JP2002203488A - Multi-cavity klystron device - Google Patents
Multi-cavity klystron deviceInfo
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- JP2002203488A JP2002203488A JP2000399002A JP2000399002A JP2002203488A JP 2002203488 A JP2002203488 A JP 2002203488A JP 2000399002 A JP2000399002 A JP 2000399002A JP 2000399002 A JP2000399002 A JP 2000399002A JP 2002203488 A JP2002203488 A JP 2002203488A
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明は、高周波入力信号
を動作周波数よりも低く設定できる多空胴クライストロ
ン装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multi-cavity klystron apparatus capable of setting a high-frequency input signal lower than an operating frequency.
【０００２】[0002]
【従来の技術】多空胴クライストロン装置は、電子銃が
発生した電子ビームの作用によって高周波信号を増幅す
る電子管で、高周波入力信号が入力する入力空胴および
増幅した高周波出力信号を取り出す出力空胴、入力空胴
と出力空胴間に位置する中間空胴などから構成されてい
る。2. Description of the Related Art A multi-cavity klystron device is an electron tube for amplifying a high-frequency signal by the action of an electron beam generated by an electron gun. The multi-cavity klystron device is an input cavity for receiving a high-frequency input signal and an output cavity for extracting an amplified high-frequency output signal. , An intermediate cavity located between the input cavity and the output cavity.
【０００３】ここで、従来の多空胴クライストロン装置
について図３を参照して説明する。Here, a conventional multi-cavity klystron apparatus will be described with reference to FIG.
【０００４】符号３１は電子銃で、電子銃３１は電子ビ
ームｅを発生するカソード３１ａおよび電子ビームｅを
加速する陽極３１ｂなどから構成されている。電子銃３
１の前方たとえば電子ビームｅの進行方向に、入力空胴
３２および複数の中間空胴３３、出力空胴３４、電子ビ
ームｅを捕捉するコレクタ３５などが順に配置されてい
る。入力空胴３２と中間空胴３３間、中間空胴３３どう
し、中間空胴３３と出力空胴３４間はドリフト管３６で
接続されている。Reference numeral 31 denotes an electron gun. The electron gun 31 includes a cathode 31a for generating an electron beam e, an anode 31b for accelerating the electron beam e, and the like. Electron gun 3
An input cavity 32, a plurality of intermediate cavities 33, an output cavity 34, a collector 35 for capturing the electron beam e, and the like are arranged in this order in front of, for example, the traveling direction of the electron beam e. A drift tube 36 is connected between the input cavity 32 and the intermediate cavity 33, between the intermediate cavities 33, and between the intermediate cavity 33 and the output cavity 34.
【０００５】入力空胴３２に、高周波入力信号を入力す
る入力線路３７たとえば同軸線路が接続されている。出
力空胴３４に、増幅した高周波出力信号を外部に伝送す
る出力線路３８たとえば導波管が接続され、出力線路３
８の一部に出力窓３９が設けられている。なお、符号ｍ
は管軸を示している。The input cavity 32 is connected to an input line 37 for inputting a high-frequency input signal, for example, a coaxial line. The output cavity 34 is connected to an output line 38 for transmitting the amplified high-frequency output signal to the outside, for example, a waveguide.
8 is provided with an output window 39. Note that the symbol m
Indicates a tube axis.
【０００６】上記の構成において、電子銃３１が発生し
た電子ビームｅは、入力空胴３２に入力する高周波入力
信号で速度変調され、その後、ドリフト管３６を通過中
に密度変調される。このような電子ビームｅの作用で、
増幅した高周波出力信号が出力空胴３４で取り出され、
出力線路３８を通して外部に出力される。In the above configuration, the electron beam e generated by the electron gun 31 is velocity-modulated by a high-frequency input signal input to the input cavity 32, and then density-modulated while passing through the drift tube 36. By the action of such an electron beam e,
The amplified high frequency output signal is taken out by the output cavity 34,
The signal is output to the outside through the output line 38.
