JP2006071357A - Manufacturing method of probe needle and probe card - Google Patents

Manufacturing method of probe needle and probe card Download PDF

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JP2006071357A
JP2006071357A JP2004252732A JP2004252732A JP2006071357A JP 2006071357 A JP2006071357 A JP 2006071357A JP 2004252732 A JP2004252732 A JP 2004252732A JP 2004252732 A JP2004252732 A JP 2004252732A JP 2006071357 A JP2006071357 A JP 2006071357A
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probe
probe needle
insulating tube
manufacturing
needle
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JP4563751B2 (en
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Taiichi Ono
泰一 大野
Motoharu Yakura
基晴 矢倉
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Fujitsu Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a probe needle wherein a probe card is easily assembled while a coaxial constitution reducing the affection of noise is employed. <P>SOLUTION: The method of manufacturing the probe needle is that the central conductor 5 is coated with the insulation tube 6, and the conductive layer 7 is formed around the insulation tube 6. The conductor layer 7 is formed by laminating the particulate of conductive matter around the insulation tube 6 in a film. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

この発明は、半導体装置の製造工程における検査工程で主に使用するプローブカードに関するものであり、特にそのプローブカードに使用されるプローブ針に関するものである。   The present invention relates to a probe card mainly used in an inspection process in a manufacturing process of a semiconductor device, and more particularly to a probe needle used in the probe card.

近年、半導体デバイスの高集積化、微細化にともない、ボンディングパッドあるいは検査用パッドの間隔が狭くなり、かつパッド数も増加している。この結果、プローブカードに搭載されるプローブ針も密集することとなる。また、検査コストを低減するために複数の半導体デバイスを同時に検査することも行われるため、1つのプローブカードに搭載されるプローブ針の本数がさらに増大し、かつ密集度も上がっている。このような状況では、検査時に近接するプローブ針が互いに影響しあい、クロストーク等のノイズが発生する。そこで、密集度を低下させることなく、ノイズの影響を抑制し得るプローブ針が必要となっている。   In recent years, with the high integration and miniaturization of semiconductor devices, the distance between bonding pads or inspection pads has become narrower and the number of pads has increased. As a result, the probe needles mounted on the probe card are also densely packed. In addition, since a plurality of semiconductor devices are inspected at the same time in order to reduce the inspection cost, the number of probe needles mounted on one probe card is further increased and the density is increased. In such a situation, adjacent probe needles influence each other during inspection, and noise such as crosstalk is generated. Therefore, there is a need for a probe needle that can suppress the influence of noise without reducing the density.

カンチレバー方式のプローブ針を備えたプローブカードは、基板上に多数本のプローブ針が放射状に配置される。各プローブ針の基端は、基板上に半田付けされ、先端部は先端位置固定部材により基板から持ち上げた状態で保持される。そして、各プローブ針の先端部が、放射状に位置するプローブ針群の中心部で、半導体デバイスのパッドに押し当てられて、当該デバイスの検査が行われる。   A probe card having cantilever type probe needles has a large number of probe needles arranged radially on a substrate. The proximal end of each probe needle is soldered onto the substrate, and the distal end is held in a state where it is lifted from the substrate by the distal position fixing member. Then, the tip of each probe needle is pressed against the pad of the semiconductor device at the center of the probe needle group located radially, and the device is inspected.

このようなプローブカードでは、プローブ針の本数が増大すると、近接するプローブ針が互いに影響しあって、クロストーク等のノイズを拾いやすくなる。また、複数の半導体デバイスを同時に検査するようなプローブカードでは、プローブ針が上下方向に近接して配置される場合もあり、さらにノイズを拾いやすくなっている。   In such a probe card, when the number of probe needles increases, adjacent probe needles influence each other, and it becomes easy to pick up noise such as crosstalk. Further, in a probe card that simultaneously inspects a plurality of semiconductor devices, probe needles may be arranged close to each other in the vertical direction, and noise is easily picked up.

