JP2009079827A - Sublimate measuring device of heat treatment device - Google Patents

Sublimate measuring device of heat treatment device Download PDF

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JP2009079827A
JP2009079827A JP2007249176A JP2007249176A JP2009079827A JP 2009079827 A JP2009079827 A JP 2009079827A JP 2007249176 A JP2007249176 A JP 2007249176A JP 2007249176 A JP2007249176 A JP 2007249176A JP 2009079827 A JP2009079827 A JP 2009079827A
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sublimation
sublimate
gas introduction
sublimation gas
gas
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Nagamitsu Tezeni
永充 手錢
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Espec Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a sublimate measuring device in a heat treatment room, capable of accurately measuring the quantity of sublimate contained in sublimate gas generated in the heat treatment room. <P>SOLUTION: This sublimate measuring device comprises a sublimate gas guide room 3 which can introduce sublimate gas E with maintaining the temperature of the sublimate gas E generated in the heat treatment room 110, a gas guide means 10 which guides gas G with a lower temperature than the sublimate gas E into the sublimate gas guide room 3 so that sublimate S is deposited from the sublimate gas E inside the sublimate gas guide room 3, and a sublimate quantity measuring means 13 which is provided to the downstream of the sublimate gas guide room 3 and measures the quantity of the deposited sublimate S. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、被熱処理物を熱処理する熱処理装置において、熱処理の際に被熱処理物から発生する昇華ガスに含まれる昇華物の量を測定する測定装置に関するものである。   The present invention relates to a measurement apparatus that measures the amount of sublimation contained in a sublimation gas generated from a heat treatment object during the heat treatment in a heat treatment apparatus for heat treating the heat treatment object.

熱処理装置は、熱処理室内に被熱処理物を収容した状態で、前記熱処理室内の空気を循環させながら加熱することにより前記被熱処理物を熱処理するものである。このような熱処理装置は、例えばＦＰＤ（フラットパネルディスプレイ）の製造工程におけるフォトレジストや有機物薄膜のプリベーク、ポストベーク工程に用いられる。   The heat treatment apparatus heat-treats the object to be heat-treated by heating the object to be heat-treated in the heat-treatment chamber while circulating the air in the heat-treatment chamber. Such a heat treatment apparatus is used, for example, in a photoresist or organic thin film pre-bake and post-bake process in an FPD (flat panel display) manufacturing process.

これらの工程では、ガラス基板等からなる被熱処理物が熱処理される際に、フォトレジスト等に含有される揮発性成分が気化して多量の昇華ガスが発生する。この昇華ガスが、前記熱処理室から外部に漏れ、冷却されると、前記揮発性成分からなる昇華物が析出または再結晶化して、ＦＰＤの製造ラインに設置されているセンサ類、前記熱処理部内で循環させる空気を換気する配管などの熱処理装置周辺に付着する。   In these processes, when a heat-treated object made of a glass substrate or the like is heat-treated, a volatile component contained in the photoresist or the like is vaporized and a large amount of sublimation gas is generated. When this sublimation gas leaks outside from the heat treatment chamber and is cooled, the sublimate consisting of the volatile components is precipitated or recrystallized, and in the sensors and the heat treatment section installed in the FPD production line. It adheres to the periphery of heat treatment equipment such as piping that ventilates the air to be circulated.

前記昇華物の付着量が許容量を超えるとＦＰＤの製造に支障が生じる。このため、前記熱処理室内で発生する昇華ガスの量を抑制して、熱処理装置周辺に昇華物が付着することを防止する対策が講じられている。しかしながら、熱処理中に熱処理室内で発生した昇華ガスに含有される昇華物の量を正確に測定して、その対策が効果的であるか否かを評価する方法は確立されていない。   When the adhesion amount of the sublimate exceeds an allowable amount, the production of FPD is hindered. For this reason, measures are taken to suppress the amount of sublimation gas generated in the heat treatment chamber to prevent the sublimate from adhering to the periphery of the heat treatment apparatus. However, a method for accurately measuring the amount of sublimate contained in the sublimation gas generated in the heat treatment chamber during the heat treatment and evaluating whether the countermeasure is effective has not been established.

一方、例えば特許文献１には、空気中に浮遊する粒子をカウントするパーティクルカウンタが記載されており、このようなパーティクルカウンタを熱処理装置の近傍に配置し、このパーティクルカウンタによって熱処理装置から漏出した昇華ガスの一部を捉え、該昇華ガスに含有される揮発性成分（昇華物）の粒子の数をカウントすることにより昇華物量を測定することが考えられる。
特開平５−１３６２４４号公報 On the other hand, for example, Patent Document 1 describes a particle counter that counts particles floating in the air. Such a particle counter is disposed in the vicinity of a heat treatment apparatus, and sublimation leaked from the heat treatment apparatus by the particle counter. It is conceivable to measure the amount of sublimation by capturing a part of the gas and counting the number of volatile component (sublimation) particles contained in the sublimation gas.
JP-A-5-136244

特許文献１に記載のパーティクルカウンタを前記熱処理装置の近傍に配置して昇華物量を測定するとしても、前記熱処理室から漏出した空気中に浮遊する昇華物の粒子数を測定できるに過ぎず、熱処理室内で発生する昇華ガスに含有される昇華物の量を正確に測定できるわけではない。仮に、熱処理室内にパーティクルカウンタを設置したとしても、熱処理室内は高温であるため、パーティクルカウンタが測定するのに十分な昇華物析出量を安定して得ることはできないと予測される。   Even if the particle counter described in Patent Document 1 is arranged in the vicinity of the heat treatment apparatus and the amount of sublimate is measured, it is only possible to measure the number of particles of sublimate floating in the air leaked from the heat treatment chamber, and heat treatment The amount of sublimation contained in the sublimation gas generated in the room cannot be accurately measured. Even if a particle counter is installed in the heat treatment chamber, it is predicted that the sublimate precipitation amount sufficient for the particle counter to measure cannot be stably obtained because the temperature in the heat treatment chamber is high.

このように、熱処理室内で発生した昇華ガスに含有される昇華物の量を正確に測定する方法は確立されておらず、そのため、昇華ガス発生の抑制対策が効果的であるか否かを正確に評価することは難しい。   As described above, a method for accurately measuring the amount of sublimation contained in the sublimation gas generated in the heat treatment chamber has not been established. Therefore, it is accurate to determine whether or not the countermeasure for suppressing sublimation gas generation is effective. It is difficult to evaluate.

そこで、本発明は、上述の課題に鑑みてなされたもので、熱処理室内で発生した昇華ガスに含有される昇華物の量を正確に測定することが可能な、熱処理室における昇華物の測定装置を提供することを目的とする。   Therefore, the present invention has been made in view of the above-described problems, and is capable of accurately measuring the amount of sublimate contained in the sublimation gas generated in the heat treatment chamber, and measuring the sublimate in the heat treatment chamber. The purpose is to provide.

前記目的を達成するために、本発明にかかる、熱処理室における昇華物の測定装置は、熱処理室内に収容された被熱処理物を熱処理する際に前記被熱処理物から発生する昇華ガスに含まれる昇華物の量を測定する装置であり、前記熱処理室内で発生した前記昇華ガスの温度が維持された状態で前記昇華ガスを導入可能な昇華ガス導入室と、前記昇華ガス導入室内で前記昇華ガスから昇華物が析出するように、前記昇華ガス導入室内に前記昇華ガスよりも低温のガスを導入するガス導入手段と、前記昇華ガス導入室の下流側に設けられて、前記析出した昇華物の量を測定する昇華物量測定手段とを備えている。   In order to achieve the above object, the apparatus for measuring a sublimation material in a heat treatment chamber according to the present invention is a sublimation gas contained in a sublimation gas generated from the heat treatment material when heat treating the heat treatment material accommodated in the heat treatment chamber. A sublimation gas introduction chamber capable of introducing the sublimation gas while maintaining the temperature of the sublimation gas generated in the heat treatment chamber, and a sublimation gas from the sublimation gas in the sublimation gas introduction chamber. Gas introduction means for introducing a gas at a temperature lower than the sublimation gas into the sublimation gas introduction chamber so that the sublimation product is precipitated, and the amount of the deposited sublimate provided on the downstream side of the sublimation gas introduction chamber And a sublimation amount measuring means for measuring.

本発明の昇華物の測定装置によれば、熱処理室内で発生した昇華ガスは、前記昇華ガスの温度が維持された状態で昇華ガス導入室に導入されるので、前記昇華ガスが大気に曝されることを防止でき、つまり前記昇華ガスが大気によって冷却されて、昇華物測定装置の外部で前記昇華ガスから昇華物が析出することを防止できる。これに加え、前記昇華ガスは、昇華ガス導入室内においてガス導入手段によって前記昇華ガスよりも低温のガスと接触して冷却されるので、昇華物量測定手段によって測定するのに十分な量の昇華物を前記昇華ガス導入室内で前記昇華ガスから安定して析出させることができる。その結果、熱処理室内で発生した昇華ガスに含有される昇華物の量を正確に測定すること、ひいては、昇華ガスの抑制対策が効果的であるか否か等を正確に評価することが可能である。   According to the sublimate measuring apparatus of the present invention, the sublimation gas generated in the heat treatment chamber is introduced into the sublimation gas introduction chamber while maintaining the temperature of the sublimation gas, so that the sublimation gas is exposed to the atmosphere. That is, it is possible to prevent the sublimation gas from being cooled from the sublimation gas and the sublimation product from being deposited from the sublimation gas outside the sublimation measurement apparatus. In addition, the sublimation gas is cooled in contact with the gas at a lower temperature than the sublimation gas by the gas introduction means in the sublimation gas introduction chamber, so that the sublimate has a sufficient amount to be measured by the sublimation quantity measurement means. Can be stably deposited from the sublimation gas in the sublimation gas introduction chamber. As a result, it is possible to accurately measure the amount of sublimation contained in the sublimation gas generated in the heat treatment chamber, and thus to accurately evaluate whether sublimation gas suppression measures are effective. is there.

本発明の好ましい実施形態によれば、昇華物測定装置は、さらに、前記昇華ガス導入室に連通接続される一方、前記熱処理室内の前記昇華ガスを前記昇華ガス導入室内に導入可能な接続管と、前記昇華ガスから前記昇華物が前記接続管内で析出しないように前記接続管を保温する接続管保温手段とを備えている。   According to a preferred embodiment of the present invention, the sublimate measuring apparatus is further connected to the sublimation gas introduction chamber, and the connection pipe capable of introducing the sublimation gas in the heat treatment chamber into the sublimation gas introduction chamber. And a connecting pipe heat retaining means for keeping the connecting pipe warm so that the sublimate does not precipitate from the sublimation gas in the connecting pipe.

この構成によれば、接続管は、接続管保温手段によって該接続管内で前記昇華ガスから昇華物が析出しないように保温されているので、昇華物が接続管内で付着することが防止され、その結果、昇華ガス導入室内の昇華ガスから熱処理室内の昇華物の量を正確に推定することができる。前記接続管保温手段は、例えば断熱材やヒータである。   According to this configuration, the connecting pipe is kept warm by the connecting pipe heat retaining means so that the sublimate does not precipitate from the sublimation gas in the connecting pipe, so that the sublimate is prevented from adhering in the connecting pipe, As a result, the amount of the sublimate in the heat treatment chamber can be accurately estimated from the sublimation gas in the sublimation gas introduction chamber. The connecting pipe heat retaining means is, for example, a heat insulating material or a heater.

本発明の他の好ましい実施形態によれば、前記昇華ガス導入室は前記熱処理室に直接連通接続されている。この構成によれば、前記昇華ガス導入室は熱処理装置に直接連通接続されているので、昇華ガスを大気に曝すことなく熱処理装置から前記昇華ガス導入室に直接導入することができる。また、前記熱処理装置と前記昇華ガス導入室とを接続する接続管を必要としないので、昇華物測定装置の構成を簡略化できる。   According to another preferred embodiment of the present invention, the sublimation gas introduction chamber is directly connected to the heat treatment chamber. According to this configuration, since the sublimation gas introduction chamber is directly connected to the heat treatment apparatus, the sublimation gas can be directly introduced into the sublimation gas introduction chamber without exposing the sublimation gas to the atmosphere. In addition, since a connection pipe for connecting the heat treatment apparatus and the sublimation gas introduction chamber is not required, the configuration of the sublimate measurement apparatus can be simplified.

本発明のさらに好ましい実施形態では、前記ガス導入手段は、前記昇華ガス導入室に連通接続されたガス導入管を有しており、このガス導入管は、前記熱処理室から前記昇華ガス導入室内に導入された前記昇華ガスの流れのほぼ中央に配置されて前記昇華ガス流れの方向に向くガス流出口を有している。   In a further preferred embodiment of the present invention, the gas introduction means has a gas introduction pipe connected to the sublimation gas introduction chamber, and the gas introduction pipe is provided from the heat treatment chamber to the sublimation gas introduction chamber. It has a gas outlet which is arranged in the approximate center of the introduced sublimation gas flow and faces the sublimation gas flow.

