JP2002298790A - Excimer lighting system - Google Patents
Excimer lighting systemInfo
- Publication number
- JP2002298790A JP2002298790A JP2001096289A JP2001096289A JP2002298790A JP 2002298790 A JP2002298790 A JP 2002298790A JP 2001096289 A JP2001096289 A JP 2001096289A JP 2001096289 A JP2001096289 A JP 2001096289A JP 2002298790 A JP2002298790 A JP 2002298790A
- Authority
- JP
- Japan
- Prior art keywords
- excimer
- lamp
- irradiation
- light
- emitted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、例えば液晶ディス
プレイの基板、マスク用石英ガラスやシリコン半導体ウ
エハに付着した有機汚染を酸化除去するドライ洗浄など
に用いられるエキシマ照明装置に関する。詳しくは、エ
キシマＵＶランプの周囲に存在する空気を置換するため
に窒素ガスが供給され、エキシマＵＶランプから発光さ
れたエキシマ光を被照射体側へ反射させる反射体が設け
られたエキシマ照明装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an excimer illuminator used for dry cleaning for oxidizing and removing organic contamination adhering to a substrate of a liquid crystal display, quartz glass for a mask or a silicon semiconductor wafer, for example. More specifically, the present invention relates to an excimer illuminating device provided with a reflector that is supplied with nitrogen gas to replace air existing around an excimer UV lamp and reflects excimer light emitted from the excimer UV lamp toward an irradiation target.
【０００２】[0002]
【従来の技術】従来、この種のエキシマ照明装置とし
て、例えば特開平７−２８８１０９号公報や特開平８−
１２４５４０号公報に開示される如く、エキシマＵＶラ
ンプ（誘導体バリア放電ランプ）が、合成石英製の平面
照射窓を有する容器（匡体）の中に取り付けられ、この
容器内に窒素ガスを流して空気と置換させることによ
り、該エキシマＵＶランプから発光するエキシマ光（真
空紫外光）が吸収されることなく平面照射窓を透して、
酸素雰囲気中の被照射体に照射され、その結果、汚れで
ある有機物の結合を断ち切り、酸素に吸収されてオゾン
及び活性酸素を作り、その強力な酸化力で有機物を酸化
させ、二酸化炭素、二酸化窒素にして蒸発させるものが
ある。しかも、上記容器内には、エキシマＵＶランプを
囲むように反射体が配置され、この反射体で反射したエ
キシマ光が平面照射窓を透して被照射体に照射され、こ
の反射板と窒素置換が組み合わせられることによって、
照射強度と照射面積を向上させている。2. Description of the Related Art Conventionally, as this type of excimer illuminating device, for example, Japanese Patent Laid-Open No.
As disclosed in JP-A-124540, an excimer UV lamp (derivative barrier discharge lamp) is mounted in a container (housing) having a flat irradiation window made of synthetic quartz. Excimer light (vacuum ultraviolet light) emitted from the excimer UV lamp is absorbed through the flat irradiation window without being absorbed,
Irradiation is performed on an object to be irradiated in an oxygen atmosphere, and as a result, bonds of organic substances which are dirt are cut off, and absorbed by oxygen to form ozone and active oxygen. Some are evaporated with nitrogen. In addition, a reflector is arranged in the container so as to surround the excimer UV lamp, and the excimer light reflected by the reflector is radiated to the irradiated object through a flat irradiation window, and the reflector is replaced with nitrogen. Is combined,
The irradiation intensity and irradiation area are improved.
【０００３】[0003]
【発明が解決しようとする課題】しかし乍ら、このよう
な従来のエキシマ照明装置では、容器内に流される窒素
ガスの内圧に対して容器及び合成石英製の平面照射窓が
十分な強度を有する必要があるため、壁の厚い容器や厚
い平面照射窓を用いなければならず、その分だけ製造コ
ストが高価でなって経済的でないと共に、エキシマＵＶ
ランプに被照射体を接近できず、エキシマ光の照射効率
が低下して洗浄効率が低下するという問題がある。しか
も、複数のエキシマＵＶランプを並列状に配置する必要
がある場合には、容器の厚い壁を挟んでエキシマＵＶラ
ンプが配置されるため、これらエキシマＵＶランプの電
極を相互に接近させて配置できず、各電極の間隔が大き
く開くから、被照射体への照射効率の低下すると共に被
照射体上の照度分布がバラ付き易いという問題がある。However, in such a conventional excimer lighting device, the container and the synthetic quartz flat irradiation window have a sufficient strength against the internal pressure of the nitrogen gas flowing into the container. This necessitates the use of thick-walled containers and thick flat irradiation windows, which increases the manufacturing cost and is not economical.
There is a problem that the object to be irradiated cannot be approached to the lamp, the irradiation efficiency of the excimer light is reduced, and the cleaning efficiency is reduced. Moreover, when it is necessary to arrange a plurality of excimer UV lamps in parallel, the excimer UV lamps are arranged with the thick wall of the container interposed therebetween, so that the electrodes of these excimer UV lamps can be arranged close to each other. However, since the distance between the electrodes is greatly increased, there is a problem that the irradiation efficiency of the irradiation target decreases and the illuminance distribution on the irradiation target easily varies.
【０００４】本発明のうち請求項１記載の発明は、簡単
な構造でエキシマ光の減衰を防止しながら被照射体への
照射量を増大させることを目的としたものである。請求
項２記載の発明は、請求項１に記載の発明の目的に加え
て、エキシマＵＶランプと被照射体や複数のエキシマＵ
Ｖランプの相互を更に接近させることを目的としたもの
である。請求項３記載の発明は、請求項１または２に記
載の発明の目的に加えて、被照射体への照射強度と照射
面積を向上させることを目的としたものである。An object of the present invention is to increase the amount of irradiation on an irradiation object while preventing attenuation of excimer light with a simple structure. The invention according to claim 2 provides, in addition to the object of the invention according to claim 1, an excimer UV lamp, an object to be irradiated, and a plurality of excimer U.
The purpose is to bring the V lamps closer to each other. The third aspect of the present invention has an object to improve the irradiation intensity and the irradiation area of the irradiation target in addition to the object of the first or second aspect of the present invention.
【０００５】[0005]
【課題を解決するための手段】前述した目的を達成する
ために、本発明のうち請求項１記載の発明は、エキシマ
ＵＶランプの外周に、エキシマ光の透過性に優れた材料
で筒状に形成された保護管を設け、これらエキシマＵＶ
ランプと保護管との間に区画形成される空間に、窒素ガ
スを流すと共に、エキシマＵＶランプの背面側へ発光し
たエキシマ光が被照射体へ反射されるように反射体を配
設したことを特徴とするものである。請求項２記載の発
明は、請求項１記載の発明の構成に、前記保護管を円筒
状に形成した構成を加えたことを特徴とする。請求項３
記載の発明は、請求項１または２記載の発明の構成に、
前記反射体の反射面をエキシマＵＶランプの外周面に沿
って凹状に湾曲させ、この反射面の曲率を、これと対向
するエキシマＵＶランプの背面側から発光するエキシマ
光のほとんどがエキシマＵＶランプの外側へ拡開するよ
うにした構成を加えたことを特徴とする。In order to achieve the above-mentioned object, according to the first aspect of the present invention, the excimer UV lamp is formed in a cylindrical shape around a periphery of an excimer UV lamp using a material having excellent excimer light transmittance. A protective tube is provided and these excimer UV
A nitrogen gas is allowed to flow into a space defined between the lamp and the protection tube, and a reflector is provided so that excimer light emitted to the back side of the excimer UV lamp is reflected to the irradiated object. It is a feature. The invention according to a second aspect is characterized in that a configuration in which the protective tube is formed in a cylindrical shape is added to the configuration of the first aspect. Claim 3
The invention described in Claim 1 or 2
The reflecting surface of the reflector is concavely curved along the outer peripheral surface of the excimer UV lamp, and the curvature of the reflecting surface is adjusted so that most of the excimer light emitted from the back side of the excimer UV lamp facing the excimer UV lamp is turned off. It is characterized by adding a configuration that expands outward.
【０００６】[0006]
【作用】請求項１の発明は、エキシマＵＶランプと保護
管との空間に、窒素ガスを流すと共に反射体を配設する
ことにより、エキシマＵＶランプの対向面側から発光し
たエキシマ光は、吸収されることなく保護管を透して被
照射体に直接照射されると共に、それ以外の背面側へ発
光したエキシマ光は、反射体で反射され、保護管を透し
て被照射体に照射されるものである。請求項２の発明
は、請求項１記載の構成に対して、前記保護管を円筒状
に形成した構成を追加したので、円筒状の保護管は、構
造上強度に優れるから、その厚さを薄くしても窒素ガス
圧に十分耐えられる。請求項３の発明は、請求項１また
は２記載の構成に対して、前記反射体の反射面をエキシ
マＵＶランプの外周面に沿って凹状に湾曲させ、この反
射面の曲率を、これと対向するエキシマＵＶランプの背
面側から発光するエキシマ光のほとんどがエキシマＵＶ
ランプの外側へ拡開するようにした構成を追加したの
で、エキシマＵＶランプの背面側から発光されるエキシ
マ光のほとんどが、反射体の反射面に反射されて、エキ
シマＵＶランプへ戻らずに被照射体に直接照射される。According to the first aspect of the present invention, the excimer light emitted from the opposing surface of the excimer UV lamp is absorbed by flowing a nitrogen gas and arranging a reflector in the space between the excimer UV lamp and the protective tube. The excimer light emitted directly to the illuminated object through the protective tube is not reflected, and the excimer light emitted to the other back side is reflected by the reflector and is irradiated to the illuminated object through the protective tube. Things. According to the second aspect of the present invention, since a configuration in which the protective tube is formed in a cylindrical shape is added to the configuration of the first aspect, the cylindrical protective tube is structurally excellent in strength. Even if thin, it can withstand nitrogen gas pressure sufficiently. According to a third aspect of the present invention, in the configuration of the first or second aspect, the reflecting surface of the reflector is curved concavely along the outer peripheral surface of the excimer UV lamp, and the curvature of the reflecting surface is opposed to the curved surface. Most of the excimer light emitted from the back side of the excimer UV lamp
With the addition of a configuration that expands to the outside of the lamp, most of the excimer light emitted from the back side of the excimer UV lamp is reflected by the reflecting surface of the reflector and is not returned to the excimer UV lamp. Irradiated directly onto the illuminated body.
【０００７】[0007]
【発明の実施の形態】以下、本発明の実施例を図面に基
づいて説明する。この実施例は、図１及び図２に示す如
く、エキシマＵＶランプ１が、網状の円筒形に形成され
た内部電極１ａと、その外側に配置された網状円筒形の
外部電極１ｂとを同軸状に配置することによって、１７
２ｎｍのエキシマ光を放射状に照射する二重円筒型構造
であり、このエキシマＵＶランプ１から所定間隔をあけ
て被照射体Ａが配置される場合を示すものである。Embodiments of the present invention will be described below with reference to the drawings. In this embodiment, as shown in FIGS. 1 and 2, an excimer UV lamp 1 is configured such that a reticulated cylindrical internal electrode 1a and a reticulated cylindrical external electrode 1b disposed outside thereof are coaxial. By placing
It has a double-cylindrical structure in which 2 nm excimer light is radiated radially, and shows a case where an irradiation target A is arranged at a predetermined interval from the excimer UV lamp 1.
【０００８】上記エキシマＵＶランプ１は、図示例の場
合、図２に示す如く、その軸方向一端又は両端に内部電
極１ａ及び外部電極１ｂを支持するためのホルダー１ｃ
が装着され、このホルダー１ｃには、内部電極１ａ及び
外部電極１ｂに高周波電圧を印加させるための接続コー
ド（図示せず）が挿通されている。As shown in FIG. 2, the excimer UV lamp 1 has a holder 1c for supporting the internal electrode 1a and the external electrode 1b at one or both ends in the axial direction, as shown in FIG.
A connection cord (not shown) for applying a high-frequency voltage to the internal electrode 1a and the external electrode 1b is inserted through the holder 1c.
【０００９】このエキシマＵＶランプ１の外周には、外
部電極１ｂを保護するための保護管２が設けられ、これ
らエキシマＵＶランプ１と保護管２との間には、空間Ｓ
を区画形成する。A protection tube 2 for protecting the external electrode 1b is provided on the outer periphery of the excimer UV lamp 1, and a space S is provided between the excimer UV lamp 1 and the protection tube 2.
Is formed.
【００１０】この保護管２は、エキシマ光の透過性に優
れた例えば合成石英ガラスなどの材料で筒状に形成さ
れ、上記エキシマＵＶランプ１の内部電極１ａ及び外部
電極１ｂと同軸状に配置する。The protective tube 2 is formed in a cylindrical shape from a material such as synthetic quartz glass having excellent excimer light transmittance, and is disposed coaxially with the internal electrode 1a and the external electrode 1b of the excimer UV lamp 1. .
【００１１】本実施例の場合には、保護管２の両端又は
一端のみが開口する円筒状に形成し、その開口端２ａを
上記エキシマＵＶランプ１のホルダー１ｃに密着固定す
ることにより、密閉した空間Ｓが形成される。In the case of this embodiment, the protective tube 2 is formed in a cylindrical shape with both ends or only one end opened, and the opening end 2a is tightly fixed to the holder 1c of the excimer UV lamp 1 to be hermetically closed. A space S is formed.
【００１２】そして、これらエキシマＵＶランプ１と保
護管２との空間Ｓには、窒素ガス３を流すと共に、エキ
シマＵＶランプ１の被照射体Ａとの対向面側とは反対の
背面側へ発光されたエキシマ光Ｅ２が被照射体Ａへ反射
されるように反射体４を配設する。A nitrogen gas 3 flows into the space S between the excimer UV lamp 1 and the protective tube 2 and light is emitted to the back side of the excimer UV lamp 1 opposite to the surface facing the irradiation object A. The reflector 4 is provided so that the excimer light E2 thus reflected is reflected to the irradiation target A.
【００１３】この窒素ガス３は、上記空間Ｓ内に存在す
る空気を排除するために供給されることにより、エキシ
マ光の吸収をなくして光エネルギーの減衰が防止される
と共に、内部電極１ａ及び外部電極１ｂの酸化を防止し
ている。The nitrogen gas 3 is supplied to eliminate air existing in the space S, thereby eliminating absorption of excimer light and preventing light energy from being attenuated. The oxidation of the electrode 1b is prevented.
【００１４】本実施例の場合には、上記エキシマＵＶラ
ンプ１のホルダー１ｃの中央部に、窒素ガス３の流入口
３ａを開穿し、この流入口３ａから内部電極１ａ内に窒
素ガス３を流して該内部電極１ａの先端部まで導くと共
に、その網状部分を通って外部電極１ｂとの空間へ流す
ことにより、これら内部電極１ａ及び外部電極１ｂが冷
却され、更に外部電極１ｂの網状部分を通って保護管２
との空間Ｓへ流れ出た窒素ガス３が、ホルダー１ｃの外
周部に開穿した流出口３ｂから外部へ排出している。In the case of the present embodiment, an inlet 3a for nitrogen gas 3 is opened at the center of the holder 1c of the excimer UV lamp 1, and nitrogen gas 3 is introduced into the internal electrode 1a from the inlet 3a. The internal electrode 1a and the external electrode 1b are cooled by flowing the air to the tip of the internal electrode 1a and flowing to the space between the internal electrode 1a and the external electrode 1b. Through protection tube 2
The nitrogen gas 3 which has flowed into the space S is discharged to the outside from an outlet 3b opened in the outer peripheral portion of the holder 1c.
【００１５】上記反射板４は、エキシマ光の反射率に優
れた材料、例えば金属などの材料で形成され、本実施例
では、エキシマＵＶランプ１の背面側と対向する反射面
４ａを、外部電極１ｂの外周面に沿って凹状に湾曲さ
せ、この反射面４ａの曲率を、これと対向するエキシマ
ＵＶランプ１の背面側から発光するエキシマ光のほとん
どがエキシマＵＶランプ１の外側へ拡開するように保護
管２の曲率と略同じかそれより小さくしている。The reflecting plate 4 is formed of a material having a high excimer light reflectance, for example, a material such as a metal. In this embodiment, the reflecting surface 4a facing the back side of the excimer UV lamp 1 is connected to an external electrode. The reflecting surface 4a is curved in a concave shape along the outer peripheral surface of the excimer UV lamp 1 so that most of the excimer light emitted from the back side of the excimer UV lamp 1 facing the reflecting surface 4a spreads out of the excimer UV lamp 1. In this case, the curvature of the protection tube 2 is substantially equal to or smaller than the curvature.
【００１６】図示例では、この反射板４がアルミニウム
板であり、その少なくとも反射面４ａを鏡面仕上げし、
上記エキシマＵＶランプ１のホルダー１ｃに対し、ハン
ガー４ｂを介して吊り下げることにより、移動不能に配
置固定している。In the illustrated example, the reflecting plate 4 is an aluminum plate, and at least the reflecting surface 4a is mirror-finished.
The excimer UV lamp 1 is suspended and fixed to the holder 1c of the excimer UV lamp 1 via a hanger 4b so as not to move.
【００１７】また、上述した構造のエキシマ照明装置
は、図１及び図２に示したように、被照射体Ａに対して
エキシマＵＶランプ１を１つのみ配備するだけでなく、
図３に示すように、被照射体Ａの大きさに対応して、複
数のエキシマＵＶランプ１…を並列状に配置する場合も
ある。The excimer illuminating device having the above-described structure is not only provided with one excimer UV lamp 1 for the irradiation object A as shown in FIGS.
As shown in FIG. 3, a plurality of excimer UV lamps 1 may be arranged in parallel according to the size of the irradiation object A.
【００１８】次に、斯かるエキシマ照明装置の作用につ
いて説明する。先ず、図２に示す如く、エキシマＵＶラ
ンプ１と保護管２との空間Ｓに窒素ガス２を流した状態
で、エキシマＵＶランプ１の内部電極１ａ及び外部電極
１ｂに高周波電圧が印加されると、図１に示す如く、エ
キシマＵＶランプ１の外周面からエキシマ光が放射方向
へ発光される。Next, the operation of the excimer lighting device will be described. First, as shown in FIG. 2, when a high-frequency voltage is applied to the internal electrode 1 a and the external electrode 1 b of the excimer UV lamp 1 in a state where the nitrogen gas 2 flows in the space S between the excimer UV lamp 1 and the protective tube 2. As shown in FIG. 1, excimer light is emitted in the emission direction from the outer peripheral surface of the excimer UV lamp 1.
【００１９】被照射体Ａと対向するエキシマＵＶランプ
１の対向面側から発光したエキシマ光Ｅ１は、上記空間
Ｓの窒素ガス２により、吸収されることなく保護管２を
透して被照射体Ａに直接照射される。それ以外のエキシ
マＵＶランプ１の背面側へ発光したエキシマ光Ｅ２は、
反射体４により被照射体Ａへ向けて反射され、保護管２
を透して被照射体Ａに照射される。Excimer light E1 emitted from the surface of the excimer UV lamp 1 facing the irradiation object A passes through the protective tube 2 without being absorbed by the nitrogen gas 2 in the space S. A is directly irradiated. Excimer light E2 emitted to the back side of the other excimer UV lamp 1 is
The light is reflected by the reflector 4 toward the irradiation object A,
Irradiation is performed on the irradiation target A through the substrate.
【００２０】その結果、簡単な構造でエキシマ光の減衰
を防止しながら被照射体Ａへの照射量を増大できる。従
って、例えば特開平７−２８８１０９号公報や特開平８
−１２４５４０号公報に開示されるような壁の厚い容器
や厚い平面照射窓が不要となり、その部だけ製造コスト
を低減できて経済的であると共に、エキシマＵＶランプ
１に対して被照射体Ａを接近でき、エキシマ光の照射効
率が高くなって、洗浄効率を向上できる。As a result, the irradiation amount on the irradiation target A can be increased with a simple structure while preventing the attenuation of the excimer light. Therefore, for example, JP-A-7-288109 and JP-A-8-
A container having a thick wall or a thick flat irradiation window as disclosed in JP-A-124540 is not required, the manufacturing cost can be reduced only in that portion, and it is economical. It is possible to approach, the irradiation efficiency of excimer light is increased, and the cleaning efficiency can be improved.
【００２１】しかも、例えば被照射体Ａの大きさに対応
して、複数のエキシマＵＶランプ１…を並列状に配置す
る必要がある場合には、図３に示す如く、例えば特開平
７−２８８１０９号公報や特開平８−１２４５４０号公
報に開示されるような容器の厚い壁が不要となって、こ
れらエキシマＵＶランプ１…の電極１ａ，１ｂを相互に
接近させて配置でき、高い照射効率の下で被照射体Ａ上
の照度分布をより均一にできる。特に図３に示すもの
は、例えば特開平７−２８８１０９号公報や特開平８−
１２４５４０号公報に開示された複数のエキシマＵＶラ
ンプ１…を並列状に配置したものに比べ、窒素ガス３を
流す空間Ｓが各エキシマＵＶランプ１毎に隔離されて夫
々の堆積が小さいので、窒素ガス３への置換を短時間で
行えるという利点がある。Further, when it is necessary to arrange a plurality of excimer UV lamps 1 in parallel according to the size of the irradiation object A, for example, as shown in FIG. No thick wall of the container as disclosed in JP-A-8-124540 or JP-A-8-124540 is required, and the electrodes 1a and 1b of the excimer UV lamps 1... Below, the illuminance distribution on the irradiation target A can be made more uniform. In particular, those shown in FIG. 3 are disclosed in, for example, JP-A-7-288109 and JP-A-8-
Since the space S through which the nitrogen gas 3 flows is isolated for each of the excimer UV lamps 1 and the amount of each of the excimer UV lamps 1 is smaller than that in which a plurality of excimer UV lamps 1 are arranged in parallel as disclosed in There is an advantage that the replacement with the gas 3 can be performed in a short time.
【００２２】更に、本実施例の場合には、上記保護管２
を円筒状に形成したので、構造上強度に優れ、その厚さ
を薄くしても窒素ガス圧に十分耐えられる。その結果、
エキシマＵＶランプ１と被照射体Ａや複数のエキシマＵ
Ｖランプ１…の相互を更に接近できる。Further, in the case of this embodiment, the protection tube 2
Is formed in a cylindrical shape, so it has excellent structural strength and can withstand nitrogen gas pressure sufficiently even when its thickness is reduced. as a result,
Excimer UV lamp 1 and irradiation object A and a plurality of excimer U
The V lamps 1 can be brought closer to each other.
【００２３】更にまた、本実施例の場合には、反射体４
の反射面４ａをエキシマＵＶランプ１の外周面に沿って
円弧状に湾曲させ、この反射面４ａの曲率を、これと対
向するエキシマＵＶランプ１の背面側から発光するエキ
シマ光Ｅ２のほとんどがエキシマＵＶランプ（１）の外
側へ拡開するようにしたので、エキシマＵＶランプ
（１）へ戻らずに被照射体Ａに直接照射される。その結
果、被照射体Ａへの照射強度と照射面積を向上できる。Furthermore, in the case of this embodiment, the reflector 4
Is curved in an arc shape along the outer peripheral surface of the excimer UV lamp 1, and the curvature of the reflective surface 4a is changed such that most of the excimer light E2 emitted from the back side of the excimer UV lamp 1 facing the excimer UV lamp 1 is excimer light. Since the light source is expanded outside the UV lamp (1), the object A is directly irradiated without returning to the excimer UV lamp (1). As a result, the irradiation intensity and the irradiation area on the irradiation target A can be improved.
【００２４】一方、図４に示すものは、本発明の他の実
施例である。このものは、前記保護管２を多角形の筒状
に形成した構成が、前記図１及び図２に示した実施例と
は異なり、それ以外の構成は図１及び図２に示した実施
例と同じものである。図示例の場合には、四角形の筒状
に形成しているが、五角形以上の多角形に形成しても良
い。FIG. 4 shows another embodiment of the present invention. This is different from the embodiment shown in FIGS. 1 and 2 in that the protection tube 2 is formed in a polygonal cylindrical shape, and the other configuration is the embodiment shown in FIGS. Is the same as In the illustrated example, it is formed in a square cylindrical shape, but may be formed in a polygonal shape of a pentagon or more.
【００２５】従って、図４に示すものも、図１及び図２
に示した実施例と同様に、被照射体Ａと対向するエキシ
マＵＶランプ１の対向面側から発光したエキシマ光Ｅ１
は、上記空間Ｓの窒素ガス２により、吸収されることな
く四角形の保護管２を透して被照射体Ａに直接照射さ
れ、それ以外のエキシマＵＶランプ１の背面側へ発光し
たエキシマ光Ｅ２は、反射体４により被照射体Ａへ向け
て反射され、四角形の保護管２を透して被照射体Ａに照
射される。Therefore, the one shown in FIG.
Excimer light E1 emitted from the opposing surface side of the excimer UV lamp 1 opposing the irradiation object A in the same manner as in the embodiment shown in FIG.
Is directly irradiated onto the irradiation target A through the rectangular protective tube 2 without being absorbed by the nitrogen gas 2 in the space S, and the other excimer light E2 emitted to the back side of the excimer UV lamp 1 Is reflected by the reflector 4 toward the irradiation target A, and is irradiated to the irradiation target A through the rectangular protective tube 2.
【００２６】その結果、保護管２の底面全体から被照射
体Ａまでの距離を均一にでき、エキシマＵＶランプ１の
電極１ａ，１ｂから最短距離にある保護管２の底面中央
部と対向する部分Ａ１と、それから離れた保護管２の底
面端部と対向する部分Ａ２とを比較しても、前記図１及
び図２に示した実施例に比べ、エキシ光の減衰量に大き
な差がなく、特に底面端部と対向する部分Ａ２は、電極
１ａ，１ｂから離れるものの、反射体４で反射されたエ
キシマ光が照射されるため、全体的に照射量を略同じに
できるという利点がある。As a result, the distance from the entire bottom surface of the protection tube 2 to the irradiation target A can be made uniform, and the portion facing the center of the bottom surface of the protection tube 2 located at the shortest distance from the electrodes 1a and 1b of the excimer UV lamp 1 Comparing A1 with the portion A2 facing the bottom end of the protective tube 2 distant therefrom, there is no large difference in the amount of attenuation of the excimer light as compared with the embodiment shown in FIGS. In particular, although the portion A2 facing the bottom end is separated from the electrodes 1a and 1b, it is irradiated with the excimer light reflected by the reflector 4, so that there is an advantage that the irradiation amount can be made substantially the same as a whole.
【００２７】また、図示せぬが、図４に示した構造のエ
キシマ照明装置を、図３に示すように、被照射体Ａの大
きさに対応して、複数のエキシマＵＶランプ１…を並列
状に配置しても良い。Although not shown, an excimer illuminating device having the structure shown in FIG. 4 is provided by connecting a plurality of excimer UV lamps 1 in parallel according to the size of the irradiation object A as shown in FIG. It may be arranged in a shape.
【００２８】尚、図示例では、アルミニウム板で少なく
とも反射面４ａを鏡面仕上げした反射板４を、エキシマ
ＵＶランプ１のホルダー１ｃに対し、ハンガー４ｂを介
して吊り下げることにより、移動不能に配置固定した
が、これに限定されず、図示せぬが、反射板４をアルミ
ニウム以外の材料で形成したり、保護管２の内面に貼着
して移動不能に配置固定しても良い。In the illustrated example, the reflecting plate 4 having at least the reflecting surface 4a mirror-finished with an aluminum plate is suspended and fixed to the holder 1c of the excimer UV lamp 1 via a hanger 4b. However, the present invention is not limited to this. Although not shown, the reflection plate 4 may be formed of a material other than aluminum, or may be stuck to the inner surface of the protection tube 2 so as to be immovably arranged and fixed.
【００２９】[0029]
【発明の効果】以上説明したように、本発明のうち請求
項１記載の発明は、エキシマＵＶランプと保護管との空
間に、窒素ガスを流すと共に反射体を配設することによ
り、エキシマＵＶランプの対向面側から発光したエキシ
マ光は、吸収されることなく保護管を透して被照射体に
直接照射されると共に、それ以外の背面側へ発光したエ
キシマ光は、反射体で反射され、保護管を透して被照射
体に照射されるので、簡単な構造でエキシマ光の減衰を
防止しながら被照射体への照射量を増大できる。従っ
て、窒素ガスの内圧に対して壁の厚い容器や厚い平面照
射窓が必要な従来のものに比べ、これら壁の厚い容器や
厚い平面照射窓が不要となって、製造コストを低減でき
て経済的であると共に、エキシマＵＶランプに対して被
照射体を接近でき、エキシマ光の照射効率が高くなっ
て、洗浄効率を向上できる。しかも、複数のエキシマＵ
Ｖランプを並列状に配置する必要がある場合には、容器
の厚い壁を挟んでエキシマＵＶランプが配置される従来
のものに比べ、容器の厚い壁が不要となって、これらエ
キシマＵＶランプの電極を相互に接近させて配置でき、
高い照射効率の下で被照射体上の照度分布をより均一に
できる。As described above, according to the first aspect of the present invention, the excimer UV lamp is provided in the space between the excimer UV lamp and the protective tube, and the reflector is provided to provide the excimer UV lamp. Excimer light emitted from the opposing surface side of the lamp is directly irradiated to the irradiated object through the protective tube without being absorbed, and excimer light emitted to the other back side is reflected by the reflector. Since the object to be irradiated is irradiated through the protective tube, the irradiation amount to the object to be irradiated can be increased while preventing the excimer light from being attenuated with a simple structure. Therefore, compared with the conventional apparatus which requires a thick-walled container and a thick flat irradiation window for the internal pressure of nitrogen gas, these thick-walled containers and a thick flat irradiation window are not required, and the manufacturing cost can be reduced and the economy can be reduced. In addition, the irradiation target can be approached to the excimer UV lamp, the irradiation efficiency of the excimer light increases, and the cleaning efficiency can be improved. Moreover, a plurality of excimer U
When the V lamps need to be arranged in parallel, a thick wall of the container is not required as compared with the conventional one in which the excimer UV lamp is arranged with the thick wall of the container interposed therebetween. The electrodes can be placed close to each other,
The illuminance distribution on the irradiation target can be made more uniform under high irradiation efficiency.
