JP2006232579A - Joined body - Google Patents

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JP2006232579A
JP2006232579A JP2005046370A JP2005046370A JP2006232579A JP 2006232579 A JP2006232579 A JP 2006232579A JP 2005046370 A JP2005046370 A JP 2005046370A JP 2005046370 A JP2005046370 A JP 2005046370A JP 2006232579 A JP2006232579 A JP 2006232579A
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metal plate
ceramic substrate
joined
joined body
metallized conductor
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Keiji Narushige
恵二 成重
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Sumitomo Metal SMI Electronics Device Inc
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Sumitomo Metal SMI Electronics Device Inc
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<P>PROBLEM TO BE SOLVED: To provide a low-priced joined body composed of a ceramic substrate comprising Al<SB>2</SB>O<SB>3</SB>and a metal plate comprising a stainless steel joined by an Ag-Cu brazing filler metal capable of preventing the formation of cracks or the like in the joined body. <P>SOLUTION: The joined body 10 is composed of a ceramic substrate of an alumina ceramic 11, on the surface of which a metallized conductor 14 comprising a metal having a high melting point is formed, and a square-shaped metal plate of a stainless steel 12, which are joined by an Ag-Cu brazing filler metal. It has a notch 15 cut away from the middle of the side of the metal plate 12 to the joined surface around at least one side of the outer periphery of the joined part of the metal plate 12 and the metallized conductor 14, or a middle metal plate 16 comprising KV or 42 alloy between the metallized conductor 14 and the metal plate 12a. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、セラミック基板と金属板との接合体に関し、より詳細にはセラミック基板と金属板がろう材で接合される、例えば、電子部品を搭載するためのパッケージ形状からなるセラミック基板と金属板の接合体に関する。   The present invention relates to a joined body of a ceramic substrate and a metal plate. More specifically, the ceramic substrate and the metal plate are joined by a brazing material, for example, a ceramic substrate and a metal plate having a package shape for mounting an electronic component. It relates to the joined body.

従来から、無機材料からなるセラミックは、高温に対する耐熱性、薬品に対する耐蝕性、電気的絶縁性等で優れるという多くの性質を有しているが、一方では、柔軟性、耐脆性、耐熱伝導性等で劣るという性質を有している。また、セラミックは、殆どの金属に比較して熱膨張係数が小さくなっている。このような性質を有するセラミックの一例であるアルミナセラミック(Al)からなるセラミック基板と、金属板を接合する接合体は、例えば、電子部品を搭載するためのパッケージ形状にして電子部品からの発熱の放熱性が向上できると共に、電子部品を気密に封止するため等に用いられている。この接合体の金属板には、セラミック基板の熱膨張係数に近似する、例えば、タングステンや、モリブデン等の高融点金属と、他の金属、例えば、銅との複合や、合金や、接着等からなる金属板が用いられている。この接合体は、金属板の熱膨張係数をセラミックに近似させてセラミックの低柔軟性、高脆性、低熱伝導性等の欠点を補ってセラミック基板と金属板のろう付け接合後の降温時の熱膨張係数の差から発生する残留熱応力によるセラミック基板の破壊や、クラック等を防止したり、電子部品からの発熱の放熱性を向上させたりしている。なお、この接合体の金属板の表面には、通常、腐食防止のためのNiめっき被膜、及びAuめっき被膜が施されている。 Conventionally, ceramics made of inorganic materials have many properties such as heat resistance to high temperatures, corrosion resistance to chemicals, and electrical insulation, but on the other hand, flexibility, brittleness resistance, heat conductivity Etc., and is inferior. Ceramics have a smaller coefficient of thermal expansion than most metals. A ceramic substrate made of alumina ceramic (Al 2 O 3 ), which is an example of a ceramic having such properties, and a joined body for joining a metal plate are formed into a package shape for mounting an electronic component, for example, from the electronic component. This is used to hermetically seal electronic components and improve the heat dissipation of the heat generated. The metal plate of this joined body approximates the thermal expansion coefficient of the ceramic substrate, for example, from a composite of refractory metal such as tungsten or molybdenum and another metal such as copper, alloy, adhesion, etc. A metal plate is used. This joined body approximates the thermal expansion coefficient of the metal plate to that of the ceramic to compensate for the disadvantages of the ceramic such as low flexibility, high brittleness, and low thermal conductivity, and the heat at the time of cooling after the brazing joining of the ceramic substrate and the metal plate. The ceramic substrate is prevented from being broken or cracked by the residual thermal stress generated from the difference in expansion coefficient, and the heat dissipation of the heat generated from the electronic components is improved. The surface of the metal plate of the joined body is usually provided with a Ni plating film and an Au plating film for preventing corrosion.

