JP2003203333A - Method for manufacturing substrate for magnetic recording medium, method for manufacturing member for manufacturing the substrate, and member for manufacturing the substrate - Google Patents
Method for manufacturing substrate for magnetic recording medium, method for manufacturing member for manufacturing the substrate, and member for manufacturing the substrateInfo
- Publication number
- JP2003203333A JP2003203333A JP2002000924A JP2002000924A JP2003203333A JP 2003203333 A JP2003203333 A JP 2003203333A JP 2002000924 A JP2002000924 A JP 2002000924A JP 2002000924 A JP2002000924 A JP 2002000924A JP 2003203333 A JP2003203333 A JP 2003203333A
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- Prior art keywords
- substrate
- manufacturing
- recording medium
- magnetic recording
- base material
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- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、垂直記録により情
報を記録する磁気記録媒体に用いられる磁気記録媒体用
基板の製造方法およびその製造用部材の作製方法ならび
に磁気記録媒体用基板の製造用部材に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a substrate for a magnetic recording medium used for a magnetic recording medium for recording information by perpendicular recording, a method of manufacturing a member for manufacturing the same, and a member for manufacturing a substrate for a magnetic recording medium. Regarding
【０００２】[0002]
【従来の技術】現在の固定磁気ディスク装置は、磁化の
向きが媒体平面内にある長手記録方式がほとんどであ
る。しかし、今後の記録密度の向上に伴なって磁性層の
磁化反転単位が小さくなると、常温でも磁化反転が起
き、いわゆる熱揺らぎによる記録ビットの消去が起きる
と言われている。将来、この熱揺らぎにより長手記録媒
体の記録密度が限界に達した際の固定磁気ディスクの方
式として、磁化の向きが媒体平面と垂直方向になる垂直
記録等が検討されている。2. Description of the Related Art Most current fixed magnetic disk devices use a longitudinal recording method in which the direction of magnetization is in the plane of the medium. However, it is said that if the magnetization reversal unit of the magnetic layer becomes smaller as the recording density is improved in the future, the magnetization reversal will occur even at room temperature, and the recorded bits will be erased by so-called thermal fluctuation. Perpendicular recording in which the direction of magnetization is perpendicular to the plane of the medium is being studied as a method of the fixed magnetic disk when the recording density of the longitudinal recording medium reaches its limit due to this thermal fluctuation in the future.
【０００３】その中で、いわゆるパターンドメディアは
非常に高い記録密度（１テラビット／平方インチのレベ
ル）を達成できる技術として注目されている。パターン
ドメディアとは、媒体の任意の位置に微細な磁性体を規
則的に配置し、その周りを非磁性体で囲んだ構造を持つ
垂直記録媒体である。この構造は、以下のような媒体と
しての有利な点をもたらす。Among them, so-called patterned media has been attracting attention as a technique capable of achieving a very high recording density (1 terabit / square inch level). The patterned medium is a perpendicular recording medium having a structure in which a fine magnetic material is regularly arranged at an arbitrary position of the medium, and the periphery thereof is surrounded by a non-magnetic material. This structure provides the following advantages as a medium.
【０００４】第１に、周りの非磁性体により孤立した磁
性体は非常に小さいため、単磁区（すなわち、磁性体よ
り小さな単位で磁化反転を起こさない）でありノイズが
少ない。第２に、磁性体が非磁性体で囲まれているた
め、隣の粒子との相互作用が無くノイズが少ない。第３
に、磁性体が基板と垂直方向に長い構造をしており、結
果として粒子体積が大きければ熱揺らぎを起こしにく
い。このように形成される孤立した磁性体は、記録ビッ
トとして、あるいは特徴的な配置で形成するとヘッドが
媒体の座標情報を得るサーボパターンとしても作用する
ことができる。First, since the magnetic substance isolated by the surrounding non-magnetic substance is very small, it is a single magnetic domain (that is, it does not cause magnetization reversal in a unit smaller than that of the magnetic substance) and has little noise. Secondly, since the magnetic material is surrounded by the non-magnetic material, there is no interaction with the adjacent particles and the noise is small. Third
In addition, the magnetic material has a structure that is long in the direction perpendicular to the substrate, and as a result, if the particle volume is large, thermal fluctuations are less likely to occur. The isolated magnetic material formed in this manner can act as a recording bit or, when formed with a characteristic arrangement, as a servo pattern for the head to obtain coordinate information of the medium.
【０００５】このように孤立した磁性体の構造を実現す
るためによく用いられる方法を図１に示す。図１は、媒
体の断面図を用いて、パターンドメディアの製造過程を
模式的に表したものである。まず、図１（ａ）に示すよ
うに、微小な径を有する穴１００をあけた非磁性基板１
（穴１００は非磁性基板１の凹部である）上に、図１
（ｂ）に示すような磁性体２をスパッタ法などにより堆
積する。次いで、これを磁性体が堆積された媒体表面側
から研磨等の手法によって穴以外に堆積した磁性体を除
去することにより、図１（ｃ）に示すような目的の構造
を得る。図１（ａ）に示す穴１００の穴径はすなわちビ
ット径であるため、非常に微細で、ナノメートルから１
０ナノメートルのオーダーである。FIG. 1 shows a method often used to realize such an isolated magnetic structure. FIG. 1 schematically shows a manufacturing process of a patterned medium using a cross-sectional view of the medium. First, as shown in FIG. 1A, the non-magnetic substrate 1 having holes 100 having a minute diameter is formed.
(The hole 100 is a recess of the non-magnetic substrate 1)
The magnetic body 2 as shown in (b) is deposited by a sputtering method or the like. Then, the magnetic material deposited on the surface of the medium on which the magnetic material is deposited is removed by a method such as polishing to remove the magnetic material other than the holes, thereby obtaining a target structure as shown in FIG. 1 (c). Since the hole diameter of the hole 100 shown in FIG. 1A is the bit diameter, it is very fine, and it is from nanometer to 1 mm.
It is on the order of 0 nanometer.
【０００６】[0006]
【発明が解決しようとする課題】しかしながら、このよ
うな極微細で、かつアスペクト比の高い穴を任意の位置
に開ける技術は現状では限られている。一般に、このよ
うな技術としては、電子線リソグラフィー技術を用いた
エッチングが良く用いられるが、電子線リソグラフィー
はスループットが低い。従って、磁気記録媒体のように
安価に作製する必要があるデバイスの作製には適してい
ないという問題があった。However, at present, there are only limited techniques for forming such ultrafine holes having a high aspect ratio at arbitrary positions. Generally, as such a technique, etching using an electron beam lithography technique is often used, but the electron beam lithography has a low throughput. Therefore, there is a problem that it is not suitable for manufacturing a device such as a magnetic recording medium that needs to be manufactured at low cost.
