JP2003137608A - Apparatus for cleaning glass substrate for information recording medium - Google Patents
Apparatus for cleaning glass substrate for information recording mediumInfo
- Publication number
- JP2003137608A JP2003137608A JP2001335197A JP2001335197A JP2003137608A JP 2003137608 A JP2003137608 A JP 2003137608A JP 2001335197 A JP2001335197 A JP 2001335197A JP 2001335197 A JP2001335197 A JP 2001335197A JP 2003137608 A JP2003137608 A JP 2003137608A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- cleaning
- water
- cleaning tank
- cleaning liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 192
- 239000011521 glass Substances 0.000 title claims abstract description 143
- 239000000758 substrate Substances 0.000 title claims abstract description 138
- 239000007788 liquid Substances 0.000 claims abstract description 50
- 230000004087 circulation Effects 0.000 claims description 31
- 239000010419 fine particle Substances 0.000 claims description 26
- 238000003426 chemical strengthening reaction Methods 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 15
- 239000002245 particle Substances 0.000 claims description 14
- 238000003756 stirring Methods 0.000 claims description 7
- 238000007599 discharging Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 142
- 239000007789 gas Substances 0.000 description 25
- 150000003839 salts Chemical class 0.000 description 19
- 238000005406 washing Methods 0.000 description 16
- 230000003749 cleanliness Effects 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 230000001464 adherent effect Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910021645 metal ion Inorganic materials 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000003082 abrasive agent Substances 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 239000002923 metal particle Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/50—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges
- G11B23/505—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges of disk carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Surface Treatment Of Glass (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明は、例えばハードデ
ィスク等のような情報記録装置の磁気記録媒体である磁
気ディスク、光磁気ディスク、光ディスク等といった情
報記録媒体に用いられる情報記録媒体用ガラス基板の洗
浄装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to cleaning of a glass substrate for an information recording medium used for an information recording medium such as a magnetic disc, a magneto-optical disc, an optical disc which is a magnetic recording medium of an information recording device such as a hard disk. It relates to the device.
【０００２】[0002]
【従来の技術】従来、上記のような情報記録媒体用ガラ
ス基板は、シート状のガラス素板を円盤状に切断してそ
の表面を研磨した後、化学強化が施されて形成されてい
る。この化学強化とは、加熱した化学強化処理液にガラ
ス素板を浸漬させ、ガラス素板中に含まれる一価の金属
イオンをこれと比較してそのイオン半径が大きな一価の
金属イオンに置き換えることにより、得られるガラス基
板の強度を高めるものである。化学強化後のガラス基板
の表面には置き換えられ、外部に放出された一価の金属
イオンにより生成される溶融塩が付着物として付着して
いる。また、この他にも溶融塩に混じり込んだ化学強化
処理装置等を形成する金属の粒子、塵埃、研磨材、研磨
粉等の微粒子が付着物として付着している。そして、こ
れら付着物を除去するため、化学強化後のガラス基板に
は洗浄処理が施されるようになっている。2. Description of the Related Art Conventionally, a glass substrate for an information recording medium as described above is formed by cutting a sheet-shaped glass base plate into a disk shape and polishing the surface thereof, followed by chemical strengthening. In this chemical strengthening, a glass base plate is immersed in a heated chemical strengthening treatment liquid, and monovalent metal ions contained in the glass base plate are replaced with monovalent metal ions having a larger ionic radius than this. As a result, the strength of the obtained glass substrate is increased. It is replaced on the surface of the glass substrate after the chemical strengthening, and the molten salt generated by the monovalent metal ions released to the outside is attached as an attached matter. In addition to these, fine particles such as metal particles, dust, abrasives, and polishing powders, which form a chemical strengthening treatment device mixed with molten salt, are attached as adhered substances. Then, in order to remove these deposits, the glass substrate after the chemical strengthening is subjected to a cleaning treatment.
【０００３】ガラス基板に洗浄処理を施すための洗浄装
置は、上面が開口された略四角箱状をなす洗浄槽を備え
ている。この洗浄槽内にはガラス基板を洗浄するための
洗浄液として水が貯留されており、化学強化処理後のガ
ラス基板は当該洗浄槽内の水に浸漬されるようになって
いる。前記洗浄槽の内部又は外部にはヒーターが取り付
けられており、このヒーターによって洗浄槽内に貯留さ
れた水は加熱されて３０〜１００℃の温水となってい
る。また、洗浄槽の内部には超音波発生装置が取り付け
られており、水に浸漬されたガラス基板に超音波を照射
するようになっている。A cleaning device for performing a cleaning process on a glass substrate is equipped with a cleaning tank having a substantially rectangular box shape with an open top surface. Water is stored in the cleaning tank as a cleaning liquid for cleaning the glass substrate, and the glass substrate after the chemical strengthening treatment is immersed in the water in the cleaning tank. A heater is attached to the inside or outside of the cleaning tank, and the water stored in the cleaning tank is heated by the heater to become hot water at 30 to 100 ° C. An ultrasonic generator is attached inside the cleaning tank so that the glass substrate immersed in water is irradiated with ultrasonic waves.
【０００４】さて、化学強化処理後のガラス基板は、化
学強化処理装置から取り出された後、常温程度まで冷却
される。このとき、溶融塩がガラス基板の表面に析出
し、付着物として付着する。この表面に付着物が付着し
たガラス基板は、まず洗浄槽内に投入され、３０〜１０
０℃の温水に浸漬される。その後、温水に浸漬されたガ
ラス基板に超音波発生装置から超音波が照射される。す
ると、ガラス基板の表面の付着物は、超音波による振動
という物理的外力で微粒子状に粉砕され、ガラス基板の
表面から遊離されるとともに、温水の極性と熱エネルギ
ーによって温水に溶解されて除去されるようになってい
る。The glass substrate after the chemical strengthening treatment is taken out from the chemical strengthening treatment apparatus and then cooled to room temperature. At this time, the molten salt is deposited on the surface of the glass substrate and adheres as a deposit. The glass substrate having the adhered substance on the surface is first put into a cleaning tank, and the glass substrate 30
Immerse in warm water at 0 ° C. Then, the glass substrate immersed in the warm water is irradiated with ultrasonic waves from the ultrasonic wave generator. Then, the adhered matter on the surface of the glass substrate is pulverized into fine particles by a physical external force of vibration due to ultrasonic waves, is released from the surface of the glass substrate, and is dissolved and removed in the warm water by the polarity and thermal energy of the warm water. It has become so.
【０００５】[0005]
【発明が解決しようとする課題】ところが、上記従来の
洗浄装置を使用してガラス基板を洗浄する場合、超音波
は対象となる付着物を振動させ、粉砕する機能を有する
が、この超音波による振動では洗浄槽内の温水を攪拌す
ることはできない。このため、粉砕された付着物のうち
特に溶融塩は、洗浄槽内で均一に分散されることなく、
ガラス基板の近傍にのみ分散されて溶解されてしまい、
温水に対する溶融塩の溶解速度が急激に低下して十分な
洗浄能力を維持することができなくなるという問題があ
った。However, when the glass substrate is cleaned by using the above-mentioned conventional cleaning device, ultrasonic waves have a function of vibrating and crushing the object to be adhered. The hot water in the washing tank cannot be stirred by vibration. For this reason, particularly the molten salt among the pulverized deposits is not uniformly dispersed in the cleaning tank,
Dispersed and dissolved only in the vicinity of the glass substrate,
There is a problem in that the rate of dissolution of the molten salt in warm water decreases rapidly and it becomes impossible to maintain a sufficient cleaning ability.
【０００６】さらに、付着物には溶融塩だけでなく、前
に挙げた微粒子ような温水に溶けないものも混じり込ん
でいる。このような温水に溶けない付着物は超音波を照
射している間はガラス基板の近傍に分散されているが、
超音波の照射を停止するとガラス基板の表面に再び付着
されるおそれがある。そして、このような再付着した付
着物により、ガラス基板の表面の清浄度が低下し、微小
突起が形成され、平滑性が失われて欠陥が発生してしま
うという問題があった。Further, not only the molten salt but also the above-mentioned fine particles that are not soluble in warm water are mixed in the deposit. Such deposits that do not dissolve in warm water are dispersed in the vicinity of the glass substrate while being irradiated with ultrasonic waves.
When the irradiation of ultrasonic waves is stopped, the ultrasonic waves may be attached again to the surface of the glass substrate. There is a problem that such redeposited deposits reduce the cleanliness of the surface of the glass substrate, form fine protrusions, lose smoothness, and cause defects.