また、セラミック基板と、金属板を接合する接合体には、接合された金属板を外部との電気的接続を容易とするための外部接続端子として使用したり、他の機器を溶接接合させたりするための台座として使用したりするものもある。この接合体の金属板には、通常、セラミック基板の熱膨張係数に近似する、例えば、KV(Fe−Ni−Co系合金、商品名「Kovar(コバール)」)や、42アロイ(Fe−Ni系合金)等からなる金属板が用いられている。この接合体は、金属板の熱膨張係数をセラミックに近似させてセラミックの低柔軟性、高脆性、低熱伝導性等の欠点を補ってセラミック基板と金属板のろう付け接合後の降温時の熱膨張係数の差から発生する残留熱応力によるセラミック基板の破壊や、クラック等を防止させるようにしている。なお、この接合体の金属板の表面には、通常、腐食防止のためのNiめっき被膜、及びAuめっき被膜が施されている。   In addition, for a joined body that joins a ceramic substrate and a metal plate, the joined metal plate can be used as an external connection terminal for facilitating electrical connection with the outside, or other equipment can be joined by welding. Some use it as a pedestal to do. The metal plate of this joined body is usually approximate to the thermal expansion coefficient of the ceramic substrate, for example, KV (Fe—Ni—Co alloy, trade name “Kovar”) or 42 alloy (Fe—Ni). A metal plate made of a base alloy) or the like is used. This joined body approximates the thermal expansion coefficient of the metal plate to that of the ceramic to compensate for the disadvantages of the ceramic such as low flexibility, high brittleness, and low thermal conductivity, and the heat at the time of cooling after the brazing joining of the ceramic substrate and the metal plate. The ceramic substrate is prevented from being broken or cracked by the residual thermal stress generated from the difference in expansion coefficient. The surface of the metal plate of the joined body is usually provided with a Ni plating film and an Au plating film for preventing corrosion.

従来のセラミック基板と金属板の接合体には、セラミック基板にアルミナセラミックを用い、金属板にステンレス鋼を用いるものが提案されている。そして、接合体は、セラミック基板と金属板の間にアルミナ粉末とステンレス鋼粉末の混合粉末の少なくとも40%を粒径1〜600nmに超微細化した接合部材を挟み、放電プラズマ焼結して形成されるものが提案されている(例えば、特許文献1参照)。また、従来のセラミック基板と金属板の接合体には、αアルミナからなるセラミック部材、Cr拡散層を有するステンレス系金属からなる金属製部材、Al−Si系ろう材からなるろう材及びAl−Mg系合金からなる芯材とから構成された積層体を、圧力1Paの真空雰囲気で560℃に加熱し、積層方向に5MPaの圧力を60分間印加して形成されるものが提案されている(例えば、特許文献2参照)。   As a conventional joined body of a ceramic substrate and a metal plate, an alumina ceramic is used for the ceramic substrate and stainless steel is used for the metal plate. The joined body is formed by sandwiching a joining member in which at least 40% of the mixed powder of alumina powder and stainless steel powder is made ultrafine to a particle size of 1 to 600 nm between a ceramic substrate and a metal plate, and performing discharge plasma sintering. The thing is proposed (for example, refer patent document 1). In addition, a conventional ceramic substrate / metal plate assembly includes a ceramic member made of α-alumina, a metal member made of a stainless steel metal having a Cr diffusion layer, a brazing material made of an Al—Si brazing material, and Al—Mg. It has been proposed that a laminate composed of a core material made of an alloy is heated to 560 ° C. in a vacuum atmosphere at a pressure of 1 Pa, and a pressure of 5 MPa is applied in the lamination direction for 60 minutes (for example, , See Patent Document 2).

特開2001−89258号公報JP 2001-89258 A 特開2000−327442号公報JP 2000-327442 A

しかしながら、前述したような従来の接合体は、次のような問題がある。
(1)セラミック基板と、金属板を接合する接合体の金属板に他の機器を溶接接合させる場合には、レーザー溶接で接合する必要があるものがある。レーザー溶接を必要とするものは、金属板の表面のAuめっき被膜によってレーザー光が反射して溶接に不具合が発生するので、ステンレスのような錆びなくてAuめっき被膜を不要とする金属板が必要となっている。しかしながら、セラミック基板と、ステンレス金属板の熱膨張係数(例えば、Al:7.2×10−6/℃、SUS304:18.0×10−6/℃)には、大きな差があるので、セラミック基板と金属板のろう付け接合後の降温時に発生する熱応力によってセラミック基板に破壊や、クラック等が発生している。
(2)セラミック基板にアルミナセラミックを用い、金属板にステンレス鋼を用いる接合体は、セラミック基板と金属板の間にアルミナ粉末とステンレス鋼粉末の混合粉末の少なくとも40%を粒径1〜600nmに超微細化した接合部材を挟み、放電プラズマ焼結して形成されるものがある。しかしながら、接合部材は、超微細化が容易でなく、放電プラズマ焼結は、これを行うための装置がダイスとパンチでセラミック基板、接合部材、及び金属板を挟持して圧力かけながら焼結を行うものであって、接合体の形状が単純なものしか行うことができなく、例えば、電子部品を搭載させるパッケージのような軽薄短小で複雑な形状のものには、適用が難しい。また、接合体は、接合部材の超微細化、及びダイスとパンチが必要な放電プラズマ焼結にコストがかかるので、接合体のコストアップとなっている。
(3)αアルミナからなるセラミック部材、Cr拡散層を有するステンレス系金属からなる金属製部材、Al−Si系ろう材からなるろう材及びAl−Mg系合金からなる芯材とから構成された積層体を、圧力1Paの真空雰囲気で560℃に加熱し、積層方向に5MPaの圧力を60分間印加して形成される接合体は、接合時に高圧の印加をしながら真空雰囲気で焼結できるホットプレス機が必要であり、高価な装置と、量産性が低いので、接合体のコストアップとなっている。また、接合体は、形状が単純なものしか対応が難しく、例えば、電子部品を搭載させるパッケージのような軽薄短小で複雑な形状のものには、適用が難しい。
本発明は、かかる事情に鑑みてなされたものであって、Alからなるセラミック基板と、ステンレス鋼からなる金属板がAg−Cu系ろう材を介して接合される接合体のクラック等の発生を防止できる安価な接合体を提供することを目的とする。
However, the conventional joined body as described above has the following problems.
(1) When other devices are welded and joined to the ceramic plate and the metal plate of the joined body for joining the metal plates, there are those that need to be joined by laser welding. For those that require laser welding, the laser beam is reflected by the Au plating film on the surface of the metal plate, causing problems in the welding. It has become. However, a ceramic substrate, the thermal expansion coefficient of the stainless steel metal plate (e.g., Al 2 O 3: 7.2 × 10 -6 /℃,SUS304:18.0×10 -6 / ℃) , the there is a large difference Therefore, the ceramic substrate is broken or cracked by the thermal stress generated when the temperature is lowered after the ceramic substrate and the metal plate are brazed.
(2) The joined body using alumina ceramic for the ceramic substrate and stainless steel for the metal plate is ultrafine with a particle size of 1 to 600 nm between at least 40% of the mixed powder of alumina powder and stainless steel powder between the ceramic substrate and the metal plate. Some of them are formed by sandwiching the formed joining member and sintering by discharge plasma. However, the joining member is not easy to be miniaturized, and in the discharge plasma sintering, the apparatus for doing this is sintered while sandwiching the ceramic substrate, joining member, and metal plate with a die and a punch and applying pressure. However, it is difficult to apply to a light, thin, small and complex shape such as a package on which an electronic component is mounted. In addition, the joined body is costly for the ultra-miniaturization of the joining member and the discharge plasma sintering that requires a die and a punch, which increases the cost of the joined body.
(3) Lamination composed of a ceramic member made of α-alumina, a metal member made of stainless steel having a Cr diffusion layer, a brazing material made of Al—Si brazing material, and a core material made of Al—Mg alloy. The joined body formed by heating the body to 560 ° C. in a vacuum atmosphere at a pressure of 1 Pa and applying a pressure of 5 MPa in the laminating direction for 60 minutes can be sintered in a vacuum atmosphere while applying a high pressure during joining. A machine is required, and the cost of the joined body is increased because of expensive equipment and low mass productivity. In addition, it is difficult to deal with a joined body having only a simple shape, and for example, it is difficult to apply to a light, thin, small and complicated shape such as a package on which an electronic component is mounted.
The present invention has been made in view of such circumstances, such as cracks in a joined body in which a ceramic substrate made of Al 2 O 3 and a metal plate made of stainless steel are joined via an Ag—Cu brazing material. An object of the present invention is to provide an inexpensive bonded body that can prevent the occurrence of the above.

