JP2007021362A - Ultrasonic treatment apparatus and ultrasonic cleaning apparatus - Google Patents

Ultrasonic treatment apparatus and ultrasonic cleaning apparatus Download PDF

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JP2007021362A
JP2007021362A JP2005207093A JP2005207093A JP2007021362A JP 2007021362 A JP2007021362 A JP 2007021362A JP 2005207093 A JP2005207093 A JP 2005207093A JP 2005207093 A JP2005207093 A JP 2005207093A JP 2007021362 A JP2007021362 A JP 2007021362A
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ultrasonic
vibration
cleaning
liquid
sound pressure
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JP4257796B2 (en
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Masashi Goto
真史 後藤
Hajime Kuwajima
一 桑島
Kenji Nagase
健司 長瀬
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TDK Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an ultrasonic treatment apparatus which can surely carry out an ultrasonic treatment of a material to be treated by uniforming sound pressure distribution in a treatment liquid using a simple constitution. <P>SOLUTION: The ultrasonic treatment apparatus has a treatment tank for storing the treatment liquid and also immersing the material to be treated into the treatment liquid, a vibration generating member which is installed on the bottom side of the treatment tank and generates an ultrasonic vibration, and a vibration transmitting member which contacts with the vibration generating member and affects the ultrasonic vibration from the vibration generating member to the treatment liquid, wherein a plurality of convex spherical surfaces are arranged on the surface of the vibration transmitting member. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、主として、処理槽に貯留した処理液に超音波振動を作用することにより処理液内に浸漬した処理対象物を洗浄する超音波処理装置に関する。   The present invention mainly relates to an ultrasonic processing apparatus for cleaning a processing object immersed in a processing liquid by applying ultrasonic vibration to the processing liquid stored in a processing tank.

従来より、めっき処理を的確に行うため、めっき処理の前工程として、めっき処理の対象となる電子部品用基板等の導体表面の活性化や洗浄を行っている。めっき処理の前工程である洗浄工程を行うための洗浄装置として、洗浄槽の底部に超音波振動発生部が固定された装置や、超音波発生部が独立した投げ込み型の超音波洗浄装置が広く利用されている。   Conventionally, in order to perform a plating process accurately, activation and cleaning of a conductor surface such as a substrate for an electronic component to be subjected to a plating process are performed as a pre-process of the plating process. As a cleaning device for performing the cleaning process, which is a pre-process of the plating process, there are a wide range of devices including an ultrasonic vibration generator fixed to the bottom of the cleaning tank and a throw-in type ultrasonic cleaning device with an independent ultrasonic generator. It's being used.

通常、超音波洗浄装置を駆動して超音波振動を洗浄液に照射すると定在波が生じる。定在波は、底部から液面に向かう進行波と、進行波が液面に反射することで生じる、液面から底部へ進行する反射波と、が合成され、あたかも波の進行が止まり、振幅が同じ場所で繰り返されているように観測される波動である。   Usually, standing waves are generated when the ultrasonic cleaning apparatus is driven to irradiate the cleaning liquid with ultrasonic vibrations. The standing wave is a combination of a traveling wave from the bottom to the liquid surface and a reflected wave that travels from the liquid surface to the bottom and is reflected from the liquid surface. Is a wave observed as if repeated at the same place.

振幅が０である定在波の節に、被洗浄物である基板のある部分が位置し、振幅の最大である定在波の腹に、同一の基板の他の部分が位置する場合には、節の部分では洗浄が十分行われない。定在波の腹の部分では基板は過度の音圧を受けてしまい、基板を過度に洗浄するのみならず、基板を破壊する恐れがある。また、同一基板内における洗浄むらのみならず、複数の基板を洗浄する場合には、定在波の腹の位置にある基板と、節の位置にある別の基板では、洗浄や活性化処理にばらつきが生じてしまう。上記ばらつきを防止するために、洗浄液内の音圧分布を均一にすべく種々の洗浄装置が提供されている。   When a portion of the substrate that is the object to be cleaned is located at the node of the standing wave having an amplitude of 0, and another portion of the same substrate is located at the antinode of the standing wave having the maximum amplitude The section is not cleaned enough. At the antinode of the standing wave, the substrate receives an excessive sound pressure, which not only excessively cleans the substrate but also destroys the substrate. Also, when cleaning multiple substrates as well as uneven cleaning within the same substrate, cleaning and activation treatments are performed on the substrate at the antinode of the standing wave and another substrate at the node position. Variation will occur. In order to prevent the variation, various cleaning apparatuses are provided to make the sound pressure distribution in the cleaning liquid uniform.

図９は、従来の超音波洗浄装置の部分断面図である。超音波洗浄装置８０１は、洗浄槽８０３と、被洗浄物である基板８０７を洗浄液８０９内で移動させるための昇降部材８０５と、超音波振動を発生させるための振動子８１１と、振動子８１１により発生された超音波振動を洗浄液８０９に付与するための平滑な振動伝達板８１５と、を備える。   FIG. 9 is a partial cross-sectional view of a conventional ultrasonic cleaning apparatus. The ultrasonic cleaning apparatus 801 includes a cleaning tank 803, an elevating member 805 for moving a substrate 807 as an object to be cleaned in the cleaning liquid 809, a vibrator 811 for generating ultrasonic vibration, and a vibrator 811. A smooth vibration transmission plate 815 for applying the generated ultrasonic vibration to the cleaning liquid 809.

Ｙ方向（図９の上下方向）に往復運動する昇降部材８０５は、アーム部８１７と保持部８１９とを備える。保持部８１９は、Ｙ方向に立てた状態の複数の基板８０７を保持する。保持部８１９は、アーム部材８１７を介して不図示の昇降駆動手段に連結されている。上記構成において、振動子８１１を駆動させるとともに、昇降駆動手段により保持部８１９をＹ方向に移動させることにより、超音波の節または腹に対応する部分にのみ基板８０７の所定部分が位置しないように洗浄処理を行っている（特許文献１参照）。   An elevating member 805 that reciprocates in the Y direction (the vertical direction in FIG. 9) includes an arm portion 817 and a holding portion 819. The holding unit 819 holds a plurality of substrates 807 standing in the Y direction. The holding unit 819 is connected to an elevating drive unit (not shown) via an arm member 817. In the above configuration, the vibrator 811 is driven, and the holding unit 819 is moved in the Y direction by the lift drive means so that the predetermined portion of the substrate 807 is not located only in the portion corresponding to the node or the belly of the ultrasonic wave. A cleaning process is performed (see Patent Document 1).

図１０は、他の従来の超音波洗浄装置の振動発生部の断面図である。振動発生部９０５は、振動子９１１及び振動伝達部材９１５から構成される。図９の振動伝達板８１５は、その表面が平滑な板状の部材であったが、図１０の振動伝達板９１５は、その表面に複数の半球状凹部９１７を備える構成である。その他の超音波洗浄装置の構成要素は同じである。   FIG. 10 is a cross-sectional view of a vibration generating unit of another conventional ultrasonic cleaning apparatus. The vibration generation unit 905 includes a vibrator 911 and a vibration transmission member 915. The vibration transmission plate 815 in FIG. 9 is a plate-like member having a smooth surface, but the vibration transmission plate 915 in FIG. 10 is configured to include a plurality of hemispherical recesses 917 on the surface. The other components of the ultrasonic cleaning apparatus are the same.

半球状凹部９１７は、単一の振動伝達板９１５から位相をずらした２つの超音波を付与するための構成である。半球状凹部９１７の深さは、振動子９１１の励振周波数の波長の１／４の長さになるように構成されている。また、半球状凹部９１７の開口部の径は励振周波数の波長の１／２の長さに寸法付けされている。上記構成において、平面部により照射される周波数と、半球状凹部から照射される周波数の位相を異ならせることにより、洗浄液内の音圧分布を、均一にするものである（特許文献２参照。）。   The hemispherical recess 917 is configured to apply two ultrasonic waves whose phases are shifted from a single vibration transmission plate 915. The depth of the hemispherical recess 917 is configured to be ¼ of the wavelength of the excitation frequency of the vibrator 911. In addition, the diameter of the opening of the hemispherical recess 917 is sized to be ½ the wavelength of the excitation frequency. In the above configuration, the sound pressure distribution in the cleaning liquid is made uniform by making the phase of the frequency irradiated from the flat surface portion different from the frequency irradiated from the hemispherical recess (see Patent Document 2). .

