JP2003340359A - High precision spin film-forming method - Google Patents
High precision spin film-forming methodInfo
- Publication number
- JP2003340359A JP2003340359A JP2002158113A JP2002158113A JP2003340359A JP 2003340359 A JP2003340359 A JP 2003340359A JP 2002158113 A JP2002158113 A JP 2002158113A JP 2002158113 A JP2002158113 A JP 2002158113A JP 2003340359 A JP2003340359 A JP 2003340359A
- Authority
- JP
- Japan
- Prior art keywords
- ultraviolet light
- curable resin
- viscosity
- forming method
- film forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、光ディスク用の円
形樹脂基板に紫外光硬化樹脂等の薄膜を成膜する高精度
スピン成膜方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-accuracy spin film forming method for forming a thin film of an ultraviolet light curing resin or the like on a circular resin substrate for an optical disk.
【０００２】[0002]
【従来の技術】樹脂材にて円盤状に成形された光ディス
ク用基板に成膜する方法として、図３に示す方法がよく
知られている。この方法は、基板１を矢印Ｉ方向に回転
させながら、基板１の表面内側に紫外光反応硬化型樹脂
２をノズル３にて環状に塗布した後、基板１を矢印Ｉの
方向に高速回転させ、遠心力で紫外光反応硬化型樹脂２
を外側に拡散させ、基板１上に図３（ｂ）に示す未硬化
の樹脂層２Ａを形成する。この樹脂層２Ａを基板１の一
方または両方から図３（ｃ）に示す紫外光発生装置６に
て紫外光４を照射すると、上記樹脂層２Ａが硬化して基
板１上に成膜が完成する。2. Description of the Related Art A method shown in FIG. 3 is well known as a method for forming a film on a disk-shaped optical disk substrate made of a resin material. In this method, while rotating the substrate 1 in the direction of arrow I, the ultraviolet light reaction-curable resin 2 is applied to the inside of the surface of the substrate 1 in a ring shape by the nozzle 3, and then the substrate 1 is rotated at high speed in the direction of arrow I. UV-curable resin 2 due to centrifugal force
Are diffused to the outside to form an uncured resin layer 2A shown in FIG. When this resin layer 2A is irradiated with ultraviolet light 4 from one or both of the substrates 1 by the ultraviolet light generator 6 shown in FIG. 3 (c), the resin layer 2A is cured and film formation is completed on the substrate 1. .
【０００３】[0003]
【発明が解決しようとする課題】記録、再生型の光ディ
スクは、記録層に片面から投射するレーザー光で、正確
に安定して情報を書き込んだり読み込んだりする必要が
ある。そのためには、情報記録範囲でレーザー光の入射
及び反射や強度を阻害することが無いように樹脂の膜厚
分布精度を確保しなければならない。しかしながら、高
速回転による遠心力で流動拡散させる従来の方法を用い
ると、回転が停止したときの樹脂層２Ａの膜厚は、図４
に示すように、基板の半径方向において、外周部分の厚
みが厚くなり、中央部分の厚みが外周部分と比較して薄
くなる現象が発生する。A recording / reproducing type optical disk is required to accurately and stably write and read information with a laser beam projected from one surface onto a recording layer. For that purpose, it is necessary to ensure the film thickness distribution accuracy of the resin so as not to impede the incidence, reflection and intensity of the laser light in the information recording range. However, when the conventional method of flowing and diffusing by centrifugal force due to high speed rotation is used, the film thickness of the resin layer 2A when the rotation is stopped is as shown in FIG.
As shown in, the phenomenon that the outer peripheral portion becomes thicker and the central portion becomes thinner than the outer peripheral portion in the radial direction of the substrate occurs.
【０００４】本発明は、このような問題点を解決するた
めになされたもので、基板への成膜において、中央付近
の樹脂層厚みを確保し面内均一を可能にする成膜方法を
提供するものである。The present invention has been made in order to solve the above problems, and provides a film forming method for ensuring a uniform resin layer thickness in the vicinity of the center when forming a film on a substrate. To do.
