JP2003178857A - Oven - Google Patents
OvenInfo
- Publication number
- JP2003178857A JP2003178857A JP2001376141A JP2001376141A JP2003178857A JP 2003178857 A JP2003178857 A JP 2003178857A JP 2001376141 A JP2001376141 A JP 2001376141A JP 2001376141 A JP2001376141 A JP 2001376141A JP 2003178857 A JP2003178857 A JP 2003178857A
- Authority
- JP
- Japan
- Prior art keywords
- quartz tube
- heater
- furnace chamber
- tube heater
- oven
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B30/00—Energy efficient heating, ventilation or air conditioning [HVAC]
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、乾燥装置、低温酸
化膜生成装置、ガラス基板のデガス洗浄装置、有機膜乾
燥装置、半導体部品の熱処理装置、還元反応炉、真空乾
燥炉などに用いるオーブンに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an oven used for a drying device, a low temperature oxide film forming device, a glass substrate degas cleaning device, an organic film drying device, a semiconductor component heat treatment device, a reduction reaction furnace, a vacuum drying furnace and the like. .
【０００２】[0002]
【従来の技術】従来、例えば電子回路基板を乾燥させる
ために炉室内にシーズヒータなどのヒータを配置したオ
ーブンが用いられているが、近年の基板の大型化や基板
処理方法の多様化に伴い、炉室内の雰囲気を所定の雰囲
気にすることによりオーブンを反応炉として利用するこ
とが多くなっている。2. Description of the Related Art Conventionally, an oven in which a heater such as a sheathed heater is arranged in a furnace chamber has been used to dry an electronic circuit board, for example, but with the recent enlargement of the board and diversification of the board processing method. By setting the atmosphere in the furnace chamber to a predetermined atmosphere, the oven is often used as a reaction furnace.
【０００３】[0003]
【発明が解決しようとする課題】しかし、シーズヒータ
などを用いる従来のオーブンでは所定の雰囲気中で高温
になるとヒータの表面が酸化されたり、還元されたりし
てヒータが劣化し易くなり、また、ヒータからの金属イ
オンガスが放出される脱ガス現象により雰囲気が壊さ
れ、例えば電子部品に不純物が混入するコンタミの問題
が発生するおそれがあるなどの問題がある。However, in a conventional oven using a sheathed heater or the like, when the temperature becomes high in a predetermined atmosphere, the surface of the heater is oxidized or reduced, and the heater is easily deteriorated. There is a problem that the atmosphere is destroyed by the degassing phenomenon in which the metal ion gas is released from the heater, and there is a risk of, for example, a problem of contamination in which impurities are mixed into electronic components.
【０００４】脱ガス現象などによる炉内雰囲気の汚染を
防止するため、ヒータを炉壁内に埋め込んだり、炉壁の
外側に配置したりする場合には、炉壁を加熱し、炉壁の
輻射熱で処理物を加熱することになるので、加熱開始後
処理物の温度が所定の温度に上昇するまでの時間が長
く、温度むらが多い。また、加熱終了後も処理物から熱
が炉壁に輻射され、更に炉壁から周囲の待機中に熱が輻
射されることにより処理物が冷却されるので、処理物が
所定の温度以下に冷却されるまでに長時間かかる。In order to prevent contamination of the atmosphere in the furnace due to degassing phenomenon, when the heater is embedded in the furnace wall or arranged outside the furnace wall, the furnace wall is heated and the radiant heat of the furnace wall is radiated. Since the processed product is heated in step 1, it takes a long time until the temperature of the processed product rises to a predetermined temperature after the start of heating, and there are many temperature irregularities. Also, after the heating is finished, heat is radiated from the processed material to the furnace wall, and further heat is radiated from the furnace wall while waiting for the surroundings to cool the processed material, so that the processed material is cooled to a predetermined temperature or lower. It takes a long time to be done.
【０００５】本発明は、上記した従来の問題点に鑑みな
されたものにして、短時間で処理物の温度を所定値に上
昇させることができ、しかも、ヒータからの脱ガスなど
による炉内雰囲気の汚染が生じないオーブンを提供する
ことを目的とする。The present invention has been made in view of the above-mentioned problems of the prior art, and can raise the temperature of the object to be processed to a predetermined value in a short time, and further, the atmosphere in the furnace due to degassing from the heater or the like. It is an object of the present invention to provide an oven which is free from the contamination of.
