JP2006186073A - 半導体装置およびその製造方法 - Google Patents
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0483—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells having several storage transistors connected in series
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/401—Multistep manufacturing processes
- H01L29/4011—Multistep manufacturing processes for data storage electrodes
- H01L29/40114—Multistep manufacturing processes for data storage electrodes the electrodes comprising a conductor-insulator-conductor-insulator-semiconductor structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66825—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a floating gate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/788—Field effect transistors with field effect produced by an insulated gate with floating gate
- H01L29/7881—Programmable transistors with only two possible levels of programmation
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
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- H10B41/30—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region
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- Condensed Matter Physics & Semiconductors (AREA)
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Abstract
【解決手段】 不揮発性メモリセルは、アクティブエリア1AA上に設けられたトンネル絶縁膜2と、トンネル絶縁膜2上に設けられた浮遊ゲート電極3と、浮遊ゲート電極3の上方に設けられた制御ゲート電極10と、浮遊ゲート電極3と制御ゲート電極10との間に設けられた電極間絶縁膜9とを含み、チャネル幅方向の断面において、アクティブエリア1AAの上面のチャネル幅方向の寸法は、トンネル絶縁膜2の下面のチャネル幅方向の寸法よりも短く、かつ、アクティブエリア1AAと対向する部分のトンネル絶縁膜2の面積は、浮遊ゲート電極3の上面と対向する部分の電極間絶縁膜9の面積より小さい。
【選択図】図3
Description
図1は、本発明の第1の実施形態に係るNAND型フラッシュメモリのメモリセルの平面図である。図2は上記メモリセルの等価回路図である。図1、図2において、M1−M8は不揮発性メモリセル部、S1およびS2は選択トランジスタ部、CG1−CG8は浮遊ゲート(ワード線)、SG1およびSG2は選択ゲート、BL1およびBL2はビット線、SLはソース線、Vssは電源電圧(グランド)を示している。
図13は、本発明の第2の実施形態に係るメモリセルを示す断面図である。図13は、図3(b)に対応するチャネル幅方向の断面図である。なお、図3(b)と対応する部分には図3(b)と同一符号を付してあり、詳細な説明は省略する。
図14は、本発明の第3の実施形態に係るメモリセルを示す断面図である。図14は、図3(b)に対応するチャネル幅方向の断面図である。なお、図3(b)と対応する部分には図3(b)と同一符号を付してあり、詳細な説明は省略する。
(3) 上記(2)において、記電極間絶縁膜は、窒化シリコン、酸化アルミニウム、酸化ハフニウム、酸化タンタル、酸化チタンおよびシリケートの少なくとも1つを含む単層または多層の絶縁膜である。
Claims (5)
- 周囲が素子分離絶縁膜で囲まれたアクティブエリアを含む半導体基板と、前記アクティブエリア上に設けられた不揮発性メモリセルとを具備してなる半導体装置であって、
前記不揮発性メモリセルは、
前記アクティブエリア上に設けられたトンネル絶縁膜と、
前記トンネル絶縁膜上に設けられた浮遊ゲート電極と、
前記浮遊ゲート電極の上方に設けられた制御ゲート電極と、
前記浮遊ゲート電極と前記制御ゲート電極との間に設けられた電極間絶縁膜とを含み、
前記不揮発性メモリセルのチャネル幅方向の断面において、前記アクティブエリアの上面の前記チャネル幅方向の寸法は、前記トンネル絶縁膜の下面の前記チャネル幅方向の寸法よりも短く、かつ、前記アクティブエリアと対向する部分の前記トンネル絶縁膜の面積は、前記浮遊ゲート電極の上面と対向する部分の前記電極間絶縁膜の面積より小さいことを特徴とする半導体装置。 - 前記電極間絶縁膜は、誘電率が6.0以上の絶縁膜であることを特徴とする請求項1に記載の半導体装置。
- 前記アクティブエリアの周囲を囲む前記素子分離絶縁膜は、さらに前記トンネル絶縁膜および前記浮遊ゲート電極の周囲を囲むことを特徴とする請求項1または2に記載の半導体装置。
- 周囲が素子分離絶縁膜で囲まれたアクティブエリアを含む半導体基板と、前記アクティブエリア上に設けられた不揮発性メモリセルとを具備してなる半導体装置の製造方法であって、
前記半導体基板上に、トンネル絶縁膜としての第1の絶縁膜、浮遊ゲート電極としての第1の導電膜を順次形成する工程と、
前記第1の導電膜、前記第1の絶縁膜および前記半導体基板をエッチングすることにより、前記半導体基板の表面に、前記アクティブエリアを規定し、かつ、前記浮遊ゲート電極および前記トンネル絶縁膜の前記不揮発性メモリセルのチャネル幅方向の形状を規定する素子分離溝を形成する工程であって、前記チャネル幅方向において、前記アクティブエリアの上面の前記チャネル幅方向の寸法が、前記トンネル絶縁膜の下面の前記チャネル幅方向の寸法よりも短くなるように前記素子分離溝を形成する工程と、
前記素子分離溝内に前記素子分離絶縁膜を形成する工程と、
前記第1の導電膜上に、電極間絶縁膜としての第2の絶縁膜、制御ゲート電極としての第2の導電膜を順次形成する工程と、
前記第2の導電膜、前記第2の絶縁膜、前記第1の導電膜、前記第1の絶縁膜を順次エッチングすることにより、前記制御ゲート電極、前記電極間絶縁膜、前記浮遊ゲート電極および前記トンネル絶縁膜の形状を決定する工程と
を有することを特徴とする半導体装置の製造方法。 - 前記素子分離溝を形成する工程は、前記第1の導電膜、前記第1の絶縁膜および前記半導体基板を等方的にエッチングする工程と、前記半導体基板を異方的にエッチングする工程とを含むことを特徴とする請求項4に記載の半導体装置の製造方法。
Priority Applications (4)
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JP2004377295A JP2006186073A (ja) | 2004-12-27 | 2004-12-27 | 半導体装置およびその製造方法 |
