JP2006319194A - Processing liquid production system - Google Patents

Processing liquid production system Download PDF

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JP2006319194A
JP2006319194A JP2005141459A JP2005141459A JP2006319194A JP 2006319194 A JP2006319194 A JP 2006319194A JP 2005141459 A JP2005141459 A JP 2005141459A JP 2005141459 A JP2005141459 A JP 2005141459A JP 2006319194 A JP2006319194 A JP 2006319194A
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Shingo Kawanishi
真悟 川西
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Tokyo Seimitsu Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To obtain a processing liquid production system for producing processing liquid with exact concentration through a simple arrangement. <P>SOLUTION: The processing liquid production system for producing processing liquid used in chemical mechanical polishing equipment by mixing first liquid and second liquid comprises preparation tubs 5A and 5B, a first flowmeter 11 for measuring flow rate of the first liquid supplied from a first liquid source 1 to the preparation tub, a second flowmeter 12 for measuring flow rate of the second liquid supplied from a second liquid source 2 to the preparation tub, and a control unit 13 for controlling supply of the first and second liquids depending on the production amount of processing liquid and the mixing ratio of the first and second liquid. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、少なくとも２つの液を混合して、半導体製造プロセスで、ウエハ上に形成された層の表面を化学機械研磨(Chemical Mechanical Polishing: CMP)する化学機械研磨（ＣＭＰ）装置において洗浄液として使用される処理液を製造する処理液製造装置に関する。   The present invention is used as a cleaning liquid in a chemical mechanical polishing (CMP) apparatus that mixes at least two liquids and performs chemical mechanical polishing (CMP) on the surface of a layer formed on a wafer in a semiconductor manufacturing process. The present invention relates to a processing liquid manufacturing apparatus for manufacturing a processing liquid.

近年、半導体製造プロセスにおいては、ＣＭＰ装置を使用してプロセスの途中のウエハの表面を化学機械研磨（ＣＭＰ）することが行われており、特許文献１などに説明されている。ＣＭＰ装置は、研磨パッドを貼り付けたプラテンを回転させ、研磨パッド上にスラリィ（研磨粒子を含んだ研磨液）を供給しながら、ウエハ保持機構に保持されたウエハを回転しながら研磨パッドに押し付けて、ウエハの表面に形成された絶縁膜や金属膜の層を研磨する。   In recent years, in a semiconductor manufacturing process, chemical mechanical polishing (CMP) is performed on the surface of a wafer in the middle of a process using a CMP apparatus, which is described in Patent Document 1 and the like. The CMP device rotates the platen with the polishing pad attached, and supplies the slurry (polishing liquid containing abrasive particles) onto the polishing pad, while pressing the wafer held by the wafer holding mechanism against the polishing pad. Then, the insulating film or metal film layer formed on the surface of the wafer is polished.

ＣＭＰ装置では、ウエハの表面を研磨前及び研磨後に洗浄する必要があり、洗浄を行う時には、洗浄液製造装置で製造した洗浄液をＣＭＰ装置に供給する。洗浄液としては、過酸化水素、アンモニア、フッ酸などを純水と混合した溶液が使用されるが、各種の溶液を複数混合した溶液が使用される場合もある。本発明は、ＣＭＰ装置に供給する処理液を製造する処理液製造装置に関する。   In the CMP apparatus, it is necessary to clean the surface of the wafer before and after polishing. When cleaning is performed, the cleaning liquid manufactured by the cleaning liquid manufacturing apparatus is supplied to the CMP apparatus. As the cleaning liquid, a solution in which hydrogen peroxide, ammonia, hydrofluoric acid, or the like is mixed with pure water is used, but a solution in which a plurality of various solutions are mixed may be used. The present invention relates to a processing liquid manufacturing apparatus for manufacturing a processing liquid to be supplied to a CMP apparatus.

処理液はＣＭＰ装置で洗浄に使用されるので、金属イオンなどを含まないようにする必要があり、処理液製造装置は金属製の経路や容器を使用できない。   Since the processing liquid is used for cleaning in the CMP apparatus, it is necessary to prevent metal ions from being contained, and the processing liquid manufacturing apparatus cannot use a metal path or container.

