JP2006190862A - Reflecting mirror for exposure - Google Patents

Reflecting mirror for exposure Download PDF

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Publication number
JP2006190862A
JP2006190862A JP2005002179A JP2005002179A JP2006190862A JP 2006190862 A JP2006190862 A JP 2006190862A JP 2005002179 A JP2005002179 A JP 2005002179A JP 2005002179 A JP2005002179 A JP 2005002179A JP 2006190862 A JP2006190862 A JP 2006190862A
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exposure
reflecting mirror
composite material
ceramic
metal
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Inventor
Hiroyuki Tsuto
宏之 津戸
Tomoyuki Hikita
友幸 引田
Ichiro Aoki
一郎 青木
Tadashi Matsumoto
匡史 松本
Tatsuya Shiogai
達也 塩貝
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Taiheiyo Cement Corp
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Taiheiyo Cement Corp
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Priority to JP2005002179A priority Critical patent/JP2006190862A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a reflecting mirror for exposure simplified in structure for attaining sufficient fine exposure accuracy because of no use of internal cooling member through formation of the basic part of the reflecting mirror for exposure with a composite material of ceramics and metal. <P>SOLUTION: The reflecting mirror for exposure is used for reflecting the light radiated from a light source for the exposure of substrates. In the reflecting mirror for exposure, the basic part thereof is formed of the composite material of ceramics and metal, and a short wavelength beam reflecting film is formed on the surface of the basic part of the reflecting mirror for exposure. Here, the ceramics reinforcing material of the composite material of ceramics and metal is desirably formed of SiC, a metal matrix is desirably formed of Si, and the ceramics reinforcing material is desirably included in the 30 to 80 volume%. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、フォトリソグラフィー用の露光装置の光源から放射された光を反射させる鏡部材として用いられる露光用反射鏡に関するものである。 The present invention relates to an exposure reflecting mirror used as a mirror member that reflects light emitted from a light source of an exposure apparatus for photolithography.

例えば液晶ディスプレイの製造工程におけるフォトリソグラフィー工程では、基板に対し所定のパターンを露光する露光処理が行われている。上述の露光処理は、通常露光装置において行われ、露光装置は、例えば光源となる超高圧水銀ランプと、この超高圧水銀ランプから出射した光を集光する楕円鏡と、楕円鏡からの光を反射させる反射鏡と、シャッタと、光の照度分布を均等にするフライアイレンズと、フライアイレンズを通過した光を基板の照射面に平行に反射させる球面鏡などから構成された光学系を備えている。
反射鏡と基板の照射面との間には、所定のパターンが面付けされたマスクが配置されている。そして、露光処理時には、シャッタを切ることによって、超高圧水銀ランプからの光が楕円鏡、反射鏡、フライアイレンズ、球面鏡を順に経由し、マスクを通過して基板の照射面に照射されて、基板に所定のパターンが露光されていた。
For example, in a photolithography process in a manufacturing process of a liquid crystal display, an exposure process for exposing a predetermined pattern to a substrate is performed. The above-described exposure processing is normally performed in an exposure apparatus, and the exposure apparatus, for example, an ultra-high pressure mercury lamp serving as a light source, an elliptical mirror that collects light emitted from the ultrahigh-pressure mercury lamp, and light from the elliptical mirror. It includes an optical system composed of a reflecting mirror that reflects, a shutter, a fly-eye lens that equalizes the illuminance distribution of light, and a spherical mirror that reflects light that has passed through the fly-eye lens in parallel to the irradiation surface of the substrate. Yes.
A mask having a predetermined pattern is disposed between the reflecting mirror and the irradiation surface of the substrate. And during the exposure process, by turning off the shutter, the light from the ultra-high pressure mercury lamp passes through the elliptical mirror, reflecting mirror, fly-eye lens, spherical mirror in order, is irradiated on the irradiation surface of the substrate through the mask, A predetermined pattern was exposed on the substrate.