前記目的に沿う第1の発明に係る接合体は、アルミナセラミックからなり表面に高融点金属からなるメタライズ導体が形成されたセラミック基板と、四角形状のステンレス鋼からなる金属板がメタライズ導体にAg−Cu系ろう材を介して接合される接合体であって、金属板のメタライズ導体との接合部の少なくとも1辺の外周縁部に、金属板の側面の途中から接合表面にかけて削除される切り欠き部を有する。   The joined body according to the first invention that meets the above-mentioned object includes a ceramic substrate made of alumina ceramic and having a metallized conductor made of a refractory metal formed on a surface thereof, and a metal plate made of rectangular stainless steel formed of Ag- A joined body joined via a Cu-based brazing material, the notch that is removed from the middle of the side surface of the metal plate to the joining surface at the outer peripheral edge of at least one side of the joint portion of the metal plate with the metallized conductor Part.

前記目的に沿う第2の発明に係る接合体は、アルミナセラミックからなり表面に高融点金属からなるメタライズ導体が形成されたセラミック基板と、四角形状のステンレス鋼からなる金属板がメタライズ導体にAg−Cu系ろう材を介して接合される接合体であって、メタライズ導体と金属板の間に、KV(Fe−Ni−Co系合金、商品名「Kovar(コバール)」)、又は42アロイ(Fe−Ni系合金)からなる中間金属板を有する。   The joined body according to the second invention that meets the above-mentioned object is a ceramic substrate made of alumina ceramic and having a metallized conductor made of a refractory metal on its surface, and a metal plate made of rectangular stainless steel is Ag- It is a joined body joined via a Cu-based brazing material, and between the metallized conductor and the metal plate, KV (Fe—Ni—Co-based alloy, trade name “Kovar”), or 42 alloy (Fe—Ni). An intermediate metal plate made of an alloy).

請求項1記載の接合体は、アルミナセラミックからなり表面に高融点金属からなるメタライズ導体が形成されたセラミック基板と、四角形状のステンレス鋼からなる金属板がメタライズ導体にAg−Cu系ろう材を介して接合される接合体であって、金属板のメタライズ導体との接合部の少なくとも1辺の外周縁部に、金属板の側面の途中から接合表面にかけて削除される切り欠き部を有するので、金属板は、上面側の面積よりセラミック基板との接合面側の面積を小さくでき、アルミナセラミック基板と、ステンレス金属板の熱膨張係数に大きな差があったとしても、セラミック基板と金属板のろう付け接合後の降温時に発生する熱応力を接合部で緩和させ、セラミック基板に破壊や、クラック等が発生するのを防止することができる。また、接合体は、セラミック基板に容易に形成できるメタライズ導体と、金属板が、一般的に用いられているAg−Cu系ろう材で容易に接合できるので、安価にすることができる。   The joined body according to claim 1 is a ceramic substrate made of alumina ceramic, on which a metallized conductor made of a refractory metal is formed, and a metal plate made of square stainless steel is made of an Ag-Cu brazing material on the metallized conductor. Since it has a notch portion that is removed from the middle of the side surface of the metal plate to the joining surface, at the outer peripheral edge portion of at least one side of the joint portion with the metallized conductor of the metal plate. The metal plate can have a smaller area on the joint surface side with the ceramic substrate than the area on the upper surface side, and even if there is a large difference in thermal expansion coefficient between the alumina ceramic substrate and the stainless steel metal plate, the brazing between the ceramic substrate and the metal plate The thermal stress generated when the temperature is lowered after the adhesive bonding can be relaxed at the bonded portion to prevent the ceramic substrate from being broken or cracked. In addition, since the metallized conductor that can be easily formed on the ceramic substrate and the metal plate can be easily bonded with a commonly used Ag—Cu brazing material, the bonded body can be made inexpensive.

