JP2006269743A - Chemicals processor and manufacturing method for semiconductor device - Google Patents

Chemicals processor and manufacturing method for semiconductor device Download PDF

Info

Publication number
JP2006269743A
JP2006269743A JP2005085695A JP2005085695A JP2006269743A JP 2006269743 A JP2006269743 A JP 2006269743A JP 2005085695 A JP2005085695 A JP 2005085695A JP 2005085695 A JP2005085695 A JP 2005085695A JP 2006269743 A JP2006269743 A JP 2006269743A
Authority
JP
Japan
Prior art keywords
chemical
pipe
tank
solution
chemical solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005085695A
Other languages
Japanese (ja)
Inventor
Makoto Hayafuji
良 早藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP2005085695A priority Critical patent/JP2006269743A/en
Publication of JP2006269743A publication Critical patent/JP2006269743A/en
Withdrawn legal-status Critical Current

Links

Images

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To replace chemicals while preventing old chemicals from remaining. <P>SOLUTION: When chemicals 2 held in a circulation tank 4 are replaced, a chemicals replacing means 8 discharges the chemicals 2 stored in the circulation tank 4 by opening a valve V3, and then opens the valve V6 while closing the valve V3 to supply fresh chemicals 2 from a chemicals supply pipe H10. Further, while valves V1, V2, V4, and V5 are opened to supply fresh chemicals 2 to pipes H1 to H6 and a collection tank 3 through a chemicals supply pipe H9, old chemicals 2 remaining in the pipes H1 to H6 and collection tank 3 are discharged from a chemicals discharge pipe H8. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は薬液処理装置および半導体装置の製造方法に関し、特に、薬液処理に用いられる薬液の交換方法に適用して好適なものである。   The present invention relates to a chemical treatment apparatus and a method for manufacturing a semiconductor device, and is particularly suitable for application to a chemical exchange method used for chemical treatment.

半導体製造プロセスでは、半導体ウェハの洗浄を行ったり、半導体ウェハの微細加工を行ったりするために、様々の薬液処理が行われている。この薬液処理では、薬液処理槽に溜められた薬液を循環させながら半導体ウェハをバッチ処理する方法、循環タンクに溜められた薬液を循環させながら半導体ウェハに吐出し枚葉処理する方法があり、この方法では薬液の寿命がくると、薬液の交換が行われる。   In the semiconductor manufacturing process, various chemical treatments are performed in order to perform cleaning of a semiconductor wafer or fine processing of a semiconductor wafer. In this chemical processing, there are a method of batch processing semiconductor wafers while circulating the chemical solution stored in the chemical processing tank, and a method of discharging single wafers to the semiconductor wafer while circulating the chemical solution stored in the circulation tank. In the method, when the life of the chemical solution comes, the chemical solution is exchanged.

また、例えば、特許文献１には、ウェット洗浄装置における薬液の交換工程において、古い薬液が新しい薬液に混入することを防止するため、フィルトレーション装置内の薬液が排出できるとともに、フィルトレーション装置から薬液槽への異物の侵入を防止する方法が開示されている。
特開平６−３２６０７１号公報 Further, for example, in Patent Document 1, in order to prevent an old chemical solution from being mixed into a new chemical solution in a chemical solution replacement process in the wet cleaning device, the chemical solution in the filtration apparatus can be discharged, and the filtration device Discloses a method for preventing foreign matter from entering the chemical tank.
JP-A-6-326071

しかしながら、従来の薬液交換方法では、薬液処理槽または循環タンクに溜められた薬液の交換しか行われておらず、配管内に残った薬液の交換は行われていなかった。このため、配管内に残った古い薬液が新しい薬液に混入し、薬液の寿命が短くなる上に、薬液の品質が劣化するという問題があった。
また、特許文献１に開示された方法では、フィルタに溜まった薬液しか排出されず、配管内に残った薬液の交換は行われていなかった。このため、配管内に残った古い薬液が新しい薬液に混入し、薬液の寿命が短くなる上に、薬液の品質が劣化するという問題があった。 However, in the conventional chemical solution exchange method, only the chemical solution stored in the chemical treatment tank or the circulation tank is exchanged, and the chemical solution remaining in the pipe is not exchanged. For this reason, there existed a problem that the old chemical | medical solution which remained in piping mixed with a new chemical | medical solution, the lifetime of a chemical | medical solution became short, and also the quality of the chemical | medical solution deteriorated.
In addition, in the method disclosed in Patent Document 1, only the chemical solution accumulated in the filter is discharged, and the chemical solution remaining in the pipe has not been replaced. For this reason, there existed a problem that the old chemical | medical solution which remained in piping mixed with a new chemical | medical solution, the lifetime of a chemical | medical solution became short, and also the quality of the chemical | medical solution deteriorated.

そこで、本発明の目的は、古い薬液が残留することを防止しつつ、薬液の交換を行うことが可能な薬液処理装置および半導体装置の製造方法を提供することである。   Accordingly, an object of the present invention is to provide a chemical solution processing apparatus and a semiconductor device manufacturing method capable of exchanging chemical solutions while preventing old chemical solutions from remaining.

上述した課題を解決するために、本発明の一態様に係る薬液処理装置によれば、バッチ処理装置においては薬液処理を行う薬液処理槽、枚葉処理装置においては薬液を溜めておく循環タンクと、前記薬液処理槽、又は循環タンクに溜められた薬液を循環させる配管と、前記配管内に残留する薬液を置換するため新たな薬液を供給する薬液供給管と、前記配管内に残留する薬液を排出する薬液排出管と、前記薬液処理槽内、又は循環タンク内の薬液を交換する薬液交換手段と、前記配管内の薬液の置換処理を行う薬液交換手段とを備えることを特徴とする。   In order to solve the above-described problem, according to the chemical processing apparatus according to one aspect of the present invention, a chemical processing tank that performs chemical processing in a batch processing apparatus, a circulation tank that stores chemicals in a single wafer processing apparatus, and A chemical liquid treatment tank or a pipe for circulating the chemical liquid stored in the circulation tank, a chemical liquid supply pipe for supplying a new chemical liquid to replace the chemical liquid remaining in the pipe, and a chemical liquid remaining in the pipe A chemical solution discharge pipe for discharging, a chemical solution exchange means for exchanging the chemical solution in the chemical solution treatment tank or the circulation tank, and a chemical solution exchange means for replacing the chemical solution in the pipe are provided.