【０００６】[0006]
【課題を解決するための手段】この目的を達成するた
め、本発明に係るオーブンは密閉される炉室内に配置さ
れる石英管ヒータを備え、前記炉室の一側壁に前記石英
管ヒータを端子部が炉室外に位置するように片持ち状に
支持させてあることを特徴とする。To achieve this object, an oven according to the present invention comprises a quartz tube heater arranged in a closed furnace chamber, and the quartz tube heater is provided on one side wall of the furnace chamber as a terminal. It is characterized in that it is supported in a cantilevered manner so that the part is located outside the furnace chamber.
【０００７】これにより、処理物は炉室内に配置された
石英管ヒータにより直接加熱されるので、短時間で所定
の処理温度まで加熱されるという作用が得られる。As a result, the object to be processed is directly heated by the quartz tube heater arranged in the furnace chamber, so that the object to be processed can be heated to a predetermined processing temperature in a short time.
【０００８】また、ヒータの劣化により生じる塵や脱ガ
スにより生じる金属イオンを含むガスは石英管内に封じ
込められ、炉室内に拡散することはないという作用を得
ることができる。Further, it is possible to obtain the effect that the gas containing the metal ions generated by the dust and the degas generated by the deterioration of the heater is enclosed in the quartz tube and does not diffuse into the furnace chamber.
【０００９】更に、特に劣化や脱ガス現象が生じ易い端
子部は炉室外に位置させているので、この端子部の劣化
や脱ガス現象により炉室内の雰囲気が汚染されるおそれ
は全くないという作用を得ることができる。Further, since the terminal portion which is particularly susceptible to deterioration and degassing phenomenon is located outside the furnace chamber, there is no possibility that the atmosphere inside the furnace chamber is contaminated by the deterioration or degassing phenomenon of the terminal portion. Can be obtained.
【００１０】そして、これらの作用により、炉室内がヒ
ータの劣化により生じた塵や脱ガス現象により生じたガ
スで汚染されることがなくなり、炉室内の雰囲気を所定
の雰囲気に確実に保持できるという作用が得られるので
ある。Due to these actions, the inside of the furnace chamber is prevented from being contaminated by dust generated by the deterioration of the heater or gas generated by the degassing phenomenon, and the atmosphere in the furnace chamber can be reliably maintained at a predetermined atmosphere. The action is obtained.
【００１１】加えて、本発明によれば、石英管ヒータを
炉室の一側壁に片持ち状に支持させることにより、石英
管の熱膨張による熱応力で石英管が破損することを防止
することができるという作用も得ることができる。In addition, according to the present invention, by supporting the quartz tube heater on one side wall of the furnace chamber in a cantilever manner, it is possible to prevent the quartz tube from being damaged by thermal stress due to thermal expansion of the quartz tube. It is also possible to obtain the effect of being able to perform.
【００１２】ところで、本発明おいて、石英管ヒータが
発生する熱線を炉室中央部に反射する反射体を設ける
と、熱線を処理物に集中させて効率よく処理物を加熱す
ることができるので、加熱開始後、短時間で処理物の温
度を所定の温度に昇温させることができると共に、炉壁
を加熱しないので、加熱停止後、短時間で炉室温度を常
温に冷却することができ、処理物からの輻射熱量が増大
し、処理物を短時間で所定の温度以下に冷却することが
できるという作用を得ることができる。By the way, in the present invention, by providing a reflector for reflecting the heat rays generated by the quartz tube heater in the center of the furnace chamber, the heat rays can be concentrated on the treatment object and the treatment object can be heated efficiently. The temperature of the processed material can be raised to a predetermined temperature in a short time after the start of heating, and since the furnace wall is not heated, the furnace chamber temperature can be cooled to room temperature in a short time after the heating is stopped. Therefore, the amount of radiant heat from the processed product is increased, and the processed product can be cooled to a predetermined temperature or lower in a short time.
【００１３】また、この反射体により、熱線を均等に分
散させて処理物に照射させることにより、処理物の温度
分布を平均にすることができ、処理物を均等に熱処理す
ることができるという作用が得られる。Further, by radiating heat rays to the object to be processed by the reflector, the temperature distribution of the object to be processed can be averaged, and the object can be uniformly heat-treated. Is obtained.
【００１４】ここで、石英管ヒータと反射体とが一体的
に前記炉室の一面から炉室内に挿抜可能に設けられる
と、石英管ヒータ及び反射面を一体的に炉外に抜き取っ
て点検や整備ができる上、石英管ヒータの交換が容易に
なるという作用を得ることができる。Here, when the quartz tube heater and the reflector are integrally provided so as to be insertable into and removable from the one surface of the furnace chamber, the quartz tube heater and the reflecting surface are integrally extracted outside the furnace for inspection. In addition to maintenance, it is possible to obtain an effect that replacement of the quartz tube heater is easy.
