JP2003066075A - Conductive material measuring device and measuring method - Google Patents
Conductive material measuring device and measuring methodInfo
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- JP2003066075A JP2003066075A JP2001256429A JP2001256429A JP2003066075A JP 2003066075 A JP2003066075 A JP 2003066075A JP 2001256429 A JP2001256429 A JP 2001256429A JP 2001256429 A JP2001256429 A JP 2001256429A JP 2003066075 A JP2003066075 A JP 2003066075A
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- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明はエレクトロクロミズ
ム（Ｅｌｅｃｔｒｏｃｈｒｏｍｉｓｍ：ＥＣ現象）を用
いて、導電性ゴム等の導電性物質の面内の抵抗値のバラ
ツキを可視化することで、導電性物質の導電性分布を色
の濃度差で表示させる様にした導電性物質測定装置及び
その測定方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention uses electrochromism (EC phenomenon) to visualize the variation in the in-plane resistance value of a conductive substance such as a conductive rubber, thereby making the conductivity of the conductive substance. The present invention relates to an electroconductive substance measuring device and a measuring method thereof, in which a distribution is displayed by a color density difference.
【０００２】[0002]
【従来の技術】従来から、エレクトロクロミック・デバ
イス（ＥｌｅｃｔｒｏｃｈｒｏｍｉｃＤｅｖｉｃｅ：以
下ＥＣＤと記す）として、外部からの電圧印加によっ
て、可逆的に色調の変化する素子が知られている。この
様なＥＣＤは視角依存性が無い点で主に車のルームミラ
ー、電気ブラインド、表示素子、着消色状態を２値対応
させたメモリ素子として応用されている。2. Description of the Related Art Conventionally, as an electrochromic device (Electrochromic Device: hereinafter referred to as ECD), an element whose color tone is reversibly changed by applying a voltage from the outside has been known. Such an ECD is mainly applied as a vehicle rearview mirror, an electric blind, a display element, and a memory element in which two color-changing color states are associated with each other because it has no viewing angle dependency.
【０００３】上述のＥＣ現象はＥＣＤに電圧を印加する
ことにより酸化、還元反応が発生して着色・消色をする
現象の総称であり、一般的に基板上に図４の動作原理図
の様に透明電極５／アノーデックエレクトロクロミック
層（アノーデックＥＣ層）４／イオン注入層３／カソー
デックエレクトロクロミック層（カソーデックＥＣ層）
２／透明電極（あるいは金属電極）６という構成を取
る。The above-mentioned EC phenomenon is a general term for a phenomenon in which coloring and decoloring are caused by the oxidation and reduction reactions caused by applying a voltage to the ECD, and generally, the operation principle diagram of FIG. Transparent electrode 5 / Anodec electrochromic layer (Anodec EC layer) 4 / Ion injection layer 3 / Casodec electrochromic layer (Casodec EC layer)
2 / Transparent electrode (or metal electrode) 6 is adopted.
【０００４】上述の構成ではアノーデックＥＣ層５側に
陽極電圧／カソーデックＥＣ層２側に陰極電圧を印加し
た際に例えばタングステブロンズ（ＨＷＯ3 ）の青色の
着色を示し、逆電圧を印加した際に透明状態になる。こ
の着色は印加電圧の大きさと印加時間に依存して着色が
濃くなったり薄くなったりする事が特徴で、また回路を
開放状態にすることでその着色状態が保存される事がで
きる。In the above-mentioned structure, when an anode voltage is applied to the anodec EC layer 5 side / a cathode voltage is applied to the cathodic EC layer 2 side, for example, a blue coloration of Tungsten bronze (HWO 3 ) is exhibited, and when a reverse voltage is applied. It becomes transparent. This coloring is characterized in that the coloring becomes darker or lighter depending on the magnitude of the applied voltage and the application time, and the colored state can be preserved by opening the circuit.
【０００５】アノーデックＥＣ層４としては一般的に酸
化イリジウムや酸化ニッケル（ＮｉＯ）、イオン注入層
３としては酸化タンタル、酸化アンチモン、カソーデッ
クＥＣ層２としては酸化タングステン（ＷＯ3 ）、酸化
チタン、酸化モリブデン等が、また透明電極材料として
はＩＴＯ（酸化インジウムに酸化スズを添加したもの）
が用いられる。Generally, the anodic EC layer 4 is iridium oxide or nickel oxide (NiO), the ion-implanted layer 3 is tantalum oxide or antimony oxide, and the cathodic EC layer 2 is tungsten oxide (WO 3 ), titanium oxide or oxide. Molybdenum, etc., and ITO as the transparent electrode material (indium oxide with tin oxide added)
Is used.
