JP2005148637A - Display device manufacturing method, image pickup device manufacturing method and inspection device for color filter substrate used for these - Google Patents

Display device manufacturing method, image pickup device manufacturing method and inspection device for color filter substrate used for these Download PDF

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JP2005148637A
JP2005148637A JP2003389577A JP2003389577A JP2005148637A JP 2005148637 A JP2005148637 A JP 2005148637A JP 2003389577 A JP2003389577 A JP 2003389577A JP 2003389577 A JP2003389577 A JP 2003389577A JP 2005148637 A JP2005148637 A JP 2005148637A
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Masaaki Nakano
雅章 中野
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Advanced Display Inc
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Abstract

<P>PROBLEM TO BE SOLVED: To inspect color shading of a color filter substrates to be inspected in which a plurality of coloring pixels in a plurality of colors are regularly ordered readily and with high precision. <P>SOLUTION: A blue color filter substrate 20 having transmission spectral characteristics almost identical to the blue-colored pixel 13 of a color filter substrate to be inspected 10 is provided between a white surface light source lamp 1 and the color filter substrate to be inspected 10. By this, most of the light which goes out (transmits) from the color filter substrate to be inspected 10 can become the transmitted light from the blue-colored pixel 13, and the transmitted light from other green-colored pixel 14 and red-colored pixel 15 can be eliminated (or made to be minimal). Therefore, a slight strength and weakness of the transmitted light found at a membrane thickness abnormal part (shading part) of the blue-colored pixel 13 can be inspected without being disturbed by the transmitted light from the green-colored pixel 14 and the red-colored pixel 15, and a blue color shading of the color filter substrate to be inspected 10 can be inspected readily with high precision. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、カラー液晶表示装置、カラープラズマディスプレイ等の表示装置の製造方法およびカラー撮像管、ＣＣＤカメラ等の撮像装置の製造方法、ならびにこれらの製造方法に用いられるカラーフィルタ基板の検査装置に関するものである。
詳しくは、表示装置の色発光用カラーフィルタ基板の検査工程を含む製造方法および撮像装置の色分解用カラーフィルタ基板の検査工程を含む製造方法、ならびにこれらの検査工程に用いられるカラーフィルタ基板の検査装置に関するものである。 The present invention relates to a manufacturing method of a display device such as a color liquid crystal display device and a color plasma display, a manufacturing method of an imaging device such as a color imaging tube and a CCD camera, and an inspection device for a color filter substrate used in these manufacturing methods. It is.
Specifically, a manufacturing method including an inspection process of a color filter substrate for color emission of a display device, a manufacturing method including an inspection process of a color filter substrate for color separation of an imaging device, and an inspection of a color filter substrate used in these inspection processes It relates to the device.

従来、液晶表示装置などに用いられるカラーフィルタ基板は、ガラス基板上に遮光性を有するブラックマトリクスと、例えば赤色、緑色、青色のフィルタ機能を有する着色画素が、基板の全面にわたって所定の規則で多数配列されたものである。このカラーフィルタ基板をフォトリソグラフィ法によって製造した際に発生する欠陥の一つである色ムラは、各着色画素の膜厚の部分的な差が色の濃淡となって現われたものであり、例えば、塗布工程における各色フォトレジストの物性の変動、あるいは塗布条件、乾燥条件の変動によってもたらされる。塗布装置としてスピンコーターを用いた場合には、基板の中央部から周縁部に向かって放射状に発生するスジ状の色ムラとなり、また塗布装置としてスリットコーターを用いた場合には、基板の幅方向に直線状に発生するスジ状の色ムラとなる。   2. Description of the Related Art Conventionally, color filter substrates used in liquid crystal display devices and the like have a black matrix having a light shielding property on a glass substrate and a large number of colored pixels having, for example, red, green, and blue filter functions, according to a predetermined rule over the entire surface of the substrate. It is arranged. Color unevenness, which is one of the defects generated when this color filter substrate is manufactured by a photolithography method, is a partial difference in the film thickness of each colored pixel that appears as shades of color. This is caused by a change in physical properties of each color photoresist in a coating process, or a change in coating conditions and drying conditions. When a spin coater is used as the coating device, streaky color unevenness occurs radially from the center of the substrate toward the peripheral portion. When a slit coater is used as the coating device, the width direction of the substrate This causes stripe-like color unevenness that occurs in a straight line.

このような色ムラの検査方法としては、従来、光源と拡散板により面光源としたバックライトの前方に被検査カラーフィルタ基板を設置し、その透過光を目視によって検査する方法がとられていた。しかし、このように赤色、緑色、青色の着色画素で構成される被検査カラーフィルタ基板の３色を一括して同時に検査する方法では、重度の色ムラの良否判定は行えるものの、軽度の色ムラの良否判定は精度よく行うことができない。   As a method for inspecting such color unevenness, conventionally, a method has been used in which a color filter substrate to be inspected is installed in front of a backlight that is a surface light source using a light source and a diffusion plate, and the transmitted light is visually inspected. . However, in the method of simultaneously inspecting the three colors of the color filter substrate to be inspected composed of the red, green, and blue colored pixels at the same time as described above, although it is possible to determine whether the color unevenness is severe or not, the color unevenness is slight. The pass / fail judgment cannot be made with high accuracy.

特に、液晶表示装置において、赤色画素および緑色画素部分の液晶を光遮断状態にした、いわゆる青色表示時のみに視認される青色ムラは、カラーフィルタ基板の青色着色画素部の膜厚変動に起因するものであるが、上記の従来方法では、青色着色画素の膜厚異常部で見られる透過光のわずかな強弱が、他の赤色着色画素と緑色着色画素からの透過光に邪魔されるため、検出が難しいという問題があった。このため、被検査カラーフィルタ基板の前に１色の着色画素の光のみを透過し他の２色の着色画素からの光を遮光する検査用マスクを設ける方法も提案されているが、位置合わせに時間がかかる、また被検査カラーフィルタ基板と検査用マスクの接触によるカラ−フィルタ基板の傷つきが発生するなどの課題があった。   In particular, in the liquid crystal display device, the blue unevenness that is visible only during the so-called blue display in which the liquid crystal of the red pixel portion and the green pixel portion is in the light blocking state is caused by the film thickness variation of the blue colored pixel portion of the color filter substrate. However, in the conventional method described above, the slight intensity of the transmitted light seen at the abnormal thickness portion of the blue colored pixel is disturbed by the transmitted light from other red colored pixels and green colored pixels. There was a problem that was difficult. For this reason, a method of providing an inspection mask that transmits only light of one color pixel and blocks light from the other two color pixels in front of the color filter substrate to be inspected has also been proposed. It takes a long time, and the color filter substrate is damaged due to contact between the color filter substrate to be inspected and the inspection mask.

このような問題を解決する技術として、例えば特許文献１では、青色着色画素の色ムラを検出するカラーフィルタ検査方法および装置に関する技術が開示されている。この例では、カラーフィルタの色ムラ検査方法として、カラーフィルタに白色面光源光を照射し、その反射光または透過光を、カラーフィルタを構成する青色着色画素のピーク波長、すなわち略４５０ｎｍ±４０ｎｍを透過させる干渉フィルタを介し検査するものである。このような干渉フィルタを介することによって、青色以外の赤色着色画素、緑色着色画素からの透過光をカットすることができるため、上記のような検査用マスクは不要となる。   As a technique for solving such a problem, for example, Patent Document 1 discloses a technique related to a color filter inspection method and apparatus for detecting color unevenness of blue colored pixels. In this example, as a method for inspecting color unevenness of a color filter, the color filter is irradiated with white surface light source light, and the reflected light or transmitted light is set to a peak wavelength of blue colored pixels constituting the color filter, that is, approximately 450 nm ± 40 nm. The inspection is performed through an interference filter to be transmitted. By passing through such an interference filter, transmitted light from red-colored pixels other than blue and green-colored pixels can be cut, and thus the inspection mask as described above becomes unnecessary.

