JP2010025864A - Interference measuring apparatus - Google Patents
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本発明は、干渉光学系を備える干渉測定装置に関するものである。 The present invention relates to an interference measuring apparatus including an interference optical system.
干渉光学系を備える干渉測定装置として非特許文献１および特許文献１に開示されたものがある。これらの文献に開示された装置は、光源から出力された光を２分岐して第１分岐光および第２分岐光を出力し、第１分岐光が被測定物により反射されて生じる第１反射光と、第２分岐光が反射ミラーにより反射されて生じる第２反射光とを干渉させて、これにより生じる干渉光の強度を検出部により検出し、その被測定物の表面形状を測定するものである。そのために、これらの装置では、第１分岐光および第１反射光の光路長Ｌ１と第２分岐光および第２反射光の光路長Ｌ２との差（光路長差）を複数の目標値に順次に設定し、光路長差が各目標値に設定されているときに生じる干渉パターンを撮像部により撮像して、その撮像した干渉パターンに基づいて被測定物の表面形状を測定する。これらの装置では、光路長差を各目標値に順次に設定するために、反射ミラー（または被測定物）に移動ステージが取り付けられている。
上記の非特許文献１や特許文献１に開示された干渉測定装置では、光路長差を各目標値に順次に設定するために移動ステージといった機械的な駆動手段を使用している。しかし、このような機械的駆動手段はその動作に時間を要するので、干渉測定に必要な時間の多くを駆動手段の動作時間が占めることとなる。また、機械的な動作の影響が干渉パターンに表れてしまう、いわゆるモーションアーチファクトが発生するおそれもある。 In the interference measurement apparatus disclosed in Non-Patent Document 1 and Patent Document 1 described above, mechanical drive means such as a moving stage is used to sequentially set the optical path length difference to each target value. However, since such a mechanical drive means requires time for its operation, much of the time required for interference measurement occupies the operation time of the drive means. In addition, there is a possibility that a so-called motion artifact is generated in which the influence of the mechanical operation appears in the interference pattern.
本発明は、上記問題点を解消する為になされたものであり、機械的な動作を低減することによって測定に要する時間を短縮し、且つモーションアーチファクトを抑制できる干渉測定装置を提供することを目的とする。 The present invention has been made to solve the above-described problems, and an object of the present invention is to provide an interference measuring apparatus capable of reducing the time required for measurement by reducing mechanical operation and suppressing motion artifacts. And
上記した課題を解決するために、本発明による干渉測定装置は、互いに波長が異なる複数の波長成分を含む光を出力する光源と光源から出力された光を分岐して第１分岐光および第２分岐光を出力し、第１分岐光が被測定物により反射されて生じる第１反射光を入力するとともに、第２分岐光が反射ミラーにより反射されて生じる第２反射光を入力して、これら第１反射光と第２反射光とを干渉させて当該干渉光を出力する干渉光学系と、第１分岐光の光路上に設けられて被測定物内に焦点を結ぶ第１レンズと、第２分岐光の光路上に設けられて反射ミラー上に焦点を結ぶ第２レンズと、干渉光学系から出力される干渉光を結像する結像光学系と、複数の波長成分に感度を有し、結像光学系により結像された干渉光の干渉パターンを撮像する撮像部とを備え、第１レンズの軸上色収差が第２レンズの軸上色収差より大きく、第１レンズによる複数の波長成分それぞれの焦点位置が第１レンズの軸上色収差に起因して第１分岐光の光軸方向に並んでおり、各波長成分の焦点位置における干渉パターンを撮像部において撮像することを特徴とする。 In order to solve the above-described problem, an interference measurement apparatus according to the present invention branches a light source that outputs light including a plurality of wavelength components having different wavelengths from each other, and light that is output from the light source, thereby dividing the first branched light and second light. The branched light is output, and the first reflected light that is generated when the first branched light is reflected by the object to be measured is input, and the second reflected light that is generated when the second branched light is reflected by the reflecting mirror is input. An interference optical system for causing the first reflected light and the second reflected light to interfere with each other and outputting the interference light, a first lens provided on the optical path of the first branched light and focused on the object to be measured; A second lens that is provided on the optical path of the bifurcated light and focuses on the reflection mirror, an imaging optical system that forms the interference light output from the interference optical system, and sensitivity to a plurality of wavelength components Imaging the interference pattern of the interference light imaged by the imaging optical system An axial chromatic aberration of the first lens is larger than the axial chromatic aberration of the second lens, and the focal position of each of the plurality of wavelength components by the first lens is caused by the axial chromatic aberration of the first lens. It is arranged in the optical axis direction of the branched light, and the interference pattern at the focal position of each wavelength component is imaged by the imaging unit.
この干渉測定装置では第１レンズが有意の大きさの軸上色収差を有しており、光源が複数の波長成分を含む光を出力することで、第１レンズによる各波長成分の焦点位置が第１分岐光の光軸方向に並ぶ。したがって、撮像部において各波長成分の焦点位置における干渉パターンを撮像することにより、光軸方向位置すなわち被測定物における高さ位置が異なる複数の干渉パターンを好適に得ることができる。このように、上記した干渉測定装置によれば、被測定物や反射ミラーを機械的に移動させることなく複数の高さ位置での干渉パターンを得ることができるので、測定時間を短縮し、且つモーションアーチファクトを抑制できる。 In this interference measuring device, the first lens has a significant axial chromatic aberration, and the light source outputs light including a plurality of wavelength components, so that the focal position of each wavelength component by the first lens is the first. Lined up in the direction of the optical axis of one branch light. Therefore, by imaging the interference pattern at the focal position of each wavelength component in the imaging unit, it is possible to suitably obtain a plurality of interference patterns having different positions in the optical axis direction, that is, the height position in the measured object. Thus, according to the above-described interference measuring apparatus, it is possible to obtain interference patterns at a plurality of height positions without mechanically moving the object to be measured and the reflection mirror, thereby reducing the measurement time, and Motion artifacts can be suppressed.
