JP2002248357A - Method for manufacturing plate type catalyst and plate type catalyst - Google Patents
Method for manufacturing plate type catalyst and plate type catalystInfo
- Publication number
- JP2002248357A JP2002248357A JP2001052227A JP2001052227A JP2002248357A JP 2002248357 A JP2002248357 A JP 2002248357A JP 2001052227 A JP2001052227 A JP 2001052227A JP 2001052227 A JP2001052227 A JP 2001052227A JP 2002248357 A JP2002248357 A JP 2002248357A
- Authority
- JP
- Japan
- Prior art keywords
- catalyst
- type catalyst
- plate
- coating
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003054 catalyst Substances 0.000 title claims abstract description 81
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title description 10
- 239000000758 substrate Substances 0.000 claims abstract description 32
- 239000008199 coating composition Substances 0.000 claims abstract description 25
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000011230 binding agent Substances 0.000 claims abstract description 12
- 238000010304 firing Methods 0.000 claims abstract description 11
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 claims abstract description 10
- 239000004354 Hydroxyethyl cellulose Substances 0.000 claims abstract description 10
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 claims abstract description 10
- 229910001220 stainless steel Inorganic materials 0.000 claims description 18
- 239000010935 stainless steel Substances 0.000 claims description 18
- 239000002562 thickening agent Substances 0.000 claims description 11
- 238000005245 sintering Methods 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 22
- 239000011248 coating agent Substances 0.000 abstract description 19
- 230000003197 catalytic effect Effects 0.000 abstract description 6
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 20
- 238000000629 steam reforming Methods 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 9
- 229910052707 ruthenium Inorganic materials 0.000 description 9
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 239000010948 rhodium Substances 0.000 description 8
- 238000003618 dip coating Methods 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 229910052703 rhodium Inorganic materials 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000006477 desulfuration reaction Methods 0.000 description 3
- 230000023556 desulfurization Effects 0.000 description 3
- 238000005265 energy consumption Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000005984 hydrogenation reaction Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- IVORCBKUUYGUOL-UHFFFAOYSA-N 1-ethynyl-2,4-dimethoxybenzene Chemical compound COC1=CC=C(C#C)C(OC)=C1 IVORCBKUUYGUOL-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000007766 curtain coating Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 239000001863 hydroxypropyl cellulose Substances 0.000 description 2
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000007751 thermal spraying Methods 0.000 description 2
- 238000002233 thin-film X-ray diffraction Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- OHVLMTFVQDZYHP-UHFFFAOYSA-N 1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-2-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound N1N=NC=2CN(CCC=21)C(CN1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)=O OHVLMTFVQDZYHP-UHFFFAOYSA-N 0.000 description 1
- IHCCLXNEEPMSIO-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 IHCCLXNEEPMSIO-UHFFFAOYSA-N 0.000 description 1
- WZRJTRPJURQBRM-UHFFFAOYSA-N 4-amino-n-(5-methyl-1,2-oxazol-3-yl)benzenesulfonamide;5-[(3,4,5-trimethoxyphenyl)methyl]pyrimidine-2,4-diamine Chemical compound O1C(C)=CC(NS(=O)(=O)C=2C=CC(N)=CC=2)=N1.COC1=C(OC)C(OC)=CC(CC=2C(=NC(N)=NC=2)N)=C1 WZRJTRPJURQBRM-UHFFFAOYSA-N 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- -1 ammonium carboxylate Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- UPHIPHFJVNKLMR-UHFFFAOYSA-N chromium iron Chemical compound [Cr].[Fe] UPHIPHFJVNKLMR-UHFFFAOYSA-N 0.000 description 1
- WHDPTDWLEKQKKX-UHFFFAOYSA-N cobalt molybdenum Chemical compound [Co].[Co].[Mo] WHDPTDWLEKQKKX-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 229920003063 hydroxymethyl cellulose Polymers 0.000 description 1
- 229940031574 hydroxymethyl cellulose Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- DDTIGTPWGISMKL-UHFFFAOYSA-N molybdenum nickel Chemical compound [Ni].[Mo] DDTIGTPWGISMKL-UHFFFAOYSA-N 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 238000005504 petroleum refining Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- BIXNGBXQRRXPLM-UHFFFAOYSA-K ruthenium(3+);trichloride;hydrate Chemical compound O.Cl[Ru](Cl)Cl BIXNGBXQRRXPLM-UHFFFAOYSA-K 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- ZTWIEIFKPFJRLV-UHFFFAOYSA-K trichlororuthenium;trihydrate Chemical compound O.O.O.Cl[Ru](Cl)Cl ZTWIEIFKPFJRLV-UHFFFAOYSA-K 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Hydrogen, Water And Hydrids (AREA)
- Catalysts (AREA)
- Production Of Liquid Hydrocarbon Mixture For Refining Petroleum (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、特定のコーティン
グ用組成物を使用する、プレート型触媒の製造方法およ
びプレート型触媒に関するものであり、詳しくは、１回
のコーティングにより多くの付着量を得られるコーティ
ング用組成物を使用した水蒸気改質用のプレート型触媒
の製造方法およびプレート型触媒に関するBACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a plate catalyst and a plate catalyst using a specific coating composition. The present invention relates to a method for producing a plate-type catalyst for steam reforming using a coating composition to be obtained, and a plate-type catalyst.
