JP2002267826A - Optical diffraction structure and manufacturing method therefor - Google Patents
Optical diffraction structure and manufacturing method thereforInfo
- Publication number
- JP2002267826A JP2002267826A JP2001071756A JP2001071756A JP2002267826A JP 2002267826 A JP2002267826 A JP 2002267826A JP 2001071756 A JP2001071756 A JP 2001071756A JP 2001071756 A JP2001071756 A JP 2001071756A JP 2002267826 A JP2002267826 A JP 2002267826A
- Authority
- JP
- Japan
- Prior art keywords
- diffraction grating
- pixels
- patterns
- diffraction
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 230000003287 optical effect Effects 0.000 title claims abstract description 20
- 239000000758 substrate Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 7
- 229920005989 resin Polymers 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 42
- 239000011295 pitch Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 238000013500 data storage Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H1/2645—Multiplexing processes, e.g. aperture, shift, or wavefront multiplexing
- G03H1/265—Angle multiplexing; Multichannel holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H1/30—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique discrete holograms only
- G03H2001/303—Interleaved sub-holograms, e.g. three RGB sub-holograms having interleaved pixels for reconstructing coloured holobject
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、カードや有価証券
に適用すると偽造防止効果が高い、ホログラムシールや
回折格子シール等の光回折構造に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical diffraction structure such as a hologram seal or a diffraction grating seal having a high anti-counterfeiting effect when applied to cards and securities.
【０００２】[0002]
【従来の技術】クレジットカードや預貯金用カード等の
カードには、偽造を防止する目的で、ホログラムシール
が貼り付けられている。また、株券、証券、金券、もし
くは商品券等にも、同様の目的でホログラムシールが貼
り付けられている。なお、これらの「ホログラムシー
ル」としては、立体画像を表現するホログラムが形成さ
れているものと、回折格子の領域をパターン状に形成し
たものとが利用されているが、いずれも、「ホログラム
シール」と呼ばれており、また、ホログラムも広義には
回折格子の一種であるため、この明細書においても、同
様の呼び方にならうことにする。2. Description of the Related Art A hologram seal is affixed to a card such as a credit card or a deposit / deposit card for the purpose of preventing forgery. A hologram seal is also attached to a stock certificate, a security, a gold certificate, a gift certificate, or the like for the same purpose. As these “hologram seals”, those in which a hologram expressing a three-dimensional image is formed and those in which a diffraction grating region is formed in a pattern shape are used. In addition, since a hologram is a kind of diffraction grating in a broad sense, a similar term is used in this specification.
【０００３】ホログラムシールは、簡単なものでは、回
折格子を構成する平行な溝を有する区域を、デザインさ
れたパターンに合わせて形成することにより、回折格子
特有の干渉色を持つパターンが見えるものである。しか
しがら、このようなホログラムシールも、クレジットカ
ード等では、既に長期間使用されており、玩具の分野で
は、市販もされている状態にある。また、製造技術的に
高度とされているものの、基本的な製造技術は知られて
おり、不正な意図での複製も、過去に比べれば、より容
易化している恐れがある。[0003] A hologram seal is a simple one in which a pattern having an interference color peculiar to a diffraction grating can be seen by forming an area having parallel grooves constituting a diffraction grating according to a designed pattern. is there. However, such a hologram seal has already been used for a long time in a credit card or the like, and is in a state of being marketed in the field of toys. In addition, although the manufacturing technology is advanced, the basic manufacturing technology is known, and there is a possibility that duplication with an unintended intention is easier than in the past.
【０００４】そこで、近年、クレジットカード分野で
は、見る角度により複数のパターンが現出する複合ホロ
グラムシールを作成して使用し、偽造の防止、安全性の
向上を図っている。一般的に、回折格子は、線巾、ピッ
チ、および面上での角度をパラメータとしているが、上
記の複合ホログラムシールにおいては、パターンごと
に、これらのうち、一つもしくはそれ以上のパラメータ
を変更することにより、同一個所に複数のパターンが見
えるよう構成していた。In recent years, in the field of credit cards, a composite hologram seal in which a plurality of patterns appear depending on the viewing angle has been created and used to prevent forgery and improve safety. Generally, a diffraction grating has parameters of line width, pitch, and angle on a plane. In the above-described composite hologram seal, one or more of these parameters are changed for each pattern. By doing so, a plurality of patterns can be seen at the same location.
【０００５】しかしながら、これらのパターンにおける
パラメータは解析が不可能なものではなく、また、パタ
ーンそのものは比較的単純な幾何学模様であるため、不
正な意図を持つ者が、同様なものを作り出す可能性が無
いとは言えなかった。However, the parameters in these patterns are not impossible to analyze, and since the patterns themselves are relatively simple geometric patterns, it is possible for a person with an incorrect intention to create similar ones. I could not say that there was no sex.
【０００６】[0006]
【発明が解決しようとする課題】本発明においては、上
記のように、不正な意図でホログラムシールの偽造を企
てる者が容易には解析しにくいホログラムシールを提供
することを課題とする。SUMMARY OF THE INVENTION It is an object of the present invention to provide a hologram seal which is difficult to analyze easily by a person who attempts to forge a hologram seal with improper intention.
【０００７】[0007]
【課題を解決する手段】本発明者の検討によれば、各パ
ターンの回折格子のパラメータとして、新たに回折格子
が形成された面と溝との角度を、従来の直角のものに変
えて、斜めの角度とし、さらに、パターンごとに回折格
子が形成された面と溝との角度を変えることにより、解
析が困難で、従って、偽造が極めて困難なホログラムシ
ールを提供することができた。According to the study of the present inventor, the angle between the surface on which a new diffraction grating is formed and the groove is changed to a conventional right angle as a parameter of the diffraction grating of each pattern. By making the angle oblique and changing the angle between the surface on which the diffraction grating is formed and the groove for each pattern, it was possible to provide a hologram seal that is difficult to analyze and therefore extremely difficult to forge.