請求項2記載の接合体は、アルミナセラミックからなり表面に高融点金属からなるメタライズ導体が形成されたセラミック基板と、四角形状のステンレス鋼からなる金属板がメタライズ導体にAg−Cu系ろう材を介して接合される接合体であって、メタライズ導体と金属板の間に、KV、又は42アロイからなる中間金属板を有するので、アルミナセラミック基板とステンレス金属板の熱膨張係数の間の熱膨張係数を有する中間金属板によって、セラミック基板と中間金属板、中間金属板と金属板のそれぞれの間のろう付け接合後の降温時に発生する熱応力をそれぞれの接合部で緩和させ、セラミック基板と、金属板の熱膨張係数に大きな差があったとしても、セラミック基板と中間金属板、中間金属板と金属板のそれぞれのろう付け接合後の降温時に発生する熱応力をそれぞれの接合部で緩和させ、セラミック基板に破壊や、クラック等が発生するのを防止することができる。また、接合体は、セラミック基板に容易に形成することができるメタライズ導体と中間金属板、及び中間金属板と金属板が、一般的に用いられているAg−Cu系ろう材を用いて容易に接合できるので、安価にすることができる。   According to a second aspect of the present invention, there is provided a bonded body comprising: a ceramic substrate made of alumina ceramic and having a metallized conductor made of a refractory metal formed on a surface thereof; and a metal plate made of rectangular stainless steel made of Ag-Cu based brazing material. And having an intermediate metal plate made of KV or 42 alloy between the metallized conductor and the metal plate, the thermal expansion coefficient between the thermal expansion coefficient of the alumina ceramic substrate and the stainless metal plate is The intermediate metal plate having the ceramic substrate and the intermediate metal plate, and the thermal stress generated at the time of temperature drop after the brazing joint between the intermediate metal plate and the metal plate are alleviated at the respective joints, and the ceramic substrate and the metal plate Even if there is a big difference in the thermal expansion coefficient, the ceramic substrate and the intermediate metal plate, the intermediate metal plate and the metal plate are brazed Thermal stress generated during the cooling was relaxed in each joint, it is possible to prevent destruction or the ceramic substrate, the cracks or the like occur. The joined body can be easily formed on a ceramic substrate using an Ag-Cu brazing material in which a metallized conductor and an intermediate metal plate, and an intermediate metal plate and a metal plate are generally used. Since it can join, it can be made cheap.

続いて、添付した図面を参照しつつ、本発明を具体化した実施するための最良の形態について説明し、本発明の理解に供する。
ここに、図1は第1の発明の一実施の形態に係る接合体の部分拡大縦断面図、図2は第2の発明の一実施の形態に係る接合体の部分拡大縦断面図である。
Subsequently, the best mode for carrying out the present invention will be described with reference to the accompanying drawings to provide an understanding of the present invention.
FIG. 1 is a partially enlarged longitudinal sectional view of a joined body according to an embodiment of the first invention, and FIG. 2 is a partially enlarged longitudinal sectional view of a joined body according to an embodiment of the second invention. .

図1に示すように、第1の発明の一実施の形態に係る接合体10は、一方側のセラミック基板11と、他方側の金属板12がろう材13を介して接合されて形成されている。この接合体10の一方側のセラミック基板11は、セラミック基材がアルミナセラミック(Al)からなり、セラミックグリーンシートの表面に、高融点金属、例えば、タングステン(W)や、モリブデン(Mo)等からなるメタライズペーストを用いてスクリーン印刷でメタライズパターンを形成し、1、又は複数枚の積層体からなるセラミックグリーンシートとメタライズパターンを還元雰囲気中の約1550℃程度の温度で同時焼成してセラミック基板11の表面にメタライズ導体14を有するように形成している。そして、このメタライズ導体14には、Niめっき被膜が施される。ここで用いられるセラミック基板11を形成するためのセラミックグリーンシートは、例えば、酸化アルミニウム粉末にマグネシア、シリカ、カルシア等の焼結助剤を適当量加えた粉末に、ジオクチフタレート等の可塑剤と、アクリル樹脂等のバインダー、及びトルエン、キシレン、アルコール類等の溶剤を加え、十分に混練して脱泡し、粘度2000〜40000cpsのスラリーを作製し、ドクターブレード法等によって所望の厚み、例えば、0.12mmのシート状にした後乾燥させ、複数枚の所望の大きさの矩形状に切断して形成している。 As shown in FIG. 1, a joined body 10 according to an embodiment of the first invention is formed by joining a ceramic substrate 11 on one side and a metal plate 12 on the other side via a brazing material 13. Yes. The ceramic substrate 11 on one side of the joined body 10 has a ceramic base material made of alumina ceramic (Al 2 O 3 ), and a refractory metal such as tungsten (W) or molybdenum (Mo ) And the like, and a metallized pattern is formed by screen printing, and the ceramic green sheet composed of one or more laminates and the metallized pattern are simultaneously fired at a temperature of about 1550 ° C. in a reducing atmosphere. A metallized conductor 14 is formed on the surface of the ceramic substrate 11. The metallized conductor 14 is provided with a Ni plating film. The ceramic green sheet for forming the ceramic substrate 11 used here is, for example, a powder obtained by adding an appropriate amount of a sintering aid such as magnesia, silica or calcia to aluminum oxide powder, and a plasticizer such as dioctiphthalate. In addition, a binder such as an acrylic resin and a solvent such as toluene, xylene, alcohols, etc. are added, kneaded sufficiently and defoamed to prepare a slurry having a viscosity of 2000 to 40000 cps, and a desired thickness, for example, The sheet is formed into a 0.12 mm sheet, dried, and cut into a plurality of desired rectangular shapes.