【０００７】また、超音波は超音波発生装置からの距離
が長くなったり、対象物が多くなったりすると対象物を
振動させる力が弱まってしまう。このため、超音波では
一作業当たりのガラス基板の処理量を多くすると、ガラ
ス基板に付着した付着物を十分に除去することができな
くなるという問題があった。[0007] In addition, the ultrasonic wave has a weaker force for vibrating the object when the distance from the ultrasonic wave generating device becomes long and the number of objects increases. For this reason, there is a problem in that if the processing amount of the glass substrate per operation is increased by ultrasonic waves, it becomes impossible to sufficiently remove the deposits attached to the glass substrate.
【０００８】この発明は、このような従来技術に存在す
る問題点に着目してなされたものである。その目的とす
るところは、洗浄槽内に貯留された洗浄液全体に付着物
を均一に分散又は溶解させて十分な洗浄能力を維持する
ことができ、付着物の再付着を抑制することができると
ともに、一作業当たりの処理量の向上を図ることができ
る情報記録媒体用ガラス基板の洗浄装置を提供すること
にある。The present invention has been made by paying attention to the problems existing in such a conventional technique. The purpose is to disperse or dissolve the adherents uniformly in the entire cleaning liquid stored in the cleaning tank to maintain sufficient cleaning ability, and to prevent reattachment of the adherents. An object of the present invention is to provide a cleaning device for a glass substrate for an information recording medium, which can improve the amount of processing per operation.
【０００９】[0009]
【課題を解決するための手段】上記の目的を達成するた
めに、請求項１に記載の情報記録媒体用ガラス基板の洗
浄装置の発明は、加熱した化学強化処理液に円盤状をな
すガラス基板を浸漬して化学強化処理を施した後、当該
ガラス基板の表面に付着した付着物を洗浄して除去する
ための情報記録媒体用ガラス基板の洗浄装置であって、
上面に開口部を有する略四角箱状をなし、内部には前記
ガラス基板の表面に対する付着物の親和力を低減させる
洗浄液が貯留され、同洗浄液にガラス基板を浸漬させた
状態でその内部に収容するための洗浄槽と、当該洗浄槽
の内底面上に配設され、洗浄槽内にガスを放出して貯留
された洗浄液中に泡を発生させるためのガス供給管とを
備え、前記洗浄液にガラス基板が浸漬された状態で洗浄
液中に泡を発生させることにより、同泡が洗浄液中を移
動して当該洗浄液を攪拌しながらガラス基板の表面に接
触して付着物を除去するように構成することを特徴とす
るものである。In order to achieve the above object, the invention of an apparatus for cleaning a glass substrate for an information recording medium according to claim 1 is a glass substrate having a disk shape in a heated chemical strengthening treatment liquid. After being subjected to a chemical strengthening treatment by dipping, a cleaning device for a glass substrate for an information recording medium for cleaning and removing deposits attached to the surface of the glass substrate,
It has a substantially rectangular box shape having an opening on the upper surface, and a cleaning liquid that reduces the affinity of adhered substances to the surface of the glass substrate is stored inside, and the glass substrate is immersed in the cleaning liquid and accommodated therein. And a gas supply pipe arranged on the inner bottom surface of the cleaning tank for discharging gas into the cleaning tank to generate bubbles in the stored cleaning solution. By generating bubbles in the cleaning liquid while the substrate is immersed, the bubbles move in the cleaning liquid and contact the surface of the glass substrate while stirring the cleaning liquid to remove the deposits. It is characterized by.
【００１０】請求項２に記載の情報記録媒体用ガラス基
板の洗浄装置の発明は、請求項１に記載の発明におい
て、前記洗浄槽には洗浄液の流入口及び流出口をそれぞ
れ設け、これら流入口と流出口との間を循環配管で接続
し、同循環配管にポンプを連結して洗浄槽内の洗浄液を
流出口から吸い込み、循環配管を介して流入口から洗浄
槽内に戻すように構成するとともに、当該循環配管にヒ
ーターを連結し、同ヒーターで循環配管内を流れる洗浄
液を加熱して洗浄槽内に戻すように構成することを特徴
とするものである。According to a second aspect of the present invention, there is provided an apparatus for cleaning a glass substrate for an information recording medium, wherein the cleaning tank is provided with an inlet and an outlet for a cleaning liquid. A circulation pipe is connected between the outlet and the outlet, and a pump is connected to the circulation pipe so that the cleaning liquid in the cleaning tank is sucked from the outlet and returned from the inlet to the cleaning tank through the circulation pipe. At the same time, a heater is connected to the circulation pipe, and the cleaning liquid flowing in the circulation pipe is heated by the heater and returned to the cleaning tank.
【００１１】請求項３に記載の情報記録媒体用ガラス基
板の洗浄装置の発明は、請求項２に記載の発明におい
て、前記循環配管にはフィルターを連結し、同フィルタ
ーで洗浄槽内に戻される洗浄液中に存在する一定以上の
粒径の微粒子を除去することを特徴とするものである。The invention of a cleaning device for a glass substrate for an information recording medium according to a third aspect is the invention according to the second aspect, wherein a filter is connected to the circulation pipe and is returned to the washing tank by the filter. It is characterized in that fine particles having a particle size of a certain size or more existing in the cleaning liquid are removed.
【００１２】請求項４に記載の情報記録媒体用ガラス基
板の洗浄装置の発明は、請求項１から請求項３のいずれ
かに記載の発明において、前記泡の径は１〜４０ｍｍで
あることを特徴とするものである。According to a fourth aspect of the present invention, there is provided an apparatus for cleaning a glass substrate for an information recording medium, wherein the bubbles have a diameter of 1 to 40 mm in the invention according to any one of the first to third aspects. It is a feature.
【００１３】[0013]
【発明の実施の形態】以下、この発明の実施形態を、図
面に基づいて詳細に説明する。実施形態のガラス基板
は、シート状をなすガラス素板を超硬合金又はダイヤモ
ンド製のカッターを用いて切断することにより、その中
心に円孔を有する円盤状に形成されている。ガラス素板
の材料としては、フロート法、ダウンドロー法、リドロ
ー法又はプレス法で製造されたソーダライムガラス、ア
ルミノシリケートガラス、ボロシリケートガラス、結晶
化ガラス等が挙げられる。このガラス基板の表面に、例
えば磁気特性を向上させるための下地層、磁性層、保護
層及び潤滑層等を設けることにより、例えば磁気ディス
ク、光磁気ディスク、光ディスク等の情報記録媒体が作
製される。そして、情報記録媒体とした際に要求される
耐衝撃性、耐振動性、耐熱性等を満たすため、ガラス基
板には化学強化処理が施されている。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below with reference to the drawings. The glass substrate of the embodiment is formed into a disc shape having a circular hole at the center by cutting a sheet-shaped glass base plate with a cutter made of cemented carbide or diamond. Examples of the material of the glass base plate include soda lime glass, aluminosilicate glass, borosilicate glass, and crystallized glass produced by the float method, downdraw method, redraw method or press method. An information recording medium such as a magnetic disk, a magneto-optical disk, or an optical disk is manufactured by providing an underlayer, a magnetic layer, a protective layer, a lubricating layer, or the like for improving the magnetic characteristics on the surface of the glass substrate. . The glass substrate is subjected to a chemical strengthening treatment in order to satisfy the impact resistance, vibration resistance, heat resistance and the like required when it is used as an information recording medium.
【００１４】この化学強化処理は、ガラス基板を加熱し
た化学強化処理液に浸漬させることによって行われる。
化学強化処理液としては、例えば硝酸カリウム溶液、硝
酸ナトリウム溶液、硝酸銀等をそれぞれ単独、あるいは
２種以上混合したものが挙げられる。この化学強化処理
液の温度は、好ましくはガラス基板を形成するガラス材
料の歪点よりも５０〜１５０℃程度低い温度である。よ
り好ましくは、３５０〜４００℃程度である。加熱した
化学強化処理液に浸漬されたガラス基板は組成中に含ま
れるリチウム、ナトリウム等の一価の金属イオンを、こ
れと比較してそのイオン半径が大きいカリウム等の一価
の金属イオンに置き換えられている。この状態でガラス
基板の表面に圧縮応力が作用し、ガラス基板が化学的に
強化される。This chemical strengthening treatment is performed by immersing the glass substrate in a heated chemical strengthening treatment liquid.
