JP2001252986A - Apparatus and method for optical shaping - Google Patents
Apparatus and method for optical shapingInfo
- Publication number
- JP2001252986A JP2001252986A JP2000065006A JP2000065006A JP2001252986A JP 2001252986 A JP2001252986 A JP 2001252986A JP 2000065006 A JP2000065006 A JP 2000065006A JP 2000065006 A JP2000065006 A JP 2000065006A JP 2001252986 A JP2001252986 A JP 2001252986A
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- Prior art keywords
- light
- liquid crystal
- crystal mask
- dimensional
- information
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Landscapes
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、光造形装置及び光
造形方法に係り、特に、可視光光源及び液晶パネルを用
いて、造形対象物（例えば、樹脂）の３次元形状を非積
層・一体で光造形する光造形装置及び光造形方法関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical shaping apparatus and an optical shaping method, and more particularly, to a method of non-stacking and integrating a three-dimensional shape of an object (for example, resin) using a visible light source and a liquid crystal panel. The present invention relates to a stereolithography apparatus and a stereolithography method for stereolithography with the use of a stereolithography.
【０００２】[0002]
【従来の技術】光造形技術は、例えば、医療や工業の分
野での製品又は部品形状の試作や小規模生産のための簡
易型作成などの分野で広く用いられており、高精度化や
適用分野の拡大に対する期待が高まってきている。ま
た、光造形技術は、様々な分野で利用される技術である
ため、対象となる製作物の形状や寸法、材質も多様とな
る。2. Description of the Related Art Stereolithography is widely used, for example, in the fields of prototyping products or parts in the medical and industrial fields, and making simple molds for small-scale production. Expectations for the expansion of the field are increasing. In addition, since the stereolithography technology is a technology used in various fields, the shapes, dimensions, and materials of target products vary.
【０００３】また、一般に、工業製品等の新製品開発に
おいて、リードタイムの短縮が重要である。製品及びそ
の部品は、通常ＣＡＤで設計されて、開発段階で試作品
を正確に早く作成することが望まれる。従来より、３次
元ＣＡＤデータに基づくＮＣ工作機械による加工で、製
品又は部品を直接切削する技術の他に、積層造形法によ
るラピッドプロトタイピングが進歩をとげている。In general, it is important to reduce the lead time in the development of new products such as industrial products. Products and their parts are usually designed by CAD, and it is desired to produce a prototype accurately and quickly in the development stage. 2. Description of the Related Art Conventionally, rapid prototyping by an additive manufacturing method has been advanced in addition to a technology of directly cutting a product or a part by machining using an NC machine tool based on three-dimensional CAD data.
【０００４】積層造形法には、光硬化樹脂法(光造形
法)、奮発レーザ光（熱硬化）焼結法、インクジェット
ノズル堆積法、押出堆積法、切断されたシートを積層す
る方法など、多種類の方法がある。いずれの方法も、所
望の３次元形状を得るために、３次元ＣＡＤデータを２
次元のシート状のデータとして、複数の層を積み重ねる
ようにしたものである。特に、光硬化樹脂法では、３次
元ＣＡＤデータから２次元スライスデータを作成し、レ
ーザ光を２次元で造形対象物としての樹脂上を走査し、
樹脂を硬化させることで造形する。[0004] Lamination molding methods include a photocuring resin method (optical molding method), a burst laser beam (thermosetting) sintering method, an inkjet nozzle deposition method, an extrusion deposition method, and a method of laminating cut sheets. There are different ways. In either method, three-dimensional CAD data is converted into two in order to obtain a desired three-dimensional shape.
