JP2003071255A - Membrane washing apparatus and membrane separation apparatus - Google Patents

Membrane washing apparatus and membrane separation apparatus

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Publication number
JP2003071255A
JP2003071255A JP2001261863A JP2001261863A JP2003071255A JP 2003071255 A JP2003071255 A JP 2003071255A JP 2001261863 A JP2001261863 A JP 2001261863A JP 2001261863 A JP2001261863 A JP 2001261863A JP 2003071255 A JP2003071255 A JP 2003071255A
Authority
JP
Japan
Prior art keywords
membrane
separation
bubbles
plate
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001261863A
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Japanese (ja)
Other versions
JP3643802B2 (en
Inventor
Masanobu Okata
政信 大方
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
Original Assignee
Sumitomo Heavy Industries Ltd
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Filing date
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Priority to JP2001261863A priority Critical patent/JP3643802B2/en
Publication of JP2003071255A publication Critical patent/JP2003071255A/en
Application granted granted Critical
Publication of JP3643802B2 publication Critical patent/JP3643802B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Separation Using Semi-Permeable Membranes (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a membrane washing apparatus capable of sufficiently washing the whole of a membrane surface of a separation membrane and sufficiently recovering a filtration resistance value of the separation membrane as a whole. SOLUTION: A treating apparatus 10 is provided with flapper plate aggregates B1, B2 in which a plurality of flapper plates 6 are provided in parallel and are arranged at a multi-stage between an immersion membrane module 2 installed in a treating tank 1 and a diffuser 50 provided on a bottom part of the treating tank 1. The flapper plates 6 of the flapper plate aggregates B1, B2 form a plate-like shape and are turnably supported to a frame body around a longitudinal axis. An installment angle is adjusted by driving parts 11, 12 and a turning mechanism C. Thereby, a movement direction of bubbles released from a diffusing unit 5 is varied and a feeding of the bubbles to side surfaces 2a, 2b of the membrane can be optionally adjusted.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、被処理液の膜分離
に供される分離膜(ろ過膜)を洗浄するための膜洗浄装
置、及びそれを用いた膜分離装置に関する。
TECHNICAL FIELD The present invention relates to a membrane cleaning apparatus for cleaning a separation membrane (filtration membrane) used for membrane separation of a liquid to be treated, and a membrane separation apparatus using the membrane cleaning apparatus.

【0002】[0002]

【従来の技術】固形物、粒子状物質等を含む被処理液
(水)の浄化処理、種々の固液分離、液液分離等には、
膜分離によるろ過処理が広く用いられており、ろ過精度
(ろ別サイズ)に応じて種々の分離膜が適用される。分
離膜としては、例えば、マイクロフィルトレーション
膜、或いは精密ろ過(MF)膜、限外ろ過(UF)膜、
ナノフィルトレーション(NF)膜、逆浸透(RO)膜
等が挙げられる。これらの分離膜の性状・形状は、用途
に応じて多岐にわたり、特に、大量の被処理液を生物処
理しながら継続的に膜分離するような浄化処理では、例
えば、複数の膜エレメントが集合配置された膜モジュー
ルが多段に設けられることが多い。
2. Description of the Related Art For purification treatment of liquid to be treated (water) containing solid matter, particulate matter, etc., various solid-liquid separation, liquid-liquid separation, etc.
The filtration treatment by membrane separation is widely used, and various separation membranes are applied according to the filtration accuracy (filter size). Examples of the separation membrane include a microfiltration membrane, a microfiltration (MF) membrane, an ultrafiltration (UF) membrane,
Examples include nanofiltration (NF) membranes and reverse osmosis (RO) membranes. The properties and shapes of these separation membranes vary widely depending on the application.In particular, in the purification treatment that continuously performs membrane separation while biologically treating a large amount of liquid to be treated, for example, multiple membrane elements are collectively arranged. In many cases, the integrated membrane module is provided in multiple stages.

【0003】このような膜分離では、その膜分離能つま
りろ過性能を長期にわたって良好に維持すべく、分離膜
表面に付着又は堆積したろ過残渣である固形分等が適宜
洗浄される。近年、浄化処理においては、処理済水(浄
水)水質の更なる向上が望まれている。また、浄水だけ
でなく、精密機器や半導体の製造に用いる洗浄液(水)
に含まれる粒子状物質の更なる低減も切望されている。
このような要求に対し、ろ過精度の高いUF膜、NF
膜、RO膜等のクロスフローろ過が可能な高性能膜が広
く採用され、これに伴い、膜洗浄の重要性が一層高まっ
ている。
In such a membrane separation, in order to maintain the membrane separation ability, that is, the filtration performance in a good condition for a long period of time, the solid matter or the like which is the filtration residue adhered to or deposited on the surface of the separation membrane is appropriately washed. In recent years, in purification treatment, further improvement in the quality of treated water (purified water) is desired. In addition to purified water, cleaning liquid (water) used for manufacturing precision equipment and semiconductors
Further reduction of the particulate matter contained in is also desired.
In response to such requirements, UF membranes and NF with high filtration accuracy
High-performance membranes capable of cross-flow filtration such as membranes and RO membranes have been widely adopted, and along with this, the importance of membrane cleaning is increasing.

【0004】従来、分離膜の洗浄方法としては多くの方
法が実用化或いは提案されており、大別すると; (1)逆洗によりろ過抵抗を回復させる方法、(2)分
離膜表面を界面活性剤等の洗浄液を用いて洗浄する方
法、(3)分離膜の下方より曝気を行って分離膜表面の
付着物又は堆積物を剥離・除去する方法、等が挙げられ
る。
Conventionally, many methods have been put to practical use or proposed as a method for cleaning a separation membrane, which are roughly classified; (1) a method for recovering filtration resistance by backwashing, (2) a surface-active surface of the separation membrane. Examples include a method of cleaning with a cleaning liquid such as an agent, and (3) a method of aerating from below the separation membrane to remove / remove the deposits or deposits on the surface of the separation membrane.

