JP2004307889A - Vacuum film deposition system - Google Patents

Vacuum film deposition system Download PDF

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Publication number
JP2004307889A
JP2004307889A JP2003100104A JP2003100104A JP2004307889A JP 2004307889 A JP2004307889 A JP 2004307889A JP 2003100104 A JP2003100104 A JP 2003100104A JP 2003100104 A JP2003100104 A JP 2003100104A JP 2004307889 A JP2004307889 A JP 2004307889A
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Japan
Prior art keywords
film forming
base material
film
substrate
vacuum
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JP2003100104A
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Japanese (ja)
Inventor
Jun Kikuchi
順 菊池
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Toppan Inc
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Toppan Printing Co Ltd
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  • Chemical Vapour Deposition (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a vacuum film deposition system where a sheet-shaped flexible base material is wound around a film deposition drum and film deposition is performed, the sheet-shaped flexible base material is wound around the film deposition drum, tension is applied to the base material so as to be held, film deposition is repeatedly carried out in a vacuum, the film deposition face is not contacted with rollers and a sheet in the process of the film deposition, and the excellent quality of the film deposition face and excellent productivity can be realized. <P>SOLUTION: In the vacuum film deposition system where a sheet-shaped flexible base material is wound around a film deposition drum, and film deposition is performed, the film deposition drum is provided with a means of winding the flexible base material therearound, applying tension to the base material in the process of the film deposition, and holding the same. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

【0001】
【発明の属する技術分野】
本発明は、シート状のフレキシブル基材を成膜ドラムに巻き付けて基材に張力を付与して保持し、真空中で繰返し成膜し、成膜中に成膜面がローラ及びシートに触れない真空成膜装置に関する。
【0002】
【従来の技術】
従来の真空成膜装置について、図6〜9に基づいて説明する。
図6は、従来の真空成膜装置の一例で、インライン式真空成膜装置である。シート状の基材を供給部6で基材搬送台13に固定する。その時真空遮断弁8は閉じられている。基材固定後、供給部6の大気圧雰囲気が排気され成膜室2と同じ圧力になると、真空遮断弁8が開き基材搬送台13が成膜室2に移動する。その後真空遮断弁8が閉じ成膜が行なわれる。その後同様に各成膜室2〜4に搬送し成膜する。前進と後進を繰り返すことにより多層の成膜が可能である。このように従来のインライン式真空成膜装置は、隣り合った成膜室とその間を仕切る真空遮断弁、成膜室間を移動する基板搬送台から成り立っている。(例えば、特許文献1参照)
【0003】
