JP2007165653A - Method and device for removing bubble - Google Patents

Method and device for removing bubble Download PDF

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JP2007165653A
JP2007165653A JP2005360871A JP2005360871A JP2007165653A JP 2007165653 A JP2007165653 A JP 2007165653A JP 2005360871 A JP2005360871 A JP 2005360871A JP 2005360871 A JP2005360871 A JP 2005360871A JP 2007165653 A JP2007165653 A JP 2007165653A
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liquid
cylindrical container
flow
opening
bubbles
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Shunsuke Nonogami
俊輔 野々上
Tetsuya Nakamura
哲也 中村
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SES Co Ltd
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SES Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of removing bubbles which can separate large and small air bubbles efficiently by making the flow velocity of a fluid change compulsorily within a container, and to provide a device for removing bubbles with structure capable of easy materialization of this method and miniaturization. <P>SOLUTION: The method includes a step (1) of surfacing and removing big air bubbles in the fluid by supplying the fluid containing large and small air bubbles through a comparatively long passage, a step (2) of attenuating the flow velocity of a fluid supplied to the comparatively long passage by an attenuation means, and a step (3) of surfacing and removing small air bubbles in the fluid by maintaining the flow velocity by which a predetermined time attenuation is carried out in the fluid whose flow velocity is attenuated. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、液体に混じった気泡を効率的に分離できる気泡除去方法及び気泡除去装置に関し、特に半導体デバイス製造工程において半導体ウェーハを薬液や純水等の処理液で処理する基板処理システムに組み込まれて処理液に混じった気泡を除去するのに好適な気泡除去方法及び気泡除去装置に関するものである。   The present invention relates to a bubble removal method and a bubble removal apparatus that can efficiently separate bubbles mixed in a liquid, and is particularly incorporated in a substrate processing system for processing a semiconductor wafer with a processing solution such as a chemical solution or pure water in a semiconductor device manufacturing process. The present invention relates to a bubble removal method and a bubble removal apparatus suitable for removing bubbles mixed in a processing solution.

気泡除去装置が組み込まれる一般的なウェーハ等の基板処理システム２０は、図６に示すように、ウェーハ等の基板を複数枚収容して薬液及び純水等の処理液で処理する基板処理槽（以下、処理槽という）２１と、この処理槽２１から溢液する処理液を回収・貯留する循環タンク２２と、この循環タンク２２に回収された処理液から塵等の不純物を除去するフィルタＦと、処理液を給送するポンプＰとを備え、これらの処理槽２１、循環タンク２２、ポンプＰ及びフィルタＦは、それぞれ配管で接続されて循環経路が形成されたシステムとなっている。この循環経路には、また気泡除去装置２５、流量計２４及び各種制御バルブが連結されて、処理液に混じった気泡等を除去して処理槽１へ再び供給するようになっている（特許文献１参照）。   As shown in FIG. 6, a general substrate processing system 20 such as a wafer in which a bubble removing device is incorporated includes a substrate processing tank (multiple substrates such as a wafer and processing with a processing solution such as a chemical solution and pure water). (Hereinafter referred to as processing tank) 21, a circulation tank 22 that collects and stores the processing liquid overflowing from the processing tank 21, and a filter F that removes impurities such as dust from the processing liquid collected in the circulation tank 22, The processing tank 21, the circulation tank 22, the pump P, and the filter F are connected by pipes to form a circulation path. A bubble removing device 25, a flow meter 24, and various control valves are connected to the circulation path to remove bubbles mixed in the processing liquid and supply the processing tank 1 again (Patent Document). 1).

この基板処理システム２０の気泡除去装置２５は、図７に示すように、内部に円筒状空間２７、逆円錐形状空間２８及び小円筒状空間２９が上下に連接して形成された筒状容器２６と、円筒状空間２７の上部開口を覆う蓋体３３とを有し、これらは合成樹脂材料又はステンレス材料で形成されている。そして、筒状容器２６の円筒状空間２７及び小円筒状空間２９には、流入口３０及び流出口３１が形成されるとともに、逆円錐形状空間２８及び小円筒状空間２９の中央部に中心軸３２が配設されている。また蓋体３３には、筒状容器２６内の圧力が所定値になったときに開放される圧力弁が装着されて、この蓋体３３で容器の上部開口が閉鎖された構成となっている。
この気泡除去装置は、流入口３０から液体、例えば洗浄液が供給されると、供給された洗浄液はそれぞれの空間２７、２８、２９内を旋回しながら下降し、この下降中に洗浄液に混じっていた小さな気泡が練り込まれて大きな気泡が形成されて、所定太さの中心軸３２に沿って上昇し、円筒状空間２７の液面と蓋体との間に蓄積され、所定量の気泡が蓋体との間に蓄積されると、圧力が高まって圧力弁が開放されて気泡が装置外へ排出され、一方、気泡が除去された洗浄液は、底部の流出口３１から排出されるようになっている。 As shown in FIG. 7, a bubble removing device 25 of the substrate processing system 20 includes a cylindrical container 26 in which a cylindrical space 27, an inverted conical space 28, and a small cylindrical space 29 are connected in the vertical direction. And a lid 33 that covers the upper opening of the cylindrical space 27, and these are formed of a synthetic resin material or a stainless steel material. An inflow port 30 and an outflow port 31 are formed in the cylindrical space 27 and the small cylindrical space 29 of the cylindrical container 26, and a central axis is formed at the center of the inverted conical space 28 and the small cylindrical space 29. 32 is disposed. The lid 33 is equipped with a pressure valve that is opened when the pressure in the cylindrical container 26 reaches a predetermined value, and the lid 33 closes the upper opening of the container. .
In the bubble removing device, when a liquid, for example, a cleaning liquid is supplied from the inlet 30, the supplied cleaning liquid descends while rotating in the spaces 27, 28, and 29, and is mixed with the cleaning liquid during the descending. Small bubbles are kneaded to form large bubbles, which rise along the central axis 32 of a predetermined thickness, accumulate between the liquid surface of the cylindrical space 27 and the lid, and a predetermined amount of bubbles When accumulated with the body, the pressure increases, the pressure valve is opened, and the bubbles are discharged out of the apparatus. On the other hand, the cleaning liquid from which the bubbles are removed is discharged from the outlet 31 at the bottom. ing.

また、フィルタを使用した気泡除去装置も知られている。この気泡除去装置は、一端が開口し他端が閉鎖された筒状容器に、一端が開口し他端が閉鎖された筒状体からなる濾過材を収納し、筒状容器の内周壁面と筒状濾過材の外周壁面間に洗浄液を流入させて、洗浄液を濾過材で濾過して排出させるとともに、筒状容器及び筒状濾過材間の端部開口の隙間に、一対の第１、第２排気口を設けてこれらの排気口から洗浄液に含まれる気泡を排出させるものである（例えば下記特許文献２参照）。   A bubble removing device using a filter is also known. This bubble removing device stores a filter medium made of a cylindrical body having one end opened and the other end closed, and a cylindrical body having one end opened and the other end closed. A cleaning liquid is caused to flow between the outer peripheral wall surfaces of the cylindrical filter medium, the cleaning liquid is filtered and discharged by the filter medium, and a pair of first, first, and second gaps are formed in the gap between the cylindrical container and the cylindrical filter medium. Two exhaust ports are provided to discharge bubbles contained in the cleaning liquid from these exhaust ports (see, for example, Patent Document 2 below).