【0005】これらのなかでも、上記(3)に示す曝気
洗浄方法は、好気性雰囲気下で生物処理を行いながら膜
分離を行う処理槽の場合、散気装置を膜洗浄に兼用する
ことができ、しかも、必ずしも薬液が要らないこともあ
り、簡便性及び洗浄性に優れている。一例として、かか
る曝気洗浄を行うための装置が特開平8−281080
号公報に記載されている。これに開示された膜分離装置
においては、散気手段と膜エレメントとの間に、ガイド
板、多孔板等を有する整流手段を設け、噴出されるエア
を膜面に均一に分散させて洗浄効率の向上を図るもので
ある。
Among these, in the aeration cleaning method described in (3) above, in the case of a treatment tank in which membrane separation is performed while biological treatment is performed in an aerobic atmosphere, the aeration device can also be used for membrane cleaning. In addition, since a chemical solution is not always required, it is excellent in simplicity and cleanability. As an example, an apparatus for performing such aeration cleaning is disclosed in Japanese Patent Application Laid-Open No. 8-281080.
It is described in Japanese Patent Publication No. In the membrane separation device disclosed in this, a rectifying means having a guide plate, a perforated plate, etc. is provided between the air diffusing means and the membrane element, and the jetted air is dispersed evenly on the membrane surface to achieve cleaning efficiency. It is intended to improve.

【0006】[0006]

【発明が解決しようとする課題】しかし、本発明者の詳
細な検討によれば、上記従来の曝気洗浄方法及び装置で
は、膜表面の均一な洗浄を必ずしも十分に行い得ないこ
とを見出した。これは、洗浄用エアの気泡が膜面に沿っ
て均一に移動(上昇)しない場合があったり、分離膜及
び/又は散気手段に対する整流手段の配置状態によって
は、洗浄用エアの供給が局所的に過剰となったり、或い
は、局所的に不足することによると考えられる。また、
散気手段の散気口が万一目詰まりしたときには、その散
気口に近い部分の分離膜に対する洗浄用エアの供給量が
他の部分に比して減少してしまう。
However, according to the detailed study by the present inventor, it was found that the conventional aeration cleaning method and apparatus described above cannot necessarily sufficiently perform uniform cleaning of the film surface. This is because the bubbles of the cleaning air may not move (rise) uniformly along the membrane surface, or the cleaning air may be locally supplied depending on the arrangement state of the rectifying means with respect to the separation membrane and / or the air diffusing means. It is considered to be due to excessive excess or local shortage. Also,
If the air diffuser of the air diffuser is clogged, the supply amount of the cleaning air to the separation membrane in the portion near the air diffuser will be smaller than that in other portions.

【0007】よって、従来の整流手段を用いた膜洗浄で
は、洗浄用エアの供給が不十分な部分では付着物等の除
去が不完全となる。こうなると、分離膜全体のろ過抵抗
値を所望の値に回復させ難く、特に、ろ過精度の高い分
離膜を用いたときに要求される洗浄効率を達成すること
が困難となってしまう。また、分離膜のろ過抵抗を十分
に回復できないことにより、本来の膜分離性能を長期に
わたって良好に維持できず、膜分離ひいては浄水処理の
効率が低下してしまうおそれがある。
Therefore, in the film cleaning using the conventional rectifying means, the removal of the adhering substances becomes incomplete in the portion where the cleaning air is not sufficiently supplied. In such a case, it is difficult to recover the filtration resistance value of the entire separation membrane to a desired value, and it is particularly difficult to achieve the cleaning efficiency required when using the separation membrane having high filtration accuracy. Further, since the filtration resistance of the separation membrane cannot be sufficiently recovered, the original membrane separation performance cannot be maintained satisfactorily for a long period of time, and the efficiency of the membrane separation and thus the water purification treatment may decrease.

【0008】そこで、本発明は、このような問題点に鑑
みてなされたものであり、分離膜の膜面を全体にわたっ
て十分に洗浄することができ、これにより、分離膜のろ
過抵抗値を全体として十分に回復させることが可能な膜
洗浄装置を提供することを目的とする。また、本発明の
膜洗浄装置を用いることにより、所望の膜分離性能を長
期にわたって良好に維持でき、処理効率の低下を防止で
きる膜分離装置を提供することを目的とする。
Therefore, the present invention has been made in view of such a problem, and the membrane surface of the separation membrane can be sufficiently washed over the entire surface, whereby the filtration resistance value of the separation membrane is reduced. It is an object of the present invention to provide a membrane cleaning device that can be sufficiently recovered. Another object of the present invention is to provide a membrane separation apparatus which can maintain desired membrane separation performance for a long period of time and can prevent deterioration of treatment efficiency by using the membrane cleaning apparatus of the present invention.

【0009】[0009]

【課題を解決するための手段】上記課題を解決するため
に、本発明による膜洗浄装置は、被処理液が供給される
処理槽に配置された分離膜を洗浄するものであって、分
離膜を有する膜分離部の略下方に配置され気泡を放出す
る散気部と、膜分離部と散気部との間に配置され、その
散気部から放出される気泡の移動方向を任意の方向に変
化させる整流部とを備えることを特徴とする。
In order to solve the above problems, a membrane cleaning apparatus according to the present invention is for cleaning a separation membrane arranged in a treatment tank to which a liquid to be treated is supplied. An air diffuser that is disposed substantially below the membrane separation portion having a bubble and that discharges air bubbles, and is disposed between the membrane separation portion and the air diffuser, and the movement direction of the bubble discharged from the air diffuser is an arbitrary direction. And a rectifying unit that changes the

【0010】このように構成された膜洗浄装置において
は、処理槽内での被処理液の膜分離により膜表面にろ過
残渣が付着した分離膜に対し、その略下方に配置された
散気部から例えば空気等の気泡が放出される。その気泡
は、整流部を通過し、徐々に容積を増大させながら膜面
に達し、膜面上の付着物と接触して剥離・除去する。気
泡は、整流部がないとした場合には、分離膜に向かって
略鉛直上方に移動するのに対し、本発明では、整流部に
よって、その移動方向が所望の方向に任意に変えられ
る。
In the membrane cleaning apparatus thus constructed, the air diffuser located substantially below the separation membrane having the filtration residue attached to the membrane surface due to the membrane separation of the liquid to be treated in the treatment tank. Bubbles such as air are discharged from the air. The bubbles pass through the rectifying unit, reach the film surface while gradually increasing the volume, and come into contact with the deposits on the film surface to be separated and removed. The bubbles move substantially vertically upward toward the separation membrane when there is no rectifying portion, whereas in the present invention, the moving direction is arbitrarily changed by the rectifying portion to a desired direction.