特開２００３−９８０３６号公報（第４頁、第６図）JP 2003-98036 A (page 4, FIG. 6)

このように、特許文献１に開示されたカラーフィルタ検査方法によれば、検査者の目に入射する光の波長スペクトルは、青色着色画素のピーク付近の波長領域のみであるため、青色着色画素のピーク波長領域の透過率が目視レベルでムラとして視認されるようなカラーフィルタの膜厚変動による色ムラを検出することは可能である。しかしながら、実際にカラーフィルタを用いて液晶表示装置を構成し、赤色画素と緑色画素部分の液晶を光遮断状態にした、いわゆる青色表示時のみに視認されるムラは、非常にわずかな青色カラーフィルタの膜厚変動で発生しているため、青色着色画素のピーク波長領域（選択透過領域）の透過率変動は少なく、青色着色画素の波長選択領域の裾の部分（低透過率領域）での透過率変動が大きい。さらに、わずかな膜厚変動で発生する青色着色画素のピーク波長領域でのわずかな透過率変動は、人間の比視感度特性で感度の低い波長領域であるため、特許文献１によるカラーフィルタ検査方法では、わずかな膜厚変動による色ムラは検出できないという問題があった。   As described above, according to the color filter inspection method disclosed in Patent Document 1, the wavelength spectrum of the light incident on the inspector's eyes is only the wavelength region near the peak of the blue colored pixel. It is possible to detect color unevenness due to film thickness variation of the color filter such that the transmittance in the peak wavelength region is visually recognized as unevenness. However, the liquid crystal display device is actually configured using a color filter, and the liquid crystal of the red pixel portion and the green pixel portion is in a light blocking state. The variation in the transmittance in the peak wavelength region (selective transmission region) of the blue colored pixel is small, and the transmission at the bottom of the wavelength selection region of the blue colored pixel (low transmittance region) The rate fluctuation is large. Further, since the slight transmittance variation in the peak wavelength region of the blue colored pixel caused by the slight film thickness variation is a wavelength region having low sensitivity in human specific visibility characteristics, the color filter inspection method according to Patent Document 1 However, there is a problem that color unevenness due to slight film thickness variation cannot be detected.

本発明は、上記のような問題点を解消するためになされたもので、複数色の着色画素が所定の規則で多数配列された被検査カラーフィルタ基板の色ムラを、容易に精度良く検査することが可能なカラーフィルタ基板の検査工程を含む表示装置の製造方法および撮像装置の製造方法ならびにこれらの製造方法に用いられるカラーフィルタ基板の検査装置を提供することを目的とする。   The present invention has been made to solve the above problems, and easily and accurately inspects color unevenness of a color filter substrate to be inspected in which a large number of colored pixels of a plurality of colors are arranged according to a predetermined rule. It is an object of the present invention to provide a display device manufacturing method, an imaging device manufacturing method, and a color filter substrate inspection device used in these manufacturing methods, including a color filter substrate inspection step.

本発明に係わる表示装置の製造方法は、複数色の着色画素が規則的に多数配列されたカラーフィルタ基板の色ムラを検査するカラーフィルタ基板の検査工程を含む表示装置の製造方法であって、検査工程では、連続スペクトルを有する白色光源とカラーフィルタ基板との間に、カラーフィルタ基板の着色画素のうち一色とほぼ同一の透過スペクトル特性を有する単色フィルタ基板を設置し、この単色フィルタ基板を介して白色光源からの光をカラーフィルタ基板に照射して、カラーフィルタ基板からの透過光に基づきカラーフィルタ基板を検査するものである。   A manufacturing method of a display device according to the present invention is a manufacturing method of a display device including an inspection process of a color filter substrate for inspecting color unevenness of a color filter substrate in which a large number of colored pixels of a plurality of colors are regularly arranged. In the inspection process, a monochromatic filter substrate having substantially the same transmission spectral characteristics as one color among the colored pixels of the color filter substrate is installed between the white light source having a continuous spectrum and the color filter substrate, and the monochromatic filter substrate is interposed therebetween. The light from the white light source is irradiated onto the color filter substrate, and the color filter substrate is inspected based on the transmitted light from the color filter substrate.

また、本発明に係わる撮像装置の製造方法は、複数色の着色画素が規則的に多数配列されたカラーフィルタ基板の色ムラを検査するカラーフィルタ基板の検査工程を含む撮像装置の製造方法であって、検査工程では、連続スペクトルを有する白色光源とカラーフィルタ基板との間に、カラーフィルタ基板の着色画素のうち一色とほぼ同一の透過スペクトル特性を有する単色フィルタ基板を設置し、この単色フィルタ基板を介して白色光源からの光をカラーフィルタ基板に照射して、カラーフィルタ基板からの透過光に基づきカラーフィルタ基板を検査するものである。   The image pickup apparatus manufacturing method according to the present invention is a method for manufacturing an image pickup apparatus including a color filter substrate inspection step for inspecting color unevenness of a color filter substrate in which a large number of colored pixels of a plurality of colors are regularly arranged. In the inspection process, a monochrome filter substrate having substantially the same transmission spectrum characteristics as one color among the colored pixels of the color filter substrate is installed between the white light source having a continuous spectrum and the color filter substrate. The color filter substrate is irradiated with light from a white light source via the color filter substrate, and the color filter substrate is inspected based on the transmitted light from the color filter substrate.

また、本発明に係わるカラーフィルタ基板の検査装置は、複数色の着色画素が規則的に多数配列されたカラーフィルタ基板の色ムラを検出するカラーフィルタ基板の検査装置であって、連続スペクトルを有する白色光源と、白色光源とカラーフィルタ基板との間に設置されカラーフィルタ基板の着色画素のうち一色とほぼ同一の透過スペクトル特性を有する単色フィルタ基板とを備えたものである。   The color filter substrate inspection apparatus according to the present invention is a color filter substrate inspection apparatus that detects color unevenness of a color filter substrate in which a large number of colored pixels of a plurality of colors are regularly arranged, and has a continuous spectrum. A white light source, and a monochromatic filter substrate that is installed between the white light source and the color filter substrate and has a transmission spectrum characteristic substantially the same as one color among the colored pixels of the color filter substrate.

本発明によれば、カラーフィルタ基板の検査工程において、白色光源とカラーフィルタ基板との間にカラーフィルタ基板の着色画素のうち一色とほぼ同一の透過スペクトル特性を有する単色フィルタ基板を設置することにより、カラーフィルタ基板からの透過光のほとんどを単色フィルタ基板と同じ色の着色画素からの透過光とすることができ、他の色の着色画素からの透過光を無くす（または微小にする）ことができる。これにより、単色フィルタ基板と同じ色の着色画素の膜厚異常部で見られる透過光のわずかな強弱を、他の色の着色画素からの透過光に邪魔されることなく検査することができ、カラーフィルタ基板の色ムラを容易に精度良く検出することが可能なカラーフィルタ基板の検査工程を含む表示装置の製造方法および撮像装置の製造方法を提供することが可能となる。   According to the present invention, in the inspection process of the color filter substrate, by installing a monochromatic filter substrate having substantially the same transmission spectrum characteristics as one color among the colored pixels of the color filter substrate between the white light source and the color filter substrate. Most of the transmitted light from the color filter substrate can be transmitted from the colored pixels of the same color as the monochrome filter substrate, and the transmitted light from the colored pixels of other colors can be eliminated (or made minute). it can. Thereby, it is possible to inspect the slight intensity of the transmitted light seen in the film thickness abnormality portion of the colored pixel of the same color as the monochrome filter substrate without being disturbed by the transmitted light from the colored pixels of other colors, It is possible to provide a display device manufacturing method and an imaging device manufacturing method including a color filter substrate inspection process capable of easily and accurately detecting color unevenness of the color filter substrate.