【００１５】また、本発明において、石英管ヒータがセ
ラミックヒータとこれを覆う石英管とを備えるものであ
る場合、ヒータが遠赤外線を発し、この遠赤外線が石英
管を透過して処理物に照射されるので、加熱開始後、一
層短時間で処理物の温度を所定の温度に昇温させること
ができると共に、加熱停止後、一層短時間で炉室温度を
常温に冷却することができるという作用を得ることがで
きる。In the present invention, when the quartz tube heater includes a ceramic heater and a quartz tube covering the ceramic heater, the heater emits far infrared rays, and the far infrared rays pass through the quartz tube and irradiate the object to be processed. Therefore, it is possible to raise the temperature of the object to be treated to a predetermined temperature in a shorter time after the start of heating, and to cool the furnace chamber temperature to room temperature in a shorter time after the heating is stopped. Can be obtained.
【００１６】[0016]
【発明の実施の態様】本発明の一実施形態に係るオーブ
ンを図面に基づいて具体的に説明すれば、以下の通りで
ある。BEST MODE FOR CARRYING OUT THE INVENTION An oven according to an embodiment of the present invention will be described in detail with reference to the drawings.
【００１７】図１は本発明の一実施形態に係るオーブン
の縦断側面図であり、図２はその半断背面図であり、こ
の図１に示すように、このオーブン１の炉体２は前後が
開放された矩形筒型の胴体３と、この胴体３の後面を閉
塞する後壁４とを備え、胴体３の前面は例えば昇降扉５
により開閉される。FIG. 1 is a vertical sectional side view of an oven according to one embodiment of the present invention, and FIG. 2 is a half sectional rear view thereof. As shown in FIG. It has a rectangular tubular body 3 having an open body and a rear wall 4 that closes the rear surface of the body 3.
It is opened and closed by.
【００１８】図には示していないが、これら胴体３、後
壁４及び昇降扉５は必要に応じて内部に形成した冷却水
路あるいはその外側に配置した冷却パイプに冷却液、例
えば水を循環させて冷却するようにしてもよい。Although not shown in the figure, the body 3, the rear wall 4 and the lift door 5 are arranged to circulate a cooling liquid, for example, water in a cooling water passage formed inside or a cooling pipe arranged outside thereof as required. You may make it cool.
【００１９】また、炉体２の内部に形成される炉室６に
は真空ポンプが接続され、必要に応じて炉室６内を真空
にできるようにしている。A vacuum pump is connected to the furnace chamber 6 formed inside the furnace body 2 so that the furnace chamber 6 can be evacuated if necessary.
【００２０】炉室６の内部には胴体３の内面にそって前
後に伸びる例えば８組のヒータユニット７が配置され、
前記後壁４にはこのヒータユニット８を挿通する例えば
８口の挿通孔８が形成される。Inside the furnace chamber 6, for example, eight sets of heater units 7 extending in the front-back direction along the inner surface of the body 3 are arranged.
The rear wall 4 has, for example, eight insertion holes 8 through which the heater unit 8 is inserted.
【００２１】各ヒータユニット８は、後壁４の外面にネ
ジ止めされる基部９とこの基部９に挿通される石英管ヒ
ータ１０と、反射体１１と、端子部カバー１２とを備
え、石英管ヒータ１０は一端が閉塞された石英管の内部
にその全長にわたってアルミナヒータからなるセラミッ
クヒータを配置したものであり、端子部１３が炉室６外
に位置するように基部９に固定される。また、反射体１
１は石英管ヒータ１０が輻射する熱線（赤外線）を炉室
６の中央に反射できる形状の反射面１４を備える。Each heater unit 8 includes a base 9 screwed to the outer surface of the rear wall 4, a quartz tube heater 10 inserted into the base 9, a reflector 11 and a terminal cover 12, and a quartz tube The heater 10 is formed by disposing a ceramic heater made of an alumina heater over the entire length inside a quartz tube whose one end is closed, and is fixed to the base 9 so that the terminal portion 13 is located outside the furnace chamber 6. Also, the reflector 1
Reference numeral 1 includes a reflecting surface 14 having a shape capable of reflecting the heat rays (infrared rays) radiated by the quartz tube heater 10 to the center of the furnace chamber 6.
【００２２】なお、前記後壁４の前面周囲部には例えば
Ｏリングからなる封止部材１５が埋め込まれ、胴体３の
後端面と後壁４の前面とでこの封止部材１５を挟圧する
ようにして多数のクランプ１６で後壁４を胴体３の後面
に気密状に締付けている。A sealing member 15 made of, for example, an O-ring is embedded around the front surface of the rear wall 4 so that the rear end surface of the body 3 and the front surface of the rear wall 4 sandwich the sealing member 15. Then, the rear wall 4 is airtightly fastened to the rear surface of the body 3 by a large number of clamps 16.
