JP2005133029A - Transparent composite film and display device using the same - Google Patents

Transparent composite film and display device using the same Download PDF

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JP2005133029A
JP2005133029A JP2003373169A JP2003373169A JP2005133029A JP 2005133029 A JP2005133029 A JP 2005133029A JP 2003373169 A JP2003373169 A JP 2003373169A JP 2003373169 A JP2003373169 A JP 2003373169A JP 2005133029 A JP2005133029 A JP 2005133029A
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composite sheet
transparent composite
transparent
release agent
glass
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JP2005133029A5 (en
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Hiroshige Nakagawa
裕茂 中川
Masaru Ota
賢 太田
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Sumitomo Bakelite Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a transparent composite sheet that has high surface smoothness, low linear expansion coefficient and excellent transparency and can be used as an optical sheet, a plastic substrate for display element and a substrate for active matrix display element. <P>SOLUTION: The transparent composite sheet contains (a) a transparent resin, (b) an inorganic filler, and (c) a mold releasing agent wherein the mold releasing agent has repeating units represented by general formulas (1) and (2) and the surface roughness (Ry) of the composite sheet is ≤1 μm. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は高い表面平滑性を有し、線膨張係数が小さく、透明性、耐熱性、耐溶剤性に優れ、ガラスに代替可能な透明複合シートに関する。   The present invention relates to a transparent composite sheet having high surface smoothness, a small coefficient of linear expansion, excellent transparency, heat resistance and solvent resistance, and capable of replacing glass.

一般に、液晶表示素子用基板、カラーフィルター基板、有機EL表示素子用基板、太陽電池用基板等としては、ガラス板が多く用いられている。しかし、割れ易い、曲げられない、比重が大きく軽量化に不向き等の問題から、近年、ガラス板の代わりにプラスチック素材を用いる試みが数多く行われるようになってきた。例えば、特許文献1や特許文献2には、エポキシ樹脂、酸無水物系硬化剤及び硬化触媒を含むエポキシ樹脂組成物を硬化して得られる硬化体からなる液晶表示素子用透明樹脂基板が記載されている。
しかしながら、従来のガラス代替用プラスチック材料は、線膨張係数が大きいため、例えばアクティブマトリックス表示素子基板に用いるとその製造工程において反りやアルミ配線の断線などの問題が生じ、適用が困難である。そこで、線膨張係数を低減するために樹脂と同等の屈折率を有するガラス繊維布等の無機フィラーを樹脂と複合化することがよく行われている。
表示装置に用いられるプラスチック基板には表面平滑性が求められる。特に表示装置に用いる場合は基板上に直接半導体素子を書き込むこともあり1μmレベルでの平滑性が求められているが、ガラス繊維布に樹脂を含侵あるいは塗布して乾燥、硬化させる際、樹脂の硬化収縮により硬化後の基板の表面は繊維布の凹凸を反映し、表面形状は粗くなる。そこで、プレス等、転写材を使用して平滑面を転写することが行われるが、転写材とプラスチック基板の表面が強力に接着し、転写材にプラスチック基板の表面の一部が取られてしまい表面形状が粗くなる。これを解決するため、一般にフッ素系離型剤やシリコーン系離型剤等により、離型処理を行うが、これらの方法では基板表面の平滑性が十分ではなかった。
In general, glass plates are often used as substrates for liquid crystal display elements, color filter substrates, organic EL display element substrates, solar cell substrates, and the like. However, in recent years, many attempts have been made to use a plastic material instead of a glass plate because of problems such as being easily broken, not being bent, having a large specific gravity, and not suitable for weight reduction. For example, Patent Document 1 and Patent Document 2 describe a transparent resin substrate for a liquid crystal display element comprising a cured product obtained by curing an epoxy resin composition containing an epoxy resin, an acid anhydride curing agent, and a curing catalyst. ing.
However, since the conventional plastic material for glass substitute has a large linear expansion coefficient, for example, when it is used for an active matrix display element substrate, problems such as warpage and disconnection of aluminum wiring occur in its manufacturing process, and it is difficult to apply. Therefore, in order to reduce the linear expansion coefficient, an inorganic filler such as a glass fiber cloth having a refractive index equivalent to that of the resin is often combined with the resin.
Surface smoothness is required for a plastic substrate used in a display device. In particular, when used in a display device, a semiconductor element may be directly written on a substrate and smoothness at the 1 μm level is required. However, when a resin is impregnated or applied to a glass fiber cloth and dried and cured, the resin Due to the curing shrinkage, the surface of the substrate after curing reflects the unevenness of the fiber cloth, and the surface shape becomes rough. Therefore, a smooth surface is transferred using a transfer material such as a press, but the transfer material and the surface of the plastic substrate are strongly bonded, and a part of the surface of the plastic substrate is taken up by the transfer material. The surface shape becomes rough. In order to solve this, release treatment is generally performed with a fluorine-type release agent, a silicone-type release agent, or the like, but the smoothness of the substrate surface is not sufficient with these methods.

