JP2002267369A - Heat treatment method for sheet-form substrate and furnace tool used therein - Google Patents
Heat treatment method for sheet-form substrate and furnace tool used thereinInfo
- Publication number
- JP2002267369A JP2002267369A JP2001068903A JP2001068903A JP2002267369A JP 2002267369 A JP2002267369 A JP 2002267369A JP 2001068903 A JP2001068903 A JP 2001068903A JP 2001068903 A JP2001068903 A JP 2001068903A JP 2002267369 A JP2002267369 A JP 2002267369A
- Authority
- JP
- Japan
- Prior art keywords
- heat treatment
- furnace
- substrates
- thin plate
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Furnace Charging Or Discharging (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Photovoltaic Devices (AREA)
- Tunnel Furnaces (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】 本発明は、太陽電池基板等
の薄板状基板の熱処理方法とそれに用いる窯道具に関す
る。The present invention relates to a method for heat-treating a thin substrate such as a solar cell substrate and a kiln tool used for the method.
【０００２】[0002]
【従来の技術】 太陽電池基板の製造には、一辺の長さ
が１００〜１５０ｍｍ程度の矩形のシリコンウエハー
に、ＡｌペーストとＡｇペーストで所定のパターンを印
刷した後、熱処理を行う工程がある。従来、この熱処理
工程は、メッシュベルトコンベアを搬送手段として有す
る熱処理炉を用い、図３に示すように、メッシュベルト
１１上にワイヤ等で支持体１３を形成し、当該支持体１
３にて太陽電池基板１が床面と平行になるように支持
し、炉内を連続的又は間欠的に移動させながら所定温度
（約８００℃）で加熱することにより行われる。2. Description of the Related Art In manufacturing a solar cell substrate, there is a step of printing a predetermined pattern with an Al paste and an Ag paste on a rectangular silicon wafer having a side length of about 100 to 150 mm, and then performing a heat treatment. Conventionally, this heat treatment step uses a heat treatment furnace having a mesh belt conveyor as a conveying means, and forms a support 13 with a wire or the like on a mesh belt 11 as shown in FIG.
The process is performed by supporting the solar cell substrate 1 in parallel with the floor surface at 3 and heating the furnace at a predetermined temperature (about 800 ° C.) while moving the furnace continuously or intermittently.
【０００３】[0003]
【発明が解決しようとする課題】 しかしながら、前記
のように太陽電池基板を炉の床面と平行に支持して熱処
理を行う方法では、炉内において太陽電池基板１枚１枚
の占有する面積が大きいため、炉の設置面積当たりの生
産性が低いという問題があった。また、熱処理時間を短
縮するため、昇温及び冷却の速度をできるだけ速くした
いが、メッシュベルトの熱容量が大きいため、急昇温・
急冷却が困難であった。更に、メッシュベルトが設けら
れた炉の幅方向中央部が、炉壁近傍部に比して大きな熱
容量を有するため、当該中央部付近の昇温・冷却が遅
れ、熱処理にムラが生じやすいという問題もあった。However, in the method of performing the heat treatment while supporting the solar cell substrate in parallel with the floor of the furnace as described above, the area occupied by each solar cell substrate in the furnace is limited. Due to the large size, there was a problem that productivity per installation area of the furnace was low. In order to shorten the heat treatment time, it is desirable to increase the temperature rising and cooling speed as much as possible. However, since the heat capacity of the mesh belt is large,
Rapid cooling was difficult. Furthermore, since the central part in the width direction of the furnace provided with the mesh belt has a larger heat capacity than the part near the furnace wall, the temperature rise and cooling near the central part are delayed, and the heat treatment tends to be uneven. There was also.