【００２３】また、図面には示していないが、炉体２に
は必要に応じて温度センサ、ガス成分センサなどが取付
られる。Although not shown in the drawing, a temperature sensor, a gas component sensor, etc. are attached to the furnace body 2 as needed.
【００２４】さて、このように構成したオーブン１によ
れば、処理物を炉室６内に収納し、昇降扉５を閉じてか
ら、真空ポンプを作動させて炉室６内を真空雰囲気に
し、更にこの後、石英管ヒータ１０に通電して加熱を開
始する。According to the oven 1 having such a configuration, the processed material is housed in the furnace chamber 6, the elevating door 5 is closed, and then the vacuum pump is operated to create a vacuum atmosphere in the furnace chamber 6, After this, the quartz tube heater 10 is energized to start heating.
【００２５】この石英管ヒータ１０は炉室６内に配置さ
れているので、処理物はこの石英管ヒータ１０が輻射す
る遠赤外線で直接に加熱されることになり、短時間で常
温から所定の処理温度に加熱される。Since the quartz tube heater 10 is arranged in the furnace chamber 6, the processed material is directly heated by the far infrared rays radiated by the quartz tube heater 10, and the temperature is kept within a predetermined period from room temperature to a predetermined temperature. It is heated to the processing temperature.
【００２６】石英管ヒータ１０から炉壁側に照射される
遠赤外線は、反射面１４で炉室６の中央側に反射される
ので、処理物は多量の遠赤外線により加熱され、一層短
時間で所定の処理温度に加熱される。Far infrared rays radiated from the quartz tube heater 10 to the furnace wall side are reflected by the reflecting surface 14 toward the center side of the furnace chamber 6, so that a large amount of far infrared rays heats the object to be treated, and the far infrared rays are further shortened. It is heated to a predetermined processing temperature.
【００２７】図３は１０−１Ｐａの真空雰囲気中で石英
管ヒータ１０に通電した場合の前記オーブン内の複数測
定点における炉内温度変化を示す処理温度特性図であ
る。石英管ヒータ１０への通電は炉体温度が１５０℃に
なるように設定した電力で制御を行っている。例えば、
この図３に示すように、常温から加熱を開始した後、３
０数分後には１５０℃前後に炉内温度を高めることがで
き、８０分後に１５０℃に安定させることができる。FIG. 3 is a processing temperature characteristic diagram showing changes in the furnace temperature at a plurality of measurement points in the oven when the quartz tube heater 10 is energized in a vacuum atmosphere of 10 −1 Pa. The energization of the quartz tube heater 10 is controlled by the electric power set so that the furnace temperature becomes 150 ° C. For example,
As shown in FIG. 3, after starting heating from room temperature, 3
After a few minutes, the temperature inside the furnace can be raised to around 150 ° C, and after 80 minutes, it can be stabilized at 150 ° C.
【００２８】しかも、反射面１４により石英管ヒータ１
０が放射する遠赤外線が炉室６内に均等に分散されるの
で、炉室６内の気温をすこぶる高度に平均化することが
でき、例えば温度偏差を例えば±１〜２℃以内にするこ
とができ、処理物を非常に均等に処理することができ、
不良品の発生率を低くできる上、製品の品質に対する信
頼性を著しく高めることができる。Moreover, the quartz tube heater 1 is provided by the reflecting surface 14.
Since the far infrared rays emitted by 0 are evenly distributed in the furnace chamber 6, the temperature in the furnace chamber 6 can be averaged to a very high level, and the temperature deviation can be, for example, within ± 1 to 2 ° C. Can process the processed material very evenly,
The incidence of defective products can be reduced, and the reliability of product quality can be significantly improved.
【００２９】これに対して、炉壁は石英管ヒータ１０の
遠赤外線で直接加熱することはなく、石英管ヒータ１０
あるいは処理物から熱を伝導された炉室６内の雰囲気か
ら伝導される熱により加熱されるに過ぎない。この炉壁
に伝導される熱量は石英管ヒータ１０から輻射される遠
赤外線の全熱量に比べると各段に少ないので、炉壁の温
度は水冷などの特別の冷却が不要になる程度の低温にな
る。On the other hand, the furnace wall is not directly heated by the far infrared rays of the quartz tube heater 10, but the quartz tube heater 10 is used.
