JP2007035917A5 - - Google Patents

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Publication number
JP2007035917A5
JP2007035917A5 JP2005216923A JP2005216923A JP2007035917A5 JP 2007035917 A5 JP2007035917 A5 JP 2007035917A5 JP 2005216923 A JP2005216923 A JP 2005216923A JP 2005216923 A JP2005216923 A JP 2005216923A JP 2007035917 A5 JP2007035917 A5 JP 2007035917A5
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JP
Japan
Prior art keywords
polishing pad
polishing
pad according
grinding
center line
Prior art date
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Application number
JP2005216923A
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Japanese (ja)
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JP4681970B2 (en
JP2007035917A (en
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Priority to JP2005216923A priority Critical patent/JP4681970B2/en
Priority claimed from JP2005216923A external-priority patent/JP4681970B2/en
Publication of JP2007035917A publication Critical patent/JP2007035917A/en
Publication of JP2007035917A5 publication Critical patent/JP2007035917A5/ja
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Publication of JP4681970B2 publication Critical patent/JP4681970B2/en
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Claims (5)

ポリウレタンを主な材料とする研磨パッドにおいて、当該研磨パッドの裏面に開口している気泡と気泡との間のエリアが中心線平均粗さＲａで２μｍ以上、３０μｍ以下の表面粗さに加工処理されている、ことを特徴とする研磨パッド。   In a polishing pad mainly made of polyurethane, the area between the bubbles opened on the back surface of the polishing pad is processed to a surface roughness of center line average roughness Ra of 2 μm or more and 30 μm or less. A polishing pad characterized by the above. 前記加工処理が研削処理である、ことを特徴とする請求項１に記載の研磨パッド。   The polishing pad according to claim 1, wherein the processing is a grinding process. 前記研削による筋状研削痕が１または複数の互いに異なる方向で形成されている、ことを特徴とする請求項２に記載の研磨パッド。   The polishing pad according to claim 2, wherein the streak-like grinding marks by the grinding are formed in one or more different directions. 前記中心線平均粗さＲａが、１０μｍ平方の前記エリアでの表面粗さである、ことを特徴とする請求項１ないし３いずれかに記載の研磨パッド。   The polishing pad according to claim 1, wherein the center line average roughness Ra is a surface roughness in the area of 10 μm square. 請求項１ないし４いずれかに記載の研磨パッドを用いてシリコンウエハを研磨する研磨機。
5. A polishing machine for polishing a silicon wafer using the polishing pad according to claim 1.
JP2005216923A 2005-07-27 2005-07-27 Polishing pad and polishing machine Active JP4681970B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005216923A JP4681970B2 (en) 2005-07-27 2005-07-27 Polishing pad and polishing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005216923A JP4681970B2 (en) 2005-07-27 2005-07-27 Polishing pad and polishing machine

Publications (3)

Publication Number Publication Date
JP2007035917A JP2007035917A (en) 2007-02-08
JP2007035917A5 true JP2007035917A5 (en) 2007-04-05
JP4681970B2 JP4681970B2 (en) 2011-05-11

Family

ID=37794806

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005216923A Active JP4681970B2 (en) 2005-07-27 2005-07-27 Polishing pad and polishing machine

Country Status (1)

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JP (1) JP4681970B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5893479B2 (en) * 2011-04-21 2016-03-23 東洋ゴム工業株式会社 Laminated polishing pad
TWI812936B (en) * 2021-04-01 2023-08-21 智勝科技股份有限公司 Polishing pad and polishing method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10128674A (en) * 1996-10-28 1998-05-19 Rooder Nitta Kk Polishing pad
US6117000A (en) * 1998-07-10 2000-09-12 Cabot Corporation Polishing pad for a semiconductor substrate
JP2000349054A (en) * 1999-06-07 2000-12-15 Asahi Chem Ind Co Ltd Polishing pad for metal film
DE19928950A1 (en) * 1999-06-24 2000-12-07 Wacker Siltronic Halbleitermat Semiconductor disc surface polishing method has perpendicular oscillating movement superimposed on relative displacement of rotary polishing tool and rotating semiconductor disc
JP3558273B2 (en) * 1999-09-22 2004-08-25 東洋ゴム工業株式会社 Method for producing polyurethane foam and polishing sheet
JP3649385B2 (en) * 2000-01-12 2005-05-18 東洋ゴム工業株式会社 Thermoplastic elastomer microporous foam, method for producing the same, and abrasive sheet
US6777455B2 (en) * 2000-06-13 2004-08-17 Toyo Tire & Rubber Co., Ltd. Process for producing polyurethane foam

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