JP2005106418A - Method for supplying waste gas, and backfire preventing device - Google Patents

Method for supplying waste gas, and backfire preventing device Download PDF

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JP2005106418A
JP2005106418A JP2003342778A JP2003342778A JP2005106418A JP 2005106418 A JP2005106418 A JP 2005106418A JP 2003342778 A JP2003342778 A JP 2003342778A JP 2003342778 A JP2003342778 A JP 2003342778A JP 2005106418 A JP2005106418 A JP 2005106418A
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exhaust gas
water vapor
steam
gas treatment
waste gas
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JP4070698B2 (en
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Keiji Imamura
啓志 今村
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Kanken Techno Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for supplying waste gas, in which waste gas of high concentration can be safely supplied to a waste gas processing device, and in which backfire phenomenon can be securely prevented while effectively utilizing waste gas processing waste heat. <P>SOLUTION: Waste gas of explosion-range concentration including combustible components discharged from a manufacturing device 12 is sent through a vapor-filled range 28a positioned between the manufacturing device 12 and the waste gas processing device 14 in which vapor V generated by use of processing waste heat in the processing device 14 is filled. It is thus supplied to the processing device 14 with the vapor V. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、製造装置から排出される爆発範囲(通常は爆発下限界以上であり、以下、爆発下限界以上として説明するが、爆発上限以下の場合も含まれる。)の高濃度可燃性成分および場合によっては粉塵を含有する爆発性排ガスの除害装置において使用される排ガス供給方法とその逆火防止装置に関する。   The present invention relates to a high-concentration flammable component in an explosion range discharged from a production apparatus (usually above the lower explosion limit, hereinafter described as being above the lower explosion limit, but also including the case below the upper explosion limit) In some cases, the present invention relates to an exhaust gas supply method used in a detoxifying device for explosive exhaust gas containing dust and a backfire prevention device.

産業界にあっては、様々なガスを使用して数々の製品の製造を行っており、その副産物として排ガスが発生し、これを無害化(例えば高温加熱ガス)する処置を排ガス処理装置にて行い、大気に放出している。その中のいくつかの製造設備において、製造装置から排出される排ガスには、H2を始め、SiH4のような広い濃度範囲における爆発性を有する可燃性成分含有排ガスが排出されることがあり、不適切な処理のために時には爆発事故を起こすことがある。 In the industry, various products are manufactured using various gases, and exhaust gas is generated as a by-product, and the treatment to make it harmless (for example, high-temperature heating gas) is done with the exhaust gas treatment device. Done and released into the atmosphere. In some of the manufacturing facilities, exhaust gas exhausted from the manufacturing equipment may contain exhaust gas containing H 2 and explosive combustible components in a wide concentration range, such as SiH 4 . Explosive accidents may occur due to improper treatment.

その対策として、多くは、これら爆発性を有する可燃性成分を高濃度に含む排ガスに多量の窒素を製造装置の排気口において直ちに混入し、前記可燃性成分を爆発下限界以下に薄めた後に排ガス処理で処理するという方法を採っていた。   As countermeasures, in many cases, a large amount of nitrogen is immediately mixed into the exhaust gas containing high concentrations of these explosive combustible components at the exhaust port of the production apparatus, and the exhaust gas is diluted after the combustible components are diluted below the lower limit of explosion. The method of processing by processing was adopted.

この方法では、可燃性成分が爆発下限界以下に薄められるので、非常に安全であるが、排ガス処理風量が製造装置から排出される排ガス量の何倍にも膨れ上がるので、排ガス処理装置の規模がそれだけ大きくなり、処理コストが高騰するという問題があった。   This method is very safe because the combustible components are diluted below the lower limit of explosion, but the exhaust gas treatment air volume swells many times the amount of exhaust gas discharged from the manufacturing equipment. However, there was a problem that the processing cost was increased.

一方、上記の方策とは別に、従来、排ガスを水中に放散して水を通過させる水封式の安全器を設けることにより、燃焼機などからの逆火を防止する技術が提案されている(例えば、特許文献1参照。)。   On the other hand, in addition to the above-mentioned measures, conventionally, there has been proposed a technique for preventing backfire from a combustor or the like by providing a water-sealed safety device that diffuses exhaust gas into water and allows water to pass through ( For example, see Patent Document 1.)

しかしながら、水封安全器を設けるこの技術では、水封レベルの差位に制限があり、広範囲な爆発現象に対応するのが困難であるという問題があった。   However, this technique for providing a water seal safety device has a problem in that it is difficult to cope with a wide range of explosion phenomena because there is a limit to the difference in water seal level.

このことから、比較的低コストにして、広範囲の爆発現象に対応できる対策が要望されている。   Therefore, there is a demand for measures that can cope with a wide range of explosion phenomena at a relatively low cost.

これに対応する技術として、既に、図5に示すように、製造装置(1)と排ガス処理装置(3)との間にメッシュのような逆火防止材(5a)が充填された逆火防止装置(5)を設置する技術が提案されている。これにより、排ガス処理装置(3)で排ガス(G)の熱分解に使用されている火炎が何らかの原因により、製造装置(1)と排ガス処理装置(3)との間に配置された排ガス供給配管(7)を通って逆流しようとしても、逆火防止材(5a)により逆火を防止し、製造装置(1)の内部に引火性ガスが溜まっていても該製造装置(1)が爆発するのを有効に防止できる。   As a technology corresponding to this, as shown in FIG. 5, the flashback prevention material (5a) filled with a backfire prevention material (5a) such as a mesh between the manufacturing device (1) and the exhaust gas treatment device (3) has already been provided. A technique for installing the device (5) has been proposed. As a result, the exhaust gas supply pipe arranged between the manufacturing device (1) and the exhaust gas treatment device (3) due to a flame used for the thermal decomposition of the exhaust gas (G) in the exhaust gas treatment device (3). Even if a reverse flow is attempted through (7), the backfire prevention material (5a) prevents backfire, and even if flammable gas is accumulated inside the production equipment (1), the production equipment (1) will explode. Can be effectively prevented.