さらに、超音波洗浄以外の用途、例えば、新化合物の合成、分散、乳化若しくは抽出、化学反応の促進、物質の分散、又は処理液の消泡若しくは脱泡の処理において、超音波を用いた超音波処理装置が利用されている。
特開２０００−２２８３８１号公報（段落番号〔０００５〕、第１図） 特開平７−３９８３５号公報（段落番号〔００１２〕、第１図） Furthermore, in applications other than ultrasonic cleaning, for example, synthesis, dispersion, emulsification or extraction of new compounds, promotion of chemical reactions, dispersion of substances, or processing of defoaming or defoaming treatment liquids, ultrasonication using ultrasonic waves is used. A sonicator is used.
Japanese Unexamined Patent Publication No. 2000-228381 (paragraph number [0005], FIG. 1) Japanese Unexamined Patent Publication No. 7-39835 (paragraph number [0012], FIG. 1)

上述した従来の超音波洗浄装置は、依然として以下のような問題がある。図９の超音波洗浄装置では、洗浄作業を行う際、超音波振動を付与するとともに、保持部を上下方向に移動させる必要があるため、超音波洗浄装置の構造を簡素化するには限界がある。また、保持部を上下方向に移動させても、各基板、若しくは基板の全面にわたり均一な音圧を付与するように制御することは非常に困難である。   The conventional ultrasonic cleaning apparatus described above still has the following problems. In the ultrasonic cleaning apparatus of FIG. 9, when performing the cleaning operation, it is necessary to apply ultrasonic vibration and to move the holding portion in the vertical direction. Therefore, there is a limit to simplifying the structure of the ultrasonic cleaning apparatus. is there. Further, even if the holding portion is moved in the vertical direction, it is very difficult to control so as to apply a uniform sound pressure over each substrate or the entire surface of the substrate.

他方、図１０の伝達板を使用した場合に、半球状凹部により照射された音波は、その凹部の曲面の焦点に収束する方向に進行する。よって、洗浄液中において、焦点近傍では音圧が高くなる。また、焦点以外の位置においても音圧のばらつきが残存している。よって、均一な音圧分布を洗浄液内に実現することは困難である。   On the other hand, when the transmission plate of FIG. 10 is used, the sound wave irradiated by the hemispherical recess travels in a direction that converges to the focal point of the curved surface of the recess. Therefore, in the cleaning liquid, the sound pressure becomes high near the focal point. In addition, variations in sound pressure remain at positions other than the focal point. Therefore, it is difficult to achieve a uniform sound pressure distribution in the cleaning liquid.

また、音波の波長のほぼ１／２波長の開口部と、ほぼ１／４波長の深さを有する凹部と、凹部の寸法が規定されているため、当該特許文献２の実施例に記載されている励振周波数１００ＫＨｚを例に取れば凹部の直径は１５．４ｍｍ、深さは７．７ｍｍとなり、この加工は石英ガラス板に施されることになる。ところがこれを後述の本発明の実施例に照らし合わせると、励振周波数は一般的に用いられる２８ＫＨｚであり、単純計算で凹部の直径および深さは約４倍となり、特に深さは約３０ｍｍに達することで前記石英ガラス板は少なくとも３０ｍｍを超える厚さが必要となる。これは加工部材としても加工作業にしても実現は非常に困難である。   In addition, since an opening having a wavelength of approximately ½ of the wavelength of the sound wave, a recess having a depth of approximately ¼ wavelength, and a size of the recess are defined, the dimensions of the recess are described in the example of Patent Document 2. Taking the excitation frequency of 100 KHz as an example, the diameter of the recess is 15.4 mm and the depth is 7.7 mm, and this processing is performed on the quartz glass plate. However, when this is compared with an embodiment of the present invention to be described later, the excitation frequency is 28 KHz, which is generally used, and the diameter and depth of the concave portion are about 4 times by simple calculation, and particularly the depth reaches about 30 mm. Thus, the quartz glass plate needs to have a thickness exceeding 30 mm. This is very difficult to realize both as a processed member and a processing operation.

図１１（ａ）、（ｂ）は、ビアホールが設けられた樹脂付銅箔の洗浄処理後の不良品を示す断面図である。樹脂付銅箔は、銅箔８５５と樹脂層８５１の２層からなる積層体であり、樹脂層８５１は厚さ方向に貫通するビアホール８５３を備える。図１１（ａ）は、ビアホール８５３内の洗浄が十分になされなかったことを示す。図に示されているようにビアホール８５３内に有機付着物等の残渣８５７が存在している。この場合、ビアホール８５３内に露出している銅箔部分の活性化処理も十分に施されていない恐れがある。   11 (a) and 11 (b) are cross-sectional views showing defective products after the cleaning treatment of the resin-coated copper foil provided with via holes. The copper foil with resin is a laminate composed of two layers of a copper foil 855 and a resin layer 851, and the resin layer 851 includes a via hole 853 penetrating in the thickness direction. FIG. 11A shows that the inside of the via hole 853 has not been sufficiently cleaned. As shown in the drawing, a residue 857 such as an organic deposit is present in the via hole 853. In this case, there is a possibility that the activation process of the copper foil portion exposed in the via hole 853 is not sufficiently performed.

図１１（ｂ）には、ビアホール８５３内に露出している銅箔８５５に穴８５９が生じてしまった状態が示されている。穴８５９の発生は、洗浄が過剰になされたことを意味する。   FIG. 11B shows a state in which a hole 859 has formed in the copper foil 855 exposed in the via hole 853. The occurrence of holes 859 means that the cleaning has been performed excessively.

図９の超音波洗浄装置を利用した場合には、洗浄液内を均一にすることが困難であるため、図１１（ａ）（ｂ）に示される不良品を防止することが困難である。   When the ultrasonic cleaning apparatus of FIG. 9 is used, it is difficult to make the inside of the cleaning liquid uniform, so that it is difficult to prevent the defective products shown in FIGS. 11 (a) and 11 (b).

図１０の超音波洗浄装置を利用した場合には、半球状凹部の曲面の焦点に配置された基板は、図１１（ｂ）のような結果となる恐れがある。また、定在波の音圧の平均値を基準として、振動子の出力を調整した場合、定在波の節に相当する位置に配置された被洗浄物には残渣が生じ、定在波の腹に相当する位置に配置された被洗浄物は、ビアホール内の銅箔に穴が開いてしまう。従って、例示した従来技術では、洗浄液中の音圧分布を均一にすることができなかった。   When the ultrasonic cleaning apparatus of FIG. 10 is used, the substrate placed at the focal point of the curved surface of the hemispherical recess may have a result as shown in FIG. In addition, when the output of the vibrator is adjusted with reference to the average value of the sound pressure of the standing wave, a residue is generated in the object to be cleaned arranged at the position corresponding to the node of the standing wave, and the standing wave An object to be cleaned arranged at a position corresponding to the belly has a hole in the copper foil in the via hole. Therefore, in the illustrated prior art, the sound pressure distribution in the cleaning liquid cannot be made uniform.

上述した従来の超音波洗浄装置における音圧の不均一に起因する課題は、新化合物の合成、分散、乳化若しくは抽出、化学反応の促進、物質の分散、又は処理液の消泡若しくは脱泡等の処理においても同様に存在する。これらの処理において、処理槽内の処理液中に音圧が高い部分や低い部分が混在すると、音圧の高い部分では低い部分に比べ処理が促進されるため、処理対象物の処理速度、例えば合成速度、反応速度等にばらつきが生じる。結果として、化合物の合成や化学反応等が不十分となる恐れがある。   Problems caused by the non-uniform sound pressure in the conventional ultrasonic cleaning apparatus described above include synthesis, dispersion, emulsification or extraction of new compounds, acceleration of chemical reaction, dispersion of substances, or defoaming or defoaming of processing liquids, etc. This process exists in the same way. In these treatments, when a portion with a high sound pressure or a portion with a low sound pressure is mixed in the treatment liquid in the treatment tank, the treatment is accelerated in the portion with a high sound pressure as compared with the low portion. Variations occur in the synthesis rate, reaction rate, and the like. As a result, the synthesis or chemical reaction of the compound may be insufficient.

そこで、本発明は、より簡易な構成で、液体内の音圧分布を均一化することにより、被洗浄物の洗浄、を確実に行うことができる超音波処理装置を提供することを一の目的とする。   Therefore, an object of the present invention is to provide an ultrasonic processing apparatus that can reliably clean an object to be cleaned by making the sound pressure distribution in the liquid uniform with a simpler configuration. And

上記目的を達成するための手段は、発明者等が、鋭意検討をした結果得られた以下の知見に基づくものである。振動発生部材の振動方向（底面から液面方向（垂直方向））と平行な方向のみに超音波を照射すると、定在波が生じることは避けられない。そこで、振動方向とは平行でない様々な角度の方向に進行する超音波を照射し、振動伝達部材からの超音波と、洗浄槽の壁面及び液面により反射した反射波を積極的に干渉させることにより、洗浄液内の音圧分布を均一化できるという知見を得た。すなわち、垂直成分のみを有する超音波のみではなく、垂直成分及び水平成分を有する反射波を混在させることにより、洗浄液内の音圧分布を均一化する超音波洗浄装置である。   Means for achieving the above object is based on the following knowledge obtained as a result of intensive studies by the inventors. When ultrasonic waves are irradiated only in the direction parallel to the vibration direction of the vibration generating member (from the bottom surface to the liquid surface direction (vertical direction)), it is inevitable that standing waves are generated. Therefore, ultrasonic waves traveling in various directions that are not parallel to the vibration direction are irradiated, and the ultrasonic waves from the vibration transmitting member and the reflected waves reflected by the wall surface and the liquid surface of the cleaning tank are positively interfered with each other. As a result, it was found that the sound pressure distribution in the cleaning liquid can be made uniform. That is, it is an ultrasonic cleaning apparatus that equalizes the sound pressure distribution in the cleaning liquid by mixing not only the ultrasonic waves having only the vertical component but also the reflected waves having the vertical component and the horizontal component.

