JP2007299732A - Discharge treatment device - Google Patents

Discharge treatment device Download PDF

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JP2007299732A
JP2007299732A JP2007063987A JP2007063987A JP2007299732A JP 2007299732 A JP2007299732 A JP 2007299732A JP 2007063987 A JP2007063987 A JP 2007063987A JP 2007063987 A JP2007063987 A JP 2007063987A JP 2007299732 A JP2007299732 A JP 2007299732A
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refrigerant
side walls
electrode
discharge
peripheral wall
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JP4820317B2 (en
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Masaki Iwasaki
政樹 岩崎
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Sekisui Chemical Co Ltd
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Sekisui Chemical Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a discharge treatment device capable of effectively performing cooling of electrodes. <P>SOLUTION: At least one of the electrodes is provided with (1) at least an electrode body including a peripheral wall 12 having an outer periphery face to be a discharging face and side walls 28, 38 each continuing from either end of the peripheral wall 12 with a hollow space formed inside, (2) inside members 50, 52, 54 arranged inside the hollow space of the electrode body and forming sealed spaces 51, 53, 55 between the peripheral wall 12 and the side walls 28, 38 of the electrode body, and (3) first coolant channels 42, 37, 32, 34 each communicated with two side wall sides 53, 55 of the sealed spaces, respectively, and second coolant channels 44, 26. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、放電処理装置に関し、詳しくは、放電処理装置の電極を冷却するための構造に関する。   The present invention relates to a discharge processing apparatus, and more particularly to a structure for cooling an electrode of a discharge processing apparatus.

従来、電極間の放電により発生させたプラズマを利用して、被処理物の表面改質、薄膜形成、アッシング、洗浄などの処理を行うプラズマ処理装置などの放電処理装置において、放電により電極が高温となり損傷することを防ぐため、電極を冷却することが提案されている。   Conventionally, in a discharge processing apparatus such as a plasma processing apparatus that performs processing such as surface modification, thin film formation, ashing, and cleaning of an object to be processed using plasma generated by discharge between electrodes, the electrode is heated to a high temperature. It has been proposed to cool the electrode to prevent it from becoming damaged.

例えば、特許文献1には、溶鋼加熱用プラズマトーチの電極を、内部に冷却水が流れる二重管にすることが開示されている。また、特許文献2には、プラズマ発生装置の電極の内部に、冷却水が循環する内部空間を形成することが開示されている。また、特許文献3には、電極となるステンレスパイプの中に、一端から他端に水を通して冷却する構成が開示されている。
特開2003−33862号公報 特開2005−235464号公報 特開2001−35835号公報
For example, Patent Document 1 discloses that the electrode of a plasma torch for heating molten steel is a double tube through which cooling water flows. Patent Document 2 discloses that an internal space in which cooling water circulates is formed inside an electrode of a plasma generator. Patent Document 3 discloses a configuration in which water is cooled from one end to the other end in a stainless steel pipe serving as an electrode.
JP 2003-33862 A JP 2005-235464 A JP 2001-35835 A

放電装置を大型化すると、電極は大径になったり、断面積が大きくなったりする。この場合、特許文献1〜3のような構成を単純に適用すると、(a)冷却水を大量に供給しなければならない、(b)冷却したい放電面付近に冷却水をうまく供給することができない、といった問題があり、電極の冷却を効率よく行うことができない。   When the discharge device is increased in size, the electrode becomes larger in diameter or has a larger cross-sectional area. In this case, when the configurations as in Patent Documents 1 to 3 are simply applied, (a) a large amount of cooling water must be supplied, and (b) the cooling water cannot be supplied well near the discharge surface to be cooled. The electrode cannot be cooled efficiently.

本発明は、かかる実情に鑑みて、電極の冷却を効率よく行うことができる、放電処理装置を提供しようとするものである。   In view of such circumstances, the present invention is intended to provide a discharge treatment apparatus that can efficiently cool an electrode.

本発明は、上記課題を解決するために、以下のように構成した放電処理装置を提供する。   In order to solve the above-mentioned problems, the present invention provides a discharge treatment apparatus configured as follows.

放電処理装置は、対向する電極間に電圧を印加し、該電極間で放電を発生させて被処理物を処理するタイプのものである。前記電極の少なくとも一つは、電極本体と、内側部材と、第1冷媒路及び第2冷媒路とを備える。前記電極本体は、放電面となる外周面を有する周壁と、該周壁の両端からそれぞれ連続する二つの側壁とを少なくとも含み、内部に中空空間が形成されている。前記内側部材は、前記電極本体の前記中空空間内に配置され、前記電極本体の前記周壁と前記二つの側壁とに沿って間隔を設けて延在し、前記電極本体の前記周壁と前記二つの側壁との間に密閉空間を形成する。前記第1冷媒路及び第2冷媒路は、前記密閉空間の前記二つの側壁側にそれぞれ連通する。   The discharge treatment apparatus is of a type that treats an object to be processed by applying a voltage between opposed electrodes to generate a discharge between the electrodes. At least one of the electrodes includes an electrode body, an inner member, a first refrigerant path, and a second refrigerant path. The electrode body includes at least a peripheral wall having an outer peripheral surface serving as a discharge surface and two side walls that are continuous from both ends of the peripheral wall, and a hollow space is formed therein. The inner member is disposed in the hollow space of the electrode main body, extends along the peripheral wall and the two side walls of the electrode main body, and is spaced apart from the peripheral wall of the electrode main body. A sealed space is formed between the side walls. The first refrigerant path and the second refrigerant path communicate with the two side walls of the sealed space, respectively.