【０００６】ＥＣＤでは図４（Ａ）の動作原理図に示す
様に、カソーデックＥＣ層２に電圧源１１から１Ｖ〜
１．５Ｖの陰電圧をアノーデックＥＣ層５に陽電圧を印
加すると、イオン注入層３側からＷＯ2 のカソーデック
ＥＣ層２へＨ+ イオンがアノーデックＥＣ層４側から電
子が注入されて、ＨＷＯ3 のタングステンブロンズが生
成され、ＷＯ3 は無色透明であるからこの反応によって
青色の着色が生じる。即ち反応式は
となる。In the ECD, as shown in the principle of operation of FIG.
When a negative voltage of 1.5V is applied to the anodec EC layer 5, H + ions are injected from the ion implantation layer 3 side to the cathode ray EC layer 2 of WO 2 and electrons are injected from the anodec EC layer 4 side, and HWO 3 This reaction produces a blue tint because WO 3 is colorless and transparent. That is, the reaction formula is Becomes
【０００７】一方、図４（Ｂ）の様に電圧を逆にすれば
アノーデックＥＣ層４側で酸化反応が起こり
の反応を起こすことで透明のＷＯ3 に戻される。この場
合、色の濃度は印加時間と印加電圧に依存している。On the other hand, when the voltage is reversed as shown in FIG. 4B, an oxidation reaction occurs on the side of the anodic EC layer 4. By causing the reaction of, it is returned to transparent WO 3 . In this case, the color density depends on the application time and the applied voltage.
【０００８】一方、天然ゴムやクロロプレンゴム等にカ
ーボンブラック等の導電性微粉末を混入して作成された
導電性ゴム等がディスプレイ兼用キーボードやキーボー
ドスイッチ等に多用されている。On the other hand, conductive rubber or the like prepared by mixing conductive fine powder such as carbon black into natural rubber or chloroprene rubber is often used for a display-use keyboard, keyboard switch and the like.
【０００９】この様な、導電性ゴム板を成形する過程で
は導電性の微粉末をゴム中に分散させた場合の品質を評
価する時に、導電性微粉末材料の分散による電気抵抗の
板面内のバラツキを測定することが必要となる。In the process of molding the conductive rubber plate, the quality of the conductive fine powder dispersed in the rubber is evaluated. It is necessary to measure the variation of.
【００１０】一般に、導電性ゴムの体積固有抵抗は１０
3 〜１０7 Ωｃｍ程度のものが利用されているが接触抵
抗等は数十Ω〜数百Ωしかないため接続回路とのインピ
ーダンスマッチング等が問題になり、導電性ゴムの面内
での正確な電気抵抗の分布が必要であった。Generally, the volume resistivity of conductive rubber is 10
Although 3 to 10 7 Ωcm or so is used, the contact resistance is only tens to hundreds of Ω, so impedance matching with the connecting circuit becomes a problem, and accurate in-plane measurement of the conductive rubber is required. A distribution of electrical resistance was needed.
【００１１】従来はこの測定は電圧を印加できる端子を
２つ設け、この端子間に導電性ゴムをはさみそのポイン
トの抵抗値を測定していた。Conventionally, in this measurement, two terminals to which a voltage can be applied are provided, and a conductive rubber is sandwiched between these terminals to measure the resistance value at that point.
【００１２】[0012]
【発明が解決しようとする課題】従来の導電性ゴム等で
の導電性微粉末の混入状態を計測するために２電極間の
抵抗値を測定しているのでは広い面積を有する導電性ゴ
ムシート等の面内の分布測定に於いて、その測定しよう
とする測定ポイントを順次、ずらしながら測定を行なう
必要があり、キーボード用の導電性ゴムシート等では少
なくともキーの配置される位置の数だけ測定を行なわな
くてはならない課題を有していた。The resistance value between two electrodes is measured in order to measure the mixed state of the conductive fine powder in the conventional conductive rubber or the like. When measuring the distribution in a plane such as, it is necessary to perform the measurement while sequentially shifting the measurement points to be measured, and for conductive rubber sheets for keyboards, measure at least the number of positions where keys are arranged. Had a task that had to be done.
