JP2002097566A - Electron gun for electron beam vapor deposition - Google Patents
Electron gun for electron beam vapor depositionInfo
- Publication number
- JP2002097566A JP2002097566A JP2000282495A JP2000282495A JP2002097566A JP 2002097566 A JP2002097566 A JP 2002097566A JP 2000282495 A JP2000282495 A JP 2000282495A JP 2000282495 A JP2000282495 A JP 2000282495A JP 2002097566 A JP2002097566 A JP 2002097566A
- Authority
- JP
- Japan
- Prior art keywords
- hearth
- crucible
- electron gun
- vapor deposition
- recesses
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は蒸着装置に使用され
る電子銃の改良に関し、特に電子ビームを出射する電子
銃本体と、電子銃から出射された電子ビームにより加熱
される蒸着材料を収容した坩堝を複数保持するハースと
を備えた電子銃の改良に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement in an electron gun used in a vapor deposition apparatus, and more particularly to an electron gun body for emitting an electron beam and a vapor deposition material heated by the electron beam emitted from the electron gun. The present invention relates to an improvement of an electron gun including a hearth holding a plurality of crucibles.
【０００２】[0002]
【従来の技術】レンズ等の各種光学部品や、電子、電
気、自動車、半導体、鉄鋼等、あらゆる産業分野におい
て、蒸着対象物に成膜を行う為の蒸着装置が用いられて
いる。蒸着装置は、真空槽内において電子ビーム蒸着用
の電子銃から対象物に向けて蒸着物質を蒸発させること
により対象物に対して蒸着物質を付着させて蒸着物質膜
を成膜する装置である。図３(a)及び(b)は従来の蒸着装
置の概略構成図、及び従来の電子ビーム蒸着用電子銃の
概略構成図である。(a)に示した蒸着装置は、真空槽１
内上部に設けたドーム２と、ドーム２の下方に配置した
電子銃（蒸着源）３等を備える。ドーム２の下面には、
例えば蒸着対象物としてのガラス基板４が複数配置さ
れ、電子銃３側に装備した高融点金属等の蒸着物質を蒸
発させて各ガラス基板４の面に付着させて成膜する。図
３(b)は電子銃の構成を示す斜視図であり、電子銃３
は、電子ビームを出射する電子銃本体５と、上面に設け
た複数の坩堝収納用凹部７内に坩堝８を着脱自在に支持
する円筒状のハース６と、ハース６の上面に近接配置さ
れて電子銃本体５に近接した位置にある坩堝だけを露出
させるための開口９ａを備えた固定蓋９等を有する。電
子銃本体５は電子ビームの発生源であり、電子ビーム出
力部５ａから出力された電子ビームの進路を図示しない
磁極からの磁力線によって偏向させて開口９ａから露出
した坩堝８内の蒸着材料１０（図３(c)参照）に放射さ
せる。電子ビームが蒸着材料に衝突すると、蒸着材料は
加熱され蒸発する。蒸着材料は分子、又は原子状の蒸発
流となって蒸着対象物であるガラス基板４の表面に付着
して膜を形成する。開口９ａから露出した坩堝８内の蒸
着材料による蒸着が終了すると、ハース６を所定角度回
転させて新たな坩堝８を開口９ａから露出させ、蒸着を
再開することができる。この坩堝交換作業は、真空槽を
開閉することなく実施することができる。2. Description of the Related Art In various industrial fields such as various optical parts such as lenses, electronics, electric vehicles, automobiles, semiconductors, and steels, vapor deposition apparatuses for forming films on vapor deposition objects are used. 2. Description of the Related Art An evaporation apparatus is an apparatus that deposits an evaporation material on an object by evaporating the evaporation material from an electron gun for electron beam evaporation toward the object in a vacuum chamber, and forms a deposition material film. 3A and 3B are a schematic configuration diagram of a conventional vapor deposition apparatus and a schematic configuration diagram of a conventional electron gun for electron beam vapor deposition. The vapor deposition device shown in FIG.
A dome 2 is provided at the upper part of the inside, and an electron gun (evaporation source) 3 is provided below the dome 2. On the lower surface of the dome 2,
For example, a plurality of glass substrates 4 as an object to be vapor-deposited are arranged, and a vapor-deposited substance such as a high-melting point metal provided on the electron gun 3 side is evaporated and adhered to the surface of each glass substrate 4 to form a film. FIG. 3B is a perspective view showing the configuration of the electron gun.