上記構成において、冷媒は、第1冷媒路から供給され、電極本体と内側部材との間に形成される密閉空間を通った後、第2冷媒路から回収される。あるいは、第2冷媒路から供給され、電極本体と内側部材との間に形成される密閉空間を通った後、第1冷媒路から回収される。いずれの場合においても、供給された冷媒の全てが、電極本体の周壁に沿って形成された密閉空間内、すなわち放電面の付近を流れるため、冷媒の全部を冷却に有効に利用することができる。また、電極本体内の周壁よりも径方向内側の空間のうち、電極本体の周壁に沿って一部分にのみ冷媒が流れるので、供給する冷媒の量を減らすことができる。   In the above configuration, the refrigerant is supplied from the first refrigerant path, passes through the sealed space formed between the electrode main body and the inner member, and then recovered from the second refrigerant path. Alternatively, after being supplied from the second refrigerant path and passing through a sealed space formed between the electrode body and the inner member, the refrigerant is recovered from the first refrigerant path. In any case, since all of the supplied refrigerant flows in the sealed space formed along the peripheral wall of the electrode body, that is, in the vicinity of the discharge surface, all of the refrigerant can be effectively used for cooling. . Further, since the refrigerant flows only in a part along the peripheral wall of the electrode body in the space radially inward of the peripheral wall in the electrode body, the amount of the supplied refrigerant can be reduced.

好ましくは、前記第1冷媒路は、一端側が、前記電極本体の前記二つの側壁の一方に隣接して配置され、他端側が、前記電極本体の前記中空空間を通って前記二つの側壁の他方の近傍まで延在し、前記密閉空間の前記二つの側壁の前記他方側に連通する。前記第2冷媒路は、前記電極本体の前記二つの側壁の前記一方に隣接して配置され、前記密閉空間の前記二つの側壁の前記一方側に連通する。   Preferably, one end side of the first refrigerant path is disposed adjacent to one of the two side walls of the electrode body, and the other end side passes through the hollow space of the electrode body and the other of the two side walls. And communicates with the other side of the two side walls of the sealed space. The second refrigerant path is disposed adjacent to the one of the two side walls of the electrode body and communicates with the one side of the two side walls of the sealed space.

この場合、電極本体の同じ側(一方の側壁側)に第1冷媒路と第2冷媒路とが配置されるので、冷媒系の配管の取り回しが容易になる。   In this case, since the first refrigerant path and the second refrigerant path are arranged on the same side (one side wall side) of the electrode body, the piping of the refrigerant system becomes easy.

好ましくは、前記電極本体の前記二つの側壁の前記一方に関して前記電極本体の前記二つの側壁の前記他方とは反対側において、前記第1冷媒路の周囲に前記第2冷媒路が配置されて二重管状である。   Preferably, the second refrigerant path is disposed around the first refrigerant path on the side opposite to the other of the two side walls of the electrode body with respect to the one of the two side walls of the electrode body. It is a heavy tube.

この場合、二重管状の部分において外側に配置される第2冷媒路は、二重管状の部分に近い一方の側壁側の密閉空間に連通され、二重管状の部分の内側に配置される第1冷媒路は、二重管状の部分から遠い他方の側壁側の密閉空間に連通される。そのため、第1冷媒路と第2冷媒路とは、二重管状となるように配置しても互いに交差することなく密閉空間に連通させることができ、装置の構成を簡単にすることができる。   In this case, the second refrigerant path disposed outside the double tubular portion communicates with the sealed space on one side wall near the double tubular portion and is disposed inside the double tubular portion. One refrigerant path is connected to the sealed space on the side of the other side wall far from the double tubular portion. Therefore, even if it arrange | positions so that it may become a double tubular shape, a 1st refrigerant path and a 2nd refrigerant path can be connected to sealed space, without mutually crossing, and the structure of an apparatus can be simplified.

上記構成において、第2冷媒路から冷媒を供給し、第1冷媒路から冷媒を回収する場合には、放電面からの熱を吸収して高温になった冷媒が第1流路を流れるときに、冷媒の熱は、二重管状の部分においては、第1冷媒路の周囲に配置された第2冷媒路にのみ伝達され、二重管状の部分以外の部分においては、内側部材などに伝達される。   In the above configuration, when the refrigerant is supplied from the second refrigerant path and the refrigerant is recovered from the first refrigerant path, when the refrigerant that has become hot due to absorption of heat from the discharge surface flows through the first flow path. The heat of the refrigerant is transmitted only to the second refrigerant path disposed around the first refrigerant path in the double tubular part, and is transmitted to the inner member and the like in the part other than the double tubular part. The

これとは逆に、第1冷媒路から冷媒を供給し、第2冷媒路から冷媒を回収する場合には、放電面からの熱を吸収して高温になった冷媒が第2流路を流れるときに、冷媒の熱は、第1冷媒路のみならず、外部にも放熱されるため、第1冷媒路内の冷媒の温度上昇を抑えることができ、冷却効率を一層向上することができる。また、内側部材などを温めてしまうこともない。   On the contrary, when the refrigerant is supplied from the first refrigerant path and is recovered from the second refrigerant path, the refrigerant that has become a high temperature by absorbing heat from the discharge surface flows through the second flow path. Sometimes, the heat of the refrigerant is radiated not only to the first refrigerant path but also to the outside, so that an increase in the temperature of the refrigerant in the first refrigerant path can be suppressed, and the cooling efficiency can be further improved. Further, the inner member or the like is not warmed.

好ましい一態様としては、前記電極本体の前記周壁が円筒形状である。前記内側部材は、前記電極本体の前記周壁と同軸に配置され、円筒形状の外周面を有する。   As a preferred embodiment, the peripheral wall of the electrode body is cylindrical. The inner member is disposed coaxially with the peripheral wall of the electrode body and has a cylindrical outer peripheral surface.

この場合、電極部材の周壁の内周面と内側部材の外周面との間に、一定間隔の密閉空間を形成することができ、放電面を均一に冷却することができる。その結果、被処理物を均一に処理することができる。   In this case, a sealed space having a constant interval can be formed between the inner peripheral surface of the peripheral wall of the electrode member and the outer peripheral surface of the inner member, and the discharge surface can be uniformly cooled. As a result, the object to be processed can be processed uniformly.

本発明によれば、冷却したい放電面付近に冷媒の全部又は大部分を供給し、冷媒の利用率を高めて冷媒供給量を減らし、電極の冷却を効率よく行うことができる。   According to the present invention, all or most of the refrigerant is supplied in the vicinity of the discharge surface to be cooled, the utilization rate of the refrigerant is increased, the refrigerant supply amount is reduced, and the electrode can be efficiently cooled.