しかしながら、このような逆火防止装置(5)を設けたものでは、排ガス(G)が気体成分のみで構成されている場合には有効であるが、半導体製造装置のような排ガス(G)中に多量の粉塵を含むような場合には、逆火防止材(5a)が目詰まりを生じて、頻繁なメンテナンスを行わなければならないという問題があった。なお、このような爆発性を有する可燃性成分を含む排ガス供給配管(7)のメンテナンスは、非常に危険が伴うものであり、出来る限りメンテナンスフリーとなるようにすることが好ましい。
特開2003−194479号公報(第1図)
However, in the case where such a backfire prevention device (5) is provided, it is effective when the exhaust gas (G) is composed of only a gaseous component, but in the exhaust gas (G) such as a semiconductor manufacturing device. When a large amount of dust is included, the backfire prevention material (5a) is clogged, and there is a problem that frequent maintenance must be performed. The maintenance of the exhaust gas supply pipe (7) containing such explosive combustible components is extremely dangerous, and it is preferable to make the maintenance as free as possible.
JP 2003-194479 A (FIG. 1)

それゆえに、本発明の主たる課題は、前述のような粉塵および高濃度の可燃性成分を含有する排ガスの除害処理を行う場合において、メンテナンスフリーで、しかも高濃度の可燃性成分を含む排ガスをそのまま安全に排ガス処理装置に供給するとともに、逆火現象の発生を防止でき、更には省エネルギー化を図ることもできる排ガスの供給方法とこの方法に用いる逆火防止装置とを提供することにある。   Therefore, the main problem of the present invention is that in the case of performing the detoxification treatment of the exhaust gas containing the dust and the high concentration combustible component as described above, the maintenance-free exhaust gas containing the high concentration combustible component is required. An object of the present invention is to provide a method for supplying exhaust gas that can be safely supplied as it is to an exhaust gas treatment device, can prevent the occurrence of a flashback phenomenon, and can also save energy, and a flashback prevention device used in this method.

請求項1に記載の排ガス供給方法は、「製造装置(12)から排出された爆発範囲(一般的には爆発下限界以上)の濃度の可燃性成分を含む排ガス(G)を排ガス処理装置(14)で除害する方法において、排ガス(G)を、製造装置(12)と排ガス処理装置(14)との間に位置し、かつ該排ガス処理装置(14)での処理余熱を利用して生成した水蒸気(V)が充満している水蒸気充満領域(28a)を通過させた後、その水蒸気(V)と共に前記排ガス処理装置(14)に供給する」ことを特徴とする。   The exhaust gas supply method according to claim 1 is described as follows: “Exhaust gas (G) containing a combustible component having a concentration within an explosion range (generally the lower explosion limit or more) discharged from the manufacturing apparatus (12) 14), the exhaust gas (G) is located between the production apparatus (12) and the exhaust gas treatment apparatus (14), and the residual heat from the exhaust gas treatment apparatus (14) is used. After passing through the steam-filled region (28a) filled with the generated steam (V), it is supplied to the exhaust gas treatment device (14) together with the steam (V). "

また、請求項2に記載の発明は、請求項1に記載の排ガス(G)の除害処理を実施するための逆火防止装置(10)に関するものであり、「爆発範囲の濃度の可燃性成分を含む排ガス(G)を排出する製造装置(12)と排ガス(G)を除害する排ガス処理装置(14)との間に設けられ、内部に水蒸気(V)を充満した水蒸気充満領域(28a)が形成されるとともに排ガス(G)が通過する筒状の本体(28)と、排ガス処理装置(14)に取着され、排ガス(G)を熱分解した際に生じる処理余熱を利用して水蒸気(V)を生成するとともにこれを水蒸気充満領域(28a)へと供給する水蒸気生成手段(30)とを具備する」ことを特徴とする逆火防止装置(10)である。   The invention described in claim 2 relates to a backfire prevention device (10) for carrying out the detoxification treatment of the exhaust gas (G) according to claim 1, and “combustibility of concentration in the explosion range”. A steam-filled region that is provided between the production device (12) that discharges exhaust gas (G) containing components and the exhaust gas treatment device (14) that removes exhaust gas (G) and is filled with water vapor (V) inside ( 28a) is formed and the tubular main body (28) through which the exhaust gas (G) passes, and the residual heat generated when the exhaust gas (G) is pyrolyzed by being attached to the exhaust gas treatment device (14). And a water vapor generating means (30) for generating water vapor (V) and supplying the water vapor to the water vapor filling region (28a) ”.