【０００４】 本発明は、このような従来の事情に鑑み
てなされたものであり、その目的とするところは、太陽
電池基板等の薄板状基板の熱処理における炉の設置面積
当たりの生産性を向上することができるとともに、メッ
シュベルトのような熱容量の大きな搬送手段を使用しな
い熱処理炉でも実施可能な熱処理方法を提供することに
ある。The present invention has been made in view of such conventional circumstances, and has as its object to improve productivity per furnace installation area in heat treatment of a thin plate substrate such as a solar cell substrate. It is another object of the present invention to provide a heat treatment method that can be performed in a heat treatment furnace that does not use a conveying means having a large heat capacity such as a mesh belt.
【０００５】[0005]
【課題を解決するための手段】 本発明によれば、炉内
上部に加熱手段を備えた輻射加熱式の熱処理炉にて薄板
状基板を熱処理する方法であって、薄板状基板を２枚１
組とし、各組の２枚の薄板状基板が互いに向き合い、上
部が開き下部が閉じた谷型の状態となるように支持し、
炉内に収容して熱処理を行うことを特徴とする薄板状基
板の熱処理方法、が提供される。According to the present invention, there is provided a method for heat-treating a sheet-like substrate in a radiation heating type heat-treating furnace provided with a heating means in an upper part of the furnace.
A set of two thin plate-like substrates facing each other, and supporting such that a valley-shaped state in which an upper portion is open and a lower portion is closed,
There is provided a heat treatment method for a thin plate-shaped substrate, wherein the heat treatment is performed in a furnace.
【０００６】 また、本発明によれば、２枚１組の薄板
状基板を少なくとも１組支持できる窯道具であって、各
組の２枚の薄板状基板が互いに向き合い、上部が開き下
部が閉じた谷型の状態となるように支持できることを特
徴とする窯道具、が提供される。Further, according to the present invention, there is provided a kiln tool capable of supporting at least one set of two thin plate-like substrates, wherein the two thin plate-like substrates of each set face each other, the upper part is open and the lower part is closed. A kiln tool is provided, which can be supported in a trough-shaped state.
【０００７】[0007]
【発明の実施の形態】 本発明の熱処理方法は、炉内上
部に加熱手段を備えた輻射加熱式の熱処理炉を用い、処
理対象である太陽電池基板等の薄板状基板を２枚１組と
して、各組の２枚の薄板状基板が互いに向き合い、上部
が開き下部が閉じた谷型（Ｖ字型）の状態となるように
支持し、炉内に収容して熱処理を行うものである。BEST MODE FOR CARRYING OUT THE INVENTION The heat treatment method of the present invention uses a radiation heating type heat treatment furnace provided with a heating means in the upper part of the furnace, and sets a pair of thin plate-like substrates such as solar cell substrates to be treated. The two thin plate-shaped substrates of each set face each other, are supported so as to be in a valley (V-shaped) state in which the upper part is open and the lower part is closed, and are accommodated in a furnace for heat treatment.
【０００８】 このように、薄板状基板を谷型の状態で
炉内に収容すると、従来のように炉の床面に平行に支持
して収容した場合に比して、基板１枚当たりの占有する
面積が小さくなるので、同面積により多くの薄板状基板
を収容することが可能となり、炉の設置面積当たりの生
産性が向上する。As described above, when the thin plate-shaped substrate is accommodated in the furnace in a valley-shaped state, the occupancy per substrate is larger than in the conventional case where the thin substrate is supported and accommodated in parallel with the floor of the furnace. Since the area to be reduced becomes smaller, more thin plate-shaped substrates can be accommodated in the same area, and the productivity per installation area of the furnace is improved.
【０００９】 ところで、炉内上部（炉天井）に設けた
加熱手段からの輻射熱を利用した熱処理炉においては、
一般に加熱手段に近い部分の方が加熱されやすいが、太
陽電池基板のような薄板状基板の輻射熱の吸収率は１０
０％ではないので、図１のように、２枚１組の薄板状基
板１ａ、１ｂを谷型状態に向かい合わせておけば、矢印
で示すように、一方の薄板状基板に当たって吸収されず
に反射した輻射熱が、向かい合う他方の薄板状基板の下
部に当たるので、加熱手段からの距離の差が緩和され
る。By the way, in a heat treatment furnace using radiant heat from a heating means provided in an upper part (furnace ceiling) in a furnace,
Generally, the portion closer to the heating means is easier to heat, but the radiant heat absorptivity of a thin plate substrate such as a solar cell substrate is 10%.