【０００７】上記した多空胴クライストロン装置の場
合、入力空胴３２および中間空胴３３、出力空胴３４の
各共振周波数は高周波入力信号や高周波出力信号の周波
数とほぼ一致する値に設定されている。In the case of the above-described multi-cavity klystron device, the resonance frequencies of the input cavity 32, the intermediate cavity 33, and the output cavity 34 are set to values substantially matching the frequencies of the high-frequency input signal and the high-frequency output signal. I have.
【０００８】[0008]
【発明が解決しようとする課題】従来の多空胴クライス
トロン装置は、高周波入力信号および高周波出力信号の
周波数が等しく設定され、また、入力空胴および中間空
胴、出力空胴の共振周波数もそれぞれ高周波入力信号な
どの周波数とほぼ等しい値に設定されている。In the conventional multi-cavity klystron device, the frequencies of the high-frequency input signal and the high-frequency output signal are set to be equal, and the resonance frequencies of the input cavity, the intermediate cavity, and the output cavity are respectively set. It is set to a value substantially equal to the frequency of the high-frequency input signal or the like.
【０００９】この場合、高周波出力信号の周波数が相違
すると、その周波数に合わせた周波数の高周波信号を発
生する高周波入力信号の周波数が設定される。たとえ
ば、線形加速器などでよく用いられるＳ帯の多空胴クラ
イストロン装置の場合は、Ｓ帯の高周波信号を発生する
高周波発生装置が入力信号源として利用される。Ｓ帯の
２倍の周波数であるＣ帯、あるいは、３〜４倍の周波数
であるＸ帯で動作させる場合は、それらの周波数帯に合
わせた高周波信号を発生する高周波発生装置が入力信号
源として用いられる。In this case, if the frequency of the high-frequency output signal is different, the frequency of the high-frequency input signal that generates a high-frequency signal having a frequency corresponding to the frequency is set. For example, in the case of an S-band multi-cavity klystron device often used in a linear accelerator or the like, a high-frequency generator that generates an S-band high-frequency signal is used as an input signal source. When operating in the C band, which is twice the frequency of the S band, or the X band, which is three to four times the frequency, a high frequency generator which generates a high frequency signal in accordance with those frequency bands is used as an input signal source. Used.
【００１０】上記したように、従来の多空胴クライスト
ロン装置では、高周波入力信号を生成する入力信号源と
して、装置から出力される高周波出力信号の周波数すな
わち動作周波数に合わせた高周波信号を発生する高周波
発生装置が利用される。As described above, in the conventional multi-cavity klystron apparatus, as an input signal source for generating a high-frequency input signal, a high-frequency signal for generating a high-frequency signal in accordance with the frequency of the high-frequency output signal output from the apparatus, that is, the operating frequency. A generator is used.
【００１１】ところで、高周波信号を伝送する伝送線路
たとえば同軸線路は周波数が高くなると伝送損失が増加
する特性がある。たとえば、Ｘ帯など高い周波数で動作
する多空胴クライストロン装置の場合、高周波入力信号
の周波数も高くなるため、高周波入力信号を入力空胴に
伝送する入力線路としてたとえば導波管が用いられる。
そのため、伝送線路部分の構造が複雑化し、取り扱いが
困難になるという問題がある。By the way, a transmission line for transmitting a high-frequency signal, for example, a coaxial line has a characteristic that the transmission loss increases as the frequency increases. For example, in the case of a multi-cavity klystron device operating at a high frequency such as the X band, the frequency of a high-frequency input signal is also high, so that, for example, a waveguide is used as an input line for transmitting the high-frequency input signal to the input cavity.
Therefore, there is a problem that the structure of the transmission line portion becomes complicated and handling becomes difficult.
【００１２】この発明は、上記した欠点を解決するため
に、高周波入力信号を動作周波数より低く設定できる多
空胴クライストロン装置を提供することを目的とする。An object of the present invention is to provide a multi-cavity klystron apparatus which can set a high-frequency input signal lower than an operating frequency in order to solve the above-mentioned drawbacks.