これらの発明では、製造装置(12)からの排ガス(G)が水蒸気充満領域(28a)内に至ると、排ガス(G)を構成する成分分子と水蒸気充満領域(28a)内の水蒸気[すなわち、水蒸気充満領域(28a)内を浮遊している水分子](V)とが均一に混ざり合い、何らかの原因により排ガス供給配管(26)内の排ガス(G)中に空気(正確には酸素)が混入したとしても、排ガス(G)中の可燃性成分と混入した酸素との結合が水蒸気(V)によって阻害され、かつ水蒸気(V)による温度上昇抑制効果も加わって製造装置(12)から排ガス処理装置(14)に至る排ガス供給配管(26)内での逆火発生を効果的に防止することができる。なお、逆火防止に水蒸気(V)を使用しているので、実際上、排ガス(G)中に粉塵が含まれているとしても、目詰まりが起こらず、メンテナンスフリーとなる。換言すれば、この発明の方法では、粉塵含有排ガスの逆火防止に特に有効である。   In these inventions, when the exhaust gas (G) from the production apparatus (12) reaches the water vapor filled region (28a), the component molecules constituting the exhaust gas (G) and the water vapor in the water vapor filled region (28a) [that is, The water molecules floating in the steam-filled area (28a)] (V) mix evenly, and for some reason, air (exactly oxygen) is present in the exhaust gas (G) in the exhaust gas supply pipe (26). Even if it is mixed, the bond between the combustible component in the exhaust gas (G) and the mixed oxygen is inhibited by the steam (V), and the temperature rise suppression effect by the steam (V) is also added to the exhaust gas from the production device (12). The occurrence of flashback in the exhaust gas supply pipe (26) leading to the treatment device (14) can be effectively prevented. Since water vapor (V) is used to prevent backfire, even if dust is actually contained in the exhaust gas (G), clogging does not occur and maintenance is free. In other words, the method of the present invention is particularly effective for preventing backfire of dust-containing exhaust gas.

また、排ガス処理装置(14)での処理余熱を利用して水蒸気(V)を生成するようにしているので、水蒸気充満領域(28a)に供給する十分な量の水蒸気(V)を生成できるとともに、別途ヒータ装置などを設置して水蒸気(V)を生成する場合に比較して省エネルギー化を推進することができる。   In addition, since the steam (V) is generated by using the residual heat from the exhaust gas treatment device (14), a sufficient amount of steam (V) to be supplied to the steam filling region (28a) can be generated. Further, energy saving can be promoted as compared with the case where a steam device (V) is generated by installing a separate heater device or the like.

請求項3に記載の発明は、請求項2に記載の逆火防止装置(10)において、「水蒸気充満領域(28a)内に螺旋板(32),邪魔板(50)或いは多孔質板(52)など抵抗増加用中間部材が設置されている」ことを特徴とするものである。     The invention according to claim 3 is the backfire prevention device (10) according to claim 2, wherein “the spiral plate (32), the baffle plate (50) or the porous plate (52 ), And the like.

このように水蒸気充満領域(28a)[即ち、逆火防止装置(10)の本体(28)内部空間]内に螺旋板(32),邪魔板(50)或いは多孔質板(52)など抵抗増加用中間部材を設置すると、水蒸気充満領域(28a)内で排ガス(G)と水蒸気(V)とが攪拌されて十分に混ざり合うとともに、水蒸気充満領域(28a)内の通過時間が長くなって水蒸気による排ガス(G)の温度上昇抑制効果が向上し逆火防止効果をさらに高めることができる。   Thus, the resistance increase of the spiral plate (32), the baffle plate (50) or the porous plate (52) in the water vapor filling region (28a) [that is, the internal space of the main body (28) of the backfire prevention device (10)] When the intermediate member is installed, the exhaust gas (G) and the water vapor (V) are agitated and mixed sufficiently in the water vapor full area (28a), and the passage time in the water vapor full area (28a) becomes long and the water vapor As a result, the effect of suppressing the temperature rise of the exhaust gas (G) can be improved and the effect of preventing backfire can be further enhanced.

本発明によれば、製造装置と排ガス処理装置との間に排ガスが通過する水蒸気充満領域を設けているので、排ガスが水蒸気充満領域内に至ると、排ガスを構成する成分分子と水蒸気とが均一に混ざり合い、可燃性成分分子と何らかの原因によって排ガス中に混入した酸素との結合が水蒸気によって阻害され、かつ水蒸気による温度上昇抑制効果も加わって、排ガス中の可燃性成分の濃度が爆発下限界以上であっても、製造装置から排ガス処理装置に至る排ガス供給配管内での逆火発生を効果的に防止することができる。   According to the present invention, since the steam-filled region through which the exhaust gas passes is provided between the manufacturing apparatus and the exhaust gas treatment device, the component molecules constituting the exhaust gas and the steam are uniform when the exhaust gas reaches the steam-filled region. The combination of flammable component molecules with oxygen mixed into the exhaust gas for some reason is blocked by water vapor, and the temperature rise suppression effect by water vapor is also added, so the concentration of flammable components in the exhaust gas is at the lower explosion limit. Even if it is the above, backfire generation | occurrence | production within the exhaust gas supply piping from a manufacturing apparatus to an exhaust gas treatment apparatus can be prevented effectively.

また、特に、排ガス処理装置での処理余熱を利用して水蒸気を生成するようにしたので、水蒸気充満領域に供給する十分な量の水蒸気を生成できるとともに、別途ヒータ装置などを設置して水蒸気を生成する場合に比較して省エネルギー化を推進することができる。   In particular, since steam is generated by using the residual heat of the exhaust gas treatment apparatus, a sufficient amount of steam to be supplied to the steam-filled region can be generated, and a heater device or the like is separately installed to generate steam. Energy saving can be promoted compared to the case of generating.