【０００８】第１の発明は、光回折構造層の表面に、多
数の微細な溝の群として形成された回折格子が輪郭され
た複数の回折格子パターンを有しており、前記回折格子
パターンの前記溝が前記光回折構造層の表面となす角度
が、前記各回折格子パターン間で相違することを特徴と
する光回折構造に関するものである。第２の発明は、第
１の発明において、前記各回折格子パターン間で、さら
に、前記溝の巾、ピッチ、もしくは前記光回折構造層の
表面における角度の各パラメータのうちの少なくともい
ずれかが相違することを特徴とする光回折構造に関する
ものである。第３の発明は、第１または第２の発明にお
いて、前記各回折格子パターンは、回折格子が所定の微
小形状に輪郭された領域からなる回折格子画素の集合体
からなることを特徴とする光回折構造に関するものであ
る。第４の発明は、第３の発明において、異なる前記回
折格子パターンを構成する前記回折格子画素どうしが重
複する個所において、前記回折格子画素が、その細分化
された副画素からなる単位副画素配列の前記副画素ごと
に、異なる前記回折格子パターンを構成する前記回折格
子画素の回折格子が配置されていることを特徴とする光
回折構造に関するものである。第５の発明は、第３の発
明において、異なる前記回折格子パターンを構成する前
記回折格子画素どうしが重複する個所において、隣接す
る前記回折格子画素どうしを副画素とする単位副画素配
列の前記副画素ごとに、異なる前記回折格子パターンを
構成する前記回折格子画素が配置されていることを特徴
とする光回折構造に関するものである。第６の発明は、
複数のパターンを準備し、型形成用基板の表面に、前記
パターンごとに、前記溝が前記型形成用基板の光回折構
造層の表面となす角度を変えたビーム露光による描画を
行なうことにより、回折格子の多数の微細な溝を形成し
て型を製造し、得られた前記型を使用して樹脂材表面
に、前記型の型面形状を転移させることからなる光回折
構造の製造方法に関するものである。第７の発明は、第
６の発明において、前記ビーム露光を行なう際に、さら
に、前記パターンごとに、前記溝の巾、ピッチ、もしく
は前記光回折構造層の表面における角度のうちの少なく
ともいずれかを相違させることを特徴とする光回折構造
の製造方法に関するものである。第８の発明は、第６ま
たは第７の発明において、前記溝に対応する所定の線
巾、ピッチ、および角度の線を所定の輪郭内に配置した
回折格子画素を複数準備した後、前記各パターン内に、
前記回折格子画素を選択して配置し、回折格子パターン
データを作成すること、および前記のパターンごとに、
溝が前記型形成用基板の光回折構造層の表面となす角度
を設定することとを行なった後、前記回折格子パターン
データに基づいて前記描画を行なうための描画用データ
を作成し、前記の溝が前記型形成用基板の表面となす角
度ごとに、前記描画を行なうことを特徴とする光回折構
造の製造方法に関するものである。第９の発明は、第８
の発明において、少なくとも前記各パターンが重複する
区域において、前記回折格子画素を細分割した副画素か
らなる単位副画素配列、もしくは隣接する前記回折格子
画素を副画素とする単位副画素配列を設定すると共に、
前記単位副画素配列中のいずれの前記副画素に、いずれ
の前記パターンに対応付けられるべき前記回折格子画素
を配列すべきかのルールを前以って決めておき、前記ル
ールに基づいて、前記副画素ごとに前記各回折格子画素
を配置することを特徴とする光回折構造の製造方法に関
するものである。According to a first aspect of the present invention, a plurality of diffraction grating patterns each having a contour of a diffraction grating formed as a group of a large number of fine grooves are provided on the surface of the light diffraction structure layer. The present invention relates to a light diffraction structure, wherein an angle formed by the groove with the surface of the light diffraction structure layer differs between the respective diffraction grating patterns. According to a second aspect, in the first aspect, at least one of the parameters of the width, the pitch, or the angle of the surface of the light diffraction structure layer is different between the diffraction grating patterns. The present invention relates to a light diffraction structure. According to a third aspect, in the first or second aspect, each of the diffraction grating patterns is formed by an aggregate of diffraction grating pixels including a region where the diffraction grating is contoured in a predetermined minute shape. It relates to a diffractive structure. According to a fourth aspect of the present invention, in the third aspect, at a place where the diffraction grating pixels constituting the different diffraction grating patterns overlap each other, the diffraction grating pixels are arranged in a unit sub-pixel arrangement including subdivided sub-pixels. A diffraction grating of the diffraction grating pixels constituting the different diffraction grating patterns is arranged for each of the sub-pixels. In a fifth aspect based on the third aspect, the sub-pixels of the unit sub-pixel array in which adjacent diffraction grating pixels are used as sub-pixels at locations where the diffraction grating pixels constituting different diffraction grating patterns overlap each other. The present invention relates to a light diffraction structure, wherein the diffraction grating pixels forming different diffraction grating patterns are arranged for each pixel. The sixth invention is
Prepare a plurality of patterns, on the surface of the mold forming substrate, for each pattern, by performing a beam exposure by changing the angle between the groove and the surface of the light diffraction structure layer of the mold forming substrate, by performing drawing. The present invention relates to a method for manufacturing a light diffraction structure, comprising: forming a mold by forming a large number of fine grooves in a diffraction grating; and transferring a mold surface shape of the mold to a resin material surface using the obtained mold. Things. In a seventh aspect based on the sixth aspect, when performing the beam exposure, at least one of the width of the groove, the pitch, or the angle at the surface of the light diffraction structure layer is further provided for each pattern. And a method of manufacturing an optical diffraction structure. In an eighth aspect based on the sixth or seventh aspect, after preparing a plurality of diffraction grating pixels in which lines of a predetermined line width, pitch, and angle corresponding to the grooves are arranged within a predetermined contour, In the pattern
Selecting and arranging the diffraction grating pixels, creating diffraction grating pattern data, and for each of the patterns,
Setting the angle that the groove makes with the surface of the light diffraction structure layer of the mold forming substrate, and then forming drawing data for performing the drawing based on the diffraction grating pattern data, The present invention relates to a method for manufacturing an optical diffraction structure, wherein the drawing is performed at each angle that a groove forms with the surface of the mold forming substrate. The ninth invention is the eighth invention
In the invention, at least in an area where the patterns overlap, a unit subpixel array including subpixels obtained by subdividing the diffraction grating pixels or a unit subpixel array including adjacent diffraction grating pixels as subpixels is set. Along with
A rule as to which of the sub-pixels in the unit sub-pixel array should be arranged with the diffraction grating pixel to be associated with any of the patterns is determined in advance, and the sub-pixel is determined based on the rule. The present invention relates to a method for manufacturing a light diffraction structure, wherein the diffraction grating pixels are arranged for each pixel.
【０００９】[0009]
【発明の実施の形態】以下に、図を引用しながら、本発
明をより詳しく説明する。本発明の光回折構造は、図１
（ａ）に例示するように、好ましくは、カード１に適用
されている。このカード１は、カード基材２上に光回折
構造を有する光回折構造層３（一般的表現では「ホログ
ラムシール」である。）が積層されたもので、光回折構
造層３は、図１（ａ）に示すように、二つのパターンＰ
１およびＰ２を有しているものである。なお、光回折構
造層はホログラムの視認性を高める目的で、通常、下層
側にアルミニウム等の金属反射層や光回折構造層とは光
の屈折率の異なる透明反射層を有しているが、図示は省
略する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in more detail with reference to the drawings. The light diffraction structure of the present invention is shown in FIG.
