JP2003267548A - Non-contact vertical type burning (drying) furnace - Google Patents
Non-contact vertical type burning (drying) furnaceInfo
- Publication number
- JP2003267548A JP2003267548A JP2002121490A JP2002121490A JP2003267548A JP 2003267548 A JP2003267548 A JP 2003267548A JP 2002121490 A JP2002121490 A JP 2002121490A JP 2002121490 A JP2002121490 A JP 2002121490A JP 2003267548 A JP2003267548 A JP 2003267548A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- furnace
- drying
- liquid crystal
- crystal glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、液晶表示装置のガ
ラス基板などの焼成（乾燥）炉に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a baking (drying) furnace for glass substrates of liquid crystal display devices.
【従来の技術】ＬＣＤ製造プロセスには、洗浄工程と同
等以上の加熱工程がある。洗浄後の乾燥、レジスト塗布
後のプリペーク、配合膜塗布後の焼成、硬化等に用いら
れる。一搬に液晶ガラス基板のサイズが小型の場合、運
搬にはバツチ方式が取られるが、サイズが大型になると
枚葉式（水平搬送）が行われる。2. Description of the Related Art The LCD manufacturing process has a heating step equal to or higher than the cleaning step. It is used for drying after washing, pre-paking after resist application, baking after coating a compound film, curing, and the like. When the size of the liquid crystal glass substrate is small, the batch method is used for transportation, but when the size is large, the single-wafer method (horizontal transportation) is performed.
【０００２】運ばれて来た液晶ガラス基板は、ロボツト
・ハンドにより多段バツチ構造（図４参照）に挿入さ
れ、加熱後は再びロボツト・ハンドに騎乗され取り出さ
れ、搬送ラインに流されている。The liquid crystal glass substrate that has been carried is inserted into a multi-stage batch structure (see FIG. 4) by a robot hand, and after heating, it is mounted on the robot hand again, taken out, and flowed to a transfer line.
【０００３】[0003]
【発明が解決しようとする課題】液晶ガラス基板の大型
化の最大のネツクは、ガラス自身の自重による撓みの発
生である。この大型液晶ガラス基板を搬送ローラーに騎
乗させ、搬送を行うが、搬送ローラーの異常振動による
破損や、ローラー痕によるガラス基板の汚れのため歩留
りを悪くする。The biggest problem in increasing the size of a liquid crystal glass substrate is the occurrence of bending due to the weight of the glass itself. This large-sized liquid crystal glass substrate is mounted on a transport roller and transported, but the yield is deteriorated due to damage due to abnormal vibration of the transport roller and stains on the glass substrate due to roller marks.
【０００４】搬送ローラーによつて運ばれて来た液晶ガ
ラス基板を、炉内に挿入する際ロボツト・ハンド上に装
備されたセラミツクスの△型の凸起物で支持され炉内え
搬入、搬出される。その際液晶ガラス基板の裏面にセラ
ミツクスの凸起物による傷が発生している。When the liquid crystal glass substrate carried by the carrying roller is inserted into the furnace, it is carried in and out of the furnace while being supported by the ceramic-shaped Δ-shaped protrusions mounted on the robot hand. It At that time, the back surface of the liquid crystal glass substrate was scratched by the protrusions of the ceramics.
【０００５】その際液晶ガラス基板の撓みをなくして搬
送するには、ガラス基板を垂直に立てて搬送すればよ
い、何故ならガラス基板の重さをガラス自身が支持する
からである。しかし、垂直搬送はガラス基板が右左に振
れて不安定である。それで、この焼成（乾燥）炉内での
液晶ガラス基板の搬送では、８０°の角度で搬送する事
にしている。８０°の角度で搬送を行えばガラス基板に
僅かの撓みが発生する、この撓みにたいして図２に示す
浮上ユニツトで防止し非接触状態で焼成（乾燥）でき
る。そうすれば液晶ガラス基板の枚葉搬送の際の破損、
汚れの原因である搬送ローラーを排除できる。At that time, in order to carry the liquid crystal glass substrate without sagging, the glass substrate may be vertically held and carried, because the glass itself supports the weight of the glass substrate. However, vertical transportation is unstable because the glass substrate swings to the right and left. Therefore, in the transportation of the liquid crystal glass substrate in the firing (drying) furnace, the transportation is performed at an angle of 80 °. If the glass substrate is conveyed at an angle of 80 °, a slight bending will occur in the glass substrate. This bending can be prevented by the levitation unit shown in FIG. 2 and baked (dried) in a non-contact state. This will damage the liquid crystal glass substrate during single-wafer transportation,
It is possible to eliminate the transport roller that causes dirt.