そして、水蒸気充満領域内に抵抗増加用中間部材を設置することで、排ガスと水蒸気とが攪拌されて十分に混ざり合うとともに、水蒸気充満領域内の通過時間が長くなり、逆火防止効果を高めることができるという利点がある。   And by installing an intermediate member for increasing resistance in the steam-filled region, the exhaust gas and steam are stirred and mixed sufficiently, and the passage time in the steam-filled region becomes longer, thereby improving the backfire prevention effect. There is an advantage that can be.

以下、この発明に実施形態を図面に基づいて説明する。   Hereinafter, embodiments of the present invention will be described with reference to the drawings.

図1は、この発明に係る逆火防止装置(10)の第1実施例の構成図である。図1において、製造装置(12)は、例えばCVDのような半導体製造装置であり、半導体製造プロセスの排ガス(G)として、H2 やSiH4など広範囲な濃度において爆発性を有する可燃性成分および場合によっては細かい多量の粉塵を伴う排ガス(G)を排出する。勿論、製造装置(12)は、半導体製造装置に限らず、爆発性の可燃性成分を含む排ガスを排ガスとして排出するような装置は全て含まれるものである。 FIG. 1 is a block diagram of a first embodiment of a flashback prevention device 10 according to the present invention. In FIG. 1, the manufacturing apparatus (12) is a semiconductor manufacturing apparatus such as CVD, and as an exhaust gas (G) of a semiconductor manufacturing process, a combustible component having explosive properties in a wide range of concentrations such as H 2 and SiH 4 and the like. In some cases, exhaust gas (G) with a large amount of fine dust is discharged. Of course, the manufacturing apparatus (12) is not limited to a semiconductor manufacturing apparatus, but includes all apparatuses that discharge exhaust gas containing explosive combustible components as exhaust gas.

排ガス処理装置(14)は、図1に示す実施例1の場合、大略、排ガス分解処理塔(16)、排ガス分解処理塔(16)の内部に導入された排ガス(G)を熱分解させるための燃焼用ヒータ(18)、後部スクラバ(20)、配線系、計器類、排気ファン(22)および水槽(24)で構成され、それぞれ配管や配線で接続されており、1つのコンパクトなキャビネット内に収納されている。   In the case of Example 1 shown in FIG. 1, the exhaust gas treatment device (14) is generally used to thermally decompose the exhaust gas (G) introduced into the exhaust gas decomposition treatment tower (16) and the exhaust gas decomposition treatment tower (16). Combustion heater (18), rear scrubber (20), wiring system, instruments, exhaust fan (22) and water tank (24), each connected by piping and wiring, in one compact cabinet It is stored in.

この製造装置(12)と排ガス処理装置(14)とは、排ガス供給配管(26)にて接続されており、その途中に逆火防止装置(10)が配設されている。   The production device (12) and the exhaust gas treatment device (14) are connected by an exhaust gas supply pipe (26), and a backfire prevention device (10) is disposed in the middle thereof.

逆火防止装置(10)は、図1に示すように、製造装置(12)と排ガス処理装置(14)との間の排ガス供給配管(26)上に設けられた円筒状の本体(28)と、排ガス分解処理塔(16)の排ガス出口(16b)側に設けられた水蒸気生成手段(30)とで構成されている。   As shown in FIG. 1, the backfire prevention device (10) includes a cylindrical main body (28) provided on the exhaust gas supply pipe (26) between the production device (12) and the exhaust gas treatment device (14). And water vapor generating means (30) provided on the exhaust gas outlet (16b) side of the exhaust gas decomposition treatment tower (16).

ここで、本体(28)の内部空間には水蒸気を充満させる水蒸気充満領域(28a)が形成されており、この水蒸気充満領域(28a)には螺旋板(32)が備えられている。なお、この実施例では逆火防止装置(10)の本体(28)を円筒状のものとする場合を示しているが、本体(28)の形状は、筒状つまり内部が中空状のものであり且つその内部に水蒸気充満領域(28a)を形成できるものであれば、例えば角筒状など如何なるものであってもよい。   Here, a water vapor filling region (28a) for filling water vapor is formed in the internal space of the main body (28), and the water vapor filling region (28a) is provided with a spiral plate (32). In this embodiment, the main body (28) of the backfire prevention device (10) is shown as being cylindrical, but the shape of the main body (28) is cylindrical, that is, the inside is hollow. Any shape such as a rectangular tube may be used as long as it can form the water vapor filling region (28a) therein.