特開平6−337408号公報JP-A-6-337408 特開平7−210740号公報Japanese Patent Laid-Open No. 7-210740

本発明は、高い表面平滑性を有し、低線膨張係数で透明性、耐熱性、耐溶剤性に優れ、透明板、光学レンズ、液晶表示素子用プラスチック基板、カラーフィルター用基板、有機EL表示素子用プラスチック基板、太陽電池基板、タッチパネル、光学素子、光導波路、LED封止材等に好適に用いられる透明複合シートを提供し、これを用いた表示素子用基板、表示素子を提供することを目的とするものである。   The present invention has high surface smoothness, low linear expansion coefficient, excellent transparency, heat resistance and solvent resistance, transparent plate, optical lens, liquid crystal display element plastic substrate, color filter substrate, organic EL display To provide a transparent composite sheet suitably used for a plastic substrate for an element, a solar cell substrate, a touch panel, an optical element, an optical waveguide, an LED sealing material, and the like, and to provide a display element substrate and a display element using the same. It is the purpose.

上記目的は、下記(1)〜(7)記載の本発明により達成される。
(1) 透明樹脂(a)と無機フィラー(b)と離型剤(c)とを含む透明複合シートであって、離型剤(c)が下記の一般式(1)及び(2)に示される繰り返し単位を有することを特徴とする、表面粗さ(Ry)が1μm以下である透明複合シート。

Figure 2005133029
Figure 2005133029
(2) 離型剤(c)の一般式(2)で表わされる構造部分の重量割合が離型剤(c)の分子全体の20〜80重量%である(1)の透明複合シート。
(3) 離型剤(c)の数平均分子量が500〜2500である(1)、(2)の透明複合シート。
(4) 無機フィラー(b)がガラス繊維布である(1)〜(3)の透明複合シート。
(5) 波長550nmにおける光線透過率が80%以上である(1)〜(4)の透明複合シート。
(6) 30〜150℃の平均線膨張係数が40ppm以下である(1)〜(5)の透明複合シート。
(7) (1)〜(6)の透明複合シートを利用した表示素子用基板。
(8) (1)〜(6)の透明複合シートを利用した表示素子。 The above object is achieved by the present invention described in the following (1) to (7).
(1) A transparent composite sheet comprising a transparent resin (a), an inorganic filler (b), and a release agent (c), wherein the release agent (c) is represented by the following general formulas (1) and (2) A transparent composite sheet having a surface roughness (Ry) of 1 μm or less, characterized by having the repeating units shown.
Figure 2005133029
Figure 2005133029
(2) The transparent composite sheet according to (1), wherein the weight ratio of the structural portion represented by the general formula (2) of the release agent (c) is 20 to 80% by weight of the whole molecule of the release agent (c).
(3) The transparent composite sheet according to (1) or (2), wherein the release agent (c) has a number average molecular weight of 500 to 2500.
(4) The transparent composite sheet according to (1) to (3), wherein the inorganic filler (b) is a glass fiber cloth.
(5) The transparent composite sheet according to any one of (1) to (4), wherein the light transmittance at a wavelength of 550 nm is 80% or more.
(6) The transparent composite sheet according to (1) to (5), wherein an average linear expansion coefficient at 30 to 150 ° C. is 40 ppm or less.
(7) A display element substrate using the transparent composite sheet of (1) to (6).
(8) A display element using the transparent composite sheet of (1) to (6).

本発明により得られる表面平滑な複合複合シートは、光学シート、表示素子用プラスチック基板又はアクティブマトリックス表示素子用基板として好適に用いることができる。   The smooth composite composite sheet obtained by the present invention can be suitably used as an optical sheet, a plastic substrate for a display element, or a substrate for an active matrix display element.