【0011】よって、分離膜への気泡の供給分布を調整
することができると共に、分離膜における付着物の量が
比較的多い部位、或るいは、例えば散気部からの距離が
比較的大きくて付着物が残存し易い部位への気泡の供給
量を増大させるといった調整が可能となる。
Therefore, the distribution of bubbles supplied to the separation membrane can be adjusted, and the distance from the portion where the amount of deposits in the separation membrane is relatively large, or, for example, the diffuser, is relatively large. Adjustments such as increasing the amount of air bubbles supplied to the portion where the adhered matter is likely to remain can be performed.

【0012】より具体的には、整流部が、分離膜と散気
部とを結ぶ仮想軸に対して交差する方向に延在し且つ長
手軸まわりに回動可能な板状部材を有すると好ましい。
More specifically, it is preferable that the rectifying section has a plate-like member extending in a direction intersecting with an imaginary axis connecting the separation membrane and the air diffusing section and rotatable about a longitudinal axis. .

【0013】こうすれば、散気部から放出された気泡が
板状部材をその延在方向(長手軸方向)と交差するよう
に通過する。このとき、板状部材が長手軸まわりに回動
すると、板状部材の設置角度が変化し、気泡の鉛直上方
への移動が制限される。そして、気泡は、板状部材に沿
って流動し、板状部材の設置角度方向に向かって変位す
る。よって、気泡の移動方向を簡便且つ確実に調節制御
できる。なお、板状部材の回動範囲(設置角度の範囲)
は、特に制限されないが、気泡の移動を過度に遮断する
ことなく分離膜へ向かう方向に円滑に散逸させ易く、且
つ、気泡の移動方向の調整範囲を十分に広く確保できる
観点から、例えば、鉛直方向に対して好ましくは±60
°以下、より好ましくは±45°以下であると好適であ
る。
With this configuration, the bubbles emitted from the air diffuser pass through the plate-shaped member so as to intersect the extending direction (longitudinal axis direction) thereof. At this time, when the plate-shaped member rotates about the longitudinal axis, the installation angle of the plate-shaped member changes, and the movement of bubbles upward in the vertical direction is restricted. Then, the bubbles flow along the plate-shaped member and are displaced in the installation angle direction of the plate-shaped member. Therefore, the moving direction of the bubbles can be simply and reliably adjusted and controlled. The rotation range of the plate-shaped member (range of installation angle)
Is not particularly limited, but from the viewpoint of facilitating smooth dissipation of bubbles in the direction toward the separation membrane without excessively blocking them and ensuring a sufficiently wide adjustment range of the bubbles moving direction, for example, vertical ± 60 relative to the direction
It is preferable that the angle is less than or equal to °, more preferably ± 45 °.

【0014】また、整流部は、板状部材の端部を支持す
る支持体を有しており、板状部材がその端部を支点とし
て回動されるものであるとより好ましい。こうすれば、
板状部材がその長手軸に対して円滑に回動される。ま
た、板状部材の両端部間に回動機構を設ける必要がない
ので、気泡の移動が不都合に妨害されることを防止でき
る。
Further, it is more preferable that the rectifying portion has a support for supporting the end portion of the plate member, and that the plate member is rotated around the end portion as a fulcrum. This way
The plate member is smoothly rotated about its longitudinal axis. Further, since it is not necessary to provide a rotating mechanism between both ends of the plate member, it is possible to prevent the movement of bubbles from being undesirably obstructed.

【0015】さらに、整流部は、多段に配置され且つ複
数の板状部材が並設されて成る複数の集合体を有してお
り、各集合体を構成する板状部材が集合体ごとに互いに
異なる方向に延在するように設けられていると好適であ
る。
Further, the rectifying section has a plurality of aggregates which are arranged in multiple stages and in which a plurality of plate-like members are arranged side by side, and the plate-like members constituting each aggregate are mutually arranged for each aggregate. It is preferable that they are provided so as to extend in different directions.

【0016】このように構成すれば、散気部から放出さ
れた気泡は、多段に構成された各集合体を順次通過して
分離膜の膜面に到達する。このとき、気泡は、各集合体
に並設された複数の板状部材の間隙を板面に沿って通過
し、板状部材が長手軸まわりに回動されると各集合体を
通過する毎にその移動方向が変化する。しかも、各集合
体が、各々を構成する板状部材の延在方向が異なるよう
に配置されるので、気泡の移動をより広範に変化させる
ことができる。よって、気泡の移動方向の調整範囲が一
層拡大され、膜面洗浄の均一性及び洗浄部位の選択制御
性が共に向上される。より具体的な集合体の構成として
は、例えば、枠体の内側に、複数の板状部材がそれぞれ
の両端部で回動可能に固定されるといった構成を例示で
きる。
According to this structure, the bubbles discharged from the air diffuser sequentially pass through the aggregates formed in multiple stages and reach the membrane surface of the separation membrane. At this time, the bubbles pass through the gaps between the plurality of plate-shaped members arranged in parallel in each assembly along the plate surface, and each time when the plate-shaped members rotate about the longitudinal axis, they pass through each assembly. The direction of movement changes. Moreover, since the respective aggregates are arranged so that the extending directions of the plate-shaped members forming the respective aggregates are different, the movement of the bubbles can be changed in a wider range. Therefore, the adjustment range of the moving direction of the bubbles is further expanded, and the uniformity of the cleaning of the film surface and the controllability of the cleaning site are both improved. As a more specific configuration of the aggregate, for example, a configuration in which a plurality of plate-shaped members are rotatably fixed at both ends of the frame body can be exemplified.