水蒸気生成手段(30)は、排ガス分解処理塔(16)内で熱分解した後に排出される高温の排ガス(G)の熱[即ち処理余熱]を利用して水蒸気を生成するものであり、図2に示すように、排ガス分解処理塔(16)の排ガス出口(16b)に連接され、上下面が密閉された円筒形のタンク(34)と、外部からの水(W)をタンク(34)内に供給する水供給配管(36)と、タンク(34)の上下面を貫通するように取着された1乃至複数の熱交換筒(38)と、タンク(34)の上面と水面との間に取着され、タンク(34)内にて発生した水蒸気(V)を逆火防止装置(10)の本体(28)内[即ち水蒸気充満領域(28a)]に供給する水蒸気供給配管(40)と、タンク(34)で発生した水蒸気(V)を水蒸気供給配管(40)に押し出すために、例えば窒素ガスなどの不活性ガス(N)をタンク(34)内に供給する配管(42)と、タンク(34)内が排ガス熱で加熱されるまでの初期時に水(W)を加熱するヒータ(44)とを具備している。   The water vapor generating means (30) generates water vapor using the heat of the high temperature exhaust gas (G) discharged after pyrolysis in the exhaust gas decomposition treatment tower (16) [namely, residual heat of treatment]. As shown in FIG. 2, a cylindrical tank (34) connected to the exhaust gas outlet (16b) of the exhaust gas decomposition treatment tower (16) and sealed at the upper and lower surfaces, and water (W) from the outside are supplied to the tank (34). A water supply pipe (36) supplied into the tank, one or more heat exchange tubes (38) attached so as to penetrate the upper and lower surfaces of the tank (34), and an upper surface and a water surface of the tank (34). A steam supply pipe (40) for supplying the steam (V) generated in the tank (34) to the inside of the main body (28) of the backfire prevention device (10) [that is, the steam filling region (28a)] And a pipe (42) for supplying an inert gas (N) such as nitrogen gas into the tank (34) in order to push the steam (V) generated in the tank (34) into the steam supply pipe (40). And the inside of the tank (34) is heated by exhaust gas heat. And comprising a heater (44) for heating the water (W) in the initial stage up to the.

熱交換筒(38)は、排ガス分解処理塔(16)で熱分解された高温の排ガス(G)を上端開口(38a)から取り込み、タンク(34)内の水(W)と熱交させることによって、タンク(34)内に水蒸気(V)を生成させるものである。   The heat exchange cylinder (38) takes in the hot exhaust gas (G) pyrolyzed in the exhaust gas decomposition treatment tower (16) from the upper end opening (38a) and exchanges heat with water (W) in the tank (34). Thus, water vapor (V) is generated in the tank (34).

なお、ヒータ(44)は、燃焼用ヒータ(18)により排ガス分解処理塔(16)内の温度が700℃〜1300℃程度まで十分上昇するまでの期間(つまり初期時に)作動してタンク(34)内の水(W)を加熱するようになっている。   The heater (44) is operated during a period (that is, at the initial stage) until the temperature in the exhaust gas decomposition treatment tower (16) is sufficiently raised to about 700 ° C. to 1300 ° C. by the combustion heater (18). The water (W) in) is heated.

上記構成において、製造装置(12)から排出された爆発下限界以上の濃度の可燃性成分を含む排ガス(G)は、逆火防止装置(10)の底部から本体(28)内部に導入される。逆火防止装置(10)は、排ガス処理装置(14)に接続されているので、排ガス処理装置(14)に向かう方向、すなわち、図1の場合には、本体(28)の底部から天井部に向かって螺旋板(32)に沿って気流が螺旋状に流れている。   In the above configuration, the exhaust gas (G) containing a combustible component having a concentration exceeding the lower explosion limit discharged from the manufacturing device (12) is introduced into the main body (28) from the bottom of the backfire prevention device (10). . Since the flashback prevention device (10) is connected to the exhaust gas treatment device (14), the direction toward the exhaust gas treatment device (14), that is, in the case of FIG. 1, from the bottom of the main body (28) to the ceiling portion. The airflow is spiraling along the spiral plate (32).

一方、排ガス処理装置(14)では、燃焼用ヒータ(18)により排ガス分解処理塔(16)内が十分高温になるまでの初期時には、水蒸気生成手段(30)におけるヒータ(44)によりタンク(34)内の水(W)が加熱され、水蒸気(V)を生成し、この水蒸気(V)が逆火防止装置(10)の本体(28)内に供給される。そして、燃焼用ヒータ(18)により排ガス分解処理塔(16)内の温度が上昇して排ガス(G)の熱分解が可能な稼働状態になれば、ヒータ(44)が断電され、排ガス処理装置(14)に供給された排ガス(G)の熱分解処理の余熱によりタンク(34)内の水(W)が加熱され、それに伴って発生した水蒸気(V)が本体(28)内の供給される。これにより、逆火防止装置(10)の内部空間は、水蒸気充満領域(28a)として水蒸気(V)で満たされる。   On the other hand, in the exhaust gas treatment device (14), at the initial stage until the inside of the exhaust gas decomposition treatment tower (16) is sufficiently heated by the combustion heater (18), the tank (34) is formed by the heater (44) in the steam generation means (30). The water (W) in) is heated to generate water vapor (V), and this water vapor (V) is supplied into the main body (28) of the backfire prevention device (10). Then, when the temperature in the exhaust gas decomposition treatment tower (16) rises by the combustion heater (18) and the exhaust gas (G) is in an operating state capable of thermal decomposition, the heater (44) is cut off and the exhaust gas treatment is performed. The water (W) in the tank (34) is heated by the residual heat of the pyrolysis treatment of the exhaust gas (G) supplied to the device (14), and the water vapor (V) generated accordingly is supplied in the main body (28). Is done. Thereby, the internal space of the backfire prevention device (10) is filled with water vapor (V) as the water vapor full area (28a).

逆火防止装置(10)の底部に導入された排ガス(G)は、大量の水蒸気(V)と共に螺旋板(32)に沿って螺旋状に上昇し、且つこの間に十分に混合される。この状態で排ガス(G)は、天井部を経て、水蒸気(V)と共に排ガス処理装置(14)の排ガス分解処理塔(16)に供給され、この排ガス処理装置(14)で熱分解される。   The exhaust gas (G) introduced into the bottom of the flashback prevention device (10) rises spirally along the spiral plate (32) together with a large amount of water vapor (V) and is sufficiently mixed therebetween. In this state, the exhaust gas (G) is supplied to the exhaust gas decomposition treatment tower (16) of the exhaust gas treatment device (14) together with the water vapor (V) through the ceiling, and is thermally decomposed by the exhaust gas treatment device (14).