特開２００２−１５１４５８号公報（図２、図５、段落〔００１５〕〜〔００２２〕）JP 2002-151458 A (FIG. 2, FIG. 5, paragraphs [0015] to [0022]) 特開２０００−３３３４７号公報（図３、段落〔００２６〕〜〔００３１〕）JP 2000-33347 A (FIG. 3, paragraphs [0026] to [0031])

上記特許文献１に記載された気泡除去装置２５は、筒状容器２６の内部に円筒状空間２７、逆円錐形状空間２８及び小円筒状空間２９の３つの空間を形成して、容器上方の流入口３０から液体を流入して下方の流出口３１から排出する過程で液体に混じった気泡を分離して液面に蓄積し、蓄積された気泡の圧力で圧力弁を開放させて気泡を装置外へ放出させるようになっている。   The bubble removing device 25 described in Patent Document 1 forms three spaces, a cylindrical space 27, an inverted conical space 28, and a small cylindrical space 29, inside the cylindrical container 26, so that the flow above the container In the process of injecting liquid from the inlet 30 and discharging it from the lower outlet 31, bubbles mixed with the liquid are separated and accumulated on the liquid surface, and the pressure valve is opened by the pressure of the accumulated bubbles to remove the bubbles from the apparatus. To be released.

しかしながら、筒状容器２６内は、３つの空間、すなわち円筒状空間２７、逆円錐形状空間２８及び小円筒状空間２９を形成しなければならないので、容器形状が複雑で作製が難しくなっている。また、液体に混じった気泡は、上方の空間から下方の空間へ旋回される過程で液体から分離されるので、特に上方の円筒状空間が形成される縦方向の長さが長くなり、また、小さい気泡は逆円錐形状空間２８及び小円筒状空間２９において練り込んで気泡を大きくし、中心軸３２に沿って上昇させるので、全体として気泡の分離経路が長くなり、結果として筒状容器が大型になっている。処理流量が小さければ小型化できるが、修理流量を減らすことはできないので小型化が難しい。このように容器が大型化すると、既存の基板処理装置等の循環室に組み込むことができなくなり、組み込むためには基板処理装置全体の改造等が必要となる。更に、圧力弁を必要としていることから、蓋体の構造が複雑になっている。更にまた、筒状容器及び蓋体は、合成樹脂材料で作製されるので、流入される液体として強酸であり高温の薬液を使用すると、筒状容器２６に熱変形が起る恐れがある。ステンレス材の場合でも強酸のために使用することができない。   However, since the inside of the cylindrical container 26 has to form three spaces, that is, a cylindrical space 27, an inverted conical space 28, and a small cylindrical space 29, the container shape is complicated and difficult to manufacture. Further, since the bubbles mixed with the liquid are separated from the liquid in the process of being swung from the upper space to the lower space, the length in the vertical direction in which the upper cylindrical space is formed is particularly long. Since the small bubbles are kneaded in the inverted conical space 28 and the small cylindrical space 29 to increase the bubbles and rise along the central axis 32, the bubble separation path becomes longer as a whole, resulting in a large cylindrical container. It has become. If the processing flow rate is small, the size can be reduced, but the repair flow rate cannot be reduced, so that downsizing is difficult. When the container is increased in size as described above, it cannot be incorporated into a circulation chamber of an existing substrate processing apparatus or the like, and in order to incorporate it, modification of the entire substrate processing apparatus is required. Furthermore, since the pressure valve is required, the structure of the lid is complicated. Furthermore, since the cylindrical container and the lid are made of a synthetic resin material, there is a risk of thermal deformation of the cylindrical container 26 when a strong acid is used as the inflowing liquid and a high temperature chemical is used. Even stainless steel cannot be used due to strong acid.

また、上記特許文献２に記載された気泡分離装置は、筒状濾過材を使用しているので上記の気泡分離装置のような圧力弁が不要になるが、一方でこの濾過材は定期的な交換が必要なためメンテナンスが面倒でコスト高になる。また、容器及び濾過材は上記特許文献１の場合と同様に高温の薬液の使用に耐えられるものではない。高流量の場合には大きな装置となってしまい処理装置内に組み込むことが困難になる。   Moreover, since the bubble separation apparatus described in the said patent document 2 uses the cylindrical filter medium, the pressure valve like the said bubble separation apparatus becomes unnecessary, On the other hand, this filter medium is periodic. Maintenance is cumbersome and expensive because replacement is required. Further, the container and the filter medium cannot withstand the use of a high-temperature chemical solution as in the case of Patent Document 1. When the flow rate is high, the apparatus becomes large and difficult to incorporate in the processing apparatus.

本願の発明者はこのような従来技術に鑑み、気泡の大小と流速との関係に着目し、大きな気泡は流速が速くとも簡単に液体から飛び出し分離されるが、小さな気泡は流速が速いと分離され難く、流速を遅くすれば分離され易くなることから、容器内で流速を強制的に減速すれば小容積の容器でも小さい気泡を簡単に分離できることを見出して本発明を完成するに至ったものである。   In view of such conventional technology, the inventor of the present application pays attention to the relationship between the size of bubbles and the flow velocity, and large bubbles are easily ejected from the liquid even if the flow velocity is high, but small bubbles are separated when the flow velocity is high. Since it becomes difficult to separate if the flow rate is slow, it has been found that small bubbles can be easily separated even in a small volume container by forcibly decelerating the flow rate in the container, and the present invention has been completed. It is.

すなわち本発明の目的は、容器内で強制的に液体の流速を変更させることにより、大小の気泡を効率よく分離できる気泡除去方法、及びこの方法を実現できる構造が簡単で小型化が可能な気泡除去装置を提供することにある。   That is, an object of the present invention is to provide a bubble removal method capable of efficiently separating large and small bubbles by forcibly changing the flow rate of the liquid in the container, and a bubble that has a simple structure and can be miniaturized. It is to provide a removal device.

上記目的を達成するために、本願の請求項１に記載の気泡除去方法の発明は、以下の（１）〜（３）の工程からなることを特徴とする。
（１）大小の気泡を含有する液体を比較的長い流路に供給することで前記液体内の大きな気泡を液面に浮上させて除去する工程。
（２）前記比較的長い流路に供給された液体の流速を減衰手段により減衰させる工程。
（３）前記流速が減衰された液体を所定時間減衰された流速を維持させることにより、前記液体内の小さな気泡を液面に浮上させて除去する工程。 In order to achieve the above object, the bubble removal method according to claim 1 of the present application is characterized by comprising the following steps (1) to (3).
(1) A step of floating and removing large bubbles in the liquid by supplying a liquid containing large and small bubbles to a relatively long channel.
(2) A step of attenuating the flow rate of the liquid supplied to the relatively long flow path by the attenuating means.
(3) A step of removing small bubbles in the liquid by floating on the liquid surface by maintaining the liquid with the flow rate attenuated for a predetermined time.

また、請求項２に記載の発明は、請求項１に記載の気泡除去方法において、前記（１）の工程における流路は、大径の筒状容器内を旋回する旋回流であることを特徴とする。   The invention described in claim 2 is the bubble removing method according to claim 1, wherein the flow path in the step (1) is a swirling flow swirling in a large-diameter cylindrical container. And

また、請求項３に記載の発明は、請求項１又は２に記載の気泡除去方法において、上端が開口し底部が閉鎖され前記開口の下方側壁に流入口が設けられて立設配置される前記筒状容器と、排気口を有し前記筒状容器の開口を塞ぐ蓋体と、を備え、前記筒状容器に、両端が開口し一端部に前記減衰手段を設けた中空の排液管を前記減衰手段が前記筒状容器の底部近傍に位置するように前記筒状容器の開口から挿入し、前記排液管を前記蓋体で支持するとともに該蓋体で前記筒状容器の開口が塞がれた気泡除去装置を用いて前記（１）〜（３）の各工程を実行することを特徴とする。   The invention described in claim 3 is the bubble removing method according to claim 1 or 2, wherein the upper end is open, the bottom is closed, and an inflow port is provided in a lower side wall of the opening. A cylindrical container and a lid that has an exhaust port and closes the opening of the cylindrical container, and the cylindrical container has a hollow drainage pipe that is open at both ends and provided with the damping means at one end. The damping means is inserted from the opening of the cylindrical container so as to be positioned near the bottom of the cylindrical container, the drainage pipe is supported by the lid body, and the opening of the cylindrical container is closed by the lid body. The steps (1) to (3) are performed by using a bubble removing device that has been removed.