本発明中の透明樹脂(a)とは、可視光線の透過性を有する樹脂を示す。本発明の透明樹脂の透明性は、シートにした際の550nmでの光線透過率が80%以上のものが好ましく、より好ましくは85%以上、最も好ましくは90%以上である。表示素子用基板として用いる場合には、85%以上が好ましい。例としては、エポキシ樹脂などの熱硬化性樹脂、アクリレートなどの反応性モノマーを活性エネルギー線で架橋させた樹脂などがあげられ、耐溶剤性に優れていることからアクリレートやエポキシ樹脂などの反応性モノマーを活性エネルギー線および/または熱によって架橋させた樹脂が好ましい。反応性モノマーとしては、熱や活性エネルギー線で架橋させることができるものであれば特に制限されないが、透明性や耐熱性の面から2つ以上の官能基を有する(メタ)アクリレートや2つ以上の官能基を有するエポキシ樹脂が好ましく、特に2つ以上の官能基を有する(メタ)アクリレートが好ましい。これら樹脂は、単独で用いても2種以上を併用してもよい。 The transparent resin (a) in the present invention refers to a resin having visible light transparency. The transparency of the transparent resin of the present invention is preferably such that the light transmittance at 550 nm when formed into a sheet is 80% or more, more preferably 85% or more, and most preferably 90% or more. When used as a display element substrate, 85% or more is preferable. Examples include thermosetting resins such as epoxy resins, resins obtained by crosslinking reactive monomers such as acrylates with active energy rays, etc., and because of their excellent solvent resistance, reactivity such as acrylates and epoxy resins. A resin obtained by crosslinking a monomer with active energy rays and / or heat is preferable. The reactive monomer is not particularly limited as long as it can be cross-linked by heat or active energy rays, but (meth) acrylate having two or more functional groups or two or more from the viewpoint of transparency and heat resistance. An epoxy resin having a functional group is preferable, and (meth) acrylate having two or more functional groups is particularly preferable. These resins may be used alone or in combination of two or more.

本発明で用いる無機フィラー(b)としては、ガラス繊維、ガラスクロス、ガラス不織布、ガラスビーズ、ガラスフレーク、ガラスパウダー、ミルドガラスなどがあげられ、中でも線膨張係数の低減効果が高いことから、ガラス繊維、ガラスクロス、ガラス不織布が好ましく、ガラスクロスが最も好ましい。繊維の厚みは特に限定されるものではないが、30〜300μmであることが好ましい。ガラスの種類としては、Eガラス、Cガラス、Aガラス、Sガラス、Dガラス、NEガラス、Tガラスなどがあげられ、中でもアルカリ金属が少ないEガラス、Sガラス、Tガラス、NEガラスが好ましい。ガラスフィラー(b)の屈折率は特に制限されないが、透明樹脂(a)の架橋後の屈折率と近い値を示し、透明複合シートが優れた透明性を示す程度である必要がある。
無機フィラー(b)の含有量は、1〜90重量%が好ましく、より好ましくは10〜80重量%、さらに好ましくは30〜70重量%である。ガラスフィラーの含有量がこの範囲であれば、成形し易く、複合化による低線膨張化の効果が認められる。
本発明においては、無機フィラーと樹脂とが密着しているほど、本発明の複合体組成物の透明性が良くなるため、無機フィラー表面をシランカップリング剤などの公知の表面処理剤で処理することが好ましい。シランカップリング剤としては、エポキシシランカップリング剤、チタネート系カップリング剤、アミノシランカップリング剤及びシリコーンオ
イル型カップリング剤等が挙げられ、これらを単独で用いても数種複合して用いてもよい。
Examples of the inorganic filler (b) used in the present invention include glass fiber, glass cloth, glass nonwoven fabric, glass beads, glass flakes, glass powder, and milled glass. Fiber, glass cloth and glass nonwoven fabric are preferred, and glass cloth is most preferred. Although the thickness of a fiber is not specifically limited, It is preferable that it is 30-300 micrometers. Examples of the glass include E glass, C glass, A glass, S glass, D glass, NE glass, and T glass. Among them, E glass, S glass, T glass, and NE glass with few alkali metals are preferable. The refractive index of the glass filler (b) is not particularly limited, but needs to be a value that is close to the refractive index after crosslinking of the transparent resin (a) and that the transparent composite sheet exhibits excellent transparency.
The content of the inorganic filler (b) is preferably 1 to 90% by weight, more preferably 10 to 80% by weight, and still more preferably 30 to 70% by weight. If the content of the glass filler is within this range, it is easy to mold, and the effect of low linear expansion by compounding is recognized.
In the present invention, as the inorganic filler and the resin are in close contact with each other, the transparency of the composite composition of the present invention is improved. Therefore, the surface of the inorganic filler is treated with a known surface treatment agent such as a silane coupling agent. It is preferable. Examples of the silane coupling agent include an epoxy silane coupling agent, a titanate coupling agent, an aminosilane coupling agent, and a silicone oil type coupling agent. These may be used alone or in combination. Good.