また、干渉測定装置は、第１分岐光、第１反射光、第２分岐光、及び第２反射光のうち少なくとも一つの光路上に設けられた分散媒質からなる光学部材を更に備えることを特徴としてもよい。このような光学部材を通過する光の光路長はその波長に応じて変化するので、光学部材において各波長成分の光路長が調整されることにより、各波長成分の焦点位置それぞれを等光路点（すなわち各波長成分の光路長が互いに等しくなる点）に好適に近づけることができる。 The interference measuring apparatus further includes an optical member made of a dispersion medium provided on at least one of the first branched light, the first reflected light, the second branched light, and the second reflected light. It is good. Since the optical path length of the light passing through such an optical member changes according to the wavelength, the optical path length of each wavelength component is adjusted in the optical member, so that the focal position of each wavelength component is set to an equal optical path point ( In other words, the optical path lengths of the respective wavelength components can be suitably approximated to each other.
また、干渉測定装置は、第１レンズによる各波長成分の焦点位置のうち、第１レンズに最も近い焦点位置と最も離れた焦点位置との距離が５μｍ以上であることを特徴としてもよい。このように焦点位置の変化幅を比較的長くとることによって、例えば生物細胞といった厚さ５〜１０μｍ程度の被測定物の形状を好適に測定することができる。 The interference measuring apparatus may be characterized in that, of the focal positions of the respective wavelength components by the first lens, the distance between the focal position closest to the first lens and the farthest focal position is 5 μm or more. Thus, by taking the change width of the focal position relatively long, it is possible to suitably measure the shape of an object to be measured such as a biological cell having a thickness of about 5 to 10 μm.
本発明による干渉測定装置によれば、機械的な動作を低減することによって測定に要する時間を短縮し、且つモーションアーチファクトを抑制できる。 According to the interference measuring apparatus of the present invention, it is possible to reduce the time required for measurement by reducing mechanical operation and to suppress motion artifacts.
以下、添付図面を参照しながら本発明による干渉測定装置の実施の形態を詳細に説明する。なお、図面の説明において同一の要素には同一の符号を付し、重複する説明を省略する。 Hereinafter, embodiments of an interference measuring apparatus according to the present invention will be described in detail with reference to the accompanying drawings. In the description of the drawings, the same elements are denoted by the same reference numerals, and redundant description is omitted.
図１は、本実施形態に係る干渉測定装置１の構成図である。この図に示される干渉測定装置１は、被測定物９の表面形状を測定するものであって、光源１１、第１レンズ２１、第２レンズ２２、ハーフミラー３１、光学部材４１，４２、撮像部５１、解析部５２、容器６１、ピエゾアクチュエータ７１，７２および反射ミラー７３を備えている。 FIG. 1 is a configuration diagram of an interference measuring apparatus 1 according to the present embodiment. The interference measuring apparatus 1 shown in this figure measures the surface shape of the object 9 to be measured, and includes a light source 11, a first lens 21, a second lens 22, a half mirror 31, optical members 41 and 42, and imaging. A unit 51, an analysis unit 52, a container 61, piezoelectric actuators 71 and 72, and a reflection mirror 73 are provided.
光源１１は、コヒーレント長が比較的短い光Ｐを出力するものであり、光Ｐは、赤色成分λＲ（波長５９０〜７２０ｎｍ）、緑色成分λＧ（波長４８０ｎｍ〜６００ｎｍ）、および青色成分λＢ（４００ｎｍ〜５４０ｎｍ）といった互いに波長が異なる複数の波長成分を含む光である。光源１１は、レンズ２３およびアパーチャ２４を介してハーフミラー３１と光学的に結合されており、光Ｐはハーフミラー３１へ向けて出射される。 The light source 11 outputs light P having a relatively short coherence length. The light P includes a red component λ R (wavelength 590 to 720 nm), a green component λ G (wavelength 480 nm to 600 nm), and a blue component λ B. The light includes a plurality of wavelength components having different wavelengths such as (400 nm to 540 nm). The light source 11 is optically coupled to the half mirror 31 via the lens 23 and the aperture 24, and the light P is emitted toward the half mirror 31.
ハーフミラー３１は、光源１１から到達した光Ｐを２分岐して第１分岐光Ｐ１および第２分岐光Ｐ２を生成する。ハーフミラー３１の一方の面は光学部材４１を介して第１レンズ２１と光学的に結合されており、当該面から出射される第１分岐光Ｐ１は光学部材４１を通って第１レンズ２１に達する。また、ハーフミラー３１の他方の面は光学部材４２およびミラー４３を介して第２レンズ２２と光学的に結合されており、当該面から出射される第２分岐光Ｐ２は光学部材４２を通って第２レンズ２２に達する。光学部材４１，４２は、波長によって屈折率が異なる分散媒質からなる板状の部材であり、光学部材４１，４２を通過する光の光学部材４１，４２内部での光路長は、その波長に応じて決まる。光学部材４１，４２に使用される分散媒質としては、長波長ほど屈折率が低くなる正常分散媒質、および長波長ほど屈折率が高くなる異常分散媒質の何れを使用してもよい。 The half mirror 31 bifurcates the light P that has arrived from the light source 11 to generate the first branched light P 1 and the second branched light P 2 . One surface of the half mirror 31 is optically coupled to the first lens 21 via the optical member 41, and the first branched light P 1 emitted from the surface passes through the optical member 41 and the first lens 21. To reach. The other surface of the half mirror 31 is optically coupled to the second lens 22 via the optical member 42 and the mirror 43, and the second branched light P 2 emitted from the surface passes through the optical member 42. And reaches the second lens 22. The optical members 41 and 42 are plate-like members made of a dispersion medium having a refractive index different depending on the wavelength, and the optical path length of the light passing through the optical members 41 and 42 inside the optical members 41 and 42 depends on the wavelength. Determined. As the dispersion medium used for the optical members 41 and 42, any of a normal dispersion medium whose refractive index decreases as the wavelength increases and an anomalous dispersion medium whose refractive index increases as the wavelength increases may be used.