従って、このようなノイズにより、検査精度の低下を来たしたり、あるいは再検査が必要となって検査時間の増大を招いている。
このようなプローブ針によるノイズの影響を低減するために、同軸構造のプローブ針を使用したプローブカードが提案されている。この同軸構造のプローブ針は、中心導体の中間部を絶縁チューブで被覆し、さらにその周囲を導電性の金属チューブにてなる外部導体で被覆したものである。
Therefore, due to such noise, the inspection accuracy is lowered, or a re-inspection is required, resulting in an increase in inspection time.
In order to reduce the influence of noise caused by such probe needles, a probe card using a coaxial probe needle has been proposed. In this probe needle having a coaxial structure, an intermediate portion of a central conductor is covered with an insulating tube, and the periphery thereof is covered with an outer conductor made of a conductive metal tube.

そして、外部導体の両端部を基板上の接地配線に接続することにより、外部導体がシールド層として作用するため、ノイズの影響を低減することが可能となる。
特許文献1,2には、同軸構造のプローブ針を使用したプローブカードが開示されている。
特開平8−22463号公報 特開平2−50452号公報
By connecting both end portions of the outer conductor to the ground wiring on the substrate, the outer conductor acts as a shield layer, so that the influence of noise can be reduced.
Patent Documents 1 and 2 disclose a probe card using a coaxial probe needle.
JP-A-8-22463 Japanese Patent Laid-Open No. 2-50452

上記のような従来の同軸構造のプローブ針は、中心導体の直径が130μm以上であり、通常は150μmである。そして、絶縁チューブで被覆すると直径が170μmとなり、さらに外部導体で被覆すると、直径が200μm程度増大する。従って、絶縁チューブで被覆した通常のプローブ針に対し、同軸針は2倍若しくはそれ以上の直径となる。   In the conventional probe needle having the coaxial structure as described above, the diameter of the central conductor is 130 μm or more, and usually 150 μm. When covered with an insulating tube, the diameter becomes 170 μm, and when covered with an external conductor, the diameter increases by about 200 μm. Therefore, the diameter of the coaxial needle is twice or more than that of a normal probe needle covered with an insulating tube.

従って、すべてのプローブ針を同軸構造とすることはできず、特にノイズ対策を必要とする一部についてのみ、同軸構造のプローブ針を使用していた。
ところが、このような同軸針は径が大きくなるため、通常の針間隔より大きな間隔を確保する必要があるとともに、径の相違によりパッドを押圧する力が通常のプローブ針と異なるため、その針跡管理が煩雑となる。
Therefore, not all probe needles can have a coaxial structure, and the probe needles having a coaxial structure have been used only for a part requiring noise countermeasures.
However, since the diameter of such a coaxial needle is large, it is necessary to secure a larger interval than the normal needle interval, and the force for pressing the pad is different from the normal probe needle due to the difference in the diameter, so the needle trace is Management becomes complicated.

また、同軸構造のプローブ針は、通常のプローブ針と直径が大きく異なるため、通常のプローブ針と同一の針立てルールでプローブカードに取着することはできず、別のルールで行う必要がある。従って、プローブカードの組み立て作業が煩雑となるという問題点がある。   In addition, since the probe needle of the coaxial structure is greatly different from the diameter of the normal probe needle, it cannot be attached to the probe card with the same needle standing rule as the normal probe needle, and it is necessary to use a different rule. . Therefore, there is a problem that the assembly work of the probe card becomes complicated.

この発明の目的は、ノイズの影響を低減し得る同軸構成でありながら、プローブカードの組み立てを容易に行い得るプローブ針を提供することにある。   An object of the present invention is to provide a probe needle capable of easily assembling a probe card while having a coaxial configuration capable of reducing the influence of noise.

上記目的は、中心導体を絶縁チューブで被覆し、該絶縁チューブの周囲に導電層を形成して同軸構造とするプローブ針の製造方法であって、前記導電層は、導電物質の微粒子を前記絶縁チューブの周囲に被膜状に積層させて形成するプローブ針の製造方法により達成される。   The above object is a method of manufacturing a probe needle in which a central conductor is covered with an insulating tube, and a conductive layer is formed around the insulating tube to form a coaxial structure. This is achieved by a method of manufacturing a probe needle formed by laminating a film around the tube.

本発明によれば、ノイズの影響を低減し得る同軸構成でありながら、プローブカードの組み立てを容易に行い得るプローブ針を提供することができる。   ADVANTAGE OF THE INVENTION According to this invention, the probe needle which can assemble a probe card easily can be provided, although it is the coaxial structure which can reduce the influence of noise.