上記知見に基づき、本発明の目的を達成するための本発明の超音波洗浄装置の第１の態様は、洗浄液を貯留するとともに被洗浄物を前記洗浄液内に浸漬するための洗浄槽と、前記洗浄槽の底面に装着され、超音波振動を発生する振動発生部材と、前記振動発生部材に接し、前記振動発生部材からの超音波振動を前記洗浄液に作用する振動伝達部材と、を備え、前記振動伝達部材の表面に、複数の凸状球面を設けた超音波洗浄装置である。   Based on the above knowledge, the first aspect of the ultrasonic cleaning apparatus of the present invention for achieving the object of the present invention includes a cleaning tank for storing a cleaning liquid and immersing an object to be cleaned in the cleaning liquid, A vibration generating member that is attached to the bottom surface of the cleaning tank and generates ultrasonic vibration; and a vibration transmission member that is in contact with the vibration generating member and acts on the cleaning liquid with ultrasonic vibration from the vibration generating member, This is an ultrasonic cleaning apparatus in which a plurality of convex spherical surfaces are provided on the surface of the vibration transmitting member.

また、本発明の超音波洗浄装置の第２の態様によれば、前記振動伝達部材は、前記振動発生部材に接する板状部材と、板状部材上に載置された複数の球状部材と、から構成され、前記複数の凸状球面は、前記複数の球状部材の外周部分により構成される。   Further, according to the second aspect of the ultrasonic cleaning apparatus of the present invention, the vibration transmitting member includes a plate-like member in contact with the vibration generating member, a plurality of spherical members placed on the plate-like member, The plurality of convex spherical surfaces are constituted by outer peripheral portions of the plurality of spherical members.

さらに、本発明の超音波洗浄装置の第３の態様は、処理液を貯留するとともに処理対象物を前記処理液内に浸漬するための処理槽と、超音波振動を発生し、前記超音波振動を前記処理液に伝達可能となるように振動伝達領域が配置された振動発生部材と、を備え、前記振動伝達領域において前記処理液に前記超音波振動を伝達する面は、同一面内に配置された複数の突起部を有する超音波処理装置である。   Furthermore, the third aspect of the ultrasonic cleaning apparatus of the present invention is configured to store a processing liquid and to immerse a processing target in the processing liquid, to generate ultrasonic vibration, and to generate the ultrasonic vibration. And a vibration generating member in which a vibration transmission region is arranged so as to be able to be transmitted to the treatment liquid, and a surface for transmitting the ultrasonic vibration to the treatment liquid in the vibration transmission region is arranged in the same plane An ultrasonic processing apparatus having a plurality of projected portions.

また、本発明の超音波処理装置の第４の態様によれば、前記突起部は、凸状曲面を有する。   Moreover, according to the 4th aspect of the ultrasonic processing apparatus of this invention, the said projection part has a convex-shaped curved surface.

そして、本発明の超音波処理装置の第５の態様によれば、前記凸状曲面は、球状部材、円錐状部材若しくは円錐台形状部材の外周部分から構成される。   And according to the 5th aspect of the ultrasonic processing apparatus of this invention, the said convex curved surface is comprised from the outer peripheral part of a spherical member, a cone-shaped member, or a truncated cone-shaped member.

さらに、本発明の超音波処理装置の第６の様態によれば、前記処理は、化合物の合成、分散、乳化若しくは抽出、化学反応の促進、物質の分散、又は処理液の消泡若しくは脱泡等を含む。   Furthermore, according to the sixth aspect of the ultrasonic treatment apparatus of the present invention, the treatment includes compound synthesis, dispersion, emulsification or extraction, promotion of a chemical reaction, dispersion of a substance, or defoaming or defoaming of a treatment liquid. Etc.

本明細書中の球状とは、特に言及していなければ、厳密な球のみならず、球が欠けた形状、半球状、楕円球状、丸みを帯びた形状等を含む。   Unless otherwise specified, the term “spherical” in this specification includes not only a strict sphere but also a shape lacking a sphere, a hemispherical shape, an elliptical sphere, a rounded shape, and the like.

また、本明細書において、被洗浄物等の処理対象物に伝達される超音波とは、振動発生部材（振動子）から液体を介して伝わる超音波や、振動発生部材からの超音波が洗浄槽等の処理槽の壁面で反射し被洗浄部材等の処理対象物に伝わる反射波を含む。   In this specification, the ultrasonic wave transmitted to the object to be cleaned such as the object to be cleaned is the ultrasonic wave transmitted from the vibration generating member (vibrator) through the liquid or the ultrasonic wave from the vibration generating member. It includes a reflected wave that is reflected by the wall surface of a processing tank such as a tank and is transmitted to a processing target such as a member to be cleaned.

本発明の超音波処理装置及び超音波洗浄装置によれば、洗浄液等の処理液内の音圧分布を均一にできるので、被洗浄物等の処理対象物に対する洗浄や表面の活性化等の超音波処理を確実に行うことができる。   According to the ultrasonic processing apparatus and the ultrasonic cleaning apparatus of the present invention, the sound pressure distribution in the processing liquid such as the cleaning liquid can be made uniform, so that the processing object such as the object to be cleaned can be cleaned and the surface activated. Sonication can be performed reliably.

以下、図面を参照して本発明の超音波洗浄装置の実施の形態について詳細に説明する。 Hereinafter, embodiments of the ultrasonic cleaning apparatus of the present invention will be described in detail with reference to the drawings.

（第１の実施形態）
図１は、本発明の超音波処理装置を洗浄装置に適用した超音波洗浄装置の第１の実施形態の部分断面図である。超音波洗浄装置１は、処理槽すなわち洗浄槽３と、振動発生部材１０と、振動伝達部材１６と、を備える。洗浄槽３は、上部が開口した略矩形状の槽であって、処理液すなわち洗浄液を貯留するためのものである。また、本実施形態では、処理対象物すなわち被洗浄物である基板７の洗浄槽３に対する出し入れを行うための昇降部材５を設けた。昇降部材５は、アーム部材１７と、保持部１９と、昇降駆動手段２１と、を備える。略Ｌ字形状のアーム部材１７には、従来から用いられている昇降駆動手段２１が連結されている。また、アーム部材１７の下端には、保持部１９が連結されている。 (First embodiment)
FIG. 1 is a partial cross-sectional view of a first embodiment of an ultrasonic cleaning apparatus in which the ultrasonic processing apparatus of the present invention is applied to a cleaning apparatus. The ultrasonic cleaning apparatus 1 includes a processing tank, that is, a cleaning tank 3, a vibration generating member 10, and a vibration transmitting member 16. The cleaning tank 3 is a substantially rectangular tank having an upper opening, and is for storing a processing liquid, that is, a cleaning liquid. Moreover, in this embodiment, the raising / lowering member 5 for taking in / out the washing | cleaning tank 3 of the board | substrate 7 which is a process target, ie, to-be-cleaned object, was provided. The elevating member 5 includes an arm member 17, a holding unit 19, and elevating drive means 21. Conventionally used lifting drive means 21 is connected to the substantially L-shaped arm member 17. A holding portion 19 is connected to the lower end of the arm member 17.

洗浄槽は、さらに不図示の濾過機構や濃度制御機構に連結されている。洗浄槽から排水された洗浄液は、濾過機構のフィルタにより異物を濾過した後、洗浄槽に戻すことで洗浄液の使用効率を高めている。また、濃度制御機構は、洗浄液に含まれる界面活性剤の液中濃度を監視し、その液中濃度を一定値に保つために利用されている。   The washing tank is further connected to a filtration mechanism and a concentration control mechanism (not shown). The cleaning liquid drained from the cleaning tank is used to improve the efficiency of use of the cleaning liquid by filtering the foreign matter with a filter of the filtering mechanism and then returning it to the cleaning tank. Further, the concentration control mechanism is used for monitoring the concentration of the surfactant contained in the cleaning liquid in the liquid and keeping the concentration in the liquid at a constant value.