第１レンズ２１は、第１分岐光Ｐ１の光路上に設けられて被測定物９の内部に焦点を結ぶ。第２レンズ２２は、第２分岐光Ｐ２の光路上に設けられて反射ミラー７３上に焦点を結ぶ。第１レンズ２１としては、その軸上色収差が一般的な対物レンズの軸上色収差より大きいものが使用され、第２レンズ２２としては、一般的な対物レンズと同様に軸上色収差が補正されたものが使用される。すなわち、第１レンズ２１の軸上色収差は、第２レンズ２２の軸上色収差より大きい。なお、第１レンズ２１の色収差特性は、長波長ほど焦点距離が短いもの、または長波長ほど焦点距離が長いもののうち何れであってもよい。 The first lens 21 is provided on the optical path of the first branched light P 1 and focuses on the inside of the measurement object 9. The second lens 22 is provided on the optical path of the second branched light P 2 and focuses on the reflection mirror 73. The first lens 21 has an axial chromatic aberration larger than that of a general objective lens, and the second lens 22 has the axial chromatic aberration corrected in the same manner as a general objective lens. Things are used. That is, the axial chromatic aberration of the first lens 21 is larger than the axial chromatic aberration of the second lens 22. Note that the chromatic aberration characteristic of the first lens 21 may be any of a longer wavelength and a shorter focal length, or a longer wavelength and a longer focal length.
また、ハーフミラー３１は、第１分岐光Ｐ１が被測定物９により反射されて生じる第１反射光Ｒ１を再び第１レンズ２１及び光学部材４１を経て入力するとともに、第２分岐光Ｐ２が反射ミラー７３により反射されて生じる第２反射光Ｒ２を再び第２レンズ２２及び光学部材４２を経て入力する。ハーフミラー３１は、これら第１反射光Ｒ１と第２反射光Ｒ２とを干渉させて干渉光ＲＩを生成する。ハーフミラー３１は、レンズ２５を介して撮像部５１の撮像面と光学的に結合されており、この干渉光ＲＩをレンズ２５へ出力する。すなわち、ハーフミラー３１は、干渉光学系を構成する要素である。 Further, the half mirror 31 inputs the first reflected light R 1 generated by the first branched light P 1 being reflected by the object 9 to be measured again through the first lens 21 and the optical member 41, and the second branched light P 1. The second reflected light R 2 generated by the reflection of 2 by the reflecting mirror 73 is input again through the second lens 22 and the optical member 42. Half mirror 31, to generate an interference light RI by interfering these first reflected light R 1 and the second reflected light R 2. The half mirror 31 is optically coupled to the imaging surface of the imaging unit 51 via the lens 25, and outputs the interference light RI to the lens 25. That is, the half mirror 31 is an element constituting an interference optical system.
レンズ２５は、ハーフミラー３１から出力された干渉光ＲＩを撮像部５１の撮像面上に結像する結像光学系を構成する要素である。撮像部５１は、その結像された干渉光ＲＩの干渉パターンを撮像するものであり、例えばＲＧＢカメラである。撮像部５１は、光源１１から出力される光Ｐに含まれる複数の波長成分λＲ、λＧおよびλＢの全てに対して十分な感度を有するとともに、各波長成分λＲ、λＧおよびλＢ毎に干渉パターンを撮像可能なように構成されている。 The lens 25 is an element constituting an imaging optical system that forms an image of the interference light RI output from the half mirror 31 on the imaging surface of the imaging unit 51. The imaging unit 51 captures an interference pattern of the formed interference light RI, and is, for example, an RGB camera. The imaging unit 51 has sufficient sensitivity with respect to all of the plurality of wavelength components λ R , λ G, and λ B included in the light P output from the light source 11, and each wavelength component λ R , λ G, and λ An interference pattern can be imaged for each B.
容器６１は、第１レンズ２１に対向して配置され、被測定物９を収容する。容器６１はピエゾアクチュエータ７１に支持されており、ピエゾアクチュエータ７１が駆動されることによって第１分岐光Ｐ１の光軸方向に変位することができる。また、反射ミラー７３はピエゾアクチュエータ７２に支持されており、ピエゾアクチュエータ７２が駆動されることによって第２分岐光Ｐ２の光軸方向に変位することができる。 The container 61 is disposed to face the first lens 21 and accommodates the object 9 to be measured. Container 61 is supported on the piezoelectric actuator 71 may be piezoelectric actuators 71 is displaced in a first direction of the optical axis of the branched light P 1 by being driven. The reflection mirror 73 is supported on the piezoelectric actuator 72 can be a piezoelectric actuator 72 is displaced to the second optical axis direction of the branched optical P 2 by being driven.