接合体10の他方側の金属板12は、ステンレス鋼の一例であるSUS304等からなり、例えば、板体から切削加工や、エッチング加工等で四角形状の所望の大きさに切断して形成されている。しかも、この金属板12には、セラミック基板11のメタライズ導体14との四角形状の接合部の少なくとも1辺の外周縁部に、金属板12の側面の途中から接合部表面にかけて削除される切り欠き部15が設けられている。この切り欠き部15の形状は、特に限定されるものではないが、例えば、断面視してC面状や、R面状や、多角面状等に削除されて形成されている。この金属板12は、セラミック基板11に形成されている表面にNiめっき被膜が施されたメタライズ導体14に、Ag−Cu系ろう材、例えば、BAg−8等からなるろう材13を介して当接し、約780℃程度に加熱することでセラミック基板11にろう付け接合されて接合体10に形成されている。この接合体10は、金属板12に形成された切り欠き部15によって、ろう付け接合後の降温時に発生する熱応力を接合部において緩和でき、接合部近傍のセラミック基板11に発生し易い破壊や、クラック等を防止することができる。なお、この切り欠き部15の大きさは、特に限定されるものではないが、例えば、大きさが2.4mm×0.9mm程度、厚さが0.65mm程度の金属板12のセラミック基板11との接合部の短辺側の1辺に、C0.25mm程度の切り欠き部15を設けた場合には、接合部近傍のセラミック基板11に発生し易い破壊や、クラック等の発生を問題なく防止することができた。この場合の金属板12のセラミック基板11との接合部における面積と、本来の金属板12の面積との比率は、89.6%程度となっている。このことから面積比率は、90%程度以下であればろう付け接合後の降温時に発生する熱応力を接合部において緩和でき、接合部近傍のセラミック基板11に発生し易い破壊や、クラック等の発生を問題なく防止させることができる。   The metal plate 12 on the other side of the joined body 10 is made of SUS304, which is an example of stainless steel, and is formed by cutting the plate body into a desired rectangular shape by cutting or etching. Yes. Moreover, the metal plate 12 has a notch that is removed from the middle of the side surface of the metal plate 12 to the surface of the joint portion at the outer peripheral edge of at least one side of the quadrangular joint portion with the metallized conductor 14 of the ceramic substrate 11. A portion 15 is provided. The shape of the notch 15 is not particularly limited. For example, the cutout 15 is formed by being deleted in a C-plane shape, an R-plane shape, a polygonal shape, or the like when viewed in cross section. This metal plate 12 is applied to a metallized conductor 14 having a Ni plating film on the surface formed on the ceramic substrate 11 via a brazing material 13 made of Ag-Cu-based brazing material, such as BAg-8. In contact with each other and heated to about 780 ° C., the ceramic substrate 11 is brazed and joined to form a joined body 10. This joined body 10 can relieve the thermal stress generated at the time of cooling after brazing and joining at the joined portion by the notch 15 formed in the metal plate 12, and can easily break down the ceramic substrate 11 near the joined portion. , Cracks and the like can be prevented. The size of the notch 15 is not particularly limited. For example, the ceramic substrate 11 of the metal plate 12 having a size of about 2.4 mm × 0.9 mm and a thickness of about 0.65 mm. In the case where the cutout portion 15 of about C0.25 mm is provided on one side on the short side of the joint portion, there is no problem with the occurrence of breakage or cracks that are likely to occur in the ceramic substrate 11 near the joint portion. Could be prevented. In this case, the ratio of the area of the joint of the metal plate 12 to the ceramic substrate 11 and the area of the original metal plate 12 is about 89.6%. Therefore, if the area ratio is about 90% or less, the thermal stress generated when the temperature is lowered after the brazing joint can be relieved at the joint, and the ceramic substrate 11 in the vicinity of the joint is likely to be broken or cracked. Can be prevented without problems.

次いで、図2に示すように、第2の発明の一実施の形態に係る接合体10aは、一方側のセラミック基板11と、他方側の金属板12aの間に中間金属板16を有し、中間金属板16がセラミック基板11と金属板12aのそれぞれにろう材13a、13bを介して接合されて形成されている。この接合体10aの一方側のセラミック基板11は、接合体10の場合と同様に、セラミック基材がアルミナセラミック(Al)からなり、セラミックグリーンシートの表面に、高融点金属、例えば、タングステン(W)や、モリブデン(Mo)等からなるメタライズペーストを用いてスクリーン印刷でメタライズパターンを形成し、1、又は複数枚の積層体からなるセラミックグリーンシートとメタライズパターンを還元雰囲気中の約1550℃程度の温度で同時焼成してセラミック基板11の表面にメタライズ導体14を有するように形成している。そして、このメタライズ導体14には、Niめっき被膜が施される。ここで用いられるセラミック基板11を形成するためのセラミックグリーンシートは、接合体10を形成するために用いられるセラミックグリーンシートと同様のものを用いることができる。 Next, as shown in FIG. 2, the joined body 10a according to one embodiment of the second invention has an intermediate metal plate 16 between the ceramic substrate 11 on one side and the metal plate 12a on the other side, An intermediate metal plate 16 is formed by joining the ceramic substrate 11 and the metal plate 12a via brazing materials 13a and 13b. As in the case of the joined body 10, the ceramic substrate 11 on one side of the joined body 10a is made of an alumina ceramic (Al 2 O 3 ), and a refractory metal such as, for example, A metallized pattern made of tungsten (W), molybdenum (Mo), or the like is used to form a metallized pattern by screen printing, and a ceramic green sheet consisting of one or more laminates and the metallized pattern are reduced to about 1550 in a reducing atmosphere. It is formed so as to have the metallized conductor 14 on the surface of the ceramic substrate 11 by simultaneous firing at a temperature of about ° C. The metallized conductor 14 is provided with a Ni plating film. As the ceramic green sheet for forming the ceramic substrate 11 used here, the same ceramic green sheet used for forming the bonded body 10 can be used.