Examples of the chemical strengthening treatment liquid include potassium nitrate solution, sodium nitrate solution, and silver nitrate, which may be used alone or in combination of two or more. The temperature of the chemical strengthening treatment liquid is preferably about 50 to 150 ° C. lower than the strain point of the glass material forming the glass substrate. More preferably, it is about 350 to 400 ° C. The glass substrate immersed in the heated chemical strengthening treatment liquid replaces monovalent metal ions such as lithium and sodium contained in the composition with monovalent metal ions such as potassium, which has a larger ionic radius compared to this. Has been. In this state, compressive stress acts on the surface of the glass substrate to chemically strengthen the glass substrate.
【００１５】化学強化処理した後のガラス基板の表面に
は溶融塩が付着物として付着されている。また、この溶
融塩に混じり込むことによって化学強化処理装置を形成
する金属の粒子、塵埃、研磨材、研磨粉等の微粒子も付
着物としてガラス基板の表面に付着している。そして、
これらの付着物を除去するため、ガラス基板には洗浄装
置を使用して洗浄処理が施されるようになっている。Molten salt is attached as an adhering substance to the surface of the glass substrate after the chemical strengthening treatment. Further, fine particles such as metal particles, dust, abrasives, and polishing powder that form a chemical strengthening treatment device by being mixed with this molten salt adhere to the surface of the glass substrate as adherents. And
In order to remove these deposits, the glass substrate is cleaned by using a cleaning device.
【００１６】次に、前記洗浄装置について説明する。図
１は、ガラス基板に洗浄処理を施すための洗浄装置の正
断面図、図２は同洗浄装置の側断面図、図３は同洗浄装
置を上方から見た平面図を示している。洗浄装置を構成
する洗浄槽１１は、上面に開口部１１ａを有する略四角
箱状に形成されている。この洗浄槽１１の底壁には中央
部及び一隅部にそれぞれドレン管２７が下方から接続さ
れている。また、これらドレン管２７には図示しないバ
ルブがそれぞれ接続されており、バルブを操作すること
により、各ドレン管２７を開閉することができるように
なっている。Next, the cleaning device will be described. FIG. 1 is a front sectional view of a cleaning device for performing a cleaning process on a glass substrate, FIG. 2 is a side sectional view of the cleaning device, and FIG. 3 is a plan view of the cleaning device seen from above. The cleaning tank 11 constituting the cleaning device is formed in a substantially rectangular box shape having an opening 11a on the upper surface. A drain pipe 27 is connected to the bottom wall of the cleaning tank 11 from below in the center and one corner. Further, valves (not shown) are connected to the drain pipes 27, respectively, and the drain pipes 27 can be opened and closed by operating the valves.
【００１７】洗浄槽１１の内側には給水管１２が図１中
で右側となる一側壁の内面から内底面上に渡って敷設さ
れている。給水管１２の基端部にはバルブ１３を有する
給水配管１４が接続されており、バルブ１３の開放によ
り、給水配管１４から給水管１２に洗浄液が供給されて
いる。そして、給水管１２内の洗浄液は給水管１２の先
端部１２ａから吐出され、洗浄槽１１内に貯留されるよ
うになっている。Inside the cleaning tank 11, a water supply pipe 12 is laid from the inner surface of one side wall on the right side in FIG. 1 to the inner bottom surface. A water supply pipe 14 having a valve 13 is connected to the proximal end of the water supply pipe 12, and when the valve 13 is opened, the cleaning liquid is supplied from the water supply pipe 14 to the water supply pipe 12. Then, the cleaning liquid in the water supply pipe 12 is discharged from the tip portion 12 a of the water supply pipe 12 and stored in the cleaning tank 11.
【００１８】ガラス基板３１は、複数枚が縦置きで一定
間隔おきの状態でホルダー３２内に収納されるととも
に、このホルダー３２ごとケージ３３内に収容されてい
る。該ガラス基板３１は、ケージ３３を洗浄槽１１の開
口部１１ａからその内部に投入することにより、ホルダ
ー３２及びケージ３３とともに洗浄槽１１内に貯留され
た洗浄液に浸漬されている。A plurality of glass substrates 31 are housed vertically in a holder 32 at regular intervals and, together with the holder 32, housed in a cage 33. The glass substrate 31 is immersed in the cleaning liquid stored in the cleaning tank 11 together with the holder 32 and the cage 33 by charging the cage 33 into the cleaning tank 11 through the opening 11a.
【００１９】前に挙げた溶融塩、微粒子等からなる付着
物は、イオン結合、分子間力、静電力、クーロン力等の
ような親和力によってガラス基板３１の表面に付着され
ている。洗浄液は、当該洗浄液に付着物を溶解させた
り、ガラス基板３１の表面と付着物との間に入り込んで
ガラス基板３１の表面から付着物を浮き上がらせたり等
することにより、付着物の親和力を低減させ、ガラス基
板３１の表面から遊離させるものである。そして、この
洗浄液には付着物である溶融塩を溶解することが可能で
あるとともに、中性であるためガラス基板３１に影響を
与えず、入手が容易な水が用いられる。The above-mentioned deposits of molten salt, fine particles and the like are attached to the surface of the glass substrate 31 by an affinity such as ionic bond, intermolecular force, electrostatic force, Coulomb force and the like. The cleaning liquid reduces the affinity of the adhered substances by dissolving the adhered substances in the cleaning liquid or entering between the surface of the glass substrate 31 and the adhered substances to lift the adhered substances from the surface of the glass substrate 31. And is released from the surface of the glass substrate 31. Then, the cleaning liquid is capable of dissolving the molten salt as an adhering substance, and since it is neutral, it does not affect the glass substrate 31, and water that is easily available is used.
【００２０】この水には通常の水を用いてもよいが、微
粒子等がガラス基板３１に付着することを抑制するため
にはフィルタリングした純水、イオン交換水、超純水等
を用いることが好ましい。また、ガラス基板３１の表面
に影響を与えない程度であれば、この水にイソプロピル
アルコール（ＩＰＡ）、メタノール、エタノール、ブタ
ノール等のアルコール、カチオン性、アニオン性又はノ
ニオン性界面活性剤等を混合してもよい。Although ordinary water may be used as this water, filtered pure water, ion-exchanged water, ultrapure water, or the like is used in order to prevent fine particles and the like from adhering to the glass substrate 31. preferable. In addition, isopropyl alcohol (IPA), alcohols such as methanol, ethanol and butanol, and cationic, anionic or nonionic surfactants are mixed with this water as long as the surface of the glass substrate 31 is not affected. May be.
【００２１】図２中で左側となる洗浄槽１１の後壁の上
端部にはオーバーフロー部１５が横方向へ延びるように
突設されている。該オーバーフロー部１５の下面には排
水管１６が接続されている。給水管１２の先端部１２ａ
から洗浄槽１１内に吐出された水は、洗浄槽１１内を満
たしつつ、オーバーフロー部１５へとオーバーフローし
て排水管１６から外部へと排水されている。At the upper end of the rear wall of the cleaning tank 11 on the left side in FIG. 2, an overflow portion 15 is provided so as to extend laterally. A drain pipe 16 is connected to the lower surface of the overflow portion 15. Tip 12a of water supply pipe 12
The water discharged from the cleaning tank 11 into the cleaning tank 11 overflows into the overflow portion 15 while filling the cleaning tank 11, and is drained from the drain pipe 16 to the outside.
【００２２】洗浄槽１１の内底面上にはその外部から延
びる複数本のガス供給管１７が敷設されている。各ガス
供給管１７の周壁には複数の孔１７ａがそれぞれ透設さ
れている。当該ガス供給管１７には洗浄槽１１の外部に
て図示しないポンプが接続されており、その内部にはガ
スが供給されている。このガスにはガラス基板３１に影
響を与えず、入手が容易なエアが用いられる。また、エ
ア以外にもヘリウムガス、ネオンガス、アルゴンガス等
のような不活性ガスを用いてもよい。そして、ガス供給
管１７に供給されたエアが孔１７ａから洗浄槽１１内に
放出される際、洗浄槽１１内に貯留された水中に泡を発
生させる。On the inner bottom surface of the cleaning tank 11, a plurality of gas supply pipes 17 extending from the outside are laid. A plurality of holes 17a are provided in the peripheral wall of each gas supply pipe 17 in a transparent manner. A pump (not shown) is connected to the gas supply pipe 17 outside the cleaning tank 11, and gas is supplied to the inside thereof. For this gas, air that does not affect the glass substrate 31 and is easily available is used. In addition to air, an inert gas such as helium gas, neon gas, or argon gas may be used. Then, when the air supplied to the gas supply pipe 17 is discharged into the cleaning tank 11 from the hole 17a, bubbles are generated in the water stored in the cleaning tank 11.