【０００５】[0005]
【課題を解決するための手段】上記目的を達成するため
に本発明は、少なくとも基板を回転させながら紫外光反
応硬化型樹脂を塗布する工程と、高速回転による遠心力
で紫外光反応硬化型樹脂を流動拡散させて成膜する工程
と、成膜中に紫外光反応硬化型樹脂の粘度を部分的に上
昇させる工程とを有する高精度スピン成膜方法である。
本発明によると、外周部の粘度を低下させ、外周部の厚
膜化を防止するため、樹脂層には厚み差が発生せず、面
内均一な膜を形成することができる。In order to achieve the above object, the present invention provides a step of applying an ultraviolet light reaction curable resin while rotating at least a substrate, and an ultraviolet light reaction curable resin by centrifugal force due to high speed rotation. Is a high-precision spin film forming method including a step of forming a film by fluidizing and diffusing it and a step of partially increasing the viscosity of the ultraviolet light reaction-curable resin during film formation.
According to the present invention, since the viscosity of the outer peripheral portion is reduced and the thickening of the outer peripheral portion is prevented, there is no difference in thickness between the resin layers, and it is possible to form an in-plane uniform film.
【０００６】[0006]
【発明の実施の形態】本発明の請求項１に記載の発明
は、回転する基板の表面内側に紫外光反応硬化型樹脂を
塗布する工程と、高速回転による遠心力で紫外光反応硬
化型樹脂を外側に流動拡散させて成膜する工程と、成膜
中に紫外光を照射して紫外光反応硬化型樹脂の粘度を部
分的に上昇させる粘度調整工程と、紫外光を紫外光硬化
型樹脂全面に照射する工程を有する高精度スピン成膜方
法であり、成膜中に紫外光反応硬化型樹脂の粘度を上昇
させることで、内周から外周まで樹脂層の膜厚分布を均
一化できる作用を有する。BEST MODE FOR CARRYING OUT THE INVENTION The invention according to claim 1 of the present invention comprises a step of applying an ultraviolet light reaction curable resin on the inside of the surface of a rotating substrate, and an ultraviolet light reaction curable resin by centrifugal force due to high speed rotation. To form a film by flowing and diffusing the resin to the outside, a viscosity adjustment process to partially increase the viscosity of the ultraviolet light reaction curable resin by irradiating it with ultraviolet light during the film formation, and an ultraviolet light curable resin to cure the ultraviolet light. It is a high-precision spin film forming method that has a step of irradiating the entire surface, and by increasing the viscosity of the ultraviolet light reaction curable resin during film formation, it is possible to make the thickness distribution of the resin layer uniform from the inner circumference to the outer circumference. Have.
【０００７】請求項２に記載の発明は、粘度調整工程
は、可動型紫外光発生装置を用い、紫外光を基板の内周
側から外周側に順次照射し、紫外光反応硬化型樹脂の粘
度分布を調整する高精度スピン成膜方法であり、簡単な
手段により、内周から外周まで均一な膜厚の樹脂層を得
ることができる作用を有する。According to the second aspect of the invention, in the viscosity adjusting step, a movable ultraviolet light generator is used, and ultraviolet light is sequentially irradiated from the inner peripheral side to the outer peripheral side of the substrate to obtain the viscosity of the ultraviolet light reaction curable resin. This is a high-precision spin film forming method for adjusting the distribution, and has an effect that a resin layer having a uniform film thickness from the inner circumference to the outer circumference can be obtained by a simple means.
【０００８】請求項３に記載の発明は、粘度調整工程
は、照度の異なる複数の紫外光発生装置を基板の半径方
向に配置し、紫外光反応硬化型樹脂に紫外光を照射し、
紫外光反応硬化型樹脂の粘度分布を調整する高精度スピ
ン成膜方法であり、紫外光発生装置が固定されているた
め、正確に粘度分布を調整できる作用を有する。According to a third aspect of the invention, in the viscosity adjusting step, a plurality of ultraviolet light generators having different illuminances are arranged in the radial direction of the substrate, and the ultraviolet light reaction-curable resin is irradiated with ultraviolet light.
This is a high-precision spin film formation method for adjusting the viscosity distribution of the ultraviolet light reaction-curable resin, and has the effect of accurately adjusting the viscosity distribution because the ultraviolet light generator is fixed.
【０００９】請求項４に記載の発明は、粘度調整工程
は、可動型紫外光発生装置により、遠心力で外側に流動
した紫外光反応硬化型樹脂の内周の一定面積に紫外光を
照射し、可動型紫外光発生装置を移動しながら高速回転
による遠心力で外側に拡散した紫外光反応硬化型樹脂の
内周側から外周側に紫外光を照射し、紫外光反応硬化型
樹脂の粘度分布を調整する高精度スピン成膜方法であ
り、可動型紫外光発生装置を移動しながら粘度分布を調
整するため、内周部から外周部まで膜厚分布を均一にで
きる作用を有する。According to the fourth aspect of the invention, in the viscosity adjusting step, the movable ultraviolet light generator irradiates ultraviolet light onto a certain area of the inner circumference of the ultraviolet light reaction curable resin that has flowed outward by centrifugal force. While moving the movable ultraviolet light generator, ultraviolet light is irradiated from the inner peripheral side to the outer peripheral side of the ultraviolet light reaction curable resin diffused to the outside by centrifugal force due to high speed rotation, and the viscosity distribution of the ultraviolet light reaction curable resin is distributed. Is a high precision spin film forming method for adjusting the viscosity distribution while adjusting the viscosity distribution while moving the movable ultraviolet light generator, and has the effect of making the film thickness distribution uniform from the inner peripheral portion to the outer peripheral portion.
【００１０】請求項５に記載の発明は、回転する基板の
表面内側に紫外光反応硬化型樹脂を塗布する工程と、高
速回転による遠心力で紫外光反応硬化型樹脂を外側に流
動拡散させて成膜する工程と、成膜中に紫外光反応硬化
型樹脂を加温して粘度を部分的に低下させる粘度調整工
程と、紫外光を紫外光硬化型樹脂全面に照射する工程を
有する高精度スピン成膜方法であり、外周部を加温し
て、外周部の粘度を部分的に低下させることで、外周部
の厚膜化を防止できる作用を有する。According to a fifth aspect of the present invention, the step of applying the ultraviolet light reaction curable resin to the inside of the surface of the rotating substrate and the flow reaction of the ultraviolet light reaction curable resin to the outside by centrifugal force due to high speed rotation. High precision with a film formation process, a viscosity adjustment process that heats the ultraviolet light reaction curable resin to partially reduce the viscosity during film formation, and a process that irradiates the entire surface of the ultraviolet light curable resin with ultraviolet light This is a spin film forming method, and by heating the outer peripheral portion to partially reduce the viscosity of the outer peripheral portion, it is possible to prevent thickening of the outer peripheral portion.
【００１１】請求項６に記載の発明は、粘度調整工程
は、加温装置を有する基板保持台を用い、紫外光反応硬
化型樹脂を加温して粘度分布を調整する高精度スピン成
膜方法であり、粘度分布を正確に調整できる作用を有す
る。According to a sixth aspect of the present invention, in the viscosity adjusting step, a substrate holding table having a heating device is used to heat the ultraviolet light curable resin to adjust the viscosity distribution. And has an effect of accurately adjusting the viscosity distribution.
【００１２】請求項７に記載の発明は、粘度調整工程
は、熱風により紫外光反応硬化型樹脂を加温して粘度分
布を調整する高精度スピン成膜方法であり、簡単な手段
により粘度分布を調整でき、均一な膜厚の樹脂層を得る
ことができる作用を有する。In the invention according to claim 7, the viscosity adjusting step is a high precision spin film forming method of adjusting the viscosity distribution by heating the ultraviolet light reaction curable resin with hot air, and the viscosity distribution by a simple means. And a resin layer having a uniform film thickness can be obtained.
