JP2007012813A - 半導体装置及びその製造方法 - Google Patents
半導体装置及びその製造方法 Download PDFInfo
- Publication number
- JP2007012813A JP2007012813A JP2005190448A JP2005190448A JP2007012813A JP 2007012813 A JP2007012813 A JP 2007012813A JP 2005190448 A JP2005190448 A JP 2005190448A JP 2005190448 A JP2005190448 A JP 2005190448A JP 2007012813 A JP2007012813 A JP 2007012813A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- resin protrusion
- wiring
- semiconductor substrate
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L24/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/11—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
- H01L2224/0502—Disposition
- H01L2224/05022—Disposition the internal layer being at least partially embedded in the surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
- H01L2224/0502—Disposition
- H01L2224/05024—Disposition the internal layer being disposed on a redistribution layer on the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
- H01L2224/05099—Material
- H01L2224/051—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05117—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
- H01L2224/05124—Aluminium [Al] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
- H01L2224/05099—Material
- H01L2224/051—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/05147—Copper [Cu] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
- H01L2224/1319—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/1354—Coating
- H01L2224/13599—Material
- H01L2224/136—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01018—Argon [Ar]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01022—Titanium [Ti]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01074—Tungsten [W]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19043—Component type being a resistor
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
【解決手段】 半導体装置は、電極14を有する半導体基板10と、半導体基板10上に形成された樹脂突起20と、電極14と電気的に接続されてなり、樹脂突起20上に至るように形成された配線30とを含む。配線30は、樹脂突起20の上端面に形成された第1の部分31と、樹脂突起20の基端部の側方に形成された第2の部分32とを含む。第2の部分32は、第1の部分31よりも幅が狭い。
【選択図】 図1
Description
前記半導体基板上に形成された樹脂突起と、
前記電極と電気的に接続されてなり、前記樹脂突起上に至るように形成された配線と、
を含み、
前記配線は、前記樹脂突起の上端面に形成された第1の部分と、前記樹脂突起の基端部の側方に形成された第2の部分とを含み、
前記第2の部分は、前記第1の部分よりも幅が狭い。本発明によると、隣り合う2つの配線間で、マイグレーションを原因とする電気的なショートが発生しにくい、信頼性の高い半導体装置を提供することができる。
(2)この半導体装置において、
前記配線は、前記第2の部分に延設された延設部と、前記延設部と前記電極とをつなぐ導電部とを含み、
前記延設部は前記導電部よりも幅が狭くてもよい。
(3)この半導体装置において、
前記延設部は、前記第2の部分と同じ幅をなしていてもよい。
(4)この半導体装置において、
前記配線のうち、前記半導体基板上に形成された部分は、前記第2の部分と同じ幅をなしていてもよい。
(5)この半導体装置において、
前記配線の前記第2の部分は、前記樹脂突起に固定されていなくてもよい。これによると、応力に対する信頼性の高い半導体装置を提供することができる。
(6)本発明に係る半導体装置の製造方法は、電極を有する半導体基板を用意する工程と、
前記半導体基板上に樹脂突起を形成する工程と、
前記電極と電気的に接続されてなり、前記樹脂突起の上端面に形成された第1の部分と、前記樹脂突起の基端面に形成された、前記第1の部分よりも幅が狭い第2の部分とを有する配線を形成する工程と、
前記樹脂突起の前記基端面における前記第2の部分と接触する部分の少なくとも一部を除去する工程と、
を含む。本発明によると、隣り合う2つの配線間で、マイグレーションを原因とする電気的なショートが発生しにくく、かつ、応力に対する信頼性の高い半導体装置を製造することができる。
図1(A)〜図3は、本発明を適用した実施の形態に係る半導体装置について説明するための図である。なお、図1(A)は、本発明を適用した実施の形態に係る半導体装置1の上視図であり、図1(B)は、図1(A)のIB−IB線断面の一部拡大図である。また、図2は、半導体装置1の概略図であり、図3は、半導体装置1が実装された電子モジュールを示す図である。
図4(A)〜図7は、本発明を適用した実施の形態に係る半導体装置の製造方法について説明するための図である。
Claims (6)
- 電極を有する半導体基板と、
前記半導体基板上に形成された樹脂突起と、
前記電極と電気的に接続されてなり、前記樹脂突起上に至るように形成された配線と、
を含み、
前記配線は、前記樹脂突起の上端面に形成された第1の部分と、前記樹脂突起の基端部の側方に形成された第2の部分とを含み、