ところで、基板サイズの大型化に伴って、超高圧水銀ランプには、十数kW程度の高出力のものが用いられるようになっている。また、露光装置は、通常1日に24時間連続して稼働しており、超高圧水銀ランプも24時間点灯し続けている。
このため、超高圧水銀ランプからは大量の熱が発生する。この大量の熱が露光装置内に放射されると、周辺機器に悪影響を及ぼすのみならず、露光されるフォトマスクや基板の温度を上昇させてしまい、露光処理が適正に行われないという問題点があった。
By the way, with the increase in the size of the substrate, high-pressure mercury lamps having a high output of about a dozen kW have been used. Further, the exposure apparatus is normally operated continuously for 24 hours a day, and the ultra-high pressure mercury lamp continues to be lit for 24 hours.
For this reason, a large amount of heat is generated from the ultra-high pressure mercury lamp. When this large amount of heat is radiated into the exposure apparatus, it not only adversely affects peripheral devices, but also raises the temperature of the exposed photomask and substrate, and the exposure process is not performed properly. was there.

こうした改善要求に対して、光源から放射された光を反射させる露光用反射鏡において、露光用反射鏡の基部に冷却部材を取り付け、前記露光用反射鏡の基部の表面に、短波長光反射膜が形成されたものが提案されている(たとえば、特許文献1参照)。
特開2004−354655
In response to such a demand for improvement, in an exposure reflector that reflects light emitted from a light source, a cooling member is attached to the base of the exposure reflector, and a short wavelength light reflecting film is formed on the surface of the base of the exposure reflector. Has been proposed (see, for example, Patent Document 1).
JP 2004-354655 A

しかしながら、近年露光精度の微細化が進み、さらには露光装置の照明出力が増加する傾向にあり、こうした冷却部材のみでは十分な冷却効果が得られず微細化に対応できないという課題がでてきた。
さらには、このようなう冷却部材を用いた反射鏡は構造が複雑になるばかりでなく、やはり長時間の使用においては温度上昇による熱膨張で、反射鏡の幾何精度に悪影響を及ぼすという課題を有していた。
However, in recent years, the exposure accuracy has been miniaturized, and the illumination output of the exposure apparatus tends to increase. Thus, a sufficient cooling effect cannot be obtained with only such a cooling member, and there has been a problem that miniaturization cannot be supported.
Furthermore, the reflector using such a cooling member not only has a complicated structure, but also has a problem of adversely affecting the geometric accuracy of the reflector due to thermal expansion due to temperature rise when used for a long time. Had.

したがって、本発明の目的は、露光用反射鏡の基部をセラミックス−金属複合材料で形成することにより、内部に冷却部材を用いることのないため構造が簡略であり露光精度の微細化に十分に対応可能な露光用反射鏡を提供することを目的としている。 Therefore, the object of the present invention is to form the base of the exposure mirror with a ceramic-metal composite material, so that a cooling member is not used in the interior, the structure is simple, and the exposure accuracy is sufficiently miniaturized. An object is to provide a possible exposure reflector.

上記した本発明の目的は、下記する手段により達成される。
(1) 基板を露光するために、光源から放射された光を反射させる露光用反射鏡であって、該露光用反射鏡の基部がセラミックス−金属複合材料で形成されており、かつ、該露光用反射鏡の基部の表面に短波長光反射膜が形成されていることを特徴とする露光用反射鏡。
(2)前記セラミックス−金属複合材料のセラミックス強化材がSiCであり、金属マトリックスがSiであり、かつ、該セラミックス強化材の含有率が30〜80体積%であることを特徴とする(1)記載の露光用反射鏡。
The object of the present invention is achieved by the following means.
(1) An exposure reflecting mirror that reflects light emitted from a light source in order to expose a substrate, the base of the reflecting mirror being formed of a ceramic-metal composite material, and the exposure A reflection mirror for exposure, wherein a short wavelength light reflection film is formed on a surface of a base portion of the reflection mirror.
(2) The ceramic reinforcing material of the ceramic-metal composite material is SiC, the metal matrix is Si, and the content of the ceramic reinforcing material is 30 to 80% by volume (1) The reflector for exposure as described.

