JP2007196100A - Plasma type gas treatment device - Google Patents

Plasma type gas treatment device Download PDF

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Publication number
JP2007196100A
JP2007196100A JP2006015730A JP2006015730A JP2007196100A JP 2007196100 A JP2007196100 A JP 2007196100A JP 2006015730 A JP2006015730 A JP 2006015730A JP 2006015730 A JP2006015730 A JP 2006015730A JP 2007196100 A JP2007196100 A JP 2007196100A
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plasma
gas
electrode
harmful
harmful gas
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JP2006015730A
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Japanese (ja)
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Keita Tanaka
啓太 田中
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Toyo Electric Manufacturing Ltd
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Toyo Electric Manufacturing Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a plasma type gas treatment device which overcomes the difficult problems in conducting the gas treatment with plasma that the residence time of gas is not sufficiently secured by the gas treatment device composed by the flat electrode. <P>SOLUTION: In the plasma type gas treatment apparatus which removes harmful gas components by plasma, it is provided with a high voltage alternator and electrodes which are connected with the high voltage alternator and oppositely arranged wherein the electrode has a spiral shape. It removes the harmful gas components with plasma by allowing the gas containing the harmful components to pass between the electrodes. The residence time of the gas containing the harmful gas components becomes longer in constant atmosphere and the harmful gas components can be removed efficiently because the electrode has a spiral shape. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、プラズマを用いて有害ガス成分を含むガスから有害ガス成分を除去するプラズマ式ガス処理装置に関するものである。 The present invention relates to a plasma gas processing apparatus that removes harmful gas components from a gas containing harmful gas components using plasma.

有害ガスと言われるものには窒素酸化物や有機化合物などが含まれている。それらを取り除くためにさまざまな方法があり、一般的には触媒法や熱分解法などが挙げられるが、近年では大気圧プラズマを利用する方法が注目されている。この方法では大気圧プラズマ中の高エネルギー電子により有害ガス分子を直接解離・分解したり、各種ラジカル類を生成し有害ガス分子に作用させたりすることで、有害ガス成分を除去するものである。 What is said to be a toxic gas includes nitrogen oxides and organic compounds. There are various methods for removing them, and in general, a catalytic method, a thermal decomposition method, and the like can be mentioned. In recent years, a method using atmospheric pressure plasma has attracted attention. In this method, harmful gas molecules are removed by directly dissociating and decomposing harmful gas molecules by high-energy electrons in atmospheric pressure plasma, or by generating various radicals and acting on harmful gas molecules.

大気圧プラズマを利用する方法においては、交流または直流、およびパルス電圧を用いて電極間に放電を発生させ、プラズマを生成させる。このうち有害ガス成分の除去をする反応器については、円筒同軸型電極や平板電極などを利用した反応器が知られている。   In the method using atmospheric pressure plasma, discharge is generated between electrodes using alternating current or direct current and a pulse voltage to generate plasma. Among these, as a reactor for removing harmful gas components, a reactor using a cylindrical coaxial electrode or a flat plate electrode is known.

特許文献１は、前記の平板電極を利用したガス処理装置の一例である。特許文献１では、平板電極を利用してガスを処理する方法が開示されている。この方法の反応器構造は、交流電源を接続した電極と接地に接続した電極があり、これら多数の平板電極を一定間隔で交互に配置することで実現している。
特開２００２−１９１９６４号公報 Patent document 1 is an example of the gas processing apparatus using the said flat plate electrode. In patent document 1, the method of processing gas using a flat electrode is disclosed. The reactor structure of this method has an electrode connected to an AC power source and an electrode connected to the ground, and is realized by alternately arranging a large number of these plate electrodes at regular intervals.
JP 2002-191964 A

解決しようとする問題点は、一定空間内において有害ガス成分を含むガスの滞留時間が十分に確保できず、高効率に有害ガス成分の除去を作用させることが困難な点である。   The problem to be solved is that the residence time of the gas containing the harmful gas component cannot be sufficiently secured in the fixed space, and it is difficult to effectively remove the harmful gas component.

請求項１の発明は、プラズマにより有害ガス成分を除去するプラズマ式ガス処理装置において、高電圧交流電源と、該高電圧交流電源に接続され対向配置された電極を備え、該電極は螺旋形状であり、前記電極間に有害ガス成分を含むガスを通過させて、該有害ガス成分をプラズマにて除去することを特徴とする。 The invention of claim 1 is a plasma type gas processing apparatus for removing harmful gas components by plasma, comprising a high-voltage AC power source and an electrode connected to and opposed to the high-voltage AC power source, the electrode having a spiral shape. And a gas containing a harmful gas component is passed between the electrodes, and the harmful gas component is removed by plasma.