図１は、従来の処理液製造装置の概略構成を示す図である。この処理液製造装置は、薬液源１から供給される過酸化水素水やアンモニア水などの薬液を、純水源２から供給される純水と混合して所定の濃度の薬液を製造して、ＣＭＰ装置の洗浄機に供給する。薬液源１から供給される薬液は、空気操作弁(air operated valve)Ｖ１を介して秤量槽３に注入される。秤量槽３には液面センサ４が設けられており、秤量槽３に注入された薬液の液面を検出することにより、秤量槽３内の薬液の量を検出する。このようにして計量された秤量槽３内の薬液は、空気操作弁Ｖ３及びＶ４を介して第１の調合槽５Ａに、及び空気操作弁Ｖ３及びＶ６を介して第２の調合槽５Ｂに注入される。   FIG. 1 is a diagram showing a schematic configuration of a conventional processing liquid production apparatus. This processing liquid manufacturing apparatus mixes a chemical solution such as hydrogen peroxide solution or ammonia water supplied from a chemical solution source 1 with pure water supplied from a pure water source 2 to produce a chemical solution having a predetermined concentration, and performs CMP. Supply to the machine washer. The chemical solution supplied from the chemical solution source 1 is injected into the weighing tank 3 through an air operated valve V1. A liquid level sensor 4 is provided in the weighing tank 3, and the amount of the chemical liquid in the weighing tank 3 is detected by detecting the liquid level of the chemical liquid injected into the weighing tank 3. The chemical solution in the weighing tank 3 thus weighed is injected into the first mixing tank 5A via the air operation valves V3 and V4 and into the second mixing tank 5B via the air operation valves V3 and V6. Is done.

一方、純水源２から供給される純水は、空気操作弁Ｖ５を介して第１の調合槽５Ａに、及び空気操作弁Ｖ７を介して第２の調合槽５Ｂに注入される。第１の調合槽５Ａ及び第２の調合槽５Ｂには、液面センサ６Ａ及び６Ｂがそれぞれ設けられており、第１の調合槽５Ａ及び第２の調合槽５Ｂに注入された液体の液面を検出することにより、第１の調合槽５Ａ及び第２の調合槽５Ｂの液体量が検出できる。前述のように、第１の調合槽５Ａ及び第２の調合槽５Ｂに注入される薬液の量は秤量槽３により計量されているので、第１の調合槽５Ａ及び第２の調合槽５Ｂの液体量が検出できれば、薬液を純水で希釈した時の濃度が判明する。純水の量は、第１の調合槽５Ａ及び第２の調合槽５Ｂの液体量から薬液の量を減じた量である。   On the other hand, pure water supplied from the pure water source 2 is injected into the first preparation tank 5A through the air operation valve V5 and into the second preparation tank 5B through the air operation valve V7. The first mixing tank 5A and the second mixing tank 5B are provided with liquid level sensors 6A and 6B, respectively, and the liquid level of the liquid injected into the first mixing tank 5A and the second mixing tank 5B. By detecting this, the amount of liquid in the first preparation tank 5A and the second preparation tank 5B can be detected. As described above, since the amount of the chemical solution injected into the first mixing tank 5A and the second mixing tank 5B is measured by the weighing tank 3, the first mixing tank 5A and the second mixing tank 5B If the amount of liquid can be detected, the concentration when the chemical is diluted with pure water can be determined. The amount of pure water is an amount obtained by subtracting the amount of the chemical from the amount of liquid in the first preparation tank 5A and the second preparation tank 5B.

調合槽が２個設けられているのは、一方の調合槽の処理液をＣＭＰ装置の洗浄機に供給している間に、他方の調合槽で処理液を製造するためである。第１の調合槽５Ａ及び第２の調合槽５Ｂの処理液は、空気操作弁Ｖ８及びＶ９を介してポンプ７に供給され、ポンプ７により加圧された後、空気操作弁Ｖ１０を介して洗浄機に供給される。   Two mixing tanks are provided in order to produce the processing liquid in the other mixing tank while supplying the processing liquid from one mixing tank to the cleaning machine of the CMP apparatus. The treatment liquid in the first mixing tank 5A and the second mixing tank 5B is supplied to the pump 7 through the air operation valves V8 and V9, pressurized after being pumped by the pump 7, and then cleaned through the air operation valve V10. Supplied to the machine.

特開２００４−２７５９１７号公報JP 2004-275917 A

上記のように、従来の処理液製造装置は、薬液の計量を液面センサで秤量槽の液面を検出することにより行い、薬液と純水の混合液の計量を液面センサで混合槽の液面を検出することにより行っている。しかし、上記のように、処理液中に金属イオンが含まれないようにする必要があり、液面センサも耐薬品性であることが要求される。このような条件を満たす液面センサは検出精度が不十分であり、処理液の混合比の精度が悪いという問題がある。   As described above, the conventional processing liquid production apparatus measures the chemical liquid by detecting the liquid level of the weighing tank with the liquid level sensor, and measures the mixed liquid of the chemical liquid and pure water with the liquid level sensor. This is done by detecting the liquid level. However, as described above, it is necessary to prevent metal ions from being contained in the treatment liquid, and the liquid level sensor is also required to have chemical resistance. The liquid level sensor that satisfies such a condition has a problem that the detection accuracy is insufficient and the mixing ratio of the processing liquid is poor.

