JP2005259707A5 - - Google Patents

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Publication number
JP2005259707A5
JP2005259707A5 JP2005107008A JP2005107008A JP2005259707A5 JP 2005259707 A5 JP2005259707 A5 JP 2005259707A5 JP 2005107008 A JP2005107008 A JP 2005107008A JP 2005107008 A JP2005107008 A JP 2005107008A JP 2005259707 A5 JP2005259707 A5 JP 2005259707A5
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JP
Japan
Prior art keywords
sample
irradiation angle
changing means
electron beam
angle changing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005107008A
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Japanese (ja)
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JP2005259707A (en
JP3874011B2 (en
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Publication date
Application filed filed Critical
Priority to JP2005107008A priority Critical patent/JP3874011B2/en
Priority claimed from JP2005107008A external-priority patent/JP3874011B2/en
Publication of JP2005259707A publication Critical patent/JP2005259707A/en
Publication of JP2005259707A5 publication Critical patent/JP2005259707A5/ja
Application granted granted Critical
Publication of JP3874011B2 publication Critical patent/JP3874011B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Claims (1)

試料を載置する試料台と;
微小試料を固定し、イオンビーム及び電子ビームの微小試料への照射角度を変更する照射角度変更手段と;
試料台、及び照射角度変更手段が配置された試料室と;
試料台に載置された試料、及び照射角度変更手段に固定された微小試料にイオンビームを照射できる集束イオンビーム光学系と;
照射角度変更手段に固定された微小試料に電子ビームを照射できる電子ビーム光学系と;
を備え、
照射角度変更手段に固定された微小試料にイオンビームを照射し、観察断面を形成し、
電子ビームに対して観察断面が略垂直の角度となるよう、照射角度変更手段により電子ビームの微小試料への照射角度を変更し、
照射角度変更手段に固定された微小試料に電子ビームを照射し、観察断面を測定するように構成された微小試料加工観察装置。
A sample stage on which the sample is placed;
Irradiation angle changing means for fixing the minute sample and changing the irradiation angle of the ion beam and electron beam to the minute sample;
A sample stage and a sample chamber in which an irradiation angle changing means is arranged;
A focused ion beam optical system capable of irradiating a sample placed on a sample stage and a micro sample fixed to the irradiation angle changing means;
An electron beam optical system capable of irradiating a minute sample fixed to the irradiation angle changing means with an electron beam;
With
Irradiate an ion beam to a micro sample fixed to the irradiation angle changing means to form an observation cross section,
Change the irradiation angle of the electron beam to the minute sample by the irradiation angle changing means so that the observation cross section becomes an angle substantially perpendicular to the electron beam,
A micro sample processing and observation apparatus configured to irradiate a micro sample fixed to the irradiation angle changing means with an electron beam and measure an observation cross section.
JP2005107008A 2005-04-04 2005-04-04 Microsample processing observation method and apparatus Expired - Lifetime JP3874011B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005107008A JP3874011B2 (en) 2005-04-04 2005-04-04 Microsample processing observation method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005107008A JP3874011B2 (en) 2005-04-04 2005-04-04 Microsample processing observation method and apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2004317452A Division JP4259454B2 (en) 2004-11-01 2004-11-01 Micro-sample processing observation equipment

Publications (3)

Publication Number Publication Date
JP2005259707A JP2005259707A (en) 2005-09-22
JP2005259707A5 true JP2005259707A5 (en) 2006-03-09
JP3874011B2 JP3874011B2 (en) 2007-01-31

Family

ID=35085184

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005107008A Expired - Lifetime JP3874011B2 (en) 2005-04-04 2005-04-04 Microsample processing observation method and apparatus

Country Status (1)

Country Link
JP (1) JP3874011B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006194907A (en) * 2006-03-31 2006-07-27 Hitachi Ltd Sample observation device and method using electron beam
JP5125123B2 (en) * 2007-01-31 2013-01-23 株式会社日立製作所 Microsample processing observation method and apparatus
JP5825797B2 (en) * 2011-02-08 2015-12-02 株式会社ブリヂストン Evaluation method for polymer materials
DE102020203580B4 (en) 2020-03-20 2021-10-07 Carl Zeiss Microscopy Gmbh Method for changing the spatial orientation of a microsample in a microscope system, as well as computer program product

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2811073B2 (en) * 1988-11-01 1998-10-15 セイコーインスツルメンツ株式会社 Cross section processing observation device
JP3216881B2 (en) * 1990-09-07 2001-10-09 株式会社日立製作所 Sample cross section observation method
JP3119959B2 (en) * 1993-02-05 2000-12-25 セイコーインスツルメンツ株式会社 Focused ion beam device and processing observation device
JP2972535B2 (en) * 1993-12-08 1999-11-08 株式会社東芝 Substrate cross-section observation device
JP3805547B2 (en) * 1999-01-21 2006-08-02 株式会社日立製作所 Sample preparation equipment
JP4534273B2 (en) * 1999-08-31 2010-09-01 株式会社日立製作所 Sample preparation device
JP2004343131A (en) * 2004-06-07 2004-12-02 Hitachi Ltd Method and device for analyzing sample

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