ここで、ハーフミラー３１から反射ミラー７３により反射されて再びハーフミラー３１に到るまでの光路長と、ハーフミラー３１から被測定物９により反射されて再びハーフミラー３１に到るまでの光路長との光路長差をΔＬとする。前述したように、光源１１から出力される光Ｐのコヒーレント長は比較的短いので、図２に示されるように、撮像部５１に到達する干渉光ＲＩの強度は、比較的狭い光路長差ΔＬの範囲において周期的に変化し、しかも、光路長差ΔＬがゼロに近いほど干渉の振幅は大きい。このことを利用して、解析部５２は、光路長差が或る目標値に設定されたときに撮像部５１により撮像された干渉光ＲＩの干渉パターン像を取得し、その干渉パターン像に基づいて、像の各位置において干渉の振幅が最大となる光路長差を求め、これにより被測定物９の表面形状（高さ分布）を求める。なお、被測定物９の一例としては、細胞等が挙げられる。 Here, the optical path length from the half mirror 31 reflected by the reflecting mirror 73 to the half mirror 31 again, and the optical path length reflected from the half mirror 31 by the measured object 9 to the half mirror 31 again. The optical path length difference between and is ΔL. As described above, since the coherent length of the light P output from the light source 11 is relatively short, the intensity of the interference light RI reaching the imaging unit 51 is relatively narrow as shown in FIG. In addition, the amplitude of interference increases as the optical path length difference ΔL is closer to zero. Using this, the analysis unit 52 acquires an interference pattern image of the interference light RI captured by the imaging unit 51 when the optical path length difference is set to a certain target value, and based on the interference pattern image. Thus, the optical path length difference that maximizes the amplitude of interference at each position of the image is obtained, and thereby the surface shape (height distribution) of the object 9 to be measured is obtained. An example of the object to be measured 9 is a cell.
ここで、図３は、被測定物９の付近における干渉測定装置１の構成を拡大して示す図である。前述したように、第１レンズ２１の軸上色収差は一般的な対物レンズの軸上色収差より大きく、且つ第２レンズ２２の軸上色収差より大きい。したがって、第１レンズ２１による複数の波長成分λＲ、λＧおよびλＢそれぞれの焦点位置ＦＲ、ＦＧおよびＦＢは、第１レンズ２１の軸上色収差に起因して、第１分岐光Ｐ１の光軸方向すなわち被測定物９の高さ方向に並ぶこととなる。図３では、第１レンズ２１の焦点距離が長波長ほど長くなる場合を例示しており、焦点位置ＦＢが第１レンズ２１に最も近くなっており、焦点位置ＦＲが第１レンズ２１に最も遠くなっている。 Here, FIG. 3 is an enlarged view showing the configuration of the interference measuring apparatus 1 in the vicinity of the DUT 9. As described above, the axial chromatic aberration of the first lens 21 is larger than the axial chromatic aberration of a general objective lens and larger than the axial chromatic aberration of the second lens 22. Accordingly, the focal positions F R , F G, and F B of the plurality of wavelength components λ R , λ G, and λ B by the first lens 21 are caused by the longitudinal chromatic aberration of the first lens 21 and thus the first branched light. It will be arranged in the optical axis direction of P 1 , that is, in the height direction of the DUT 9. In Figure 3 exemplifies the case where the focal length of the first lens 21 becomes longer longer wavelength, the focal position F B has become closest to the first lens 21, the focal position F R to the first lens 21 The farthest.
そして、ハーフミラー３１から焦点位置ＦＲを経て再びハーフミラー３１に到る波長成分λＲの光路長と、ハーフミラー３１から反射ミラー７３により反射されて再びハーフミラー３１に到るまでの波長成分λＲの光路長との差、すなわち波長成分λＲに関する光路長差ΔＬＲがゼロに近づくと、波長成分λＲにおける干渉の振幅が大きくなる。したがって、撮像部５１は、干渉光ＲＩに含まれる波長成分λＲを撮像することで、焦点位置ＦＲに相当する光軸方向位置での干渉パターンを撮像することができる。同様に、撮像部５１は、干渉光ＲＩに含まれる波長成分λＧ，λＢをそれぞれ撮像することで、焦点位置ＦＧ，ＦＢに相当する光軸方向位置での干渉パターンを撮像することができる。すなわち、撮像部５１は、各波長成分λＲ，λＧ，λＢ毎に異なる光軸方向位置（すなわち被測定物９の高さ位置）における干渉パターンを撮像することができる。 Then, the wavelength component from the half mirror 31 and the optical path length of the wavelength component lambda R leading to the half mirror 31 again passes through the focal position F R, up to the half mirror 31 again and is reflected by the reflecting mirror 73 from the half mirror 31 the difference between the optical path length of the lambda R, that is, the optical path length difference [Delta] L R a wavelength component lambda R approaches zero, the amplitude of the interference at the wavelength component lambda R increases. Accordingly, the imaging unit 51, by imaging the wavelength component lambda R contained in the interference light RI, can be imaged interference pattern at the optical axis direction position corresponding to the focal position F R. Similarly, the imaging unit 51 captures the interference pattern at the position in the optical axis direction corresponding to the focal positions F G and F B by capturing the wavelength components λ G and λ B included in the interference light RI, respectively. Can do. That is, the imaging unit 51 can capture an interference pattern at a position in the optical axis direction that is different for each wavelength component λ R , λ G , and λ B (that is, the height position of the DUT 9).
なお、波長成分λＲ，λＧおよびλＢによる干渉パターンの一例を、図４に示す。図４（ａ）は波長成分λＢによる干渉パターンを示しており、被測定物９の頂部付近の表面形状を示している。また、図４（ｂ）は波長成分λＧによる干渉パターンを示しており、被測定物９の中腹付近の表面形状を示している。図４（ｃ）は波長成分λＲによる干渉パターンを示しており、被測定物９の裾部付近の表面形状を示している。なお、図４（ａ）〜（ｃ）において、縦軸および横軸の単位はピクセル（ｐｉｘｅｌ）である。 An example of an interference pattern due to the wavelength components λ R , λ G and λ B is shown in FIG. FIG. 4A shows an interference pattern due to the wavelength component λ B and shows the surface shape near the top of the DUT 9. FIG. 4 (b) shows the interference pattern by the wavelength component lambda G, it shows a surface shape in the vicinity of the middle of the object 9. FIG. 4 (c) shows an interference pattern by the wavelength component lambda R, shows the surface shape in the vicinity of the skirt portion of the object 9. 4A to 4C, the unit of the vertical axis and the horizontal axis is a pixel.
