JP2002251704A - Magnetic head, manufacturing method therefor and magnetic recording and reproducing device - Google Patents
Magnetic head, manufacturing method therefor and magnetic recording and reproducing deviceInfo
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- JP2002251704A JP2002251704A JP2001045698A JP2001045698A JP2002251704A JP 2002251704 A JP2002251704 A JP 2002251704A JP 2001045698 A JP2001045698 A JP 2001045698A JP 2001045698 A JP2001045698 A JP 2001045698A JP 2002251704 A JP2002251704 A JP 2002251704A
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- Prior art keywords
- magnetic head
- magnetic
- groove
- head according
- glass
- Prior art date
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、磁気ヘッドと磁気
媒体の接触状態を良好に保ち、特に磁気媒体として磁気
テープを使用する磁気記録装置とそれに用いる磁気ヘッ
ドを安定に低摩擦で接触させる磁気記録装置に関するも
のである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording device using a magnetic tape as a magnetic medium and a magnetic recording device for stably and low-frictionally contacting the magnetic head used in the magnetic recording device. It relates to a recording device.
【０００２】[0002]
【従来の技術】近年、ハイビジョンデジタルＶＴＲやス
トリーマ等の広帯域の信号を取り扱うシステムの開発が
盛んに行われており、磁気記録媒体もこのような大量の
情報を記録するために、従来の酸化鉄系から合金粉末媒
体や金属蒸着媒体等の高抗磁力媒体へと変わってきた。
そして磁気ヘッドとしても、これらの高抗磁力媒体に対
応できるような高飽和磁束密度を有し、５０ＭＨｚ以上
の高周波帯域での特性の優れた磁気ヘッドの開発が望ま
れてきた。そこで、このような要求に対応するため、図
１４に示すように、センダストやアモルファス磁性合
金、ＦｅＴａＮ等の金属磁性膜１４１の両側を非磁性基
板１４２で挟持した構造にして高周波特性を向上させた
磁気ヘッド、いわゆる積層型磁気ヘッド１４３が開発さ
れている。これを図１４に示す。また非磁性基板１４２
としてはチタン酸マグネシウム系やチタン酸カルシウム
系等のセラミックス材料が多く用いられている。2. Description of the Related Art In recent years, systems for handling wideband signals, such as high-vision digital VTRs and streamers, have been actively developed, and magnetic recording media also use conventional iron oxide to record such a large amount of information. The system has been changed to a high coercive force medium such as an alloy powder medium and a metal deposition medium.
As a magnetic head, it has been desired to develop a magnetic head having a high saturation magnetic flux density capable of coping with such a high coercive force medium and having excellent characteristics in a high frequency band of 50 MHz or more. Therefore, in order to respond to such a demand, as shown in FIG. 14, a high-frequency characteristic is improved by adopting a structure in which both sides of a metal magnetic film 141 such as Sendust, an amorphous magnetic alloy, and FeTaN are sandwiched between non-magnetic substrates 142. A magnetic head, a so-called stacked magnetic head 143, has been developed. This is shown in FIG. The non-magnetic substrate 142
Ceramic materials such as magnesium titanate and calcium titanate are often used.
【０００３】ＶＴＲやストリーマは小型化、高密度化、
高転送レートが進んでおり、それに伴って磁気ヘッドが
搭載されたドラム装置の小型化、高速回転化、高周波数
化、短波長化による記憶容量、転送速度の増加が模索さ
れている。従って、磁気ヘッドと磁気媒体テープとの接
触状態を安定に保つには安定した摩擦、低い摩耗、焼き
付き等が起こらないきれいな摺動面等を長時間保つこと
が重要になってきている。このため、ヘッド摺動面１４
６にＤＬＣ膜やポリテトラフルオロエチレン膜を設けて
トライボロジの改善を試みようとする動きはあるが、Ｖ
ＴＲやストリーマに用いる接触型の磁気ヘッドは摩耗が
数μｍに及ぶため、摺動面上にこれらの保護膜を残すこ
とが困難であった。また摺動面でない側面にポリテトラ
フルオロエチレン（デュポン社製の商品名”テフロ
ン”）等をコーティングする提案（例えば藤本、磁気ヘ
ッド装置、特開平４−１３４７６９号公報）もなされて
いるが、摺動する磁気ヘッド面の耐久性にはいまだに問
題がある。その理由は、”テフロン”自体は摩耗に弱い
からである。また、上記積層型磁気ヘッドやＭＩＧ型磁
気ヘッドは、摺動面１４６に金属磁性膜１４１が露出
し、金属磁性膜は摩擦抵抗が高くまた摩耗が基板１４２
に比べて大きい。摩擦の増加はヘッドテープ間の摩擦が
大きくなり、ブラウンステイン等と呼ばれる金属部への
焼き付き現象が起こり、再生出力の低下が起こる。ま
た、金属磁性膜１４１の摩耗が基板１４２お摩耗より大
きいと、リセスによる出力の低下、ヘッド寿命の低下等
が起こる。[0003] VTRs and streamers have become smaller and denser,
Higher transfer rates have been developed, and accordingly, it has been sought to increase the storage capacity and transfer speed by downsizing, high-speed rotation, higher frequency, and shorter wavelength of a drum device on which a magnetic head is mounted. Therefore, in order to stably maintain the contact state between the magnetic head and the magnetic medium tape, it is important to maintain stable friction, low wear, a clean sliding surface free from seizure, etc. for a long time. Therefore, the head sliding surface 14
There is a move to try to improve tribology by providing a DLC film or a polytetrafluoroethylene film in
Since the contact type magnetic head used for the TR and the streamer wears several μm, it is difficult to leave these protective films on the sliding surface. A proposal has also been made (for example, Fujimoto, magnetic head device, Japanese Patent Application Laid-Open No. 4-134767) to coat a side surface other than the sliding surface with polytetrafluoroethylene (trade name "Teflon" manufactured by DuPont) or the like. There is still a problem with the durability of the moving magnetic head surface. The reason is that "Teflon" itself is vulnerable to wear. Further, in the above-mentioned laminated magnetic head and MIG type magnetic head, the metal magnetic film 141 is exposed on the sliding surface 146, the metal magnetic film has a high frictional resistance, and the abrasion is reduced.
Larger than. As the friction increases, the friction between the head tapes increases, causing a burn-in phenomenon to a metal part called brown stain or the like, and a reduction in reproduction output. Further, if the wear of the metal magnetic film 141 is larger than the wear of the substrate 142, a reduction in output due to the recess, a reduction in the head life, and the like occur.
【０００４】[0004]
【発明が解決しようとする課題】本発明は、上記従来の
問題を解決するため、摩擦力の増加によるヘッドの焼き
付きの現象、金属磁性膜の摩耗の減少が可能な磁気ヘッ
ド及び磁気ヘッドの製造方法及び磁気記録再生装置を提
供することを目的とするものである。SUMMARY OF THE INVENTION The present invention solves the above-mentioned conventional problems by manufacturing a magnetic head and a magnetic head capable of reducing the seizure of the head due to an increase in frictional force and the abrasion of the metal magnetic film. It is an object of the present invention to provide a method and a magnetic recording / reproducing apparatus.
【０００５】[0005]
【課題を解決する手段】この目的を達成するため、本発
明の磁気ヘッドは、磁気媒体と相対運動することで磁気
記録再生を行う磁気ヘッドにおいて、磁気媒体と相対す
る磁気ヘッド摺動面に溝を形成し、前記溝内部に少なく
ともフッ素樹脂を充填したことを特徴とする。In order to achieve this object, a magnetic head according to the present invention is a magnetic head which performs magnetic recording and reproduction by moving relative to a magnetic medium. Is formed, and at least a fluorine resin is filled in the groove.
【０００６】次に本発明の磁気ヘッドの製造方法は、磁
気媒体と相対運動することで磁気記録再生を行う磁気ヘ
ッドの製造方法において、磁気媒体と相対磁気ヘッド摺
動面に溝を形成し、前記溝内部に多孔性物質または無機
粒子を充填し、前記多孔性物質または無機粒子間にフッ
素樹脂粒子の水ディスパージョン液を浸透させ、乾燥後
加熱焼結して多孔性物質孔内に固着させることを特徴と
する。Next, according to a method of manufacturing a magnetic head of the present invention, a groove is formed in a sliding surface of a magnetic medium and a relative magnetic head, wherein the groove is formed in a magnetic head for performing magnetic recording and reproduction by moving relative to a magnetic medium. The groove is filled with a porous substance or inorganic particles, a water dispersion liquid of fluororesin particles is infiltrated between the porous substance or the inorganic particles, dried, heated and sintered to be fixed in the porous substance pores. It is characterized by the following.
【０００７】次に本発明の磁気ヘッドの磁気記録再生装
置は、磁気ヘッドと磁気媒体により情報を記録再生する
形式の磁気記録再生装置において、前記磁気ヘッドが前
記本発明の磁気ヘッドであるか、または前記本発明方法
によって得られた磁気ヘッドであることを特徴とする。Next, a magnetic recording / reproducing apparatus for a magnetic head according to the present invention is a magnetic recording / reproducing apparatus for recording / reproducing information with a magnetic head and a magnetic medium, wherein the magnetic head is the magnetic head of the present invention, Alternatively, the magnetic head is obtained by the method of the present invention.
【０００８】[0008]
【発明の実施形態】本発明においては、使用できるフッ
素樹脂は、ポリテトラフルオロエチレン（ＰＴＦＥ）、
テトラフルオロエチレン−エチレン共重合体（ＰＥＴＦ
Ｅ）、テトラフルオロエチレン−パーフルオロアルキル
ビニルエーテル共重合体（ＰＦＡ）及びテトラフルオロ
エチレン−ヘキサフルオロプロピレン共重合体（ＰＦＥ
Ｐ）から選ばれる少なくとも一つの樹脂である。フッ素
樹脂の加熱焼結温度は、ポリテトラフルオロエチレン
（ＰＴＦＥ）の場合は３５０〜４００℃の範囲、テトラ
フルオロエチレン−エチレン共重合体（ＰＥＴＦＥ）の
場合は３００〜３５０℃の範囲、テトラフルオロエチレ
ン−パーフルオロアルキルビニルエーテル共重合体（Ｐ
ＦＡ）の場合は２５０〜３００℃の範囲、テトラフルオ
ロエチレン−ヘキサフルオロプロピレン共重合体（ＰＦ
ＥＰ）の場合は２５０〜３００℃の範囲である。BEST MODE FOR CARRYING OUT THE INVENTION In the present invention, usable fluororesins are polytetrafluoroethylene (PTFE),
Tetrafluoroethylene-ethylene copolymer (PETF
E), tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer (PFA) and tetrafluoroethylene-hexafluoropropylene copolymer (PFE)
At least one resin selected from P). The heating and sintering temperature of the fluororesin is in the range of 350 to 400 ° C. for polytetrafluoroethylene (PTFE), 300 to 350 ° C. for tetrafluoroethylene-ethylene copolymer (PETFE), and tetrafluoroethylene. -Perfluoroalkyl vinyl ether copolymer (P
FA) in the range of 250 to 300 ° C., tetrafluoroethylene-hexafluoropropylene copolymer (PF
In the case of EP), the temperature is in the range of 250 to 300 ° C.
