JP2006114886A - n型III族窒化物半導体積層構造体 - Google Patents
n型III族窒化物半導体積層構造体 Download PDFInfo
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- JP2006114886A JP2006114886A JP2005264379A JP2005264379A JP2006114886A JP 2006114886 A JP2006114886 A JP 2006114886A JP 2005264379 A JP2005264379 A JP 2005264379A JP 2005264379 A JP2005264379 A JP 2005264379A JP 2006114886 A JP2006114886 A JP 2006114886A
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- group iii
- nitride semiconductor
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/15—Structures with periodic or quasi periodic potential variation, e.g. multiple quantum wells, superlattices
- H01L29/151—Compositional structures
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- H01L33/26—Materials of the light emitting region
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
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Abstract
【解決手段】 n型不純物原子高濃度層およびn型不純物原子低濃度層からなる第1n型層とn型不純物原子の平均濃度が該第1n型層よりも小さい第2n型層とからなり、第2n型層が第1n型層のn型不純物原子低濃度層に隣接していることを特徴とするn型III族窒化物半導体積層構造体、および基板とIII族窒化物半導体からなる発光層との間に前記n型III族窒化物半導体積層構造体を有することを特徴とするIII族窒化物半導体発光素子。
【選択図】 なし
Description
(1)n型不純物原子高濃度層およびn型不純物原子低濃度層からなる第1n型層とn型不純物原子の平均濃度が該第1n型層よりも小さい第2n型層とからなり、第2n型層が第1n型層のn型不純物原子低濃度層に隣接していることを特徴とするn型III族窒化物半導体積層構造体。
(22)上記20項に記載のIII族窒化物半導体発光素子および蛍光体を用いてなるランプ。
(24)上記23項に記載の電子機器が組み込まれている機械装置。
(25)上記23項に記載の電子機器が組み込まれている玩具。
本発明のn型III族窒化物半導体積層構造体を用いて発光素子を作製した。図1は、本実施例で作製した発光素子の半導体積層構造を模式的に示した図である。101はサファイアからなる基板、102はAlNからなる高温緩衝層、103はアンドープGaNからなる下地層である。104はGeドープGaNからなる第1n型層であり、発光素子においてnコンタクト層として機能する。105はGeドープGaNからなる第2n型層であり、104および105が本発明のn型III族窒化物半導体積層構造体を構成している。106はSiドープInGaNからなるnクラッド層、107は多重量子井戸構造の発光層、108はMgドープAlGaNからなるpクラッド層、109はMgドープAlGaNからなるpコンタクト層である。
また、第2n型層105の表面は、ピット密度が20個/cm2以下の非常に平坦な面であった。
第1n型層104の形成を常にテトラメチルゲルマニウムを流通させて行ない、Geを均一にドープした層としたこと、および第2n型層105を形成しなかったこと以外は、実施例1と同様にしてIII族窒化物半導体発光素子を作製した。
本実施例では、第2n型層105において、高濃度層および低濃度層の不純物原子濃度を第1n型層104の不純物原子濃度と同一にして、高濃度層の膜厚を3nmと薄くし、低濃度層の膜厚を30nmと厚くしたこと、および高濃度層と低濃度層の繰り返し周期数を5回としたこと以外は実施例1と同様にしてIII族窒化物半導体発光素子を作製した。従って、第1n型層104のGe原子の平均濃度は実施例1と同様6.5×1018cm-3であり、第2n型層105のGe原子の平均濃度は2×1018cm-3であった。
本実施例では、Geを低濃度で均一にドープした層によって第2n型層105を形成すること以外は、実施例1と同様にしてIII族窒化物半導体発光素子を作製した。第2n型層105では、Geのドープ量を第1n型層104の高濃度層の1/25とし、膜厚を0.04μmとした。即ち、第2n型層105のGe原子の濃度は4.8×1017cm-3である。
本実施例では、第1および第2n型層104および105の形成を、テトラメチルゲルマニウム((CH3)4Ge)の代わりにジエチルサルファイド((C2H5)2S)を用いて行なったこと以外は、実施例1と同様にしてIII族窒化物半導体発光素子を作製した。
本実施例では、第1および第2n型層104および105の形成を、テトラメチルゲルマニウム((CH3)4Ge)の代わりにテトラメチルティン((CH3)4Sn)を用いて行なったこと以外は、実施例1と同様にしてIII族窒化物半導体発光素子を作製した。
本実施例では、第1および第2n型層104および105の形成を、テトラメチルゲルマニウム((CH3)4Ge)の代わりにモノシラン(SiH4)を用いて行なったこと以外は、実施例1と同様にしてIII族窒化物半導体発光素子を作製した。
本実施例では、実施例1で作製したIII族窒化物半導体発光素子(LEDチップ)を用いて、以下の手順で、図3に示すようなLEDランプを作製した。