これにより、薬液処理槽内、又は循環タンク内の薬液を交換する際に、配管内に残った古い薬液が新しい薬液に混入することを防止することができる。このため、薬液の寿命を長くすることが可能となり、薬液にかかるコストを削減することが可能となるとともに、薬液交換時に薬液が劣化することを防止することができ、薬液の品質を安定化させることができる。   Thereby, when the chemical solution in the chemical treatment tank or the circulation tank is replaced, it is possible to prevent the old chemical solution remaining in the pipe from being mixed into the new chemical solution. For this reason, it is possible to extend the life of the chemical solution, reduce the cost of the chemical solution, prevent the chemical solution from deteriorating when the chemical solution is replaced, and stabilize the quality of the chemical solution be able to.

また、本発明の一態様に係る薬液処理装置によれば、バッチ処理装置においては薬液処理を行う薬液処理槽、枚葉処理装置においては薬液を溜めておく循環タンクと、前記薬液処理槽、又は循環タンクに溜められた薬液を循環させる配管と、前記配管内に残留する薬液を置換するため新たな薬液を供給する薬液供給管と、前記配管内に残留する薬液を排出する薬液排出管と、前記薬液排出管から排出される薬液の濃度を検出する濃度検出部と、前記薬液処理槽内、又は循環タンク内の薬液を交換し、前記濃度検出部にて検出された薬液の濃度に基づいて、前記配管内の薬液の置換処理を行う薬液交換手段とを備えることを特徴とする。   In addition, according to the chemical processing apparatus according to one aspect of the present invention, a chemical processing tank for performing chemical processing in a batch processing apparatus, a circulation tank for storing chemical liquid in a single wafer processing apparatus, and the chemical processing tank, or A pipe for circulating the chemical liquid stored in the circulation tank, a chemical liquid supply pipe for supplying a new chemical liquid to replace the chemical liquid remaining in the pipe, a chemical liquid discharge pipe for discharging the chemical liquid remaining in the pipe, Based on the concentration of the chemical solution detected by the concentration detection unit, the concentration detection unit for detecting the concentration of the chemical solution discharged from the chemical solution discharge pipe and the chemical solution in the chemical solution treatment tank or the circulation tank are exchanged. And a chemical solution exchange means for performing a replacement process of the chemical solution in the pipe.

これにより、薬液処理槽内、又は循環タンク内の薬液を交換する際、配管内に古い薬液が残っているかを確認しながら配管内の薬液交換処理を行うことが可能となる。このため、薬液処理槽内、又は循環タンク内の薬液を交換する際に、新しい薬液が無駄に消費されることを防止しつつ、配管内に残った古い薬液が新しい薬液に残留することを防止することができる。   Thereby, when exchanging the chemical solution in the chemical treatment tank or the circulation tank, it is possible to perform the chemical solution exchange processing in the pipe while confirming whether the old chemical solution remains in the pipe. For this reason, when replacing the chemical solution in the chemical treatment tank or the circulation tank, the new chemical solution is prevented from being wasted and the old chemical solution remaining in the pipe is prevented from remaining in the new chemical solution. can do.

また、本発明の一態様に係る薬液処理装置によれば、薬液処理を行う薬液処理槽と、前記薬液処理槽に溜められた薬液を循環させる配管と、前記薬液処理槽に溜められた薬液を排出する第１の薬液排出管と、前記薬液処理槽に薬液を供給する第１の薬液供給管と、前記配管内を置換するため新たな薬液を供給する第２の薬液供給管と、前記配管内に残留する薬液を排出する第２の薬液排出管と、前記薬液処理槽に溜められた薬液および前記配管内に残留する薬液を排出し、前記薬液処理槽内の薬液を交換する薬液交換手段とを備えることを特徴とする。   Further, according to the chemical treatment apparatus according to one aspect of the present invention, the chemical treatment tank that performs chemical treatment, the piping that circulates the chemical stored in the chemical treatment tank, and the chemical stored in the chemical treatment tank A first chemical liquid discharge pipe for discharging, a first chemical liquid supply pipe for supplying chemical liquid to the chemical liquid treatment tank, a second chemical liquid supply pipe for supplying new chemical liquid to replace the inside of the pipe, and the pipe A second chemical solution discharge pipe for discharging the chemical solution remaining inside, and a chemical solution exchange means for discharging the chemical solution stored in the chemical treatment tank and the chemical solution remaining in the pipe and exchanging the chemical solution in the chemical treatment tank It is characterized by providing.

これにより、バッチ式の薬液処理を採用した場合においても、配管内に残った古い薬液が新しい薬液に混入することを防止しつつ、薬液処理槽内の薬液を交換することができる。このため、薬液の寿命を長くすることが可能となり、薬液にかかるコストを削減することが可能となるとともに、薬液交換時に薬液が劣化することを防止することができ、薬液の品質を安定化させることができる。   Thereby, even when a batch type chemical solution treatment is employed, the chemical solution in the chemical solution treatment tank can be replaced while preventing the old chemical solution remaining in the pipe from being mixed into the new chemical solution. For this reason, it is possible to extend the life of the chemical solution, reduce the cost of the chemical solution, prevent the chemical solution from deteriorating when the chemical solution is replaced, and stabilize the quality of the chemical solution be able to.

また、本発明の一態様に係る薬液処理装置によれば、薬液処理を行う薬液処理ユニットと、薬液処理ユニットから排出された薬液を回収する回収タンクと、前記回収タンクに回収された薬液を循環させる配管と、前記循環される薬液を貯留する循環タンクと、前記循環タンクに貯留された薬液を排出する第１の薬液排出管と、前記循環タンクに薬液を供給する第１の薬液供給管と、前記配管内を置換するため新たな薬液を供給する第２の薬液供給管と、、前記配管内に残留する薬液を排出する第２の薬液排出管と、前記配管内、回収タンク内の薬液を新しい薬液に置換し、前記循環タンク内の薬液を交換する薬液交換手段とを備えることを特徴とする。 これにより、枚葉式の薬液処理を採用した場合においても、配管内に残った古い薬液が新しい薬液に残留することを防止しつつ、循環タンク内の薬液を交換することができる。このため、薬液の寿命を長くすることが可能となり、薬液にかかるコストを削減することが可能となるとともに、薬液交換時に薬液が劣化することを防止することができ、薬液の品質を安定化させることができる。   In addition, according to the chemical processing apparatus according to one aspect of the present invention, the chemical processing unit that performs chemical processing, the recovery tank that recovers the chemical discharged from the chemical processing unit, and the chemical recovered in the recovery tank are circulated. A piping tank that stores the circulating chemical solution, a first chemical discharge pipe that discharges the chemical solution stored in the circulation tank, and a first chemical supply pipe that supplies the chemical solution to the circulation tank A second chemical liquid supply pipe for supplying a new chemical liquid for replacing the inside of the pipe, a second chemical liquid discharge pipe for discharging the chemical liquid remaining in the pipe, and the chemical liquid in the pipe and in the recovery tank And a chemical solution exchanging means for exchanging the chemical solution in the circulation tank. As a result, even when single-wafer chemical treatment is employed, it is possible to replace the chemical in the circulation tank while preventing the old chemical remaining in the pipe from remaining in the new chemical. For this reason, it is possible to extend the life of the chemical solution, reduce the cost of the chemical solution, prevent the chemical solution from deteriorating when the chemical solution is replaced, and stabilize the quality of the chemical solution be able to.