この構成によれば、ガス導入管のガス流出口から流出したガスは、昇華ガス流れの方向に沿って前記昇華ガス流れのほぼ中央を流れるように設定されているので、前記昇華ガスを効率良く冷却して十分な昇華物析出量を安定して得ることができる。このため、昇華物量測定手段により昇華物量を正確に測定できるので、熱処理室内の昇華物量の正確な推定が可能となる。前記ガス導入管は、好ましくは断熱材で被覆されており、昇華ガスが昇華ガス導入室内でガス導入管に接触して冷却され、析出した昇華物がガス導入管に付着することを防止する。   According to this configuration, the gas flowing out from the gas outlet of the gas introduction pipe is set to flow substantially in the center of the sublimation gas flow along the direction of the sublimation gas flow. By cooling, a sufficient amount of precipitated sublimate can be stably obtained. For this reason, since the amount of sublimation can be accurately measured by the sublimation amount measuring means, the amount of sublimation in the heat treatment chamber can be accurately estimated. The gas introduction pipe is preferably covered with a heat insulating material, and the sublimation gas is cooled in contact with the gas introduction pipe in the sublimation gas introduction chamber to prevent the deposited sublimate from adhering to the gas introduction pipe.

本発明のさらに他の実施形態では、前記昇華ガス導入室は、前記昇華物を前記昇華ガス導入室から前記昇華物量測定手段へ導出する昇華物導出口を有しており、この昇華物導出口は、前記ガス導入管の前記ガス流出口から前記ガスが流れる方向に延長した線上で前記ガス流出口と対向するように位置している。   In still another embodiment of the present invention, the sublimation gas introduction chamber has a sublimate outlet for leading the sublimate from the sublimation gas introduction chamber to the sublimate amount measuring means. Is positioned so as to face the gas outlet on a line extending in the direction in which the gas flows from the gas outlet of the gas introduction pipe.

この構成によれば、前記ガス流出口と前記昇華物導出口は対向配置されているので、冷却された昇華ガスから析出した昇華物が、ガスの流れに乗って前記昇華物導出口に向かって流れる。このため、昇華物は、前記昇華ガス導入室内に滞留し難くなるので、前記昇華物導出口を介して昇華物量測定手段に運ばれる。その結果、昇華物量測定手段により昇華物量を正確に測定できるので、熱処理室内の昇華物量の正確な推定が可能となる。   According to this configuration, since the gas outlet and the sublimate outlet are disposed to face each other, the sublimate precipitated from the cooled sublimation gas rides on the gas flow toward the sublimate outlet. Flowing. For this reason, since the sublimate hardly stays in the sublimation gas introduction chamber, the sublimate is conveyed to the sublimate amount measuring means via the sublimate outlet. As a result, the amount of sublimation can be accurately measured by the sublimation amount measuring means, so that the amount of sublimation in the heat treatment chamber can be accurately estimated.

本発明のさらに他の実施形態では、昇華物測定装置は、さらに、前記昇華ガス導入室に連通接続される一方、前記昇華ガスを前記熱処理室から前記昇華ガス導入室内に導入可能な昇華ガス導入管を備えており、この昇華ガス導入管は、前記ガス導入手段によって前記昇華ガス導入室内に導入された前記ガスの流れのほぼ中央に配置されて前記ガス流れの方向に向く昇華ガス導出口を有している。   In still another embodiment of the present invention, the sublimate measuring apparatus is further connected to the sublimation gas introduction chamber, while the sublimation gas introduction is capable of introducing the sublimation gas from the heat treatment chamber into the sublimation gas introduction chamber. The sublimation gas introduction pipe is provided with a sublimation gas lead-out port which is arranged at substantially the center of the gas flow introduced into the sublimation gas introduction chamber by the gas introduction means and faces the gas flow direction. Have.

この構成によれば、昇華ガス導入管の昇華ガス導出口から流出した昇華ガスは、前記ガス流れの方向に沿って前記ガス流れのほぼ中央を流れるように設定されているので、前記昇華ガスを効率良く冷却して十分な昇華物析出量を安定して得ることができる。このため、昇華物量測定手段により昇華物量を正確に測定できるので、熱処理室内の昇華物量の正確な推定が可能となる。また、析出した昇華物は、前記ガス流れに遮られて前記昇華ガス導入室の壁面に付着し難くなる。このように、前記ガス流れは、昇華物が昇華ガス導入室の壁面に付着するのを防止する付着防止手段としても作用する。前記昇華ガス導入管は、好ましくは断熱材で被覆されており、前記昇華ガス導入管内を流れる前記昇華ガスがガスによって冷却され、析出した昇華物が前記昇華ガス導入管内で付着するのを防止する。   According to this configuration, the sublimation gas that has flowed out of the sublimation gas outlet of the sublimation gas introduction pipe is set to flow substantially in the center of the gas flow along the direction of the gas flow. It can cool efficiently and can obtain sufficient sublimate precipitation amount stably. For this reason, since the amount of sublimation can be accurately measured by the sublimation amount measuring means, the amount of sublimation in the heat treatment chamber can be accurately estimated. Further, the deposited sublimate is blocked by the gas flow and hardly adheres to the wall surface of the sublimation gas introduction chamber. Thus, the gas flow also acts as an adhesion preventing means for preventing the sublimate from adhering to the wall surface of the sublimation gas introduction chamber. The sublimation gas introduction pipe is preferably coated with a heat insulating material, and the sublimation gas flowing in the sublimation gas introduction pipe is cooled by the gas, and the deposited sublimate is prevented from adhering in the sublimation gas introduction pipe. .

本発明のさらに好ましい実施形態では、前記昇華ガス導入室は、前記昇華物を前記昇華ガス導入室から前記昇華物量測定手段へ導出する昇華物導出口を有しており、この昇華物導出口は、前記昇華ガス導入管の前記昇華ガス流出口から前記昇華ガスが流れる方向に延長した線上で前記昇華ガス流出口と対向するように位置している。   In a further preferred embodiment of the present invention, the sublimation gas introduction chamber has a sublimate outlet for leading the sublimate from the sublimation gas introduction chamber to the sublimate amount measuring means. The sublimation gas inlet pipe is positioned so as to face the sublimation gas outlet on a line extending in the direction in which the sublimation gas flows from the sublimation gas outlet.

この構成によれば、前記昇華ガス流出口と前記昇華物導出口は対向配置されているので、冷却された昇華ガスから析出した昇華物が、前記ガス流れに乗って前記昇華物導出口に向かって流れる。このため、昇華物は、前記昇華ガス導入室内に滞留し難くなるので、前記昇華物導出口を介して昇華物量測定手段に運ばれる。その結果、昇華物量測定手段により昇華物量を正確に測定できるので、熱処理室内の昇華物量の正確な推定が可能となる。   According to this configuration, since the sublimation gas outlet and the sublimate outlet are arranged opposite to each other, the sublimate deposited from the cooled sublimation gas rides on the gas flow toward the sublimate outlet. Flowing. For this reason, since the sublimate hardly stays in the sublimation gas introduction chamber, the sublimate is conveyed to the sublimate amount measuring means via the sublimate outlet. As a result, the amount of sublimation can be accurately measured by the sublimation amount measuring means, so that the amount of sublimation in the heat treatment chamber can be accurately estimated.

本発明のさらに他の実施形態では、昇華物測定装置は、さらに、前記昇華ガス導入室内に導入される前記昇華ガスを整流する整流部材を備えている。この構成によれば、昇華ガスは前記昇華ガス導入室内で整流となって流れるので、ガスの流れと効率良く接触して冷却される。これにより、前記昇華ガス導入室内での昇華物析出量が安定するため、熱処理室内の昇華物量の推定をさらに正確に行うことができる。   In still another embodiment of the present invention, the sublimate measuring apparatus further includes a rectifying member that rectifies the sublimation gas introduced into the sublimation gas introduction chamber. According to this configuration, the sublimation gas flows in a rectified manner in the sublimation gas introduction chamber, so that the sublimation gas efficiently contacts the gas flow and is cooled. Thereby, since the sublimation deposit amount in the sublimation gas introduction chamber is stabilized, the sublimation amount in the heat treatment chamber can be estimated more accurately.

本発明のさらに他の実施形態では、昇華物測定装置は、さらに、前記昇華ガス導入室の空間を画定する壁を、前記昇華物が前記壁の内面に付着しないように保温する昇華ガス導入室保温手段を備えている。この構成によれば、昇華物が昇華ガス導入室の壁の内面に付着するのが防止されるので、前記昇華ガス導入室内において昇華物の析出が安定する。これにより、熱処理室内の昇華物量の推定をさらに正確に行うことができる。   In still another embodiment of the present invention, the sublimate measuring apparatus further includes a sublimation gas introduction chamber that keeps the wall defining the space of the sublimation gas introduction chamber warm so that the sublimate does not adhere to the inner surface of the wall. It has heat insulation means. According to this configuration, the sublimate is prevented from adhering to the inner surface of the wall of the sublimation gas introduction chamber, so that the precipitation of the sublimate is stabilized in the sublimation gas introduction chamber. Thereby, the amount of sublimation in the heat treatment chamber can be estimated more accurately.

本発明のさらに他の実施形態では、前記昇華物量測定手段は、前記昇華物の粒子数をカウントするパーティクルカウンタである。パーティクルカウンタを用いれば、昇華物の粒子数をカウントするのみで、熱処理室内の昇華物量を容易に推定できる。   In still another embodiment of the present invention, the sublimate amount measuring means is a particle counter that counts the number of particles of the sublimate. If the particle counter is used, the amount of sublimation in the heat treatment chamber can be easily estimated only by counting the number of sublimation particles.

本発明のさらに他の実施形態では、前記昇華物量測定手段は、前記昇華ガス導入室からの前記昇華物が流れる昇華物流路を有しており、前記昇華物が流れる前記昇華物流路に光を照射して、前記昇華物によって減衰した前記光の量を測定し、その減衰量に基づき前記昇華物の濃度を決定する測定手段である。この構成によれば、昇華物の粒子数をカウントしなくても昇華物によって減衰された光の量を測定するのみで、熱処理室内の昇華物量を容易に推定できる。   In still another embodiment of the present invention, the sublimate amount measuring means has a sublimate flow path through which the sublimate from the sublimation gas introduction chamber flows, and the sublimate flow path through which the sublimate flows. Irradiating, measuring the amount of the light attenuated by the sublimate, and determining the concentration of the sublimate based on the amount of attenuation. According to this configuration, the amount of sublimate in the heat treatment chamber can be easily estimated only by measuring the amount of light attenuated by the sublimate without counting the number of particles of the sublimate.

本発明のさらに他の実施形態では、前記昇華物量測定手段は、前記昇華ガス導入室からの前記昇華物が流れる昇華物流路を有しており、前記昇華ガス導入室は、前記昇華物流路に対して着脱自在である。この構成によれば、長時間の使用により昇華ガス導入室の壁面に昇華物が付着し堆積した場合、汚れた昇華ガス導入室を、新しい昇華ガス導入室と交換することができるので、清掃作業に伴う時間のロスを回避することができる。   In still another embodiment of the present invention, the sublimate amount measuring means has a sublimate flow path through which the sublimate from the sublimation gas introduction chamber flows, and the sublimation gas introduction chamber is connected to the sublimation flow path. On the other hand, it is detachable. According to this configuration, when the sublimate adheres to and accumulates on the wall surface of the sublimation gas introduction chamber after a long period of use, the dirty sublimation gas introduction chamber can be replaced with a new sublimation gas introduction chamber. It is possible to avoid the time loss associated with.

本発明のさらに他の実施形態では、前記昇華物量測定手段は、前記昇華ガス導入室からの前記昇華物が流れる昇華物流路を有しており、この昇華物流路に着脱自在な透明管が挿入されている。この構成によれば、昇華物が流れる昇華物流路に透明管が挿入されているので、昇華物が昇華物流路に付着して堆積することが防止できると共に、長時間の使用により透明管の内壁面に昇華物が付着して堆積した場合、汚れた透明管を、新しい透明管と交換することができるので、清掃作業に伴う時間のロスを回避することができる。しかも、透明な管を用いているので、昇華物を測定するために昇華物流路に照射される光を遮ることはないので、昇華物量の測定を支障なく行うことができる。   In still another embodiment of the present invention, the sublimate amount measuring means has a sublimate flow path through which the sublimate from the sublimation gas introduction chamber flows, and a detachable transparent tube is inserted into the sublimate flow path. Has been. According to this configuration, since the transparent tube is inserted into the sublimate flow path through which the sublimate flows, the sublimate can be prevented from adhering to and deposited on the sublimate flow channel, and the inside of the transparent tube can be used for a long time. When a sublimate adheres and accumulates on the wall surface, the dirty transparent tube can be replaced with a new transparent tube, so that time loss associated with the cleaning operation can be avoided. In addition, since a transparent tube is used, the amount of sublimate can be measured without hindrance because the light irradiated to the sublimate flow path for measuring the sublimate is not blocked.

本発明のさらに他の実施形態では、前記昇華物量測定手段の下流側に、前記昇華ガスの流量を測定する流量計が設けられている。この構成によれば、昇華物量の測定を開始する前に昇華ガスのみを昇華ガス導入室に導入すれば、その流量を測定することができるので、昇華物量測定装置が、析出した昇華物を安定して検出かつ測定できるように昇華ガスの流量を制御できる。   In still another embodiment of the present invention, a flow meter for measuring the flow rate of the sublimation gas is provided on the downstream side of the sublimate amount measuring means. According to this configuration, if only the sublimation gas is introduced into the sublimation gas introduction chamber before the measurement of the amount of sublimation is started, the flow rate can be measured. Thus, the flow rate of the sublimation gas can be controlled so that it can be detected and measured.