【００１３】本発明は叙上の課題を解消するために成さ
れたもので、発明が解決しようとする課題は、従来から
利用されているＥＣＤを用いて導電性ゴム（以下、導電
性物質：ＣＭと記す）面内の抵抗値のバラツキを可視化
して簡単に測定可能なＣＭ測定装置及びＣＭ測定方法を
提供しようとするものである。The present invention has been made to solve the above problems, and the problem to be solved by the present invention is to use conductive rubber (hereinafter, conductive material: It is intended to provide a CM measuring device and a CM measuring method capable of easily measuring a variation in in-plane resistance value by visualizing.
【００１４】[0014]
【課題を解決するための手段】請求項１に係わる本発明
は少なくとも第１の電極１とカソーデックエレクトロク
ロミック層２を格子状にパターニングしたＥＣＤの第１
の電極１上に導電性物質を含有する被測定体８を載置
し、被測定体８上に載置した金属電極９とＥＣＤの第２
の電極６間に電圧を印加し、被測定体８の導電分布をパ
ターニング化させて成ることを特徴とするＣＭ測定装置
としたものである。The present invention according to claim 1 relates to a first ECD in which at least a first electrode 1 and a cathode-ray electrochromic layer 2 are patterned in a lattice pattern.
The measured object 8 containing a conductive substance is placed on the electrode 1 of the above, and the metal electrode 9 placed on the measured object 8 and the second ECD
This is a CM measuring device characterized in that a voltage is applied between the electrodes 6 to pattern the conductive distribution of the object 8 to be measured.
【００１５】請求項２に係わる本発明はＥＣＤの第１の
電極１とカソーデックＥＣ層２及びアノーデックＥＣ層
４並びにイオン注入層３を格子状にパターニングして成
ることを特徴とする請求項１記載のＣＭ測定装置とした
ものである。The present invention according to claim 2 is characterized in that the first electrode 1 of the ECD, the cathodic EC layer 2, the anodic EC layer 4 and the ion implantation layer 3 are patterned in a lattice pattern. CM measuring device.
【００１６】請求項３に係わる本発明は格子状にパター
ニングされた格子間の隙間をセラミック或は樹脂等の絶
縁物７で充填させて成ることを特徴とする請求項１又は
請求項２記載のＣＭ測定装置としたものである。The present invention according to claim 3 is characterized in that the gaps between the grids patterned in a grid pattern are filled with an insulating material 7 such as ceramic or resin. This is a CM measuring device.
【００１７】請求項４に係わる本発明はＣＭ８が導電性
ゴム、導電性樹脂、金属板に導電ペイント、導電塗料、
導電性粘着剤等を塗布した導電体であることを特徴とす
る請求項１乃至請求項３記載のいづれか１項記載のＣＭ
測定装置としたものである。In the present invention according to claim 4, CM8 is conductive rubber, conductive resin, conductive paint, conductive paint on a metal plate,
The CM according to any one of claims 1 to 3, which is a conductor coated with a conductive adhesive or the like.
This is a measuring device.
【００１８】請求項５に係わる本発明は少なくとも第１
の電極１とカソーデックＥＣ層２を格子状にパターニン
グしたＥＣＤの第１の電極１上に導電性物質を含有する
被測定体８を載置するプロセスと、被測定体８上に全面
に亘って金属電極９を載置して押圧させるプロセスと、
金属電極９とＥＣＤの第２の電極５間に電圧を印加する
プロセスとにより、被測定体８の導電性分布をＥＣＤの
格子状のパターン毎の色濃度パターンを表示させて成る
ことを特徴とするＣＭ測定方法としたものである。The present invention according to claim 5 is at least a first aspect.
Process of placing the measured object 8 containing the conductive substance on the first electrode 1 of the ECD in which the electrode 1 and the cathodic EC layer 2 are patterned in a grid pattern, and the entire surface of the measured object 8 on the measured object 8. A process of placing and pressing the metal electrode 9,
A process for applying a voltage between the metal electrode 9 and the second electrode 5 of the ECD is used to display the conductivity distribution of the DUT 8 by displaying a color density pattern for each grid pattern of the ECD. This is the CM measuring method.