Since it is not 0%, as shown in FIG. 1, if a pair of thin-plate substrates 1a and 1b face each other in a valley-shaped state, as shown by an arrow, they are not absorbed by being hit by one of the thin-plate substrates. The reflected radiant heat impinges on the lower part of the other facing thin plate-shaped substrate, so that the difference in distance from the heating means is reduced.
【００１０】 なお、図１の（ａ）は２枚の薄板状基板
１ａ、１ｂのなす角度が９０゜の場合、（ｂ）は２枚の
薄板状基板１ａ、１ｂのなす角度が６０゜の場合、
（ｃ）は２枚の薄板状基板１ａ、１ｂのなす角度が３５
゜の場合である。各組の２枚の薄板状基板の下部のなす
角度は９０゜以下であることが好ましく、６０゜以下で
あると更に好ましい。当該角度が９０゜を超えると、基
板１枚当たりの占有する面積が大きくなるとともに、一
方の薄板状基板から反射した輻射熱が他方の薄板状基板
の下部に当たりにくくなる。FIG. 1A shows a case where the angle between the two thin substrates 1a and 1b is 90 °, and FIG. 1B shows a case where the angle between the two thin substrates 1a and 1b is 60 °. If
(C) shows that the angle between the two thin plate-like substrates 1a and 1b is 35.
This is the case of ゜. The angle formed by the lower portions of the two thin plate substrates in each set is preferably 90 ° or less, and more preferably 60 ° or less. If the angle exceeds 90 °, the area occupied by one substrate increases, and the radiant heat reflected from one of the thin-plate substrates hardly hits the lower part of the other thin-plate substrate.
【００１１】 ２枚の薄板状基板１ａ、１ｂのなす角度
が６０゜の場合には、同じ薄板状基板を炉の床面と平行
に支持した場合の基板１枚分の占有面積に、丁度２枚の
基板を収容するすることができ、炉の設置面積当たりの
生産性は２倍となる。なお、炉に収容する薄板状基板の
枚数が２倍になると、熱処理時に基板自体の加熱に要す
る熱量も２倍になるが、熱処理炉全体としての熱効率は
６０〜７０％程度であり、後述する窯道具による熱量の
損失を考慮しても、従来に比べて１０〜１５％程度の省
エネ効果が期待できる。更に、使用する熱処理炉を従来
のメッシュベルトコンベア式のものからローラーハース
炉のような搬送手段の熱容量が小さい熱処理炉に代える
ことにより、５０％程度の大幅な省エネも可能になる。If the angle between the two thin substrates 1a and 1b is 60 °, the area occupied by one substrate when the same thin substrate is supported in parallel with the floor of the furnace is just 2 One substrate can be accommodated, and productivity per installation area of the furnace is doubled. In addition, when the number of thin plate-shaped substrates accommodated in the furnace is doubled, the amount of heat required for heating the substrate itself during the heat treatment also doubles, but the thermal efficiency of the entire heat treatment furnace is about 60 to 70%, which will be described later. Even if the heat loss due to the kiln tools is considered, an energy saving effect of about 10 to 15% can be expected as compared with the conventional case. Further, by changing the heat treatment furnace to be used from a conventional mesh belt conveyor type heat treatment furnace such as a roller hearth furnace having a small heat capacity of a conveying means, a large energy saving of about 50% can be achieved.
【００１２】 ２枚１組の基板を谷型の状態に支持する
のには、専用の窯道具を使用することが好ましい。この
窯道具は、２枚１組の薄板状基板を少なくとも１組支持
できる窯道具であって、各組の２枚の薄板状基板が互い
に向き合い、上部が開き下部が閉じた谷型の状態となる
ように支持できるものである。In order to support the pair of substrates in a valley shape, it is preferable to use a dedicated kiln tool. This kiln tool is a kiln tool capable of supporting at least one set of two thin plate-shaped substrates, and each set of two thin plate-shaped substrates faces each other, and has a valley shape in which an upper portion is opened and a lower portion is closed. It can be supported as it is.