ここで、上記構成では焦点位置ＦＲ、ＦＧおよびＦＢが互いに異なるので、反射ミラー７３を移動させることなく光路長差ΔＬＲ，ΔＬＧ，ΔＬＢをゼロに近づけるために、本実施形態では、第１分岐光Ｐ１および第１反射光Ｒ１の光路上に分散媒質からなる光学部材４１を設け、第２分岐光Ｐ２および第２反射光Ｒ２の光路上に分散媒質からなる光学部材４２を設けている。これにより、光学部材４１，４２を通過する際の光路長を各波長成分λＲ，λＧおよびλＢで異ならせることができるので、光路長差ΔＬＲ，ΔＬＧ，ΔＬＢが同時にゼロとなるように、すなわち焦点位置ＦＲ、ＦＧおよびＦＢが互いに等光路点となるように各成分の光路長を調整できる。なお、第１レンズ２１の焦点距離が長波長ほど長くなる場合には、光学部材４１として長波長ほど屈折率が低くなる正常分散媒質を使用し、光学部材４２として長波長ほど屈折率が高くなる異常分散媒質を使用することが好ましい。逆に、第１レンズ２１の焦点距離が長波長ほど短くなる場合には、光学部材４１として異常分散媒質を使用し、光学部材４２として正常分散媒質を使用することが好ましい。 Here, since the focal positions F R , F G, and F B are different from each other in the above configuration, the present embodiment is used to bring the optical path length differences ΔL R , ΔL G , ΔL B close to zero without moving the reflecting mirror 73. Then, an optical member 41 made of a dispersion medium is provided on the optical paths of the first branched light P 1 and the first reflected light R 1 , and made of a dispersion medium on the optical paths of the second branched light P 2 and the second reflected light R 2. An optical member 42 is provided. This makes it possible to vary at each wavelength component of the optical path length lambda R, lambda G and lambda B when passing through the optical members 41 and 42, the optical path length difference [Delta] L R, [Delta] L G, is [Delta] L B and simultaneously zero In other words, the optical path lengths of the respective components can be adjusted so that the focal positions F R , F G and F B are mutually equal optical path points. When the focal length of the first lens 21 is longer as the wavelength is longer, a normal dispersion medium whose refractive index is lower as the wavelength is longer is used as the optical member 41, and the refractive index is higher as the wavelength is longer as the optical member 42. It is preferable to use an anomalous dispersion medium. Conversely, when the focal length of the first lens 21 becomes shorter as the wavelength increases, it is preferable to use an anomalous dispersion medium as the optical member 41 and a normal dispersion medium as the optical member 42.
また、被測定物９の表面形状が波長未満の微小な凹凸を持つ場合には、干渉の振幅が最大となる光路長差付近において、波長成分λＲ，λＧ，λＢそれぞれの中心波長をλＲ０，λＧ０，λＢ０とおいて、それぞれλＲ０／４，λＧ０／４，λＢ０／４ずつ光路長差を４回シフトさせると共に干渉パターン像を取得するとよい。そして、各波長成分毎に４つの干渉パターン像に基づいて、像の各位置において干渉波形の位相オフセット値を求めることにより被測定物９の詳細な表面形状（高さ分布）を求め、各波長成分による表面形状を合成することにより、広い高さ範囲での表面形状を、波長未満の精度で得ることができる。このようなλＲ０／４，λＧ０／４，λＢ０／４ずつの光路長差のシフトは、ピエゾアクチュエータ７２を駆動することにより反射ミラー７３を第２分岐光Ｐ２の光軸方向に微小動作させることで容易に実現できる。なお、本実施形態では、ピエゾアクチュエータ７１は測定開始時の光学調整のみに使用され、測定中は動作しない。 Further, when the surface shape of the object to be measured 9 has minute irregularities less than the wavelength, the center wavelengths of the wavelength components λ R , λ G , and λ B are set in the vicinity of the optical path length difference at which the interference amplitude becomes maximum. For λ R0 , λ G0 , and λ B0 , the optical path length difference is shifted four times by λ R0 / 4, λ G0 / 4, and λ B0 / 4, respectively, and an interference pattern image is acquired. Then, based on the four interference pattern images for each wavelength component, the detailed surface shape (height distribution) of the DUT 9 is obtained by obtaining the phase offset value of the interference waveform at each position of the image, and each wavelength. By synthesizing the surface shape of the components, the surface shape in a wide height range can be obtained with an accuracy less than the wavelength. Such a shift of the optical path length difference of λ R0 / 4, λ G0 / 4, and λ B0 / 4 causes the reflection mirror 73 to move slightly in the optical axis direction of the second branched light P 2 by driving the piezo actuator 72. It can be easily realized by operating. In this embodiment, the piezo actuator 71 is used only for optical adjustment at the start of measurement, and does not operate during measurement.
また、本実施形態において、焦点位置ＦＲ、ＦＧおよびＦＢのうち第１レンズ２１に最も近い焦点位置（図３ではＦＢ）と、最も離れた焦点位置（図３ではＦＲ）との差は５μｍ以上であることが望ましい。このように焦点位置の変化幅を比較的長くとることによって、例えば生物細胞といった厚さ５〜１０μｍ程度の被測定物の形状を好適に測定することができる。一般的な対物レンズの軸上色収差は赤色光と青色光とを比べても±１μｍ程度に抑えられているので、このように大きな軸上色収差を有するレンズとしては、例えば単色レーザ用のレンズ等が好適に用いられる。 In the present embodiment, among the focal positions F R , F G and F B , the focal position closest to the first lens 21 (F B in FIG. 3) and the farthest focal position (F R in FIG. 3) The difference is desirably 5 μm or more. Thus, by taking the change width of the focal position relatively long, it is possible to suitably measure the shape of an object to be measured such as a biological cell having a thickness of about 5 to 10 μm. Since the axial chromatic aberration of a general objective lens is suppressed to about ± 1 μm even when comparing red light and blue light, as a lens having such a large axial chromatic aberration, for example, a lens for a monochromatic laser, etc. Are preferably used.