また、請求項４に記載の発明は、請求項１〜３の何れかに記載の気泡除去方法において、前記減衰手段は前記液体の流れを遮蔽することによりその流速を減衰させる制流部材からなることを特徴とする。   According to a fourth aspect of the present invention, in the method for removing bubbles according to any one of the first to third aspects, the damping means comprises a flow control member that attenuates the flow velocity by shielding the flow of the liquid. It is characterized by that.

請求項５に記載の気泡除去装置の発明は、上端が開口し底部が閉鎖され前記開口の下方側壁に流入口が設けられて立設配置される筒状容器と、排気口を有し前記筒状容器の開口を塞ぐ蓋体と、を備えた気泡除去装置において、
前記筒状容器に、両端が開口し一端部に所定方向の液体の流れを遮る制流部材を設けた中空の排液管を前記制流部材が前記筒状容器の底部近傍に位置するように前記筒状容器の開口から挿入し、前記排液管を前記蓋体で支持するとともに該蓋体で前記筒状容器の開口を塞ぎ、前記流入口から液体を供給して、前記排液管の回りを旋回する流路を前記制流部材で遮って、液体に混じった気泡を前記排気口から放出させるとともに、気泡を取り除いた液体を前記排液管の下方の開口を通して上方の開口から排出させることを特徴とする。 The invention of a bubble removing device according to claim 5 has a cylindrical container which has an upper end opened and a bottom closed and an inflow port is provided in a lower side wall of the opening, and an exhaust port. A bubble removing device comprising a lid that closes the opening of the container,
A hollow drainage pipe provided with a flow restricting member that opens at both ends and blocks a liquid flow in a predetermined direction at one end of the cylindrical container so that the flow restricting member is positioned near the bottom of the cylindrical container. Inserting from the opening of the cylindrical container, supporting the drainage pipe with the lid, closing the opening of the cylindrical container with the lid, supplying liquid from the inlet, The flow path turning around is blocked by the flow restricting member, and bubbles mixed with the liquid are discharged from the exhaust port, and the liquid from which the bubbles are removed is discharged from the upper opening through the lower opening of the drainage pipe. It is characterized by that.

また、請求項６に記載の発明は、請求項５に記載の気泡除去装置において、前記制流部材は前記排液管の中間部より下方に設けられていることを特徴とする。   The invention described in claim 6 is the bubble removing device according to claim 5, wherein the flow restricting member is provided below an intermediate portion of the drainage pipe.

また、請求項７に記載の発明は、請求項５又は６に記載の気泡除去装置において、前記制流部材は前記排液管の中間部から下端部に向かって面積が拡大した１乃至複数枚の板状体からなり、該１乃至複数枚の板状体が前記排液管の長手方向に沿って固定されていることを特徴とする。   The invention according to claim 7 is the bubble removing device according to claim 5 or 6, wherein the flow restricting member has one or more sheets in which the area is increased from an intermediate portion to a lower end portion of the drainage pipe. The one or more plate-like bodies are fixed along the longitudinal direction of the drainage pipe.

また、請求項８に記載の発明は、請求項５又は６に記載の気泡除去装置において、前記制流部材は矩形状の１乃至複数枚の板状体からなり、該１乃至複数枚の板状体の長辺端面が前記排液管の長手方向に沿って固定されていることを特徴とする。   Further, the invention described in claim 8 is the bubble removing device according to claim 5 or 6, wherein the flow restricting member is composed of one or more rectangular plate-like bodies, and the one or more plates. The long-side end surface of the cylindrical body is fixed along the longitudinal direction of the drainage pipe.

また、請求項９に記載の発明は、請求項５に記載の気泡除去装置において、前記筒状容器の前記開口と前記流入口との間の内周壁面には、前記排液管を挿通し且つ気泡を通過させる隙間を形成した開口を有する遮流板が装着されていることを特徴とする。   The invention described in claim 9 is the bubble removing device according to claim 5, wherein the drainage pipe is inserted into an inner peripheral wall surface between the opening and the inflow port of the cylindrical container. In addition, a current shielding plate having an opening in which a gap for allowing bubbles to pass is formed.

また、請求項１０に記載の発明は、請求項５に記載の気泡除去装置において、前記蓋体の排気口は複数個形成されていることを特徴とする。   The invention described in claim 10 is the bubble removing device described in claim 5, wherein a plurality of exhaust ports of the lid are formed.

また、請求項１１に記載の発明は、請求項５〜１０の何れかに記載の気泡除去装置において、前記筒状容器、前記遮流板、前記蓋体、前記排液管及び前記制流部材は、石英で形成されていることを特徴とする。   The invention according to claim 11 is the bubble removing device according to any one of claims 5 to 10, wherein the cylindrical container, the current blocking plate, the lid, the drainage pipe, and the flow restricting member. Is made of quartz.

本発明は上記構成を備えることにより、以下に示すような優れた効果を奏する。すなわち、請求項１の発明によれば、大小の気泡を含有する液体を比較的長い、例えば水平方向の流路に供給することで液体の含有する気泡の内、浮力の大きなもの、すなわち大きな気泡はその浮力によって液体内で浮上することにより除去することができ、またこの水平方向の流路を流れる流速を減衰手段により減衰させ緩やかな流れにすることで、液体内の浮力の小さなもの、すなわち小さい気泡をも除去することができるので、効率よく液体内の気泡を除去することができる。また、この方法により気泡が除去された液体を半導体製造システムに供給するようになせば、除去された液体が緩衝材の役目をして配管内で脈動しない液体を供給できるので、基板を均一に処理することができるようになる。   By providing the above configuration, the present invention has the following excellent effects. That is, according to the first aspect of the present invention, a liquid containing large and small bubbles is supplied to a relatively long channel, for example, a horizontal flow path, so that the liquid has a large buoyancy, that is, a large bubble. Can be removed by floating in the liquid by its buoyancy, and by reducing the flow velocity flowing through this horizontal flow path by the damping means to make a gentle flow, Since even small bubbles can be removed, bubbles in the liquid can be efficiently removed. In addition, if the liquid from which bubbles are removed by this method is supplied to the semiconductor manufacturing system, the removed liquid can serve as a cushioning material and supply liquid that does not pulsate in the piping. Be able to process.

請求項２の発明によれば、比較的長い流路として筒状容器内を旋回する旋回流を採用すれば、この流路を省スペースで容易に形成でき、以って小型の装置で実現できるので半導体製造システム等への組み込みがより容易になる。   According to the second aspect of the present invention, if a swirling flow swirling in the cylindrical container is adopted as a relatively long flow path, the flow path can be easily formed in a space-saving manner, and thus can be realized with a small apparatus. Therefore, it becomes easier to incorporate into a semiconductor manufacturing system or the like.