【０００９】前記おいて、さらに好ましいフッ素樹脂
は、ポリテトラフルオロエチレン（ＰＴＦＥ）及びテト
ラフルオロエチレン−エチレン共重合体（ＰＥＴＦＥ）
から選ばれる少なくとも一つの樹脂である。In the above, more preferred fluororesins are polytetrafluoroethylene (PTFE) and tetrafluoroethylene-ethylene copolymer (PTFE).
At least one resin selected from the group consisting of:
【００１０】本発明においては、溝深さがギャップデプ
スより深いことが好ましい。具体的には、溝深さがギャ
ップデプスより１μｍ〜０．５ｍｍ深いことが好まし
い。In the present invention, it is preferable that the groove depth is deeper than the gap depth. Specifically, the groove depth is preferably 1 μm to 0.5 mm deeper than the gap depth.
【００１１】また本発明においては、フッ素樹脂が多孔
性物質内に保持されていることが好ましい。多孔性物質
としては多孔性ガラスが好ましい。In the present invention, it is preferable that the fluororesin is held in the porous material. As the porous substance, porous glass is preferable.
【００１２】また本発明においては、フッ素樹脂が、溝
内部に充填されたガラスの表面に形成したクラック内に
保持されていることが好ましい。In the present invention, it is preferable that the fluororesin is held in a crack formed on the surface of the glass filled in the groove.
【００１３】また本発明においては、フッ素樹脂が、溝
内部に充填された発泡性ガラスの空気泡内に保持されて
いることが好ましい。Further, in the present invention, it is preferable that the fluororesin is held in air bubbles of foamable glass filled in the groove.
【００１４】また本発明においては、フッ素樹脂が、溝
内部に充填されたガラスとの網目構造体に保持されてい
ることが好ましい。網目構造体は、グラファイトを含む
物質である。In the present invention, it is preferable that the fluororesin is held in a network structure with the glass filled in the groove. The network structure is a substance containing graphite.
【００１５】また本発明においては、フッ素樹脂が、細
孔を持つ酸化アルミニウム被膜の細孔に保持されていて
もよい。また、フッ素樹脂が、多孔性クロムメッキ膜の
孔内に保持されていてもよい。また、フッ素樹脂は、粒
子状のニッケル層の粒子間に粒子状で保持されていても
よい。また、フッ素樹脂が、多孔性セラミック膜の空孔
に保持されていてもよい。In the present invention, the fluororesin may be retained in the pores of the aluminum oxide film having pores. Further, the fluororesin may be held in the hole of the porous chromium plating film. Further, the fluororesin may be held in the form of particles between the particles of the nickel layer in the form of particles. Further, the fluororesin may be held in the pores of the porous ceramic film.
【００１６】また本発明においては、金属磁性膜が一対
の基板により挟み込まれてなる磁気コア半体を、その端
面同士が対向するように配置して磁気ギャップを形成し
た磁気ヘッドの磁気媒体と相対する基板上に溝を形成し
たことが好ましい。Further, in the present invention, a magnetic core half having a metal magnetic film sandwiched between a pair of substrates is disposed so that end faces thereof are opposed to each other, and is opposed to a magnetic medium of a magnetic head in which a magnetic gap is formed. Preferably, a groove is formed on the substrate to be formed.
【００１７】また、磁気媒体と相対し摺動する基板上と
磁気コア含むように、ヘッド走行方向に斜めに溝を形成
してもよい。また、ヘッド走行方向に斜めに溝を作製
し、この溝加工でギャップエッヂをトリミングしてギャ
ップ幅を規制してもよい。Also, a groove may be formed obliquely in the head running direction so as to include the magnetic core on the substrate that slides against the magnetic medium. Alternatively, a groove may be formed obliquely in the head running direction, and the gap width may be regulated by trimming the gap edge by the groove processing.
【００１８】本発明方法においては、多孔性物質が、ホ
ウケイ酸ガラスを溝内に充填し酸処理で空孔を作製した
多孔性ガラスであることが好ましい。In the method of the present invention, it is preferable that the porous material is a porous glass in which borosilicate glass is filled in a groove and pores are formed by an acid treatment.
【００１９】また多孔性物質が多孔性ガラスであり、多
孔性ガラスを溝内に圧入して組み込むこともできる。Further, the porous substance is porous glass, and the porous glass can be press-fitted into the groove and incorporated.
【００２０】また多孔性物質が、表面にクラックを作製
したガラスであり、溝にガラスを充填しガラス表面をＮ
ａ蒸気に暴露しクラックを形成したものでもよい。The porous substance is glass having cracks formed on the surface, the grooves are filled with glass, and the glass surface is filled with N.
a) Exposure to steam may form cracks.
【００２１】また多孔性物質が発泡性ガラスであり、溝
に発泡性ガラスを圧入してもよい。The porous substance may be foamed glass, and the foamed glass may be press-fitted into the groove.
【００２２】また、溝にフッ素樹脂と、少なくともガラ
ス粒子とを含む材料を流し込み、３００℃〜４００℃の
範囲の温度に加熱焼結して固着してもよい。Alternatively, a material containing a fluororesin and at least glass particles may be poured into the groove and heated and sintered at a temperature in the range of 300 ° C. to 400 ° C. for fixing.
【００２３】また、多孔性物質がアルミナ陽極酸化被膜
であり、上記溝に陽極酸化法による酸化アルミニウム被
膜を設けてもよい。The porous material may be an alumina anodic oxide film, and the groove may be provided with an aluminum oxide film by an anodic oxidation method.
【００２４】また、上記溝内に粒子状の無電解ニッケル
メッキ層を成長させ、さらに無電解ニッケルメッキ層上
に、フッ素樹脂粒子を吸着させ、３００℃〜４００℃の
範囲の温度に加熱し、無電解ニッケルメッキ粒子間に前
記フッ素樹脂を浸透かつ焼結させてもよい。In addition, a particulate electroless nickel plating layer is grown in the groove, and fluororesin particles are adsorbed on the electroless nickel plating layer, and heated to a temperature in the range of 300 ° C. to 400 ° C. The fluororesin may be permeated and sintered between the electroless nickel plated particles.
【００２５】以下、具体的実施の形態を説明する。Hereinafter, specific embodiments will be described.
【００２６】（実施の形態１）図１（ａ）は本発明の第
１の実施例の磁気ヘッドの構成を示す斜視図であり、図
１（ｂ）はその平面図である。また、図２（ａ）〜
（ｇ）は本発明の製造方法の１例を示す模式図である。
図３（ａ）は本発明に用いるポリテトラフルオロエチレ
ンの化学構造式で、ｍは重合度で一般的には平均10〜1
0,000である。図３（ｂ）はエチレンー４フッ化エチレ
ン共重合体の構造を示す構造式で、ａ，ｂは共重合比率
を示し、０＜ａ＜１００，０＜ｂ＜１００である。重合
度で一般的には平均10〜10,000である。図３（ｃ）はポ
リテトラフルオロエチレンを用いた場合の処理工程を示
す図である。図４（ａ）は本発明の別の実施例の磁気ヘ
ッドの構成を示す斜視図であり、図４（ｂ）はその平面
図である。(Embodiment 1) FIG. 1A is a perspective view showing a configuration of a magnetic head according to a first embodiment of the present invention, and FIG. 1B is a plan view thereof. In addition, FIG.
(G) is a schematic view showing one example of the production method of the present invention.
FIG. 3 (a) is a chemical structural formula of polytetrafluoroethylene used in the present invention, where m is a degree of polymerization and generally 10 to 1 on average.
It is 0,000. FIG. 3B is a structural formula showing the structure of the ethylene-tetrafluoroethylene copolymer, wherein a and b indicate the copolymerization ratio, and 0 <a <100 and 0 <b <100. The degree of polymerization is generally 10 to 10,000 on average. FIG. 3C is a diagram showing a processing step when polytetrafluoroethylene is used. FIG. 4A is a perspective view showing a configuration of a magnetic head according to another embodiment of the present invention, and FIG. 4B is a plan view thereof.
【００２７】本実施例では、磁気コアである金属磁性膜
１１にはアモルファス磁性合金のＣｏＮｂＺｒＴａ、基
板１２に非磁性単結晶フェライトを用いた。磁気ヘッド
の構造としては金属磁性膜１１の両側を一対の基板１２
で挟持する構造の積層型磁気ヘッド１６である。摺動面
上にポリテトラフルオロエチレンまたはエチレンー４フ
ッ化エチレン共重合体で埋められた溝１３を持つ。本実
施例では磁気ヘッドのトラック幅は１０μｍであり、金
属磁性膜であるＣｏＮｂＺｒＴａ膜１１の膜厚は約１
５．４μｍとした。また、ＣｏＮｂＺｒＴａ膜の構成は
高周波特性を向上させるため、２μmのＣｏＮｂＺｒＴ
ａ膜を０．１μmのＳiＯ2を介して５層積層した積層膜
とした。両側の非磁性フェライト基板１２はそれぞれ３
０μｍ厚である。In this embodiment, CoNbZrTa of an amorphous magnetic alloy is used for the metal magnetic film 11 as the magnetic core, and non-magnetic single crystal ferrite is used for the substrate 12. The structure of the magnetic head is such that a pair of substrates 12
This is a laminated magnetic head 16 having a structure sandwiched by. The sliding surface has a groove 13 filled with polytetrafluoroethylene or ethylene-tetrafluoroethylene copolymer. In this embodiment, the track width of the magnetic head is 10 μm, and the thickness of the CoNbZrTa film 11 which is a metal magnetic film is about 1 μm.
It was 5.4 μm. In addition, the configuration of the CoNbZrTa film improves the high-frequency characteristics, so that the CoNbZrTa film of 2 μm is used.
The film a was a laminated film in which five layers were laminated via 0.1 μm of SiO 2 . The nonmagnetic ferrite substrates 12 on both sides are 3
It is 0 μm thick.
【００２８】摺動面２２の加工が終わった磁気ヘッドチ
ップを２１用意し、これを比較例１−１とし図２（ａ）
に示す。比較例１−１の非磁性単結晶フェライト基板１
２の摺動面２２上に金属磁性面１１に平行に溝部２３を
設けた（図２（ｂ））。溝部２３は機械加工、エッチン
グ加工、イオンミリング加工、放電加工、フォーカスド
・イオン・ビーム加工（ＦＩＢ：収束イオンビームで特
定部位の加工を行う加工法）等で行う。溝部２３は幅１
５μｍで、深さはギャップアペックス位置より１０μｍ
深くなるように、両方の基板２２に行った。この溝部を
持つ磁気ヘッド２４を比較例１−２とする。A magnetic head chip 21 in which the processing of the sliding surface 22 has been completed is prepared, and this is referred to as a comparative example 1-1.