また、処理液の製造量及び濃度は連続的に任意に変更できることが要求される。液面センサはセンサの位置を調整することにより計量する量を任意に設定できるという利点があるが、センサ位置の設定を連続して変化させるのは難しく、処理液の製造量及び濃度を小刻みに設定できないという問題がある。   Further, it is required that the production amount and concentration of the treatment liquid can be arbitrarily changed continuously. The liquid level sensor has the advantage that the amount to be measured can be set arbitrarily by adjusting the position of the sensor, but it is difficult to change the setting of the sensor position continuously, and the production volume and concentration of the processing liquid are small. There is a problem that it cannot be set.

また、揮発性の薬液の場合、混合液の状態でも薬液成分が蒸発して濃度が変化するという問題がある。特に、２個の混合槽を使用して、一方の混合槽の処理液を供給する場合残量が徐々に減少するが、残量が減少した状態では薬液成分の蒸発による濃度変化への影響が大きくなり、残った処理液の濃度が大きく変化するという問題を生じる。このような問題を回避するため、処理液の残量が少なくなると残量を廃棄することも行われているが、これは溶液を無駄にしてコスト増加の要因になる。   Further, in the case of a volatile chemical solution, there is a problem that the chemical solution components evaporate and the concentration changes even in a mixed solution state. In particular, when two mixing tanks are used and the processing liquid in one mixing tank is supplied, the remaining amount gradually decreases. However, in the state where the remaining amount is reduced, the concentration change due to evaporation of the chemical components is affected. A problem arises in that the concentration of the remaining processing solution changes greatly. In order to avoid such a problem, when the remaining amount of the processing liquid decreases, the remaining amount is also discarded. However, this wastes the solution and causes an increase in cost.

本発明は、上記のような問題に鑑みてなされたものであり、第１の目的は、正確な濃度で処理液を製造できる処理液製造装置の実現であり、第２の目的は、処理液を無駄にすることのない処理液製造装置の実現である。   The present invention has been made in view of the above problems, and a first object is to realize a treatment liquid production apparatus capable of producing a treatment liquid with an accurate concentration, and a second object is to provide a treatment liquid. It is realization of the processing liquid manufacturing apparatus which does not waste.

上記第１の目的を実現するため、本発明の第１の態様の処理液製造装置は、第１液と第２液を混合して化学機械研磨装置で使用する処理液を製造する処理液製造装置であって、調合槽と、第１液源から前記調合槽へ供給する前記第１液の流量を計量する第１流量計と、第２液源から前記調合槽へ供給する前記第２液の流量を計量する第２流量計と、処理液の製造量及び前記第１液と第２液の混合比に応じて、前記第１液及び第２液の供給を制御する制御部とを備えることを特徴とする。   In order to realize the first object, the processing liquid manufacturing apparatus according to the first aspect of the present invention is a processing liquid manufacturing that mixes the first liquid and the second liquid to manufacture a processing liquid used in the chemical mechanical polishing apparatus. A device, a first tank for measuring a flow rate of the first liquid supplied from the first liquid source to the mixing tank, and a second liquid supplied from the second liquid source to the mixing tank. And a controller for controlling the supply of the first liquid and the second liquid according to the production amount of the processing liquid and the mixing ratio of the first liquid and the second liquid. It is characterized by that.

本発明の第１の態様の処理液製造装置は、混合する第１液及び第２液の量を、精密な第１流量計及び第２流量計で計量して、計量した値に基づいて瞬時に調合槽への供給を制御するため、高精度の混合が可能である。   The processing liquid manufacturing apparatus according to the first aspect of the present invention measures the amounts of the first liquid and the second liquid to be mixed with the precise first flow meter and the second flow meter, and instantaneously based on the measured values. In addition, since the supply to the mixing tank is controlled, highly accurate mixing is possible.

例えば、第１液は薬液であり、第２液は純水である。   For example, the first liquid is a chemical liquid and the second liquid is pure water.

薬液に対応する第１液は、純水に対応する第２液に比べて混合比が小さいので、第１流量計で計量する場合も低流量であり、流量が不安定になるという問題がある。そこで、第１液源と第１流量計の間に、第１液の流量を安定化する定流量弁を備えることが望ましい。   Since the first liquid corresponding to the chemical liquid has a smaller mixing ratio than the second liquid corresponding to pure water, there is a problem that the flow rate becomes unstable even when measured by the first flow meter. . Therefore, it is desirable to provide a constant flow valve for stabilizing the flow rate of the first liquid between the first liquid source and the first flow meter.