【００３０】請求項２の発明は、請求項１の発明の効果
に加えて、円筒状の保護管は、構造上強度に優れるか
ら、その厚さを薄くしても窒素ガス圧に十分耐えられる
ので、エキシマＵＶランプと被照射体や複数のエキシマ
ＵＶランプの相互を更に接近できる。According to the second aspect of the present invention, in addition to the effect of the first aspect, the cylindrical protective tube has excellent structural strength, so that it can sufficiently withstand the nitrogen gas pressure even if its thickness is reduced. Therefore, the excimer UV lamp and the irradiation target or the plurality of excimer UV lamps can be closer to each other.
【００３１】請求項３の発明は、請求項１または２の発
明の効果に加えて、エキシマＵＶランプの背面側から発
光されるエキシマ光のほとんどが、反射体の反射面に反
射されて、エキシマＵＶランプへ戻らずに被照射体に直
接照射されるので、被照射体への照射強度と照射面積を
向上できる。According to a third aspect of the present invention, in addition to the effect of the first or second aspect, most of the excimer light emitted from the back side of the excimer UV lamp is reflected by the reflecting surface of the reflector, and the excimer Since the irradiation object is directly irradiated without returning to the UV lamp, the irradiation intensity and the irradiation area on the irradiation object can be improved.
【図１】 本発明の一実施例を示すエキシマ照明装置の
縦断面図である。FIG. 1 is a longitudinal sectional view of an excimer illuminating device showing one embodiment of the present invention.
【図２】 同斜視図である。FIG. 2 is a perspective view of the same.
【図３】 複数のエキシマＵＶランプが並列状に配置さ
れた場合を示す縮小縦断面図である。FIG. 3 is a reduced vertical sectional view showing a case where a plurality of excimer UV lamps are arranged in parallel.
【図４】 本発明の他の実施例を示すエキシマ照明装置
の部分的な縦断面図である。FIG. 4 is a partial vertical cross-sectional view of an excimer illumination device showing another embodiment of the present invention.
Ａ 被照射体 Ｅ２ 背面側へ発
光したエキシマ光 Ｓ 空間 １ エキシマＵＶ
ランプ ２ 保護管 ３ 窒素ガス ４ 反射体 ４ａ 反射面A Exposed object E2 Excimer light emitted to the back side S Space 1 Excimer UV
Lamp 2 Protective tube 3 Nitrogen gas 4 Reflector 4a Reflecting surface
───────────────────────────────────────────────────── フロントページの続き Ｆターム(参考） 5F004 AA16 BA20 BB05 BC08 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 5F004 AA16 BA20 BB05 BC08
Claims (3)
する空気を置換するために窒素ガス（３）が供給され、
エキシマＵＶランプ（１）から発光されたエキシマ光を
被照射体（Ａ）側へ反射させる反射体（４）が設けられ
たエキシマ照明装置において、前記エキシマＵＶランプ
（１）の外周に、エキシマ光の透過性に優れた材料で筒
状に形成された保護管（２）を設け、これらエキシマＵ
Ｖランプ（１）と保護管（２）との間に区画形成される
空間（Ｓ）に、窒素ガス（３）を流すと共に、エキシマ
ＵＶランプ（１）の背面側へ発光したエキシマ光（Ｅ
２）が被照射体（Ａ）へ反射されるように反射体（４）
を配設したことを特徴とするエキシマ照明装置。1. A nitrogen gas (3) is provided to replace air present around the excimer UV lamp (1),
In an excimer illuminator provided with a reflector (4) for reflecting excimer light emitted from the excimer UV lamp (1) toward the irradiation target (A), excimer light is provided on the outer periphery of the excimer UV lamp (1). A protective tube (2) formed in a tubular shape with a material having excellent permeability to the excimer U is provided.
A nitrogen gas (3) is caused to flow into a space (S) defined between the V lamp (1) and the protective tube (2), and excimer light (E) emitted to the back side of the excimer UV lamp (1) is emitted.
Reflector (4) so that 2) is reflected to irradiated object (A)
An excimer lighting device, comprising:
求項１記載のエキシマ照明装置。2. An excimer lighting device according to claim 1, wherein said protection tube is formed in a cylindrical shape.