Shown in Non-magnetic single crystal ferrite substrate 1 of Comparative Example 1-1
A groove 23 was provided on the second sliding surface 22 in parallel with the metal magnetic surface 11 (FIG. 2B). The groove 23 is formed by machining, etching, ion milling, electric discharge machining, focused ion beam machining (FIB: a machining method for machining a specific portion with a focused ion beam), or the like. The groove 23 has a width of 1
5 μm, depth 10 μm from gap apex position
The operation was performed on both substrates 22 so as to be deep. The magnetic head 24 having the groove is referred to as Comparative Example 1-2.
【００２９】さらに、溝部を設けたヘッド２４をポリテ
トラフルオロエチレン（ＰＴＦＥ、デュポン社製”テフ
ロン４２”）の水ディスパージョン液２５に浸漬し、ヘ
ッド表面にＰＴＦＥをコーティングした。これを図２
（ｃ）に示す。ＰＴＦＥは粒径が0.1〜１μｍで、分散
安定剤として非イオン性塗れ剤（界面活性剤）を混ぜて
も良い。浸漬後、１２０℃で乾燥させた後、３５０〜４
００℃で数分間焼結させた。望ましくは３７０℃で５分
間である。この浸漬、乾燥、熱処理を１５回繰り返し約
２０μｍ厚のＰＴＦＥ膜２６をヘッド表面に作製した。
この工程を図２（ｄ）に示す。１回に作製する膜厚は１
〜５μｍが望ましい。これより厚くなると、膜内にクラ
ックが発生し脱離し易くなる。膜厚が薄すぎると工程数
が多くなる。この状態のギャップ断面における模式図を
図２（ｅ）に示す。上記磁気ヘッド２７の摺動面を更に
前面研磨を行い、溝部２３以外のＰＴＦＥを取り除い
た。この時のギャップ断面の模式図を図２（ｆ）に示
す。このようにして作製した磁気ヘッド１６（図２
（ｇ））を実施例１−１とする。Further, the head 24 provided with the groove was immersed in a water dispersion liquid 25 of polytetrafluoroethylene (PTFE, "Teflon 42" manufactured by DuPont) to coat the head surface with PTFE. Figure 2
It is shown in (c). PTFE has a particle size of 0.1 to 1 μm, and may be mixed with a nonionic paint (surfactant) as a dispersion stabilizer. After immersion, after drying at 120 ° C, 350-4
Sintered at 00 ° C for several minutes. Preferably, it is at 370 ° C. for 5 minutes. This immersion, drying and heat treatment were repeated 15 times to produce a PTFE film 26 having a thickness of about 20 μm on the head surface.
This step is shown in FIG. The film thickness produced at one time is 1
５5 μm is desirable. If the thickness is larger than this, cracks are generated in the film and the film is easily detached. If the film thickness is too small, the number of steps increases. FIG. 2E shows a schematic view of the gap section in this state. The sliding surface of the magnetic head 27 was further polished to remove the PTFE other than the groove 23. FIG. 2F shows a schematic view of the gap cross section at this time. The magnetic head 16 (FIG. 2)
(G)) is Example 1-1.
【００３０】単に溝部を持たない比較例１−１、溝部の
み構成した比較例１−１、ＰＴＦＥを積層して穴部に埋
め込んだ実施例１−１のヘッドを、それぞれＤＶＣ方式
ＶＴＲに搭載し、ＭＥテープを約１時間走行させた後の
出力、焼き付きの様子、偏摩耗量、摩擦係数を測定し
た。これを表１に示す。The heads of Comparative Example 1-1 having no groove, Comparative Example 1-1 having only the groove, and Example 1-1 in which PTFE was laminated and embedded in the hole were mounted on a DVC VTR. After running the ME tape for about 1 hour, the output, the state of seizure, the amount of uneven wear, and the coefficient of friction were measured. This is shown in Table 1.
【００３１】出力の測定は、ＤＶＣに映像信号を入出力
し、スペクトロアナリザで２０ＭＨｚの出力を抽出し、
比較例１を基準として相対値で示した。焼き付きは、１
時間走行後の磁気ヘッド摺動面を２００倍の顕微鏡で観
察し、目視で判定を行った。偏摩耗量はＡＦＭ（原子間
力顕微鏡）で基板と金属磁性面との段差を測定した。摩
擦係数はヘッド方線方向と接線方向の接触力を測定し
て、摩擦係数を求めた。この測定方法は、長谷川、溝
尾、養田、「ＶＴＲにおける磁気ヘッドとテープの摩擦
解析」（日本機械学会第７２期全国大会講演論文集、１
９９４年）でも提案されている。The output is measured by inputting / outputting a video signal to / from the DVC, extracting an output of 20 MHz with a spectroanalyzer,
The values are shown as relative values based on Comparative Example 1. Burn-in is 1
The sliding surface of the magnetic head after running for an hour was observed with a microscope of 200 times magnification, and the judgment was made visually. The uneven wear amount was obtained by measuring the level difference between the substrate and the metal magnetic surface with an AFM (atomic force microscope). The friction coefficient was determined by measuring the contact force in the head normal direction and the tangential direction. This measurement method is described in Hasegawa, Mizoo, and Yoda, "Analysis of friction between magnetic head and tape in VTR" (Papers of the 72nd Annual Meeting of the Japan Society of Mechanical Engineers, 1
994).
【００３２】これらの結果を表１に示す。これより、実
施例１−１は摩擦係数が大幅に低減され、かつ偏摩耗や
焼き付きが少なく、優れた再生出力を得ることが可能と
なった。これは、磁気ヘッド摺動面２２に低摩擦係数の
ＰＴＦＥ１３が溝２３に埋め込まれ、潤滑効果が発生し
ているためと考えられる。またＰＴＦＥ１３は溝２３内
に埋め込まれているため、磁気ヘッド摺動面が摩耗して
も絶えず新しいＰＴＦＥの潤滑面が露出するため、優れ
た耐久性が持続すると考えられる。Table 1 shows the results. As a result, in Example 1-1, the coefficient of friction was significantly reduced, and uneven wear and image sticking were small, and it was possible to obtain an excellent reproduction output. This is probably because the PTFE 13 having a low friction coefficient is embedded in the groove 23 on the sliding surface 22 of the magnetic head, and a lubricating effect is generated. Further, since the PTFE 13 is embedded in the groove 23, even if the sliding surface of the magnetic head is worn, a new lubricated surface of the PTFE is constantly exposed, so that it is considered that excellent durability is maintained.
【００３３】[0033]
【表１】 [Table 1]
【００３４】前記実施例においては、溝部２３内でホウ
ケイ酸ガラスを酸処理により多孔性にする方法について
述べたが、ガラスを棒状や平面状等に作製し、５００℃
〜８００℃の熱処理で２層に分離し、酸処理で多孔性に
した物を、ヘッド上面から圧入しても良い。このように
すれば、熱処理で磁気ヘッドのギャップ形状がゆるんだ
り、酸処理で金属磁性膜が腐食することがなくなり、歩
留まりが向上する。In the above-described embodiment, the method of making the borosilicate glass porous by the acid treatment in the groove 23 has been described.
A material that has been separated into two layers by heat treatment at ８００800 ° C. and made porous by acid treatment may be press-fitted from the upper surface of the head. By doing so, the gap shape of the magnetic head is not loosened by the heat treatment, and the metal magnetic film is not corroded by the acid treatment, and the yield is improved.
【００３５】金属磁性膜１１としては、パーマロイ、セ
ンダスト、ＦｅＴａ、ＦｅＴａＮ等を用いても同様な効
果が得られる。基板１２としては磁性Ｍｎ−Ｚｎフェラ
イト、チタン酸カルシウム、ニッケル酸チタン酸マグネ
シウム、アルティックを用いても同様な効果が得られる
事は言うまでもない。The same effect can be obtained by using permalloy, sendust, FeTa, FeTaN, or the like as the metal magnetic film 11. Needless to say, the same effect can be obtained even if magnetic Mn-Zn ferrite, calcium titanate, magnesium nickelate titanate, or Altic is used as the substrate 12.
【００３６】前記実施例においては、ＰＴＦＥ３１を使
用した例について述べたが、エチレンー４フッ化エチレ
ン共重合体（ＰＥＴＦＥ）３２（例えばデュポン社製商
品名「ＡＦＬＯＮ−ＣＯＰ」）を用いると、ＰＥＴＦＥ
は、融点は３５０℃であり、ＰＴＦＥより低温度の３０
０℃〜３５０℃で熱処理でき、またセラミックやガラス
と反応するので剥離等が起こりにくく、耐久性向上に有
効である。これを図３（ｃ）に示し、実施例１−２とす
る。In the above embodiment, an example using PTFE 31 has been described. However, when ethylene-tetrafluoroethylene copolymer (PETFE) 32 (for example, trade name “AFLON-COP” manufactured by DuPont) is used,
Has a melting point of 350 ° C. and a lower temperature of 30 ° C. than PTFE.
Heat treatment can be performed at 0 ° C. to 350 ° C., and since it reacts with ceramic or glass, peeling or the like hardly occurs, which is effective for improving durability. This is shown in FIG. 3C and is referred to as Example 1-2.
【００３７】またＰＴＦＥとＰＥＴＦＥの混合物を用い
ることも、接着性と滑り性を共存させる上で有効であ
る。ＰＥＴＦＥ３２を使うことにより熱処理温度が低い
ため、ヘッドボンディング課程等で使ったガラス接着が
ゆるむ、あるいは熱処理によて磁性金属の磁気特性が変
わるという不良が起こりにくくなる効果がある。The use of a mixture of PTFE and PETE is also effective for coexisting adhesiveness and slipperiness. Since the heat treatment temperature is low by using PETFE32, there is an effect that the glass bonding used in the head bonding process or the like is loosened, or the magnetic property of the magnetic metal is not easily changed by the heat treatment.
【００３８】前記においては、溝を金属磁性面に平行に
作製した例について述べたが、溝部４３を摺動方向と角
度を持たせて作製し、金属磁性面４１上にＰＴＦＥを含
む溝を作製することは、摩擦係数の低減、磁性面の露出
面積を減らすことが出来、効果的である。この磁気ヘッ
ド４６を実施例１−３として、図４（ａ）に斜視図、図
４（ｂ）に平面図を示す。また磁気ギャップ幅を決める
加工と併用する事も性能安定、コスト削減の上で効果的
である。溝部４３の好ましい角度は、摺動方向（金属磁
性面４１の方向）に対して０〜４５度の範囲である。In the above description, an example was described in which the groove was formed parallel to the metal magnetic surface. However, the groove 43 was formed so as to have an angle with the sliding direction, and a groove including PTFE was formed on the metal magnetic surface 41. Doing so is effective in reducing the friction coefficient and reducing the exposed area of the magnetic surface. FIG. 4A is a perspective view, and FIG. 4B is a plan view of this magnetic head 46 as Example 1-3. Also, it is effective to use in combination with processing for determining the magnetic gap width in terms of stable performance and cost reduction. The preferred angle of the groove 43 is in the range of 0 to 45 degrees with respect to the sliding direction (the direction of the metal magnetic surface 41).