A plurality of layers are stacked as dimensional sheet-like data. In particular, in the photo-curing resin method, two-dimensional slice data is created from three-dimensional CAD data, and a laser beam is two-dimensionally scanned on a resin as a modeling object,
It is formed by curing the resin.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、従来の
積層造形法では、所望の造形品の寸法精度を向上するた
めには、層の数を増やす必要があり、製造時間及びコス
トが増大することになる。また、樹脂の硬化が順次硬化
であるため、硬化の際の収縮により、精度を落とす場合
がある。さらに、複雑な構造や空中に浮かぶような部分
には、支持物を配置し、加工後にそれを取り除く工程が
必要となる。However, in the conventional additive manufacturing method, it is necessary to increase the number of layers in order to improve the dimensional accuracy of a desired molded product, which leads to an increase in manufacturing time and cost. Become. Further, since the curing of the resin is performed sequentially, the precision may be reduced due to shrinkage during the curing. In addition, a step of arranging a support and removing it after processing is required for a complicated structure or a portion that floats in the air.
【０００６】また、処理時間・工程の短縮のために、液
晶パネルを用いた一括面露光による光造形法が提案され
たものの、紫外線を用いる必要があるため液晶が損傷又
は破壊される場合がある。また、この光造形法では、回
折光や散乱光が発生し、結像が不鮮明となり、造形物の
寸法精度が良くない。[0006] In order to shorten the processing time and process, a stereolithography method by batch exposure using a liquid crystal panel has been proposed, but the liquid crystal may be damaged or destroyed due to the necessity of using ultraviolet rays. . Further, in this optical shaping method, diffracted light and scattered light are generated, the image is unclear, and the dimensional accuracy of the formed object is not good.
【０００７】本発明は、以上の点に鑑み、精密部品やマ
イクロマシニング用の製品又は部品などのような小型形
状、中型形状の造形からマイクロ形状の造形までカバー
できる光造形装置及び光造形方法を提供することを目的
とする。In view of the above, the present invention provides an optical shaping apparatus and an optical shaping method capable of covering from small-sized, medium-sized to micro-shaped shaping such as precision parts and products or parts for micromachining. The purpose is to provide.
【０００８】本発明は、液晶マスクと可視光を用いて、
面露光による非積層での造形を、高い造形自由度、高精
度、高速で実現することを目的とする。本発明は、液晶
表示階調による造形深さを制御することで、露光像の強
度変調を容易とすることを目的とする。[0008] The present invention uses a liquid crystal mask and visible light,
It is an object of the present invention to realize non-lamination modeling by surface exposure with high modeling flexibility, high accuracy, and high speed. SUMMARY OF THE INVENTION It is an object of the present invention to facilitate the intensity modulation of an exposure image by controlling the modeling depth based on the liquid crystal display gradation.
【０００９】また、本発明は、造形データの作成を容易
とし、異なる形状の複数部品を同時に作成可能とするこ
とで、多品種少量生産に適した光造形装置及び光造形方
法を提供することを目的とする。Another object of the present invention is to provide an optical molding apparatus and an optical molding method suitable for small-lot production of many kinds by facilitating creation of molding data and enabling simultaneous creation of a plurality of parts having different shapes. Aim.
【００１０】[0010]
【課題を解決するための手段】液晶ディスプレイは、任
意の画像を表示できることから、従来作成が困難であっ
た可変マスクとして利用できる。この液晶マスクを用い
て、一括面露光を行い、ビーム走査の工程を含まない造
形を行うのが、本発明の液晶光造形法の主な特徴であ
る。走査により点から面を作る工程を含まないために、
造形時間の短縮と高精度化を達成することができる。ま
た、液晶は、濃淡表示によって透過光の強度を変化する
ことができるため、二次元画像に強度情報を加えた三次
元情報を持った像から、一括して立体形状を作成するこ
とができる。この点で、積層という2次元から3次元への
拡張に不可欠なプロセスを必要としない点は、従来の手
法と大きく異なる。さらに画像の取り扱いが容易である
ことから、AFM等の三次元測定データからの形状を拡大
再構成する等の新たな利用法も考えられる。Since a liquid crystal display can display an arbitrary image, it can be used as a variable mask which has conventionally been difficult to produce. The main feature of the liquid crystal optical shaping method of the present invention is to perform collective surface exposure using this liquid crystal mask and perform shaping without a beam scanning step. Because it does not include the step of creating a surface from points by scanning,
Shortening of modeling time and high accuracy can be achieved. In addition, since the intensity of transmitted light of a liquid crystal can be changed by grayscale display, a three-dimensional shape can be created collectively from an image having three-dimensional information obtained by adding intensity information to a two-dimensional image. In this regard, the point that the process of lamination, which is indispensable for extending from 2D to 3D, is not required is significantly different from the conventional method. Further, since the handling of images is easy, a new use method such as enlarging and reconstructing a shape from three-dimensional measurement data such as AFM can be considered.