前記第2の部分は、前記第1の部分よりも幅が狭い半導体装置。 - 請求項1記載の半導体装置において、
前記配線は、前記第2の部分に延設された延設部と、前記延設部と前記電極とをつなぐ導電部とを含み、
前記延設部は前記導電部よりも幅が狭い半導体装置。 - 請求項2記載の半導体装置において、
前記延設部は、前記第2の部分と同じ幅をなす半導体装置。 - 請求項1記載の半導体装置において、
前記配線のうち、前記半導体基板上に形成された部分は、前記第2の部分と同じ幅をなす半導体装置。 - 請求項1から請求項4のいずれかに記載の半導体装置において、
前記配線の前記第2の部分は、前記樹脂突起に固定されていない半導体装置。 - 電極を有する半導体基板を用意する工程と、
前記半導体基板上に樹脂突起を形成する工程と、
前記電極と電気的に接続されてなり、前記樹脂突起の上端面に形成された第1の部分と、前記樹脂突起の基端面に形成された、前記第1の部分よりも幅が狭い第2の部分とを有する配線を形成する工程と、
前記樹脂突起の前記基端面における前記第2の部分と接触する部分の少なくとも一部を除去する工程と、
を含む半導体装置の製造方法。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005190448A JP4284544B2 (ja) | 2005-06-29 | 2005-06-29 | 半導体装置及びその製造方法 |
US11/444,271 US7671476B2 (en) | 2005-06-29 | 2006-05-31 | Semiconductor device and method of manufacturing the same |
KR1020060052544A KR100786210B1 (ko) | 2005-06-29 | 2006-06-12 | 반도체 장치 및 그 제조 방법 |
CNB2006100946150A CN100461396C (zh) | 2005-06-29 | 2006-06-21 | 半导体装置及其制造方法 |
TW095123349A TW200715424A (en) | 2005-06-29 | 2006-06-28 | Semiconductor device and method of manufacturing the same |
US12/685,169 US7825518B2 (en) | 2005-06-29 | 2010-01-11 | Semiconductor device and method of manufacturing the same |
US12/891,145 US7936073B2 (en) | 2005-06-29 | 2010-09-27 | Semiconductor device and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005190448A JP4284544B2 (ja) | 2005-06-29 | 2005-06-29 | 半導体装置及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007012813A true JP2007012813A (ja) | 2007-01-18 |
JP4284544B2 JP4284544B2 (ja) | 2009-06-24 |
Family
ID=37588403
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005190448A Active JP4284544B2 (ja) | 2005-06-29 | 2005-06-29 | 半導体装置及びその製造方法 |
Country Status (5)
Country | Link |
---|---|
US (3) | US7671476B2 (ja) |
JP (1) | JP4284544B2 (ja) |
KR (1) | KR100786210B1 (ja) |
CN (1) | CN100461396C (ja) |
TW (1) | TW200715424A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9748115B2 (en) | 2014-11-25 | 2017-08-29 | Seiko Epson Corporation | Electronic component and method for producing the same |
JP2018049933A (ja) * | 2016-09-21 | 2018-03-29 | セイコーエプソン株式会社 | 実装構造体、超音波デバイス、超音波探触子、超音波装置、及び電子機器 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4572376B2 (ja) * | 2007-07-30 | 2010-11-04 | セイコーエプソン株式会社 | 半導体装置の製造方法および電子デバイスの製造方法 |
JP4353289B2 (ja) * | 2007-08-20 | 2009-10-28 | セイコーエプソン株式会社 | 電子デバイス及び電子機器 |
JP4352279B2 (ja) * | 2007-08-21 | 2009-10-28 | セイコーエプソン株式会社 | 半導体装置及びその製造方法 |
JP4737466B2 (ja) * | 2009-02-09 | 2011-08-03 | セイコーエプソン株式会社 | 半導体装置及びその製造方法 |
KR101897653B1 (ko) * | 2017-03-06 | 2018-09-12 | 엘비세미콘 주식회사 | 컴플라이언트 범프의 제조방법 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02272737A (ja) | 1989-04-14 | 1990-11-07 | Citizen Watch Co Ltd | 半導体の突起電極構造及び突起電極形成方法 |
JPH1167776A (ja) | 1997-08-21 | 1999-03-09 | Citizen Watch Co Ltd | 突起電極およびその製造方法 |
JP3642414B2 (ja) | 2001-02-08 | 2005-04-27 | シャープ株式会社 | 半導体装置およびその製造方法 |
JP3983996B2 (ja) | 2001-04-23 | 2007-09-26 | 株式会社ルネサステクノロジ | 半導体集積回路装置 |
JP2005101527A (ja) | 2003-08-21 | 2005-04-14 | Seiko Epson Corp | 電子部品の実装構造、電気光学装置、電子機器及び電子部品の実装方法 |
JP3938128B2 (ja) | 2003-09-30 | 2007-06-27 | セイコーエプソン株式会社 | 半導体装置とその製造方法、回路基板、電気光学装置、及び電子機器 |
JP4218622B2 (ja) | 2003-10-09 | 2009-02-04 | セイコーエプソン株式会社 | 半導体装置の製造方法 |
JP4133786B2 (ja) * | 2003-12-16 | 2008-08-13 | 日東電工株式会社 | 配線回路基板 |