また、本発明によれば、白色光源とカラーフィルタ基板との間に設置されカラーフィルタ基板の着色画素のうち一色とほぼ同一の透過スペクトル特性を有する単色フィルタ基板を備えることにより、カラーフィルタ基板からの透過光のほとんどを単色フィルタ基板と同じ色の着色画素からの透過光とすることができ、この着色画素の膜厚異常部で見られる透過光のわずかな強弱を、他の色の着色画素からの透過光に邪魔されることなく検査することができるため、カラーフィルタ基板の色ムラを容易に精度良く検出することが可能なカラーフィルタ基板の検査装置が得られる。   In addition, according to the present invention, the color filter substrate can be provided by including the single color filter substrate that is installed between the white light source and the color filter substrate and has substantially the same transmission spectrum characteristics as one of the colored pixels of the color filter substrate. Most of the transmitted light can be transmitted from the colored pixels of the same color as the monochromatic filter substrate, and the slight intensity of the transmitted light seen at the abnormal thickness portion of the colored pixels can be reduced to the colored pixels of other colors. Therefore, a color filter substrate inspection apparatus capable of easily and accurately detecting the color unevenness of the color filter substrate can be obtained.

以下に、本発明を実施するための最良の形態である実施の形態１および実施の形態２について述べる。   Embodiments 1 and 2 that are the best modes for carrying out the present invention will be described below.

実施の形態１．
本発明の実施の形態１を図面に基づいて説明する。図１は、本発明の実施の形態１であるカラーフィルタ基板の検査装置を示す概略図、図２は被検査カラーフィルタ基板の構造を示す図であり、（ａ）は部分平面図、（ｂ）は図２（ａ）中、Ｘ−Ｘで示す部分の断面図である。 Embodiment 1 FIG.
Embodiment 1 of the present invention will be described with reference to the drawings. FIG. 1 is a schematic view showing a color filter substrate inspection apparatus according to Embodiment 1 of the present invention, FIG. 2 is a view showing the structure of a color filter substrate to be inspected, (a) is a partial plan view, and (b) ) Is a cross-sectional view of a portion indicated by XX in FIG.

カラー液晶表示装置、カラープラズマディスプレイ等の表示装置では、多数の表示素子の光を受けて色発光する色発光用カラーフィルタが用いられ、カラー撮像管、ＣＣＤカメラ等の撮像装置では、多数の撮像素子に対する光を色分解する色分解用カラーフィルタが用いられる。これらの表示装置および撮像装置は、それぞれのカラーフィルタの色ムラを検査する検査工程を経て製造される。図２の被検査カラーフィルタ基板１０は、これらの表示装置に用いられる色発光用カラーフィルタまたは撮像装置に用いられる色分解用カラーフィルタである。   Color liquid crystal display devices such as color liquid crystal display devices and color plasma displays use color light emission color filters that emit light by receiving light from a large number of display elements, and image pickup devices such as color image pickup tubes and CCD cameras use a large number of image pickup devices. A color separation color filter that separates light emitted from the element is used. These display devices and imaging devices are manufactured through an inspection process for inspecting color unevenness of each color filter. The color filter substrate 10 to be inspected in FIG. 2 is a color filter for color light emission used in these display devices or a color filter for color separation used in an imaging device.

本実施の形態１におけるカラーフィルタ基板検査装置３０は、複数色の着色画素が規則的に多数配列された被検査カラーフィルタ基板１０の色ムラを検出する検査装置であり、図１に示すように、タングステンランプまたはキセノンランプなど連続スペクトルを有する複数の白色光源ランプ１を備えている。これらの複数の白色光源ランプ１はハウジング２に収納され、発光面側となるハウジング２の主面２ａ上に拡散板３を設け、均一な白色面光源を形成している。   The color filter substrate inspection apparatus 30 according to the first embodiment is an inspection apparatus that detects color unevenness of the inspected color filter substrate 10 in which a large number of colored pixels of a plurality of colors are regularly arranged, as shown in FIG. A plurality of white light source lamps 1 having a continuous spectrum, such as a tungsten lamp or a xenon lamp. The plurality of white light source lamps 1 are housed in a housing 2, and a diffusion plate 3 is provided on the main surface 2a of the housing 2 on the light emitting surface side to form a uniform white surface light source.

さらに、拡散板３上には、ガラス基板２１上に青色フィルタ層２３が形成された青色フィルタ基板２０が設けられている。なお、図１では、拡散板３と青色フィルタ基板２０は離れて設置されているが、重ねて設置してもよく、青色フィルタ基板２０の設置位置は、白色光源ランプ１と被検査カラーフィルタ基板１０の間であればよい。   Furthermore, a blue filter substrate 20 in which a blue filter layer 23 is formed on a glass substrate 21 is provided on the diffusion plate 3. In FIG. 1, the diffusing plate 3 and the blue filter substrate 20 are installed apart from each other, but they may be installed in an overlapping manner. The installation position of the blue filter substrate 20 is the white light source lamp 1 and the color filter substrate to be inspected. It may be between 10.

次に、図２に示す被検査カラーフィルタ基板１０の構造について説明する。被検査カラーフィルタ基板１０は、図２に示すように、ガラス基板１１上に遮光性を有するブラックマトリクス１２がマトリクス状に形成され、さらに青色着色画素１３、緑色着色画素１４、赤色着色画素１５などの複数色の着色画素が、ガラス基板１１の全面にわたって規則的に多数配列されたものである。これらの各着色画素は、フォトリソグラフィ法により形成されている。   Next, the structure of the color filter substrate 10 to be inspected shown in FIG. 2 will be described. As shown in FIG. 2, in the color filter substrate 10 to be inspected, a black matrix 12 having a light shielding property is formed in a matrix on a glass substrate 11, and further, blue colored pixels 13, green colored pixels 14, red colored pixels 15 and the like. A plurality of colored pixels are regularly arranged over the entire surface of the glass substrate 11. Each of these colored pixels is formed by a photolithography method.

また、本実施の形態１では、青色フィルタ基板２０の青色フィルタ層２３を、被検査カラーフィルタ基板１０の青色着色画素１３と同―色材で形成している。すなわち、本実施の形態１によるカラーフィルタ基板検査装置３０は、複数の白色光源ランプ１と被検査カラーフィルタ基板１０との間に、被検査カラーフィルタ基板１０の着色画素のうち一色（本実施の形態では青色）と同一の透過スペクトル特性を有する青色フィルタ基板２０を備えたことを特徴としている。   In the first embodiment, the blue filter layer 23 of the blue filter substrate 20 is formed of the same color material as the blue colored pixels 13 of the color filter substrate 10 to be inspected. That is, the color filter substrate inspection apparatus 30 according to the first embodiment has one color (this embodiment) among the colored pixels of the color filter substrate 10 to be inspected between the plurality of white light source lamps 1 and the color filter substrate 10 to be inspected. It is characterized in that a blue filter substrate 20 having the same transmission spectrum characteristic as that of blue in the form is provided.

本実施の形態１におけるカラーフィルタ基板検査装置３０を用いたカラーフィルタ基板の検査方法について図１を用いて説明する。連続スペクトルを有する白色光源ランプ１と被検査カラーフィルタ基板１０との間に、被検査カラーフィルタ基板１０の青色着色画素１３と同一の透過スペクトル特性を有する青色フィルタ基板２０を設置する。白色光源ランプ１からの光は、この青色フィルタ基板２０を介して被検査カラーフィルタ基板１０に照射され、検査者は被検査カラーフィルタ基板１０からの透過光を検査者目視部３１にて検査する。   A color filter substrate inspection method using the color filter substrate inspection apparatus 30 according to the first embodiment will be described with reference to FIG. Between the white light source lamp 1 having a continuous spectrum and the color filter substrate 10 to be inspected, a blue filter substrate 20 having the same transmission spectrum characteristics as the blue colored pixels 13 of the color filter substrate 10 to be inspected is installed. The light from the white light source lamp 1 is applied to the color filter substrate 10 to be inspected through the blue filter substrate 20, and the inspector inspects the transmitted light from the color filter substrate 10 to be inspected by the inspector viewing unit 31. .

次に、本実施の形態１におけるカラーフィルタ基板の検査方法の原理および特徴について、図３〜図６を用いて説明する。図３は、被検査カラーフィルタ基板１０の青色着色画素１３、緑色着色画素１４、赤色着色画素１５それぞれの透過スペクトル特性を示す図である。なお、図中Ｂは青色着色画素１３、Ｇは緑色着色画素１４、Ｒは赤色着色画素１５の透過スペクトル特性を示している。   Next, the principle and characteristics of the color filter substrate inspection method according to the first embodiment will be described with reference to FIGS. FIG. 3 is a diagram showing transmission spectrum characteristics of the blue colored pixel 13, the green colored pixel 14, and the red colored pixel 15 of the color filter substrate 10 to be inspected. In the figure, B represents the transmission spectrum characteristics of the blue colored pixel 13, G represents the green colored pixel 14, and R represents the red colored pixel 15.