【００１１】また、液晶により、回折から生じる1次回
折光等のノイズ、液晶の光吸収・光照射により熱が発生
する場合がある。本発明では、これを抑制又は防止する
ために、可視光光源と可視光感光樹脂を用いている他、
空間周波数フィルターによる１次回折光の除去等の対策
をとっている。Further, the liquid crystal may generate heat due to noise such as first-order diffracted light resulting from diffraction, or light absorption and light irradiation of the liquid crystal. In the present invention, in order to suppress or prevent this, in addition to using a visible light source and a visible light photosensitive resin,
Measures such as removal of first-order diffracted light by a spatial frequency filter are taken.
【００１２】本発明の第1の解決手段によると、造形対
象物を造形するための可視光を出力する光源と、２次元
情報及び階調情報により透過光又は反射光が制御される
液晶マスク部と、液晶マスク部に、2次元情報及び階調
情報を与え、造形対象物の３次元形状を設定する制御部
と、を備え、前記光源からの可視光が、前記制御部によ
り制御された前記液晶マスク部を透過又は反射し、造形
対象物に照射されることにより、３次元形状を形成する
ようにした光造形装置を提供する。According to a first aspect of the present invention, there is provided a light source for outputting visible light for forming an object to be formed, and a liquid crystal mask section in which transmitted light or reflected light is controlled by two-dimensional information and gradation information. And a liquid crystal mask unit, which provides two-dimensional information and gradation information, and a control unit that sets a three-dimensional shape of the object to be formed, wherein the visible light from the light source is controlled by the control unit. Provided is an optical shaping apparatus that forms a three-dimensional shape by transmitting or reflecting a liquid crystal mask portion and irradiating a shaping target object.
【００１３】本発明の第２の解決手段によると、液晶マ
スク部に、２次元情報及び階調情報を与え、造形対象物
の３次元造形形状を設定し、光源からの可視光を、所定
のビーム径で且つ一様又は略一様な強度分布をもつ光に
調整し、調整された光を、液晶マスク部に透過させて又
は液晶マスク部で反射させて、造形対象物に照射するこ
とにより、３次元形状を形成するようにした光造形方法
を提供する。According to the second solution of the present invention, two-dimensional information and gradation information are given to the liquid crystal mask portion, a three-dimensional printing shape of the printing object is set, and visible light from the light source is transmitted to a predetermined light source. By adjusting to light having a beam diameter and uniform or substantially uniform intensity distribution, and transmitting the adjusted light to the liquid crystal mask part or reflecting it at the liquid crystal mask part, and irradiating the object to be modeled. And a stereolithography method for forming a three-dimensional shape.
【００１４】[0014]
【発明の実施の形態】図1に、本発明の光造形装置の構
成図を示す。この光造形装置は、光源１、コリメータ部
２、１／４波長板３、１／２波長板４、液晶マスク部
５、レンズ６、ピンホール７、Ｘ−Ｚステージ８、制御
部（ＰＣ）９を備える。DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a configuration diagram of an optical shaping apparatus according to the present invention. This stereolithography apparatus includes a light source 1, a collimator unit 2, a 板 wavelength plate 3, a 波長 wavelength plate 4, a liquid crystal mask unit 5, a lens 6, a pinhole 7, an XZ stage 8, a control unit (PC). 9 is provided.