【００２３】ガス供給管１７の孔１７ａから発生した泡
は、ここから洗浄槽１１内に貯留された水中を水面に向
かって移動しようとする。この泡はケージ３３内のホル
ダー３２に収容されたガラス基板３１に接触する際にガ
ラス基板３１の表面に対する付着物の親和力を低減又は
消滅させる。The bubbles generated from the holes 17a of the gas supply pipe 17 tend to move toward the water surface in the water stored in the cleaning tank 11 from here. This bubble reduces or eliminates the affinity of the deposit for the surface of the glass substrate 31 when coming into contact with the glass substrate 31 housed in the holder 32 in the cage 33.
【００２４】つまり、水に浸漬された状態で付着物はガ
ラス基板３１の表面に対する親和力を低減されている。
この状態でガラス基板３１の表面に泡が接触すると、例
えば泡が破裂して細かな泡となったり、潰れたり等する
ことによって生じる衝撃等のような付着物が遊離する程
度の物理的外力がガラス基板３１の表面に付与され、付
着物が除去される。また、水面に近付くにつれて水圧が
低下することから、泡はその径を拡大させながら水を押
し上げ、かき回すようにして移動することにより、洗浄
槽１１内の水を攪拌している。That is, the adhered substances have a reduced affinity for the surface of the glass substrate 31 when immersed in water.
When the bubbles come into contact with the surface of the glass substrate 31 in this state, a physical external force such as a shock generated when the bubbles burst and become fine bubbles or is crushed is released. It is applied to the surface of the glass substrate 31 and the deposits are removed. Further, since the water pressure decreases as it approaches the water surface, the bubbles push up the water while enlarging its diameter and move by stirring so that the water in the cleaning tank 11 is stirred.
【００２５】前記ガス供給管１７内へのエアの供給量
は、１分間当たり３万〜１１万ｃｍ3とすることが好ま
しい。１分間当たりのエアの供給量が３万ｃｍ3よりも
少ない場合、水中に泡が十分に発生しないおそれがあ
り、１１万ｃｍ3よりも多い場合、泡が接触するときの
勢いによってガラス基板３１が大きく振動し、細かな
傷、ひび割れ、破損等の欠陥が生じるおそれがある。The amount of air supplied into the gas supply pipe 17 is preferably 30,000 to 110,000 cm 3 per minute. If the amount of air supplied per minute is less than 30,000 cm 3 , bubbles may not be sufficiently generated in the water. If the amount of air supplied is more than 110,000 cm 3 , the glass substrate 31 may be affected by the momentum when the bubbles come into contact with each other. May vibrate greatly, and defects such as fine scratches, cracks, and breakage may occur.
【００２６】前記泡はガス供給管１７の孔１７ａの径を
調整することによってその径を１〜４０ｍｍとすること
が好ましい。泡の径が１ｍｍ未満の場合、付着物を十分
に遊離させることができなくなるとともに、水を十分に
攪拌することができなくなるおそれがある。また、泡の
径が４０ｍｍより大きい場合、泡の接触によりガラス基
板３１が大きく振動し、細かな傷、ひび割れ、破損等が
生じるおそれがある。It is preferable that the bubble has a diameter of 1 to 40 mm by adjusting the diameter of the hole 17a of the gas supply pipe 17. If the diameter of the bubbles is less than 1 mm, it may not be possible to sufficiently release the deposits and it may be impossible to sufficiently stir the water. Further, when the diameter of the bubbles is larger than 40 mm, the glass substrate 31 may vibrate greatly due to the contact of the bubbles, and fine scratches, cracks, breakage, and the like may occur.
【００２７】また、ガス供給管１７には洗浄槽１１の外
部にて図示しないフィルターが接続されている。このフ
ィルターを通過したエアからは一定以上の粒径の微粒子
が除去されており、洗浄槽１１内で水に浸漬されたガラ
ス基板３１に泡が接触する際、この泡に混じり込んだ微
粒子がガラス基板３１に付着することが防止されてい
る。A filter (not shown) is connected to the gas supply pipe 17 outside the cleaning tank 11. Fine particles having a certain particle size or more are removed from the air that has passed through this filter, and when the bubbles come into contact with the glass substrate 31 immersed in water in the cleaning tank 11, the fine particles mixed in the bubbles are the glass. Adhesion to the substrate 31 is prevented.
【００２８】フィルターでエアから除去される微粒子の
粒径は０．３μｍ以上であることが好ましい。０．３μ
ｍ未満の微粒子をフィルターで除去しようとする場合、
フィルターが目詰まりして抵抗が大きくなり、ガス供給
管１７内へエアを十分に送り込むことができなくなるお
それがある。なお、微粒子の粒径の上限については特に
規定されないが、通常は１００μｍ以下である。１００
μｍより大きな微粒子はその大半が水面に浮き上がるた
め、ガラス基板３１を水に浸漬するのみで取り除くこと
ができる。The particle size of the fine particles removed from the air by the filter is preferably 0.3 μm or more. 0.3μ
If you want to remove particles smaller than m with a filter,
The filter may become clogged and the resistance may increase, and it may not be possible to sufficiently feed air into the gas supply pipe 17. The upper limit of the particle size of the fine particles is not particularly specified, but is usually 100 μm or less. 100
Since most of the particles larger than μm float on the water surface, they can be removed only by immersing the glass substrate 31 in water.
【００２９】洗浄槽１１の一側壁の下端部には流出口１
９が透設されるとともに、この流出口１９よりも洗浄槽
１１の外部には流出管２０が接続されている。また、洗
浄槽１１の他側壁の上端部には流入管２１が配設される
とともに、この流入管２１の下端は流入口２２として開
口されている。これら流出管２０と流入管２１との間は
循環配管２３によって接続されている。さらに、この循
環配管２３にはポンプ２４が連結されている。そして、
洗浄槽１１内の水はポンプ２４により流出管２０から吸
い出され、循環配管２３を介して流入管２１に至り、こ
の流入管２１から洗浄槽１１内に戻されることにより、
洗浄槽１１と循環配管２３との間で循環されるようにな
っている。The outlet 1 is provided at the lower end of one side wall of the cleaning tank 11.
9 is transparently provided, and an outflow pipe 20 is connected to the outside of the cleaning tank 11 from the outlet 19. An inflow pipe 21 is arranged at the upper end of the other side wall of the cleaning tank 11, and the lower end of the inflow pipe 21 is opened as an inflow port 22. A circulation pipe 23 connects the outflow pipe 20 and the inflow pipe 21. Further, a pump 24 is connected to the circulation pipe 23. And
The water in the cleaning tank 11 is sucked from the outflow pipe 20 by the pump 24, reaches the inflow pipe 21 through the circulation pipe 23, and is returned from the inflow pipe 21 into the cleaning tank 11 by
The cleaning tank 11 and the circulation pipe 23 are circulated.
【００３０】前記循環配管２３の途中にはフィルター２
５が連結されている。このフィルター２５は、循環配管
２３内を流れる水中に存在する金属の粒子、塵埃、研磨
材、研磨粉等といった水に対して不溶性であり、一定以
上の粒径の微粒子を除去するように機能している。そし
て、フィルター２５で一定以上の粒径の微粒子を除去す
ることにより、洗浄槽１１に戻される水の清浄度が良好
に維持されるようになっている。このときフィルター２
５で除去される微粒子の粒径は０．２μｍ以上であるこ
とが好ましい。０．２μｍ未満の微粒子をフィルター２
５で除去しようとする場合、循環配管２３中においてフ
ィルター２５が目詰まりして抵抗が大きくなり、水が流
れにくくなるおそれがある。なお、微粒子の粒径の上限
については特に規定されないが、通常は１００μｍ以下
である。１００μｍより大きな微粒子はその大半が水面
に浮き上がるため、ガラス基板３１を水に浸漬するのみ
で取り除くことができる。The filter 2 is provided in the middle of the circulation pipe 23.