Is an electron gun body 5 that emits an electron beam, a cylindrical hearth 6 that removably supports a crucible 8 in a plurality of crucible storage recesses 7 provided on the upper surface, and a cylindrical hearth 6 that is arranged close to the upper surface of the hearth 6. It has a fixed lid 9 provided with an opening 9a for exposing only the crucible located at a position close to the electron gun body 5. The electron gun main body 5 is a source of an electron beam, and deflects the path of the electron beam output from the electron beam output unit 5a by lines of magnetic force from a magnetic pole (not shown), and deposits the vapor deposition material 10 (in the crucible 8 exposed from the opening 9a). (See FIG. 3 (c)). When the electron beam collides with the deposition material, the deposition material is heated and evaporates. The vapor deposition material becomes a molecular or atomic vapor flow and adheres to the surface of the glass substrate 4 as a vapor deposition target to form a film. When the evaporation using the evaporation material in the crucible 8 exposed from the opening 9a is completed, the hearth 6 is rotated by a predetermined angle to expose a new crucible 8 from the opening 9a, and the evaporation can be restarted. This crucible exchange operation can be performed without opening and closing the vacuum chamber.
【０００３】ところで、図３(c)に示した如く、坩堝収
納用凹部７内には坩堝８が着脱可能に収容されるが、電
子銃本体５からの電子ビームの照射によって坩堝８内の
蒸着材料１０が蒸発した後は、(d)に示すように凹部７
の開口周縁に蒸着材料８のカス８ａが付着し、残留して
こびり付く。このカス８ａを放置しておくと、凹部７内
に対する坩堝８の座りが悪くなり、ビームを蒸着材料８
に照射する際の障害となる。このため、蒸着終了後に真
空槽１を開放して坩堝を交換する際に、カス８ａをサン
ドペーパーで削ってからアルコールで清掃するといった
煩雑な作業を全ての凹部７について行う必要が生じ、蒸
着装置の稼働率が低下する原因となっている。また、削
り取ったカス８ａの一部が５μｍ程度の微小な粒となっ
てハース６等に付着していると、蒸発して上昇する蒸着
材料と共に当該カス粒が浮遊して、ガラス基板４の蒸着
面に付着しやすくなる。ガラス基板４の蒸着面の蒸着膜
の一部にカス粒が付着すると、当該ガラス基板が不良品
となるばかりでなく、カス粒の付着に気付かずに当該ガ
ラス基板を他のガラス基板と張り合せて複合素子を作成
した時に、当該カス粒が障害となって２枚のガラス基板
を平行に貼り合せできなくなり、複合素子全体が不良品
がとなる。このような不具合を未然に防止する為には、
凹部７の開口周縁に付着したカス８ａを単に削り取るだ
けでなく、カス粒が残らないように入念に清掃を行うこ
とが必須の工程となっていた。このため、蒸着終了後の
清掃工程が長期化し、清掃工程が終了するまで坩堝の交
換と、次の蒸着作業が行えないという不具合があった。
これは、稼働率の低下による製造時間の長期化をもたら
していた。As shown in FIG. 3 (c), the crucible 8 is detachably accommodated in the crucible accommodating recess 7, but the crucible 8 is evacuated by irradiation of an electron beam from the electron gun body 5. After the material 10 evaporates, as shown in FIG.
The residue 8a of the vapor deposition material 8 adheres to the periphery of the opening, and remains and sticks. If the waste 8a is left unattended, the crucible 8 will not sit well in the recess 7 and the beam
It becomes an obstacle when irradiating to. For this reason, when opening the vacuum chamber 1 and exchanging the crucible after the end of the vapor deposition, it is necessary to perform a complicated operation such as shaving off the dregs 8a with sandpaper and then cleaning with alcohol with respect to all the concave portions 7. Causes the operating rate of the system to decrease. Also, if a part of the scrap 8a is a small particle of about 5 μm and adheres to the hearth 6 or the like, the dust particle floats together with the evaporation material which evaporates and rises, and the evaporation of the glass substrate 4 It easily adheres to the surface. When scum particles adhere to a part of the vapor deposition film on the vapor deposition surface of the glass substrate 4, the glass substrate becomes not only a defective product, but also the glass substrate is bonded to another glass substrate without noticing the adhesion of the scum particles. When a composite device is produced by the above method, the scum particles become an obstacle and the two glass substrates cannot be bonded in parallel, and the entire composite device becomes defective. In order to prevent such problems beforehand,
It has been an essential step to not only scrap off the scum 8a attached to the periphery of the opening of the recess 7 but also to carefully clean it so that no scum particles remain. For this reason, there is a problem that the cleaning process after the vapor deposition is prolonged, and the crucible cannot be replaced and the next vapor deposition operation cannot be performed until the cleaning process is completed.
This has led to a prolonged production time due to a reduction in the operation rate.
【０００４】[0004]
【発明が解決しようとする課題】本発明が解決しようと
する課題は、電子ビームを出射する電子銃本体と、電子
銃から出射された電子ビームにより加熱される蒸着材料
を収容した坩堝を複数保持するハースとを備えた電子銃
において、ハース上の全ての坩堝内の蒸着材料を用いた
蒸着工程が終了したあとで、真空槽を開放したままでハ
ースの坩堝収納用凹部に付着した蒸着材料のカスを除去
する煩雑且つ装置の稼働率を低下させる作業を行うこと
なく、簡単な作業によって短時間で新たな坩堝に交換し
て蒸着工程を再開することを可能にした電子ビーム蒸着
用電子銃を提供することにある。An object of the present invention is to hold an electron gun body for emitting an electron beam and a plurality of crucibles containing a vapor deposition material heated by the electron beam emitted from the electron gun. In the electron gun equipped with a hearth, after the evaporation process using the evaporation material in all the crucibles on the hearth is completed, the evaporation material adhered to the crucible storage recess of the hearth while the vacuum chamber is opened. An electron gun for electron beam evaporation that enables a simple operation to replace a new crucible in a short time and restart the vapor deposition process without performing the complicated work of removing waste and lowering the operation rate of the apparatus. To provide.
【０００５】[0005]
【課題を解決するための手段】上記課題を解決するた
め、請求項１の発明は、電子ビームを出射する電子銃本
体と、該電子銃本体に隣接配置され上端面に周方向に沿
って複数の坩堝収納用凹部を備えた回転する円筒状のハ
ースと、該ハース上端面の複数の坩堝収納用凹部のうち
の一つを除いた坩堝収納用凹部だけを露出させる開口部
を備えた固定蓋と、前記各坩堝収納用凹部内に個別に着
脱される坩堝と、から成る電子銃において、前記ハース
は、中心軸を回転自在に支持されて上端面に回転方向に
沿って複数の坩堝収納穴を備えた円筒状のハース本体
と、該各坩堝収納穴と夫々連通する連通穴を周方向に沿
って有して該ハース本体上端面に対して着脱自在に固定
される環状円盤状の分割ハースと、を備え、前記各坩堝
収納穴と前記連通穴とを連通させることにより形成され
る各坩堝収納用凹部内に前記坩堝を着脱することを特徴
とする。In order to solve the above-mentioned problems, the invention according to claim 1 comprises an electron gun main body for emitting an electron beam, and a plurality of electron gun main bodies arranged adjacent to the electron gun main body along a circumferential direction on an upper end face. A rotating cylindrical hearth having a crucible storage recess, and a fixed lid having an opening exposing only the crucible storage recess excluding one of the plurality of crucible storage recesses at the upper end surface of the hearth. And a crucible that is individually attached to and detached from each of the crucible storage recesses, wherein the hearth is rotatably supported on a central axis and has a plurality of crucible storage holes along the rotation direction at an upper end surface thereof. An annular disk-shaped split hearth having a cylindrical hearth body provided with a communication hole communicating with each of the crucible storage holes along the circumferential direction and being detachably fixed to the upper end surface of the hearth body. And each of the crucible storage holes and the communication holes And wherein the attaching and detaching the said crucible in each crucible accommodating the recess formed by communicating.
【０００６】[0006]
【発明の実施の形態】以下、本発明の一実施形態に係る
電子ビーム蒸着用電子銃について詳細に説明する。図１
は本発明の一実施形態に係る電子ビーム蒸着用電子銃の
外観構成を示す斜視図であり、図２は分解斜視図であ
る。この電子銃は図３(a)に示した如き真空槽１の下部
に配置され、ドーム２の下面に配置された蒸着対象物に
対して蒸着材料を蒸着させる手段である。本発明の電子
銃２１は、電子ビームを出射する電子銃本体２５と、該
電子銃本体２５に隣接配置され上端面２６ａに周方向に
沿って複数の坩堝収納用凹部２７を備えた回転する円筒
状のハース２６と、該ハース上端面２６ａの複数の坩堝
収納用凹部２７のうちの一つを除いた坩堝収納用凹部だ
けを露出させる開口部２８ａを備えた固定蓋２８と、前
記各坩堝収納用凹部２７内に個別に着脱される坩堝２９
と、を有する。電子銃本体２５は、電磁石３１と、フィ
ラメント３２等を備え、電磁石３１が励磁されることに
よってフィラメント３２から電子ビームが出力される。
電子ビームは図示しない磁極からの磁力線によって進路
を曲げられ、固定蓋２８の開口２８ａから露出した坩堝
収納用凹部２７内の坩堝２９内の蒸着材料３０に向けて
照射される。電子ビームの照射を受けた蒸着材料３０は
高温加熱されて分子、或は原子状の蒸着材料が蒸発す
る。ハース２６は、中心軸を回転自在に支持されて上端
面２６ａに回転方向に沿って複数の坩堝収納穴３６を備
えた円筒状のハース本体３５と、各坩堝収納穴３６と夫
々連通する連通穴３８を周方向に沿って有して該ハース
本体上端面２６ａに対して着脱自在に固定される環状円
盤状の分割ハース３７と、ハース本体３５を回転駆動す
る図示しないモータと、を備えている。坩堝収納穴３６
に対して連通穴３８が連通して整合固定されることによ
り、坩堝収納用凹部２７が形成される。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an electron gun for electron beam evaporation according to an embodiment of the present invention will be described in detail. FIG.
1 is a perspective view showing an external configuration of an electron gun for electron beam evaporation according to an embodiment of the present invention, and FIG. 2 is an exploded perspective view. The electron gun is disposed below the vacuum chamber 1 as shown in FIG. 3A, and is a means for depositing a deposition material on a deposition target disposed on the lower surface of the dome 2. The electron gun 21 of the present invention includes an electron gun main body 25 for emitting an electron beam, and a rotating cylinder provided with a plurality of crucible accommodating recesses 27 arranged adjacent to the electron gun main body 25 along the circumferential direction on an upper end surface 26a. Hearth 26, a fixed lid 28 having an opening 28a for exposing only the crucible storage recess except one of the plurality of crucible storage recesses 27 on the hearth upper end surface 26a, Crucibles 29 which are individually attached to and detached from recesses 27
And The electron gun main body 25 includes an electromagnet 31, a filament 32, and the like. When the electromagnet 31 is excited, an electron beam is output from the filament 32.
The path of the electron beam is bent by magnetic lines of force from a magnetic pole (not shown), and is irradiated toward the vapor deposition material 30 in the crucible 29 in the crucible storage recess 27 exposed from the opening 28 a of the fixed lid 28. The deposition material 30 that has been irradiated with the electron beam is heated to a high temperature, and the molecules or the atomic deposition material are evaporated. The hearth 26 has a cylindrical hearth body 35 rotatably supported on a central axis and having a plurality of crucible storage holes 36 in the upper end surface 26a along the rotation direction, and a communication hole communicating with each of the crucible storage holes 36. An annular disk-shaped divided hearth 37 having a peripheral portion 38 along the circumferential direction and being detachably fixed to the upper end surface 26a of the hearth body, and a motor (not shown) for rotating and driving the hearth body 35 are provided. . Crucible storage hole 36
The communication holes 38 communicate with each other and are aligned and fixed, thereby forming the crucible storage recess 27.
【０００７】図２(a)に示した実施形態では、ハース本
体３５はその上面中央部に円筒状の突起４０を有し、そ
の外径方向には所定の周方向ピッチで坩堝収納穴３６を
備えている。分割ハース３７は、突部４０と嵌合する嵌
合穴４１を中央部に有し、更に嵌合穴４１の外周には各
坩堝収納穴３６と一対一で対応して連通する連通穴３８
が貫通形成されている。ハース本体３５の上面に対する
分割ハース３７の固定は、例えば図示しないビス等によ
って行う。図２(b)はハース２６の要部断面図であり、
坩堝収納穴３６に対して連通穴３８が連通して整合固定
されることにより坩堝収納用凹部２７が形成される。坩
堝収納用凹部２７内には、坩堝２９が着脱自在に嵌着さ
れる。固定蓋２８は、図示しない固定部材によって回転
不能な状態で分割ハース３７の上面に対して近接配置さ
れる。開口部２８ａから露出した坩堝以外の坩堝は固定
蓋２８により隠蔽されているため、収容した蒸着材料は
電子ビームの照射を受けることがない。固定蓋２８は、
ハース上面から着脱可能に組み付ける。以上の構成にお
いて、必要とされる全ての坩堝収納用凹部２７内に、蒸
着材料を収容した坩堝２９を嵌着させた状態で、真空槽
を閉止して内部を真空化した上で、電子銃本体２５を作
動させて開口部２８ａから露出した坩堝２９内の蒸着材
料を加熱して蒸発させる。蒸着材料が費消された坩堝
は、ハース本体２６の回転によって開口部２８ａ内から
固定蓋２８の下面に移動して隠蔽され、これと同時に新
たな坩堝２９が開口部２８ａから露出されて収容した蒸
着材料が蒸着に供される。このような操作が順次繰り返
されて一連の蒸着工程を終了し、全ての坩堝を新たなも
のと交換する必要が生じた場合には真空槽を開放し、各
坩堝２９を凹部２７内から取り外した後で、固定蓋２８
を取り外し、更にハース本体３５の上面から分割ハース
３７を取り外す。従来技術の説明において説明した蒸着
後にハースに付着するカスは、本発明のハースにおいて
は、分割ハース２７の連通穴３８の内周縁（特に、テー
パ部３８ａ）に沿った部分に専ら付着し、坩堝によって
隠蔽される坩堝収納穴３６内には付着しない。従って、
カスが付着した分割ハース３７さえハース本体３５から
取り外して個別に清掃するのであれば、清掃完了を待つ
ことなく、清掃済みの分割ハース３７をハース本体３５
上に取付けることにより次の蒸着工程を実施できる。従
って、分割ハース３７を複数個用意しておけば、カスが
付着した分割ハースを取り外して清掃している間に、他
の分割ハースをハース本体３５に固定して蒸着工程を再
開できるので、稼働率が向上し、生産性が向上する。In the embodiment shown in FIG. 2A, the hearth body 35 has a cylindrical projection 40 at the center of the upper surface thereof, and the crucible storage holes 36 are formed at a predetermined circumferential pitch in the outer diameter direction. Have. The split hearth 37 has a fitting hole 41 at the center thereof for fitting with the projection 40, and a communication hole 38 on the outer periphery of the fitting hole 41 which communicates with each crucible storage hole 36 in one-to-one correspondence.