【００１５】光源１は、可視光を発生する各種レーザで
ある。この実施の形態では、例えば、大出力が得られる
こと、及び、可視光（例えば、波長４８８ｎｍ）を発生
させ液晶に損傷を与えないこと（紫外光では液晶に損傷
をあたえる場合がある）から、可視光源のＡｒ＋レーザ
ーを用いている。コリメータ部２は、対物レンズ２１、
ピンホール２２、レンズ２３等が組み合わせて構成され
る。コリメータ部２は、光源１からのビーム径を広げＬ
ＣＤ５２全体又は広範囲を照射できるようにする。ま
た、コリメータ部２は、光強度を全体にわたって均一化
する役目もはたしている。１／４波長板３は、円偏光の
光を直線偏光に変換するもので、ＬＣＤ５２の手前にあ
る偏光子（ｚ）でのビームエネルギーのロスを減らす。
１／２波長板４は、直線偏光に変換した光の偏光方向を
変え、ＬＣＤ５２に対して最適なコントラストを得られ
る方向に変換する。The light source 1 is various lasers that generate visible light. In this embodiment, for example, a large output is obtained, and a visible light (for example, a wavelength of 488 nm) is generated and does not damage the liquid crystal (ultraviolet light may damage the liquid crystal). An Ar + laser as a visible light source is used. The collimator unit 2 includes an objective lens 21,
It is configured by combining the pinhole 22, the lens 23 and the like. The collimator unit 2 expands the beam diameter from the light source 1 to L
The entire CD 52 or a wide area can be irradiated. Further, the collimator unit 2 also serves to make the light intensity uniform over the entirety. The 波長 wavelength plate 3 converts circularly polarized light into linearly polarized light, and reduces loss of beam energy at the polarizer (z) in front of the LCD 52.
The half-wave plate 4 changes the polarization direction of the light converted into linearly polarized light, and converts the light into a direction in which the LCD 52 can obtain an optimum contrast.
【００１６】液晶マスク部５は、偏光子（ｚ）５１、液
晶パネル（ＬＣＤ）５２及び偏光子（ｚ）５３を備え
る。偏光子（ｚ）５１は、ＬＣＤ５２に入射する前の非
直線偏光成分の光をカットし画像のコントラストを向上
させる。ＬＣＤ５２は、例えば、TFT液晶を有し、直接
接続されたＰＣ９から出力された画像を表示、表示画像
にしたがって一画素ごとに偏光方向を変換し、一様照明
された光に偏光の回転角として画像情報を与える。偏光
子（ｙ）５３は、この偏光子を通過することでＬＣＤ５
２に表示された画像が光の濃淡として変換される。ＬＣ
Ｄ５２の画素毎の偏光の回転によってその画素に対応す
る光の強度が決定される。The liquid crystal mask section 5 includes a polarizer (z) 51, a liquid crystal panel (LCD) 52, and a polarizer (z) 53. The polarizer (z) 51 cuts the light of the non-linearly polarized component before entering the LCD 52 to improve the contrast of the image. The LCD 52 has, for example, a TFT liquid crystal, displays an image output from the PC 9 directly connected, converts the polarization direction for each pixel according to the display image, and converts the polarization direction into uniformly illuminated light as a rotation angle of polarization. Give image information. The polarizer (y) 53 passes through the polarizer, and thereby the LCD 5
The image displayed in 2 is converted as light and shade. LC
The rotation of the polarization of each pixel in D52 determines the intensity of light corresponding to that pixel.
【００１７】制御部（ＰＣ）９は、液晶マスク部５のＬ
ＣＤ５２に、2次元情報及び階調情報を与え、造形対象
物の３次元造形形状を設定する。例えば、造形物の３次
元ＣＡＤデータに基づき、２次元スライスデータを作成
し、その縦方向のデータとしてＬＣＤ５２の階調データ
に変換する。ＬＣＤ５２を通過した光を造形対象物１０
に結像させることで、実質的に複数のスライスデータを
用いた露光を、一度の面露光で造形物を作成することに
なる。The control unit (PC) 9 controls the L of the liquid crystal mask unit 5.