【００１３】 図２はそのような窯道具の一例を示す側
面概要図で、この窯道具３は、複数の谷型の支持部を持
ち、それぞれの支持部の斜面に沿って薄板状基板を載置
することにより、２枚１組の薄板状基板１ａ、１ｂを前
記のような谷型の状態に支持することができる。なお、
前述のような理由で、この窯道具３は、２枚の薄板状基
板１ａ、１ｂの下部のなす角度が９０゜以下となるよう
に支持できるものであることが好ましく、６０゜以下と
なるように支持できるものであれば更に好ましい。FIG. 2 is a schematic side view showing an example of such a kiln tool. This kiln tool 3 has a plurality of valley-shaped support portions, and mounts a thin plate-like substrate along the slope of each support portion. By placing them, a pair of thin plate-like substrates 1a and 1b can be supported in a valley-like state as described above. In addition,
For the above-mentioned reason, it is preferable that the kiln tool 3 can be supported so that the angle formed by the lower portions of the two thin plate-shaped substrates 1a and 1b is 90 ° or less, and is 60 ° or less. It is more preferable that the support can be made.
【００１４】 このような窯道具を使用して本発明の熱
処理方法を実施する場合は、従来のメッシュベルトを搬
送手段に用いた熱処理炉に代えて、例えばローラーハー
ス炉のような、より熱容量の小さな搬送手段を用いた熱
処理炉が使用できる。このような熱容量の小さな搬送手
段を用いた熱処理炉を用いれば、急昇温・急冷却が容易
になり、熱処理時間を短縮することができる。また、炉
内における熱容量のバラツキが小さくなり、熱処理のム
ラが生じにくくなる。When the heat treatment method of the present invention is carried out using such a kiln tool, a heat treatment furnace using a conventional mesh belt as a conveying means is replaced with a heat treatment furnace having a higher heat capacity such as a roller hearth furnace. A heat treatment furnace using small transfer means can be used. If a heat treatment furnace using such a transfer means having a small heat capacity is used, rapid temperature rise and rapid cooling become easy, and the heat treatment time can be shortened. In addition, variations in heat capacity in the furnace are reduced, and unevenness in heat treatment is less likely to occur.
【００１５】[0015]
【実施例】 以下、本発明を実施例に基づいて更に詳細
に説明するが、本発明はこれらの実施例に限定されるも
のではない。EXAMPLES Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to these examples.
【００１６】 ほぼ同等の設置面積を有するメッシュベ
ルトコンベア式の熱処理炉とローラーハース炉とを用
い、従来の方法と本発明の方法とにより太陽電池基板の
熱処理を実施した。従来の方法による熱処理は、メッシ
ュベルトコンベア式の熱処理炉を使用し、合計１００枚
の太陽電池基板を、図３に示すようにメッシュベルト１
１上にワイヤで形成した支持体１３にて太陽電池基板１
が床面と平行になるように支持して行った。また、本発
明の方法による熱処理は、ローラーハース炉を使用し、
搬送手段であるローラー上に平板状のセッターを敷き、
そのセッター上で図２のような窯道具３を用いて、合計
１００組２００枚の太陽電池基板を各組の２枚の太陽電
池基板１ａ、１ｂの下部のなす角が６０゜となるよう谷
型の状態に支持して行った。Using a heat treatment furnace of a mesh belt conveyor type and a roller hearth furnace having substantially the same installation area, heat treatment of the solar cell substrate was performed by the conventional method and the method of the present invention. In the heat treatment by the conventional method, a heat treatment furnace of a mesh belt conveyor type is used, and a total of 100 solar cell substrates are placed on the mesh belt 1 as shown in FIG.
The solar cell substrate 1 is formed on a support 13 formed of a wire on the solar cell substrate 1.
