JP2002210834A - Three-dimensional shaping apparatus and method therefor - Google Patents
Three-dimensional shaping apparatus and method thereforInfo
- Publication number
- JP2002210834A JP2002210834A JP2001014386A JP2001014386A JP2002210834A JP 2002210834 A JP2002210834 A JP 2002210834A JP 2001014386 A JP2001014386 A JP 2001014386A JP 2001014386 A JP2001014386 A JP 2001014386A JP 2002210834 A JP2002210834 A JP 2002210834A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- mask
- dimensional
- curing
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 14
- 238000007493 shaping process Methods 0.000 title abstract description 10
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 55
- 229920005989 resin Polymers 0.000 claims abstract description 35
- 239000011347 resin Substances 0.000 claims abstract description 35
- 238000006073 displacement reaction Methods 0.000 claims abstract description 28
- 230000007246 mechanism Effects 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims description 24
- 238000000465 moulding Methods 0.000 claims description 15
- 229920001187 thermosetting polymer Polymers 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 6
- 238000003475 lamination Methods 0.000 claims description 6
- 238000010146 3D printing Methods 0.000 claims description 5
- 229920005992 thermoplastic resin Polymers 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims 1
- 230000003287 optical effect Effects 0.000 abstract description 10
- 238000010586 diagram Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、面状に設定された
光や熱等の硬化媒体により材料を硬化し、この硬化した
層の積層を繰り返すことにより立体物を造形する立体造
形装置および立体造形方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a three-dimensional molding apparatus and a three-dimensional object which form a three-dimensional object by curing a material with a curing medium such as light or heat set in a planar shape and repeating the lamination of the cured layers. It relates to a molding method.
【０００２】[0002]
【従来の技術】一般に、光造形に関するデータを出力す
る三次元ＣＡＤ等の制御手段と、この制御手段からのデ
ータに応じて面状パターンを制御する液晶マスクと、例
えばＵＶランプ等の光源とを備え、上記液晶マスク越し
に上記光源を用いて光硬化性樹脂の１層分の未硬化樹脂
層を面露光し、この面露光操作を多層に亘って繰り返す
ことにより光造形する立体造形装置が知られている。2. Description of the Related Art Generally, control means such as three-dimensional CAD for outputting data relating to optical shaping, a liquid crystal mask for controlling a planar pattern according to data from the control means, and a light source such as a UV lamp are generally used. There is known a three-dimensional modeling apparatus that performs surface exposure on one uncured resin layer of a photocurable resin using the light source through the liquid crystal mask, and repeats the surface exposure operation over multiple layers. Have been.
【０００３】この種のものは、従来のように半導体レー
ザ等のレーザ光で露光し、光造形を行うものに比べ、圧
倒的に造形速度を速めることができ、しかも半導体レー
ザ等が不要なため、低コストで光造形を行うことができ
る。In this type, the molding speed can be overwhelmingly increased as compared with the conventional one in which exposure is performed by laser light such as a semiconductor laser or the like and optical molding is performed, and a semiconductor laser or the like is unnecessary. The optical shaping can be performed at low cost.
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、従来の
構成では、面状パターンによる１層分のデータ輪郭が、
液晶マスクの表示画素の解像度に従い、それに応じた輪
郭となるため、光造形物の外表面に凹凸が生じ、製品品
質が低下するという問題がある。However, in the conventional configuration, the data contour of one layer by the planar pattern is
Since the contour is adjusted according to the resolution of the display pixel of the liquid crystal mask, there is a problem that unevenness is generated on the outer surface of the optically formed object and the product quality is reduced.
【０００５】この種の問題は、面状に設定された光や熱
等の材料硬化媒体が、デジタル化された場合、例えば、
ブラウン管或いはプラズマディスプレイ等の面光源を用
い、または光とデジタルマイクロミラーとの組み合わせ
を用い、さらにはサーマルヘッドアレイ等を用いた立体
造形装置においても同様に発生する問題である。A problem of this kind is that when a material curing medium such as light or heat set in a plane is digitized, for example,
The same problem occurs in a three-dimensional printing apparatus using a surface light source such as a cathode ray tube or a plasma display, or using a combination of light and a digital micromirror, and further using a thermal head array or the like.
【０００６】そこで、本発明の目的は、上述した従来の
技術が有する課題を解消し、面状に設定された光や熱等
の材料硬化媒体が、デジタル化された場合、立体造形物
の外形輪郭をなめらかに形成することができ、造形精度
を向上させることができる立体造形装置および立体造形
方法を提供することにある。Accordingly, an object of the present invention is to solve the above-mentioned problems of the prior art, and when a material-cured medium such as light or heat set in a plane is digitized, the external shape of a three-dimensional object is reduced. An object of the present invention is to provide a three-dimensional modeling apparatus and a three-dimensional modeling method that can form a contour smoothly and improve the modeling accuracy.
【０００７】[0007]
【発明が解決しようとする課題】請求項１記載の発明
は、立体造形に関するデータに応じて面状に設定された
硬化媒体により材料を硬化し、この硬化した層の積層を
繰り返すことにより立体物を造形する立体造形装置にお
いて、上記材料表面上における上記硬化媒体か上記材料
の少なくとも一方を互いに平行移動させる変位手段を備
えたことを特徴とする。According to the first aspect of the present invention, a three-dimensional object is formed by curing a material with a curing medium set in a plane according to data relating to three-dimensional molding, and repeating the lamination of the cured layers. In the three-dimensional modeling apparatus, a displacement unit that translates at least one of the curing medium and the material on the surface of the material in parallel with each other is provided.
【０００８】請求項２記載の発明は、請求項１記載のも
のにおいて、上記硬化媒体が面状に設定された光であ
り、上記材料が光硬化性樹脂であることを特徴とする。According to a second aspect of the present invention, in the first aspect, the curing medium is light set in a planar shape, and the material is a photocurable resin.
【０００９】請求項３記載の発明は、請求項２記載のも
のにおいて、上記面状に設定された光が液晶マスクの透
過により形成され、上記変位手段がこの液晶マスクを平
行移動させるマスク変位機構を含むことを特徴とする。According to a third aspect of the present invention, in the second aspect, the light set in a plane is formed by transmission of a liquid crystal mask, and the displacement means moves the liquid crystal mask in parallel. It is characterized by including.