JP3873986B2 (ja) | 2004-04-16 | 2007-01-31 | セイコーエプソン株式会社 | 電子部品、実装構造体、電気光学装置および電子機器 |
JP2005340761A (ja) | 2004-04-27 | 2005-12-08 | Seiko Epson Corp | 半導体装置の実装方法、回路基板、電気光学装置並びに電子機器 |
JP3994989B2 (ja) | 2004-06-14 | 2007-10-24 | セイコーエプソン株式会社 | 半導体装置、回路基板、電気光学装置および電子機器 |
-
2005
- 2005-06-29 JP JP2005190448A patent/JP4284544B2/ja active Active
-
2006
- 2006-05-31 US US11/444,271 patent/US7671476B2/en not_active Expired - Fee Related
- 2006-06-12 KR KR1020060052544A patent/KR100786210B1/ko active IP Right Grant
- 2006-06-21 CN CNB2006100946150A patent/CN100461396C/zh not_active Expired - Fee Related
- 2006-06-28 TW TW095123349A patent/TW200715424A/zh unknown
-
2010
- 2010-01-11 US US12/685,169 patent/US7825518B2/en not_active Expired - Fee Related
- 2010-09-27 US US12/891,145 patent/US7936073B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9748115B2 (en) | 2014-11-25 | 2017-08-29 | Seiko Epson Corporation | Electronic component and method for producing the same |
JP2018049933A (ja) * | 2016-09-21 | 2018-03-29 | セイコーエプソン株式会社 | 実装構造体、超音波デバイス、超音波探触子、超音波装置、及び電子機器 |
Also Published As
Publication number | Publication date |
---|---|
US20110011630A1 (en) | 2011-01-20 |
KR100786210B1 (ko) | 2007-12-17 |
US20100109144A1 (en) | 2010-05-06 |
US7825518B2 (en) | 2010-11-02 |
US20070001200A1 (en) | 2007-01-04 |
US7936073B2 (en) | 2011-05-03 |
TW200715424A (en) | 2007-04-16 |
CN1893057A (zh) | 2007-01-10 |
CN100461396C (zh) | 2009-02-11 |
US7671476B2 (en) | 2010-03-02 |
JP4284544B2 (ja) | 2009-06-24 |
KR20070001797A (ko) | 2007-01-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4328970B2 (ja) | 半導体装置 | |
JP4284544B2 (ja) | 半導体装置及びその製造方法 | |
JP4269173B2 (ja) | 半導体装置及びその製造方法 | |
JP2007208209A (ja) | 半導体装置及びその製造方法 | |
JP4061506B2 (ja) | 半導体装置の製造方法 | |
US8138612B2 (en) | Semiconductor device | |
JP4145902B2 (ja) | 半導体装置及びその製造方法 | |
JP4654790B2 (ja) | 半導体装置及びその製造方法 | |
JP2006287094A (ja) | 半導体装置及びその製造方法 | |
JP4968424B2 (ja) | 半導体装置 | |
JP2007115958A (ja) | 半導体装置 | |
JP2007042868A (ja) | 半導体装置 | |
JP2007012811A (ja) | 半導体装置の製造方法 | |
JP2007281216A (ja) | 半導体装置及びその製造方法、並びに、電子機器 | |
JP4873144B2 (ja) | 電子デバイスの製造方法、及び、半導体装置 | |
JP2006351922A (ja) | 半導体装置の製造方法 | |
JP2004281896A (ja) | 半導体装置及びその製造方法、回路基板並びに電子機器 | |
JP2006191141A (ja) | 半導体装置 | |
JP2006191140A (ja) | 半導体装置 | |
JP2005064536A (ja) | 半導体装置 | |
JP2005064537A (ja) | 半導体装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20071018 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20071024 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20071217 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20080626 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20081203 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090129 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090225 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090310 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120403 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4284544 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120403 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130403 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130403 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140403 Year of fee payment: 5 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |