JP2002307278A - Polishing tool retaining device and polishing device - Google Patents
Polishing tool retaining device and polishing deviceInfo
- Publication number
- JP2002307278A JP2002307278A JP2001110772A JP2001110772A JP2002307278A JP 2002307278 A JP2002307278 A JP 2002307278A JP 2001110772 A JP2001110772 A JP 2001110772A JP 2001110772 A JP2001110772 A JP 2001110772A JP 2002307278 A JP2002307278 A JP 2002307278A
- Authority
- JP
- Japan
- Prior art keywords
- polishing tool
- polishing
- spherical surface
- polisher
- holding device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、レンズ、ミラー等
の光学素子や金型等を研磨するための研磨工具を保持す
る研磨工具保持装置および研磨装置に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing tool holding apparatus and a polishing apparatus for holding a polishing tool for polishing an optical element such as a lens and a mirror, a mold and the like.
【０００２】[0002]
【従来の技術】一般的に、レンズ、ミラー等の光学素子
や金型等を研磨する研磨装置では、研磨工具を回転自在
に保持する研磨工具保持装置を、被加工物を保持する下
軸に対して相対移動させることで、研磨工具を当接した
被研磨面を研磨する。2. Description of the Related Art Generally, in a polishing apparatus for polishing an optical element such as a lens or a mirror, a mold, or the like, a polishing tool holding device for rotatably holding a polishing tool is mounted on a lower shaft for holding a workpiece. By relative movement, the surface to be polished in contact with the polishing tool is polished.
【０００３】従来、この種の研磨工具保持装置として
は、図９に示すものが知られている。これは、ポリシャ
保持部材１０１ａに、緩衝材１０１ｂを介して、例え
ば、砥石からなるポリシャ１０１ｃを固定して構成され
た研磨工具１０１を回転自在に保持するもので、研磨工
具保持装置の本体部は、円筒状の支持部材１０２を有
し、その内周には、内側に向けて突出する円環状の突出
部１０２ａが形成されている。研磨工具１０１のポリシ
ャ保持部材１０１ａと支持部材１０２との間には、ポリ
シャ保持部材１０１ａを回転自在に案内する案内部１０
３が配置されている。Conventionally, a polishing tool holding device of this type is known as shown in FIG. This holds the polishing tool 101 configured by fixing a polisher 101c made of a grindstone, for example, to a polisher holding member 101a via a cushioning material 101b so that the polishing tool 101 can rotate freely. , A cylindrical support member 102, and an annular protrusion 102 a protruding inward is formed on the inner periphery of the support member 102. A guide 10 that rotatably guides the polisher holding member 101a between the polisher holding member 101a and the support member 102 of the polishing tool 101.
3 are arranged.
【０００４】この案内部１０３は、支持部材１０２の内
周面に外周を嵌合され、突出部１０２ａに後端面を当接
される球体保持部材１０３ａと、この球体保持部材１０
３ａに保持される３個以上の球体１０３ｂとから構成さ
れている。[0004] The guide portion 103 has a sphere holding member 103a whose outer periphery is fitted on the inner peripheral surface of the support member 102 and whose rear end surface is in contact with the protruding portion 102a.
3a and three or more spheres 103b.
【０００５】研磨工具１０１のポリシャ保持部材１０１
ａは、凸球面１０１ｄと端面１０１ｅとからなるほぼ半
球状に形成され、端面１０１ｅに、緩衝材１０１ｂを介
してポリシャ１０１ｃが固定されている。[0005] Polisher holding member 101 of polishing tool 101
“a” is formed in a substantially hemispherical shape including a convex spherical surface 101d and an end surface 101e, and a polisher 101c is fixed to the end surface 101e via a cushioning material 101b.
【０００６】ポリシャ保持部材１０１ａの凸球面１０１
ｄの球心は、ポリシャ１０１ｃの研磨中心点Ｏに一致し
ており、複数の球体１０３ｂの凸球面１０１ｄへの接触
部Ｃは、同一の円周Ｓ上に配置されている。The convex spherical surface 101 of the polisher holding member 101a
The spherical center of d coincides with the polishing center point O of the polisher 101c, and the contact portions C of the plurality of spherical bodies 103b with the convex spherical surface 101d are arranged on the same circumference S.
【０００７】ポリシャ保持部材１０１ａの凸球面１０１
ｄの中心には、研磨工具１０１を回転させるための回転
伝達部材１０４が配設されている。回転伝達部材１０４
は、円弧状の溝部１０４ａおよび係止ピン１０４ｂを備
えた一対のユニバーサルジョイントからなり、紙面に対
して垂直方向および平行方向に揺動自在に構成されてい
る。The convex spherical surface 101 of the polisher holding member 101a
At the center of d, a rotation transmitting member 104 for rotating the polishing tool 101 is provided. Rotation transmitting member 104
Is composed of a pair of universal joints having an arc-shaped groove 104a and a locking pin 104b, and is configured to be swingable in a direction perpendicular and parallel to the plane of the paper.
【０００８】回転伝達部材１０４には、工具回転軸１０
５の先端から突出する突出部１０５ａが連結されてい
る。工具回転軸１０５の先端部には、鍔部１０５ｂが形
成され、この鍔部１０５ｂがボルト１０６により支持部
材１０２に連結されている。The rotation transmitting member 104 includes a tool rotating shaft 10.
5 are connected to each other. A flange 105 b is formed at the tip of the tool rotation shaft 105, and the flange 105 b is connected to the support member 102 by a bolt 106.
【０００９】また、支持部材１０２と研磨工具１０１と
の間に形成される空間は、可撓性部材からなるシール部
材１０７により密閉されている（特開平７−０７５９５
２号公報参照）。A space formed between the support member 102 and the polishing tool 101 is sealed by a seal member 107 made of a flexible member (Japanese Patent Laid-Open No. 07-07595).
No. 2).
【００１０】このような研磨工具保持装置を用いて、図
示しない下軸に保持された被加工物の被研磨面に研磨工
具を押し付けて、研磨工具を垂直軸周りに回転運動させ
ることにより、研磨加工を行なっていた。By using such a polishing tool holding device, a polishing tool is pressed against a surface to be polished of a workpiece held by a lower shaft (not shown), and the polishing tool is rotated about a vertical axis to thereby perform polishing. Processing was done.
【００１１】[0011]
【発明が解決しようとする課題】しかしながらこのよう
な従来の研磨工具保持装置では、研磨工具１０１のポリ
シャ保持部材１０１ａが有する凸球面１０１ｄと複数の
球体１０３ｂが接触する構成であるため、研磨加工中に
研磨工具１０１が垂直軸回りに回転運動を行なうと、ポ
リシャ保持部材１０１ａと球体１０３ｂの接触部Ｃにお
いて常に水平方向の摩擦力が生じ、加工中に研磨工具１
０１が被研磨面の形状にならって動こうとすると、接触
部Ｃに生じている摩擦力が研磨工具１０１の動きを妨げ
る向きに作用するので、研磨工具１０１の研磨中心点Ｏ
周りの滑らかな回転を阻害して、研磨中心点Ｏを通る水
平軸周りのモーメントが研磨工具１０１に発生し、被研
磨面を均一な圧力分布によって研磨することが困難にな
るという未解決の課題があった。However, in such a conventional polishing tool holding device, the convex spherical surface 101d of the polisher holding member 101a of the polishing tool 101 and the plurality of spheres 103b are in contact with each other. When the polishing tool 101 rotates about a vertical axis, a horizontal frictional force is always generated at the contact portion C between the polisher holding member 101a and the sphere 103b.
01 moves along the shape of the surface to be polished, the frictional force generated at the contact portion C acts in a direction that hinders the movement of the polishing tool 101.
An unsolved problem that the smooth rotation of the periphery is hindered and a moment about the horizontal axis passing through the polishing center point O is generated in the polishing tool 101, making it difficult to polish the surface to be polished with a uniform pressure distribution. was there.
【００１２】さらに、ポリシャ保持部材１０１ａの自由
な回転が回転伝達部材１０４で阻止され、このために、
研磨中心点Ｏを通る垂直軸周りのモーメントが研磨工具
１０１に発生し、研磨除去形状を悪化させるという問題
もあった。Further, free rotation of the polisher holding member 101a is prevented by the rotation transmitting member 104.
There is also a problem that a moment about a vertical axis passing through the polishing center point O is generated in the polishing tool 101, and the shape removed by polishing is deteriorated.
【００１３】また、接触部Ｃにおいて摺動が繰り返され
ると、凸球面１０１ｄや球体１０３ｂが摩耗して、凸球
面１０１ｄの曲率半径が変化し、その曲率中心が研磨中
心点Ｏと一致しなくなる。その結果、研磨工具１０１に
モーメントが発生し、被研磨面にかかる圧力分布を均一
にできないという問題もあった。Further, when sliding is repeated at the contact portion C, the convex spherical surface 101d and the spherical body 103b are worn, the radius of curvature of the convex spherical surface 101d changes, and the center of curvature does not coincide with the polishing center point O. As a result, there is a problem that a moment is generated in the polishing tool 101 and the pressure distribution applied to the surface to be polished cannot be made uniform.
【００１４】さらに、被研磨面の端部付近を加工すると
きに以下のような問題も生じる。すなわち、被加工物の
端部近傍において、研磨工具１０１が研磨中心点Ｏを通
る垂直軸より外側にはみ出す状態で研磨加工を行なう
と、被研磨面から受ける圧力で生じる回転モーメントに
より研磨工具１０１が外側に大きく傾斜し、被研磨面上
の圧力分布が均一でなくなってしまう。最悪の場合に
は、研磨工具１０１が被研磨面から外れて研磨工具１０
１および被研磨面を損傷する。Further, the following problems occur when processing the vicinity of the end of the polished surface. That is, when polishing is performed in a state in which the polishing tool 101 protrudes outside the vertical axis passing through the polishing center point O near the end of the workpiece, the polishing tool 101 is rotated by a rotational moment generated by a pressure received from the surface to be polished. As a result, the pressure distribution on the surface to be polished is not uniform. In the worst case, the polishing tool 101 comes off the surface to be polished and the polishing tool 10
1 and the surface to be polished are damaged.
【００１５】このように、被研磨面の端部における研磨
圧力の不均一のために、急激な形状曲線の変化が避けら
れず、被研磨面の形状精度を著しく損なう原因となって
いた。As described above, the unevenness of the polishing pressure at the end of the polished surface inevitably causes a sharp change in the shape curve, causing a significant deterioration in the shape accuracy of the polished surface.
【００１６】本発明は上記従来の技術の有する未解決の
課題に鑑みてなされたものであり、研磨工具を被加工物
に対して相対移動させたときの連れ回りを含む全方向の
回転が自在であり、しかも摩擦によるトラブルや被加工
物の端部での研磨工具の脱落、傾斜等のおそれもなく、
均一な圧力分布で安定して高精度の研磨を行なうことが
できる研磨工具保持装置および研磨装置を提供すること
を目的とするものである。The present invention has been made in view of the above-mentioned unresolved problems of the prior art, and is free to rotate in all directions including co-rotation when a polishing tool is relatively moved with respect to a workpiece. In addition, there is no risk of trouble due to friction, falling off of the polishing tool at the end of the workpiece, inclination, etc.
It is an object of the present invention to provide a polishing tool holding device and a polishing device capable of stably performing high-precision polishing with a uniform pressure distribution.
【００１７】[0017]
【課題を解決するための手段】上記目的を達成するた
め、本発明の研磨工具保持装置は、ポリシャの研磨中心
点を球心とする凸球面を有する研磨工具の前記凸球面に
嵌合する凹球面を備えた支持部材と、前記研磨工具の前
記凸球面と前記支持部材の前記凹球面の間の間隙に加圧
流体を供給するための加圧流体供給手段と、前記研磨工
具と前記支持部材を互いに吸引する吸引力を発生する吸
引手段と、前記吸引力を調節するための可変磁力を発生
させる吸引力調節手段を有することを特徴とする。In order to achieve the above object, a polishing tool holding device according to the present invention comprises a polishing tool having a convex spherical surface whose center is a polishing center point of a polisher. A support member having a spherical surface, pressurized fluid supply means for supplying a pressurized fluid to a gap between the convex spherical surface of the polishing tool and the concave spherical surface of the support member, the polishing tool and the support member And a suction force adjusting means for generating a variable magnetic force for adjusting the suction force.
【００１８】吸引力調節手段が、コイルと、これに流す
電流を制御するコントローラを有するとよい。It is preferable that the suction force adjusting means has a coil and a controller for controlling a current flowing through the coil.
【００１９】吸引手段が磁石を有し、吸引力調節手段を
構成するコイルとともに磁気回路を形成しているとよ
い。Preferably, the attraction means has a magnet and forms a magnetic circuit together with a coil constituting the attraction force adjusting means.
【００２０】被加工物と研磨工具の相対位置に基づいて
吸引力調節手段が制御されるとよい。The suction force adjusting means may be controlled based on the relative position between the workpiece and the polishing tool.
【００２１】被加工物と研磨工具の相対位置を検知する
位置検出手段が設けられているとよい。Preferably, a position detecting means for detecting the relative position between the workpiece and the polishing tool is provided.
【００２２】研磨工具の少なくとも一部分が磁性体であ
るとよい。It is preferable that at least a part of the polishing tool is made of a magnetic material.
【００２３】支持部材の凹球面の一部または全体が多孔
質材料で形成されているとよい。A part or the whole of the concave spherical surface of the supporting member is preferably formed of a porous material.
【００２４】本発明の研磨装置は、上記の研磨工具保持
装置と、これによって保持された研磨工具と、前記研磨
工具保持装置を被加工物に対して相対運動させるための
駆動機構を有することを特徴とする。A polishing apparatus according to the present invention includes the above-mentioned polishing tool holding device, a polishing tool held by the polishing tool holding device, and a drive mechanism for moving the polishing tool holding device relative to a workpiece. Features.
【００２５】[0025]
【作用】支持部材の凹球面と研磨工具の凸球面の間に供
給される加圧流体による流体潤滑を用いて、研磨工具を
支持部材に対して非接触に支持しているため、球体を介
在させた場合のような接触部での摩擦力を排除して、研
磨工具を研磨面の中心点（研磨中心点）の周りにあらゆ
る方向に滑らかに回転させることができる。このとき、
凹球面に対して凸球面が、磁石等の吸引手段の吸引力に
よって吸引・付勢されており、このような吸引力による
予圧によって流体潤滑膜の剛性が確保されており、ま
た、必要に応じて吸引力調節手段の可変磁力によって予
圧を増大させることでより高い剛性を得られるため、回
転精度も向上し、研磨工具のより安定した運動が可能と
なる。The polishing tool is supported in a non-contact manner with respect to the support member by using fluid lubrication by a pressurized fluid supplied between the concave spherical surface of the support member and the convex spherical surface of the polishing tool. By removing the frictional force at the contact portion as in the case where the polishing is performed, the polishing tool can be smoothly rotated in all directions around the center point (polishing center point) of the polishing surface. At this time,
The convex spherical surface is attracted and urged by the attracting force of the attracting means such as a magnet to the concave spherical surface, and the rigidity of the fluid lubricating film is secured by the preload by such attractive force. By increasing the preload by the variable magnetic force of the suction force adjusting means, higher rigidity can be obtained, so that the rotation accuracy is also improved, and more stable movement of the polishing tool becomes possible.
【００２６】また、研磨工具の凸球面の球心と支持部材
の凹球面の球心が、研磨工具の研磨中心点と一致してお
り、研磨中に生じる力の作用点が研磨中心点であるた
め、研磨工具にモーメントが発生しない。The spherical center of the convex spherical surface of the polishing tool and the spherical center of the concave spherical surface of the support member coincide with the polishing center point of the polishing tool, and the point of action of the force generated during polishing is the polishing center point. Therefore, no moment is generated in the polishing tool.