請求項３の発明によれば、上述の各工程を比較的簡単な構造からなる装置で実現できるので製造コストを抑えることができる。   According to the invention of claim 3, since each of the above steps can be realized by an apparatus having a relatively simple structure, the manufacturing cost can be suppressed.

請求項４の発明によれば、減衰手段として液体の流路を遮蔽する制流部材を用いることで容易に液体の流速を減衰することができるようになる。ただし、減衰手段としてはこの制流部材に限らず、例えば流路の管経を変更する等の方法を用いて流速を減衰させることももちろん可能である。   According to the fourth aspect of the present invention, the flow velocity of the liquid can be easily attenuated by using the flow restricting member that shields the liquid flow path as the attenuating means. However, the attenuating means is not limited to this flow restricting member, and it is of course possible to attenuate the flow velocity by using a method such as changing the diameter of the flow path.

請求項５の発明によれば、筒状容器内に一端に制流部材が設けられた中空の排液管を制流部材が筒状容器の底部に位置するように配設することにより、流入口から供給される液体の流れを制流部材で強制的にブロックして、この流れの変更により大小の気泡を効率よく分離、すなわち、大きい気泡は流速が速い段階で分離・放出させ、小さい気泡は流速が速いと分離し難いので、液体を制流部材に衝突させてその流速を遅くするとともに下方への離れに変更することで分離・放出させる。したがって、筒状容器の容積を小さくしても大小の気泡を効率よく分離できるので、簡単な構造で気泡除去装置を小型化及び低コスト化することができ、またこの小型化により、各種処理システム、例えば半導体製造システム等の収容室を特に改造することなく簡単に組み込むことが可能となる。また、半導体製造システム等に組み込むと、処理液から気泡が取り除かれ配管内での脈動がなくなり、脈動のない処理液を処理装置に供給できるので、均一な基板処理が可能となる。   According to the invention of claim 5, by disposing a hollow drainage pipe provided with a baffle member at one end in the cylindrical container so that the baffle member is located at the bottom of the tubular container, The flow of the liquid supplied from the inlet is forcibly blocked by the flow control member, and by changing this flow, large and small bubbles are efficiently separated, that is, large bubbles are separated and released at a stage where the flow velocity is high, and small bubbles Is difficult to separate when the flow velocity is high, the liquid is made to collide with the flow restricting member to slow down the flow velocity, and to separate and release it by changing it downward. Accordingly, even if the volume of the cylindrical container is reduced, large and small bubbles can be efficiently separated, so that the bubble removing device can be reduced in size and cost with a simple structure. For example, it is possible to easily incorporate a housing chamber of a semiconductor manufacturing system or the like without any particular modification. In addition, when incorporated in a semiconductor manufacturing system or the like, bubbles are removed from the processing liquid, pulsation in the piping is eliminated, and processing liquid without pulsation can be supplied to the processing apparatus, so that uniform substrate processing can be performed.

請求項６の発明によれば、制流部材を排液管の中間部より下方に設けることにより、大きな気泡がある程度除去できてから旋回流を効率よくブロックして減速できるので、小さい気泡を効率よく分離できる。   According to the invention of claim 6, by providing the flow restricting member below the intermediate portion of the drainage pipe, the large air bubbles can be removed to some extent and the swirl flow can be efficiently blocked and decelerated. Can be separated well.

請求項７の発明によれば、制流部材を排液管の中間部から下端部に向かって面積が拡大した１乃至複数枚の板状体で形成することにより、旋回流の下降過程で徐々に減速ブロックできるので、配管と制流部材の接合部に集中してかかる力を分散することができ、より装置の寿命を延ばすことができる。また徐々に減速されるのでより大きい気泡から順に除去されるため、小さい気泡まで効率よく分離できる。   According to the seventh aspect of the present invention, the flow restricting member is formed of one or a plurality of plate-like bodies whose areas are enlarged from the intermediate portion toward the lower end portion of the drainage pipe, so that the swirl flow gradually decreases. Therefore, it is possible to disperse the force concentrated on the joint between the pipe and the flow restricting member, thereby further extending the life of the apparatus. Moreover, since it is gradually decelerated, the larger bubbles are removed in order, so that even smaller bubbles can be separated efficiently.

請求項８の発明によれば、制流部材を板状体で形成することにより、旋回流を適確にブロックして減速でき、また下降流の方向を導くことができるので小さい気泡を容易に分離できる。   According to the invention of claim 8, by forming the flow restricting member with a plate-like body, the swirling flow can be properly blocked and decelerated, and the direction of the downward flow can be guided, so that small bubbles can be easily formed. Can be separated.

請求項９の発明によれば、開口と前記流入口との間に気泡を通過させる隙間を有する遮流板を装着することにより、容器内で流速の速い液体が跳ねても遮流板で阻止されて気泡が排気口から排出されることを低減できる。また、従来技術のように圧力弁の設置が不要になる。   According to the ninth aspect of the present invention, by mounting a current shielding plate having a gap for allowing air bubbles to pass between the opening and the inlet, the current shielding plate prevents the liquid having a high flow velocity from splashing in the container. This can reduce the discharge of bubbles from the exhaust port. Further, it is not necessary to install a pressure valve as in the prior art.

請求項１０の発明によれば、例えば１つの大きな排気口を設けると、この排気口に液面から跳ねた液体が排気とともに流入する流入量が増えてしまうので、個数を増やすことで対応する方がより混入薬液を減らせるため、蓋体に少なくとも２個の排気口を設け、これらの排気口を閉鎖又は開放することにより、簡単な操作で排気量の調節が可能になる。   According to the invention of claim 10, for example, if one large exhaust port is provided, the amount of inflow of the liquid splashed from the liquid surface into the exhaust port together with the exhaust gas increases. Therefore, by providing at least two exhaust ports in the lid and closing or opening these exhaust ports, the exhaust amount can be adjusted with a simple operation.

請求項１１の発明によれば、筒状容器、遮流板、蓋体、排液管及び制流部材は、石英で形成されているので、耐熱、耐薬品性及びクリーン性を有する気泡除去装置を形成できる。   According to the eleventh aspect of the present invention, since the cylindrical container, the current blocking plate, the lid, the drainage pipe, and the flow restricting member are made of quartz, the bubble removing device having heat resistance, chemical resistance and cleanliness. Can be formed.

以下、図面を参照して本発明の最良の実施形態を説明する。但し、以下に示す実施形態は、本発明の技術思想を具体化するための気泡除去方法及び気泡除去装置を例示するものであって、本発明をこの気泡除去方法及び気泡除去装置に特定することを意図するものではなく、特許請求の範囲に含まれるその他の実施形態のものも等しく適応し得るものである。   Hereinafter, the best embodiment of the present invention will be described with reference to the drawings. However, the embodiment shown below exemplifies the bubble removing method and the bubble removing device for embodying the technical idea of the present invention, and the present invention is specified to the bubble removing method and the bubble removing device. And other embodiments within the scope of the claims are equally applicable.

図１は本発明の実施例に係る気泡除去装置が組み込まれる基板処理システムの一例を示す概略図、図２は気泡除去装置を構成する容器の外観斜視図、図３は図２の容器を一部破断した正面図、図４（ａ）は図３のＡ−Ａ線の断面図、図４（ｂ）は図３のＢ−Ｂ線の断面図、図４（ｃ）は制流部材の変形例を示す側面図、図５は図２の容器内に液体が流れる流路を模式して示した概略説明図である。   FIG. 1 is a schematic view showing an example of a substrate processing system in which a bubble removing apparatus according to an embodiment of the present invention is incorporated, FIG. 2 is an external perspective view of a container constituting the bubble removing apparatus, and FIG. 4A is a cross-sectional view taken along the line AA in FIG. 3, FIG. 4B is a cross-sectional view taken along the line BB in FIG. 3, and FIG. FIG. 5 is a schematic explanatory view schematically showing a flow path through which a liquid flows in the container of FIG.