本発明で用いる離型剤(c)について説明する。本発明に使用される離型剤(c)は200℃以上の温度でプレスしても、プレス後、転写材の表面平滑性を転写して透明基板を離型させる機能と、混入しても透明基板としての透明性を維持することが要求される。離型性が維持されていないと転写材から基板をはがす際に基板表面の樹脂が転写材にとられてしまい、基板表面の平滑性が損なわれるため好ましくない。これらの機能を併せ持つものとして、一般式(1)及び(2)に示される繰り返し単位を有する離型剤が好ましい。

Figure 2005133029
Figure 2005133029
また、耐熱性向上と離型性向上のため、分子量は大きい方が好ましい、具体的には数平均分子量500〜2500が好ましく、更に一般式(2)で表わされる構造部分の重量割合は分子全体の20〜80重量%であることが好ましい。数平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)で測定し、ポリスチレン換算で求めることができ、一般式(2)で表わされる構造部分の重量割合は核磁気共鳴スペクトル(NMP)にて求めることができる。離型剤の含有率は、透明樹脂との混合比で0.05〜15重量%が好ましく、更に好ましくは0.5〜5重量%である。
一般式(1)及び一般式(2)で表わされる構造部分は分子内に連続して存在しても良いし、不連続で存在してもよい。さらに、一般式(1)及び一般式(2)で表わされる構造部分はそれぞれ1個だけでなく複数個あっても良い。
また、上記一般式(1)および上記一般式(2)で表わされる構造以外に、離型剤を構成する単位としてはアルキル基、アルキレン基、カルボキシル基、エステル結合、ケトン結合、ベンゼン環、水素原子、金属原子等があげられる。ただし、上記離型剤において、上記一般式(1)および上記一般式(2)で表わされる構造部分が占める重量割合は通常、70〜99重量%である。 The release agent (c) used in the present invention will be described. The release agent (c) used in the present invention may be pressed at a temperature of 200 ° C. or higher, or may be mixed with the function of releasing the transparent substrate by transferring the surface smoothness of the transfer material after pressing. It is required to maintain transparency as a transparent substrate. If the releasability is not maintained, the resin on the substrate surface is taken off by the transfer material when the substrate is peeled off from the transfer material, and the smoothness of the substrate surface is impaired. As those having these functions, a release agent having a repeating unit represented by the general formulas (1) and (2) is preferable.
Figure 2005133029
Figure 2005133029
In order to improve heat resistance and mold releasability, it is preferable that the molecular weight is large. Specifically, the number average molecular weight is preferably 500 to 2500, and the weight ratio of the structural portion represented by the general formula (2) is the whole molecule. It is preferable that it is 20 to 80 weight%. The number average molecular weight can be determined by gel permeation chromatography (GPC) and determined in terms of polystyrene, and the weight ratio of the structural portion represented by the general formula (2) can be determined by nuclear magnetic resonance spectrum (NMP). Can do. The content of the release agent is preferably 0.05 to 15% by weight, more preferably 0.5 to 5% by weight, in terms of the mixing ratio with the transparent resin.
The structural parts represented by the general formula (1) and the general formula (2) may exist continuously or discontinuously in the molecule. Further, the number of structural parts represented by the general formula (1) and the general formula (2) may be not only one but also a plurality.
In addition to the structures represented by the general formulas (1) and (2), the units constituting the release agent include alkyl groups, alkylene groups, carboxyl groups, ester bonds, ketone bonds, benzene rings, hydrogen An atom, a metal atom, etc. are mention | raise | lifted. However, in the release agent, the weight ratio of the structural parts represented by the general formula (1) and the general formula (2) is usually 70 to 99% by weight.

複合透明シートの成形方法には制限がなく、例えば、エポキシ樹脂とガラスフィラーとを直接混合し、必要な型に注型したのち架橋させる方法、エポキシ樹脂を溶剤に溶解し、ガラスフィラーを分散させ、キャストした後、架橋させる方法、エポキシ樹脂をガラスクロスやガラス不織布に含浸させたのち架橋させる方法などが挙げられる。   There are no restrictions on the method of forming the composite transparent sheet. For example, a method in which an epoxy resin and a glass filler are directly mixed, cast into a required mold and then crosslinked, an epoxy resin is dissolved in a solvent, and the glass filler is dispersed. And a method of crosslinking after casting, a method of crosslinking after impregnating a glass cloth or a glass nonwoven fabric with an epoxy resin, and the like.

本発明における透明複合シートの表面粗さ(Ry)は1μm以下であることが好ましく、より好ましくは0.8μm以下、さらに好ましくは0.5μm以下である。透明複合シートがこれより粗い場合は、シートに接触している液晶部分に厚みムラを生じ、表示不良の問題が起こりうる。   The surface roughness (Ry) of the transparent composite sheet in the present invention is preferably 1 μm or less, more preferably 0.8 μm or less, and further preferably 0.5 μm or less. When the transparent composite sheet is coarser than this, thickness unevenness occurs in the liquid crystal portion in contact with the sheet, which may cause a problem of display failure.