洗浄槽３の底部には、振動発生部材１０が設けられている。振動発生部材１０は、振動子１１と、振動板１５と、を備える。洗浄槽３の底面に装着されている振動子１１には、制御部１８が連結されており、制御部１８からの駆動信号により振動子１１を駆動して超音波振動を発生する。また、振動子１１の上面には、略平坦状の板状部材である振動板１５が接着剤で固定されている。さらに、振動板１５の上面には、振動伝達部材であるガラス球１６が、振動板１５の表面をほぼ覆うように敷き詰められている。   A vibration generating member 10 is provided at the bottom of the cleaning tank 3. The vibration generating member 10 includes a vibrator 11 and a diaphragm 15. A control unit 18 is connected to the vibrator 11 mounted on the bottom surface of the cleaning tank 3, and the vibrator 11 is driven by a drive signal from the control unit 18 to generate ultrasonic vibration. In addition, a diaphragm 15 that is a substantially flat plate-like member is fixed to the upper surface of the vibrator 11 with an adhesive. Further, a glass ball 16 as a vibration transmitting member is spread on the upper surface of the diaphragm 15 so as to substantially cover the surface of the diaphragm 15.

図２は、洗浄槽内に配置された被洗浄部材の保持部の斜視図である。なお、明瞭化のため昇降部材５のアーム部及びガラス球を省略した。昇降部材５の保持部１９の形状について説明する。保持部１９は、複数の棒状部材を略直方体状に連結された枠体である。図２において横方向に延在する４つの側枠１９ａの内、下方に位置する１対の側枠には、基板７を厚さに対応する幅を持つ溝が等間隔で設けられている。
保持部１９に装填される基板７は、略矩形状の板状部材である。複数の基板７は、互いに離間して、直立した状態で上記溝に収容されて保持部１９に保持される。 FIG. 2 is a perspective view of a holding portion for a member to be cleaned disposed in the cleaning tank. In addition, the arm part and glass ball | bowl of the raising / lowering member 5 were abbreviate | omitted for clarification. The shape of the holding part 19 of the raising / lowering member 5 is demonstrated. The holding part 19 is a frame body in which a plurality of rod-shaped members are connected in a substantially rectangular parallelepiped shape. Of the four side frames 19a extending in the horizontal direction in FIG. 2, a pair of side frames positioned below are provided with grooves having a width corresponding to the thickness of the substrate 7 at equal intervals.
The substrate 7 loaded in the holding unit 19 is a substantially rectangular plate-like member. The plurality of substrates 7 are separated from each other and are accommodated in the groove in an upright state and held by the holding portion 19.

上記構成の超音波洗浄装置を用いた洗浄方法について図１、図２を参照して説明する。まず、保持部１９に所定数の基板７を装填する。次に、昇降駆動手段２１を駆動させることで保持部１９を下降し、保持部１９を基板７とともに洗浄液９内に浸漬させる。制御部１８からの駆動信号により振動子１１を駆動させ振動板１５を超音波振動させる。振動板１５に伝達された超音波振動は、ガラス球１６に伝達される。さらに、ガラス球１６に伝達された超音波振動が洗浄液内に照射される。   A cleaning method using the ultrasonic cleaning apparatus having the above configuration will be described with reference to FIGS. First, a predetermined number of substrates 7 are loaded into the holding unit 19. Next, the holding unit 19 is lowered by driving the elevating drive means 21, and the holding unit 19 is immersed in the cleaning liquid 9 together with the substrate 7. The vibrator 11 is driven by the drive signal from the control unit 18 to vibrate the diaphragm 15 ultrasonically. The ultrasonic vibration transmitted to the diaphragm 15 is transmitted to the glass sphere 16. Furthermore, the ultrasonic vibration transmitted to the glass bulb 16 is irradiated into the cleaning liquid.

以下に洗浄液に照射される超音波について図３を用いて説明する。図３は、図１の振動板及びその上に配置された複数のガラス球の一部を示す。   Hereinafter, the ultrasonic wave applied to the cleaning liquid will be described with reference to FIG. FIG. 3 shows a part of the diaphragm of FIG. 1 and a plurality of glass balls arranged thereon.

振動板１５の上下方向２３の振動がガラス球１６に伝達されると、ガラス球１６が上下方向に振動する。ガラス球１６の表面から球面状に広がる波（矢印２５ａ、２５ｂ、２５ｃ方向）が洗浄液中に照射される。   When the vibration in the vertical direction 23 of the vibration plate 15 is transmitted to the glass ball 16, the glass ball 16 vibrates in the vertical direction. Waves spreading in a spherical shape from the surface of the glass sphere 16 (in the directions of the arrows 25a, 25b, and 25c) are irradiated into the cleaning liquid.

ガラス球から照射された音波３１は、図１に模式的に示されている。各ガラス球１６から放射された音波３１は互いに干渉する。また、洗浄槽３の側壁や洗浄液９の液面を反射した音波も干渉する。このように、洗浄液中の音波が互いに反射および干渉を繰り返すことにより、洗浄液中の音圧分布を均一にすることができる。   The sound wave 31 irradiated from the glass sphere is schematically shown in FIG. The sound waves 31 emitted from the glass balls 16 interfere with each other. In addition, sound waves reflected from the side wall of the cleaning tank 3 and the liquid surface of the cleaning liquid 9 also interfere. Thus, the sound pressure distribution in the cleaning liquid can be made uniform by the sound waves in the cleaning liquid being repeatedly reflected and interfered with each other.

次に、図１に示すガラス球を用いた超音波洗浄装置と、ガラス球を用いない超音波洗浄装置における洗浄液中内の音圧分布を比較した結果を示す。   Next, the result of comparing the sound pressure distribution in the cleaning liquid between the ultrasonic cleaning apparatus using the glass sphere shown in FIG. 1 and the ultrasonic cleaning apparatus not using the glass sphere is shown.

計測に使用した洗浄槽の寸法は、幅８００ｍｍｘ奥行き８００ｍｍｘ高さ８００ｍｍである。洗浄槽内の洗浄液は硫酸と硫酸主体の界面活性剤の混合液である。   The dimensions of the cleaning tank used for the measurement are 800 mm wide × 800 mm deep × 800 mm high. The cleaning liquid in the cleaning tank is a mixture of sulfuric acid and a surfactant mainly composed of sulfuric acid.

被洗浄物は、縦１４０ｍｍｘ横１４０ｍｍのプリント基板であり、約１５，０００個のビアホールが設けられている。プリント基板である樹脂付銅箔は、銅箔と樹脂層の２層からなる積層体であり、銅箔の厚さは１２μｍである。樹脂層を貫通するビアホールは、上穴の径が１６０μｍ、下穴の径が１００μｍ、深さが１６０μｍである。また、保持部には２４枚の基板が装填されている。ガラス球は直径約１０ｍｍで、振動板上のほぼ全面に敷き詰められている。また、振動子の励振周波数は、２８ｋＨｚとした。
音圧の計測には、本多電子株式会社製の超音波音圧計（ＨＵＳ−５）を用いた。 The object to be cleaned is a printed circuit board having a length of 140 mm and a width of 140 mm, and is provided with about 15,000 via holes. The resin-attached copper foil as a printed board is a laminate composed of two layers of a copper foil and a resin layer, and the thickness of the copper foil is 12 μm. The via hole penetrating the resin layer has an upper hole diameter of 160 μm, a lower hole diameter of 100 μm, and a depth of 160 μm. The holding unit is loaded with 24 substrates. The glass sphere has a diameter of about 10 mm and is spread almost all over the diaphragm. The excitation frequency of the vibrator was 28 kHz.
For measurement of sound pressure, an ultrasonic sound pressure meter (HUS-5) manufactured by Honda Electronics Co., Ltd. was used.