Alternatively, it is only heated by the heat conducted from the atmosphere in the furnace chamber 6 in which the heat is conducted from the processed material. Since the amount of heat conducted to the furnace wall is much smaller than the total amount of far infrared rays radiated from the quartz tube heater 10, the temperature of the furnace wall is set to such a low temperature that special cooling such as water cooling becomes unnecessary. Become.
【００３０】従って、処理終了後に石英管ヒータ１０に
よる加熱を停止した後、真空状態を解除し、外部とガス
パージすることで、炉体２が短時間で常温まで冷却され
るので、炉室６内の雰囲気も短時間で所定の温度、例え
ば処理物を取出す取出温度まで冷却される。そして、炉
内温度が低くなることにより処理物から炉室６内の雰囲
気への輻射熱量が多くなり、短時間で処理物を所定の温
度（取出温度）以下に冷却することができる。Therefore, after the heating by the quartz tube heater 10 is stopped after the processing is finished, the vacuum state is released and the gas is purged with the outside, so that the furnace body 2 is cooled to room temperature in a short time, so that the furnace chamber 6 is cooled. The atmosphere is also cooled to a predetermined temperature in a short time, for example, the temperature for taking out the processed material. Then, as the temperature in the furnace decreases, the amount of radiant heat from the processed material to the atmosphere in the furnace chamber 6 increases, and the processed material can be cooled to a predetermined temperature (extraction temperature) or lower in a short time.
【００３１】例えば図３に示すように、炉内温度が１５
０℃に安定してから更に６０分間にわたり１５０℃を維
持してから加熱を停止し、真空状態を解除し、外部とガ
スパージすると、加熱停止後６０分弱で炉室温度が約５
０℃程度になり、炉室６から処理物を取出すことができ
る。For example, as shown in FIG.
After stabilizing at 0 ° C, maintaining 150 ° C for 60 minutes and then stopping heating, releasing the vacuum state, and purging with gas from the outside, the furnace chamber temperature was about 5 minutes after heating stopped for about 60 minutes.
It becomes about 0 ° C., and the processed product can be taken out from the furnace chamber 6.
【００３２】しかも、石英管ヒータ１０を用いているの
で、その内部のセラミックヒータ（アルミナヒータ）が
劣化して塵を発生してもその塵は石英管内に封じ込めら
れるので、炉室６内に拡散するおそれはなく、また、セ
ラミックヒータの脱ガス現象により生じる金属イオンな
どを含んだガスも石英管内に封じ込められて炉室６内に
拡散するおそれはない。更に、劣化や脱ガス現象が生じ
易い端子部１３は炉室６外に配置されているので、端子
部１３の劣化により生じる塵や端子部１３の脱ガス現象
により生じるガスが炉室６内に拡散するおそれもない。
従って、ヒータの劣化や脱ガス現象によって炉室６内の
雰囲気が汚染されるおそれは全くない。In addition, since the quartz tube heater 10 is used, even if the ceramic heater (alumina heater) inside the quartz tube heater 10 deteriorates and dust is generated, the dust is confined in the quartz tube and therefore diffuses into the furnace chamber 6. Also, there is no risk of gas containing metal ions or the like generated by the degassing phenomenon of the ceramic heater being confined in the quartz tube and diffusing into the furnace chamber 6. Furthermore, since the terminal portion 13 that is apt to deteriorate or degas is disposed outside the furnace chamber 6, dust generated due to the deterioration of the terminal portion 13 and gas generated due to the degassing phenomenon of the terminal portion 13 are inside the furnace chamber 6. There is no danger of spreading.
Therefore, there is no possibility that the atmosphere in the furnace chamber 6 is contaminated due to the deterioration of the heater or the degassing phenomenon.
【００３３】また、翻って見れば、セラミックヒータは
石英管で被覆されることにより炉室６内の雰囲気から遮
断されているので、劣化し難くなり、寿命が長くなる。In addition, looking back, the ceramic heater is shielded from the atmosphere in the furnace chamber 6 by being covered with the quartz tube, so that it is less likely to deteriorate and the life is extended.
【００３４】ところで、この実施形態では、基部９と、
石英管ヒータ１０と、反射体１１とでヒータユニット８
を構成し、石英管ヒータ１０及び反射体１１を外から炉
室６内に差込んで基部９を後壁４に固定することにより
炉室６内の所定の位置に配置するようにしているので、
このヒータユニット８を取出すことにより簡単に石英管
ヒータ１０及び反射体１１を点検したり、処理中に付着
した副生物を石英管ヒータ１０や反射体１１から払拭す
るなどの整備をしたり、石英管ヒータ１０や反射体１１
を交換したりすることができる。By the way, in this embodiment, the base 9 and
A heater unit 8 including a quartz tube heater 10 and a reflector 11.