【０００７】また、平滑基材上に、電子線リソグラフィ
ーにてパターンドメディア基板とはその凹凸が逆となっ
ている雌型を作製し、それをスタンパとしてプラスチッ
ク等の成型可能な材料を用いて、スループットが高い成
型法により穴開き基板を作製する方法もある。しかしな
がら、パターンドメディア用基板は多数の極微細な構造
を有しているため、スタンパとディスクの接触面積が極
めて大きく、離型しにくいという問題があった。On a smooth base material, a female die is prepared by electron beam lithography in which the unevenness is opposite to that of the patterned media substrate, and a moldable material such as plastic is used as a stamper. There is also a method of manufacturing a perforated substrate by a molding method with high throughput. However, since the patterned media substrate has a large number of extremely fine structures, there is a problem that the contact area between the stamper and the disk is extremely large, and it is difficult to release the mold.
【０００８】従って、パターンドメディア基板の極微細
な穴を高スループットで作製する技術が望まれている。Therefore, there is a demand for a technique for producing extremely fine holes in a patterned media substrate with high throughput.
【０００９】本発明はこのような問題に鑑みてなされた
ものであり、その目的とするところは、パターンドメデ
ィアを安価に作製することができる磁気記録媒体用基板
の製造方法およびその製造用部材の作製方法ならびに磁
気記録媒体用基板の製造用部材を提供することにある。The present invention has been made in view of the above problems, and an object of the present invention is to provide a method of manufacturing a substrate for a magnetic recording medium, which can manufacture a patterned medium at low cost, and a member for manufacturing the same. And a member for manufacturing a substrate for a magnetic recording medium.
【００１０】[0010]
【課題を解決するための手段】上記課題を解決するため
に鋭意検討した結果、炭素系材料からなる線状構造体を
平滑基材上の任意の位置に基材と垂直方向に多数形成し
て作製された部材をプラスチック基板に押し付けたり、
また、同部材を成型用のスタンパとして射出成型するこ
とで、任意の位置に多数の穴を有するパターンドメディ
ア用基板を高スループットで作成できることが分かっ
た。As a result of extensive studies to solve the above problems, as a result of forming a large number of linear structures made of a carbon-based material at arbitrary positions on a smooth base material in the vertical direction to the base material. Press the manufactured member against the plastic substrate,
Further, it was found that a substrate for patterned media having a large number of holes at arbitrary positions can be produced with high throughput by injection-molding the same member as a molding stamper.
【００１１】具体的には本発明における磁気記録媒体用
基板の製造方法は、基板に形成された穴に磁性体を埋め
込んだ磁気記録媒体に用いられる磁気記録媒体用基板の
製造方法であって、炭素系材料からなる複数の線状構造
体が平滑基材上に該平滑基材と垂直方向に形成された製
造用部材を、平滑プラスチック基板に押し付けて該平滑
プラスチック基板に前記穴を形成することにより製造す
る。Specifically, the method for producing a substrate for a magnetic recording medium according to the present invention is a method for producing a substrate for a magnetic recording medium used in a magnetic recording medium in which a magnetic material is embedded in a hole formed in the substrate, A plurality of linear structures made of carbonaceous material are formed on a smooth base material in a direction perpendicular to the smooth base material, and a manufacturing member is pressed against the smooth plastic base material to form the holes in the smooth plastic base material. Manufactured by.
【００１２】また、本発明における磁気記録媒体用基板
の製造方法は、基板に形成された穴に磁性体を埋め込ん
だ磁気記録媒体に用いられる磁気記録媒体用基板の製造
方法であって、炭素系材料からなる複数の線状構造体が
平滑基材上に該平滑基材と垂直方向に形成された製造用
部材をスタンパとして、成型法により製造する。A method of manufacturing a substrate for a magnetic recording medium according to the present invention is a method for manufacturing a substrate for a magnetic recording medium used in a magnetic recording medium in which a magnetic material is embedded in a hole formed in the substrate, which is carbon-based. A plurality of linear structures made of a material are manufactured by a molding method using a manufacturing member having a smooth base material formed in a direction perpendicular to the smooth base material as a stamper.
【００１３】ここで、前記磁気記録媒体用基板はプラス
チックまたはガラスからなることが好ましい。Here, the magnetic recording medium substrate is preferably made of plastic or glass.
【００１４】また、本発明における磁気記録媒体用基板
の製造方法に用いられる製造用部材の作製方法は、前記
平滑基材に真空中で電子線を照射して前記炭素系材料を
堆積させて前記線状構造体を形成する。Further, in the method of manufacturing the manufacturing member used in the method of manufacturing the magnetic recording medium substrate of the present invention, the smooth base material is irradiated with an electron beam in a vacuum to deposit the carbonaceous material, and Form a linear structure.
【００１５】また、本発明における磁気記録媒体用基板
の製造方法に用いられる製造用部材の作製方法は、前記
平滑基材に穴を形成し、該形成された穴に触媒金属を埋
め込み、該埋め込まれた触媒金属からカーボンナノチュ
ーブを成長させて前記線状構造体を形成する。Further, in the method for producing a manufacturing member used in the method for producing a substrate for a magnetic recording medium according to the present invention, a hole is formed in the smooth base material, a catalytic metal is embedded in the formed hole, and the embedding is performed. The carbon nanotubes are grown from the catalyst metal thus formed to form the linear structure.
【００１６】ここで、前記平滑基材に対向させて、本発
明における磁気記録媒体用基板の製造用部材の作製方法
により作製された製造用部材を配置し、真空中で前記カ
ーボンナノチューブに電圧をかけて前記対向基材に向け
て電子線を放出させ、前記平滑基材に前記炭素系材料を
堆積させることにより前記線状構造体を形成することが
好ましい。Here, a manufacturing member manufactured by the method for manufacturing a magnetic recording medium substrate manufacturing member according to the present invention is arranged so as to face the smooth base material, and a voltage is applied to the carbon nanotubes in a vacuum. It is preferable that the linear structure is formed by emitting an electron beam toward the facing base material and depositing the carbon-based material on the smooth base material.
【００１７】また、本発明における磁気記録媒体用基板
の製造用部材は、基板に形成された穴に磁性体を埋め込
んだ磁気記録媒体の作製に用いられる磁気記録媒体用基
板の製造用部材であって、炭素系材料からなる複数の線
状構造体が平滑基材上に該平滑基材と垂直方向に形成さ
れている。The member for manufacturing a magnetic recording medium substrate according to the present invention is a member for manufacturing a magnetic recording medium substrate used for manufacturing a magnetic recording medium in which a magnetic material is embedded in a hole formed in the substrate. A plurality of linear structures made of carbonaceous material are formed on the smooth base material in the direction perpendicular to the smooth base material.
【００１８】ここで、前記磁気記録媒体用基板はプラス
チックまたはガラスからなることが好ましい。Here, the magnetic recording medium substrate is preferably made of plastic or glass.
【００１９】また、前記線状構造体は、真空中での前記
平滑基材に対する電子線の照射により堆積した炭素系材
料であることが好ましい。Further, the linear structure is preferably a carbonaceous material deposited by irradiating the smooth base material with an electron beam in a vacuum.
【００２０】また、前記線状構造体は、前記平滑基材に
形成された穴に触媒金属が埋め込まれた触媒金属から成
長させたカーボンナノチューブであることが好ましい。Further, it is preferable that the linear structure is a carbon nanotube grown from a catalytic metal in which a catalytic metal is embedded in a hole formed in the smooth base material.