【００１９】斯かる、本発明によれば短時間且つ簡便に
導電性物質の面内の抵抗値のバラツキ分布を視覚的に視
ることが出来、且つ、その分布状態を保持させることが
出来、且つ、消色することが可能で繰返し使用可能なＣ
Ｍ測定装置及びその測定方法が得られる。According to the present invention, the in-plane distribution of resistance values of the conductive material can be visually visually observed in a short time and easily, and the distribution state can be maintained. C that can be erased and can be used repeatedly
An M measuring device and its measuring method are obtained.
【００２０】[0020]
【発明の実施の形態】以下、本発明の導電性物質測定装
置及びその測定方法の１形態例を図１（Ａ）（Ｂ）及び
図２（Ａ）（Ｂ）を用いて詳記する。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, one embodiment of a conductive substance measuring apparatus and a measuring method thereof according to the present invention will be described in detail with reference to FIGS. 1 (A) and (B) and FIGS. 2 (A) and 2 (B).
【００２１】図１（Ａ）は本発明の導電性物質測定装置
及びその測定方法に用いるエレクトロクロミックデバイ
ス（ＥＣＤ）の要部の斜視図、図１（Ｂ）は図１（Ａ）
のＡ−Ａ′矢視図を示す側断面図、図２（Ａ）は本発明
の導電性物質測定方法を説明するための要部側断面図、
図２（Ｂ）は被測定体の抵抗分布を可視化した模式図で
ある。FIG. 1 (A) is a perspective view of a main part of an electrochromic device (ECD) used in the conductive substance measuring apparatus and its measuring method of the present invention, and FIG. 1 (B) is FIG. 1 (A).
2A is a side sectional view showing an AA ′ arrow view, FIG. 2A is a side sectional view of a main part for explaining the conductive substance measuring method of the present invention,
FIG. 2B is a schematic diagram in which the resistance distribution of the measured object is visualized.
【００２２】先ず、図１（Ａ）及び図１（Ｂ）によっ
て、本発明の測定装置に用いられるＥＣＤ１２を説明す
る。First, the ECD 12 used in the measuring apparatus of the present invention will be described with reference to FIGS. 1 (A) and 1 (B).
【００２３】図１（Ａ）（Ｂ）に於いて、硝子板或は合
成樹脂フィルム等の透明基板６上にＩＴＯ等の下側の第
２の透明導電膜５を形成し、その上にアノーデックＥＣ
層４、イオン注入層３、カソーデックＥＣ層２、上側の
第１の透明導電膜１が形成されている。1A and 1B, a lower second transparent conductive film 5 such as ITO is formed on a transparent substrate 6 such as a glass plate or a synthetic resin film, and an anodec is formed on the second transparent conductive film 5. EC
The layer 4, the ion-implanted layer 3, the cathodic EC layer 2, and the upper first transparent conductive film 1 are formed.
【００２４】ここで、図１（Ａ）（Ｂ）に示すように、
第１の透明導電膜１、カソーデックＥＣ層２、イオン注
入層３、アノーデックＥＣ層４は格子状にパターニング
されて複数のマトリックス素子１３が形成されている。Here, as shown in FIGS. 1 (A) and 1 (B),
The first transparent conductive film 1, the cathodic EC layer 2, the ion implantation layer 3, and the anodic EC layer 4 are patterned in a lattice pattern to form a plurality of matrix elements 13.
【００２５】又、格子状にパターニングされた格子間即
ち、マトリックスセルとの隙間には図１（Ａ）には示さ
れていないが図１（Ｂ）の様に必要に応じてＳｉＯ2 、
ＳｉＮ等の絶縁体７を充填させる様に成されている。ま
た第２の透明導電膜５は外部に電極を取り出せる構造と
成され、絶縁体７は後述するＣＭである被測定体８が第
２の透明導電膜５に直接接触する事を防止している。[0025] Further, between the grid pattern patterned grating i.e., SiO 2 optionally as a Although not shown in FIG. 1 (A) in the gap between the matrix cell FIG. 1 (B), the
It is configured to be filled with an insulator 7 such as SiN. The second transparent conductive film 5 has a structure in which an electrode can be taken out to the outside, and the insulator 7 prevents the measured object 8 which is a CM described later from directly contacting the second transparent conductive film 5. .
【００２６】上述のＥＣＤ１２の動作を図２（Ａ）
（Ｂ）を用いて説明する。図２（Ａ）は図１（Ａ）
（Ｂ）に示したＥＣＤ１２を簡略化して示している。The operation of the ECD 12 described above is shown in FIG.