Since the quartz tube heater 10 and the reflector 11 are inserted into the furnace chamber 6 from the outside and the base portion 9 is fixed to the rear wall 4, it is arranged at a predetermined position in the furnace chamber 6. ,
By taking out the heater unit 8, the quartz tube heater 10 and the reflector 11 can be easily inspected, and by-products adhering to the quartz tube heater 10 and the reflector 11 during processing can be wiped off. Tube heater 10 and reflector 11
Can be replaced.
【００３５】また、石英管ヒータ１０を基部９を介して
後壁４に片持ち状に支持させているので、石英管が加熱
されても自由に熱膨張することができ、内部に生じる熱
応力で石英管が破損するおそれはない。Further, since the quartz tube heater 10 is supported on the rear wall 4 via the base portion 9 in a cantilever manner, even if the quartz tube is heated, the quartz tube heater 10 can freely thermally expand, and the thermal stress generated inside the quartz tube heater 10 can be increased. There is no danger of the quartz tube being damaged by.
【００３６】なお、この実施形態では、炉体２に真空ポ
ンプを付設して、炉室６内の雰囲気を真空にしている
が、更にアルゴンガスなどの不活性ガス供給装置を接続
して、炉室６内を不活性雰囲気にしたり、窒素ガス供給
装置を接続して炉室６内を窒素リッチ雰囲気にしたり、
蒸気供給装置などを接続して炉室６内を酸化雰囲気にし
たり、水素ガス供給装置などを接続して炉室６内を還元
雰囲気にすることが可能である。In this embodiment, a vacuum pump is attached to the furnace body 2 to make the atmosphere in the furnace chamber 6 a vacuum. However, an inert gas supply device such as argon gas is further connected to the furnace body 6 to To make the chamber 6 an inert atmosphere, or to connect a nitrogen gas supply device to make the furnace chamber 6 a nitrogen-rich atmosphere,
It is possible to connect a steam supply device or the like to make the inside of the furnace chamber 6 an oxidizing atmosphere, or connect a hydrogen gas supply device or the like to make the inside of the furnace chamber 6 a reducing atmosphere.
【００３７】更に、この実施形態では石英管ヒータ１０
の内部に配置されるヒータとしてアルミナヒータを用い
ているが、このヒータとしては、他のセラミックヒータ
を用いてもよく、シーズヒータなどのセラミックヒータ
以外のヒータを用いてもよい。Further, in this embodiment, the quartz tube heater 10 is used.
Although an alumina heater is used as the heater arranged inside the heater, other ceramic heaters may be used as this heater, or heaters other than ceramic heaters such as sheath heaters may be used.
【００３８】また、この実施形態では、石英管ヒータ１
０と共にユニット化される反射体１１を設けているが、
これに代えて、或いはこれと共に、図１及び図２に仮想
線で示すように、炉室６の内面に沿って全面的に展開す
る平板状の反射板１７を設けてもよい。Further, in this embodiment, the quartz tube heater 1 is used.
Although the reflector 11 which is unitized with 0 is provided,
Instead of this, or in addition to this, as shown in phantom lines in FIGS. 1 and 2, a flat plate-shaped reflecting plate 17 that is entirely developed along the inner surface of the furnace chamber 6 may be provided.
【００３９】[0039]
【発明の効果】以上に説明したように、本発明のオーブ
ンは、密閉される炉室内に配置される石英管ヒータを備
え、前記炉室の一側壁に前記石英管ヒータを端子部が炉
室外に位置するように片持ち状に支持させることを特徴
とするものであるので、石英管ヒータにより直接に炉室
内の処理物を加熱して、短時間で処理物を処理温度まで
加熱することができるという作用が得られ、これにより
処理時間を短縮できるという効果を得ることができる。As described above, the oven of the present invention is provided with the quartz tube heater arranged in the closed furnace chamber, and the quartz tube heater is provided on one side wall of the furnace chamber outside the furnace chamber. Since it is characterized in that it is supported in a cantilevered manner so that it is positioned at, it is possible to heat the processed material in the furnace chamber directly by the quartz tube heater and heat the processed material to the processing temperature in a short time. The effect that it can be obtained is obtained, and by this, the effect that the processing time can be shortened can be obtained.