請求項２の発明は、プラズマにより有害ガス成分を除去するプラズマ式ガス処理装置において、高電圧パルス電源と、該高電圧パルス電源に接続され対向配置された電極を備え、該電極は螺旋形状であり、前記電極間に有害ガス成分を含むガスを通過させて、該有害ガス成分をプラズマにて除去することを特徴とする。 According to a second aspect of the present invention, there is provided a plasma type gas processing apparatus for removing harmful gas components by plasma, comprising a high voltage pulse power source and an electrode connected to the high voltage pulse power source so as to face each other, the electrode having a spiral shape. And a gas containing a harmful gas component is passed between the electrodes, and the harmful gas component is removed by plasma.

本発明は、プラズマ式ガス処理装置の電極を螺旋形状にすることで、一定空間内での有害ガス成分を含むガスの滞留時間が長くなり、高効率に有害ガス成分の除去ができるという利点がある。   The present invention has an advantage that the residence time of the gas containing the harmful gas component in the fixed space is prolonged by making the electrode of the plasma type gas processing apparatus spiral, and the harmful gas component can be removed with high efficiency. is there.

高効率に有害ガスを含むガスを除去するという目的を、プラズマ式ガス処理装置の電極を螺旋形状にするという、簡便な方法で実現した。   The purpose of removing the gas containing harmful gas with high efficiency was realized by a simple method in which the electrode of the plasma type gas processing apparatus was formed in a spiral shape.

図１はプラズマ式ガス処理装置の構成を示す図である。
以下、図１について説明する。 FIG. 1 is a diagram showing a configuration of a plasma type gas processing apparatus.
Hereinafter, FIG. 1 will be described.

図１のプラズマ式ガス処理装置は、円柱型絶縁物１と円筒型絶縁物２により、円筒同軸型反応器を構成し、円柱型絶縁物１と円筒型絶縁物２の空間に螺旋形状の第１螺旋電極３と第２螺旋電極４を一定間隔おいて配置することで実現できる。有害ガス成分を含むガスはガスフロー５に従って流す。高圧交流電源６は第１螺旋電極３と第２螺旋電極４に接続し、第２螺旋電極４は接地７に接続する。高圧交流電源６によって高電圧を印加すると、第１螺旋電極３と第２螺旋電極４の間で放電現象が起きてプラズマを生成し、有害ガス成分を除去する。以上の実施例は請求項１のガス処理装置であり、高圧交流電源７を高圧パルス電源に置き換えると、請求項２のガス処理装置を実現できる。 The plasma type gas processing apparatus of FIG. 1 comprises a cylindrical coaxial reactor by a columnar insulator 1 and a cylindrical insulator 2, and a spiral-shaped first reactor is formed in the space between the columnar insulator 1 and the cylindrical insulator 2. This can be realized by arranging the first spiral electrode 3 and the second spiral electrode 4 at a constant interval. A gas containing harmful gas components is allowed to flow according to the gas flow 5. The high-voltage AC power source 6 is connected to the first spiral electrode 3 and the second spiral electrode 4, and the second spiral electrode 4 is connected to the ground 7. When a high voltage is applied by the high-voltage AC power source 6, a discharge phenomenon occurs between the first spiral electrode 3 and the second spiral electrode 4 to generate plasma and remove harmful gas components. The above embodiment is the gas processing apparatus according to claim 1, and the gas processing apparatus according to claim 2 can be realized by replacing the high-voltage AC power supply 7 with a high-voltage pulse power supply.

プラズマ式ガス処理装置の電極を螺旋形状とすることによって、有害ガスの滞留時間が長くなり、また有害ガスにプラズマが作用する時間も長くなるので、一定空間内においての高効率ガス処理装置を実現でき実用上多いに有用である。   By making the electrode of the plasma type gas treatment device into a spiral shape, the residence time of harmful gas becomes longer, and the time for plasma to act on the harmful gas also becomes longer, realizing a highly efficient gas treatment device in a fixed space And practically useful.