Are formed through. The division hearth 37 is fixed to the upper surface of the hearth body 35 by, for example, a screw (not shown). FIG. 2B is a sectional view of a main part of the hearth 26,
The communication hole 38 communicates with the crucible storage hole 36 and is aligned and fixed, thereby forming the crucible storage recess 27. A crucible 29 is detachably fitted in the crucible storage recess 27. The fixed lid 28 is arranged close to the upper surface of the split hearth 37 in a state where it cannot be rotated by a fixing member (not shown). Since the crucible other than the crucible exposed from the opening 28a is concealed by the fixed lid 28, the accommodated vapor deposition material is not irradiated with the electron beam. The fixed lid 28 is
Removably assembled from the top of the hearth. In the above configuration, the crucible 29 accommodating the evaporation material is fitted in all the necessary crucible accommodating recesses 27, and the vacuum chamber is closed to evacuate the inside. By operating the main body 25, the evaporation material in the crucible 29 exposed from the opening 28a is heated and evaporated. The crucible in which the evaporation material has been consumed moves from the inside of the opening 28a to the lower surface of the fixed lid 28 by the rotation of the hearth body 26 and is concealed, and at the same time, a new crucible 29 is exposed from the opening 28a and accommodated. The material is subjected to evaporation. Such operations are sequentially repeated to complete a series of vapor deposition steps, and when it becomes necessary to replace all crucibles with new ones, the vacuum chamber is opened and each crucible 29 is removed from the inside of the recess 27. Later, fixed lid 28
And the split hearth 37 is further removed from the upper surface of the hearth body 35. In the hearth of the present invention, the scum adhering to the hearth after the vapor deposition described in the description of the prior art is exclusively attached to the portion along the inner peripheral edge (particularly, the tapered portion 38a) of the communication hole 38 of the divided hearth 27, and the crucible is formed. It does not adhere in the crucible storage hole 36 concealed by the. Therefore,
If even the divided hearth 37 to which the scum adheres is removed from the hearth body 35 and individually cleaned, the cleaned hearth 37 can be removed without waiting for the completion of cleaning.
The following vapor deposition process can be performed by attaching on top. Therefore, if a plurality of divided hearths 37 are prepared, the other divided hearths can be fixed to the hearth body 35 and the vapor deposition process can be restarted while removing and cleaning the divided hearths to which the scum has adhered. The rate is improved, and the productivity is improved.
【０００８】なお、分割ハース３７については、これを
超音波洗浄器の水槽内に浸漬して丸洗いができるので、
容易且つ完全にカスの除去、残留防止を実現でき、残っ
たカスによる製品歩留の低下を防止できる。このように
本発明の電子ビーム蒸着用電子銃にあっては、電子銃本
体から電子ビームの照射を受ける蒸着材料を収容した坩
堝を支持するハースを、ハース本体と、ハース本体上面
に着脱可能に固定される分割ハースとから構成し、ハー
ス本体上面の坩堝収納穴と分割ハースの連通穴とを連通
させて坩堝収納用凹部とした。そして、一連の蒸着工程
が終了して坩堝を交換する際には、ハース本体上から分
割ハースと取り外して分割ハースを交換することにより
新たな坩堝を装着可能とした。このため、ハースに付着
したカスを除去、清掃する作業を真空槽内で行う必要が
なく、短時間で坩堝の交換作業が完了し、装置の稼働率
を高めることができる。しかも、取り外した分割ハース
を真空槽外において洗浄装置等を用いて容易且つ完全に
洗浄できるので、残留したカスが蒸着対象物に付着して
製品歩留を低下させる不具合を解消できる。The divided hearth 37 can be immersed in a water tank of an ultrasonic cleaner to be washed in a round.