【００２７】さらに、研磨工具を支持する支持部材の凹
球面に対して研磨工具の凸球面は非接触で回転自在であ
るため、研磨工具が回転したときの摩擦による磨耗が生
じない。従って、支持部材の凹球面と研磨工具の凸球面
の曲率半径はそれぞれ半永久的に一定に維持され、長期
にわたって安定した高精度の研磨加工を継続できる。Further, since the convex spherical surface of the polishing tool is rotatable in a non-contact manner with respect to the concave spherical surface of the support member for supporting the polishing tool, no wear occurs due to friction when the polishing tool rotates. Therefore, the radius of curvature of the concave spherical surface of the support member and the radius of curvature of the convex spherical surface of the polishing tool are each maintained constant semipermanently, and stable high-precision polishing can be continued over a long period.
【００２８】加えて、凹球面と凸球面との間の吸引力
を、応答の速い電磁石（コイル）等の可変磁力によって
制御自在に構成することで、被研磨面の端部において、
瞬間的に吸引力を強めて、支持部材の凹球面に対して研
磨工具を素早く吸着し、研磨工具のピッチング運動（傾
斜）を防ぐことができる。In addition, the attractive force between the concave spherical surface and the convex spherical surface can be controlled by a variable magnetic force of a fast-response electromagnet (coil) or the like.
By instantaneously increasing the suction force, the polishing tool can be quickly attracted to the concave spherical surface of the support member, and the pitching movement (inclination) of the polishing tool can be prevented.
【００２９】被研磨面の端部から研磨工具の一部がはみ
出した場合でも、吸引力調節手段によって吸引力を増大
させれば、研磨工具が脱落することなく、研磨工具の姿
勢を安定保持することができる。Even when a part of the polishing tool protrudes from the end of the surface to be polished, if the suction force is increased by the suction force adjusting means, the posture of the polishing tool is stably maintained without the polishing tool falling off. be able to.
【００３０】このように、被加工物の端部における研磨
工具の脱落、姿勢変化を効果的に回避して、端部も含め
た全ての被研磨面を均一な圧力分布で安定して研磨する
ことができる。As described above, it is possible to effectively avoid the falling off of the polishing tool and the change in the posture at the end of the workpiece and to stably grind all the polished surfaces including the end with a uniform pressure distribution. be able to.
【００３１】[0031]
【発明の実施の形態】本発明の実施の形態を図面に基づ
いて説明する。Embodiments of the present invention will be described with reference to the drawings.
【００３２】図１は第１の実施の形態を示すもので、研
磨工具１０は、被加工物Ｗの被研磨面に接触している粘
弾性体層１ｂと、その一部が金属等の磁性体１ｃとを貼
り合せたポリシャ１と、これを保持するポリシャ保持部
材２を有し、ポリシャ１の粘弾性体層１ｂの図示下面が
研磨面１ａとなっている。FIG. 1 shows a first embodiment, in which a polishing tool 10 comprises a viscoelastic layer 1b in contact with a surface to be polished of a workpiece W, and a part of which is a magnetic material such as metal. The polisher 1 includes a polisher 1 bonded to a body 1c and a polisher holding member 2 for holding the polisher. The illustrated lower surface of the viscoelastic layer 1b of the polisher 1 is a polished surface 1a.
【００３３】被加工物Ｗの被研磨面に対して研磨工具１
０の研磨面１ａは充分小さい外径を有する。例えば、直
径φ２００ｍｍの被研磨面に対して、ポリシャ１は外径
φ２０ｍｍを有する円柱形状をなしている。ポリシャ１
を保持するポリシャ保持部材２は、その一部が磁性体で
作られており、磁性体１ｃを貼り合わされたポリシャ１
が、図示しない磁石の磁力を用いてポリシャ保持部材２
に吸着・保持され、前記磁石の磁力に抗してポリシャ１
を引き離すことにより、ポリシャ保持部材２から容易に
ポリシャ１を取り外すことができるように構成されてい
る。The polishing tool 1 is applied to the surface of the workpiece W to be polished.
The 0 polished surface 1a has a sufficiently small outer diameter. For example, for a surface to be polished having a diameter of 200 mm, the polisher 1 has a cylindrical shape having an outer diameter of 20 mm. Polisher 1
Of the polisher holding member 2 for holding the magnetic member 1c, the polisher 1 having the magnetic member 1c bonded thereto.
However, the polisher holding member 2 is formed using the magnetic force of a magnet (not shown).
Is attracted to and held by the polisher 1 against the magnetic force of the magnet.
, The polisher 1 can be easily removed from the polisher holding member 2.
【００３４】ポリシャ保持部材２を回転自在に支持する
支持部材４は、ポリシャ保持部材２の凸球面２ａに対向
して設けられた凹球面４ａを有し、前述のように一部が
磁性体であるポリシャ保持部材２は、支持部材４と一体
的に配設された吸引手段である磁石５の吸引力によって
吸引・保持されている。磁石５は、そのＮ極およびＳ極
が図１の（ａ）において上下方向になるように配設さ
れ、支持部材４の中心軸Ｍに沿って作用する磁力によっ
て、ポリシャ保持部材２の凸球面２ａが支持部材４の凹
球面４ａに向かって吸引・付勢される。このとき、ポリ
シャ保持部材２の凸球面２ａと支持部材４の凹球面４ａ
が、両者の摩擦係数が例えば、摩擦係数μ＝０．１以下
に低くなる材料の組み合わせ（例えば、フッ素樹脂と
鉄、セラミックスと鉄）で構成されていれば、吸着時に
損傷する危険性が少なくなる。The support member 4 for rotatably supporting the polisher holding member 2 has a concave spherical surface 4a provided opposite to the convex spherical surface 2a of the polisher holding member 2, and a part thereof is made of a magnetic material as described above. A certain polisher holding member 2 is attracted and held by the attraction force of a magnet 5 which is a suction means provided integrally with the support member 4. The magnet 5 is disposed so that its north and south poles are arranged vertically in FIG. 1A, and the convex spherical surface of the polisher holding member 2 is formed by a magnetic force acting along the central axis M of the support member 4. 2a is sucked and urged toward the concave spherical surface 4a of the support member 4. At this time, the convex spherical surface 2a of the polisher holding member 2 and the concave spherical surface 4a of the support member 4
However, if they are composed of a combination of materials (for example, fluororesin and iron, ceramics and iron) whose friction coefficient is reduced to, for example, a friction coefficient μ = 0.1 or less, the risk of damage at the time of adsorption is small. Become.
【００３５】ポリシャ保持部材２には、ポリシャ１を吸
着・保持する面と反対側に上記の凸球面２ａが形成され
ており、凸球面２ａの球心は、ポリシャ１の研磨面１ａ
の中心点（研磨中心点）Ｏと一致する。支持部材４の凹
球面４ａは、前記凸球面２ａと対向してこれを嵌合させ
るもので、支持部材４の中心軸Ｍ上の凹球面４ａの球心
も前記研磨中心点Ｏと一致する。このとき、凸球面２ａ
の曲率半径と凹球面４ａの曲率半径はほぼ同一に形成さ
れ、曲率半径の差はせいぜい数十μｍ程度である。On the polisher holding member 2, the above-mentioned convex spherical surface 2 a is formed on the side opposite to the surface on which the polisher 1 is sucked and held.
(The center point of polishing) O. The concave spherical surface 4a of the support member 4 is opposed to the convex spherical surface 2a and fitted thereto. The spherical center of the concave spherical surface 4a on the central axis M of the support member 4 also coincides with the polishing center point O. At this time, the convex spherical surface 2a
And the radius of curvature of the concave spherical surface 4a are substantially the same, and the difference between the radii of curvature is at most about several tens of μm.
【００３６】支持部材４の凹球面４ａには、支持部材４
の上面から貫通する加圧流体供給手段である、内径φ１
ｍｍ程度の微小な給気孔４ｂが設けられている。複数個
の給気孔４ｂを用いる場合は、図１の（ｂ）に示すよう
に、同一円周上に等間隔で配置される。The supporting member 4 has a concave spherical surface 4a.
Inner diameter φ1 which is a pressurized fluid supply means penetrating from the upper surface of
A minute air supply hole 4b of about mm is provided. When a plurality of air supply holes 4b are used, they are arranged at equal intervals on the same circumference as shown in FIG.
【００３７】給気孔４ｂは流体絞りとなっているが、支
持部材４の内部に別途オリフィス絞り、自成絞り等を設
けてもよい。さらに、給気孔４ｂは、無数の給気孔を持
つ多孔質材料で構成しても同様の機能を持たせることが
可能である。Although the air supply hole 4b is a fluid restrictor, an orifice restrictor, a self-contained restrictor, and the like may be separately provided inside the support member 4. Further, the same function can be provided even if the air supply hole 4b is made of a porous material having an infinite number of air supply holes.
【００３８】また、支持部材４には、凹球面４ａから上
面に貫通する排気孔４ｃが設けられており、給気孔４ｂ
から噴出する加圧流体は、排気孔４ｃを通り、磁石５を
支持する支持体６に設けられた通気孔６ａから外部に排
出される。排気効率をあげるため、排気孔４ｃは給気孔
４ｂより大径であり、例えば、外径φ４ｍｍ程度に設定
されている。The support member 4 is provided with an exhaust hole 4c penetrating from the concave spherical surface 4a to the upper surface.
The pressurized fluid ejected from the nozzle passes through the exhaust hole 4c and is discharged to the outside through the vent hole 6a provided in the support 6 supporting the magnet 5. In order to increase the exhaust efficiency, the exhaust hole 4c has a larger diameter than the air supply hole 4b, and is set to, for example, an outer diameter of about 4 mm.
【００３９】ポリシャ保持部材２の凸球面２ａと支持部
材４の凹球面４ａとの間隙の流体潤滑は以下のように行
なわれる。The fluid lubrication in the gap between the convex spherical surface 2a of the polisher holding member 2 and the concave spherical surface 4a of the support member 4 is performed as follows.
【００４０】外部の加圧流体供給源から供給された加圧
流体、例えば、ゲージ圧５ｋｇｆ／ｃｍ2 （４９０ｋＰ
ａ）の乾燥空気は、矢印Ａで示すように、支持部材４の
内部を通り、凹球面４ａに開口する各給気孔４ｂからポ
リシャ保持部材２の凸球面２ａに対して噴出され、凸球
面２ａおよび凹球面４ａに沿って、矢印Ｂに示すように
流動する。支持部材４の中央へ流動した加圧流体は、支
持部材４の内部に設けられた排気孔４ｃを通って、矢印
Ｃで示すように排出され、また、外周部に流出した加圧
流体は、そのまま外部に排出される。このときの加圧流
体の流動により、対向する凸球面２ａと凹球面４ａの間
に数十μｍ程度の流体潤滑膜が形成され、その流体圧力
により凹球面４ａに対して凸球面２ａを非接触に支持す
る。A pressurized fluid supplied from an external pressurized fluid supply source, for example, a gauge pressure of 5 kgf / cm 2 (490 kP
The dry air of a) passes through the inside of the support member 4 and is blown out from each air supply hole 4b opening to the concave spherical surface 4a to the convex spherical surface 2a of the polisher holding member 2 as shown by an arrow A, and the convex spherical surface 2a And flows along the concave spherical surface 4a as shown by the arrow B. The pressurized fluid flowing to the center of the support member 4 is discharged as shown by an arrow C through an exhaust hole 4c provided inside the support member 4, and the pressurized fluid flowing to the outer peripheral portion is It is discharged to the outside as it is. Due to the flow of the pressurized fluid at this time, a fluid lubricating film of about several tens of μm is formed between the facing convex spherical surface 2a and concave spherical surface 4a, and the convex spherical surface 2a is brought into non-contact with the concave spherical surface 4a by the fluid pressure. To support.
【００４１】一方、支持部材４に取り付けた磁石５の磁
力（吸引力）により、凹球面２ａが凸球面４ａに吸引さ
れているため、例えば、凸球面２ａと凹球面４ａの間隙
を２０μｍ程度と微小にすることで、流体潤滑膜の圧力
を高めて、凹球面４ａに対する凸球面２ａの支持剛性を
強化することができる。On the other hand, since the concave spherical surface 2a is attracted to the convex spherical surface 4a by the magnetic force (attraction force) of the magnet 5 attached to the support member 4, for example, the gap between the convex spherical surface 2a and the concave spherical surface 4a is about 20 μm. By making it small, the pressure of the fluid lubricating film can be increased, and the support rigidity of the convex spherical surface 2a with respect to the concave spherical surface 4a can be enhanced.
【００４２】加圧流体の流れはその一部が外周方向に向
かっており、凸球面２ａと凹球面４ａのなす間隙を外部
に対してシールする作用も有しているので、使用する研
磨剤に含有される砥粒が軸受間隙に入り込む可能性は極
めて低い。また凸球面２ａと凹球面４ａのなす間隙に砥
粒が入り込んだ場合でも、使用する研磨剤に含有される
砥粒の径は、前記間隙の間隙寸法よりも小さいので、凹
球面４ａに対して凹球面２ａが回転したときも、凸球面
２ａや凹球面４ａを損傷することはない。A part of the flow of the pressurized fluid is directed toward the outer periphery, and also has a function of sealing the gap between the convex spherical surface 2a and the concave spherical surface 4a from the outside. The possibility that the contained abrasive grains enter the bearing gap is extremely low. Even when the abrasive particles enter the gap between the convex spherical surface 2a and the concave spherical surface 4a, the diameter of the abrasive particles contained in the abrasive used is smaller than the gap size of the gap. Even when the concave spherical surface 2a rotates, the convex spherical surface 2a and the concave spherical surface 4a are not damaged.
【００４３】磁石５には吸引力調節手段であるコイル７
が巻回されており、図２に示す磁気回路を構成してい
る。コイル７は、中心軸Ｍに沿って配設された磁石５の
周りに複数回導線を巻き付けたもので、導線を巻く方向
は、時計周り、反時計周りのいずれでもよい。また、被
加工物Ｗの形状、研磨工具１０の送り速度等の加工条件
から、研磨工具１０の被加工物Ｗに対する相対位置を算
出し、これに基づいてコイル７に流す電流Ｉｍを調節す
るため制御信号を送るコントローラ８が設けられる。コ
イル７とコントローラ８は、リード線により電気的に接
続されている。The magnet 5 has a coil 7 serving as an attractive force adjusting means.
Are wound, and constitute the magnetic circuit shown in FIG. The coil 7 has a conductor wound around the magnet 5 arranged along the central axis M a plurality of times, and the direction in which the conductor is wound may be clockwise or counterclockwise. Further, the relative position of the polishing tool 10 with respect to the workpiece W is calculated from the processing conditions such as the shape of the workpiece W and the feed speed of the polishing tool 10, and the current Im flowing through the coil 7 is adjusted based on the calculated position. A controller 8 for sending a control signal is provided. The coil 7 and the controller 8 are electrically connected by a lead wire.
【００４４】電流Ｉｍを流すとコイル７に熱が発生する
が、支持部材４の排気孔４ｃを通って通気孔６ａから外
部に排出される加圧流体がコイル７を冷却する働きをす
る。When the current Im flows, heat is generated in the coil 7, but the pressurized fluid discharged to the outside from the ventilation hole 6 a through the exhaust hole 4 c of the support member 4 serves to cool the coil 7.
【００４５】図２においては、コイル７が中心軸Ｍの鉛
直下向きを正として反時計周りに導線が巻かれており、
磁石５のＮ極が鉛直上側に位置する場合を例にして、磁
気回路の作用について説明する。In FIG. 2, a conductor is wound in a counterclockwise direction with the coil 7 having a positive direction perpendicular to the center axis M,
The operation of the magnetic circuit will be described by taking, as an example, a case where the N pole of the magnet 5 is positioned vertically above.
【００４６】磁石５は、その永久磁石の為す磁界Ｈｍに
より、凹球面４ａに対し凸球面２ａを吸引している。形
成される磁界の向きは、磁石５の内部ではＳ極からＮ極
へつまり鉛直上向きで、外部では逆に鉛直上向きであ
る。この磁石５に巻かれたコイル７に、図２に示すよう
な向きに電流Ｉｍが流れると、「右ネジの法則」によ
り、瞬間的に磁界Ｈｍが強められ、凹球面４ａに対し凸
球面２ａを吸引する吸引力を増加させる可変磁力が発生
する。その結果、凸球面２ａは矢印Ｆｍの方向に瞬時に
移動する。The magnet 5 attracts the convex spherical surface 2a to the concave spherical surface 4a by the magnetic field Hm generated by the permanent magnet. The direction of the formed magnetic field is from the south pole to the north pole, that is, vertically upward inside the magnet 5, and vertically upward inside the magnet 5. When a current Im flows through the coil 7 wound around the magnet 5 in a direction as shown in FIG. 2, the magnetic field Hm is instantaneously strengthened by the "right-handed screw rule", and the convex spherical surface 2a is reduced with respect to the concave spherical surface 4a. A variable magnetic force is generated to increase the attraction force for attracting the magnet. As a result, the convex spherical surface 2a instantaneously moves in the direction of the arrow Fm.
【００４７】研磨工具１０を図示しない駆動機構によっ
て被加工物Ｗに対して相対運動させる研磨加工中は、図
８に示すように、研磨工具１０を被加工物Ｗの被研磨面
に押圧するべく支持部材４に加えられた加圧力Ｐと、支
持部材４を揺動させた時に生じる揺動力Ｎの合力が、支
持部材４の凹球面４ａから流体潤滑膜Ｌを介して、ポリ
シャ保持部材２の凸球面２ａに伝わり、ポリシャ保持部
材２に保持されたポリシャ１の研磨面１ａの加工力とな
る。During the polishing process in which the polishing tool 10 is relatively moved with respect to the workpiece W by a drive mechanism (not shown), the polishing tool 10 is pressed against the surface to be polished of the workpiece W as shown in FIG. The resultant force of the pressing force P applied to the support member 4 and the oscillating force N generated when the support member 4 is oscillated is transmitted from the concave spherical surface 4 a of the support member 4 via the fluid lubricating film L to the polisher holding member 2. It is transmitted to the convex spherical surface 2a and becomes a processing force of the polished surface 1a of the polisher 1 held by the polisher holding member 2.
【００４８】このときの研磨工具１０は、図１に示した
ように被加工物Ｗの被研磨面に沿った方向に往復運動を
行なうものである。At this time, the polishing tool 10 reciprocates in the direction along the polished surface of the workpiece W as shown in FIG.
【００４９】ポリシャ保持部材２の凸球面２ａの球心と
支持部材４の凹球面４ａの球心とは、研磨面１ａの中心
点Ｏとそれぞれ一致するので、ポリシャ保持部材２が支
持部材４に対してどのように傾斜していても、前記加工
力の作用点は研磨面１ａの中心点Ｏに位置する。この研
磨時に発生する摩擦力Ｆも、研磨面１ａに作用するの
で、研磨工具１０を回転させようとする偶力（モーメン
ト）は発生しない。従って、研磨面１ａの圧力分布ωは
常に一定に保たれる。The spherical center of the convex spherical surface 2a of the polisher holding member 2 and the spherical center of the concave spherical surface 4a of the supporting member 4 coincide with the center point O of the polishing surface 1a. Regardless of the inclination, the point of application of the processing force is located at the center point O of the polishing surface 1a. Since the frictional force F generated during the polishing also acts on the polishing surface 1a, no couple (moment) for rotating the polishing tool 10 is generated. Therefore, the pressure distribution ω on the polishing surface 1a is always kept constant.
【００５０】加えて、上記の研磨工具保持装置において
は、前述のように、支持部材４が流体潤滑を用いて、ポ
リシャ１を保持するポリシャ保持部材２を非接触に支持
しているため、図９に示す従来例のように接触部を有す
る場合に比べて、摩擦抵抗がほぼ皆無となり、研磨工具
１０を研磨中心点Ｏ周りに滑らかに回転させることがで
きる。In addition, in the above-described polishing tool holding device, as described above, the support member 4 supports the polisher holding member 2 for holding the polisher 1 in a non-contact manner by using fluid lubrication. As compared with the case of the conventional example shown in FIG. 9, there is almost no frictional resistance, and the polishing tool 10 can be smoothly rotated around the polishing center point O.
【００５１】また、凸球面２ａを非接触に支持している
ため、研磨工具１０が被加工物Ｗにならって回転しても
凸球面２ａが摩耗することなく、凸球面２ａの曲率半径
を半永久的に一定に維持できるという利点も付加され
る。Further, since the convex spherical surface 2a is supported in a non-contact manner, the convex spherical surface 2a does not wear even when the polishing tool 10 rotates following the workpiece W, and the radius of curvature of the convex spherical surface 2a is semi-permanent. The advantage that it can be kept constant constant is also added.
【００５２】さらに、ポリシャ保持部材２の凸球面２ａ
は支持部材４の凹球面４ａの給気孔４ｂから噴出する加
圧流体による流体潤滑によって支持する構成であるた
め、ポリシャ保持部材２と支持部材４とは完全に非接触
であり、研磨工具１０の研磨面１ａに垂直軸周りに回転
する力が加えられたとしても、抵抗なくスムースに回転
することができる。Further, the convex spherical surface 2a of the polisher holding member 2
Is configured to be supported by fluid lubrication by pressurized fluid ejected from the air supply hole 4b of the concave spherical surface 4a of the support member 4, so that the polisher holding member 2 and the support member 4 are completely non-contact, and the polishing tool 10 Even if a force that rotates around the vertical axis is applied to the polishing surface 1a, the polishing surface 1a can rotate smoothly without resistance.
【００５３】図３は、被加工物Ｗの端部を研磨工具１０
が研磨するときのコイル７の可変磁力による吸引力調節
作用を説明するものである。コントローラ８では、図５
のフローチャートに示すように、被加工物Ｗの形状およ
び研磨工具１０の送り速度等の加工条件から、常に研磨
工具１０の被加工物Ｗに対する相対位置を算出している
（ステップＳ１）。図３の状態で研磨工具１０が被加工
物Ｗからはみ出すと判断した場合には（ステップＳ
２）、コントローラ８より制御信号が出されて（ステッ
プＳ３）、コイル７に電流Ｉｍを流すことによって（ス
テップＳ４）、瞬時に凸球面２ａと凹球面４ａの間の吸
引力を増加する。FIG. 3 shows a state in which the end of the workpiece W is
FIG. 7 explains the attraction force adjusting action by the variable magnetic force of the coil 7 when polishing. In the controller 8, FIG.
As shown in the flowchart, the relative position of the polishing tool 10 with respect to the workpiece W is constantly calculated from the processing conditions such as the shape of the workpiece W and the feed speed of the polishing tool 10 (step S1). When it is determined that the polishing tool 10 protrudes from the workpiece W in the state of FIG.
2) A control signal is output from the controller 8 (step S3), and a current Im flows through the coil 7 (step S4), thereby instantaneously increasing the attraction force between the convex spherical surface 2a and the concave spherical surface 4a.
【００５４】すると、図８の流体潤滑膜Ｌが瞬間的に消
失して、図３の矢印Ｆ１の向きに支持部材４が移動し、
凹球面４ａに対して凸球面２ａが接触かつ固定される。
その結果、研磨工具１０のピッチング運動が抑制され、
研磨工具１０の脱落あるいは大きな傾斜を防ぐことがで
きる。Then, the fluid lubricating film L in FIG. 8 disappears instantaneously, and the support member 4 moves in the direction of arrow F1 in FIG.
The convex spherical surface 2a is in contact with and fixed to the concave spherical surface 4a.
As a result, the pitching movement of the polishing tool 10 is suppressed,
The falling off or large inclination of the polishing tool 10 can be prevented.
【００５５】通常は、永久磁石である磁石５のみの磁力
により、流体潤滑膜Ｌに対する予圧力を与えており、磁
石５とコイル７、コントローラ８、それらを繋ぐリード
線からなる磁気回路は、前記予圧力に加えてさらに強い
吸引力を必要とする場合にのみ、電流Ｉｍを流す。従っ
て、被加工物Ｗの端部以外ではコイル７に電流が流れな
いため、熱を発生することなく、加工に影響を与えな
い。また、電流Ｉｍによって発生したわずかな熱に対し
ても、流体潤滑膜をなす加圧流体が排気孔４ｃ、通気孔
６ａを通って、支持部材４の外部に排出されるため、発
熱するコイル７を加圧流体の排気によって冷却すること
ができる。Normally, a preload is applied to the fluid lubricating film L by the magnetic force of only the magnet 5, which is a permanent magnet, and the magnetic circuit composed of the magnet 5, the coil 7, the controller 8, and the lead wire connecting them is as described above. The current Im flows only when a stronger suction force is required in addition to the preload. Therefore, no current flows through the coil 7 except at the end of the workpiece W, so that no heat is generated and the processing is not affected. Further, even with a small amount of heat generated by the current Im, the pressurized fluid forming the fluid lubricating film is discharged to the outside of the support member 4 through the exhaust hole 4c and the vent hole 6a, so that the heat generating coil 7 is heated. Can be cooled by evacuating the pressurized fluid.
【００５６】これに対して、従来例の場合は、図４に示
すように被加工物Ｗの端部においても研磨工具１０１の
ピッチング方向の回転を拘束できず、以下のようなトラ
ブルを生じる。On the other hand, in the case of the conventional example, as shown in FIG. 4, the rotation of the polishing tool 101 in the pitching direction cannot be restricted even at the end of the workpiece W, and the following troubles occur.
【００５７】被加工物Ｗの外に研磨工具１０１のポリシ
ャ１０１ｃがはみ出すと、研磨工具１０１を取り付けた
凸球面は、ユニバーサルジョイントの円弧状の溝部およ
び係止ピンによってピッチング方向の運動を規制される
ものの、被加工物Ｗの接触部分から受ける圧力により回
転モーメントが生じ、球体１０３ｂに接触して倣うよう
に回転運動する。そのため、研磨工具１０１にかかる圧
力やはみ出した時の位置により、最悪、被加工物Ｗから
脱落するため、研磨工具１０１や被加工物Ｗを損傷する
おそれがある。When the polisher 101c of the polishing tool 101 protrudes out of the workpiece W, the convex spherical surface to which the polishing tool 101 is attached is restricted from moving in the pitching direction by the arc-shaped groove and the locking pin of the universal joint. However, a rotational moment is generated by the pressure received from the contact portion of the workpiece W, and the workpiece W rotates in contact with the spherical body 103b so as to follow the spherical body 103b. Therefore, depending on the pressure applied to the polishing tool 101 and the position at which the polishing tool 101 protrudes, the polishing tool 101 may fall off from the workpiece W in the worst case, so that the polishing tool 101 and the workpiece W may be damaged.
【００５８】また、脱落しない場合でも研磨工具１０１
は、前述の回転モーメントにより外側に大きく傾斜し、
被加工物Ｗの端部のみで接触するため、微少な面積に極
端に高い圧力が加わり、急激な形状曲線の変化が避けら
れなかった。Further, even if the polishing tool 101 does not fall off,
Is greatly inclined outward due to the aforementioned rotational moment,
Since contact is made only at the end of the workpiece W, extremely high pressure is applied to a small area, and a sudden change in the shape curve cannot be avoided.
【００５９】さらに、研磨工具１０１の傾斜が小さい場
合でも、被加工物Ｗ上の圧力分布が均一でなくなってし
まうので、形状精度を損なう大きな原因となっていた。Further, even when the inclination of the polishing tool 101 is small, the pressure distribution on the workpiece W is not uniform, which is a major cause of impairing the shape accuracy.
【００６０】本実施の形態によれば、前述のように、磁
気回路によって吸引力を自在に変化させることで、被加
工物の端部を研磨するときの研磨工具の脱落や姿勢変化
を確実に防止するとともに、端部も含め全ての被加工面
を極めて均一な圧力分布で高精度に研磨できる。According to the present embodiment, as described above, the attraction force is freely changed by the magnetic circuit, so that the removal of the polishing tool and the change in the posture when polishing the end of the workpiece can be reliably performed. In addition to this, all the surfaces to be processed including the end portions can be polished with extremely uniform pressure distribution with high precision.
【００６１】図６は第２の実施の形態を示す。これは、
磁石１５の中空部１５ａに鉄心等の磁性体で構成される
ヨーク１７ａを配設し、ヨーク１７ａとこれに巻回され
たコイル１７ｂおよび磁石１５からなる磁気回路を設け
たものである。すなわち流体潤滑膜の予圧力を得るため
に、支持部材４に円環状の永久磁石である磁石１５を固
定し、その磁力で凹球面４ａに対して凸球面２ａを吸引
する。また、磁石１５の中空部１５ａによって排気孔を
構成し、ここに、コイル１７ｂを巻き付けたヨーク１７
ａを並列配置している。ポリシャ１、ポリシャ保持部材
２、支持部材４、コントローラ８等は第１の実施の形態
と同様であるから、同一符号で表わし、説明は省略し
た。FIG. 6 shows a second embodiment. this is,
A yoke 17a made of a magnetic material such as an iron core is provided in a hollow portion 15a of the magnet 15, and a magnetic circuit including the yoke 17a, a coil 17b wound around the yoke 17a, and the magnet 15 is provided. That is, in order to obtain the preload of the fluid lubricating film, the magnet 15 which is an annular permanent magnet is fixed to the support member 4, and the convex spherical surface 2a is attracted to the concave spherical surface 4a by the magnetic force. An exhaust hole is formed by the hollow portion 15a of the magnet 15, and the yoke 17 around which the coil 17b is wound is formed here.
a are arranged in parallel. The polisher 1, the polisher holding member 2, the support member 4, the controller 8, and the like are the same as those in the first embodiment, and are represented by the same reference numerals, and description thereof is omitted.
【００６２】第１の実施の形態では、永久磁石である磁
石５と、可変磁力を発生するコイル７による磁気回路が
直列になっていたのに対して、本実施の形態では、磁石
１５とコイル１７ｂによる磁気回路が完全に並列配置さ
れており、永久磁石である磁石１５の磁力に関係無く、
ヨーク１７ａとコイル１７ｂからなる磁気回路による可
変磁力を独立して調節自在であるため、ヨーク１７ａと
それに巻かれたコイル１７ｂのサイズを小型化しても、
第１の実施の形態と同程度の磁力を得ることができると
いう利点がある。In the first embodiment, the magnet 5 which is a permanent magnet and the magnetic circuit including the coil 7 for generating a variable magnetic force are connected in series. 17b are completely arranged in parallel, regardless of the magnetic force of the magnet 15, which is a permanent magnet,
Since the variable magnetic force by the magnetic circuit composed of the yoke 17a and the coil 17b can be adjusted independently, even if the size of the yoke 17a and the coil 17b wound therearound is reduced,
There is an advantage that the same magnetic force as in the first embodiment can be obtained.
【００６３】その他の点は第１の実施の形態と同様であ
る。The other points are the same as in the first embodiment.
【００６４】図７は第３の実施の形態を示す。これはポ
リシャ保持部材２を非接触で支持する支持部材２４全体
を多孔質材料で構成したものである。多孔質体である支
持部材２４の上面に、給気室２４ｂを設けて、凹球面２
４ａに存在する無数の給気孔から加圧流体を噴出させ
る。新たに給気孔を設ける必要がないうえに、支持部材
２４がポリシャ保持部材２に対して吸着された場合で
も、支持部材２４が多孔質体で構成されているため、部
材同士が溶融する等のトラブルを回避できる。FIG. 7 shows a third embodiment. This is one in which the entire support member 24 that supports the polisher holding member 2 in a non-contact manner is made of a porous material. An air supply chamber 24b is provided on the upper surface of the support member 24, which is a porous body, and the concave spherical surface 2
A pressurized fluid is ejected from countless supply holes present in 4a. It is not necessary to provide a new air supply hole, and even if the support member 24 is adsorbed to the polisher holding member 2, the support member 24 is formed of a porous body, so that the members may be fused. Trouble can be avoided.
【００６５】また、支持部材２４の多孔質体を貫くよう
に設けた中央の排気孔内に磁石２５が配設され、これに
コイル２７が巻回されている。A magnet 25 is provided in a central exhaust hole provided to penetrate the porous body of the support member 24, and a coil 27 is wound around the magnet 25.
【００６６】磁石２５の中空部を経て排気する構成であ
るから、排気孔内に障害物が存在せず、排気がスムース
に行なわれる。これによって、磁気回路のコンパクト化
を図りながら、排気能率を高めて、凹球面２４ａに対し
て、凸球面２ａを吸着する場合の応答速度をさらに向上
させることができる。ポリシャ１、ポリシャ保持部材
２、コントローラ８等は第１の実施の形態と同様である
から、同一符号で表わし、説明は省略した。Since the exhaust is performed through the hollow portion of the magnet 25, there is no obstacle in the exhaust hole, and the exhaust is smoothly performed. This makes it possible to increase the exhaust efficiency while reducing the size of the magnetic circuit, and further improve the response speed when the convex spherical surface 2a is attracted to the concave spherical surface 24a. The polisher 1, the polisher holding member 2, the controller 8, and the like are the same as those in the first embodiment, and are represented by the same reference numerals, and description thereof is omitted.
【００６７】本実施の形態は、多孔質材料で構成された
支持部材２４を用いるものであり、支持部材２４全体が
多孔質材料で構成されているため、凹球面２４ａには無
数の給気孔が存在し、新たに加工して給気孔を設ける必
要はない。その結果、次のような利点が付加される。In this embodiment, the support member 24 made of a porous material is used. Since the entire support member 24 is made of a porous material, the concave spherical surface 24a has an infinite number of air supply holes. It is present and need not be newly machined to provide air supply holes. As a result, the following advantages are added.
【００６８】給気孔を多数設ける代わりに、無数の孔を
持つ多孔質材料を使用することにより、少ない流量でポ
リシャ保持部材２を支持するのに必要な剛性を有する流
体潤滑が可能となる。つまり、第１および第２の実施の
形態に比べて、給気効率を大幅に向上させることができ
る。By using a porous material having an innumerable number of holes instead of providing a large number of air supply holes, fluid lubrication having the rigidity necessary to support the polisher holding member 2 at a small flow rate can be achieved. That is, the air supply efficiency can be significantly improved as compared with the first and second embodiments.
【００６９】また、位置検出手段であるレーザ変位計２
９によって研磨工具１０の位置を検出するように構成す
る。これによって、コントローラ８内で加工条件等から
研磨工具１０の相対位置を算出することなく、被加工物
Ｗに対する研磨工具１０の相対位置を直接レーザ変位計
２９によってモニタしてコントローラ８に入力し、コイ
ル２７による磁気回路の可変磁力を調整できる。Further, a laser displacement meter 2 as a position detecting means is provided.
9, the position of the polishing tool 10 is detected. Accordingly, the relative position of the polishing tool 10 with respect to the workpiece W is directly monitored by the laser displacement meter 29 and input to the controller 8 without calculating the relative position of the polishing tool 10 from the processing conditions and the like in the controller 8. The variable magnetic force of the magnetic circuit by the coil 27 can be adjusted.
【００７０】被加工物Ｗの端部における研磨工具１０の
姿勢制御をより一層確実に行なうことができるという特
筆すべき長所がある。There is a remarkable advantage that the attitude control of the polishing tool 10 at the end of the workpiece W can be performed more reliably.
【００７１】その他の点については第１の実施の形態と
同様である。The other points are the same as in the first embodiment.
【００７２】[0072]
【発明の効果】本発明は上述のとおり構成されているの
で、以下に記載するような効果を奏する。Since the present invention is configured as described above, the following effects can be obtained.
【００７３】流体潤滑膜によってポリシャ保持部材を非
接触に支持し、研磨工具を研磨中心点周りに滑らかに回
転させることができる。The polisher holding member is supported in a non-contact manner by the fluid lubricating film, and the polishing tool can be smoothly rotated around the polishing center point.
【００７４】また、ポリシャ保持部材の凸球面の球心と
支持部材の凹球面の球心は、研磨工具の研磨中心点とそ
れぞれ一致する構成となっているので、研磨面上にて生
じる力の作用点は研磨中心点と一致し、研磨工具にモー
メントが発生しない。これによって、被加工物を均一な
圧力分布で確実に研磨することができる。Further, since the spherical center of the convex spherical surface of the polisher holding member and the spherical center of the concave spherical surface of the support member coincide with the polishing center point of the polishing tool, the force generated on the polishing surface is reduced. The action point coincides with the polishing center point, and no moment is generated in the polishing tool. Thereby, the workpiece can be surely polished with a uniform pressure distribution.
【００７５】研磨工具を保持するポリシャ保持部材の凸
球面が支持部材の凹球面に対して非接触に回転可能であ
るため、研磨工具が回転しても、摩擦による摩耗は生じ
ることなく、凸球面の曲率半径は半永久的に一定に維持
される。また、研磨工具の研磨面に被加工物の被研磨面
に対して平行に回転する力が加えられたとしても、抵抗
なくスムースに回転することが可能となる。Since the convex spherical surface of the polisher holding member for holding the polishing tool can rotate in a non-contact manner with respect to the concave spherical surface of the support member, even if the polishing tool is rotated, there is no abrasion due to friction. Is maintained semi-permanently constant. In addition, even if a rotating force is applied to the polished surface of the polishing tool in parallel with the polished surface of the workpiece, the tool can be smoothly rotated without resistance.
【００７６】加えて、コイルを含む磁気回路の可変磁力
によって支持部材の凹球面とポリシャ保持部材の凸球面
の間の吸引力を調節することが可能であり、例えば、瞬
間的に吸引固定する等、吸引力を自在に制御できる。す
なわち、瞬間的に吸引力を強めて、凹球面に対して凸球
面を強力に吸引することで、研磨工具のピッチング運動
を抑制し、被加工物の端部から研磨工具の一部がはみ出
した場合でも、研磨工具の脱落を防ぎ、研磨工具の姿勢
を保持することができる。In addition, the suction force between the concave spherical surface of the support member and the convex spherical surface of the polisher holding member can be adjusted by the variable magnetic force of the magnetic circuit including the coil. The suction force can be freely controlled. That is, by instantaneously increasing the suction force and strongly suctioning the convex sphere against the concave sphere, the pitching movement of the polishing tool is suppressed, and a part of the polishing tool protrudes from the end of the workpiece. Even in this case, the polishing tool can be prevented from falling off, and the posture of the polishing tool can be maintained.
【００７７】また、吸引力を急激に強めて瞬間的に流体
潤滑膜を無くして、凹球面と凸球面を接触させ、研磨工
具がピッチング運動しないように固定することもでき
る。Further, the suction force can be sharply increased, the fluid lubricating film can be instantaneously eliminated, the concave spherical surface and the convex spherical surface can be brought into contact with each other, and the polishing tool can be fixed so as not to pitch.
【００７８】このように、被加工物の端部での研磨工具
の脱落、姿勢変化を回避して、端部を含めた全ての被研
磨面を均一な圧力分布で確実に研磨することができる。As described above, it is possible to surely polish all the surfaces to be polished including the ends with a uniform pressure distribution while avoiding the removal of the polishing tool and the change in the posture at the ends of the workpiece. .
【図１】第１の実施の形態を示すもので、（ａ）はその
模式断面図、（ｂ）は凹球面部に設けた給気孔の配置を
示す図である。FIGS. 1A and 1B show a first embodiment, in which FIG. 1A is a schematic cross-sectional view, and FIG. 1B is a view showing an arrangement of air supply holes provided in a concave spherical portion.