【００３９】本実施例は積層型磁気ヘッドについて述べ
たが、バルク型磁気ヘッド１２１、ＭＩＧ型磁気ヘッド
１２２、薄膜型磁気ヘッド１２４等に用いる事が可能な
事は言うまでもない。In this embodiment, the laminated magnetic head has been described. However, it is needless to say that the present invention can be applied to the bulk magnetic head 121, the MIG magnetic head 122, the thin film magnetic head 124 and the like.
【００４０】（実施の形態２）図５（ａ）は本発明の第
２の実施例の磁気ヘッドの構成を示す斜視図、図５
（ｂ）は同平面図、図６（ａ）〜（ｉ）はその製造方法
の１例を示す模式図、図７は実施例の１例を示す斜視図
である。(Embodiment 2) FIG. 5A is a perspective view showing the structure of a magnetic head according to a second embodiment of the present invention.
6B is a plan view of the same, FIGS. 6A to 6I are schematic views showing one example of the manufacturing method, and FIG. 7 is a perspective view showing one example of the embodiment.
【００４１】本実施例では磁気コアである金属磁性膜５
１にはＦｅＴａＮ磁性合金、基板５２にチタン酸カルシ
ウムを用い、磁気ヘッドの構造としては金属磁性膜５１
の両側を一対の基板５２で挟持する構造の積層型磁気ヘ
ッドであり、摺動面上にＰＴＦＥまたはＰＥＴＦＥを含
むガラスで埋められた溝を持つ磁気ヘッド５６とした。In this embodiment, the metal magnetic film 5 as a magnetic core
1 is made of a FeTaN magnetic alloy, and a substrate 52 is made of calcium titanate.
Is a laminated magnetic head having a structure in which both sides are sandwiched between a pair of substrates 52, and has a groove filled with glass containing PTFE or PETE on a sliding surface.
【００４２】本実施例では磁気ヘッドのトラック幅は１
８μｍであり、金属磁性膜５１の膜厚は約２５μｍとし
た。両側のチタン酸カルシウム非磁性基板５２はそれぞ
れ４０μｍ厚であった。In this embodiment, the track width of the magnetic head is 1
The thickness of the metal magnetic film 51 was about 25 μm. The calcium titanate nonmagnetic substrates 52 on both sides were each 40 μm thick.
【００４３】摺動面の加工が終わった磁気ヘッドチップ
６１を用意し、これを比較例２−１として図６（ａ）に
示す。比較例２−１のチタン酸カルシウム基板５２の上
に金属磁性面５１に平行に溝部を設ける。これを図６ｂ
に示す。溝部６２は幅２０μｍで、深さはギャップアペ
ックス位置より５０μｍ深くなるように、両方の基板５
２に行った。この溝形成を行った磁気ヘッド６３を比較
例２−２とする。A magnetic head chip 61 having a finished sliding surface is prepared, and this is shown in FIG. 6A as Comparative Example 2-1. A groove is provided on the calcium titanate substrate 52 of Comparative Example 2-1 in parallel with the metal magnetic surface 51. This is shown in FIG.
Shown in The groove 62 has a width of 20 μm and a depth of 50 μm deeper than the gap apex position.
Went to 2. The magnetic head 63 on which the groove was formed is referred to as Comparative Example 2-2.
【００４４】ホウケイ酸ガラス（ＳｉＯ2）w（Ｂ2Ｏ3）
x（ＲyＯ）y（Ａｌ2Ｏ3）zからなるガラス６３を作製
し、溝部に流し込んだ。ここで、Ｒはアルカリ、アルカ
リ土類を示す。ｗは３０〜８０ｗｔ％、ｘは８〜５０ｗ
ｔ％、ｙは２〜２５ｗｔ％、ｚは０〜２４ｗｔ％が望ま
しい。Borosilicate glass (SiO 2 ) w (B 2 O 3 )
to produce x (R y O) y ( Al 2 O 3) glass 63 comprising a-z, poured into the groove. Here, R represents an alkali or alkaline earth. w is 30 to 80 wt%, x is 8 to 50 w
It is desirable that t%, y is 2 to 25 wt%, and z is 0 to 24 wt%.
【００４５】この状態のギャップ断面図を図６（ｃ）に
示す。このガラスを５００℃〜８００℃の温度でアニー
ル処理することにより、ＳｉＯ2層とＢ2Ｏ3−Ｎａ2Ｏ層
６５に分離した。この様子を図６（ｄ）に示す。これを
酸処理によってＮａ2Ｏ−Ｂ2Ｏ3６５層を取り除き多孔
性ガラス６６にした。これを図６（ｅ）に示す。細孔の
径は１〜１０μｍが望ましい。その後、溝部以外のガラ
スを削る前面研磨を行った。このヘッドを比較例２−３
とする。FIG. 6C shows a sectional view of the gap in this state. This glass was annealed at a temperature of 500 ° C. to 800 ° C. to separate it into a SiO 2 layer and a B 2 O 3 —Na 2 O layer 65. This state is shown in FIG. This was porous glass 66 removes Na 2 O-B 2 O 3 65 layers by the acid treatment. This is shown in FIG. The diameter of the pores is desirably 1 to 10 μm. Then, the front surface of the glass other than the groove was polished. This head was used in Comparative Example 2-3.
And
【００４６】さらに、溝部に多孔性ガラスを設けたヘッ
ドをＰＴＦＥの水ディスパージョンに浸漬し、ガラス表
面６６の細孔部にＰＴＦＥをコーティングした。１２０
℃で乾燥させた後、３５０〜４００℃で多孔性ガラス内
部で数分間焼結させ、粒塊６７にした。これを図６
（ｆ）、図６（ｇ）に示す。望ましくは３７０℃で５分
間である。このヘッドを仕上げ研磨前の実施例２−１、
磁気ヘッド５６とする。実施例２−１、比較例２−１、
２−２、２−３の磁気ヘッドがほぼ同様の前面形状、ギ
ャップデプスになるようにそれぞれ摺動面を更に前面研
磨を行った。この時のギャップ断面を図６（ｈ）に示
す。Further, the head provided with the porous glass in the groove was immersed in a water dispersion of PTFE, and the pores on the glass surface 66 were coated with PTFE. 120
After drying at ℃, it was sintered at 350-400 ℃ for several minutes inside the porous glass to form agglomerates 67. This is shown in FIG.
(F) and shown in FIG. Preferably, it is at 370 ° C. for 5 minutes. Example 2-1 before finish polishing of this head,
The magnetic head 56 is used. Example 2-1, Comparative Example 2-1,
The sliding surfaces were further polished so that the magnetic heads 2-2 and 2-3 had substantially the same front shape and gap depth. FIG. 6H shows a cross section of the gap at this time.
【００４７】これらのヘッドをＤＶＣ−ＰＲＯ方式ＶＴ
Ｒに搭載し、ＭＰテープを用いて５００時間走行後のヘ
ッド摩耗量と出力を求めた。出力はデジタル化した映像
再生信号の４０ＭＨｚの再生出力を比較例１を基準とし
てｄＢ単位で表した。厚手９μｍと薄手７μｍの全厚の
異なるテープ出力を測定すると薄手テープはエンベロー
プが悪化する。この薄手テープのエンベロープの平坦度
も測定した。ヘッド摩耗量は、５００時間走行前後のド
ラム表面からの突出量をレーザ測長顕微鏡で測定し、差
を表した。These heads are connected to a DVC-PRO system VT
The tape was mounted on an R tape, and the amount of head wear and output after running for 500 hours using an MP tape were determined. The output was expressed in dB with respect to the reproduction output of the digitized video reproduction signal at 40 MHz with reference to Comparative Example 1. When measuring the output of different thicknesses of the thick 9 μm and the thin 7 μm, the envelope of the thin tape deteriorates. The flatness of the envelope of this thin tape was also measured. The amount of head abrasion was determined by measuring the amount of protrusion from the drum surface before and after running for 500 hours using a laser length-measuring microscope and expressing the difference.
【００４８】表２より、実施例２−１は出力が大きくヘ
ッド摩耗の小さい優れた磁気ヘッドが得られた事がわか
る。従来の比較例２−１では、厚手テープになじんだ磁
気ヘッドに薄手テープを走行させるとヘッド頂部でスペ
ースが発生し出力低下が発生していたが、比較例２−２
のように両基板面に溝を入れることでテープタッチが改
善され、薄手テープのエンベロープは改善される。しか
し、比較例２−１は溝によって摺動面積が減少するた
め、ヘッド摩耗量が大きくなる。比較例２−３のよう
に、ガラスを溝に埋めると、ガラスは一般に基板より摩
耗が多いためガラス部の偏摩耗により、比較例２−２の
溝があるのと同様な効果を示すと考えられる。しかし摩
耗量は基板のみの比較例２−１より多く、またガラスに
起因する焼き付き等により厚手テープの出力が低下す
る。また実施例１と同様の方法で摩擦係数を測定すると
０．５５と高い値を示す。しかし実施例２−１のように
ＰＴＦＥをガラスの孔に埋めることにより、摩擦係数が
０．２８まで低下する。この良好な潤滑性は微少な摩耗
粒となったＰＴＦＥが金属磁性面に再付着し、常に、ガ
ラス孔内に埋め込まれた低摩擦係数のＰＴＦＥが常に補
給されて潤滑効果が長時間保持しているためと考えられ
る。From Table 2, it can be seen that in Example 2-1 an excellent magnetic head having high output and low head wear was obtained. In Comparative Example 2-1 of the related art, when a thin tape was run on a magnetic head that had been adjusted to a thick tape, a space was generated at the top of the head, resulting in a decrease in output.
By making grooves on both substrate surfaces as described above, the tape touch is improved, and the envelope of the thin tape is improved. However, in Comparative Example 2-1, since the sliding area is reduced by the groove, the amount of head wear increases. As in Comparative Example 2-3, when the glass is buried in the groove, glass generally wears more than the substrate, so that uneven wear of the glass portion is considered to exhibit the same effect as the presence of the groove in Comparative Example 2-2. Can be However, the amount of abrasion is larger than that of Comparative Example 2-1 in which only the substrate is used, and the output of the thick tape is reduced due to seizure caused by glass. When the coefficient of friction was measured in the same manner as in Example 1, it showed a high value of 0.55. However, by filling PTFE in the holes of the glass as in Example 2-1, the coefficient of friction is reduced to 0.28. This good lubricity means that the PTFE that has become fine wear particles is reattached to the metal magnetic surface, and the PTFE with a low friction coefficient embedded in the glass hole is always replenished, and the lubrication effect is maintained for a long time. It is thought that there is.
【００４９】[0049]
【表２】 [Table 2]
【００５０】このような効果は、例えば鉛ガラス７１を
比較例２−２の溝内に流し込み、表面をＮａガスに晒
し、表面にマイクロクラック７２を作製した後、実施例
２−１同様にＰＴＦＥを埋め込んでも良い。これを実施
例２−２として図７に示す。実施例２−２の場合はガラ
スの硬度が増加し、ガラス部の偏摩耗が減少する効果が
あり、スチル寿命が向上する。またＮａ暴露時間を制御
することにより、マイクロクラック７１の大きさ、数を
制御できるので、ＰＴＦＥの埋め込み量を制御すること
が可能になる。Such an effect can be obtained by, for example, pouring lead glass 71 into the groove of Comparative Example 2-2, exposing the surface to Na gas, forming a microcrack 72 on the surface, and then forming PTFE as in Example 2-1. May be embedded. This is shown in FIG. 7 as Example 2-2. In the case of Example 2-2, the hardness of the glass is increased, the uneven wear of the glass portion is reduced, and the still life is improved. Further, by controlling the Na exposure time, the size and number of the microcracks 71 can be controlled, so that the amount of embedded PTFE can be controlled.