図４は、洗浄槽内に保持部を浸漬させない状態おける洗浄液の音圧分布を示すグラフ及び表である。図４（ａ）、（ｃ）は、それぞれガラス球を使用しない超音波洗浄装置、ガラス球を使用した超音波洗浄装置の音圧グラフである。図４（ｂ）、（ｄ）は、それぞれガラス球を使用しない超音波洗浄装置、ガラス球を使用した超音波洗浄装置における洗浄槽の底面に対して垂直方向に延在する同一平面を９つの領域に分割し、各領域の平均音圧を示す表である。グラフ及び表に示された音圧は、いずれも交流電圧の実効値として表され、単位はＶｒｍｓである。また、グラフのＸ軸方向は、洗浄槽の幅方向を示し、Ｙ軸方向は洗浄槽の深さ方向を示す。Ｘ１、Ｘ３は、洗浄槽の側壁側の領域である。また、Ｙ１は洗浄槽の底面すなわち振動子側の領域であり、Ｙ３は液面側の領域である。   FIG. 4 is a graph and a table showing the sound pressure distribution of the cleaning liquid in a state where the holding part is not immersed in the cleaning tank. 4A and 4C are sound pressure graphs of an ultrasonic cleaning apparatus that does not use glass spheres and an ultrasonic cleaning apparatus that uses glass spheres, respectively. 4 (b) and 4 (d) respectively show nine identical planes extending in a direction perpendicular to the bottom surface of the cleaning tank in an ultrasonic cleaning device that does not use glass balls and an ultrasonic cleaning device that uses glass balls. It is a table | surface which divides | segments into an area | region and shows the average sound pressure of each area | region. The sound pressures shown in the graph and the table are all expressed as the effective value of the AC voltage, and the unit is Vrms. Moreover, the X-axis direction of a graph shows the width direction of a washing tank, and the Y-axis direction shows the depth direction of a washing tank. X1 and X3 are regions on the side wall side of the cleaning tank. Y1 is a bottom surface of the cleaning tank, that is, a region on the vibrator side, and Y3 is a region on the liquid surface side.

図４（ａ）から明らかなように、液面と底面との中間辺りの領域（Ｘ１〜Ｘ３、Ｙ２）と、底面（Ｘ１〜Ｘ３、Ｙ１）、液面（Ｘ１〜Ｘ３、Ｙ３）近傍の領域が他の領域より音圧が高い傾向にあることがわかる。他方、図４（ｃ）からわかるように、ガラス球を使用した場合には、洗浄液内では深さに関係なく、いずれの場所でも音圧がほぼ等しい。図４（ｂ）に示されるように、ガラス球を使用しない場合には、領域毎に音圧のばらつきが見られる。図４（ｂ）のグラフより、９つの領域の音圧の平均値は、２．４２Ｖｒｍｓであり、音圧の最高値と最低値との差は、４．０Ｖｒｍｓであることがわかる。   As is clear from FIG. 4 (a), the region (X1 to X3, Y2) around the middle between the liquid surface and the bottom surface, the bottom surface (X1 to X3, Y1), and the vicinity of the liquid surface (X1 to X3, Y3). It can be seen that the area tends to have a higher sound pressure than the other areas. On the other hand, as can be seen from FIG. 4 (c), when glass spheres are used, the sound pressure is almost equal at any location in the cleaning liquid regardless of the depth. As shown in FIG. 4B, when the glass sphere is not used, variation in sound pressure is observed for each region. From the graph of FIG. 4B, it can be seen that the average value of the sound pressures in the nine regions is 2.42 Vrms, and the difference between the maximum value and the minimum value of the sound pressure is 4.0 Vrms.

図４（ｄ）に示された結果から、ガラス球を用いた洗浄槽では、９つの領域の音圧の平均値は４．４６Ｖｒｍｓとなり、音圧の最高値と音圧の最低値の差は、０．１Ｖｒｍｓであることがわかる。すなわち、ガラス球を配置した本発明の洗浄槽では、ガラス球を配置しない洗浄槽に比べ、音圧の平均値は、２．０４Ｖｒｍｓ高く、音圧のばらつきが、３．９Ｖｒｍｓ低下していることがわかる。音圧の平均値が高くなったのは、洗浄液内の音圧のばらつきが低下することにより、同一面内の音圧の平均値が底上げされたと考えられる。従って、ガラス球を使用することにより、同じ出力で振動を付与しても、洗浄槽内の音圧の平均値を高く維持できるので、超音波洗浄装置の効率を上げることができる。   From the result shown in FIG. 4D, in the cleaning tank using glass spheres, the average value of the sound pressure in the nine regions is 4.46 Vrms, and the difference between the maximum value of the sound pressure and the minimum value of the sound pressure is , 0.1 Vrms. That is, in the cleaning tank of the present invention in which the glass sphere is arranged, the average value of the sound pressure is 2.04 Vrms higher and the variation in the sound pressure is reduced by 3.9 Vrms, compared to the cleaning tank in which the glass sphere is not arranged. I understand. It is considered that the average value of the sound pressure is increased because the average value of the sound pressure in the same plane is raised due to the decrease in the dispersion of the sound pressure in the cleaning liquid. Therefore, by using the glass sphere, even if vibration is applied with the same output, the average value of the sound pressure in the cleaning tank can be maintained high, so that the efficiency of the ultrasonic cleaning apparatus can be increased.

次に、洗浄槽内の洗浄液内に基板を装填した保持部を浸漬した場合の音圧分布に関し、ガラス球を利用した場合と、ガラス球を利用しない場合について説明する。   Next, regarding the sound pressure distribution when the holding portion loaded with the substrate is immersed in the cleaning liquid in the cleaning tank, a case where a glass sphere is used and a case where a glass sphere is not used will be described.

図５は、洗浄液内に保持部を浸漬した状態の音圧分布を示すグラフ及び表である。図５（ａ）、（ｃ）は、それぞれガラス球を利用しない超音波洗浄装置、ガラス球を利用した超音波洗浄装置のグラフである。図５（ｂ）、（ｄ）は、それぞれガラス球を利用しない超音波洗浄装置、ガラス球を利用した超音波洗浄装置に関し、所定の計測深度における同一面を９つの領域に分割し、各領域の平均音圧を表に示したものである。音圧グラフ及び表に示された音圧は、いずれも交流電圧の実効値として表され、単位はＶｒｍｓである。また、グラフのｘ軸方向は、洗浄槽の幅方向を示し、ｙ軸方向は洗浄槽の奥行き方向を示す。また、基板が装填された保持部は、洗浄槽の各壁面からほぼ等距離となるように配置されている。計測深度は、液面から約４０ｃｍの深さの洗浄液中とした。   FIG. 5 is a graph and a table showing the sound pressure distribution in a state where the holding part is immersed in the cleaning liquid. 5A and 5C are graphs of an ultrasonic cleaning apparatus that does not use glass spheres and an ultrasonic cleaning apparatus that uses glass spheres, respectively. FIGS. 5B and 5D respectively relate to an ultrasonic cleaning apparatus that does not use glass spheres and an ultrasonic cleaning apparatus that uses glass spheres, and divides the same plane at a predetermined measurement depth into nine regions. The average sound pressure is shown in the table. The sound pressures shown in the sound pressure graph and the table are both expressed as the effective value of the AC voltage, and the unit is Vrms. The x-axis direction of the graph indicates the width direction of the cleaning tank, and the y-axis direction indicates the depth direction of the cleaning tank. Further, the holding portion loaded with the substrate is arranged so as to be substantially equidistant from each wall surface of the cleaning tank. The measurement depth was in the cleaning liquid at a depth of about 40 cm from the liquid surface.

図５（ａ）から明らかなように、ガラス球を使用しない場合、音圧のばらつきに規則性が見られない。また、図５（ｂ）に示されるように、ガラス球を利用しない場合、領域毎に音圧のばらつきが見られる。９つの領域の音圧の最高値と最低値との差は、３．５Ｖｒｍｓである。   As is clear from FIG. 5A, when the glass sphere is not used, there is no regularity in the variation of the sound pressure. Further, as shown in FIG. 5B, when the glass sphere is not used, variation in sound pressure is observed for each region. The difference between the maximum value and the minimum value of the sound pressures in the nine areas is 3.5 Vrms.

ガラス球を用いた洗浄槽では、音圧の最高値と音圧の最低値との差は、１．５Ｖｒｍｓである。すなわち、ガラス球を配置した本発明の超音波洗浄装置を使用すると、ガラス球を使用しない洗浄槽に比べ、音圧のばらつきを、２．０Ｖｒｍｓ低下させることができるので、洗浄槽内の音圧を均一化が図れた。   In the cleaning tank using glass spheres, the difference between the highest sound pressure value and the lowest sound pressure value is 1.5 Vrms. That is, when using the ultrasonic cleaning apparatus of the present invention in which glass spheres are arranged, the variation in sound pressure can be reduced by 2.0 Vrms compared to a cleaning tank that does not use glass spheres. Can be made uniform.