接合体10aの他方側の金属板12aは、接合体10の場合の金属板12と同様に、ステンレス鋼の一例であるSUS304等からなり、例えば、板体から切削加工や、エッチング加工等で四角形状の所望の大きさに切断して形成されているが、この金属板12aには、金属板12のような切り欠き部15を必要としない。接合体10aの一方側のセラミック基板11のメタライズ導体14と、他方側の金属板12aの間に接合される中間金属板16は、KV、又は42アロイからなり、例えば、板体から切削加工や、エッチング加工等で四角形状の所望の大きさに切断して形成されている。この中間金属板16は、セラミック基板11に形成されている表面にNiめっき被膜が施されたメタライズ導体14に、Ag−Cu系ろう材、例えば、BAg−8等からなるろう材13aを介して当接し、約780℃程度に加熱することでセラミック基板11にろう付け接合している。そして、更に、表面にNiめっき被膜が施された中間金属板16の上面には、表面にNiめっき被膜が施された金属板12aをAg−Cu系ろう材、例えば、BAg−8等からなるろう材13aを介して当接し、約780℃程度に加熱することでろう付け接合している。この接合体10aは、中間金属板16がセラミック基板11と金属板12aの間の範囲にある熱膨張係数(KV:9.9×10−6/℃、42アロイ:8.5×10−6/℃)からなるので、セラミック基板11と中間金属板16、あるいは中間金属板16と金属板12aとのそれぞれのろう付け接合後の降温時に発生する熱応力を接合部において緩和でき、接合部近傍のセラミック基板11に発生し易い破壊や、クラック等を防止することができる。 The metal plate 12a on the other side of the joined body 10a is made of SUS304, which is an example of stainless steel, similarly to the metal plate 12 in the case of the joined body 10. For example, the square is formed by cutting or etching from the plate body. Although the metal plate 12a is formed by cutting into a desired size, the cutout portion 15 like the metal plate 12 is not required. The intermediate metal plate 16 joined between the metallized conductor 14 of the ceramic substrate 11 on one side of the joined body 10a and the metal plate 12a on the other side is made of KV or 42 alloy. It is formed by cutting into a desired rectangular shape by etching or the like. The intermediate metal plate 16 is formed on a metallized conductor 14 having a Ni plating film formed on the surface formed on the ceramic substrate 11 via a brazing material 13a made of Ag-Cu based brazing material, for example, BAg-8. The ceramic substrate 11 is brazed and joined by abutting and heating to about 780 ° C. Further, on the upper surface of the intermediate metal plate 16 with the Ni plating film on the surface, the metal plate 12a with the Ni plating film on the surface is made of an Ag—Cu brazing material such as BAg-8. It abuts via the brazing material 13a and is brazed and joined by heating to about 780 ° C. This bonded body 10a has a thermal expansion coefficient (KV: 9.9 × 10 −6 / ° C., 42 alloy: 8.5 × 10 −6) in which the intermediate metal plate 16 is in the range between the ceramic substrate 11 and the metal plate 12a. / ° C.), it is possible to relieve the thermal stress generated at the time of cooling after brazing and joining of the ceramic substrate 11 and the intermediate metal plate 16 or between the intermediate metal plate 16 and the metal plate 12a at the joint, and in the vicinity of the joint It is possible to prevent breakage, cracks and the like that are likely to occur in the ceramic substrate 11.

なお、接合体10aは、上記のようにセラミック基板11と中間金属板16のろう付け接合後に中間金属板16と金属板12aをろう付け接合するように行われる以外に、セラミック基板11と中間金属板16の下面の間にろう材13aを介し、中間金属板16の上面と金属板12aの間にろう材13bを介して、セラミック基板11、中間金属板16、及び金属板12aを加熱して一度にろう付け接合することで形成することもできる。あるいは、接合体10aは、金属板12aと中間金属板16の間にろう材13bを介して予め加熱してろう付け接合しておいた後に、中間金属板16とセラミック基板11の間にろう材13aを介して加熱してろう付け接合することで形成することもできる。   Note that the bonded body 10a is formed by brazing and bonding the intermediate metal plate 16 and the metal plate 12a after the brazing and bonding of the ceramic substrate 11 and the intermediate metal plate 16 as described above. The ceramic substrate 11, the intermediate metal plate 16, and the metal plate 12a are heated via the brazing material 13a between the lower surface of the plate 16 and the brazing material 13b between the upper surface of the intermediate metal plate 16 and the metal plate 12a. It can also be formed by brazing at a time. Alternatively, the joined body 10a is preliminarily heated and brazed between the metal plate 12a and the intermediate metal plate 16 via the brazing material 13b and then brazed between the intermediate metal plate 16 and the ceramic substrate 11. It can also be formed by heating and brazing through 13a.

