JP2006308483A5 - - Google Patents

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Publication number
JP2006308483A5
JP2006308483A5 JP2005132963A JP2005132963A JP2006308483A5 JP 2006308483 A5 JP2006308483 A5 JP 2006308483A5 JP 2005132963 A JP2005132963 A JP 2005132963A JP 2005132963 A JP2005132963 A JP 2005132963A JP 2006308483 A5 JP2006308483 A5 JP 2006308483A5
Authority
JP
Japan
Prior art keywords
layer
multilayer film
manufacturing
repeatedly laminated
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005132963A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006308483A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005132963A priority Critical patent/JP2006308483A/ja
Priority claimed from JP2005132963A external-priority patent/JP2006308483A/ja
Publication of JP2006308483A publication Critical patent/JP2006308483A/ja
Publication of JP2006308483A5 publication Critical patent/JP2006308483A5/ja
Pending legal-status Critical Current

Links

JP2005132963A 2005-04-28 2005-04-28 多層膜及び多層膜の製造方法 Pending JP2006308483A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005132963A JP2006308483A (ja) 2005-04-28 2005-04-28 多層膜及び多層膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005132963A JP2006308483A (ja) 2005-04-28 2005-04-28 多層膜及び多層膜の製造方法

Publications (2)

Publication Number Publication Date
JP2006308483A JP2006308483A (ja) 2006-11-09
JP2006308483A5 true JP2006308483A5 (es) 2008-06-19

Family

ID=37475531

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005132963A Pending JP2006308483A (ja) 2005-04-28 2005-04-28 多層膜及び多層膜の製造方法

Country Status (1)

Country Link
JP (1) JP2006308483A (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI427334B (zh) * 2007-02-05 2014-02-21 Zeiss Carl Smt Gmbh Ｅｕｖ蝕刻裝置反射光學元件
JP5340321B2 (ja) 2011-01-01 2013-11-13 キヤノン株式会社 ミラーおよびその製造方法、露光装置、ならびに、デバイス製造方法
CN111752085B (zh) * 2019-03-27 2024-06-18 Hoya株式会社 带多层反射膜的基板、反射型掩模坯料及反射型掩模、以及半导体装置的制造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2692881B2 (ja) * 1988-08-17 1997-12-17 キヤノン株式会社 軟ｘ線又は真空紫外線用多層膜の製造方法ならびに光学素子
JP2723955B2 (ja) * 1989-03-16 1998-03-09 キヤノン株式会社 軟ｘ線・真空紫外線用多層膜反射鏡
JPH03274001A (ja) * 1990-03-24 1991-12-05 Seiko Epson Corp Ｘ線反射膜
US5356662A (en) * 1993-01-05 1994-10-18 At&T Bell Laboratories Method for repairing an optical element which includes a multilayer coating
JPH09230098A (ja) * 1996-02-21 1997-09-05 Nippon Telegr & Teleph Corp <Ntt> 多層膜ｘ線反射鏡
JP3673968B2 (ja) * 1999-11-29 2005-07-20 株式会社東北テクノアーチ 多層膜反射鏡の製造方法
JP2001183499A (ja) * 1999-12-22 2001-07-06 Rigaku Industrial Co Ｘ線分光素子およびそれを用いた蛍光ｘ線分析装置
US6396900B1 (en) * 2001-05-01 2002-05-28 The Regents Of The University Of California Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application

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