また、図7は、従来の真空成膜装置の一例で、マルチチャンバ式真空成膜装置である。シート状の基材を供給部6で基材搬送台13に固定する。その時真空遮断弁8は閉じられている。基材固定後、供給部6の大気圧雰囲気が排気され中央の部屋と同じ圧力になると、真空遮断弁8が開き基材搬送台13がロボットハンド14によって中央の部屋を通り各成膜室2〜4に搬送され、基材搬送台13上の基材が成膜される。ロボットハンド14による各成膜室2〜4への基材の出し入れを繰り返すことにより多層の成膜が可能である。このように従来のマルチチャンバ式真空成膜装置は、複数の成膜室とその成膜室に囲まれた部屋とその間を仕切る真空遮断弁と成膜室に基板を移動する基板搬送装置から成り立っている。(例えば、特許文献2参照)
【0004】
また、図8は、従来の真空成膜装置の一例で、巻取り式真空成膜装置である。
ロール状の長尺フレキシブル基材15を真空中で成膜ドラム1に巻き付けて成膜室2〜4を通し、連続して成膜を行なってから巻き取る。逆転して成膜することにより多層の成膜が可能である。このように従来の巻取り式真空成膜装置は、巻き出し部と成膜部と巻取り部から成り立っている。(例えば、特許文献3参照)
【0005】
また、図9は、巻取り式真空成膜装置の成膜ドラム1にシート状のフレキシブル基材12をテープで貼りつけた状態である。成膜ドラム1を回転させながら成膜することにより多層の成膜が可能である。ドラムに可撓性シートを巻き付け、張力をかける発明はすでに公開されている。可撓性シートの第一の端と係合するための取り付けストリップと、ドラムに回転可能に取り付けられた複数のテンショナブロックと、可撓性シートの第二の端と係合するための複数のピンであって、各々がテンショナブロックに連結され、各々が露光ドラムの表面より上に可動に延びているピンと、感光シートの張力を調節するため、ピンを露光ドラムの表面に沿って移動させるためのテンショナブロックを作動させるための手段とを、備えている。(例えば、特許文献4参照)
【0006】
【特許文献1】
特開平5−295551号公報
【特許文献2】
特開平10−303276号公報
【特許文献3】
特開2000−17437号公報
【特許文献4】
特開平7−28359号公報
【0007】
【発明が解決しようとする課題】
上記の図6、7に示す多層成膜に用いられる従来の真空成膜装置の場合、複数の成膜方法で繰返し成膜し、成膜面にローラが触れることがなく大気中に取り出すことは可能であるが、下記の問題点がある。
(1)シートを成膜室に出し入れする際、真空遮断弁を開く。そのため、圧力,温度等の成膜条件が変動し、最適条件になるまで時間がかかる。それにより生産性が問題となる。
(2)シートの温度を制御するシート固定板が平面状であると、固定板からシートが浮く場所が発生する。そのため温度ムラが生じ、それにより膜厚及び膜組成にムラができるため品質上の問題が生じる。
【0008】
また、上記の図8に示す多層成膜に用いられる従来の真空成膜装置の場合、ロール状の長尺フレキシブル基材15を供給して、複数の成膜方法で繰返し成膜することは可能である。成膜ドラムに巻き付けて成膜するため、成膜ドラムを均一に温度制御するとシートが密着しているためシート表面の温度も均一となる。また、連続して成膜できるため生産性も良い。しかし、下記の問題点がある。
(1)成膜面にローラが触れるため、成膜面の品質上に問題がある。
(2)多層成膜を行なうためには、巻取り式であるために各成膜方法の成膜時間を合わせる必要があり、成膜方法の組合せ、または膜厚の組合せが制限される。
(3)長尺フレキシブル基材を搬送するため高い張力が必要となり、フィルム伸縮による膜への悪影響が生じる。
(4)成膜ドラムからフィルムが離れる時に、静電気による膜の剥離等の障害が発生する。
【0009】
上記の欠点を回避するため、上記の図9に示す多層成膜に用いられる従来の方法として、従来の真空成膜装置図8を使用して、シート状のフレキシブル基材12を成膜ドラムに貼り付けて、回転しながら成膜することにより繰り返し成膜する方法もある。しかし、下記の問題点がある。
(1)成膜時に発生する熱によりフレキシブル基材が膨張し、そのためフレキシブル基材にたるみが生じる。そのことにより、フレキシブル基材の温度分布が不均一になり、その結果、膜の厚さ、組成等が不均一になる。
【0010】
一方、露光ドラムマスクの露光ドラムの表面に取り付け、固定する方法が提案されている(例えば、特許文献4参照)。この方法を、真空成膜装置において、シート状のフレキシブル基材を成膜ドラムに巻き付けて保持する方法に適用すると、下記の問題点がある。
(1)フレキシブル基材に穴をあけてピンで固定する方法では、穴の周辺が変形、あるいは破損を生じる。
(2)テンショナブロックの回転径がドラム径と大きく異なるため、フレキシブル基材の曲率半径が一定とならない。そのため、フレキシブル基材が成膜ドラムから浮き、それにより、フレキシブル基材の温度分布が不均一になり、その結果、膜の厚さ、組成等が不均一になる。
(3)ドラムを巾方向に連続して切り欠く構造である。そのため、ドラム素材の内部応力による変形で真円度等の寸法精度がでにくい。
【0011】
本発明は、上記従来技術の問題点を鑑みてなされたもので、シート状のフレキシブル基材を成膜ドラムに巻き付けて成膜する真空成膜装置において、シート状のフレキシブル基材を成膜ドラムに巻き付けて基材に張力を付与して保持し、真空中で繰返し成膜し、成膜中に成膜面がローラ及びシートに触れない、成膜面の品質、生産性に優れる、真空成膜装置を提供することを目的とする。
【0012】
【課題を解決しようとする手段】
上記目的を達成するために、すなわち請求項1に係る発明は、
シート状のフレキシブル基材を成膜ドラムに巻き付けて成膜する真空成膜装置であって、
前記成膜ドラムに、フレキシブル基材を巻き付けて成膜中に該基材に張力を付与して保持する手段を具備することを特徴とする真空成膜装置である。