本発明のさらに他の実施形態では、前記昇華物量測定手段の下流側に、前記昇華物を捕集するフィルタが設けられている。この構成によれば、捕集した昇華物の成分を分析できるので、昇華物量の測定結果と併用すれば、昇華ガス発生防止の対策をさらに向上することができる。   In still another embodiment of the present invention, a filter for collecting the sublimate is provided on the downstream side of the sublimate amount measuring means. According to this configuration, since the components of the collected sublimate can be analyzed, the countermeasure for preventing sublimation gas generation can be further improved by using it together with the measurement result of the amount of sublimation.

本発明の昇華物の測定装置によれば、熱処理室内で発生した昇華ガスに含有される昇華物の量を正確に測定することが可能であり、ひいては昇華ガス発生抑制の対策が効果的であるか否かを正確に評価することが可能である。   According to the sublimate measuring apparatus of the present invention, it is possible to accurately measure the amount of sublimate contained in the sublimation gas generated in the heat treatment chamber, and as a result, measures for suppressing sublimation gas generation are effective. It is possible to accurately evaluate whether or not.

以下、本発明を実施するための最良の形態について、図面を参照しながら詳細に説明する。   Hereinafter, the best mode for carrying out the present invention will be described in detail with reference to the drawings.

（実施形態１）
図１は、本発明の第１実施形態に係る昇華物測定装置１Ａの概略構成図であり、熱処理装置１００の熱処理室１１０に連通接続された状態を示している。昇華物測定装置１Ａは、熱処理装置１００に連通接続可能な装置であり、熱処理装置１００内で被熱処理物Ｗを熱処理する際に被熱処理物Ｗから発生する昇華ガスＥに含有される昇華物Ｓの量を測定する装置である。熱処理装置１００は、例えばＦＰＤ（フラットパネルディスプレイ）の製造工程に用いられるものであり、クリーンルーム内に設置されるいわゆるクリーンオーブンと呼ばれるものである。 (Embodiment 1)
FIG. 1 is a schematic configuration diagram of a sublimation product measuring apparatus 1A according to the first embodiment of the present invention, and shows a state in which it is connected to a heat treatment chamber 110 of a heat treatment apparatus 100. The sublimation measuring apparatus 1A is an apparatus that can be connected to the heat treatment apparatus 100, and the sublimation substance S contained in the sublimation gas E generated from the heat treatment object W when the heat treatment object W is heat-treated in the heat treatment apparatus 100. It is a device that measures the amount of. The heat treatment apparatus 100 is used, for example, in an FPD (flat panel display) manufacturing process, and is called a so-called clean oven installed in a clean room.

熱処理装置１００は、被熱処理物Ｗが出し入れ可能に収容される熱処理室１１０を有している。この熱処理室１１０の内側には、１または２以上の被熱処理物Ｗを所定状態で保持できる保持部材（図示せず）が二点鎖線で示す位置に設けられている。また、熱処理室１１０には、熱処理用気体、例えば加熱エアを熱処理室１１０内に導入する図示しない気体導入ダクトと、熱処理室１１０から熱処理済みの気体を導出する図示しない気体導出ダクトとが連通接続されている。これらの前記気体導入ダクトおよび前記気体導出ダクトを介して熱処理室１１０内で熱処理気体を循環させながら被熱処理物Ｗを加熱すると、被熱処理物Ｗが熱処理される。   The heat treatment apparatus 100 has a heat treatment chamber 110 in which the object to be heat treated W is accommodated so that it can be taken in and out. Inside the heat treatment chamber 110, a holding member (not shown) capable of holding one or more heat-treated objects W in a predetermined state is provided at a position indicated by a two-dot chain line. Further, in the heat treatment chamber 110, a gas introduction duct (not shown) for introducing a heat treatment gas, for example, heated air, into the heat treatment chamber 110 and a gas outlet duct (not shown) for extracting the heat-treated gas from the heat treatment chamber 110 are connected in communication. Has been. When the heat treatment object W is heated while circulating the heat treatment gas in the heat treatment chamber 110 through the gas introduction duct and the gas lead-out duct, the heat treatment object W is heat-treated.

被熱処理物Ｗは、例えばガラス基板であり、フォトレジスト膜や有機物薄膜が形成されている。被熱処理物Ｗが熱処理されると、フォトレジスト等に含有される揮発性成分が気化し、昇華ガスＥが熱処理室内に発生する。   The workpiece W is a glass substrate, for example, and a photoresist film or an organic thin film is formed thereon. When the workpiece W is heat-treated, a volatile component contained in the photoresist or the like is vaporized, and a sublimation gas E is generated in the heat treatment chamber.

一方、昇華物測定装置１Ａは、熱処理室１１０からの昇華ガスＥが導入される昇華ガス導入室３と、昇華ガス導入室３に連通接続されて熱処理室１１０内の昇華ガスＥを昇華ガス導入室３内に導入可能な接続管７と、ガスＧを昇華ガス導入室３に導入するガス導入手段１０と、昇華ガス導入室３の下流側に接続されて、昇華ガス導入室３内に導入された昇華ガスＥに含有される昇華物Ｓの量を測定する昇華物量測定手段１３とを有している。   On the other hand, the sublimate measuring apparatus 1A is connected to the sublimation gas introduction chamber 3 into which the sublimation gas E from the heat treatment chamber 110 is introduced, and the sublimation gas introduction chamber 3 is connected to the sublimation gas introduction chamber 3 to introduce the sublimation gas E in the heat treatment chamber 110 into the sublimation gas. Connecting pipe 7 that can be introduced into chamber 3, gas introduction means 10 for introducing gas G into sublimation gas introduction chamber 3, and connected to the downstream side of sublimation gas introduction chamber 3 to be introduced into sublimation gas introduction chamber 3. And a sublimate amount measuring means 13 for measuring the amount of sublimate S contained in the sublimation gas E.

昇華ガス導入室３は、熱処理室１１０からの昇華ガスＥおよびガス導入手段１０からのガスＧが流れる空間を形成するものであり、この空間は壁部３ａにより画定されている。以下、本明細書では、前記空間において、昇華ガスＥおよびガスＧが導入される側を上流側とし、昇華ガスＥから析出する昇華物ＳおよびガスＧが導出される側を下流側とする。   The sublimation gas introduction chamber 3 forms a space through which the sublimation gas E from the heat treatment chamber 110 and the gas G from the gas introduction means 10 flow, and this space is defined by the wall 3a. Hereinafter, in the present specification, in the space, the side where the sublimation gas E and the gas G are introduced is the upstream side, and the side where the sublimate S and the gas G precipitated from the sublimation gas E is the downstream side.

昇華ガス導入室３における上流側の壁部３ａには、接続管７が接続されて、昇華ガス導入室３と接続管７とは連通可能な状態となっている。この接続管７は、その流入口７ａに連結用フランジ８を有している。熱処理室１１０は、その空間を画定する断熱壁１１２を貫通して形成された昇華ガス導出用の導出管１１４を有しており、この昇華ガス導出管１１４の導出口１１４ａには、連結用フランジ１１６が設けられている。昇華物測定装置１Ａを使用する際、接続管７の連結用フランジ８と、熱処理室１１０の昇華ガス導出管１１４の連結用フランジ１１６とを、ボルトおよびナット等の締結手段で連結すると、接続管７が熱処理室１１０に連通接続される。このように、接続管７と熱処理室１１０とが連通接続されることで、熱処理室１１０内で発生した昇華ガスＥが接続管７を介して昇華ガス導入室３内に導入可能となる。なお、接続管７は、図示は省略するが、ボルトを、連結用フランジ８に穿孔された貫通孔に通し、熱処理室１１０の断熱壁１１２に形成されたボルト孔に螺入することにより、熱処理室１１０に直接取り付けてもよい。   A connecting pipe 7 is connected to the upstream wall 3 a in the sublimation gas introduction chamber 3 so that the sublimation gas introduction chamber 3 and the connection pipe 7 can communicate with each other. The connecting pipe 7 has a connecting flange 8 at the inlet 7a. The heat treatment chamber 110 has a sublimation gas lead-out pipe 114 formed through a heat insulating wall 112 that defines the space, and the sublimation gas lead-out pipe 114 has a connection flange at a lead-out port 114a. 116 is provided. When the sublimate measuring apparatus 1A is used, if the connecting flange 8 of the connecting pipe 7 and the connecting flange 116 of the sublimation gas outlet pipe 114 of the heat treatment chamber 110 are connected by fastening means such as bolts and nuts, the connecting pipe 7 is connected in communication with the heat treatment chamber 110. Thus, the connection pipe 7 and the heat treatment chamber 110 are connected in communication, so that the sublimation gas E generated in the heat treatment chamber 110 can be introduced into the sublimation gas introduction chamber 3 through the connection pipe 7. Although not shown, the connecting pipe 7 is heat-treated by passing a bolt through a through-hole drilled in the connecting flange 8 and screwing it into a bolt hole formed in the heat-insulating wall 112 of the heat-treating chamber 110. It may be attached directly to the chamber 110.

熱処理室１１０の昇華ガス導出管１１４には、図示しないバルブ等の開閉部材が設けられており、昇華物測定装置１Ａを用いて熱処理室１１０内の昇華ガスＥに含有される昇華物Ｓの量を測定するとき、開閉部材を開状態にする。この開閉部材を開状態にすると、熱処理された被熱処理物Ｗから発生した高圧下にある高温の昇華ガスＥが接続管７に流入する。熱処理室１１０内で発生した昇華ガスＥは、例えば２２０〜２３０℃のガスであるが、接続管７内に流入した際に冷却されて２００℃以下になると、昇華ガスＥから昇華物Ｓが析出し、接続管７内で付着するおそれがある。昇華物Ｅが接続管７内で付着してしまうと、昇華物導入室３内で安定した昇華物析出量を得ることができないので、正確な昇華物量を昇華物量測定手段１３によって測定することはできない。   The sublimation gas outlet pipe 114 of the heat treatment chamber 110 is provided with an opening / closing member such as a valve (not shown), and the amount of sublimation S contained in the sublimation gas E in the heat treatment chamber 110 using the sublimation measurement apparatus 1A. When measuring, the open / close member is opened. When this open / close member is in the open state, the high-temperature sublimation gas E generated from the heat-treated workpiece W under high pressure flows into the connecting pipe 7. The sublimation gas E generated in the heat treatment chamber 110 is, for example, a gas having a temperature of 220 to 230 ° C. When the sublimation gas E is cooled to 200 ° C. or less when flowing into the connecting pipe 7, the sublimate S is precipitated from the sublimation gas E. Then, there is a risk of adhesion in the connecting pipe 7. If the sublimate E adheres in the connecting pipe 7, a stable sublimate precipitation amount cannot be obtained in the sublimate introduction chamber 3, and therefore the accurate sublimate amount measurement means 13 can measure the sublimate amount measurement means 13. Can not.

そこで、接続管７内における昇華物Ｓの付着を防止するために、接続管７には、該接続管７内を流れる昇華ガスＥの温度が少なくとも２００℃以下に低下しないように接続管７を保温する接続管保温手段９が設けられている。接続管保温手段９は、例えばヒータを接続管７の周囲に配置したり、断熱材を接続管７に被覆することで構成される。また、熱処理室１１０の昇華ガス導出管１１４にも、接続管保温手段９と同様の目的で保温手段１１５が設けられている。   Therefore, in order to prevent the sublimation S from adhering in the connection pipe 7, the connection pipe 7 is provided with a connection pipe 7 so that the temperature of the sublimation gas E flowing in the connection pipe 7 does not decrease to at least 200 ° C. or less. A connecting tube heat retaining means 9 for retaining heat is provided. The connecting pipe heat retaining means 9 is configured by, for example, arranging a heater around the connecting pipe 7 or covering the connecting pipe 7 with a heat insulating material. Further, the sublimation gas outlet pipe 114 of the heat treatment chamber 110 is also provided with a heat retaining means 115 for the same purpose as the connecting pipe heat retaining means 9.

昇華ガス導入室３における上流側の壁部３ａには、接続管７に加え、ガス導入手段１０に連通接続された送ガス管１１が接続されている。この送ガス管１１を介して、ガス導入手段１０からのガスＧが昇華ガス導入室３内に導入される。このガスＧは、熱処理室１１０から昇華ガス導入室３内に高圧下で導入される昇華ガスＥと等しい圧力、またはそれ以上の圧力で昇華ガス導入室３内に導入される。   In addition to the connection pipe 7, a gas supply pipe 11 connected in communication with the gas introduction means 10 is connected to the upstream wall 3 a in the sublimation gas introduction chamber 3. The gas G from the gas introduction means 10 is introduced into the sublimation gas introduction chamber 3 through the gas supply pipe 11. This gas G is introduced into the sublimation gas introduction chamber 3 at a pressure equal to or higher than the sublimation gas E introduced under high pressure from the heat treatment chamber 110 into the sublimation gas introduction chamber 3.

