JP2008089470A - 欠陥検査装置 - Google Patents
欠陥検査装置 Download PDFInfo
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- JP2008089470A JP2008089470A JP2006272103A JP2006272103A JP2008089470A JP 2008089470 A JP2008089470 A JP 2008089470A JP 2006272103 A JP2006272103 A JP 2006272103A JP 2006272103 A JP2006272103 A JP 2006272103A JP 2008089470 A JP2008089470 A JP 2008089470A
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- 230000007547 defect Effects 0.000 title claims abstract description 94
- 238000007689 inspection Methods 0.000 claims abstract description 55
- 238000000034 method Methods 0.000 claims abstract description 19
- 230000002093 peripheral effect Effects 0.000 claims abstract description 9
- 238000012937 correction Methods 0.000 claims description 59
- 238000003384 imaging method Methods 0.000 claims description 7
- 238000001514 detection method Methods 0.000 abstract description 14
- 230000002950 deficient Effects 0.000 abstract 2
- 238000012545 processing Methods 0.000 description 34
- 238000010586 diagram Methods 0.000 description 15
- 238000003705 background correction Methods 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 9
- 230000014509 gene expression Effects 0.000 description 6
- 238000007781 pre-processing Methods 0.000 description 5
- 238000002372 labelling Methods 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
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- 239000000758 substrate Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0403—Mechanical elements; Supports for optical elements; Scanning arrangements
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/44—Electric circuits
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/44—Electric circuits
- G01J2001/4446—Type of detector
- G01J2001/448—Array [CCD]
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- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Image Processing (AREA)
Abstract
【解決手段】 所定の被検査エリアを有する検査対象を、エリアセンサにより撮像した画像情報を処理し、前記エリア内の輝度変化から計算した特徴量に基づいて欠陥を識別する欠陥検査装置において、
前記エリアセンサのエリア中心部と周辺部の輝度出力差に起因する前記特徴量の差を補正する、特徴量面内補正手段を備える。
【選択図】 図1
Description
コントラスト=(欠陥輝度−周辺輝度)×100/周辺輝度
欠陥輝度と周辺輝度が夫々の位置において等倍で変化するならば、この値は一定となるはずであるが、一定とはならない。この原因はレンズの分解能にある。
(1)所定の被検査エリアを有する検査対象を、エリアセンサにより撮像した画像情報を処理し、前記エリア内の輝度変化から計算した特徴量に基づいて欠陥を識別する欠陥検査装置において、
前記エリアセンサのエリア中心部と周辺部の輝度出力差に起因する前記特徴量の差を補正する、特徴量面内補正手段を備えることを特徴とする欠陥検査装置。
(1)画像の場所によらず、安定した特徴量を算出でき、高い精度での欠陥判定を実現できる。これにより、
(a)画像の場所によって欠陥判定の閾値を変更する必要がない。
(b)画像の場所によらず、欠陥強度の比較が可能となる。
300 カメラ
301 エリアセンサ
400 画像処理装置
401 画像入力ボード
402 前処理手段
402a カメラ欠陥補正手段
403 検出処理手段
403a 強調フィルタ手段
403b 二値化手段
403c ラベリング手段
404 判定処理手段
404a 特徴量計算手段
404b 識別手段
404c 特徴量面内補正手段
405 判定結果出力手段
407 補正データ生成手段
Claims (4)
- 所定の被検査エリアを有する検査対象を、エリアセンサにより撮像した画像情報を処理し、前記エリア内の輝度変化から計算した特徴量に基づいて欠陥を識別する欠陥検査装置において、
前記エリアセンサのエリア中心部と周辺部の輝度出力差に起因する前記特徴量の差を補正する、特徴量面内補正手段を備えることを特徴とする欠陥検査装置。 - 前記エリアセンサのエリア内輝度の分布特性を予め測定して生成された補正データを保持する補正データ生成手段を備え、前記特徴量面内補正手段はこの補正データ生成手段より補正データを取得することを特徴とする請求項1に記載の欠陥検査装置。
- 前記補正データ生成手段は、X方向及びY方向に格子状に分布した同一サイズの擬似欠陥が形成された擬似欠陥チャートを前記エリアセンサで撮像して計算した特徴量の分布を、X方向またはY方向の多次多項式で近似した形態で保持することを特徴とする請求項2に記載の欠陥検査装置。
- 前記特徴量面内補正手段は、取得した前記補正データを参照し、撮像しているエリアの特徴量を、前記エリアの中心部の特徴量に換算する補正演算を実行することを特徴とする請求項2または3に記載の欠陥検査装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006272103A JP4367474B2 (ja) | 2006-10-03 | 2006-10-03 | 欠陥検査装置 |
KR1020070077704A KR100902301B1 (ko) | 2006-10-03 | 2007-08-02 | 결함 검사 장치 |
TW096130119A TW200825405A (en) | 2006-10-03 | 2007-08-15 | Defect inspection system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006272103A JP4367474B2 (ja) | 2006-10-03 | 2006-10-03 | 欠陥検査装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008089470A true JP2008089470A (ja) | 2008-04-17 |
JP4367474B2 JP4367474B2 (ja) | 2009-11-18 |
Family
ID=39373776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006272103A Expired - Fee Related JP4367474B2 (ja) | 2006-10-03 | 2006-10-03 | 欠陥検査装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4367474B2 (ja) |
KR (1) | KR100902301B1 (ja) |
TW (1) | TW200825405A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013118304A1 (ja) * | 2012-02-10 | 2013-08-15 | シャープ株式会社 | 検査装置、検査方法、および記録媒体 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6970550B2 (ja) * | 2017-07-24 | 2021-11-24 | 住友化学株式会社 | 欠陥検査システム及び欠陥検査方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4216062B2 (ja) * | 2002-12-13 | 2009-01-28 | 株式会社リコー | 欠陥検査方法 |
JP4115378B2 (ja) * | 2003-12-01 | 2008-07-09 | 徳島県 | 欠陥検出方法 |
US20050207639A1 (en) | 2004-03-22 | 2005-09-22 | Olympus Corporation | Inspection apparatus |
-
2006
- 2006-10-03 JP JP2006272103A patent/JP4367474B2/ja not_active Expired - Fee Related
-
2007
- 2007-08-02 KR KR1020070077704A patent/KR100902301B1/ko not_active IP Right Cessation
- 2007-08-15 TW TW096130119A patent/TW200825405A/zh unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013118304A1 (ja) * | 2012-02-10 | 2013-08-15 | シャープ株式会社 | 検査装置、検査方法、および記録媒体 |
Also Published As
Publication number | Publication date |
---|---|
JP4367474B2 (ja) | 2009-11-18 |
KR100902301B1 (ko) | 2009-06-10 |
TW200825405A (en) | 2008-06-16 |
KR20080031104A (ko) | 2008-04-08 |
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