【００５１】また、このような効果は、発泡性ガラスを
比較例２−２の溝内に埋め込み、実施例２−１同様にＰ
ＴＦＥを埋め込んでも良い。これを実施例２−３とす
る。発泡性ガラスは棒状の物をバー状態のヘッドに摺動
面より圧力をかけて押し込んでも良い。実施例２−３の
場合は、空孔の体積が増大しＰＴＦＥの含有量を大きく
できると同時に、ヘッドを実施例２−１の酸や実施例２
−２のＮａガスにさらす必要が無く、腐食等の不良発生
を低減することができる。Further, such an effect is obtained by burying the foaming glass in the groove of Comparative Example 2-2, and as in Example 2-1.
TFE may be embedded. This is referred to as Example 2-3. The foamable glass may be pushed into the head in a bar state by applying pressure from the sliding surface. In the case of Example 2-3, the volume of the pores was increased and the content of PTFE was able to be increased, and at the same time, the head was replaced with the acid of Example 2-1 or Example 2
-2, it is not necessary to expose to Na gas, and the occurrence of defects such as corrosion can be reduced.
【００５２】また、このような効果は、ＰＴＦＥとガラ
スの懸濁液をを比較例２−２の溝内に埋め込み３５０℃
以上で焼結した後、前面研磨でヘッド形状を仕上げても
良い。ガラスの網目構造に融解したＰＴＦＥが保持され
るので、ＰＴＦＥの脱離が防げる。これを実施例２−４
とする。ＰＴＦＥとガラスの懸濁液に融点が４００℃よ
り高いガラスファイバー粉末（５〜２０μｍ）またはグ
ラファイトを混ぜるとガラスの耐久性が増加するので、
ヘッド摩耗が低減される。またグラファイトを混入する
と溝部に導電性が付与されるので、蛍ノイズが低減さ
れ、エラーレートが向上する。カーボンブラックも同様
な効果を持つが、粒子径が小さく脱離によるドロップ発
生するので望ましくない。Further, such an effect can be obtained by embedding a suspension of PTFE and glass in the groove of Comparative Example 2-2.
After sintering as described above, the head shape may be finished by polishing the front surface. Since the molten PTFE is retained in the glass network structure, the PTFE can be prevented from desorbing. This is referred to as Example 2-4.
And Mixing glass fiber powder (5-20 μm) or graphite with a melting point higher than 400 ° C. with a suspension of PTFE and glass increases the durability of the glass,
Head wear is reduced. When graphite is mixed, conductivity is imparted to the groove, so that fire noise is reduced and the error rate is improved. Carbon black has a similar effect, but is undesirable because the particle diameter is small and drops are generated due to desorption.
【００５３】本実施例は積層型磁気ヘッドについて述べ
たが、バルク型磁気ヘッド１２１、ＭＩＧ型磁気ヘッド
１２２、薄膜型磁気ヘッド１２４等に用いる事が可能な
事は言うまでもない。In this embodiment, the laminated magnetic head has been described. However, it is needless to say that the present invention can be applied to the bulk magnetic head 121, the MIG magnetic head 122, the thin film magnetic head 124 and the like.
【００５４】溝を平行に入れた例について述べたが、実
施例１−３と同様に、溝部５３を摺動方向と角度を持た
せて作製し、金属磁性面上にＰＴＦＥを含む多孔性物質
で充填された溝を作製することは、摩擦係数の低減、磁
性面の露出面積を減らすことが出来、効果的である。ま
た磁気ギャップ幅を決める加工と併用する事も性能安
定、コスト削減の上で効果的である。The example in which the grooves are formed in parallel has been described. As in the case of Example 1-3, the grooves 53 are formed so as to have an angle with respect to the sliding direction, and a porous material containing PTFE is formed on the metal magnetic surface. The production of the groove filled with is effective because the coefficient of friction can be reduced and the exposed area of the magnetic surface can be reduced. Also, it is effective to use in combination with processing for determining the magnetic gap width in terms of stable performance and cost reduction.
【００５５】（実施の形態３）図８は本発明の第３の実
施例の磁気ヘッドの構成を示す斜視図、図９〜図１１は
その製造方法の１例を示す模式図である。(Embodiment 3) FIG. 8 is a perspective view showing a configuration of a magnetic head according to a third embodiment of the present invention, and FIGS. 9 to 11 are schematic views showing an example of a manufacturing method thereof.
【００５６】本実施例では磁気コアである金属磁性膜８
１にはパーマロイ合金、基板８２にアルティックを用
い、磁気ヘッドの構造としてはＨＤＤ用薄膜インダクテ
ィブ型磁気ヘッドであり、摺動面上にＰＴＦＥ８４また
はＰＥＴＦＥを含む細孔を持つアルミ陽極酸化膜８５で
埋められた溝を持つスライダ構造の薄膜磁気ヘッド８３
である。本実施例では磁気ヘッドのトラック幅を規制す
る上部コアの幅は１.５μｍであり、金属磁性膜８１の
膜厚は約３．５μｍとした。ヘッド摺動面上のレール幅
は１２０μｍである。In this embodiment, the metal magnetic film 8 as a magnetic core
1 is a permalloy alloy, Altic is used for the substrate 82, and the structure of the magnetic head is a thin-film inductive magnetic head for HDD. The aluminum anodic oxide film 85 having pores containing PTFE 84 or PETE on the sliding surface. Thin-film magnetic head 83 with slider structure having buried grooves
It is. In this embodiment, the width of the upper core that regulates the track width of the magnetic head is 1.5 μm, and the thickness of the metal magnetic film 81 is about 3.5 μm. The rail width on the head sliding surface is 120 μm.
【００５７】摺動面形状が作製された２レール型ＨＤＤ
用インダクティブ記録再生磁気ヘッド９１を用意した。
これを図９（ａ）に示す。摺動面のレール上に溝９２を
作製した。これを図９（ｂ）に示し比較例３−１の磁気
ヘッド９３とする。溝部９２は幅５０μｍで、深さは１
０μｍである。摺動面のアルティック上にアルミナの多
孔性被膜９４を作製した。これはアルミナの陽極酸化法
で作製した。これを図９（ｃ）に示す。表面処理として
下地にアルミニウム膜を数μｍ〜数十μｍ設けておくこ
とは有効である。陽極酸化被膜の製法としては、硫酸被
膜、しゅう酸被膜、クロム酸被膜、硝酸皮膜、有機酸皮
膜、水酸化ナトリウム系浴電解膜、水酸化アンモニウム
系電解浴被膜、リン酸ナトリウム系電解浴被膜、非水容
系被膜がある。図９（ｃ）に示すように多くの陽極酸化
被膜細胞の空孔とクラックを持つ陽極酸化膜が望まし
く、例えば希硫酸を電解液としてアルミニウムを対極と
して高電流で生成した硫酸被膜は、本発明に有効であ
る。これを実施例１と同様にＰＴＦＥ水ディスパージョ
ン液に含浸し１２０℃で乾燥させた後、３５０〜４００
℃で数分間焼結させた。望ましくは３７０℃で５分間で
ある。これを図９（ｄ）に示す。溝部以外の陽極酸化
膜、ＰＴＦＥを摺動面ラップ等で取り除き作製した磁気
ヘッド９５（図９（ｅ））を実施例３−１とする。Two-rail HDD with Sliding Surface Shape
An inductive recording / reproducing magnetic head 91 was prepared.
This is shown in FIG. A groove 92 was formed on the rail on the sliding surface. This is shown in FIG. 9B, which is a magnetic head 93 of Comparative Example 3-1. The groove 92 has a width of 50 μm and a depth of 1
0 μm. An alumina porous coating 94 was formed on the sliding surface altic. This was produced by the anodic oxidation method of alumina. This is shown in FIG. It is effective to provide an aluminum film of several μm to several tens μm as a base as a surface treatment. Examples of the method of producing the anodic oxide film include a sulfuric acid film, an oxalic acid film, a chromic acid film, a nitric acid film, an organic acid film, a sodium hydroxide-based electrolytic bath film, an ammonium hydroxide-based electrolytic bath film, and a sodium phosphate-based electrolytic bath film. There is a non-aqueous coating. As shown in FIG. 9 (c), an anodic oxide film having many pores and cracks of anodized film cells is desirable. For example, a sulfuric acid film formed at a high current using dilute sulfuric acid as an electrolyte and aluminum as a counter electrode is the present invention It is effective for This was impregnated with a PTFE water dispersion liquid in the same manner as in Example 1 and dried at 120 ° C.
Sintered at ℃ for several minutes. Preferably, it is at 370 ° C. for 5 minutes. This is shown in FIG. A magnetic head 95 (FIG. 9 (e)) manufactured by removing the anodic oxide film and PTFE other than the groove portion with a lapping surface or the like is referred to as Example 3-1.
【００５８】比較例３−１と実施例３−１をコンタクト
・スタート・ストップ試験（ＣＳＳ：磁気ヘッドを１回
浮上させて停止する摺動試験）すると何も表面処理を行
っていない比較例３−１は３万回で摩擦係数の増加やア
コースティック・エミッション（Acoustic Emission：
物質の中でマイクロクラック等が発生することによって
生ずる超音波を検出して寿命予測を行う方法）音の増加
が発生したが、比較例３−２は５０万回ＣＳＳを行って
も摩擦の増加は起こらなかった。The comparative example 3-1 and the example 3-1 were subjected to a contact start / stop test (CSS: a sliding test in which the magnetic head was lifted once and stopped). Comparative example 3 in which no surface treatment was performed -1 means 30,000 times increase of friction coefficient and acoustic emission (Acoustic Emission:
A method of detecting the ultrasonic waves generated by the occurrence of microcracks and the like in a substance and estimating the life thereof) Although the noise increased, the comparative example 3-2 increased the friction even after performing 500,000 times of CSS. Did not happen.
【００５９】同様の効果は多孔性クロムメッキ膜でも得
られる。これを実施例３−２とする。クロムメッキ膜に
ＰＴＦＥを含浸させた実施例３−２は、クロムメッキ層
が硬質でありヘッド摩耗量の低減が望める。The same effect can be obtained with a porous chromium plating film. This is Example 3-2. In Example 3-2 in which the chromium plating film was impregnated with PTFE, the chromium plating layer was hard, and a reduction in head wear can be expected.