【００１０】請求項４記載の発明は、請求項２記載のも
のにおいて、上記面状に設定された光が液晶マスクの透
過により形成され、上記変位手段がこの液晶マスクを透
過した光を平行移動させる光変位機構を含むことを特徴
とする。According to a fourth aspect of the present invention, in the second aspect, the light set in a plane is formed by transmission of a liquid crystal mask, and the displacement means translates the light transmitted through the liquid crystal mask. It is characterized by including a light displacement mechanism for causing the displacement.
【００１１】請求項５記載の発明は、請求項２記載のも
のにおいて、上記面状に設定された光が液晶マスクの透
過により形成され、この液晶マスクがマスク面と直交方
向に重ねて配置されると共に、それぞれの表示画素の位
置がマスク面と平行方向に変位して配置された複数の液
晶マスクで構成されることを特徴とする。According to a fifth aspect of the present invention, in the light emitting device according to the second aspect, the light set in a planar shape is formed by transmission of a liquid crystal mask, and the liquid crystal mask is arranged so as to overlap with the mask surface in a direction perpendicular to the mask surface. In addition, each display pixel is constituted by a plurality of liquid crystal masks arranged so as to be displaced in a direction parallel to the mask surface.
【００１２】請求項６記載の発明は、請求項１記載のも
のにおいて、上記硬化媒体がブラウン管或いはプラズマ
ディスプレイ等の面光源により形成されることを特徴と
する。According to a sixth aspect of the present invention, in the first aspect, the curing medium is formed by a surface light source such as a cathode ray tube or a plasma display.
【００１３】請求項７記載の発明は、請求項１記載のも
のにおいて、上記硬化媒体が光とデジタルマイクロミラ
ーとにより形成されることを特徴とする。According to a seventh aspect of the present invention, in the first aspect, the curing medium is formed by light and a digital micromirror.
【００１４】請求項８記載の発明は、請求項１記載のも
のにおいて、上記硬化媒体が面状に設定された熱であ
り、上記材料が熱硬化性または熱可塑性樹脂であり、こ
の未硬化樹脂層の層表面上における上記熱か熱硬化性ま
たは熱可塑性樹脂の少なくとも一方を互いに平行移動さ
せる変位手段を備えたことを特徴とする。According to an eighth aspect of the present invention, in the first aspect, the curing medium is heat set in a planar shape, the material is a thermosetting or thermoplastic resin, and the uncured resin is Displacement means for parallelly moving at least one of the above-mentioned thermosetting or thermosetting or thermoplastic resin on the layer surface of the layer is provided.
【００１５】請求項９記載の発明は、立体造形に関する
データに応じて面状に設定された硬化媒体により材料を
硬化し、この硬化した層の積層を繰り返すことにより立
体物を造形する立体造形方法において、上記材料を１層
分硬化する場合、まず第１の面状パターンに従い硬化
し、ついで第２或いはそれ以上の面状パターンに従い硬
化するとき、上記材料表面上における上記硬化媒体か上
記材料の少なくとも一方を互いに平行移動させることを
特徴とする。According to a ninth aspect of the present invention, there is provided a three-dimensional forming method for forming a three-dimensional object by curing a material with a hardening medium set in a plane according to data relating to three-dimensional forming and repeating the lamination of the cured layers. In the case where the material is cured for one layer, the material is first cured according to a first planar pattern, and then cured according to a second or more planar pattern, when the curing medium or the material on the surface of the material is cured. At least one of them is moved in parallel with each other.
【００１６】[0016]
【発明の実施の形態】以下、本発明の一実施形態を図面
に基づいて説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings.
【００１７】図１において、１は立体造形装置を示して
いる。この立体造形装置１は昇降自在に構成された造形
テーブル３を有し、この造形テーブル３上で１層分のデ
ータに従って光硬化性樹脂の未硬化樹脂層５Ａを一括面
露光し、この面露光操作を繰り返すことにより造形物５
を光造形する。In FIG. 1, reference numeral 1 denotes a three-dimensional printing apparatus. The three-dimensional modeling apparatus 1 has a modeling table 3 configured to be able to move up and down. The uncured resin layer 5A of the photocurable resin is exposed on the modeling table 3 according to data of one layer. Molded object 5 by repeating the operation
Stereolithography.
【００１８】上記造形テーブル３の上方には投影レンズ
７が配置され、この投影レンズ７の上方には液晶素子か
らなる液晶マスク９が配置されている。このマスク９の
上方には光源１１が設置され、この光源１１とマスク９
間には投影レンズ７に集光するレンズ１３が配置されて
いる。A projection lens 7 is arranged above the modeling table 3, and a liquid crystal mask 9 made of a liquid crystal element is arranged above the projection lens 7. Above the mask 9, a light source 11 is provided.
A lens 13 for condensing the light on the projection lens 7 is disposed therebetween.
【００１９】上記光源１１には水銀ランプ、メタルハラ
イドランプ、或いは紫外線蛍光灯等からなる光源が用い
られるが、本実施形態では、周囲の温度上昇を抑制する
等の理由からストロボが用いられている。As the light source 11, a light source such as a mercury lamp, a metal halide lamp, or an ultraviolet fluorescent lamp is used. In the present embodiment, a strobe is used for the reason of suppressing an increase in ambient temperature.
【００２０】１５は制御手段である。この制御手段１５
は三次元ＣＡＤ等からなり、造形すべき立体モデルを例
えば平行方向に薄くスライスした上記１層分の断面デー
タを出力する。この制御手段１５には、上記造形テーブ
ル３を昇降させるためのサーボモータ（図示せず）を駆
動するサーボモータ駆動装置２１と、マスク９を構成す
る液晶素子に対する印加電圧を制御する制御装置２３
と、光源１１に接続された光源電源２５とが接続され
る。Reference numeral 15 denotes control means. This control means 15
Is composed of a three-dimensional CAD or the like, and outputs, for example, the one-layer cross-section data obtained by thinly slicing a three-dimensional model to be formed, for example, in the parallel direction. The control means 15 includes a servo motor driving device 21 for driving a servo motor (not shown) for raising and lowering the modeling table 3, and a control device 23 for controlling an applied voltage to a liquid crystal element constituting the mask 9.