また、図４の符号１００は本実施の形態１におけるカラーフィルタ検査装置３０に用いられる白色光源ランプ１の発光スペクトル特性、図５の符号２００は白色光源ランプ１から放射され青色フィルタ基板２０を通過した光、すなわち被検査カラーフィルタ基板１０に入射する光の発光スペクトル特性を示している。図３と図５を比較すると明らかなように、青色フィルタ基板２０の青色フィルタ層２３は、被検査カラーフィルタ基板１０の青色着色画素１３と同―色材で形成されているため、被検査カラーフィルタ１０に入射される光の発光スペクトル特性２００（図５）は、被検査カラーフィルタ基板１０の青色着色画素１３の透過スペクトル特性Ｂ（図３）と同様のものとなる。   4 is the emission spectrum characteristic of the white light source lamp 1 used in the color filter inspection apparatus 30 according to the first embodiment, and the reference numeral 200 in FIG. 5 is emitted from the white light source lamp 1 and passes through the blue filter substrate 20. The light emission spectrum characteristic of the incident light, that is, the light incident on the color filter substrate 10 to be inspected is shown. As apparent from a comparison between FIG. 3 and FIG. 5, the blue filter layer 23 of the blue filter substrate 20 is formed of the same color material as the blue colored pixels 13 of the color filter substrate 10 to be inspected. The emission spectral characteristic 200 (FIG. 5) of the light incident on the filter 10 is the same as the transmission spectral characteristic B (FIG. 3) of the blue colored pixel 13 of the color filter substrate 10 to be inspected.

さらに、図６は、白色光源ランプ１から放射され青色フィルタ基板２０を通過した光（図５に示す発光スペクトル特性２００の光）が、被検査カラーフィルタ基板１０に入射し、青色着色画素１３、緑色着色画素１４、赤色着色画素１５のそれぞれから出射（透過）された光の発光スペクトル特性を示している。すなわち、図６は、本実施の形態におけるカラーフィルタ基板検査装置３０の検査者が、検査者目視部３１（図１）において観察する発光スペクトル特性である。なお、図６中、符号３０１ａは被検査カラーフィルタ基板１０の青色着色画素（膜厚正常部）透過光の発光スペクトル特性、符号３０１ｂは被検査カラーフィルタ基板１０の青色着色画素（膜厚異常部）透過光の発光スペクトル特性、符号３０２は被検査カラーフィルタ基板１０の緑色着色画素透過光の発光スペクトル特性、符号４００は人の比視感度特性曲線を示している。   Further, FIG. 6 shows that the light emitted from the white light source lamp 1 and passed through the blue filter substrate 20 (light having the emission spectrum characteristic 200 shown in FIG. 5) enters the color filter substrate 10 to be inspected, and the blue colored pixels 13, The emission spectrum characteristics of the light emitted (transmitted) from each of the green colored pixel 14 and the red colored pixel 15 are shown. That is, FIG. 6 shows the emission spectrum characteristics observed by the inspector viewing unit 31 (FIG. 1) by the inspector of the color filter substrate inspection apparatus 30 in the present embodiment. In FIG. 6, reference numeral 301a denotes the emission spectrum characteristic of the blue colored pixel (thickness normal part) transmitted light of the color filter substrate 10 to be inspected, and reference numeral 301b denotes the blue colored pixel (thickness abnormality part of the color filter substrate 10 to be inspected). ) Emission spectral characteristics of transmitted light, reference numeral 302 indicates an emission spectral characteristic of green colored pixel transmitted light of the color filter substrate 10 to be inspected, and reference numeral 400 indicates a human relative luminous efficiency characteristic curve.

図６に示すように、本実施の形態１によるカラーフィルタ基板検査装置３０において、被検査カラーフィルタ基板１０から出射される発光スペクトルとしては、赤色着色画素１５からの出射光成分はほとんどない（図示せず）。また、緑色着色画素１４から出射される発光スペクトル３０２は、図５に示す被検査カラーフィルタ基板１０に入射される光の発光スペクトル２００と、図３に示す被検査カラーフィルタ基板１０の緑色着色画素１４の透過スペクトル特性Ｇとの重なり部分であるため、その出力は小さいものとなる。従って、被検査カラーフィルタ基板１０から出射される発光スペクトルのほとんどは、青色着色画素１３から出射される発光スペクトル（膜厚正常部３０１ａ、膜厚異常部３０１ｂ）となる。   As shown in FIG. 6, in the color filter substrate inspection apparatus 30 according to the first embodiment, the emission spectrum emitted from the color filter substrate 10 to be inspected has almost no emission light component from the red colored pixel 15 (FIG. 6). Not shown). The emission spectrum 302 emitted from the green colored pixel 14 includes the emission spectrum 200 of the light incident on the color filter substrate 10 shown in FIG. 5 and the green color pixel of the color filter substrate 10 shown in FIG. Since this is an overlapping portion with 14 transmission spectrum characteristics G, the output is small. Therefore, most of the emission spectrum emitted from the color filter substrate 10 to be inspected is the emission spectrum (film thickness normal part 301a, film thickness abnormal part 301b) emitted from the blue colored pixel 13.

このように、本実施の形態１におけるカラーフィルタ検査工程では、被検査カラーフィルタ基板１０の赤色着色画素１５から出射（透過）される赤色成分の発光スペクトルはほとんどなく、緑色着色画素１４から出射（透過）される緑色成分の発光スペクトル３０２も非常に微小であり、ほとんどが青色着色画素１３から出射（透過）される青色成分の発光スペクトル３０１ａ、３０１ｂとなる。このため、青色着色画素１３の膜厚異常部（ムラ部分）で見られる透過光のわずかな強弱が、他の赤色着色画素１５および緑色着色画素１４からの透過光に邪魔されることなく検査することが可能となる。   As described above, in the color filter inspection step in the first embodiment, there is almost no emission spectrum of the red component emitted (transmitted) from the red colored pixel 15 of the color filter substrate 10 to be inspected, and is emitted from the green colored pixel 14 ( The emission spectrum 302 of the green component that is transmitted) is also very small, and most of the emission spectrum is 301a and 301b of the blue component that is emitted (transmitted) from the blue colored pixel 13. For this reason, the slight intensity of the transmitted light seen at the film thickness abnormality portion (uneven portion) of the blue colored pixel 13 is inspected without being disturbed by the transmitted light from the other red colored pixels 15 and the green colored pixels 14. It becomes possible.

さらに、青色着色画素１３から透過される光のピーク波長領域付近の透過率変動だけでなく、裾の部分（低透過率領域）すなわち人の比視感度特性４００において感度の高い波長領域の透過率変動まで検査できるので、青色着色画素１３のわずかな膜厚変動によって生じる透過率特性の変動に対しても非常に高精度な色ムラ検査が可能となる。また、従来のように、被検査カラーフィルタ１０に１色の着色画素からの光のみを透過し他の色の着色画素からの光を遮光する検査用マスクを設ける必要がないため、位置合わせに時間を要することなく、簡単な作業で検査でき、検査用マスクとの接触による被検査カラ−フィルタ基板１０の傷つき等も発生しない。   Further, not only the transmittance variation in the vicinity of the peak wavelength region of the light transmitted from the blue colored pixel 13 but also the transmittance in the wavelength region having high sensitivity in the tail portion (low transmittance region), that is, the human relative luminous sensitivity characteristic 400. Since even the variation can be inspected, it is possible to perform a highly accurate color unevenness inspection even with respect to the variation in transmittance characteristics caused by a slight variation in film thickness of the blue colored pixel 13. Further, unlike the prior art, it is not necessary to provide the inspection color filter 10 with an inspection mask that transmits only light from one color pixel and blocks light from other color pixels. The inspection can be performed by a simple operation without taking time, and the color filter substrate 10 to be inspected is not damaged due to contact with the inspection mask.