また、送ガス管１１は、該送ガス管１１を通るガスＧが、昇華ガス導入室３の空間の中央部を占める領域Ｃ（図２）付近を流れるように昇華ガス導入室３に接続されており、接続管７も、送ガス管１１と同様に、該接続管７を通る昇華ガスＥが昇華ガス導入室３の空間の中央領域Ｃを流れるように昇華ガス導入室３に接続されている。このように、接続管７および送ガス管１１を昇華ガス導入室３に接続することで、昇華ガスＥおよびガスＧが、昇華ガス導入室３の空間の中央領域Ｃ付近で互いに接触して流れるように設定されている。   The gas feed pipe 11 is connected to the sublimation gas introduction chamber 3 so that the gas G passing through the gas feed pipe 11 flows in the vicinity of the region C (FIG. 2) occupying the central portion of the space of the sublimation gas introduction chamber 3. Similarly to the gas feed pipe 11, the connection pipe 7 is connected to the sublimation gas introduction chamber 3 so that the sublimation gas E passing through the connection pipe 7 flows through the central region C of the space of the sublimation gas introduction chamber 3. Yes. Thus, by connecting the connecting pipe 7 and the gas feeding pipe 11 to the sublimation gas introduction chamber 3, the sublimation gas E and the gas G flow in contact with each other in the vicinity of the central region C of the space of the sublimation gas introduction chamber 3. Is set to

ガスＧは、例えば、外気であり、ガス導入手段１０は、例えば送風機である。ガスＧは、外気に限らず、２２０〜２３０℃の昇華ガスＥを昇華ガス導入室３内で１５０〜１８０℃にまで冷却して昇華ガスＥから昇華物Ｓを析出させることが可能なガスであればよい。   The gas G is, for example, outside air, and the gas introduction unit 10 is, for example, a blower. The gas G is not limited to the outside air, and is a gas that can cool the sublimation gas E of 220 to 230 ° C. to 150 to 180 ° C. in the sublimation gas introduction chamber 3 to precipitate the sublimate S from the sublimation gas E. I just need it.

昇華ガス導入室３における下流側の壁部３ａには、昇華物Ｓが昇華ガス導入室３から昇華物量測定手段１３へ導出される昇華物導出部３ｂが設けられており、この昇華物導出部３ｂの導出口３ｃには、連結用フランジ１５が設けられている。   The downstream wall 3a of the sublimation gas introduction chamber 3 is provided with a sublimate discharge portion 3b through which the sublimate S is led out from the sublimation gas introduction chamber 3 to the sublimation amount measuring means 13, and this sublimate discharge portion. A connecting flange 15 is provided in the outlet 3c of 3b.

また、昇華ガス導入室３の壁部３ａには保温手段４３が設けられている。この保温手段４３は、昇華ガス導入室３の壁部３ａの内面に、昇華ガスＥから析出した昇華物Ｓが付着することを防止するために、前記壁部３ａを保温するものである。昇華ガス導入室３が、円形断面を有する円筒状の管状部材である場合、保温手段４３は、管状部材の周壁に設けられる。昇華ガス導入室３の壁部（周壁）３ａは大気と接触している部分であるため、昇華ガスＥが前記壁部（周壁）３ａの内面と接触すると、冷却され、析出した昇華物Ｓが前記壁部３ａの内面に付着するおそれがあるが、保温手段４３によって、昇華物Ｓの付着を防止できる。これにより、昇華ガス導入室３内において昇華物Ｓの析出が安定する。保温手段４３は、例えばヒータを昇華ガス導入室３の壁部３ａの周囲に配置したり、断熱材を昇華ガス導入室３の壁部３ａに被覆することで構成される。なお、保温手段４３は省略してもよい。   A heat retaining means 43 is provided on the wall 3 a of the sublimation gas introduction chamber 3. The heat retaining means 43 heats the wall 3a in order to prevent the sublimate S deposited from the sublimation gas E from adhering to the inner surface of the wall 3a of the sublimation gas introduction chamber 3. When the sublimation gas introduction chamber 3 is a cylindrical tubular member having a circular cross section, the heat retaining means 43 is provided on the peripheral wall of the tubular member. Since the wall (peripheral wall) 3a of the sublimation gas introduction chamber 3 is in contact with the atmosphere, when the sublimation gas E comes into contact with the inner surface of the wall (peripheral wall) 3a, the sublimate S that is cooled and precipitated is cooled. Although there is a possibility of adhering to the inner surface of the wall 3a, the heat retaining means 43 can prevent the sublimation S from adhering. Thereby, precipitation of the sublimate S is stabilized in the sublimation gas introduction chamber 3. The heat retaining means 43 is configured, for example, by arranging a heater around the wall 3 a of the sublimation gas introduction chamber 3 or covering the wall 3 a of the sublimation gas introduction chamber 3 with a heat insulating material. The heat retaining means 43 may be omitted.

昇華物量測定手段１３は、昇華ガス導入室３の昇華物導出部３ｂから導出された昇華物Ｓが導入される昇華物導入部１３ａを有しており、この昇華物導入部１３ａの導入口１３ｂには、連結用フランジ１６が設けられている。昇華物量測定手段１３の内部には、昇華物導入部１３ａから導入された昇華物Ｓが流れる昇華物流路１７が形成されており、測定部１８によって昇華物流路１７を流れる昇華物Ｓの量が測定される。測定部１８によって測定された昇華物Ｓは、ガスＧと共に昇華物排出口１３ｃから外部に排出される。   The sublimate amount measuring means 13 has a sublimate introduction part 13a into which the sublimate S derived from the sublimate extraction part 3b of the sublimation gas introduction chamber 3 is introduced, and the inlet 13b of the sublimate introduction part 13a. Is provided with a connecting flange 16. A sublimate flow passage 17 through which the sublimate S introduced from the sublimate introduction portion 13 a flows is formed inside the sublimate amount measuring means 13, and the amount of the sublimate S flowing through the sublimate flow passage 17 is measured by the measurement portion 18. Measured. The sublimation product S measured by the measurement unit 18 is discharged together with the gas G from the sublimation product discharge port 13c.

昇華物量測定手段１３の測定部１８は、昇華物Ｓの量を測定することが可能なものであればよく、種々の公知の測定方法を採用でき、例えばパーティクルカウンタを採用している。パーティクルカウンタを用いれば、昇華物Ｓの粒子数をカウントするのみで、熱処理室１１０内で発生した昇華ガスＥに含有される昇華物Ｓの量を容易に推定できる。   The measuring unit 18 of the sublimate amount measuring means 13 only needs to be capable of measuring the amount of the sublimate S, and various known measuring methods can be employed, for example, a particle counter is employed. If the particle counter is used, the amount of the sublimation product S contained in the sublimation gas E generated in the heat treatment chamber 110 can be easily estimated only by counting the number of particles of the sublimation product S.

また、昇華物量測定手段１３の昇華物排出口１３ｃには、昇華ガスＥの流量を測定する流量計４７が接続されている。昇華物量の測定を開始する前に昇華ガスＥのみを昇華ガス導入室３に導入すれば、昇華ガス導入室３内から昇華物流路１７に流れ込み、昇華物排出口１３ｃから流出する昇華ガスＥの流量を測定することができるので、昇華物量測定装置１Ａが、析出した昇華物Ｓを安定して検出かつ測定できるように昇華ガスＥの流量を制御できる。流量計４７は省略してもよい。   Further, a flow meter 47 for measuring the flow rate of the sublimation gas E is connected to the sublimate discharge port 13 c of the sublimate amount measuring means 13. If only the sublimation gas E is introduced into the sublimation gas introduction chamber 3 before the measurement of the amount of sublimation is started, the sublimation gas E flows from the sublimation gas introduction chamber 3 into the sublimation passage 17 and flows out of the sublimation outlet 13c. Since the flow rate can be measured, the flow rate of the sublimation gas E can be controlled so that the sublimate amount measuring apparatus 1A can detect and measure the deposited sublimate S stably. The flow meter 47 may be omitted.

昇華ガス導入室３の昇華物導出部３ｂの連結用フランジ１５と、昇華物量測定手段１３の昇華物導入部１３ａの連結用フランジ１６とを、ボルトおよびナット等の締結手段で連結すると、昇華ガス導入室３と昇華物量測定手段１３とは互いに連通接続される。このように、昇華ガス導入室３と昇華物量測定手段１３とが連通接続されることで、昇華ガス導入室３内で析出した昇華物Ｓが昇華物流路１７に流れ込むので、昇華物量測定手段１３によって昇華物Ｓの量が測定可能となる。なお、昇華物量測定手段１３は、図示は省略するが、ボルトを、連結用フランジ１６に穿孔された貫通孔に通し、昇華ガス導入室３の壁部３ａに形成されたボルト孔に螺入することにより、昇華ガス導入室３に直接取り付けてもよい。   When the connection flange 15 of the sublimation product outlet 3b of the sublimation gas introduction chamber 3 and the connection flange 16 of the sublimation product introduction unit 13a of the sublimation amount measuring means 13 are connected by fastening means such as bolts and nuts, the sublimation gas. The introduction chamber 3 and the sublimation amount measuring means 13 are connected in communication with each other. As described above, the sublimation gas introduction chamber 3 and the sublimation substance amount measuring means 13 are connected to each other, so that the sublimation substance S deposited in the sublimation gas introduction chamber 3 flows into the sublimation substance flow path 17. Makes it possible to measure the amount of the sublimate S. Although not shown in the figure, the sublimation amount measuring means 13 passes a bolt through a through-hole drilled in the connecting flange 16 and screws it into a bolt hole formed in the wall 3a of the sublimation gas introduction chamber 3. As a result, it may be directly attached to the sublimation gas introduction chamber 3.

以下、図１および図２を参照して昇華物測定装置１Ａの動作を説明する。   Hereinafter, the operation of the sublimate measuring apparatus 1A will be described with reference to FIG. 1 and FIG.

熱処理装置１００の熱処理室１１０内で被熱処理物Ｗを熱処理すると、被熱処理物Ｗから昇華ガスＥが発生する。熱処理室１１０の開閉部材を開状態にすると、熱処理室１１０内で高圧下にある昇華ガスＥが、矢印で示すように、昇華ガス導出管１１４の導出口１１４ａを介して接続管７内に流入する。接続管７は接続管保温手段９により保温されているので、接続管７内で昇華ガスＥから昇華物Ｓが析出することなく、昇華ガスＥは２２０〜２３０℃の温度に維持された状態で接続管７内を流れる。なお、熱処理室１１０内で発生した昇華ガスＥは、大気圧よりは高圧下にあるので、ブロワ等によって昇華ガス導入室３内に吸引する必要はない。なお、熱処理装置１００の構成によっては、熱処理室１１０内で発生した昇華ガスＥを、ブロワ等によって昇華ガス導入室３内に吸引する、またはファン等によって昇華ガス導入室３内に送出する必要がある。   When the heat treatment object W is heat-treated in the heat treatment chamber 110 of the heat treatment apparatus 100, a sublimation gas E is generated from the heat treatment object W. When the opening / closing member of the heat treatment chamber 110 is opened, the sublimation gas E under high pressure in the heat treatment chamber 110 flows into the connection pipe 7 through the outlet 114a of the sublimation gas outlet pipe 114 as indicated by an arrow. To do. Since the connecting pipe 7 is kept warm by the connecting pipe heat retaining means 9, the sublimation gas E is maintained at a temperature of 220 to 230 ° C. without sublimation S being deposited from the sublimation gas E in the connecting pipe 7. It flows in the connecting pipe 7. Note that the sublimation gas E generated in the heat treatment chamber 110 is at a pressure higher than the atmospheric pressure, and therefore it is not necessary to suck the sublimation gas into the sublimation gas introduction chamber 3 with a blower or the like. Depending on the configuration of the heat treatment apparatus 100, the sublimation gas E generated in the heat treatment chamber 110 needs to be sucked into the sublimation gas introduction chamber 3 by a blower or the like, or sent to the sublimation gas introduction chamber 3 by a fan or the like. is there.

接続管７内に流入した昇華ガスＥは、図２に示すように、昇華ガス導入室３内に導入され、ガス導入手段１０によって送ガス管１１を通して昇華ガス導入室３内に導入された矢印で示すガスＧと、昇華ガス導入室３の空間における一点鎖線で示す中央領域Ｃ付近で接触して冷却される。このとき、昇華ガスＥはガスＧによって２２０〜２３０℃から１５０〜１８０℃にまで冷却され、その結果、昇華ガスＥから昇華物Ｓが析出する。析出した昇華物Ｓは、矢印で示すように、ガスＧの流れに乗り、昇華物／ガス流れとなって昇華物導出部３ｂの昇華物導出口３ｃを介して昇華物量測定手段１３の昇華物流路１７に運ばれる。そして、昇華物量測定手段１３の測定部１８において、析出した昇華物Ｓの量が測定され、その測定値に基づき、熱処理室１１０内で発生した昇華ガスＥに含有される昇華物Ｓの量を推定する。   As shown in FIG. 2, the sublimation gas E that has flowed into the connection pipe 7 is introduced into the sublimation gas introduction chamber 3 and is introduced into the sublimation gas introduction chamber 3 through the gas feed pipe 11 by the gas introduction means 10. The gas G shown in FIG. 5 is brought into contact with and cooled in the vicinity of the central region C shown by the one-dot chain line in the space of the sublimation gas introduction chamber 3. At this time, the sublimation gas E is cooled by the gas G from 220 to 230 ° C. to 150 to 180 ° C. As a result, the sublimate S is deposited from the sublimation gas E. The deposited sublimation S, as indicated by an arrow, rides on the flow of gas G, becomes a sublimate / gas flow, and passes through the sublimate outlet 3c of the sublimate outlet 3b. Carried to Road 17. Then, in the measurement unit 18 of the sublimate amount measuring means 13, the amount of the sublimate S deposited is measured, and the amount of the sublimate S contained in the sublimation gas E generated in the heat treatment chamber 110 is determined based on the measured value. presume.