基板処理システム１は、図１に示すように、ウェーハＷ等の基板を複数枚収容して処理液で処理する内槽２ａ及びこの内槽から溢流する処理液を収容する外槽２ｂを有する基板処理槽（以下、処理槽という）２を備え、この処理槽２の外槽２ｂと気泡除去装置８とは、その間にポンプ４、温調器５、フィルタ６及び混合器７を介在してそれぞれ配管Ｌ１で接続されている。処理槽２は、所定の大きさの収容室３に収容されて、この収容室３の上方からクリーンエアが給気され、また下部に排気口が設けられ、この排気口からエア等が排出されるようになっている。 As shown in FIG. 1, the substrate processing system 1 includes an inner tank 2a for storing a plurality of substrates such as wafers W and processing with a processing liquid, and an outer tank 2b for storing a processing liquid overflowing from the inner tank. A substrate processing tank (hereinafter referred to as a processing tank) 2 is provided, and the outer tank 2b of the processing tank 2 and the bubble removing device 8 are provided with a pump 4, a temperature controller 5, a filter 6 and a mixer 7 interposed therebetween. It is connected by a pipe L 1 respectively. The treatment tank 2 is accommodated in a storage chamber 3 of a predetermined size, clean air is supplied from above the storage chamber 3, and an exhaust port is provided in the lower part, and air or the like is discharged from the exhaust port. It has become so.

気泡除去装置８は、配管Ｌ２で処理槽２の底部に設けた処理液供給口に接続され、また、配管Ｌ３で外槽２ｂの上方開口に接続されている。この基板処理システム１では、処理槽２から排出された処理液は、ポンプ４を通過してヒータを内蔵した温調器５で所定温度にコントロールされ、次のフィルタ６で処理液に混じった塵等の不純物が除去され、続く混合器７で所定量のオゾンガスが混入されて気泡除去装置８へ供給されて、処理液に混じった気泡が取り除かれるようになっている。 Bubble removing device 8 is connected to the processing liquid supply port formed in a bottom of the processing tank 2 through a pipe L 2, also connected to the upper opening of the outer tank 2b through a pipe L 3. In this substrate processing system 1, the processing liquid discharged from the processing tank 2 passes through a pump 4, is controlled to a predetermined temperature by a temperature controller 5 having a built-in heater, and is mixed with the processing liquid by a next filter 6. In the subsequent mixer 7, a predetermined amount of ozone gas is mixed and supplied to the bubble removing device 8, so that bubbles mixed in the processing liquid are removed.

気泡除去装置８は、図２、図３に示すように、上端に開口部９ａを形成し底部９ｂが閉鎖され所定太さ及び長さを有して立設配置される筒状容器９と、両端が開口した貫通孔を内部に有し一端の側壁に所定方向の液体の流れを遮る制流部材１６が装着された中空の排出管１５と、この排液管１５を挿通する挿通孔１２１及び複数個（例えば２個）の排気口１２２、１２３を有し筒状容器９の開口部９ａを塞ぐ蓋体１２とを備えている。
この筒状容器９は、所定の管径Ｄ１及び高さＨ１を有する円筒状の筒状体であって、耐熱、耐薬品性及びクリーン性を有する材料、例えば石英で形成されている。筒状容器９を石英で形成することにより、この容器内に高温及び強酸の液体、例えば１２０℃に加熱された硫酸が流入された場合であっても容器が熱変形等を起すことがなくなる。なお、管径Ｄ１は例えば８８ｍｍ、高さＨ１は例えば２５４ｍｍである。
この筒状容器９は、上端開口部９ａから所定距離、例えば４９ｍｍ下がった箇所の側壁面に流入口９１が形成されている。この流入口９１には、短長（例えば、７７ｍｍ）の導出管１０が連結され、この導出管１０は混合器７に配管Ｌ１で接続される。また、開口部９ａと流入口９１間、例えば開口部９ａから下方へ、例えば２０ｍｍ下がった箇所の内周壁面には、遮流板１１が装着されている。この遮流板１１は、図４（ａ）に示すように、中心部に排液管１５を挿通し且つ気体を通過させることができる大きさ（例えば直径５５ｍｍ）の開口部１１ａを有して、所定の肉厚、例えば厚さ４．０ｍｍの石英で形成されている。 As shown in FIGS. 2 and 3, the bubble removing device 8 includes a cylindrical container 9 that has an opening 9 a at the upper end, the bottom 9 b is closed, and has a predetermined thickness and length. A hollow discharge pipe 15 having a through hole with both ends opened therein and a flow control member 16 that blocks the flow of liquid in a predetermined direction on the side wall of one end, and an insertion hole 12 1 through which the drain pipe 15 is inserted. And a lid body 12 having a plurality of (for example, two) exhaust ports 12 2 and 12 3 and closing the opening 9 a of the cylindrical container 9.
The cylindrical container 9 is a cylindrical tubular body having a predetermined tube diameter D 1 and a height H 1, heat is formed a material having chemical resistance and cleanliness, for example quartz. By forming the cylindrical container 9 from quartz, even when a high-temperature and strong acid liquid, for example, sulfuric acid heated to 120 ° C., flows into the container, the container does not undergo thermal deformation or the like. Note that the pipe diameter D 1 is, for example 88mm, it is the height H 1 for example 254 mm.
The cylindrical container 9, a predetermined distance from the top opening 9a, for example, the inlet 9 1 on the side wall surface of 49mm lowered position is formed. The inlet 9 1, short length (e.g., 77 mm) is connected the outlet pipe 10 of the outlet pipe 10 is connected to the mixer 7 through a pipe L 1. Moreover, between the opening 9a inlet 9 1, for example, downward from the opening 9a, the inner peripheral wall surface of the portion for example drops 20mm is shielding flux plate 11 is mounted. As shown in FIG. 4A, the current blocking plate 11 has an opening portion 11a having a size (for example, a diameter of 55 mm) through which the drainage pipe 15 can be inserted and gas can pass. , And a predetermined thickness, for example, 4.0 mm thick quartz.

蓋体１２は、中央部に排液管１５を挿通する挿通孔１２１と、この挿通孔１２１の外周囲に２個の排気口１２２、１２３とを有し、所定の肉厚、例えば厚さ４．０ｍｍの略円盤状の石英材で形成され、容器の開口部９ａを密閉する構造となっている。この蓋体１２の排気口１２２、１２３には、所定の太さ（例えば直径１０ｍｍ）及び長さ（例えば４０ｍｍ）を備える導出管１３ａ、１３ｂが融着により固定され、これらは処理槽２の外槽２ｂへ配管Ｌ３で接続される。この蓋体１２の挿通穴１２１には、排液管１５が挿通されて、この排液管１５は融着により固定される。なお、この固定の際に複数枚の支持板１４を用いて排液管１５を支持しながら固定するのが好ましい。また、蓋体１２と容器の開口部９ａとは、石英の融着により結合される。 The lid body 12, the insertion holes 12 1 through which the drain pipe 15 to the central portion, and an outer periphery to two exhaust ports 12 2, 12 3 of the insertion hole 12 1, a predetermined thickness, For example, it is formed of a substantially disc-shaped quartz material having a thickness of 4.0 mm, and has a structure that seals the opening 9a of the container. Outlet pipes 13a and 13b having a predetermined thickness (for example, a diameter of 10 mm) and a length (for example, 40 mm) are fixed to the exhaust ports 12 2 and 12 3 of the lid body 12 by fusion. It is in connection with pipe L 3 to outer tank 2b. This is insertion hole 12 1 of the lid 12, the drain pipe 15 is inserted, the drain pipe 15 is fixed by fusion. In this case, it is preferable to fix the drainage pipe 15 while supporting the drainage pipe 15 using a plurality of support plates 14. Further, the lid 12 and the opening 9a of the container are coupled by fusion of quartz.