本発明のプラズマ式ガス処理装置の実施例を説明した図である。（実施例１）It is the figure explaining the Example of the plasma type gas processing apparatus of this invention. Example 1

符号の説明Explanation of symbols

１ 円柱型絶縁物
２ 円筒型絶縁物
３ 第１螺旋電極
４ 第２螺旋電極
５ ガスフロー
６ 高圧交流電源
７ 接地
DESCRIPTION OF SYMBOLS 1 Cylindrical insulator 2 Cylindrical insulator 3 1st spiral electrode 4 2nd spiral electrode 5 Gas flow 6 High voltage alternating current power supply 7 Grounding

Claims (2)

プラズマにより有害ガス成分を除去するプラズマ式ガス処理装置において、高電圧交流電源と、該高電圧交流電源に接続され対向配置された電極を備え、該電極は螺旋形状であり、前記電極間に有害ガス成分を含むガスを通過させて、該有害ガス成分をプラズマにて除去することを特徴とするプラズマ式ガス処理装置。 A plasma-type gas processing apparatus that removes harmful gas components by plasma, comprising: a high-voltage AC power source; and an electrode connected to and opposed to the high-voltage AC power source, the electrode having a spiral shape, and harmful between the electrodes A plasma-type gas processing apparatus, wherein a gas containing a gas component is passed and the harmful gas component is removed by plasma. プラズマにより有害ガス成分を除去するプラズマ式ガス処理装置において、高電圧パルス電源と、該高電圧パルス電源に接続され対向配置された電極を備え、該電極は螺旋形状であり、前記電極間に有害ガス成分を含むガスを通過させて、該有害ガス成分をプラズマにて除去することを特徴とするプラズマ式ガス処理装置。 A plasma-type gas processing apparatus that removes harmful gas components by plasma, comprising a high-voltage pulse power source and electrodes that are connected to and opposed to the high-voltage pulse power source, the electrodes having a spiral shape, and harmful between the electrodes A plasma-type gas processing apparatus, wherein a gas containing a gas component is passed and the harmful gas component is removed by plasma.
JP2006015730A 2006-01-25 2006-01-25 Plasma type gas treatment device Pending JP2007196100A (en)

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100822860B1 (en) * 2007-08-24 2008-04-16 주식회사 다원시스 Apparatus for plasma reaction
EP2434112A1 (en) * 2009-05-19 2012-03-28 Utsunomiya University Device and method for combusting particulate substances
WO2013130149A2 (en) * 2011-12-02 2013-09-06 Old Dominion University Research Foundation Gas treatment using surface plasma and devices therefrom
KR101374627B1 (en) * 2012-02-20 2014-03-19 재단법인 철원플라즈마 산업기술연구원 Apparatus for Plasma Processing
CN106731831A (en) * 2016-12-30 2017-05-31 中船动力研究院有限公司 A kind of low temperature plasma pre-oxidizes joint SCR desulphurization denitration noise reduction dedusting set composites
CN108613201A (en) * 2016-12-09 2018-10-02 韩国三重核心株式会社 Plasma wash mill with barrier rib
CN108990248A (en) * 2018-10-11 2018-12-11 南京苏曼等离子科技有限公司 A kind of plasma producing apparatus and its application
CN113171673A (en) * 2021-05-27 2021-07-27 长江师范学院 Ship tail gas treatment device based on plasma ionization

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100822860B1 (en) * 2007-08-24 2008-04-16 주식회사 다원시스 Apparatus for plasma reaction
EP2434112A1 (en) * 2009-05-19 2012-03-28 Utsunomiya University Device and method for combusting particulate substances
EP2434112A4 (en) * 2009-05-19 2014-10-22 Univ Utsunomiya Device and method for combusting particulate substances
WO2013130149A2 (en) * 2011-12-02 2013-09-06 Old Dominion University Research Foundation Gas treatment using surface plasma and devices therefrom
WO2013130149A3 (en) * 2011-12-02 2013-11-14 Old Dominion University Research Foundation Gas treatment using surface plasma and devices therefrom
KR101374627B1 (en) * 2012-02-20 2014-03-19 재단법인 철원플라즈마 산업기술연구원 Apparatus for Plasma Processing
CN108613201A (en) * 2016-12-09 2018-10-02 韩国三重核心株式会社 Plasma wash mill with barrier rib
CN108613201B (en) * 2016-12-09 2020-06-12 韩国三重核心株式会社 Plasma washing device with barrier wall
CN106731831A (en) * 2016-12-30 2017-05-31 中船动力研究院有限公司 A kind of low temperature plasma pre-oxidizes joint SCR desulphurization denitration noise reduction dedusting set composites
CN108990248A (en) * 2018-10-11 2018-12-11 南京苏曼等离子科技有限公司 A kind of plasma producing apparatus and its application
CN108990248B (en) * 2018-10-11 2024-03-26 南京苏曼等离子科技有限公司 Plasma generating device and application thereof
CN113171673A (en) * 2021-05-27 2021-07-27 长江师范学院 Ship tail gas treatment device based on plasma ionization

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