【００１３】請求項８に記載の発明は、粘度調整工程
は、紫外光反応硬化型樹脂の外周部を加温し、外周部の
粘度を低下させる高精度スピン成膜方法であり、紫外光
反応硬化型樹脂の外周部を加温し、外周部の粘度を低下
させることで、外周部の厚膜化を防止して、均一な膜厚
の樹脂層を形成する作用を有する。The invention according to claim 8 is a high-precision spin film forming method in which the viscosity adjusting step heats the outer peripheral portion of the ultraviolet light reaction-curable resin to lower the viscosity of the outer peripheral portion. By heating the outer peripheral portion of the curable resin and lowering the viscosity of the outer peripheral portion, it is possible to prevent the outer peripheral portion from becoming thicker and to form a resin layer having a uniform film thickness.
【００１４】[0014]
【実施の形態１】以下、本発明の一実施の形態による高
精度スピン成膜方法について、図１（ａ）〜（ｅ）を用
いて説明する。First Embodiment A high-precision spin film forming method according to an embodiment of the present invention will be described below with reference to FIGS.
【００１５】本実施の形態による高精度スピン成膜方法
では、まず、光ディスク用基板１を用意する。次に、図
１（ａ）に示すように、１０００ｒｐｍ以下の低速で回
転させた基板の内周付近にノズル３から紫外光反応硬化
型樹脂２を吐出して環状に塗布する。次に、図１（ｂ）
に示すように、基板を１０００から５０００ｒｐｍ程度
の高速で回転させ、遠心力によって、環状に塗布された
紫外光反応硬化型樹脂２を外周方向へ拡散させる。次
に、ある程度広がった時点で、図１（ｃ）に示すよう
に、内周の一定面積の紫外光反応硬化型樹脂２に、粘度
を上昇させる程度、例えば３００ｍＷの紫外光４を可動
型紫外光発生装置５にて照射する。次に、回転数を３０
００から８０００ｒｐｍ程度まで増速させ、紫外光反応
硬化型樹脂２を更に拡散して薄く引き伸ばす。このと
き、内周付近のみを紫外光照射すると、内周部の樹脂粘
度だけが上昇し内周は厚くなるが、照射領域より外側で
は従来通り外周部が厚くなるため、内外周の間が薄くな
る。そのため、図１（ｄ）に示すように、可動型紫外光
発生装置５を外周方向へ移動させながら照射すること
で、内周から外周まで均一な膜厚を得る。このようにし
て樹脂層２Ａが形成された基板１を紫外光発生装置６へ
移載し、図１（ｅ）に示すように、紫外光４を照射する
ことで、均一な樹脂層２Ａを硬化させ、均一な膜厚の成
膜が完了する。In the high precision spin film forming method according to the present embodiment, first, the optical disk substrate 1 is prepared. Next, as shown in FIG. 1A, the ultraviolet light reaction curable resin 2 is ejected from the nozzle 3 near the inner circumference of the substrate rotated at a low speed of 1000 rpm or less to apply it in a ring shape. Next, FIG. 1 (b)
As shown in (1), the substrate is rotated at a high speed of about 1000 to 5000 rpm, and the ultraviolet light reaction curable resin 2 applied in an annular shape is diffused in the outer peripheral direction by a centrifugal force. Next, when it spreads to a certain extent, as shown in FIG. 1 (c), the ultraviolet light 4 of about 300 mW, for example, 300 mW of ultraviolet light 4 is added to the movable ultraviolet light to increase the viscosity of the ultraviolet light reaction curable resin 2 having a constant inner area. The light is generated by the light generator 5. Next, set the rotation speed to 30
The speed is increased from 00 to about 8000 rpm, and the ultraviolet light reaction curable resin 2 is further diffused and thinly stretched. At this time, if the ultraviolet light is irradiated only near the inner circumference, only the resin viscosity of the inner circumference increases and the inner circumference becomes thicker. Become. Therefore, as shown in FIG. 1D, by irradiating the movable ultraviolet light generator 5 while moving it toward the outer circumference, a uniform film thickness is obtained from the inner circumference to the outer circumference. The substrate 1 on which the resin layer 2A is thus formed is transferred to the ultraviolet light generator 6 and is irradiated with ultraviolet light 4 as shown in FIG. 1 (e) to cure the uniform resin layer 2A. Then, film formation with a uniform film thickness is completed.