排ガス分解処理塔(16)内部の燃焼部分(16a)は、燃焼用ヒータ(18)により700〜1300℃程度の高温に保たれている(例えば、シラン;SiH4の場合、700〜900℃、NF3の場合、900〜1100℃、WF6の場合、700〜900℃)。そして、必要に応じて外部から排ガス分解処理塔(16)内に供給された酸素を含む外気により、燃焼部分(16a)に導入された排ガス(G)は、確実に熱分解され、後部スクラバ(20)に送り出され、後部スクラバ(20)でスプレー(20a)による温度低下(前記熱分解により粉塵が発生した場合には、同時に除去)が行われた後、排気ファン(22)により、大気放出される。前記スプレー(20a)への揚水は、水槽(24)の水をスプレー(20a)に供給する揚水ポンプ(48)により行われる。 The combustion part (16a) inside the exhaust gas decomposition treatment tower (16) is maintained at a high temperature of about 700 to 1300 ° C. by the combustion heater (18) (for example, in the case of silane; SiH 4 , 700 to 900 ° C., In the case of NF 3 , 900 to 1100 ° C., and in the case of WF 6 , 700 to 900 ° C.). The exhaust gas (G) introduced into the combustion part (16a) is reliably pyrolyzed by the outside air containing oxygen supplied from the outside into the exhaust gas decomposition treatment tower (16) from the outside as necessary, and the rear scrubber ( 20), after the temperature is reduced by spraying (20a) in the rear scrubber (20) (if dust is generated by the thermal decomposition, it is removed at the same time) and then released into the atmosphere by the exhaust fan (22) Is done. Pumping water to the spray (20a) is performed by a pumping pump (48) that supplies water from the water tank (24) to the spray (20a).

さて、前述のように、排ガス分解処理塔(16)において、排ガス(G)は、完全に熱分解されるのであるが、時には何らかの原因により空気が排ガス供給配管(26)に混入して逆火現象が発生するような状態になることがある。この時、逆火防止装置(10)を装備していないような場合、製造装置(12)と排ガス処理装置(14)とを結ぶ排ガス供給配管(26)を通じて排ガス処理装置(14)の燃焼部分(16a)の火炎が製造装置(12)内に流れ、内部に溜まっている可燃性ガスに引火して製造装置(12)内で爆発を起こす(特に、水素のように広い範囲で爆発範囲を有するものの場合には顕著である。)ことがあったが、本発明の逆火防止装置(10)では、例えこのような状態になったとしても、前述のように水蒸気(V)が可燃性成分分子と助燃性成分分子との間に入り込むので、例え可燃性成分の濃度が爆発範囲内に踏み込んでいたとしても逆火現象を防止することができる。   As described above, in the exhaust gas decomposition treatment tower (16), the exhaust gas (G) is completely pyrolyzed, but sometimes air is mixed into the exhaust gas supply pipe (26) for some reason and backfired. There may be a situation where the phenomenon occurs. At this time, if the backfire prevention device (10) is not equipped, the combustion part of the exhaust gas treatment device (14) is connected through the exhaust gas supply pipe (26) connecting the production device (12) and the exhaust gas treatment device (14). The flame of (16a) flows into the manufacturing device (12), ignites the combustible gas accumulated inside, and causes an explosion in the manufacturing device (12) (especially the explosion range is wide in a range such as hydrogen). However, in the flashback prevention device (10) of the present invention, even if such a state occurs, the steam (V) is flammable as described above. Since it enters between the component molecule and the auxiliary combustible component molecule, even if the concentration of the combustible component falls within the explosion range, the flashback phenomenon can be prevented.

つまり、爆発下限界以上の高濃度の爆発性可燃性成分を含む排ガス(G)が逆火防止装置(10)に導入されると、前述のように、本体(28)内部において、排ガス(G)は完全に分子レベルで水蒸気(V)と混ざり合い、例え排ガス(G)中に何らかの原因により酸素が混入したとしても酸素と可燃性成分との急激な酸化結合が妨げられ、爆発的燃焼現象を引き起こすことがない。換言すれば、このような状態になり、排ガス処理装置(14)と逆火防止装置(10)の出口との間で逆火現象が発生したとしても、この火炎は逆火防止装置(10)内で消し止められ、逆火防止装置(10)の入口に達することはない。   In other words, when exhaust gas (G) containing a high concentration of explosive combustible components exceeding the lower explosion limit is introduced into the backfire prevention device (10), as described above, the exhaust gas (G ) Completely mixes with water vapor (V) at the molecular level, and even if oxygen is mixed into the exhaust gas (G) for some reason, the rapid oxidative bond between oxygen and flammable components is hindered, causing an explosive combustion phenomenon. Will not cause. In other words, even if a flashback phenomenon occurs between the exhaust gas treatment device (14) and the outlet of the flashback prevention device (10), this flame is not flashback prevention device (10). It is extinguished within and does not reach the entrance of the backfire prevention device (10).