An explanation will be given using (B). 2 (A) is shown in FIG. 1 (A).
The ECD 12 shown in (B) is shown in a simplified manner.
【００２７】図１（Ａ）（Ｂ）で示したＥＣＤ１２の第
１の透明導電膜、即ち第１の電極１上に被測定体である
導電性ゴム（ＣＭ）を押圧載置させる。On the first transparent conductive film of the ECD 12 shown in FIGS. 1A and 1B, that is, the first electrode 1, a conductive rubber (CM) as a measured object is placed under pressure.
【００２８】次にＣＭ８の上に金属箔或は金属板等の金
属電極９を押圧する様に載置させ、この金属電極９とＥ
ＣＤ１２の第２の透明導電膜５間に電圧源１１から電圧
を印加する。電圧源１１によって陰電圧を金属電極９側
に陽電圧を第２の透明導電膜５側に印加することでＥＣ
Ｄ１２は図４（Ａ）で説明した反応式に基づいて格子状
のマトリックスセル１３は着色される。Next, a metal electrode 9 such as a metal foil or a metal plate is placed on the CM 8 so as to press the metal electrode 9 and the metal electrode 9 together.
A voltage is applied from the voltage source 11 between the second transparent conductive film 5 of the CD 12. By applying a negative voltage to the metal electrode 9 side and a positive voltage to the second transparent conductive film 5 side by the voltage source 11, EC
In D12, the lattice-shaped matrix cell 13 is colored based on the reaction formula described in FIG.
【００２９】この際印加する電圧はＣＭ８の抵抗値の仕
様により可変する必要があり、ＥＣＤ１２のマトリック
スセル１３に最大１．５Ｖ程度が掛かるように見積もっ
ておく。（これはＥＣＤ１２を破壊しないためであ
る。）電圧を印加すると、ＣＭ８の面内の抵抗値のバラ
ツキに応じて電圧降下が起こり、マトリックスセル１３
に印加される電圧値が変化する。電圧印加後に被測定体
８を取り除けば第１の透明導電膜１側の各マトリックス
セル１３は図２（Ｂ）のようにマトリックスセル１３毎
に着色状態が異なる状態で色が保持される。図２（Ｂ）
では右上部分と左下部分の着色が濃いため、この部分の
抵抗値は低く（すなわちＥＣＤ１２のマトリックス素体
１２に高電圧が印加されている。）その他の部分の抵抗
値が高くなっている事が分かる。The voltage applied at this time must be varied according to the resistance value specification of CM8, and it is estimated that the matrix cell 13 of the ECD 12 will have a maximum of about 1.5V. (This is because the ECD 12 is not destroyed.) When a voltage is applied, a voltage drop occurs according to the variation of the resistance value in the plane of the CM 8, and the matrix cell 13
The voltage value applied to is changed. If the measured object 8 is removed after the voltage is applied, each matrix cell 13 on the side of the first transparent conductive film 1 retains its color in a state in which the coloring state is different for each matrix cell 13 as shown in FIG. 2B. Figure 2 (B)
However, since the upper right portion and the lower left portion are deeply colored, the resistance value of this portion is low (that is, a high voltage is applied to the matrix element body 12 of the ECD 12) and the resistance values of other portions are high. I understand.
【００３０】このようにＣＭ８の抵抗値の分布を可視的
に表示する事が出来る。また、電圧の印加を逆にする事
でこの現象は可逆的な変化が起こり透明になるため、繰
り返し使用する事が可能となる。一般的にＥＣＤ１２の
寿命は１０5 回程度と言われているためこの程度の繰り
返し測定は可能と言える。さらに印加電圧、印加時間と
透過率変化の相関を求め、色見本等を用意する事である
程度定量的に抵抗値を算出することも可能となる。本発
明の薄膜はＣＶＤ（化学気相成長法）あるいはスパッ
タ、蒸着等のＰＶＤ（物理気相成長法）にて成膜を行う
事ができる。また、マトリックス素子１３の大きさに関
しては、ＣＭ８の抵抗値の内面の分散の程度に応じて適
当にマスクパターンを決めれば良いが３〜５ｍｍ□程度
のマスクパターン、パターン間の距離は１ｍｍ〜２ｍｍ
程度の物で十分である。As described above, the distribution of the resistance value of the CM 8 can be visually displayed. Also, by reversing the application of voltage, this phenomenon undergoes a reversible change and becomes transparent, so that it can be used repeatedly. It is generally said that the life of the ECD12 is about 10 5 times, so it can be said that repeated measurement of this level is possible. Further, it is possible to calculate the resistance value to some extent quantitatively by obtaining the correlation between the applied voltage and the applied time and the change in transmittance and preparing a color sample or the like. The thin film of the present invention can be formed by CVD (chemical vapor deposition) or PVD (physical vapor deposition) such as sputtering or vapor deposition. Regarding the size of the matrix element 13, the mask pattern may be appropriately determined according to the degree of dispersion of the resistance value of the CM 8 on the inner surface, but the mask pattern is about 3 to 5 mm □, and the distance between the patterns is 1 mm to 2 mm.