以下、本発明の実施の形態について、図1〜図7を参照しながら説明する。   Hereinafter, embodiments of the present invention will be described with reference to FIGS.

<実施例1> 実施例1の放電装置について、図1〜図3を参照しながら説明する。図1は、縦断面図、図2は、図1の線II−IIに沿って切断した横断面図である。   <Example 1> The discharge device of Example 1 will be described with reference to FIGS. 1 is a longitudinal sectional view, and FIG. 2 is a transverse sectional view taken along line II-II in FIG.

放電装置は、図2に示すように、ロール電極10と固定電極ユニット4とが対向して配置されている。ロール電極10の外周面には、被処理物1が接触するように配置される。被処理物1は、ロール電極10が矢印18で示す方向に回転することによって、矢印3で示す方向に搬送され、固定電極ユニット4と対向する位置を通過する。   In the discharge device, as shown in FIG. 2, the roll electrode 10 and the fixed electrode unit 4 are arranged to face each other. An object 1 to be processed is disposed on the outer peripheral surface of the roll electrode 10. The workpiece 1 is conveyed in the direction indicated by the arrow 3 when the roll electrode 10 rotates in the direction indicated by the arrow 18, and passes through a position facing the fixed electrode unit 4.

固定電極ユニット4の内部には、ロール電極10に対向して配置される電極6と、この電極6とロール電極10との間の隙間(以下、「放電空間8」という。)に処理ガスを供給するガス供給部(不図示)とを備える。   Inside the fixed electrode unit 4, a processing gas is introduced into an electrode 6 disposed opposite to the roll electrode 10 and a gap between the electrode 6 and the roll electrode 10 (hereinafter referred to as “discharge space 8”). A gas supply unit (not shown) to supply.

放電装置は、大気圧下に配置され、ロール電極10が接地され、固定電極ユニット4の電極6に電圧が印加される。これによって、放電空間8でプラズマ放電が発生し、放電空間8に供給されている処理ガスがプラズマ放電によってプラズマ化する。このプラズマ化した処理ガス(現にプラズマ化している処理ガスであっても、プラズマを経て活性化した処理ガスであってもよい。)を、被処理物1の表面2に接触させることにより、被処理物1の表面2に対して、放電によるプラズマ(活性種、イオンなど)を用いて、表面改質(親水化、撥水など)、薄膜形成、アッシング、エッチング(洗浄を含む)などのプラズマ処理を行なことができる。被処理物1は、放電空間8を通過することによって、連続的に処理される。   The discharge device is disposed under atmospheric pressure, the roll electrode 10 is grounded, and a voltage is applied to the electrode 6 of the fixed electrode unit 4. As a result, plasma discharge is generated in the discharge space 8, and the processing gas supplied to the discharge space 8 is turned into plasma by the plasma discharge. This plasma-treated processing gas (whether it is a processing gas that is actually plasma or may be a processing gas activated through plasma) is brought into contact with the surface 2 of the object 1 to be treated. Plasma such as surface modification (hydrophilization, water repellency, etc.), thin film formation, ashing, etching (including cleaning) is performed on the surface 2 of the processed object 1 using plasma (active species, ions, etc.) by discharge. Processing can be performed. The workpiece 1 is continuously processed by passing through the discharge space 8.

処理ガスは、被処理物1のプラズマ処理の目的に応じて選択する。例えば、プラスチックフィルムの表面への印刷が容易になるように親水化処理を行う場合、公知の処理ガス、例えば酸素、フッ素系ガス(フルオロカーボンなど)を用いる。処理ガスは、窒素、アルゴン等の不活性ガスで希釈してもよい。また、放電空間8に処理ガスを供給しない状態でも、放電空間8で発生したプラズマによって、被処理物1の表面処理を行うことができる。   The processing gas is selected according to the purpose of plasma processing of the workpiece 1. For example, when the hydrophilic treatment is performed so that printing on the surface of the plastic film is facilitated, a known processing gas such as oxygen or a fluorine-based gas (fluorocarbon or the like) is used. The processing gas may be diluted with an inert gas such as nitrogen or argon. Even in a state where the processing gas is not supplied to the discharge space 8, the surface treatment of the workpiece 1 can be performed by the plasma generated in the discharge space 8.

図1及び図2に示すように、ロール電極10は、円筒形状の周壁12と、周壁12の両端と軸部20,30との間に延在し結合された二つの側壁28,38とを含む。周壁12及び側壁28,38の外面は、誘電体14で覆われ、放電による損傷から保護されるようになっている。例えば、外径が300mm、軸方向の長さが1700mmの周壁12と、側壁28,38との表面に、誘電体14として厚さ1mm〜5mmのシリコンゴムを被覆する。誘電体14は、アルミナなどの溶射膜やセラミックなど、シリコンゴム以外であってもよい。軸部20,30は、筒部材36の両端にそれぞれ固定され、筒部材36を介して同軸に結合されている。ロール電極10は、軸部20,30が回転自在に支持され、外部からの駆動によって回転する。   As shown in FIGS. 1 and 2, the roll electrode 10 includes a cylindrical peripheral wall 12, and two side walls 28 and 38 that extend and are coupled between both ends of the peripheral wall 12 and the shaft portions 20 and 30. Including. The outer surfaces of the peripheral wall 12 and the side walls 28 and 38 are covered with a dielectric 14 so as to be protected from damage due to electric discharge. For example, the surface of the peripheral wall 12 having an outer diameter of 300 mm and an axial length of 1700 mm and the side walls 28 and 38 is covered with silicon rubber having a thickness of 1 mm to 5 mm as the dielectric 14. The dielectric 14 may be other than silicon rubber, such as a sprayed film such as alumina or ceramic. The shaft portions 20 and 30 are respectively fixed to both ends of the cylindrical member 36 and are coaxially coupled via the cylindrical member 36. The roll electrode 10 is rotatably supported by the shaft portions 20 and 30 and is rotated by driving from the outside.