【００１６】本実施の形態では、紫外光発生装置として
可動型のものを用いたが、照度の異なる複数の紫外光発
生装置を基板の半径方向に配置し、紫外光反応硬化型樹
脂に紫外光を照射し、粘度分布を調整することもでき
る。In the present embodiment, a movable type is used as the ultraviolet light generator. However, a plurality of ultraviolet light generators having different illuminances are arranged in the radial direction of the substrate, and the ultraviolet light is cured on the ultraviolet light curable resin. The viscosity distribution can also be adjusted by irradiating.
【００１７】[0017]
【実施の形態２】次に、他の実施の形態について、図２
（ａ）〜（ｅ）を用いて説明する。まず、成形された光
ディスク用基板１を用意する。次に、図２（ａ）に示す
ように、１０００ｒｐｍ以下の低速で回転させた基板の
内周付近にノズルから紫外光反応硬化型樹脂２を吐出し
て環状に塗布する。次に、図２（ｂ）に示すように、基
板を１０００から５０００ｒｐｍ程度の高速で回転さ
せ、遠心力によって、環状に塗布された紫外光反応硬化
型樹脂２を外周方向へ拡散させる。次に、外周まで広が
った紫外光反応硬化型樹脂２の外周部を図２（ｃ）に示
すように、熱風７で加温し、粘度を低下させる。紫外光
反応硬化型樹脂の外周部の粘度を低下させることで、外
周部の厚膜化を防止して、図２（ｄ）に示すような均一
な樹脂層２Ａを形成する。このように樹脂層２Ａが形成
された基板１を紫外光発生装置６へ移載し、図２（ｅ）
に示すように、紫外光４を照射することで、均一な樹脂
層２Ａを硬化させ、均一な膜厚の成膜が完了する。Second Embodiment Next, another embodiment will be described with reference to FIG.
This will be described with reference to (a) to (e). First, the molded optical disk substrate 1 is prepared. Next, as shown in FIG. 2A, the ultraviolet light reaction curable resin 2 is discharged from a nozzle near the inner circumference of the substrate rotated at a low speed of 1000 rpm or less and applied in a ring shape. Next, as shown in FIG. 2B, the substrate is rotated at a high speed of about 1000 to 5000 rpm, and the ultraviolet light reaction curable resin 2 applied in an annular shape is diffused in the outer peripheral direction by a centrifugal force. Next, as shown in FIG. 2C, the outer peripheral portion of the ultraviolet light reaction curable resin 2 that has spread to the outer periphery is heated with hot air 7 to reduce the viscosity. By lowering the viscosity of the outer peripheral portion of the ultraviolet light reaction curable resin, it is possible to prevent the outer peripheral portion from becoming thicker and form a uniform resin layer 2A as shown in FIG. 2 (d). The substrate 1 on which the resin layer 2A is formed in this manner is transferred to the ultraviolet light generator 6 and then, as shown in FIG.
As shown in FIG. 3, by irradiating with the ultraviolet light 4, the uniform resin layer 2A is cured, and the film formation with a uniform film thickness is completed.
【００１８】本実施の形態では、加温手段として熱風を
用いたが、加温手段として加温装置を有する基板保持台
を用い、保持台を温度制御して、紫外光反応硬化型樹脂
を加温して粘度分布を調整することもできる。Although hot air is used as the heating means in this embodiment, a substrate holding table having a heating device is used as the heating means, and the temperature of the holding table is controlled to add the ultraviolet light reaction curable resin. It is also possible to adjust the viscosity distribution by heating.
【００１９】上記のような方法を用いて基板の成膜及び
貼り合わせを行い、初期化、アニール等の工程を経て、
光ディスク５が完成する。The substrate is formed and bonded by the above method, and after initialization, annealing, etc.,
The optical disc 5 is completed.