【００６０】また、同様の効果はニッケル無電解メッキ
膜を設けて、ＰＴＦＥを含浸し、３００℃から４００℃
で熱処理してもさせても同様な効果が得られる。この製
造方法を図１０（ａ）〜（ｅ）に示す、実施例３−１と
同様に溝１０２を作製した磁気ヘッド１０３を用意す
る。これを図１０（ｂ）に示す。この溝中に図１０
（ｃ）に示すように粒状の無電解ニッケル膜を作製す
る。無電解ニッケルメッキ膜１０４はなるべく微粒子が
望ましく、酸性浴で次亜リン酸塩を用いた方法が望まし
い。例えば、磁気ヘッド摺動面の下地処理として、鉄ま
たはコバルトまたはニッケル膜を１〜２μｍスパッタす
る。または１重量％の塩化第一スズ液、０．１重量％の
塩化パラジウム液でに浸す。純水１リットルに塩化ニッ
ケル５０ｇ、酢酸ナトリウム１５ｇ、次亜リン酸ナトリ
ウム２４ｇを調合し、ｐＨは４．５〜５．５、温度を９
９℃で磁気ヘッドを浸すと、粒子状の無電解ニッケル膜
が生成する。水洗した後、ＰＴＦＥ水懸濁液に浸し、３
００℃〜４００℃で熱処理する（図１０（ｄ））。これ
を実施例３−３の磁気ヘッド１０５とする（図１０
（ｅ））。この実施例３−３はニッケルが導電性であ
り、潤滑性の付与と同時に、帯電しやすいＰＴＦＥ膜の
電荷を逃がすことで磁気ヘッドのＥＳＤ破壊防止（静電
気によるギャップ膜、磁気抵抗交換膜等の電気的磁気的
破壊）等のに効果を発揮するまた同様の効果は多孔性セ
ラミックスを用いても得ることができる。例えばテトラ
ケイ酸エチルとポリエチレングリコールの混合液に硝酸
を加えた液に、磁気ヘッドを浸漬し８０℃に熱すると発
泡性セラミック膜が摺動面上に得られる。この発泡性セ
ラミック膜の空孔を実施例３−１と同様にＰＴＦＥで充
填することで本発明の磁気ヘッドが得られる。多孔性セ
ラミックスを用いると、耐摺動性に優れ離脱粉が少ない
磁気ヘッドが得られ、ＣＳＳ特性の向上、ドロップアウ
トの低減がはかれる。The same effect is obtained by providing a nickel electroless plating film, impregnating with PTFE, and
The same effect can be obtained by heat treatment. This manufacturing method is shown in FIGS. 10A to 10E, and a magnetic head 103 in which a groove 102 is formed is prepared in the same manner as in Example 3-1. This is shown in FIG. In this groove, FIG.
A granular electroless nickel film is prepared as shown in FIG. The electroless nickel plating film 104 is preferably made of fine particles as much as possible, and a method using hypophosphite in an acidic bath is desirable. For example, as a base treatment of the sliding surface of the magnetic head, an iron, cobalt, or nickel film is sputtered by 1 to 2 μm. Or dipped in 1% by weight of stannous chloride solution and 0.1% by weight of palladium chloride solution. Mix 1 g of pure water with 50 g of nickel chloride, 15 g of sodium acetate and 24 g of sodium hypophosphite, pH 4.5 to 5.5, temperature 9
When the magnetic head is immersed at 9 ° C., a particulate electroless nickel film is formed. After washing with water, immerse in water suspension of PTFE,
Heat treatment is performed at 00 ° C. to 400 ° C. (FIG. 10D). This is referred to as a magnetic head 105 of Example 3-3 (FIG. 10).
(E)). In this embodiment 3-3, nickel is conductive, and at the same time as imparting lubricity, the charge of the easily charged PTFE film is released to prevent ESD destruction of the magnetic head (such as gap film due to static electricity, magnetoresistive exchange film, etc.). The same effect can be obtained by using porous ceramics. For example, when a magnetic head is immersed in a liquid obtained by adding nitric acid to a liquid mixture of ethyl tetrasilicate and polyethylene glycol and heated to 80 ° C., a foamable ceramic film is obtained on the sliding surface. The magnetic head of the present invention can be obtained by filling the pores of the foamable ceramic film with PTFE in the same manner as in Example 3-1. When a porous ceramic is used, a magnetic head having excellent sliding resistance and little detachment powder can be obtained, and CSS characteristics can be improved and dropout can be reduced.
【００６１】前記においては、チップ状態での加工法に
ついて述べたが、図１１に示すように、ウエファ１１１
より切り出したバー１１２状態で溝加工１１３をまとめ
て行い、実施例２−１で示した多孔性ガラスや実施例３
−１で示した陽極酸化膜等の形成とＰＴＦＥの含浸、焼
結１１４を行い、その後チップ切断加工１１５を行うこ
とは、形状の安定、加工コストの低減で有効である。In the above, the processing method in a chip state has been described, but as shown in FIG.
Grooving 113 is collectively performed in the state of the bar 112 cut out from the porous glass and the porous glass shown in Example 2-1.
Forming an anodic oxide film, etc., impregnating and sintering PTFE 114, and then performing chip cutting 115 as shown by -1 is effective in stabilizing the shape and reducing the processing cost.
【００６２】本実施例はインダクティブ型薄膜磁気ヘッ
ドについて述べたが、バルク型磁気ヘッド１２１、ＭＩ
Ｇ型磁気ヘッド１２２、磁気抵抗効果型薄膜型再生・イ
ンダクティブ記録接合型磁気ヘッドに用いる事が可能な
事は言うまでもない。In this embodiment, the inductive thin film magnetic head has been described.
It goes without saying that the present invention can be used for the G-type magnetic head 122 and the magneto-resistance effect type thin film type reproducing / inductive recording junction type magnetic head.
【００６３】（実施の形態４）次に本発明の磁気ヘッド
を用いた磁気記録再生装置の実施例について説明する。
本実施例では記録再生ヘッド１２１に本発明の実施例１
１−１、２−１の磁気ヘッドを用いたＤＶＣ−ＰＲＯ方
式の磁気記録再生装置を試作した。これを図１２〜図１
３に示す。回転ドラム１３３を１８０００ｒｐｍで回転
させ、ＭＰテープ１３２とヘッド１３１の相対速度が２
０ｍ／ｓ以上の系においても、４０ＭＨｚ以上の高周波
信号を良好に記録再生でき、ヘッド寿命も大幅に向上し
たハイビジョンデジタルＶＴＲや大容量ストリーマが実
現できた。(Embodiment 4) Next, an embodiment of a magnetic recording / reproducing apparatus using the magnetic head of the present invention will be described.
In this embodiment, the recording / reproducing head 121 is used in the first embodiment of the present invention.
A prototype of a DVC-PRO magnetic recording / reproducing apparatus using the magnetic heads 1-1 and 2-1 was manufactured. This is shown in FIGS.
3 is shown. The rotating drum 133 is rotated at 18000 rpm, and the relative speed between the MP tape 132 and the head 131 becomes 2
Even in a system of 0 m / s or higher, a high-definition digital VTR and a large-capacity streamer, which can record and reproduce a high-frequency signal of 40 MHz or higher satisfactorily and have a significantly improved head life, can be realized.
【００６４】[0064]
【発明の効果】本発明により、低摩擦で耐久性に優れた
磁気ヘッド実現することができるようになった。その結
果、テープとヘッドの相対速度が２０ｍ／ｓ以上の系に
おいても、４０ＭＨｚ以上の高周波信号を良好に記録再
生でき、ヘッド寿命も大幅に向上したハイビジョンデジ
タルＶＴＲや大容量ストリーマが実現できた。According to the present invention, a magnetic head having low friction and excellent durability can be realized. As a result, even in a system in which the relative speed between the tape and the head is 20 m / s or more, a high-definition digital VTR and a large-capacity streamer can be realized in which a high-frequency signal of 40 MHz or more can be recorded and reproduced satisfactorily and the head life is greatly improved.
【図１】（ａ）は本発明の実施の形態１の磁気ヘッドの
構成を示す斜視図、（ｂ）は同平面図。FIG. 1A is a perspective view showing a configuration of a magnetic head according to a first embodiment of the present invention, and FIG. 1B is a plan view thereof.
【図２】（ａ）〜（ｇ）は本発明の実施の形態１の製造
方法を示す模式図。FIGS. 2A to 2G are schematic diagrams illustrating a manufacturing method according to the first embodiment of the present invention.
【図３】（ａ）は本発明で用いるポリテトラフルオロエ
チレンの化学構造式、（ｂ）はエチレンー４フッ化エチ
レン共重合体の化学構造式、（ｃ）はエチレンー４フッ
化エチレン共重合体を用いた処理工程図。3A is a chemical structural formula of a polytetrafluoroethylene used in the present invention, FIG. 3B is a chemical structural formula of an ethylene tetrafluoroethylene copolymer, and FIG. 3C is an ethylene tetrafluoroethylene copolymer FIG.
【図４】本発明の実施の形態１の磁気ヘッドを示す斜視
図（ａ）と平面図（ｂ）である。FIG. 4 is a perspective view (a) and a plan view (b) showing the magnetic head according to the first embodiment of the present invention.
【図５】本発明の実施の形態２の磁気ヘッドの構成を示
す斜視図（ａ）と平面図（ｂ）である。FIGS. 5A and 5B are a perspective view and a plan view showing a configuration of a magnetic head according to a second embodiment of the present invention; FIGS.
【図６】（ａ）〜（ｉ）は、本発明の実施の形態２の製
造方法を示す模式図である。FIGS. 6A to 6I are schematic diagrams illustrating a manufacturing method according to a second embodiment of the present invention.
【図７】本発明の実施の形態２の磁気ヘッドを示す斜視
図である。FIG. 7 is a perspective view showing a magnetic head according to a second embodiment of the present invention.
【図８】本発明の実施の形態３の磁気ヘッドの構成を示
す斜視図である。FIG. 8 is a perspective view showing a configuration of a magnetic head according to a third embodiment of the present invention.
【図９】（ａ）〜（ｅ）は本発明の実施の形態３の製造
方法を示す模式図である。FIGS. 9A to 9E are schematic diagrams illustrating a manufacturing method according to a third embodiment of the present invention.
【図１０】（ａ）〜（ｅ）は本発明の実施の形態３の製
造方法を示す模式図である。FIGS. 10A to 10E are schematic diagrams illustrating a manufacturing method according to a third embodiment of the present invention.
【図１１】本発明の実施の形態３の製造方法を示す模式
図である。FIG. 11 is a schematic view illustrating a manufacturing method according to a third embodiment of the present invention.
【図１２】本発明の実施の形態４の磁気ヘッドを示す模
式図である。FIG. 12 is a schematic diagram showing a magnetic head according to a fourth embodiment of the present invention.
【図１３】本発明の実施の形態４の磁気ヘッドを組み込
んだ磁気記録再生装置示す模式図である。FIG. 13 is a schematic diagram showing a magnetic recording / reproducing apparatus incorporating a magnetic head according to a fourth embodiment of the present invention.
【図１４】従来例の磁気ヘッドを示す斜視図（ａ）と平
面図（ｂ）である。14A and 14B are a perspective view and a plan view showing a conventional magnetic head.