As shown in (a), it is preferably applied to the card 1. The card 1 has a light diffractive structure layer 3 having a light diffractive structure (a “hologram seal” in a general expression) laminated on a card base material 2. As shown in (a), two patterns P
1 and P2. The light diffraction structure layer has a transparent reflection layer having a different refractive index from that of a metal reflection layer such as aluminum or the light diffraction structure layer on the lower layer side for the purpose of enhancing the visibility of the hologram. Illustration is omitted.
【００１０】図１（ａ）に示すカードのＡ−Ａ線で切断
した断面を図１（ｂ）に示す。二つのパターンＰ１およ
びＰ２は、それぞれ、異なる角度で形成された回折格子
の溝４を光回折構造層の下面に有しており、パターンＰ
１では、溝４は光回折構造の下面から右上がりの傾斜を
有し、また、パターンＰ２では、溝４は光回折構造の下
面から左上がりの傾斜を有している、FIG. 1B shows a cross section of the card shown in FIG. 1A taken along the line AA. Each of the two patterns P1 and P2 has a diffraction grating groove 4 formed at a different angle on the lower surface of the light diffraction structure layer.
In 1, the groove 4 has a slope rising to the right from the lower surface of the light diffraction structure, and in the pattern P2, the groove 4 has a slope rising to the left from the lower surface of the light diffraction structure.
【００１１】従来技術においては、回折格子の線巾、ピ
ッチ、および面上での角度をパラメータとしていたが、
本発明の回折格子においては、回折格子の溝と光回折構
造層のなす角度を第１のパラメータとし、最小限、この
第１のパラメータである回折格子の溝と光回折構造層の
なす角度がパターン間で相違していればよい。このよう
に、回折格子の溝と光回折構造層のなす角度がパターン
間で相違していれば、見る角度によって、各パターンの
見え方が相違し、同一のホログラムシールから、複数の
パターンの各々を他のパターンと分離して見ることがで
きる。In the prior art, the line width, pitch, and angle on the plane of the diffraction grating were used as parameters.
In the diffraction grating of the present invention, the angle formed by the groove of the diffraction grating and the light diffraction structure layer is defined as the first parameter, and the angle formed by the groove of the diffraction grating and the light diffraction structure layer, which is the first parameter, is minimized. It suffices if the patterns differ. As described above, if the angle between the groove of the diffraction grating and the light diffraction structure layer is different between the patterns, the appearance of each pattern is different depending on the viewing angle, and each of the plurality of patterns is different from the same hologram seal. Can be seen separately from other patterns.
【００１２】ところで、本発明の回折格子においては、
回折格子の溝と光回折構造層のなす角度を第１優先とし
て、各パターン間で相違させるが、上記のように回折格
子の溝と光回折構造層のなす角度が各パターン間で相違
していれば、従来のパラメータである回折格子の線巾、
ピッチ、および面上での角度のうち、一つ、もしくはそ
れ以上を変更して、各パターン間により変化を持たせて
もよい。By the way, in the diffraction grating of the present invention,
The angle formed by the groove of the diffraction grating and the light diffraction structure layer is made the first priority, and is made different between the patterns. However, as described above, the angle formed by the groove of the diffraction grating and the light diffraction structure layer is made different between the patterns. Then, the conventional parameter, the line width of the diffraction grating,
One or more of the pitch and the angle on the plane may be changed so as to have a change between patterns.
【００１３】ホログラムシール等における本発明の光回
折構造は、ガラス板、樹脂板、もしくは金属板、あるい
はガラス板や金属板上に樹脂コートして作成した適宜な
型形成用基板（作業対象の意味で「ワーク」とも言
う。）に、電子線やレーザー光を光源とする描画装置を
用いてビーム露光することにより、回折格子の溝を彫刻
して型を製造し、得られた型を使用して樹脂等の表面
に、型の型面形状を転移させて製造することができる。The light diffraction structure of the present invention in a hologram seal or the like is a glass plate, a resin plate, or a metal plate, or an appropriate mold forming substrate (meaning the work object) formed by coating a glass plate or a metal plate with a resin. The work is also referred to as “work.” The beam is exposed using a drawing apparatus that uses an electron beam or a laser beam as a light source, thereby engraving a groove of the diffraction grating to produce a mold, and using the obtained mold. The mold can be manufactured by transferring the mold surface shape to the surface of a resin or the like.
【００１４】なお、描画装置を用いて回折格子の溝を彫
刻する際に、型における回折格子の溝と光回折構造層３
とがなす角度を変えるには、ワークを載せる台（＝ステ
ージ）を傾けるか、もしくは光源を傾けるかのいずれか
によればよいが、図２に示すように、ステージを傾けた
方がやりやすい。また、回折格子の溝と光回折構造層３
とがなす角度以外の、溝の巾、ピッチ、もしくは前記光
回折構造層の表面における角度の変更も、ステージの動
きによって行なうことが好ましい。When the grooves of the diffraction grating are engraved by using the drawing apparatus, the grooves of the diffraction grating in the mold and the light diffraction structure layer 3 are engraved.
In order to change the angle formed, either the base on which the work is placed (= stage) or the light source may be tilted, but it is easier to tilt the stage as shown in FIG. . The grooves of the diffraction grating and the light diffraction structure layer 3
It is also preferable to change the width and pitch of the groove other than the angle formed by the stage and the angle on the surface of the light diffraction structure layer by moving the stage.
【００１５】描画装置は、通常、光源６とワーク７を載
せるステージ７が、露光ビーム６ａがステージ（ステー
ジとワークは平行とする。）と直交するような位置関係
にあるので、本発明の光回折構造のように、回折格子の
溝と光回折構造層３とがなす角度を変えるためには、型
を作成する際に、ステージ５を水平な位置から、時計回
り、もしくは逆回りに角度を変える。なお、ここでは、
上記の反時計回りの角度を＋、時計回りを−とし、露光
ビーム６ａからワーク７の垂線を時計回りに測った角度
を＋、反時計回りに測った角度を−とし、便宜上、型の
回折格子の溝と型面のなす角度も露光ビームから見たワ
ーク垂線との角度として表現する。なお、得られる光回
折構造における回折格子の溝についても、光回折構造層
の垂線から見た回折格子の溝の角度（より正確には、光
回折構造層の表面と、溝の開口部の中心線と溝の底の中
心線の両者を通る面とが交差する角度である。）で表現
する。In the drawing apparatus, usually, the light source 6 and the stage 7 on which the work 7 is placed are in a positional relationship such that the exposure beam 6a is orthogonal to the stage (the stage and the work are parallel). In order to change the angle formed between the groove of the diffraction grating and the light diffraction structure layer 3 as in the case of a diffraction structure, the angle of the stage 5 must be changed clockwise or counterclockwise from a horizontal position when forming a mold. Change. Here,
The above counterclockwise angle is +, the clockwise direction is −, the angle measured perpendicular to the workpiece 7 from the exposure beam 6a clockwise is +, and the angle measured counterclockwise is −. The angle between the groove of the grating and the mold surface is also expressed as the angle between the workpiece and the perpendicular to the workpiece as viewed from the exposure beam. Note that the grooves of the diffraction grating in the obtained light diffraction structure are also formed at the angles of the grooves of the diffraction grating viewed from the perpendicular to the light diffraction structure layer (more precisely, the surface of the light diffraction structure layer and the center of the opening of the groove. It is the angle at which the line and the plane passing through both the center line at the bottom of the groove intersect.)
【００１６】描画装置を用いて型を製造する際には、型
のどの部分にどのような回折格子を形成するかをデータ
として、描画装置に与える必要があるので、このため、
画素ごとに所定の回折格子を配置することを行なう。When a mold is manufactured using a drawing apparatus, it is necessary to provide the drawing apparatus with data as to what portion of the mold is to be formed with what kind of diffraction grating.
A predetermined diffraction grating is arranged for each pixel.
【００１７】上記の目的を果たすため、まず、回折格子
が、所定の微小形状に輪郭された領域からなる回折格子
画素を、回折格子を色々と変えて準備する。各回折格子
画素としては、回折格子の溝と光回折構造層３とがなす
角度が異なるものを準備するが、回折格子の溝と光回折
構造層３とがなす角度が異なっていれば、さらに、溝の
巾、ピッチ、もしくは前記光回折構造層の表面における
角度は同じでも、異なっていてもよい。図３は、回折格
子画素のごく一例を示すものである。なお、本発明にお
いては、回折格子の溝と光回折構造層３とがなす角度が
異なる複数の回折格子画素を使用していれば、それらに
加えて、回折格子の溝と光回折構造層３とがなす角度が
同じで、溝の巾、ピッチ、もしくは前記光回折構造層の
表面における角度が異なる回折格子画素を使用してもよ
い。In order to achieve the above object, first, a diffraction grating pixel in which the diffraction grating is formed of a region contoured in a predetermined minute shape is prepared by changing the diffraction grating in various ways. As each diffraction grating pixel, a pixel having a different angle formed by the groove of the diffraction grating and the light diffraction structure layer 3 is prepared. If the angle formed by the groove of the diffraction grating and the light diffraction structure layer 3 is different, furthermore, The groove width, pitch, or angle at the surface of the light diffraction structure layer may be the same or different. FIG. 3 shows only one example of a diffraction grating pixel. In the present invention, if a plurality of diffraction grating pixels having different angles formed by the grooves of the diffraction grating and the light diffraction structure layer 3 are used, in addition to these, the grooves of the diffraction grating and the light diffraction structure layer 3 are used. Diffraction grating pixels may be used which have the same angle but different widths, pitches, or angles at the surface of the light diffraction structure layer.
【００１８】図４は、パターンを画素で表示したもの
で、簡単のために、図４（ａ）では数字「１」を、また
図４（ｂ）では数字「２」を縦横５×５の画素で表示し
たものである。勿論、パターンは任意であるし、画素の
分割の細かさについても任意に定めることができる。な
お、画素の大きさは、得られる光回折構造において、例
えば、１０〜１００μｍ程度である。図４（ａ）の
「１」のパターンには、例えば、横方向の太い多数の線
で表示する回折格子画素Ａが配置されており、図４
（ｂ）の「２」のパターンには、例えば、横方向の細い
線で表示する回折格子画素Ｂが配置されている。図４
で、二種類の回折格子画素の線巾を相違させたのは、二
つの回折格子画素を図上で区別する都合上であって、勿
論、本発明においては、図２の下部に示したような、回
折格子の溝と光回折構造層３とがなす角度が異なるもの
どうし、例えば図２（ａ）の下方に示すような角度が＋
４５°のもの、および図２（ｂ）に示すような角度が−
４５°のものを配置する。FIG. 4 shows a pattern represented by pixels. For simplicity, the numeral "1" in FIG. 4A and the numeral "2" in FIG. It is displayed by pixels. Of course, the pattern is arbitrary, and the fineness of the pixel division can be arbitrarily determined. The size of the pixel is, for example, about 10 to 100 μm in the obtained light diffraction structure. In the pattern “1” in FIG. 4A, for example, diffraction grating pixels A displayed by a large number of lines in the horizontal direction are arranged.
In the pattern “2” of (b), for example, diffraction grating pixels B displayed by thin horizontal lines are arranged. FIG.
The reason why the line widths of the two types of diffraction grating pixels are different is that the two diffraction grating pixels are distinguished from each other on the drawing, and, of course, in the present invention, as shown in the lower part of FIG. The angles formed by the grooves of the diffraction grating and the light diffraction structure layer 3 are different from each other. For example, the angle shown in the lower part of FIG.
45 ° and an angle as shown in FIG.
Arrange 45 °.
【００１９】この例では、両回折格子画素における、回
折格子の溝と光回折構造層３とがなす角度が９０°異な
ることになり、このような場合、概ね＋３０°〜＋８０
°の方向からは一方のパターンが、また、概ね−３０°
〜−８０°の方向からは、他方のパターンが見える。当
然ながら、回折格子の溝と光回折構造層のなす角度が、
パターン間で近いと、各パターンが見る角度により分離
して見える効果が薄れるので、上記の例のように、大き
く異なることが好ましいが、実用的には、少なくとも１
０°〜３０°、あるいはそれ以上の差違を有していれ
ば、二つのパターンが見る角度によって明瞭に分離す
る。また、パターンが３つ以上あるときは、互いに、少
なくとも１０°〜３０°、あるいはそれ以上程度の差違
を有していることが好ましい。In this example, the angle formed by the groove of the diffraction grating and the light diffraction structure layer 3 in both diffraction grating pixels is different by 90 °, and in such a case, it is approximately + 30 ° to + 80 °.
From the direction of °, one pattern is also approximately -30 °
The other pattern is visible from the direction of -80 °. Naturally, the angle between the groove of the diffraction grating and the light diffraction structure layer is
When the patterns are close to each other, the effect that each pattern is separated and seen depending on the viewing angle is weakened. Therefore, it is preferable that the patterns are largely different from each other as in the above example.
If there is a difference between 0 ° and 30 ° or more, the two patterns are clearly separated according to the viewing angle. When there are three or more patterns, it is preferable that the patterns have a difference of at least 10 ° to 30 ° or more.
【００２０】ところで、図４（ｃ）においても明らかな
ように、図４（ａ）の「１」のパターンと、図４（ｂ）
の「２」のパターンとを重ねると、重複部が生じる。図
４（ａ）および図４（ｂ）に示すように、各々のパター
ンには、別の回折格子画素が配置されることが予定され
ているので、この重複部において、いずれの回折格子画
素を配置するかが問題となる。一般的にこの種のホログ
ラムシールにおいては、見る角度によって、ほぼ同じ位
置にある複数のパターンが一つずつ見える必要があるの
で、重複部において、いずれかのパターンを単純に無く
すのではなく、できるだけいずれのパターンも生かす必
要がある。By the way, as is apparent from FIG. 4C, the pattern of "1" in FIG.
When the pattern “2” is overlapped, an overlapping portion occurs. As shown in FIGS. 4 (a) and 4 (b), it is planned that another diffraction grating pixel is arranged in each pattern. It is a matter of placement. Generally, in this type of hologram seal, depending on the viewing angle, it is necessary to see a plurality of patterns at almost the same position one by one. Both patterns need to be used.
【００２１】そこで、このような場合を想定して、画素
に対して、副画素の概念を持ち込んで、対処する。例え
ば、図５（ａ）に示すように、一つの画素を縦線で四分
割した単位副画素配列（○で囲んだもの、以下も同
じ。）や、図５（ｂ）に示すように、縦横に四分割した
単位副画素配列である。図５（ａ）に示す例において
は、例えば、向かって最も左側の副画素と一つおいた右
側の副画素に一方のパターンの回折格子画素を、向かっ
て最も右側の副画素と一つおいた左側の副画素に他方の
パターンの回折格子画素を配置することにより、重複部
において、二つのパターンが両立する。また、図５
（ｂ）に示す例においては、例えば、左上および右下の
副画素に一方のパターンを、また、左下および右上の副
画素に他方のパターンを配置すればよい。Therefore, assuming such a case, the concept of a sub-pixel is taken into consideration for a pixel. For example, as shown in FIG. 5A, a unit sub-pixel array in which one pixel is divided into four by a vertical line (one surrounded by a circle, the same applies to the following), or as shown in FIG. This is a unit sub-pixel array divided vertically and horizontally into four parts. In the example shown in FIG. 5A, for example, a diffraction grating pixel of one pattern is placed on the rightmost subpixel after the leftmost subpixel, and one on the rightmost subpixel. By arranging the diffraction grating pixel of the other pattern in the left sub-pixel, the two patterns are compatible in the overlapping portion. FIG.
In the example shown in (b), for example, one pattern may be arranged in the upper left and lower right sub-pixels, and the other pattern may be arranged in the lower left and upper right sub-pixels.
【００２２】単位副画素配列の概念を持ち込むことは、
パターンどうしの重複のない部分では、必ずしも必要で
はないが、いずれの画素にもこのように単位副画素配列
を形成しておき、単位副画素配列内のいずれの副画素に
いずれのパターンの画素を配置するかを決めておけば、
重複の有無を判断せずに、回折格子画素の配置が行なえ
る利点がある。なお、単位副画素配列は、さらに細かく
分割して形成し、例えば縦横に９分割して３つのパター
ンの重複に対処することもでき、それ以上の重複に対処
することも可能である。Introducing the concept of the unit sub-pixel array is as follows.
In a portion where patterns do not overlap with each other, it is not always necessary, but a unit subpixel array is formed in each pixel in this way, and a pixel of any pattern is assigned to any subpixel in the unit subpixel array. If you decide whether to arrange,
There is an advantage that the arrangement of the diffraction grating pixels can be performed without determining the presence or absence of overlap. Note that the unit sub-pixel array can be formed by dividing it further finely, for example, by dividing it vertically and horizontally into nine to deal with the overlap of three patterns, and to deal with further overlap.
【００２３】なお、単位副画素配列は、画素の分割によ
らず、隣接する画素どうしを、各々副画素とみなし、図
５（ｃ）に示すように縦横四つまとめて形成することも
できる。図５（ｃ）に示すような場合、図５（ａ）にお
けるのと同様、左上および右下の副画素に一方のパター
ンを、また、左下および右上の副画素に他方のパターン
を配置すればよい。この場合、パターンの一部は間引か
れることになるが、もともと精密なパターンであるた
め、間引きにより、見た目に分かるほど劣化することは
ない。The unit sub-pixel array can be formed as four vertical and horizontal lines, as shown in FIG. 5C, by regarding adjacent pixels as sub-pixels, regardless of the division of pixels. In the case shown in FIG. 5 (c), as in FIG. 5 (a), if one pattern is arranged in the upper left and lower right sub-pixels and the other pattern is arranged in the lower left and upper right sub-pixels Good. In this case, a part of the pattern is thinned out. However, since the pattern is originally a precise pattern, the thinning does not cause deterioration as much as can be seen.
【００２４】図６は、図５（ａ）に示すような、画素を
縦線で四分割した単位副画素配列を重複部において利用
し、図４に示したパターンの重複に適用した例で、図
中、○で囲んだ３つの重複部において、右側に拡大図で
示すように、向かって最も左側の副画素と一つおいた右
側の副画素に「１」のパターンの回折格子画素を配置
し、また、向かって最も右側の副画素と一つおいた左側
の副画素に「２」のパターンの回折格子画素を配置し、
その他の、即ち、重複部以外では、画素にそのまま、各
パターンの回折格子画素を配置する。このようにして、
パターンの重複のある回折格子パターンデータを作成す
ることができる。FIG. 6 shows an example in which a unit subpixel array obtained by dividing a pixel into four by a vertical line as shown in FIG. 5A is used in an overlapping portion and applied to the overlapping of the pattern shown in FIG. As shown in the enlarged view on the right side, a diffraction grating pixel having a pattern of “1” is arranged on the rightmost sub-pixel and the leftmost sub-pixel on the three overlapping portions circled in the figure, as shown in the enlarged view on the right side. In addition, a diffraction grating pixel having a pattern of “2” is arranged on the leftmost subpixel that is separated from the rightmost subpixel by one,
Other than that, that is, other than the overlapping portion, the diffraction grating pixels of each pattern are arranged as they are in the pixels. In this way,
Diffraction grating pattern data with overlapping patterns can be created.