上述のように、第１実施形態に係る昇華物測定装置１Ａは、熱処理室１１０内で発生した昇華ガスＥを、昇華ガスＥの温度が維持された状態で昇華ガス導入室３に導入できるので、昇華ガスＥが大気に曝されることを防止でき、つまり前記昇華ガスＥが大気によって冷却されて、昇華物測定装置１Ａの外部で昇華ガスＥから昇華物Ｓが析出することを防止できる。これに加え、前記昇華ガスＥは、昇華ガス導入室３内の中央領域Ｃ付近で昇華ガスＥよりも低温のガスＧと接触して冷却されるので、昇華物量測定手段１３によって測定するのに十分な量の昇華物Ｓを昇華ガス導入室３内で前記昇華ガスＥから安定して析出させることができる。その結果、昇華物量測定手段１３によって測定された昇華物量に基づき、熱処理室１１０内で発生した昇華ガスＥに含有される昇華物Ｓの量を正確に推定することが可能である。   As described above, the sublimate measurement apparatus 1A according to the first embodiment can introduce the sublimation gas E generated in the heat treatment chamber 110 into the sublimation gas introduction chamber 3 while maintaining the temperature of the sublimation gas E. The sublimation gas E can be prevented from being exposed to the atmosphere, that is, the sublimation gas E is cooled by the atmosphere, and the sublimation product S can be prevented from being deposited from the sublimation gas E outside the sublimation measurement apparatus 1A. In addition, the sublimation gas E is cooled in contact with the gas G having a temperature lower than that of the sublimation gas E in the vicinity of the central region C in the sublimation gas introduction chamber 3. A sufficient amount of the sublimate S can be stably deposited from the sublimation gas E in the sublimation gas introduction chamber 3. As a result, it is possible to accurately estimate the amount of sublimate S contained in the sublimation gas E generated in the heat treatment chamber 110 based on the sublimate amount measured by the sublimate amount measuring means 13.

また、昇華物測定装置１Ａにおいて、昇華ガス導入室３は、昇華物量測定手段１３とフランジ１５，１６によって連結されているが、このフランジ連結を解除することで、長時間の使用により昇華ガス導入室３の壁部３ａの内面に昇華物Ｓが付着し堆積した場合、汚れた昇華ガス導入室３を、新しい昇華ガス導入室３と交換することができるので、清掃作業に伴う時間のロスを回避することができる。   Further, in the sublimation measuring apparatus 1A, the sublimation gas introduction chamber 3 is connected by the sublimation amount measuring means 13 and the flanges 15 and 16, but by releasing this flange connection, the sublimation gas introduction is achieved after a long period of use. When the sublimation S adheres to and accumulates on the inner surface of the wall 3a of the chamber 3, the dirty sublimation gas introduction chamber 3 can be replaced with a new sublimation gas introduction chamber 3. It can be avoided.

（実施形態２）
図３は、本発明の第２実施形態に係る昇華物測定装置１Ｂの概略構成図であり、熱処理装置１００の熱処理室１１０に連通接続された状態を示している。なお、図１の昇華物測定装置１Ａと同一構成部分には、同一符号を付して、その説明を省略する。 (Embodiment 2)
FIG. 3 is a schematic configuration diagram of the sublimation product measuring apparatus 1B according to the second embodiment of the present invention, and shows a state in which the sublimate measuring apparatus 1B is connected to the heat treatment chamber 110 of the heat treatment apparatus 100. In addition, the same code | symbol is attached | subjected to the same component as the sublimation measuring apparatus 1A of FIG. 1, and the description is abbreviate | omitted.

この昇華物測定装置１Ｂでは、図１に示す昇華物測定装置１Ａで用いられる接続管７を省略し、代わりに、昇華ガス導入室３を熱処理室１１０に直接連通接続が可能なものとしており、昇華ガス導入室３を、その上流側部分が熱処理装置１００の熱処理室１１０内に位置するように熱処理装置１００に直接取り付けている。   In this sublimation measuring apparatus 1B, the connecting pipe 7 used in the sublimation measuring apparatus 1A shown in FIG. 1 is omitted, and instead, the sublimation gas introduction chamber 3 can be directly connected to the heat treatment chamber 110. The sublimation gas introduction chamber 3 is directly attached to the heat treatment apparatus 100 so that the upstream portion thereof is located in the heat treatment chamber 110 of the heat treatment apparatus 100.

熱処理装置１００の熱処理室１１０には、熱処理室１１０の断熱壁１１２を貫通する貫通部１１８が形成されており、この貫通部１１８は、昇華ガス導入室３における上流側部分の壁部３ａの形状に対応する形状を有している。この貫通部１１８に、昇華ガス導入室３の上流側部分が熱処理室１１０内に位置するように挿通される。前記貫通部１１８は、昇華ガス導入室３における上流側部分の壁部の形状が、例えば円筒状であれば、円形の貫通孔である。   In the heat treatment chamber 110 of the heat treatment apparatus 100, a through portion 118 penetrating the heat insulating wall 112 of the heat treatment chamber 110 is formed, and the through portion 118 has a shape of the wall portion 3a of the upstream portion in the sublimation gas introduction chamber 3. It has a shape corresponding to. The through portion 118 is inserted so that the upstream portion of the sublimation gas introduction chamber 3 is located in the heat treatment chamber 110. If the shape of the wall portion of the upstream portion in the sublimation gas introduction chamber 3 is, for example, a cylindrical shape, the through portion 118 is a circular through hole.

熱処理室１１０内に挿通された昇華ガス導入室３を熱処理室１１０に固定する方法として、例えば、昇華ガス導入室３における上流側部分の壁部３ａにフランジ２０を設け、ボルト２１を、フランジ２０に穿孔された貫通孔２０ａ（図４）に通し、フランジ２０の貫通孔２０ａに対応する位置で熱処理室１１０の断熱壁１１２に形成されたボルト孔１２０（図４）に螺入することにより、昇華ガス導入室３を熱処理装置１００に気密に固定する。   As a method for fixing the sublimation gas introduction chamber 3 inserted into the heat treatment chamber 110 to the heat treatment chamber 110, for example, a flange 20 is provided on the wall portion 3 a of the upstream portion in the sublimation gas introduction chamber 3, and the bolt 21 is connected to the flange 20. And threaded into a bolt hole 120 (FIG. 4) formed in the heat insulating wall 112 of the heat treatment chamber 110 at a position corresponding to the through hole 20a of the flange 20. The sublimation gas introduction chamber 3 is hermetically fixed to the heat treatment apparatus 100.

このように昇華ガス導入室３を熱処理室１１０に固定することで、昇華ガス導入室３は熱処理室１１０と連通可能な状態となる。昇華ガス導入室３における、熱処理室１１０内に位置する上流側部分の壁部３ａには、昇華ガス導入口３ｄが形成されており、この昇華ガス導入口３ｄを介して、熱処理室１１０内で発生した昇華ガスＥが昇華ガス導入室３内に導入される。   By fixing the sublimation gas introduction chamber 3 to the heat treatment chamber 110 in this way, the sublimation gas introduction chamber 3 can communicate with the heat treatment chamber 110. A sublimation gas introduction port 3d is formed in the upstream wall 3a of the sublimation gas introduction chamber 3 located in the heat treatment chamber 110, and the sublimation gas introduction port 3d is used in the heat treatment chamber 110. The generated sublimation gas E is introduced into the sublimation gas introduction chamber 3.

昇華物測定装置１Ｂのガス導入手段１０は、昇華ガス導入室３に連通接続されてガスＧを昇華ガス導入室３内に導入するガス導入管２３を有しており、このガス導入管２３は、昇華ガス導入室３の壁部３ａを貫通するとともに途中で折れ曲がって、昇華ガス導入室３内をガス流れの方向に延在している。このガス導入管２３のガス流出端部２４は、図４に示すように、熱処理室１１０から昇華ガス導入室３内に直接導入された昇華ガスＥの流れのほぼ中央に配置されており、ガス流出端部２４のガス流出口２４ａは、昇華ガス流れの方向に向いている。   The gas introduction means 10 of the sublimation measurement apparatus 1B has a gas introduction pipe 23 that is connected to the sublimation gas introduction chamber 3 and introduces the gas G into the sublimation gas introduction chamber 3. The gas passes through the wall 3a of the sublimation gas introduction chamber 3 and bends in the middle to extend in the gas flow direction in the sublimation gas introduction chamber 3. As shown in FIG. 4, the gas outflow end portion 24 of the gas introduction pipe 23 is arranged at the approximate center of the flow of the sublimation gas E introduced directly from the heat treatment chamber 110 into the sublimation gas introduction chamber 3. The gas outlet 24a of the outflow end 24 faces the direction of sublimation gas flow.

昇華ガス導入室３の下流側部分に設けられた昇華物導出部３ｂの昇華物導出口３ｃは、図４に示すように、ガス導入管２３のガス流出口２４ａからガスＧが流れる方向に延長した一点鎖線で示す線Ｌ上でガス流出口２４ａと対向するように配置されている。   As shown in FIG. 4, the sublimate outlet 3c of the sublimate outlet 3b provided in the downstream portion of the sublimation gas inlet chamber 3 extends in the direction in which the gas G flows from the gas outlet 24a of the gas inlet pipe 23. It arrange | positions so that the gas outflow port 24a may be opposed on the line L shown with the dashed-dotted line.

昇華物量測定手段１３の昇華物排出口１３ｃには、ガスＧによって運ばれる昇華物Ｓを捕集するフィルタ４８が設けられている。ガスＧのみがフィルタ４８を通過して外部に排出される。フィルタ４８によって捕集した昇華物Ｓの成分を分析できるので、昇華物量の測定結果と併用すれば、昇華ガス発生防止の対策をさらに向上することができる。フィルタ４８は省略してもよい。   A filter 48 for collecting the sublimate S carried by the gas G is provided at the sublimate discharge port 13 c of the sublimate amount measuring means 13. Only the gas G passes through the filter 48 and is discharged to the outside. Since the components of the sublimate S collected by the filter 48 can be analyzed, the countermeasure for preventing the generation of sublimation gas can be further improved by using it together with the measurement result of the amount of sublimation. The filter 48 may be omitted.

以下、図３および図４を参照して昇華物測定装置の動作を説明する。   Hereinafter, the operation of the sublimate measuring apparatus will be described with reference to FIGS. 3 and 4.

熱処理装置１００の熱処理室１１０内で被熱処理物Ｗを熱処理すると、被熱処理物Ｗから昇華ガスＥが発生する。熱処理室１１０内で高圧下にある昇華ガスＥは、昇華ガス導入口３ｄを介して昇華ガス導入室３内に２２０〜２３０℃の温度で直接流入する。   When the heat treatment object W is heat-treated in the heat treatment chamber 110 of the heat treatment apparatus 100, a sublimation gas E is generated from the heat treatment object W. The sublimation gas E under high pressure in the heat treatment chamber 110 flows directly into the sublimation gas introduction chamber 3 at a temperature of 220 to 230 ° C. via the sublimation gas introduction port 3d.

昇華ガス導入室３内に流入した昇華ガスＥは、昇華ガス導入室３内において、昇華ガス流れのほぼ中央に配置されたガス導入管２３のガス流出口２４ａから昇華ガス導入室３内に導入されたガスＧの周囲を流れながらガスＧと、前記線Ｌ上に位置する破線で示す接触領域Ｘにおいて接触して冷却される。このとき、昇華ガスＥは、昇華ガス流れのほぼ中央を流れるガスＧによって２２０〜２３０℃から１５０〜１８０℃にまで冷却され、その結果、主として昇華ガスＥの流路の中央付近で昇華物Ｓが析出する。析出した昇華物Ｓは、矢印で示すように、昇華ガスＥのほぼ中央を流れるガスＧの流れに乗り、昇華物／ガス流れとなって、ガス導入管２３のガス流出口２４ａに対して対向配置された昇華物導出口３ｃを介して昇華物量測定手段１３の昇華物流路１７に運ばれる。そして、昇華物量測定手段１３の測定部１８において、析出した昇華物Ｓの量が測定され、その測定値に基づき、熱処理室１１０内で発生した昇華ガスＥに含有される昇華物Ｓの量を推定する。   The sublimation gas E that has flowed into the sublimation gas introduction chamber 3 is introduced into the sublimation gas introduction chamber 3 from the gas outlet 24a of the gas introduction pipe 23 disposed in the sublimation gas flow in the sublimation gas introduction chamber 3. The gas G is cooled in contact with the gas G in a contact region X indicated by a broken line located on the line L while flowing around the gas G. At this time, the sublimation gas E is cooled from 220 to 230 ° C. to 150 to 180 ° C. by the gas G flowing almost in the center of the sublimation gas flow, and as a result, the sublimate S mainly near the center of the flow path of the sublimation gas E. Precipitates. The deposited sublimate S rides on the flow of the gas G flowing almost in the center of the sublimation gas E as indicated by the arrow, becomes a sublimate / gas flow, and faces the gas outlet 24a of the gas introduction pipe 23. It is carried to the sublimate flow path 17 of the sublimate quantity measuring means 13 through the arranged sublimate outlet 3c. Then, in the measurement unit 18 of the sublimate amount measuring means 13, the amount of the sublimate S deposited is measured, and the amount of the sublimate S contained in the sublimation gas E generated in the heat treatment chamber 110 is determined based on the measured value. presume.

ガス導入管２３、または少なくともガス導入管２３における昇華ガス導入室３内に延在する部分は、保温部材２６、例えば断熱材で被覆されている。ガス導入管２３は、昇華ガスＥよりも低温のガスＧが流れるため、昇華ガスＥが、ガス導入管２３から流出したガスＧと接触して冷却される前に、ガス導入管２３自体に接触して冷却され、析出した昇華物Ｓがガス導入管２３に付着するおそれがあるが、保温部材２６をガス導入管２３に被覆することで、昇華物Ｓの付着を防止できる。   The gas introduction pipe 23 or at least a portion of the gas introduction pipe 23 that extends into the sublimation gas introduction chamber 3 is covered with a heat insulating member 26, for example, a heat insulating material. Since the gas G having a temperature lower than that of the sublimation gas E flows through the gas introduction pipe 23, the sublimation gas E contacts the gas introduction pipe 23 itself before being cooled by contact with the gas G flowing out of the gas introduction pipe 23. Then, the sublimated material S that has been cooled and deposited may adhere to the gas introduction tube 23, but by covering the heat introduction member 26 with the gas introduction tube 23, the adhesion of the sublimation product S can be prevented.