ロール電極10の内側には、内側部材として、周壁12に沿って間隔を設けて延在する内部周壁50と、周壁28,38に沿って間隔を設けて延在する内部側壁52,54とが配置されている。内部側壁52,54は、内部周壁50の両端と、軸部20,30とに結合されている。周壁12及び側壁28,38と、内部周壁50及び内部側壁52,54との間に、密閉空間51,53,55が形成されている。   Inside the roll electrode 10, there are inner peripheral walls 50 extending as gaps along the peripheral wall 12 and inner side walls 52, 54 extending as gaps along the peripheral walls 28, 38 as inner members. Has been placed. The inner side walls 52 and 54 are coupled to both ends of the inner peripheral wall 50 and the shaft portions 20 and 30. Sealed spaces 51, 53, 55 are formed between the peripheral wall 12 and the side walls 28, 38 and the inner peripheral wall 50 and the inner side walls 52, 54.

ロール電極10が撓まないように、軸部20,30と内部周壁50との間に延在し結合された内補強部材56と、内部周壁50と周壁12との間に延在し結合された外補強部材58とが設けられている。図2に示すように、外補強部材58は、密閉空間51内において、周方向に部分的に設けられている。   The inner reinforcing member 56 extending and coupled between the shaft portions 20 and 30 and the inner peripheral wall 50 and the inner peripheral wall 50 and the peripheral wall 12 are extended and coupled so that the roll electrode 10 does not bend. An outer reinforcing member 58 is provided. As shown in FIG. 2, the outer reinforcing member 58 is partially provided in the circumferential direction in the sealed space 51.

図1に示すように、一方の軸部20には、先端側(図において左側)に内径が相対的に大きい大径穴22が形成され、基端側に内径が相対的に小さい小径穴24が形成され、大径穴22と小径穴24とは、軸部20の中間で連通するようになっている。大径穴22及び小径穴24には管状部材40が挿入され、大径穴22の内周面と管状部材40の外周面との間に筒状空間44が形成され、二重管状になっている。小径穴24の内周面と管状部材40の外周面とは密着し、管状部材40の一端が筒部材36の中空穴37に連通するようになっている。   As shown in FIG. 1, one shaft portion 20 has a large-diameter hole 22 having a relatively large inner diameter on the distal end side (left side in the drawing) and a small-diameter hole 24 having a relatively small inner diameter on the proximal end side. The large diameter hole 22 and the small diameter hole 24 communicate with each other in the middle of the shaft portion 20. A tubular member 40 is inserted into the large diameter hole 22 and the small diameter hole 24, and a cylindrical space 44 is formed between the inner peripheral surface of the large diameter hole 22 and the outer peripheral surface of the tubular member 40. Yes. The inner peripheral surface of the small diameter hole 24 and the outer peripheral surface of the tubular member 40 are in close contact with each other, and one end of the tubular member 40 communicates with the hollow hole 37 of the tubular member 36.

他方の軸部30には、基端(図において左端)から軸部30の中間位置まで軸方向に延在する中心穴32が形成されている。中心穴32は、筒部材36の中空穴37に連通している。また、軸部30の中間位置には、径方向に延在する接続穴34が放射状に8本形成され、中心穴32と密閉空間55とを接続するようになっている。   The other shaft portion 30 is formed with a center hole 32 extending in the axial direction from the base end (left end in the drawing) to the intermediate position of the shaft portion 30. The center hole 32 communicates with the hollow hole 37 of the cylindrical member 36. Further, eight connecting holes 34 extending in the radial direction are formed radially at an intermediate position of the shaft portion 30 so as to connect the center hole 32 and the sealed space 55.

二重管状になっている一方の軸部20の先端側(図1において左側)において、冷媒が、矢印43で示すように管状部材40の中空穴42を通って供給され、矢印45で示すように、筒状空間44を通って回収される。すなわち、冷媒は、順に、管状部材40の中空穴42、筒部材36の中空穴37、軸部30の中心穴32、軸部30の接続穴34、側壁38と内部側壁54との間の密閉空間55、周壁12と内部周壁50との間の密閉空間51、側壁28と内部側壁52との間の密閉空間53、軸部20の接続穴26、軸部20の大径穴22の内周面と管状部材40の外周面との間の筒状空間44を通る。接続穴26は、放射状に8本形成されている。冷媒は、液体(例えば、水、不凍液)でも、気体(例えば、空気)でもよい。   On the distal end side (left side in FIG. 1) of one shaft portion 20 having a double tubular shape, the refrigerant is supplied through the hollow hole 42 of the tubular member 40 as indicated by an arrow 43 and as indicated by an arrow 45. Then, it is collected through the cylindrical space 44. That is, the refrigerant is sealed in order between the hollow hole 42 of the tubular member 40, the hollow hole 37 of the tubular member 36, the center hole 32 of the shaft part 30, the connection hole 34 of the shaft part 30, and the side wall 38 and the inner side wall 54. The space 55, the sealed space 51 between the peripheral wall 12 and the inner peripheral wall 50, the sealed space 53 between the side wall 28 and the inner side wall 52, the connection hole 26 of the shaft portion 20, and the inner periphery of the large-diameter hole 22 of the shaft portion 20. It passes through the cylindrical space 44 between the surface and the outer peripheral surface of the tubular member 40. Eight connecting holes 26 are formed radially. The refrigerant may be a liquid (for example, water or antifreeze) or a gas (for example, air).

ロール電極10に供給された冷媒は、全て、周壁12に沿って形成された密閉空間51内、すなわち放電面付近を流れるため、供給された冷媒の全てを冷却に有効に利用することができる。また、密閉空間51は、周壁12より径方向内側の空間のうち、周壁12に沿って一部分にのみ形成されているため、ロール電極10に供給する冷媒の量を減らすことができる。つまり、冷却したい部分にのみ冷媒を供給し、冷媒の供給量を減らし、効率よく冷却することができる。   Since all of the refrigerant supplied to the roll electrode 10 flows in the sealed space 51 formed along the peripheral wall 12, that is, in the vicinity of the discharge surface, all of the supplied refrigerant can be effectively used for cooling. Moreover, since the sealed space 51 is formed only in a part along the peripheral wall 12 in the space radially inward from the peripheral wall 12, the amount of refrigerant supplied to the roll electrode 10 can be reduced. That is, the refrigerant can be supplied only to the portion to be cooled, the amount of refrigerant supplied can be reduced, and cooling can be performed efficiently.