The two-dimensional information and the gradation information are given to the CD 52, and the three-dimensional printing shape of the printing object is set. For example, two-dimensional slice data is created based on the three-dimensional CAD data of the modeled object, and is converted into gradation data of the LCD 52 as data in the vertical direction. The light that has passed through the LCD 52 is
By forming an image on the object, a printed object is created by substantially one-time exposure using a plurality of slice data.
【００１８】レンズ６は、現在ズームレンズを用いてお
り、像の縮小および拡大倍率を変換できる。このレンズ
６によって、造形対象物１０上にＬＣＤ５２に表示され
た画像が結像される。なお、光の方向を調整するために
適宜ミラー６１を設けることができる。空間周波数フィ
ルター７は、例えば、ピンホールを用いることができ
る。空間周波数フィルター７は、ＬＣＤ５２によって生
じた０次元を除く回折光をカットする。これにより、結
像位置での光の干渉による像の劣化を防ぐ。すなわち、
０次光は直進するが、それ以外の回折光はＢｒａｇｇ条
件を満たす方向へすすむので、レンズを通過して光が集
光する位置に空間周波数フィルター７（ピンホール）を
配置し、主に０次光のみを通過させる。また、空間周波
数フィルター７によって２次回折光以降の光についても
同様に除去できる。なお、２次以降の回折光については
強度が弱くなるため、実際に影響するのは主に１次回折
光である。The lens 6 uses a zoom lens at present, and can change the reduction and enlargement magnification of an image. The image displayed on the LCD 52 is formed on the modeling object 10 by the lens 6. Note that a mirror 61 can be appropriately provided to adjust the direction of light. As the spatial frequency filter 7, for example, a pinhole can be used. The spatial frequency filter 7 cuts off diffracted light generated by the LCD 52 except for the zero dimension. This prevents the image from deteriorating due to light interference at the imaging position. That is,
The zero-order light travels straight, but the other diffracted light proceeds in a direction that satisfies the Bragg condition. Therefore, the spatial frequency filter 7 (pinhole) is disposed at a position where the light passes through the lens and is condensed. Only the next light passes. Further, the spatial frequency filter 7 can similarly remove light after the second-order diffracted light. Since the intensity of the diffracted light of the second and subsequent orders becomes weak, the first order diffracted light actually affects mainly.
【００１９】Ｘ−Ｚステージ８は、造形対象物１０の位
置をレンズによって像が結像する面に正確に配置する。
ベースプレート８１は、造形対象物１０を実際に配置す
る。下方から光があたるため透明で厚さの薄いガラス、
プラスチック等の板を用いる。なお、ここでは、一例と
して、厚さ１５０μｍのカバーガラスを使用した。造形
対象物１０は、例えば、光硬化性樹脂を用いられる。こ
こでは、一例として、可視光に感度を有するように特別
に調合された光硬化性樹脂を使用し、そのピーク感度
は、４８８ｎｍ付近に調整されている。造形対象物１０
は、これに限らず、光源１により造形しうる適宜の材料
を用いることができる。The XZ stage 8 accurately positions the object 10 on the surface on which an image is formed by a lens.
The modeling object 10 is actually arranged on the base plate 81. Transparent and thin glass because light shines from below,
Use a plate of plastic or the like. Here, as an example, a cover glass having a thickness of 150 μm was used. The modeling object 10 is made of, for example, a photocurable resin. Here, as an example, a photocurable resin specially prepared so as to have sensitivity to visible light is used, and its peak sensitivity is adjusted to around 488 nm. Modeling object 10
The material is not limited to this, and an appropriate material that can be formed by the light source 1 can be used.
