JP2002075899A - Uniformly heating method for circular plate-form workpiece - Google Patents
Uniformly heating method for circular plate-form workpieceInfo
- Publication number
- JP2002075899A JP2002075899A JP2000262763A JP2000262763A JP2002075899A JP 2002075899 A JP2002075899 A JP 2002075899A JP 2000262763 A JP2000262763 A JP 2000262763A JP 2000262763 A JP2000262763 A JP 2000262763A JP 2002075899 A JP2002075899 A JP 2002075899A
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- JP
- Japan
- Prior art keywords
- lamp
- sample
- circular
- heating
- annular
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Furnace Details (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、スパッタ、ＣＶ
Ｄ、エッチング、アニール等の平板試料を高温でしかも
温度的に一様に加熱する均熱装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to sputtering, CV
The present invention relates to a heat equalizer for uniformly heating a plate sample such as D, etching, annealing, etc. at a high temperature and temperature.
【０００２】[0002]
【従来の技術】従来、真空室内に設置したシリコンウエ
ハなどの円形状の平板試料を例えばアニールする場合、
図１に示すように、棒状のランプａを真空室ｂ内に配置
した平板試料ｃに沿って設け、該平板試料ｃの加熱効率
を増大させるために該ランプａに放物線状の反射面を有
する反射体ｄを設けることが行われている。2. Description of the Related Art Conventionally, when a circular flat plate sample such as a silicon wafer placed in a vacuum chamber is annealed, for example,
As shown in FIG. 1, a rod-shaped lamp a is provided along a flat plate sample c arranged in a vacuum chamber b, and the lamp a has a parabolic reflecting surface in order to increase the heating efficiency of the flat plate sample c. Providing a reflector d has been performed.
【０００３】[0003]
【発明が解決しようとする課題】上記従来の放物線状の
反射体ｄは、加熱効率の点からは理想的であるが、平板
試料ｃを均熱加熱するには適当でないという欠点があっ
た。すなわち、放物線状の反射体ｄでは、平板試料ｃの
中心部に比べて周辺部の光の強度が約半分に弱まり、平
板試料ｃを均熱することは困難である。平板試料ｃを均
熱したい場合には、図２のように加熱効率を犠牲にして
反射体ｄ、ｄを幾重にも設け、平板試料ｃの光の強度を
平均化することが行われているが、このような複雑な構
成の装置を製作するには、コストがかさみ、加熱効率も
上がらない不都合があった。The above-mentioned conventional parabolic reflector d is ideal in terms of heating efficiency, but has a drawback that it is not suitable for uniformly heating the flat plate sample c. That is, in the case of the parabolic reflector d, the intensity of light at the peripheral portion is reduced to about half of that at the central portion of the flat plate sample c, and it is difficult to uniformly heat the flat plate sample c. When it is desired to equalize the temperature of the flat plate sample c, as shown in FIG. 2, the reflectors d and d are provided in multiple layers at the expense of the heating efficiency to average the light intensity of the flat plate sample c. However, in order to manufacture an apparatus having such a complicated configuration, there are disadvantages that the cost is increased and the heating efficiency is not improved.
【０００４】また、従来の装置では、棒状のランプａを
使用しているので、円形状の平板試料ｃに対して方形状
の加熱体が対向した状態になり、方形状の加熱体の隅角
部は円形状の平板試料ｃから外れているため加熱にあま
り寄与することがなく、加熱効率の向上には適していな
い。Further, in the conventional apparatus, since the rod-shaped lamp a is used, the rectangular heating element is opposed to the circular flat sample c, and the corner of the rectangular heating element is formed. Since the portion is out of the circular plate sample c, it does not contribute much to heating and is not suitable for improving the heating efficiency.
【０００５】本発明は、円形状の平板試料を均一な温度
分布で加熱効率よく加熱する装置を提供することを目的
とするものである。An object of the present invention is to provide an apparatus for heating a circular flat sample with a uniform temperature distribution and with high heating efficiency.
【０００６】[0006]
【課題を解決するための手段】本発明では、円形状の平
板試料をランプにより温度的に一様に加熱する装置に於
いて、１個又は複数個の円環状のランプをその環状面が
該平板試料の板面と平行になるように配置し、該ランプ
又はランプ群の外周を同心円状に囲んで円筒状の反射体
を設けることにより、上記の目的を達成するようにし
た。該円形状のランプを円形状の平板試料の両面の夫々
に配置し、各面に向けて配置した該ランプ又はランプ群
の外周を同心円状に囲んで円筒状の反射体を設けること
で、該平板試料の加熱速度を２倍以上となし得る。According to the present invention, there is provided an apparatus for uniformly heating a circular flat sample with a lamp in terms of temperature, wherein one or a plurality of annular lamps are provided with annular surfaces. The above object was achieved by disposing the lamp or the lamp group concentrically and providing a cylindrical reflector so as to be arranged parallel to the plate surface of the flat sample. By arranging the circular lamps on both sides of a circular flat plate sample and providing a cylindrical reflector concentrically surrounding the outer periphery of the lamp or the lamp group arranged toward each surface, The heating rate of the flat plate sample can be doubled or more.
【０００７】[0007]
【発明の実施の形態】図面に基づき本発明の実施の形態
を説明すると、図３及び図４に於いて符号１は真空室２
内に適当な保持手段により保持されて設けられた円形状
のシリコンウエハからなる平板試料、３は該平板試料１
を加熱する赤外線ランプを示す。該ランプ３は、切れ目
のない円環状に形成され、その環状面が該平板試料１の
板面と平行し且つ該平板試料１の円形と同心円になるよ
うに配置し、該ランプ３の光をロスすることなく有効に
該板面へ照射できるようにした。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described with reference to the drawings. In FIGS.
A plate sample 3 made of a circular silicon wafer held and provided in a suitable holding means therein, and 3 is the plate sample 1
3 shows an infrared lamp for heating the lamp. The lamp 3 is formed in a continuous annular shape, and is arranged so that its annular surface is parallel to the plate surface of the flat plate sample 1 and concentric with the circle of the flat plate sample 1, and the light of the lamp 3 is emitted. Irradiation to the plate surface can be performed effectively without loss.
【０００８】加熱効率良く該平板試料１を加熱するに
は、該ランプ３の光を該試料１へ向かわせる反射体４を
設けることであるが、加熱効率と同時に該試料１を温度
的に一様に加熱する要望すなわち均熱することの要望が
ある場合、該反射体４を円筒状に構成してその軸芯４ａ
が該ランプ３の環状の中心軸３ａと合致するように設
け、その内面の反射面が該ランプ３の環状の外周を同心
円状に囲むようにした。この構成とした場合に該平板試
料１の板面に均一性のよい照度が得られる該板面から該
ランプ３までの間隔Ｌは、該ランプ３の直径Ｒと平板試
料１の直径Ｄとの比によって異なり、その値は計算によ
って算出できる。図５に円形状のランプ３を１個設けて
その外周に円筒状の反射体４を設けた場合のＲ／Ｄに対
するＬ／Ｄの最適な計算値を示した。また、このときの
加熱効率も照度の大きさから算出できる。該反射体４を
円筒状に構成したことにより、反射光が均一に分散して
均一性のよい照度が得られ、光の強度も大きくなるので
加熱効率も向上する。In order to heat the flat plate sample 1 with high heating efficiency, it is necessary to provide a reflector 4 for directing the light of the lamp 3 to the sample 1. When there is a demand for heating, that is, a demand for uniform heating, the reflector 4 is formed in a cylindrical shape and its axis 4a is formed.
Is provided so as to coincide with the annular central axis 3a of the lamp 3, and the reflection surface on the inner surface concentrically surrounds the annular outer periphery of the lamp 3. In the case of this configuration, the distance L from the plate surface to the lamp 3 at which the plate surface of the plate sample 1 can obtain good uniform illuminance is the difference between the diameter R of the lamp 3 and the diameter D of the plate sample 1. Depending on the ratio, the value can be calculated. FIG. 5 shows an optimum calculated value of L / D with respect to R / D when one circular lamp 3 is provided and a cylindrical reflector 4 is provided on the outer periphery thereof. Further, the heating efficiency at this time can also be calculated from the magnitude of the illuminance. By forming the reflector 4 in a cylindrical shape, the reflected light is uniformly dispersed to obtain a uniform illuminance, and the light intensity is increased, so that the heating efficiency is improved.
【０００９】図３に示す装置構成において、該平板試料
１の直径とランプ３の直径が決まれば最も一様な照度に
なる両者の間隔Ｌが決定され、その位置にランプ３と反
射体４を設置するだけで、平板試料１を均一に加熱でき
ると共に加熱効率を高めることができ、図３の装置構成
では、反射体４のない場合に比べて加熱効率が２．２倍
に向上した。In the apparatus configuration shown in FIG. 3, if the diameter of the flat plate sample 1 and the diameter of the lamp 3 are determined, the distance L between the two, which provides the most uniform illuminance, is determined. By simply installing the same, the flat plate sample 1 can be uniformly heated and the heating efficiency can be increased. In the apparatus configuration shown in FIG. 3, the heating efficiency has been improved 2.2 times as compared with the case where the reflector 4 is not provided.
【００１０】該平板試料１の両面に向け、図６に示すよ
うにランプ３と反射体４を夫々設けることもでき、この
場合は２倍以上の加熱速度で該平板試料１を加熱でき
る。また、図７に示すように、該ランプ３の複数個を平
板試料１の板面に対して同心円状に配置し、これらのラ
ンプ群の外周を囲んで反射体４を設けることも可能であ
り、この場合も前記と同様の計算により間隔Ｌを算出し
て加熱効率よく均熱することができる。本発明は、該平
板試料１を、スパッタリング、ＣＶＤ、エッチング、ア
ニールなどの高温で均一な温度に加熱する場合に好都合
に適用できる。As shown in FIG. 6, a lamp 3 and a reflector 4 can be provided on both sides of the flat plate sample 1, respectively. In this case, the flat plate sample 1 can be heated at twice or more the heating rate. As shown in FIG. 7, it is also possible to arrange a plurality of the lamps 3 concentrically with respect to the plate surface of the flat sample 1 and to provide a reflector 4 around the outer periphery of the lamp group. Also in this case, the interval L can be calculated by the same calculation as above, and the heat can be uniformly heated. The present invention can be advantageously applied when the flat plate sample 1 is heated to a high and uniform temperature such as sputtering, CVD, etching and annealing.
【００１１】直径６インチのシリコンウエハの平板試料
１を図３のように真空室内に用意し、該試料１に対し同
心円状に配置した直径１５０ｃｍの赤外線ランプ３を反
射体４で囲んで設けた。該ランプ３に５．０ＫＷの電力
を投入してアニールのために該試料１の片側の板面を均
一の照度で照射する間隔Ｌは、予めの計算で６．１ｃｍ
と算出されており、この計算値に基づきランプ３と反射
体４を設置し、特に電力比を調整することなくこれらに
電力を投入したところ、該試料１の板面に±０．２４％
の一様性の温度分布が得られ、加熱効率は２２％であっ
た。A flat sample 1 of a silicon wafer having a diameter of 6 inches was prepared in a vacuum chamber as shown in FIG. 3, and an infrared lamp 3 having a diameter of 150 cm arranged concentrically with respect to the sample 1 was provided so as to be surrounded by a reflector 4. . The interval L of applying 5.0 KW of power to the lamp 3 and irradiating one plate surface of the sample 1 with uniform illuminance for annealing for annealing is 6.1 cm in advance.