【0013】
また、請求項2に係る発明は、
前記成膜ドラムに巻き付けられたフレキシブル基材の曲率半径が一定であることを特徴とする請求項1記載の真空成膜装置である。
【0014】
また、請求項3に係る発明は、
前記基材に張力を付与して保持する手段が、フレキシブル基材を貼り付け保持する部材と、フレキシブル基材に張力を付与するスプリングと、該スプリングを伸縮するカムとから構成され、これらの部材を収めるための溝を具備することを特徴とする請求項1または2記載の真空成膜装置である。
【0015】
また、請求項4に係る発明は、
前記フレキシブル基材を貼り付け保持する部材に接着テープにより貼り付けることを特徴とする請求項1〜3のいずれれか1項に記載の真空成膜装置である。
【0016】
また、請求項5に係る発明は、
前記フレキシブル基材を貼り付け保持する部材にバイアス電圧を印加して静電吸着により貼り付けることを特徴とする請求項1〜3のいずれれか1項に記載の真空成膜装置である。
【0017】
【発明の実施の形態】
以下、本発明の真空成膜装置について図面に基づいて説明する。
図1〜図5は、本発明の一例を示す成膜ドラム基材保持構造の概略図である。
図1の(1−1)は、本発明の一例を示す成膜ドラム基材保持構造でフレキシブル基材取付け前の状態を示す概略上面図である。カム10により貼付け部材11が押し広げられ、スプリング16が縮んでいる状態を示す。フレキシブル基材を貼り付ける貼付け部材11とフレキシブル基材に張力を与えるスプリング16とスプリング16を縮んだ状態に固定するためのカム10とこれらの部品を収めるための溝17から成り立っている。フレキシブル基材を貼付け部材11に貼り付ける方法であるが、接着テープによる方法と貼付け部材11にバイアス電圧を印加して静電吸着する方法がある。
【0018】
図1の(1−2)は、本発明の一例を示す成膜ドラム基材保持構造でフレキシブル基材取付け前の状態を示す概略側面断面図である。
【0019】
図2の(2−1)は、本発明の一例を示す成膜ドラム基材保持構造でフレキシブル基材取付け後の状態を示す概略上面図である。カム10を90度回転することにより、押し広げられていた貼付け部材11がスプリング16の伸びる力により中心方向に移動した状態を示す。この場合はフレキシブル基材が貼られていないため、貼り付け部材11がカム10に接触して止まった状態である。
【0020】
図2の(2−2)は、本発明の一例を示す成膜ドラム基材保持構造でフレキシブル基材取付け後の状態を示す概略側面断面図である。
【0021】
図3は、本発明の一例を示す基材保持構造を備えた成膜ドラムの概略斜視図である。カム10により貼付け部材11が押し広げられ、スプリング16が縮んでいる状態を示す。この状態でフレキシブル基材の両端を貼付け部材11に貼り付ける。本図は3個の基材保持構造を示しているが、成膜ドラム巾、フレキシブル基材巾等に応じて個数は変えられる。また、円周方向も同様に、成膜ドラム径、フレキシブル基材長さ等に応じて個数は変えられる。
【0022】
図4は、本発明の一例を示す基材保持構造を備えた成膜ドラムでフレキシブル基材を貼り付けて張力をかけているところを示す概略斜視図である。図3に示す状態でフレキシブル基材の両端を貼付け部材11に貼り付けてから、カム10を90度回転する。それにより、押し広げられていた貼付け部材11がスプリング16の伸びる力により移動する。フレキシブル基材の両端が貼付け部材11に貼り付いているため、フレキシブル基材に張力が発生し、フレキシブル基材は成膜ドラムに密着する。
【0023】
図5は、本発明の一例を示す基材保持構造を備えた成膜ドラムによる真空成膜装置の概略断面図である。成膜ドラム1外周部には成膜室2〜4が配置されている。成膜方法はCVD、蒸着、スパッタリング等がある。成膜室の数は3室とは限らず成膜する種類に応じて増減することができる。成膜ドラム1外周部には成膜室2〜4の他に脱着室5があり、この部屋でフレキシブル基材の脱着が行なわれる。脱着室5には供給部6がつながっており、長尺のフレキシブル基材15を成膜ドラム1に貼り付けて切断する作業を行なう。
【0024】
以上、詳細に説明したように、本発明の真空成膜装置は、シート状のフレキシブル基材を成膜ドラムに巻き付けて成膜する真空成膜装置において、フレキシブル基材を成膜ドラムに取付ける部材の機構により、成膜中にフレキシブル基材に張力がかかることを特徴とする成膜ドラム基材保持構造である。
このことにより下記の利点がある。
(1)成膜による熱でフレキシブル基材が膨張しても、フレキシブル基材を成膜ドラムに取付ける機構が、成膜中にフレキシブル基材に張力をかけられることでたるみを防ぎ、均一な膜を成膜することができる。
(2)成膜時発生する熱によるフレキシブル基材の伸縮を吸収できるため、複数の成膜方法で複数回成膜することができる。成膜方法及び膜厚の組合せが自由にでき、多品種でなおかつ高品質の多層成膜フレキシブル基材の生産が可能となる。
(3)巻取り式真空成膜装置の場合と異なり、成膜ドラムの回転速度を変えることにより成膜時間の異なる成膜方法の組合せが可能となる。
(4)巻取り式真空成膜装置と比較して低い張力で成膜ができるため、フレキシブル基材伸縮による膜への悪影響が少ない。
(5)成膜後、成膜ドラムからフレキシブル基材を離す際、静電気が発生しにくい条件にすることで、静電気による膜の剥離等の障害がなくすことができる。
【0025】
また、本発明の真空成膜装置は、成膜ドラムに巻き付けられたフレキシブル基材の曲率半径が一定であることを特徴とする成膜ドラム基材保持構造である。
このことにより下記の利点がある。