１１，４１，５１，８１ 金属磁性膜 １２，４２，５２，８２ 非磁性基板 １３，４３ 溝に埋め込んだテトラフルオロエタン １４，５４ 磁気ギャップ １５，４５，５５ 巻き線窓 １６ 実施例１−１の磁気ヘッド ２１ 比較例１−１の磁気ヘッド ２２ 磁気ヘッドの摺動面 ２３，６２，９２，１０２ 溝 ２４ 溝を持つ比較例１−２の磁気ヘッド ２５ ポリテトラフルオロエチレンの水ディスパージョ
ン液 ２６，６７ ポリテトラフルオロエチレンの膜 ２７ 摺動面研磨前の実施例１−１の磁気ヘッド ３１ ポリテトラフルオロエチレンの構造式 ３２ エチレンー４フッ化エチレン共重合の構造式 ４６ 実施の形態１−３の磁気ヘッド ５３ ポリテトラフルオロエチレンを含む多孔性ガラス ５６ 実施の形態２−１の磁気ヘッド ６１ 比較例２−１の磁気ヘッド ６３ 比較例２−２の磁気ヘッド ６４ 流し込まれたホウケイ酸ガラス ６５ 層分離したホウケイ酸ガラス ６６ 作製した多孔性ガラス ７１ ガラス ７２ クラック中のポリテトラフルオロエチレン膜 ８３ 実施の形態３−１の磁気ヘッド ８４ 細孔中のポリテトラフルオロエチレン膜 ８５ 陽極酸化細胞膜 ８６ ポリテトラフルオロエチレンを含む陽極酸化膜 ９１，１０１ 磁気ヘッド ９３，１０３ 比較例３−１の磁気ヘッド ９４ 陽極酸化膜 １０４ ニッケル無電解メッキ膜 １０５ 実施の形態３−３の磁気ヘッド １１１ ウエファー １１２ バー １１３ バー上の溝 １１４ ポリテトラフルオロエチレンを含む多孔性膜 １１５ チップ切断 １２１ バルク型磁気ヘッド １２２ ＭＩＧ型磁気ヘッド １２３ 積層型磁気ヘッド １３１ 本発明の磁気ヘッド １３２ 磁気テープ １３３ 回転ドラム11, 41, 51, 81 Metal magnetic film 12, 42, 52, 82 Nonmagnetic substrate 13, 43 Tetrafluoroethane embedded in groove 14, 54 Magnetic gap 15, 45, 55 Winding window 16 Example 1-1 Magnetic head 21 Magnetic head of Comparative example 1-1 22 Sliding surface of magnetic head 23, 62, 92, 102 Groove 24 Magnetic head of Comparative example 1-2 having groove 25 Water dispersion liquid of polytetrafluoroethylene 26, 67 Film of polytetrafluoroethylene 27 Magnetic head of Example 1-1 before sliding surface polishing 31 Structural formula of polytetrafluoroethylene 32 Structural formula of ethylene-tetrafluoroethylene copolymer 46 Magnetism of Embodiment 1-3 Head 53 Porous glass containing polytetrafluoroethylene 56 Magnetic head of embodiment 2-1 61 Magnetic head of comparative example 2-1 Magnetic head 63 magnetic head of Comparative Example 2-2 64 borosilicate glass poured 65 borosilicate glass separated into layers 66 produced porous glass 71 glass 72 polytetrafluoroethylene film in crack 83 of Embodiment 3-1 Magnetic head 84 Polytetrafluoroethylene film in pores 85 Anodized cell film 86 Anodized film containing polytetrafluoroethylene 91,101 Magnetic head 93,103 Magnetic head of comparative example 3-1 94 Anodized film 104 Nickel electroless Plating film 105 Magnetic head of Embodiment 3-3 111 Wafer 112 Bar 113 Groove on bar 114 Porous film containing polytetrafluoroethylene 115 Chip cutting 121 Bulk magnetic head 122 MIG magnetic head 123 Multilayer magnetic head 131 Of the present invention Air head 132 the magnetic tape 133 rotary drum
【手続補正書】[Procedure amendment]
【提出日】平成１３年３月８日（２００１．３．８）[Submission date] March 8, 2001 (2001.3.8)
【手続補正１】[Procedure amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】図面の簡単な説明[Correction target item name] Brief description of drawings
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【図面の簡単な説明】[Brief description of the drawings]
【図１】（ａ）は本発明の実施の形態１の磁気ヘッドの
構成を示す斜視図、（ｂ）は同平面図。FIG. 1A is a perspective view showing a configuration of a magnetic head according to a first embodiment of the present invention, and FIG. 1B is a plan view thereof.
【図２Ａ】（ａ）〜（ｄ）は本発明の実施の形態１の製
造方法を示す模式図。FIGS. 2A to 2D are schematic diagrams showing a manufacturing method according to the first embodiment of the present invention.
【図２Ｂ】（ｅ）〜（ｇ）は本発明の実施の形態１の製
造方法を示す模式図。FIGS. 2E to 2G are schematic diagrams showing a manufacturing method according to the first embodiment of the present invention.
【図３】（ａ）は本発明で用いるポリテトラフルオロエ
チレンの化学構造式、（ｂ）はエチレンー４フッ化エチ
レン共重合体の化学構造式、（ｃ）はエチレンー４フッ
化エチレン共重合体を用いた処理工程図。3A is a chemical structural formula of a polytetrafluoroethylene used in the present invention, FIG. 3B is a chemical structural formula of an ethylene tetrafluoroethylene copolymer, and FIG. 3C is an ethylene tetrafluoroethylene copolymer FIG.
【図４】本発明の実施の形態１の磁気ヘッドを示す斜視
図（ａ）と平面図（ｂ）である。FIG. 4 is a perspective view (a) and a plan view (b) showing the magnetic head according to the first embodiment of the present invention.
【図５】本発明の実施の形態２の磁気ヘッドの構成を示
す斜視図（ａ）と平面図（ｂ）である。FIGS. 5A and 5B are a perspective view and a plan view showing a configuration of a magnetic head according to a second embodiment of the present invention; FIGS.
【図６Ａ】（ａ）〜（ｅ）は、本発明の実施の形態２の
製造方法を示す模式図である。FIGS. 6A to 6E are schematic diagrams illustrating a manufacturing method according to a second embodiment of the present invention.
【図６Ｂ】（ｆ）〜（ｉ）は、本発明の実施の形態２の
製造方法を示す模式図である。FIGS. 6F to 6I are schematic diagrams illustrating a manufacturing method according to a second embodiment of the present invention.
【図７】本発明の実施の形態２の磁気ヘッドを示す斜視
図である。FIG. 7 is a perspective view showing a magnetic head according to a second embodiment of the present invention.
【図８】本発明の実施の形態３の磁気ヘッドの構成を示
す斜視図である。FIG. 8 is a perspective view showing a configuration of a magnetic head according to a third embodiment of the present invention.
【図９】（ａ）〜（ｅ）は本発明の実施の形態３の製造
方法を示す模式図である。FIGS. 9A to 9E are schematic diagrams illustrating a manufacturing method according to a third embodiment of the present invention.
【図１０】（ａ）〜（ｅ）は本発明の実施の形態３の製
造方法を示す模式図である。FIGS. 10A to 10E are schematic diagrams illustrating a manufacturing method according to a third embodiment of the present invention.
【図１１】本発明の実施の形態３の製造方法を示す模式
図である。FIG. 11 is a schematic view illustrating a manufacturing method according to a third embodiment of the present invention.
【図１２】本発明の実施の形態４の磁気ヘッドを示す模
式図である。FIG. 12 is a schematic diagram showing a magnetic head according to a fourth embodiment of the present invention.
【図１３】本発明の実施の形態４の磁気ヘッドを組み込
んだ磁気記録再生装置示す模式図である。FIG. 13 is a schematic diagram showing a magnetic recording / reproducing apparatus incorporating a magnetic head according to a fourth embodiment of the present invention.
【図１４】従来例の磁気ヘッドを示す斜視図（ａ）と平
面図（ｂ）である。14A and 14B are a perspective view and a plan view showing a conventional magnetic head.
【符号の説明】 １１，４１，５１，８１ 金属磁性膜 １２，４２，５２，８２ 非磁性基板 １３，４３ 溝に埋め込んだテトラフルオロエタン １４，５４ 磁気ギャップ １５，４５，５５ 巻き線窓 １６ 実施例１−１の磁気ヘッド ２１ 比較例１−１の磁気ヘッド ２２ 磁気ヘッドの摺動面 ２３，６２，９２，１０２ 溝 ２４ 溝を持つ比較例１−２の磁気ヘッド ２５ ポリテトラフルオロエチレンの水ディスパージョ
ン液 ２６，６７ ポリテトラフルオロエチレンの膜 ２７ 摺動面研磨前の実施例１−１の磁気ヘッド ３１ ポリテトラフルオロエチレンの構造式 ３２ エチレンー４フッ化エチレン共重合の構造式 ４６ 実施の形態１−３の磁気ヘッド ５３ ポリテトラフルオロエチレンを含む多孔性ガラス ５６ 実施の形態２−１の磁気ヘッド ６１ 比較例２−１の磁気ヘッド ６３ 比較例２−２の磁気ヘッド ６４ 流し込まれたホウケイ酸ガラス ６５ 層分離したホウケイ酸ガラス ６６ 作製した多孔性ガラス ７１ ガラス ７２ クラック中のポリテトラフルオロエチレン膜 ８３ 実施の形態３−１の磁気ヘッド ８４ 細孔中のポリテトラフルオロエチレン膜 ８５ 陽極酸化細胞膜 ８６ ポリテトラフルオロエチレンを含む陽極酸化膜 ９１，１０１ 磁気ヘッド ９３，１０３ 比較例３−１の磁気ヘッド ９４ 陽極酸化膜 １０４ ニッケル無電解メッキ膜 １０５ 実施の形態３−３の磁気ヘッド １１１ ウエファー １１２ バー １１３ バー上の溝 １１４ ポリテトラフルオロエチレンを含む多孔性膜 １１５ チップ切断 １２１ バルク型磁気ヘッド １２２ ＭＩＧ型磁気ヘッド １２３ 積層型磁気ヘッド １３１ 本発明の磁気ヘッド １３２ 磁気テープ １３３ 回転ドラム[Description of Signs] 11, 41, 51, 81 Metallic magnetic film 12, 42, 52, 82 Nonmagnetic substrate 13, 43 Tetrafluoroethane embedded in groove 14, 54 Magnetic gap 15, 45, 55 Winding window 16 Implementation Magnetic head of Example 1-1 21 Magnetic head of Comparative example 1-1 22 Sliding surface of magnetic head 23, 62, 92, 102 Groove 24 Magnetic head of Comparative example 1-2 having grooves 25 Water of polytetrafluoroethylene Dispersion liquid 26,67 Polytetrafluoroethylene film 27 Magnetic head of Example 1-1 before sliding surface polishing 31 Structural formula of polytetrafluoroethylene 32 Structural formula of ethylene-tetrafluoroethylene copolymer 46 Embodiment 1-3 Magnetic Head 53 Porous Glass Containing Polytetrafluoroethylene 56 Magnetic Head 61 of Embodiment 2-1 Magnetic Head of Comparative Example 2-1 63 Magnetic Head of Comparative Example 2-2 64 Borosilicate Glass Poured 65 Layered Borosilicate Glass 66 Porous Glass Prepared 71 Glass 72 Polytetrafluoroethylene Film in Crack 83 Magnetic head of embodiment 3-1 84 Polytetrafluoroethylene film in pores 85 Anodized cell film 86 Anodized film containing polytetrafluoroethylene 91,101 Magnetic head 93,103 Magnetic head 94 of comparative example 3-1 Anode Oxide film 104 Nickel electroless plating film 105 Magnetic head of embodiment 3-3 111 Wafer 112 Bar 113 Groove on bar 114 Porous film containing polytetrafluoroethylene 115 Chip cutting 121 Bulk type magnetic head 122 MIG type magnetic head 123 laminated magnetic head 31 magnetic head 132 the magnetic tape 133 a rotary drum of the invention
フロントページの続き (72)発明者 那須 昌吾 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 Ｆターム(参考） 5D111 BB25 BB28 BB38 BB48 DD02 DD23 FF04 FF33 GG14 JJ03 JJ13 JJ17 JJ22 KK07 KK08Continuation of the front page (72) Inventor Shogo Nasu 1006 Kazuma Kadoma, Osaka Prefecture F term in Matsushita Electric Industrial Co., Ltd. (reference) 5D111 BB25 BB28 BB38 BB48 DD02 DD23 FF04 FF33 GG14 JJ03 JJ13 JJ17 JJ22 KK07 KK08
Claims (26)
生を行う磁気ヘッドにおいて、磁気媒体と相対する磁気
ヘッド摺動面に溝を形成し、前記溝内部に少なくともフ
ッ素樹脂を充填したことを特徴とする磁気ヘッド。In a magnetic head for performing magnetic recording and reproduction by moving relative to a magnetic medium, a groove is formed on a sliding surface of the magnetic head facing the magnetic medium, and at least a fluorine resin is filled in the groove. Characteristic magnetic head.