(第一の実施の形態)
以下、この発明を具体化した一実施の形態を図面に従って説明する。図1及び図2に示すプローブカードは、円板状の基板1上に多数本のプローブ針2が基板1の中心部から外周に向かって放射状に配置される。
(First embodiment)
Hereinafter, an embodiment of the present invention will be described with reference to the drawings. In the probe card shown in FIGS. 1 and 2, a large number of probe needles 2 are radially arranged on a disc-shaped substrate 1 from the center of the substrate 1 toward the outer periphery.

各プローブ針2の基端部は、基板1の針立て部3に半田付けされ、先端部は基板1の中心部で合成樹脂にてなる固定部材4に保持されている。従って、各プローブ針2は先端部が基板1の中央部に密集し、基端から先端に向かって基板から立ち上がるカンチレバー構造となっている。   The proximal end portion of each probe needle 2 is soldered to the needle stand portion 3 of the substrate 1, and the distal end portion is held by a fixing member 4 made of synthetic resin at the center portion of the substrate 1. Accordingly, each probe needle 2 has a cantilever structure in which the distal end portion is closely packed in the central portion of the substrate 1 and rises from the substrate toward the distal end from the proximal end.

前記プローブ針2の具体的構成及びその製造方法を図3に従って説明する。図3(a)に示すプローブ針2の中心導体5は、タングステンで形成され、その直径は130μmである。また、先端部は先端に向かって先細となるように成形される。   A specific configuration of the probe needle 2 and a manufacturing method thereof will be described with reference to FIG. The center conductor 5 of the probe needle 2 shown in FIG. 3A is made of tungsten and has a diameter of 130 μm. Further, the tip is shaped so as to taper toward the tip.

次いで、同図(b)に示すように、前記中心導体5の中間部が絶縁チューブ6で被覆される。絶縁チューブ6で被覆することにより、直径は150μmとなる。
次いで、同図(c)に示すように、先端部側の絶縁チューブ6をわずかに残して、中心導体5を溶剤Lに浸す。この溶剤Lは、導電物質である微細なフレーク状の銀粉末を、ハイポリマーアクリル樹脂をバインダーにして、酢酸エチルあるいは酢酸ブチル等の溶剤とともに練り分散を行った一液性常温硬化型の銀系導電接着剤である。
Next, as shown in FIG. 2B, the intermediate portion of the center conductor 5 is covered with an insulating tube 6. By covering with the insulating tube 6, the diameter becomes 150 μm.
Next, as shown in FIG. 2C, the central conductor 5 is immersed in the solvent L, leaving the insulating tube 6 on the tip side slightly. This solvent L is a one-part room-temperature-curing silver-based material obtained by kneading and dispersing fine flaky silver powder, which is a conductive material, with a high polymer acrylic resin as a binder together with a solvent such as ethyl acetate or butyl acetate. It is a conductive adhesive.

この後、同図(d)に示すように、中心導体5を溶剤から取り出して乾燥させることにより、絶縁チューブ6を覆うように10μmの膜圧の導電層7が形成される。この膜圧は、溶剤の温度、導電物質と溶剤との組成(割合)に基づく溶剤の粘性、溶剤からの引き上げ速度及び乾燥工程での温度、湿度により調整可能である。   Thereafter, as shown in FIG. 4D, the central conductor 5 is taken out of the solvent and dried to form a conductive layer 7 having a film pressure of 10 μm so as to cover the insulating tube 6. This film pressure can be adjusted by the temperature of the solvent, the viscosity of the solvent based on the composition (ratio) of the conductive material and the solvent, the pulling speed from the solvent, and the temperature and humidity in the drying process.

次いで、同図(e)に示すように、中心導体5の基端部を前記導電物質を混ぜていない溶剤Mに浸して、導電層7を除去し、同図(f)に示すように、基端側の絶縁チューブ6を露出させる。このような工程により、同軸構成のプローブ針2が形成され、その直径は170μmとなる。   Next, as shown in FIG. 5E, the base end portion of the central conductor 5 is immersed in the solvent M not mixed with the conductive material to remove the conductive layer 7, and as shown in FIG. The proximal insulating tube 6 is exposed. By such a process, the probe needle 2 having a coaxial configuration is formed, and the diameter thereof is 170 μm.