本発明の複合透明シートを、透明板、光学レンズ、液晶表示素子用プラスチック基板、カラーフィルター用基板、有機EL表示素子用プラスチック基板、太陽電池基板、タッチパネル、光学素子、光導波路、LED封止材等として用いる場合は、波長550nmの光線透過率が80%以上であることが好ましく、さらに好ましくは、85%以上である。波長550nmの光線透過率が80%以下の場合は、光を利用する効率が低下するので、光
効率が重要な用途には好ましくない。
The composite transparent sheet of the present invention is made of a transparent plate, an optical lens, a plastic substrate for a liquid crystal display element, a substrate for a color filter, a plastic substrate for an organic EL display element, a solar cell substrate, a touch panel, an optical element, an optical waveguide, and an LED sealing material. When used as a light source, the light transmittance at a wavelength of 550 nm is preferably 80% or more, and more preferably 85% or more. When the light transmittance at a wavelength of 550 nm is 80% or less, the efficiency of using light is lowered, which is not preferable for applications where light efficiency is important.

本発明の透明複合シートを、透明板、光学レンズ、液晶表示素子用プラスチック基板、カラーフィルター用基板、有機EL表示素子用プラスチック基板、太陽電池基板、タッチパネル、光学素子、光導波路、LED封止材等として用いる場合は、30〜150℃の平均線膨張係数が40ppm以下であることが好ましく、より好ましくは30ppm以下、最も好ましくは20ppm以下である。例えば、この複合体組成物をアクティブマトリックス表示素子基板に用いた場合、この上限値を越えると、その製造工程において反りやアルミ配線の断線などの問題が生じる恐れがある。
本発明の透明複合シートは、平滑性を向上させるために両面に樹脂のコート層を設けても良い。コートする樹脂としては、優れた透明性、耐熱性、耐薬品性を有していることが好ましく、具体的には多官能アクリレートやエポキシ樹脂などをあげることができる。コートする樹脂の厚みとしては、0.1〜50μmが好ましく、0.5〜30μmがより好ましい。
本発明の透明複合シートは、必要に応じて水蒸気や酸素に対するガスバリア層や透明電極層を設けても良い。
また、本発明の透明複合シート中には、必要に応じて、透明性、耐溶剤性、耐熱性等の特性を損なわない範囲で、少量の酸化防止剤、紫外線吸収剤、染顔料、他の無機フィラー等の充填剤等を含んでいても良い。
The transparent composite sheet of the present invention is made of a transparent plate, an optical lens, a plastic substrate for a liquid crystal display element, a substrate for a color filter, a plastic substrate for an organic EL display element, a solar cell substrate, a touch panel, an optical element, an optical waveguide, and an LED sealing material. In the case of using as such, the average linear expansion coefficient at 30 to 150 ° C. is preferably 40 ppm or less, more preferably 30 ppm or less, and most preferably 20 ppm or less. For example, when this composite composition is used for an active matrix display element substrate, if this upper limit is exceeded, problems such as warpage and disconnection of aluminum wiring may occur in the manufacturing process.
The transparent composite sheet of the present invention may be provided with a resin coating layer on both sides in order to improve smoothness. The resin to be coated preferably has excellent transparency, heat resistance and chemical resistance, and specific examples include polyfunctional acrylates and epoxy resins. As thickness of resin to coat, 0.1-50 micrometers is preferred and 0.5-30 micrometers is more preferred.
The transparent composite sheet of the present invention may be provided with a gas barrier layer or a transparent electrode layer against water vapor or oxygen as necessary.
In the transparent composite sheet of the present invention, if necessary, a small amount of antioxidant, ultraviolet absorber, dye / pigment, and the like, as long as the properties such as transparency, solvent resistance and heat resistance are not impaired. It may contain a filler such as an inorganic filler.