【0017】また、本発明による膜分離装置は、本発明
の膜洗浄装置を用いて膜分離及び膜洗浄の高度化を有効
に図るためのものであり、被処理液が供給される処理槽
と、その処理槽内に配置されて被処理液をろ過する分離
膜を有する膜分離部と、上述した本発明による膜洗浄装
置とを備えることを特徴とする。
Further, the membrane separation apparatus according to the present invention is intended to effectively enhance the sophistication of membrane separation and membrane cleaning using the membrane cleaning apparatus of the present invention. And a membrane separation unit having a separation membrane arranged in the treatment tank for filtering the liquid to be treated, and the membrane cleaning apparatus according to the present invention described above.

【0018】[0018]

【発明の実施の形態】以下、本発明の実施形態について
詳細に説明する。なお、同一の要素には同一の符号を付
し、重複する説明を省略する。また、上下左右等の位置
関係は、特に断らない限り、図面に示す位置関係に基づ
くものとする。また、図面の寸法比率は、図示の比率に
限られるものではない。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below. The same elements will be denoted by the same reference symbols, without redundant description. Further, the positional relationship such as up, down, left and right is based on the positional relationship shown in the drawings unless otherwise specified. The dimensional ratios in the drawings are not limited to the illustrated ratios.

【0019】図1は、本発明による膜洗浄装置を備える
膜分離装置の好適な一実施形態の構成を模式的に示す正
面断面図であり、図2は同側面断面図である。処理装置
10は、被処理液L0の生物処理と膜分離を並行して実
施するための浸漬型膜分離装置であり、処理槽1内に、
分離膜としての浸漬平膜を複数有する浸漬膜モジュール
2(膜分離部)が設けられたものである。この浸漬膜モ
ジュール2は、処理槽1の外部に設けられたろ過ポンプ
3に接続されている。また、処理槽1の底部には、送風
機4に接続された散気ユニット5が所定間隔で複数配置
された散気装置50(散気部)を装備している。
FIG. 1 is a front sectional view schematically showing the configuration of a preferred embodiment of a membrane separation apparatus equipped with a membrane cleaning apparatus according to the present invention, and FIG. 2 is a side sectional view thereof. The treatment device 10 is an immersion type membrane separation device for carrying out biological treatment and membrane separation of the liquid L0 to be treated in parallel, and
An immersion membrane module 2 (membrane separation unit) having a plurality of immersion flat membranes as separation membranes is provided. The submerged membrane module 2 is connected to a filtration pump 3 provided outside the processing tank 1. Further, the bottom of the processing tank 1 is equipped with an air diffuser 50 (air diffuser) in which a plurality of air diffuser units 5 connected to the blower 4 are arranged at predetermined intervals.

【0020】さらに、浸漬膜モジュール2と散気装置5
0との間には、長冊平板状を成す複数のフラッパー板6
(板状部材)が浸漬平膜の配列方向と同方向に所定間隔
で並設されたフラッパー板集合体B1(集合体)が設け
られている。すなわち、フラッパー板6は、浸漬膜モジ
ュール2と散気装置50とを結ぶ仮想軸(鉛直方向)に
対して交差する方向(水平方向)に延在するように設置
されている。
Furthermore, the submerged membrane module 2 and the air diffuser 5
Between 0 and a plurality of flapper plates 6 in the form of a strip plate
A flapper plate assembly B1 (assembly) in which (plate-shaped members) are arranged in parallel in the same direction as the arrangement direction of the immersion flat membranes at a predetermined interval is provided. That is, the flapper plate 6 is installed so as to extend in a direction (horizontal direction) intersecting a virtual axis (vertical direction) that connects the submerged membrane module 2 and the air diffuser 50.

【0021】また、各フラッパー板6は、方形状の枠体
(支持体)に、長手軸(つまり水平方向)まわりに回動
可能なように両端部で支持されており、それらの各支持
部には回動機構Cが設けられ、それら回動機構Cが処理
槽1の外部に設けられた駆動部11に接続されている。
この駆動部11の運転により、回動機構Cを介してフラ
ッパー板6が回動され、設置角度が調整されるようにな
っている。
Further, each flapper plate 6 is supported at both ends by a rectangular frame (support) so as to be rotatable around a longitudinal axis (that is, a horizontal direction), and the respective support parts thereof are supported. The rotating mechanism C is provided in the container 1, and the rotating mechanism C is connected to the drive unit 11 provided outside the processing tank 1.
By operating the drive unit 11, the flapper plate 6 is rotated via the rotation mechanism C, and the installation angle is adjusted.

【0022】さらに、フラッパー板集合体B1と散気装
置50との間には、フラッパー板集合体B2(集合体)
がフラッパー板集合体B1と略平行に設置されている。
フラッパー板集合体B2は、フラッパー板6の延在方向
がフラッパー板集合体B1のフラッパー板6と略直交す
るように配置されたこと以外は、フラッパー板集合体B
1と同様に構成されたものであり、各フラッパー板6に
結合している回動機構Cが駆動部12に接続されてい
る。
Further, a flapper plate assembly B2 (aggregate) is provided between the flapper plate assembly B1 and the air diffuser 50.
Are installed substantially parallel to the flapper plate assembly B1.
The flapper plate assembly B2 is arranged so that the extending direction of the flapper plate 6 is substantially perpendicular to the flapper plate 6 of the flapper plate assembly B1.
The rotation mechanism C is connected to the drive unit 12 and is configured in the same manner as 1.

【0023】ここで、図3は、フラッパー板集合体B
1,B2の配置関係を摸式的に示す斜視図である。フラ
ッパー板集合体B1,B2は、多段に配置されており、
両者から整流部が構成されている。また、この整流部と
散気装置50とから本発明の膜洗浄装置が構成されてい
る。
Here, FIG. 3 shows a flapper plate assembly B.
It is a perspective view which shows the arrangement | positioning relationship of 1 and B2 typically. The flapper plate assemblies B1 and B2 are arranged in multiple stages,
A rectifying section is composed of both. Further, the rectification unit and the air diffuser 50 constitute the membrane cleaning apparatus of the present invention.