【０００６】液晶ガラス基板を焼成（乾燥）炉内えロボ
ツト・ハンドで出し入れする際、焼成（乾燥）炉の扉を
解放しなければならない、その時炉内の高温の気体を炉
外え逃がし炉内の温度が低下し、焼成温度が一定しな
い。本発明の非接触縦型焼成（乾燥）炉であれば、炉の
扉を解放することが無いため、炉内の温度は常に一定で
ある。When the liquid crystal glass substrate is put in and taken out of the firing (drying) furnace by the robot hand, the door of the firing (drying) furnace has to be opened, at which time the high temperature gas in the furnace escapes from the furnace to escape. And the firing temperature is not constant. With the non-contact vertical firing (drying) furnace of the present invention, the temperature in the furnace is always constant because the furnace door is not opened.
【０００７】[0007]
【発明の実施の形態】基本的には液晶ガラス基板を８０
°の角度に傾斜させ、搬送力はガラス基板の底辺に設け
られた搬送ローラーで搬送する。他のガラス基板部を非
接触の状態に維持するため、多孔質セラミツクスを組み
込んだ浮上ユニツトを利用する。BEST MODE FOR CARRYING OUT THE INVENTION Basically, a liquid crystal glass substrate 80
It is inclined at an angle of °, and the carrying force is carried by a carrying roller provided on the bottom side of the glass substrate. In order to keep the other glass substrate parts in a non-contact state, a levitating unit incorporating a porous ceramic is used.
【０００８】この傾斜した液晶ガラス基板の表面および
裏面に近接する位置に遠赤外線ヒーター（ホツト・プレ
ート）を装備し焼成（乾燥）を行う。Far infrared heaters (hot plates) are provided at positions close to the front and back surfaces of the tilted liquid crystal glass substrate, and firing (drying) is performed.
【０００９】この形式の炉であれば、トラバーサーによ
り非接触で８０°の角度で搬送されてきた液晶ガラス基
板の流れが連續的で、ガラス基板の炉えの出し入れの為
のロボツトは必要無い。この様式であれば、液晶ガラス
基板の傷、破損、汚れが防げる。In this type of furnace, the flow of the liquid crystal glass substrate carried by the traverser in a non-contact manner at an angle of 80 ° is continuous, and a robot is not necessary for loading and unloading the glass substrate furnace. With this method, scratches, breakage, and dirt on the liquid crystal glass substrate can be prevented.
【００１０】液晶ガラス基板が大型化すると、搬送にし
ろ焼成（乾燥）にしろ必然的にフツト・プリントが増大
することである。また異サイズの液晶ガラス基板を処理
する場合は、それぞれのガラス基板のサイズにあつた装
置を準備しなければならない。この非接触縦型焼成（乾
燥）炉であれば、１台の焼成（乾燥）炉でサイズの異な
る液晶ガラス基板に対応出来るともに、装置の大型化が
防げる。この事は、高価なクリーン・ルームの建屋面積
の減少に繋がる。As the size of the liquid crystal glass substrate increases, the foot print inevitably increases whether it is transported or baked (dried). Further, when processing liquid crystal glass substrates of different sizes, it is necessary to prepare an apparatus suitable for the size of each glass substrate. With this non-contact vertical baking (drying) furnace, a single baking (drying) furnace can be used for liquid crystal glass substrates of different sizes, and an increase in the size of the device can be prevented. This leads to a reduction in the expensive clean room building area.