【００２１】更に、前記線状構造体は、前記平滑基材に
対向させて配置された、本発明における磁気記録媒体用
基板の製造用部材のカーボンナノチューブに真空中で電
圧をかけて放出された電子線により、前記平滑基材に堆
積された炭素系材料であることが好ましい。Further, the linear structure is discharged by applying a voltage in a vacuum to the carbon nanotubes of the member for manufacturing the substrate for a magnetic recording medium of the present invention which is arranged so as to face the smooth base material. It is preferable that the carbon-based material is deposited on the smooth base material by an electron beam.
【００２２】[0022]
【発明の実施の形態】以下に、本発明の好適な実施の形
態について詳細に説明する。BEST MODE FOR CARRYING OUT THE INVENTION Preferred embodiments of the present invention will be described in detail below.
【００２３】（第１実施形態）本実施形態では、平滑基
材上に、炭素系化合物からなる線状構造体を基材の任意
の場所に基材と垂直方向に成長させて、磁気記録媒体用
基板の製造用部材を作製する。(First Embodiment) In this embodiment, a linear structure made of a carbon-based compound is grown on a smooth base material at an arbitrary position on the base material in a direction perpendicular to the base material to obtain a magnetic recording medium. A member for manufacturing a manufacturing substrate is manufactured.
【００２４】図２は、本実施形態に係る磁気記録媒体用
基板の製造用部材の作製方法を実施する電子ビーム装置
の構成図である。電子ビーム装置は、真空チャンバー２
０６と、その内部に設けられた電子銃２０１、コンデン
サレンズ２０２、対物レンズ２０３および加速レンズ２
０５から構成されている。電子銃２０１から出射された
電子ビームは、コンデンサレンズ２０２によって収束さ
れ、対物レンズ２０３によって基材２０４上の所定の位
置に照射される。これにより、電子ビームが照射された
位置に、線状の炭素系堆積物が形成される。FIG. 2 is a block diagram of an electron beam apparatus for carrying out the method of manufacturing a member for manufacturing a substrate for a magnetic recording medium according to this embodiment. The electron beam device is a vacuum chamber 2
06, the electron gun 201, the condenser lens 202, the objective lens 203, and the acceleration lens 2 provided therein.
It is composed of 05. The electron beam emitted from the electron gun 201 is converged by the condenser lens 202, and is irradiated onto a predetermined position on the base material 204 by the objective lens 203. As a result, a linear carbon-based deposit is formed at the position irradiated with the electron beam.
【００２５】電子線照射による炭素系材料の堆積は、走
査型電子顕微鏡の分野では観察によるコンタミネーショ
ンとして良く知られている現象である。真空チャンバー
２０６内には、その真空度に応じた微量残留ガスが存在
するが、その中には通常、炭素系ガスが存在する。その
炭素系ガスが原料となって、電子線の照射部にアモルフ
ァスカーボン系の材料が堆積すると理解されている。炭
素系材料の析出は、電子顕微鏡観察において観察や分析
の妨げとなるが、逆に、本実施形態のように電子線照射
により線状構造体を容易に作製する手段となり得る。The deposition of carbonaceous materials by electron beam irradiation is a phenomenon well known as observation contamination in the field of scanning electron microscopes. Although a trace amount of residual gas according to the degree of vacuum exists in the vacuum chamber 206, carbon-based gas is usually present therein. It is understood that the carbon-based gas serves as a raw material and an amorphous carbon-based material is deposited on the electron beam irradiation portion. The precipitation of the carbon-based material hinders observation and analysis in electron microscope observation, but can be a means for easily producing a linear structure by electron beam irradiation as in the present embodiment.
【００２６】磁気記録媒体用基板を製造する際には、上
記のように平滑基板上に線状炭素系構造体が形成された
製造用部材をプラスチック基板に押し付ける。これによ
り、線状炭素系構造体がプラスチック基板に穴をあける
ので、磁気記録媒体用基板の穴を一括形成することがで
きる。また、この製造用部材は繰り返し使用できるの
で、次々に基板に加工を施していけば、高いスループッ
トで磁気記録媒体用基板の作製が実現できる。When manufacturing a substrate for a magnetic recording medium, a manufacturing member having a linear carbon-based structure formed on a smooth substrate as described above is pressed against a plastic substrate. As a result, the linear carbon-based structure makes a hole in the plastic substrate, so that the holes in the magnetic recording medium substrate can be collectively formed. Further, since this manufacturing member can be repeatedly used, it is possible to manufacture a substrate for a magnetic recording medium with high throughput if the substrates are processed one after another.
【００２７】（第２実施形態）本実施形態では、平滑基
材に形成された微細な穴に触媒金属を埋め込み、そこか
らカーボンナノチューブを成長させて磁気記録媒体用基
板の製造用部材を作製する。これにより、微細かつ位置
が制御された穴を一括形成することができる。(Second Embodiment) In this embodiment, a catalytic metal is embedded in a fine hole formed in a smooth base material, and carbon nanotubes are grown from the hole to manufacture a member for manufacturing a substrate for a magnetic recording medium. . This makes it possible to collectively form fine holes whose positions are controlled.
【００２８】図３は、本実施形態に係るプラズマＣＶＤ
装置の構成図である。マイクロ波電源３０７からの出力
電力は、導波管３０２を経由して、石英管３０１に導か
れる。石英管３０１の内部には、ガス導入口３０８に接
続されたガスボンベ（図示せず）から炭素系ガスと他の
ガスとの混合ガスが導入され、一定圧力が維持されてい
る。導入された混合ガスは、導波管３０２を介して供給
されるマイクロ波電力によりプラズマ化される。基材３
０６は、直流電源３０４によりマイクロ波の電界に対し
て垂直な電界を形成するように配置された２枚の平板電
極３０５のうちの一方に設置される。これにより、平板
電極３０５の間でプラズマが励起され、基材３０６上に
カーボンナノチューブアレイが作製される。FIG. 3 shows the plasma CVD according to this embodiment.
It is a block diagram of an apparatus. Output power from the microwave power source 307 is guided to the quartz tube 301 via the waveguide 302. A mixed gas of a carbon-based gas and another gas is introduced into the quartz tube 301 from a gas cylinder (not shown) connected to the gas introduction port 308 to maintain a constant pressure. The introduced mixed gas is turned into plasma by the microwave power supplied through the waveguide 302. Base material 3
06 is installed on one of the two plate electrodes 305 arranged so as to form an electric field perpendicular to the electric field of the microwave by the DC power supply 304. As a result, plasma is excited between the flat plate electrodes 305, and a carbon nanotube array is produced on the base material 306.