And the light source power supply 25 connected to the light source 11 are connected.
【００２１】本実施形態では、制御手段１５から１層分
のデータが出力されると、サーボモータが駆動されて、
上記造形テーブル３が１層分に対応する寸法分だけ降下
し、造形物５の上に１層分の未硬化樹脂層５Ａが、図示
を省略した塗布手段を介して塗布される。この場合、未
硬化樹脂層５Ａの上にフィルムを被せて、上記樹脂の流
出を防止すれば、造形精度を向上させることができる。
また造形テーブル３を容器中に浸し、液中で光造形して
もよい。In this embodiment, when data for one layer is output from the control means 15, the servomotor is driven,
The modeling table 3 is lowered by a dimension corresponding to one layer, and one layer of the uncured resin layer 5A is applied on the modeling object 5 via a coating means not shown. In this case, if a film is put on the uncured resin layer 5A to prevent the resin from flowing out, the modeling accuracy can be improved.
Alternatively, the molding table 3 may be immersed in a container and subjected to optical molding in a liquid.
【００２２】つぎに、上記制御装置２３が動作し、マス
ク９を構成する液晶素子に対し１層分のデータに従う所
定の電圧が印加される。Next, the control device 23 operates to apply a predetermined voltage according to the data of one layer to the liquid crystal element constituting the mask 9.
【００２３】この液晶マスク９は、図２に示すように、
フレーム５１を有する。このフレーム５１は、複数のコ
イルばね５３Ａ〜５３Ｄと、複数のピエゾ素子（マスク
変位機構）５５Ａ〜５５Ｄとを介して固定部に水平に支
持され、いずれかのピエゾ素子５５Ａ〜５５Ｄに電圧が
印加された場合、この液晶マスク９は、マスク面と平行
方向であるＸ方向又はＹ方向のいずれかに微少変位され
る。ピエゾ素子５５Ａ、５５Ｂに電圧が印加されると、
この液晶マスク９は、Ｘ方向に微少変位され、ピエゾ素
子５５Ｃ、５５Ｄに電圧が印加されると、この液晶マス
ク９は、Ｙ方向に微少変位される。この微少変位の距離
は、後述するように、液晶マスク９を構成する表示画素
の寸法の１／２，１／３，１／４等の任意距離である。This liquid crystal mask 9 is, as shown in FIG.
It has a frame 51. The frame 51 is horizontally supported by a fixed portion via a plurality of coil springs 53A to 53D and a plurality of piezo elements (mask displacement mechanisms) 55A to 55D, and a voltage is applied to any of the piezo elements 55A to 55D. In this case, the liquid crystal mask 9 is slightly displaced in either the X direction or the Y direction that is parallel to the mask surface. When a voltage is applied to the piezo elements 55A and 55B,
The liquid crystal mask 9 is slightly displaced in the X direction, and when a voltage is applied to the piezo elements 55C and 55D, the liquid crystal mask 9 is slightly displaced in the Y direction. The distance of the minute displacement is an arbitrary distance such as １ ／, ３ ，, １ ／ of the dimensions of the display pixels constituting the liquid crystal mask 9 as described later.
【００２４】この液晶マスク９は、図３において、例え
ば、Ｘ方向およびＹ方向に延びる図示を省略した複数の
電極を有し、光を透過遮断制御する表示画素１００が、
このＸ、Ｙ電極の交点で形成される。これによれば、透
過光はいわゆるデジタル化され、透過光の外形には、後
述するように凹凸が現れる。なお、図３では、液晶マス
ク９を表示画素１００の集合体として模式的に示してい
る。In FIG. 3, the liquid crystal mask 9 has a plurality of electrodes (not shown) extending in the X direction and the Y direction, for example.
It is formed at the intersection of the X and Y electrodes. According to this, the transmitted light is so-called digitized, and irregularities appear on the outer shape of the transmitted light as described later. In FIG. 3, the liquid crystal mask 9 is schematically shown as an aggregate of the display pixels 100.
【００２５】本実施形態では、制御手段１５から出力さ
れる１層分のデータが、例えば、円形の断面データ１０
１であった場合、この断面データ１０１に従い、２回に
分けて面状パターンが作成され、未硬化樹脂層５Ａが２
回に分けて露光される。なお、２回に分けて露光する場
合、１回当たりの露光量は少なくすることが望ましい。
具体的には、図３に示すように、制御装置２３から縦Ｌ
１、横Ｌ２の十文字形を表す１回目のデータが出力さ
れ、このデータに従い、マスク９を構成する液晶素子に
対し所定の電圧が印加され、１回目の十文字形の第１の
面状パターンが作成される。この面状パターンでは、５
か所の表示画素１００Ａ〜１００Ｅが光を透過し、その
ほかの表示画素は光を透過しない。In this embodiment, the data of one layer output from the control means 15 is, for example, a circular section data 10.
If the number is 1, the planar pattern is formed twice in accordance with the cross-sectional data 101, and the uncured resin layer 5A is
Exposure is performed in different times. When the exposure is performed twice, it is desirable to reduce the amount of exposure per one time.
Specifically, as shown in FIG.
1. The first data representing the horizontal L2 cross is output. A predetermined voltage is applied to the liquid crystal element forming the mask 9 in accordance with this data, and the first cross-shaped first planar pattern is formed. Created. In this planar pattern, 5
One of the display pixels 100A to 100E transmits light, and the other display pixels do not transmit light.
【００２６】この状態で、ストロボ光源１１が点灯され
ると、表示画素１００Ａ〜１００Ｅを通じて、未硬化樹
脂層５Ａに光が到達して、この表示画素１００Ａ〜１０
０Ｅに相当する未硬化樹脂層５Ａが硬化する。In this state, when the strobe light source 11 is turned on, light reaches the uncured resin layer 5A through the display pixels 100A to 100E, and the display pixels 100A to 100E.
The uncured resin layer 5A corresponding to 0E is cured.