また、薬液に対応する第１液が発泡性の場合には、流量が不安定で流量計の計量値が不安定になるので、第１流量計は、第１液の供給圧力が一定になるようにする定圧弁と、バルブ及び圧力センサを有する流量コントローラとを備えるように構成することが望ましい。   Further, when the first liquid corresponding to the chemical liquid is foaming, the flow rate is unstable and the measured value of the flow meter becomes unstable, so the first flow meter has a constant supply pressure of the first liquid. It is desirable to provide a constant pressure valve and a flow rate controller having a valve and a pressure sensor.

調合槽は、単一でもよいが、上記のように、第１調合槽と第２調合槽の２つの調合槽を備えることが望ましい。   Although a single mixing tank may be used, it is desirable to provide two mixing tanks, a first mixing tank and a second mixing tank, as described above.

上記第２の目的を実現するため、本発明の第２の態様の処理液製造装置は、第１液と第２液を混合して化学機械研磨装置で使用する処理液を製造する処理液製造装置であって、調合槽と、第１液源から前記調合槽へ供給する前記第１液の流量を計量する第１流量計と、第２液源から前記調合槽へ供給する前記第２液の流量を計量する第２流量計と、前記調合槽の処理液の濃度を検出する濃度計と、前記濃度計の検出した濃度に応じて、前記調合槽の処理液の濃度が所望の濃度値になるように、前記第１液及び第２液の供給を制御する制御部とを備えることを特徴とする。   In order to achieve the second object, the processing liquid manufacturing apparatus according to the second aspect of the present invention is a processing liquid manufacturing for manufacturing a processing liquid used in a chemical mechanical polishing apparatus by mixing the first liquid and the second liquid. A device, a first tank for measuring a flow rate of the first liquid supplied from the first liquid source to the mixing tank, and a second liquid supplied from the second liquid source to the mixing tank. A second flow meter for measuring the flow rate of the liquid, a concentration meter for detecting the concentration of the treatment liquid in the preparation tank, and the concentration of the treatment liquid in the preparation tank is a desired concentration value according to the concentration detected by the concentration meter. And a controller for controlling the supply of the first liquid and the second liquid.

本発明の第２の態様の処理液製造装置は、調合槽内の液の濃度を検出しながら、調合槽に供給する第１液と第２液の量を調整するので、調合槽内の液を所望の濃度値にできる。したがって、残液が減少するなどして、調合槽内の処理液の濃度が変化した時にも第１液と第２液を供給して、所望の濃度値の処理液を所望量だけ製造することができる。   The treatment liquid production apparatus according to the second aspect of the present invention adjusts the amounts of the first liquid and the second liquid supplied to the preparation tank while detecting the concentration of the liquid in the preparation tank. Can be set to a desired concentration value. Therefore, the first liquid and the second liquid are supplied even when the concentration of the processing liquid in the preparation tank changes due to a decrease in the residual liquid, and the processing liquid having a desired concentration value is produced in a desired amount. Can do.

調合槽は、単一でもよいが、上記のように、第１調合槽と第２調合槽の２つの調合槽を備えることが望ましい。   Although a single mixing tank may be used, it is desirable to provide two mixing tanks, a first mixing tank and a second mixing tank, as described above.

濃度計は高価なので、２つの調合槽を備える場合には、第１調合槽の処理液と第２調合槽の処理液を選択的に濃度計に供給できるようにして、濃度計を共用することが望ましい。   Since the densitometer is expensive, when two blending tanks are provided, the densitometer should be shared so that the treatment liquid in the first blending tank and the treatment liquid in the second blending tank can be selectively supplied to the densitometer. Is desirable.

本発明の第１の態様によれば、簡単な構成で、正確な濃度で処理液を製造できる。   According to the first aspect of the present invention, the treatment liquid can be manufactured with an accurate concentration with a simple configuration.

本発明の第１の態様によれば、残液がある状態からでも、所望の濃度の処理液を所望の量だけ製造できるので、処理液を無駄にすることがなくなる。   According to the first aspect of the present invention, a processing liquid having a desired concentration can be produced in a desired amount even in a state where there is a residual liquid, so that the processing liquid is not wasted.