【００２５】具体例を挙げると、上記の例において、
「１」のパターンに配置する回折格子画素Ａは、線幅；
０．５μｍ、ピッチ；１μｍ、型面上での線の描画角
度；０°（即ち、図の水平方向である。）、回折格子の
溝と光回折構造層３とがなす角度；＋４５°（図１
（ｂ）のパターンＰ１の角度θ（４５°を想定してい
る。）の型部分から得られ、また、「２」のパターンに
配置する回折格子画素Ｂは、線幅、ピッチ、および型面
上での線の描画角度は回折格子画素Ａと同じで、回折格
子の溝と光回折構造層３とがなす角度；−４５°（図１
（ｂ）のパターンＰ２の角度θ（−４５°を想定してい
る。）の型部分から得られる。To give a specific example, in the above example,
The diffraction grating pixels A arranged in the pattern “1” have a line width;
0.5 μm, pitch: 1 μm, line drawing angle on mold surface; 0 ° (that is, horizontal direction in the drawing), angle between groove of diffraction grating and light diffraction structure layer 3; + 45 ° ( FIG.
The diffraction grating pixel B obtained from the pattern portion of the pattern P1 at the angle θ (assuming 45 °) of the pattern P1 and arranged in the pattern “2” has a line width, a pitch, and a mold surface. The drawing angle of the line above is the same as that of the diffraction grating pixel A, and the angle between the groove of the diffraction grating and the light diffraction structure layer 3;
It is obtained from the mold part of the angle θ (assuming −45 °) of the pattern P2 in (b).
【００２６】以上に説明した光回折構造を製造するに
は、光回折構造上での複数のパターンおよびその配置
や、複数の回折格子画素を記憶するデザインデータ記憶
装置、デザインデータ記憶装置に記憶されたデータに基
づき、各パターンに回折格子画素を配置して回折格子パ
ターンデータを作成するデザインデータの処理装置、回
折格子パターンデータを描画用データに変換し、描画用
光源の出力および描画用ステージの動きおよび傾きを制
御する光源・ステージ制御系とからなる製造装置を使用
して、まず、型を製造する。To manufacture the above-described light diffraction structure, a plurality of patterns and their arrangement on the light diffraction structure, a design data storage device for storing a plurality of diffraction grating pixels, and a design data storage device for storing the plurality of diffraction grating pixels. Based on the data obtained, a design data processing device that arranges diffraction grating pixels in each pattern to generate diffraction grating pattern data, converts the diffraction grating pattern data into drawing data, outputs a drawing light source and sets a drawing stage First, a mold is manufactured using a manufacturing apparatus including a light source / stage control system for controlling movement and tilt.
【００２７】得られた型は、必要に応じて、複製型（以
降、型もしくは複製型を単に型と言う。）を製造し、型
を樹脂材料からなる光回折構造形成用層に加熱加圧して
型付けするか、型の型面に紫外線硬化性樹脂等の硬化性
で流動性の樹脂組成物を接触させ、必要に応じて、プラ
スチックフィルムで被覆した後に、プラスチックフィル
ム上から紫外線を照射して樹脂組成物を硬化させること
により、型付けを行なうことができる。その後、型付け
された面に反射層の薄膜を形成し、さらに接着剤層を積
層する等して、種々の対象に適用しやすいシール形態と
する。あるいは、先に挙げたプラスチックフィルムとし
て剥離性のものを使用する等して、光回折構造層、反射
層、接着剤層等の積層体が転写できるような転写シート
を形成して、種々の対象に適用してもよい。The obtained mold is, if necessary, manufactured as a duplicate mold (hereinafter, the mold or the duplicate mold is simply referred to as a mold), and the mold is heated and pressed to a light diffraction structure forming layer made of a resin material. Or mold, or contact the mold surface of the mold with a curable and fluid resin composition such as an ultraviolet-curable resin, and, if necessary, after coating with a plastic film, irradiate ultraviolet rays from above the plastic film. Molding can be performed by curing the resin composition. After that, a thin film of a reflective layer is formed on the molded surface, and an adhesive layer is further laminated to form a seal form that can be easily applied to various objects. Alternatively, by using a releasable plastic film as described above, a transfer sheet on which a laminate of the light diffraction structure layer, the reflection layer, the adhesive layer, and the like can be transferred is formed, and various objects are formed. May be applied.
【００２８】[0028]
【発明の効果】請求項１の発明によれば、複数の回折格
子パターン間で、回折格子を構成する溝が前記光回折構
造層の表面となす角度が、前記各回折格子パターン間で
相違しているので、見る角度によって見えるパターンが
変る効果を有していて、かつ、従来のものにくらべて解
析がより困難な光回折構造を提供することができる。請
求項２の発明によれば、請求項１の発明の効果に加え、
光回折構造のパラメータとして、二次元的なものが加味
されるので、より外観の変化のある光回折構造を提供す
ることができる。請求項３の発明によれば、各回折格子
パターンは、微小な画素からなっているので、描画装置
を用いて型を製造するのに適した光回折構造を提供する
ことができる。請求項４の発明によれば、請求項３の発
明の効果に加え、パターンどうしの重複部において、画
素をさらに細分化した単位副画素配列の副画素ごとに、
異なる前記回折格子パターンを構成する回折格子画素を
配置するので、複数のパターンの各々を損なうことな
く、見る角度によって見えるパターンが変る光回折構造
を提供できる。請求項５の発明によれば、請求項３の発
明の効果に加え、パターンどうしの重複部において、隣
接する前記回折格子画素を副画素とする単位副画素配列
がの副画素ごとに、異なる前記回折格子パターンを構成
する回折格子画素を配置するので、画素の一部は間引か
れるものの、副画素として画素をそのまま利用して形成
可能な光回折構造を提供できる。請求項６の発明によれ
ば、描画装置により型を製造する際に、露光ビームの型
面への入射角度をパターン間で変えることにより、回折
格子の溝が前記光回折構造層の表面となす角度が、各パ
ターン間で相違させることが効率よく行なえる光回折構
造の製造方法を提供することができる。請求項７の発明
によれば、請求項６の発明の効果に加え、ビーム露光時
に、回折格子の溝の巾、ピッチ、もしくは前記光回折構
造層の表面における角度等をパターンごとに変えるた
め、より変化に富んだ製品が得られる光回折構造の製造
方法を提供できる。請求項８の発明によれば、請求項６
または７の発明の効果に加え、デザインデータ記憶装
置、デザインデータの処理装置、光源・ステージ制御系
等からなる製造装置を使用して、パターンでデータを生
成させ、これに基づいて描画を行なうことにより型の製
造が効率的な光回折構造の製造方法を提供できる。請求
項９の発明によれば、回折格子画素を細分割した副画素
からなる単位副画素配列、もしくは隣接する前記回折格
子画素を副画素とする単位副画素配列を設定して、副画
素に各パターンの回折格子画素を配置するので、重複部
の処理が効率的で、しかも、重複部における各パターン
の欠損の少ない製品が得られる光回折構造の製造方法を
提供することができる。According to the first aspect of the present invention, the angle formed by the groove constituting the diffraction grating with the surface of the light diffraction structure layer differs among the plurality of diffraction grating patterns. Therefore, it is possible to provide an optical diffraction structure that has an effect of changing a pattern viewed depending on a viewing angle and that is more difficult to analyze than a conventional one. According to the invention of claim 2, in addition to the effect of the invention of claim 1,
Since a two-dimensional structure is added as a parameter of the light diffraction structure, a light diffraction structure having a further change in appearance can be provided. According to the third aspect of the present invention, since each diffraction grating pattern is composed of minute pixels, it is possible to provide a light diffraction structure suitable for manufacturing a mold using a drawing apparatus. According to the invention of claim 4, in addition to the effect of the invention of claim 3, in the overlapping portion of the patterns, for each sub-pixel of the unit sub-pixel array in which the pixels are further subdivided,