以下、本発明の内容を実施例により詳細に説明するが、本発明は、その要旨を越えない限り以下の例に限定されるものではない。
(実施例)
脂環式エポキシ樹脂(ダイセル化学工業製EHPE3150)80重量部、ビスフェノールS型エポキシ樹脂(大日本インキ化学工業製エピクロンEXA1514)20重量部、メチルヘキサヒドロ無水フタル酸(新日本理化製リカシッドMH−700)75重量部、テトラフェニルホスホニウムブロマイド(北興化学工業製TPP−PB)0.5重量部を混合したものを透明樹脂とし、透明樹脂100重量部に対して、下記離型剤を表1に示す割合で混合してワニスとした。これを、厚さ80μmのNEガラス系ガラスクロス(日東紡績製NEA2319E)を焼きだしして有機物を除去した後、γ−グリシドキシプロピルトリメトキシシラン(エポキシシラン)で処理したものに含侵し、140℃で3分間乾燥した後、離型処理しないガラス板に挟み込み、真空プレス機を用いて30kg/cmの圧力でプレスしながら200℃で2時間硬化させ、厚さ0.1mmの透明複合シートを得た。
(比較例)
脂環式エポキシ樹脂(ダイセル化学工業製EHPE3150)80重量部、ビスフェノールS型エポキシ樹脂(大日本インキ化学工業製エピクロンEXA1514)20重量部、メチルヘキサヒドロ無水フタル酸(新日本理化製リカシッドMH−700)75重量部、テトラフェニルホスホニウムブロマイド(北興化学工業製TPP−PB)0.5重量部を混合したものを透明樹脂として混合してワニスとした。これを、厚さ80μmのNEガラス系ガラスクロス(日東紡績製NEA2319E)を焼きだしして有機物を除去した後、γ−グリシドキシプロピルトリメトキシシラン(エポキシシラン)で処理したものに含侵し、140℃で3分間乾燥した後、離型剤(4)または離型剤(5)を転写材の転写面にスプレーして離型処理したガラス板に挟み込み、真空プレス機を用いて30kg/cmの圧力でプレスしながら200℃で2時間硬化させ、厚さ0.1mmの透明複合シートを得た。
離型剤(1):長鎖状アルキル基とポリエチレングリコールからなるポリエチレン系離型剤
東洋ペトロライト社製ユニトックス TM420 (数平均分子量:560、エチレンオキサイド含有量:20重量%)
離型剤(2):長鎖状アルキル基とポリエチレングリコールからなるポリエチレン系離型剤
東洋ペトロライト社製ユニトックス TM450 (数平均分子量:900、エチレンオキサイド含有量:50重量%)
離型剤(3):長鎖状アルキル基とポリエチレングリコールからなるポリエチレン系離型剤
東洋ペトロライト社製ユニトックス TM480 (数平均分子量:2250、エチレンオキサイド含有量:80重量%)
離型剤(4):フッ素系離型剤 ダイキン工業製ダイフリー GA−6010(スプレー式

離型剤(5):高温用シリコーン系離型剤 信越化学工業製 KF965SP(スプレー式
Hereinafter, the contents of the present invention will be described in detail by way of examples. However, the present invention is not limited to the following examples unless it exceeds the gist.
(Example)
80 parts by weight of an alicyclic epoxy resin (EHPE3150 manufactured by Daicel Chemical Industries), 20 parts by weight of a bisphenol S type epoxy resin (Epiclon EXA1514 manufactured by Dainippon Ink and Chemicals), methylhexahydrophthalic anhydride (Rikacid MH-700 manufactured by Shin Nippon Chemical Co., Ltd.) ) 75 parts by weight and a mixture of 0.5 parts by weight of tetraphenylphosphonium bromide (TPP-PB manufactured by Hokuko Chemical Co., Ltd.) is used as a transparent resin. The varnish was prepared by mixing at a ratio. This was impregnated with the one treated with γ-glycidoxypropyltrimethoxysilane (epoxysilane) after baking organic glass cloth (NEA2319E manufactured by Nittobo Co., Ltd.) having a thickness of 80 μm to remove organic matter. After drying at 140 ° C. for 3 minutes, it is sandwiched between glass plates that are not demolded and cured at 200 ° C. for 2 hours while pressing at a pressure of 30 kg / cm 2 using a vacuum press machine. A sheet was obtained.
(Comparative example)
80 parts by weight of an alicyclic epoxy resin (EHPE3150 manufactured by Daicel Chemical Industries), 20 parts by weight of a bisphenol S type epoxy resin (Epiclon EXA1514 manufactured by Dainippon Ink and Chemicals), methylhexahydrophthalic anhydride (Rikacid MH-700 manufactured by Shin Nippon Chemical Co., Ltd.) ) 75 parts by weight and 0.5 parts by weight of tetraphenylphosphonium bromide (TPP-PB manufactured by Hokuko Chemical Co., Ltd.) were mixed as a transparent resin to obtain a varnish. This was impregnated with the one treated with γ-glycidoxypropyltrimethoxysilane (epoxysilane) after baking organic glass cloth (NEA2319E manufactured by Nittobo Co., Ltd.) having a thickness of 80 μm to remove organic matter. After drying at 140 ° C for 3 minutes, the release agent (4) or release agent (5) is sprayed onto the transfer surface of the transfer material and sandwiched between the release-treated glass plates, and 30 kg / cm using a vacuum press. While pressing at a pressure of 2, the composition was cured at 200 ° C. for 2 hours to obtain a transparent composite sheet having a thickness of 0.1 mm.
Release agent (1): Polyethylene release agent consisting of a long-chain alkyl group and polyethylene glycol
Unitox TM420 manufactured by Toyo Petrolite Co., Ltd. (number average molecular weight: 560, ethylene oxide content: 20% by weight)
Release agent (2): Polyethylene release agent consisting of a long-chain alkyl group and polyethylene glycol
Unitox TM450 manufactured by Toyo Petrolite Co., Ltd. (number average molecular weight: 900, ethylene oxide content: 50% by weight)
Release agent (3): Polyethylene release agent consisting of a long-chain alkyl group and polyethylene glycol
Unitox TM480 manufactured by Toyo Petrolite Co., Ltd. (number average molecular weight: 2250, ethylene oxide content: 80% by weight)
Release agent (4): Fluorine-based release agent Daikin Industries' Die Free GA-6010 (spray type)
Release agent (5): High temperature silicone release agent KF965SP (spray type) manufactured by Shin-Etsu Chemical Co., Ltd.