When the lamp 3 and the reflector 4 were installed based on the calculated values, and power was supplied to these without adjusting the power ratio, ± 0.24% was applied to the plate surface of the sample 1.
Was obtained, and the heating efficiency was 22%.
【００１２】[0012]
【発明の効果】以上のように本発明によるときは、円形
状の平板試料の板面と平行になるように、１個又は複数
個の円環状のランプを配置し、該ランプ又はランプ群の
外周を同心円状に囲んで円筒状の反射体を設け、円形状
の平板試料に対応した円形状のランプで加熱するように
したので、ランプと平板試料の直径に基づき算出された
間隔に該ランプを設置して反射体で囲むことにより、特
別の調整を行わずに一様な温度分布の加熱を効率よく簡
単に行えるように設置でき、円筒状の反射体は製作容易
で安価に製作できる等の効果があり、円形状の平板試料
の両面の夫々に、１個又は複数個の円形状のランプをそ
の環状面が平行になるように配置することで加熱速度を
高めることができる。As described above, according to the present invention, one or a plurality of annular lamps are arranged so as to be parallel to the plate surface of a circular flat sample, and the lamp or lamp group is arranged. A cylindrical reflector was provided so as to surround the outer periphery concentrically, and the lamp was heated by a circular lamp corresponding to the circular flat sample. By installing the reflector and surrounding it with a reflector, it can be installed so that heating with a uniform temperature distribution can be performed efficiently and easily without special adjustment, and a cylindrical reflector can be manufactured easily and inexpensively. The heating rate can be increased by arranging one or a plurality of circular lamps on both sides of a circular flat plate sample so that their annular surfaces are parallel to each other.
【図１】従来の加熱効率よく平板試料を加熱する装置の
説明図FIG. 1 is an explanatory view of a conventional apparatus for heating a flat plate sample with high heating efficiency.
【図２】従来の平板試料を一様な温度分布で加熱する装
置の説明図FIG. 2 is an explanatory view of a conventional apparatus for heating a flat sample with a uniform temperature distribution.
【図３】本発明の実施の形態を示す斜視図FIG. 3 is a perspective view showing an embodiment of the present invention.
【図４】図３の４−４線断面図FIG. 4 is a sectional view taken along line 4-4 in FIG. 3;
【図５】平板試料の直径とランプの直径の関係を示す線
図FIG. 5 is a diagram showing the relationship between the diameter of a flat sample and the diameter of a lamp.
【図６】平板試料の両側にランプと反射体とを夫々設け
た実施例の斜視図FIG. 6 is a perspective view of an embodiment in which a lamp and a reflector are provided on both sides of a flat sample, respectively.
【図７】複数個のランプを設けた実施例の説明図FIG. 7 is an explanatory view of an embodiment in which a plurality of lamps are provided.
１ 平板試料、３ 赤外線ランプ、４ 反射体、Ｌ 間
隔、1 flat plate sample, 3 infrared lamp, 4 reflector, L interval,
Claims (2)
一様に加熱する装置に於いて、１個又は複数個の円環状
のランプをその環状面が該平板試料の板面と平行になる
ように配置し、該ランプ又はランプ群の外周を同心円状
に囲んで円筒状の反射体を設けたことを特徴とする円形
状平板試料の均熱装置。In an apparatus for uniformly heating a circular flat sample with a lamp in terms of temperature, one or a plurality of annular lamps are arranged such that the annular surface is parallel to the plate surface of the flat sample. A circular plate-shaped sample soaking device, wherein a cylindrical reflector is provided so as to surround the lamp or lamp group concentrically.