このように構成されたプローブ針2を基板1に搭載するには、図4に示すように、プローブ針2の先端部を固定部材4に取着し、その固定部材4を基板1に取着する。そして、プローブ針2の基端を基板1に半田付けし、導電層7の両端部を基板1上の接地配線8に半田付けあるいは導電性接着剤により接続する。   In order to mount the probe needle 2 thus configured on the substrate 1, as shown in FIG. 4, the tip of the probe needle 2 is attached to the fixing member 4, and the fixing member 4 is attached to the substrate 1. To do. Then, the proximal end of the probe needle 2 is soldered to the substrate 1 and both ends of the conductive layer 7 are connected to the ground wiring 8 on the substrate 1 by soldering or a conductive adhesive.

なお、接地配線8は基板1中心部の透孔9から前記固定部材4の側面にかけて銅箔を貼ることにより、導電層7の先端側近傍まで延設され、その接地配線8と導電層7の先端部とが接続される。   The ground wiring 8 is extended to the vicinity of the front end side of the conductive layer 7 by sticking a copper foil from the through hole 9 in the center of the substrate 1 to the side surface of the fixing member 4. The tip is connected.

上記のようなプローブ針の製造方法により、次に示す作用効果を得ることができる。
(1)同軸構造のプローブ針2を、絶縁チューブ6で被覆した通常のプローブ針とほぼ同等の径で形成することができる。
(2)同軸構造のプローブ針2を通常のプローブ針とほぼ等しい径で形成することができるので、すべてのプローブ針を同軸針とすることができる。
(3)基板に搭載するプローブ針をすべて同軸針とすることができるので、ノイズの影響を受けにくいプローブカードを形成することができる。
(4)同軸構造のプローブ針2を通常のプローブ針とほぼ等しい径で形成することができるので、通常の針立てルールと同様なルールで、同軸針を基板上に搭載することができる。従って、プローブカードの組み立てを容易に行うことができる。
(第二の実施の形態)
図5は、第二の実施の形態を示す。この実施の形態は、絶縁チューブ6で被覆する部分の中心導体5の直径を小さくすることにより、プローブ針2の直径を小さくしようとするものである。
The following effects can be obtained by the probe needle manufacturing method as described above.
(1) The probe needle 2 having a coaxial structure can be formed with a diameter substantially equal to that of a normal probe needle covered with an insulating tube 6.
(2) Since the probe needle 2 having a coaxial structure can be formed with a diameter almost equal to that of a normal probe needle, all the probe needles can be coaxial needles.
(3) Since all the probe needles mounted on the substrate can be coaxial needles, a probe card that is less susceptible to noise can be formed.
(4) Since the probe needle 2 having the coaxial structure can be formed with a diameter substantially equal to that of the normal probe needle, the coaxial needle can be mounted on the substrate according to the same rule as the normal needle stand rule. Accordingly, the probe card can be easily assembled.
(Second embodiment)
FIG. 5 shows a second embodiment. In this embodiment, the diameter of the probe needle 2 is reduced by reducing the diameter of the central conductor 5 at the portion covered with the insulating tube 6.

すなわち、絶縁チューブ6で被覆する部分を縮径部10とする。この縮径部10は、導電層7の厚さを前記第一の実施の形態と同様に10μmとすれば、中心導体5の他の部分より20μ小さい直径で形成する。   That is, the portion covered with the insulating tube 6 is the reduced diameter portion 10. The reduced diameter portion 10 is formed with a diameter 20 μm smaller than other portions of the central conductor 5 if the thickness of the conductive layer 7 is 10 μm as in the first embodiment.

このような構成とすることにより、絶縁チューブ6及び導電層7で被覆した後の直径は、絶縁チューブ6のみで被覆した従来のプローブ針と同等となる。従って、従来のプローブ針と同様な針立てルールでプローブカードを組み立てることができる。   By adopting such a configuration, the diameter after being covered with the insulating tube 6 and the conductive layer 7 becomes equivalent to that of a conventional probe needle covered only with the insulating tube 6. Therefore, the probe card can be assembled with the same needle stand rule as that of the conventional probe needle.