また、本発明の一態様に係る薬液処理装置によれば、前記第２の薬液排出管に設置され、前記第２の薬液排出管から排出される薬液の濃度を検出する濃度検出部をさらに備えることを特徴とする。
これにより、配管内に古い薬液が残っているかを確認しながら、循環タンク内の薬液を交換することが可能となり、新しい薬液が無駄に消費されることを防止しつつ、配管内に残った古い薬液が新しい薬液に残留することを防止することができる。 In addition, according to the chemical treatment apparatus according to one aspect of the present invention, the chemical treatment apparatus further includes a concentration detector that is installed in the second chemical liquid discharge pipe and detects the concentration of the chemical liquid discharged from the second chemical liquid discharge pipe. It is characterized by that.
This makes it possible to replace the chemical solution in the circulation tank while checking whether the old chemical solution remains in the pipe, and prevent the old chemical solution from being consumed unnecessarily. It is possible to prevent the chemical liquid from remaining in a new chemical liquid.

また、本発明の一態様に係る半導体装置の製造方法によれば、バッチ処理装置においては薬液処理槽、枚葉処理装置においては循環タンクに溜められた薬液を排出する工程と、前記薬液処理槽、又は循環タンクに接続された配管内に残留する薬液を排出する工程と、前記薬液処理槽内、又は循環タンク内の薬液を交換する工程と、前記薬液が交換された薬液処理槽内、又は前記薬液が交換された循環タンクから薬液が吐出される薬液処理ユニットで半導体ウェハの薬液処理を行う工程とを備えることを特徴とする。   In addition, according to the method for manufacturing a semiconductor device according to one aspect of the present invention, a process for discharging a chemical solution stored in a circulation tank in a batch processing apparatus, a chemical processing tank in a batch processing apparatus, and the chemical processing tank Or a step of discharging the chemical remaining in the pipe connected to the circulation tank, a step of replacing the chemical in the chemical treatment tank or the circulation tank, and a chemical treatment tank in which the chemical is exchanged, or And a step of performing a chemical treatment of the semiconductor wafer in a chemical treatment unit that discharges the chemical from the circulation tank in which the chemical is exchanged.

これにより、薬液処理槽内、又は循環タンク内の薬液を交換する際に、配管内に残った古い薬液が新しい薬液に残留することを防止することができる。このため、薬液の品質の安定化を図りながら、半導体ウェハの薬液処理を行うことが可能となり、半導体装置の品質を向上させることができる。   Thereby, when exchanging the chemical solution in the chemical treatment tank or the circulation tank, it is possible to prevent the old chemical solution remaining in the pipe from remaining in the new chemical solution. For this reason, it becomes possible to perform the chemical treatment of the semiconductor wafer while stabilizing the quality of the chemical solution, and the quality of the semiconductor device can be improved.

以下、本発明の実施形態に係る薬液処理装置について図面を参照しながら説明する。
図１は、本発明の第１実施形態に係る薬液処理装置の概略構成を示すブロック図である。
図１において、薬液処理装置には、半導体ウェハの薬液処理を行う薬液処理ユニット１、薬液処理ユニット１から排出された薬液２を回収する回収タンク３および薬液処理ユニット１に吐出される薬液２を貯留する循環タンク４が設けられている。ここで、薬液処理ユニット１は配管Ｈ３を介して回収タンク３に接続され、回収タンク３は配管Ｈ４、Ｈ５を介して循環タンク４に接続され、循環タンク４は配管Ｈ１、Ｈ２を介して薬液処理ユニット１に接続されている。また、配管Ｈ１、Ｈ５は配管Ｈ６を介して接続され、循環タンク４には、循環タンク４内に貯留されている薬液２を排出する薬液排出管Ｈ７、循環タンク４に薬液２を供給する薬液供給管Ｈ１０が接続されている。また、配管Ｈ５には、配管Ｈ１〜Ｈ６内に残留する薬液２を排出する薬液排出管Ｈ８が接続されている。さらに、配管Ｈ１には、配管Ｈ１〜Ｈ６、回収タンク６内に新しい薬液２を供給する薬液供給管Ｈ９が接続されている。 Hereinafter, a chemical processing apparatus according to an embodiment of the present invention will be described with reference to the drawings.
FIG. 1 is a block diagram showing a schematic configuration of a chemical processing apparatus according to the first embodiment of the present invention.
In FIG. 1, the chemical processing apparatus includes a chemical processing unit 1 that performs chemical processing on a semiconductor wafer, a recovery tank 3 that collects the chemical 2 discharged from the chemical processing unit 1, and a chemical 2 that is discharged to the chemical processing unit 1. A circulation tank 4 is provided for storage. Here, the chemical liquid processing unit 1 is connected to the recovery tank 3 via the pipe H3, the recovery tank 3 is connected to the circulation tank 4 via the pipes H4 and H5, and the circulation tank 4 is connected to the chemical liquid via the pipes H1 and H2. It is connected to the processing unit 1. The pipes H1 and H5 are connected via a pipe H6. The circulation tank 4 has a chemical liquid discharge pipe H7 for discharging the chemical liquid 2 stored in the circulation tank 4, and a chemical liquid for supplying the chemical liquid 2 to the circulation tank 4. A supply pipe H10 is connected. Further, a chemical liquid discharge pipe H8 for discharging the chemical liquid 2 remaining in the pipes H1 to H6 is connected to the pipe H5. Furthermore, the pipe H1 is connected to pipes H1 to H6 and a chemical supply pipe H9 for supplying new chemical liquid 2 into the collection tank 6.