【００２９】（第３実施形態）本実施形態では、平滑基
材上に、炭素系化合物からなる線状構造体を基材の任意
の場所に基材と垂直方向に成長させた磁気記録媒体用基
板の製造用部材をスタンパとして、プラスチックあるい
はガラス等の基板材料を用いて成型法により磁気記録媒
体用基板を作製する。ここで使用される磁気記録媒体用
基板の製造用部材は、上述の何れの方法により作製され
たものであってもよい。(Third Embodiment) In this embodiment, a linear structure made of a carbon-based compound is grown on a smooth base material at an arbitrary place on the base material in a direction perpendicular to the base material. A substrate for a magnetic recording medium is produced by a molding method using a substrate material such as plastic or glass with a substrate manufacturing member as a stamper. The member for manufacturing the magnetic recording medium substrate used here may be manufactured by any of the above-mentioned methods.
【００３０】炭素系材料は他の物質との摩擦が小さいの
で、この製造用部材をプラスチック等の成型可能な材料
の成型時のスタンパに使用することで、離型が容易にな
り、スループットの高い成型法が実現できる。Since a carbon-based material has a small friction with other substances, by using this manufacturing member as a stamper when molding a moldable material such as plastic, mold release is facilitated and throughput is high. A molding method can be realized.
【００３１】（第４実施形態）本実施形態では、上述の
第２実施形態に係る磁気記録媒体用基板の製造用部材の
作製方法により作製されたカーボンナノチューブアレイ
を微小電子源として用い、平滑基材上に炭素系堆積物を
形成する。(Fourth Embodiment) In the present embodiment, a carbon nanotube array produced by the method for producing a member for producing a substrate for a magnetic recording medium according to the second embodiment described above is used as a minute electron source, and a smooth substrate is used. A carbon-based deposit is formed on the material.
【００３２】図４は、本実施形態に係るの製造用部材の
製造方法を実施するための電子ビーム装置の構成図であ
る。電子ビーム装置は、直流電源４０１、基材４０２、
真空容器４０３よび電子源４０４から構成されている。
直流電源４０１に接続された基材４０２および電子源４
０４は、真空容器４０３の内部で対向して配置されてい
る。ここで、電子源４０４としては、第２実施形態に係
る方法で作製されたものと全く同様の製造用部材（その
表面と垂直にカーボンナノチューブが多数成長したシリ
コンウエハ）が使用される。FIG. 4 is a block diagram of an electron beam apparatus for carrying out the method for manufacturing a manufacturing member according to this embodiment. The electron beam device includes a DC power source 401, a substrate 402,
It is composed of a vacuum container 403 and an electron source 404.
Substrate 402 and electron source 4 connected to DC power supply 401
04 are arranged facing each other inside the vacuum container 403. Here, as the electron source 404, a manufacturing member (a silicon wafer having a large number of carbon nanotubes grown perpendicularly to its surface) exactly the same as that manufactured by the method according to the second embodiment is used.
【００３３】本実施形態では、電子源４０４が複数存在
するため、コンデンサレンズおよび対物レンズを用いて
各電子ビームを絞ることができない。そこで、図２に示
す電子ビーム装置よりも電子源４０４と基材４０２との
距離を短くする。In this embodiment, since there are a plurality of electron sources 404, it is not possible to focus each electron beam using the condenser lens and the objective lens. Therefore, the distance between the electron source 404 and the substrate 402 is made shorter than in the electron beam apparatus shown in FIG.
【００３４】磁気記録媒体用基板の製造用部材を作製す
る際には、電子源４０４のカーボンナノチューブに電圧
を印加して、電流を得る。これにより、基材４０２上に
線状炭素系堆積物を一括形成することができる。When manufacturing a member for manufacturing a substrate for a magnetic recording medium, a voltage is applied to the carbon nanotube of the electron source 404 to obtain a current. Thereby, the linear carbon-based deposits can be collectively formed on the base material 402.
【００３５】[0035]
【実施例】以下に、本発明の実施例を示す。EXAMPLES Examples of the present invention will be shown below.
【００３６】（実施例１）本実施例では、図５に示すよ
うに、図２に示す電子ビーム装置を使用し、磁気記録媒
体用基板の一例であるパターンドメディア用基板を製造
するための製造用部材を作製した。すなわち、真空チャ
ンバーを使用し、真空中にて基材５に細く絞った電子ビ
ーム３を照射し、線状の炭素系堆積物４を形成した。Example 1 In this example, as shown in FIG. 5, the electron beam apparatus shown in FIG. 2 is used to manufacture a patterned media substrate, which is an example of a magnetic recording medium substrate. A manufacturing member was produced. That is, using a vacuum chamber, the substrate 5 was irradiated with a finely focused electron beam 3 in a vacuum to form a linear carbon-based deposit 4.
【００３７】基材５として直径約６ｃｍのシリコンを用
い、電子ビームの照射条件を加速電圧３０ｋＶ、電流１
０μＡとして約１０ｎｍのビーム径を得た。なお、真空
チャンバー内の真空度は７×１０−４Ｐａ程度である。
電子ビームの照射時間は１分とし、基材５と電子銃との
距離は１５ｍｍとした。また、炭素系堆積物４の間隔を
５０ｎｍとして、１０行×１０列すなわち１００個作製
した。作製された炭素系堆積物４は、直径約５０ｎｍ、
高さ約１００ｎｍであった。Silicon having a diameter of about 6 cm was used as the base material 5, and the electron beam irradiation conditions were an accelerating voltage of 30 kV and a current of 1
A beam diameter of about 10 nm was obtained with 0 μA. The degree of vacuum in the vacuum chamber is about 7 × 10 −4 Pa.
The irradiation time of the electron beam was 1 minute, and the distance between the substrate 5 and the electron gun was 15 mm. Further, the spacing between the carbon-based deposits 4 was set to 50 nm, and 10 rows × 10 columns, that is, 100 pieces were produced. The produced carbon-based deposit 4 has a diameter of about 50 nm,
The height was about 100 nm.
【００３８】図６は、図５に示された方法で炭素系堆積
物４を複数形成した製造用部材６を用いたパターンドメ
ディア用基板の製造方法の一例を示す。図６（ａ）に示
すように製造用部材６を非磁性基板１に対向して配置
し、図６（ｂ）に示すように製造用部材６を非磁性基板
１に押し付けて炭素系堆積物４により非磁性基板１に穴
を開けた。ここで、非磁性基板１には直径約６ｃｍのポ
リカーボネートあるいはポリオレフィン系プラスチック
材料を用いた。また、製造用部材６の押し付け力は以下
のようにした。即ち、図６（ｃ）に示すように、製造用
部材６を非磁性基板１の上部に配置して、最初は製造用
部材６の自重（７ｇ程度）によって押し付け、その後１
０Ｎとした。FIG. 6 shows an example of a method of manufacturing a substrate for patterned media using a manufacturing member 6 in which a plurality of carbonaceous deposits 4 are formed by the method shown in FIG. As shown in FIG. 6A, the manufacturing member 6 is arranged so as to face the non-magnetic substrate 1, and the manufacturing member 6 is pressed against the non-magnetic substrate 1 as shown in FIG. A hole was made in the non-magnetic substrate 1 by 4. Here, for the non-magnetic substrate 1, a polycarbonate or polyolefin plastic material having a diameter of about 6 cm was used. The pressing force of the manufacturing member 6 is as follows. That is, as shown in FIG. 6C, the manufacturing member 6 is arranged on the non-magnetic substrate 1, and is first pressed by the own weight (about 7 g) of the manufacturing member 6, and then the 1
It was set to 0N.