特に、本発明では、逆火防止装置(10)内に供給する水蒸気(V)を、排ガス分解処理塔(16)にて排ガス(G)を熱分解した際に生じる処理余熱を利用して生成しているので、逆火防止装置(10)の本体(28)内の水蒸気充満領域(28a)に供給する十分な量の水蒸気を生成できるとともに、余熱の有効利用、つまり省エネルギー化を達成することができる。   In particular, in the present invention, the steam (V) supplied into the backfire prevention device (10) is generated by using the residual heat generated when the exhaust gas (G) is pyrolyzed in the exhaust gas decomposition treatment tower (16). Therefore, it is possible to generate a sufficient amount of water vapor to be supplied to the water vapor filling region (28a) in the main body (28) of the backfire prevention device (10), and to achieve effective use of residual heat, that is, energy saving. Can do.

なお、上述の実施例では、排ガス(G)を逆火防止装置(10)の底部から導入する場合を示したが、勿論、これに限らず、排ガス(G)を逆火防止装置(10)の天井部から導入するようにしてもよい。   In the above-described embodiment, the case where the exhaust gas (G) is introduced from the bottom of the flashback prevention device (10) is shown, but of course, the present invention is not limited to this, and the flashfire prevention device (10) You may make it introduce from the ceiling part.

また、上述したように、排ガス分解処理塔(16)内部で熱分解した排ガス(G)は、熱交換筒(38)を通過する際、タンク(34)内の水(W)と熱交して、タンク(34)内に水蒸気(V)を生成するが、この排ガス(G)の温度は700℃〜1300℃程度と高温のため、特に1300℃前後の温度で熱分解した排ガス(G)が熱交換筒(38)を通過する際には、タンク(34)内の水が次々に水蒸気となり、タンク(34)内の水量が一気に減少する場合がある。このような場合、タンク(34)内の水が無くなると水蒸気生成手段(30)が空焚き状態となり、当該手段(30)が熱によってダメージを受けるようになる。このため、水蒸気生成手段(30)のタンク(34)に図示しない冷却装置を取付けて、タンク(34)の水が全て蒸発して無くならないように、生成する水蒸気量をコントロールするようにしてもよい。   Further, as described above, the exhaust gas (G) pyrolyzed inside the exhaust gas decomposition treatment tower (16) exchanges heat with water (W) in the tank (34) when passing through the heat exchange cylinder (38). The steam (V) is generated in the tank (34). The temperature of the exhaust gas (G) is as high as about 700 ° C to 1300 ° C, and therefore, the exhaust gas (G) pyrolyzed particularly at a temperature around 1300 ° C. When the water passes through the heat exchange cylinder (38), the water in the tank (34) becomes water vapor one after another, and the amount of water in the tank (34) may decrease at a stretch. In such a case, when the water in the tank (34) runs out, the water vapor generating means (30) is in an empty state, and the means (30) is damaged by heat. For this reason, a cooling device (not shown) is attached to the tank (34) of the water vapor generating means (30) to control the amount of water vapor generated so that all water in the tank (34) is not evaporated. Good.

さらに、排ガス(G)に粉塵が含まれれば、排ガス処理装置(14)の前段に逆火防止装置(10)と機能的に類似した前部スクラバを設けるが、その場合、この前部スクラバに水蒸気充満領域(28a)を設けることによって、逆火防止装置(10)としての働きをさせることができる。   Furthermore, if the exhaust gas (G) contains dust, a front scrubber functionally similar to the backfire prevention device (10) is provided in the front stage of the exhaust gas treatment device (14). By providing the water vapor filling region (28a), it is possible to function as a backfire prevention device (10).

図3は、邪魔板(50)を複数段使用した例であり、図4は、内部に金網やパンチングメタルのような多孔質板(52)を複数段設けた例である。   FIG. 3 is an example in which a plurality of baffle plates (50) are used, and FIG. 4 is an example in which a plurality of porous plates (52) such as a metal net or punching metal are provided inside.

図1の螺旋板(32)や図3の邪魔板(50)の場合は、内部の排ガス通過路を長くして水蒸気(V)と排ガス(G)との十分な混合を図ることを目的としているのに対して、図4の多孔質板(52)の場合は、多孔質板(52)全体に十分に水分が付着し、水分とガスとの接触を良好にさせることができる。それ故、粉塵の補集効果が大きい。加えて、多孔質板(52)そのものが逆火防止機能を有しているので、前記水蒸気(V)の逆火防止効果と協働して優れた逆火防止効果を奏する。なお、粉塵による多孔質板(52)の目詰まりが懸念されるが、多孔質板(52)には上面から絶えず水蒸気(V)が供給されており、この水蒸気(V)が多孔質板(52)に接触すると冷却され水滴となり、この水滴が上側の多孔質板(52)から下側に向けて絶えず流下しているので、多孔質板(52)は常に洗浄された状態となり、目詰まりは発生しない。   In the case of the spiral plate (32) in FIG. 1 and the baffle plate (50) in FIG. 3, the internal exhaust gas passage is lengthened to achieve sufficient mixing of water vapor (V) and exhaust gas (G). On the other hand, in the case of the porous plate (52) of FIG. 4, the water is sufficiently adhered to the entire porous plate (52), and the contact between the water and the gas can be improved. Therefore, the dust collecting effect is great. In addition, since the porous plate (52) itself has a backfire prevention function, it has an excellent backfire prevention effect in cooperation with the backfire prevention effect of the water vapor (V). Although there is concern about clogging of the porous plate (52) due to dust, water vapor (V) is constantly supplied from the upper surface to the porous plate (52), and this water vapor (V) is 52) is cooled and becomes water droplets, and since these water droplets are constantly flowing downward from the upper porous plate (52), the porous plate (52) is always washed and clogged. Does not occur.