本発明によれば、以下に詳細に説明するとおり、内部に冷却部材を用いることのないため構造が簡略であり、かつ、露光精度の微細化に十分に対応可能な露光用反射鏡が得られる効果がある。 According to the present invention, as will be described in detail below, an exposure reflecting mirror is obtained that has a simple structure because it does not use a cooling member inside and that can sufficiently cope with miniaturization of exposure accuracy. effective.

以下本発明について更に詳しく説明する。
本発明者らは、基板を露光するために、光源から放射された光を反射させる露光用反射鏡であって、該露光用反射鏡の基部がセラミックス−金属複合材料で形成されており、かつ、該露光用反射鏡の基部の表面に短波長光反射膜が形成されていることを特徴とする露光用反射鏡を提案している。(請求項1)
Hereinafter, the present invention will be described in more detail.
The present inventors provide an exposure reflector that reflects light emitted from a light source in order to expose a substrate, wherein the base of the exposure mirror is formed of a ceramic-metal composite material, and In addition, there has been proposed an exposure reflector characterized in that a short wavelength light reflection film is formed on the surface of the base of the exposure reflector. (Claim 1)

ここで、本発明に係わる露光装置の光学系の概略構成図を図1に示した。図1は、光源となる超高圧水銀ランプと、この超高圧水銀ランプから出射した光を集光する楕円鏡として本発明の露光用反射鏡を用いた例である。ここで、該露光用反射鏡の基部はセラミックス−金属複合材料で形成されており、かつ、該露光用反射鏡の基部の表面には、短波長光反射膜が形成されている
露光用反射鏡の基部をセラミックス−金属複合材料で形成させる理由は、露光用反射鏡の基部を熱膨張係数の小さいセラミックス−金属複合材料で形成することで内部に冷却部材を用いる必要がなくなるとの着想による。また、露光用反射鏡の基部の表面の凹面側に短波長光反射膜(図示せず。)を形成する理由は、露光に必要な波長450nm以下の短波長を効率よく反射させるためである。
Here, a schematic block diagram of the optical system of the exposure apparatus according to the present invention is shown in FIG. FIG. 1 shows an example in which an ultrahigh pressure mercury lamp serving as a light source and the exposure reflecting mirror of the present invention are used as an elliptical mirror for condensing light emitted from the ultrahigh pressure mercury lamp. Here, the base part of the exposure mirror is formed of a ceramic-metal composite material, and a short-wavelength light reflection film is formed on the surface of the base part of the exposure mirror. The reason why the base portion is formed of the ceramic-metal composite material is that the base portion of the reflecting mirror for exposure is formed of the ceramic-metal composite material having a small thermal expansion coefficient, thereby eliminating the need to use a cooling member inside. The reason for forming a short-wavelength light reflecting film (not shown) on the concave side of the surface of the base of the exposure reflector is to efficiently reflect a short wavelength of 450 nm or less necessary for exposure.

次に、本発明者らは、前記セラミックス−金属複合材料のセラミックス強化材がSiCであり、金属マトリックスがSiであり、かつ、該セラミックス強化材の含有率が30〜80体積%であることを特徴とする露光用反射鏡を提案している。(請求項2)
その理由は、本発明の金属−セラミックス複合材料のセラミックス強化材をSiCとし、金属マトリックスをSiとすることで、露光用反射鏡の基部の組織が緻密となり、かつ熱膨張係数が小さく、熱伝導率も良いので、温度上昇の幾何精度への影響を大幅に低減できるからである。
また、金属−セラミックス複合材料のセラミックス強化材の含有率を30〜80体積%とする理由は、セラミックス強化材の含有率が30体積%より少ないと成形体強度が弱くなるため保形性に問題があり、逆に、セラミックス強化材の含有率80体積%より多いと複合材料自体の作製が困難となるからである。
Next, the inventors confirmed that the ceramic reinforcing material of the ceramic-metal composite material is SiC, the metal matrix is Si, and the content of the ceramic reinforcing material is 30 to 80% by volume. We have proposed a characteristic reflector for exposure. (Claim 2)
The reason for this is that the ceramic reinforcing material of the metal-ceramic composite material of the present invention is made of SiC and the metal matrix is made of Si, so that the structure of the base of the reflecting mirror for exposure becomes dense, the thermal expansion coefficient is small, and the heat conduction. This is because the rate is good, and the influence of the temperature rise on the geometric accuracy can be greatly reduced.
Also, the reason why the content of the ceramic reinforcing material in the metal-ceramic composite material is 30 to 80% by volume is that if the content of the ceramic reinforcing material is less than 30% by volume, the strength of the molded body will be weak, and there will be a problem with shape retention. On the contrary, if the content of the ceramic reinforcement is more than 80% by volume, it is difficult to produce the composite material itself.