以上の説明においては光Ｐが３つの波長成分λＲ，λＧ，λＢを含む場合について説明したが、光Ｐが一定の波長帯域にわたって略平坦なスペクトルを有する場合であっても、撮像部５１が複数の波長成分のそれぞれを個別に撮像することで、同様の作用を得ることができる。いま、撮像部５１のスペクトルチャネル数（すなわち、光Ｐに含まれる波長成分の数）をＮ（Ｎは２以上の整数）とし、各チャネルの中心波長をλ１，λ２…λＮとおく。そして、図５に示すように、各チャネルの中心波長同士の間隔をλｄとし、各チャネルの受光スペクトル帯域幅をΔλとおく。このとき、各チャネルにおいて検出される各波長成分のコヒーレンス長Δｌは、次式（１）によって表される。
例えばλ＝５００ｎｍ、Δλ＝６０ｎｍ、ｎ（屈折率）＝１．３３（水中）を代入すると、この値はΔｌ＝３．１μｍとなる。
In the above description, the case where the light P includes three wavelength components λ R , λ G , and λ B has been described. However, even if the light P has a substantially flat spectrum over a certain wavelength band, the imaging unit The same action can be obtained by 51 individually imaging each of the plurality of wavelength components. Now, the number of spectral channels of the imaging unit 51 (that is, the number of wavelength components included in the light P) is N (N is an integer equal to or greater than 2), and the center wavelengths of the channels are λ 1 , λ 2 ... Λ N. . Then, as shown in FIG. 5, the interval between the center wavelengths of the channels is λ d, and the received spectrum bandwidth of each channel is Δλ. At this time, the coherence length Δl of each wavelength component detected in each channel is expressed by the following equation (1).
For example, if λ = 500 nm, Δλ = 60 nm, and n (refractive index) = 1.33 (underwater) are substituted, this value is Δl = 3.1 μm.
ここで、光の波長がλｄ長くなる毎に焦点距離がおおよそΔｌずつ長くなるように第１レンズ２１の軸上色収差を設定する。このとき、撮像部５１の各チャネルに入射する光は、それぞれ異なる焦点位置からの反射光を反映したものとなる。さらに、光学部材４１及び４２の屈折率特性を、波長がλｄ長くなる毎におおよそｎ×Δｌずつ光路長差が短くなるように調整する。これにより、物体光路（第１分岐光Ｐ１および第１反射光Ｒ１が通過する光路）の光路長と、参照光路（第２分岐光Ｐ２および第２反射光Ｒ２が通過する光路）の光路長とが互いに等しくなる等光路点は、波長がλｄ長くなる毎に、第１レンズ２１からΔｌずつ遠方にシフトする。 Here, to set the axial chromatic aberration of the first lens 21 as the focal length for each wavelength of light lambda d becomes longer becomes roughly by Δl long. At this time, the light incident on each channel of the imaging unit 51 reflects the reflected light from different focal positions. Further, the refractive index profile of the optical member 41 and 42, the optical path length difference approximately by n × .DELTA.l whenever the wavelength lambda d becomes longer be adjusted to be shorter. Thereby, the optical path length of the object optical path (the optical path through which the first branched light P 1 and the first reflected light R 1 pass) and the reference optical path (the optical path through which the second branched light P 2 and the second reflected light R 2 pass) equal optical path points and the optical path length are equal to each other in, every time the wavelength lambda d becomes longer, shifted to far from the first lens 21 by .DELTA.l.
図６に示すグラフは、光学ガラスとして一般的なＢＫ７の屈折率特性を示している。いま、第１分岐光Ｐ１および第１反射光Ｒ１の光路上に設けられた光学部材４１のみを用いて光路長差を調整することを考える。この光学部材４１にＢＫ７を用いた場合、ＢＫ７の色分散は波長５５０ｎｍ付近で５×１０−５／ｎｍである（図６参照）。例えばλｄ＝１００ｎｍとした場合、隣接する波長間で５×１０−３の屈折率差が生じる。この屈折率差によって生じる光学部材４１内での光路長差がｎ×Δｌに等しくなればよいので、光学部材４１に必要な厚さＤは、
Ｄ＝ｎ×Δｌ／（ＣＤ×λｄ）＝８２５［μｍ］
となる。なお、現実には、第１レンズ２１、光学部材４１、第２レンズ２２の三箇所において光路長の波長依存性が生ずるので、その全てで発生する光路長の波長依存性が次の条件
ｎ×Δｌ＝（ＣＤ×λｄ）×Ｄ＋ΔＯＤｏｂｊ１−ΔＯＤｏｂｊ２（ただし、ΔＯＤｏｂｊ１およびΔＯＤｏｂｊ２は第１レンズ２１および第２レンズ２２のそれぞれで発生する光路長の波長依存性）
を満たすように、光学部材４１の厚さを調整する必要がある。
The graph shown in FIG. 6 shows the refractive index characteristics of BK7, which is common as optical glass. Now, consider that the optical path length difference is adjusted using only the optical member 41 provided on the optical paths of the first branched light P 1 and the first reflected light R 1 . When BK7 is used for the optical member 41, the chromatic dispersion of BK7 is 5 × 10 −5 / nm near the wavelength of 550 nm (see FIG. 6). For example, when λ d = 100 nm, a refractive index difference of 5 × 10 −3 occurs between adjacent wavelengths. Since the optical path length difference in the optical member 41 caused by this difference in refractive index should be equal to n × Δl, the thickness D required for the optical member 41 is
D = n × Δl / (CD × λ d ) = 825 [μm]
It becomes. In reality, since the wavelength dependence of the optical path length occurs at the three locations of the first lens 21, the optical member 41, and the second lens 22, the wavelength dependence of the optical path length generated in all of them is the following condition nx. Δl = (CD × λ d ) × D + ΔOD obj1 −ΔOD obj2 (where ΔOD obj1 and ΔOD obj2 are the wavelength dependences of the optical path lengths generated in the first lens 21 and the second lens 22, respectively)
It is necessary to adjust the thickness of the optical member 41 so as to satisfy the above.