It is possible to easily and completely remove scum and prevent the residue from remaining, thereby preventing a reduction in product yield due to the remaining scum. Thus, in the electron gun for electron beam evaporation according to the present invention, the hearth supporting the crucible containing the evaporation material to be irradiated with the electron beam from the electron gun main body can be detachably attached to the hearth main body and the upper surface of the hearth main body. The crucible storage recess was formed by connecting the crucible storage hole on the upper surface of the hearth body and the communication hole of the split hearth. Then, when the crucible was replaced after a series of vapor deposition steps, a new crucible could be mounted by removing the split hearth from the hearth body and replacing the split hearth. For this reason, it is not necessary to perform the operation of removing and cleaning the scum adhered to the hearth in the vacuum chamber, and the operation of replacing the crucible is completed in a short time, thereby increasing the operation rate of the apparatus. In addition, since the detached split hearth can be easily and completely cleaned outside the vacuum chamber by using a cleaning device or the like, the problem that the residual scum adheres to the object to be deposited and reduces the product yield can be solved.
【０００９】[0009]
【発明の効果】以上のように本発明によれば、電子ビー
ムを出射する電子銃本体と、電子銃から出射された電子
ビームにより加熱される蒸着材料を収容した坩堝を複数
保持するハースとを備えた電子銃において、ハース上の
全ての坩堝内の蒸着材料を用いた蒸着工程が終了したあ
とで、真空槽を開放したままでハースの坩堝収納用凹部
に付着した蒸着材料のカスを除去する煩雑且つ装置の稼
働率を低下させる作業を行うことなく、簡単な作業によ
って短時間で新たな坩堝に交換して蒸着工程を再開する
ことを可能にした電子ビーム蒸着用電子銃を提供するこ
とができる。As described above, according to the present invention, an electron gun body for emitting an electron beam and a hearth for holding a plurality of crucibles containing a vapor deposition material heated by the electron beam emitted from the electron gun are provided. In the equipped electron gun, after the vapor deposition process using the vapor deposition material in all the crucibles on the hearth is completed, while leaving the vacuum chamber open, the residue of the vapor deposition material adhering to the crucible storage recess of the hearth is removed. It is possible to provide an electron gun for electron beam evaporation, which can replace a new crucible in a short time by a simple operation and restart the evaporation process without performing a complicated and operation for lowering the operation rate of the apparatus. it can.
【図１】本発明の一実施形態に係る電子ビーム蒸着用電
子銃の外観構成を示す斜視図。FIG. 1 is a perspective view showing an external configuration of an electron gun for electron beam evaporation according to an embodiment of the present invention.
【図２】(a)は本発明に係るハースの分解斜視図、(b)は
要部断面図。2A is an exploded perspective view of a hearth according to the present invention, and FIG.
【図３】(a)は従来の蒸着装置の概略構成図、(b)は従来
の電子銃の構成図、(c)は坩堝収納用凹部の構成図、(d)
はカスが付着した状態を示す図。3A is a schematic configuration diagram of a conventional vapor deposition apparatus, FIG. 3B is a configuration diagram of a conventional electron gun, FIG. 3C is a configuration diagram of a crucible storage recess, and FIG.
FIG. 3 is a diagram showing a state where scum is attached.