【００２０】以下に、本発明の光造形装置及び方法の動
作を説明する。この例では、光源に、Ar+レーザー（λ=
488nm）を用い、コリメータ部２により、ビーム径を拡
大して入射光とする。1/4波長板３、1/2波長板４を経
て、一様な強度分布をもつ入射光は、液晶マスク部５を
透過した後、レンズ６を経て空間周波数フィルター７に
より一次回折光等のノイズを取り除かれる。レンズ６等
による縮小光学系のはたらきによりベースプレート８１
上で液晶画像は、縮小（例えば、9/25）されて結像す
る。ベースプレート８１には造形対象物１０として可視
光硬化性樹脂が配置され、非積層で材料を硬化させる。The operation of the stereolithography apparatus and method of the present invention will be described below. In this example, an Ar + laser (λ =
488 nm) and the collimator 2 enlarges the beam diameter to make incident light. After passing through the 1/4 wavelength plate 3 and the 1/2 wavelength plate 4, the incident light having a uniform intensity distribution passes through the liquid crystal mask section 5, passes through the lens 6, passes through the lens 6, and passes through the spatial frequency filter 7 such as first-order diffracted light. Noise is removed. The function of the reduction optical system by the lens 6 and the like allows the base plate 81
Above, the liquid crystal image is reduced (for example, 9/25) to form an image. A visible light curable resin is disposed on the base plate 81 as the object 10 to be shaped, and the material is cured without being laminated.
【００２１】以下に、本発明による造形物作成の例を説
明する。ＬＣＤ５２としては、一例として、TFTアクテ
ィブマトリクス型画素数８００ｘ６００pixel、画面サ
イズ26.40ｘ19.98mm、ピクセルサイズ３３ｘ３３μｍ等
を用いた。また、光源１としては、アルゴン（Ａｒ＋）
レーザ（波長４８８ｎｍ、直線偏光、１００ｍＷ〜１．
５Ｗ）である。光強度は、３００ｍＷ、露光時間は２〜
１０ｓｅｃとした。造形対象物１０の使用樹脂は、ウレ
タンアクリレート系を用いた。Hereinafter, an example of forming a molded article according to the present invention will be described. As the LCD 52, as an example, a TFT active matrix type having a pixel number of 800 × 600 pixels, a screen size of 26.40 × 19.98 mm, a pixel size of 33 × 33 μm, or the like was used. The light source 1 is argon (Ar +).
Laser (wavelength 488 nm, linearly polarized light, 100 mW to 1.
5W). Light intensity is 300mW, exposure time is 2
10 sec. The resin used for the modeling object 10 was a urethane acrylate resin.
【００２２】図２に、液晶の光透過率の説明図を示す。
これによると、強度変調には、７０階調程度が利用可能
であることがわかる。また、ＬＣＤ５２は、１００％に
近い遮光性能をもつことがわかる。測定条件としては、
ＬＣＤ５２に光を入射し、主に０次光の強度のみを測定
することができる。FIG. 2 is a diagram illustrating the light transmittance of the liquid crystal.
According to this, it is understood that about 70 gradations can be used for intensity modulation. Further, it can be seen that the LCD 52 has a light shielding performance close to 100%. As measurement conditions,
Light is incident on the LCD 52, and mainly only the intensity of the zero-order light can be measured.
【００２３】図３に、表示階調と光強度および硬化深さ
の関係についての説明図を示す。この図は、液晶の表示
階調（色の濃さ）と光強度および硬化深さの関係を示す
ものである。硬化深さは、Lambert-Beerの法則より照射
エネルギーの対数にほぼ比例する。したがって、図より
硬化深さは表示階調にほぼ比例することが推測される。
表示階調と硬化深さの関係の確認をかねて、基本的な形
状を幾つか試作した。ここに示す結果は、いずれも非積
層プロセスで形状を創成したものである。FIG. 3 is an explanatory diagram showing the relationship between display gradation, light intensity, and curing depth. This figure shows the relationship between the display gradation (color density) of the liquid crystal, the light intensity and the curing depth. The curing depth is almost proportional to the logarithm of irradiation energy according to Lambert-Beer's law. Therefore, it is presumed from the figure that the curing depth is almost proportional to the display gradation.
To confirm the relationship between display gradation and curing depth, several basic shapes were prototyped. The results shown here are all created by the non-lamination process.