図７は、各チャネルの干渉信号と第１分岐光Ｐ１の光軸方向位置との関係を示す図である。上記した条件を満たすことにより、図７に示されるように、各チャネルの干渉信号を第１分岐光Ｐ１の光軸方向に広範囲にわたって連続して得ることができる。 Figure 7 is a diagram showing the relationship between the interference signal and the optical axis direction position of the first branched light P 1 of each channel. By satisfying the above conditions, as shown in FIG. 7, interference signals of the respective channels can be continuously obtained over a wide range in the optical axis direction of the first branched light P 1 .
そして、このような条件下で、ピエゾアクチュエータ７２によって反射ミラー７３を光軸方向に変位させることにより、各チャネル毎に例えば波長の１／４ずつの位相シフトを行いながら４枚の干渉像を撮像すれば、各チャネルの干渉像は各焦点位置での細胞形状を反映した位相像となる。図８（ａ）〜（ｈ）は、一例としてＮ＝８の場合における干渉像を示す画像であり、互いにΔｌずつシフトした光軸方向位置における干渉像を示している。そして、これらの干渉像を、チャネル１からチャネルＮにわたって合成すると、被測定物９全体の表面（界面）形状の全焦点画像が得られる（図９参照）。なお、このときの被測定深度はＮ×Δｌである。例えば前述Δｌ＝３．１μｍの条件でＮ＝３とした場合、被測定深度は９μｍ程度となり、厚さ５〜１０μｍの細胞の殆どを測定することが可能となる。 Under such conditions, the reflection mirror 73 is displaced in the direction of the optical axis by the piezo actuator 72, so that four interference images are picked up while performing a phase shift of, for example, 1/4 wavelength for each channel. Then, the interference image of each channel becomes a phase image reflecting the cell shape at each focal position. FIGS. 8A to 8H are images showing interference images when N = 8 as an example, and show interference images at positions in the optical axis direction shifted by Δl. Then, when these interference images are synthesized from channel 1 to channel N, an omnifocal image of the surface (interface) shape of the entire object to be measured 9 is obtained (see FIG. 9). The depth to be measured at this time is N × Δl. For example, when N = 3 under the condition of Δl = 3.1 μm, the depth to be measured is about 9 μm, and most of cells having a thickness of 5 to 10 μm can be measured.
以上説明したように、本実施形態による干渉測定装置１では、一般的な対物レンズとは顕著に異なる有意の大きさの軸上色収差を第１レンズ２１が有するので、光源１１が複数の波長成分（例えばλＲ，λＧ，λＢ）を含む光Ｐを出力することにより、第１レンズ２１による各波長成分の焦点位置（ＦＲ，ＦＧ，ＦＢ）が第１分岐光Ｐ１の光軸方向に並ぶ。したがって、撮像部５１において各波長成分λＲ，λＧ，λＢの焦点位置ＦＲ，ＦＧ，ＦＢにおける干渉パターンを撮像することにより、光軸方向位置すなわち被測定物９における高さ位置が異なる複数の干渉パターンを好適に得ることができる。このように、干渉測定装置１によれば、被測定物９や反射ミラー７３を移動ステージ等を用いて機械的に移動させることなく複数の高さ位置（深さ位置）での干渉パターンを得ることができるので、機械的な動作を低減して測定時間を短縮し、且つモーションアーチファクトを抑制できる。 As described above, in the interference measuring apparatus 1 according to the present embodiment, since the first lens 21 has a significant magnitude of axial chromatic aberration that is significantly different from that of a general objective lens, the light source 11 has a plurality of wavelength components. By outputting the light P including (for example, λ R , λ G , λ B ), the focal position (F R , F G , F B ) of each wavelength component by the first lens 21 is the first branched light P 1 . Lined up in the direction of the optical axis. Therefore, the wavelength components lambda R in the imaging unit 51, lambda G, lambda focal position F R of B, F G, by imaging the interference pattern in the F B, the height position in the optical axis direction position or the object to be measured 9 A plurality of interference patterns having different values can be suitably obtained. As described above, according to the interference measuring apparatus 1, interference patterns at a plurality of height positions (depth positions) are obtained without mechanically moving the DUT 9 or the reflection mirror 73 using a moving stage or the like. Therefore, the mechanical operation can be reduced, the measurement time can be shortened, and the motion artifact can be suppressed.