１ 真空槽、２ ドーム、２１ 電子銃、２５ 電子銃
本体、２６ ハース、２６ａ 上端面、２７ 坩堝収納
用凹部、２８ 固定蓋、２８ａ 開口部、２９ 坩堝、
３１ 電磁石、３２ フィラメント、３５ ハース本
体、３６ 坩堝収納穴、３７ 分割ハース、３８ 連通
穴、４０ 突起、４１ 嵌合穴。1 vacuum chamber, 2 dome, 21 electron gun, 25 electron gun main body, 26 hearth, 26a upper end surface, 27 crucible storage recess, 28 fixed lid, 28a opening, 29 crucible,
31 electromagnet, 32 filament, 35 hearth body, 36 crucible storage hole, 37 split hearth, 38 communication hole, 40 projection, 41 fitting hole.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 山口 晃司 神奈川県高座郡寒川町小谷二丁目１番１号 東洋通信機株式会社内 (72)発明者 串間 直人 神奈川県高座郡寒川町小谷二丁目１番１号 東洋通信機株式会社内 (72)発明者 三島 信芳 神奈川県高座郡寒川町小谷二丁目１番１号 東洋通信機株式会社内 Ｆターム(参考） 4K029 CA01 DB12 DB14 DB23 5C030 BB15 ──────────────────────────────────────────────────続 き Continuing from the front page (72) Koji Yamaguchi 2-1-1 Kotani, Samukawa-cho, Koza-gun, Kanagawa Prefecture Toyo Communication Equipment Co., Ltd. (72) Naoto Kushima 2-1-1 Kotani, Samukawa-cho, Koza-gun, Kanagawa No. 1 Toyo Tsushinki Co., Ltd. (72) Nobuyoshi Mishima 2-1-1 Kotani, Samukawa-cho, Koza-gun, Kanagawa F-term in Toyo Tsushinki Co., Ltd. 4K029 CA01 DB12 DB14 DB23 5C030 BB15
Claims (1)
電子銃本体に隣接配置され上端面に周方向に沿って複数
の坩堝収納用凹部を備えた回転する円筒状のハースと、
該ハース上端面の複数の坩堝収納用凹部のうちの一つを
除いた坩堝収納用凹部だけを露出させる開口部を備えた
固定蓋と、前記各坩堝収納用凹部内に個別に着脱される
坩堝と、から成る電子銃において、 前記ハースは、中心軸を回転自在に支持されて上端面に
回転方向に沿って複数の坩堝収納穴を備えた円筒状のハ
ース本体と、該各坩堝収納穴と夫々連通する連通穴を周
方向に沿って有して該ハース本体上端面に対して着脱自
在に固定される環状円盤状の分割ハースと、を備え、 前記各坩堝収納穴と前記連通穴とを連通させることによ
り形成される各坩堝収納用凹部内に前記坩堝を着脱する
ことを特徴とする電子ビーム蒸着用電子銃。1. An electron gun main body for emitting an electron beam, a rotating cylindrical hearth arranged adjacent to the electron gun main body and provided with a plurality of crucible accommodating recesses along a circumferential direction on an upper end surface thereof.
A fixed lid having an opening for exposing only the crucible storage recess excluding one of the plurality of crucible storage recesses on the upper end surface of the hearth, and crucibles individually attached and detached in each of the crucible storage recesses An electron gun comprising: a hearth, a cylindrical hearth body rotatably supported on a central axis and provided with a plurality of crucible storage holes along a rotation direction on an upper end surface; and each of the crucible storage holes. Annular disc-shaped hearths each having a communicating hole along the circumferential direction and communicating with each other and detachably fixed to the upper end surface of the hearth body, wherein each of the crucible storage holes and the communication hole is provided. An electron gun for electron beam evaporation, characterized in that said crucibles are attached to and detached from each crucible storage recess formed by communication.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000282495A JP4701486B2 (en) | 2000-09-18 | 2000-09-18 | Electron gun for electron beam vapor deposition, vapor deposition material holding device, and vapor deposition device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000282495A JP4701486B2 (en) | 2000-09-18 | 2000-09-18 | Electron gun for electron beam vapor deposition, vapor deposition material holding device, and vapor deposition device |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002097566A true JP2002097566A (en) | 2002-04-02 |
| JP2002097566A5 JP2002097566A5 (en) | 2007-07-19 |
| JP4701486B2 JP4701486B2 (en) | 2011-06-15 |
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ID=18767005
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000282495A Expired - Fee Related JP4701486B2 (en) | 2000-09-18 | 2000-09-18 | Electron gun for electron beam vapor deposition, vapor deposition material holding device, and vapor deposition device |
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| JP (1) | JP4701486B2 (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009293133A (en) * | 2009-09-16 | 2009-12-17 | Showa Shinku:Kk | Feeding/recovering means for vapor deposition material, and vacuum device |
| US7727335B2 (en) | 2002-11-05 | 2010-06-01 | Theva Dunnschichttechnik Gmbh | Device and method for the evaporative deposition of a coating material |
| DE102009014304A1 (en) * | 2009-03-25 | 2010-10-07 | Eto Magnetic Gmbh | actuator |