【００３９】図７は、本実施例によって製造されたポリ
カーボネート基板の穴の透過型電子顕微鏡による断面写
真のトレース像を示す。本実施例に示す手法により直径
約５０ｎｍ、深さ約１００ｎｍの穴がポリカーボネート
基板に形成されていることがわかる。また、ポリカーボ
ネート基板の表面からの走査型電子顕微鏡観察により、
１００個の穴が形成されていることを確認した。従っ
て、本実施例による手法により、微細かつ位置が制御さ
れた穴が一括形成されたことがわかる。FIG. 7 shows a trace image of a cross-sectional photograph by a transmission electron microscope of the hole of the polycarbonate substrate manufactured according to this example. It can be seen that the polycarbonate substrate has holes with a diameter of about 50 nm and a depth of about 100 nm formed by the method described in this example. Also, by scanning electron microscope observation from the surface of the polycarbonate substrate,
It was confirmed that 100 holes were formed. Therefore, it can be seen that the method according to the present embodiment collectively formed fine and position-controlled holes.
【００４０】（実施例２）本実施例では、平滑基材に形
成された微細な穴に触媒金属を埋め込み、図３に示すプ
ラズマＣＶＤ装置を使用して、この穴からカーボンナノ
チューブを成長させて、パターンドメディア用基板の製
造用部材を作製した。そして、この製造用部材を用い
て、パターンドメディア用基板を製造した。(Embodiment 2) In this embodiment, a catalytic metal is embedded in a fine hole formed in a smooth base material, and a carbon nanotube is grown from this hole by using the plasma CVD apparatus shown in FIG. A member for manufacturing a substrate for patterned media was produced. Then, a substrate for patterned media was manufactured using this manufacturing member.
【００４１】図８は、本発明に係るパターンドメディア
用基板の製造用部材の作製方法を示す模式図である。図
８（ａ）に示すように、基材５には約２．５ｃｍの直径
を有するシリコンを用い、それに電子線リソグラフィー
技術を用いて一辺が３０ｎｍ、深さ２０ｎｍの穴を形成
した。穴と穴の間隔は３０ｎｍとし、５００行×５００
列、すなわち２５００００個の穴を形成した。次いで、
図８（ｂ）に示すように、この基材５にスパッタ法によ
り約１０ｎｍ厚の触媒金属７を埋め込んだ。なお、本実
施例では、触媒金属としてコバルトを用いた。その後、
図８（ｃ）に示すように基材５の表面の触媒金属７を研
磨によって除去し、その後イソプロピルアルコールによ
り超音波洗浄した。FIG. 8 is a schematic view showing a method of manufacturing a member for manufacturing a substrate for patterned media according to the present invention. As shown in FIG. 8A, silicon having a diameter of about 2.5 cm was used for the base material 5, and a hole having a side of 30 nm and a depth of 20 nm was formed on the base material 5 by using an electron beam lithography technique. Space between holes is 30 nm, 500 rows x 500
Rows were formed, i.e. 250,000 holes. Then
As shown in FIG. 8B, a catalyst metal 7 having a thickness of about 10 nm was embedded in the base material 5 by the sputtering method. In this example, cobalt was used as the catalyst metal. afterwards,
As shown in FIG. 8C, the catalytic metal 7 on the surface of the base material 5 was removed by polishing, and then ultrasonic cleaning was performed with isopropyl alcohol.
【００４２】このときの基材５の電子顕微鏡および原子
間力顕微鏡観察より、触媒金属からなる研磨粉が基材５
に形成された穴に入り込んでいる様子が確認されたが、
穴全体を完全には埋め尽くしておらず、若干穴形状（く
ぼみ）が残るような形状となっていた。次いで、図８
（ｄ）に示すように、この金属触媒７の上に、プラズマ
ＣＶＤ法にてカーボンナノチューブ８を形成した。プラ
ズマＣＶＤでは、水素／ベンゼンを原料ガスとし、両者
の流量を７５／２５ｓｃｃｍとして１０分間で成長させ
た。また、基板バイアスは−１９０Ｖ、マイクロ波電源
の発信周波数は２．５ＧＨｚ、出力は５００Ｗとした。From observation of the base material 5 at this time by an electron microscope and an atomic force microscope, it was found that the polishing powder made of the catalytic metal was the base material 5.
It was confirmed that it entered the hole formed in
The entire hole was not completely filled, and the hole shape (recess) was slightly left. Then, FIG.
As shown in (d), carbon nanotubes 8 were formed on the metal catalyst 7 by the plasma CVD method. In the plasma CVD, hydrogen / benzene was used as a source gas, the flow rate of both was 75/25 sccm, and growth was performed for 10 minutes. The substrate bias was −190 V, the microwave power source had an oscillation frequency of 2.5 GHz, and the output was 500 W.
【００４３】上記の条件下で、触媒金属７が埋め込まれ
た基材５の穴部に直径約１５ｎｍ、基材５の表面からの
長さ約８０ｎｍのカーボンナノチューブが形成できた。
この製造用部材を用い直径約６ｃｍのポリカーボネート
基板に穴あけ加工を行った。荷重の条件は、自重がやや
軽く３ｇ程度である点を除き、実施例１の場合と同一で
ある。Under the above conditions, carbon nanotubes having a diameter of about 15 nm and a length of about 80 nm from the surface of the base material 5 could be formed in the holes of the base material 5 in which the catalytic metal 7 was embedded.
Using this manufacturing member, a polycarbonate substrate having a diameter of about 6 cm was perforated. The conditions of the load are the same as in the case of Example 1 except that the self-weight is slightly lighter and about 3 g.
【００４４】図９は、本実施例によって作製されたポリ
カーボネート基板の穴の透過型電子顕微鏡による断面写
真のトレース像を示す。本実施例に示す手法により、直
径約２０ｎｍ、深さ約８０ｎｍの穴がポリカーボネート
基板に形成されていることがわかる。また、ポリカーボ
ネート基板の表面からの走査型電子顕微鏡観察により、
２５００００個の穴が作製されていることを確認した。
従って、本実施例による手法により微細かつ位置が制御
された穴が一括形成されたことがわかる。FIG. 9 shows a trace image of a cross-sectional photograph by a transmission electron microscope of the hole of the polycarbonate substrate manufactured according to this example. By the method shown in this example, it is found that holes having a diameter of about 20 nm and a depth of about 80 nm are formed in the polycarbonate substrate. Also, by scanning electron microscope observation from the surface of the polycarbonate substrate,
It was confirmed that 250,000 holes were formed.
Therefore, it can be seen that the method according to the present embodiment collectively formed fine holes whose positions were controlled.