(1)フレキシブル基材を成膜ドラムに取付ける機構が、成膜ドラムの内側にフレキシブル基材を引き込む機構の場合、引き込まれる部分の曲率半径が小さくなる。そのことによりフレキシブル基材の成膜ドラムからの浮きが発生する。フレキシブル基材の曲率半径を一定にした状態で成膜ドラムに取付けることにより、フレキシブル基材のたるみを防ぎ、均一な膜を成膜することができる。
【0026】
また、本発明の真空成膜装置は、フレキシブル基材を貼り付ける部材とフレキシブル基材に張力を与えるスプリングとこれらの部品を収めるための溝から成り立っていることを特徴とする成膜ドラム基材保持構造である。また、フレキシブル基材を貼り付ける部材とフレキシブル基材に張力を与えるスプリングとこれらの部品を収めるための溝から成り立っていて、シンプルで小スペースな構造である。
このことにより下記の利点がある。
(1)フレキシブル基材を成膜ドラムに取付ける機構が、成膜ドラムの内側に引き込む機構の場合、フレキシブル基材の巾寸法以上の巾で成膜ドラムを切り欠く必要がある。成膜ドラムの表面は通常鏡面仕上げであるが、切り欠いた後の鏡面仕上げは困難である。従って、鏡面仕上げをした後に切り欠くが、成膜ドラム素材が持っている内部応力により真円度等の精度が著しく悪くなる。それに比べ本案は成膜ドラムの外周部を部分的に切り欠くだけであるので、真円度等の精度が良好である。
【0027】
さらに、本発明の真空成膜装置は、本発明によれば、成膜面にローラが触れることが無い。このことにより下記のような品質上のメリットがある。
(1)膜がローラに付着してはがれることが無い。
(2)フレキシブル基材とローラ間のズレおよび圧縮力により膜に亀裂が生じることが無い。
(3)コンタミが挟みこまれて成膜面に埋め込まれたりすることが無い。
(4)ローラの傷が成膜面に転写されることが無い。
【0028】
以上のことから、本発明の真空成膜装置は、高品質の多層成膜フレキシブル基材を高能率で生産することが可能となる。フレキシブル基材は合成樹脂フィルムあるいはガラスが適している。多層成膜フレキシブル基材の用途としてはバリア性、反射防止性、静電防止性等の機能を有する機能性フレキシブル基材として、有機ELディスプレイ、液晶ディスプレイ、電子ペーパー等に使用される。
【0029】
【発明の効果】
本発明により、シート状のフレキシブル基材を成膜ドラムに巻き付けて成膜する真空成膜装置において、シート状のフレキシブル基材を成膜ドラムに巻き付けて基材に張力を付与して保持し、真空中で繰返し成膜し、成膜中に成膜面がローラ及びシートに触れない、成膜面の品質、生産性に優れる、真空成膜装置を提供することができる。
【0030】
特に、本発明の真空成膜装置は、シート状のフレキシブル基材を成膜ドラムに巻き付けて基材に張力を付与して保持する構造から、成膜時発生する熱によるフレキシブル基材の伸縮、弛みを防止し、均一な膜を成膜することができる成膜面の品質に優れるものである。
【図面の簡単な説明】
【図1】(1−1)は、本発明の一例を示す成膜ドラム基材保持構造でフレキシブル基材取付け前の状態を示す概略上面図である。
(1−2)は、本発明の一例を示す成膜ドラム基材保持構造でフレキシブル基材取付け前の状態を示す概略側面断面図である。
【図2】(2−1)は、本発明の一例を示す成膜ドラム基材保持構造でフレキシブル基材取付け後の状態を示す概略上面図である。
(2−2)は、本発明の一例を示す成膜ドラム基材保持構造でフレキシブル基材取付け後の状態を示す概略側面断面図である。
【図3】本発明の一例を示す基材保持構造を備えた成膜ドラムの概略斜視図である。
【図4】本発明の一例を示す基材保持構造を備えた成膜ドラムでフレキシブル基材を貼り付けて張力をかけているところを示す概略斜視図である。
【図5】本発明の一例を示す基材保持構造を備えた成膜ドラムによる真空成膜装置の概略断面図である。
【図6】従来のインライン式真空成膜装置の一例を示す概略断面図である。
【図7】従来のマルチチャンバ式真空成膜装置の一例を示す概略断面図である。
【図8】従来の巻取り式真空成膜装置の一例を示す概略断面図である。
【図9】従来の方法で、巻取り式真空成膜装置の成膜ドラムにシート状のフレキシブル基材をテープで貼り付けた状態を示す概略斜視図である。
【符号の説明】
1・・・成膜ドラム
2・・・成膜室
3・・・成膜室
4・・・成膜室
5・・・脱着室
6・・・供給部
7・・・排出部
8・・・真空遮断弁
9・・・真空遮断弁
10・・・カム
11・・・貼付け部材
12・・・フレキシブル基材
13・・・基材搬送台
14・・・ロボットハンド
15・・・長尺フレキシブル基材
16・・・スプリング
17・・・溝
[0001]
TECHNICAL FIELD OF THE INVENTION
According to the present invention, a sheet-shaped flexible base material is wound around a film forming drum, tension is applied to the base material and held, and a film is repeatedly formed in a vacuum, and a film forming surface does not touch a roller and a sheet during film formation. The present invention relates to a vacuum film forming apparatus.
[0002]
[Prior art]
A conventional vacuum film forming apparatus will be described with reference to FIGS.