101 基板
102 高温緩衝層
103 下地層
104 第1n型層
105 第2n型層
106 nクラッド層
107 発光層
108 pクラッド層
109 pコンタクト層
20 LEDチップ
201 n型オーミック電極
202 p型オーミック電極
203 p型ボンディングパッド
33 第1のリードフレーム
34 第2のリードフレーム
35 Auワイヤー
36 LEDチップ
37 エポキシ樹脂
Claims (25)
- n型不純物原子高濃度層およびn型不純物原子低濃度層からなる第1n型層とn型不純物原子の平均濃度が該第1n型層よりも小さい第2n型層とからなり、第2n型層が第1n型層のn型不純物原子低濃度層に隣接していることを特徴とするn型III族窒化物半導体積層構造体。
- 第1n型層においてn型不純物原子高濃度層およびn型不純物原子低濃度層が交互に周期的に存在する請求項1に記載のn型III族窒化物半導体積層構造体。
- 第2n型層がアンドープである請求項1または2に記載のn型III族窒化物半導体積層構造体。
- 第2n型層が、n型不純物原子を均一にドープした層をなしている請求項1または2に記載のn型III族窒化物半導体積層構造体。
- 第2n型層がn型不純物原子高濃度層およびn型不純物原子低濃度層からなる請求項1または2に記載のn型III族窒化物半導体積層構造体。
- 第2n型層においてn型不純物原子高濃度層およびn型不純物原子低濃度層が交互に周期的に存在する請求項5に記載のn型III族窒化物半導体積層構造体。
- 第2n型層のn型不純物原子高濃度層が第1n型層のそれよりも低濃度である請求項5または6に記載のn型III族窒化物半導体積層構造体。
- 第2n型層のn型不純物原子低濃度層が第1n型層のそれよりも低濃度である請求項5〜7のいずれか一項に記載のn型III族窒化物半導体積層構造体。
- 第2n型層におけるn型不純物原子高濃度層の膜厚(thd)とn型不純物原子低濃度層の膜厚(tld)の比率(thd/tld)が、第1n型層におけるそれよりも小さい請求項5〜8のいずれか一項に記載のn型III族窒化物半導体積層構造体。
- 第2n型層におけるn型不純物原子高濃度層の膜厚が、第1n型層におけるそれよりも小さい請求項5〜9のいずれか一項に記載のn型III族窒化物半導体積層構造体。
- 第2n型層におけるn型不純物原子低濃度層の膜厚が、第1n型層におけるそれよりも大きい請求項5〜10のいずれか一項に記載のn型III族窒化物半導体積層構造体。
- 第2n型層において、n型不純物原子高濃度層およびn型不純物原子低濃度層の厚さがそれぞれ0.5〜500nmである請求項5〜11のいずれか一項に記載のn型III族窒化物半導体積層構造体。
- 第2n型層において、n型不純物原子低濃度層の厚さがn型不純物原子高濃度層の厚さと等しいか、またはn型不純物原子高濃度層の厚さよりも厚い請求項5〜12のいずれか一項に記載のn型III族窒化物半導体積層構造体。
- 第2n型層において、n型不純物原子高濃度層およびn型不純物原子低濃度層の繰り返し周期数が2〜20である請求項6〜13のいずれか一項に記載のn型III族窒化物半導体積層構造体。
- 第2n型層において、n型不純物原子低濃度層がn型不純物原子を故意にドーピングされていない請求項5〜14のいずれか一項に記載のn型III族窒化物半導体積層構造体。
- 第2n型層の厚さが0.01〜0.5μmである請求項1〜15のいずれか一項に記載のn型III族窒化物半導体積層構造体。
- 第2n型層の平均n型不純物原子濃度が、第1n型層の平均n型不純物原子濃度の1/2以下である請求項1〜16のいずれか一項に記載のn型III族窒化物半導体積層構造体。
- 第1n型層および/または第2n型層に含有される不純物原子が、シリコン(Si)、ゲルマニウム(Ge)、硫黄(S)、セレン(Se)、錫(Sn)およびテルル(Te)からなる群から選ばれた1種または2種以上の組み合わせである請求項1〜17のいずれか一項に記載のn型III族窒化物半導体積層構造体。
- 不純物原子が、シリコン(Si)、ゲルマニウム(Ge)および錫(Sn)からなる群から選ばれた1種または2種以上の組み合わせである請求項18に記載のn型III族窒化物半導体積層構造体。
- 基板上にIII族窒化物半導体からなる発光層を有するIII族窒化物半導体発光素子において、基板と発光層との間に、請求項1〜19のいずれか一項に記載のn型III族窒化物半導体積層構造体を有するIII族窒化物半導体発光素子。
- 請求項20に記載のIII族窒化物半導体発光素子を用いてなるランプ。
- 請求項20に記載のIII族窒化物半導体発光素子および蛍光体を用いてなるランプ。
- 請求項21または22に記載のランプが組み込まれている電子機器。
- 請求項23に記載の電子機器が組み込まれている機械装置。
- 請求項23に記載の電子機器が組み込まれている玩具。
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Also Published As
Publication number | Publication date |
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TWI285444B (en) | 2007-08-11 |
TW200618353A (en) | 2006-06-01 |
US20080093621A1 (en) | 2008-04-24 |
CN101019243A (zh) | 2007-08-15 |
WO2006030950A1 (en) | 2006-03-23 |
CN100547814C (zh) | 2009-10-07 |
KR100902576B1 (ko) | 2009-06-11 |
KR20070043035A (ko) | 2007-04-24 |
DE112005002133T5 (de) | 2007-08-02 |
US7612363B2 (en) | 2009-11-03 |
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