【0024】このように構成された処理装置10では、
被処理液L0が処理槽1に導入され、散気装置50から
の空気の供給によって例えば微生物菌体を含む活性汚泥
による好気性処理が行われる。それと共に、ろ過ポンプ
3が運転され、汚泥や他の固形分と処理済液L1とが浸
漬膜モジュール2によって連続的又は断続的にろ別され
る。処理槽1の外部へ排出された処理済液L1は、必要
に応じて他の処理が施され得る。
In the processing apparatus 10 thus constructed,
The liquid L0 to be treated is introduced into the treatment tank 1, and air is supplied from the air diffuser 50 to perform aerobic treatment with activated sludge containing, for example, microbial cells. At the same time, the filtration pump 3 is operated, and sludge and other solids and the treated liquid L1 are filtered by the submerged membrane module 2 continuously or intermittently. The treated liquid L1 discharged to the outside of the treatment tank 1 may be subjected to another treatment as necessary.

【0025】このとき、膜分離に伴って浸漬膜モジュー
ル2の浸漬平膜の表面には、ろ過残渣である固形分等が
付着・堆積するが、散気装置50からの曝気によって、
かかる付着物が除去され、浸漬平膜の洗浄が被処理液L
0の生物処理と同時に行われる。図4〜6は、処理装置
10を用いて被処理液L0の生物処理を行いながら浸漬
平膜の洗浄を行っている状態を模式的に示す断面図であ
る。
At this time, solid contents such as filtration residue adhere to and deposit on the surface of the submerged flat membrane of the submerged membrane module 2 due to the membrane separation, but by the aeration from the air diffuser 50,
Such deposits are removed, and the immersion flat film is washed with the liquid L to be treated.
It is performed at the same time as 0 biological treatment. 4 to 6 are cross-sectional views schematically showing a state in which the immersion flat membrane is washed while biologically treating the liquid L0 to be treated using the treatment device 10.

【0026】図4は、上段のフラッパー板集合体B1を
構成するフラッパー板6が鉛直方向に設定されている場
合の気泡の流れを示している。散気装置50から放出さ
れた微細気泡は、浸漬膜モジュール2へ向かって上昇
し、フラッパー板集合体B2及びB1をその順に通過す
る。この際、フラッパー板集合体B1のフラッパー板6
が鉛直方向を向いているため、気泡は鉛直方向に上昇
し、浸漬膜モジュール2の浸漬平膜表面を掃引するよう
に洗浄が行われる。
FIG. 4 shows the flow of bubbles when the flapper plate 6 constituting the upper flapper plate assembly B1 is set in the vertical direction. The fine bubbles discharged from the air diffuser 50 rise toward the submerged membrane module 2 and pass through the flapper plate assemblies B2 and B1 in that order. At this time, the flapper plate 6 of the flapper plate assembly B1
Are oriented in the vertical direction, the bubbles rise in the vertical direction, and cleaning is performed so as to sweep the surface of the immersion flat membrane of the immersion membrane module 2.

【0027】この場合、フラッパー板6によって気泡の
移動が殆ど妨げられないので、気泡の上昇速度の低下が
抑えられ、洗浄速度が高められる。よって、ろ過抵抗値
が低い場合、すなわち、膜表面へのろ過残渣の付着・堆
積が少ないときに有効であり、また、浸漬平膜の両側面
2a,2bが等価に洗浄される。
In this case, since the movement of the bubbles is hardly hindered by the flapper plate 6, the decrease in the rising speed of the bubbles is suppressed and the cleaning speed is increased. Therefore, it is effective when the filtration resistance value is low, that is, when the adhesion and deposition of the filtration residue on the membrane surface is small, and both side surfaces 2a and 2b of the immersed flat membrane are equivalently cleaned.

【0028】一方、図5及び6は、上段のフラッパー板
集合体B1を構成するフラッパー板6が鉛直方向から所
定の角度傾いて設置されている場合の気泡の流れを示し
ている。フラッパー板6は、所定の設置角度となるよう
に、駆動部11により回動機構Cを介して長手軸まわり
に回動され、その位置で固定される。
On the other hand, FIGS. 5 and 6 show the flow of bubbles when the flapper plate 6 constituting the upper flapper plate assembly B1 is installed at a predetermined angle with respect to the vertical direction. The flapper plate 6 is rotated about the longitudinal axis by the drive unit 11 via the rotation mechanism C so as to have a predetermined installation angle, and is fixed at that position.

【0029】この場合、散気装置50から放出された微
細気泡がフラッパー板集合体B1に達すると、気泡は、
フラッパー板6によって進路が制限され、フラッパー板
6に沿ってその傾斜方向へ上昇する。これにより、気泡
の移動方向が変化し、図5に示す状態では、浸漬平膜の
側面2aへの気泡の供給が側面2bに比して高められ、
側面2a側を比較的高い気泡密度で洗浄できる。これに
対し、図6に示す状態では、浸漬平膜の側面2bへの気
泡の供給が側面2aに比して高められ、側面2b側を比
較的高い気泡密度で洗浄できる。
In this case, when the fine air bubbles emitted from the air diffuser 50 reach the flapper plate assembly B1, the air bubbles are
The path is restricted by the flapper plate 6, and the flapper plate 6 rises along the flapper plate 6 in its inclination direction. As a result, the moving direction of the bubbles changes, and in the state shown in FIG. 5, the supply of bubbles to the side surface 2a of the immersion flat membrane is enhanced as compared with the side surface 2b,
The side surface 2a side can be cleaned with a relatively high bubble density. On the other hand, in the state shown in FIG. 6, the supply of bubbles to the side surface 2b of the immersion flat membrane is enhanced as compared with the side surface 2a, and the side surface 2b side can be cleaned with a relatively high bubble density.