【００４５】（実施例３）本実施例では、炭素系材料か
らなる線状構造体を平滑基材上の任意の位置に基材と垂
直方向に多数形成して作製された部材をスタンパとし
て、プラスチックあるいはガラスを材料とした基板を成
型法により製造するパターンドメディア用基板の製造方
法の実施例を示す。(Embodiment 3) In this embodiment, a stamper is a member produced by forming a large number of linear structures made of a carbonaceous material at arbitrary positions on a smooth base material in a direction perpendicular to the base material. An example of a method for producing a substrate for patterned media, in which a substrate made of plastic or glass is produced by a molding method will be described.
【００４６】表面研磨したニッケル板上に、実施例１と
同一の方法にて１００行×１００列すなわち１００００
個のアモルファスカーボン堆積物を形成した。また、ア
モルファスカーボン堆積物の間隔は５０ｎｍとした。作
製されたアモルファスカーボン堆積物は直径約５０ｎ
ｍ、高さ約１００ｎｍであった。このニッケル板上に、
アモルファスカーボンの線状構造体を形成したものをパ
ターンドメディア用基板の成型時のスタンパとした。On the surface-polished nickel plate, in the same manner as in Example 1, 100 rows × 100 columns, that is, 10000
A number of amorphous carbon deposits were formed. The interval between the amorphous carbon deposits was 50 nm. The prepared amorphous carbon deposit has a diameter of about 50n.
m, and the height was about 100 nm. On this nickel plate,
What formed the linear structure of amorphous carbon was used as a stamper at the time of molding of the substrate for patterned media.
【００４７】本発明による手法との比較のため、従来の
光ディスク等で用いられている手法によってもスタンパ
を作製した。For comparison with the method according to the present invention, a stamper was also manufactured by the method used in the conventional optical disk and the like.
【００４８】図１０は、従来手法によるスタンパ作製の
模式図を示す。まず、図１０（ａ）の平滑なガラス基板
９に、図１０（ｂ）に示すようにレジスト１０を塗布し
た。ここで、図１０（ｃ）に示すように、形成したい穴
のパターンでレジストを除去した。光記録の場合にはレ
ーザー光を用いることが多いが、本実施例ではパターン
が小さいため、電子線リソグラフィー法により所望の位
置でレジストを除去した。FIG. 10 is a schematic view of the stamper production by the conventional method. First, a resist 10 was applied to the smooth glass substrate 9 shown in FIG. 10A as shown in FIG. 10B. Here, as shown in FIG. 10C, the resist was removed in a pattern of holes to be formed. In the case of optical recording, laser light is often used, but since the pattern is small in this embodiment, the resist was removed at a desired position by electron beam lithography.
【００４９】次いで、図１０（ｄ）に示すように、この
ガラス基板９およびレジスト１０上に導電性を付与する
ためのニッケル膜１１を形成した。ニッケル膜の形成
は、スパッタリング法で、次いで比較的厚い膜を得るた
めメッキ法により行い、メッキ膜厚を約０．３ｍｍとし
た。次いで、図１０（ｅ）に示すように、形成されたニ
ッケル膜１１をガラス基板９とレジスト１０から剥離
し、成型用スタンパとした。このような方法により作製
されたスタンパは、上記の本実施例により作製されたス
タンパとほぼ同じ形状を有するよう作製された。すなわ
ち、５０ｎｍ間隔で並べられた、１００行×１００列の
１００００個の突起を有し、それぞれの突起は直径約５
０ｎｍ、高さ約１００ｎｍの大きさを持つスタンパが作
製された。Then, as shown in FIG. 10D, a nickel film 11 for imparting conductivity is formed on the glass substrate 9 and the resist 10. The nickel film was formed by the sputtering method and then by the plating method to obtain a relatively thick film, and the plating film thickness was set to about 0.3 mm. Then, as shown in FIG. 10E, the formed nickel film 11 was peeled from the glass substrate 9 and the resist 10 to obtain a molding stamper. The stamper manufactured by such a method was manufactured so as to have substantially the same shape as the stamper manufactured by the above-mentioned embodiment. That is, there are 10000 protrusions arranged in 100 rows and 100 columns arranged at intervals of 50 nm, and each protrusion has a diameter of about 5 mm.
A stamper having a size of 0 nm and a height of about 100 nm was manufactured.
【００５０】これらのスタンパを用い、ポリカーボネー
ト基板の射出成型を試みた。射出成型は、樹脂温度を３
２０℃、金型温度を１１５℃、射出速度を１２０ｍｍ／
ｓ、型締め圧力を７５ｋｇ／ｃｍ２として行った。An injection molding of a polycarbonate substrate was attempted using these stampers. Injection molding requires a resin temperature of 3
20 ℃, mold temperature 115 ℃, injection speed 120mm /
s and the mold clamping pressure was 75 kg / cm 2 .
【００５１】上記のような条件下で、両スタンパを用い
てそれぞれ２００枚のポリカーボネート基板の成型を行
った。成型枚数が２００枚未満でスタンパに樹脂が付着
した場合には溶媒洗浄を施し、成型を続けた。その結
果、従来法によるスタンパにおける離型率が０％であ
り、全てのディスクにおいて、スタンパとディスク基板
の付着が認められた。これに対し、本発明による方法で
は離型率が７３％となり、その効果が確認された。ま
た、本実施例に示す手法により作製され、良好に離型し
たポリカーボネートディスクを走査型電子顕微鏡で観察
したところ、所望の位置に穴が形成されていることが確
認された。Under the above conditions, 200 polycarbonate substrates were molded using both stampers. When the number of moldings was less than 200 and the resin adhered to the stamper, solvent washing was performed and molding was continued. As a result, the release rate of the stamper according to the conventional method was 0%, and adhesion of the stamper and the disc substrate was recognized in all the discs. On the other hand, in the method according to the present invention, the release rate was 73%, and its effect was confirmed. Further, when a polycarbonate disk produced by the method shown in this example and released well was observed with a scanning electron microscope, it was confirmed that holes were formed at desired positions.
【００５２】（実施例４）本実施例では、図８（ｄ）に
示す実施例２の磁気記録媒体用基板の製造用部材と全く
同様にして作製されたカーボンナノチューブアレイを微
小電子源として用い、炭素系堆積物を形成した例につい
て説明する。図４に示す電子ビーム装置の真空容器内に
おいて、基材に対向させて、実施例２で作製したものと
全く同様の製造用部材（その表面と垂直にカーボンナノ
チューブが多数成長したシリコンウエハ）を配置した、
そして、対向して配置された製造用部材のカーボンナノ
チューブに１００Ｖの電圧を印加し、０．２５Ａの電流
を得た。(Embodiment 4) In this embodiment, a carbon nanotube array manufactured in exactly the same manner as the member for manufacturing the magnetic recording medium substrate of Embodiment 2 shown in FIG. An example of forming a carbon-based deposit will be described. In the vacuum container of the electron beam apparatus shown in FIG. 4, a manufacturing member (a silicon wafer having a large number of carbon nanotubes grown perpendicularly to its surface) facing the base material and having exactly the same structure as that manufactured in Example 2 was prepared. Placed
Then, a voltage of 100 V was applied to the carbon nanotubes of the manufacturing member arranged facing each other, and a current of 0.25 A was obtained.
