JP2008531129A - 短パルス特性を有するレーザシステム及びその使用方法 - Google Patents
短パルス特性を有するレーザシステム及びその使用方法 Download PDFInfo
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Abstract
【選択図】図1
Description
この例では、リソース18は、所望のパワーレベルを超えて3から5%に設定されるハードウェア光ループ閾値を有する。各パルスの最初では、要求された光レベルは最大に設定され、レーザパワーが所望のレベルに達するまでそこで保持される。これは、最速の立ち上がり時間を発生させる。レーザパワーが所望のレベルに達するとき、リソース18は、所望のレベルより高いパワーを保持する。リソース18は、その後、レーザパワーが所望のレベル以下になるまで要求されたパワーレベルを下げる。それが所望のレベル以下になったならば、ゆっくりとバックアップ(back up)に進む。もしそれが高いならば、ゆっくりと下方に下げられる。リソース18は、要求されたレベルを上下させる各決定の前に新たな計測をする。
この例では、レーザシステム10は、眼のRPE、カプロコリス(capullochoris)、及び脈絡膜を治療するのに利用される。パルス状の出力16は、眼のターゲット位置40に導かれ、ターゲット位置での温度上昇はパルスからパルスへ非加算的である。ターゲット位置40は、50マイクロから3mmの領域である。パルス状の出力16は、520から615nmの波長範囲を有する。パルス状の出力16は、25マイクロ秒から10,000マイクロ秒のパルスオンの時間と、750から10,000マイクロ秒のパルスオフの時間を有する。
この例では、レーザシステム10は、眼のRPE、カプロコリス(capullochoris)、及び脈絡膜を治療するのに利用される。パルス状の出力16は、眼のターゲット位置に導かれ、ターゲット位置での温度上昇はパルスからパルスへ非加算的である。ターゲット位置40は、50ミクロンから3mmの領域である。コントローラ22は、光検出器24からの信号をターゲットパワーと比較する高速回路を有しており、各パルスのオンとオフの時間を決定するのにこの比較を利用する。光検出器24からの信号は、オンとオフの時間を決定するためにターゲットパワーに対して比較される。
この実施例では、レーザシステム10は、眼のRPE、カプロコリス(capullochoris)、及び脈絡膜を治療するのに利用される。パルス状の出力16は、眼のターゲット位置に導かれ、ターゲット位置での温度上昇はパルスからパルスへ非加算的である。ターゲット位置40は、50ミクロンから3mmの領域である。パルス列16は、眼の網膜神経感覚上皮に影響を与えることなくRPEに対する熱の影響を封じ込めるように最適化されている。パルス列のオフ時間は、次のパルスがRPEターゲット位置に配信される前に、RPEターゲット位置が前のパルスの配信から鎮まるのに十分な時間を有していることを提供するための十分な存続時間である。
Claims (38)
- レーザシステムであって、
ダイオード励起源と、
前記ダイオード励起源によって励起される周波数二倍の固体可視レーザであって、パルス状のレーザ出力を生成する周波数二倍の固体可視レーザと、
ターゲット位置での熱の影響の実質的な閉じ込めのために提供する、オンとオフの時間を備えたパルス列を備えた前記パルス状の出力の作成のための命令を提供するリソースとを備えたレーザシステム。 - 前記パルス列は、前記ターゲット位置の熱の緩和時間より短い熱の緩和時間を有している請求項1に記載のシステム。
- 前記パルス列は、10ミリ秒より小さいパルス幅を有している請求項1に記載のシステム。
- 前記パルス列は、25ミリ秒より大きなパルスを有している請求項1に記載のシステム。
- 前記リソースは、フィードバック制御システムを含んでいる請求項1に記載のシステム。
- 前記フィードバック制御は、前記ターゲット位置に配信されるレーザ光を監視する請求項5に記載のシステム。
- 前記パルス状の出力は、前記監視に応答して変更される請求項6に記載のシステム。
- 前記フィードバック制御システムは、制御信号を生成するコントローラを含んでいる請求項5に記載のシステム。
- 前記制御信号は、前記パルス状の出力を調整するのに用いられる請求項8に記載のシステム。
- 前記パルス列は、医療上の処置においてターゲット組織の熱の影響を封じ込めるように最適化されている請求項1に記載のシステム。
- 前記パルス列は、眼の網膜神経感覚上皮に影響を及ぼすことなく、RPEに対して熱の影響を封じ込めるように最適化されている請求項1に記載のシステム。
- 前記パルス列のオフ時間は、次のパルスが前記ターゲット位置に配信される前に、前記ターゲット位置が前のパルスの配信から鎮まるのに十分な時間を有することを提供するために十分な存続時間である請求項1に記載のシステム。
- 前記リソースは、熱の影響の封じ込めのために最適化されているオン時間を備えたパルス列を有するパルス状の出力に提供するために、正確なパラメータ及びトリガーを前記ダイオード励起源に提供する請求項1に記載のシステム。
- 前記命令は、ダイオードに対する開始電流を設定し、レーザからのターゲットパワーを設定し、ダイオードを起動するようにトリガーするステップを含んでいる請求項1に記載のシステム。
- 前記パルス状の出力は、ダイオード励起固体レーザに適当な可視範囲の波長を有している請求項1に記載のシステム。