また、配管Ｈ１には、配管Ｈ１〜Ｈ６内を循環する薬液２を押し出すポンプ５が設置され、ポンプ５の後段には、薬液２に含まれる不純物を濾過するフィルタ６が設けられている。また、配管Ｈ６には、配管Ｈ６内における薬液２の流れを遮断するバルブＶ１が設けられ、配管Ｈ２には、配管Ｈ２内における薬液２の流れを遮断するバルブＶ２が設けられている。また、薬液排出管Ｈ７には、薬液排出管Ｈ７内における薬液２の流れを遮断するバルブＶ３が設けられ、薬液排出管Ｈ８には、薬液排出管Ｈ８内における薬液２の流れを遮断するバルブＶ４が設けられている。さらに、薬液供給管Ｈ９には、薬液供給管Ｈ９内における薬液２の流れを遮断するバルブＶ５が設けられ、薬液供給管Ｈ１０には、薬液供給管Ｈ１０内における薬液２の流れを遮断するバルブＶ６が設けられている。また、薬液排出管Ｈ８には、薬液排出管Ｈ８から排出される薬液２の濃度を検出する薬液濃度計７が設置されている。   The pipe H1 is provided with a pump 5 that pushes out the chemical liquid 2 that circulates in the pipes H1 to H6, and a filter 6 that filters impurities contained in the chemical liquid 2 is provided downstream of the pump 5. The pipe H6 is provided with a valve V1 for blocking the flow of the chemical liquid 2 in the pipe H6, and the pipe H2 is provided with a valve V2 for blocking the flow of the chemical liquid 2 in the pipe H2. The chemical solution discharge pipe H7 is provided with a valve V3 that shuts off the flow of the chemical solution 2 in the chemical solution discharge tube H7, and the chemical solution discharge tube H8 has a valve V4 that blocks the flow of the chemical solution 2 in the chemical solution discharge pipe H8. Is provided. Further, the chemical solution supply pipe H9 is provided with a valve V5 that shuts off the flow of the chemical solution 2 in the chemical solution supply pipe H9, and the chemical solution supply tube H10 has a valve V6 that blocks the flow of the chemical solution 2 in the chemical solution supply pipe H10. Is provided. Further, a chemical concentration meter 7 for detecting the concentration of the chemical liquid 2 discharged from the chemical liquid discharge pipe H8 is installed in the chemical liquid discharge pipe H8.

また、薬液処理装置には薬液交換手段８が設けられ、薬液交換手段８は配管Ｈ１〜Ｈ６内、回収タンク内に残留する薬液２を排出するため配管Ｈ９から新しい薬液を供給して置換し、また循環タンク４内の薬液２を交換することができる。ここで、薬液交換手段８は、薬液濃度計７にて検出された薬液２の濃度に基づいてバルブＶ１〜Ｖ６の開閉制御を行うことにより、配管Ｈ１〜Ｈ６内、回収タンク内の薬液２を交換することができる。   Further, the chemical treatment apparatus is provided with a chemical exchange means 8, and the chemical exchange means 8 supplies and replaces a new chemical from the pipe H9 in order to discharge the chemical 2 remaining in the pipes H1 to H6 and in the recovery tank, Moreover, the chemical | medical solution 2 in the circulation tank 4 can be replaced | exchanged. Here, the chemical solution exchanging means 8 controls the opening and closing of the valves V1 to V6 based on the concentration of the chemical solution 2 detected by the chemical concentration meter 7, thereby removing the chemical solution 2 in the pipes H1 to H6 and in the collection tank. Can be exchanged.

そして、薬液処理ユニット１にて半導体ウェハの薬液処理が行われない場合、バルブＶ２〜Ｖ６が閉じられるとともにバルブＶ１が開かれ、循環タンク４に貯留された薬液２が配管Ｈ１、Ｈ６、Ｈ５を介して循環される。
そして、薬液処理ユニット１にて半導体ウェハの薬液処理が行われる場合、バルブＶ１、Ｖ３〜Ｖ６が閉じられるとともにバルブＶ２が開かれ、薬液２が循環タンクから配管Ｈ１、Ｈ２を介して薬液処理ユニット１に吐出され、配管Ｈ３、回収タンク、Ｈ４、Ｈ５を介して循環タンクに貯留される。半導体ウェハは薬液処理ユニット１にて薬液２が吐出されることにより、薬液処理が行われる。 When the chemical processing of the semiconductor wafer is not performed in the chemical processing unit 1, the valves V2 to V6 are closed and the valve V1 is opened, and the chemical 2 stored in the circulation tank 4 passes through the pipes H1, H6, and H5. Circulated through.
When the chemical processing of the semiconductor wafer is performed in the chemical processing unit 1, the valves V1, V3 to V6 are closed and the valve V2 is opened, and the chemical 2 is supplied from the circulation tank through the pipes H1, H2. 1 and is stored in a circulation tank via a pipe H3, a recovery tank, H4, and H5. The chemical treatment is performed on the semiconductor wafer by discharging the chemical 2 in the chemical processing unit 1.

なお、半導体ウェハの薬液処理としては、例えば、半導体ウェハに形成されたレジストの現像処理および剥離処理、半導体ウェハのウェットエッチング処理、半導体ウェハの洗浄処理などを挙げることができる。
そして、循環タンク４に溜められた薬液２を交換する場合、薬液交換手段８は、バルブＶ３を開くことにより、循環タンク４に貯留された薬液２を排出させ、循環タンク４に溜められている薬液２が排出されると、薬液交換手段８は、バルブ３を閉じ、バルブ１０を開き薬液供給管１０から新しい薬液２を定量まで供給する。 Examples of the chemical treatment of the semiconductor wafer include a developing process and a peeling process for a resist formed on the semiconductor wafer, a wet etching process for the semiconductor wafer, and a cleaning process for the semiconductor wafer.
When the chemical solution 2 stored in the circulation tank 4 is exchanged, the chemical solution exchange means 8 opens the valve V3 to discharge the chemical solution 2 stored in the circulation tank 4 and is stored in the circulation tank 4. When the chemical liquid 2 is discharged, the chemical liquid exchanging means 8 closes the valve 3 and opens the valve 10 to supply the new chemical liquid 2 from the chemical liquid supply pipe 10 to the fixed amount.