【図２】図１の装置の磁気回路を説明する図である。FIG. 2 is a diagram illustrating a magnetic circuit of the device of FIG.
【図３】図１の装置において、研磨工具が被加工物の端
部を研磨するときの状態を説明する図である。FIG. 3 is a diagram illustrating a state in which a polishing tool grinds an end of a workpiece in the apparatus of FIG. 1;
【図４】従来例において、研磨工具が被加工物の端部を
研磨するときの状態を説明する図である。FIG. 4 is a diagram illustrating a state where a polishing tool grinds an end of a workpiece in a conventional example.
【図５】磁気回路による制御工程を示すフローチャート
である。FIG. 5 is a flowchart showing a control process by a magnetic circuit.
【図６】第２の実施の形態を示す模式断面図である。FIG. 6 is a schematic sectional view showing a second embodiment.
【図７】第３の実施の形態を示す模式断面図である。FIG. 7 is a schematic cross-sectional view showing a third embodiment.
【図８】図１の装置における作用力を説明する図であ
る。FIG. 8 is a view for explaining the acting force in the device of FIG. 1;
【図９】一従来例を示す模式断面図である。FIG. 9 is a schematic sectional view showing a conventional example.
１ ポリシャ １ａ 研磨面 ２ ポリシャ保持部材 ２ａ 凸球面 ４、２４ 支持部材 ４ａ、２４ａ 凹球面 ５、１５、２５ 磁石 ７、１７ｂ、２７ コイル ８ コントローラ １０ 研磨工具 ２９ レーザ変位計 DESCRIPTION OF SYMBOLS 1 Polisher 1a Polishing surface 2 Polisher holding member 2a Convex spherical surface 4, 24 Support member 4a, 24a Concave spherical surface 5, 15, 25 Magnet 7, 17b, 27 Coil 8 Controller 10 Polishing tool 29 Laser displacement meter
───────────────────────────────────────────────────── フロントページの続き Ｆターム(参考） 3C034 BB07 BB30 BB37 CA12 CB01 DD08 3C049 AA07 AA12 AA14 BA07 BB02 BC02 CA01 CA03 CB01 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 3C034 BB07 BB30 BB37 CA12 CB01 DD08 3C049 AA07 AA12 AA14 BA07 BB02 BC02 CA01 CA03 CB01
Claims (9)
面を有する研磨工具の前記凸球面に嵌合する凹球面を備
えた支持部材と、前記研磨工具の前記凸球面と前記支持
部材の前記凹球面の間の間隙に加圧流体を供給するため
の加圧流体供給手段と、前記研磨工具と前記支持部材を
互いに吸引する吸引力を発生する吸引手段と、前記吸引
力を調節するための可変磁力を発生させる吸引力調節手
段を有する研磨工具保持装置。A polishing member having a convex spherical surface whose center is a polishing center point of a polisher, the supporting member having a concave spherical surface fitted to the convex spherical surface; Pressurized fluid supply means for supplying a pressurized fluid to the gap between the concave spherical surfaces, suction means for generating a suction force for sucking the polishing tool and the support member together, and adjusting the suction force A polishing tool holding device having suction force adjusting means for generating a variable magnetic force.
す電流を制御するコントローラを有することを特徴とす
る請求項１記載の研磨工具保持装置。2. The polishing tool holding device according to claim 1, wherein the suction force adjusting means includes a coil and a controller for controlling a current flowing through the coil.
を構成するコイルとともに磁気回路を形成していること
を特徴とする請求項２記載の研磨工具保持装置。3. The polishing tool holding device according to claim 2, wherein the attraction means has a magnet and forms a magnetic circuit together with a coil constituting the attraction force adjusting means.
て吸引力調節手段が制御されることを特徴とする請求項
１ないし３いずれか１項記載の研磨工具保持装置。4. The polishing tool holding device according to claim 1, wherein the suction force adjusting means is controlled based on a relative position between the workpiece and the polishing tool.
る位置検出手段が設けられていることを特徴とする請求
項４記載の研磨工具保持装置。5. The polishing tool holding device according to claim 4, further comprising position detecting means for detecting a relative position between the workpiece and the polishing tool.
あることを特徴とする請求項１ないし５いずれか１項記
載の研磨工具保持装置。6. The polishing tool holding device according to claim 1, wherein at least a part of the polishing tool is a magnetic material.
が、互いに低摩擦係数となる材料の組み合わせで作られ
ていることを特徴とする請求項１ないし６いずれか１項
記載の研磨工具保持装置。7. The polishing tool according to claim 1, wherein the convex spherical surface of the polishing tool and the concave spherical surface of the support member are made of a combination of materials having a low friction coefficient with each other. Holding device.
孔質材料で形成されていることを特徴とする請求項１な
いし７いずれか１項記載の研磨工具保持装置。8. The polishing tool holding device according to claim 1, wherein a part or the whole of the concave spherical surface of the support member is formed of a porous material.
磨工具保持装置と、これによって保持された研磨工具
と、前記研磨工具保持装置を被加工物に対して相対運動
させるための駆動機構を有する研磨装置。9. A polishing tool holding device according to claim 1, a polishing tool held by the polishing tool holding device, and a driving mechanism for moving the polishing tool holding device relative to a workpiece. Polishing device having
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001110772A JP2002307278A (en) | 2001-04-10 | 2001-04-10 | Polishing tool retaining device and polishing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001110772A JP2002307278A (en) | 2001-04-10 | 2001-04-10 | Polishing tool retaining device and polishing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002307278A true JP2002307278A (en) | 2002-10-23 |
Family
ID=18962476
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001110772A Pending JP2002307278A (en) | 2001-04-10 | 2001-04-10 | Polishing tool retaining device and polishing device |
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| CN101862989A (en) * | 2010-06-08 | 2010-10-20 | 宁波大学 | Polishing method of non-spherical surface optical parts |
| CN105437020A (en) * | 2015-12-23 | 2016-03-30 | 福建福光股份有限公司 | Processing technique of spherical mirror provided with platform surface |
| CN105881110A (en) * | 2016-06-08 | 2016-08-24 | 浙江科技学院 | Magnetic-gas compound fluid grinding head device |
| CN106181676A (en) * | 2016-07-14 | 2016-12-07 | 中国科学院上海光学精密机械研究所 | A kind of thin type planar optical elements magnetic stress-removal disc loading method |
| CN110125801A (en) * | 2019-05-21 | 2019-08-16 | 清博(昆山)自动化科技有限公司 | A kind of pneumatic grinding and polishing apparatus and its working method digitizing speed regulating control |
| CN112355782A (en) * | 2020-09-28 | 2021-02-12 | 金昱佐 | Burnishing device is used in optical lens processing |
-
2001
- 2001-04-10 JP JP2001110772A patent/JP2002307278A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100544889C (en) * | 2006-09-06 | 2009-09-30 | 财团法人工业技术研究院 | Negative pressure vacuum adsorption device and use the edging device of this device |
| CN101862989A (en) * | 2010-06-08 | 2010-10-20 | 宁波大学 | Polishing method of non-spherical surface optical parts |
| CN105437020A (en) * | 2015-12-23 | 2016-03-30 | 福建福光股份有限公司 | Processing technique of spherical mirror provided with platform surface |
| CN105881110A (en) * | 2016-06-08 | 2016-08-24 | 浙江科技学院 | Magnetic-gas compound fluid grinding head device |
| CN106181676A (en) * | 2016-07-14 | 2016-12-07 | 中国科学院上海光学精密机械研究所 | A kind of thin type planar optical elements magnetic stress-removal disc loading method |
| CN106181676B (en) * | 2016-07-14 | 2018-08-14 | 中国科学院上海光学精密机械研究所 | A kind of thin type planar optical elements magnetism stress-removal disc loading method |
| CN110125801A (en) * | 2019-05-21 | 2019-08-16 | 清博(昆山)自动化科技有限公司 | A kind of pneumatic grinding and polishing apparatus and its working method digitizing speed regulating control |
| CN112355782A (en) * | 2020-09-28 | 2021-02-12 | 金昱佐 | Burnishing device is used in optical lens processing |
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