【０００２】[0002]
【従来の技術】従来、反応器中で、触媒を使用して、水
蒸気改質、水素化、脱硫、燃焼、ＣＯ変性、部分酸化な
どさまざまな反応が行われている。なかでも、水蒸気改
質反応は、石油精製や、化学工業、電子工業などに使用
される他に、クリーン燃料として燃料電池などへの需要
が増加している水素の製造方法として重要視されてい
る。水蒸気改質法は、天然ガスやナフサを原料とするも
のであり、通常は、反応温度が８００〜９００℃と高温
であるため、エネルギー消費量が多く、改質ガス中に二
酸化炭素が多く含まれる問題がある。そして、ジルコニ
ア（ＺｒＯ2）を担体とした、ロジウム（Ｒｈ）触媒ま
たはルテニウム（Ｒｕ）触媒は、低温で、低水蒸気比で
優れた触媒性能を発揮し、かつ長寿命であることが知ら
れている。2. Description of the Related Art Conventionally, various reactions such as steam reforming, hydrogenation, desulfurization, combustion, CO modification, and partial oxidation have been carried out in a reactor using a catalyst. Among them, the steam reforming reaction is used as a method for producing hydrogen, which is used in petroleum refining, the chemical industry, the electronics industry, and the like, and is increasing in demand for fuel cells and the like as a clean fuel. . The steam reforming method uses natural gas or naphtha as a raw material, and usually has a high reaction temperature of 800 to 900 ° C., and thus consumes a large amount of energy and contains a large amount of carbon dioxide in the reformed gas. Problem. A rhodium (Rh) or ruthenium (Ru) catalyst using zirconia (ZrO 2 ) as a carrier is known to exhibit excellent catalytic performance at a low temperature, a low water vapor ratio, and a long life. I have.
【０００３】また、上記水蒸気改質などの反応を行う場
合、反応器中への触媒の設置方法としては、充填層型と
管壁型に分けられる。充填層型反応器は、触媒成分を担
持したペレット状などの触媒を反応器中に充填し、反応
ガスを通過させるものであり、圧力損失が大きく、負荷
応答性が悪い問題がある。また、反応器壁面から加熱伝
熱するため、反応器中央部では温度が低くなり、温度勾
配が急となり、反応器中で反応温度を一定に保つことが
難しい。一方、管壁型反応器は、反応器壁面上にプレー
ト型触媒面を形成させ、反応ガスを通過させるものであ
り、反応器壁面からの伝熱特性が良好であり、かつ、圧
力損失の低減、負荷応答性の向上、エネルギー消費の低
減に効果がある。[0003] When performing the above-mentioned reaction such as steam reforming, the method of installing the catalyst in the reactor is divided into a packed bed type and a tube wall type. A packed-bed reactor is a reactor in which a catalyst such as a pellet supporting a catalyst component is charged into the reactor and a reaction gas is passed therethrough, and has a problem that pressure loss is large and load response is poor. In addition, since heat is transferred from the reactor wall surface, the temperature decreases in the central portion of the reactor, the temperature gradient becomes steep, and it is difficult to keep the reaction temperature constant in the reactor. On the other hand, the tube wall type reactor has a plate-type catalyst surface formed on the reactor wall surface and allows the reaction gas to pass through, and has good heat transfer characteristics from the reactor wall surface and reduced pressure loss. This is effective in improving load response and reducing energy consumption.
【０００４】上記管壁型反応器に使用されるプレート型
触媒は、基板へ触媒成分を付着させて製造されるもので
あり、触媒成分の付着方法としては、圧着法、ディップ
コーティング法、スプレーコーティング法、セルコーテ
ィング法、ブレードコーティング法、バーコーティング
法、ロールコーティング法、カーテンコーティング法、
ウオッシュコート法、めっき法（浸漬、溶解、無電
解）、溶射法（プラズマ、サーモ）、陽極酸化法などが
ある。なかでも、ディップコーティング法は、コーティ
ング操作が比較的容易であり、コーティング液にディッ
ピング（浸漬）されたところは、複雑な形状の表面でも
均一な厚みの触媒層が得られ、また、比較的安価に製造
できるなどの利点を有する。[0004] The plate-type catalyst used in the tube wall type reactor is manufactured by attaching a catalyst component to a substrate, and the catalyst component can be attached by a pressure bonding method, a dip coating method, a spray coating method or the like. Method, cell coating method, blade coating method, bar coating method, roll coating method, curtain coating method,
Wash coating, plating (immersion, dissolution, electroless), thermal spraying (plasma, thermo), anodic oxidation, and the like. Above all, the dip coating method is relatively easy to perform a coating operation, and when dipped (immersed) in a coating solution, a catalyst layer having a uniform thickness can be obtained even on a surface having a complicated shape, and is relatively inexpensive. It has the advantage that it can be manufactured in a short time.
【０００５】しかし、従来のディップコーティング法に
おいては、１回のコーティングで得られる付着量に限界
があり、付着量を大きくするにはディップコーティング
を何回も繰り返す必要があり、効率が悪い。また、基板
への密着性が悪いため、触媒層の亀裂、剥離が起きやす
く、さらにディップコーティング法を適用する基材とし
て、ガラスに限定されているものが多く、ステンレス、
樹脂などの他の素材への適用が困難である、などの問題
がある。ここで、ＲｈまたはＲｕ触媒／ＺｒＯ2担体を
触媒成分とする、付着量の多いプレート型触媒が、容易
に製造可能であれば、触媒効率に優れ、装置のコンパク
ト化およびコストダウンを可能にすることのでき、結果
的にエネルギー消費の少ない水蒸気改質反応が期待され
る。[0005] However, in the conventional dip coating method, there is a limit to the amount of adhesion obtained by one coating, and to increase the amount of adhesion, it is necessary to repeat dip coating many times, which is inefficient. In addition, because of poor adhesion to the substrate, cracking of the catalyst layer, peeling is likely to occur, furthermore, the substrate to which the dip coating method is applied is often limited to glass, stainless steel,
It is difficult to apply to other materials such as resin. Here, if a plate-type catalyst having a large amount of adhesion and comprising a Rh or Ru catalyst / ZrO 2 carrier as a catalyst component can be easily manufactured, the catalyst efficiency is excellent, and the apparatus can be made compact and the cost can be reduced. As a result, a steam reforming reaction with low energy consumption is expected.
【０００６】[0006]
【発明が解決しようとする課題】本発明は、上記問題点
を解決し、１回のコーティングで充分な付着量を得るこ
とができるコーティング用組成物を使用したプレート型
触媒の製造方法、ならびに、密着性に優れ、優れた触媒
性能を有し、装置のコンパクト化およびコストダウンを
可能にすることのできるプレート型触媒を提供すること
を、目的としている。DISCLOSURE OF THE INVENTION The present invention solves the above problems and provides a method for producing a plate-type catalyst using a coating composition capable of obtaining a sufficient coating amount by one coating, and An object of the present invention is to provide a plate-type catalyst having excellent adhesion, excellent catalytic performance, and capable of reducing the size and cost of an apparatus.
【０００７】[0007]
【課題を解決するための手段】本発明は、アルミニウム
を含有するステンレス板を焼成してプレート型触媒の基
板を作製し、この基板上に、触媒、バインダーおよび増
粘剤を含有するコーティング用組成物を塗布し、次いで
焼成することを特徴とするプレート型触媒の製造方法に
関するものである。上記基板は、アルミニウムを含有す
るステンレス板を１，０００〜１，１５０℃で焼成した
ものであることが好ましい。また、上記増粘剤は、ヒド
ロキシエチルセルロースであることが好ましい。さら
に、上記コーティング用組成物の焼成温度は、５００〜
６００℃であることが好ましい。また、本発明は、上記
プレート型触媒の製造方法により製造されたプレート型
触媒に関するものである。According to the present invention, a plate-type catalyst substrate is prepared by firing a stainless steel plate containing aluminum, and a coating composition containing a catalyst, a binder and a thickener is formed on the substrate. The present invention relates to a method for producing a plate-type catalyst, which comprises applying a product and then firing the product. It is preferable that the substrate is obtained by firing a stainless steel plate containing aluminum at 1,000 to 1,150 ° C. Further, the thickener is preferably hydroxyethyl cellulose. Further, the firing temperature of the coating composition is 500 to
Preferably it is 600 ° C. The present invention also relates to a plate-type catalyst manufactured by the above-described method for manufacturing a plate-type catalyst.
【０００８】[0008]
【発明の実施の形態】本発明は、アルミニウムを含有す
るステンレス板を焼成してプレート型触媒の基板を作製
し、この基板上に、コーティング用組成物を塗布し、次
いで焼成することを特徴とするプレート型触媒の製造方
法に関する。アルミニウムを含有するステンレス基板と
しては、具体的には、カルソニック（株）製、２０Ｃｒ
−Ａｌ，ＨＴステンレスなどが挙げられる。BEST MODE FOR CARRYING OUT THE INVENTION The present invention is characterized in that a stainless steel plate containing aluminum is fired to prepare a plate-type catalyst substrate, a coating composition is applied on the substrate, and then fired. To a method for producing a plate-type catalyst. As a stainless steel substrate containing aluminum, specifically, 20Cr manufactured by Calsonic Corporation
-Al, HT stainless steel and the like.
【０００９】ステンレス基板の焼成（前処理）条件は、
好ましくは１，０００〜１，１５０℃で１〜３時間、さ
らに好ましくは１，０５０〜１，１５０℃で１〜３時
間、特に好ましくは１，１００〜１，１５０℃で１〜３
時間である。上記範囲内で焼成を行うと、ステンレス基
板表面に、酸化アルミニウムが析出し、基板表面が粗面
化するため、コーティング用組成物の付着量が増加す
る。図１に、アルミニウムを５重量％含有するステンレ
ス基板を、１，１５０℃、１，０３０℃、９２５℃で、
２時間焼成して得られた粗面化ステンレス基板の薄膜法
Ｘ線回折図を、縦軸に回折強度〔ＣＰＳ〕、回折角〔２
θ／ｄｅｇ〕をとり、縦軸に温度をずらして示す。１，
１５０℃で焼成したステンレス板には、析出した酸化ア
ルミニウム（Ａｌ2Ｏ3）による鋭いピークが表れ、１，
０３０℃で焼成したステンレス板にも、ピークが見られ
るが、９２５℃で焼成したステンレス板には、ピークが
ほとんど見られない。このことから、約１，０００℃以
上で酸化アルミニウムが析出すると考えられる。The firing (pretreatment) conditions for the stainless steel substrate are as follows:
Preferably at 1,000 to 1,150 ° C for 1 to 3 hours, more preferably at 1,050 to 1,150 ° C for 1 to 3 hours, particularly preferably at 1,100 to 1,150 ° C for 1 to 3 hours.
Time. When baking is performed within the above range, aluminum oxide precipitates on the surface of the stainless steel substrate, and the surface of the substrate is roughened, so that the adhesion amount of the coating composition increases. FIG. 1 shows a stainless steel substrate containing 5% by weight of aluminum at 1,150 ° C., 1,030 ° C., and 925 ° C.