記１個又は複数個の円形状のランプをその環状面が平行
になるように配置し、各面に向けて配置した該ランプ又
はランプ群の外周を同心円状に囲んで円筒状の反射体を
設けたことを特徴とする円形状平板試料の均熱装置。2. The lamp according to claim 1, wherein the one or more circular lamps are arranged on both sides of the circular flat plate sample so that their annular surfaces are parallel to each other, and are arranged toward each surface. Alternatively, a circular plate flat sample heat equalizing device, wherein a cylindrical reflector is provided so as to concentrically surround the outer periphery of a lamp group.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000262763A JP2002075899A (en) | 2000-08-31 | 2000-08-31 | Uniformly heating method for circular plate-form workpiece |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000262763A JP2002075899A (en) | 2000-08-31 | 2000-08-31 | Uniformly heating method for circular plate-form workpiece |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002075899A true JP2002075899A (en) | 2002-03-15 |
Family
ID=18750395
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000262763A Pending JP2002075899A (en) | 2000-08-31 | 2000-08-31 | Uniformly heating method for circular plate-form workpiece |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002075899A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6898372B2 (en) * | 2003-04-09 | 2005-05-24 | Glas-Weld Systems, Inc. | Lamp system for curing resin in glass |
| JP2009302131A (en) * | 2008-06-10 | 2009-12-24 | Dainippon Screen Mfg Co Ltd | Heat treatment apparatus |
| JP2014514734A (en) * | 2011-03-11 | 2014-06-19 | アプライド マテリアルズ インコーポレイテッド | Off-angle heating of the underside of the substrate using a lamp assembly |
| WO2015013832A1 (en) | 2013-07-31 | 2015-02-05 | Oerlikon Advanced Technologies Ag | Radiation heater arangement |
| CN111041413A (en) * | 2019-12-11 | 2020-04-21 | 中国工程物理研究院激光聚变研究中心 | Method for improving surface shape precision of large-aperture reflector coating film |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63186424A (en) * | 1987-01-28 | 1988-08-02 | Nikon Corp | System for heating by light |
| JPH06168894A (en) * | 1992-09-29 | 1994-06-14 | Fuji Electric Co Ltd | Substrate heating system |
| JPH10321547A (en) * | 1997-05-22 | 1998-12-04 | Kokusai Electric Co Ltd | Heat-treating device |
| JP2000068222A (en) * | 1998-08-21 | 2000-03-03 | Dainippon Screen Mfg Co Ltd | Substrate heat treatment device |
-
2000
- 2000-08-31 JP JP2000262763A patent/JP2002075899A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63186424A (en) * | 1987-01-28 | 1988-08-02 | Nikon Corp | System for heating by light |
| JPH06168894A (en) * | 1992-09-29 | 1994-06-14 | Fuji Electric Co Ltd | Substrate heating system |
| JPH10321547A (en) * | 1997-05-22 | 1998-12-04 | Kokusai Electric Co Ltd | Heat-treating device |
| JP2000068222A (en) * | 1998-08-21 | 2000-03-03 | Dainippon Screen Mfg Co Ltd | Substrate heat treatment device |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6898372B2 (en) * | 2003-04-09 | 2005-05-24 | Glas-Weld Systems, Inc. | Lamp system for curing resin in glass |
| JP2009302131A (en) * | 2008-06-10 | 2009-12-24 | Dainippon Screen Mfg Co Ltd | Heat treatment apparatus |
| JP2014514734A (en) * | 2011-03-11 | 2014-06-19 | アプライド マテリアルズ インコーポレイテッド | Off-angle heating of the underside of the substrate using a lamp assembly |
| WO2015013832A1 (en) | 2013-07-31 | 2015-02-05 | Oerlikon Advanced Technologies Ag | Radiation heater arangement |
| US11143416B2 (en) | 2013-07-31 | 2021-10-12 | Evatec Ag | Radiation heater arrangement |
| CN111041413A (en) * | 2019-12-11 | 2020-04-21 | 中国工程物理研究院激光聚变研究中心 | Method for improving surface shape precision of large-aperture reflector coating film |
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