- 前記パルス状の出力は、25ミリ秒から10,000マイクロ秒のパルスオンの時間を有している請求項1に記載のシステム。
- 前記パルス状の出力は、75から10,000マイクロ秒のパルスオフの時間を有している請求項1に記載のシステム。
- 前記リソースは、1つのターゲット位置に繰り返しのパルスを提供するように構成されている請求項1に記載のシステム。
- 前記固体レーザは、Nd:YAG、Nd:YVO4、Nd:YLF、Ho:YAG、Er:YAG、Yb:YAG、Yb:YVO4から選択されるゲイン媒体を有している請求項1に記載のシステム。
- ダイオード励起の周波数二倍の固体レーザシステムに、熱の影響の封じ込めのために最適化されたオンの時間を備えたパルス列を有するパルス状の出力を用意するステップと、
複数のパルスをターゲット位置に導くステップとを備え、
前記ターゲット位置での温度上昇がパルスからパルスへ加えられない処置方法。 - 前記ターゲット位置は、眼のRPE、カプロコリス(capullochoris)、及び脈絡膜から選択される請求項20に記載の方法。
- 前記ターゲット位置は、約50ミクロンから3mmの領域を有している請求項20に記載の方法。
- 前記パルス状の出力は、可視の波長範囲を有している請求項20に記載の方法。
- 前記パルス状の出力は、520から615nmの波長範囲を有している請求項20に記載の方法。
- 前記パルス状の出力は、25マイクロ秒から10,000マイクロ秒のパルスオンの時間を有している請求項20に記載の方法。
- 前記パルス状の出力は、750から10,000マイクロ秒のパルスオフの時間を有している請求項20に記載の方法。
- レーザ手術によって生物学的組織を治療する方法であって、
周波数二倍器を周波数二倍の固体可視レーザシステムに用意するステップと、
熱の影響を実質的に封じ込め得るオンとオフの時間を備えたパルス列を有するパルス状の出力を作成するために前記レーザシステムに命令を用意するステップと、
前記パルス状の出力を生成するステップと、
前記パルス状の出力をターゲット位置に誘導するステップとを備えた方法。 - 前記ターゲット位置は、眼のRPE、カプロコリス(capullochoris)、及び脈絡膜から選択される請求項27に記載の方法。
- 前記ターゲット位置での温度上昇は、パルスからパルスへ加えられない請求項27に記載の方法。
- 前記ターゲット位置に除去しない(non-ablative)効果を提供するために前記パルス状の出力を利用することをさらに備えた請求項27に記載の方法。
- 前記パルス状の出力は、必要とされる時間及びエネルギーが終了点(endpoint)に達するまで前記ターゲット位置に配信される請求項27に記載の方法。
- 前記パルス列は、10ミリ秒より小さいパルス幅を有している請求項27に記載の方法。
- 前記パルス列は、25マイクロ秒より大きなパルスを有している請求項27に記載の方法。
- 前記ターゲット位置は、眼のRPE、カプロコリス(capullochoris)、及び脈絡膜から選択される請求項27に記載の方法。
- ダイオード励起源であって、該ダイオード励起源によって励起されパルス状の出力を生成する周波数二倍固体可視レーザに結合されるダイオード励起源と、
熱の影響を実質的に封じ込め得るオンとオフの時間を備えたパルス列を有するパルス状の出力を作成するために前記可視レーザに命令を提供するコントローラシステムとを備えたレーザ治療システム。 - 前記コントローラは、光検出器信号をターゲットパワーと比較し、この比較をオンとオフの時間を決定するために用いるプロセッサを含んでいる請求項35に記載のシステム。
- 前記コントローラは、光検出器信号をターゲットパワーと比較し、この比較を各パルスのオンとオフの時間を決定するのに用いる高速回路を含んでいる請求項35に記載のシステム。
- 前記コントローラは、光検出器信号をターゲットパワーと比較し、この比較をオンとオフの時間を決定するのに用いる高速回路及びプロセッサを含んでいる請求項35に記載のシステム。
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US11/066,615 US7771417B2 (en) | 2005-02-24 | 2005-02-24 | Laser system with short pulse characteristics and its methods of use |
PCT/US2006/006369 WO2006091714A2 (en) | 2005-02-24 | 2006-02-22 | Laser system with short pulse characteristics and its methods of use |
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EP1856774A4 (en) | 2010-02-10 |
HK1223536A1 (zh) | 2017-08-04 |
EP1856774B1 (en) | 2016-06-08 |
US7771417B2 (en) | 2010-08-10 |
WO2006091714A3 (en) | 2007-10-25 |
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US20060187978A1 (en) | 2006-08-24 |
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