図２は、本発明の第１実施例のＣＭＰ装置で使用する処理液を製造する処理液製造装置の構成を示す図である。図１と比較して明らかなように、第１実施例の処理液製造装置は、図１の従来の装置における空気操作バルブＶ１とＶ３、秤量槽３、及び液面センサ４の代わりに、空圧源８、精密レギュレータ９、定流量弁１０及び流量計１１を設け、空気操作バルブＶ４、６及びＶ５、７の開閉を制御する制御部１３を設けた点が、従来例と異なり、他の部分は従来例と同じである。   FIG. 2 is a diagram showing a configuration of a processing liquid manufacturing apparatus for manufacturing a processing liquid used in the CMP apparatus according to the first embodiment of the present invention. As apparent from the comparison with FIG. 1, the processing liquid production apparatus of the first embodiment is empty in place of the air operation valves V1 and V3, the weighing tank 3 and the liquid level sensor 4 in the conventional apparatus of FIG. Unlike the conventional example, the pressure source 8, the precision regulator 9, the constant flow valve 10, and the flow meter 11 are provided, and the control unit 13 that controls the opening and closing of the air operation valves V4, 6 and V5, 7 is provided. The part is the same as the conventional example.

薬液は、純水に比べて供給量が小さいので低流量であり、流量が不安定になるという問題がある。そこで、第１実施例では、薬液源２と流量計１１の間に、薬液の流量を安定化する定流量弁１０を設けている。定流量弁１０は、空圧源８から供給され、精密レギュレータ９で圧力を精密に調整された空気圧により制御される。流量計１１及び１２は、例えば超音波式流量計であり、流量を精密に瞬時に測定することができる。流量計１１及び１２は、通過する薬液及び純水の量を正確に計量し、所定量を流した時に制御部１３に信号を出力する。制御部１３は、この信号に応じて、空気操作バルブＶ４、６及びＶ５、７を閉じるように制御する。これにより、調合槽５Ａ又は５Ｂに所定量の薬液及び純水を供給することができる。   Since the supply amount of the chemical solution is smaller than that of pure water, there is a problem that the flow rate is low and the flow rate becomes unstable. Therefore, in the first embodiment, a constant flow valve 10 that stabilizes the flow rate of the chemical solution is provided between the chemical solution source 2 and the flow meter 11. The constant flow valve 10 is supplied from an air pressure source 8 and is controlled by an air pressure whose pressure is precisely adjusted by a precision regulator 9. The flow meters 11 and 12 are, for example, ultrasonic flow meters, and can accurately and instantaneously measure the flow rate. The flow meters 11 and 12 accurately measure the amount of chemical solution and pure water that pass through, and output a signal to the control unit 13 when a predetermined amount flows. The control unit 13 controls the air operation valves V4, 6 and V5, 7 to be closed according to this signal. Thereby, a predetermined amount of chemical | medical solution and pure water can be supplied to the mixing tank 5A or 5B.

調合槽５Ａ又は５Ｂには、液面センサ６Ａ及び６Ｂがそれぞれ設けられているが、これらの液面センサ６Ａ及び６Ｂは、槽内の液量を検出するためのものである。   Liquid level sensors 6A and 6B are provided in the mixing tank 5A or 5B, respectively. These liquid level sensors 6A and 6B are for detecting the liquid amount in the tank.

図３は、本発明の第２実施例のＣＭＰ装置で使用する処理液を製造する処理液製造装置の構成を示す図である。図２と比較して明らかなように、第２実施例の処理液製造装置は、薬液源２が過酸化水素水を供給する過酸化水素水減２Ａであり、図２の第１実施例の装置における空圧源８、精密レギュレータ９、定流量弁１０及び流量計１１の代わりに、定圧弁２１及び流量コントローラ２２を設けた点が第１実施例と異なり、他の部分は第１実施例と同じである。   FIG. 3 is a diagram showing a configuration of a processing liquid manufacturing apparatus for manufacturing a processing liquid used in the CMP apparatus according to the second embodiment of the present invention. As apparent from the comparison with FIG. 2, the treatment liquid production apparatus of the second embodiment is a hydrogen peroxide reduction 2A in which the chemical liquid source 2 supplies the hydrogen peroxide water. Unlike the first embodiment, a constant pressure valve 21 and a flow rate controller 22 are provided in place of the pneumatic pressure source 8, precision regulator 9, constant flow valve 10 and flow meter 11 in the apparatus. Is the same.

過酸化水素水は、発泡性であり、図２の構成では、流量が安定せず、流量計で正確に流量を測定するのが難しいという問題を生じる。そこで、第２実施例では、手動式の定圧弁２１を設け、高速応答性のバルブと圧力センサを内蔵した流量コントローラ２２を設けて、発泡性の過酸化水素水の流量を正確に測定できるようにしている。   The hydrogen peroxide solution is foaming, and the configuration of FIG. 2 causes a problem that the flow rate is not stable and it is difficult to accurately measure the flow rate with a flow meter. Therefore, in the second embodiment, a manual constant pressure valve 21 is provided, and a flow rate controller 22 incorporating a high-speed response valve and a pressure sensor is provided so that the flow rate of foaming hydrogen peroxide water can be accurately measured. I have to.