次に、本発明における金属−セラミックス複合材料の作製方法としては慣用の方法が用いられる。例えばSiC、カーボン、Si粉末により成形体を作製し、非酸化雰囲気中1300〜・・・・℃で焼成する方法や、SiC、カーボン、樹脂により成形体を作製し、溶融したSiを非酸化雰囲気中1500〜・・・・℃で含浸させる方法などが挙げられる。   Next, a conventional method is used as a method for producing the metal-ceramic composite material in the present invention. For example, a molded body is produced from SiC, carbon, Si powder, and fired at 1300 to ... ° C. in a non-oxidizing atmosphere, or a molded body is produced from SiC, carbon, resin, and molten Si is non-oxidized. Among them, a method of impregnation at 1500 to.

以上の方法で露光用反射鏡を作製すれば、緻密でかつ熱膨張係数の小さい露光用反射鏡とすることができるようになる。また、金属−セラミックス複合材料の表面に短波長反射膜を形成することにより、露光に必要な波長450nm以下の短波長を効率よく反射できるため好適な露光用反射鏡とすることができる。 If the reflecting mirror for exposure is produced by the above method, the reflecting mirror for exposure can be made dense and with a small coefficient of thermal expansion. Further, by forming a short wavelength reflection film on the surface of the metal-ceramic composite material, a short wavelength of 450 nm or less necessary for exposure can be efficiently reflected, so that a suitable reflecting mirror for exposure can be obtained.

以下、実施例と比較例を示し、本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。
(実施例)
(1) 複合材料の作製
強化材としては、市販の信濃電気製錬社製のSiC粉末(品番:#400、平均粒径30μm)を用い、これにフェノール樹脂を添加して、・・・・・・・・・・・・の形状に成形した。得られた成形体を、Ar中で・・・・℃に加熱してSiCプリフォームを得た。次にSiを当該プリフォームとともに炉内に設置し、・・・・℃に加熱してSiを溶融し、SiCの含有率が50体積%になるようにプリフォームに含浸させて、セラミックス強化材がSiCであり、金属マトリックスがSiであるSiC-Si複合材料を得た。
EXAMPLES Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated concretely, this invention is not restrict | limited to the following Example.
(Example)
(1) Production of composite materials
As a reinforcing material, a commercially available SiC powder manufactured by Shinano Electric Smelting Co., Ltd. (product number: # 400, average particle size 30 μm) is used, and a phenol resin is added to this powder. Molded to the shape of The obtained molded body was heated in Ar ··· ° C. to obtain a SiC preform. Next, Si is placed in the furnace together with the preform, and then heated to ° C to melt Si and impregnate the preform so that the SiC content is 50% by volume. SiC-Si composite material with SiC as the metal matrix was obtained.

(2)評価
得られた複合材料から3×4×40mmの試験片を切り出し、その試験片を用いて公知の方法でヤング率を求めた。また熱膨張係数はJIS R 1618に従い、熱伝導率はJIS R 1611に従いそれぞれ測定した。
(2) Evaluation A test piece of 3 × 4 × 40 mm was cut out from the obtained composite material, and Young's modulus was determined by a known method using the test piece. The thermal expansion coefficient was measured according to JIS R 1618, and the thermal conductivity was measured according to JIS R 1611.