接合体10、10aは、電子部品を搭載させるためのパッケージとして用いる場合には、通常セラミック基板11から露出する金属部分にNiめっき被膜、及びAuめっき被膜が施される。しかしながら、ステンレス鋼からなる金属板12、12aの上面に他の機器をレーザー溶接で溶接接合させる場合には、金属板12、12aの上面のAuめっき被膜によってレーザー光が反射して溶接に不具合が発生するので、金属板12、12aの上面に予めマスクしてめっきを施したり、接合体10、10aの全体にめっき被膜を形成した後に金属板12、12aの上面のめっき被膜を剥離したりしている。   When the joined bodies 10 and 10a are used as a package for mounting electronic components, a Ni plating film and an Au plating film are usually applied to a metal portion exposed from the ceramic substrate 11. However, when other devices are welded and joined to the upper surfaces of the metal plates 12 and 12a made of stainless steel by laser welding, the laser beam is reflected by the Au plating film on the upper surfaces of the metal plates 12 and 12a, causing problems in welding. Therefore, the upper surfaces of the metal plates 12 and 12a are masked in advance and plated, or after the plating film is formed on the entire joined bodies 10 and 10a, the plating film on the upper surfaces of the metal plates 12 and 12a is peeled off. ing.

発明者は、第1の発明に係る接合体である実施例1と、第2の発明に係る接合体である実施例2のモデルを作製し、これに合わせて、従来の接合体である金属板を接合しただけの比較例のモデルを作製して有限要素法によるシミュレーション解析によって、ろう付け接合時の応力状態を比較解析した。この解析法には、コンピューターによる三次元弾性(線形)熱応力解析ソフト「FEMソフト:ANSYS Rev.7.0」を用いた。   The inventor made a model of Example 1 which is a joined body according to the first invention and Example 2 which is a joined body according to the second invention, and according to this, a metal which is a conventional joined body The model of the comparative example which only joined the board was produced, and the stress state at the time of brazing joining was comparatively analyzed by the simulation analysis by the finite element method. In this analysis method, three-dimensional elastic (linear) thermal stress analysis software “FEM software: ANSYS Rev. 7.0” by a computer was used.

実施例1のモデルの金属板には、SUS304からなる大きさ2.4mm×0.9mm、厚さ0.65mm程度のものを用い、セラミック基板との接合部側の短辺側の1辺の縁部に、C0.25mm程度の切り欠き部を設けたものを用いた。また、セラミック基板には、アルミナセラミックからなり、表面にタングステンからなるメタライズ導体、及びこの上にNiめっき被膜を施したものをモデルとした。そして、実施例1のモデルの接合体の応力状態は、金属板の切り欠き部を設けた側と、セラミック基板のNiめっき被膜が施されたメタライズ導体との間にAg−Cuろう(BAg−8)を介して当接し、780℃でろう付け接合した後、780℃から室温まで一様に冷却した時の状態を想定して求めた。   The metal plate of the model of Example 1 is made of SUS304 and has a size of about 2.4 mm × 0.9 mm and a thickness of about 0.65 mm. One side on the short side on the joint side with the ceramic substrate is used. What provided the notch part about C0.25mm in the edge part was used. Moreover, the ceramic substrate was made of an alumina ceramic, a metallized conductor made of tungsten on the surface, and a Ni plating film formed thereon was used as a model. The stress state of the joined body of the model of Example 1 is that the Ag—Cu solder (BAg—) is formed between the metal plate notched portion of the metal plate and the metallized conductor having the Ni plating film on the ceramic substrate. 8), and after brazing and joining at 780 ° C., the temperature was uniformly cooled from 780 ° C. to room temperature.

実施例2のモデルの金属板には、実施例1と同様のSUS304からなる大きさ2.4mm×0.9mm、厚さ0.30mm程度の切り欠き部を設けないものを用いた。また、中間金属板には、KVからなる金属板と略同じ大きさのものを用い、金属板と中間金属板がろう材を介してろう付け接合された時の厚さが実施例1の場合の金属板と略同じ厚さになるようにした。更に、セラミック基板には、実施例1と同様のものを用いた。そして、実施例2のモデルの接合体の応力状態は、それぞれの部材間にAg−Cuろう(BAg−8)を介して当接し、780℃で1度にろう付け接合した後、780℃から室温まで一様に冷却した時の状態を想定して求めた。   As the model metal plate of Example 2, a metal plate made of SUS304 similar to that of Example 1 having a size of 2.4 mm × 0.9 mm and a thickness of about 0.30 mm was used. In addition, the intermediate metal plate is approximately the same size as the metal plate made of KV, and the thickness when the metal plate and the intermediate metal plate are brazed and joined via the brazing material is that of the first embodiment. The thickness of the metal plate was almost the same. Further, the same ceramic substrate as in Example 1 was used. And the stress state of the joined body of the model of Example 2 was brought into contact with each member via Ag—Cu brazing (BAg-8), and after brazing and joining at 780 ° C. once, from 780 ° C. It was determined assuming the state when uniformly cooled to room temperature.

比較例のモデルの金属板には、実施例2と同様の大きさで切り欠き部を設けないが、厚さが実施例1と同様の0.65mm程度のものを用いた。また、セラミック基板には、実施例1、実施例2と同様のものを用いた。そして、比較例のモデルの接合体は、金属板と、セラミック基板のNiめっき被膜が施されたメタライズ導体との間にAg−Cuろう(BAg−8)を介して当接し、780℃でろう付け接合した後、780℃から室温まで一様に冷却した時の状態を想定して求めた。   The metal plate of the model of the comparative example was the same size as that of the second embodiment, but was not provided with a notch, but the same thickness as that of the first embodiment was about 0.65 mm. Further, the same ceramic substrate as in Example 1 and Example 2 was used. Then, the joined body of the model of the comparative example is in contact with the metal plate and the metallized conductor on which the Ni plating film of the ceramic substrate is applied via Ag—Cu brazing (BAg-8), and is soldered at 780 ° C. It was obtained by assuming the state when uniformly cooled from 780 ° C. to room temperature after the adhesive joining.