これに対し、従来のカラーフィルタの色ムラ検査方法（特許文献１）について図８〜図１１を用いて説明し、本発明と従来例との違いを明らかにする。図８は、特許文献１に開示されたカラーフィルタ検査方法の一実施例を示している。なお、図８中、図１と同一、相当部分には同一符号を付し説明を省略する。図８に示すように、従来のカラーフィルタの色ムラ検査方法では、白色面光源３２からの光を、青色着色画素１３のピーク波長略４５０ｎｍ±４０ｎｍを選択的に透過させる干渉フィルタ３３を通して被検査カラーフィルタ基板１０に照射し、被検査カラーフィルタ基板１０からの透過光を目視によって検査するものである。   On the other hand, a conventional color filter color nonuniformity inspection method (Patent Document 1) will be described with reference to FIGS. 8 to 11 to clarify the difference between the present invention and the conventional example. FIG. 8 shows an embodiment of the color filter inspection method disclosed in Patent Document 1. 8 that are the same as or equivalent to those in FIG. As shown in FIG. 8, in the conventional color filter color unevenness inspection method, the light from the white surface light source 32 is inspected through the interference filter 33 that selectively transmits the peak wavelength of approximately 450 nm ± 40 nm of the blue colored pixel 13. The color filter substrate 10 is irradiated and the transmitted light from the color filter substrate 10 to be inspected is visually inspected.

図９は、被検査カラーフィルタ基板１０の青色着色画素１３の透過スペクトル特性を示しており、図中、Ｂは膜厚正常部の透過スペクトル特性、Ｂ’は膜厚異常部の透過スペクトル特性を示している。また、図１０は、従来のカラーフィルタの色ムラ検査方法における干渉フィルタ３３の透過率特性５００を示している。この従来例における干渉フィルタ３３は、図１０に示すように、青色着色画素１３のピーク波長略４５０ｎｍ±４０ｎｍを選択的に透過させ、緑色着色画素１４、赤色着色画素１５からの透過光をカットするものである。図９と図１０を比較すると明らかなように、青色着色画素１３のわずかな膜厚変動による透過率変動は、干渉フィルタ３３の選択透過領域であるピーク波長領域付近においては少なく、選択透過領域のすその部分（低透過率領域）において大きいことがわかる。   FIG. 9 shows the transmission spectrum characteristic of the blue colored pixel 13 of the color filter substrate 10 to be inspected. In FIG. 9, B represents the transmission spectrum characteristic of the normal film thickness portion, and B ′ represents the transmission spectrum characteristic of the abnormal film thickness portion. Show. FIG. 10 shows the transmittance characteristic 500 of the interference filter 33 in the conventional color filter color unevenness inspection method. As shown in FIG. 10, the interference filter 33 in this conventional example selectively transmits the peak wavelength of approximately 450 nm ± 40 nm of the blue colored pixel 13 and cuts the transmitted light from the green colored pixel 14 and the red colored pixel 15. Is. As is clear from comparison between FIG. 9 and FIG. 10, the transmittance variation due to the slight film thickness variation of the blue colored pixel 13 is small in the vicinity of the peak wavelength region, which is the selective transmission region of the interference filter 33, and It can be seen that the portion at the bottom (low transmittance region) is large.

さらに、図１１は干渉フィルタ３３と被検査カラーフィルタ基板１０を通して検査者目視部３１にて観察される光のスペクトル分布を、人の比視感度特性４００と共に示した図である。図中、符号６０１ａは被検査カラーフィルタ基板１０の青色着色画素（膜厚正常部）透過光の発光スペクトル、符号６０１ｂは被検査カラーフィルタ基板１０の青色着色画素（膜厚異常部）透過光の発光スペクトルを示している。図１１に示すように、この従来例によるカラーフィルタ検査方法では、検査者目視部３１にて観察される光の波長スペクトルは、青色着色画素１３のピーク波長領域付近のみであり、青色着色画素１３のわずかな膜厚変動による透過率変動が少ない上に、この波長領域は人の目に鈍感な波長領域である。   Further, FIG. 11 is a diagram showing the spectral distribution of light observed by the inspector viewing unit 31 through the interference filter 33 and the color filter substrate 10 to be inspected together with the human specific luminous efficiency characteristic 400. In the figure, reference numeral 601a denotes the emission spectrum of the blue colored pixel (thickness normal part) transmitted light of the color filter substrate 10 to be inspected, and reference numeral 601b denotes the transmitted light of the blue colored pixel (thickness abnormality part) of the color filter substrate 10 to be inspected. The emission spectrum is shown. As shown in FIG. 11, in the color filter inspection method according to this conventional example, the wavelength spectrum of the light observed by the inspector viewing unit 31 is only in the vicinity of the peak wavelength region of the blue colored pixel 13. This wavelength region is a wavelength region that is insensitive to human eyes.

このように、本発明の実施の形態１と従来例において、検査者が目視する被検査カラーフィルタ基板１０からの透過光の発光スペクトル特性は、図６と図１１を比較すると明らかなように、その波長領域が全く異なるものである。すなわち、従来のカラーフィルタ検査方法においては、青色着色画素１３のピーク波長領域付近での透過率変動を観察しており、この波長領域は、わずかな膜厚変動による透過率変動が少ない上に、人の目に鈍感な波長領域であるため、わずかな膜厚変動による色ムラは検出できなかった。これに対し、本実施の形態１におけるカラーフィルタ基板の検査方法では、青色着色画素１３の低透過率領域（すその部分）、特に人の比視感度特性において感度の高い緑色波長領域側での透過率変動を観察できるため、わずかな膜厚変動による色ムラを容易に検出することが可能である。   As described above, in the first embodiment of the present invention and the conventional example, the emission spectrum characteristics of the transmitted light from the color filter substrate 10 to be inspected by the inspector are clearly shown by comparing FIG. 6 and FIG. Their wavelength regions are completely different. That is, in the conventional color filter inspection method, the transmittance variation in the vicinity of the peak wavelength region of the blue colored pixel 13 is observed, and in this wavelength region, the transmittance variation due to slight film thickness variation is small. Since this is a wavelength region insensitive to human eyes, color unevenness due to slight film thickness variation could not be detected. In contrast, in the method for inspecting the color filter substrate according to the first embodiment, the low transmittance region of the blue colored pixel 13 (ie, the portion thereof), particularly in the green wavelength region side where the sensitivity is high in human relative luminous sensitivity characteristics. Since the transmittance variation can be observed, it is possible to easily detect color unevenness due to slight film thickness variation.

なお、本実施の形態１では、青色フィルタ基板２０の青色フィルタ層２３を、被検査カラーフィルタ基板１０の青色着色画素１３と同―色材で形成したが、コスト面や生産性を考慮し、必ずしも青色着色画素１３と同―色材を用いる必要はない。ただし、青色着色画素１３とほぼ同一の透過スペクトル特性を示し、青色着色画素１３の透過率特性の低透過率領域であり比視感度特性の高い波長領域を一定割合で透過させ、且つ被検査カラーフィルタ基板１０の緑色着色画素１４を透過させる波長領域に対して低透過率特性となるフィルタ材料を用いる必要がある。   In the first embodiment, the blue filter layer 23 of the blue filter substrate 20 is formed of the same color material as the blue colored pixels 13 of the color filter substrate 10 to be inspected. However, in consideration of cost and productivity, It is not always necessary to use the same color material as the blue colored pixels 13. However, it shows substantially the same transmission spectrum characteristic as that of the blue colored pixel 13, transmits a wavelength region having a low transmittance of the transmittance characteristic of the blue colored pixel 13 and a high relative visibility characteristic at a certain ratio, and a color to be inspected. It is necessary to use a filter material that has low transmittance characteristics with respect to a wavelength region that transmits the green colored pixels 14 of the filter substrate 10.