【００１１】[0011]
【発明の形態】発明の実施の形態を実施例にもとずき図
面を参照して説明する。図１は８０°に傾斜した液晶ガ
ラス基板１を高温気体（１００°〜３００°）で非接触
状態を作り出すための浮上ユニツト９の構造図である。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described based on examples with reference to the drawings. FIG. 1 is a structural diagram of a levitation unit 9 for creating a non-contact state of a liquid crystal glass substrate 1 tilted at 80 ° with a high temperature gas (100 ° to 300 °).
【００１２】金属製の高温空気導入管１０を通うして高
温空気５は浮上ユニツト９のチャンバー８内に圧入され
る。（高温空気発生装置は省略）ケース３に組み込まれ
た多孔質セラミツクス２の細孔を通して、高温空気は外
部に排出される。その際多孔質セラミツクス２の表面に
液晶ガラス基板１との間に高温気体膜４を形成し、液晶
ガラス基板との間に非接触状態を作り出す。この事が非
接触の原理である。The hot air 5 is forced into the chamber 8 of the levitation unit 9 through the hot air introducing pipe 10 made of metal. (The high temperature air generator is omitted.) The high temperature air is discharged to the outside through the pores of the porous ceramics 2 incorporated in the case 3. At that time, a high temperature gas film 4 is formed on the surface of the porous ceramics 2 with the liquid crystal glass substrate 1 to create a non-contact state with the liquid crystal glass substrate. This is the principle of non-contact.
【００１３】高温空気発生装置を使用しない場合は、ヒ
ーター６をチヤンバー８内に組み込む事がある、なお７
はヒーター６用の電線である。When the high temperature air generator is not used, the heater 6 may be incorporated in the chamber 8, and
Is an electric wire for the heater 6.
【００１４】図１は非接触の原理図であるが、図２は焼
成（乾燥）炉内の非接触状態での搬送装置の断面図であ
る。（ここでは加熱用ヒーター類は省略）FIG. 1 is a principle view of non-contact, while FIG. 2 is a cross-sectional view of a transfer device in a non-contact state in a firing (drying) furnace. (Heating heaters are omitted here)
【００１５】（９０°−θ）＝８０°に傾斜した液晶ガ
ラス基板１の下部は搬送用ローラー１２に騎乗してい
る。液晶ガラス基板１の上部は回転コロ１１で支持され
てる。ガラス基板１に発生する撓みを浮上ユニツト９の
表面で発生する高温気体膜４で支持する。The lower portion of the liquid crystal glass substrate 1 tilted at (90 ° -θ) = 80 ° is mounted on the transport roller 12. The upper part of the liquid crystal glass substrate 1 is supported by a rotating roller 11. The bending generated in the glass substrate 1 is supported by the high temperature gas film 4 generated on the surface of the levitation unit 9.
【００１６】液晶ガラス基板１の搬送力は搬送ローラー
１２の回転力を使用する。搬送ローラー１２のシャフト
１９は炉外壁１７に施置されたボール・ベアリング１３
で支持されている。シャフト１９の駆動力は炉外のモー
ター１６で行う。液晶ガラス基板１の移動方向の搬送ロ
ーラー１２はシャフト１９に装備されたコンベア・ベル
トおよびベルト・プリー１４で行う。As the conveying force of the liquid crystal glass substrate 1, the rotating force of the conveying roller 12 is used. The shaft 19 of the transfer roller 12 is a ball bearing 13 mounted on the outer wall 17 of the furnace.
Supported by. The driving force of the shaft 19 is performed by the motor 16 outside the furnace. The transport roller 12 in the moving direction of the liquid crystal glass substrate 1 is performed by a conveyor belt and a belt pulley 14 mounted on the shaft 19.
【００１７】図３は非接触縦型焼成（乾燥）炉２０の断
面図である。図２の非接触縦型装置に焼成（乾燥）用の
遠赤外線ヒーター（ホツト・プレート）２２を装備した
焼成（乾燥）炉である。炉内の温度は１００°〜２５０
°の高温であるので外壁は断熱材１７で保温されてい
る。FIG. 3 is a sectional view of the non-contact vertical firing (drying) furnace 20. This is a baking (drying) furnace in which the far-infrared heater (hot plate) 22 for baking (drying) is installed in the non-contact vertical apparatus of FIG. The temperature in the furnace is 100 ° to 250
Since the temperature is high, the outer wall is kept warm by the heat insulating material 17.