この第２実施形態において、ガスＧが昇華ガス流れのほぼ中央を流れるとは、昇華ガス導入室３が、例えば円形断面を有する円筒状の管状部材からなるものである場合、管状部材の一端（上流側）から他端（下流側）にかけて延びる軸心上に、ガス導入管２３のガス流出口２４ａを配置し、そのガス流出口２４ａから流出したガスＧが前記軸心に沿って流れ、そのガス流れの周囲を昇華ガスＥが前記一端から他端に向かって流れるように設定された構成のことをいう。この場合、前記軸心は前記線Ｌに合致する。言うまでもないが、昇華ガス導入室３の形状、特に昇華ガス導入室３の空間の形状は、ガスが昇華ガス流れのほぼ中央を流れることが可能な形状とされている限り、特に限定されない。   In the second embodiment, the fact that the gas G flows substantially in the center of the sublimation gas flow means that when the sublimation gas introduction chamber 3 is made of a cylindrical tubular member having a circular cross section, for example, one end of the tubular member ( A gas outlet 24a of the gas introduction pipe 23 is disposed on an axis extending from the upstream side to the other end (downstream side), and the gas G flowing out from the gas outlet 24a flows along the axis. A configuration in which the sublimation gas E is set to flow from one end to the other end around the gas flow. In this case, the axis coincides with the line L. Needless to say, the shape of the sublimation gas introduction chamber 3, particularly the shape of the space of the sublimation gas introduction chamber 3, is not particularly limited as long as the gas can flow almost in the center of the sublimation gas flow.

上述のように、第２実施形態に係る昇華物測定装置１Ｂは、第１実施形態に係る昇華物測定装置１Ａにおいて用いられている接続管７を省略し、昇華ガス導入室３を熱処理室１１０に直接連通接続しているので、昇華ガスＥを大気に曝すことなく温度維持された状態で熱処理室１１０から昇華ガス導入室３内に直接導入することができると共に、昇華物測定装置１Ｂの構成を簡略化できる。   As described above, the sublimation product measuring apparatus 1B according to the second embodiment omits the connection pipe 7 used in the sublimated product measurement apparatus 1A according to the first embodiment, and the sublimation gas introduction chamber 3 is replaced with the heat treatment chamber 110. Since the sublimation gas E can be directly introduced from the heat treatment chamber 110 into the sublimation gas introduction chamber 3 without being exposed to the atmosphere, and the configuration of the sublimation measurement apparatus 1B. Can be simplified.

また、昇華物測定装置１Ｂでは、ガス導入管２３のガス流出口２４ａから流出したガスＧが、昇華ガスＥの流れの方向に沿って昇華ガス流れのほぼ中央を流れるように設定されているので、昇華ガスＥを効率良く冷却して十分な昇華物析出量を安定して得ることができる。   Further, in the sublimation product measuring apparatus 1B, the gas G flowing out from the gas outlet 24a of the gas introduction pipe 23 is set to flow almost in the center of the sublimation gas flow along the flow direction of the sublimation gas E. The sublimation gas E can be efficiently cooled to obtain a sufficient sublimate precipitation amount.

さらに、昇華物測定装置１Ｂでは、ガス導入管２３のガス流出口２４ａと昇華ガス導入室３の昇華物導出口３ｃとを同一の線Ｌ上で対向配置しているので、冷却された昇華ガスＥから析出した昇華物Ｓを、ガスＧの流れに乗せて昇華物導出口３ｃに向かって円滑に流すことができる。このため、昇華物Ｓは、昇華ガス導入室３内に滞留し難くなるので、昇華物導出口３ｃを介して昇華物量測定手段１３に運ばれる。その結果、昇華物量測定手段１３により昇華物量を正確に測定できるので、熱処理室１１０内の昇華物量の正確な推定が可能となる。その他の構成、作用、効果は第１実施形態と同じである。   Further, in the sublimation measuring apparatus 1B, the gas outlet 24a of the gas introduction pipe 23 and the sublimation outlet 3c of the sublimation gas introduction chamber 3 are disposed opposite to each other on the same line L. The sublimate S deposited from E can be flowed smoothly toward the sublimate outlet 3c on the gas G flow. For this reason, the sublimation product S is less likely to stay in the sublimation gas introduction chamber 3, and is therefore carried to the sublimation product amount measuring means 13 via the sublimation product outlet 3c. As a result, the amount of sublimation can be accurately measured by the sublimation amount measuring means 13, so that the amount of sublimation in the heat treatment chamber 110 can be accurately estimated. Other configurations, operations, and effects are the same as those in the first embodiment.

（実施形態３）
図５は、本発明の第３実施形態に係る昇華物測定装置１Ｃの概略構成図であり、熱処理装置１００の熱処理室１１０に連通接続された状態を示している。なお、図１の第１実施形態に係る昇華物測定装置１Ａと同一構成部分には、同一符号を付して、その説明を省略する。 (Embodiment 3)
FIG. 5 is a schematic configuration diagram of a sublimation product measuring apparatus 1 </ b> C according to the third embodiment of the present invention, and shows a state in which it is connected to the heat treatment chamber 110 of the heat treatment apparatus 100. In addition, the same code | symbol is attached | subjected to the same component as 1 A of sublimation object measuring apparatuses which concern on 1st Embodiment of FIG. 1, and the description is abbreviate | omitted.

昇華物測定装置１Ｃは、昇華ガス導入室３における上流側部分に、ガス導入手段１０に連通接続された送ガス管１２を有している。この送ガス管１２を介して、ガス導入手段１０からのガスＧが昇華ガス導入室３内に導入され、昇華ガス導入室３内において上流側から下流側に向かって流れる。   The sublimate measuring apparatus 1 </ b> C has a gas feed pipe 12 connected to the gas introduction means 10 in the upstream portion of the sublimation gas introduction chamber 3. The gas G from the gas introduction means 10 is introduced into the sublimation gas introduction chamber 3 through the gas feed pipe 12 and flows from the upstream side to the downstream side in the sublimation gas introduction chamber 3.

また、昇華物測定装置１Ｃは、昇華ガス導入室３に連通接続される一方、昇華ガスＥを熱処理室１１０から昇華ガス導入室３内に導入可能な昇華ガス導入管２８を有している。この昇華ガス導入管２８は、熱処理室１１０から昇華ガスＥが導入される昇華ガス導入端部２９を有しており、昇華ガス導入端部２９の昇華ガス導入口２９ａには、連結用フランジ３２が設けられている。この昇華ガス導入管２８の連結用フランジ３２と、熱処理室１１０の昇華ガス導出管１１４の連結用フランジ１１６とを、ボルトおよびナット等の締結手段で連結すると、昇華ガス導入管２８が熱処理室１１０に連通接続される。このように、昇華ガス導入管２８と熱処理室１１０とが連通接続されることで、熱処理室１１０内で発生した昇華ガスＥが昇華ガス導入管２８を通って昇華ガス導入室３内に導入可能となる。   The sublimate measuring apparatus 1 </ b> C has a sublimation gas introduction pipe 28 that can be connected to the sublimation gas introduction chamber 3 and can introduce the sublimation gas E from the heat treatment chamber 110 into the sublimation gas introduction chamber 3. The sublimation gas introduction pipe 28 has a sublimation gas introduction end 29 into which the sublimation gas E is introduced from the heat treatment chamber 110, and the sublimation gas introduction port 29 a of the sublimation gas introduction end 29 has a connecting flange 32. Is provided. When the connecting flange 32 of the sublimation gas introduction pipe 28 and the connection flange 116 of the sublimation gas outlet pipe 114 of the heat treatment chamber 110 are connected by fastening means such as bolts and nuts, the sublimation gas introduction pipe 28 is connected to the heat treatment chamber 110. It is connected in communication. In this way, the sublimation gas introduction pipe 28 and the heat treatment chamber 110 are connected in communication, so that the sublimation gas E generated in the heat treatment chamber 110 can be introduced into the sublimation gas introduction chamber 3 through the sublimation gas introduction pipe 28. It becomes.

昇華ガス導入管２８は、昇華ガス導入端部２９に加え、昇華ガス導入室３の壁部３ａを貫通して昇華ガス導入室３内に延在する昇華ガス導出端部３０を有しており、この昇華ガス導出端部３０には、昇華ガスＥが昇華ガス導入室３内に導入される昇華ガス導出口３０ａが形成されている。   In addition to the sublimation gas introduction end 29, the sublimation gas introduction pipe 28 has a sublimation gas outlet end 30 extending through the wall 3 a of the sublimation gas introduction chamber 3 into the sublimation gas introduction chamber 3. The sublimation gas outlet end 30 is formed with a sublimation gas outlet 30 a through which the sublimation gas E is introduced into the sublimation gas introduction chamber 3.

昇華ガス導入管２８の昇華ガス導出端部３０は、図６に示すように、ガス導入手段１０によって送ガス管１２を介して昇華ガス導入室３内に導入されて上流側から下流側に向かって流れるガスＧの流れのほぼ中央に配置されており、昇華ガス導出端部３０の昇華ガス導出口３０ａは、ガス流れの方向に向いている。   As shown in FIG. 6, the sublimation gas outlet end 30 of the sublimation gas introduction pipe 28 is introduced into the sublimation gas introduction chamber 3 by the gas introduction means 10 through the gas feed pipe 12 and moves from the upstream side toward the downstream side. The sublimation gas outlet 30a of the sublimation gas outlet end 30 faces the direction of the gas flow.

昇華ガス導入室３の下流側部分に設けられた昇華物導出部３ｂの昇華物導出口３ｃは、図６に示すように、昇華ガス導入管２８の昇華ガス導出口３０ａから昇華ガスＥが流れる方向に延長した線Ｒ上で昇華ガス導出口３０ａと対向するように配置されている。   As shown in FIG. 6, the sublimation gas E flows from the sublimation gas outlet 30a of the sublimation gas inlet pipe 28 through the sublimate outlet 3c of the sublimate outlet 3b provided in the downstream portion of the sublimation gas inlet chamber 3. It arrange | positions so that the sublimation gas outlet 30a may be opposed on the line R extended in the direction.

以下、図５および図６を参照して昇華物測定装置の動作を説明する。   Hereinafter, the operation of the sublimate measuring apparatus will be described with reference to FIGS. 5 and 6.

昇華ガス導入室３内に流入した昇華ガスＥは、ガス導入手段１０により送ガス管１２を介して昇華ガス導入室３内に導入された矢印で示すガスＧの流れのほぼ中央を流れながら、前記線Ｒ上に位置する破線で示す接触領域ＹにおいてガスＧと接触して冷却される。これにより、主としてガスＧの流れの中央で昇華ガスＥから昇華物Ｓが析出する。このため、昇華ガス導入室３の壁部３ａの内面に昇華物Ｓが付着し難い。   The sublimation gas E that has flowed into the sublimation gas introduction chamber 3 flows almost through the center of the flow of the gas G indicated by the arrow introduced into the sublimation gas introduction chamber 3 by the gas introduction means 10 via the gas feed pipe 12. In the contact region Y indicated by the broken line located on the line R, the gas G contacts the gas G and is cooled. Thereby, the sublimate S is deposited from the sublimation gas E mainly in the center of the flow of the gas G. For this reason, the sublimate S hardly adheres to the inner surface of the wall 3a of the sublimation gas introduction chamber 3.

析出した昇華物Ｓは、矢印で示すように、昇華ガスＥの周囲を流れるガスＧの流れに乗り、昇華物／ガス流れとなって、昇華ガス導入管２８の昇華ガス導出口３０ａに対して対向配置された昇華物導出口３ｃを介して昇華物量測定手段１３の昇華物流路１７に運ばれる。そして、昇華物量測定手段１３の測定部１８において、析出した昇華物Ｓの量が測定され、その測定値に基づき、熱処理室１１０内で発生した昇華ガスＥに含有される昇華物Ｓの量を推定する。   The deposited sublimate S, as indicated by the arrow, rides on the flow of gas G flowing around the sublimation gas E, becomes a sublimate / gas flow, and flows into the sublimation gas outlet 30a of the sublimation gas introduction pipe 28. It is conveyed to the sublimation substance flow path 17 of the sublimation substance amount measuring means 13 through the sublimation substance outlet 3c arranged oppositely. Then, in the measurement unit 18 of the sublimate amount measuring means 13, the amount of the sublimate S deposited is measured, and the amount of the sublimate S contained in the sublimation gas E generated in the heat treatment chamber 110 is determined based on the measured value. presume.