Something is enough.
【００３１】上述では被測定体８としての導電性物質
（ＣＭ）を弾性ゴムとして説明したが、これらＣＭ８は
適当な樹脂を媒体とし、その中に銅や炭素等の微粒粉末
を混入した導電性樹脂や適当な溶媒に銀、銅、或は炭素
等の微粒粉末を混入した導電ペイントや導電性粘着剤等
を導電体に塗布した導電物質であってもよい。In the above description, the conductive substance (CM) as the object to be measured 8 has been described as an elastic rubber, but these CM8 are made of a suitable resin as a medium, and a conductive material in which fine particle powder such as copper or carbon is mixed. It may be a conductive substance in which a resin or a suitable solvent is mixed with fine powder of silver, copper, carbon or the like and a conductive paint or a conductive adhesive is applied to the conductor.
【００３２】次に本発明の他の形態例を図３（Ａ）
（Ｂ）を用いて説明する図３（Ａ）（Ｂ）は図１（Ａ）
（Ｂ）に対応して、図１（Ａ）（Ｂ）との違いは格子状
にパターニングされるマトリックスセル１３が第１の透
明導電膜１及びカソーデックＥＣ層２より構成されてい
る点である。他は全く図１（Ａ）（Ｂ）と同一であるの
で対応部分には同一符号を付して重複説明は省略する。
次に図３（Ａ）（Ｂ）に示すＥＣＤ１２の実施例を以下
に説明する。Next, another embodiment of the present invention is shown in FIG.
3A and 3B described with reference to FIG. 3B are shown in FIG.
Corresponding to (B), the difference from FIGS. 1 (A) and (B) is that the matrix cell 13 patterned in a lattice pattern is composed of a first transparent conductive film 1 and a cathode-ray EC layer 2. . Since the other parts are exactly the same as those in FIGS. 1A and 1B, the corresponding parts are designated by the same reference numerals, and the duplicate description will be omitted.
Next, an embodiment of the ECD 12 shown in FIGS. 3A and 3B will be described below.
【００３３】図３（Ａ）（Ｂ）において透明基板６とし
てはアクリル系樹脂の塗布されたＰＥＴ剤を用い、その
上に第２の透明導電膜５としてＩＴＯをスパッタリング
にて形成する。厚さは２００ｎｍ〜５００ｎｍ程度が望
ましい。また同じくスパッタリングを用い、アノーデッ
クＥＣ層５としてＮｉＯ膜を堆積する。この際のスパッ
タリングターゲットとしてはＮｉ金属を用い、酸素とア
ルゴンの混合ガスによる反応性スパッタにて堆積を行
う。同じくイオン注入層４に関しても酸化タンタル等の
水酸化物も同様の方法で形成する。In FIGS. 3A and 3B, a PET material coated with an acrylic resin is used as the transparent substrate 6, and ITO is formed as a second transparent conductive film 5 thereon by sputtering. The thickness is preferably about 200 nm to 500 nm. Similarly, a NiO film is deposited as the anodic EC layer 5 by using sputtering. Ni metal is used as a sputtering target at this time, and deposition is performed by reactive sputtering using a mixed gas of oxygen and argon. Similarly, with respect to the ion-implanted layer 4, a hydroxide such as tantalum oxide is also formed by the same method.