また、固定部材4で固定する部分及び先端部の径を変更しないので、従来のプローブ針と同等の耐久性、針圧、接触性等を得ることができる。
上記実施の形態は、次に示すように変更してもよい。
・前記導電物質は、銅、銅合金、銀、ニッケル、半田等の低融点合金の微粒子、酸化亜鉛、酸化インビジウム等の金属酸化物微粒子、各種カーボンブラック、ポリピロールやポリアニリン等の導電性ポリマー粒子、金属で被覆したポリマー微粒子、貴金属で被覆した銅や銀の微粒子、金属繊維、炭素繊維等を使用してもよい。その他、すず、鉛、亜鉛、鉄、りん、珪素、クロム、ビスマス、カドミウム、チタン、マグネシウム、アルミニウム、ひ素、アンチモン、モリブデン、コバルト等でもよい。
・前記導電層7は、導電物質を混ぜた溶剤を絶縁チューブ6の周囲に塗布し、次いで乾燥させることにより形成してもよい。
・前記導電層7は、気相蒸着法により導電物質を絶縁チューブ6の周囲に積層させるようにしてもよい。
Further, since the diameter of the portion fixed by the fixing member 4 and the diameter of the tip portion are not changed, durability, needle pressure, contactability, etc. equivalent to those of the conventional probe needle can be obtained.
The above embodiment may be modified as follows.
-The conductive material is fine particles of low melting point alloy such as copper, copper alloy, silver, nickel, solder, metal oxide fine particles such as zinc oxide and inbidium oxide, various carbon black, conductive polymer particles such as polypyrrole and polyaniline, Polymer fine particles coated with metal, copper or silver fine particles coated with noble metal, metal fibers, carbon fibers, and the like may be used. In addition, tin, lead, zinc, iron, phosphorus, silicon, chromium, bismuth, cadmium, titanium, magnesium, aluminum, arsenic, antimony, molybdenum, cobalt, and the like may be used.
The conductive layer 7 may be formed by applying a solvent mixed with a conductive material around the insulating tube 6 and then drying it.
The conductive layer 7 may be formed by laminating a conductive material around the insulating tube 6 by vapor deposition.

第一の実施の形態のプローブカードを示す断面図である。It is sectional drawing which shows the probe card of 1st embodiment. プローブカードを示す平面図である。It is a top view which shows a probe card. (a)〜(f)はプローブ針の製造工程を示す説明図である。(A)-(f) is explanatory drawing which shows the manufacturing process of a probe needle. プローブカードを示す断面図である。It is sectional drawing which shows a probe card. 第二の実施の形態のプローブ針を示す断面図である。It is sectional drawing which shows the probe needle of 2nd embodiment.

符号の説明Explanation of symbols

1 基板
2 プローブ針
5 中心導体
6 絶縁チューブ
7 導電層
DESCRIPTION OF SYMBOLS 1 Board | substrate 2 Probe needle 5 Center conductor 6 Insulation tube 7 Conductive layer

Claims (6)

中心導体を絶縁チューブで被覆し、該絶縁チューブの周囲に導電層を形成して同軸構造とするプローブ針の製造方法であって、
前記導電層は、導電物質の微粒子を前記絶縁チューブの周囲に被膜状に積層させて形成することを特徴とするプローブ針の製造方法。
A method of manufacturing a probe needle in which a central conductor is covered with an insulating tube and a conductive layer is formed around the insulating tube to form a coaxial structure.
The method of manufacturing a probe needle, wherein the conductive layer is formed by laminating fine particles of a conductive material in a film shape around the insulating tube.
中心導体を絶縁チューブで被覆し、該絶縁チューブの周囲に導電層を形成して同軸構造とするプローブ針の製造方法であって、
前記導電層は、導電物質を混ぜた第一の溶剤に前記中心導体を浸し、次いで該溶剤から引き出して乾燥させて形成することを特徴とするプローブ針の製造方法。
A method of manufacturing a probe needle in which a central conductor is covered with an insulating tube and a conductive layer is formed around the insulating tube to form a coaxial structure.
The method for manufacturing a probe needle is characterized in that the conductive layer is formed by immersing the central conductor in a first solvent mixed with a conductive material, and then pulling it out from the solvent and drying it.
前記中心導体を前記絶縁チューブの一端部を残して前記第一の溶剤に浸し、乾燥後に前記中心導体の他端部の導電層を第二の溶剤で除去して、前記絶縁チューブの他端部を露出させたことを特徴とする請求項2記載のプローブ針の製造方法。   The central conductor is immersed in the first solvent leaving one end of the insulating tube, and after drying, the conductive layer at the other end of the central conductor is removed with a second solvent, and the other end of the insulating tube 3. The method of manufacturing a probe needle according to claim 2, wherein the probe needle is exposed. 中心導体を絶縁チューブで被覆し、該絶縁チューブの周囲に導電層を形成して同軸構造とするプローブ針の製造方法であって、
前記導電層は、導電物質を前記絶縁チューブの周囲に塗布して形成することを特徴とするプローブ針の製造方法。
A method of manufacturing a probe needle in which a central conductor is covered with an insulating tube and a conductive layer is formed around the insulating tube to form a coaxial structure.
The method of manufacturing a probe needle, wherein the conductive layer is formed by applying a conductive material around the insulating tube.
中心導体を絶縁チューブで被覆し、該絶縁チューブの周囲に導電層を形成して同軸構造とするプローブ針の製造方法であって、
前記導電層は、導電物質を前記絶縁チューブの周囲に気相蒸着法により積層させることを特徴とするプローブ針の製造方法。
A method of manufacturing a probe needle in which a central conductor is covered with an insulating tube and a conductive layer is formed around the insulating tube to form a coaxial structure.
The method of manufacturing a probe needle, wherein the conductive layer is formed by laminating a conductive material around the insulating tube by vapor deposition.
基板上に搭載されるプローブ針を、すべて同軸構造としたことを特徴とするプローブカード。   A probe card characterized in that all probe needles mounted on a substrate have a coaxial structure.
JP2004252732A 2004-08-31 2004-08-31 Manufacturing method of probe needle Expired - Fee Related JP4563751B2 (en)