排液管１５は、筒状容器９の高さより若干長く両端に開口部１５ａ、１５ｂを有する中空の管体からなり、石英で形成されている。詳しくは、長さは例えば３５９ｍｍ、太さは例えば直径２５ｍｍ（内径１７ｍｍ）であり、蓋体１２からの突出部分の長さが例えば１２０ｍｍとなっている。
この排液管１５の筒状容器９内に位置する一端部の側壁には、制流部材１６が装着されている。この制流部材１６は、２枚の制流板１６１、１６２からなり、各制流板は、所定の横幅Ｄ２（例えば２７．５ｍｍ）及び高さＨ２（例えば５０ｍｍ）を有する矩形状の板状体からなり、石英で形成されている。なお、本実施例においては、各制流板１６１、１６２はほぼ１８０°開いた状態で排液管１５に装着されている。ただし制流板の枚数は、１枚でも３枚以上でもよい。また、複数枚の制流板の排液管への装着角度は、等角度が好ましい。加えて、本実施例の制流部材１６は矩形状のもので作製したが、この形状に限定されず任意の形状でよい。この制流部材は排液管の中間部から下端部に向かって面積が拡大した板状体が好ましく、例えば図４（ｃ）に示すように、高さＨ'２（例えば１２５ｍｍ）、底辺の長さＤ'２（例えば１２．５ｍｍ）の矩形状の板に直角三角形状の板を継ぎ足したような制流板１６Ａ１、１６Ａ２にすることもできる。この形状にすると、容器内を流れる旋回流の下降過程で徐々に減速ブロックできるので、排液管１５と制流部材１６の接合部に集中してかかる力を分散することができる。また、徐々に旋回流が減速することでより大きい気泡から順に除去されるため、小さい気泡まで効率よく分離できる。 The drainage pipe 15 is a hollow pipe body that is slightly longer than the height of the cylindrical container 9 and has openings 15a and 15b at both ends, and is made of quartz. Specifically, the length is, for example, 359 mm, the thickness is, for example, 25 mm (inner diameter: 17 mm), and the length of the protruding portion from the lid 12 is, for example, 120 mm.
A flow control member 16 is mounted on the side wall of one end portion of the drainage pipe 15 located in the cylindrical container 9. The flow restricting member 16 includes two flow restricting plates 16 1 and 16 2 , and each flow restricting plate has a rectangular shape having a predetermined lateral width D 2 (for example, 27.5 mm) and a height H 2 (for example, 50 mm). It consists of a plate-shaped body and is made of quartz. In this embodiment, each of the flow restricting plates 16 1 and 16 2 is attached to the drainage pipe 15 in a state of being opened approximately 180 °. However, the number of the baffle plates may be one or three or more. Further, it is preferable that the mounting angles of the plurality of flow control plates to the drain pipe are equal. In addition, although the flow restricting member 16 of the present embodiment is manufactured in a rectangular shape, it is not limited to this shape and may be in an arbitrary shape. The flow restricting member is preferably a plate-like body whose area increases from the middle part to the lower end part of the drainage pipe. For example, as shown in FIG. 4 (c), the height H ′ 2 (for example, 125 mm), The current control plates 16A 1 and 16A 2 may be formed by adding a right triangle plate to a rectangular plate having a length D ′ 2 (for example, 12.5 mm). With this shape, the block can be gradually decelerated during the descending process of the swirling flow flowing in the container, so that the force applied to the drain pipe 15 and the flow restricting member 16 can be concentrated. Further, since the swirling flow is gradually decelerated, the larger bubbles are removed in order, so that even small bubbles can be efficiently separated.

気泡除去装置８の組立ては、予め蓋体１２の挿通孔１２１に既に制流部材１６が装着された排液管１５の一端を挿通し、蓋体１２に支持板１４を用いて排液管１５を固定しておく。排液管１５の固定箇所は、排液管が容器に挿入された状態で制流板１６１、１６２が容器底部と若干の隙間（例えば１５ｍｍ）が形成される箇所に選定されている。次いで、この排液管１５の一端部を筒状容器９の開口部９ａから挿入し、この蓋体１２で開口部９ａを密閉固定する。また、固定強度を高めるために制流板１６１、１６２と筒状容器９の内周壁とを融着により固定してもよい。 Assembly of the bubble removing device 8, inserted through one end of the drain pipe 15 already restricted flow member 16 into the insertion hole 12 1 is mounted in advance lid 12, drain pipe using a support plate 14 on the lid 12 15 is fixed. Fixing portion of the drain pipe 15, drain pipe is selected to place the flow restriction plate 16 1 in a state of being inserted into the container, 16 2 container bottom and a small gap (e.g., 15 mm) is formed. Next, one end of the drainage pipe 15 is inserted from the opening 9 a of the cylindrical container 9, and the opening 9 a is hermetically fixed by the lid 12. It may also be fixed by fusing the inner circumferential wall of the flow restriction plate 16 1, 16 2 and the cylindrical container 9 in order to increase the fixing strength.

筒状容器９への蓋体１２の固定により、排液管１５に設けた制流板１６１、１６２は筒状容器９の底部９ｂ付近に配設され、制流板１６１、１６２の端部が筒状容器９の内周壁に当接し、また、排液管１５の下端開口部１５ａは、筒状容器９の底壁面９ｂとの間に隙間が形成されて、この開口部１５ａから排液管１５内を通過して上方の開口部１５ｂへ送出される。このようにして組立てた気泡処理装置８は図１に示すような基板処理システム１に組み込まれる。また、本実施例は液体流量３０リットル／ｍｉｎ、気体流量２０リットル／ｍｉｎに対応している。 By fixing the lid 12 to the cylindrical container 9, the flow control plates 16 1 and 16 2 provided in the drainage pipe 15 are disposed near the bottom 9 b of the cylindrical container 9, and the current control plates 16 1 and 16 2 are disposed. The lower end opening portion 15a of the drainage pipe 15 is formed with a gap between the bottom wall surface 9b of the cylindrical container 9, and the opening portion 15a is in contact with the inner peripheral wall of the cylindrical container 9. Is passed through the drainage pipe 15 and sent to the upper opening 15b. The bubble processing apparatus 8 assembled in this way is incorporated into a substrate processing system 1 as shown in FIG. Further, this embodiment corresponds to a liquid flow rate of 30 liter / min and a gas flow rate of 20 liter / min.