【００５３】ここで、電子ビームの照射時間は１０分と
し、電子源とアモルファスカーボン堆積用基板の距離は
３０μｍとした。その結果、実施例１と同様に、基材に
線状炭素系堆積物を一括形成することができた。堆積物
の長さは約８０ｎｍ、直径は約３５ｎｍであった。ま
た、この製造用部材を用いて実施例１と全く同一の条件
下でポリカーボネート基板に穴あけ加工を施したとこ
ろ、ポリカーボネート基板の走査型電子顕微鏡観察によ
り、所望の位置に穴が形成されていることが確認され
た。Here, the irradiation time of the electron beam was 10 minutes, and the distance between the electron source and the amorphous carbon deposition substrate was 30 μm. As a result, similar to Example 1, it was possible to collectively form the linear carbon-based deposit on the base material. The length of the deposit was about 80 nm and the diameter was about 35 nm. Further, when using this manufacturing member, a polycarbonate substrate was perforated under exactly the same conditions as in Example 1, and a hole was formed at a desired position by observing the polycarbonate substrate with a scanning electron microscope. Was confirmed.
【００５４】[0054]
【発明の効果】以上説明したように、本発明によれば、
磁気記録媒体用の微細かつ任意の位置に多数存在する穴
を有する基板を、より高スループットで作製できる。従
って、本発明に係る方法は、ますます進展する磁気ディ
スク媒体の高記録密度化に対応する媒体の作製方法とし
て、工業的価値が大きいといえる。As described above, according to the present invention,
It is possible to manufacture a substrate for a magnetic recording medium, which has fine holes and a large number of holes at arbitrary positions, with a higher throughput. Therefore, it can be said that the method according to the present invention has a great industrial value as a method for producing a medium that can cope with the increasing recording density of a magnetic disk medium that is developing more and more.
【図１】一般的なパターンドメディアの製造方法を示す
模式図である。FIG. 1 is a schematic view showing a method for manufacturing a general patterned medium.
【図２】本発明の第１実施形態による磁気記録媒体用基
板の製造用部材を作製するための電子ビーム装置の構成
図である。FIG. 2 is a configuration diagram of an electron beam apparatus for manufacturing a member for manufacturing a substrate for a magnetic recording medium according to the first embodiment of the present invention.
【図３】本発明の第２実施形態による磁気記録媒体用基
板の製造用部材を作製するためのプラズマＣＶＤ装置の
構成図である。FIG. 3 is a configuration diagram of a plasma CVD apparatus for manufacturing a member for manufacturing a substrate for a magnetic recording medium according to a second embodiment of the present invention.
【図４】本発明の第４実施形態による磁気記録媒体用基
板の製造用部材を作製するための電子ビーム装置の構成
図である。FIG. 4 is a configuration diagram of an electron beam apparatus for manufacturing a member for manufacturing a substrate for a magnetic recording medium according to a fourth embodiment of the present invention.
【図５】本発明の実施例１によるパターンドメディア用
基板の製造用部材の作製方法を示す模式図である。FIG. 5 is a schematic diagram showing a method for manufacturing a member for manufacturing a substrate for patterned media according to Example 1 of the present invention.
【図６】本発明の実施例１によるパターンドメディア用
基板の製造方法を示す模式図である。FIG. 6 is a schematic view showing a method for manufacturing a substrate for patterned media according to Example 1 of the present invention.
【図７】本発明の実施例１に記載された方法によりパタ
ーンドメディア用基板に形成した穴の透過型電子顕微鏡
による断面写真のトレース像を示す図である。FIG. 7 is a diagram showing a trace image of a cross-sectional photograph taken by a transmission electron microscope of a hole formed in a substrate for patterned media by the method described in Example 1 of the present invention.
【図８】本発明の実施例２によるパターンドメディア用
基板の製造用部材の作製方法を示す模式図である。FIG. 8 is a schematic diagram showing a method for manufacturing a member for manufacturing a substrate for patterned media according to Example 2 of the present invention.
【図９】本発明の実施例２に記載された方法により製造
されたパターンドメディア用基板に形成された穴の透過
型電子顕微鏡による断面写真のトレース像である。FIG. 9 is a trace image of a cross-sectional photograph taken by a transmission electron microscope of a hole formed in a substrate for patterned media manufactured by the method described in Example 2 of the present invention.
【図１０】従来の光ディスク用基板の作製法を説明した
模式図である。FIG. 10 is a schematic diagram illustrating a method for manufacturing a conventional optical disk substrate.
１ 非磁性基板 ２ 磁性体 ３ 電子ビーム ４ 炭素系堆積物 ５ 基材 ６ 製造用部材 ７ 触媒金属 ８ カーボンナノチューブ ９ ガラス基板 １０ レジスト １１ ニッケル膜 ２０１ 電子銃 ２０２ コンデンサレンズ ２０３ 対物レンズ ２０４ 基材 ２０５ 加速レンズ（アノード電極） ２０６ 真空チャンバー ３０１ 石英管 ３０２ 導波管 ３０３ 真空ポンプ ３０４ 直流電源 ３０５ 電極 ３０６ 基材 ３０７ マイクロ波電源 ３０８ ガス導入口 ４０１ 直流電源 ４０２ 基材 ４０３ 真空容器 ４０４ 電子源 1 Non-magnetic substrate 2 magnetic material 3 electron beam 4 Carbon deposits 5 base materials 6 Manufacturing members 7 catalytic metal 8 carbon nanotubes 9 glass substrates 10 Resist 11 Nickel film 201 electron gun 202 condenser lens 203 Objective lens 204 base material 205 Accelerator lens (anode electrode) 206 vacuum chamber 301 quartz tube 302 Waveguide 303 vacuum pump 304 DC power supply 305 electrode 306 base material 307 microwave power supply 308 gas inlet 401 DC power supply 402 base material 403 vacuum container 404 electron source
Claims (11)
だ磁気記録媒体に用いられる磁気記録媒体用基板の製造
方法であって、炭素系材料からなる複数の線状構造体が
平滑基材上に該平滑基材と垂直方向に形成された製造用
部材を、平滑プラスチック基板に押し付けて該平滑プラ
スチック基板に前記穴を形成することにより製造するこ
とを特徴とする磁気記録媒体用基板の製造方法。1. A method of manufacturing a magnetic recording medium substrate used in a magnetic recording medium, wherein a magnetic material is embedded in a hole formed in the substrate, wherein a plurality of linear structures made of a carbon-based material are smooth base materials. A magnetic recording medium substrate manufactured by pressing a manufacturing member formed in a direction perpendicular to the smooth base material onto a smooth plastic substrate to form the holes in the smooth plastic substrate. Method.
だ磁気記録媒体に用いられる磁気記録媒体用基板の製造
方法であって、炭素系材料からなる複数の線状構造体が
平滑基材上に該平滑基材と垂直方向に形成された製造用
部材をスタンパとして、成型法により製造することを特
徴とする磁気記録媒体用基板の製造方法。2. A method of manufacturing a magnetic recording medium substrate used in a magnetic recording medium, wherein a magnetic material is embedded in a hole formed in a substrate, wherein a plurality of linear structures made of a carbon-based material are smooth base materials. A method for manufacturing a substrate for a magnetic recording medium, which is manufactured by a molding method using as a stamper a manufacturing member formed on the upper surface in a direction perpendicular to the smooth base material.