| CN101962751A (en) * | 2010-10-27 | 2011-02-02 | 普尼太阳能(杭州)有限公司 | Multistep physical vapor deposition equipment |
| US7914620B2 (en) | 2005-01-21 | 2011-03-29 | Samsung Mobile Display Co., Ltd. | Supporting device for heating crucible and deposition apparatus having the same |
| CN102808155A (en) * | 2012-08-01 | 2012-12-05 | 东莞宏威数码机械有限公司 | Electron bombardment type evaporation source system |
| WO2013153604A1 (en) * | 2012-04-09 | 2013-10-17 | 株式会社シンクロン | Electron gun device |
| WO2014006706A1 (en) * | 2012-07-04 | 2014-01-09 | 中外炉工業株式会社 | Vapor deposition device |
| JPWO2013153604A1 (en) * | 2012-04-09 | 2015-12-17 | 株式会社シンクロン | Electron gun equipment |
| WO2017061481A1 (en) * | 2015-10-06 | 2017-04-13 | 株式会社アルバック | Material supply device and vapor deposition apparatus |
| CN108070825A (en) * | 2016-11-07 | 2018-05-25 | 卡尔蔡司光学国际有限公司 | Vacuum deposition apparatus and vacuum coating methods |
| DE102019102587A1 (en) * | 2019-02-01 | 2020-08-06 | Semikron Elektronik Gmbh & Co. Kg | Rotatable evaporation material receiving device and device herewith for coating semiconductor or other surfaces |
| EP3887562A4 (en) * | 2018-11-30 | 2022-08-24 | Ferrotec (USA) Corporation | Crucible cover for coating with an electron beam source |
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| JPH0556951U (en) * | 1992-01-09 | 1993-07-30 | 沖電気工業株式会社 | Vacuum deposition equipment |
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Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0556951U (en) * | 1992-01-09 | 1993-07-30 | 沖電気工業株式会社 | Vacuum deposition equipment |
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| US7727335B2 (en) | 2002-11-05 | 2010-06-01 | Theva Dunnschichttechnik Gmbh | Device and method for the evaporative deposition of a coating material |
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| US7914620B2 (en) | 2005-01-21 | 2011-03-29 | Samsung Mobile Display Co., Ltd. | Supporting device for heating crucible and deposition apparatus having the same |
| DE102009014304A1 (en) * | 2009-03-25 | 2010-10-07 | Eto Magnetic Gmbh | actuator |
| DE102009014304B4 (en) * | 2009-03-25 | 2011-09-22 | Eto Magnetic Gmbh | actuator |
| JP2009293133A (en) * | 2009-09-16 | 2009-12-17 | Showa Shinku:Kk | Feeding/recovering means for vapor deposition material, and vacuum device |
| CN101962751A (en) * | 2010-10-27 | 2011-02-02 | 普尼太阳能(杭州)有限公司 | Multistep physical vapor deposition equipment |
| JPWO2013153604A1 (en) * | 2012-04-09 | 2015-12-17 | 株式会社シンクロン | Electron gun equipment |
| WO2013153604A1 (en) * | 2012-04-09 | 2013-10-17 | 株式会社シンクロン | Electron gun device |
| JP5832650B2 (en) * | 2012-07-04 | 2015-12-16 | 中外炉工業株式会社 | Vapor deposition equipment |
| WO2014006706A1 (en) * | 2012-07-04 | 2014-01-09 | 中外炉工業株式会社 | Vapor deposition device |
| CN102808155A (en) * | 2012-08-01 | 2012-12-05 | 东莞宏威数码机械有限公司 | Electron bombardment type evaporation source system |
| WO2017061481A1 (en) * | 2015-10-06 | 2017-04-13 | 株式会社アルバック | Material supply device and vapor deposition apparatus |
| JPWO2017061481A1 (en) * | 2015-10-06 | 2018-04-05 | 株式会社アルバック | Material supply device and vapor deposition device |
| CN108138309A (en) * | 2015-10-06 | 2018-06-08 | 株式会社爱发科 | Material feeding apparatus and evaporation coating device |
| CN108138309B (en) * | 2015-10-06 | 2020-08-14 | 株式会社爱发科 | Material supply device and vapor deposition device |
| CN108070825A (en) * | 2016-11-07 | 2018-05-25 | 卡尔蔡司光学国际有限公司 | Vacuum deposition apparatus and vacuum coating methods |
| EP3887562A4 (en) * | 2018-11-30 | 2022-08-24 | Ferrotec (USA) Corporation | Crucible cover for coating with an electron beam source |
| US11807935B2 (en) | 2018-11-30 | 2023-11-07 | Ferrotec (Usa) Corporation | Crucible cover for coating with an electron beam source |
| DE102019102587A1 (en) * | 2019-02-01 | 2020-08-06 | Semikron Elektronik Gmbh & Co. Kg | Rotatable evaporation material receiving device and device herewith for coating semiconductor or other surfaces |
| DE102019102587B4 (en) | 2019-02-01 | 2023-02-23 | Semikron Elektronik Gmbh & Co. Kg | Rotatable evaporative material receiver and apparatus therewith for coating semiconductor or other surfaces |
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