【００２４】図４に、液晶マスクに用いた画像の図を示
す。図５に、各液晶マスクにより造形された形状の図を
示す。両方の図で寸法の縮尺が異なるのは、液晶画像が
縮小されているためである。各図において、(a)は白抜
きのアルファベット、(b)は中心に向かって同心状に階
調が等間隔で変化する正方形、(c)にはAFMによる格子縞
の3次元測定データを用いた。造形条件は、一例とし
て、入射光強度が500mW、露光時間はそれぞれ1秒、4
秒、4秒である。その結果、二次元形状の造形、三次元
形状の造形、三次元測定データからの形状復元の可能性
を確認できた。FIG. 4 shows a diagram of an image used for the liquid crystal mask. FIG. 5 shows a diagram of a shape formed by each liquid crystal mask. The reason why the scales of the dimensions are different in both figures is that the liquid crystal image is reduced. In each figure, (a) is a white alphabet, (b) is a square whose gradation changes concentrically toward the center at equal intervals, and (c) is three-dimensional measurement data of lattice fringe by AFM. . The molding conditions are, for example, the incident light intensity is 500 mW, the exposure time is 1 second, 4
Seconds, 4 seconds. As a result, the possibility of shaping two-dimensional shapes, shaping three-dimensional shapes, and reconstructing shapes from three-dimensional measurement data was confirmed.
【００２５】図６に、光リング式変位センサによる非接
触で計測した硬化形状の説明図を示す。図中（ａ）は、
文字形状の測定結果を示す。図中（ｂ）は、四角錘形状
の測定結果を、斜め視点及び正面プロファイルを示す。
なお、光リング式変位センサは、例えば、高谷裕浩他：
非接触光造形3D形状計測に関する研究、精密工学会秋季
大会学術講演論文集(1996)559等参照のこと。特に、図
中（ｂ）に示すような四角錐の硬化形状から、階調と硬
化深さの関係が図３に示した推測値とよく一致すること
が分かる。これらの結果から、硬化深さは階調にほぼ比
例して変化していることが確認できた。FIG. 6 is an explanatory diagram of a cured shape measured in a non-contact manner by an optical ring type displacement sensor. (A) in the figure
The measurement result of the character shape is shown. (B) in the figure shows the measurement result of the quadrangular pyramid shape, showing the oblique viewpoint and the front profile.
Incidentally, the optical ring type displacement sensor is, for example, Hirohiro Takatani et al .:
Research on non-contact stereolithography 3D shape measurement, see Japanese Society of Precision Engineering Autumn Meeting, Proc. In particular, from the cured shape of the quadrangular pyramid as shown in FIG. 3B, it can be seen that the relationship between the gradation and the cured depth matches well with the estimated value shown in FIG. From these results, it was confirmed that the curing depth changed almost in proportion to the gradation.
【００２６】また、図７は、液晶マスクに用いた他の画
像の図（上）とSEM観察像を示す図（下）である。図中
（ａ）はアルファベット、（ｂ）はチューブについて、
それぞれ示される。なお、ここでは、露光時間は４秒で
ある。このように、３次元造形がなされていることが確
認できる。FIG. 7 is a diagram (top) of another image used for the liquid crystal mask and a diagram (bottom) showing an SEM observation image. In the figure, (a) is an alphabet, (b) is a tube,
Shown respectively. Here, the exposure time is 4 seconds. Thus, it can be confirmed that the three-dimensional modeling is performed.
【００２７】図８は、多品種同時生産についての入力画
像とSEM観察像を示す図である。露光時間４秒、歯車厚
さ1mmで、複数種歯車が造形された。なお、製作時間は
従来の1/10程度であった。FIG. 8 is a diagram showing an input image and an SEM observation image for multi-product simultaneous production. The exposure time was 4 seconds, the gear thickness was 1 mm, and multiple kinds of gears were formed. The production time was about 1/10 of the conventional one.
【００２８】以上のように、本発明によって形状の試作
を行い、硬化深さと表示階調の関係から、非積層で三次
元形状を自由に造形できることを確認した。また、三次
元測定データの復元や高精度造形が、本発明で可能であ
ることを確認した。As described above, prototypes of shapes were manufactured according to the present invention, and it was confirmed from the relationship between the curing depth and the display gradation that a three-dimensional shape could be freely formed without lamination. In addition, it was confirmed that restoration of three-dimensional measurement data and high-precision modeling are possible with the present invention.