5 are connected. The filter 25 is insoluble in water such as metal particles, dust, abrasives, and polishing powders existing in the water flowing in the circulation pipe 23, and functions to remove fine particles having a certain size or more. ing. The filter 25 removes fine particles having a certain size or more, so that the cleanliness of the water returned to the cleaning tank 11 can be maintained well. Filter 2 at this time
The particle size of the fine particles removed in 5 is preferably 0.2 μm or more. Filter 2 for particles less than 0.2 μm
If it is attempted to remove by 5, the filter 25 may become clogged in the circulation pipe 23 and the resistance may increase, which may make it difficult for water to flow. The upper limit of the particle size of the fine particles is not particularly specified, but is usually 100 μm or less. Since most of the particles larger than 100 μm float on the water surface, they can be removed only by immersing the glass substrate 31 in water.
【００３１】さらに、循環配管２３の途中にはフィルタ
ー２５よりも流入管２１側に位置するようにヒーター２
６が連結されている。このヒーター２６は、循環配管２
３内を流れる水を加熱することによって、流入管２１か
ら洗浄槽１１内に所定温度の温水を戻すように機能して
いる。そして、ヒーター２６で加熱しながら水を洗浄槽
１１と循環配管２３との間で循環させることにより、洗
浄槽１１内に貯留された水は一定温度に維持された温水
となり、ガラス基板３１は一定時間、温水で洗浄される
ように構成されている。また、一定時間温水で洗浄され
たガラス基板３１は、ヒーター２６による加熱を停止す
るとともに、前記給水管１２から水が給水され、洗浄槽
１１内の水が入れ替えられることにより、徐冷されるよ
うになっている。Further, in the middle of the circulation pipe 23, the heater 2 is located so as to be located closer to the inflow pipe 21 than the filter 25.
6 are connected. This heater 26 is used for the circulation pipe 2
By heating the water flowing through the inside of the washing tank 3, hot water of a predetermined temperature is returned from the inflow pipe 21 into the washing tank 11. Then, by circulating the water between the cleaning tank 11 and the circulation pipe 23 while being heated by the heater 26, the water stored in the cleaning tank 11 becomes hot water maintained at a constant temperature, and the glass substrate 31 is kept constant. It is configured to be washed with warm water for a time. Further, the glass substrate 31 washed with warm water for a certain period of time is gradually cooled by stopping the heating by the heater 26, supplying water from the water supply pipe 12 and replacing the water in the cleaning tank 11. It has become.
【００３２】前記温水の温度は２０〜７０℃であること
が好ましい。温度を２０℃未満とすると溶融塩が溶けに
くく、洗浄能力が低下するおそれがあり、７０℃より高
くすると、水が蒸発しやすくなり、溶解された溶融塩が
再び析出するおそれがある。また、ガラス基板３１を温
水で洗浄する時間は、３０〜６０分であることが好まし
い。温水で洗浄する時間が３０分未満の場合、付着物を
十分に除去できず、６０分より長く温水で洗浄しても、
ガラス基板３１の清浄度は高まらず、却って一作業当た
りの処理量が減少する。The temperature of the hot water is preferably 20 to 70 ° C. If the temperature is lower than 20 ° C., the molten salt is less likely to be dissolved and the cleaning ability may be deteriorated. If the temperature is higher than 70 ° C., water is likely to be evaporated and the molten salt may be precipitated again. The time for cleaning the glass substrate 31 with warm water is preferably 30 to 60 minutes. If the time of washing with warm water is less than 30 minutes, the adhered substances cannot be removed sufficiently, and even if the washing with warm water is performed for longer than 60 minutes,
The cleanliness of the glass substrate 31 does not increase, and on the contrary, the amount of processing per operation decreases.
【００３３】温水で洗浄している間のポンプ２４による
水の循環量は、洗浄槽１１の容量及び温水による洗浄時
間によって調整され、温水による洗浄時間中に洗浄槽１
１の全ての水が１〜５回循環するように設定することが
好ましい。具体的には１分間当たりの循環量を洗浄槽１
１の容量の２０分の１〜１０分の１とすることが好まし
い。例えば、洗浄槽１１の容量を１．０１５ｍ3、温水
による洗浄時間を４０分とし、４０分間で１．０１５ｍ
3の水を２．４回循環させる場合、１分間当たりの循環
量は、洗浄槽１１の容量の１７分の１である０．０６ｍ
3となる。The amount of water circulated by the pump 24 during washing with warm water is adjusted by the capacity of the washing tank 11 and the washing time with hot water, and the washing tank 1 is washed during the washing time with warm water.
It is preferable to set such that all water of 1 circulates 1 to 5 times. Specifically, the circulating amount per minute is the cleaning tank 1
It is preferable to set the volume to 1/20 to 1/10. For example, the washing tank 11 has a capacity of 1.015 m 3 , the washing time with warm water is 40 minutes, and 40 minutes is 1.015 m 3.
When the water of 3 is circulated 2.4 times, the circulation amount per minute is one-seventeenth of the capacity of the cleaning tank 11, which is 0.06 m.
It becomes 3 .
【００３４】温水による洗浄時間中における水の循環回
数を１回未満とした場合、水に多量の微粒子が混じり込
み、その洗浄能力を十分に維持することができず、５回
より多くしても、ガラス基板３１の清浄度は高まらず、
却って一作業当たりの処理量が減少する。また、１分間
当たりの循環量を洗浄槽１１の容量の２０分の１未満と
した場合、水が十分に温まらず、十分な洗浄能力を発揮
できないおそれがあり、１０分の１より多くしてもガラ
ス基板３１の清浄度は高まらず、却って一作業当たりの
処理量が減少する。When the number of circulations of water during the washing time with warm water is less than 1, a large amount of fine particles are mixed in the water and the washing ability cannot be sufficiently maintained, and even if it is increased more than 5 times. , The cleanliness of the glass substrate 31 does not increase,
On the contrary, the processing amount per work is reduced. Further, if the circulation amount per minute is less than 1/20 of the capacity of the cleaning tank 11, the water may not be sufficiently warmed and sufficient cleaning performance may not be exhibited. However, the cleanliness of the glass substrate 31 does not increase, and on the contrary, the processing amount per work decreases.
【００３５】次いで、前記洗浄装置の作用について説明
する。さて、図１〜図３に示すような洗浄装置を使用す
るときには、予め２つのドレン管２７が閉塞された状態
でバルブ１３が開放され、給水配管１４から給水管１２
を介して洗浄槽１１内に水が給水される。この給水は、
オーバーフロー部１５から水がオーバーフローするまで
続けられ、その後バルブ１３が閉塞されて洗浄槽１１内
に水が貯留される。この後、ポンプ２４を作動させ、ヒ
ーター２６でこの水を加熱しながら洗浄槽１１内の水を
循環させ、洗浄槽１１内の水を温水とし、その温度を２
０〜７０℃に維持する。Next, the operation of the cleaning device will be described. Now, when using the cleaning apparatus as shown in FIGS. 1 to 3, the valve 13 is opened with the two drain pipes 27 previously closed, and the water supply pipe 14 to the water supply pipe 12 is closed.
Water is supplied into the cleaning tank 11 via the. This water supply is
The operation is continued until the water overflows from the overflow section 15, and then the valve 13 is closed to store the water in the cleaning tank 11. After that, the pump 24 is operated, the water in the cleaning tank 11 is circulated while heating the water by the heater 26, and the water in the cleaning tank 11 is heated to a temperature of 2
Maintain at 0-70 ° C.
【００３６】この状態でホルダー３２及びケージ３３ご
とガラス基板３１を洗浄槽１１内に投入し、温水に浸漬
させる。そして、ガラス基板３１を温水に浸漬させた
後、温水を循環させたまま、ガス供給管１７にエアを供
給し、その孔１７ａからエアを放出させて温水中に泡を
発生させる。In this state, the glass substrate 31 together with the holder 32 and the cage 33 is put into the cleaning tank 11 and immersed in warm water. Then, after immersing the glass substrate 31 in warm water, air is supplied to the gas supply pipe 17 while circulating the warm water, and the air is discharged from the hole 17a to generate bubbles in the warm water.