The thin film X-ray diffraction diagram of the roughened stainless steel substrate obtained by baking for 2 hours is shown with the vertical axis representing the diffraction intensity [CPS] and the diffraction angle [2
θ / deg], and the temperature is shifted on the vertical axis. 1,
A sharp peak due to precipitated aluminum oxide (Al 2 O 3 ) appeared on the stainless steel plate fired at 150 ° C.
A peak is also seen in the stainless steel plate fired at 030 ° C., but almost no peak is seen in the stainless steel plate fired at 925 ° C. From this, it is considered that aluminum oxide precipitates at about 1,000 ° C. or higher.
【００１０】上記アルミニウムを含有するステンレス板
を焼成して作成したプレート型触媒の基板に塗布する本
発明のコーティング用組成物は、触媒、バインダー、お
よび増粘剤を含有する。上記触媒は、通常、水蒸気改
質、水素化、脱硫、燃焼、ＣＯ変成、部分酸化など、ど
のような反応に使用されるものでもよい。水蒸気改質触
媒としては、白金、ルテニウム（Ｒｕ）、ニッケル（Ｎ
ｉ）、銅（Ｃｕ）、ロジウム（Ｒｈ）などの元素を、シ
リカ、アルミナ、ジルコニア（ＺｒＯ2）などの担体に
担持したものなどが挙げられる。好ましくは、ルテニウ
ム（Ｒｕ）／ジルコニア（ＺｒＯ2）、ロジウム（Ｒ
ｈ）／ジルコニア（ＺｒＯ2）、ルテニウム（Ｒｕ）／
アルミナ（Ａｌ2Ｏ3）、ロジウム（Ｒｈ）／アルミナ
（Ａｌ2Ｏ3）である。[0010] The coating composition of the present invention, which is applied to a plate-type catalyst substrate prepared by baking the above-described aluminum-containing stainless steel plate, contains a catalyst, a binder, and a thickener. The catalyst may be used for any reaction such as steam reforming, hydrogenation, desulfurization, combustion, CO conversion, and partial oxidation. Platinum, ruthenium (Ru), nickel (N
i), an element such as copper (Cu) and rhodium (Rh) supported on a carrier such as silica, alumina and zirconia (ZrO 2 ). Preferably, ruthenium (Ru) / zirconia (ZrO 2 ), rhodium (R
h) / zirconia (ZrO 2 ), ruthenium (Ru) /
Alumina (Al 2 O 3 ), rhodium (Rh) / alumina (Al 2 O 3 ).
【００１１】水素化触媒としては、ニッケル−モリブデ
ン、コバルト−モリブデンなどの酸化物、硫化物をシリ
カやアルミナ（Ａｌ2Ｏ3）などの担体に担持したＮｉＭ
ｏｘ触媒、ＣｏＭｏｘ触媒などが挙げられる。脱硫触媒
としては、酸化亜鉛、酸化ニッケルなどが単独または担
体に担持したものが挙げられる。燃焼触媒としては、白
金、パラジウムなどをアルミナなどの担体に担持したも
のなどが挙げられる。ＣＯ変性触媒としては、白金、レ
ニウム、ルテニウムなどをジルコニア、アルミナなどの
担体に担持したものや、鉄−クロム、銅−亜鉛などの酸
化物などが挙げられる。部分酸化触媒としては、白金、
ニッケルなどをアルミナなどの担体に担持したものなど
が挙げられる。上記触媒は１種単独でもよく、２種以上
を併用してもよい。Examples of the hydrogenation catalyst include NiM in which oxides such as nickel-molybdenum and cobalt-molybdenum and sulfides are supported on a carrier such as silica or alumina (Al 2 O 3 ).
ox catalyst, CoMox catalyst and the like. Examples of the desulfurization catalyst include those in which zinc oxide, nickel oxide and the like are used alone or supported on a carrier. Examples of the combustion catalyst include those in which platinum, palladium, or the like is supported on a carrier such as alumina. Examples of the CO-modified catalyst include catalysts in which platinum, rhenium, ruthenium and the like are supported on a carrier such as zirconia and alumina, and oxides such as iron-chromium and copper-zinc. As a partial oxidation catalyst, platinum,
One in which nickel or the like is supported on a carrier such as alumina may be used. The above catalysts may be used alone or in combination of two or more.
【００１２】上記触媒の調製方法としては、例えば、水
蒸気改質触媒であるルテニウム触媒（Ｒｕ）／ジルコニ
ア担体（ＺｒＯ2）の場合、水酸化ジルコニウムと３価
の塩化ルテニウムｎ水和物を、混合物中のルテニウム
（原子）濃度が０．５重量％程度となるように混合し、
常温で１０分間撹拌した後、１００℃で２時間蒸発乾固
させ、空気中で１００℃１５時間乾燥した後、空気中で
６００℃１時間焼成して、Ｒｕ／ＺｒＯ2粉末を得るこ
とができる。As a method for preparing the above catalyst, for example, in the case of a ruthenium catalyst (Ru) / zirconia support (ZrO 2 ) which is a steam reforming catalyst, a mixture of zirconium hydroxide and trivalent ruthenium chloride n-hydrate is used. Mixing so that the ruthenium (atomic) concentration in it is about 0.5% by weight,
After stirring at room temperature for 10 minutes, the mixture is evaporated to dryness at 100 ° C. for 2 hours, dried in air at 100 ° C. for 15 hours, and then calcined in air at 600 ° C. for 1 hour to obtain a Ru / ZrO 2 powder. .