【００１３】[0013]
【課題を解決するための手段】本発明は、高周波入力信
号が入力する入力空胴と、この入力空胴の電子ビームの
進行方向に位置する少なくとも１個の中間空胴と、増幅
された所定動作周波数の高周波出力信号を出力する出力
空胴とを具備した多空胴クライストロン装置において、
前記入力空胴の共振周波数を前記動作周波数の２分の１
の周波数またはこの周波数に近い周波数に設定し、前記
出力空胴の共振周波数を前記動作周波数に設定したこと
を特徴としている。According to the present invention, there is provided an input cavity to which a high-frequency input signal is input, at least one intermediate cavity located in a traveling direction of an electron beam of the input cavity, and an amplified predetermined cavity. An output cavity for outputting a high-frequency output signal of an operating frequency, and a multi-cavity klystron device comprising:
Set the resonance frequency of the input cavity to one half of the operating frequency
Or a frequency close to this frequency, and the resonance frequency of the output cavity is set to the operating frequency.
【００１４】[0014]
【発明の実施の形態】本発明の実施形態について図１を
参照して説明する。符号１１は２極管型電子銃で、電子
銃１１は電子ビームｅを発生するカソード１１ａおよび
電子ビームｅを加速する陽極１１ｂなどから構成されて
いる。電子銃１１の前方すなわち電子ビームｅの進行方
向に入力空胴１２が配置されている。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described with reference to FIG. Reference numeral 11 denotes a diode electron gun. The electron gun 11 includes a cathode 11a for generating an electron beam e, an anode 11b for accelerating the electron beam e, and the like. An input cavity 12 is arranged in front of the electron gun 11, that is, in the direction of travel of the electron beam e.
【００１５】入力空胴１２の共振周波数は、増幅され出
力する高周波出力信号の周波数すなわち動作周波数（ｆ
O ）の２分の１の周波数（ｆO ／２）、あるいは、これ
に近い周波数に設定されている。また、入力空胴１２
に、高周波入力信号を入力する入力線路１３たとえば同
軸線路が接続され、入力空胴１２の前方に、たとえば２
個の第１中間空胴１４ａ、１４ｂが配置されている。The resonance frequency of the input cavity 12 is the frequency of the amplified high-frequency output signal, that is, the operating frequency (f).
O) is set to a half frequency (fO / 2) or a frequency close thereto. Also, the input cavity 12
Is connected to an input line 13 for inputting a high-frequency input signal, for example, a coaxial line.
The first intermediate cavities 14a and 14b are arranged.
【００１６】第１中間空胴１４ａ、１４ｂの共振周波数
は、入力空胴１２の共振周波数（ｆO ／２）と等しい周
波数またはこれに近い値の適宜離調された周波数に設定
されている。また、第１中間空胴１４ａ、１４ｂの前方
に、たとえば２個の第２中間空胴１５ａ、１５ｂが配置
されている。The resonance frequency of the first intermediate cavities 14a and 14b is set to a frequency equal to or close to the resonance frequency (fO / 2) of the input cavity 12, as appropriate. Further, for example, two second intermediate cavities 15a and 15b are arranged in front of the first intermediate cavities 14a and 14b.
【００１７】第２中間空胴１５ａ、１５ｂの共振周波数
は、動作周波数（ｆO ）すなわち入力空胴１２の共振周
波数の２倍の周波数またはこれに近い値の適宜離調され
た周波数に設定されている。そして、第２中間空胴１５
ａ、１５ｂの前方に、増幅された高周波出力信号を取り
出す出力空胴１６が配置されている。The resonance frequency of the second intermediate cavities 15a and 15b is set to an operating frequency (fo), that is, a frequency twice as high as the resonance frequency of the input cavity 12, or a frequency detuned to a value close thereto. I have. And the second intermediate cavity 15
An output cavity 16 for extracting an amplified high-frequency output signal is disposed in front of the output cavities a and 15b.