次に、この気泡除去装置による気泡除去法を図５を参照して説明する。
処理槽２から排出された基板処理用の各種薬液等の処理液には、外槽２ｂから排出された状態或いは途中の混合器７でオゾンガスが混入された状態で大小の気泡が混じっている。このように気泡が混じった処理液がポンプ４により所定の圧力に加圧されて、筒状容器９の流入口９１から容器内へ給送されると、この処理液は狭い筒状容器９内に閉じ込められて容器の内壁面に沿って所定方向、例えば反時計方向へ回転する流速の速い旋回流となって排液管１５の外周囲を旋回し、この旋回流は矢印に示すように、徐々に降下して容器下方の制流板１６に衝突して下向きの流れに変更される。 Next, the bubble removal method by this bubble removal apparatus will be described with reference to FIG.
The processing liquids such as various chemicals for substrate processing discharged from the processing tank 2 are mixed with large and small bubbles in a state discharged from the outer tank 2b or a state where ozone gas is mixed in the mixer 7 in the middle. The thus treated liquid bubbles mixed is pressurized to a predetermined pressure by the pump 4 and fed through the inlet 9 1 of the tubular container 9 into the container, the treatment liquid is small cylindrical container 9 The swirl flow is a fast swirling flow confined inside and rotated in a predetermined direction along the inner wall surface of the container, for example, counterclockwise, and swirls around the drain pipe 15, and this swirl flow is indicated by an arrow. Then, it gradually descends and collides with the flow restricting plate 16 below the container, and is changed to a downward flow.

この過程において、流入口９１付近では旋回流の流速が速くなっているものの大きい気泡はこの旋回流から飛び出して液面に放出される。一方、この旋回流は、徐々に降下して制流板１６に衝突して旋回がブロックされて下向きの流れに変更される。この流れの変更の際に、制流板の裏面に小さい気泡が集まり、これらが互いに結合されて大きな気泡が形成されていることが観察された。この現象は旋回流が衝突した面と反対側面との間に圧力差が発生し、反対面すなわち裏面が負圧になることに起因しているものと推察される。
このように液面へ放出された気泡は、双方の排気口１２２、１２３から配管Ｌ３内を通り処理槽２の外槽２ｂへ供給される。また、気泡が除去された処理液は既にポンプ４により所定の圧力に加圧されているので排液管１５の下方の開口部１５ａから管内を通過して上方の開口部１５ｂを経て再び処理槽２へ送られる。もし、外槽２ｂへ供給される液体に薬液が混じっていても、外槽２ｂから再びポンプに送られて循環するので、薬液が損なわれることがない。また、除去された気体は収容室３に放出されるが、収容室３上部より供給されるクリーンエアとともに排気され装置内に留まることはない。 In this process, in the vicinity of the inlet 9 1 is larger bubbles though a flow rate of the swirling flow is faster is discharged to the liquid surface protrudes from the swirling flow. On the other hand, the swirling flow gradually descends and collides with the flow restricting plate 16, and the swirling is blocked and changed to a downward flow. It was observed that when this flow was changed, small bubbles gathered on the back surface of the baffle plate and these were joined together to form large bubbles. This phenomenon is presumed to be caused by the fact that a pressure difference is generated between the surface on which the swirling flow collides and the opposite side surface, and the opposite surface, that is, the back surface becomes negative pressure.
The bubbles are released to the liquid level as is supplied to both the exhaust port 12 2, 12 3 from the outer tank 2b of the pipe L 3 in as treatment tank 2. Further, since the processing liquid from which the bubbles have been removed has already been pressurized to a predetermined pressure by the pump 4, it passes through the pipe from the lower opening 15a of the drainage pipe 15 and again passes through the upper opening 15b to the processing tank. 2 is sent. Even if the chemical liquid is mixed in the liquid supplied to the outer tank 2b, the liquid is sent again from the outer tank 2b to the pump and circulates, so that the chemical liquid is not damaged. Further, the removed gas is released into the storage chamber 3, but is exhausted together with the clean air supplied from the upper portion of the storage chamber 3, and does not stay in the apparatus.

この気泡除去装置８によれば、筒状容器９の大きさを小型にしても液中の気泡を除去することができる。例えば、容器の大きさを従来のものと比べて、高さを約５０％、幅長（図７の円筒状空間２７に相当する箇所）を約３５％以下に減少させることができる。また、この気泡除去装置は、筒状容器、蓋体及び制流板を設けた排液管で形成できるので、構造が極めて簡単になり低コストで作製できる。更に、小型化により、各種処理システム、例えば半導体製造システム等の循環室を特に改造することなく簡単に組み込むことが可能となる。更にまた、半導体製造システム等に組み込むと、処理液から気泡が取り除かれ処理液の流れに脈動がなくなるので、基板へ均一に処理液を供給できるので均一な基板処理が可能となる。更にまた、筒状容器、蓋体及び排液管等を石英で形成することにより、耐熱、耐薬品性及びクリーン性を有する気泡除去装置を形成できる。更にまた、従来技術のように圧力弁等の可動機構がないので、故障がなく保守も極めて簡単になる。   According to the bubble removing device 8, bubbles in the liquid can be removed even if the size of the cylindrical container 9 is reduced. For example, the size of the container can be reduced to about 50% in height and the width (the portion corresponding to the cylindrical space 27 in FIG. 7) to about 35% or less compared to the conventional one. In addition, since the bubble removing device can be formed by a drainage pipe provided with a cylindrical container, a lid, and a baffle plate, the structure is extremely simple and can be manufactured at low cost. Further, the downsizing allows various processing systems, for example, a circulation chamber of a semiconductor manufacturing system or the like to be easily incorporated without any particular modification. Furthermore, when incorporated in a semiconductor manufacturing system or the like, bubbles are removed from the processing liquid and there is no pulsation in the flow of the processing liquid, so that the processing liquid can be supplied uniformly to the substrate, and uniform substrate processing becomes possible. Furthermore, by forming the cylindrical container, the lid, the drainage pipe, etc. with quartz, a bubble removing device having heat resistance, chemical resistance and cleanliness can be formed. Furthermore, since there is no movable mechanism such as a pressure valve as in the prior art, there is no failure and maintenance is extremely simple.

図１は本発明の実施例に係る気泡除去装置が組み込まれる基板処理システム一例の概要図である。FIG. 1 is a schematic diagram of an example of a substrate processing system in which a bubble removing apparatus according to an embodiment of the present invention is incorporated. 図２は気泡除去装置を構成する容器の斜視図である。FIG. 2 is a perspective view of a container constituting the bubble removing device. 図３は図２の容器を一部破断するとともに内部の管体を示した正面図である。FIG. 3 is a front view of the container shown in FIG. 図４（ａ）は図３のＡ−Ａ線の断面図、図４（ｂ）は図３のＢ−Ｂ線の断面図、図４（ｃ）は制流部材の変形例を示す側面図である。4A is a cross-sectional view taken along line AA in FIG. 3, FIG. 4B is a cross-sectional view taken along line BB in FIG. 3, and FIG. 4C is a side view showing a modification of the current control member. It is. 図５は図２の容器内に液体が流れる流路を模式して示した概略説明図である。FIG. 5 is a schematic explanatory view schematically showing a flow path through which a liquid flows in the container of FIG. 図６は従来技術の処理システムを示す模式図である。FIG. 6 is a schematic diagram showing a conventional processing system. 図７は図６の気泡分離装置を構成する容器の断面図である。FIG. 7 is a cross-sectional view of a container constituting the bubble separation device of FIG.

