JP2007512693A - コンパクトな設計の高度繰り返しレーザーシステム - Google Patents
コンパクトな設計の高度繰り返しレーザーシステム Download PDFInfo
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- 230000001172 regenerating effect Effects 0.000 claims description 23
- 239000011521 glass Substances 0.000 claims description 14
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 5
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 claims description 5
- 239000013078 crystal Substances 0.000 claims description 3
- 230000003321 amplification Effects 0.000 description 12
- 238000003199 nucleic acid amplification method Methods 0.000 description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 10
- 229910052594 sapphire Inorganic materials 0.000 description 10
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
- H01S3/235—Regenerative amplifiers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/08—Generation of pulses with special temporal shape or frequency spectrum
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/0602—Crystal lasers or glass lasers
- H01S3/0615—Shape of end-face
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1618—Solid materials characterised by an active (lasing) ion rare earth ytterbium
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- H—ELECTRICITY
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/17—Solid materials amorphous, e.g. glass
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S372/00—Coherent light generators
- Y10S372/70—Optical delay
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- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
6’ レーザー媒質
9 回折格子
10 反射器
11 ミラー
12 パルス遅延発生器とポッケルスセル用高電圧供給器
13 フェムト秒パルス発振器 150フェムト秒, 80メガHz, 250ミリワット出力,1040ナノメートル波長
14 ミラー
14’ ミラー
PD フォトダイオード
PC ポッケルスセル
PBS 偏光子
TFP 薄膜偏光子
M1 曲面ミラー
M2 曲面ミラー
M3 曲面ミラー
DM ダイクロイックミラー
L1 モードマッチングレンズ
L2 モードマッチングレンズ
Lc 回折格子反射間の光路長
FR ファラデー回転子
λ/2 1/2波長板
λ/4 1/4波長板
Claims (11)
- 少なくとも、
増幅したレーザー媒質(6)と
少なくとも一つの共振器ミラー(5)を有するレーザー共振器と、少なくとも一つの変調器(3)と
レーザー媒質(6)をポンプするための、特にレーザダイオードからなるレーザーポンプ源とからなり、
前記レーザー共振器が、構造及び/又は材料に関連した高度分散効果を有するパルス幅延長回路(7、8a、8b)を有することを特徴とする、再生増幅器の原理に従う繰り返し率が50kHz以上のレーザーシステム。 - 前記パルス幅延長回路(7、8a、8b)が、最大2次分散と組み合わせて最低第3次分散を有することを特徴とする請求項1記載のレーザーシステム。
- 前記パルス幅延長回路(7)が、特にSF57ガラス又はSF10ガラス又はBK7ガラスからなる高度に分散した材料のブロックを有することを特徴とする請求項1又は2記載のレーザーシステム。
- 多重反射が前記ブロック内部で、特に界面反射によって発生することを特徴とする請求項3記載のレーザーシステム。
- 前記パルス幅延長回路(8a、8b)が好ましくは折り返しミラーとしてのGires−Tournois干渉計又は分散的層構造を有することを特徴とする請求項1ないし4のいずれか1記載のレーザーシステム。
- 前記パルス幅延長回路(8a、8b)が少なくとも2枚の反射面を有し、前記反射面は互いに対し指向性を持ち特に調整可能な開き角となるように配され、前記レーザービームは少なくとも2度少なくとも前記面の一つで反射されることを特徴とする請求項5記載のレーザーシステム。
- 前記レーザー媒質(6)が1ms以上の反転ライフタイムを有し、特にイッテルビウムガラス又はイッテルビウム結晶であることを特徴とする請求項1ないし6のいずれか1記載のレーザーシステム。
- シードパルスがフェムト秒パルス又はピコ秒パルスでレーザー共振器に入力するように形成され配置された、シードパルスを入力するためのフェムト秒発振器(13)を特徴とする請求項1ないし7のいずれか1記載のレーザーシステム。
- 変調器(3)としての電気光学的スイッチング素子を特徴とする請求項1ないし8のいずれか1記載のレーザーシステム。
- レーザー共振器の外側にある特にTreacy設計に従うパルス圧縮器を特徴とする請求項1ないし9のいずれか1記載のレーザーシステム。
- 前記パルス圧縮器が、1700ライン/mm以下の、好ましくは1200ライン/mm以下の分散性回折格子を有することを特徴とする請求項10記載のレーザーシステム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US52517803P | 2003-11-28 | 2003-11-28 | |
US60/525,178 | 2003-11-28 | ||
PCT/EP2004/013375 WO2005053118A1 (de) | 2003-11-28 | 2004-11-25 | Hochrepetierendes lasersystem mit kompaktem aufbau |
Publications (3)
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JP2007512693A true JP2007512693A (ja) | 2007-05-17 |
JP2007512693A5 JP2007512693A5 (ja) | 2010-09-09 |