【００２７】ついで、ピエゾ素子５５Ａ、５５Ｂに電圧
を印加し、表示画素１００の寸法Ｗの略半分１／２Ｗだ
け、液晶マスク９をＸ方向に微少変位させると共に、ピ
エゾ素子５５Ｃ、５５Ｄに電圧を印加し、表示画素１０
０の寸法Ｈの略半分１／２Ｈだけ、液晶マスク９をＹ方
向に微少変位させる。これによると、液晶マスク９は
Ｘ，Ｙの中間方向に斜めに変位する。Next, a voltage is applied to the piezo elements 55A and 55B to slightly displace the liquid crystal mask 9 in the X direction by approximately half of the dimension W of the display pixel 100, and to apply a voltage to the piezo elements 55C and 55D. Apply and display pixel 10
The liquid crystal mask 9 is slightly displaced in the Y direction by approximately half H of the dimension H of 0. According to this, the liquid crystal mask 9 is displaced obliquely in the middle direction between X and Y.
【００２８】そして、この状態で、制御装置２３から縦
Ｌ３、横Ｌ４の正方形を表すデータが出力され、このデ
ータに従い、マスク９を構成する液晶素子に対し所定の
電圧が印加され、２回目の露光に用いられる正方形の第
２の面状パターンが作成される。この面状パターンで
は、４か所の表示画素１００Ｆ〜１００Ｉが光を透過
し、そのほかの表示画素は光を透過しない。In this state, data representing a vertical L3 and a horizontal L4 square is output from the control device 23, and a predetermined voltage is applied to the liquid crystal element constituting the mask 9 in accordance with the data, and a second time is performed. A square second planar pattern used for exposure is created. In this planar pattern, four display pixels 100F to 100I transmit light, and the other display pixels do not transmit light.
【００２９】この状態で、ストロボ光源１１が点灯され
ると、表示画素１００Ｆ〜１００Ｉを通じて、未硬化樹
脂層５Ａに光が到達して、この表示画素１００Ｆ〜１０
０Ｉに相当する未硬化樹脂層５Ａが硬化する。In this state, when the strobe light source 11 is turned on, light reaches the uncured resin layer 5A through the display pixels 100F to 100I, and the display pixels 100F to 10I.
The uncured resin layer 5A corresponding to 0I is cured.
【００３０】上記の処理によって、１層分の樹脂を硬化
させた後は、再び、制御手段１５から１層分のデータが
出力され、サーボモータが駆動され、造形テーブル３が
１層分に対応する寸法分だけ降下し、造形物５の上に１
層分の新たな未硬化樹脂層５Ａが、図示を省略した塗布
手段を介して塗布される。そして、上記と同様の手順に
よって、新たな未硬化樹脂層５Ａを硬化する。After the resin for one layer is cured by the above-described processing, the data for one layer is output again from the control means 15, the servomotor is driven, and the molding table 3 corresponds to the one layer. Drop by the size of
A new uncured resin layer 5A for the layer is applied via application means not shown. Then, the new uncured resin layer 5A is cured by the same procedure as described above.
【００３１】本実施形態では、第１の面状パターンに従
い面露光し、ピエゾ素子により液晶マスク９をマスク面
と平行方向に微少変位させた後、第２の面状パターンに
従い面露光することにより、図５に示すように、１層分
の円形断面データ１０１の輪郭に近い形状の硬化層が得
られる。In this embodiment, the surface is exposed according to the first planar pattern, the liquid crystal mask 9 is slightly displaced in the direction parallel to the mask surface by the piezo element, and then the surface is exposed according to the second planar pattern. As shown in FIG. 5, a cured layer having a shape close to the contour of the circular section data 101 for one layer is obtained.
【００３２】すなわち、１回で露光を完了する場合、表
示画素の解像度に従い、図３に示す十文字形の硬化層が
得られるだけであるのに対し、２回に分けて露光するこ
とにより、図５に示すように、十文字形に比べて円形の
断面データ１０１により近い、輪郭のなめらかな形状の
硬化層が得られる。That is, when the exposure is completed in one time, only the cross-shaped cured layer shown in FIG. 3 can be obtained according to the resolution of the display pixel. As shown in FIG. 5, a hardened layer having a smoother contour and closer to the circular cross-sectional data 101 than the cross shape is obtained.
【００３３】従って、上記処理に従い造形された造形物
５は、その外形表面に現れる凹凸が少なく、製品品質を
向上させることができる。Accordingly, the molded article 5 molded according to the above-mentioned processing has few irregularities appearing on the outer surface thereof, and the product quality can be improved.
【００３４】図９はマスク変位機構の別の実施形態を示
す。FIG. 9 shows another embodiment of the mask displacement mechanism.
【００３５】図２では、液晶マスク９をＸ，Ｙ方向に変
位させ、結果的にその中間方向Ｚに斜めに変位させる構
成が採用されている。FIG. 2 shows a configuration in which the liquid crystal mask 9 is displaced in the X and Y directions, and consequently is displaced obliquely in the intermediate direction Z.
【００３６】ここでの液晶マスク９は、始めからその中
間方向Ｚに斜めに変位させる機構が採用される。この機
構は、液晶マスク９のフレーム５１に対し、その対角線
上に位置するように、コイルばね１５３と、ピエゾ素子
（マスク変位機構）１５５とを備えて構成される。この
ピエゾ素子１５５に電圧が印加された場合、この液晶マ
スク９は、一度に、マスク面と平行方向であるＺ方向に
微少変位される。この機構では、図２のものと比べ構成
が簡素化される。Here, the liquid crystal mask 9 employs a mechanism for displacing obliquely in the intermediate direction Z from the beginning. This mechanism is provided with a coil spring 153 and a piezo element (mask displacement mechanism) 155 so as to be located on a diagonal line with respect to the frame 51 of the liquid crystal mask 9. When a voltage is applied to the piezo element 155, the liquid crystal mask 9 is slightly displaced at a time in the Z direction parallel to the mask surface. In this mechanism, the configuration is simplified as compared with that of FIG.
【００３７】図６は、上記面状パターンの作成フローを
示す。FIG. 6 shows a flow of creating the planar pattern.