【００１８】出力空胴１６の共振周波数は動作周波数
（ｆO ）に設定されている。また、出力空胴１６に、増
幅された高周波出力信号を外部に伝送する出力線路１７
たとえば導波管が接続され、出力線路１７の一部に出力
窓１８が設けられている。また、出力空胴１６の前方
に、出力空胴１６を通過した電子ビームｅを捕捉するコ
レクタ１９が配置されている。なお、符号ｍは管軸を示
している。The resonance frequency of the output cavity 16 is set to the operating frequency (f0). An output line 17 for transmitting the amplified high-frequency output signal to the outside is provided to the output cavity 16.
For example, a waveguide is connected, and an output window 18 is provided in a part of the output line 17. Further, a collector 19 for capturing the electron beam e passing through the output cavity 16 is disposed in front of the output cavity 16. The symbol m indicates the tube axis.
【００１９】上記の入力空胴１２および第１中間空胴１
４ａ、１４ｂ、第２中間空胴１５ａ、１５ｂ、出力空胴
１６の各空胴間はドリフト管２０で接続され、また、各
空胴の配置などは、動作周波数すなわち高周波入力信号
の高調波成分（ｆO ）を増幅するのに適した構成になっ
ている。The above-mentioned input cavity 12 and first intermediate cavity 1
4a, 14b, the second intermediate cavities 15a, 15b, and the output cavity 16 are connected to each other by a drift tube 20, and the arrangement of the cavities depends on the operating frequency, that is, the harmonic component of the high frequency input signal. The configuration is suitable for amplifying (f0).
【００２０】各空胴およびドリフト管２０の外側には、
電子ビームｅを集束するための磁場を形成する磁界装置
（図示せず）が配置されている。Outside each cavity and drift tube 20,
A magnetic field device (not shown) for forming a magnetic field for focusing the electron beam e is provided.
【００２１】上記した構成において、たとえば動作周波
数（ｆ0 ）の２分の１の周波数をもつ高周波入力信号が
入力線路１３から入力空胴１２に入力され、入力空胴１
２部分を通過する電子ビームｅが速度変調される。速度
変調された電子ビームｅは、その後、第２中間空胴１５
ａ、１５ｂなどでたとえば２倍の高調波成分が選択的に
増幅され、増幅された動作周波数の高周波出力信号が出
力空胴１６から取り出され、出力線路１７に出力され
る。In the above-described configuration, for example, a high-frequency input signal having a frequency half the operating frequency (f0) is input from the input line 13 to the input cavity 12, and the input cavity 1
The electron beam e passing through the two portions is velocity-modulated. The velocity-modulated electron beam e is then applied to the second intermediate cavity 15
For example, a double harmonic component is selectively amplified by a, 15b, and the like, and a high-frequency output signal of the amplified operating frequency is extracted from the output cavity 16 and output to the output line 17.
【００２２】ここで、管軸に沿って走行する電子ビーム
中の高調波成分について図２を参照して説明する。図２
の横軸は電子ビームの進行方向たとえば管軸方向を示
し、たとえば入力空胴１２の位置を符号Ａ、第１および
第２の中間空胴１４ａ、１４ｂ、１５ａ、１５ｂの位置
を符号Ｂ〜Ｅ、出力空胴１６の位置を符号Ｆで示してい
る。縦軸は、電子ビーム中の高調波成分を示している。
図中、符号Ｐがｆ0 ／２の周波数成分、符号Ｑがｆ0 の
周波数成分である。Here, harmonic components in the electron beam traveling along the tube axis will be described with reference to FIG. FIG.
The horizontal axis indicates the traveling direction of the electron beam, for example, the tube axis direction. For example, the position of the input cavity 12 is denoted by A, and the positions of the first and second intermediate cavities 14a, 14b, 15a, 15b are denoted by B to E. , The position of the output cavity 16 is indicated by the symbol F. The vertical axis indicates a harmonic component in the electron beam.