符号の説明Explanation of symbols

１ 基板処理システム
２ 処理槽
４ ポンプ
５ 温調器
６ フィルタ
７ 混合器
８ 気泡除去装置
９ 筒状容器
９ａ 開口部
９１ 流入口
１１ 遮流板
１２ 蓋体
１２２、１２３ 排気口
１５ 排液管
１６、１６Ａ 制流部材
DESCRIPTION OF SYMBOLS 1 Substrate processing system 2 Processing tank 4 Pump 5 Temperature controller 6 Filter 7 Mixer 8 Bubble removal device 9 Cylindrical container 9a Opening part 9 1 Inlet 11 Current shielding plate 12 Lid 12 2 , 12 3 Exhaust port 15 Drained liquid Tube 16, 16A Current control member

Claims (11)

以下の（１）〜（３）の工程からなることを特徴とする気泡除去方法。
（１）大小の気泡を含有する液体を比較的長い流路に供給することで前記液体内の大きな気泡を液面に浮上させて除去する工程。
（２）前記比較的長い流路に供給された液体の流速を減衰手段により減衰させる工程。
（３）前記流速が減衰された液体を所定時間減衰された流速を維持させることにより、前記液体内の小さな気泡を液面に浮上させて除去する工程。 A bubble removing method comprising the following steps (1) to (3):
(1) A step of floating and removing large bubbles in the liquid by supplying a liquid containing large and small bubbles to a relatively long channel.
(2) A step of attenuating the flow rate of the liquid supplied to the relatively long flow path by the attenuating means.
(3) A step of removing small bubbles in the liquid by floating on the liquid surface by maintaining the liquid with the flow rate attenuated for a predetermined time. 前記（１）の工程における流路は、大径の筒状容器内を旋回する旋回流であることを特徴とする請求項１に記載の気泡除去方法。   The bubble removal method according to claim 1, wherein the flow path in the step (1) is a swirl flow swirling in a large-diameter cylindrical container. 上端が開口し底部が閉鎖され前記開口の下方側壁に流入口が設けられて立設配置される前記筒状容器と、排気口を有し前記筒状容器の開口を塞ぐ蓋体と、を備え、前記筒状容器に、両端が開口し一端部に前記減衰手段を設けた中空の排液管を前記減衰手段が前記筒状容器の底部近傍に位置するように前記筒状容器の開口から挿入し、前記排液管を前記蓋体で支持するとともに該蓋体で前記筒状容器の開口が塞がれた気泡除去装置を用いて前記（１）〜（３）の各工程を実行することを特徴とする請求項１又は２に記載の気泡除去方法。   The tubular container that has an upper end opened, the bottom is closed, and an inflow port is provided in a lower side wall of the opening, and a lid body that has an exhaust port and closes the opening of the tubular container. A hollow drainage pipe having both ends opened and provided with the damping means at one end is inserted into the cylindrical container from the opening of the cylindrical container so that the damping means is located near the bottom of the cylindrical container. Then, the steps (1) to (3) are performed using a bubble removing device in which the drainage pipe is supported by the lid and the opening of the cylindrical container is closed by the lid. The method for removing bubbles according to claim 1 or 2. 前記減衰手段は前記液体の流れを遮蔽することによりその流速を減衰させる制流部材からなることを特徴とする請求項１〜３の何れかに記載の気泡除去方法。   The bubble removing method according to any one of claims 1 to 3, wherein the attenuating means comprises a flow restricting member that attenuates the flow velocity by shielding the flow of the liquid. 上端が開口し底部が閉鎖され前記開口の下方側壁に流入口が設けられて立設配置される筒状容器と、排気口を有し前記筒状容器の開口を塞ぐ蓋体と、を備えた気泡除去装置において、
前記筒状容器に、両端が開口し一端部に所定方向の液体の流れを遮る制流部材を設けた中空の排液管を前記制流部材が前記筒状容器の底部近傍に位置するように前記筒状容器の開口から挿入し、前記排液管を前記蓋体で支持するとともに該蓋体で前記筒状容器の開口を塞ぎ、前記流入口から液体を供給して、前記排液管の回りを旋回する流路を前記制流部材で遮って、液体に混じった気泡を前記排気口から放出させるとともに、気泡を取り除いた液体を前記排液管の下方の開口を通して上方の開口から排出させることを特徴とする気泡除去装置。 A cylindrical container having an upper end opened and a bottom closed and an inflow port provided in a lower side wall of the opening, and a lid that has an exhaust port and closes the opening of the cylindrical container In the bubble removal device,
A hollow drainage pipe provided with a flow restricting member that opens at both ends and blocks a liquid flow in a predetermined direction at one end of the cylindrical container so that the flow restricting member is positioned near the bottom of the cylindrical container. Inserting from the opening of the cylindrical container, supporting the drainage pipe with the lid, closing the opening of the cylindrical container with the lid, supplying liquid from the inlet, The flow path turning around is blocked by the flow restricting member, and bubbles mixed with the liquid are discharged from the exhaust port, and the liquid from which the bubbles are removed is discharged from the upper opening through the lower opening of the drainage pipe. A bubble removing device characterized by that. 前記制流部材は前記排液管の中間部より下方に設けられていることを特徴とする請求項５に記載の気泡除去装置。   The bubble removing device according to claim 5, wherein the flow restricting member is provided below an intermediate portion of the drainage pipe. 前記制流部材は前記排液管の中間部から下端部に向かって面積が拡大した１乃至複数枚の板状体からなり、該１乃至複数枚の板状体が前記排液管の長手方向に沿って固定されていることを請求項５又は６に記載の気泡除去装置。   The flow restricting member is composed of one or a plurality of plate-like bodies whose areas are enlarged from the middle portion to the lower end portion of the drainage pipe, and the one or more plate-like bodies are in the longitudinal direction of the drainage pipe. The air bubble removing device according to claim 5 or 6, wherein the air bubble removing device is fixed along. 前記制流部材は矩形状の１乃至複数枚の板状体からなり、該１乃至複数枚の板状体の長辺端面が前記排液管の長手方向に沿って固定されていることを特徴とする請求項５又は６に記載の気泡除去装置。   The flow restricting member is composed of one or more rectangular plate-like bodies, and the long side end surfaces of the one or more plate-like bodies are fixed along the longitudinal direction of the drainage pipe. The bubble removing apparatus according to claim 5 or 6. 前記筒状容器の前記開口と前記流入口との間の内周壁面には、前記排液管を挿通し且つ気泡を通過させる隙間を形成した開口を有する遮流板が装着されていることを特徴とする請求項５に記載の気泡除去装置。   On the inner peripheral wall surface between the opening of the cylindrical container and the inflow port, a current blocking plate having an opening through which the drainage pipe is inserted and a gap through which bubbles pass is mounted. The bubble removing apparatus according to claim 5, wherein 前記蓋体の排気口は複数個形成されていることを特徴とする請求項５に記載の気泡除去装置。   The bubble removing device according to claim 5, wherein a plurality of exhaust ports of the lid are formed. 前記筒状容器、前記遮流板、前記蓋体、前記排液管及び前記制流部材は、石英で形成されていることを特徴とする請求項５〜１０の何れかに記載の気泡除去装置。   The bubble removing device according to any one of claims 5 to 10, wherein the cylindrical container, the current blocking plate, the lid, the drainage pipe, and the flow restricting member are made of quartz. .
JP2005360871A 2005-12-14 2005-12-14 Method and device for removing bubble Pending JP2007165653A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8361831B2 (en) 2008-12-25 2013-01-29 Dainippon Screen Mfg. Co., Ltd. Zinc oxide film forming method and apparatus
JP2014216188A (en) * 2013-04-25 2014-11-17 京セラ株式会社 Fuel cell device
KR102432895B1 (en) * 2021-10-18 2022-08-18 주식회사 지노바이오 Microfluidic Bubble Trap

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8361831B2 (en) 2008-12-25 2013-01-29 Dainippon Screen Mfg. Co., Ltd. Zinc oxide film forming method and apparatus
JP2014216188A (en) * 2013-04-25 2014-11-17 京セラ株式会社 Fuel cell device
KR102432895B1 (en) * 2021-10-18 2022-08-18 주식회사 지노바이오 Microfluidic Bubble Trap
WO2023068685A1 (en) * 2021-10-18 2023-04-27 주식회사 지노바이오 Microfluidic bubble trap

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