キシマＵＶランプ（１）の外周面に沿って凹状に湾曲さ
せ、この反射面（４ａ）の曲率を、これと対向するエキ
シマＵＶランプ（１）の背面側から発光するエキシマ光
（Ｅ２）のほとんどがエキシマＵＶランプ（１）の外側
へ拡開するようにした請求項１または２記載のエキシマ
照明装置。3. The reflecting surface (4a) of the reflector (4) is concavely curved along the outer peripheral surface of the excimer UV lamp (1), and the curvature of the reflecting surface (4a) is changed to the excimer facing the excimer UV lamp (1). The excimer lighting device according to claim 1 or 2, wherein most of the excimer light (E2) emitted from the back side of the UV lamp (1) expands outside the excimer UV lamp (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001096289A JP2002298790A (en) | 2001-03-29 | 2001-03-29 | Excimer lighting system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001096289A JP2002298790A (en) | 2001-03-29 | 2001-03-29 | Excimer lighting system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002298790A true JP2002298790A (en) | 2002-10-11 |
Family
ID=18950218
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001096289A Pending JP2002298790A (en) | 2001-03-29 | 2001-03-29 | Excimer lighting system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002298790A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2002036259A1 (en) * | 2000-11-01 | 2004-03-11 | 信越エンジニアリング株式会社 | Excimer UV Photoreactor |
| WO2005098903A1 (en) * | 2004-04-08 | 2005-10-20 | Sen Engineering Co., Ltd. | Dielectric barrier discharge excimer light source |
| KR20180048792A (en) * | 2015-08-27 | 2018-05-10 | 서스 마이크로텍 포토마스크 이큅먼트 게엠베하 운트 코. 카게 | Apparatus for applying a liquid medium irradiated with UV radiation onto a substrate |
| CN108290185A (en) * | 2015-08-27 | 2018-07-17 | 聚斯微技术光掩模设备两合公司 | For the liquid medium of UV radiations will to be utilized to be applied to the device on substrate |
| CN110441935A (en) * | 2019-08-01 | 2019-11-12 | 深圳市华星光电技术有限公司 | Irradiating machine for ultraviolet orientation |
| CN112635294A (en) * | 2020-12-22 | 2021-04-09 | 中国科学技术大学 | Ultra-high brightness vacuum ultraviolet lamp |
| CN113857012A (en) * | 2021-09-27 | 2021-12-31 | 常熟五临天光电科技有限公司 | Illumination processing system convenient to air is got rid of |
-
2001
- 2001-03-29 JP JP2001096289A patent/JP2002298790A/en active Pending
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2002036259A1 (en) * | 2000-11-01 | 2004-03-11 | 信越エンジニアリング株式会社 | Excimer UV Photoreactor |
| WO2005098903A1 (en) * | 2004-04-08 | 2005-10-20 | Sen Engineering Co., Ltd. | Dielectric barrier discharge excimer light source |
| KR102103739B1 (en) * | 2015-08-27 | 2020-04-23 | 서스 마이크로텍 포토마스크 이큅먼트 게엠베하 운트 코. 카게 | Apparatus for applying liquid medium irradiated with UV radiation on a substrate |
| JP7005485B2 (en) | 2015-08-27 | 2022-01-21 | ズース マイクロテク フォトマスク エクイップメント ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト | A device for applying a liquid medium irradiated with UV radiation to a substrate. |
| CN108352340A (en) * | 2015-08-27 | 2018-07-31 | 聚斯微技术光掩模设备两合公司 | For the liquid medium of UV radiations will to be utilized to be applied to the device on substrate |
| JP2018528470A (en) * | 2015-08-27 | 2018-09-27 | ズース マイクロテク フォトマスク エクイップメント ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフトＳｕｓｓ ＭｉｃｒｏＴｅｃ Ｐｈｏｔｏｍａｓｋ Ｅｑｕｉｐｍｅｎｔ ＧｍｂＨ ＆ Ｃｏ． ＫＧ | Apparatus for applying a liquid medium irradiated with UV radiation to a substrate |
| JP2018528469A (en) * | 2015-08-27 | 2018-09-27 | ズース マイクロテク フォトマスク エクイップメント ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフトＳｕｓｓ ＭｉｃｒｏＴｅｃ Ｐｈｏｔｏｍａｓｋ Ｅｑｕｉｐｍｅｎｔ ＧｍｂＨ ＆ Ｃｏ． ＫＧ | Apparatus for applying a liquid medium irradiated with UV radiation to a substrate |
| CN108352340B (en) * | 2015-08-27 | 2022-03-29 | 聚斯微技术光掩模设备两合公司 | Device for applying a liquid medium irradiated with UV radiation to a substrate |
| KR20180048792A (en) * | 2015-08-27 | 2018-05-10 | 서스 마이크로텍 포토마스크 이큅먼트 게엠베하 운트 코. 카게 | Apparatus for applying a liquid medium irradiated with UV radiation onto a substrate |
| CN108290185A (en) * | 2015-08-27 | 2018-07-17 | 聚斯微技术光掩模设备两合公司 | For the liquid medium of UV radiations will to be utilized to be applied to the device on substrate |
| CN110441935B (en) * | 2019-08-01 | 2021-07-06 | Tcl华星光电技术有限公司 | A irradiator for ultraviolet is joined in marriage |
| CN110441935A (en) * | 2019-08-01 | 2019-11-12 | 深圳市华星光电技术有限公司 | Irradiating machine for ultraviolet orientation |
| CN112635294A (en) * | 2020-12-22 | 2021-04-09 | 中国科学技术大学 | Ultra-high brightness vacuum ultraviolet lamp |
| CN112635294B (en) * | 2020-12-22 | 2022-04-19 | 中国科学技术大学 | Ultra-high brightness vacuum ultraviolet lamp |
| CN113857012A (en) * | 2021-09-27 | 2021-12-31 | 常熟五临天光电科技有限公司 | Illumination processing system convenient to air is got rid of |
| CN113857012B (en) * | 2021-09-27 | 2023-07-28 | 常熟五临天光电科技有限公司 | Illumination processing system convenient to air is got rid of |
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