以上のように、本実施の形態１によるカラーフィルタ検査装置３０は、連続スペクトルを有する白色光源ランプ１と、この白色光源ランプ１と被検査カラーフィルタ基板１０との間に設置され、被検査カラーフィルタ基板１０の青色着色画素１３とほぼ同一の透過スペクトル特性を有する青色フィルタ基板２０とを備えることにより、被検査カラーフィルタ基板１０の緑色着色画素１４および赤色着色画素１５から出射される光を無くし（または微小にし）、被検査カラーフィルタ基板１０から出射される光のほとんどを青色着色画素１３から出射される光とすることができる。このため、青色着色画素１３の膜厚異常部（ムラ部分）で見られる透過光のわずかな強弱を、他の緑色着色画素１４や赤色着色画素１５からの透過光に邪魔されることなく検査することができ、被検査カラーフィルタ基板１０の青色ムラを容易に精度良く検出することが可能となる。   As described above, the color filter inspection apparatus 30 according to the first embodiment is installed between the white light source lamp 1 having a continuous spectrum, the white light source lamp 1 and the color filter substrate 10 to be inspected, and the color to be inspected. By providing a blue filter substrate 20 having substantially the same transmission spectrum characteristics as the blue colored pixels 13 of the filter substrate 10, light emitted from the green colored pixels 14 and the red colored pixels 15 of the color filter substrate 10 to be inspected is eliminated. Most of the light emitted from the color filter substrate 10 to be inspected can be made the light emitted from the blue colored pixels 13. For this reason, the slight intensity of the transmitted light seen in the film thickness abnormality portion (uneven portion) of the blue colored pixel 13 is inspected without being disturbed by the transmitted light from the other green colored pixels 14 and the red colored pixels 15. Therefore, it is possible to easily detect the blue unevenness of the color filter substrate 10 to be inspected with high accuracy.

さらに、本実施の形態１によるカラーフィルタ基板の検査工程では、青色着色画素１３のわずかな膜厚変動によって生じる透過率特性の変動に関しても、青色着色画素１３のピーク波長領域付近の透過率変動だけでなく、人の比視感度特性において感度の高い青色着色画素１３の低透過率領域（裾の部分）の透過率変動まで検査することができるため、非常に高精度な色ムラの検出が可能となる。   Further, in the inspection process of the color filter substrate according to the first embodiment, only the transmittance variation in the vicinity of the peak wavelength region of the blue colored pixel 13 can be obtained with respect to the variation in the transmittance characteristic caused by the slight film thickness variation of the blue colored pixel 13. In addition, since it is possible to inspect even the transmittance fluctuation in the low transmittance region (bottom portion) of the blue colored pixel 13 having high sensitivity in human specific visual sensitivity characteristics, it is possible to detect color unevenness with very high accuracy. It becomes.

実施の形態２．
上記実施の形態１では、白色光源ランプ１と被検査カラーフィルタ基板１０との間に青色フィルタ基板２０を設置し、被検査カラーフィルタ基板１０の青色ムラを高精度に検出する例について説明したが、本発明はこれに限定されるものではない。本発明の実施の形態２では、白色光源ランプ１と被検査カラーフィルタ１０との間に、赤色フィルタ基板を設置し、被検査カラーフィルタ基板１０の赤色ムラを高精度に検出するものである。なお、本実施の形態におけるカラーフィルタ基板検査装置の構成は、上記実施の形態１に示したカラーフィルタ基板検査装置３０の青色フィルタ基板２０を赤色フィルタ基板に置き換えた以外は上記実施の形態１と同様であるので、図１を流用して説明する。 Embodiment 2. FIG.
In the first embodiment, the example in which the blue filter substrate 20 is installed between the white light source lamp 1 and the color filter substrate 10 to be inspected and the blue unevenness of the color filter substrate 10 to be inspected is detected with high accuracy has been described. However, the present invention is not limited to this. In the second embodiment of the present invention, a red filter substrate is installed between the white light source lamp 1 and the color filter 10 to be inspected, and red unevenness of the color filter substrate 10 to be inspected is detected with high accuracy. The configuration of the color filter substrate inspection apparatus according to the present embodiment is the same as that of the first embodiment except that the blue filter substrate 20 of the color filter substrate inspection apparatus 30 shown in the first embodiment is replaced with a red filter substrate. Since it is the same, FIG. 1 is used and demonstrated.

本実施の形態２におけるカラーフィルタ基板検査装置３０ａは、タングステンランプまたはキセノンランプなど連続スペクトルを有する白色光源ランプ１をハウジング２に収納し、発光面側となるハウジング２の主面２ａ上に拡散板３を設け、均一な面光源を形成している。さらに、拡散板３上には、ガラス基板２１上に赤色フィルタ層２３aが形成された赤色フィルタ基板２０ａが設けられている。この赤色フィルタ基板２０ａの赤色フィルタ層２３ａは、被検査カラーフィルタ基板１０の赤色着色画素１５と同―色材で形成されている。   A color filter substrate inspection apparatus 30a according to the second embodiment stores a white light source lamp 1 having a continuous spectrum, such as a tungsten lamp or a xenon lamp, in a housing 2, and a diffusion plate on the main surface 2a of the housing 2 on the light emitting surface side. 3 is provided to form a uniform surface light source. Furthermore, a red filter substrate 20 a in which a red filter layer 23 a is formed on a glass substrate 21 is provided on the diffusion plate 3. The red filter layer 23a of the red filter substrate 20a is formed of the same color material as the red colored pixels 15 of the color filter substrate 10 to be inspected.

図７は、本実施の形態におけるカラーフィルタ基板検査装置３０ａにおいて、白色光源ランプ１から放射され赤色フィルタ基板２０ａを通過した光が被検査カラーフィルタ基板１０に入射し、青色着色画素１３、緑色着色画素１４、赤色着色画素１５のそれぞれから出射（透過）された光の発光スペクトル特性を示している。すなわち、図７は、本実施の形態におけるカラーフィルタ基板検査装置３０ａの検査者が、検査者目視部３１（図１）において観察する発光スペクトル特性である。なお、図７中、符号７０１ａは被検査カラーフィルタ基板１０の赤色着色画素（膜厚正常部）透過光の発光スペクトル特性、符号７０１ｂは被検査カラーフィルタ基板１０の赤色着色画素（膜厚異常部）透過光の発光スペクトル特性、符号３０３は被検査カラーフィルタ基板１０の緑色着色画素透過光の発光スペクトル特性、符号４００は人の比視感度特性曲線を示している。   FIG. 7 shows that in the color filter substrate inspection apparatus 30a according to the present embodiment, light emitted from the white light source lamp 1 and passed through the red filter substrate 20a is incident on the color filter substrate 10 to be inspected. The emission spectrum characteristics of the light emitted (transmitted) from each of the pixel 14 and the red colored pixel 15 are shown. That is, FIG. 7 shows the emission spectral characteristics observed by the inspector viewing unit 31 (FIG. 1) by the inspector of the color filter substrate inspection apparatus 30a in the present embodiment. In FIG. 7, reference numeral 701a denotes a light emission spectrum characteristic of the red colored pixel (thickness normal part) transmitted light of the color filter substrate 10 to be inspected, and reference numeral 701b denotes a red colored pixel (thickness abnormality part of the color filter substrate 10 to be inspected). ) Emission spectral characteristics of transmitted light, reference numeral 303 indicates an emission spectral characteristic of green colored pixel transmitted light of the color filter substrate 10 to be inspected, and reference numeral 400 indicates a human relative luminous efficiency characteristic curve.

