JP2004050026A - Coating apparatus - Google Patents

Coating apparatus Download PDF

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Publication number
JP2004050026A
JP2004050026A JP2002210208A JP2002210208A JP2004050026A JP 2004050026 A JP2004050026 A JP 2004050026A JP 2002210208 A JP2002210208 A JP 2002210208A JP 2002210208 A JP2002210208 A JP 2002210208A JP 2004050026 A JP2004050026 A JP 2004050026A
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JP
Japan
Prior art keywords
coating
pump
die head
pressure
pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002210208A
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Japanese (ja)
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JP4197107B2 (en
Inventor
Takeaki Tsuda
津田 武明
Hiroshi Yoshiba
吉羽 洋
Takashi Aoki
青木 孝
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Priority to JP2002210208A priority Critical patent/JP4197107B2/en
Publication of JP2004050026A publication Critical patent/JP2004050026A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To reduce the insufficient region of film thickness which occurs in the start of the coating in a coating apparatus using a die head. <P>SOLUTION: In the coating apparatus provided with a chuck table 2 holding a base material 1 and moving, the coating die head 3 for applying a coating liquid on the base material 1, and piping 8 and a pump 6 connected to supply the coating liquid to the die head 3, a back pressure valve 15 for holding inside of the piping to the pump 6 at a desired pressure is provided to the piping 8 located close to the die head, and a proper pressure is applied to the inside of the piping 8 regularly and a discharge pressure is rapidly raised in the start of the operation of the pump to secure the desired discharge quantity in a short period of time. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は、ガラス板などの平板状の基材に対して、ダイヘッドを用いて塗布液を高精度で塗布する技術に関する。
【0002】
【従来の技術】
液晶用カラーフィルタの製造工程において、ガラス板などの基材に対して、R、G、Bの各色の層の形成、或いは表面保護層や柱材の形成のために、液状のレジストを塗布することが行われている。これらのレジストの塗布に当たっては高精度塗布が必要であることから、通常、基材表面に過剰量の液滴を供給し、基材を高速回転させて薄く均一に拡げるスピン方式が用いられている。しかし、この方法では供給したレジストの大半が周囲に飛散してしまうため、レジストの消費量が多くなり、コスト高となるという問題があった。
【0003】
【発明が解決しようとする課題】