Was supported so as to be parallel to the floor surface. The heat treatment according to the method of the present invention uses a roller hearth furnace,
Lay a flat setter on the roller that is the transport means,
Using the kiln tool 3 as shown in FIG. 2 on the setter, a valley is formed so that the angle formed by the lower part of the two solar cell substrates 1a and 1b of each group is 100 °. The test was performed while supporting the state of the mold.
【００１７】 これらの熱処理方法における熱使用量は
表１に示すとおりであった。本発明の方法では、従来方
法の２倍の枚数の太陽電池基板を処理したため、太陽電
池基板自体の加熱に要する熱量は２倍必要になるが、各
々の搬送手段であるメッシュベルトとローラーとの熱容
量差等のため、熱処理炉全体としての合計熱使用量は同
等で、基板１枚当たりの処理に要した熱使用量としては
本発明方法が従来方法の１／２となり、５０％の省エネ
を達成することができた。The amounts of heat used in these heat treatment methods were as shown in Table 1. In the method of the present invention, since twice as many solar cell substrates as in the conventional method are processed, the amount of heat required for heating the solar cell substrate itself is doubled. Due to the difference in heat capacity, the total amount of heat used in the entire heat treatment furnace is the same, and the amount of heat required for processing per substrate is half that of the method of the present invention compared to the conventional method. Could be achieved.
【００１８】[0018]
【表１】 [Table 1]
【００１９】[0019]
【発明の効果】 以上説明したように、本発明によれ
ば、従来のように薄板状基板を炉の床面に平行に支持し
て収容した場合に比して、基板１枚当たりの占有する面
積が小さくなるので、炉の設置面積当たりの生産性が向
上する。また、従来のメッシュベルトを搬送手段に用い
た熱処理炉に代えて、ローラーハース炉のような、より
熱容量の小さな搬送手段を用いた熱処理炉が使用できる
ので、急昇温・急冷却が容易になり、熱処理時間を短縮
することが可能となる。更に、炉内における熱容量のバ
ラツキが小さくなり、熱処理のムラが生じにくくなる。
更にまた、基板１枚当たりの処理に要する熱使用量が低
下するので、省エネ効果が期待できる。As described above, according to the present invention, one thin substrate is occupied per substrate as compared with the conventional case where a thin plate is supported and accommodated in parallel with the floor of a furnace. Since the area is reduced, productivity per installation area of the furnace is improved. In addition, instead of a conventional heat treatment furnace using a mesh belt as a conveyance means, a heat treatment furnace using a conveyance means having a smaller heat capacity, such as a roller hearth furnace, can be used. Thus, the heat treatment time can be shortened. Further, the variation in the heat capacity in the furnace is reduced, and unevenness of the heat treatment is less likely to occur.
Furthermore, since the amount of heat used for processing per substrate is reduced, an energy saving effect can be expected.
【図１】 本発明における２枚１組の薄板状基板の支持
状態と輻射熱の反射方向を示す説明図で、（ａ）は２枚
の基板のなす角度が９０゜の場合、（ｂ）は２枚の基板
のなす角度が６０゜の場合、（ｃ）は２枚の基板のなす
角度が３５゜の場合である。FIGS. 1A and 1B are explanatory diagrams showing a supporting state of a pair of thin plate-shaped substrates and a reflection direction of radiant heat in the present invention, wherein FIG. 1A shows a case where an angle between two substrates is 90 °, and FIG. In the case where the angle between the two substrates is 60 °, (c) is the case where the angle between the two substrates is 35 °.
【図２】 本発明の熱処理方法に使用する窯道具の一例
を示す側面概要図である。FIG. 2 is a schematic side view showing an example of a kiln tool used in the heat treatment method of the present invention.
【図３】 従来の熱処理方法を示す説明図である。FIG. 3 is an explanatory view showing a conventional heat treatment method.