シミュレーション解析結果を表1に示す。第1の発明に係る接合体である実施例1のセラミック基板に生ずる最大応力は、従来の接合体である金属板を接合しただけの比較例を100%とした時に、76.8%であって、23.2%の減少となっている。また、第2の発明に係る接合体である実施例2のセラミック基板に生ずる最大応力は、従来の接合体である金属板を接合しただけの比較例を100%とした時に、75.5%であって、24.5%の減少となっている。本発明のいずれの場合の接合体は、従来の接合体より20%を超えるセラミック基板に生ずる最大応力の減少となっており、効果の大きいことが分かった。   The simulation analysis results are shown in Table 1. The maximum stress generated in the ceramic substrate of Example 1 which is the joined body according to the first invention is 76.8% when the comparative example in which the metal plate which is the conventional joined body is simply joined is 100%. This is a decrease of 23.2%. Further, the maximum stress generated in the ceramic substrate of Example 2 which is the joined body according to the second invention is 75.5% when the comparative example in which only the metal plate which is the conventional joined body is joined is 100%. That is a decrease of 24.5%. It was found that the bonded body in any case of the present invention had a large effect because the maximum stress generated in the ceramic substrate exceeded 20% compared to the conventional bonded body.

Figure 2006232579
Figure 2006232579

本発明の接合体は、半導体素子等の電子部品を搭載させるパッケージ等に利用でき、特に、金属板に光ファイバーの端子をレーザー溶接できる光通信用半導体素子収納用パッケージとして用いることができるアルミナセラミック基板とステンレス鋼金属板の接合体として利用することができる。   The bonded body of the present invention can be used for a package for mounting an electronic component such as a semiconductor element, and in particular, an alumina ceramic substrate that can be used as a package for housing an optical communication semiconductor element capable of laser welding an optical fiber terminal to a metal plate. And can be used as a joined body of stainless steel metal plate.

第1の発明の一実施の形態に係る接合体の部分拡大縦断面図である。It is a partial expanded longitudinal cross-sectional view of the joined body which concerns on one embodiment of 1st invention. 第2の発明の一実施の形態に係る接合体の部分拡大縦断面図である。It is a partial expanded longitudinal cross-sectional view of the joined body which concerns on one embodiment of 2nd invention.

符号の説明Explanation of symbols

10、10a:接合体、11:セラミック基板、12、12a:金属板、13、13a、13b:ろう材、14:メタライズ導体、15:切り欠き部、16:中間金属板   10, 10a: bonded body, 11: ceramic substrate, 12, 12a: metal plate, 13, 13a, 13b: brazing material, 14: metallized conductor, 15: notch, 16: intermediate metal plate

Claims (2)

アルミナセラミックからなり表面に高融点金属からなるメタライズ導体が形成されたセラミック基板と、四角形状のステンレス鋼からなる金属板が前記メタライズ導体にAg−Cu系ろう材を介して接合される接合体であって、
前記金属板の前記メタライズ導体との接合部の少なくとも1辺の外周縁部に、前記金属板の側面の途中から接合表面にかけて削除される切り欠き部を有することを特徴とする接合体。
A joined body in which a ceramic substrate made of alumina ceramic and having a metallized conductor made of a refractory metal formed on a surface thereof, and a metal plate made of rectangular stainless steel are joined to the metallized conductor via an Ag-Cu brazing material. There,
A joined body comprising a cutout portion that is deleted from the middle of the side surface of the metal plate to the joining surface at an outer peripheral edge portion of at least one side of the joining portion of the metal plate with the metallized conductor.
アルミナセラミックからなり表面に高融点金属からなるメタライズ導体が形成されたセラミック基板と、四角形状のステンレス鋼からなる金属板が前記メタライズ導体にAg−Cu系ろう材を介して接合される接合体であって、
前記メタライズ導体と前記金属板の間に、KV(Fe−Ni−Co系合金、商品名「Kovar(コバール)」)、又は42アロイ(Fe−Ni系合金)からなる中間金属板を有することを特徴とする接合体。
A joined body in which a ceramic substrate made of alumina ceramic and a metallized conductor made of a refractory metal formed on a surface thereof, and a metal plate made of rectangular stainless steel are joined to the metallized conductor via an Ag-Cu brazing material. There,
Between the metallized conductor and the metal plate, an intermediate metal plate made of KV (Fe—Ni—Co alloy, trade name “Kovar”) or 42 alloy (Fe—Ni alloy) is provided. To be joined.
JP2005046370A 2005-02-23 2005-02-23 Joined body Pending JP2006232579A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011065457A1 (en) * 2009-11-27 2011-06-03 昭和電工株式会社 Laminate and manufacturing method for same
JP2012156432A (en) * 2011-01-28 2012-08-16 Kyocera Corp Package for housing element and mounting structure

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011065457A1 (en) * 2009-11-27 2011-06-03 昭和電工株式会社 Laminate and manufacturing method for same
US9096471B2 (en) 2009-11-27 2015-08-04 Showa Denko K.K. Method for producing a layered material
JP2012156432A (en) * 2011-01-28 2012-08-16 Kyocera Corp Package for housing element and mounting structure

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