In the figure, the symbol P is a frequency component of f0 / 2, and the symbol Q is a frequency component of f0.
【００２３】図２に示すように、電子ビームｅは入力空
胴１２を通過中に受ける速度変調によって、ｆO ／２の
周波数成分（符号Ｐ）、および、この周波数の２倍の高
調波成分（符号Ｑ）が発生する。この場合、各空胴の空
胴パラメータや配置が、高調波成分のうちｆO 成分を増
幅するように選定されているため、ｆO 成分が次第に大
きくなり、出力空胴１６（符号Ｆ）の部分ではｆO 成分
が支配的となる。このｆO 成分が出力空胴１６から取り
出され、高周波出力信号として出力線路１７に出力され
る。As shown in FIG. 2, the electron beam e is subjected to a velocity modulation during passage through the input cavity 12 to have a frequency component of fO / 2 (symbol P) and a harmonic component twice as high as this frequency (sign P). Sign Q) occurs. In this case, since the cavity parameters and arrangement of each cavity are selected so as to amplify the f0 component among the harmonic components, the f0 component gradually increases, and the portion of the output cavity 16 (symbol F) is increased. The fO component becomes dominant. The fo component is extracted from the output cavity 16 and output to the output line 17 as a high-frequency output signal.
【００２４】上記した構成によれば、たとえば高周波入
力信号の周波数が動作周波数より低い場合でも、所望の
動作周波数をもつ高周波出力信号が出力される。したが
って、動作周波数が高くても、高周波入力信号の周波数
を低く設定できる。その結果、たとえば入力空胴に接続
する入力線路を同軸線路で構成でき、伝送線路部分の構
造が簡単になり、取り扱いも容易になる。また、高周波
入力信号の周波数を設定する自由度も大きくなるため、
動作周波数が相違するシステムへの対応も容易になる。According to the above configuration, for example, even when the frequency of the high-frequency input signal is lower than the operating frequency, a high-frequency output signal having a desired operating frequency is output. Therefore, even if the operating frequency is high, the frequency of the high-frequency input signal can be set low. As a result, for example, the input line connected to the input cavity can be constituted by a coaxial line, so that the structure of the transmission line portion is simplified and handling is facilitated. Also, since the degree of freedom for setting the frequency of the high-frequency input signal is increased,
It is easy to deal with systems having different operating frequencies.
【００２５】上記の実施形態では、高周波入力信号の周
波数を動作周波数の２分の１とし、入力空胴およびこの
入力空胴から順に隣り合うたとえば２つの中間空胴の共
振周波数を動作周波数のほぼ１／２に設定している。し
かし、高周波入力信号の周波数および入力空胴の共振周
波数、入力空胴から順に隣り合う中間空胴の共振周波数
は、一般に、動作周波数のｎ分の１（ｎは整数）に設定
できる。また、これらの中間空胴の数は３個以上でもよ
く、また、省略することもできる。In the above-described embodiment, the frequency of the high-frequency input signal is set to one half of the operating frequency, and the resonance frequency of the input cavity and, for example, two intermediate cavities adjacent to the input cavity in order from the operating frequency is set to approximately the operating frequency. It is set to 1/2. However, the frequency of the high-frequency input signal, the resonance frequency of the input cavity, and the resonance frequency of the intermediate cavity adjacent in order from the input cavity can generally be set to 1 / n (n is an integer) of the operating frequency. Further, the number of these intermediate cavities may be three or more, or may be omitted.
【００２６】また、共振周波数が動作周波数のｎ分の１
（ｎは整数）の中間空胴に加えて、たとえばその後段
に、共振周波数が動作周波数のｍ分の１（ｍは整数で、
たとえばｎよりも小さい）の中間空胴を設けることもで
きる。この場合、共振周波数が動作周波数のｎ分の１の
中間空胴および共振周波数が動作周波数のｍ分の１の中
間空胴の数は、それぞれ動作条件に応じて適宜設定でき
る。The resonance frequency is 1 / n of the operating frequency.
