JP2006237161A5 - - Google Patents

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Publication number
JP2006237161A5
JP2006237161A5 JP2005047734A JP2005047734A JP2006237161A5 JP 2006237161 A5 JP2006237161 A5 JP 2006237161A5 JP 2005047734 A JP2005047734 A JP 2005047734A JP 2005047734 A JP2005047734 A JP 2005047734A JP 2006237161 A5 JP2006237161 A5 JP 2006237161A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2005047734A
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Japanese (ja)
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JP4582450B2 (ja
JP2006237161A (ja
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Priority to JP2005047734A priority Critical patent/JP4582450B2/ja
Priority claimed from JP2005047734A external-priority patent/JP4582450B2/ja
Publication of JP2006237161A publication Critical patent/JP2006237161A/ja
Publication of JP2006237161A5 publication Critical patent/JP2006237161A5/ja
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Publication of JP4582450B2 publication Critical patent/JP4582450B2/ja
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JP2005047734A 2005-02-23 2005-02-23 真空成膜装置の搬送機構 Active JP4582450B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005047734A JP4582450B2 (ja) 2005-02-23 2005-02-23 真空成膜装置の搬送機構

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005047734A JP4582450B2 (ja) 2005-02-23 2005-02-23 真空成膜装置の搬送機構

Publications (3)

Publication Number Publication Date
JP2006237161A JP2006237161A (ja) 2006-09-07
JP2006237161A5 true JP2006237161A5 (lt) 2008-03-06
JP4582450B2 JP4582450B2 (ja) 2010-11-17

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ID=37044502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005047734A Active JP4582450B2 (ja) 2005-02-23 2005-02-23 真空成膜装置の搬送機構

Country Status (1)

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JP (1) JP4582450B2 (lt)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1870487B1 (de) * 2006-06-22 2009-07-29 Applied Materials GmbH & Co. KG Vakuumbeschichtungsanlage
JP5081516B2 (ja) 2007-07-12 2012-11-28 株式会社ジャパンディスプレイイースト 蒸着方法および蒸着装置
KR101055862B1 (ko) * 2009-03-23 2011-08-09 주식회사 테라세미콘 인라인 열처리 장치
DE102010031245B4 (de) 2010-07-12 2013-04-11 Von Ardenne Anlagentechnik Gmbh Substratbehandlungsanlage
DE102010031252A1 (de) 2010-07-12 2012-01-12 Von Ardenne Anlagentechnik Gmbh Substratbehandlungseinrichtung
DE102011116136B4 (de) * 2011-10-15 2021-05-12 Onejoon Gmbh Anlage zur Behandlung von Werkstücken
DE102014017451A1 (de) * 2014-11-26 2016-06-02 Eisenmann Se Anlage zum Behandeln eines Guts
TWI613314B (zh) * 2015-03-31 2018-02-01 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) 成膜裝置及成膜裝置的分隔壁構造體
JP6909196B2 (ja) * 2018-10-10 2021-07-28 株式会社ヒラノK&E 成膜装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59200863A (ja) * 1983-04-27 1984-11-14 Hitachi Ltd 回転導入駆動装置
JPS6127484U (ja) * 1984-07-21 1986-02-19 金則 西村 無段変速装置
JP2836234B2 (ja) * 1990-10-19 1998-12-14 石川島播磨重工業株式会社 非接触型トルク伝達装置
US5158279A (en) * 1991-09-30 1992-10-27 Xerox Corporation Magnetic clutch with adjustable slip torque
JP3909888B2 (ja) * 1996-04-17 2007-04-25 キヤノンアネルバ株式会社 トレイ搬送式インライン成膜装置
JP2003301857A (ja) * 2002-04-10 2003-10-24 Canon Inc 画像形成装置
JP4158096B2 (ja) * 2003-02-14 2008-10-01 富士フイルム株式会社 スリッタ装置及び該スリッタ装置を使用した磁気記録媒体の製造方法

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