また、本実施形態のように、第１分岐光Ｐ１および第１反射光Ｒ１の光路上、並びに第２分岐光Ｐ２および第２反射光Ｒ２の光路上には、分散媒質からなる光学部材４１，４２を設けることが好ましい。これらの光学部材４１，４２を通過する光の光路長はその波長に応じて変化するので、この光学部材４１，４２において各波長成分の光路長が調整されることにより、各波長成分の焦点位置ＦＲ，ＦＧ，ＦＢそれぞれを等光路点（すなわち各波長成分λＲ，λＧ，λＢの光路長が互いに等しくなる点）に好適に近づけることができる。なお、本実施形態では第１分岐光Ｐ１および第１反射光Ｒ１の光路上、ならびに第２分岐光Ｐ２および第２反射光Ｒ２の光路上の双方に光学部材を配置しているが、いずれか一方の光路上にのみ光学部材を配置してもよい。また、光学部材４１は、第１分岐光Ｐ１および第１反射光Ｒ１の光路が互いに一致していない場合には、少なくともいずれか一方の光路上に設けられるとよい。光学部材４２に関しても、第２分岐光Ｐ２および第２反射光Ｒ２の光路が互いに一致していない場合には、少なくともいずれか一方の光路上に設けられるとよい。 Further, as in the present embodiment, a dispersion medium is formed on the optical paths of the first branched light P 1 and the first reflected light R 1 and on the optical paths of the second branched light P 2 and the second reflected light R 2. Optical members 41 and 42 are preferably provided. Since the optical path length of the light passing through these optical members 41 and 42 changes according to the wavelength, the focal position of each wavelength component is adjusted by adjusting the optical path length of each wavelength component in this optical member 41 and 42. Each of F R , F G , and F B can be suitably brought close to an equal optical path point (that is, a point where the optical path lengths of the wavelength components λ R , λ G , and λ B are equal to each other). In the present embodiment, optical members are disposed both on the optical paths of the first branched light P 1 and the first reflected light R 1 and on the optical paths of the second branched light P 2 and the second reflected light R 2 . However, the optical member may be disposed only on one of the optical paths. Further, the optical member 41 may be provided on at least one of the optical paths when the optical paths of the first branched light P 1 and the first reflected light R 1 do not coincide with each other. Also with respect to the optical member 42, when the optical path of the second branch light P 2 and the second reflected light R 2 do not coincide with each other, it may be provided on at least one of the optical path.
本発明による干渉測定装置は、上記した実施形態に限られるものではなく、他に様々な変形が可能である。例えば、上記実施形態では各波長成分の光路長を整合させるために分散媒質からなる光学部材を設けたが、第１レンズや第２レンズ自体も波長分散を有することができるので、第１レンズや第２レンズの分散特性を利用して各波長成分の光路長を整合させてもよい。したがって、光学部材を設けるか否かは任意となる。 The interference measuring apparatus according to the present invention is not limited to the above-described embodiment, and various other modifications are possible. For example, in the above embodiment, an optical member made of a dispersion medium is provided to match the optical path length of each wavelength component. However, since the first lens and the second lens themselves can also have wavelength dispersion, The optical path length of each wavelength component may be matched using the dispersion characteristic of the second lens. Therefore, whether or not to provide an optical member is arbitrary.
１…干渉測定装置、９…被測定物、１１…光源、２１…第１レンズ、２２…第２レンズ、２３，２５…レンズ、２４…アパーチャ、３１…ハーフミラー、４１，４２…光学部材、５１…撮像部、５２…解析部、６１…容器、７１，７２…ピエゾアクチュエータ、７３…反射ミラー、ＦＲ，ＦＧ，ＦＢ…焦点位置、Ｐ１…第１分岐光、Ｐ２…第２分岐光、Ｒ１…第１反射光、Ｒ２…第２反射光、ＲＩ…干渉光。 DESCRIPTION OF SYMBOLS 1 ... Interference measuring device, 9 ... Measured object, 11 ... Light source, 21 ... 1st lens, 22 ... 2nd lens, 23, 25 ... Lens, 24 ... Aperture, 31 ... Half mirror, 41, 42 ... Optical member, 51 ... imaging unit, 52 ... analyzer, 61 ... container, 71 ... piezoelectric actuator, 73 ... reflecting mirror, F R, F G, F B ... focal position, P 1 ... first branched light, P 2 ... first Bifurcated light, R 1 ... first reflected light, R 2 ... second reflected light, RI ... interference light.
Claims (3)
前記光源から出力された光を分岐して第１分岐光および第２分岐光を出力し、前記第１分岐光が被測定物により反射されて生じる第１反射光を入力するとともに、前記第２分岐光が反射ミラーにより反射されて生じる第２反射光を入力して、これら第１反射光と第２反射光とを干渉させて当該干渉光を出力する干渉光学系と、
前記第１分岐光の光路上に設けられて前記被測定物内に焦点を結ぶ第１レンズと、
前記第２分岐光の光路上に設けられて前記反射ミラー上に焦点を結ぶ第２レンズと、
前記干渉光学系から出力される干渉光を結像する結像光学系と、
前記複数の波長成分に感度を有し、前記結像光学系により結像された干渉光の干渉パターンを撮像する撮像部と
を備え、
前記第１レンズの軸上色収差が前記第２レンズの軸上色収差より大きく、前記第１レンズによる前記複数の波長成分それぞれの焦点位置が前記第１レンズの軸上色収差に起因して前記第１分岐光の光軸方向に並んでおり、各波長成分の焦点位置における干渉パターンを前記撮像部において撮像することを特徴とする、干渉測定装置。 A light source that outputs light including a plurality of wavelength components having different wavelengths from each other;
The light output from the light source is branched to output first branched light and second branched light, and the first reflected light generated by reflecting the first branched light by the object to be measured is input, and the second An interference optical system that receives the second reflected light that is generated when the branched light is reflected by the reflecting mirror, causes the first reflected light and the second reflected light to interfere with each other, and outputs the interference light;
A first lens provided on the optical path of the first branched light to focus on the object to be measured;
A second lens provided on the optical path of the second branched light and focused on the reflecting mirror;
An imaging optical system for imaging the interference light output from the interference optical system;
An imaging unit having sensitivity to the plurality of wavelength components and imaging an interference pattern of interference light imaged by the imaging optical system;
The axial chromatic aberration of the first lens is larger than the axial chromatic aberration of the second lens, and the focal position of each of the plurality of wavelength components by the first lens is caused by the axial chromatic aberration of the first lens. An interference measurement apparatus, wherein the interference pattern is arranged in the optical axis direction of the branched light and the interference pattern at the focal position of each wavelength component is imaged by the imaging unit.
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