ガラス球を利用しない超音波洗浄装置では、音圧分布が均一な領域に規則性を見ることができないばかりではなく、ばらつき自体が３．５Ｖｒｍｓと大きい。よって、複数の基板を一度に浸漬して洗浄する場合に均一な洗浄結果を得られない可能性がある。しかし、ガラス球を利用した超音波洗浄装置では、音圧分布に規則性が見られるだけでなく、音圧のばらつきが１．５Ｖｒｍｓと均一にでき、均一な洗浄結果を得ることが可能となる。つまり上記のように、超音波洗浄装置にガラス球を使用すれば、図４（ｃ）、図４（ｄ）の如く洗浄槽内の音圧分布が均一となり、さらに図５（ｃ）、図５（ｄ）の如く保持部に装填された基板を洗浄液内に浸漬した場合でも音圧分布はガラス球を使用しない場合に比べて音圧分布のばらつきは大幅に低減でき、確実に洗浄作業を行えることが実証された。   In an ultrasonic cleaning apparatus that does not use glass spheres, not only cannot regularity be seen in a region where the sound pressure distribution is uniform, but the variation itself is as large as 3.5 Vrms. Therefore, there is a possibility that a uniform cleaning result cannot be obtained when a plurality of substrates are immersed and cleaned at a time. However, in the ultrasonic cleaning apparatus using glass spheres, not only the sound pressure distribution is regular, but also the variation in sound pressure can be made uniform at 1.5 Vrms, and a uniform cleaning result can be obtained. . That is, as described above, if glass balls are used in the ultrasonic cleaning apparatus, the sound pressure distribution in the cleaning tank becomes uniform as shown in FIGS. 4 (c) and 4 (d), and FIG. 5 (c) and FIG. Even when the substrate loaded in the holding unit is immersed in the cleaning solution as shown in 5 (d), the sound pressure distribution can be greatly reduced compared to the case where glass spheres are not used. It was demonstrated that it can be done.

実際に洗浄した基板を検証したところ、図１１に示したような残渣の発生若しくはビアホール内の銅箔部分に穴が生じるという不具合の発生率は、数パーセントのオーダであったものが、ほぼゼロパーセントとなった。   When the actually cleaned substrate was verified, the rate of occurrence of defects such as the generation of residues as shown in FIG. 11 or the formation of holes in the copper foil in the via holes was on the order of several percent, but was almost zero. It became a percentage.

上記実施例では、液面から４０ｃｍ下がった液中の音圧分布について実証した。ここで、その他の深度における液中の音圧分布が問題となる。一般に、深さ方向に関する音圧は、音波の性質上振動源から離れるに従い減衰し、また、液面における音波の反射と透過によっても減衰する。従って、振動源から最も離れた液面に近づくにつれて音圧の減衰が見られたものの、ガラス球を利用した場合には、ガラス球を利用しない場合と比較して、音圧分布を均一化できるという傾向には変わりがないことが判明している。   In the said Example, it demonstrated about the sound pressure distribution in the liquid which fell 40 cm from the liquid level. Here, the sound pressure distribution in the liquid at other depths becomes a problem. In general, the sound pressure in the depth direction is attenuated with distance from the vibration source due to the property of sound waves, and is also attenuated by reflection and transmission of sound waves on the liquid surface. Therefore, although the sound pressure is attenuated as it approaches the liquid surface farthest from the vibration source, the sound pressure distribution can be made uniform when the glass sphere is used compared to when the glass sphere is not used. It has been found that this trend has not changed.

（第２の実施形態）
以下、本発明の超音波処理装置を超音波洗浄装置に適用した第２の実施形態について説明する。図６は、超音波洗浄装置の第２の実施形態の断面図である。第１実施形態の超音波洗浄装置１は、ガラス球を振動板の上に配置する構成としたが、第２実施形態の超音波洗浄装置５１では、振動板の表面に複数の凸状曲面を設けた構成である。 (Second Embodiment)
Hereinafter, a second embodiment in which the ultrasonic processing apparatus of the present invention is applied to an ultrasonic cleaning apparatus will be described. FIG. 6 is a cross-sectional view of the second embodiment of the ultrasonic cleaning apparatus. Although the ultrasonic cleaning apparatus 1 of the first embodiment is configured to arrange the glass sphere on the diaphragm, the ultrasonic cleaning apparatus 51 of the second embodiment has a plurality of convex curved surfaces on the surface of the diaphragm. This is a configuration provided.

第１の実施形態の超音波洗浄装置１と同様に、第２実施形態の超音波洗浄装置５１は、処理槽すなわち洗浄槽５３と、振動発生部材６０と、を備える。また、本実施形態においても、洗浄槽５３内に被洗浄物を搬送するための昇降部材５５を設けた。昇降部材５５は、アーム部材６７と、保持部６９と、昇降駆動手段７１と、を備える。アーム部材６７の先端部には、保持部６９が連結されている。   Similar to the ultrasonic cleaning device 1 of the first embodiment, the ultrasonic cleaning device 51 of the second embodiment includes a processing tank, that is, a cleaning tank 53, and a vibration generating member 60. Also in the present embodiment, the elevating member 55 for transporting the object to be cleaned is provided in the cleaning tank 53. The elevating member 55 includes an arm member 67, a holding portion 69, and elevating drive means 71. A holding portion 69 is connected to the distal end portion of the arm member 67.

洗浄槽５３の底部には、振動発生部材６０が設けられている。振動発生部材６０は、振動子６１と、振動板６５と、を備える。洗浄槽５３の底面に装着されている振動子６１には、制御部７８が連結されており、制御部７８からの駆動信号により振動子６１を駆動して超音波振動を発生する。振動子６１の上面には、振動板６５が接着剤等の固定手段により装着されている。振動板６５は、処理液すなわち洗浄液５９に接し超音波振動を洗浄液５９に伝達できる振動伝達領域６８を備える。本実施形態では、振動伝達領域６８の所定範囲内（振動板６５の上面）に、複数の略半球状の突起部６６が同一面状に連続して形成されている。なお、振動板６５は、洗浄槽５３の底面より若干小さく寸法付けされている。また、洗浄槽５３の開口側から見た場合に、保持部６９に装填されているすべての基板５７（処理対象物）についての振動板６５上の投影面より若干広い領域を占めるような数の突起部６６が設けられている。なお、突起部６６を設ける面積は適宜変更でき、投影面とほぼ同一の領域内に突起部を設ければ良いことは言うまでもない。   A vibration generating member 60 is provided at the bottom of the cleaning tank 53. The vibration generating member 60 includes a vibrator 61 and a diaphragm 65. A control unit 78 is connected to the vibrator 61 mounted on the bottom surface of the cleaning tank 53, and the vibrator 61 is driven by a drive signal from the control unit 78 to generate ultrasonic vibration. A diaphragm 65 is mounted on the upper surface of the vibrator 61 by a fixing means such as an adhesive. The vibration plate 65 includes a vibration transmission region 68 that is in contact with the processing liquid, that is, the cleaning liquid 59 and can transmit ultrasonic vibration to the cleaning liquid 59. In the present embodiment, a plurality of substantially hemispherical protrusions 66 are continuously formed in the same plane within a predetermined range of the vibration transmission region 68 (the upper surface of the diaphragm 65). The diaphragm 65 is dimensioned slightly smaller than the bottom surface of the cleaning tank 53. Further, when viewed from the opening side of the cleaning tank 53, the number of the substrates 57 (processing object) loaded in the holding unit 69 occupies a region slightly wider than the projection surface on the vibration plate 65. A protrusion 66 is provided. Needless to say, the area in which the protrusion 66 is provided can be changed as appropriate, and the protrusion may be provided in the same region as the projection surface.

上記構成の超音波洗浄装置５１を用いて、洗浄液５９内に保持部６９に装填された基板５７を浸漬する。振動子６１を図中上下方向に駆動させると、その振動が振動板６５に伝達される。振動板６５に設けられた複数の半球状突起部６６の各々の表面から球面状に音波８１が伝播する。さらに、各突起部６６から照射された音波８１と、洗浄槽５３の内壁面で反射した反射波とが互いに干渉し合い、音圧のばらつきのない波が形成される。当該波が基板５７に到達すると、基板５７に対して均一な音圧で洗浄がなされる。   The substrate 57 loaded in the holding unit 69 is immersed in the cleaning liquid 59 using the ultrasonic cleaning apparatus 51 having the above configuration. When the vibrator 61 is driven in the vertical direction in the figure, the vibration is transmitted to the diaphragm 65. A sound wave 81 propagates in a spherical shape from the surface of each of the plurality of hemispherical projections 66 provided on the diaphragm 65. Furthermore, the sound wave 81 emitted from each protrusion 66 and the reflected wave reflected by the inner wall surface of the cleaning tank 53 interfere with each other, and a wave having no variation in sound pressure is formed. When the wave reaches the substrate 57, the substrate 57 is cleaned with a uniform sound pressure.

第１実施形態の平坦の振動板上にガラス球を配置する構成の代わりに、振動板６５自体の表面に略半球状の突起部６６を設けるという簡易な構成により、第１実施形態と同様に、洗浄液５９中の音圧分布を均一化することができる。   Instead of the configuration in which the glass spheres are arranged on the flat diaphragm in the first embodiment, a simple configuration in which a substantially hemispherical protrusion 66 is provided on the surface of the diaphragm 65 itself, as in the first embodiment. The sound pressure distribution in the cleaning liquid 59 can be made uniform.