【００３７】温水中に発生した泡は、温水を攪拌しつ
つ、このまま水面に向かって移動する。このとき、ガラ
ス基板３１に泡が接触される。ガラス基板３１に接触し
た泡は、温水に浸漬されることによってガラス基板３１
の表面に対する親和力が低減された付着物に物理的外力
を与える。すると、その物理的外力により、ガラス基板
３１の表面に対する付着物の親和力が消滅し、付着物が
ガラス基板３１の表面から遊離される。遊離された付着
物のうち、溶融塩はそのまま温水に溶解し、微粒子は泡
内に取り込まれたり、温水中に分散されたり等する。The bubbles generated in the warm water move toward the water surface as they are while stirring the warm water. At this time, bubbles contact the glass substrate 31. The bubbles that have come into contact with the glass substrate 31 are immersed in warm water to form the glass substrate 31.
A physical external force is applied to the deposit with a reduced affinity for the surface of. Then, due to the physical external force, the affinity of the deposit for the surface of the glass substrate 31 disappears, and the deposit is released from the surface of the glass substrate 31. Among the liberated deposits, the molten salt is dissolved in the hot water as it is, and the fine particles are taken into the bubbles or dispersed in the hot water.
【００３８】ガラス基板３１の表面では、溶融塩が溶解
した温水が泡の移動に伴ってガラス基板３１の表面から
水面に向かって押し上げられることにより、液交換が常
に行われる。また、溶融塩が溶解した温水は水面まで達
すると、そのまま洗浄槽１１内の温水中に均一に拡散さ
れる。このため、ガラス基板３１の近傍と、その他の箇
所とで温水に対する溶融塩の溶解度に大きな差を生じる
ことがなく、洗浄槽１１内の温水全体で溶融塩の溶解度
は均一となり、その洗浄能力が十分に維持される。On the surface of the glass substrate 31, the hot water in which the molten salt is dissolved is pushed up from the surface of the glass substrate 31 toward the water surface as the bubbles move, so that liquid exchange is always performed. Further, when the hot water in which the molten salt is dissolved reaches the water surface, it is uniformly dispersed in the hot water in the washing tank 11 as it is. Therefore, there is no great difference in the solubility of the molten salt with respect to the hot water between the vicinity of the glass substrate 31 and other places, the solubility of the molten salt is uniform throughout the hot water in the cleaning tank 11, and the cleaning ability is high. Well maintained.
【００３９】微粒子が分散された温水は、溶融塩が溶解
した温水と同様に泡の移動に伴ってガラス基板３１の表
面から水面に向かって押し上げられ、水面まで達すると
そのまま洗浄槽１１内の温水中に均一に分散される。ま
た、温水中に均一に分散された微粒子のうち粒径が０．
３μｍ以上のものは、温水が循環配管２３内を流れると
きにフィルター２５で除去され、ガラス基板３１の表面
に再付着することを防止される。The hot water in which the fine particles are dispersed is pushed up from the surface of the glass substrate 31 toward the water surface along with the movement of bubbles in the same manner as the hot water in which the molten salt is dissolved. Evenly dispersed throughout. In addition, among the fine particles uniformly dispersed in warm water, the particle size is 0.
Those having a thickness of 3 μm or more are removed by the filter 25 when the hot water flows through the circulation pipe 23, and are prevented from reattaching to the surface of the glass substrate 31.
【００４０】ガラス基板３１を温水で一定時間洗浄した
後、ヒーター２６による水の加熱が停止され、ポンプ２
４による循環と、ガス供給管１７からのエアの放出は継
続されたまま、給水管１２から常温の水が給水される。
すると、温水は溶融塩が溶解され、微粒子が分散された
ままの状態で、その大半がオーバーフロー部１５からオ
ーバーフローされ、洗浄槽１１から外部に排水される。
その後、洗浄槽１１内の温水が常温の水へと入れ替わる
までガラス基板３１が徐冷される。そして、ガラス基板
３１が徐冷された後、給水管１２からの給水、ポンプ２
４による循環及びガス供給管１７からのエアの放出が停
止され、ガラス基板３１がケージ３３ごと洗浄槽１１内
から引きあげられ、次工程へと搬送される。また、洗浄
槽１１内の水は、ガラス基板３１が洗浄槽１１内から引
きあげられた後、両ドレン管２７が開放されて排水され
る。After the glass substrate 31 is washed with warm water for a certain period of time, the heating of the water by the heater 26 is stopped and the pump 2
Water at room temperature is supplied from the water supply pipe 12 while the circulation by 4 and the release of air from the gas supply pipe 17 are continued.
Then, the molten salt is dissolved in the hot water, and most of the hot water is overflowed from the overflow section 15 and discharged from the cleaning tank 11 to the outside in a state where the fine particles remain dispersed.
After that, the glass substrate 31 is gradually cooled until the hot water in the cleaning tank 11 is replaced with water at room temperature. Then, after the glass substrate 31 is gradually cooled, water is supplied from the water supply pipe 12 and the pump 2
The circulation by 4 and the discharge of air from the gas supply pipe 17 are stopped, and the glass substrate 31 together with the cage 33 is lifted from the cleaning tank 11 and conveyed to the next step. The water in the cleaning tank 11 is drained after the glass substrate 31 is pulled out from the cleaning tank 11 and the drain pipes 27 are opened.
【００４１】前記の実施形態によって発揮される効果に
ついて、以下に記載する。
・ 実施形態の洗浄装置によれば、洗浄槽１１内に貯留
された水中に泡を発生させ、この泡により水を攪拌する
とともに、泡をガラス基板３１に接触させて付着物を除
去している。このため、洗浄槽１１内に貯留された水全
体に付着物を均一に分散又は溶解させて十分な洗浄能力
を維持することができ、付着物の再付着を抑制すること
ができる、加えて、従来例で挙げた超音波とは異なり、
泡は洗浄槽１１内の全体に均一に広がり、ガラス基板３
１にほぼ確実に接触されるため、付着物の洗い残しがな
く、一作業当たりの処理量の向上を図ることができる。The effects exhibited by the above embodiment will be described below. -According to the cleaning apparatus of the embodiment, bubbles are generated in the water stored in the cleaning tank 11, and the bubbles are agitated to bring the bubbles into contact with the glass substrate 31 to remove the deposits. . Therefore, it is possible to uniformly disperse or dissolve the deposits in the entire water stored in the cleaning tank 11 and maintain a sufficient cleaning ability, and it is possible to suppress the reattachment of the deposits. Unlike the ultrasonic waves mentioned in the conventional example,
The bubbles spread evenly throughout the cleaning tank 11, and the glass substrate 3
Since it is almost certainly brought into contact with No. 1, there is no unwashed residue left, and the amount of treatment per operation can be improved.
【００４２】・ また、洗浄槽１１内に貯留された水を
ヒーター２６で加熱しながらポンプ２４を用いて循環さ
せることにより、洗浄槽１１内の水を一定温度に維持す
ることができ、付着物に対する水の洗浄能力を良好に維
持することができる。In addition, by circulating the water stored in the cleaning tank 11 with the heater 26 while circulating the water stored in the cleaning tank 11, the water in the cleaning tank 11 can be maintained at a constant temperature. It is possible to maintain good water cleaning ability for the.
【００４３】・ さらに、循環配管２３にフィルターを
連結し、水中に存在する微粒子を除去するように構成し
たことにより、ガラス基板３１に対する付着物の再付着
をより効果的に抑制することができる。Further, since the filter is connected to the circulation pipe 23 to remove the fine particles existing in the water, it is possible to more effectively suppress the reattachment of the deposit on the glass substrate 31.
【００４４】・ さらにまた、泡の径を１〜４０ｍｍと
したことにより、ガラス基板３１の損傷を抑制しつつ、
付着物の除去及び水の攪拌をより良好に行うことができ
る。なお、本実施形態は、次のように変更して具体化す
ることも可能である。Furthermore, by controlling the diameter of the bubbles to be 1 to 40 mm, while suppressing damage to the glass substrate 31,
It is possible to better remove the deposits and stir the water. The present embodiment may be modified and embodied as follows.
【００４５】・ 例えば、洗浄槽１１の両側壁内面にガ
ス供給管１７をそれぞれ敷設し、下方に加えて側方から
もガラス基板３１に泡を接触させるように構成してもよ
い。このように構成した場合、水をより効率よく攪拌す
ることができる。For example, the gas supply pipes 17 may be laid on the inner surfaces of both side walls of the cleaning tank 11, and bubbles may be brought into contact with the glass substrate 31 not only from below but also from the side. With this configuration, water can be stirred more efficiently.