また、冷媒の供給・回収は、ロール電極10の片側(図1において左側)にまとめられているので、ロール電極10の外部において、冷媒系の配管の取り回しが容易になる。   In addition, since the supply and recovery of the refrigerant are performed on one side (the left side in FIG. 1) of the roll electrode 10, it is easy to route the refrigerant piping outside the roll electrode 10.

なお、冷媒は、矢印43,45で示した向きとは逆向きに流すことも可能である。この場合、筒状空間44が形成され二重管状となっている部分において、密閉空間から流出した冷媒(以下、「流出冷媒」という。)の流路の周囲に、密閉空間に流入する冷媒(以下、「流入冷媒」という。)の流路が配置されることになる。そのため、流出冷媒からの放熱は、流入冷媒側にのみ伝わる。これに対して、矢印43,45で示す向きに冷媒を流せば、二重管状となっている部分において、流入冷媒の流路の周囲に流出冷媒の流路が配置されることになるため、流出冷媒からの放熱は、流入冷媒側のみならず、外部にも伝わるため、流出媒体から流入冷媒に与えられる熱量が相対的に少なくなり、容易により効率よく冷却することができるので、好ましい。   The refrigerant can also flow in the direction opposite to the direction indicated by the arrows 43 and 45. In this case, in the portion where the cylindrical space 44 is formed and formed into a double tubular shape, a refrigerant (referred to as “outflow refrigerant” hereinafter) flowing into the sealed space around the flow path of the refrigerant flowing out from the sealed space (hereinafter referred to as “outflow refrigerant”). Hereinafter, a flow path of “inflowing refrigerant”) is arranged. Therefore, heat dissipation from the outflow refrigerant is transmitted only to the inflow refrigerant side. On the other hand, if the refrigerant flows in the direction indicated by the arrows 43 and 45, the flow path of the outflow refrigerant is arranged around the flow path of the inflow refrigerant in the double tubular portion. Since the heat released from the outflow refrigerant is transmitted not only to the inflow refrigerant side but also to the outside, the amount of heat given from the outflow medium to the inflow refrigerant is relatively small, and it is preferable because the heat can be easily and efficiently cooled.

図3は、ロール電極10の基本構成を模式的に示した要部構成図である。ロール電極10は、放電面66と、放電面66の両端に連続する二つの側壁62,64とを有する中空構造である。ロール電極10の内部には、内側部材70が配置されている。内側部材70は、二つの側壁62,64の内側と放電面66の裏側との間に密閉空間72,74,76を形成する。   FIG. 3 is a main part configuration diagram schematically showing the basic configuration of the roll electrode 10. The roll electrode 10 has a hollow structure having a discharge surface 66 and two side walls 62 and 64 continuous to both ends of the discharge surface 66. An inner member 70 is disposed inside the roll electrode 10. The inner member 70 forms sealed spaces 72, 74, 76 between the inner sides of the two side walls 62, 64 and the back side of the discharge surface 66.

密閉空間72,74,76に冷媒を供給・回収するため、流入路68と流出路78とが設けられている。流入路68は、一方の側壁62側から他方の側壁64付近まで延在し、他方の側壁64側の密閉空間74に連通する。流出路78は、一方の側壁62付近において、一方の側壁62側の密閉空間72に連通している。   An inflow path 68 and an outflow path 78 are provided to supply and recover the refrigerant in the sealed spaces 72, 74, and 76. The inflow path 68 extends from one side wall 62 side to the vicinity of the other side wall 64 and communicates with the sealed space 74 on the other side wall 64 side. The outflow path 78 communicates with the sealed space 72 on the one side wall 62 side in the vicinity of the one side wall 62.

冷媒は、図3において矢印で示すように、一方の側壁62側から流入路68を通り、他方の側壁64側の密閉空間74、放電面66の裏側の密閉空間76、他方の側壁64側の密閉空間72を通った後、流出路78を通る。つまり、一方の側壁62側に戻る。冷媒は、放電面66の裏側の密閉空間76を通るときに熱を吸収し、放電面66を冷却する。   As shown by arrows in FIG. 3, the refrigerant passes through the inflow path 68 from one side wall 62 side, the sealed space 74 on the other side wall 64 side, the sealed space 76 on the back side of the discharge surface 66, and the other side wall 64 side. After passing through the sealed space 72, it passes through the outflow path 78. That is, it returns to the side wall 62 side. The refrigerant absorbs heat when passing through the sealed space 76 on the back side of the discharge surface 66 and cools the discharge surface 66.

実施例1では、放電面66はロール状(円筒形状)であり、図3の線A−Aに沿って切断した断面が円形であるが、次の変形例1、2のように、断面が四角形などの多角形であってもよい。   In the first embodiment, the discharge surface 66 has a roll shape (cylindrical shape), and the cross section cut along the line AA in FIG. 3 has a circular shape. It may be a polygon such as a rectangle.

<変形例1> 図4に示すように、放電面80a,82a同士が対向するように、断面が四角形の電極本体80,82を配置する。少なくとも一方の電極本体82の内部に、電極本体82の周壁に沿って密閉空間84を形成するように、内側部材86を配置する。このとき、密閉空間84は、放電面82aを含め、電極82の外周面全体の裏側に形成され、断面略口字状に連続して延在している。なお、断面の角は、円弧状等に丸めてもよい。被処理物は、放電面80a,82a間に配置したり、通過させるようにしたりしてもよい。また、被処理物はこの放電面間外に配置したり、通過させるようにしたりしてもよい。   <Modification 1> As shown in FIG. 4, electrode bodies 80 and 82 having a square cross section are arranged so that the discharge surfaces 80 a and 82 a face each other. The inner member 86 is disposed in at least one of the electrode bodies 82 so as to form a sealed space 84 along the peripheral wall of the electrode body 82. At this time, the sealed space 84 is formed on the back side of the entire outer peripheral surface of the electrode 82 including the discharge surface 82a, and continuously extends in a substantially square shape in cross section. The corners of the cross section may be rounded into an arc shape or the like. The object to be processed may be disposed between the discharge surfaces 80a and 82a or may be allowed to pass therethrough. Moreover, you may arrange | position a to-be-processed object outside between this discharge surface, or let it pass.