【００２０】[0020]
【発明の効果】以上説明したように、本発明の基板の高
精度スピン成膜方法では、紫外光照射または加温によっ
て紫外光反応硬化型樹脂材料の粘度を調整するため、樹
脂層の膜厚分布を均一化することができ、正確に安定し
て情報を書き込み、かつ読み取りが可能な高品質の光デ
ィスクを提供できる。As described above, in the high-precision spin film forming method for a substrate of the present invention, since the viscosity of the ultraviolet light reaction-curable resin material is adjusted by irradiation with ultraviolet light or heating, the film thickness of the resin layer It is possible to provide a high-quality optical disc that can make the distribution uniform and can accurately and stably write and read information.
【図１】本発明の一実施の形態の成膜方法の各工程を示
す断面図である。
（ａ）紫外光反応硬化型樹脂の塗布を示す断面図であ
る。
（ｂ）高速回転による樹脂の流動拡散を示す断面図であ
る。
（ｃ）成膜中に基板内周側に紫外光を照射している状態
を示す断面図である。
（ｄ）紫外光発生装置が基板外周側へ移動する状態を示
す断面図である。
（ｅ）成膜された樹脂層を紫外光で硬化する状態を示す
断面図である。FIG. 1 is a cross-sectional view showing each step of a film forming method according to an embodiment of the present invention. (A) It is sectional drawing which shows application of ultraviolet light reaction hardening type resin. (B) It is sectional drawing which shows the flow diffusion of the resin by high speed rotation. (C) It is a cross-sectional view showing a state in which ultraviolet light is irradiated to the inner peripheral side of the substrate during film formation. (D) It is sectional drawing which shows the state which an ultraviolet light generator moves to a board | substrate outer peripheral side. (E) It is sectional drawing which shows the state which hardens the formed resin layer by ultraviolet light.
【図２】本発明の他の実施の形態の成膜方法の各工程を
示す断面図である。
（ａ）紫外光反応硬化型樹脂の塗布を示す断面図であ
る。
（ｂ）高速回転による樹脂の流動拡散を示す断面図であ
る。
（ｃ）成膜中に基板外周付近を熱風により加熱している
状態を示す断面図である。
（ｄ）加熱による粘度低下で外周付近の樹脂層が平坦化
したことを示す断面図である。
（ｅ）成膜された樹脂層を紫外光で硬化する状態を示す
断面図である。FIG. 2 is a sectional view showing each step of a film forming method according to another embodiment of the present invention. (A) It is sectional drawing which shows application of ultraviolet light reaction hardening type resin. (B) It is sectional drawing which shows the flow diffusion of the resin by high speed rotation. (C) A cross-sectional view showing a state in which the periphery of the substrate is heated by hot air during film formation. (D) A cross-sectional view showing that the resin layer near the outer periphery is flattened due to a decrease in viscosity due to heating. (E) It is sectional drawing which shows the state which hardens the formed resin layer by ultraviolet light.
【図３】従来の成膜方法の各工程を示す斜視図である。
（ａ）紫外光反応硬化型樹脂の塗布を示す斜視図であ
る。
（ｂ）樹脂層が成膜された基板を示す斜視図である。
（ｃ）成膜された樹脂層を紫外光で硬化する状態を示す
斜視図である。FIG. 3 is a perspective view showing each step of a conventional film forming method. (A) It is a perspective view which shows application of ultraviolet light reaction hardening type resin. (B) A perspective view showing a substrate on which a resin layer is formed. FIG. 3C is a perspective view showing a state where the formed resin layer is cured by ultraviolet light.
【図４】従来の成膜方法で製作されたディスクの断面図
である。FIG. 4 is a cross-sectional view of a disk manufactured by a conventional film forming method.