In addition to the intermediate cavity (n is an integer), for example, in the subsequent stage, the resonance frequency is 1 / m of the operating frequency (m is an integer,
(E.g. less than n) intermediate cavities can also be provided. In this case, the number of intermediate cavities whose resonance frequency is 1 / n of the operating frequency and the number of intermediate cavities whose resonance frequency is 1 / m of the operating frequency can be appropriately set according to operating conditions.
【００２７】また、上記の実施形態では、共振周波数が
動作周波数の中間空胴を、出力空胴の直前に２個設けて
いる。この中間空胴は３個以上とすることもでき、ま
た、動作条件によって省略することもできる。In the above embodiment, two intermediate cavities having a resonance frequency of the operating frequency are provided immediately before the output cavity. The number of the intermediate cavities may be three or more, or may be omitted depending on operating conditions.
【００２８】[0028]
【発明の効果】本発明によれば、高周波入力信号を動作
周波数よりも低くできる多空胴クライストロン装置を実
現できる。According to the present invention, it is possible to realize a multi-cavity klystron device capable of lowering a high-frequency input signal below an operating frequency.
【図１】本発明の実施形態を説明するための概略の構造
図である。FIG. 1 is a schematic structural diagram for explaining an embodiment of the present invention.
【図２】本発明の動作を説明するための特性図である。FIG. 2 is a characteristic diagram for explaining the operation of the present invention.
【図３】従来例を説明するための概略の構造図である。FIG. 3 is a schematic structural diagram for explaining a conventional example.
１１…電子銃 １２…入力空胴 １３…入力線路 １４ａ、１４ｂ…第１中間空胴 １５ａ、１５ｂ…第２中間空胴 １６…出力空胴 １７…出力線路 １８…出力窓 １９…コレクタ ２０…ドリフト管 DESCRIPTION OF SYMBOLS 11 ... Electron gun 12 ... Input cavity 13 ... Input line 14a, 14b ... 1st intermediate cavity 15a, 15b ... 2nd intermediate cavity 16 ... Output cavity 17 ... Output line 18 ... Output window 19 ... Collector 20 ... Drift tube
Claims (6)
この入力空胴の電子ビームの進行方向に位置する少なく
とも１個の中間空胴と、増幅された所定動作周波数の高
周波出力信号を出力する出力空胴とを具備した多空胴ク
ライストロン装置において、前記入力空胴の共振周波数
を前記動作周波数の２分の１の周波数またはこの周波数
に近い周波数に設定し、前記出力空胴の共振周波数を前
記動作周波数に設定したことを特徴とする多空胴クライ
ストロン装置。An input cavity into which a high-frequency input signal is input;
A multi-cavity klystron device comprising at least one intermediate cavity positioned in a direction of travel of the electron beam of the input cavity and an output cavity for outputting an amplified high-frequency output signal having a predetermined operating frequency; A multi-cavity klystron, wherein a resonance frequency of an input cavity is set to a frequency which is half of the operating frequency or a frequency close to this frequency, and a resonance frequency of the output cavity is set to the operating frequency. apparatus.
この入力空胴の電子ビームの進行方向に位置する少なく
とも１個の中間空胴と、増幅された所定動作周波数の高
周波出力信号を出力する出力空胴とを具備した多空胴ク
ライストロン装置において、前記入力空胴の共振周波数
を前記動作周波数のｎ（ｎは整数）分の１の周波数また
はこの周波数に近い周波数に設定し、前記出力空胴の共
振周波数を前記動作周波数に設定したことを特徴とする
多空胴クライストロン装置。2. An input cavity into which a high-frequency input signal is input;
A multi-cavity klystron device comprising at least one intermediate cavity positioned in a direction of travel of the electron beam of the input cavity and an output cavity for outputting an amplified high-frequency output signal having a predetermined operating frequency; The resonance frequency of the input cavity is set to a frequency that is 1 / n (n is an integer) of the operating frequency or a frequency close to this frequency, and the resonance frequency of the output cavity is set to the operating frequency. Multi-cavity klystron device.