【００１８】乾燥工程でわなく液晶ガラス基板１のレジ
スト塗布後の配合膜焼成、硬化では液晶ガラス基板１の
表面の加工であるので、遠赤外線ヒーター（ホツト・プ
レート）２２を液晶ガラス基板１の表面に近接して設置
する。この遠赤外線ヒーター（ホツト・プレート）２２
は、（９０°−θ）＝８０°の角度で設置された遠赤外
線ヒーター（ホツト・プレート）保持材２１にて保持さ
れている。（遠赤外線ヒーター等の配線は省略）Since the surface of the liquid crystal glass substrate 1 is processed by baking and curing the compound film after resist coating of the liquid crystal glass substrate 1 instead of in the drying step, the far infrared heater (hot plate) 22 is connected to the liquid crystal glass substrate 1. Install close to the surface. This far infrared heater (hot plate) 22
Is held by a far infrared heater (hot plate) holding member 21 installed at an angle of (90 ° −θ) = 80 °. (Wiring of far infrared heater etc. is omitted)
【００１９】現在使用されている焼成（乾燥）炉は図４
に示すような多段形式である。液晶ガラス基盤１の焼
成、硬化時、塗布材の有機性ガスが発生し、その有機性
ガスを排出するためエア供給ダクト３４、排気ダクト３
５を設けて高温空気をおくつている。排気が十分でない
と、有機性ガスが液晶ガラス基板に再付着してトラブル
の原因となつている。また各チヤンバーに平均に高温空
気を送るのが難しい。The firing (drying) furnace currently used is shown in FIG.
It is a multistage format as shown in. When the liquid crystal glass substrate 1 is baked or cured, an organic gas of the coating material is generated, and the air supply duct 34 and the exhaust duct 3 are provided to discharge the organic gas.
5 is provided and hot air is sent. If the exhaust gas is not sufficient, the organic gas reattaches to the liquid crystal glass substrate, causing troubles. It is also difficult to send hot air to each chamber on average.
【００２０】本焼成（乾燥）炉２０の様に、液晶ガラス
基板１を立てた状態で焼成、硬化を行えば、液晶ガラス
基板の処理面より発生する有機性ガスは上部に上昇し、
ガスの液晶ガラス基板えの再付着は考えられない。炉内
の発生有機性ガスを抜くために、炉の下部に吸気口２３
および上部に排気口２４を設けている。When the liquid crystal glass substrate 1 is baked and cured in a standing state like the main baking (drying) furnace 20, the organic gas generated from the treated surface of the liquid crystal glass substrate rises to the upper part,
It is unlikely that gas will reattach to the liquid crystal glass substrate. In order to remove the organic gas generated in the furnace, an intake port 23 is provided at the bottom of the furnace.
Further, an exhaust port 24 is provided in the upper part.
【００２１】液晶ガラス基板１の乾燥ではガラス基板両
面乾燥であるので、液晶ガラス基板１の裏面にも遠赤外
線ヒーター（ホツト・プレート）２２を浮上ユニツト保
持材１８の面に装備しなければならない。この場合液晶
ガラス基板１の両面に遠赤外線ヒーター（ホツト・プレ
ート）２２が装備される事となる。Since the liquid crystal glass substrate 1 is dried on both sides of the glass substrate, a far infrared heater (hot plate) 22 must be provided on the rear surface of the liquid crystal glass substrate 1 on the surface of the floating unit holding member 18. In this case, far infrared heaters (hot plates) 22 are provided on both sides of the liquid crystal glass substrate 1.
【００２２】図４は現在使用されているマルチ・チヤン
バー型の焼成（乾燥）炉３０である。コンベア・ローラ
ーで流れてきた（水平枚葉搬送）液晶ガラス基板１を、
ロボツト・ハンドですくい取られ、炉内え挿入される。
炉内は高温であるので真空の吸着パツトは使用に耐えな
い。FIG. 4 shows a currently used multi-chamber type baking (drying) furnace 30. The liquid crystal glass substrate 1 (horizontal single-wafer conveyance) that has flowed by the conveyor roller
It is picked up by a robot hand and inserted in the furnace.