Since the diffraction grating pixels that constitute the different diffraction grating patterns are arranged, it is possible to provide a light diffraction structure in which the pattern seen according to the viewing angle changes without damaging each of the plurality of patterns. According to the invention of claim 5, in addition to the effect of the invention of claim 3, the unit sub-pixel arrangement in which the adjacent diffraction grating pixels are sub-pixels is different for each sub-pixel in the overlapping portion of the patterns. Since the diffraction grating pixels constituting the diffraction grating pattern are arranged, it is possible to provide an optical diffraction structure that can be formed by using the pixels as sub-pixels as they are, although some of the pixels are thinned out. According to the sixth aspect of the present invention, when the mold is manufactured by the drawing apparatus, the groove of the diffraction grating forms the surface of the light diffraction structure layer by changing the incident angle of the exposure beam on the mold surface between the patterns. It is possible to provide a method of manufacturing an optical diffraction structure in which the angle can be made to differ between patterns efficiently. According to the invention of claim 7, in addition to the effect of the invention of claim 6, at the time of beam exposure, the width and pitch of the groove of the diffraction grating or the angle at the surface of the light diffraction structure layer are changed for each pattern. It is possible to provide a method of manufacturing an optical diffraction structure that can provide a more varied product. According to the invention of claim 8, claim 6
Or, in addition to the effects of the seventh aspect, using a manufacturing apparatus including a design data storage device, a design data processing device, a light source / stage control system, and the like to generate data in a pattern and perform drawing based on the data. Accordingly, it is possible to provide a method for manufacturing a light diffraction structure in which the manufacture of a mold is efficient. According to the ninth aspect of the present invention, a unit subpixel array including subpixels obtained by subdividing a diffraction grating pixel or a unit subpixel array including adjacent diffraction grating pixels as subpixels is set. Since the diffraction grating pixels of the pattern are arranged, it is possible to provide a method of manufacturing an optical diffraction structure in which the processing of the overlapping portion is efficient, and a product with few defects in each pattern in the overlapping portion is obtained.
【図１】本発明の光回折構造（ホログラムシール）の適
用例を示す図である。FIG. 1 is a diagram showing an application example of a light diffraction structure (hologram seal) of the present invention.
【図２】光回折構造を製造する型の製造方法を示す図で
ある。FIG. 2 is a diagram illustrating a method of manufacturing a mold for manufacturing an optical diffraction structure.
【図３】回折格子画素パターンの例を示す図である。FIG. 3 is a diagram showing an example of a diffraction grating pixel pattern.
【図４】パターンの重複を説明する図である。FIG. 4 is a diagram illustrating overlapping of patterns.
【図５】単位副画素配列を示す図である。FIG. 5 is a diagram showing a unit sub-pixel array.
【図６】パターンの重複部の処理例を示す図である。FIG. 6 is a diagram illustrating a processing example of a pattern overlapping portion;
１ カード ２ カード基材 ３ 光回折構造（ホログラムシール） ４ 溝 ５ ステージ ６ 光源（６ａ；ビーム） DESCRIPTION OF SYMBOLS 1 Card 2 Card base material 3 Optical diffraction structure (hologram seal) 4 Groove 5 Stage 6 Light source (6a; beam)
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） // Ｂ４２Ｄ 15/10 ５０１ Ｂ４２Ｄ 15/10 ５０１Ｇ ５３１ ５３１Ｂ ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) // B42D 15/10 501 B42D 15/10 501G 531 531B
Claims (9)
の群として形成された回折格子が輪郭された複数の回折
格子パターンを有しており、前記回折格子パターンの前
記溝が前記光回折構造層の表面となす角度が、前記各回
折格子パターン間で相違することを特徴とする光回折構
造。1. A surface of a light diffraction structure layer has a plurality of diffraction grating patterns in which a diffraction grating formed as a group of a large number of fine grooves is contoured, and the grooves of the diffraction grating pattern are An optical diffraction structure, wherein an angle formed with the surface of the optical diffraction structure layer differs between the respective diffraction grating patterns.
前記溝の巾、ピッチ、もしくは前記光回折構造層の表面
における角度の各パラメータのうちの少なくともいずれ
かが相違することを特徴とする請求項１記載の光回折構
造。2. The method according to claim 1, further comprising:
2. The light diffraction structure according to claim 1, wherein at least one of parameters of a width and a pitch of the groove or an angle at a surface of the light diffraction structure layer is different.
所定の微小形状に輪郭された領域からなる回折格子画素
の集合体からなることを特徴とする請求項１または２記
載の光回折構造。3. The optical diffraction structure according to claim 1, wherein each of the diffraction grating patterns is formed by a set of diffraction grating pixels each including a region where the diffraction grating is contoured in a predetermined minute shape.
前記回折格子画素どうしが重複する個所において、前記
回折格子画素が、その細分化された副画素からなる単位
副画素配列の前記副画素ごとに、異なる前記回折格子パ
ターンを構成する前記回折格子画素の回折格子が配置さ
れていることを特徴とする請求項３記載の光回折構造。4. At a place where the diffraction grating pixels constituting the different diffraction grating patterns overlap each other, the diffraction grating pixel is provided for each of the sub-pixels in a unit sub-pixel array composed of subdivided sub-pixels. 4. The optical diffraction structure according to claim 3, wherein diffraction gratings of the diffraction grating pixels constituting different diffraction grating patterns are arranged.