【００３８】Ｓ１〜Ｓ３は、上記１層分の断面データの
作成手順である。三次元ＣＡＤ等からのデータを読み込
み（Ｓ１）、このデータをスライスして上記断面データ
を作成する（Ｓ２）。そして、この断面データにサポー
ト（造形中に造形物を支持する部材）に関するデータを
付与する（Ｓ３）。Steps S1 to S3 are procedures for creating the cross-sectional data for one layer. Data from a three-dimensional CAD or the like is read (S1), and this data is sliced to create the above-described cross-sectional data (S2). Then, data relating to a support (a member that supports the modeled object during modeling) is added to this cross-sectional data (S3).
【００３９】ついで、造形物（モデル）の積層数が終了
したか否かを判断し（Ｓ４）、終了していない場合、モ
デル及びサポートの塗りつぶしデータ（上記１層分の断
面データ）を計算し、記憶する（Ｓ５）。つぎに、一つ
目の第１の面状パターン（例えば、図３の十文字形）を
用いた場合の塗りつぶしパターンを計算し、記憶し（Ｓ
６）、モデル及びサポートと面状パターンの論理積を算
出し、マスク作成をおこない（Ｓ７）、そして、露光す
る（Ｓ８）。Next, it is determined whether or not the number of layers of the modeled object (model) has been completed (S4). If the number has not been completed, the fill data of the model and the support (the above-described cross-sectional data of one layer) is calculated. Is stored (S5). Next, a fill pattern when the first first planar pattern (for example, the cross shape in FIG. 3) is used is calculated and stored (S
6) The logical product of the model and support and the planar pattern is calculated, a mask is created (S7), and exposure is performed (S8).
【００４０】ついで、面状パターンがＮ回終了したかを
判断し（Ｓ９）、Ｎ回終了していない場合、上記ピエゾ
素子に電圧を印加し、液晶マスク９をマスク面と平行方
向に微少変位させて（Ｓ１０）、Ｓ６に移行する。そし
て、第２の面状パターン（例えば、図４の正方形）を用
いた場合の塗りつぶしパターンを計算し、これに基づい
てマスク作成をおこない、そして、露光する（Ｓ８）。Next, it is determined whether the planar pattern has been completed N times (S9). If not completed, the voltage is applied to the piezo element, and the liquid crystal mask 9 is slightly displaced in a direction parallel to the mask surface. Then, the process proceeds to S6. Then, a fill pattern when the second planar pattern (for example, the square in FIG. 4) is used is calculated, a mask is created based on the calculated fill pattern, and exposure is performed (S8).
【００４１】上記Ｓ９で、面状パターンがＮ回終了した
場合、Ｓ４に移行して、次の層のマスクを作成し、露光
を実行する。When the planar pattern is completed N times in S9, the process proceeds to S4, where a mask for the next layer is created and exposure is performed.
【００４２】これらの処理が進み、上記Ｓ４で、モデル
の積層数が終了した場合、Ｓ１１に移行して、光造形を
終了する。When these processes are advanced and the number of stacked models is completed in S4, the process proceeds to S11 and the optical shaping is completed.
【００４３】図７は、別の実施形態を示す。FIG. 7 shows another embodiment.
【００４４】この実施形態では、ピエゾ素子から成るマ
スク変位機構の代わりに、液晶マスク９と未硬化樹脂層
５Ａ間に光変位機構６１が配置される。この光変位機構
６１は、例えば揺動ミラー等で構成され、マスク９を透
過した光を未硬化樹脂層５Ａの層表面と平行方向に微少
変位させる。In this embodiment, an optical displacement mechanism 61 is arranged between the liquid crystal mask 9 and the uncured resin layer 5A instead of the mask displacement mechanism composed of a piezo element. The optical displacement mechanism 61 is composed of, for example, a swinging mirror, and slightly displaces the light transmitted through the mask 9 in a direction parallel to the surface of the uncured resin layer 5A.
【００４５】本実施形態では、光硬化性樹脂の１層分を
面露光する場合、一つ目の第１の面状パターン（例え
ば、図３の十文字形）に従い面露光し、ついで第２の面
状パターン（例えば、図４の正方形）に従い面露光する
とき、この第２の面状パターンを透過した光を、光変位
機構６１によって、未硬化樹脂層５Ａの層表面と平行方
向に微少変位させて面露光する。In this embodiment, when one layer of the photocurable resin is surface-exposed, the surface is exposed according to the first first planar pattern (for example, the cross shape in FIG. 3), and then the second exposure is performed. When surface exposure is performed according to a planar pattern (for example, a square in FIG. 4), light transmitted through the second planar pattern is slightly displaced by the optical displacement mechanism 61 in a direction parallel to the layer surface of the uncured resin layer 5A. Then, surface exposure is performed.
【００４６】これによれば、例えば、図５に示すよう
に、１層分の円形断面データ１０１の輪郭に近い形状の
硬化層が得られる。According to this, for example, as shown in FIG. 5, a hardened layer having a shape close to the contour of the circular section data 101 for one layer can be obtained.
【００４７】すなわち、１回で露光を完了する場合、表
示画素の解像度に従い、図３に示す十文字形の硬化層が
得られるだけであるのに対し、２回に分けて露光するこ
とにより、図５に示すように、十文字形に比べて円形の
断面データ１０１により近い、輪郭のなめらかな形状の
硬化層が得られる。That is, when the exposure is completed in one time, only the cross-shaped cured layer shown in FIG. 3 can be obtained according to the resolution of the display pixel. As shown in FIG. 5, a hardened layer having a smoother contour and closer to the circular cross-sectional data 101 than the cross shape is obtained.
【００４８】従って、上記処理に従い造形された造形物
５は、その外形表面に現れる凹凸が少なく、製品品質を
向上させることができる。Therefore, the molded article 5 molded according to the above-mentioned processing has few irregularities appearing on the outer surface thereof, and the product quality can be improved.
【００４９】図８は、さらに別の実施形態を示す。本実
施形態では、上記マスク９が複数の液晶マスク９Ａ，９
Ｂで構成される。これら液晶マスク９Ａ，９Ｂは、マス
ク面と直交方向に重ねて配置されると共に、それぞれの
表示画素の位置がマスク面と平行方向に相対的に微少変
位して配置される。FIG. 8 shows still another embodiment. In the present embodiment, the mask 9 includes a plurality of liquid crystal masks 9A, 9A.