【0030】このような本発明の処理装置10によれ
ば、フラッパー板6の角度を所望に調節することによ
り、浸漬膜モジュール2の浸漬平膜への空気の供給分布
を任意に調整することができる。よって、浸漬平膜にお
ける付着物の量が比較的多い部位、或るいは、例えば散
気装置50からの距離が比較的遠い位置にあって付着物
が残存し易い部位への気泡の供給量を増大させるといっ
た調整が可能となる。
According to the processing apparatus 10 of the present invention as described above, the air supply distribution to the submerged flat membrane of the submerged membrane module 2 can be arbitrarily adjusted by adjusting the angle of the flapper plate 6 as desired. it can. Therefore, the amount of bubbles to be supplied to a portion where the amount of deposits is relatively large in the immersion flat membrane, or a portion where the deposits are likely to remain due to a position relatively far from the air diffuser 50, for example. Adjustments such as increasing it are possible.

【0031】また、万一、一部の散気ユニット5からの
気泡の放出量が低下又は停止した場合にも、フラッパー
板6の角度調整によって、その散気ユニット5上方に位
置する膜面への気泡の供給を確保できる。したがって、
局所的に洗浄が行き届かない部位が生じてしまうことを
防止できる。さらに、上述したように、ろ過抵抗値が小
さく維持されている状態においては、フラッパー板6の
角度を傾斜させずに、洗浄速度の増大を図ることも可能
であり、効率的な膜洗浄を一層有効に実施できる。
In addition, even if the amount of bubbles discharged from some of the air diffusing units 5 is reduced or stopped, the angle of the flapper plate 6 is adjusted so that the film surface above the air diffusing units 5 is adjusted. The supply of bubbles can be secured. Therefore,
It is possible to prevent a portion where cleaning cannot reach locally from occurring. Further, as described above, in the state where the filtration resistance value is kept small, it is possible to increase the cleaning speed without inclining the angle of the flapper plate 6, and to further improve the efficient membrane cleaning. It can be effectively implemented.

【0032】これらの結果、浸漬膜モジュール2の浸漬
平膜の膜面を全体にわたって十分に且つ効率よく洗浄す
ることができ、浸漬膜モジュール2全体のろ過抵抗値を
十分に回復させることが可能となる。したがって、処理
装置10の本来の膜分離性能を長期にわたって良好に維
持でき、生物処理及び膜分離による被処理液L0の処理
効率の低下を十分に抑制できる。加えて、フラッパー板
6が複数設けられているので、気泡の整流作用が奏さ
れ、曝気範囲における膜面の更なる均一洗浄を実施でき
る。
As a result, it is possible to sufficiently and efficiently clean the entire membrane surface of the immersed flat membrane of the immersed membrane module 2 and to sufficiently recover the filtration resistance value of the entire immersed membrane module 2. Become. Therefore, the original membrane separation performance of the treatment apparatus 10 can be favorably maintained for a long period of time, and the reduction in treatment efficiency of the liquid L0 to be treated due to biological treatment and membrane separation can be sufficiently suppressed. In addition, since a plurality of flapper plates 6 are provided, the air bubbles are rectified, and the film surface can be further uniformly cleaned in the aeration range.

【0033】さらに、平板状のフラッパー板6の角度調
整によって気泡の移動方向を変化させるので、操作が簡
便且つ確実となり、気泡の供給分布の調整を極めて容易
ならしめることが可能となる。またさらに、フラッパー
板6を両端部で枠体に支持せしめ、その支持部において
回動機構Cによって回動可能に保持するので、フラッパ
ー板6の両端部間に気泡の移動を妨げる部材を設置する
ことなく、フラッパー板6の回動及び角度調整が可能と
なる。よって、この点においても、気泡による洗浄力の
低下を抑制できる。
Further, since the moving direction of the bubbles is changed by adjusting the angle of the flat flapper plate 6, the operation becomes simple and reliable, and the supply distribution of the bubbles can be adjusted extremely easily. Furthermore, since the flapper plate 6 is supported by the frame body at both ends and is rotatably held by the rotating mechanism C at the supporting portions, a member that prevents movement of bubbles is installed between the both ends of the flapper plate 6. Without this, the flapper plate 6 can be rotated and its angle can be adjusted. Therefore, also in this respect, it is possible to suppress the decrease in the cleaning power due to the bubbles.

【0034】さらにまた、フラッパー板6の調整角度
を、鉛直方向に対して好ましくは±60°以下、より好
ましくは±45°以下とすれば、気泡の移動が過度に制
限又は遮断されず、気泡を浸漬膜モジュール2側へ円滑
に供給し易い利点がある。よって、気泡による膜表面の
曝気力の低下が抑えられ、高い洗浄効果を維持できる。
また、フラッパー板6の回動制御をこのような角度範囲
で実施すれば、気泡の移動方向の調整範囲を十分に確保
できる観点からも好ましい。
Furthermore, if the adjustment angle of the flapper plate 6 is preferably ± 60 ° or less with respect to the vertical direction, more preferably ± 45 ° or less, the movement of bubbles is not excessively limited or blocked, and bubbles are not blocked. Has an advantage that it is easy to smoothly supply the liquid to the side of the submerged membrane module 2. Therefore, a decrease in the aeration power of the film surface due to the bubbles can be suppressed, and a high cleaning effect can be maintained.
Further, it is preferable to control the rotation of the flapper plate 6 within such an angle range from the viewpoint of being able to sufficiently secure the adjustment range of the moving direction of the bubbles.

【0035】さらに、図7〜10を参照して、より具体
的な事例について説明する。図7は、従来装置により膜
洗浄を行っている状態を示す摸式断面図であり、特開平
8−281080号公報に記載の膜分離装置における分
離膜の洗浄を適用した一例を示すものである。同図にお
いては、理解を容易にするために、散気ユニット5aが
一台の状態を図示した。処理装置20は、処理槽1内に
設けられた浸漬膜モジュール2と散気ユニット5aとの
間に、格子状のガイド板から成る整流板Sが設けられた
ものである。一方、図8は、本発明の処理装置10によ
り膜洗浄を行っている状態を示す摸式断面図であり、図
7と同様に、説明の都合上、一台の散気ユニット5aを
図示した。
Further, a more specific case will be described with reference to FIGS. FIG. 7 is a schematic cross-sectional view showing a state in which membrane cleaning is performed by a conventional apparatus, and shows an example in which the cleaning of the separation membrane in the membrane separation apparatus described in JP-A-8-281080 is applied. . In the same figure, for facilitating understanding, a state in which one air diffuser unit 5a is shown is shown. The processing apparatus 20 is provided with a straightening plate S, which is a grid-like guide plate, between the submerged membrane module 2 provided in the processing tank 1 and the air diffusing unit 5a. On the other hand, FIG. 8 is a schematic cross-sectional view showing a state in which the film cleaning is performed by the processing apparatus 10 of the present invention, and like FIG. 7, for convenience of explanation, one air diffuser unit 5a is shown. .