図４は、本発明の第３実施例のＣＭＰ装置で使用する処理液を製造する処理液製造装置の構成を示す図である。図２と比較して明らかなように、第３実施例の処理液製造装置は、第１実施例と第２実施例の構成を合せ、更に調合槽５Ａ及び５Ｂ内の処理液の濃度を測定する濃度計３１を設けた構成を有する。   FIG. 4 is a diagram showing a configuration of a processing liquid manufacturing apparatus for manufacturing a processing liquid used in the CMP apparatus according to the third embodiment of the present invention. As apparent from the comparison with FIG. 2, the processing liquid production apparatus of the third embodiment combines the configurations of the first and second embodiments and further measures the concentration of the processing liquid in the mixing tanks 5A and 5B. The concentration meter 31 is provided.

濃度計３１は、処理液中の超音波の伝播速度及び導電率を検出することにより濃度を検出する超音波濃度計を使用する。超音波濃度計は、液体内の３成分のうちの２成分の濃度、例えば、純水とアンモニア水と過酸化水素水のうちのアンモニア（水）と過酸化水素（水）の２成分の濃度を検出することができる。   The densitometer 31 uses an ultrasonic densitometer that detects the concentration by detecting the propagation speed and conductivity of the ultrasonic wave in the treatment liquid. The ultrasonic densitometer is the concentration of two components of the three components in the liquid, for example, the concentration of two components of ammonia (water) and hydrogen peroxide (water) of pure water, ammonia water and hydrogen peroxide solution. Can be detected.

第１調合槽５Ａ内の処理液の濃度を検出する時には、空気操作バルブＶ２１とＶ２２を閉じ、空気操作バルブＶ１９とＶ２０を開放した状態で、ポンプ３２を動作させることにより、第１調合槽５Ａ内の処理液が濃度計３１内を循環し、濃度が検出される。第２調合槽５Ｂ内の処理液の濃度を検出する時には、空気操作バルブＶ１９とＶ２０を閉じ、空気操作バルブＶ２１とＶ２２を開放した状態で、ポンプ３２を動作させることにより、第２調合槽５Ｂ内の処理液が濃度計３１内を循環し、濃度が検出される。   When detecting the concentration of the processing liquid in the first mixing tank 5A, the first mixing tank 5A is operated by operating the pump 32 with the air operation valves V21 and V22 closed and the air operation valves V19 and V20 opened. The processing solution inside circulates in the concentration meter 31, and the concentration is detected. When detecting the concentration of the processing liquid in the second mixing tank 5B, the second mixing tank 5B is operated by operating the pump 32 with the air operation valves V19 and V20 closed and the air operation valves V21 and V22 opened. The processing solution inside circulates in the concentration meter 31, and the concentration is detected.

第３実施例の処理液製造装置では、第１実施例と同様に、一方の調合槽内の処理液をＣＭＰ装置の洗浄機に供給している間に、他方の調合槽に薬剤及び純水を供給して処理液を製造する。この時供給する薬剤及び純水の量は流量計１１及び１２で精密に測定されるので所望の濃度の処理液を製造することができる。一方の調合槽内の処理液は、処理液の供給による残液の減少及び時間の経過にしたがって濃度が変化するので、濃度計３１で一方の調合槽内の処理液の濃度を監視し、濃度が許容範囲を超えた時には、薬液又は純水を追加供給して処理液の濃度が許容範囲内に入るようにする。このようにして、一方の調合槽内の処理液は常に所定の濃度に維持される。   In the treatment liquid production apparatus of the third embodiment, as in the first embodiment, the chemical and pure water are supplied to the other preparation tank while the treatment liquid in one preparation tank is being supplied to the cleaning device of the CMP apparatus. Is supplied to produce a treatment liquid. Since the amount of chemicals and pure water supplied at this time are accurately measured by the flow meters 11 and 12, a treatment liquid having a desired concentration can be produced. Since the concentration of the processing liquid in one of the mixing tanks changes with the decrease of the residual liquid due to the supply of the processing liquid and the passage of time, the concentration of the processing liquid in one of the mixing tanks is monitored with the densitometer 31. When the water content exceeds the allowable range, a chemical solution or pure water is additionally supplied so that the concentration of the treatment liquid falls within the allowable range. In this way, the treatment liquid in one preparation tank is always maintained at a predetermined concentration.