B. These liquid crystal masks 9A and 9B are arranged so as to overlap in a direction orthogonal to the mask surface, and the positions of respective display pixels are arranged with a relatively slight displacement in a direction parallel to the mask surface.
【００５０】この実施形態では、光硬化性樹脂の１層分
を面露光する場合、一つ目の液晶マスク９Ａを制御し
て、第１の面状パターン（例えば、図３の十文字形）に
従い面露光し、ついで二つ目の液晶マスク９Ｂを制御し
て、第２の面状パターン（例えば、図４の正方形）に従
い面露光する。この場合、上述した制御を行わない方の
液晶マスク９は、全面的に光を透過するように制御され
る。In this embodiment, when one layer of the photocurable resin is subjected to surface exposure, the first liquid crystal mask 9A is controlled to follow the first planar pattern (for example, the cross shape in FIG. 3). Surface exposure is performed, and then the second liquid crystal mask 9B is controlled to perform surface exposure according to a second planar pattern (for example, a square in FIG. 4). In this case, the liquid crystal mask 9 on which the above control is not performed is controlled so as to transmit light entirely.
【００５１】これら液晶マスク９Ａ，９Ｂは、それぞれ
の表示画素の位置がマスク面と平行方向に相対的に微少
変位して配置されているため、第１、第２の面状パター
ンに従い面露光することにより、例えば、図５に示すよ
うに、１層分の円形断面データ１０１の輪郭に近い形状
の硬化層が得られる。Since these liquid crystal masks 9A and 9B are arranged with the positions of the display pixels relatively slightly displaced in the direction parallel to the mask surface, surface exposure is performed according to the first and second planar patterns. Thereby, for example, as shown in FIG. 5, a hardened layer having a shape close to the contour of the circular cross-section data 101 for one layer is obtained.
【００５２】すなわち、１回で露光を完了する場合、表
示画素の解像度に従い、図３に示す十文字形の硬化層が
得られるだけであるのに対し、２回に分けて露光するこ
とにより、図５に示すように、十文字形に比べて円形の
断面データ１０１により近い、輪郭のなめらかな形状の
硬化層が得られる。従って、上記処理に従い造形された
造形物５は、その外形表面に現れる凹凸が少なく、製品
品質を向上させることができる。本実施形態では、光
が、２枚の液晶マスクを透過することになるため、照射
強度を若干高めに設定することが望ましい。That is, when the exposure is completed in one time, only the cross-shaped cured layer shown in FIG. 3 can be obtained according to the resolution of the display pixel. As shown in FIG. 5, a hardened layer having a smoother contour and closer to the circular cross-sectional data 101 than the cross shape is obtained. Therefore, the molded article 5 molded according to the above-described processing has few irregularities appearing on the outer surface thereof, and can improve product quality. In the present embodiment, since the light passes through the two liquid crystal masks, it is desirable to set the irradiation intensity slightly higher.
【００５３】さらに、別の実施形態として、図示は省略
したが、光造形に関するデータに応じて照射パターンが
制御されるブラウン管或いはプラズマディスプレイ（Ｐ
ＤＰ）等の面光源を備えたものに適用してもよい。Further, as another embodiment, although not shown, a cathode ray tube or a plasma display (P) in which an irradiation pattern is controlled in accordance with data relating to stereolithography.
DP) or the like provided with a surface light source.
【００５４】この種の面光源は、任意に変化させ得る領
域から選択的に光エネルギーを放射可能に構成されてい
る。ブラウン管方式では、例えば、特開昭６３−３１２
１３０号公報に開示がある。This type of surface light source is configured so that light energy can be selectively emitted from a region that can be arbitrarily changed. In the cathode ray tube system, for example, Japanese Patent Application Laid-Open No. 63-312
No. 130 discloses this.
【００５５】この別の実施形態では、光硬化性樹脂の１
層分を面露光する場合、第１の面状パターン（例えば、
図３の十文字形）に従い面露光し、ついで第２の面状パ
ターン（例えば、図４の正方形）に従い面露光すると
き、この第２の面状パターンに従う光を上記未硬化樹脂
層の層表面と平行方向に微少変位させて面露光する。In this alternative embodiment, the photocurable resin 1
When the layers are surface-exposed, a first planar pattern (for example,
When the surface is exposed according to the cross-shaped pattern in FIG. 3 and then the surface is exposed according to the second planar pattern (for example, the square in FIG. 4), the light according to the second planar pattern is exposed to the surface of the uncured resin layer. Surface exposure with a slight displacement in the direction parallel to
【００５６】或いは、光硬化性樹脂の１層分を面露光す
る場合、第１の面状パターン（例えば、図３の十文字
形）に従い面露光し、ついで第２の面状パターン（例え
ば、図４の正方形）に従い面露光するとき、上記面光源
を面光源変位機構（図示せず）によりこの面と平行方向
に微少変位させた後、面露光する。Alternatively, when one layer of the photocurable resin is surface-exposed, the surface is exposed according to a first planar pattern (for example, the cross shape in FIG. 3), and then a second planar pattern (for example, FIG. 4), the surface light source is slightly displaced in a direction parallel to the surface by a surface light source displacement mechanism (not shown), and then the surface exposure is performed.
【００５７】この面光源変位機構は、例えば、図２また
は図９に相当する機構であって、図２または図９中の液
晶マスク９の代わりに面光源を配置すればよい。This surface light source displacement mechanism is, for example, a mechanism corresponding to FIG. 2 or FIG. 9, and a surface light source may be arranged instead of the liquid crystal mask 9 in FIG. 2 or FIG.
【００５８】本実施形態によれば、例えば、図５に示す
ように、１層分の円形断面データ１０１の輪郭に近い形
状の硬化層が得られる。According to the present embodiment, for example, as shown in FIG. 5, a hardened layer having a shape close to the contour of the circular section data 101 for one layer can be obtained.