<変形例2> 図5は、図4に示した変形例1と略同様に構成されている。変形例1と異なり、電極82の内部に配置される内側部材88は、放電面82aと放電面82aの両端の各辺82b,82dに沿って間隔を設けて配置され、断面略コ字状に密閉空間85を形成する。すなわち、密閉空間85は、放電面82aとは反対側82cに沿っては形成されていない。   <Modification 2> FIG. 5 is configured in substantially the same manner as Modification 1 shown in FIG. Unlike the first modification, the inner member 88 disposed inside the electrode 82 is disposed at intervals along the sides 82b and 82d at both ends of the discharge surface 82a and the discharge surface 82a, and has a substantially U-shaped cross section. A sealed space 85 is formed. That is, the sealed space 85 is not formed along the side 82c opposite to the discharge surface 82a.

放電面82aで発生した熱が電極82の放電面82aとは反対側82cに伝達されるまでに、密閉空間85を流れる冷媒によって十分に吸収され、放電面82aとは反対側82cを冷却する必要がない場合に、図5のように構成することにより、冷媒が流れる流路断面を小さくし、使用する冷媒の量を減らし、放電面82aを効率よく冷却することができる。   Before the heat generated on the discharge surface 82a is transferred to the opposite side 82c of the electrode 82 to the discharge surface 82a, it is sufficiently absorbed by the refrigerant flowing through the sealed space 85, and it is necessary to cool the opposite side 82c of the discharge surface 82a. In the case where there is not, the configuration as shown in FIG. 5 can reduce the cross section of the flow path through which the refrigerant flows, reduce the amount of refrigerant to be used, and cool the discharge surface 82a efficiently.

<実施例2> 実施例2の放電装置について、図6及び図7を参照しながら説明する。   <Example 2> The discharge apparatus of Example 2 is demonstrated referring FIG.6 and FIG.7.

実施例2の放電装置は、実施例1と略同様に構成されている。以下では、実施例1との相違点を中心に説明し、実施例1と同様の構成部分には同じ符号を用いる。   The discharge device of the second embodiment is configured in substantially the same manner as the first embodiment. Below, it demonstrates centering on difference with Example 1, and the same code | symbol is used for the component similar to Example 1. FIG.

図6の縦断面図に示すように、実施例2の放電装置のロール電極10aは、実施例1のロール電極10と同様に、外面が誘電体14で覆われた周壁12及び側壁28,38と、内部周壁50及び内部側壁52,54との間に、密閉空間51,53,55が形成されている。側壁28,38及び内部側壁52,54が固定されている軸部20a,30aには、密閉空間53,55に連通する接続穴26,34が形成されている。軸部20a,30aは、筒部材36aの両端にそれぞれ固定されている。   As shown in the longitudinal sectional view of FIG. 6, the roll electrode 10 a of the discharge device of Example 2 is similar to the roll electrode 10 of Example 1 in that the peripheral wall 12 and the side walls 28 and 38 whose outer surfaces are covered with the dielectric 14. Between the inner peripheral wall 50 and the inner side walls 52, 54, sealed spaces 51, 53, 55 are formed. Connection holes 26 and 34 communicating with the sealed spaces 53 and 55 are formed in the shaft portions 20a and 30a to which the side walls 28 and 38 and the inner side walls 52 and 54 are fixed. The shaft portions 20a and 30a are fixed to both ends of the cylindrical member 36a, respectively.

実施例1と異なり、軸部20a,30aに、それぞれ、外側端面から中間位置まで軸方向に延在する中心穴22a,32aが形成されている。中心穴22a,32aは、軸部20a,30aの中間位置において、接続穴26,34に連通している。   Unlike the first embodiment, center holes 22a and 32a extending in the axial direction from the outer end face to the intermediate position are formed in the shaft portions 20a and 30a, respectively. The center holes 22a and 32a communicate with the connection holes 26 and 34 at an intermediate position between the shaft portions 20a and 30a.

矢印43a,45aで示すように、一方の軸部20a側から冷媒が供給され、他方の軸部30a側から冷媒が排出される。すなわち、冷媒は、順に、軸部20aの中心穴32a、軸部20aの接続穴26、側壁28と内部側壁52との間の密閉空間53、周壁12と内部周壁50との間の密閉空間51、側壁38と内部側壁54との間の密閉空間55、軸部30aの接続穴34、軸部30aの中心穴32aを通る。   As indicated by arrows 43a and 45a, the refrigerant is supplied from one shaft portion 20a side, and the refrigerant is discharged from the other shaft portion 30a side. That is, the refrigerant is, in order, the center hole 32a of the shaft portion 20a, the connection hole 26 of the shaft portion 20a, the sealed space 53 between the side wall 28 and the inner side wall 52, and the sealed space 51 between the peripheral wall 12 and the inner peripheral wall 50. , It passes through the sealed space 55 between the side wall 38 and the inner side wall 54, the connection hole 34 of the shaft portion 30a, and the center hole 32a of the shaft portion 30a.

なお、ロール電極10aは、実施例1の内補強部材や外補強部材を省いて構成を簡略化しているが、内補強部材や外補強部材を設けても構わない。   In addition, although the roll electrode 10a has simplified the structure by omitting the inner reinforcing member and the outer reinforcing member of the first embodiment, an inner reinforcing member and an outer reinforcing member may be provided.