Due to the high temperature inside the furnace, vacuum adsorption pads are not usable.
【００２３】液晶ガラス基板１が小型の場合はガラス基
板の中央部には撓みは発生しないが、液晶ガラス基板１
が１ｍ角に近ずくと中央部に約８０ｍｍの撓みが発生す
る。それ故図４のマルチ・チャンバー焼成（乾燥）炉３
０の２段目に示すようなセラミツクス材の撓み防止材３
８を装備しなければならない。この先端が鋭角のセラミ
ツクス防止材３０がガラス基板１の裏面を傷つけ歩留り
を悪くする。この非接触縦型焼成（乾燥）炉２０にはそ
の心配がない。When the liquid crystal glass substrate 1 is small, no bending occurs in the central portion of the glass substrate, but the liquid crystal glass substrate 1
When is close to 1 m square, a bending of about 80 mm occurs in the central part. Therefore, the multi-chamber firing (drying) furnace 3 of FIG.
Deflection prevention material 3 of ceramics material as shown in the second row of No. 0
You must equip eight. The ceramics preventing material 30 having a sharp tip damages the back surface of the glass substrate 1 and deteriorates the yield. This non-contact vertical firing (drying) furnace 20 does not have such a worry.
【００２４】図５は非接触状態で液晶ガラス基板１が８
０°の角度でトラバーサー（図省略）で維持され、焼成
（乾燥）炉２０内え挿入されるフローパタンを図面化し
た傾斜図である。液晶ガラス基板１は炉の左端の挿入口
より炉内え搬入される、炉内の搬送力は搬送ローラー１
２駆動用モーター１６で行う。この時液晶ガラス基板１
は浮上ユニツト３で非接触状態が維持されている。炉内
を液晶ガラス基板１が流れる間に遠赤外線ヒーター（ホ
ツト・ヒーター）２２により焼成（乾燥）が行われる。
焼成炉内部の加熱装置の配線は省略している。もちろ
ん、液晶ガラス基板１の炉外えの送り出しのためのトラ
バーサーが準備されなければならない。非接触縦型焼成
（乾燥）炉２０内の発生有機ガスを排気するための高温
空気吸気口２３が下部に、排気口２４が上部に設けられ
ている。In FIG. 5, the liquid crystal glass substrate 1 is 8 in a non-contact state.
FIG. 3 is a tilted view showing a flow pattern which is maintained by a traverser (not shown) at an angle of 0 ° and is inserted inside the firing (drying) furnace 20. The liquid crystal glass substrate 1 is loaded into the furnace through the insertion port at the left end of the furnace.
2 Drive motor 16 is used. At this time, the liquid crystal glass substrate 1
The floating unit 3 maintains the non-contact state. Firing (drying) is performed by a far infrared heater (hot heater) 22 while the liquid crystal glass substrate 1 flows in the furnace.
The wiring of the heating device inside the firing furnace is omitted. Of course, a traverser for feeding the liquid crystal glass substrate 1 outside the furnace must be prepared. A high temperature air intake port 23 for exhausting the generated organic gas in the non-contact vertical firing (drying) furnace 20 is provided in the lower part, and an exhaust port 24 is provided in the upper part.
【００２５】[0025]
【図１】液晶ガラス基板非接触の原理図[Figure 1] Principle of non-contact liquid crystal glass substrate
【図２】焼成（乾燥）炉内の非接触縦型搬送装置の断面
図FIG. 2 is a cross-sectional view of a non-contact vertical transfer device in a firing (drying) furnace.
【図３】液晶ガラス基板非接触縦型焼成（乾燥）炉の断
面図FIG. 3 is a cross-sectional view of a liquid crystal glass substrate non-contact vertical baking (drying) furnace.
【図４】多段式マルチ・チャンバー焼成（乾燥）炉[Fig. 4] Multi-stage multi-chamber firing (drying) furnace
【図５】液晶ガラス基板の焼成炉内えの移載傾斜図FIG. 5 is a transfer tilt diagram of a liquid crystal glass substrate inside a baking furnace.