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US11/006,762 US7150095B2 (en) 2004-08-31 2004-12-08 Method for manufacturing probe needle, method for manufacturing probe card, and probe card
KR1020050022742A KR100677686B1 (en) 2004-08-31 2005-03-18 Method for manufacturing probe needle, method for manufacturing probe card, and probe card

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007256078A (en) * 2006-03-23 2007-10-04 Toshiba Corp Mutilayer-type probe pin and probe card
JP2010117209A (en) * 2008-11-12 2010-05-27 Mitsubishi Cable Ind Ltd Probe pin
JP2010127879A (en) * 2008-12-01 2010-06-10 Mitsubishi Cable Ind Ltd Probe pin and its support structure

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5887343U (en) * 1981-12-08 1983-06-14 富士通株式会社 IC tester test prober structure
JPS60223138A (en) * 1984-04-20 1985-11-07 Hitachi Ltd Prober
JPS63253260A (en) * 1987-04-10 1988-10-20 Mitsubishi Steel Mfg Co Ltd Manufacture of coaxial needle for probe
JPH03195974A (en) * 1989-12-25 1991-08-27 Nec Corp Probe card
JPH07235571A (en) * 1994-02-22 1995-09-05 Hitachi Ltd Probe pin with sensor
JPH1010154A (en) * 1996-06-20 1998-01-16 Fujitsu Ltd Manufacture for probe unit
JP2001506752A (en) * 1996-12-12 2001-05-22 ジージービー インダストリーズ,インコーポレーテッド Probe card for high-speed test

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5887343U (en) * 1981-12-08 1983-06-14 富士通株式会社 IC tester test prober structure
JPS60223138A (en) * 1984-04-20 1985-11-07 Hitachi Ltd Prober
JPS63253260A (en) * 1987-04-10 1988-10-20 Mitsubishi Steel Mfg Co Ltd Manufacture of coaxial needle for probe
JPH03195974A (en) * 1989-12-25 1991-08-27 Nec Corp Probe card
JPH07235571A (en) * 1994-02-22 1995-09-05 Hitachi Ltd Probe pin with sensor
JPH1010154A (en) * 1996-06-20 1998-01-16 Fujitsu Ltd Manufacture for probe unit
JP2001506752A (en) * 1996-12-12 2001-05-22 ジージービー インダストリーズ,インコーポレーテッド Probe card for high-speed test

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007256078A (en) * 2006-03-23 2007-10-04 Toshiba Corp Mutilayer-type probe pin and probe card
JP2010117209A (en) * 2008-11-12 2010-05-27 Mitsubishi Cable Ind Ltd Probe pin
JP2010127879A (en) * 2008-12-01 2010-06-10 Mitsubishi Cable Ind Ltd Probe pin and its support structure

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