【0036】両図において、散気ユニット5aとして
は、有効径が300mmφのものを用い、ガイド板及び
フラッパー板6間隔は150mmとし、散気ユニット5
aと2との間隔は約700mmとした。また、図8にお
いては、下段のフラッパー板集合体B2のフラッパー板
6の設置方向は、鉛直方向とし、上段のフラッパー板集
合体B1のフラッパー板6の設置方向は、鉛直から最大
45°傾斜させた。
In both figures, an air diffuser unit 5a having an effective diameter of 300 mmφ is used, and the distance between the guide plate and the flapper plate 6 is 150 mm.
The distance between a and 2 was about 700 mm. Further, in FIG. 8, the installation direction of the flapper plate 6 of the lower flapper plate assembly B2 is the vertical direction, and the installation direction of the flapper plate 6 of the upper flapper plate assembly B1 is inclined up to 45 ° from the vertical direction. It was

【0037】図9及び10は、それぞれ図7におけるI
X−IX線断面図、及び、図8におけるX−X線断面図
を示し、従来装置及び本発明による処理装置10におけ
る散気状態を示す平面断面図である。これらの結果よ
り、処理装置10による気泡の供給範囲は、従来装置の
9倍程度となることが判明した。よって、同一の散気ユ
ニット5aを用いても、本発明の処理装置10によれ
ば、洗浄範囲を格別に拡大できることが確認された。ま
た、下段側のフラッパー板集合体B2のフラッパー板6
を回動させて角度調整を行えば、洗浄範囲の更なる拡大
が実現され得る。
9 and 10 respectively show I in FIG.
FIG. 9 is a cross-sectional view taken along line XX and a cross-sectional view taken along line XX in FIG. 8 and is a plan cross-sectional view showing an aeration state in a conventional apparatus and the processing apparatus 10 according to the present invention. From these results, it was found that the supply range of bubbles by the processing device 10 was about 9 times that of the conventional device. Therefore, it was confirmed that, even if the same air diffuser unit 5a was used, the cleaning range could be significantly expanded according to the processing apparatus 10 of the present invention. Further, the flapper plate 6 of the lower flapper plate assembly B2
If the angle is adjusted by rotating the, the cleaning range can be further expanded.

【0038】なお、本発明は上述した実施形態に限定さ
れるものではなく、例えば、複数のフラッパー板6を同
期して回動させずに非同期で回動してもよい。つまり、
各フラッパー板6の駆動を独立して制御してもよく、こ
の場合、駆動部11,12は、フラッパー板6の回動機
構Cを個別に駆動するように構成される。また、フラッ
パー板集合体B1,B2はいずれか一方を備えてもよ
く、或いは、三段以上の多段配置としてもよい。さら
に、両者B1,B2は、必ずしも平行に、又は、両者の
フラッパー板6が必ずしも直交するように位置する必要
はない。またさらに、洗浄対象の分離膜は、浸漬平膜に
限られず、一般に用いられる種々の性状及び形状の分離
膜に適用可能である。
The present invention is not limited to the above-described embodiment, and for example, the plurality of flapper plates 6 may be asynchronously rotated without being synchronously rotated. That is,
The drive of each flapper plate 6 may be controlled independently, and in this case, the drive units 11 and 12 are configured to individually drive the rotating mechanism C of the flapper plate 6. Further, either one of the flapper plate assemblies B1 and B2 may be provided, or the flapper plate assemblies B1 and B2 may be arranged in three or more stages. Furthermore, both B1 and B2 do not necessarily need to be positioned in parallel, or the flapper plates 6 of both need to be positioned orthogonally. Furthermore, the separation membrane to be cleaned is not limited to the immersion flat membrane, but can be applied to generally used separation membranes having various properties and shapes.

【0039】[0039]

【発明の効果】以上説明したように、本発明の膜洗浄装
置によれば、整流部により気泡の移動方向を変化させて
分離膜面への気泡の供給分布を調整でき、これにより、
分離膜の膜面を全体にわたって十分に洗浄することが可
能となる。よって、分離膜のろ過抵抗値を全体として十
分に回復させることができる。また、本発明の膜分離装
置によれば、本発明の膜洗浄装置を用いることにより、
所望の膜分離性能を長期にわたって良好に維持でき、処
理効率の低下を十分に防止することが可能となる。
As described above, according to the membrane cleaning apparatus of the present invention, the flow distribution direction of the bubbles can be changed by the rectifying section to adjust the supply distribution of the bubbles to the separation membrane surface.
It becomes possible to sufficiently wash the entire membrane surface of the separation membrane. Therefore, the filtration resistance value of the separation membrane can be sufficiently recovered as a whole. Further, according to the membrane separation apparatus of the present invention, by using the membrane cleaning apparatus of the present invention,
Desired membrane separation performance can be favorably maintained over a long period of time, and it becomes possible to sufficiently prevent reduction in treatment efficiency.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による膜洗浄装置を備える膜分離装置の
好適な一実施形態の構成を模式的に示す正面断面図であ
る。
FIG. 1 is a front cross-sectional view schematically showing the configuration of a preferred embodiment of a membrane separation device including a membrane cleaning device according to the present invention.

【図2】本発明による膜洗浄装置を備える膜分離装置の
好適な一実施形態の構成を模式的に示す側面断面図であ
る。
FIG. 2 is a side sectional view schematically showing the configuration of a preferred embodiment of a membrane separation device including the membrane cleaning device according to the present invention.