図７に示すように、本実施の形態によるカラーフィルタ基板検査装置３０ａにおいて、被検査カラーフィルタ基板１０から出射される発光スペクトルとしては、青色着色画素１３からの出射光成分はほとんどない（図示せず）。また、緑色着色画素１４から出射される発光スペクトル３０３は、被検査カラーフィルタ基板１０に入射される赤色波長成分の光の発光スペクトルと、被検査カラーフィルタ基板１０の緑色着色画素１４の透過スペクトル特性Ｇ（図３参照）との重なり部分であるため、その出力は小さいものとなる。従って、被検査カラーフィルタ基板１０から出射される発光スペクトルのほとんどは、赤色着色画素１５から出射される発光スペクトル（膜厚正常部７０１ａ、膜厚異常部７０１ｂ）となる。   As shown in FIG. 7, in the color filter substrate inspection apparatus 30a according to the present embodiment, the emission spectrum emitted from the color filter substrate 10 to be inspected has almost no emission light component from the blue colored pixel 13 (not shown). ) The emission spectrum 303 emitted from the green colored pixel 14 includes the emission spectrum of the light of the red wavelength component incident on the color filter substrate 10 to be inspected and the transmission spectrum characteristics of the green colored pixel 14 of the color filter substrate 10 to be inspected. Since it is an overlapping portion with G (see FIG. 3), its output is small. Therefore, most of the emission spectrum emitted from the color filter substrate 10 to be inspected is the emission spectrum (film thickness normal part 701a, film thickness abnormal part 701b) emitted from the red colored pixel 15.

このように、本実施の形態２におけるカラーフィルタ検査工程では、被検査カラーフィルタ基板１０の青色着色画素１３から出射（透過）される青色成分の発光スペクトルはほとんどなく、緑色着色画素１４から出射（透過）される緑色成分の発光スペクトル３０３も非常に微小であり、ほとんどが赤色着色画素１５から出射（透過）される赤色成分の発光スペクトル７０１ａ、７０１ｂとなる。このため、赤色着色画素１５の膜厚異常部（ムラ部分）で見られる透過光のわずかな強弱を、他の青色着色画素１３および緑色着色画素１４からの透過光に邪魔されることなく検査でき、被検査カラーフィルタ基板１０の赤色ムラを容易に精度良く検出することが可能となる。   As described above, in the color filter inspection process according to the second embodiment, there is almost no emission spectrum of the blue component emitted (transmitted) from the blue colored pixel 13 of the color filter substrate 10 to be inspected and emitted from the green colored pixel 14 ( The emission spectrum 303 of the green component that is transmitted) is also very small, and most of the emission spectrum is 701a and 701b of the red component that is emitted (transmitted) from the red colored pixel 15. For this reason, it is possible to inspect the slight intensity of the transmitted light seen in the film thickness abnormality portion (uneven portion) of the red colored pixel 15 without being disturbed by the transmitted light from the other blue colored pixels 13 and the green colored pixels 14. Therefore, it is possible to easily detect the red unevenness of the color filter substrate 10 to be inspected with high accuracy.

さらに、赤色着色画素１５から透過される光のピーク波長領域付近の透過率変動だけでなく、すその部分（低透過率領域）すなわち人の比視感度特性４００において感度の高い波長領域の透過率変動まで検査できるので、赤色着色画素１５のわずかな膜厚変動によって生じる透過率特性の変動に対しても非常に高精度な色ムラ検査が可能となる。   Furthermore, not only the transmittance fluctuation in the vicinity of the peak wavelength region of the light transmitted from the red colored pixel 15 but also the transmittance in the wavelength region where sensitivity is high in the soot portion (low transmittance region), that is, the human relative visual sensitivity characteristic 400. Since even the variation can be inspected, it is possible to perform a highly accurate color unevenness inspection even with respect to the variation in transmittance characteristics caused by a slight variation in film thickness of the red colored pixel 15.

なお、本実施の形態２では、赤色フィルタ基板２０ａの赤色フィルタ層２３ａを、被検査カラーフィルタ基板１０の赤色着色画素１５と同―色材で形成したが、コスト面や生産性を考慮し、必ずしも赤色着色画素１５と同―色材を用いる必要はなく、ほぼ同一の透過スペクトル特性を示すものであればよい。   In the second embodiment, the red filter layer 23a of the red filter substrate 20a is formed of the same color material as the red colored pixels 15 of the color filter substrate 10 to be inspected. However, in consideration of cost and productivity, It is not always necessary to use the same color material as that of the red colored pixel 15, and any material having substantially the same transmission spectrum characteristics may be used.

本発明の表示装置の製造方法は、カラー液晶表示装置およびカラープラズマディスプレイなどの製造方法に利用でき、また本発明の撮像装置の製造方法は、カラー撮像管、CCDカメラなどの製造方法に利用され、それらのカラーフィルタ基板の製造工程において、その品質検査に利用される。また本発明のカラーフィルタ基板の検査装置は、カラー液晶表示装置およびカラープラズマディスプレイなどの表示装置における色発光用カラーフィルタおよびカラー撮像管、CCDカメラなどの撮像装置のおける色分解用カラーフィルタの製造に利用され、それらの品質検査に利用される。   The manufacturing method of the display device of the present invention can be used for a manufacturing method of a color liquid crystal display device and a color plasma display, and the manufacturing method of the imaging device of the present invention is used for a manufacturing method of a color image pickup tube, a CCD camera and the like. The color filter substrate is used for quality inspection in the manufacturing process. The color filter substrate inspection apparatus of the present invention is a color light emission color filter in a display device such as a color liquid crystal display device and a color plasma display, and a color separation color filter in an image pickup device such as a color image pickup tube or a CCD camera. Used for quality inspection.

本発明の実施の形態１であるカラーフィルタ基板検査装置を示す概略図である。It is the schematic which shows the color filter board | substrate inspection apparatus which is Embodiment 1 of this invention. 本発明の実施の形態１における被検査カラーフィルタ基板の構造を示す平面図および断面図である。It is the top view and sectional drawing which show the structure of the to-be-inspected color filter substrate in Embodiment 1 of this invention. 被検査カラーフィルタ基板の青色着色画素、緑色着色画素、赤色着色画素それぞれの透過スペクトル特性を示す図である。It is a figure which shows the transmission spectrum characteristic of each of the blue coloring pixel of a to-be-inspected color filter substrate, a green coloring pixel, and a red coloring pixel. 本発明の本実施の形態１であるカラーフィルタ基板検査装置に用いられる白色光源ランプの発光スペクトル特性を示す図である。It is a figure which shows the emission spectrum characteristic of the white light source lamp used for the color filter board | substrate inspection apparatus which is this Embodiment 1 of this invention. 本発明の本実施の形態１であるカラーフィルタ基板検査装置において白色光源ランプから放射され青色フィルタ基板を通過した光の発光スペクトル特性を示す図である。It is a figure which shows the emission spectrum characteristic of the light radiated | emitted from the white light source lamp and the blue filter board | substrate in the color filter board | substrate inspection apparatus which is this Embodiment 1 of this invention. 本発明の実施の形態１であるカラーフィルタ基板検査装置において、被検査カラーフィルタ基板から出射（透過）された光の発光スペクトル特性を示す図である。It is a figure which shows the emission spectrum characteristic of the light radiate | emitted (transmitted) from the to-be-inspected color filter substrate in the color filter substrate inspection apparatus which is Embodiment 1 of this invention. 本発明の実施の形態２であるカラーフィルタ基板検査装置において、被検査カラーフィルタ基板から出射（透過）された光の発光スペクトル特性を示す図である。It is a figure which shows the emission spectrum characteristic of the light radiate | emitted (transmitted) from the to-be-inspected color filter substrate in the color filter substrate inspection apparatus which is Embodiment 2 of this invention. 従来のカラーフィルタの色ムラ検査方法の一実施例を示す図である。It is a figure which shows one Example of the color nonuniformity inspection method of the conventional color filter. 被検査カラーフィルタ基板の青色着色画素（膜厚正常部、膜厚異常部）の透過スペクトル特性を示す図である。It is a figure which shows the transmission spectrum characteristic of the blue coloring pixel (film thickness normal part, film thickness abnormal part) of a to-be-inspected color filter substrate. 従来のカラーフィルタの色ムラ検査方法における干渉フィルタの透過率特性を示す図である。It is a figure which shows the transmittance | permeability characteristic of the interference filter in the color nonuniformity inspection method of the conventional color filter. 従来のカラーフィルタの色ムラ検査方法において、被検査カラーフィルタ基板から出射（透過）された光の発光スペクトル特性を示す図である。It is a figure which shows the emission spectrum characteristic of the light radiate | emitted (transmitted) from the to-be-inspected color filter board | substrate in the conventional color filter nonuniformity inspection method.