【００５９】すなわち、１回で露光を完了する場合、面
光源の解像度に従い、図３に示す十文字形の硬化層が得
られるだけであるのに対し、２回に分けて露光すること
により、図５に示すように、十文字形に比べて円形の断
面データ１０１により近い、輪郭のなめらかな形状の硬
化層が得られる。That is, when the exposure is completed in one time, only the cross-shaped cured layer shown in FIG. 3 can be obtained according to the resolution of the surface light source. As shown in FIG. 5, a hardened layer having a smoother contour and closer to the circular cross-sectional data 101 than the cross shape is obtained.
【００６０】従って、上記処理に従い造形された造形物
５は、その外形表面に現れる凹凸が少なく、製品品質を
向上させることができる。Therefore, the molded article 5 molded according to the above-described processing has few irregularities appearing on the outer surface thereof, and the product quality can be improved.
【００６１】さらに、別の実施形態として、図示は省略
したが、光とデジタルマイクロミラーとの組み合わせが
提案される。この場合、上記面状のパターンは、デジタ
ルマイクロミラーの制御により形成される。また、光を
変位させる場合、デジタルマイクロミラーを種々の方向
或いは角度に変位させればよい。紫外光により樹脂を硬
化させるタイプのものでは、上記液晶マスクを用いたも
のに比べて、本案の方が、より多くの紫外光を照射可能
である。As another embodiment, although not shown, a combination of light and a digital micromirror is proposed. In this case, the planar pattern is formed by controlling a digital micromirror. When displacing light, the digital micromirror may be displaced in various directions or angles. In the case of the type in which the resin is cured by ultraviolet light, the present invention can irradiate more ultraviolet light than the one using the liquid crystal mask.
【００６２】以上、一実施形態に基づいて本発明を説明
したが、本発明は、これに限定されるものでないことは
明らかである。Although the present invention has been described based on one embodiment, it is apparent that the present invention is not limited to this.
【００６３】すなわち、本発明は、立体造形に関するデ
ータに応じて面状に設定された光や熱等の硬化媒体によ
り材料を硬化し、この硬化した層の積層を繰り返すこと
により立体物を造形する立体造形装置において、材料表
面上における硬化媒体か材料の少なくとも一方を互いに
平行移動させる変位手段を備えたものであればよい。That is, according to the present invention, a three-dimensional object is formed by curing a material with a curing medium such as light or heat set in a plane according to data relating to three-dimensional molding and repeating the lamination of the cured layers. In the three-dimensional modeling apparatus, any apparatus may be used as long as the apparatus has a displacement unit that translates at least one of the curing medium and the material on the material surface in parallel with each other.
【００６４】例えば、面状に設定された硬化媒体が光で
あれば、上記のように材料は光硬化性樹脂が好適であ
り、面状に設定された硬化媒体が熱であれば、材料は熱
硬化性または熱可塑性樹脂が好適である。面状に設定さ
れた硬化媒体を熱とした場合、この熱は、例えば、サー
マルヘッドアレイ等により形成される。For example, if the curing medium set in a planar shape is light, the material is preferably a photocurable resin as described above, and if the curing medium set in a planar shape is heat, the material is Thermosetting or thermoplastic resins are preferred. When the curing medium set in a planar shape is heat, the heat is generated by, for example, a thermal head array or the like.
【００６５】[0065]
【発明の効果】本発明によれば、断面データの輪郭に近
い形状の硬化層を得ることができ、この処理に従い造形
された造形物は、その外形表面に現れる凹凸が少なく、
造形物の製品品質を向上させることができる。According to the present invention, it is possible to obtain a hardened layer having a shape close to the contour of the cross-sectional data.
The product quality of the molded article can be improved.
【図１】本発明による立体造形装置の一実施形態を示す
正面図である。FIG. 1 is a front view showing an embodiment of a three-dimensional printing apparatus according to the present invention.
【図２】液晶マスクの支持形態を示す図である。FIG. 2 is a view showing a supporting form of a liquid crystal mask.
【図３】第１の面状パターンを示す図である。FIG. 3 is a diagram showing a first planar pattern.
【図４】第２の面状パターンを示す図である。FIG. 4 is a diagram showing a second planar pattern.
【図５】本実施形態により得られた樹脂硬化層を示す図
である。FIG. 5 is a view showing a cured resin layer obtained according to the embodiment.
【図６】マスク作成手順を示すフローチャートである。FIG. 6 is a flowchart illustrating a mask creation procedure.
【図７】別の実施形態を示す図である。FIG. 7 is a diagram showing another embodiment.
【図８】別の実施形態を示す図である。FIG. 8 is a diagram showing another embodiment.
【図９】液晶マスクの支持形態の別の実施形態を示す図
である。FIG. 9 is a diagram showing another embodiment of a supporting form of the liquid crystal mask.
１ 立体造形装置 ３ 造形テーブル ５Ａ 未硬化樹脂層 ５ 造形物 ７ 投影レンズ ９，９Ａ，９Ｂ 液晶マスク １１ 光源 １３ レンズ １５ 制御手段 ２３ 制御装置 ２５ 光源電源 ５１ フレーム ５３Ａ〜５３Ｄ コイルばね ５５Ａ〜５５Ｄ ピエゾ素子（マスク変位機構） ６１ 光変位機構 １００ 表示画素 DESCRIPTION OF SYMBOLS 1 Solid modeling apparatus 3 Modeling table 5A Uncured resin layer 5 Modeling object 7 Projection lens 9, 9A, 9B Liquid crystal mask 11 Light source 13 Lens 15 Control means 23 Control device 25 Light source power supply 51 Frame 53A-53D Coil spring 55A-55D Piezo element (Mask displacement mechanism) 61 Light displacement mechanism 100 Display pixel
Claims (9)
設定された硬化媒体により材料を硬化し、この硬化した
層の積層を繰り返すことにより立体物を造形する立体造
形装置において、 上記材料表面上における上記硬化媒体か上記材料の少な
くとも一方を互いに平行移動させる変位手段を備えたこ
とを特徴とする立体造形装置。1. A three-dimensional molding apparatus for curing a material with a curing medium set in a planar shape in accordance with data relating to three-dimensional modeling, and forming a three-dimensional object by repeating lamination of the cured layers. 3. The three-dimensional printing apparatus according to claim 1, further comprising a displacement unit configured to move at least one of the curing medium and the material in parallel with each other.