【００３４】上部に形成されるカソーデックＥＣ層２に
関しては電界エッチング加工等でパターニングされたＳ
ＵＳ板をマスクとして用い、同じくスパッタ法にて形成
を行う。上部の第１の電極となる第１の透明導電膜１も
同じくマスクパターンによるスパッタによりＩＴＯ膜あ
るいは金属膜を製膜する。この際、マスクパターンは、
電流のリークを避ける為、数％マスク開口部面積を小さ
くしておく事が望ましい。最後にカソーデック層２を形
成した場合と同じマスクを用いて上部にレジストを塗布
する。その後、絶縁膜７をスパッタあるいは塗布等のプ
ロセスにより堆積を行い、レジストを除去する事により
図３（Ａ）（Ｂ）に示す形態を完成させることが出来
る。As for the cathodic EC layer 2 formed on the upper portion, S patterned by electric field etching or the like is used.
Using the US plate as a mask, formation is also performed by the sputtering method. The ITO film or the metal film is also formed on the first transparent conductive film 1 to be the first electrode on the upper side by sputtering with a mask pattern. At this time, the mask pattern is
To avoid current leakage, it is desirable to reduce the mask opening area by several percent. Finally, a resist is applied on the upper portion using the same mask as when the cathodic layer 2 is formed. After that, the insulating film 7 is deposited by a process such as sputtering or coating, and the resist is removed, whereby the configuration shown in FIGS. 3A and 3B can be completed.
【００３５】[0035]
【発明の効果】本発明の導電性物質測定装置及び導電性
物質測定方法によればエレクトロクロミズム機能を利用
して簡単な構成で導電性ゴム等の抵抗値のバラツキ状態
を可視化出来、抵抗測定プロセスを簡略及び短時間内に
行うことが可能となる。According to the conductive substance measuring apparatus and the conductive substance measuring method of the present invention, the variation state of the resistance value of the conductive rubber or the like can be visualized with a simple structure by utilizing the electrochromism function, and the resistance measuring process. Can be performed in a simple manner and in a short time.
【図１】本発明の導電性物質測定装置に用いるエレクト
ロクロミックデバイスの１形態例を示す模式的斜視図及
びＡ−Ａ′断面矢視図である。FIG. 1 is a schematic perspective view and an AA ′ cross-sectional arrow view showing one embodiment of an electrochromic device used in a conductive substance measuring apparatus of the present invention.
【図２】本発明の導電性物質測定方法を説明する要部の
側断面図及び導電性ゴムの抵抗値分布を可視化した模式
図である。FIG. 2 is a side cross-sectional view of a main part for explaining the conductive substance measuring method of the present invention and a schematic diagram in which a resistance value distribution of a conductive rubber is visualized.
【図３】本発明の導電性物質測定装置に用いるエレクト
ロクロミックデバイスの他の形態例を示す斜視図及びＡ
−Ａ′断面矢視図である。FIG. 3 is a perspective view showing another embodiment of the electrochromic device used in the electroconductive substance measuring apparatus of the present invention and FIG.
FIG. 6 is a sectional view taken along the line A-A '.
【図４】エレクトロクロミズムを説明するための動作原
理説明図である。FIG. 4 is an explanatory diagram of an operation principle for explaining electrochromism.
１‥‥第１の透明導電膜、２‥‥カソーデックエレクト
ロクロミック層（カソーデックＥＣ層）、３‥‥イオン
注入層、４‥‥アノーデックエレクトロクロミック層
（アノーデックＥＣ層）、５‥‥第２の透明導電膜、６
‥‥透明基板、７‥‥絶縁体、９‥‥金属電極、１１‥
‥電圧源、１２‥‥エレクトロクロミックデバイス（Ｅ
ＣＤ）、１３‥‥マトリックスセル1 ... First transparent conductive film, 2 ... Casodec electrochromic layer (Casodec EC layer), 3 ... Ion injection layer, 4 ... Anodec electrochromic layer (Anodec EC layer), 5 ... Second Transparent conductive film, 6
Transparent substrate, 7 Insulator, 9 Metal electrode, 11
Voltage source, 12 Electrochromic device (E
CD), 13 ... Matrix cell
Claims (5)
レクトロクロミック層を格子状にパターニングしたエレ
クトロクロミックデバイスの該第１の電極上に導電性物
質を含有する被測定体を載置し、該被測定体上に載置し
た金属電極と該エレクトロクロミックデバイスの第２の
電極間に電圧を印加し、該被測定体の導電分布をパター
ニング化させて成ることを特徴とする導電性物質測定装
置。1. An object to be measured containing a conductive substance is placed on the first electrode of an electrochromic device in which at least a first electrode and a cathodic electrochromic layer are patterned in a grid pattern, and the object to be measured is placed. A conductive substance measuring device, characterized in that a voltage is applied between a metal electrode placed on a body and a second electrode of the electrochromic device to pattern the conductivity distribution of the body to be measured.