以上のようにして作製した透明複合シートについて、下記に示す評価方法により、各種特性を測定し、結果を表1に示した。
a)表面粗さ(Ry)
zygo社製干渉計を用いて透明複合シートの表面粗さ(Ry)を測定した。
b)平均線膨張係数
セイコー電子(株)製TMA/SS120C型熱応力歪測定装置を用いて、窒素雰囲気下、1分間に5℃の割合で温度を30℃から400℃まで上昇させて20分間保持し、30℃〜150℃の時の値を測定して求めた。荷重を5gにし、引張モードで測定を行った。測定は、独自に設計した石英引張チャック(材質:石英,線膨張係数0.5ppm)を用
いた。一般に使われているインコネル製のチャックは、それ自体の線膨張が高いことやサンプルの支持形態に不具合があり、100μmを超える厚いシートに適用すると線膨張係数が圧縮モードで測定した結果よりも大きくなったり、測定ばらつきが大きくなる問題があった。したがって、石英引張チャックを独自に設計し、それを用いて線膨張係数を測定することにした。この引張チャックを用いることにより、圧縮モードで測定した場合とほぼ同様の値で測定できることを確認している。
c)光線透過率
分光光度計U3200(日立製作所製)で550nmの光線透過率を測定した。
d)プレス後の透明複合シートと転写材の剥がれやすさ
転写材から剥がしやすい場合は“○”、剥がしにくい場合は“×”とした。
With respect to the transparent composite sheet produced as described above, various characteristics were measured by the following evaluation method, and the results are shown in Table 1.
a) Surface roughness (Ry)
The surface roughness (Ry) of the transparent composite sheet was measured using a zygo interferometer.
b) Average coefficient of linear expansion Using a TMA / SS120C type thermal stress strain measuring device manufactured by Seiko Electronics Co., Ltd., increasing the temperature from 30 ° C. to 400 ° C. at a rate of 5 ° C. for 1 minute in a nitrogen atmosphere for 20 minutes. It hold | maintained and measured and calculated | required the value at the time of 30 to 150 degreeC. The load was 5 g and the measurement was performed in the tensile mode. For the measurement, an independently designed quartz tension chuck (material: quartz, coefficient of linear expansion 0.5 ppm) was used. Commonly used Inconel chucks have high linear expansion per se and defects in the sample support form. When applied to thick sheets exceeding 100 μm, the linear expansion coefficient is larger than the result measured in the compression mode. There was a problem that the measurement variation became large. Therefore, we decided to design a quartz tensile chuck and use it to measure the linear expansion coefficient. By using this tension chuck, it has been confirmed that it can be measured with a value almost the same as that measured in the compression mode.
c) Light transmittance The light transmittance at 550 nm was measured with a spectrophotometer U3200 (manufactured by Hitachi, Ltd.).
d) Ease of peeling of the transparent composite sheet and the transfer material after pressing “O” when easy to peel off from the transfer material, and “X” when difficult to peel off.

Figure 2005133029
Figure 2005133029

本発明の透明複合シートは従来の機能を損なわずに、良好な平滑性を有する透明複合シートであり、例えば、液晶表示用基板、有機EL表示素子基板、カラーフィルター用基板、タッチパネル用基板、太陽電池基板などの光学シート、透明板、光学レンズ、光学素子、光導波路、LED封止材等に好適に用いることができる。
特に、表示素子用プラスチック基板又はアクティブマトリックス表示素子用基板用途の透明複合シートとして有用である。
The transparent composite sheet of the present invention is a transparent composite sheet having good smoothness without impairing conventional functions. For example, a liquid crystal display substrate, an organic EL display element substrate, a color filter substrate, a touch panel substrate, the sun It can be suitably used for optical sheets such as battery substrates, transparent plates, optical lenses, optical elements, optical waveguides, LED sealing materials and the like.
In particular, it is useful as a transparent composite sheet for use as a plastic substrate for display elements or a substrate for active matrix display elements.