１ 液晶ガラス基板 １３ ベアリング
２ 多孔質セラミツクス １４ プリー
３ 浮上ユニツト １５ ベルト
４ 高温気体膜 １６ モター
５ 高温気体 １７ 断熱材
６ ヒーター １８ 浮上ユニツ
ト保持材
７ ヒーター用電線 １９ シャフト
８ チャンバー ２０ 焼成（乾
燥）炉
９ ケース ２１ 遠赤外線ヒ
ーター保持材
１０ 金属パイプ ２２ 遠赤外線
ヒーター
１１ 回転コロ ２３ 吸気口
１２ 搬送用ローラー ２４ 排気口
３０ マルチ・チャンバー焼成（乾燥）炉
３２ ガラス基板支持管
３３ 放射加熱
３４ エアー供給ダクト
３５ 排気ダクト
３６ 断熱保温材
３７ 壁外壁パネル
３８ 撓み防止材
４１ 液晶ガラス基板排出口1 Liquid Crystal Glass Substrate 13 Bearing 2 Porous Ceramics 14 Pulley 3 Levitating Unit 15 Belt 4 High Temperature Gas Film 16 Moter 5 High Temperature Gas 17 Heat Insulating Material 6 Heater 18 Levitating Unit Holding Material 7 Heater Wire 19 Shaft 8 Chamber 20 Firing (Drying) Furnace 9 Case 21 Far-infrared Heater Holding Material 10 Metal Pipe 22 Far-infrared Heater 11 Rotating Roller 23 Intake Port 12 Transport Roller 24 Exhaust Port 30 Multi-Chamber Baking (Drying) Furnace 32 Glass Substrate Support Tube 33 Radiant Heating 34 Air Supply Duct 35 Exhaust duct 36 Thermal insulation 37 Wall outer wall panel 38 Bending prevention material 41 Liquid crystal glass substrate outlet
フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｆ２７Ｄ 5/00 Ｆ２７Ｄ 5/00 ５Ｆ０３１ 7/02 7/02 Ａ 11/02 11/02 Ａ Ｇ０２Ｆ 1/13 １０１ Ｇ０２Ｆ 1/13 １０１ Ｈ０１Ｌ 21/68 Ｈ０１Ｌ 21/68 Ａ Ｆターム(参考） 2H088 FA17 FA21 FA30 HA01 MA20 3L113 AA03 AB06 AC10 AC36 BA34 DA04 4K050 AA04 AA05 BA07 BA17 CA07 CD06 CD16 CF06 CF16 CG04 4K055 AA00 NA04 4K063 AA06 AA12 DA01 DA13 DA15 DA24 FA02 5F031 CA05 FA02 FA07 FA18 GA51 GA53 GA62 MA30 PA26 Front page continuation (51) Int.Cl. 7 Identification code FI theme code (reference) F27D 5/00 F27D 5/00 5F031 7/02 7/02 A 11/02 11/02 A G02F 1/13 101 G02F 1 / 13 101 H01L 21/68 H01L 21/68 AF Term (reference) 2H088 FA17 FA21 FA30 HA01 MA20 3L113 AA03 AB06 AC10 AC36 BA34 DA04 4K050 AA04 AA05 BA07 BA17 CA07 CD06 CD16 CF06 CF16 CG04 4K055 AA00 NA04 4K12 DA01 DAA3 DA06 DA24 FA02 5F031 CA05 FA02 FA07 FA18 GA51 GA53 GA62 MA30 PA26
Claims (5)
込んだ圧力容器より、高温気体（１００°〜３００°）
を噴気させ、多孔質セラミツクスの表面に形成される高
温気体膜で液晶ガラス基板を浮上させる圧力ユニツト。1. A high-temperature gas (100 ° to 300 °) from a pressure vessel incorporating a porous ceramic having air permeability.
A pressure unit that causes the liquid crystal glass substrate to float by a high temperature gas film formed on the surface of the porous ceramics.