り、上記材料が光硬化性樹脂であることを特徴とする請
求項１記載の立体造形装置。2. The three-dimensional molding apparatus according to claim 1, wherein the curing medium is light set in a planar shape, and the material is a photocurable resin.
透過により形成され、上記変位手段がこの液晶マスクを
平行移動させるマスク変位機構を含むことを特徴とする
請求項２記載の立体造形装置。3. The three-dimensional structure according to claim 2, wherein the light set in a planar shape is formed by transmission of a liquid crystal mask, and the displacement means includes a mask displacement mechanism for translating the liquid crystal mask. apparatus.
透過により形成され、上記変位手段がこの液晶マスクを
透過した光を平行移動させる光変位機構を含むことを特
徴とする請求項２記載の立体造形装置。4. The apparatus according to claim 2, wherein the light set in a planar shape is formed by transmission through a liquid crystal mask, and the displacement means includes a light displacement mechanism for translating the light transmitted through the liquid crystal mask. The three-dimensional modeling device according to the description.
透過により形成され、この液晶マスクがマスク面と直交
方向に重ねて配置されると共に、それぞれの表示画素の
位置がマスク面と平行方向に変位して配置された複数の
液晶マスクで構成されることを特徴とする請求項２記載
の立体造形装置。5. The light set in a planar shape is formed by transmission of a liquid crystal mask, and the liquid crystal mask is disposed so as to overlap with the mask surface in a direction orthogonal to the mask surface, and the position of each display pixel is parallel to the mask surface. 3. The three-dimensional printing apparatus according to claim 2, comprising a plurality of liquid crystal masks displaced in a direction.
マディスプレイ等の面光源により形成されることを特徴
とする請求項１記載の立体造形装置。6. The three-dimensional molding apparatus according to claim 1, wherein the curing medium is formed by a surface light source such as a cathode ray tube or a plasma display.
ラーとにより形成されることを特徴とする請求項１記載
の立体造形装置。7. The three-dimensional molding apparatus according to claim 1, wherein the curing medium is formed by light and a digital micromirror.
り、上記材料が熱硬化性または熱可塑性樹脂であり、こ
の未硬化樹脂層の層表面上における上記熱か熱硬化性ま
たは熱可塑性樹脂の少なくとも一方を互いに平行移動さ
せる変位手段を備えたことを特徴とする請求項１記載の
立体造形装置。8. The method according to claim 1, wherein the curing medium is heat set in a planar shape, the material is a thermosetting or thermoplastic resin, and the thermosetting or thermosetting or thermosetting resin on the surface of the uncured resin layer. 2. The three-dimensional molding apparatus according to claim 1, further comprising a displacement unit that moves at least one of the plastic resins in parallel with each other.
設定された硬化媒体により材料を硬化し、この硬化した
層の積層を繰り返すことにより立体物を造形する立体造
形方法において、 上記材料を１層分硬化する場合、まず第１の面状パター
ンに従い硬化し、ついで第２或いはそれ以上の面状パタ
ーンに従い硬化するとき、上記材料表面上における上記
硬化媒体か上記材料の少なくとも一方を互いに平行移動
させることを特徴とする立体造形装置。9. A three-dimensional molding method for curing a material with a curing medium set in a planar shape in accordance with data relating to three-dimensional modeling, and forming a three-dimensional object by repeating lamination of the cured layers. In the case of layer-by-layer curing, first curing according to a first planar pattern, and then curing according to a second or more planar pattern, at least one of the curing medium and the material on the material surface is moved in parallel with each other. A three-dimensional modeling device characterized by being made to work.
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| JP2006285261A (en) * | 2005-04-01 | 2006-10-19 | Three D Syst Inc | Improved edge smoothness with low resolution projected image for use in solid imaging |
| JP2007536131A (en) * | 2004-05-10 | 2007-12-13 | エンヴィジョンテック ゲーエムベーハー | 3D object manufacturing process with resolution improvement by pixel shift |
| JP2008027438A (en) * | 2006-07-19 | 2008-02-07 | Envisiontec Gmbh | Method and device for producing three-dimensional object, and computer and data carrier useful thereof |
| JP2008068621A (en) * | 2006-08-29 | 2008-03-27 | Three D Syst Inc | Improvement of wall surface smoothness, feature accuracy and resolution of projected image by exposure level in solid image formation |
| US7962238B2 (en) | 2004-05-10 | 2011-06-14 | Envisiontec Gmbh | Process for the production of a three-dimensional object with resolution improvement by pixel-shift |
| JP2017001285A (en) * | 2015-06-10 | 2017-01-05 | ローランドディー．ジー．株式会社 | Apparatus for creating slice image, three-dimensional printing system, and method for creating slice image |
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| WO2018154847A1 (en) * | 2017-02-27 | 2018-08-30 | 株式会社ジャパンディスプレイ | Photofabrication apparatus |
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| US7962238B2 (en) | 2004-05-10 | 2011-06-14 | Envisiontec Gmbh | Process for the production of a three-dimensional object with resolution improvement by pixel-shift |
| US8862260B2 (en) | 2004-05-10 | 2014-10-14 | Envisiontec Gmbh | Process for the production of a three-dimensional object with resolution improvement by “pixel shift” |
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| JP2006285261A (en) * | 2005-04-01 | 2006-10-19 | Three D Syst Inc | Improved edge smoothness with low resolution projected image for use in solid imaging |
| JP2008027438A (en) * | 2006-07-19 | 2008-02-07 | Envisiontec Gmbh | Method and device for producing three-dimensional object, and computer and data carrier useful thereof |
| JP2008068621A (en) * | 2006-08-29 | 2008-03-27 | Three D Syst Inc | Improvement of wall surface smoothness, feature accuracy and resolution of projected image by exposure level in solid image formation |
| US9415544B2 (en) | 2006-08-29 | 2016-08-16 | 3D Systems, Inc. | Wall smoothness, feature accuracy and resolution in projected images via exposure levels in solid imaging |
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| WO2022176283A1 (en) * | 2021-02-18 | 2022-08-25 | 株式会社フジクラ | Method for manufacturing stereolithographically fabricated object |
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