【００１３】上記触媒は、下記バインダー水溶液と混合
して使用するが、その配合割合は、触媒／バインダー水
溶液で、好ましくは１／１〜１／７、さらに好ましくは
１／４〜１／７である。触媒の割合が１／７未満である
と、触媒の付着量が少なく、一方、１／１を超えると、
得られるプレート型触媒の表面に亀裂や剥離を生じる。The above catalyst is used by being mixed with the following binder aqueous solution, and the mixing ratio thereof is catalyst / binder aqueous solution, preferably 1/1 to 1/7, more preferably 1/4 to 1/7. is there. When the ratio of the catalyst is less than 1/7, the amount of the catalyst attached is small.
Cracks and peeling occur on the surface of the obtained plate catalyst.
【００１４】本発明のコーティング用組成物のバインダ
ーとしては、通常、使用されるものでよく、例えば、ア
ルミニウム、チタニウム、ジルコニウムなどの金属酸化
物を親水性有機溶媒に分散した分散体、アルミニウム、
チタニウム、ジルコニウムなどの金属アルコキシドのア
ルコール溶液を加水分解、重縮合して得られる金属
（水）酸化物ゾルなどが挙げられる。具体的には、第一
稀元素化学工業（株）製、商品名ジルコゾールＨＡ［成
分；コロイド状ジルコニア、カルボン酸アンモニウム
塩、固形分濃度；１５重量％、中性］、ジルコゾールＺ
Ｎ［成分；コロイド状ジルコニア、硝酸塩、固形分濃
度；２５重量％、酸性］、酢酸ジルコゾール［成分；コ
ロイド状ジルコニア、酢酸塩、固形分濃度；１５重量
％、酸性］、ジルコゾールＡＣ−７〔成分；コロイド状
ジルコニア、炭酸アンモニウム、固形分濃度；１３重量
％、塩基性〕、川研ファインケミカル（株）製、商品名
アルミナクリアゾル（コロイド状アルミナ、固形分濃
度；５重量％、酸性）などが挙げられる。As the binder of the coating composition of the present invention, those usually used may be used. For example, a dispersion in which a metal oxide such as aluminum, titanium or zirconium is dispersed in a hydrophilic organic solvent, aluminum,
A metal (hydroxide) sol obtained by hydrolyzing and polycondensing an alcohol solution of a metal alkoxide such as titanium or zirconium is exemplified. Specifically, Zircosol HA (trade name) manufactured by Daiichi Kagaku Kagaku Kogyo KK [Component: colloidal zirconia, ammonium carboxylate, solid content: 15% by weight, neutral], Zircosol Z
N [component: colloidal zirconia, nitrate, solid content concentration: 25% by weight, acidic], zircosol acetate [component: colloidal zirconia, acetate, solid content concentration: 15% by weight, acidic], zircosol AC-7 [component Colloidal zirconia, ammonium carbonate, solid content: 13% by weight, basic], manufactured by Kawaken Fine Chemical Co., Ltd., trade name: alumina clear sol (colloidal alumina, solid content: 5% by weight, acidic), etc. No.
【００１５】増粘剤は、コーティングにおける厚さの増
加に効果的であり、焼成して得られるプレート型触媒表
面の亀裂、剥離の防止に効果的である。本発明のコーテ
ィング用組成物の増粘剤としては、ヒドロキシエチルセ
ルロース（ＨＥＣ）、ヒドロキシメチルセルロース（Ｈ
ＭＣ）、ヒドロキシプロピルセルロース（ＨＰＣ）など
のセルロース化合物などが挙げられる。このうち、ヒド
ロキシエチルセルロースが、触媒成分とゲル化してチク
ソトロピー（動的流動性）を発現できるため好ましい。
上記増粘剤は、１種単独でもよく、２種以上を組み合わ
せてもよい。増粘剤の添加量は、使用する触媒により異
なるが、コーティング用組成物中に、０．０１〜１０重
量％の範囲で添加するのが好ましい。０．０１重量％未
満であると、充分な増粘効果が得られず、一方、１０重
量％を超えると、膜厚が厚くなり、亀裂や剥離が生じ
る。The thickener is effective in increasing the thickness of the coating, and is effective in preventing cracking and peeling of the surface of the plate-type catalyst obtained by firing. Examples of the thickener of the coating composition of the present invention include hydroxyethyl cellulose (HEC) and hydroxymethyl cellulose (H
MC) and hydroxypropyl cellulose (HPC). Among them, hydroxyethylcellulose is preferable because it can gel with the catalyst component and exhibit thixotropy (dynamic fluidity).
The thickeners may be used alone or in combination of two or more. The amount of the thickener to be added varies depending on the catalyst used, but is preferably added to the coating composition in the range of 0.01 to 10% by weight. If it is less than 0.01% by weight, a sufficient thickening effect cannot be obtained, while if it exceeds 10% by weight, the film thickness becomes large and cracks and peeling occur.
【００１６】本発明のコーティング用組成物を基板に塗
布する方法としては、ディップコーティング法、スプレ
ーコーティング法、セルコーティング法、ブレードコー
ティング法、バーコーティング法、ロールコーティング
法、カーテンコーティング法、ウオッシュコート法、め
っき法（浸漬、溶解、無電解）、溶射法（プラズマ、サ
ーモ）、陽極酸化法などが挙げられる。なかでも、ディ
ップコーティング法が好ましい。The method for applying the coating composition of the present invention to a substrate includes dip coating, spray coating, cell coating, blade coating, bar coating, roll coating, curtain coating, and wash coating. , Plating (immersion, dissolution, electroless), thermal spraying (plasma, thermo), anodic oxidation, and the like. Especially, the dip coating method is preferable.