【００４６】・ 洗浄槽１１内に温水がある程度貯留さ
れた状態であれば、給水管１２から水を給水しつつ、ヒ
ーター２６で循環される水を加熱しながら洗浄を行って
もよい。このように構成した場合、給水管１２から水を
給水した分だけ洗浄槽１１内の付着物が溶解又は分散さ
れた温水がオーバーフロー部１５から排水されるため、
洗浄槽１１内の水の清浄度を高めることができる。As long as warm water is stored in the cleaning tank 11 to some extent, the water may be supplied from the water supply pipe 12 and the water circulated by the heater 26 may be heated for cleaning. In the case of such a configuration, hot water in which the deposits in the cleaning tank 11 are dissolved or dispersed is discharged from the overflow portion 15 by the amount of water supplied from the water supply pipe 12,
The cleanliness of the water in the cleaning tank 11 can be improved.
【００４７】・ ヒーター２６を省略し、給水管１２か
ら温水を給水してもよい。
・ 洗浄槽１１内の洗浄液にガラス基板３１が浸漬され
た状態で、同ガラス基板３１に超音波を照射するように
構成してもよい。このように構成した場合、超音波によ
る振動でガラス基板の表面の付着物を粉砕することが可
能であり、超音波と泡の相乗効果により、ガラス基板３
１の表面の清浄度をより良好なものとすることができ
る。The heater 26 may be omitted and hot water may be supplied from the water supply pipe 12. The glass substrate 31 may be irradiated with ultrasonic waves in a state where the glass substrate 31 is immersed in the cleaning liquid in the cleaning tank 11. With such a configuration, it is possible to crush the adhered substances on the surface of the glass substrate by vibration of ultrasonic waves, and the synergistic effect of ultrasonic waves and bubbles makes the glass substrate 3
The cleanliness of the surface of No. 1 can be made better.
【００４８】さらに、前記実施形態より把握できる技術
的思想について以下に記載する。
・ 請求項１から請求項４のいずれかに記載の情報記録
媒体用ガラス基板の洗浄装置による洗浄方法であって、
上面に開口部を有する略四角箱状をなす洗浄槽内にガラ
ス基板の表面に対する付着物の親和力を低減させる洗浄
液を貯留し、該洗浄液にガラス基板を浸漬させるととも
に、洗浄槽内にガスを放出して泡を発生させ、同泡が洗
浄液中を移動して当該洗浄液を攪拌しながらガラス基板
に接触して当該ガラス基板の表面の付着物を除去する情
報記録媒体用ガラス基板の洗浄方法。このように構成し
た場合、洗浄槽内に貯留された洗浄液全体に付着物を均
一に分散又は溶解させて十分な洗浄能力を維持すること
ができ、付着物の再付着を抑制することができるととも
に、一作業当たりの処理量の向上を図ることができる。Further, the technical idea which can be understood from the above embodiment will be described below. A method for cleaning a glass substrate for an information recording medium according to any one of claims 1 to 4, comprising:
A cleaning solution that reduces the affinity of adhered substances to the surface of the glass substrate is stored in a cleaning tank that has an approximately square box shape with an opening on the top surface, and the glass substrate is immersed in the cleaning solution and gas is released into the cleaning tank. A method for cleaning a glass substrate for an information recording medium, wherein bubbles are generated, the bubbles move in a cleaning liquid, and the cleaning liquid is stirred to come into contact with the glass substrate to remove deposits on the surface of the glass substrate. When configured in this way, it is possible to uniformly disperse or dissolve the adherent in the entire cleaning liquid stored in the cleaning tank, maintain a sufficient cleaning ability, and prevent reattachment of the adherent. It is possible to improve the processing amount per work.
【００４９】・ 前記ヒーターで洗浄槽内に戻される洗
浄液を加熱することによって洗浄槽内の洗浄液を２０〜
７０℃で一定の温度に維持することを特徴とする請求項
２から請求項４のいずれかに記載の情報記録媒体用ガラ
ス基板の洗浄装置。このように構成した場合、洗浄液の
付着物に対する洗浄能力を良好に維持することができ
る。By heating the cleaning liquid returned to the cleaning tank with the heater, the cleaning liquid in the cleaning tank is heated to 20 to 20%.
The apparatus for cleaning a glass substrate for an information recording medium according to any one of claims 2 to 4, wherein the apparatus is maintained at a constant temperature of 70 ° C. With this configuration, it is possible to favorably maintain the cleaning ability for the cleaning liquid to adhere to the cleaning liquid.
【００５０】・ 前記フィルターで粒径０．２μｍ以上
の微粒子を除去することを特徴とする請求項３又は請求
項４に記載の情報記録媒体用ガラス基板の洗浄装置。こ
のように構成した場合、除去され、洗浄液中に分散され
た微粒子がガラス基板に再付着することを防止すること
ができる。The apparatus for cleaning a glass substrate for an information recording medium according to claim 3 or 4, wherein fine particles having a particle diameter of 0.2 μm or more are removed by the filter. With this configuration, it is possible to prevent the fine particles that have been removed and dispersed in the cleaning liquid from reattaching to the glass substrate.
【００５１】・ 前記ガス供給管には１分間当たり３万
〜１１万ｃｍ3のエアを供給することを特徴とする請求
項１から請求項４のいずれかに記載の情報記録媒体用ガ
ラス基板の洗浄装置。このように構成した場合、ガラス
基板の損傷を抑制しつつ、洗浄液中に十分な量の泡を発
生させることができる。The glass substrate for an information recording medium according to any one of claims 1 to 4, wherein air of 30,000 to 110,000 cm 3 is supplied to the gas supply pipe per minute. Cleaning device. With such a configuration, it is possible to generate a sufficient amount of bubbles in the cleaning liquid while suppressing damage to the glass substrate.
【００５２】・ 前記ガス供給管にフィルターを接続
し、当該フィルターにより、ガス供給管に供給されるエ
ア中から粒径が０．３μｍ以上の微粒子を除去すること
を特徴とする請求項１から請求項４のいずれかに記載の
情報記録媒体用ガラス基板の洗浄装置。このように構成
した場合、泡を発生させるエア中に混じり込んだ微粒子
がガラス基板に付着することを防止することができる。A filter is connected to the gas supply pipe, and the filter removes fine particles having a particle size of 0.3 μm or more from the air supplied to the gas supply pipe. Item 5. A cleaning device for a glass substrate for an information recording medium according to any one of items 4. With this configuration, it is possible to prevent the fine particles mixed in the air that generates bubbles from adhering to the glass substrate.
【００５３】・ 前記ポンプによる洗浄液の１分間当た
りの循環量が洗浄槽の容量の２０分の１〜１０分の１で
あることを特徴とする請求項２から請求項４のいずれか
に記載の情報記録媒体用ガラス基板の洗浄装置。このよ
うに構成した場合、洗浄液がその洗浄能力を十分に発揮
することができる。The circulation amount of the cleaning liquid per minute by the pump is 1/20 to 1/10 of the capacity of the cleaning tank, according to any one of claims 2 to 4. Cleaning device for glass substrates for information recording media. When configured in this manner, the cleaning liquid can sufficiently exert its cleaning ability.
【００５４】[0054]
【発明の効果】以上詳述したように、この発明によれ
ば、次のような効果を奏する。請求項１に記載の情報記
録媒体用ガラス基板の洗浄装置の発明によれば、洗浄槽
内に貯留された洗浄液全体に付着物を均一に分散又は溶
解させて十分な洗浄能力を維持することができ、付着物
の再付着を抑制することができるとともに、一作業当た
りの処理量の向上を図ることができる。As described in detail above, the present invention has the following effects. According to the invention of the cleaning device for a glass substrate for an information recording medium described in claim 1, it is possible to uniformly disperse or dissolve the adherent in the entire cleaning liquid stored in the cleaning tank to maintain a sufficient cleaning ability. Therefore, it is possible to suppress the re-adhesion of the adhered matter, and it is possible to improve the processing amount per work.
【００５５】請求項２に記載の情報記録媒体用ガラス基
板の洗浄装置の発明によれば、請求項１に記載の発明の
効果に加えて、付着物に対する水の洗浄能力を良好に維
持することができる。According to the invention of the apparatus for cleaning a glass substrate for an information recording medium described in claim 2, in addition to the effect of the invention described in claim 1, it is possible to maintain a good ability of cleaning water with respect to adhered substances. You can
【００５６】請求項３に記載の情報記録媒体用ガラス基
板の洗浄装置の発明によれば、請求項２に記載の発明の
効果に加えて、ガラス基板に対する付着物の再付着をよ
り効果的に抑制することができる。According to the invention of the cleaning device for a glass substrate for an information recording medium described in claim 3, in addition to the effect of the invention described in claim 2, the reattachment of the deposit on the glass substrate can be made more effective. Can be suppressed.