符号の説明Explanation of symbols

１ 白色光源ランプ、２ ハウジング、２ａ 主面、３ 拡散板、
１０ 被検査カラーフィルタ基板、１１ ガラス基板、１２ ブラックマトリクス、
１３ 青色着色画素、１４ 緑色着色画素、１５ 赤色着色画素、
２０ 青色フィルタ基板、２０ａ 赤色フィルタ基板、
２１ ガラス基板、２３ 青色フィルタ層、２３ａ 赤色フィルタ層、
３０、３０ａ カラーフィルタ検査装置、３１ 検査者目視部、３２ 白色面光源、
３３ 干渉フィルタ、１００ 白色光源ランプの発光スペクトル特性、
２００ 白色光源ランプから放射され青色フィルタ基板を通過した光の発光スペクトル特性、
３０１ａ 被検査カラーフィルタ基板の青色着色画素（膜厚正常部）透過光の発光スペクトル特性、
３０１ｂ 被検査カラーフィルタ基板の青色着色画素（膜厚異常部）透過光の発光スペクトル特性、
３０２、３０３ 被検査カラーフィルタ基板の緑色着色画素透過光の発光スペクトル特性、
４００ 人の比視感度特性曲線、５００ 従来例における干渉フィルタの透過率特性、
６０１ａ 従来例における被検査カラーフィルタ基板の青色着色画素（膜厚正常部）透過光の発光スペクトル特性、
６０１ｂ 従来例における被検査カラーフィルタ基板の青色着色画素（膜厚異常部）透過光の発光スペクトル特性、
７０１ａ 被検査カラーフィルタ基板の赤色着色画素（膜厚正常部）透過光の発光スペクトル特性、
７０１ｂ 被検査カラーフィルタ基板の赤色着色画素（膜厚異常部）透過光の発光スペクトル特性。 1 white light source lamp, 2 housing, 2a main surface, 3 diffusion plate,
10 color filter substrate to be inspected, 11 glass substrate, 12 black matrix,
13 blue colored pixels, 14 green colored pixels, 15 red colored pixels,
20 Blue filter substrate, 20a Red filter substrate,
21 glass substrate, 23 blue filter layer, 23a red filter layer,
30, 30a color filter inspection device, 31 inspector viewing part, 32 white surface light source,
33 Interference filter, 100 White light source lamp emission spectrum characteristics,
200 emission spectral characteristics of light emitted from a white light source lamp and passed through a blue filter substrate,
301a Emission spectrum characteristic of transmitted light of blue-colored pixel (film thickness normal part) of the color filter substrate to be inspected,
301b Emission spectrum characteristic of blue colored pixel (film thickness abnormality portion) transmitted light of the color filter substrate to be inspected,
302, 303 Emission spectrum characteristics of green colored pixel transmitted light of the color filter substrate to be inspected,
400 specific visibility characteristics curve, 500 transmittance characteristics of interference filter in the conventional example,
601a Emission spectrum characteristic of transmitted light of a blue colored pixel (thickness normal part) of a color filter substrate to be inspected in a conventional example,
601b The emission spectrum characteristic of the blue color pixel (film thickness abnormality portion) transmitted light of the color filter substrate to be inspected in the conventional example,
701a The emission spectrum characteristic of the transmitted light of the red colored pixel (thickness normal part) of the color filter substrate to be inspected,
701b Emission spectrum characteristics of light transmitted through red colored pixels (film thickness abnormality portion) of the color filter substrate to be inspected.

Claims (5)

複数色の着色画素が規則的に多数配列されたカラーフィルタ基板の色ムラを検査するカラーフィルタ基板の検査工程を含む表示装置の製造方法であって、前記検査工程では、連続スペクトルを有する白色光源と前記カラーフィルタ基板との間に、前記カラーフィルタ基板の着色画素のうち一色とほぼ同一の透過スペクトル特性を有する単色フィルタ基板を設置し、この単色フィルタ基板を介して前記白色光源からの光を前記カラーフィルタ基板に照射して、前記カラーフィルタ基板からの透過光に基づき前記カラーフィルタ基板を検査することを特徴とする表示装置の製造方法。   A method of manufacturing a display device including an inspection process of a color filter substrate for inspecting color unevenness of a color filter substrate in which a large number of colored pixels of a plurality of colors are regularly arranged. In the inspection process, a white light source having a continuous spectrum Between the color filter substrate and the color filter substrate, a monochromatic filter substrate having substantially the same transmission spectral characteristics as one color among the colored pixels of the color filter substrate is installed, and the light from the white light source is transmitted through the monochromatic filter substrate. A method for manufacturing a display device, comprising: irradiating the color filter substrate; and inspecting the color filter substrate based on transmitted light from the color filter substrate. 請求項１記載の表示装置の製造方法であって、前記単色フィルタ基板が青色フィルタ基板であることを特徴とする表示装置の製造方法。   2. The method for manufacturing a display device according to claim 1, wherein the single color filter substrate is a blue filter substrate. 複数色の着色画素が規則的に多数配列されたカラーフィルタ基板の色ムラを検査するカラーフィルタ基板の検査工程を含む撮像装置の製造方法であって、前記検査工程では、連続スペクトルを有する白色光源と前記カラーフィルタ基板との間に、前記カラーフィルタ基板の着色画素のうち一色とほぼ同一の透過スペクトル特性を有する単色フィルタ基板を設置し、この単色フィルタ基板を介して前記白色光源からの光を前記カラーフィルタ基板に照射して、前記カラーフィルタ基板からの透過光に基づき前記カラーフィルタ基板を検査することを特徴とする撮像装置の製造方法。   A method of manufacturing an imaging device including a color filter substrate inspection process for inspecting color unevenness of a color filter substrate in which a large number of colored pixels of a plurality of colors are regularly arranged. In the inspection process, a white light source having a continuous spectrum Between the color filter substrate and the color filter substrate, a monochromatic filter substrate having substantially the same transmission spectral characteristics as one color among the colored pixels of the color filter substrate is installed, and the light from the white light source is transmitted through the monochromatic filter substrate. A method for manufacturing an imaging apparatus, comprising: irradiating the color filter substrate; and inspecting the color filter substrate based on transmitted light from the color filter substrate. 請求項３記載の撮像装置の製造方法であって、前記単色フィルタ基板が青色フィルタ基板であることを特徴とする撮像装置の製造方法。   4. The method of manufacturing an imaging apparatus according to claim 3, wherein the single color filter substrate is a blue filter substrate. 複数色の着色画素が規則的に多数配列されたカラーフィルタ基板の色ムラを検出するカラーフィルタ基板の検査装置であって、連続スペクトルを有する白色光源と、前記白色光源と前記カラーフィルタ基板との間に設置され前記カラーフィルタ基板の着色画素のうち一色とほぼ同一の透過スペクトル特性を有する単色フィルタ基板とを備えたことを特徴とするカラーフィルタ基板の検査装置。   A color filter substrate inspection device for detecting color unevenness of a color filter substrate in which a large number of colored pixels of a plurality of colors are regularly arranged, comprising: a white light source having a continuous spectrum; and the white light source and the color filter substrate. An inspection apparatus for a color filter substrate, comprising: a single color filter substrate that is installed between the color filter substrates and has a transmission spectrum characteristic substantially the same as that of one color among the colored pixels of the color filter substrate.
JP2003389577A 2003-11-19 2003-11-19 Display device manufacturing method, image pickup device manufacturing method and inspection device for color filter substrate used for these Pending JP2005148637A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101391448B1 (en) * 2007-02-15 2014-05-07 주식회사 동진쎄미켐 System for testing a flat panel display device and mehtod thereof
WO2022024968A1 (en) * 2020-07-29 2022-02-03 富士フイルム株式会社 Device and film thickness variation inspection method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101391448B1 (en) * 2007-02-15 2014-05-07 주식회사 동진쎄미켐 System for testing a flat panel display device and mehtod thereof
WO2022024968A1 (en) * 2020-07-29 2022-02-03 富士フイルム株式会社 Device and film thickness variation inspection method
JPWO2022024968A1 (en) * 2020-07-29 2022-02-03

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