また、薬液交換手段８は配管Ｈ１〜Ｈ６内、回収タンク３内に残留する薬液２を排出するため、バルブＶ１、Ｖ２、Ｖ４、Ｖ５を開き、薬液供給管Ｈ９を介して配管Ｈ１〜Ｈ６、回収タンク３に新しい薬液２を供給しながら、配管Ｈ１〜Ｈ６、回収タンク３に残留している古い薬液２を薬液排出管Ｈ８から排出させる。
そして、薬液交換手段８は、薬液濃度計７にて検出された薬液２の濃度に基づいて配管Ｈ１〜Ｈ６、回収タンク３に古い薬液２が残留しているかどうかを判定する。そして、薬液交換手段８は、配管Ｈ１〜Ｈ６、回収タンク３に残留している古い薬液２がすべて排出されると、バルブＶ２、Ｖ４、Ｖ５を閉じる。 Further, the chemical liquid exchange means 8 opens the valves V1, V2, V4 and V5 to discharge the chemical liquid 2 remaining in the pipes H1 to H6 and the recovery tank 3, and opens the pipes H1 to H6 via the chemical liquid supply pipe H9. While supplying the new chemical liquid 2 to the recovery tank 3, the old chemical liquid 2 remaining in the pipes H1 to H6 and the recovery tank 3 is discharged from the chemical liquid discharge pipe H8.
And the chemical | medical solution exchange means 8 determines whether the old chemical | medical solution 2 remains in piping H1-H6 and the collection tank 3 based on the density | concentration of the chemical | medical solution 2 detected with the chemical concentration meter 7. FIG. And the chemical | medical solution exchange means 8 will close valve | bulb V2, V4, V5, if all the old chemical | medical solutions 2 which remain | survived in piping H1-H6 and the collection tank 3 are discharged | emitted.

これにより、枚葉式の薬液処理を採用した場合においても、配管Ｈ１〜Ｈ６内、回収タンク３内に残った古い薬液２が新しい薬液２に残留することを防止しつつ、循環タンク４内の薬液２を交換することができる。このため、薬液２の寿命を長くすることが可能となり、薬液２にかかるコストを削減することが可能となるとともに、薬液２の交換時に薬液２が劣化することを防止することができ、薬液２の品質を安定化させることができる。   As a result, even when single-wafer chemical treatment is employed, the old chemical solution 2 remaining in the pipes H1 to H6 and in the recovery tank 3 is prevented from remaining in the new chemical solution 2, and the inside of the circulation tank 4 The chemical solution 2 can be exchanged. For this reason, it becomes possible to lengthen the lifetime of the chemical | medical solution 2, it becomes possible to reduce the cost concerning the chemical | medical solution 2, and it can prevent that the chemical | medical solution 2 deteriorates at the time of replacement | exchange of the chemical | medical solution 2, and the chemical | medical solution 2 Can stabilize the quality.

図２は、本発明の第２実施形態に係る薬液処理装置の概略構成を示すブロック図である。
図２において、薬液処理装置には、半導体ウェハの薬液処理を行う薬液処理槽１１が設けられている。ここで、薬液処理槽１１には、薬液処理槽１１内に貯留されている薬液１２を循環させる配管Ｈ１１、Ｈ１２が接続されている。また、薬液処理槽１１には、薬液処理槽１１内に貯留されている薬液１２を排出する薬液排出管Ｈ１３と、薬液処理槽１１内に薬液１２を供給する薬液供給管Ｈ１６が接続されている。また、配管Ｈ１１には、配管１１、１２内に残留する薬液を置換するため新たな薬液を供給する薬液供給管Ｈ１５と、配管Ｈ１１、Ｈ１２内に残留する薬液１２を排出する薬液排出管Ｈ１４が接続されている。 FIG. 2 is a block diagram showing a schematic configuration of a chemical processing apparatus according to the second embodiment of the present invention.
In FIG. 2, the chemical processing apparatus is provided with a chemical processing tank 11 for performing chemical processing of semiconductor wafers. Here, pipes H <b> 11 and H <b> 12 for circulating the chemical liquid 12 stored in the chemical liquid processing tank 11 are connected to the chemical liquid processing tank 11. In addition, a chemical solution discharge pipe H <b> 13 that discharges the chemical solution 12 stored in the chemical solution treatment tank 11 and a chemical solution supply pipe H <b> 16 that supplies the chemical solution 12 to the chemical solution treatment tank 11 are connected to the chemical solution treatment tank 11. . The pipe H11 includes a chemical liquid supply pipe H15 that supplies a new chemical liquid to replace the chemical liquid remaining in the pipes 11 and 12, and a chemical liquid discharge pipe H14 that discharges the chemical liquid 12 remaining in the pipes H11 and H12. It is connected.

また、配管Ｈ１２には、配管Ｈ１１、Ｈ１２内を循環する薬液１２を押し出すポンプ１５が設置され、ポンプ１５の後段には、薬液１２に含まれる不純物を濾過するフィルタ１６が設けられている。また、薬液排出管Ｈ１３には、薬液排出管Ｈ１３内における薬液１２の流れを遮断するバルブＶ１１が設けられ、薬液排出管Ｈ１４には、薬液排出管Ｈ１４内における薬液１２の流れを遮断するバルブＶ１２が設けられている。さらに、薬液供給管Ｈ１６には、薬液供給管Ｈ１６内における薬液１２の流れを遮断するバルブＶ１４が設けられ、薬液供給管Ｈ１３には、薬液供給管Ｈ１３内における薬液１２の流れを遮断するバルブＶ１３が設けられている。また、薬液排出管Ｈ１４には、薬液排出管Ｈ１４から排出される薬液１２の濃度を検出する薬液濃度計１７が設置されている。   The pipe H12 is provided with a pump 15 for pushing out the chemical liquid 12 circulating in the pipes H11 and H12, and a filter 16 for filtering impurities contained in the chemical liquid 12 is provided at a subsequent stage of the pump 15. The chemical solution discharge pipe H13 is provided with a valve V11 that shuts off the flow of the chemical solution 12 in the chemical solution discharge tube H13, and the chemical solution discharge tube H14 has a valve V12 that blocks the flow of the chemical solution 12 in the chemical solution discharge pipe H14. Is provided. Furthermore, the chemical solution supply pipe H16 is provided with a valve V14 that blocks the flow of the chemical solution 12 in the chemical solution supply tube H16, and the chemical solution supply tube H13 has a valve V13 that blocks the flow of the chemical solution 12 in the chemical solution supply pipe H13. Is provided. Further, a chemical concentration meter 17 for detecting the concentration of the chemical liquid 12 discharged from the chemical liquid discharge pipe H14 is installed in the chemical liquid discharge pipe H14.