【００５７】請求項４に記載の情報記録媒体用ガラス基
板の洗浄装置の発明によれば、請求項１から請求項３の
いずれかに記載の発明の効果に加えて、ガラス基板の損
傷を抑制しつつ、付着物の除去及び水の攪拌をより良好
に行うことができる。According to the invention of the cleaning device for a glass substrate for an information recording medium described in claim 4, in addition to the effect of the invention described in any one of claims 1 to 3, damage to the glass substrate is suppressed. At the same time, it is possible to more effectively remove the deposits and stir the water.
【図１】 実施形態の洗浄装置を示す正断面図。FIG. 1 is a front cross-sectional view showing a cleaning device according to an embodiment.
【図２】 実施形態の洗浄装置を示す側断面図。FIG. 2 is a side sectional view showing the cleaning device according to the embodiment.
【図３】 実施形態の洗浄装置を示す平面図。FIG. 3 is a plan view showing a cleaning device according to an embodiment.
１１…洗浄槽、１１ａ…開口部、１７…ガス供給管、１
９…流出口、２２…流入口、２３…循環配管、２４…ポ
ンプ、２５…フィルター、２６…ヒーター、３１…ガラ
ス基板。11 ... Cleaning tank, 11a ... Opening part, 17 ... Gas supply pipe, 1
9 ... Outflow port, 22 ... Inflow port, 23 ... Circulation piping, 24 ... Pump, 25 ... Filter, 26 ... Heater, 31 ... Glass substrate.
Claims (4)
ガラス基板を浸漬して化学強化処理を施した後、当該ガ
ラス基板の表面に付着した付着物を洗浄して除去するた
めの情報記録媒体用ガラス基板の洗浄装置であって、 上面に開口部を有する略四角箱状をなし、内部には前記
ガラス基板の表面に対する付着物の親和力を低減させる
洗浄液が貯留され、同洗浄液にガラス基板を浸漬させた
状態でその内部に収容するための洗浄槽と、当該洗浄槽
の内底面上に配設され、洗浄槽内にガスを放出して貯留
された洗浄液中に泡を発生させるためのガス供給管とを
備え、前記洗浄液にガラス基板が浸漬された状態で洗浄
液中に泡を発生させることにより、同泡が洗浄液中を移
動して当該洗浄液を攪拌しながらガラス基板の表面に接
触して付着物を除去するように構成することを特徴とす
る情報記録媒体用ガラス基板の洗浄装置。1. An information recording for removing a deposit adhered to a surface of a glass substrate by immersing the glass substrate having a disk shape in a heated chemical strengthening treatment liquid to perform the chemical strengthening treatment. A cleaning device for a glass substrate for a medium, which has a substantially rectangular box shape having an opening on an upper surface, and a cleaning liquid for reducing the affinity of adhered substances to the surface of the glass substrate is stored inside, and the cleaning liquid is used for the glass substrate. Is placed on the inner bottom surface of the cleaning tank for accommodating the inside of the cleaning tank in a dipped state, and for generating bubbles in the cleaning liquid stored by discharging gas into the cleaning tank. A gas supply pipe is provided, and bubbles are generated in the cleaning liquid in a state where the glass substrate is immersed in the cleaning liquid, the bubbles move in the cleaning liquid and contact the surface of the glass substrate while stirring the cleaning liquid. To remove deposits Cleaning apparatus for a glass substrate for an information recording medium, characterized in that configured in so that.
口をそれぞれ設け、これら流入口と流出口との間を循環
配管で接続し、同循環配管にポンプを連結して洗浄槽内
の洗浄液を流出口から吸い込み、循環配管を介して流入
口から洗浄槽内に戻すように構成するとともに、当該循
環配管にヒーターを連結し、同ヒーターで循環配管内を
流れる洗浄液を加熱して洗浄槽内に戻すように構成する
ことを特徴とする請求項１に記載の情報記録媒体用ガラ
ス基板の洗浄装置。2. The cleaning tank is provided with an inflow port and an outflow port for a cleaning liquid, and the inflow port and the outflow port are connected by a circulation pipe, and a pump is connected to the circulation pipe to connect the cleaning pipe to the inside of the cleaning bath. The cleaning liquid is sucked from the outflow port and is returned from the inflow port to the inside of the cleaning tank via the circulation pipe.A heater is connected to the circulation pipe, and the cleaning liquid flowing in the circulation pipe is heated by the heater to wash the cleaning tank. The apparatus for cleaning a glass substrate for an information recording medium according to claim 1, wherein the cleaning apparatus is configured to return the inside.
同フィルターで洗浄槽内に戻される洗浄液中に存在する
一定以上の粒径の微粒子を除去することを特徴とする請
求項２に記載の情報記録媒体用ガラス基板の洗浄装置。3. A filter is connected to the circulation pipe,
The apparatus for cleaning a glass substrate for an information recording medium according to claim 2, wherein the filter removes fine particles having a particle diameter of a predetermined value or more present in the cleaning liquid returned to the cleaning tank.
特徴とする請求項１から請求項３のいずれかに記載の情
報記録媒体用ガラス基板の洗浄装置。4. The apparatus for cleaning a glass substrate for an information recording medium according to claim 1, wherein the bubble has a diameter of 1 to 40 mm.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001335197A JP3950319B2 (en) | 2001-10-31 | 2001-10-31 | Method for cleaning glass substrate for information recording medium, method for producing glass substrate for information recording medium, and method for producing information recording medium |
| MYPI20024043A MY130390A (en) | 2001-10-31 | 2002-10-29 | Apparatus for cleaning glass substrate for use in information recording medium |
| US10/284,815 US20030079759A1 (en) | 2001-10-31 | 2002-10-31 | Apparatus for cleaning glass substrate for use in information recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001335197A JP3950319B2 (en) | 2001-10-31 | 2001-10-31 | Method for cleaning glass substrate for information recording medium, method for producing glass substrate for information recording medium, and method for producing information recording medium |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003137608A true JP2003137608A (en) | 2003-05-14 |
| JP2003137608A5 JP2003137608A5 (en) | 2005-06-23 |
| JP3950319B2 JP3950319B2 (en) | 2007-08-01 |
Family
ID=19150210
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001335197A Expired - Fee Related JP3950319B2 (en) | 2001-10-31 | 2001-10-31 | Method for cleaning glass substrate for information recording medium, method for producing glass substrate for information recording medium, and method for producing information recording medium |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20030079759A1 (en) |
| JP (1) | JP3950319B2 (en) |
| MY (1) | MY130390A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101413626B1 (en) | 2013-12-31 | 2014-08-06 | 김호권 | Manufacturing Apparatus and Process of Glass Plate using Chemical Reinforcement |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009042439A1 (en) * | 2009-09-22 | 2011-03-31 | Gühring Ohg | reclaiming |
| US9433966B2 (en) * | 2014-02-21 | 2016-09-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and system of chemical bath deposition |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4817652A (en) * | 1987-03-26 | 1989-04-04 | Regents Of The University Of Minnesota | System for surface and fluid cleaning |
| SG49584A1 (en) * | 1994-12-28 | 1998-06-15 | Hoya Corp | Plate glass flattening method method of manufacturing an information recording glass substrate using flattened glass method of manufacturing a magnetic |
| US6701941B1 (en) * | 1997-05-09 | 2004-03-09 | Semitool, Inc. | Method for treating the surface of a workpiece |
| US20020066464A1 (en) * | 1997-05-09 | 2002-06-06 | Semitool, Inc. | Processing a workpiece using ozone and sonic energy |
-
2001
- 2001-10-31 JP JP2001335197A patent/JP3950319B2/en not_active Expired - Fee Related
-
2002
- 2002-10-29 MY MYPI20024043A patent/MY130390A/en unknown
- 2002-10-31 US US10/284,815 patent/US20030079759A1/en not_active Abandoned
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101413626B1 (en) | 2013-12-31 | 2014-08-06 | 김호권 | Manufacturing Apparatus and Process of Glass Plate using Chemical Reinforcement |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3950319B2 (en) | 2007-08-01 |
| US20030079759A1 (en) | 2003-05-01 |
| MY130390A (en) | 2007-06-29 |
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