１ 基板 ２ 紫外光反応硬化型樹脂 ３ ノズル ４ 紫外光 ５ 可動型紫外光発生装置 ６ 紫外光発生装置 ７ 熱風 1 substrate 2 UV light reaction curable resin 3 nozzles 4 UV light 5 Movable ultraviolet light generator 6 Ultraviolet light generator 7 hot air
───────────────────────────────────────────────────── フロントページの続き Ｆターム(参考） 4D075 AC64 AC96 BB23Z BB33Z BB42Z BB46Z BB53Z BB54Z BB91Z BB92Z CA48 DA08 DC27 EA07 EA21 5D121 AA04 EE22 EE24 EE28 GG02 GG07 GG28 ─────────────────────────────────────────────────── ─── Continued front page F-term (reference) 4D075 AC64 AC96 BB23Z BB33Z BB42Z BB46Z BB53Z BB54Z BB91Z BB92Z CA48 DA08 DC27 EA07 EA21 5D121 AA04 EE22 EE24 EE28 GG02 GG07 GG28
Claims (8)
化型樹脂を塗布する工程と、高速回転による遠心力で紫
外光反応硬化型樹脂を外側に流動拡散させて成膜する工
程と、成膜中に紫外光を照射して紫外光反応硬化型樹脂
の粘度を部分的に上昇させる粘度調整工程と、紫外光を
紫外光硬化型樹脂全面に照射する工程を有する高精度ス
ピン成膜方法。1. A step of applying an ultraviolet light reaction curable resin to the inside of the surface of a rotating substrate, and a step of forming a film by fluidizing and diffusing the ultraviolet light reaction curable resin to the outside by centrifugal force due to high speed rotation. A high-precision spin film forming method comprising a step of irradiating the film with ultraviolet light to partially increase the viscosity of the ultraviolet light curable resin and a step of irradiating the entire surface of the ultraviolet light curable resin with ultraviolet light.
を用い、紫外光を基板の内周側から外周側に順次照射
し、紫外光反応硬化型樹脂の粘度分布を調整することを
特徴とする請求項１に記載の高精度スピン成膜方法。2. The viscosity adjusting step comprises using a movable ultraviolet light generator to sequentially irradiate ultraviolet light from the inner peripheral side to the outer peripheral side of the substrate to adjust the viscosity distribution of the ultraviolet light reactive curable resin. The high-precision spin film forming method according to claim 1.
外光発生装置を基板の半径方向に配置し、紫外光反応硬
化型樹脂に紫外光を照射し、紫外光反応硬化型樹脂の粘
度分布を調整することを特徴とする請求項１に記載の高
精度スピン成膜方法。3. The viscosity adjusting step comprises arranging a plurality of ultraviolet light generators having different illuminances in a radial direction of a substrate, irradiating the ultraviolet light reactive curable resin with ultraviolet light, and distributing the viscosity distribution of the ultraviolet light reactive curable resin. The high-precision spin film forming method according to claim 1, wherein
により、遠心力で外側に流動した紫外光反応硬化型樹脂
の内周の一定面積に紫外光を照射し、可動型紫外光発生
装置を移動しながら、高速回転による遠心力で外側に拡
散した紫外光反応硬化型樹脂の内周側から外周側に紫外
光を照射し、紫外光反応硬化型樹脂の粘度分布を調整す
ることを特徴とする請求項１または２に記載の高精度ス
ピン成膜方法。4. In the viscosity adjusting step, the movable ultraviolet light generator irradiates the movable ultraviolet light generator onto a predetermined area of the inner circumference of the ultraviolet light reaction-curable resin that has flowed outward by centrifugal force to irradiate the ultraviolet light. It is characterized by adjusting the viscosity distribution of the ultraviolet light reaction curable resin by irradiating ultraviolet light from the inner side to the outer side of the ultraviolet light reaction curable resin diffused to the outside by centrifugal force due to high speed rotation while moving The high precision spin film forming method according to claim 1 or 2.
化型樹脂を塗布する工程と、高速回転による遠心力で紫
外光反応硬化型樹脂を外側に流動拡散させて成膜する工
程と、成膜中に紫外光反応硬化型樹脂を加温して粘度を
部分的に低下させる粘度調整工程と、紫外光を紫外光硬
化型樹脂全面に照射する工程を有する高精度スピン成膜
方法。5. A step of applying an ultraviolet light reaction curable resin to the inside of the surface of a rotating substrate, and a step of forming a film by fluidizing and diffusing the ultraviolet light reaction curable resin to the outside by centrifugal force due to high speed rotation. A high-precision spin film forming method comprising: a step of heating an ultraviolet light reaction curable resin in the film to partially lower the viscosity, and a step of irradiating the entire surface of the ultraviolet light curable resin with ultraviolet light.