１の電極とカソーデックエレクトロクロミック層及びア
ノーデックエレクトロクロミック層並びにイオン注入層
を格子状にパターニングして成ることを特徴とする請求
項１記載の導電性物質測定装置。2. The conductive material according to claim 1, wherein the first electrode of the electrochromic device, the cathodic electrochromic layer, the anodic electrochromic layer, and the ion implantation layer are patterned in a lattice pattern. Material measuring device.
の隙間をセラミック或は樹脂等の絶縁物で充填させて成
ることを特徴とする請求項１又は請求項２記載の導電性
物質測定装置。3. The conductive substance measuring apparatus according to claim 1, wherein the gaps between the lattices patterned in the lattice shape are filled with an insulating material such as ceramic or resin.
脂、金属板に導電ペイント、導電塗料、導電性粘着剤等
を塗布した導電体であることを特徴とする請求項１乃至
請求項３記載のいづれか１項記載の導電性物質測定装
置。4. The electrically conductive material is an electrically conductive rubber, an electrically conductive resin, or an electric conductor obtained by applying an electrically conductive paint, an electrically conductive paint, an electrically conductive adhesive or the like to a metal plate. 3. The conductive substance measuring device according to any one of 3 above.
レクトロクロミック層を格子状にパターニングしたエレ
クトロクロミックデバイスの該第１の電極上に導電性物
質を含有する被測定体を載置するプロセスと、 上記被測定体上に全面に亘って金属電極を載置して押圧
させるプロセスと、 上記金属電極と上記エレクトロクロミックデバイスの第
２の電極間に電圧を印加するプロセスとにより、 上記被測定体の導電性分布を上記エレクトロクロミック
デバイスの上記格子状のパターン毎に色濃度パターンを
表示させて成ることを特徴とする導電性物質測定方法。5. A process of placing an object to be measured containing a conductive material on the first electrode of an electrochromic device in which at least a first electrode and a cathodic electrochromic layer are patterned in a grid pattern, By the process of placing and pressing the metal electrode over the entire surface of the object to be measured and applying a voltage between the metal electrode and the second electrode of the electrochromic device, the conductivity of the object to be measured is reduced. A method for measuring a conductive substance, characterized in that a color density pattern is displayed for each of the grid-like patterns of the electrochromic device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001256429A JP2003066075A (en) | 2001-08-27 | 2001-08-27 | Conductive material measuring device and measuring method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001256429A JP2003066075A (en) | 2001-08-27 | 2001-08-27 | Conductive material measuring device and measuring method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003066075A true JP2003066075A (en) | 2003-03-05 |
Family
ID=19084243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001256429A Pending JP2003066075A (en) | 2001-08-27 | 2001-08-27 | Conductive material measuring device and measuring method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003066075A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101480950B1 (en) * | 2013-12-26 | 2015-01-14 | 전자부품연구원 | Cell-structured electrochromic device and method of manufacturing the same |
| CN104483550A (en) * | 2014-11-05 | 2015-04-01 | 南京华印半导体有限公司 | Method used for measuring resistance values of printed metal electrode |
| WO2021136124A1 (en) * | 2020-01-03 | 2021-07-08 | 深圳市光羿科技有限公司 | Electrochromic device and manufacturing method |
-
2001
- 2001-08-27 JP JP2001256429A patent/JP2003066075A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101480950B1 (en) * | 2013-12-26 | 2015-01-14 | 전자부품연구원 | Cell-structured electrochromic device and method of manufacturing the same |
| CN104483550A (en) * | 2014-11-05 | 2015-04-01 | 南京华印半导体有限公司 | Method used for measuring resistance values of printed metal electrode |
| CN104483550B (en) * | 2014-11-05 | 2017-06-16 | 南京华印半导体有限公司 | A kind of method for measuring type metal electrode resistance |
| WO2021136124A1 (en) * | 2020-01-03 | 2021-07-08 | 深圳市光羿科技有限公司 | Electrochromic device and manufacturing method |
| EP4060402A4 (en) * | 2020-01-03 | 2023-12-20 | Shenzhen Guangyi Tech Co., Ltd. | Electrochromic device and manufacturing method |
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