US11/315,280 US20060140028A1 (en) | 2004-12-27 | 2005-12-23 | Semiconductor device and manufacturing method thereof |
CNB2005101356387A CN100530660C (zh) | 2004-12-27 | 2005-12-27 | 半导体器件和半导体器件的制造方法 |
US11/819,428 US20070254434A1 (en) | 2004-12-27 | 2007-06-27 | Semiconductor device and manufacturing method thereof |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008186838A (ja) * | 2007-01-26 | 2008-08-14 | Toshiba Corp | 半導体装置、その製造方法及び不揮発性半導体記憶装置 |
KR100914105B1 (ko) * | 2006-11-07 | 2009-08-27 | 가부시끼가이샤 도시바 | 비휘발성 반도체 메모리 디바이스 및 그 제조 방법 |
US7939878B2 (en) | 2006-09-12 | 2011-05-10 | Kabushiki Kaisha Toshiba | Nonvolatile semiconductor memory and method of manufacturing the same and manufacturing method thereof |
US8072021B2 (en) | 2007-08-29 | 2011-12-06 | Kabushiki Kaisha Toshiba | Nonvolatile semiconductor memory device |
KR101110403B1 (ko) | 2009-09-15 | 2012-02-24 | 가부시끼가이샤 도시바 | 반도체 기억 장치 |
US8319270B2 (en) | 2008-12-22 | 2012-11-27 | Kabushiki Kaisha Toshiba | Semiconductor device and method for manufacturing the same |
KR101900103B1 (ko) | 2010-12-29 | 2018-09-18 | 에이블릭 가부시키가이샤 | 반도체 불휘발성 메모리 장치 |
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JP4528718B2 (ja) * | 2005-12-27 | 2010-08-18 | 株式会社東芝 | 不揮発性半導体メモリの製造方法 |
KR20090065754A (ko) * | 2007-12-18 | 2009-06-23 | 주식회사 동부하이텍 | 반도체 소자 및 그 제조방법 |
KR20090084128A (ko) * | 2008-01-31 | 2009-08-05 | 삼성전자주식회사 | 비휘발성 메모리 소자 및 비휘발성 메모리 소자의 제조방법 |
KR100998945B1 (ko) * | 2008-09-05 | 2010-12-09 | 주식회사 하이닉스반도체 | 비휘발성 메모리 소자 제조 방법 |
CN103390589B (zh) | 2012-05-09 | 2015-08-26 | 无锡华润上华半导体有限公司 | Nor结构闪存及其制备方法 |
KR102021808B1 (ko) * | 2012-12-04 | 2019-09-17 | 삼성전자주식회사 | 3차원 구조의 메모리 셀 어레이를 포함하는 불휘발성 메모리 |
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JP2002289683A (ja) * | 2001-03-28 | 2002-10-04 | Nec Corp | トレンチ分離構造の形成方法および半導体装置 |
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2004
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- 2005-12-23 US US11/315,280 patent/US20060140028A1/en not_active Abandoned
- 2005-12-27 CN CNB2005101356387A patent/CN100530660C/zh not_active Expired - Fee Related
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2007
- 2007-06-27 US US11/819,428 patent/US20070254434A1/en not_active Abandoned
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7939878B2 (en) | 2006-09-12 | 2011-05-10 | Kabushiki Kaisha Toshiba | Nonvolatile semiconductor memory and method of manufacturing the same and manufacturing method thereof |
KR100914105B1 (ko) * | 2006-11-07 | 2009-08-27 | 가부시끼가이샤 도시바 | 비휘발성 반도체 메모리 디바이스 및 그 제조 방법 |
JP2008186838A (ja) * | 2007-01-26 | 2008-08-14 | Toshiba Corp | 半導体装置、その製造方法及び不揮発性半導体記憶装置 |
US8072021B2 (en) | 2007-08-29 | 2011-12-06 | Kabushiki Kaisha Toshiba | Nonvolatile semiconductor memory device |
US8319270B2 (en) | 2008-12-22 | 2012-11-27 | Kabushiki Kaisha Toshiba | Semiconductor device and method for manufacturing the same |
KR101110403B1 (ko) | 2009-09-15 | 2012-02-24 | 가부시끼가이샤 도시바 | 반도체 기억 장치 |
US8860121B2 (en) | 2009-09-15 | 2014-10-14 | Kabushiki Kaisha Toshiba | Semiconductor device having upper layer portion of semiconductor substrate divided into a plurality of active areas |
KR101900103B1 (ko) | 2010-12-29 | 2018-09-18 | 에이블릭 가부시키가이샤 | 반도체 불휘발성 메모리 장치 |
Also Published As
Publication number | Publication date |
---|---|
US20060140028A1 (en) | 2006-06-29 |
CN100530660C (zh) | 2009-08-19 |
CN1812107A (zh) | 2006-08-02 |
US20070254434A1 (en) | 2007-11-01 |
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