そこで、これに代わる方法として、ダイヘッドを用いた塗布方法が試みられている。図3は、ダイヘッドを用いた塗工装置の1例を示すもので、1は、塗布すべき基材、2はその基材1を保持して水平に移動させるチャック台、3は、チャック台2に保持された基材1の上方に、吐出口を近接させて設けられた塗工用のダイヘッド、4はダイヘッド3によって基材表面に形成されたレジスト層、5は塗布すべき液状のレジスト(塗布液という)を収容したタンク、6は、タンク5の塗布液をダイヘッド3に供給するポンプ、7はそのポンプ内の圧力を検出する内蔵圧力計、8は配管である。ポンプ6には、吐出量を高精度で制御する必要があることから、高精密シリンジポンプ、ダイアフラムポンプ、チューブフラムポンプなどが用いられる。この塗工装置による塗布動作は、次のように行われる。まず、基板1の塗布開始位置(先端)をダイヘッド3の直下に位置させ、且つダイヘッド3を基板1に近接させた状態で、ポンプ6の作動を開始し、塗布液をダイヘッド3の先端から吐出してダイヘッド3と基材1の間に塗布液の溜まり(ビード)を形成し、次いで、ダイヘッド3からの塗布液の吐出を継続したままで、チャック台2を矢印Aで示す方向に一定速度で走行させ、基材1をダイヘッド3に対して移動させことで、塗布液を基材1表面に所定厚さに塗布し、基材1の塗布終了位置(後端)まで塗布液を塗布した後、ポンプ6を停止し、ダイヘッド3からの塗布液の吐出を停止する。これにより、基材1の表面にレジスト層4を形成できる。以下、同様の動作を次の基材1に対して繰り返すことで、枚葉の基材1に対して次々とレジスト層4を形成できる。
【0004】
ところが、この塗工装置による塗布では、図4に示すように、塗布開始からある程度時間が経過した後に塗布した領域は、塗布厚が一定となった定常領域となっているが、塗布開始時に塗布したかなりの領域(例えば、3〜5cm程度)では膜厚が薄くなっているという現象があり、この領域(膜厚不足領域)は、近年激しいスペックが要求されるカラーフィルタに用いるレジスト層には用いることができず、除去しなければないないという問題があった。
【0005】
本発明はかかる問題点に鑑みてなされたもので、ダイヘッドを用いた塗工装置において塗布開始時に生じる膜厚不足領域を小さくすることを可能とする塗工装置を提供することを課題とする。
【0006】
【課題を解決するための手段】
本発明者らは、塗布開始時の膜厚不足領域発生の原因を検討した結果、次の事項を見出した。すなわち、図3に示す塗工装置では、1枚の基板1に対して塗布を終了すると、ポンプ6を停止させるため、ポンプ6及び配管8内の圧力が一旦開放され、圧力0の状態となり、その状態から次の基板1に対する塗布のためにポンプ6を作動させることとなる。この時、ポンプ6として用いられる高精密シリンジポンプ、ダイアフラムポンプ、チューブフラムポンプなどでは、図4のグラフに曲線11で示すように、作動を開始した後、吐出側配管内の圧力がゆっくりと上昇し、所望の一定圧力Pに達するまでに、数秒程度の時間がかっており、このためダイヘッド3からの吐出量も、曲線12で示すようにゆっくりと増加し、所望の一定吐出量Qに達するまでに数秒程度の時間がかかり、この間に塗布した領域の膜厚が薄くなっていた。従って、ポンプ6の停止中も配管8内の圧力を高く保持しておけば、塗布開始時の吐出量不足を抑制できる。本発明はかかる知見に基づいてなされたもので、塗工用ダイヘッドと、該ダイヘッドに塗布液を供給するよう連結された配管及びポンプとを備えた塗工装置において、前記ダイヘッドに近接した位置の配管に、前記ポンプに至るまでの配管内を所望の圧力に保持する背圧弁を設けるという構成としたものである。この構成により、ポンプの停止中も配管内が所望の圧力に保たれており、塗布開始のためにポンプの作動を開始した時における吐出圧力は、何も圧力をかけていない場合に比べて、圧力の立ち上がりが速くスムーズになり、このため短時間で所望の吐出量を確保でき、塗布開始時に生じる膜厚不足領域をきわめて短くできる。
【0007】
【発明の実施の形態】
本発明に係る塗工装置の基本形態は、基材に対して相対的に移動しながら塗布液を吐出し、前記基材表面に塗布する塗工用ダイヘッドと、該ダイヘッドに塗布液を供給するよう連結された配管及びポンプと、前記ダイヘッドに近接した位置で前記配管に設けられ、前記ポンプに至るまでの配管内を所望の圧力に保持する背圧弁とを備えたものである。
【0008】
ここで用いるポンプは、吐出量を精密に制御できるよう、シリンジポンプ、ダイアフラムポンプ又はチューブフラムポンプとすることが好ましく、特に、ダイアフラムポンプ又はチューブフラムポンプは、作動開始時の吐出圧力の立ち上がりに時間がかかる傾向があるので、本発明適用の効果が大きい。
【0009】
前記背圧弁が配管内にかける圧力は、通常、0.1〜10kgf/cm2 程度に設定されるが、好ましくは、背圧弁を設けない場合における定常塗布時に前記ポンプ吐出口側に生じている圧力にほぼ等しく設定する。このように設定しておくと、より敏速に所望の吐出量を確保できる。
【0010】
本発明に使用する背圧弁は、配管内を所望の圧力に保持できるものであれば任意であるが、エア供給式のダイアフラム弁を用いることが好ましい。エア供給式のダイアフラム弁は供給エア圧力の調整によって容易に配管内圧力を所望の圧力に調整できる利点を有している。
【0011】
以下、図面に示す本発明の好適な実施の形態を説明する。図1は本発明の好適な実施の形態に係る塗工装置の概略斜視図であり、図3に示す塗工装置と同一又は同様な部品には同一符号を付している。図1に示す塗工装置では、ポンプ6からダイヘッド3に至る配管8に、ダイヘッド3に極力近接させて背圧弁15と圧力計16を配置している。背圧弁15は、配管8内に液が流れている状態、流れていない状態のいずれにおいても、配管8内の圧力を、常時任意に設定した圧力に保つことができる機能を備えたものであり、ここではエア供給式のダイアフラム弁が用いられ、その背圧弁15には、所望圧力のエアを供給するエア供給装置17が接続されている。エア供給式のダイアフラム弁による配管内圧力の調整は、外部からエアを供給し、そのエアで作動するダイアフラムが配管内の液を押したり引いたりすることにより行われており、供給エアの圧力設定により、配管8内の圧力を任意に設定できる。その他の構成は、図3に示す塗工装置と同様である。
【0012】
次に、図1に示す塗工装置による塗布動作を説明する。背圧弁15には、エア供給装置17により常時、所望圧力のエアが供給されており、背圧弁15は配管8内を常時、所望圧力に保持している。背圧弁15が配管8内を保持する圧力としては、背圧弁を設けない場合において定常塗布時にポンプ6の吐出口側に生じている圧力(例えば、0.5kgf/cm2 )にほぼ等しく設定しておく。この状態で、塗布動作が行われる。すなわち、基板1の塗布開始位置(先端)をダイヘッド3の直下に位置させ、且つダイヘッド3を基板1に近接させた状態で、ポンプ6の作動を開始し、塗布液をダイヘッド3の先端から吐出してダイヘッド3と基材1の間に塗布液の溜まり(ビード)を形成し、次いで、ダイヘッド3からの塗布液の吐出を継続したまま、チャック台2及び基材1を矢印Aで示す方向に一定速度で走行させ、基材1に塗布液を所定厚さに塗布し、基材1の塗布終了位置(後端)まで塗布液を塗布した後、ポンプ6を停止し、ダイヘッド3からの塗布液の吐出を停止する。これにより、基材1の表面にレジスト層4を形成できる。
【0013】
ここで、塗布開始時において、ポンプ6が作動を開始した時、配管8内は、図2のグラフに直線21で示すように、すでに所定の圧力Pとなっている。このため、ポンプ6の吐出圧は直ちに所定の圧力Pに達することとなり、ダイヘッド3からの吐出量は、図2の線22で示すように、急激に所望の吐出量Qに到達する。ポンプ6の作動開始から所望の吐出量Qに到達するまでの時間は、背圧弁を設けていない場合に、圧力が曲線11のように上昇し、吐出量が曲線12で示すようにゆっくりと増加する場合に比べて、きわめて短縮されている。かくして、塗布開始時の膜厚不足領域を、きわめて短くでき、基板1のほとんどの部分を有効に利用できる。
【0014】
【発明の効果】
以上に説明したように、本発明により、チューブフラムポンプなどの欠点である液吐出開始時における圧力の立ち上がりが遅く、それにより所定の吐出量を確保するまでに時間がかかるという問題を解決し、塗布開始時における膜厚の薄くなる領域を短くすることができる。このため、本発明の塗工装置は、近年激しいスペックが要求されるカラーフィルタに用いるレジスト層の形成にも有効に用いることができるといった効果を有している。
【図面の簡単な説明】
【図1】本発明の実施の形態に係る塗工装置の概略斜視図
【図2】図1の塗工装置による塗工開始時の圧力及び吐出量の変化を示すグラフ並びに基材表面のレジスト層の厚さを誇張して示す概略断面図
【図3】カラーフィルタのレジスト層を形成するために提案された塗工装置の概略斜視図
【図4】図3の塗工装置による塗工開始時の圧力及び吐出量の変化を示すグラフ並びに基材表面のレジスト層の厚さを誇張して示す概略断面図
【符号の説明】
1 基材
2 チャック台
3 塗工用ダイヘッド
4 レジスト層
5 タンク
6 ポンプ
7 内蔵圧力計
8 配管
15 背圧弁
16 圧力計
17 エア供給装置
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a technique for applying a coating liquid with high accuracy to a flat substrate such as a glass plate using a die head.
[0002]
[Prior art]
In the manufacturing process of a liquid crystal color filter, a liquid resist is applied to a base material such as a glass plate to form layers of each color of R, G, and B, or to form a surface protective layer and a pillar. That is being done. Since high-precision coating is required for coating these resists, a spin method is generally used in which an excessive amount of liquid droplets is supplied to the surface of the base material, and the base material is rotated at a high speed to spread the resist thinly and uniformly. . However, in this method, most of the supplied resist is scattered around, so that there is a problem that the consumption of the resist increases and the cost increases.
[0003]
[Problems to be solved by the invention]
Therefore, as an alternative method, a coating method using a die head has been attempted. FIG. 3 shows an example of a coating apparatus using a die head. 1 is a substrate to be coated, 2 is a chuck table for holding and moving the substrate 1 horizontally, and 3 is a chuck table. A coating die head provided above the base material 1 held by 2 with the discharge ports close to each other; 4, a resist layer formed on the base material surface by the die head 3; and 5, a liquid resist to be coated. A tank containing a coating liquid (referred to as a coating liquid), a pump 6 for supplying the coating liquid in the tank 5 to the die head 3, a built-in pressure gauge 7 for detecting the pressure in the pump, and a pipe 8 are provided. As the pump 6 needs to control the discharge amount with high precision, a high-precision syringe pump, a diaphragm pump, a tube diaphragm pump, or the like is used. The coating operation by this coating device is performed as follows. First, the operation of the pump 6 is started with the coating start position (tip) of the substrate 1 positioned immediately below the die head 3 and the die head 3 close to the substrate 1, and the coating liquid is discharged from the tip of the die head 3. Then, a pool (bead) of the coating liquid is formed between the die head 3 and the base material 1. By moving the substrate 1 with respect to the die head 3, the application liquid was applied to the surface of the substrate 1 to a predetermined thickness, and the application liquid was applied to the application end position (rear end) of the substrate 1. Thereafter, the pump 6 is stopped, and the discharge of the coating liquid from the die head 3 is stopped. Thereby, the resist layer 4 can be formed on the surface of the substrate 1. Hereinafter, by repeating the same operation for the next substrate 1, the resist layer 4 can be successively formed on the single substrate 1.
[0004]
However, in the application by the coating apparatus, as shown in FIG. 4, the area applied after a certain time has elapsed from the start of application is a steady area where the applied thickness is constant. In a considerable area (for example, about 3 to 5 cm), there is a phenomenon that the film thickness becomes thin. This area (insufficient film thickness area) is used in a resist layer used for a color filter which requires severe specifications in recent years. There was a problem that it could not be used and had to be removed.
[0005]
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and it is an object of the present invention to provide a coating apparatus that can reduce a film thickness insufficiency region generated at the start of coating in a coating apparatus using a die head.
[0006]
[Means for Solving the Problems]
The present inventors have studied the cause of the occurrence of the insufficient film thickness region at the start of coating, and have found the following. In other words, in the coating apparatus shown in FIG. 3, when the coating on one substrate 1 is completed, the pump 6 is stopped, so that the pressure in the pump 6 and the pipe 8 is temporarily released, and the pressure becomes zero. From this state, the pump 6 is operated for application to the next substrate 1. At this time, in the high-precision syringe pump, diaphragm pump, tube diaphragm pump and the like used as the pump 6, as shown by the curve 11 in the graph of FIG. However, it takes about several seconds to reach the desired constant pressure P. Therefore, the discharge amount from the die head 3 also increases slowly as shown by the curve 12 until the desired constant discharge amount Q is reached. It took about several seconds to complete the process, and during this time, the thickness of the applied region was thin. Therefore, if the pressure in the pipe 8 is kept high even while the pump 6 is stopped, the shortage of the discharge amount at the start of coating can be suppressed. The present invention has been made based on such knowledge, and in a coating apparatus having a coating die head and a pipe and a pump connected to supply a coating liquid to the die head, a coating device having a position close to the die head. The pipe is provided with a back pressure valve for maintaining a desired pressure in the pipe leading to the pump. With this configuration, even when the pump is stopped, the inside of the pipe is maintained at a desired pressure, and the discharge pressure when the operation of the pump is started for application start is smaller than when no pressure is applied. The pressure rises quickly and smoothly, so that a desired discharge amount can be secured in a short time, and the region of insufficient film thickness occurring at the start of coating can be extremely short.
[0007]
BEST MODE FOR CARRYING OUT THE INVENTION
The basic form of the coating apparatus according to the present invention is to discharge a coating liquid while relatively moving with respect to a base material, and to supply a coating die head for coating on the base material surface and a coating liquid to the die head. And a back pressure valve provided in the pipe at a position close to the die head and maintaining a desired pressure in the pipe leading to the pump.
[0008]
The pump used here is preferably a syringe pump, a diaphragm pump, or a tube diaphragm pump so that the discharge amount can be precisely controlled.In particular, the diaphragm pump or the tube diaphragm pump requires time to rise in discharge pressure at the start of operation. However, the effect of the application of the present invention is great.
[0009]
The pressure applied to the pipe by the back pressure valve is usually set to about 0.1 to 10 kgf / cm 2, but preferably, it is generated on the pump discharge port side at the time of steady application when no back pressure valve is provided. Set approximately equal to pressure. With such a setting, a desired discharge amount can be secured more quickly.
[0010]
The back pressure valve used in the present invention is not particularly limited as long as the inside of the pipe can be maintained at a desired pressure, but it is preferable to use an air supply type diaphragm valve. The air supply type diaphragm valve has an advantage that the pressure in the piping can be easily adjusted to a desired pressure by adjusting the supply air pressure.
[0011]
Hereinafter, preferred embodiments of the present invention shown in the drawings will be described. FIG. 1 is a schematic perspective view of a coating apparatus according to a preferred embodiment of the present invention, and the same reference numerals are given to the same or similar parts as the coating apparatus shown in FIG. In the coating apparatus shown in FIG. 1, a back pressure valve 15 and a pressure gauge 16 are arranged in a pipe 8 from a pump 6 to a die head 3 as close as possible to the die head 3. The back pressure valve 15 has a function of always maintaining the pressure in the pipe 8 at an arbitrarily set pressure regardless of whether the liquid is flowing in the pipe 8 or not. Here, an air supply type diaphragm valve is used, and an air supply device 17 for supplying air at a desired pressure is connected to the back pressure valve 15. The adjustment of the pressure in the piping by the air supply type diaphragm valve is performed by supplying air from the outside and the diaphragm operated by the air pushing and pulling the liquid in the piping, and the pressure setting of the supply air Thereby, the pressure in the pipe 8 can be set arbitrarily. Other configurations are the same as those of the coating apparatus shown in FIG.
[0012]
Next, a coating operation by the coating apparatus shown in FIG. 1 will be described. Air at a desired pressure is constantly supplied to the back pressure valve 15 by an air supply device 17, and the back pressure valve 15 constantly maintains the inside of the pipe 8 at a desired pressure. The pressure at which the back pressure valve 15 holds the inside of the pipe 8 is set to be substantially equal to the pressure (for example, 0.5 kgf / cm 2 ) generated on the discharge port side of the pump 6 during the steady application when the back pressure valve is not provided. Keep it. In this state, the coating operation is performed. That is, with the coating start position (tip) of the substrate 1 positioned immediately below the die head 3 and with the die head 3 close to the substrate 1, the operation of the pump 6 is started, and the coating liquid is discharged from the tip of the die head 3. To form a pool (bead) of the coating liquid between the die head 3 and the substrate 1, and then, while continuing to discharge the coating liquid from the die head 3, move the chuck table 2 and the substrate 1 in the direction indicated by the arrow A. At a constant speed, apply the coating solution to the base material 1 to a predetermined thickness, apply the coating solution to the coating end position (rear end) of the base material 1, stop the pump 6, The discharge of the application liquid is stopped. Thereby, the resist layer 4 can be formed on the surface of the substrate 1.
[0013]
Here, at the start of the application, when the pump 6 starts operating, the pressure in the pipe 8 is already at the predetermined pressure P as shown by the straight line 21 in the graph of FIG. Therefore, the discharge pressure of the pump 6 immediately reaches the predetermined pressure P, and the discharge amount from the die head 3 rapidly reaches the desired discharge amount Q as shown by the line 22 in FIG. The time from the start of operation of the pump 6 until the desired discharge amount Q is reached, when the back pressure valve is not provided, the pressure rises as shown by a curve 11, and the discharge amount increases slowly as shown by a curve 12. It is much shorter than in the case of Thus, the region where the film thickness is insufficient at the start of coating can be made extremely short, and most of the substrate 1 can be used effectively.
[0014]
【The invention's effect】
As described above, the present invention solves the problem that the rise of the pressure at the start of liquid discharge, which is a drawback of a tube frame pump, is slow, and it takes time to secure a predetermined discharge amount, The region where the film thickness becomes thin at the start of coating can be shortened. For this reason, the coating apparatus of the present invention has an effect that it can be effectively used for forming a resist layer used for a color filter, which has recently required severe specifications.
[Brief description of the drawings]
FIG. 1 is a schematic perspective view of a coating apparatus according to an embodiment of the present invention. FIG. 2 is a graph showing changes in pressure and discharge amount at the start of coating by the coating apparatus of FIG. FIG. 3 is a schematic cross-sectional view exaggerating the thickness of the layer. FIG. 3 is a schematic perspective view of a coating apparatus proposed to form a resist layer of a color filter. FIG. Graph showing the change in pressure and discharge amount at the time and a schematic cross-sectional view exaggerating the thickness of the resist layer on the surface of the base material.
Reference Signs List 1 base material 2 chuck base 3 coating die head 4 resist layer 5 tank 6 pump 7 built-in pressure gauge 8 piping 15 back pressure valve 16 pressure gauge 17 air supply device

Claims (4)

基材に対して相対的に移動しながら塗布液を吐出し、前記基材表面に塗布する塗工用ダイヘッドと、該ダイヘッドに塗布液を供給するよう連結された配管及びポンプと、前記ダイヘッドに近接した位置で前記配管に設けられ、前記ポンプに至るまでの配管内を所望の圧力に保持する背圧弁とを備えた塗工装置。A coating die head for discharging a coating liquid while relatively moving with respect to the base material and applying the coating liquid to the surface of the base material, a pipe and a pump connected to supply the coating liquid to the die head, and the die head. A back pressure valve provided in the pipe at a position close to the pipe and maintaining a desired pressure in the pipe leading to the pump. 前記ポンプが、シリンジポンプ、ダイアフラムポンプ又はチューブフラムポンプであることを特徴とする請求項1記載の塗工装置。The coating apparatus according to claim 1, wherein the pump is a syringe pump, a diaphragm pump, or a tube diaphragm pump. 前記背圧弁によって配管内に保持する圧力を、定常塗布時に前記ポンプ吐出口側に生じている圧力にほぼ等しく設定することを特徴とする請求項1又は2記載の塗工装置。The coating apparatus according to claim 1, wherein a pressure held in the pipe by the back pressure valve is set to be substantially equal to a pressure generated on a side of the pump discharge port at the time of steady application. 前記背圧弁が、エア供給式のダイアフラム弁であることを特徴とする請求項1から3のいずれか1項記載の塗工装置。The coating device according to any one of claims 1 to 3, wherein the back pressure valve is an air supply type diaphragm valve.
JP2002210208A 2002-07-18 2002-07-18 Coating equipment Expired - Fee Related JP4197107B2 (en)

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009131747A (en) * 2007-11-29 2009-06-18 Anest Iwata Corp Cylinder pump apparatus
US7841842B2 (en) 2006-11-29 2010-11-30 Koganei Corporation Chemical liquid supplying apparatus
US7871250B2 (en) 2006-11-20 2011-01-18 Koganei Corporation Chemical liquid supplying apparatus
US8133042B2 (en) 2007-12-03 2012-03-13 Koganei Corporation Chemical liquid supplying apparatus and pump assembly
JP2015065404A (en) * 2013-08-30 2015-04-09 東京エレクトロン株式会社 Coating film formation device
CN104549911A (en) * 2015-02-10 2015-04-29 青岛科化高分子科技股份有限公司 Hot-melt pressure-sensitive adhesive coating equipment with back coating
JP2015167933A (en) * 2014-03-10 2015-09-28 東レエンジニアリング株式会社 Coating method and coating device
KR20190038242A (en) 2017-09-29 2019-04-08 쥬가이로 고교 가부시키가이샤 Method and apparatus for coating substrate

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7871250B2 (en) 2006-11-20 2011-01-18 Koganei Corporation Chemical liquid supplying apparatus
US7841842B2 (en) 2006-11-29 2010-11-30 Koganei Corporation Chemical liquid supplying apparatus
JP2009131747A (en) * 2007-11-29 2009-06-18 Anest Iwata Corp Cylinder pump apparatus
US8133042B2 (en) 2007-12-03 2012-03-13 Koganei Corporation Chemical liquid supplying apparatus and pump assembly
JP2015065404A (en) * 2013-08-30 2015-04-09 東京エレクトロン株式会社 Coating film formation device
JP2015167933A (en) * 2014-03-10 2015-09-28 東レエンジニアリング株式会社 Coating method and coating device
CN104549911A (en) * 2015-02-10 2015-04-29 青岛科化高分子科技股份有限公司 Hot-melt pressure-sensitive adhesive coating equipment with back coating
KR20190038242A (en) 2017-09-29 2019-04-08 쥬가이로 고교 가부시키가이샤 Method and apparatus for coating substrate

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