(比較例)
比較のために、露光用反射鏡用の基部の部材をセラミックス−金属複合材料の代わりに銅とし、それを実施例と同様に評価した。その評価結果を実施例の部材の評価結果とともに表1にまとめて示した。
(Comparative example)
For comparison, the base member for the reflecting mirror for exposure was replaced with copper instead of the ceramic-metal composite material, which was evaluated in the same manner as in the example. The evaluation results are shown in Table 1 together with the evaluation results of the members of the examples.

Figure 2006190862
Figure 2006190862

表1の結果から明らかなように、実施例の部材は、金属と比較して高いヤング率とセラミックスと比較して高い熱伝導率、さらに低い熱膨張係数を兼ね備えた材料であった。このことから、この複合材料を用いて露光用反射鏡を作製すれば、緻密であって、かつ熱膨張係数の小さい露光用反射鏡が得られることが分かった。
これに対して比較例の部材では、材質が複合材料ではなく、銅単味であるので、熱膨張係数が大きくなった。
したがって、実施例に係わるセラミックス−金属複合材料は、照明出力を高出力化した露光装置用部材として比較例の部材よりも適していることが分かった。
As is clear from the results in Table 1, the member of the example was a material having a high Young's modulus compared to metal, a high thermal conductivity compared to ceramics, and a low thermal expansion coefficient. From this, it has been found that if an exposure reflector is produced using this composite material, an exposure reflector having a high density and a small thermal expansion coefficient can be obtained.
On the other hand, in the member of the comparative example, since the material is not a composite material but a simple copper, the coefficient of thermal expansion is large.
Therefore, it was found that the ceramic-metal composite material according to the example is more suitable than the member of the comparative example as a member for an exposure apparatus having a high illumination output.

(3)稼動試験
実施例と同様にして得られたセラミックス−金属複合材料で形成した基部の表面に短波長光反射膜を形成した露光反射鏡を用い、実際に露光操作を行った。
その結果、超高圧水銀ランプとして30kW程度の高出力のものが用い、露光装置を72時間連続して稼働しても、超高圧水銀ランプからの大量の熱の発生による露光精度の低下は発生しなかった。
(3) Operation test An exposure operation was actually performed using an exposure reflector in which a short-wavelength light reflection film was formed on the surface of a base formed of a ceramic-metal composite material obtained in the same manner as in the examples.
As a result, an ultra-high pressure mercury lamp with a high output of about 30 kW is used, and even if the exposure device is operated continuously for 72 hours, the exposure accuracy is reduced due to the generation of a large amount of heat from the ultra-high pressure mercury lamp. There wasn't.

本発明に係わる露光装置の光学系の概略構成図である。It is a schematic block diagram of the optical system of the exposure apparatus concerning this invention.

Claims (2)

基板を露光するために、光源から放射された光を反射させる露光用反射鏡であって、該露光用反射鏡の基部がセラミックス−金属複合材料で形成されており、かつ、該露光用反射鏡の基部の表面に短波長光反射膜が形成されていることを特徴とする露光用反射鏡。 An exposure reflector for reflecting light emitted from a light source for exposing a substrate, wherein the base of the exposure reflector is formed of a ceramic-metal composite material, and the exposure reflector A reflection mirror for exposure, wherein a short-wavelength light reflection film is formed on the surface of the base portion of the above. 前記セラミックス−金属複合材料のセラミックス強化材がSiCであり、金属マトリックスがSiであり、かつ、該セラミックス強化材の含有率が30〜80体積%であることを特徴とする請求項1記載の露光用反射鏡。 2. The exposure according to claim 1, wherein the ceramic reinforcement of the ceramic-metal composite material is SiC, the metal matrix is Si, and the content of the ceramic reinforcement is 30 to 80% by volume. Reflector.
JP2005002179A 2005-01-07 2005-01-07 Reflecting mirror for exposure Pending JP2006190862A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3489374A1 (en) * 2011-01-21 2019-05-29 Carl Zeiss SMT GmbH Substrate for mirrors for euv lithography

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3489374A1 (en) * 2011-01-21 2019-05-29 Carl Zeiss SMT GmbH Substrate for mirrors for euv lithography
US10935704B2 (en) 2011-01-21 2021-03-02 Carl Zeiss Smt Gmbh Substrate for an EUV-lithography mirror

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