１…薄板状基板（太陽電池基板）、１ａ…薄板状基板
（太陽電池基板）、１ｂ…薄板状基板（太陽電池基
板）、３…窯道具、１１…メッシュベルト、１３…支持
体。DESCRIPTION OF SYMBOLS 1 ... Thin board (solar cell board), 1a ... Thin board (solar cell board), 1b ... Thin board (solar cell board), 3 ... Kiln tool, 11 ... Mesh belt, 13 ... Support.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｈ０１Ｌ 21/68 Ｈ０１Ｌ 21/26 Ｅ 31/04 31/04 Ａ ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H01L 21/68 H01L 21/26 E 31/04 31/04 A
Claims (7)
の熱処理炉にて薄板状基板を熱処理する方法であって、 薄板状基板を２枚１組とし、各組の２枚の薄板状基板が
互いに向き合い、上部が開き下部が閉じた谷型の状態と
なるように支持し、炉内に収容して熱処理を行うことを
特徴とする薄板状基板の熱処理方法。1. A method for heat-treating a thin plate-like substrate in a radiation heating type heat-treating furnace provided with a heating means in an upper part of the furnace, comprising two sets of thin plate-like substrates, and two thin plates of each set. A heat treatment method for a thin plate-shaped substrate, comprising supporting a substrate in a valley-shaped state in which upper portions are open and lower portions are closed, and are housed in a furnace for heat treatment.
が９０゜以下である請求項１記載の熱処理方法。2. The heat treatment method according to claim 1, wherein an angle formed by a lower portion of the two thin plate-like substrates is 90 ° or less.
が６０゜以下である請求項１記載の熱処理方法。3. The heat treatment method according to claim 1, wherein an angle formed by a lower portion of the two thin plate-shaped substrates is 60 ° or less.
請求項１記載の熱処理方法。4. The heat treatment method according to claim 1, wherein the heat treatment furnace is a roller hearth furnace.
支持できる窯道具であって、 各組の２枚の薄板状基板が互いに向き合い、上部が開き
下部が閉じた谷型の状態となるように支持できることを
特徴とする窯道具。5. A kiln tool capable of supporting at least one pair of two thin plate-shaped substrates, wherein each set of two thin plate-shaped substrates faces each other, and has a valley shape in which an upper portion is opened and a lower portion is closed. A kiln tool that can be supported as it is.
が９０゜以下となるように支持できる請求項５記載の窯
道具。6. The kiln tool according to claim 5, wherein said two thin plate-shaped substrates can be supported such that an angle formed by a lower portion thereof is 90 ° or less.
が６０゜以下となるように支持できる請求項５記載の窯
道具。7. The kiln tool according to claim 5, wherein the kiln tool can be supported such that an angle formed by a lower portion of the two thin plate substrates is 60 ° or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001068903A JP2002267369A (en) | 2001-03-12 | 2001-03-12 | Heat treatment method for sheet-form substrate and furnace tool used therein |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001068903A JP2002267369A (en) | 2001-03-12 | 2001-03-12 | Heat treatment method for sheet-form substrate and furnace tool used therein |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002267369A true JP2002267369A (en) | 2002-09-18 |
Family
ID=18927015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001068903A Pending JP2002267369A (en) | 2001-03-12 | 2001-03-12 | Heat treatment method for sheet-form substrate and furnace tool used therein |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002267369A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008252079A (en) * | 2007-03-07 | 2008-10-16 | Semiconductor Energy Lab Co Ltd | Manufacturing method of semiconductor device and semiconductor manufacturing apparatus |
| CN102878803A (en) * | 2011-07-12 | 2013-01-16 | 浚鑫科技股份有限公司 | Sintering furnace and net belt |
-
2001
- 2001-03-12 JP JP2001068903A patent/JP2002267369A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008252079A (en) * | 2007-03-07 | 2008-10-16 | Semiconductor Energy Lab Co Ltd | Manufacturing method of semiconductor device and semiconductor manufacturing apparatus |
| CN102878803A (en) * | 2011-07-12 | 2013-01-16 | 浚鑫科技股份有限公司 | Sintering furnace and net belt |
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