また、薬液処理装置には薬液交換手段１８が設けられ、薬液交換手段１８は薬液処理槽１１内の薬液を排出してから、配管Ｈ１１、Ｈ１２内に残留する薬液１２を排出し、薬液処理槽１１内に薬液１２を供給し液交換することができる。ここで、薬液交換手段１８は、薬液濃度計１７にて検出された薬液１２の濃度に基づいてバルブＶ１１、Ｖ１２、Ｖ１３の開閉制御を行うことにより、配管Ｈ１１、Ｈ１２内の薬液１２を新しい薬液に置換することができる。   Further, the chemical treatment apparatus is provided with a chemical exchange means 18, which discharges the chemical liquid 12 in the pipes H <b> 11 and H <b> 12 after discharging the chemical liquid in the chemical treatment tank 11. The chemical liquid 12 can be supplied into the liquid 11 and exchanged. Here, the chemical solution exchange means 18 performs opening / closing control of the valves V11, V12, and V13 based on the concentration of the chemical solution 12 detected by the chemical concentration meter 17, so that the chemical solution 12 in the pipes H11 and H12 is replaced with a new chemical solution. Can be substituted.

そして、薬液処理槽１１にて半導体ウェハの薬液処理が行われる場合、バルブＶ１１〜Ｖ１４が閉じられ、薬液処理槽１１に溜められた薬液１２が配管Ｈ１１、Ｈ１２を介して循環される。そして、半導体ウェハを薬液処理槽１１に浸漬させることにより、半導体ウェハの薬液処理を行うことができる。
そして、薬液処理槽１１に溜められた薬液１２を交換する場合、薬液交換手段１８は、バルブＶ１１を開くことにより、薬液処理槽１１に溜められた薬液１２を排出させる。そして、薬液処理槽１１に溜められている薬液１２が排出されると、薬液交換手段１８は、バルブ１１を閉じてバルブＶ１２、Ｖ１３を開き、薬液供給管Ｈ１５を介して配管Ｈ１１、Ｈ１２に新しい薬液１２を供給しながら、配管Ｈ１１、Ｈ１２に残留している古い薬液１２を薬液排出管Ｈ１４から排出させる。 When the chemical processing of the semiconductor wafer is performed in the chemical processing tank 11, the valves V11 to V14 are closed, and the chemical 12 stored in the chemical processing tank 11 is circulated through the pipes H11 and H12. Then, by immersing the semiconductor wafer in the chemical treatment tank 11, the chemical treatment of the semiconductor wafer can be performed.
When the chemical solution 12 stored in the chemical solution processing tank 11 is exchanged, the chemical solution exchange means 18 opens the valve V11 to discharge the chemical solution 12 stored in the chemical solution processing tank 11. Then, when the chemical liquid 12 stored in the chemical liquid treatment tank 11 is discharged, the chemical liquid exchange means 18 closes the valve 11 and opens the valves V12 and V13, and adds new pipes H11 and H12 through the chemical liquid supply pipe H15. While supplying the chemical solution 12, the old chemical solution 12 remaining in the pipes H11 and H12 is discharged from the chemical solution discharge pipe H14.

そして、薬液交換手段１８は、薬液濃度計１７にて検出された薬液１２の濃度に基づいて配管Ｈ１１、Ｈ１２に古い薬液１２が残留しているかどうかを判定する。そして、薬液交換手段１８は、配管Ｈ１１、Ｈ１２に残留している古い薬液１２がすべて排出されると、バルブＶ１１〜Ｖ１３を閉じ、バルブ１４を開き、薬液供給管Ｈ１６から薬液処理槽１１に新しい薬液１２を供給する。   And the chemical | medical solution exchange means 18 determines whether the old chemical | medical solution 12 remains in the piping H11 and H12 based on the density | concentration of the chemical | medical solution 12 detected with the chemical concentration meter 17. FIG. Then, when all of the old chemical liquid 12 remaining in the pipes H11 and H12 is discharged, the chemical liquid exchanging means 18 closes the valves V11 to V13, opens the valve 14, and newly supplies the chemical liquid treatment tank 11 from the chemical liquid supply pipe H16. Chemical solution 12 is supplied.

これにより、バッチ式の薬液処理を採用した場合においても、配管Ｈ１１、Ｈ１２内に残った古い薬液１２が新しい薬液１２に残留することを防止しつつ、薬液処理槽１１内の薬液１２を交換することができる。このため、薬液１２の寿命を長くすることが可能となり、薬液１２にかかるコストを削減することが可能となるとともに、薬液１２の交換時に薬液１２が劣化することを防止することができ、薬液１２の品質を安定化させることができる。   Thereby, even when the batch type chemical solution treatment is adopted, the chemical solution 12 in the chemical treatment tank 11 is replaced while preventing the old chemical solution 12 remaining in the pipes H11 and H12 from remaining in the new chemical solution 12. be able to. For this reason, it becomes possible to lengthen the lifetime of the chemical | medical solution 12, it becomes possible to reduce the cost concerning the chemical | medical solution 12, and it can prevent that the chemical | medical solution 12 deteriorates at the time of replacement | exchange of the chemical | medical solution 12, and the chemical | medical solution 12 Can stabilize the quality.

本発明の第１実施形態に係る薬液処理装置の概略構成を示すブロック図。The block diagram which shows schematic structure of the chemical | medical solution processing apparatus which concerns on 1st Embodiment of this invention. 本発明の第２実施形態に係る薬液処理装置の概略構成を示すブロック図。The block diagram which shows schematic structure of the chemical | medical solution processing apparatus which concerns on 2nd Embodiment of this invention.