【００１７】本発明のコーティング用組成物を基板に塗
布した後の、焼成条件としては、好ましくは５００〜
１,０００℃で１〜３時間、さらに好ましくは５００〜
８００℃で１〜３時間、特に好ましくは５００〜７００
℃で１〜３時間である。上記範囲内で焼成を行うと、反
応活性に優れたプレート型触媒を得ることができる。After applying the coating composition of the present invention to a substrate, the firing conditions are preferably from 500 to 500.
1,000 ° C for 1 to 3 hours, more preferably 500 to
800 ° C for 1 to 3 hours, particularly preferably 500 to 700
C. for 1-3 hours. When calcination is performed within the above range, a plate-type catalyst having excellent reaction activity can be obtained.
【００１８】本発明のコーティング用組成物は、１回の
コーティングで充分な付着量を得ることができ、密着性
に優れ、優れた触媒性能を有し、装置のコンパクト化お
よびコストダウンを可能にすることのできるプレート型
触媒が製造できる。The coating composition of the present invention can provide a sufficient amount of coating by one coating, has excellent adhesiveness, has excellent catalytic performance, and can reduce the size and cost of the apparatus. And a plate-type catalyst that can be produced.
【００１９】[0019]
【実施例】以下、実施例を挙げ、本発明をさらに具体的
に説明するが、本発明は、これらの実施例により何ら限
定されるものではない。なお、実施例中の部および％
は、特に断らない限り重量部および重量％である。EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to these examples. In the examples, parts and%
Are by weight unless otherwise indicated.
【００２０】基板表面粗面評価 理学電機(株)製、Ｘ線回折装置ＲＩＮＴ−２５００−Ｖ
ＨＦを使用し、前処理焼成を行ったステンレス基板の薄
膜法Ｘ線回折パターンを得た。触媒付着量 触媒の付着量（ｍｇ／ｃｍ2）は、焼成後のプレート型
触媒の重量からコーティング前の重量を差し引いて算出
した。 Evaluation of substrate surface rough surface X-ray diffractometer RINT-2500-V manufactured by Rigaku Corporation
Using HF, a thin film method X-ray diffraction pattern of a pretreated and baked stainless steel substrate was obtained. The amount of catalyst attached (mg / cm 2 ) was calculated by subtracting the weight before coating from the weight of the plate type catalyst after calcination.
【００２１】触媒性能（水蒸気改質性能） プレート型触媒のｎ−ブタンの水蒸気改質性能(転化
率、％）を、下記条件で測定した。１０容量％（アルゴ
ンバランス）のｎ−ブタンを反応原料としてパルス注入
し、四重極質量分析計Ｑ−ＭＡＳＳを使用して、生成ガ
ス量を測定した。パルス注入量は０．５ｍｌ、水はバブ
ラーで圧力１５．１ｋＰａで供給し、反応温度５００
℃、触媒量５ｍｍ×３０ｍｍ×５枚（見かけ表面積１５
ｃｍ2）、キャリアーガス（ヘリウムガス）の流量４０
ｍｌ／ｍｉｎ。The catalytic performance (steam reforming performance) of the plate type catalytic n- butane steam reforming performance (conversion,%) was measured under the following conditions. Pulse-injection of 10% by volume (argon balance) of n-butane as a reaction raw material was performed, and the amount of generated gas was measured using a quadrupole mass spectrometer Q-MASS. The pulse injection volume is 0.5 ml, water is supplied by a bubbler at a pressure of 15.1 kPa, and the reaction temperature is 500.
° C, catalyst amount 5mm × 30mm × 5 sheets (apparent surface area 15
cm 2 ), carrier gas (helium gas) flow rate 40
ml / min.
【００２２】参考例１（水蒸気改質触媒Ｒｕ／ＺｒＯ2
の調製） 水酸化ジルコニウムと３価の塩化ルテニウム３水和物
を、混合物中のルテニウム濃度が０．５重量％となるよ
うに混合し、常温で１０分間撹拌した後、１００℃で２
時間蒸発乾固させ、空気中で１００℃で１５時間乾燥し
た後、空気中で６００℃１時間焼成して、Ｒｕ／ＺｒＯ
2粉末を得た。Reference Example 1 (Steam reforming catalyst Ru / ZrO 2
Preparation of zirconium hydroxide and trivalent ruthenium chloride trihydrate were mixed such that the ruthenium concentration in the mixture was 0.5% by weight, and the mixture was stirred at room temperature for 10 minutes.
After evaporating to dryness over time and drying in air at 100 ° C. for 15 hours, baking in air at 600 ° C. for 1 hour, Ru / ZrO
Two powders were obtained.
【００２３】参考例２（バインダー水溶液の調製） バインダーとして第一稀元素化学工業（株）製、商品名
ジルコゾールＨＡ（ｂ１）を、イオン交換水と、バイン
ダー／水＝１／７（重量比）となるように混合し、バイ
ンダー水溶液を得た。Reference Example 2 (Preparation of Binder Aqueous Solution) Zircosol HA (b1) (trade name, manufactured by Daiichi Kagaku Kagaku Kogyo Co., Ltd.) was used as a binder, and ion-exchanged water and binder / water = 1/7 (weight ratio) And an aqueous binder solution was obtained.
【００２４】参考例３（コーティング用組成物の調製） 参考例１で調製した触媒および参考例２のバインダー水
溶液、ならびにＨＥＣを、表１に示す配合割合で混合
し、コーティング用組成物Ｂ〜Ｄを得た。また、ＨＥＣ
を添加しない以外は上記と同様に、表１に示す配合割合
で混合し、コーティング用組成物Ａを得た。Reference Example 3 (Preparation of Coating Composition) The catalyst prepared in Reference Example 1, the aqueous binder solution of Reference Example 2, and HEC were mixed at the mixing ratio shown in Table 1, and the coating compositions B to D were mixed. I got Also, HEC
Was added in the same manner as described above, except that was not added, to obtain a coating composition A.