ツトを設け、圧力ユニツトの平面部が傾斜あるいは垂直
になるようにし、前記圧力ユニツトより噴出される高温
気体により液晶ガラス基板が支持されるともに、液晶ガ
ラス基板の下端部を搬送ローラーで支持搬送する手段を
設けた焼成（乾燥）炉。2. A pressure unit having at least one flat portion is provided, the flat portion of the pressure unit is inclined or vertical, and the liquid crystal glass substrate is supported by a high temperature gas ejected from the pressure unit. A baking (drying) furnace provided with a means for supporting and conveying the lower end of the liquid crystal glass substrate with a conveying roller.
搬送されている液晶ガラス基板の表面または両面を焼成
（乾燥）するために設けた、遠赤外線ヒーターまたはホ
ツト・プレートを具備する焼成（乾燥）炉。3. A firing (drying) provided with a far-infrared heater or a hot plate provided for firing (drying) the surface or both surfaces of a liquid crystal glass substrate which is supported by a pressure unit and is conveyed while being inclined. Furnace.
る有機性ガスを排気するため、炉内の温度と同じ高温気
体を供給、排気するための機構を備えた焼成（乾燥）
炉。4. A firing (drying) provided with a mechanism for supplying and exhausting a high temperature gas which is the same as the temperature in the furnace in order to exhaust the organic gas generated during the firing (drying) of the liquid crystal glass substrate.
Furnace.
送り込む装備を具備した焼成（乾燥）炉。5. A firing (drying) furnace equipped with a device for feeding hot air instead of the far infrared heater.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002121490A JP2003267548A (en) | 2002-03-18 | 2002-03-18 | Non-contact vertical type burning (drying) furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002121490A JP2003267548A (en) | 2002-03-18 | 2002-03-18 | Non-contact vertical type burning (drying) furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003267548A true JP2003267548A (en) | 2003-09-25 |
Family
ID=29208077
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002121490A Pending JP2003267548A (en) | 2002-03-18 | 2002-03-18 | Non-contact vertical type burning (drying) furnace |
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| Country | Link |
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| JP (1) | JP2003267548A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006008350A (en) * | 2004-06-28 | 2006-01-12 | Motoyama:Kk | Object floating unit and object floating device |
| JP2008164235A (en) * | 2006-12-28 | 2008-07-17 | Ngk Insulators Ltd | Heat treatment furnace for flat plate-shaped member |
| JP2011117678A (en) * | 2009-12-04 | 2011-06-16 | Toppan Printing Co Ltd | Substrate drying method and device, method for manufacturing substrate, and flat panel display |
| KR101224905B1 (en) * | 2006-10-16 | 2013-01-22 | 주식회사 케이씨텍 | Device for transferring large scale substrate |
| CN105043103A (en) * | 2015-07-06 | 2015-11-11 | 上海卡贝尼精密陶瓷有限公司 | Super-long ceramic stick sintering furnace and using method thereof |
| CN109230533A (en) * | 2018-09-03 | 2019-01-18 | 郑州福耀玻璃有限公司 | A kind of vehicle glass uninterruptedly dries curved line |
-
2002
- 2002-03-18 JP JP2002121490A patent/JP2003267548A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006008350A (en) * | 2004-06-28 | 2006-01-12 | Motoyama:Kk | Object floating unit and object floating device |
| KR101224905B1 (en) * | 2006-10-16 | 2013-01-22 | 주식회사 케이씨텍 | Device for transferring large scale substrate |
| JP2008164235A (en) * | 2006-12-28 | 2008-07-17 | Ngk Insulators Ltd | Heat treatment furnace for flat plate-shaped member |
| JP2011117678A (en) * | 2009-12-04 | 2011-06-16 | Toppan Printing Co Ltd | Substrate drying method and device, method for manufacturing substrate, and flat panel display |
| CN105043103A (en) * | 2015-07-06 | 2015-11-11 | 上海卡贝尼精密陶瓷有限公司 | Super-long ceramic stick sintering furnace and using method thereof |
| CN109230533A (en) * | 2018-09-03 | 2019-01-18 | 郑州福耀玻璃有限公司 | A kind of vehicle glass uninterruptedly dries curved line |
| CN109230533B (en) * | 2018-09-03 | 2024-03-19 | 郑州福耀玻璃有限公司 | Uninterrupted baking and bending line for automobile glass |
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