符号の説明Explanation of symbols

１ 薬液処理ユニット、１１ 薬液処理槽、２ 薬液、３ 回収タンク、４ 循環タンク、５、１５ ポンプ、６、１６ フィルタ、７、１７ 薬液濃度計、８、１８ 薬液交換手段、Ｈ１〜Ｈ６、Ｈ１１、Ｈ１２ 配管、Ｈ７、Ｈ８、Ｈ１３、Ｈ１４ 薬液排出管、Ｈ９、Ｈ１０、Ｈ１５、Ｈ１６ 薬液供給管、Ｖ１〜Ｖ６、Ｖ１１〜Ｖ１４ バルブ

DESCRIPTION OF SYMBOLS 1 Chemical liquid processing unit, 11 Chemical liquid processing tank, 2 Chemical liquid, 3 Recovery tank, 4 Circulation tank, 5, 15 Pump, 6, 16 Filter, 7, 17 Chemical liquid concentration meter, 8, 18 Chemical liquid exchange means, H1-H6, H11 , H12 piping, H7, H8, H13, H14 chemical liquid discharge pipe, H9, H10, H15, H16 chemical liquid supply pipe, V1-V6, V11-V14 valve

Claims (6)

バッチ処理装置においては薬液処理を行う薬液処理槽、枚葉処理装置においては薬液を貯留しておく循環タンクと、
前記薬液処理槽に溜められた薬液を循環させる配管と、
前記配管内に新たな薬液を供給する薬液供給管と、
前記配管内に残留する薬液を排出する薬液排出管と、
前記配管内に残留する薬液を排出し、前記薬液処理槽内の薬液を交換する薬液交換手段とを備えることを特徴とする薬液処理装置。 In a batch processing apparatus, a chemical processing tank that performs chemical processing, in a single wafer processing apparatus, a circulation tank that stores chemicals,
A pipe for circulating the chemical stored in the chemical processing tank;
A chemical supply pipe for supplying a new chemical into the pipe;
A chemical solution discharge pipe for discharging the chemical solution remaining in the pipe;
A chemical treatment apparatus comprising: a chemical exchange means for discharging the chemical remaining in the pipe and exchanging the chemical in the chemical treatment tank. バッチ処理装置においては薬液処理を行う薬液処理槽、枚葉処理装置においては薬液を貯留しておく循環タンクと、
前記薬液処理槽、又は循環タンクに溜められた薬液を循環させる配管と、
前記配管内に残留する薬液を排出する薬液排出管と、
前記配管内に新たな薬液を供給する薬液供給管と、
前記薬液排出管から排出される薬液の濃度を検出する濃度検出部と、
前記薬液処理槽内、又は循環タンク内の薬液を交換し、前記濃度検出部にて検出された薬液の濃度に基づいて前記配管内の薬液を新しい薬液に置換する薬液交換手段とを備えることを特徴とする薬液処理装置。 In a batch processing apparatus, a chemical processing tank that performs chemical processing, in a single wafer processing apparatus, a circulation tank that stores chemicals,
A pipe for circulating the chemical stored in the chemical processing tank or the circulation tank;
A chemical solution discharge pipe for discharging the chemical solution remaining in the pipe;
A chemical supply pipe for supplying a new chemical into the pipe;
A concentration detector for detecting the concentration of the chemical liquid discharged from the chemical liquid discharge pipe;
A chemical solution exchange means for exchanging the chemical solution in the chemical solution treatment tank or the circulation tank and replacing the chemical solution in the pipe with a new chemical solution based on the concentration of the chemical solution detected by the concentration detection unit. A chemical processing apparatus. 薬液処理を行う薬液処理槽と、
前記薬液処理槽に溜められた薬液を循環させる配管と、
前記薬液処理槽に溜められた薬液を排出する第１の薬液排出管と、
前記薬液処理槽に薬液を供給する第１の薬液供給管と、
前記配管内を置換するため新たな薬液を供給する第２の薬液供給管と、
前記配管内に残留する薬液を排出する第２の薬液排出管と、
前記薬液処理槽に溜められた薬液および前記配管内に残留する薬液を排出し、前記薬液処理槽内の薬液を交換する薬液交換手段とを備えることを特徴とする薬液処理装置。 A chemical treatment tank for performing chemical treatment;
A pipe for circulating the chemical stored in the chemical processing tank;
A first chemical discharge pipe for discharging the chemical stored in the chemical treatment tank;
A first chemical supply pipe for supplying a chemical to the chemical treatment tank;
A second chemical supply pipe for supplying a new chemical to replace the inside of the pipe;
A second chemical liquid discharge pipe for discharging the chemical liquid remaining in the pipe;
A chemical solution processing apparatus comprising: a chemical solution exchange means for discharging the chemical solution stored in the chemical solution treatment tank and the chemical solution remaining in the pipe and exchanging the chemical solution in the chemical solution treatment tank. 薬液処理を行う薬液処理ユニットと、
薬液処理ユニットから排出された薬液を回収する回収タンクと、
前記回収タンクに回収された薬液を循環させる配管と、
前記循環される薬液を貯留する循環タンクと、
前記循環タンクに貯留された薬液を排出する第１の薬液排出管と、
前記循環タンクに薬液を供給する第１の薬液供給管と、
前記配管内を置換するため新たな薬液を供給する第２の薬液供給管と
前記配管内に残留する薬液を排出する第２の薬液排出管と、
前記配管内、回収タンク内の薬液を新しい薬液に置換し、前記循環タンク内の薬液を交換する薬液交換手段とを備えることを特徴とする薬液処理装置。 A chemical treatment unit for performing chemical treatment;
A collection tank for collecting the chemical discharged from the chemical processing unit;
A pipe for circulating the chemical solution collected in the collection tank;
A circulation tank for storing the circulated chemical solution;
A first chemical liquid discharge pipe for discharging the chemical liquid stored in the circulation tank;
A first chemical supply pipe for supplying a chemical to the circulation tank;
A second chemical supply pipe for supplying new chemical to replace the inside of the pipe; a second chemical discharge pipe for discharging the chemical remaining in the pipe;
A chemical solution processing apparatus comprising: a chemical solution exchange means for replacing the chemical solution in the pipe and the recovery tank with a new chemical solution and exchanging the chemical solution in the circulation tank. 前記第２の薬液排出管に設置され、前記第２の薬液排出管から排出される薬液の濃度を検出する濃度検出部をさらに備えることを特徴とする請求項３または４記載の薬液処理装置。   5. The chemical processing apparatus according to claim 3, further comprising a concentration detector that is installed in the second chemical liquid discharge pipe and detects a concentration of the chemical liquid discharged from the second chemical liquid discharge pipe. バッチ処理装置においては薬液処理槽、枚葉処理装置においては循環タンクに溜められた薬液を排出する工程と、
前記薬液処理槽、又は循環タンクに接続された配管内に残留する薬液を排出する工程と、
前記薬液処理槽内、又は循環タンク内の薬液を交換する工程と、
前記薬液が交換された薬液処理槽内、又は前記薬液が交換された循環タンク内から薬液が吐出される薬液処理ユニットで半導体ウェハの薬液処理を行う工程とを備えることを特徴とする半導体装置の製造方法。 In the batch processing apparatus, the chemical processing tank, in the single wafer processing apparatus, the step of discharging the chemical stored in the circulation tank,
Discharging the chemical solution remaining in the chemical solution treatment tank or the pipe connected to the circulation tank; and
Replacing the chemical solution in the chemical treatment tank or the circulation tank;
A step of performing a chemical treatment of a semiconductor wafer in a chemical treatment unit in which the chemical solution is discharged from the chemical treatment tank in which the chemical solution has been exchanged or in the circulation tank in which the chemical solution has been exchanged. Production method.
JP2005085695A 2005-03-24 2005-03-24 Chemicals processor and manufacturing method for semiconductor device Withdrawn JP2006269743A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005085695A JP2006269743A (en) 2005-03-24 2005-03-24 Chemicals processor and manufacturing method for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005085695A JP2006269743A (en) 2005-03-24 2005-03-24 Chemicals processor and manufacturing method for semiconductor device