第３実施形態において、昇華ガス導入管２８は、図６に示すように、例えば断熱材３１で被覆されている。ガスＧは、昇華ガス導入室３内において、昇華ガスＥが流れる昇華ガス導入管２８と接触しながら流れるので、昇華ガス導入管２８内を流れる昇華ガスＥが昇華ガス導入管２８を通して冷却され、析出した昇華物Ｓが、昇華ガス導入管２８における昇華ガス導入室３内に延在する部分の内部で付着するおそれがあるが、断熱材３１を昇華ガス導入管２８に被覆することで、昇華物Ｓの析出および付着を防止できる。   In the third embodiment, the sublimation gas introduction pipe 28 is covered with, for example, a heat insulating material 31 as shown in FIG. Since the gas G flows in contact with the sublimation gas introduction pipe 28 through which the sublimation gas E flows in the sublimation gas introduction chamber 3, the sublimation gas E flowing through the sublimation gas introduction pipe 28 is cooled through the sublimation gas introduction pipe 28. The deposited sublimate S may adhere inside the portion of the sublimation gas introduction pipe 28 that extends into the sublimation gas introduction chamber 3, but the sublimation gas introduction pipe 28 is covered with the heat insulating material 31 to sublimate. Precipitation and adhesion of the object S can be prevented.

また、昇華ガス導入管２８における昇華ガス導入室３外に延在する部分も、断熱材３１で被覆されているので、昇華ガスＥは、大気によって冷却されることなく、したがって、昇華ガスＥから昇華物Ｓが析出して付着することなく、昇華ガス導入室３内に導入される。断熱材３１の代わりに、昇華ガス導入管２８における昇華ガス導入室３外に延在する部分には、ヒータをその周囲に配置してもよい。   Further, the portion of the sublimation gas introduction pipe 28 that extends outside the sublimation gas introduction chamber 3 is also covered with the heat insulating material 31, so that the sublimation gas E is not cooled by the atmosphere, and therefore, from the sublimation gas E. The sublimate S is introduced into the sublimation gas introduction chamber 3 without depositing and adhering. Instead of the heat insulating material 31, a heater may be disposed around the sublimation gas introduction pipe 28 that extends outside the sublimation gas introduction chamber 3.

第３実施形態において、昇華ガスＥがガス流れのほぼ中央を流れるとは、昇華ガス導入室３が、例えば円形断面を有する円筒状の管状部材からなるものである場合、昇華ガス導入管２８を、管状部材の周壁を貫通して昇華ガス導入室３内に延在させ、昇華ガス導入管２８の昇華ガス導出口３０ａを、管状部材の一端（上流側）から他端（下流側）にかけて延びる軸心上に配置し、その昇華ガス導出口３０ａから流出した昇華ガスＥが前記軸心に沿って流れ、その昇華ガス流れの周囲をガスＧが前記一端から他端に向かって流れるように設定された構成のことをいう。この場合、前記軸心は前記線Ｒに合致する。言うまでもないが、昇華ガス導入室３の形状、特に昇華ガス導入室３の空間の形状は、昇華ガスがガス流れのほぼ中央を流れることが可能な形状とされている限り、特に限定されない。   In the third embodiment, the fact that the sublimation gas E flows substantially in the center of the gas flow means that when the sublimation gas introduction chamber 3 is made of, for example, a cylindrical tubular member having a circular cross section, the sublimation gas introduction pipe 28 is provided. The tubular member extends through the peripheral wall into the sublimation gas introduction chamber 3, and the sublimation gas outlet 30a of the sublimation gas introduction pipe 28 extends from one end (upstream side) to the other end (downstream side) of the tubular member. The sublimation gas E which is arranged on the axis and flows out of the sublimation gas outlet 30a flows along the axis, and the gas G flows around the sublimation gas flow from one end to the other end. Refers to the configured structure. In this case, the axis coincides with the line R. Needless to say, the shape of the sublimation gas introduction chamber 3, particularly the shape of the space of the sublimation gas introduction chamber 3, is not particularly limited as long as the sublimation gas can flow almost in the center of the gas flow.

上述のように、第３実施形態に係る昇華物測定装置１Ｃでは、昇華ガス導入管２８の昇華ガス導出口３０ａから導出された昇華ガスＥは、ガス流れの方向に沿ってガス流れのほぼ中央を流れるように設定されているので、昇華ガスＥを効率良く冷却して十分な昇華物析出量を安定して得ることができる。このため、昇華物量測定手段１３により昇華物量を正確に測定できるので、熱処理室１１０内の昇華物量の正確な推定が可能となる。また、析出した昇華物Ｓは、昇華ガスＥの周囲を流れるガスＧの流れに遮られて昇華ガス導入室３の壁部３ａの内面に付着し難くなる。   As described above, in the sublimate measuring device 1C according to the third embodiment, the sublimation gas E led out from the sublimation gas outlet 30a of the sublimation gas introduction pipe 28 is substantially at the center of the gas flow along the gas flow direction. Therefore, the sublimation gas E can be efficiently cooled to obtain a sufficient sublimate precipitation amount. For this reason, the amount of sublimation can be accurately measured by the sublimation amount measuring means 13, so that the amount of sublimation in the heat treatment chamber 110 can be accurately estimated. Further, the deposited sublimate S is blocked by the flow of the gas G flowing around the sublimation gas E, and is difficult to adhere to the inner surface of the wall 3 a of the sublimation gas introduction chamber 3.

また、昇華ガス導出管２８の昇華ガス導出口３０ａと昇華物導出口３ｃとを同一の線Ｒ上で対向配置しているので、冷却された昇華ガスＥから析出した昇華物Ｓは、ガス流れに乗って昇華物導出口３ｃに向かって流れ易くなる。このため、昇華物Ｓは、昇華ガス導入室３内に滞留し難くなるので、昇華物導出口３ｃを介して昇華物量測定手段１３に運ばれる。その結果、昇華物量測定手段１３により昇華物量を正確に測定できるので、熱処理室１１０内の昇華物量の正確な推定が可能となる。   Further, since the sublimation gas outlet 30a and the sublimate outlet 3c of the sublimation gas outlet pipe 28 are arranged opposite to each other on the same line R, the sublimate S deposited from the cooled sublimation gas E is a gas flow. And easily flows toward the sublimate outlet 3c. For this reason, the sublimation product S is less likely to stay in the sublimation gas introduction chamber 3, and is therefore carried to the sublimation product amount measuring means 13 via the sublimation product outlet 3c. As a result, the amount of sublimation can be accurately measured by the sublimation amount measuring means 13, so that the amount of sublimation in the heat treatment chamber 110 can be accurately estimated.

（実施形態４）
第１〜第３実施形態で採用しているパーティクルカウンタに代えて、昇華物Ｓを透過した光の減衰量に基づき昇華物量を測定することもできる。図７は、その一例を示す昇華物量測定手段１３の測定部１８の概略構成図である。昇華物量測定手段１３の測定部１８は、図示しない光源からの光Ｆを昇華物流路１７に投光する投光素子３３と、昇華物流路１７を流れる昇華物Ｓを前記光Ｆで照射するための照射エリア部３５と、投光素子３３から照射エリア部３５に投光された光Ｆを受光する受光素子３７とを有している。 (Embodiment 4)
Instead of the particle counter employed in the first to third embodiments, the amount of sublimation can be measured based on the attenuation of light transmitted through the sublimation S. FIG. 7 is a schematic configuration diagram of the measuring unit 18 of the sublimation amount measuring means 13 showing an example thereof. The measurement unit 18 of the sublimation amount measuring means 13 irradiates the light F from a light source (not shown) to the sublimation channel 17 and the sublimation S flowing through the sublimation channel 17 with the light F. , And a light receiving element 37 that receives the light F projected from the light projecting element 33 onto the irradiation area 35.

以下に、測定方法を説明する。まず、測定部１８の投光素子３３から昇華物流路１７に対して光Ｆを照射する。昇華物Ｓが照射エリア部３５において光Ｆの光路を横切ると、光Ｆは、その一部が昇華物Ｓによって吸収されたり、昇華物Ｓ上で反射されるが、昇華物Ｓを透過した光Ｔ、つまり減衰された光Ｔは受光素子３７によって検知される。つづいて、受光素子３７に接続された図示しない処理回路等によって、検出された透過光Ｔの強度に応じた電気信号が出力され、光Ｔの減衰量に基づき昇華物Ｓの濃度が決定される。この測定方法によれば、昇華物Ｓの粒子数をカウントしなくても昇華物Ｓによって減衰された光Ｔの量を測定するのみで、熱処理室１１０内の昇華物量を容易に推定できる。   The measurement method will be described below. First, the light F is irradiated from the light projecting element 33 of the measuring unit 18 to the sublimate flow path 17. When the sublimation S crosses the optical path of the light F in the irradiation area 35, the light F is partially absorbed by the sublimation S or reflected on the sublimation S, but the light transmitted through the sublimation S. T, that is, the attenuated light T is detected by the light receiving element 37. Subsequently, an electric signal corresponding to the detected intensity of the transmitted light T is output by a processing circuit (not shown) connected to the light receiving element 37, and the concentration of the sublimation S is determined based on the attenuation amount of the light T. . According to this measurement method, the amount of sublimation in the heat treatment chamber 110 can be easily estimated only by measuring the amount of light T attenuated by the sublimation S without counting the number of particles of the sublimation S.

また、図７に示す測定方法の変形例として、反射ミラーを照射エリア部３５に設け、投光素子３３によって照射エリア部３５に投光された光Ｆを反射ミラーで反射させ、反射した光を受光素子３７によって受光する構成としてもよい。反射ミラーを用いれば、照射エリア部３５において光Ｆは昇華物Ｓによって２度減衰されるので、光Ｆの減衰量を大きくできる。これにより、昇華物量を正確に測定できる。この構成は、特に昇華物Ｓの濃度が低い場合に有利である。   As a modification of the measurement method shown in FIG. 7, a reflection mirror is provided in the irradiation area part 35, the light F projected on the irradiation area part 35 by the light projecting element 33 is reflected by the reflection mirror, and the reflected light is reflected. The light receiving element 37 may receive light. If the reflection mirror is used, the light F is attenuated twice by the sublimation S in the irradiation area 35, so that the attenuation amount of the light F can be increased. Thereby, the amount of sublimation can be measured accurately. This configuration is particularly advantageous when the concentration of the sublimate S is low.

（実施形態５）
第１〜第３実施形態の昇華物測定装置１Ａ〜１Ｃは、上述した構成に加え、昇華ガスＥを、昇華ガス導入室３内においてガス導入手段１０からのガスＧと効率良く接触させて冷却するために、図８に示すように、昇華ガス導入室３の壁部３ａの上流側に整流部材３９を備えていてもよい。この整流部材３９は、例えば、図３の第２実施形態に係る昇華物測定装置１Ｂの昇華ガス導入室３の壁部３ａの上流側に取り付けられる。整流部材３９は、図４に示す前記線Ｌと平行に、かつ互いに所定の間隔をあけて配置された複数の整流板４１を有している。 (Embodiment 5)
In addition to the above-described configuration, the sublimate measurement apparatuses 1A to 1C of the first to third embodiments efficiently cool the sublimation gas E in contact with the gas G from the gas introduction means 10 in the sublimation gas introduction chamber 3. Therefore, as shown in FIG. 8, a rectifying member 39 may be provided on the upstream side of the wall 3 a of the sublimation gas introduction chamber 3. This rectifying member 39 is attached, for example, on the upstream side of the wall 3a of the sublimation gas introduction chamber 3 of the sublimation product measuring apparatus 1B according to the second embodiment of FIG. The rectifying member 39 has a plurality of rectifying plates 41 arranged in parallel to the line L shown in FIG.

熱処理室１１０内で発生した昇華ガスＥは、整流部材３９の流入口３９ａから整流部材３９内に流入し、矢印Ｍで示すように、整流板４１によって前記線Ｌに対して平行に流れるように整流される。整流となった昇華ガスＥの流れＭは、流出口３９ｂから昇華ガス導入室３の昇華ガス導入口３ｄを介して昇華ガス導入室３内に流入し、ガス導入手段１０からのガスＧの流れと効率良く接触して冷却される。これにより、昇華ガス導入室３内での昇華物析出量が安定するため、熱処理室１１０内の昇華物量の推定を昇華物量測定手段１３によってさらに正確に行うことができる。また、整流部材３９を用いる場合、昇華ガス導入室３の断面形状を、整流部材３９の流出口３９ｂの断面形状とほぼ同一とするのがよい。これにより、整流された昇華ガスＭは昇華ガス導入室３内を円滑に流れ、昇華物Ｓが昇華ガス導入室３内で滞留し難くなる。   The sublimation gas E generated in the heat treatment chamber 110 flows into the rectifying member 39 from the inlet 39a of the rectifying member 39 and flows parallel to the line L by the rectifying plate 41 as indicated by an arrow M. Rectified. The flow M of the sublimation gas E which has been rectified flows into the sublimation gas introduction chamber 3 from the outlet 39b through the sublimation gas introduction port 3d of the sublimation gas introduction chamber 3, and the flow of the gas G from the gas introduction means 10 And cool efficiently. Thereby, since the sublimate deposit amount in the sublimation gas introduction chamber 3 is stabilized, the sublimate amount in the heat treatment chamber 110 can be estimated more accurately by the sublimate amount measuring means 13. When the rectifying member 39 is used, the cross-sectional shape of the sublimation gas introduction chamber 3 is preferably substantially the same as the cross-sectional shape of the outlet 39 b of the rectifying member 39. As a result, the rectified sublimation gas M smoothly flows in the sublimation gas introduction chamber 3, and the sublimate S does not easily stay in the sublimation gas introduction chamber 3.