【００４０】また、本発明によれば、ヒータの劣化によ
り生じる塵や脱ガスにより生じる金属イオンを含むガス
は石英管内に封じ込められ、劣化や脱ガス現象が生じ易
い端子部は炉室外に位置させているので、ヒータや端子
部の劣化や脱ガス現象により炉室内の雰囲気が汚染され
るおそれは全くないという作用を得ることができ、所定
の雰囲気内における加熱処理に最適のオーブンを得るこ
とができる。Further, according to the present invention, the gas containing the dust generated by the heater deterioration and the metal ions generated by the degassing is confined in the quartz tube, and the terminal portion, which easily causes the deterioration and the degassing phenomenon, is located outside the furnace chamber. Therefore, it is possible to obtain the effect that there is no possibility that the atmosphere in the furnace chamber is contaminated due to the deterioration of the heater or the terminal portion or the degassing phenomenon, and it is possible to obtain the optimal oven for the heat treatment in the predetermined atmosphere. it can.
【００４１】更に、本発明によれば、石英管ヒータを炉
室の一側壁、例えば後壁に片持ち状に支持させることに
より、石英管の熱膨張による熱応力で石英管が破損する
ことを防止することができるという作用を得ることがで
き、これにより石英管ヒータの交換頻度を下げてランニ
ングコストを削減できるという効果を得ることができ
る。Further, according to the present invention, by supporting the quartz tube heater on one side wall of the furnace chamber, for example, the rear wall in a cantilever manner, it is possible to prevent the quartz tube from being damaged by thermal stress due to thermal expansion of the quartz tube. It is possible to obtain the effect of being able to prevent it, and thereby it is possible to obtain the effect that the replacement frequency of the quartz tube heater can be reduced and the running cost can be reduced.
【００４２】本発明において、石英管ヒータが発生する
熱線を炉室中央部に反射する反射体を設けると、炉壁に
向かって照射された石英管ヒータの熱線を炉室内の処理
物に反射して照射させることができ、これにより、処理
物を効率よく、平均に加熱することができ、加熱開始後
所定の処理温度に到達するまでの時間を短縮して処理時
間を短縮できるという効果が得られる上、炉壁が直接加
熱されないので炉壁温度を低温にすることができ、炉壁
を冷却する冷却装置を省略して安価にすることができる
という効果が得られると共に、加熱終了後に処理物を短
時間で所定の取出し温度まで冷却することができ、これ
により処理時間を短縮できるという効果が得られる。In the present invention, when a reflector for reflecting the heat rays generated by the quartz tube heater in the central portion of the furnace chamber is provided, the heat rays of the quartz tube heater irradiated toward the furnace wall are reflected on the processed material in the furnace chamber. It is possible to heat the processed material efficiently and evenly, and it is possible to shorten the processing time after the start of heating to reach the predetermined processing temperature. In addition, since the furnace wall is not directly heated, the temperature of the furnace wall can be lowered, and the effect that the cooling device for cooling the furnace wall can be omitted and the cost can be reduced, and at the same time, the processed material can be processed after the heating is completed. Can be cooled to a predetermined take-out temperature in a short time, which has the effect of shortening the processing time.
【００４３】また、本発明において、石英管ヒータと反
射面とが一体的に前記炉室の一面から炉室内に挿抜可能
に設けられると、石英管ヒータ及び反射面を炉室から取
出して点検したり、整備したり、交換したりできるの
で、石英管ヒータ及び反射体の点検、整備、交換などの
メンテナンスが容易になるという効果を得ることができ
る。Further, in the present invention, when the quartz tube heater and the reflecting surface are integrally provided so as to be insertable into and removable from the one surface of the furnace chamber, the quartz tube heater and the reflecting surface are taken out from the furnace chamber and inspected. Since the quartz tube heater and the reflector can be repaired, maintained, or replaced, maintenance such as inspection, maintenance, and replacement of the quartz tube heater and the reflector can be easily performed.
【図１】本発明の縦断側面図である。FIG. 1 is a vertical side view of the present invention.
【図２】本発明の半断背面図である。FIG. 2 is a half-section rear view of the present invention.
【図３】本発明の処理温度特性図である。FIG. 3 is a processing temperature characteristic diagram of the present invention.