また、調合槽に薬剤及び純水を供給して処理液を製造する時に製造中の処理液の濃度を検出して、所望の濃度になるように薬剤及び純水の供給量を制御することも可能である。また、調合槽内の処理液が減少した時には、ＣＭＰ装置の洗浄機に処理液を供給しない間に、調合槽に薬剤及び純水を供給して処理液の量を増加させ、処理液の濃度を所望の濃度にするように管理することも可能であり、この場合には調合槽は１個でよい。   In addition, when the chemical and pure water are supplied to the preparation tank and the processing liquid is manufactured, the concentration of the processing liquid being manufactured is detected, and the supply amount of the chemical and pure water can be controlled so as to obtain a desired concentration. Is possible. In addition, when the treatment liquid in the preparation tank is reduced, while supplying the treatment liquid to the cleaning device of the CMP apparatus, the chemical and pure water are supplied to the preparation tank to increase the amount of the treatment liquid, and the concentration of the treatment liquid It is also possible to manage so that the concentration becomes a desired concentration. In this case, only one preparation tank is required.

以上説明したように、本発明によれば、所望の濃度の処理液を高精度で製造すると共に常時所望の濃度に維持することが可能であるので、精密な濃度の処理液を必要とする分野に広く適用できる。   As described above, according to the present invention, a processing solution having a desired concentration can be produced with high accuracy and maintained at a desired concentration at all times. Widely applicable to.

ＣＭＰ装置で使用する処理液を製造する従来の処理液製造装置の構成を示す図である。It is a figure which shows the structure of the conventional process liquid manufacturing apparatus which manufactures the process liquid used with CMP apparatus. 本発明の第１実施例のＣＭＰ装置で使用する処理液を製造する処理液製造装置の構成を示す図である。It is a figure which shows the structure of the processing liquid manufacturing apparatus which manufactures the processing liquid used with the CMP apparatus of 1st Example of this invention. 本発明の第２実施例のＣＭＰ装置で使用する処理液を製造する処理液製造装置の構成を示す図である。It is a figure which shows the structure of the processing liquid manufacturing apparatus which manufactures the processing liquid used with the CMP apparatus of 2nd Example of this invention. 本発明の第３実施例のＣＭＰ装置で使用する処理液を製造する処理液製造装置の構成を示す図である。It is a figure which shows the structure of the process liquid manufacturing apparatus which manufactures the process liquid used with the CMP apparatus of 3rd Example of this invention.

符号の説明Explanation of symbols

１ 薬液源
２ 純水源
５Ａ、５Ｂ 調合槽
６Ａ、６Ｂ 液面センサ
１０ 定流量弁
１１、１２ 流量計
１３ 制御部 DESCRIPTION OF SYMBOLS 1 Chemical liquid source 2 Pure water source 5A, 5B Mixing tank 6A, 6B Liquid level sensor 10 Constant flow valve 11, 12 Flowmeter 13 Control part

Claims (9)