（実施形態６）
第１〜第３実施形態において、昇華物量測定手段１３は、その昇華物流路１７に着脱自在な透明管４５が挿入される構成としてもよい。図９は、昇華物流路１７に透明管４５を昇華物排出口１３ｃ側から挿入した状態を示している。昇華物Ｓが流れる昇華物流路１７に透明管４５を挿入することで、昇華物Ｓが昇華物流路１７に付着して堆積することが防止できると共に、長時間の使用により透明管４５の内壁面４５ａに昇華物Ｓが付着して堆積した場合、汚れた透明管４５を、新しい透明管４５と交換することができるので、清掃作業に伴う時間のロスを回避することができる。しかも、透明な管を用いているので、昇華物Ｓを測定するために昇華物流路１７に照射される光Ｆを遮ることはないので、昇華物量の測定を支障なく行うことができる。この透明管４５は、例えばガラス管である。 (Embodiment 6)
In the first to third embodiments, the sublimate amount measuring means 13 may be configured such that a detachable transparent tube 45 is inserted into the sublimate flow path 17. FIG. 9 shows a state where the transparent tube 45 is inserted into the sublimate flow path 17 from the sublimate discharge port 13c side. By inserting the transparent tube 45 into the sublimate channel 17 through which the sublimate S flows, the sublimate S can be prevented from adhering to and deposited on the sublimate channel 17 and the inner wall surface of the transparent tube 45 can be used for a long time. When the sublimate S adheres and accumulates on 45a, the dirty transparent tube 45 can be replaced with a new transparent tube 45, so that time loss associated with the cleaning operation can be avoided. In addition, since a transparent tube is used, the light F irradiated to the sublimate flow path 17 in order to measure the sublimate S is not blocked, so that the amount of sublimate can be measured without any trouble. The transparent tube 45 is, for example, a glass tube.

本発明の第１実施形態に係る昇華物測定装置の概略構成図である。It is a schematic block diagram of the sublimate measuring apparatus which concerns on 1st Embodiment of this invention. 図１の昇華物測定装置の昇華ガス導入室の拡大図であり、昇華ガスが冷却されて昇華物が析出する状態を示している。FIG. 2 is an enlarged view of a sublimation gas introduction chamber of the sublimate measurement apparatus of FIG. 1, showing a state in which the sublimation product is precipitated by cooling the sublimation gas. 本発明の第２実施形態に係る昇華物測定装置の概略構成図である。It is a schematic block diagram of the sublimate measuring apparatus which concerns on 2nd Embodiment of this invention. 図２の昇華物測定装置の昇華ガス導入室の拡大図であり、昇華ガスが冷却されて昇華物が析出する状態を示している。FIG. 3 is an enlarged view of a sublimation gas introduction chamber of the sublimate measurement apparatus in FIG. 2, showing a state where the sublimation gas is cooled and the sublimate is deposited. 本発明の第３実施形態に係る昇華物測定装置の概略構成図である。It is a schematic block diagram of the sublimate measuring apparatus which concerns on 3rd Embodiment of this invention. 図３の昇華物測定装置の昇華ガス導入室の拡大図であり、昇華ガスが冷却されて昇華物が析出する状態を示している。FIG. 4 is an enlarged view of a sublimation gas introduction chamber of the sublimate measurement apparatus of FIG. 3, showing a state where the sublimation gas is cooled and the sublimate is deposited. 本発明に係る昇華物測定装置の昇華物量測定手段の測定部の一例を示す概略構成図である。It is a schematic block diagram which shows an example of the measurement part of the sublimate amount measuring means of the sublimate measuring apparatus which concerns on this invention. 本発明に係る昇華物測定装置の昇華ガス導入室に整流部材を取り付けた構成を示す概略図である。It is the schematic which shows the structure which attached the rectification | straightening member to the sublimation gas introduction chamber of the sublimate measuring apparatus which concerns on this invention. 本発明に係る昇華物測定装置の昇華物量測定手段の昇華物流路に透明管を挿入した構成を示す概略図である。It is the schematic which shows the structure which inserted the transparent tube in the sublimate flow path of the sublimate amount measuring means of the sublimate measuring apparatus which concerns on this invention.

符号の説明Explanation of symbols

１Ａ〜１Ｃ 昇華物測定装置
３ 昇華ガス導入室
７ 接続管
１０ ガス導入手段
１１ 送ガス管
１３ 昇華物量測定手段
１００ 熱処理装置
１１０ 熱処理室
Ｅ 昇華ガス
Ｇ ガス
Ｓ 昇華物 1A to 1C Sublimation measurement apparatus 3 Sublimation gas introduction chamber 7 Connection pipe 10 Gas introduction means 11 Gas supply pipe 13 Sublimation amount measurement means 100 Heat treatment apparatus 110 Heat treatment room E Sublimation gas G Gas S Sublimation

Claims (17)

熱処理室内に収容された被熱処理物を熱処理する際に前記被熱処理物から発生する昇華ガスに含まれる昇華物の量を測定する昇華物測定装置であって、
前記熱処理室内で発生した前記昇華ガスの温度が維持された状態で前記昇華ガスを導入可能な昇華ガス導入室と、
前記昇華ガス導入室内で前記昇華ガスから昇華物が析出するように、前記昇華ガス導入室内に前記昇華ガスよりも低温のガスを導入するガス導入手段と、
前記昇華ガス導入室の下流側に設けられて、前記析出した昇華物の量を測定する昇華物量測定手段と、
を備えた昇華物測定装置。 A sublimation measuring device for measuring the amount of sublimation contained in a sublimation gas generated from the heat treated material when heat treating the material to be treated contained in the heat treatment chamber,
A sublimation gas introduction chamber capable of introducing the sublimation gas in a state where the temperature of the sublimation gas generated in the heat treatment chamber is maintained;
A gas introduction means for introducing a gas having a temperature lower than that of the sublimation gas into the sublimation gas introduction chamber so that a sublimate is precipitated from the sublimation gas in the sublimation gas introduction chamber;
A sublimate amount measuring means provided on the downstream side of the sublimation gas introduction chamber and measuring the amount of the deposited sublimate;
Sublimation measuring device equipped with. 請求項１において、さらに、前記昇華ガス導入室に連通接続される一方、前記熱処理室内の前記昇華ガスを前記昇華ガス導入室内に導入可能な接続管と、
前記昇華ガスから前記昇華物が前記接続管内で析出しないように前記接続管を保温する接続管保温手段と、
を備えた昇華物測定装置。 In claim 1, further connected to the sublimation gas introduction chamber, while the connection pipe capable of introducing the sublimation gas in the heat treatment chamber into the sublimation gas introduction chamber,
Connection pipe heat retaining means for keeping the connection pipe warm so that the sublimate from the sublimation gas does not precipitate in the connection pipe;
Sublimation measuring device equipped with. 請求項１において、前記昇華ガス導入室が前記熱処理室に直接連通接続されている昇華物測定装置。   2. The sublimate measuring device according to claim 1, wherein the sublimation gas introduction chamber is directly connected to the heat treatment chamber. 請求項１〜３のいずれか一項において、前記ガス導入手段は、前記昇華ガス導入室に連通接続されたガス導入管を有しており、このガス導入管は、前記熱処理室から前記昇華ガス導入室内に導入された前記昇華ガスの流れのほぼ中央に配置されて前記昇華ガス流れの方向に向くガス流出口を有している昇華物測定装置。   4. The gas introduction unit according to claim 1, wherein the gas introduction unit includes a gas introduction pipe connected to the sublimation gas introduction chamber, and the gas introduction pipe is connected to the sublimation gas from the heat treatment chamber. A sublimate measuring device having a gas outlet arranged substantially in the center of the flow of the sublimation gas introduced into the introduction chamber and directed in the direction of the sublimation gas flow. 請求項４において、前記昇華ガス導入室は、前記昇華物を前記昇華ガス導入室から前記昇華物量測定手段へ導出する昇華物導出口を有しており、この昇華物導出口は、前記ガス導入管の前記ガス流出口から前記ガスが流れる方向に延長した線上で前記ガス流出口と対向するように位置している昇華物測定装置。   5. The sublimation gas introduction chamber according to claim 4, wherein the sublimation gas introduction chamber has a sublimation material outlet through which the sublimate is led out from the sublimation gas introduction chamber to the sublimate amount measuring means. A sublimate measuring device located so as to face the gas outlet on a line extending in a direction in which the gas flows from the gas outlet of the pipe. 請求項４において、前記ガス導入管が断熱材で被覆されている昇華物測定装置。   5. The sublimate measuring device according to claim 4, wherein the gas introduction pipe is covered with a heat insulating material. 請求項１において、さらに、前記昇華ガス導入室に連通接続される一方、前記昇華ガスを前記熱処理室から前記昇華ガス導入室内に導入可能な昇華ガス導入管を備え、
前記昇華ガス導入管は、前記ガス導入手段によって前記昇華ガス導入室内に導入された前記ガスの流れのほぼ中央に配置されて前記ガス流れの方向に向く昇華ガス導出口を有している昇華物測定装置。 In Claim 1, further comprising a sublimation gas introduction pipe that is connected to the sublimation gas introduction chamber and capable of introducing the sublimation gas from the heat treatment chamber into the sublimation gas introduction chamber.
The sublimation gas introduction pipe has a sublimation gas outlet arranged in substantially the center of the gas flow introduced into the sublimation gas introduction chamber by the gas introduction means and directed in the gas flow direction. measuring device. 請求項７において、前記昇華ガス導入室は、前記昇華物を前記昇華ガス導入室から前記昇華物量測定手段へ導出する昇華物導出口を有しており、この昇華物導出口は、前記昇華ガス導入管の前記昇華ガス導出口から前記昇華ガスが流れる方向に延長した線上で前記昇華ガス導出口と対向するように位置している昇華物測定装置。   8. The sublimation gas introduction chamber according to claim 7, wherein the sublimation gas introduction chamber has a sublimation material outlet through which the sublimate is led out from the sublimation gas introduction chamber to the sublimate amount measuring means. A sublimation product measuring apparatus positioned so as to face the sublimation gas outlet on a line extending in a direction in which the sublimation gas flows from the sublimation gas outlet of the introduction pipe. 請求項７において、前記昇華ガス導入管が断熱材で被覆されている昇華物測定装置。   8. The sublimate measuring device according to claim 7, wherein the sublimation gas introduction pipe is covered with a heat insulating material. 請求項１において、さらに、前記昇華ガス導入室内に導入される前記昇華ガスを整流する整流部材を備えた昇華物測定装置。   The sublimate measurement apparatus according to claim 1, further comprising a rectifying member that rectifies the sublimation gas introduced into the sublimation gas introduction chamber. 請求項１において、さらに、前記昇華ガス導入室の空間を画定する壁を、前記昇華物が前記壁の内面に付着しないように保温する昇華ガス導入室保温手段を備えた昇華物測定装置。   2. The sublimate measuring apparatus according to claim 1, further comprising a sublimation gas introduction chamber heat retaining means for retaining the wall defining the space of the sublimation gas introduction chamber so that the sublimate does not adhere to the inner surface of the wall. 請求項１〜１１のいずれか一項において、前記昇華物量測定手段は、前記昇華物の粒子数をカウントするパーティクルカウンタである昇華物測定装置。   12. The sublimation product measuring apparatus according to claim 1, wherein the sublimation product amount measuring means is a particle counter that counts the number of particles of the sublimation product. 請求項１〜１２のいずれか一項において、前記昇華物量測定手段は、前記昇華ガス導入室からの前記昇華物が流れる昇華物流路を有しており、前記昇華物が流れる前記昇華物流路に光を照射して、前記昇華物によって減衰した前記光の量を測定し、その減衰量に基づき前記昇華物の濃度を決定する測定手段である昇華物測定装置。   The sublimate amount measuring means according to any one of claims 1 to 12, further comprising a sublimate flow path through which the sublimate from the sublimation gas introduction chamber flows, and the sublimate flow path through which the sublimate flows. A sublimate measuring apparatus which is a measuring means for measuring the amount of the light attenuated by the sublimate by irradiating light and determining the concentration of the sublimate based on the amount of attenuation. 請求項１〜１２のいずれか一項において、前記昇華物量測定手段は、前記昇華ガス導入室からの前記昇華物が流れる昇華物流路を有しており、前記昇華ガス導入室は、前記昇華物流路に対して着脱自在である昇華物測定装置。   The sublimate amount measuring means according to any one of claims 1 to 12, further comprising a sublimate flow path through which the sublimate from the sublimation gas introduction chamber flows, wherein the sublimation gas introduction chamber includes the sublimation logistics. Sublimation measuring device that is detachable from the road. 請求項１３または１４のいずれか一項において、前記昇華物流路に着脱自在な透明管が挿入されている昇華物測定装置。   15. The sublimate measuring device according to claim 13, wherein a detachable transparent tube is inserted into the sublimate flow path. 請求項１〜１５のいずれか一項において、前記昇華物量測定手段の下流側に、前記昇華ガスの流量を測定する流量計が設けられている昇華物測定装置。   The sublimate measurement apparatus according to claim 1, wherein a flow meter for measuring a flow rate of the sublimation gas is provided on the downstream side of the sublimate amount measurement unit. 請求項１〜１６のいずれか一項において、前記昇華物量測定手段の下流側に、前記昇華物を捕集するフィルタが設けられている昇華物測定装置。   The sublimate measurement apparatus according to any one of claims 1 to 16, wherein a filter that collects the sublimate is provided on a downstream side of the sublimate amount measurement unit.
JP2007249176A 2007-09-26 2007-09-26 Sublimate measuring device of heat treatment device Pending JP2009079827A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7414205B2 (en) 2022-07-28 2024-01-16 島津産機システムズ株式会社 heat treatment equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7414205B2 (en) 2022-07-28 2024-01-16 島津産機システムズ株式会社 heat treatment equipment

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