ン（ＰＴＦＥ）及びテトラフルオロエチレン−エチレン
共重合体（ＰＥＴＦＥ）から選ばれる少なくとも一つの
樹脂である請求項１に記載の磁気ヘッド。2. The magnetic head according to claim 1, wherein the fluororesin is at least one resin selected from polytetrafluoroethylene (PTFE) and tetrafluoroethylene-ethylene copolymer (PETFE).
に記載の磁気ヘッド。3. The groove depth is greater than the gap depth.
3. The magnetic head according to claim 1.
る請求項１〜３のいずれかに記載の磁気ヘッド。4. The magnetic head according to claim 1, wherein the fluororesin is held in a porous material.
に記載の磁気ヘッド。5. The porous material is a porous glass.
3. The magnetic head according to claim 1.
の表面に形成したクラック内に保持されている請求項１
または２に記載の磁気ヘッド。6. The method according to claim 1, wherein the fluorine resin is held in a crack formed on the surface of the glass filled in the groove.
Or the magnetic head according to 2.
ガラスの空気泡内に保持されている請求項１または２に
記載の磁気ヘッド。7. The magnetic head according to claim 1, wherein the fluororesin is held in air bubbles of foamable glass filled in the groove.
との網目構造体に保持されている請求項１または２に記
載の磁気ヘッド。8. The magnetic head according to claim 1, wherein the fluororesin is held in a network structure with glass filled in the groove.
８に記載の磁気ヘッド。9. The magnetic head according to claim 8, wherein the network structure includes graphite.
ウム被膜の細孔に保持されている請求項１または２に記
載の磁気ヘッド。10. The magnetic head according to claim 1, wherein the fluororesin is held in pores of the aluminum oxide film having pores.
孔内に保持されている請求項１または２に記載の磁気ヘ
ッド。11. The magnetic head according to claim 1, wherein the fluororesin is held in a hole of the porous chromium plating film.
子間に粒子状で保持されている請求項１または２に記載
の磁気ヘッド。12. The magnetic head according to claim 1, wherein the fluororesin is held in a particulate state between the particles of the particulate nickel layer.
孔に保持されている請求項１または２に記載の磁気ヘッ
ド。13. The magnetic head according to claim 1, wherein the fluororesin is held in pores of the porous ceramic film.
れてなる磁気コア半体を、その端面同士が対向するよう
に配置して磁気ギャップを形成した磁気ヘッドの磁気媒
体と相対する基板上に溝を形成した請求項１〜１３のい
ずれかに記載の磁気ヘッド。14. A magnetic core half comprising a metal magnetic film sandwiched between a pair of substrates is disposed on a substrate facing a magnetic medium of a magnetic head in which a magnetic gap is formed by arranging the magnetic core halves to face each other. 14. The magnetic head according to claim 1, wherein a groove is formed.
コア含むように、ヘッド走行方向に斜めに溝を形成した
請求項１４に記載の磁気ヘッド。15. The magnetic head according to claim 14, wherein a groove is formed obliquely in the head traveling direction so as to include the magnetic core and the surface of the substrate that slides against the magnetic medium.
の溝加工でギャップエッヂをトリミングしてギャップ幅
を規制した請求項１５に記載の磁気ヘッド。16. The magnetic head according to claim 15, wherein a groove is formed obliquely in the head running direction, and the gap width is regulated by trimming a gap edge by the groove processing.
再生を行う磁気ヘッドの製造方法において、磁気媒体と
相対磁気ヘッド摺動面に溝を形成し、前記溝内部に多孔
性物質または無機粒子を充填し、前記多孔性物質または
無機粒子間にフッ素樹脂粒子の水ディスパージョン液を
浸透させ、乾燥後加熱焼結して多孔性物質孔内に固着さ
せることを特徴とする磁気ヘッドの製造方法。17. A method of manufacturing a magnetic head for performing magnetic recording and reproduction by moving relative to a magnetic medium, wherein a groove is formed on a sliding surface of the magnetic medium and the relative magnetic head, and a porous substance or inorganic particles are formed inside the groove. Filling the porous material or the inorganic particles with a water dispersion liquid of fluororesin particles, drying and heating and sintering to fix the particles in the porous material holes. .
ラフルオロエチレン（ＰＴＦＥ）の場合は３５０〜４０
０℃の範囲、テトラフルオロエチレン−エチレン共重合
体（ＰＥＴＦＥ）の場合は３００〜３５０℃の範囲であ
る請求項１７に記載の磁気ヘッドの製造方法。18. When the heating and sintering temperature of the fluororesin is polytetrafluoroethylene (PTFE), it is 350 to 40.
The method for manufacturing a magnetic head according to claim 17, wherein the temperature is in a range of 0C, and in the case of tetrafluoroethylene-ethylene copolymer (PETFE), the temperature is in a range of 300 to 350C.
に充填し酸処理で空孔を作製した多孔性ガラスである請
求項１７に記載の磁気ヘッドの製造方法。19. The method for manufacturing a magnetic head according to claim 17, wherein the porous material is a porous glass in which borosilicate glass is filled in a groove and holes are formed by an acid treatment.
性ガラスを溝内に圧入して組み込む請求項１７に記載の
磁気ヘッドの製造方法。20. The method for manufacturing a magnetic head according to claim 17, wherein the porous substance is porous glass, and the porous glass is press-fitted into the groove and incorporated.
たガラスであり、溝にガラスを充填しガラス表面をＮａ
蒸気に暴露しクラックを形成する請求項１７に記載の磁
気ヘッドの製造方法。21. The porous substance is glass having a crack formed on the surface, the groove is filled with glass, and the glass surface is made of Na.
The method for manufacturing a magnetic head according to claim 17, wherein cracks are formed by exposing to a vapor.
発泡性ガラスを圧入する請求項１７に記載の磁気ヘッド
の製造方法。22. The method of manufacturing a magnetic head according to claim 17, wherein the porous substance is foamable glass, and the foamable glass is press-fitted into the groove.
子とを含む材料を流し込み、３００℃〜４００℃の範囲
の温度に加熱焼結して固着する請求項１７に記載の磁気
ヘッドの製造方法。23. The method of manufacturing a magnetic head according to claim 17, wherein a material containing a fluororesin and at least glass particles is poured into the groove and is heated and sintered at a temperature in the range of 300 ° C. to 400 ° C. for fixing.
り、上記溝に陽極酸化法による酸化アルミニウム被膜を
設けた請求項１７に記載の磁気ヘッドの製造方法。24. The method of manufacturing a magnetic head according to claim 17, wherein the porous material is an alumina anodic oxide film, and the groove is provided with an aluminum oxide film by an anodic oxidation method.
キ層を成長させ、さらに無電解ニッケルメッキ層上に、
フッ素樹脂粒子を吸着させ、２５０℃〜４００℃の範囲
の温度に加熱し、無電解ニッケルメッキ粒子間に前記フ
ッ素樹脂を浸透かつ焼結させる請求項１７に記載の磁気
ヘッドの製造方法。25. A particulate electroless nickel plating layer is grown in the groove, and further on the electroless nickel plating layer,
The method of manufacturing a magnetic head according to claim 17, wherein the fluororesin particles are adsorbed, heated to a temperature in the range of 250C to 400C, and the fluororesin is permeated and sintered between the electroless nickel plated particles.
再生する形式の磁気記録再生装置において、前記磁気ヘ
ッドが請求項１〜１６のいずれかに記載の磁気ヘッドま
たは請求項１７〜２５のいずれかの方法によって得られ
た磁気ヘッドであることを特徴とする磁気記録再生装
置。26. A magnetic recording / reproducing apparatus of a type in which information is recorded / reproduced by using a magnetic head and a magnetic medium, wherein the magnetic head is the magnetic head according to any one of claims 1 to 16, or the magnetic head according to any of claims 17 to 25 A magnetic recording / reproducing apparatus characterized in that it is a magnetic head obtained by the method of (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001045698A JP2002251704A (en) | 2001-02-21 | 2001-02-21 | Magnetic head, manufacturing method therefor and magnetic recording and reproducing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001045698A JP2002251704A (en) | 2001-02-21 | 2001-02-21 | Magnetic head, manufacturing method therefor and magnetic recording and reproducing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002251704A true JP2002251704A (en) | 2002-09-06 |
Family
ID=18907437
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001045698A Pending JP2002251704A (en) | 2001-02-21 | 2001-02-21 | Magnetic head, manufacturing method therefor and magnetic recording and reproducing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002251704A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8035919B2 (en) | 2008-12-15 | 2011-10-11 | Tdk Corporation | Multi-channel thin-film magnetic head, magnetic tape drive apparatus with the multi-channel thin-film magnetic head and manufacturing method of multi-channel thin-film magnetic head |
-
2001
- 2001-02-21 JP JP2001045698A patent/JP2002251704A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8035919B2 (en) | 2008-12-15 | 2011-10-11 | Tdk Corporation | Multi-channel thin-film magnetic head, magnetic tape drive apparatus with the multi-channel thin-film magnetic head and manufacturing method of multi-channel thin-film magnetic head |
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