保持台を用い、紫外光反応硬化型樹脂を加温して粘度分
布を調整することを特徴とする請求項５に記載の高精度
スピン成膜方法。6. The high precision according to claim 5, wherein in the viscosity adjusting step, a substrate holding table having a heating device is used to heat the ultraviolet light reaction curable resin to adjust the viscosity distribution. Spin film forming method.
硬化型樹脂を加温して粘度分布を調整することを特徴と
する請求項５に記載の高精度スピン成膜方法。7. The high precision spin film forming method according to claim 5, wherein in the viscosity adjusting step, the ultraviolet light reaction curable resin is heated by hot air to adjust the viscosity distribution.
の外周部を加温し、外周部の粘度を低下させることを特
徴とする請求項５〜７いずれかに記載の高精度スピン成
膜方法。8. The high precision spin composition according to claim 5, wherein in the viscosity adjusting step, the outer peripheral portion of the ultraviolet light reaction curable resin is heated to reduce the viscosity of the outer peripheral portion. Membrane method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002158113A JP2003340359A (en) | 2002-05-30 | 2002-05-30 | High precision spin film-forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002158113A JP2003340359A (en) | 2002-05-30 | 2002-05-30 | High precision spin film-forming method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003340359A true JP2003340359A (en) | 2003-12-02 |
| JP2003340359A5 JP2003340359A5 (en) | 2005-10-06 |
Family
ID=29773614
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002158113A Pending JP2003340359A (en) | 2002-05-30 | 2002-05-30 | High precision spin film-forming method |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004095108A (en) * | 2002-09-03 | 2004-03-25 | Global Mach Kk | Manufacturing method of optical recording medium |
| EP1520865A2 (en) | 2003-09-30 | 2005-04-06 | Nippon Shokubai Co., Ltd. | Water-based emulsion for vibration damper |
| WO2006030494A1 (en) * | 2004-09-14 | 2006-03-23 | Origin Electric Company, Limited | Method and equipment for forming resin film |
| JP2009514671A (en) * | 2005-11-08 | 2009-04-09 | ジングルス・テヒノロギース・アクチェンゲゼルシャフト | Method and apparatus for controlling film thickness by spin coating |
| US8088438B2 (en) | 2004-06-03 | 2012-01-03 | Shibaura Mechatronics Corporation | Resin layer formation method, resin layer formation device, and disk manufacturing method |
-
2002
- 2002-05-30 JP JP2002158113A patent/JP2003340359A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004095108A (en) * | 2002-09-03 | 2004-03-25 | Global Mach Kk | Manufacturing method of optical recording medium |
| EP1520865A2 (en) | 2003-09-30 | 2005-04-06 | Nippon Shokubai Co., Ltd. | Water-based emulsion for vibration damper |
| US8088438B2 (en) | 2004-06-03 | 2012-01-03 | Shibaura Mechatronics Corporation | Resin layer formation method, resin layer formation device, and disk manufacturing method |
| US8220410B2 (en) | 2004-06-03 | 2012-07-17 | Shibaura Mechatronics Corporation | Resin layer formation method, resin layer formation device, disk, and disk manufacturing method |
| US8475870B2 (en) | 2004-06-03 | 2013-07-02 | Shibaura Mechatronics Corporation | Resin layer formation method, resin layer formation device, disk and disk manufacturing method |
| WO2006030494A1 (en) * | 2004-09-14 | 2006-03-23 | Origin Electric Company, Limited | Method and equipment for forming resin film |
| JP2009514671A (en) * | 2005-11-08 | 2009-04-09 | ジングルス・テヒノロギース・アクチェンゲゼルシャフト | Method and apparatus for controlling film thickness by spin coating |
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