を動作周波数のｎ（ｎは整数）分の１の周波数またはこ
の周波数に近い周波数に設定した請求項２記載の多空胴
クライストロン装置。3. The multi-cavity klystron apparatus according to claim 2, wherein at least one resonance frequency of the intermediate cavity is set to a frequency that is 1 / n (n is an integer) of the operating frequency or a frequency close to this frequency.
を動作周波数またはこの動作周波数に近い周波数に設定
した請求項１または請求項２記載の多空胴クライストロ
ン装置。4. The multi-cavity klystron apparatus according to claim 1, wherein at least one resonance frequency of the intermediate cavity is set to an operating frequency or a frequency close to the operating frequency.
を動作周波数のｎ（ｎは整数）分の１の周波数またはこ
の周波数に近い周波数に設定し、他の中間空胴の少なく
とも１個の共振周波数を動作周波数またはこの動作周波
数に近い周波数に設定した請求項２記載の多空胴クライ
ストロン装置。5. The method according to claim 5, wherein at least one resonance frequency of the intermediate cavity is set to a frequency that is n / n (n is an integer) of the operating frequency or a frequency close to this frequency, and at least one resonance frequency of another intermediate cavity is set. 3. The multi-cavity klystron apparatus according to claim 2, wherein the resonance frequency is set to an operating frequency or a frequency close to the operating frequency.
を動作周波数のｎ（ｎは整数）分の１の周波数またはこ
の周波数に近い周波数に設定し、他の中間空胴の少なく
とも１個の共振周波数を動作周波数のｍ（ｍはｎと相違
する整数）分の１の周波数またはこの周波数に近い周波
数に設定した請求項２記載の多空胴クライストロン装
置。6. At least one resonance frequency of the intermediate cavity is set to a frequency that is n / n (n is an integer) of the operating frequency or a frequency close to this frequency, and at least one resonance frequency of another intermediate cavity is set. 3. The multi-cavity klystron apparatus according to claim 2, wherein the resonance frequency is set to a frequency that is 1 / m (m is an integer different from n) of the operating frequency or a frequency close to this frequency.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000399002A JP2002203488A (en) | 2000-12-27 | 2000-12-27 | Multi-cavity klystron device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000399002A JP2002203488A (en) | 2000-12-27 | 2000-12-27 | Multi-cavity klystron device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002203488A true JP2002203488A (en) | 2002-07-19 |
Family
ID=18863855
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000399002A Pending JP2002203488A (en) | 2000-12-27 | 2000-12-27 | Multi-cavity klystron device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002203488A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019192344A (en) * | 2018-04-18 | 2019-10-31 | キヤノン電子管デバイス株式会社 | Klystron |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2579480A (en) * | 1947-08-26 | 1951-12-25 | Sperry Corp | Ultrahigh-frequency electron discharge apparatus |
| WO1999028943A1 (en) * | 1997-11-27 | 1999-06-10 | Eev Limited | Electron beam tubes |
-
2000
- 2000-12-27 JP JP2000399002A patent/JP2002203488A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2579480A (en) * | 1947-08-26 | 1951-12-25 | Sperry Corp | Ultrahigh-frequency electron discharge apparatus |
| WO1999028943A1 (en) * | 1997-11-27 | 1999-06-10 | Eev Limited | Electron beam tubes |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019192344A (en) * | 2018-04-18 | 2019-10-31 | キヤノン電子管デバイス株式会社 | Klystron |
| JP7032222B2 (en) | 2018-04-18 | 2022-03-08 | キヤノン電子管デバイス株式会社 | Klystron |
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