JP2006137727A5 - - Google Patents

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Publication number
JP2006137727A5
JP2006137727A5 JP2004330588A JP2004330588A JP2006137727A5 JP 2006137727 A5 JP2006137727 A5 JP 2006137727A5 JP 2004330588 A JP2004330588 A JP 2004330588A JP 2004330588 A JP2004330588 A JP 2004330588A JP 2006137727 A5 JP2006137727 A5 JP 2006137727A5
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Japan
Prior art keywords
formula
hydrogen atom
acrylic acid
acid ester
following formula
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JP2004330588A
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Japanese (ja)
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JP4723847B2 (en
JP2006137727A (en
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Priority claimed from JP2004330588A external-priority patent/JP4723847B2/en
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Publication of JP2006137727A5 publication Critical patent/JP2006137727A5/ja
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Description

Figure 2006137727
Figure 2006137727

Figure 2006137727
Figure 2006137727

Claims (2)

下記式(1−1)または式(1−2)で表される化合物を、酸の存在下、メタクリル酸またはアクリル酸と反応させる下記式(2−1)または式(2−2)の(メタ)アクリル酸エステルの製造方法。A compound of the following formula (2-1) or the formula (2-2) in which a compound represented by the following formula (1-1) or the formula (1-2) is reacted with methacrylic acid or acrylic acid in the presence of an acid Method for producing meta) acrylic acid ester.
Figure 2006137727
Figure 2006137727
Figure 2006137727
Figure 2006137727
(式(1−1)、式(1−2)、式(2−1)および式(2−2)中、R1 〜R9 、R11〜R19はそれぞれ独立に水素原子、または酸素原子を含んでもよい炭素数1〜4の1価の炭化水素基を表し、R20は水素原子またはメチル基を表す。)(In the formula (1-1), the formula (1-2), the formula (2-1) and the formula (2-2), R1 to R9 and R11 to R19 each independently contain a hydrogen atom or an oxygen atom Represents a C1-C4 monovalent hydrocarbon group, and R20 represents a hydrogen atom or a methyl group.)
下記式(1−1)または式(1−2)で表される化合物に、酸を付加した後、(メタ)アクリル酸エステルとエステル交換反応させる、下記式(2−1)または式(2−2)の(メタ)アクリル酸エステルの製造方法。  An acid is added to a compound represented by the following formula (1-1) or formula (1-2), and then transesterification with a (meth) acrylic acid ester is carried out, the following formula (2-1) or formula (2) -2) The manufacturing method of the (meth) acrylic acid ester.
Figure 2006137727
Figure 2006137727
Figure 2006137727
Figure 2006137727
(式(1−1)、式(1−2)、式(2−1)および式(2−2)中、R1 〜R9 、R11〜R19はそれぞれ独立に水素原子、または酸素原子を含んでもよい炭素数1〜4の1価の炭化水素基を表し、R20は水素原子またはメチル基を表す。)(In the formula (1-1), the formula (1-2), the formula (2-1) and the formula (2-2), R1 to R9 and R11 to R19 each independently contain a hydrogen atom or an oxygen atom Represents a C1-C4 monovalent hydrocarbon group, and R20 represents a hydrogen atom or a methyl group.)
JP2004330588A 2004-11-15 2004-11-15 Method for producing (meth) acrylic acid ester Active JP4723847B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004330588A JP4723847B2 (en) 2004-11-15 2004-11-15 Method for producing (meth) acrylic acid ester

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004330588A JP4723847B2 (en) 2004-11-15 2004-11-15 Method for producing (meth) acrylic acid ester

Publications (3)

Publication Number Publication Date
JP2006137727A JP2006137727A (en) 2006-06-01
JP2006137727A5 true JP2006137727A5 (en) 2007-12-27
JP4723847B2 JP4723847B2 (en) 2011-07-13

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ID=36618774

Family Applications (1)

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JP2004330588A Active JP4723847B2 (en) 2004-11-15 2004-11-15 Method for producing (meth) acrylic acid ester

Country Status (1)

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JP (1) JP4723847B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5446598B2 (en) * 2008-09-01 2014-03-19 セントラル硝子株式会社 Method for producing α-substituted norbornanyl acrylates

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS537615A (en) * 1977-04-26 1978-01-24 Kohjin Co Ltd Synthesis of n-substituted acrylamides
JPS5640644A (en) * 1979-09-10 1981-04-16 Hitachi Chem Co Ltd Preparation of dihydrodicyclopentenyl acrylate
JPS5659736A (en) * 1979-10-18 1981-05-23 Hitachi Chem Co Ltd Preparation of dihydrodicyclopentenyl acrylate and/or dihydrodicyclopentenyl methacrylate
JPH0259751A (en) * 1988-08-26 1990-02-28 Nippon Oil Co Ltd Photosensitive composition
JPH0413647A (en) * 1990-04-27 1992-01-17 Tosoh Corp Production of (meth)acrylate of alicyclic compound
JP4129064B2 (en) * 1995-06-09 2008-07-30 出光興産株式会社 Alkoxycarbonyl norbornyl (meth) acrylate, method for producing the same, and photosensitive resin composition
JP2973998B2 (en) * 1997-03-07 1999-11-08 日本電気株式会社 Photosensitive resin composition and pattern forming method using the same
JPH11109630A (en) * 1997-10-03 1999-04-23 Fuji Photo Film Co Ltd Positive photoresist composition for exposure with far ultraviolet ray

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