JP4741507B2 JP4741507B2 (ja) | 2011-08-03 |
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JP2006540379A Active JP4741507B2 (ja) | 2003-11-28 | 2004-11-25 | コンパクトな設計の高度繰り返しレーザーシステム |
Country Status (5)
Country | Link |
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US (1) | US7924902B2 (ja) |
EP (1) | EP1687876B1 (ja) |
JP (1) | JP4741507B2 (ja) |
DE (1) | DE502004008293D1 (ja) |
WO (1) | WO2005053118A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006173419A (ja) * | 2004-12-17 | 2006-06-29 | National Institute Of Advanced Industrial & Technology | 非平行平面鏡対を用いた超短パルスレーザー発振器 |
JP2010003865A (ja) * | 2008-06-20 | 2010-01-07 | Fujifilm Corp | モード同期固体レーザ装置 |
JP2010003864A (ja) * | 2008-06-20 | 2010-01-07 | Fujifilm Corp | モード同期固体レーザ装置 |
JP2010003866A (ja) * | 2008-06-20 | 2010-01-07 | Fujifilm Corp | モード同期固体レーザ装置 |
JP2015079873A (ja) * | 2013-10-17 | 2015-04-23 | 独立行政法人産業技術総合研究所 | チャープパルス増幅装置 |
Families Citing this family (9)
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JP5177969B2 (ja) * | 2006-07-12 | 2013-04-10 | 浜松ホトニクス株式会社 | 光増幅装置 |
US8582614B2 (en) | 2010-02-17 | 2013-11-12 | High Q Laser Gmbh | Laser amplification system and method for generating retrievable laser pulses |
US9054479B2 (en) * | 2010-02-24 | 2015-06-09 | Alcon Lensx, Inc. | High power femtosecond laser with adjustable repetition rate |
AT510116B1 (de) | 2010-06-22 | 2012-06-15 | High Q Laser Gmbh | Laser |
JP2012219661A (ja) * | 2011-04-05 | 2012-11-12 | National Institute Of Advanced Industrial Science & Technology | レーザ着火装置 |
US9008144B2 (en) * | 2012-01-20 | 2015-04-14 | Henry Yang Pang | Low noise optically pumped laser structures utilizing dispersion elements |
DE102014109681B4 (de) * | 2014-07-10 | 2021-02-25 | Rofin-Baasel Lasertech Gmbh & Co. Kg | Faltungsoptik für einen Laserpulskompressor sowie Laserpulsanordnung mit einer Faltungsoptik |
CN108365513A (zh) * | 2018-04-28 | 2018-08-03 | 哈尔滨工业大学 | 一种激光再生放大器的脉冲稳定性控制装置及方法 |
EP3918677A4 (en) * | 2019-02-02 | 2022-11-30 | MKS Instruments | LOW REPETITION RATE INFRARED TUNABLE FEMTOSECOND LASER SOURCE |
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- 2004-11-25 WO PCT/EP2004/013375 patent/WO2005053118A1/de active Application Filing
- 2004-11-25 DE DE502004008293T patent/DE502004008293D1/de active Active
- 2004-11-25 JP JP2006540379A patent/JP4741507B2/ja active Active
- 2004-11-25 US US10/578,508 patent/US7924902B2/en active Active
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006173419A (ja) * | 2004-12-17 | 2006-06-29 | National Institute Of Advanced Industrial & Technology | 非平行平面鏡対を用いた超短パルスレーザー発振器 |
JP2010003865A (ja) * | 2008-06-20 | 2010-01-07 | Fujifilm Corp | モード同期固体レーザ装置 |
JP2010003864A (ja) * | 2008-06-20 | 2010-01-07 | Fujifilm Corp | モード同期固体レーザ装置 |
JP2010003866A (ja) * | 2008-06-20 | 2010-01-07 | Fujifilm Corp | モード同期固体レーザ装置 |
JP2015079873A (ja) * | 2013-10-17 | 2015-04-23 | 独立行政法人産業技術総合研究所 | チャープパルス増幅装置 |
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Publication number | Publication date |
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US20070053401A1 (en) | 2007-03-08 |
EP1687876A1 (de) | 2006-08-09 |
US7924902B2 (en) | 2011-04-12 |
JP4741507B2 (ja) | 2011-08-03 |
DE502004008293D1 (de) | 2008-11-27 |
WO2005053118A1 (de) | 2005-06-09 |
EP1687876B1 (de) | 2008-10-15 |
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