【００２５】[0025]
【表１】 [Table 1]
【００２６】参考例４−１（前処理基板１の調製） カルソニック（株）製、２０Ｃｒ−Ａｌ，ＨＴステンレ
ス（アルミニウム含有量５重量％、メタハニカム用）
を、空気中、１，１５０℃で２時間焼成し、前処理基板
１を得た。評価結果を図１に示す。 参考例４−２（前処理基板２調製） 焼成温度を１，０３０℃にした以外は、参考例４−１と
同様にして前処理基板２を得た。評価結果を図１に示
す。 参考例４−３（前処理基板３の調製） 焼成温度を９２５℃にした以外は、参考例４−１と同様
にして前処理基板３を得た。評価結果を図１に示す。Reference Example 4-1 (Preparation of pre-processed substrate 1) 20Cr-Al, HT stainless steel manufactured by Calsonic Corporation (aluminum content 5% by weight, for meta-honeycomb)
Was fired in air at 1,150 ° C. for 2 hours to obtain a pre-treated substrate 1. FIG. 1 shows the evaluation results. Reference Example 4-2 (Preparation of Pretreatment Substrate 2) A pretreatment substrate 2 was obtained in the same manner as in Reference Example 4-1 except that the firing temperature was 1,030 ° C. FIG. 1 shows the evaluation results. Reference Example 4-3 (Preparation of Pretreatment Substrate 3) A pretreatment substrate 3 was obtained in the same manner as in Reference Example 4-1 except that the firing temperature was 925 ° C. FIG. 1 shows the evaluation results.
【００２７】実施例１ 参考例３で調製したコーティング用組成物Ｂに、参考例
４−１で調製した前処理基板１を浸漬(ディッピング）
し、引き上げ速度１ｍｍ／ｓｅｃで引き上げ、空気中で
１００℃１５時間乾燥後に、空気中で６００℃１時間焼
成し、プレート型触媒を得た。評価結果を表２に示す。 実施例２〜３、比較例１ コーティング用組成物Ａ，Ｃ〜Ｄを使用した以外は、上
記と同様にして、プレート型触媒を得た。評価結果を表
２に示す。Example 1 The pre-treated substrate 1 prepared in Reference Example 4-1 was dipped in the coating composition B prepared in Reference Example 3 (dipping).
Then, it was pulled up at a pulling rate of 1 mm / sec, dried in air at 100 ° C. for 15 hours, and calcined in air at 600 ° C. for 1 hour to obtain a plate-type catalyst. Table 2 shows the evaluation results. Examples 2-3 and Comparative Example 1 A plate-type catalyst was obtained in the same manner as described above, except that the coating compositions A and C to D were used. Table 2 shows the evaluation results.
【００２８】[0028]
【表２】 [Table 2]
【００２９】実施例１〜３は、本発明の範囲内の例であ
り、増粘剤を含有しないコーティング用組成物よりも、
触媒付着量が大きかった。実施例２では、増粘剤である
ＨＥＣを５重量％含むことにより、１回の浸漬により、
ＨＥＣなしの比較例１の約５倍、また実施例３では、Ｈ
ＥＣを１０重量％含むことにより、比較例１の約３０倍
の触媒付着量が得られた。Examples 1 to 3 are examples within the scope of the present invention and are more effective than coating compositions containing no thickener.
The catalyst adhesion amount was large. In Example 2, by including 5% by weight of HEC which is a thickener, by one dipping,
About 5 times that of Comparative Example 1 without HEC, and in Example 3, H
By containing 10% by weight of EC, about 30 times the catalyst adhesion amount of Comparative Example 1 was obtained.
【００３０】[0030]
【発明の効果】本発明のコーティング用組成物は、１回
のコーティングで充分な付着量を得ることができ、密着
性に優れ、優れた触媒性能を有し、装置のコンパクト化
およびコストダウンを可能にすることのできるプレート
型触媒が製造できる。また、本発明のプレート型触媒
に、水蒸気改質触媒を適用すると、触媒効率がよく、結
果的にエネルギー消費の少ない水蒸気改質反応が可能と
なる。According to the coating composition of the present invention, a sufficient amount of coating can be obtained by one coating, the adhesion is excellent, the catalyst performance is excellent, the apparatus can be made compact and the cost can be reduced. A plate-type catalyst that can be made possible can be produced. Further, when a steam reforming catalyst is applied to the plate-type catalyst of the present invention, the catalyst efficiency is high, and as a result, a steam reforming reaction with low energy consumption becomes possible.