実施例2の放電装置100は、図7の構成図に示すように、ケーシング102内に、巻き出しロール106、巻き取りロール108、ロール電極10a、固定電極160が配置されている。固定電極160は、ロール電極10aの下に配置され、ロール電極10aの外周面111の下部との間に隙間(以下、「放電空間118」という。)が形成されている。   As shown in the configuration diagram of FIG. 7, the discharge device 100 according to the second embodiment includes a winding roll 106, a winding roll 108, a roll electrode 10 a, and a fixed electrode 160 in a casing 102. The fixed electrode 160 is disposed under the roll electrode 10a, and a gap (hereinafter referred to as “discharge space 118”) is formed between the fixed electrode 160 and the lower portion of the outer peripheral surface 111 of the roll electrode 10a.

固定電極160にはガス配管170が接続され、ガス供給部172から供給された処理ガスが、ロール電極10aの外周面の下部に対向する面162に形成された開口(図示せず)から放電空間118に供給されるようになっている。処理ガスは、ケーシング102の排気口104から回収される。   A gas pipe 170 is connected to the fixed electrode 160, and the processing gas supplied from the gas supply unit 172 is discharged into the discharge space from an opening (not shown) formed on the surface 162 facing the lower portion of the outer peripheral surface of the roll electrode 10a. 118 is supplied. The processing gas is recovered from the exhaust port 104 of the casing 102.

ロール電極10aは接地されている。固定電極160は電源164に接続され、電圧が印加される。これによって、放電空間118内においてプラズマ放電が発生し、処理ガスがプラズマ化する。   The roll electrode 10a is grounded. The fixed electrode 160 is connected to a power source 164 and a voltage is applied. As a result, plasma discharge is generated in the discharge space 118, and the processing gas is turned into plasma.

シート状の被処理物101は、巻き出しロール106から巻き取りロール108に巻き取られる途中に、ロール電極10aの外周面111の下部に沿って移動し、放電空間118を通過する。このときに、被処理物101の表面が、プラズマ化した処理ガス(現にプラズマ化している処理ガスであっても、プラズマを経て活性化した処理ガスであってもよい。)に接触することによって、プラズマ処理される。   The sheet-like workpiece 101 moves along the lower part of the outer peripheral surface 111 of the roll electrode 10 a and passes through the discharge space 118 while being wound around the winding roll 108 from the winding roll 106. At this time, the surface of the workpiece 101 is brought into contact with a plasma processing gas (which may be a plasma processing gas that is actually plasma or a processing gas activated through plasma). Plasma treatment.

ロール電極10aの両端の軸部20a,30aの中心穴22a,32aには、冷媒を供給・排出する冷媒配管180がそれぞれ接続されている。なお、冷媒配管180は、1本のみを図示しているが、実際には複数本である。   Refrigerant pipes 180 for supplying and discharging refrigerant are connected to the center holes 22a and 32a of the shaft portions 20a and 30a at both ends of the roll electrode 10a, respectively. In addition, although only one refrigerant pipe 180 is illustrated, there are actually a plurality of refrigerant pipes 180.

ロール電極10aに供給された冷媒は、供給量が少なくない場合でも、必ず密閉空間の下部には配置される。また、密閉空間に配置された冷媒は、相対的に低温で高密度の冷媒は下に、相対的に高温で低密度の冷媒は上に分布する傾向がある。したがって、固定電極160をロール電極10aの下に設けると、放電によって発熱するロール電極10aの下部を効率よく冷却することができる。   The refrigerant supplied to the roll electrode 10a is always arranged below the sealed space even when the supply amount is not small. Moreover, the refrigerant | coolant arrange | positioned in sealed space tends to distribute a relatively low temperature and high density refrigerant | coolant below, and a relatively high temperature and low density refrigerant | coolant upward. Therefore, when the fixed electrode 160 is provided under the roll electrode 10a, the lower part of the roll electrode 10a that generates heat by discharge can be efficiently cooled.

<まとめ> 以上に説明したように、電極本体の内部に内側部材を配置して密閉空間を形成し、この密閉空間に冷媒を流すことによって、冷却したい放電面付近に冷媒の全部又は大部分を供給し、冷媒の利用率を高めて冷媒供給量を減らし、電極の冷却を効率よく行うことができる。   <Summary> As described above, an inner member is disposed inside the electrode body to form a sealed space, and the coolant is caused to flow in the sealed space, whereby all or most of the coolant is placed near the discharge surface to be cooled. It is possible to efficiently cool the electrodes by supplying and reducing the refrigerant supply rate by increasing the refrigerant utilization rate.

なお、本発明は、上記した実施の形態に限定されるものではなく、種々変更を加えて実施可能である。   The present invention is not limited to the above-described embodiment, and can be implemented with various modifications.

例えば、実施例では大気圧下のプラズマ処理について説明したが、本発明はこれに限るものではなく、例えば、減圧下のプラズマ処理、大気圧下のコロナ放電処理などにも、適用することができる。   For example, in the embodiments, plasma processing under atmospheric pressure has been described, but the present invention is not limited to this, and can be applied to, for example, plasma processing under reduced pressure, corona discharge processing under atmospheric pressure, and the like. .

中空空間内に配置される内側部材は、中空であれば軽量化できるので好ましいが、中実であっても構わない。   The inner member disposed in the hollow space is preferable because it can be reduced in weight if it is hollow, but it may be solid.