Publications (1)

Publication Number Publication Date
JP2006269743A true JP2006269743A (en) 2006-10-05

Family

ID=37205389

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005085695A Withdrawn JP2006269743A (en) 2005-03-24 2005-03-24 Chemicals processor and manufacturing method for semiconductor device

Country Status (1)

Country Link
JP (1) JP2006269743A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130220478A1 (en) * 2012-02-24 2013-08-29 Tokyo Electron Limited Process liquid changing method and substrate processing apparatus
JP2015141980A (en) * 2014-01-28 2015-08-03 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing device
JP2016143684A (en) * 2015-01-30 2016-08-08 東京エレクトロン株式会社 Substrate liquid processing apparatus and substrate liquid processing method, and computer readable storage medium stored with substrate liquid processing program
KR20190115416A (en) 2018-04-02 2019-10-11 도쿄엘렉트론가부시키가이샤 Substrate processing apparatus, substrate processing method and recording medium
JP2021072415A (en) * 2019-11-01 2021-05-06 東京エレクトロン株式会社 Substrate processing apparatus and substrate processing method
JP2021174973A (en) * 2020-04-30 2021-11-01 株式会社Ｓｃｒｅｅｎホールディングス Replacement method of processing liquid for substrate processing and substrate processing device

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130220478A1 (en) * 2012-02-24 2013-08-29 Tokyo Electron Limited Process liquid changing method and substrate processing apparatus
JP2013175552A (en) * 2012-02-24 2013-09-05 Tokyo Electron Ltd Process liquid exchange method and substrate processing apparatus
US9278768B2 (en) 2012-02-24 2016-03-08 Tokyo Electron Limited Process liquid changing method and substrate processing apparatus
KR101916474B1 (en) * 2012-02-24 2018-11-07 도쿄엘렉트론가부시키가이샤 Processing liquid exchanging method and substrate processing device
JP2015141980A (en) * 2014-01-28 2015-08-03 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing device
JP2016143684A (en) * 2015-01-30 2016-08-08 東京エレクトロン株式会社 Substrate liquid processing apparatus and substrate liquid processing method, and computer readable storage medium stored with substrate liquid processing program
KR20190115416A (en) 2018-04-02 2019-10-11 도쿄엘렉트론가부시키가이샤 Substrate processing apparatus, substrate processing method and recording medium
US11282719B2 (en) 2018-04-02 2022-03-22 Tokyo Electron Limited Substrate processing apparatus, substrate processing method and recording medium of performing liquid exchange processing according to liquid exchange condition
JP2021072415A (en) * 2019-11-01 2021-05-06 東京エレクトロン株式会社 Substrate processing apparatus and substrate processing method
JP7412134B2 (en) 2019-11-01 2024-01-12 東京エレクトロン株式会社 Substrate processing equipment and substrate processing method
JP2021174973A (en) * 2020-04-30 2021-11-01 株式会社Ｓｃｒｅｅｎホールディングス Replacement method of processing liquid for substrate processing and substrate processing device
JP7376424B2 (en) 2020-04-30 2023-11-08 株式会社Ｓｃｒｅｅｎホールディングス Method for exchanging processing liquid for substrate processing and substrate processing equipment

Similar Documents

Publication Publication Date Title
JP5173500B2 (en) Processing liquid supply apparatus and substrate processing apparatus including the same
JP2006269743A (en) Chemicals processor and manufacturing method for semiconductor device
TWI690979B (en) Substrate processing device and cleaning method of substrate processing device
US8956463B2 (en) Method for cleaning photomask-related substrate, cleaning method, and cleaning fluid supplying apparatus
KR101399820B1 (en) Substrate processing device, substrate processing method, and computer-readable storaging medium
KR20040071853A (en) Apparatus for sampling a chemical
KR20230035056A (en) Liquid processing device and liquid processing method
TW201842961A (en) Method of evaluating cleanliness of hollow fiber membrane device, cleaning method, and device for cleaning hollow fiber membrane device
JP2013111537A (en) Method and device for cleaning equipment
JP2023178301A (en) Treatment system and treatment method for tetraalkylammonium hydroxide-containing liquid
JP6278808B2 (en) Liquid supply device and filter cleaning method
EP1759755A1 (en) Gas purifying device
JP2003305465A (en) System for making pure water and method for monitoring water quality
CN106957080B (en) Water treatment method and water treatment apparatus
JP2006281022A (en) Method and apparatus for cleaning of separation membrane module
JP3582680B2 (en) Cleaning equipment
TWI656100B (en) Hydrogen peroxide-containing drainage treatment device and treatment method
US20220216072A1 (en) Processing liquid supply apparatus and method of removing solids from processing liquid supply apparatus
KR100598914B1 (en) System and method for recycling chemical, and apparatus for treating a substrate using the system
JP2010267856A (en) Cleaning treatment apparatus and cleaning treatment method
JP4842772B2 (en) Sodium bisulfite storage equipment
JP4469542B2 (en) Functional water production method and production apparatus
TWI837479B (en) System for purification of citric acid
KR20080099032A (en) Apparatus for automatic sampling of bacteria
CN115826361A (en) Pre-infiltration system with air pressure type circulation function

Legal Events

Date Code Title Description
RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20070404

A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20080603