前記回折格子画素どうしが重複する個所において、隣接
する前記回折格子画素どうしを副画素とする単位副画素
配列の前記副画素ごとに、異なる前記回折格子パターン
を構成する前記回折格子画素が配置されていることを特
徴とする請求項３記載の光回折構造。5. A different diffraction grating for each of the sub-pixels in a unit sub-pixel array in which adjacent diffraction grating pixels constitute sub-pixels at positions where the diffraction grating pixels constituting the different diffraction grating patterns overlap. The light diffraction structure according to claim 3, wherein the diffraction grating pixels forming a grating pattern are arranged.
の表面に、前記パターンごとに、前記溝が前記型形成用
基板の光回折構造層の表面となす角度を変えたビーム露
光による描画を行なうことにより、回折格子の多数の微
細な溝を形成して型を製造し、得られた前記型を使用し
て樹脂材表面に、前記型の型面形状を転移させることか
らなる光回折構造の製造方法。6. A pattern is prepared by preparing a plurality of patterns, and writing on the surface of the mold forming substrate by beam exposure in which the angle formed by the groove with the surface of the light diffraction structure layer of the mold forming substrate is changed for each pattern. By forming a large number of fine grooves of the diffraction grating to produce a mold, and using the obtained mold, transferring the mold surface shape of the mold to a resin material surface. The method of manufacturing the structure.
前記パターンごとに、前記溝の巾、ピッチ、もしくは前
記光回折構造層の表面における角度のうちの少なくとも
いずれかを相違させることを特徴とする請求項６記載の
光回折構造の製造方法。7. When the beam exposure is performed,
7. The method according to claim 6, wherein at least one of the width and the pitch of the groove or the angle at the surface of the light diffraction structure layer is different for each pattern.
および角度の線を所定の輪郭内に配置した回折格子画素
を複数準備した後、前記各パターン内に、前記回折格子
画素を選択して配置し、回折格子パターンデータを作成
すること、および前記のパターンごとに、溝が前記型形
成用基板の光回折構造層の表面となす角度を設定するこ
ととを行なった後、前記回折格子パターンデータに基づ
いて前記描画を行なうための描画用データを作成し、前
記の溝が前記型形成用基板の表面となす角度ごとに、前
記描画を行なうことを特徴とする請求項６または７記載
の光回折構造の製造方法。8. A predetermined line width and pitch corresponding to the groove,
After preparing a plurality of diffraction grating pixels in which the lines of the angle and the angle are arranged within a predetermined contour, in each of the patterns, selectively arranging the diffraction grating pixels, creating diffraction grating pattern data, and Setting the angle that the groove makes with the surface of the light diffraction structure layer of the mold forming substrate for each pattern, and then forming drawing data for performing the drawing based on the diffraction grating pattern data. 8. The method for manufacturing an optical diffraction structure according to claim 6, wherein the writing is performed at each angle formed by the groove and the surface of the mold forming substrate.
域において、前記回折格子画素を細分割した副画素から
なる単位副画素配列、もしくは隣接する前記回折格子画
素を副画素とする単位副画素配列を設定すると共に、前
記単位副画素配列中のいずれの前記副画素に、いずれの
前記パターンに対応付けられるべき前記回折格子画素を
配列すべきかのルールを前以って決めておき、前記ルー
ルに基づいて、前記副画素ごとに前記各回折格子画素を
配置することを特徴とする請求項８記載の光回折構造の
製造方法。9. A unit subpixel array including subpixels obtained by subdividing the diffraction grating pixels or a unit subpixel array including adjacent diffraction grating pixels as subpixels, at least in an area where the patterns overlap. In addition, a rule as to which of the sub-pixels in the unit sub-pixel array should be arranged with the diffraction grating pixel to be associated with any of the patterns is determined in advance, and based on the rule. 9. The method according to claim 8, wherein the diffraction grating pixels are arranged for each of the sub-pixels.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004126326A (en) * | 2002-10-04 | 2004-04-22 | Toppan Printing Co Ltd | Diffraction grating array having blazed diffraction grating pattern |
| JP2007521165A (en) * | 2003-07-08 | 2007-08-02 | ダウ グローバル テクノロジーズ インコーポレーテッド | Surface marking method for molded products |
| JP2013020239A (en) * | 2011-06-16 | 2013-01-31 | Dainippon Printing Co Ltd | Diffraction grating recording medium |
| JP2013101302A (en) * | 2011-10-12 | 2013-05-23 | Dainippon Printing Co Ltd | Diffraction grating recording medium |
| CN106019434A (en) * | 2016-07-27 | 2016-10-12 | 京东方科技集团股份有限公司 | Optical film and manufacturing method thereof and display device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000100758A (en) * | 1998-09-18 | 2000-04-07 | Canon Inc | Electron-beam lithography apparatus and pattern formation |
| JP2000304912A (en) * | 1999-04-22 | 2000-11-02 | Toppan Printing Co Ltd | Diffraction grating pattern |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE98795T1 (en) * | 1988-09-30 | 1994-01-15 | Landis & Gyr Business Support | DIFFRACTION ELEMENT. |
| JP2745902B2 (en) * | 1991-01-29 | 1998-04-28 | 凸版印刷株式会社 | Display with diffraction grating pattern |
| JP3383004B2 (en) * | 1993-05-27 | 2003-03-04 | 大日本印刷株式会社 | Method and apparatus for producing hologram recording medium |
| JPH08146209A (en) * | 1994-11-16 | 1996-06-07 | Olympus Optical Co Ltd | Production of curved surface grating |
| JPH103002A (en) * | 1996-06-14 | 1998-01-06 | Nikon Corp | Method for manufacturing blaze diffraction optical element, and device therefor |
| JPH10206621A (en) * | 1997-01-22 | 1998-08-07 | Toshiba Corp | Manufacture of holographic optical element |
-
2001
- 2001-03-14 JP JP2001071756A patent/JP4498629B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000100758A (en) * | 1998-09-18 | 2000-04-07 | Canon Inc | Electron-beam lithography apparatus and pattern formation |
| JP2000304912A (en) * | 1999-04-22 | 2000-11-02 | Toppan Printing Co Ltd | Diffraction grating pattern |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004126326A (en) * | 2002-10-04 | 2004-04-22 | Toppan Printing Co Ltd | Diffraction grating array having blazed diffraction grating pattern |
| JP2007521165A (en) * | 2003-07-08 | 2007-08-02 | ダウ グローバル テクノロジーズ インコーポレーテッド | Surface marking method for molded products |
| JP2013020239A (en) * | 2011-06-16 | 2013-01-31 | Dainippon Printing Co Ltd | Diffraction grating recording medium |
| JP2013101302A (en) * | 2011-10-12 | 2013-05-23 | Dainippon Printing Co Ltd | Diffraction grating recording medium |
| CN106019434A (en) * | 2016-07-27 | 2016-10-12 | 京东方科技集团股份有限公司 | Optical film and manufacturing method thereof and display device |
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