放電処理装置の電極の縦断面図である。(実施例1)It is a longitudinal cross-sectional view of the electrode of a discharge processing apparatus. Example 1 放電処理装置の電極の横断面図である。(実施例1)It is a cross-sectional view of the electrode of a discharge processing apparatus. Example 1 放電処理装置の要部構成図である。(実施例1)It is a principal part block diagram of a discharge processing apparatus. Example 1 放電処理装置の電極の構成図である。(変形例1)It is a block diagram of the electrode of a discharge processing apparatus. (Modification 1) 放電処理装置の電極の構成図である。(変形例2)It is a block diagram of the electrode of a discharge processing apparatus. (Modification 2) 放電処理装置の電極の縦断面図である。(実施例2)It is a longitudinal cross-sectional view of the electrode of a discharge processing apparatus. (Example 2) 放電処理装置の構成図である。(実施例2)It is a block diagram of a discharge processing apparatus. (Example 2)

符号の説明Explanation of symbols

1 被処理物
6 電極
10 ロール電極
12 周壁(電極本体)
22a 中心穴(第2冷媒路)
26 接続穴(第2冷媒路)
28 側壁(電極本体)
32 中心穴(第1冷媒路)
32a 中心穴(第1冷媒路)
34 接続穴(第1冷媒路)
37 中空穴(第1冷媒路)
38 側壁(電極本体)
42 中空穴(第1冷媒路)
44 筒状空間(第2冷媒路)
50 内部周壁(内側部材)
51 密閉空間
52 内部側壁(内側部材)
53 密閉空間
54 内部側壁(内側部材)
55 密閉空間
1 Workpiece 6 Electrode 10 Roll electrode 12 Perimeter wall (electrode body)
22a Center hole (second refrigerant path)
26 Connection hole (second refrigerant path)
28 Side wall (electrode body)
32 Center hole (first refrigerant path)
32a Center hole (first refrigerant path)
34 Connection hole (first refrigerant path)
37 Hollow hole (first refrigerant path)
38 Side wall (electrode body)
42 Hollow hole (first refrigerant path)
44 Cylindrical space (second refrigerant path)
50 Inner peripheral wall (inner member)
51 Sealed space 52 Internal side wall (inner member)
53 Sealed space 54 Internal side wall (inner member)
55 sealed space

Claims (4)

対向する電極間に電圧を印加し、該電極間で放電を発生させて被処理物を処理する放電処理装置において、
前記電極の少なくとも一つは、
放電面となる外周面を有する周壁と、該周壁の両端からそれぞれ連続する二つの側壁とを少なくとも含み、内部に中空空間が形成される電極本体と、
前記電極本体の前記中空空間内に配置され、前記電極本体の前記周壁と前記二つの側壁とに沿って間隔を設けて延在し、前記電極本体の前記周壁と前記二つの側壁との間に密閉空間を形成する内側部材と、
前記密閉空間の前記二つの側壁側にそれぞれ連通する、第1冷媒路及び第2冷媒路と、
を備えたことを特徴とする、放電処理装置。
In a discharge treatment apparatus for treating a workpiece by applying a voltage between opposing electrodes and generating a discharge between the electrodes,
At least one of the electrodes is
An electrode main body including at least a peripheral wall having an outer peripheral surface serving as a discharge surface, and two side walls each continuous from both ends of the peripheral wall, and a hollow space formed therein
The electrode body is disposed in the hollow space, extends along the peripheral wall and the two side walls of the electrode body, and is disposed between the peripheral wall and the two side walls of the electrode body. An inner member forming a sealed space;
A first refrigerant path and a second refrigerant path respectively communicating with the two side walls of the sealed space;
An electrical discharge treatment apparatus comprising:
前記第1冷媒路は、一端側が、前記電極本体の前記二つの側壁の一方に隣接して配置され、他端側が、前記電極本体の前記中空空間を通って前記二つの側壁の他方の近傍まで延在し、前記密閉空間の前記二つの側壁の前記他方側に連通し、
前記第2冷媒路は、前記電極本体の前記二つの側壁の前記一方に隣接して配置され、前記密閉空間の前記二つの側壁の前記一方側に連通することを特徴とする、請求項1に記載の放電処理装置。
One end side of the first refrigerant path is disposed adjacent to one of the two side walls of the electrode body, and the other end side passes through the hollow space of the electrode body to the vicinity of the other of the two side walls. Extending and communicating with the other side of the two side walls of the sealed space,
The said 2nd refrigerant path is arrange | positioned adjacent to the said one of the said two side walls of the said electrode main body, and is connected to the said one side of the said two side walls of the said sealed space, The Claim 1 characterized by the above-mentioned. The discharge treatment apparatus as described.
前記電極本体の前記二つの側壁の前記一方に関して前記電極本体の前記二つの側壁の前記他方とは反対側において、前記第1冷媒路の周囲に前記第2冷媒路が配置されて二重管状であることを特徴とする、請求項2に記載の放電処理装置。   The second refrigerant path is disposed around the first refrigerant path on the side opposite to the other of the two side walls of the electrode body with respect to the one of the two side walls of the electrode body, and has a double tubular shape. The discharge treatment apparatus according to claim 2, wherein the discharge treatment apparatus is provided. 前記電極本体の前記周壁が円筒形状であり、
前記内側部材は、前記電極本体の前記周壁と同軸に配置され、円筒形状の外周面を有することを特徴とする、請求項1、2又は3に記載の放電処理装置。
The peripheral wall of the electrode body is cylindrical;
The discharge processing apparatus according to claim 1, wherein the inner member is disposed coaxially with the peripheral wall of the electrode body and has a cylindrical outer peripheral surface.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04502531A (en) * 1988-12-01 1992-05-07 マンネスマン・アクチエンゲゼルシャフト Transfer type arc discharge type plasma torch cooled by liquid
JP2000309870A (en) * 1999-04-26 2000-11-07 Sekisui Chem Co Ltd Discharge plasma treating device
JP2004143520A (en) * 2002-10-24 2004-05-20 Sony Corp Film deposition system
JP2004347778A (en) * 2003-05-21 2004-12-09 Konica Minolta Holdings Inc Optical film, polarizing plate and liquid crystal display using the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04502531A (en) * 1988-12-01 1992-05-07 マンネスマン・アクチエンゲゼルシャフト Transfer type arc discharge type plasma torch cooled by liquid
JP2000309870A (en) * 1999-04-26 2000-11-07 Sekisui Chem Co Ltd Discharge plasma treating device
JP2004143520A (en) * 2002-10-24 2004-05-20 Sony Corp Film deposition system
JP2004347778A (en) * 2003-05-21 2004-12-09 Konica Minolta Holdings Inc Optical film, polarizing plate and liquid crystal display using the same

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