本発明に係る逆火防止装置の第1実施例の構成図である。It is a block diagram of 1st Example of the backfire prevention apparatus which concerns on this invention. 逆火防止装置における水蒸気生成手段を示す一部破断斜視図である。It is a partially broken perspective view which shows the water vapor | steam production | generation means in a backfire prevention apparatus. 本発明に係る逆火防止装置の第2実施例の構成図である。It is a block diagram of 2nd Example of the backfire prevention apparatus which concerns on this invention. 本発明に係る逆火防止装置の第3実施例の構成図である。It is a block diagram of 3rd Example of the backfire prevention apparatus which concerns on this invention. 従来の逆火防止装置を示す構成図である。It is a block diagram which shows the conventional backfire prevention apparatus.

符号の説明Explanation of symbols

(10)・・・逆火防止装置
(12)・・・製造装置
(14)・・・排ガス処理装置
(16)・・・排ガス分解処理塔
(18)・・・燃焼用ヒータ
(20)・・・後部スクラバ
(22)・・・排気ファン
(24)・・・水槽
(26)・・・排ガス供給配管
(28)・・・(逆火防止装置の)本体
(28a)・・・水蒸気充満領域
(30)・・・水蒸気生成手段
(32)・・・螺旋板
(34)・・・タンク
(36)・・・水供給配管
(38)・・・熱交換筒
(40)・・・水蒸気供給配管
(42)・・・配管
(44)・・・ヒータ
(48)・・・揚水ポンプ
(50)・・・邪魔板
(52)・・・多孔質板
(10) ... Backfire prevention device
(12) ・ ・ ・ Production equipment
(14) ・ ・ ・ Exhaust gas treatment equipment
(16) ... Exhaust gas decomposition treatment tower
(18) ... Combustion heater
(20) ・ ・ ・ Rear scrubber
(22) ... Exhaust fan
(24) ... Water tank
(26) ... Exhaust gas supply piping
(28) ・ ・ ・ Main body (of backfire prevention device)
(28a) ・ ・ ・ Water vapor filling area
(30) ... Water vapor generating means
(32) ... Spiral plate
(34) ・ ・ ・ Tank
(36) ... Water supply piping
(38) ... Heat exchange tube
(40) ... Steam supply piping
(42) ... Piping
(44) ・ ・ ・ Heater
(48) ・ ・ ・ Pumping pump
(50) ... Baffle plate
(52) ... Porous plate

Claims (3)

製造装置から排出された爆発範囲の濃度の可燃性成分を含む排ガスを排ガス処理装置で除害する方法において、
前記排ガスを、前記製造装置と排ガス処理装置との間に位置し、かつ該排ガス処理装置の処理余熱を利用して生成した水蒸気が充満している水蒸気充満領域を通過させた後、その水蒸気と共に前記排ガス処理装置に供給することを特徴とする排ガス供給方法。
In a method for detoxifying exhaust gas containing a combustible component having an explosive range concentration discharged from a manufacturing device with an exhaust gas treatment device,
The exhaust gas is positioned between the manufacturing apparatus and the exhaust gas treatment apparatus, and after passing through a water vapor filling region filled with water vapor generated by using the residual heat of the exhaust gas treatment apparatus, together with the water vapor An exhaust gas supply method for supplying to the exhaust gas treatment apparatus.
爆発範囲の濃度の可燃性成分を含む排ガスを排出する製造装置と前記排ガスを除害する排ガス処理装置との間に設けられ、内部に水蒸気を充満した水蒸気充満領域が形成されるとともに前記排ガスが通過する筒状の本体と、
前記排ガス処理装置に取着され、前記排ガスを熱分解した際に生じる処理余熱を利用して水蒸気を生成するとともにこれを前記水蒸気充満領域へと供給する水蒸気生成手段とを具備することを特徴とする逆火防止装置。
Provided between a manufacturing apparatus that discharges exhaust gas containing a combustible component with an explosive range concentration and an exhaust gas treatment apparatus that removes the exhaust gas, a steam-filled region filled with steam is formed inside, and the exhaust gas is A cylindrical body passing through,
It is attached to the exhaust gas treatment apparatus, and comprises steam generation means for generating steam using residual processing heat generated when the exhaust gas is thermally decomposed and supplying the steam to the steam-filled region. Backfire prevention device to do.
前記水蒸気充満領域内に螺旋板,邪魔板或いは多孔質板など抵抗増加用中間部材が設置されていることを特徴とする請求項2に記載の逆火防止装置。   The backfire prevention device according to claim 2, wherein an intermediate member for increasing resistance, such as a spiral plate, a baffle plate, or a porous plate, is installed in the water vapor filling region.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013044479A (en) * 2011-08-24 2013-03-04 Japan Pionics Co Ltd Method for purifying exhaust gas containing silicon chloride compound
JP2017526163A (en) * 2014-06-04 2017-09-07 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Heat exchanger for freeze prevention of reagent supply system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013044479A (en) * 2011-08-24 2013-03-04 Japan Pionics Co Ltd Method for purifying exhaust gas containing silicon chloride compound
JP2017526163A (en) * 2014-06-04 2017-09-07 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Heat exchanger for freeze prevention of reagent supply system

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