第１液と第２液を混合して化学機械研磨装置で使用する処理液を製造する処理液製造装置であって、
調合槽と、
第１液源から前記調合槽へ供給する前記第１液の流量を計量する第１流量計と、
第２液源から前記調合槽へ供給する前記第２液の流量を計量する第２流量計と、
処理液の製造量及び前記第１液と第２液の混合比に応じて、前記第１液及び第２液の供給を制御する制御部とを備えることを特徴とする処理液製造装置。 A treatment liquid production apparatus for producing a treatment liquid to be used in a chemical mechanical polishing apparatus by mixing a first liquid and a second liquid,
A mixing tank;
A first flow meter for measuring a flow rate of the first liquid supplied from the first liquid source to the preparation tank;
A second flow meter for measuring the flow rate of the second liquid supplied from the second liquid source to the preparation tank;
A processing liquid manufacturing apparatus, comprising: a control unit that controls supply of the first liquid and the second liquid according to a manufacturing amount of the processing liquid and a mixing ratio of the first liquid and the second liquid. 前記第１液は薬液であり、前記第２液は純水である請求項１に記載の処理液製造装置。   The processing liquid manufacturing apparatus according to claim 1, wherein the first liquid is a chemical liquid and the second liquid is pure water. 前記第１液源と前記第１流量計の間に設けられ、前記第１液の流量を安定化する定流量弁を備える請求項１又は２に記載の処理液製造装置。   The processing liquid manufacturing apparatus according to claim 1, further comprising a constant flow valve that is provided between the first liquid source and the first flow meter and stabilizes a flow rate of the first liquid. 前記第１流量計は、前記第１液の供給圧力が一定になるようにする定圧弁と、バルブ及び圧力センサを有する流量コントローラとを備える請求項１又は２に記載の処理液製造装置。   The processing liquid manufacturing apparatus according to claim 1, wherein the first flow meter includes a constant pressure valve that makes a supply pressure of the first liquid constant, and a flow rate controller having a valve and a pressure sensor. 前記調合槽は、第１調合槽と第２調合槽の２つの調合槽を備え、
前記第１流量計から供給される前記第１液を、前記第１調合槽と前記第２調合槽のいずれかに供給するように切り換える第１バルブシステムと、
前記第２流量計から供給される前記第２液を、前記第１調合槽と前記第２調合槽のいずれかに供給するように切り換える第２バルブシステムとを備える請求項１から４のいずれか１項に記載の処理液製造装置。 The mixing tank comprises two mixing tanks, a first mixing tank and a second mixing tank,
A first valve system that switches the first liquid supplied from the first flow meter to be supplied to either the first preparation tank or the second preparation tank;
5. The device according to claim 1, further comprising: a second valve system that switches the second liquid supplied from the second flow meter to be supplied to either the first preparation tank or the second preparation tank. The processing liquid manufacturing apparatus according to Item 1. 濃度を検出する濃度計と、
前記第１調合槽の処理液を前記濃度計に供給する状態と前記第２調合槽の処理液を前記濃度計に供給する状態を切り換える測定切り換え手段とを備える請求項５に記載の処理液製造装置。 A densitometer for detecting the concentration;
The treatment liquid production according to claim 5, further comprising measurement switching means for switching between a state in which the treatment liquid in the first preparation tank is supplied to the concentration meter and a state in which the treatment liquid in the second preparation tank is supplied to the concentration meter. apparatus. 第１液と第２液を混合して化学機械研磨装置で使用する処理液を製造する処理液製造装置であって、
調合槽と、
第１液源から前記調合槽へ供給する前記第１液の流量を計量する第１流量計と、
第２液源から前記調合槽へ供給する前記第２液の流量を計量する第２流量計と、
前記調合槽の処理液の濃度を検出する濃度計と、
前記濃度計の検出した濃度に応じて、前記調合槽の処理液の濃度が所望の濃度値になるように、前記第１液及び第２液の供給を制御する制御部とを備えることを特徴とする処理液製造装置。 A treatment liquid production apparatus for producing a treatment liquid to be used in a chemical mechanical polishing apparatus by mixing a first liquid and a second liquid,
A mixing tank;
A first flow meter for measuring a flow rate of the first liquid supplied from the first liquid source to the preparation tank;
A second flow meter for measuring the flow rate of the second liquid supplied from the second liquid source to the preparation tank;
A concentration meter for detecting the concentration of the treatment liquid in the preparation tank;
A controller for controlling the supply of the first liquid and the second liquid so that the concentration of the treatment liquid in the preparation tank becomes a desired concentration value according to the concentration detected by the densitometer. A processing liquid manufacturing apparatus. 前記調合槽は、第１調合槽と第２調合槽の２つの調合槽を備え、
前記第１流量計から供給される前記第１液を、前記第１調合槽と前記第２調合槽のいずれかに供給するように切り換える第１バルブシステムと、
前記第２流量計から供給される前記第２液を、前記第１調合槽と前記第２調合槽のいずれかに供給するように切り換える第２バルブシステムとを備える請求項７に記載の処理液製造装置。 The mixing tank comprises two mixing tanks, a first mixing tank and a second mixing tank,
A first valve system that switches the first liquid supplied from the first flow meter to be supplied to either the first preparation tank or the second preparation tank;
The processing liquid according to claim 7, further comprising a second valve system that switches the second liquid supplied from the second flow meter to be supplied to either the first mixing tank or the second mixing tank. Manufacturing equipment. 前記第１調合槽の処理液を前記濃度計に供給する状態と前記第２調合槽の処理液を前記濃度計に供給する状態を切り換える測定切り換え手段とを備える請求項８に記載の処理液製造装置。   The treatment liquid production according to claim 8, further comprising a measurement switching unit that switches between a state in which the treatment liquid in the first preparation tank is supplied to the concentration meter and a state in which the treatment liquid in the second preparation tank is supplied to the concentration meter. apparatus.
JP2005141459A 2005-05-13 2005-05-13 Processing liquid production system Pending JP2006319194A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017188540A (en) * 2016-04-04 2017-10-12 東京エレクトロン株式会社 Liquid processing device, control method of liquid processing device, and storage medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017188540A (en) * 2016-04-04 2017-10-12 東京エレクトロン株式会社 Liquid processing device, control method of liquid processing device, and storage medium

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