１ オーブン ４ 後壁 ６ 炉室 １０ 石英管ヒータ １１ 反射体 １３ 端子部 １７ 反射体 1 oven 4 rear wall 6 furnace room 10 Quartz tube heater 11 reflector 13 terminals 17 Reflector
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｈ０５Ｂ 3/66 Ｈ０５Ｂ 3/66 Ｆターム(参考） 3K058 AA02 AA45 AA82 AA86 AA87 BA19 CE04 CE16 CE17 CE31 EA02 EA05 3K092 PP01 PP09 QA01 QB04 QB24 QB62 QC27 QC38 RA02 RC02 RD11 SS47 TT08 TT09 TT37 UB02 UB04 VV09 VV16 VV22 VV35 4K063 AA05 AA06 AA09 AA12 BA01 BA06 BA12 CA01 CA03 CA06 FA03 FA04 FA07 FA18 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) H05B 3/66 H05B 3/66 F term (reference) 3K058 AA02 AA45 AA82 AA86 AA87 BA19 CE04 CE16 CE17 CE31 EA02 EA05 3K092 PP01 PP09 QA01 QB04 QB24 QB62 QC27 QC38 RA02 RC02 RD11 SS47 TT08 TT09 TT37 UB02 UB04 VV09 VV16 VV22 VV35 4K063 AA05 AA06 AA09 AA12 BA01 BA06 BA12 CA01 CA03 CA06 FA03 FA04 FA07 FA18
Claims (4)
ータを備え、前記炉室の一側壁に前記石英管ヒータを端
子部が炉室外に位置するように片持ち状に支持させるこ
とを特徴とするオーブン。1. A quartz tube heater disposed in a closed furnace chamber, wherein the quartz tube heater is supported on one side wall of the furnace chamber in a cantilever manner so that a terminal portion is located outside the furnace chamber. Characteristic oven.
中央部に反射する反射体を設けた請求項１に記載のオー
ブン。2. The oven according to claim 1, further comprising a reflector for reflecting heat rays generated by the quartz tube heater in a central portion of the furnace chamber.
的に前記炉室の一面から炉室内に挿抜可能に設けられた
請求項２に記載のオーブン。3. The oven according to claim 2, wherein the quartz tube heater and the reflector are integrally provided so as to be insertable into and removable from the one surface of the furnace chamber.
これを覆う石英管とを備える請求項１ないし３のいずれ
かに記載のオーブン。4. The oven according to claim 1, wherein the quartz tube heater comprises a ceramic heater and a quartz tube covering the ceramic heater.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001376141A JP2003178857A (en) | 2001-12-10 | 2001-12-10 | Oven |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001376141A JP2003178857A (en) | 2001-12-10 | 2001-12-10 | Oven |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003178857A true JP2003178857A (en) | 2003-06-27 |
| JP2003178857A5 JP2003178857A5 (en) | 2004-11-18 |
Family
ID=19184396
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001376141A Pending JP2003178857A (en) | 2001-12-10 | 2001-12-10 | Oven |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003178857A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101979941A (en) * | 2010-09-30 | 2011-02-23 | 张家港市益成机械有限公司 | Guiding structure for inserted lamp tube in oven |
| CN102778112A (en) * | 2012-08-23 | 2012-11-14 | 辉县市旭日电源有限公司 | Directional infrared ray intense-radiation heating three-dimensional dual-drying-tunnel energy-saving slurry furnace |
| JP2013519863A (en) * | 2010-02-15 | 2013-05-30 | ライボルト オプティクス ゲゼルシャフト ミット ベシュレンクテル ハフツング | Equipment for heat treatment of substrates |
| KR101774356B1 (en) * | 2016-08-04 | 2017-09-04 | 박태규 | Heater clamping device for electric roaster |
| KR101786557B1 (en) * | 2016-09-13 | 2017-10-18 | 박태규 | Pressure electric roasting machine replacement parts heater assembly confidential |
| KR20180003454U (en) * | 2017-06-01 | 2018-12-12 | 이병호 | roasting apparatus which uses near infrared ray |
-
2001
- 2001-12-10 JP JP2001376141A patent/JP2003178857A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013519863A (en) * | 2010-02-15 | 2013-05-30 | ライボルト オプティクス ゲゼルシャフト ミット ベシュレンクテル ハフツング | Equipment for heat treatment of substrates |
| CN101979941A (en) * | 2010-09-30 | 2011-02-23 | 张家港市益成机械有限公司 | Guiding structure for inserted lamp tube in oven |
| CN102778112A (en) * | 2012-08-23 | 2012-11-14 | 辉县市旭日电源有限公司 | Directional infrared ray intense-radiation heating three-dimensional dual-drying-tunnel energy-saving slurry furnace |
| KR101774356B1 (en) * | 2016-08-04 | 2017-09-04 | 박태규 | Heater clamping device for electric roaster |
| KR101786557B1 (en) * | 2016-09-13 | 2017-10-18 | 박태규 | Pressure electric roasting machine replacement parts heater assembly confidential |
| KR20180003454U (en) * | 2017-06-01 | 2018-12-12 | 이병호 | roasting apparatus which uses near infrared ray |
| KR200488339Y1 (en) * | 2017-06-01 | 2019-04-11 | 이병호 | roasting apparatus which uses near infrared ray |
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