製造方法において、前記磁気記録媒体用基板はプラスチ
ックまたはガラスからなることを特徴とする磁気記録媒
体用基板の製造方法。3. The method for manufacturing a magnetic recording medium substrate according to claim 2, wherein the magnetic recording medium substrate is made of plastic or glass.
用基板の製造用部材の作製方法であって、 前記平滑基材に真空中で電子線を照射して前記炭素系材
料を堆積させて前記線状構造体を形成することを特徴と
する磁気記録媒体用基板の製造用部材の作製方法。4. The method for manufacturing a member for manufacturing a substrate for a magnetic recording medium according to claim 1, wherein the smooth base material is irradiated with an electron beam in vacuum to deposit the carbon-based material. A method for manufacturing a member for manufacturing a substrate for a magnetic recording medium, characterized in that the linear structure is formed.
用基板の製造用部材の作製方法であって、 前記平滑基材に穴を形成し、 該形成された穴に触媒金属を埋め込み、 該埋め込まれた触媒金属からカーボンナノチューブを成
長させて前記線状構造体を形成することを特徴とする磁
気記録媒体用基板の製造用部材の作製方法。5. A method for manufacturing a member for manufacturing a substrate for a magnetic recording medium according to claim 1 or 2, wherein a hole is formed in the smooth base material, and a catalyst metal is embedded in the formed hole. A method for producing a member for manufacturing a substrate for a magnetic recording medium, which comprises forming carbon nanotubes from the embedded catalytic metal to form the linear structure.
用基板の製造用部材の作製方法であって、 前記平滑基材に対向させて、請求項５に記載の磁気記録
媒体用基板の製造用部材の作製方法により作製された製
造用部材を配置し、 真空中で前記カーボンナノチューブに電圧をかけて前記
対向基材に向けて電子線を放出させ、前記平滑基材に前
記炭素系材料を堆積させることにより前記線状構造体を
形成することを特徴とする磁気記録媒体用基板の製造用
部材の作製方法。6. The method for manufacturing a member for manufacturing a substrate for a magnetic recording medium according to claim 1 or 2, wherein the substrate for a magnetic recording medium according to claim 5 is opposed to the smooth base material. The manufacturing member manufactured by the manufacturing member manufacturing method is arranged, a voltage is applied to the carbon nanotubes in a vacuum to emit an electron beam toward the facing base material, and the carbon-based material is applied to the smooth base material. A method for producing a member for manufacturing a substrate for a magnetic recording medium, characterized in that the linear structure is formed by depositing.
だ磁気記録媒体に用いられる磁気記録媒体用基板の製造
用部材であって、炭素系材料からなる複数の線状構造体
が平滑基材上に該平滑基材と垂直方向に形成されている
ことを特徴とする磁気記録媒体用基板の製造用部材。7. A member for manufacturing a magnetic recording medium substrate used in a magnetic recording medium having a magnetic material embedded in a hole formed in the substrate, wherein a plurality of linear structures made of a carbon-based material are smooth bases. A member for manufacturing a substrate for a magnetic recording medium, which is formed on a material in a direction perpendicular to the smooth base material.
製造用部材において、前記磁気記録媒体用基板はプラス
チックまたはガラスからなることを特徴とする磁気記録
媒体用基板の製造用部材。8. The member for manufacturing a substrate for a magnetic recording medium according to claim 7, wherein the substrate for a magnetic recording medium is made of plastic or glass.
用基板の製造用部材において、前記線状構造体は、真空
中での前記平滑基材に対する電子線の照射により堆積し
た炭素系材料であることを特徴とする磁気記録媒体用基
板の製造用部材。9. The member for manufacturing a substrate for a magnetic recording medium according to claim 7, wherein the linear structure is a carbon-based material deposited by irradiating the smooth base material with an electron beam in a vacuum. A member for manufacturing a substrate for a magnetic recording medium, which is
体用基板の製造用部材において、前記線状構造体は、前
記平滑基材に形成された穴に触媒金属が埋め込まれた触
媒金属から成長させたカーボンナノチューブであること
を特徴とする磁気記録媒体用基板の製造用部材。10. The member for manufacturing a substrate for a magnetic recording medium according to claim 7, wherein the linear structure is made of a catalytic metal having a catalytic metal embedded in a hole formed in the smooth base material. A member for manufacturing a substrate for a magnetic recording medium, which is a grown carbon nanotube.
体用基板の製造用部材において、前記線状構造体は、前
記平滑基材に対向させて配置された請求項１０に記載の
磁気記録媒体用基板の製造用部材のカーボンナノチュー
ブに真空中で電圧をかけて放出された電子線により、前
記平滑基材に堆積された炭素系材料であることを特徴と
する磁気記録媒体用基板の製造用部材。11. The magnetic recording medium manufacturing member according to claim 7, wherein the linear structure is arranged so as to face the smooth base material. Manufacturing of a substrate for a magnetic recording medium, which is a carbon-based material deposited on the smooth base material by an electron beam emitted by applying a voltage to a carbon nanotube of a member for manufacturing a medium substrate in vacuum Parts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002000924A JP2003203333A (en) | 2002-01-07 | 2002-01-07 | Method for manufacturing substrate for magnetic recording medium, method for manufacturing member for manufacturing the substrate, and member for manufacturing the substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002000924A JP2003203333A (en) | 2002-01-07 | 2002-01-07 | Method for manufacturing substrate for magnetic recording medium, method for manufacturing member for manufacturing the substrate, and member for manufacturing the substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003203333A true JP2003203333A (en) | 2003-07-18 |
Family
ID=27641168
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|---|---|---|---|
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| Country | Link |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100466740B1 (en) * | 2002-09-23 | 2005-01-15 | 강신일 | Fabrication of Patterned Media Using Ultra-Precision Injection Molding |
| US7204915B2 (en) | 2003-12-26 | 2007-04-17 | Fujitsu Limited | Patterned medium, method for fabricating same and method for evaluating same |
| US7296514B2 (en) * | 2003-08-26 | 2007-11-20 | Tdk Corporation | Convex/concave pattern-forming stamp, convex/concave pattern-forming method and magnetic recording medium |
-
2002
- 2002-01-07 JP JP2002000924A patent/JP2003203333A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100466740B1 (en) * | 2002-09-23 | 2005-01-15 | 강신일 | Fabrication of Patterned Media Using Ultra-Precision Injection Molding |
| US7296514B2 (en) * | 2003-08-26 | 2007-11-20 | Tdk Corporation | Convex/concave pattern-forming stamp, convex/concave pattern-forming method and magnetic recording medium |
| US7204915B2 (en) | 2003-12-26 | 2007-04-17 | Fujitsu Limited | Patterned medium, method for fabricating same and method for evaluating same |
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