【図１】参考例４−１〜参考例４−３で得られた前処理
基板の薄膜法Ｘ線回折図である。FIG. 1 is a thin-film X-ray diffraction diagram of a pretreated substrate obtained in Reference Examples 4-1 to 4-3.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 小渕 彰 神奈川県横浜市旭区若葉台４−28−1405 (72)発明者 吉田 光弘 神奈川県横浜市鶴見区東寺尾５−２−５− 323 Ｆターム(参考） 4G040 EA03 EA06 EC03 EC08 4G069 AA03 AA09 BA01A BA02A BA05A BA05B BA18 BA29C BB02A BB02B BB04A BC31A BC35A BC58A BC59A BC64A BC66A BC67A BC68A BC70A BC70B BC71A BC72A BC75A CB07 CC02 CC17 CC25 CC26 CD01 EA11 FA04 FB15 FB17 FB23 FB30 FB39 FC05 FC07 4G140 EA03 EA06 EC03 EC08 4H029 CA00 DA00 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Akira Obuchi 4-28-1405, Wakabadai, Asahi-ku, Yokohama-shi, Kanagawa Prefecture (72) Inventor Mitsuhiro Yoshida 5-5-2-5, Higashiterao, Tsurumi-ku, Yokohama-shi, Kanagawa F-term (Reference) 4G040 EA03 EA06 EC03 EC08 4G069 AA03 AA09 BA01A BA02A BA05A BA05B BA18 BA29C BB02A BB02B BB04A BC31A BC35A BC58A BC59A BC64A BC66A BC67A BC68A BC70A BC70B BC71ABC07 FC04 CB07 CC02 CC03 CC04 EA06 EC03 EC08 4H029 CA00 DA00
Claims (5)
焼成してプレート型触媒の基板を作製し、この基板上
に、触媒、バインダーおよび増粘剤を含有するコーティ
ング用組成物を塗布し、次いで焼成することを特徴とす
るプレート型触媒の製造方法。1. A stainless steel plate containing aluminum is baked to produce a plate-type catalyst substrate, and a coating composition containing a catalyst, a binder and a thickener is applied on the substrate, and then baked. A method for producing a plate-type catalyst.
テンレス板を１，０００〜１，１５０℃で焼成したもの
である、請求項１記載のプレート型触媒の製造方法。2. The method for producing a plate-type catalyst according to claim 1, wherein the substrate is obtained by firing a stainless steel plate containing aluminum at 1,000 to 1,150 ° C.
ースである、請求項１または２記載のプレート型触媒の
製造方法。3. The method for producing a plate-type catalyst according to claim 1, wherein the thickener is hydroxyethylcellulose.
が、５００〜６００℃である、請求項１〜３いずれか１
項記載のプレート型触媒の製造方法。4. The sintering temperature of the coating composition is 500 to 600 ° C.
The method for producing a plate-type catalyst according to the above item.
ト型触媒の製造方法により製造されたプレート型触媒。5. A plate catalyst produced by the method for producing a plate catalyst according to claim 1. Description:
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006290737A (en) * | 2005-04-13 | 2006-10-26 | Samsung Sdi Co Ltd | Flat plate-type reformer and fuel cell system using the same |
| JP2007090342A (en) * | 2005-09-05 | 2007-04-12 | Hideki Koyanaka | Catalytic material for producing hydrogen gas from hydrocarbon gas and method of producing the same, and method of producing hydrogen gas using the catalytic material |
| JP2008302304A (en) * | 2007-06-07 | 2008-12-18 | Cataler Corp | Method and apparatus for depositing noble metal |
| JP2009042383A (en) * | 2007-08-07 | 2009-02-26 | Sumitomo Chemical Co Ltd | Polarizing plate and manufacturing method therefor |
| KR101679710B1 (en) | 2014-04-21 | 2016-11-25 | 주식회사 엘지화학 | Hydrocarbon reforming catalyst paste composition and reformer using the same |
Families Citing this family (1)
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|---|---|---|---|---|
| KR101623235B1 (en) | 2013-05-10 | 2016-05-20 | 주식회사 엘지화학 | Hydrocarbon reforming catalyst paste composition and reformer using the same |
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|---|---|---|---|---|
| JPH07178343A (en) * | 1993-12-24 | 1995-07-18 | Matsushita Electric Ind Co Ltd | Catalystic body using metallic base material, catalystic slurry and catalystic carrier slurry |
| JPH10183062A (en) * | 1996-10-30 | 1998-07-07 | Jsr Corp | Coating composition |
| JPH11179157A (en) * | 1997-12-25 | 1999-07-06 | Nippon Steel Corp | Electric heating catalytic apparatus |
-
2001
- 2001-02-27 JP JP2001052227A patent/JP4650858B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07178343A (en) * | 1993-12-24 | 1995-07-18 | Matsushita Electric Ind Co Ltd | Catalystic body using metallic base material, catalystic slurry and catalystic carrier slurry |
| JPH10183062A (en) * | 1996-10-30 | 1998-07-07 | Jsr Corp | Coating composition |
| JPH11179157A (en) * | 1997-12-25 | 1999-07-06 | Nippon Steel Corp | Electric heating catalytic apparatus |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006290737A (en) * | 2005-04-13 | 2006-10-26 | Samsung Sdi Co Ltd | Flat plate-type reformer and fuel cell system using the same |
| US7976592B2 (en) | 2005-04-13 | 2011-07-12 | Samsung Sdi Co., Ltd. | Plate type reformer and fuel cell system including the reformer |
| JP2007090342A (en) * | 2005-09-05 | 2007-04-12 | Hideki Koyanaka | Catalytic material for producing hydrogen gas from hydrocarbon gas and method of producing the same, and method of producing hydrogen gas using the catalytic material |
| JP2008302304A (en) * | 2007-06-07 | 2008-12-18 | Cataler Corp | Method and apparatus for depositing noble metal |
| JP2009042383A (en) * | 2007-08-07 | 2009-02-26 | Sumitomo Chemical Co Ltd | Polarizing plate and manufacturing method therefor |
| KR101679710B1 (en) | 2014-04-21 | 2016-11-25 | 주식회사 엘지화학 | Hydrocarbon reforming catalyst paste composition and reformer using the same |
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| JP4650858B2 (en) | 2011-03-16 |
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