FIG. 6 shows an example of a conventional vacuum film forming apparatus, which is an in-line vacuum film forming apparatus. The sheet-shaped substrate is fixed to the substrate transport table 13 by the supply unit 6. At that time, the vacuum shut-off valve 8 is closed. After the substrate is fixed, the atmospheric pressure of the supply unit 6 is exhausted and the pressure becomes the same as that of the film forming chamber 2. Thereafter, the vacuum shut-off valve 8 is closed, and a film is formed. Thereafter, the film is similarly transferred to each of the film forming chambers 2 to 4 and formed. By repeatedly moving forward and backward, a multilayer film can be formed. As described above, the conventional in-line type vacuum film forming apparatus is composed of the adjacent film forming chambers, the vacuum shut-off valve for separating the adjacent film forming chambers, and the substrate transfer table moving between the film forming chambers. (For example, see Patent Document 1)
[0003]
FIG. 7 shows an example of a conventional vacuum film forming apparatus, which is a multi-chamber type vacuum film forming apparatus. The sheet-shaped substrate is fixed to the substrate transport table 13 by the supply unit 6. At that time, the vacuum shut-off valve 8 is closed. After the substrate is fixed, when the atmospheric pressure of the supply unit 6 is exhausted and the pressure becomes the same as that of the central room, the vacuum shut-off valve 8 is opened and the substrate transfer table 13 is moved by the robot hand 14 through the central room to form the respective film forming chambers 2 To 4 and the substrate on the substrate transport table 13 is formed into a film. A multilayer film can be formed by repeating the transfer of the substrate into and out of each of the film forming chambers 2 to 4 by the robot hand 14. As described above, the conventional multi-chamber vacuum film forming apparatus is composed of a plurality of film forming chambers, a room surrounded by the film forming chambers, a vacuum shut-off valve for separating the chambers, and a substrate transfer device for moving the substrate to the film forming chambers. ing. (For example, see Patent Document 2)
[0004]
FIG. 8 shows an example of a conventional vacuum film forming apparatus, which is a roll-up type vacuum film forming apparatus.
The roll-shaped long flexible base material 15 is wound around the film forming drum 1 in a vacuum, passed through the film forming chambers 2 to 4, continuously formed, and then wound up. By forming the film in reverse, a multilayer film can be formed. As described above, the conventional winding type vacuum film forming apparatus includes the unwinding unit, the film forming unit, and the winding unit. (For example, see Patent Document 3)
[0005]
FIG. 9 shows a state in which a sheet-like flexible base material 12 is attached to a film forming drum 1 of a roll-up type vacuum film forming apparatus with a tape. By forming a film while rotating the film forming drum 1, a multilayer film can be formed. An invention in which a flexible sheet is wound around a drum and tension is applied has already been disclosed. A mounting strip for engaging a first end of the flexible sheet; a plurality of tensioner blocks rotatably mounted on the drum; and a plurality of tensioner blocks for engaging a second end of the flexible sheet. Pins, each connected to a tensioner block, each of which is movably extending above the surface of the exposure drum, and for moving the pins along the surface of the exposure drum to adjust the tension of the photosensitive sheet. Means for operating the tensioner block. (For example, see Patent Document 4)
[0006]
[Patent Document 1]
JP-A-5-295551 [Patent Document 2]
JP-A-10-303276 [Patent Document 3]
Japanese Patent Application Laid-Open No. 2000-17437 [Patent Document 4]
JP-A-7-28359
[Problems to be solved by the invention]
In the case of the conventional vacuum film forming apparatus used for multilayer film forming shown in FIGS. 6 and 7, it is possible to repeatedly form a film by a plurality of film forming methods and take it out to the atmosphere without a roller touching the film forming surface. Although possible, there are the following problems.
(1) The vacuum shut-off valve is opened when a sheet is taken in and out of the film formation chamber. For this reason, film forming conditions such as pressure and temperature fluctuate, and it takes a long time to reach the optimum conditions. As a result, productivity becomes a problem.
(2) If the sheet fixing plate for controlling the temperature of the sheet is flat, there are places where the sheet floats from the fixing plate. As a result, temperature unevenness occurs, which causes unevenness in the film thickness and the film composition, thereby causing quality problems.
[0008]
Further, in the case of the conventional vacuum film forming apparatus used for the multilayer film forming shown in FIG. 8, it is possible to supply the roll-shaped long flexible base material 15 and repeatedly form the film by a plurality of film forming methods. It is. Since the film is wound around the film forming drum to form a film, if the temperature of the film forming drum is controlled uniformly, the temperature of the sheet surface becomes uniform because the sheet is in close contact. In addition, productivity can be improved because a film can be continuously formed. However, there are the following problems.
(1) Since the roller contacts the film forming surface, there is a problem in quality of the film forming surface.
(2) In order to perform multi-layer film formation, it is necessary to match the film formation time of each film formation method because of the winding type, and the combination of film formation methods or the combination of film thicknesses is limited.
(3) A high tension is required to transport the long flexible base material, and the film is adversely affected by the expansion and contraction of the film.
(4) When the film separates from the film forming drum, troubles such as peeling of the film due to static electricity occur.
[0009]
In order to avoid the above-mentioned drawbacks, as a conventional method used for the multilayer film formation shown in FIG. There is also a method of repeatedly forming a film by sticking and rotating to form a film. However, there are the following problems.
(1) The flexible substrate expands due to the heat generated during film formation, which causes the flexible substrate to sag. As a result, the temperature distribution of the flexible base material becomes non-uniform, and as a result, the thickness, composition, and the like of the film become non-uniform.
[0010]
On the other hand, there has been proposed a method of attaching and fixing an exposure drum mask to the surface of an exposure drum (for example, see Patent Document 4). If this method is applied to a method in which a sheet-like flexible substrate is wound around a film forming drum and held in a vacuum film forming apparatus, the following problems occur.
(1) In the method of making a hole in the flexible base material and fixing it with a pin, the periphery of the hole is deformed or damaged.
(2) Since the rotation diameter of the tensioner block is significantly different from the drum diameter, the radius of curvature of the flexible base material is not constant. As a result, the flexible base material floats from the film forming drum, whereby the temperature distribution of the flexible base material becomes non-uniform, and as a result, the thickness, composition, and the like of the film become non-uniform.
(3) The drum is cut out continuously in the width direction. Therefore, dimensional accuracy such as roundness is difficult to obtain due to deformation due to internal stress of the drum material.
[0011]
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the related art, and is directed to a vacuum film forming apparatus that winds a sheet-shaped flexible substrate around a film-forming drum to form a film. And hold the substrate by applying tension to the substrate, forming the film repeatedly in a vacuum. The film forming surface does not touch the rollers and sheets during film formation, and the film forming surface is excellent in quality and productivity. It is an object to provide a membrane device.
[0012]
[Means to solve the problem]
In order to achieve the above object, that is, the invention according to claim 1,
A vacuum film forming apparatus that winds a sheet-like flexible substrate around a film forming drum to form a film,
A vacuum film forming apparatus, comprising: means for winding a flexible substrate around the film forming drum to apply tension to the substrate during film formation and hold the substrate.
[0013]
The invention according to claim 2 is
2. The vacuum film forming apparatus according to claim 1, wherein the radius of curvature of the flexible substrate wound around the film forming drum is constant.
[0014]
The invention according to claim 3 is:
The means for applying tension to and holding the base material includes a member that sticks and holds the flexible base material, a spring that applies tension to the flexible base material, and a cam that expands and contracts the spring. 3. The vacuum film forming apparatus according to claim 1, further comprising a groove for accommodating therein.
[0015]
The invention according to claim 4 is
The vacuum film forming apparatus according to any one of claims 1 to 3, wherein the flexible base material is attached to a member for attaching and holding the flexible base material with an adhesive tape.
[0016]
The invention according to claim 5 is
The vacuum film forming apparatus according to any one of claims 1 to 3, wherein a bias voltage is applied to a member for attaching and holding the flexible substrate, and the flexible substrate is attached by electrostatic attraction.
[0017]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, a vacuum film forming apparatus of the present invention will be described with reference to the drawings.
1 to 5 are schematic diagrams of a film-forming drum substrate holding structure showing an example of the present invention.
(1-1) of FIG. 1 is a schematic top view showing a state before attaching a flexible substrate in a film forming drum substrate holding structure showing an example of the present invention. The state where the attaching member 11 is pushed and spread by the cam 10 and the spring 16 is contracted is shown. It comprises an attaching member 11 for attaching the flexible base material, a spring 16 for applying tension to the flexible base material, a cam 10 for fixing the spring 16 in a contracted state, and a groove 17 for accommodating these components. The method of attaching the flexible base material to the attaching member 11 includes a method using an adhesive tape and a method of applying a bias voltage to the attaching member 11 to perform electrostatic attraction.
[0018]
FIG. 1B is a schematic side cross-sectional view showing a state before attaching a flexible substrate in the film forming drum substrate holding structure according to an example of the present invention.
[0019]
FIG. 2A is a schematic top view illustrating a state after the flexible base material is attached in the film forming drum base material holding structure according to an example of the present invention. This shows a state in which, by rotating the cam 10 by 90 degrees, the pasting member 11 that has been spread has moved in the center direction due to the extension force of the spring 16. In this case, since the flexible base material is not stuck, the sticking member 11 is in a state of contacting the cam 10 and stopping.
[0020]
FIG. 2B is a schematic side cross-sectional view illustrating a state after the flexible substrate is attached in the film forming drum substrate holding structure according to an example of the present invention.
[0021]
FIG. 3 is a schematic perspective view of a film forming drum having a substrate holding structure according to an example of the present invention. The state where the attaching member 11 is pushed and spread by the cam 10 and the spring 16 is contracted is shown. In this state, both ends of the flexible base material are attached to the attaching member 11. Although this figure shows three substrate holding structures, the number can be changed according to the film forming drum width, the flexible substrate width, and the like. Similarly, the number in the circumferential direction can be changed according to the diameter of the film forming drum, the length of the flexible base material, and the like.
[0022]
FIG. 4 is a schematic perspective view showing a state where a flexible substrate is attached and tension is applied by a film forming drum having a substrate holding structure according to an example of the present invention. After attaching both ends of the flexible base material to the attaching member 11 in the state shown in FIG. 3, the cam 10 is rotated by 90 degrees. Thereby, the pasting member 11 that has been spread is moved by the force of the spring 16 extending. Since both ends of the flexible substrate are attached to the attaching member 11, tension is generated in the flexible substrate, and the flexible substrate comes into close contact with the film forming drum.
[0023]
FIG. 5 is a schematic cross-sectional view of a vacuum film forming apparatus using a film forming drum having a substrate holding structure according to an example of the present invention. Film forming chambers 2 to 4 are arranged on the outer peripheral portion of the film forming drum 1. The film formation method includes CVD, vapor deposition, sputtering and the like. The number of film formation chambers is not limited to three, but can be increased or decreased according to the type of film formation. In addition to the deposition chambers 2 to 4, a desorption chamber 5 is provided on the outer peripheral portion of the deposition drum 1, in which the flexible substrate is desorbed. The supply unit 6 is connected to the desorption chamber 5, and performs an operation of attaching and cutting the long flexible base material 15 to the film forming drum 1.
[0024]
As described in detail above, the vacuum film forming apparatus of the present invention is a vacuum film forming apparatus that winds a sheet-shaped flexible substrate around a film forming drum to form a film. The film forming drum substrate holding structure is characterized in that tension is applied to the flexible substrate during the film formation by the above mechanism.
This has the following advantages.
(1) Even if the flexible base material expands due to the heat generated by the film formation, the mechanism for attaching the flexible base material to the film forming drum prevents the sag by applying tension to the flexible base material during the film formation, thereby providing a uniform film. Can be formed.
(2) Since the expansion and contraction of the flexible base material due to heat generated during film formation can be absorbed, film formation can be performed a plurality of times by a plurality of film formation methods. The combination of the film forming method and the film thickness can be freely set, and it is possible to produce a multi-layer, high-quality, multilayer film-formed flexible substrate.
(3) Unlike the case of the winding type vacuum film forming apparatus, by changing the rotation speed of the film forming drum, a combination of film forming methods having different film forming times becomes possible.
(4) Since the film can be formed with a lower tension as compared with a roll-up type vacuum film forming apparatus, there is little adverse effect on the film due to expansion and contraction of the flexible base material.
(5) When the flexible substrate is separated from the film-forming drum after film formation, it is possible to eliminate obstacles such as peeling of the film due to static electricity by setting the conditions under which static electricity is hardly generated.
[0025]
Further, the vacuum film forming apparatus of the present invention is a film forming drum substrate holding structure, characterized in that the flexible substrate wound around the film forming drum has a constant radius of curvature.
This has the following advantages.
(1) When the mechanism for attaching the flexible base material to the film forming drum is a mechanism for drawing the flexible base material into the inside of the film forming drum, the radius of curvature of the drawn part becomes small. As a result, floating of the flexible base material from the film forming drum occurs. By attaching the flexible substrate to the film forming drum in a state where the radius of curvature is constant, the flexible substrate can be prevented from sagging and a uniform film can be formed.
[0026]
Further, the vacuum film forming apparatus of the present invention is characterized by comprising a member for attaching a flexible substrate, a spring for applying tension to the flexible substrate, and a groove for accommodating these components. It is a holding structure. Further, the structure is composed of a member for attaching the flexible base material, a spring for applying tension to the flexible base material, and a groove for accommodating these components, and has a simple and small space structure.
This has the following advantages.
(1) When the mechanism for attaching the flexible substrate to the film forming drum is a mechanism for drawing the inside of the film forming drum, it is necessary to cut out the film forming drum with a width equal to or larger than the width of the flexible substrate. The surface of the film forming drum is usually mirror-finished, but it is difficult to mirror-finish after the notch. Therefore, the notch is formed after the mirror finish, but the accuracy such as the roundness is significantly deteriorated due to the internal stress of the film forming drum material. On the other hand, in the present invention, since the outer peripheral portion of the film forming drum is only partially cut out, accuracy such as roundness is excellent.
[0027]
Furthermore, in the vacuum film forming apparatus of the present invention, according to the present invention, the roller does not touch the film forming surface. This has the following quality advantages.
(1) The film does not adhere to the roller and peel off.
(2) There is no crack in the film due to the displacement between the flexible substrate and the roller and the compressive force.
(3) Contaminants are not inserted and buried in the film formation surface.
(4) No scratch on the roller is transferred to the film formation surface.
[0028]
As described above, the vacuum film forming apparatus of the present invention can produce a high quality multilayer film flexible substrate with high efficiency. As the flexible substrate, a synthetic resin film or glass is suitable. The multilayered flexible substrate is used as a functional flexible substrate having functions such as a barrier property, an antireflection property, and an antistatic property, for example, an organic EL display, a liquid crystal display, and an electronic paper.
[0029]
【The invention's effect】
According to the present invention, in a vacuum film forming apparatus that winds a sheet-shaped flexible substrate around a film-forming drum to form a film, the sheet-shaped flexible substrate is wound around the film-forming drum, and tension is applied to the substrate, and the substrate is held. It is possible to provide a vacuum film forming apparatus in which a film is repeatedly formed in a vacuum and the film forming surface does not contact a roller and a sheet during the film forming and has excellent film forming surface quality and productivity.
[0030]
In particular, the vacuum film forming apparatus of the present invention has a structure in which a sheet-shaped flexible base material is wound around a film forming drum and tension is applied to the base material to hold the base material. It is excellent in quality of a film forming surface capable of preventing loosening and forming a uniform film.
[Brief description of the drawings]
FIG. 1A is a schematic top view showing a state before attaching a flexible substrate in a film forming drum substrate holding structure according to an embodiment of the present invention.
(1-2) is a schematic side sectional view showing a state before attaching a flexible base material in the film forming drum base material holding structure according to an example of the present invention.
FIG. 2 (2-1) is a schematic top view showing a state after attaching a flexible substrate in a film forming drum substrate holding structure according to an example of the present invention.
(2-2) is a schematic side sectional view showing a state after attaching a flexible substrate in the film-forming drum substrate holding structure showing one example of the present invention.
FIG. 3 is a schematic perspective view of a film forming drum provided with a substrate holding structure according to an example of the present invention.
FIG. 4 is a schematic perspective view showing a state where a flexible substrate is attached and tension is applied by a film forming drum having a substrate holding structure according to an example of the present invention.
FIG. 5 is a schematic sectional view of a vacuum film forming apparatus using a film forming drum having a substrate holding structure according to an embodiment of the present invention.
FIG. 6 is a schematic sectional view showing an example of a conventional in-line type vacuum film forming apparatus.
FIG. 7 is a schematic sectional view showing an example of a conventional multi-chamber type vacuum film forming apparatus.
FIG. 8 is a schematic sectional view showing an example of a conventional winding type vacuum film forming apparatus.
FIG. 9 is a schematic perspective view showing a state in which a sheet-like flexible base material is attached to a film forming drum of a roll-up type vacuum film forming apparatus with a tape by a conventional method.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 ... Film-forming drum 2 ... Film-forming chamber 3 ... Film-forming chamber 4 ... Film-forming chamber 5 ... Desorption chamber 6 ... Supply part 7 ... Discharge part 8 ... Vacuum shutoff valve 9 Vacuum shutoff valve 10 Cam 11 Adhering member 12 Flexible substrate 13 Substrate carrier 14 Robot hand 15 Long flexible base Material 16: Spring 17: Groove

Claims (5)

シート状のフレキシブル基材を成膜ドラムに巻き付けて成膜する真空成膜装置であって、
前記成膜ドラムに、フレキシブル基材を巻き付けて成膜中に該基材に張力を付与して保持する手段を具備することを特徴とする真空成膜装置。
A vacuum film forming apparatus that winds a sheet-shaped flexible base material around a film forming drum to form a film,
A vacuum film forming apparatus, comprising: means for winding a flexible substrate around the film forming drum to apply tension to the substrate during film formation and hold the substrate.
前記成膜ドラムに巻き付けられたフレキシブル基材の曲率半径が一定であることを特徴とする請求項1記載の真空成膜装置。2. The vacuum film forming apparatus according to claim 1, wherein a radius of curvature of the flexible substrate wound around the film forming drum is constant. 前記基材に張力を付与して保持する手段が、フレキシブル基材を貼り付け保持する部材と、該フレキシブル基材に張力を付与するスプリングと、該スプリングを伸縮するカムとから構成され、これらの部材を収めるための溝を具備することを特徴とする請求項1または2記載の真空成膜装置。The means for applying tension to and holding the substrate is a member that sticks and holds a flexible substrate, a spring that applies tension to the flexible substrate, and a cam that expands and contracts the spring. 3. The vacuum film forming apparatus according to claim 1, further comprising a groove for accommodating the member. 前記フレキシブル基材を貼り付け保持する部材に、接着テープにより貼り付けることを特徴とする請求項1〜3のいずれれか1項に記載の真空成膜装置。The vacuum film forming apparatus according to any one of claims 1 to 3, wherein the flexible base material is attached to a member for attaching and holding the flexible base material with an adhesive tape. 前記フレキシブル基材を貼り付け保持する部材に、バイアス電圧を印加して静電吸着により貼り付けることを特徴とする請求項1〜3のいずれれか1項に記載の真空成膜装置。The vacuum film forming apparatus according to any one of claims 1 to 3, wherein a bias voltage is applied to a member for attaching and holding the flexible base material, and the flexible base material is attached by electrostatic attraction.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012092448A (en) * 2010-10-22 2012-05-17 Samsung Mobile Display Co Ltd Device for organic layer deposition and method of manufacturing organic light emitting display device using the same
WO2022210395A1 (en) * 2021-03-31 2022-10-06 日立造船株式会社 Vacuum film formation device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012092448A (en) * 2010-10-22 2012-05-17 Samsung Mobile Display Co Ltd Device for organic layer deposition and method of manufacturing organic light emitting display device using the same
WO2022210395A1 (en) * 2021-03-31 2022-10-06 日立造船株式会社 Vacuum film formation device

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