Claims (8)

透明樹脂(a)と無機フィラー(b)と離型剤(c)とを含む透明複合シートであって、離型剤(c)が下記の一般式(1)及び(2)に示される繰り返し単位を有することを特徴とする、表面粗さ(Ry)が1μm以下である透明複合シート。
Figure 2005133029
Figure 2005133029
A transparent composite sheet comprising a transparent resin (a), an inorganic filler (b), and a release agent (c), wherein the release agent (c) is represented by the following general formulas (1) and (2) A transparent composite sheet having a surface roughness (Ry) of 1 μm or less, comprising units.
Figure 2005133029
Figure 2005133029
離型剤(c)の一般式(2)で表わされる構造部分の重量割合が離型剤(c)の分子全体の20〜80重量%である請求項1記載の透明複合シート。 The transparent composite sheet according to claim 1, wherein the weight ratio of the structural portion represented by the general formula (2) of the release agent (c) is 20 to 80% by weight of the whole molecule of the release agent (c). 離型剤(c)の数平均分子量が500〜2500である請求項1または2記載の透明複合シート。 The transparent composite sheet according to claim 1 or 2, wherein the release agent (c) has a number average molecular weight of 500 to 2500. 無機フィラー(b)がガラス繊維布である請求項1〜3のいずれか1項記載の透明複合シート。 The transparent composite sheet according to any one of claims 1 to 3, wherein the inorganic filler (b) is a glass fiber cloth. 波長550nmにおける光線透過率が80%以上である請求項1〜4のいずれか1項記載の透明複合シート。 The transparent composite sheet according to any one of claims 1 to 4, wherein the light transmittance at a wavelength of 550 nm is 80% or more. 30〜150℃の平均線膨張係数が40ppm以下である請求項1〜5のいずれか1項記載の透明複合シート。 The transparent composite sheet according to any one of claims 1 to 5, wherein an average linear expansion coefficient at 30 to 150 ° C is 40 ppm or less. 請求項1〜6のいずれか1項記載の透明複合シートを利用した表示素子用基板。 A display element substrate using the transparent composite sheet according to claim 1. 請求項1〜6のいずれか1項記載の透明複合シートを利用した表示素子。 The display element using the transparent composite sheet of any one of Claims 1-6.
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JP2009191170A (en) * 2008-02-14 2009-08-27 Nitto Denko Corp Epoxy resin composition for sealing optical semiconductor element and optical semiconductor device using the same
JP2012025935A (en) * 2010-06-25 2012-02-09 Sumitomo Bakelite Co Ltd Resin composition, transparent composite substrate, and display element substrate

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JPH10292091A (en) * 1997-04-18 1998-11-04 Nippon Kayaku Co Ltd Epoxy resin composition and cured item thereof
JPH11106609A (en) * 1997-09-30 1999-04-20 Matsushita Electric Works Ltd Resin composition for sealing use
JPH11241002A (en) * 1998-02-24 1999-09-07 Matsushita Electric Works Ltd Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewith
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WO2003064530A1 (en) * 2002-01-25 2003-08-07 Sumitomo Bakelite Co., Ltd. Transparent composite composition

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JPH01217007A (en) * 1988-02-23 1989-08-30 Petrolite Corp Terminal functionalized low molecular weight polymer of ethylene
JPH10292091A (en) * 1997-04-18 1998-11-04 Nippon Kayaku Co Ltd Epoxy resin composition and cured item thereof
JPH11106609A (en) * 1997-09-30 1999-04-20 Matsushita Electric Works Ltd Resin composition for sealing use
JPH11241002A (en) * 1998-02-24 1999-09-07 Matsushita Electric Works Ltd Epoxy resin composition for semiconductor sealing and semiconductor device sealed therewith
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WO2003064530A1 (en) * 2002-01-25 2003-08-07 Sumitomo Bakelite Co., Ltd. Transparent composite composition

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* Cited by examiner, † Cited by third party
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JP2009191170A (en) * 2008-02-14 2009-08-27 Nitto Denko Corp Epoxy resin composition for sealing optical semiconductor element and optical semiconductor device using the same
JP2012025935A (en) * 2010-06-25 2012-02-09 Sumitomo Bakelite Co Ltd Resin composition, transparent composite substrate, and display element substrate
TWI496835B (en) * 2010-06-25 2015-08-21 Sumitomo Bakelite Co Resin composition, transparent composite substrate and display device substrate

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