（他の実施形態）
以下に、振動伝達板の表面に設けることができる突起部の他の実施形態について説明する。図７（ａ）〜（ｃ）は、振動板の表面に設けられた突起部の種々の実施形態を示す。図７（ａ）は、複数の円錐形状突起部１１６を互いに隣接して振動板１１５上に設けた構成である。図７（ｂ）は、複数の円錐形状突起部２１６を振動板２１５上に設けている点で、図７（ａ）の構成と同じであるが、複数の円錐形状突起部２１６を互いに離間させて設けた構成である。図７（ｃ）は、複数の円錐台形状突起部３１６が、隣接して振動板３１６の上面に設けた構成である。なお、図７（ａ）〜（ｃ）の振動板の下面には、不図示の振動子（図１の１１参照。）が装着されている。なお、突起部１１６、２１６、３１６は、振動板１１５、２１５、３１５とは別体とし、実施形態１のように振動伝達部材として用いることも可能である。 (Other embodiments)
Below, other embodiment of the projection part which can be provided in the surface of a vibration transmission board is described. 7A to 7C show various embodiments of the protrusion provided on the surface of the diaphragm. FIG. 7A shows a configuration in which a plurality of conical protrusions 116 are provided on the diaphragm 115 adjacent to each other. FIG. 7B is the same as the configuration of FIG. 7A in that a plurality of conical protrusions 216 are provided on the diaphragm 215, but the plurality of conical protrusions 216 are separated from each other. This is a configuration provided. FIG. 7C shows a configuration in which a plurality of frustoconical protrusions 316 are provided adjacent to the upper surface of the diaphragm 316. Note that an unillustrated vibrator (see 11 in FIG. 1) is attached to the lower surface of the diaphragm in FIGS. The protrusions 116, 216, and 316 are separate from the diaphragms 115, 215, and 315, and can be used as vibration transmission members as in the first embodiment.

上記構成において、振動子を振動すると、振動板１１５、２１５、３１５の突起部１１６、２１６、３１６を有する面から超音波振動が洗浄液内に照射される。各突起部から照射される音波の内、各突起部の曲面状の側面から照射される超音波は、それぞれ曲面状に進行する進行波となる。その進行波が互いに、若しくは、進行波の一部が洗浄槽の内壁に反射して形成される反射波と干渉し合い、音圧にばらつきのない波が洗浄液内に形成される。よって、図７（ａ）〜（ｃ）の何れの構成であっても、洗浄液中の音圧分布を均一にできる。   In the above configuration, when the vibrator is vibrated, ultrasonic vibration is irradiated into the cleaning liquid from the surface having the projections 116, 216, and 316 of the vibration plates 115, 215, and 315. Of the sound waves emitted from the respective projections, the ultrasonic waves emitted from the curved side surfaces of the respective projections become traveling waves that travel in a curved shape. The traveling waves interfere with each other or reflected waves formed by reflecting a part of the traveling waves on the inner wall of the cleaning tank, and waves having no variation in sound pressure are formed in the cleaning liquid. Therefore, the sound pressure distribution in the cleaning liquid can be made uniform with any of the configurations shown in FIGS.

なお、図７（ａ）、（ｂ）のように、円錐状突起部を用いる場合には、底面の径の長さが、円錐の高さ寸法と等しいか、大きくなるように寸法付けすることが望ましい。突起部の側面が、垂直面に近づくにつれて、各突起部から放射される音波の水平成分同士が打ち消しあう割合が多くなり、結果として音波の垂直成分のみが放射されることとなる。この場合には、従来の超音波洗浄装置で見られる定在波を形成してしまい、本発明の効果が得られない恐れがあるからである。   As shown in FIGS. 7 (a) and 7 (b), when using a conical protrusion, dimension the bottom surface diameter so that it is equal to or larger than the height of the cone. Is desirable. As the side surface of the projection approaches the vertical plane, the proportion of the horizontal components of the sound waves radiated from the projections cancel each other, and as a result, only the vertical component of the sound waves is radiated. In this case, the standing wave seen in the conventional ultrasonic cleaning apparatus is formed, and the effect of the present invention may not be obtained.

また、突起部の形状は、球状体、半球状、円錐状に限定されることなく、凸状の曲面を有する突起部であれば、洗浄液内に伝播する音波の音圧分布を均一にすることが可能である。さらに、突起部の形状は、音波の上方成分と水平成分を有する音波を放射できれば良いので、例えば、多角錐であっても良い。その斜面から照射される音波は、上方向成分のみならず水平方向成分を有し、各突起部から放射される音波が互いに干渉し合うからである。   Further, the shape of the protrusion is not limited to a spherical body, a hemisphere, or a cone, and if the protrusion has a convex curved surface, the sound pressure distribution of the sound wave propagating in the cleaning liquid is made uniform. Is possible. Further, the shape of the protrusion may be a polygonal pyramid, for example, as long as it can emit a sound wave having an upper component and a horizontal component of the sound wave. This is because the sound wave emitted from the inclined surface has not only an upward component but also a horizontal component, and the sound waves emitted from the protrusions interfere with each other.

また、上記したすべての実施形態では、単一の振動子に対して一の振動伝達板を装着する構成としたが、図８に示すように、複数の振動子１１１を設ける構成とすることもできる。この場合には、洗浄液内に浸漬される基板の寸法や数の変更に伴う基板の投影面の変化に対応して、必要な領域に位置する振動子のみを駆動することにより、効率的に洗浄処理を行うことができる。   In all the above embodiments, one vibration transmission plate is attached to a single vibrator. However, as shown in FIG. 8, a plurality of vibrators 111 may be provided. it can. In this case, in response to changes in the projection surface of the substrate accompanying changes in the size and number of substrates immersed in the cleaning liquid, efficient cleaning is achieved by driving only the transducers located in the necessary areas. Processing can be performed.

さらに、第１の実施形態では、振動伝達板のほぼ全面に球状部材を配置したが、本発明はこれに制限されることはない。すなわち、洗浄槽の開口側から見て保持部に装填された基板の底面に対する投影面のほぼ全領域を占めるような数の、複数の球状部材若しくは突起部を配置することが好ましい。なお、隣接する球状部材若しくは突起部同士を接触した状態で並置する必要は必ずしもない。球状部材間及び突起部間に延在する振動板の平坦部で形成される垂直方向の超音波と、突起部からの球面状の超音波が干渉し合い形成される波が、垂直成分のみを有する波ではなく、水平成分をも有する波とすることができる範囲であれば、球状部材若しくは突起部を互いに離間して配置することができる。
また、複数の球状部材や突起部の各々について、曲面の曲率を均一にする必要はなく、曲率が異なる種々の球状部材や突起部とすることも可能である。 Furthermore, in the first embodiment, the spherical member is disposed on almost the entire surface of the vibration transmission plate, but the present invention is not limited to this. That is, it is preferable to arrange a plurality of spherical members or protrusions so as to occupy almost the entire area of the projection surface with respect to the bottom surface of the substrate loaded in the holding portion when viewed from the opening side of the cleaning tank. It is not always necessary to place adjacent spherical members or protrusions in contact with each other. The vertical ultrasonic wave formed by the flat part of the diaphragm extending between the spherical members and between the protrusions and the wave formed by the interference of the spherical ultrasonic waves from the protrusions only have a vertical component. Spherical members or protrusions can be arranged apart from each other as long as the wave can have a horizontal component instead of a wave.
Further, it is not necessary to make the curvature of the curved surface uniform for each of the plurality of spherical members and protrusions, and various spherical members and protrusions having different curvatures can be used.

さらに、何れの実施形態においても、洗浄槽の底部に振動伝達板を設ける構成としたが、本発明は本構成に限定されることはない。例えば、洗浄槽の底部のみならず、内壁面に、上述した突起部を設ける構成とすることもできる。   Further, in any embodiment, the vibration transmission plate is provided at the bottom of the cleaning tank, but the present invention is not limited to this configuration. For example, the above-described protrusions can be provided not only on the bottom of the cleaning tank but also on the inner wall surface.

本発明の超音波洗浄装置に用いる洗浄液は、実施形態や実施例に記載した洗浄液に限定されることなく、希硫酸溶液、有機溶剤、弗硝酸液等を適宜用いることができることは言うまでもない。   Needless to say, the cleaning liquid used in the ultrasonic cleaning apparatus of the present invention is not limited to the cleaning liquid described in the embodiments and examples, and dilute sulfuric acid solution, organic solvent, hydrofluoric acid liquid, and the like can be used as appropriate.

また、実施形態や実施例では、本発明の超音波処理装置を、電子部品を洗浄するための超音波洗浄装置の活性処理に適用した例を示したが、本発明の超音波処理装置は、処理液の音圧分布を均一にできるので、活性処理時に発生する処理液の泡の消泡、脱泡等の効果や、導電性ペーストや誘電体ペーストなどの混合物や化合物の合成、フィラーと溶媒とバインダを混練したスラリーなどの混合物や化合物の分散、乳化及び抽出、希硫酸を用いて酸化膜を除去するなどの化学反応の促進、物質の分散等を目的とした装置に適用しても、列記した各処理を被処理対象物に対して確実に行うことが可能である。   In the embodiments and examples, the example of applying the ultrasonic processing apparatus of the present invention to the activation process of the ultrasonic cleaning apparatus for cleaning electronic components has been shown. Since the sound pressure distribution of the treatment liquid can be made uniform, effects such as defoaming and defoaming of the foam of the treatment liquid generated during the active treatment, synthesis of mixtures and compounds such as conductive paste and dielectric paste, filler and solvent Even when applied to an apparatus for the purpose of dispersion of a mixture such as a slurry kneaded with a binder and dispersion of a compound, emulsification and extraction, chemical reaction such as removal of an oxide film using dilute sulfuric acid, dispersion of a substance, etc. It is possible to reliably perform the listed processes on the object to be processed.

例えば、本発明の超音波処理装置は、液体と固体、液体と液体、の間の化学反応を進行させる装置や、超音波により酸化作用、還元作用を促進する反応溶液を用いて液体処理を行う装置に適用できる。   For example, the ultrasonic processing apparatus of the present invention performs liquid processing using a device that promotes a chemical reaction between a liquid and a solid or between a liquid and a liquid, or a reaction solution that promotes an oxidizing action or a reducing action by ultrasonic waves. Applicable to equipment.

この発明は、その本質的特性から逸脱することなく数多くの形式のものとして具体化することができる。よって、上述した実施形態及び実施例は専ら説明上のものであり、本発明を制限するものではないことは言うまでもない。   The present invention can be embodied in many forms without departing from its essential characteristics. Therefore, it is needless to say that the above-described embodiments and examples are merely illustrative and do not limit the present invention.

本発明の超音波処理装置を超音波洗浄装置に適用した第１の実施形態の部分断面図である。1 is a partial cross-sectional view of a first embodiment in which an ultrasonic treatment apparatus of the present invention is applied to an ultrasonic cleaning apparatus. 洗浄槽内に配置された被洗浄部材の保持部に斜視図である。It is a perspective view in the holding | maintenance part of the to-be-cleaned member arrange | positioned in the washing tank. 図１の振動伝達板及びその上に配置されたガラス球の一部を示す。The vibration transmission board of FIG. 1 and a part of glass bulb | ball arrange | positioned on it are shown. 洗浄液内に保持部を浸漬させる前の状態の音圧分布を示すグラフ及び表である。It is a graph and table | surface which show the sound pressure distribution of the state before immersing a holding | maintenance part in a washing | cleaning liquid. 洗浄液内に保持部を浸漬した状態の音圧分布を示すグラフ及び表である。It is a graph and a table | surface which show the sound pressure distribution of the state which immersed the holding | maintenance part in the washing | cleaning liquid. 本発明の超音波処理装置を超音波洗浄装置に適用した第２の実施形態の断面図である。It is sectional drawing of 2nd Embodiment which applied the ultrasonic treatment apparatus of this invention to the ultrasonic cleaning apparatus. （ａ）〜（ｃ）は、他の実施形態の突起部の部分断面図である。(A)-(c) is a fragmentary sectional view of the projection part of other embodiment. 複数の振動子を示す斜視図である。It is a perspective view showing a plurality of vibrators. 従来の超音波洗浄装置の部分断面図である。It is a fragmentary sectional view of the conventional ultrasonic cleaning apparatus. 他の従来の超音波洗浄装置の振動発生部材の断面図である。It is sectional drawing of the vibration generation member of another conventional ultrasonic cleaning apparatus. ビアホールが設けられた樹脂付銅箔の洗浄処理後の状態を示す断面図である。It is sectional drawing which shows the state after the washing process of the copper foil with resin in which the via hole was provided.

符号の説明Explanation of symbols

１ 超音波洗浄装置
３ 洗浄槽
５ 昇降部材
１０ 振動発生部材
１６ 振動伝達部材
１９ 保持部
DESCRIPTION OF SYMBOLS 1 Ultrasonic cleaning apparatus 3 Cleaning tank 5 Lifting member 10 Vibration generating member 16 Vibration transmission member 19 Holding part

Claims (6)

超音波振動を洗浄液に作用することにより洗浄液内の被洗浄体を洗浄する超音波洗浄装置であって、
前記洗浄液を貯留するとともに前記被洗浄物を前記洗浄液内に浸漬するための洗浄槽と、
前記洗浄槽の底面に装着され、超音波振動を発生する振動発生部材と、
前記振動発生部材に接し、前記振動発生部材からの超音波振動を前記洗浄液に作用する振動伝達部材と、を備え、
前記振動伝達部材の表面に、複数の凸状球面を設けた超音波洗浄装置。 An ultrasonic cleaning apparatus that cleans an object to be cleaned in the cleaning liquid by applying ultrasonic vibration to the cleaning liquid,
A cleaning tank for storing the cleaning liquid and immersing the object to be cleaned in the cleaning liquid;
A vibration generating member mounted on the bottom surface of the cleaning tank and generating ultrasonic vibration;
A vibration transmission member that is in contact with the vibration generating member and acts on the cleaning liquid with ultrasonic vibration from the vibration generating member;
An ultrasonic cleaning apparatus in which a plurality of convex spherical surfaces are provided on a surface of the vibration transmitting member. 前記振動伝達部材は、前記振動発生部材に接する板状部材と、板状部材上に載置された複数の球状部材と、から構成され、前記複数の凸状球面は、前記複数の球状部材の外周部分により構成される請求項１に記載の超音波洗浄装置。   The vibration transmitting member includes a plate-like member that is in contact with the vibration-generating member, and a plurality of spherical members placed on the plate-like member, and the plurality of convex spherical surfaces are formed of the plurality of spherical members. The ultrasonic cleaning apparatus according to claim 1, comprising an outer peripheral portion. 超音波振動を処理液に作用することにより処理液内の処理対象物を処理する超音波処理装置であって、
前記処理液を貯留するとともに前記処理対象物を前記処理液内に浸漬するための処理槽と、
超音波振動を発生し、前記超音波振動を前記処理液に伝達可能となるように振動伝達領域が配置された振動発生部材と、を備え、
前記振動伝達領域において前記処理液に前記超音波振動を伝達する面には、同一面内に配置された複数の突起部を有する超音波処理装置。 An ultrasonic processing apparatus for processing an object to be processed in a processing liquid by applying ultrasonic vibration to the processing liquid,
A treatment tank for storing the treatment liquid and immersing the treatment object in the treatment liquid;
A vibration generating member in which a vibration transmission region is disposed so as to generate ultrasonic vibration and transmit the ultrasonic vibration to the treatment liquid;
The ultrasonic processing apparatus which has the some protrusion part arrange | positioned in the same surface in the surface which transmits the said ultrasonic vibration to the said process liquid in the said vibration transmission area | region. 前記突起部は、凸状曲面を有する請求項３に記載の超音波処理装置。   The ultrasonic processing apparatus according to claim 3, wherein the protrusion has a convex curved surface. 前記凸状曲面は、球状部材、円錐状部材若しくは円錐台形状部材の外周部分から構成される請求項４に記載の超音波処理装置。   The ultrasonic processing apparatus according to claim 4, wherein the convex curved surface includes an outer peripheral portion of a spherical member, a conical member, or a truncated cone member. 前記処理は、物品の洗浄、混合物の合成、若しくは分散、化学反応の促進、又は処理液の消泡若しくは脱泡の処理であることを特徴とする請求項３〜５のいずれか一項に記載の超音波処理装置。
The said process is washing | cleaning of articles | goods, the synthesis | combination or dispersion | distribution of a mixture, acceleration | stimulation of a chemical reaction, or the process of defoaming or defoaming a process liquid, The process of any one of Claims 3-5 characterized by the above-mentioned. Sonication equipment.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019043976A1 (en) * 2017-08-31 2019-03-07 シャープ株式会社 Ultrasonic generator, cleaning device, and extraction device
CN112514034A (en) * 2018-08-02 2021-03-16 株式会社钟化 Cartridge and cleaning bath set

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019043976A1 (en) * 2017-08-31 2019-03-07 シャープ株式会社 Ultrasonic generator, cleaning device, and extraction device
CN112514034A (en) * 2018-08-02 2021-03-16 株式会社钟化 Cartridge and cleaning bath set
CN112514034B (en) * 2018-08-02 2024-04-12 株式会社钟化 Box and cleaning bath set

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