【図3】図1に示すフラッパー板集合体B1,B2の配
置関係を摸式的に示す斜視図である。
FIG. 3 is a perspective view schematically showing the positional relationship between the flapper plate assemblies B1 and B2 shown in FIG.

【図4】図1に示す処理装置10を用いて被処理液L0
の生物処理を行いながら浸漬平膜の洗浄を行っている状
態を模式的に示す断面図である。
4 is a liquid to be treated L0 using the treatment apparatus 10 shown in FIG.
FIG. 6 is a cross-sectional view schematically showing a state where the submerged flat membrane is washed while performing the biological treatment of FIG.

【図5】図1に示す処理装置10を用いて被処理液L0
の生物処理を行いながら浸漬平膜の洗浄を行っている状
態を模式的に示す断面図である。
5 is a liquid L0 to be treated using the treatment apparatus 10 shown in FIG.
FIG. 6 is a cross-sectional view schematically showing a state where the submerged flat membrane is washed while performing the biological treatment of FIG.

【図6】図1に示す処理装置10を用いて被処理液L0
の生物処理を行いながら浸漬平膜の洗浄を行っている状
態を模式的に示す断面図である。
6 is a liquid L0 to be treated using the treatment apparatus 10 shown in FIG.
FIG. 6 is a cross-sectional view schematically showing a state where the submerged flat membrane is washed while performing the biological treatment of FIG.

【図7】従来装置により分離膜洗浄を行っている状態を
示す摸式断面図である。
FIG. 7 is a schematic cross-sectional view showing a state in which separation membrane cleaning is performed by a conventional device.

【図8】本発明の処理装置10により分離膜洗浄を行っ
ている状態を示す摸式断面図である。
FIG. 8 is a schematic cross-sectional view showing a state in which separation membrane cleaning is performed by the processing apparatus 10 of the present invention.

【図9】図7におけるIX−IX線断面図である。9 is a sectional view taken along line IX-IX in FIG.

【図10】図8におけるX−X線断面図である。10 is a sectional view taken along line XX in FIG.

【符号の説明】[Explanation of symbols]

1…処理槽、2…浸漬膜モジュール(膜分離部)、5,
5a…散気ユニット、6…フラッパー板(板状部材)、
10…処理装置(膜分離装置)、11,12…駆動部、
50…散気装置(散気部)、B1,B2…フラッパー板
集合体(集合体)、L0…被処理液、L1…処理済液。
1 ... Treatment tank, 2 ... Immersion membrane module (membrane separation part), 5,
5a ... Air diffuser unit, 6 ... Flapper plate (plate member),
10 ... Processing device (membrane separation device), 11, 12 ... Driving unit,
50 ... Air diffuser (air diffuser), B1, B2 ... Flapper plate aggregate (aggregate), L0 ... Liquid to be treated, L1 ... Treated liquid.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 被処理液が供給される処理槽に配置され
た分離膜を洗浄する膜洗浄装置であって、 前記分離膜を有する膜分離部の略下方に配置され気泡を
放出する散気部と、 前記膜分離部と前記散気部との間に配置され、該散気部
から放出される気泡の移動方向を任意の方向に変化させ
る整流部と、を備えることを特徴とする膜洗浄装置。
1. A membrane cleaning device for cleaning a separation membrane arranged in a treatment tank to which a liquid to be treated is supplied, the diffuser being arranged substantially below a membrane separation portion having the separation membrane and discharging bubbles. And a rectifying unit that is disposed between the membrane separating unit and the air diffusing unit and that changes the moving direction of the bubbles discharged from the air diffusing unit to an arbitrary direction. Cleaning device.
【請求項2】 前記整流部が、前記膜分離部と前記散気
部とを結ぶ仮想軸に対して交差する方向に延在し且つ長
手軸まわりに回動可能な板状部材を有する、ことを特徴
とする請求項1記載の膜洗浄装置。
2. The rectifying section has a plate-shaped member extending in a direction intersecting with an imaginary axis connecting the membrane separation section and the air diffuser and rotatable about a longitudinal axis. The film cleaning apparatus according to claim 1, wherein:
【請求項3】 前記整流部は、多段に配置され且つ複数
の前記板状部材が並設されて成る複数の集合体を有して
おり、該各集合体を構成する前記板状部材が該集合体ご
とに互いに異なる方向に延在するように設けられてい
る、ことを特徴とする請求項2記載の膜洗浄装置。
3. The rectifying section has a plurality of aggregates which are arranged in multiple stages and in which a plurality of the plate-like members are arranged in parallel, and the plate-like members constituting each of the aggregates are The film cleaning apparatus according to claim 2, wherein the assembly is provided so as to extend in different directions for each assembly.
【請求項4】 被処理液が供給される処理槽と、 前記処理槽内に配置され、分離膜を有する膜分離部と、 請求項1〜3のいずれか一項に記載の膜洗浄装置と、を
備える膜分離装置。
4. A treatment tank to which a liquid to be treated is supplied, a membrane separation unit which is disposed in the treatment tank and has a separation membrane, and the membrane cleaning apparatus according to claim 1. A membrane separation device comprising:
JP2001261863A 2001-08-30 2001-08-30 Membrane cleaning device and membrane separation device Expired - Fee Related JP3643802B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001261863A JP3643802B2 (en) 2001-08-30 2001-08-30 Membrane cleaning device and membrane separation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001261863A JP3643802B2 (en) 2001-08-30 2001-08-30 Membrane cleaning device and membrane separation device

Publications (2)

Publication Number Publication Date
JP2003071255A true JP2003071255A (en) 2003-03-11
JP3643802B2 JP3643802B2 (en) 2005-04-27

Family

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KR100834716B1 (en) 2006-12-29 2008-06-02 주식회사 코오롱 Air diffusing unit for clearing a cassette and method of clearing a cassette thereby
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KR100786201B1 (en) * 2006-12-29 2007-12-17 주식회사 코오롱 Air diffusing unit for clearing a cassette and method of clearing a cassette thereby
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