【００２９】なお、本発明において、液晶パネルに反射
部又は反射鏡を設けることにより、光源からの入射光を
反射して、造形対象物に照射するような反射型の光造形
装置及び方法とすることができる。また、上述の実施の
形態において、使用波長、液晶マスクの大きさや画素数
等のスペック、造形対象物の材料・形状・大きさ等は、
一例を挙げたに過ぎず、適宜変更、修正することができ
る。In the present invention, a reflection type optical shaping apparatus and method for reflecting incident light from a light source and irradiating an object to be formed by providing a reflecting portion or a reflecting mirror in a liquid crystal panel is provided. be able to. Further, in the above-described embodiment, the wavelength used, specifications such as the size of the liquid crystal mask and the number of pixels, and the material, shape, size, and the like of the modeling object are
This is merely an example, and can be changed and modified as appropriate.
【００３０】[0030]
【発明の効果】本発明によると、以上のように、精密部
品やマイクロマシニング用の製品又は部品などのような
小型形状、中型形状の造形からマイクロ形状の造形まで
カバーできる光造形装置及び光造形方法を提供すること
ができる。According to the present invention, as described above, the optical molding apparatus and the optical molding capable of covering from small-sized, medium-sized to micro-shaped molding such as precision parts and products or parts for micromachining. A method can be provided.
【００３１】本発明によると、液晶表示階調による造形
深さを制御することで、露光像の強度変調を容易とする
ことができる。本発明によると、液晶マスクと可視光を
用いて、面露光による非積層での造形を、高い造形自由
度、高精度、高速で実現することができる。According to the present invention, the intensity modulation of the exposure image can be facilitated by controlling the modeling depth based on the liquid crystal display gradation. ADVANTAGE OF THE INVENTION According to this invention, non-lamination modeling by surface exposure can be implement | achieved with high degree of freedom of modeling, high precision, and high speed using a liquid crystal mask and visible light.
【００３２】本発明によると、造形データの作成を容易
とし、異なる形状の複数部品を同時に作成可能とするこ
とで、多品種少量生産に適した光造形装置及び光造形方
法を提供することができる。According to the present invention, it is possible to provide an optical molding apparatus and an optical molding method suitable for small-lot production of many kinds by facilitating creation of molding data and enabling simultaneous creation of a plurality of parts having different shapes. .
【図１】本発明の光造形装置の構成図。FIG. 1 is a configuration diagram of an optical shaping apparatus according to the present invention.
【図２】液晶の光透過率の説明図。FIG. 2 is an explanatory diagram of a light transmittance of a liquid crystal.
【図３】表示階調と光強度および硬化深さの関係につい
ての説明図。FIG. 3 is an explanatory diagram showing the relationship between display gradation, light intensity, and curing depth.
【図４】液晶マスクに用いた画像の図。FIG. 4 is a diagram of an image used for a liquid crystal mask.
【図５】各液晶マスクにより造形された形状の図。FIG. 5 is a diagram of a shape formed by each liquid crystal mask.
【図６】光リング式変位センサによる非接触で計測した
硬化形状の説明図。FIG. 6 is an explanatory diagram of a cured shape measured without contact by an optical ring displacement sensor.
【図７】液晶マスクに用いた他の画像の図上とSEM観察
像を示す図。FIG. 7 is a diagram showing another image used for the liquid crystal mask and an SEM observation image.
【図８】多品種同時生産についての入力画像とSEM観察
像を示す図。FIG. 8 is a diagram showing an input image and an SEM observation image for multi-product simultaneous production.
１ 光源 ２ コリメータ部 ３ １／４波長板 ４ １／２波長板 ５ 液晶マスク部 ６ レンズ ７ ピンホール ８ Ｘ−Ｚステージ ９ 制御部（ＰＣ） １０ 造形対象物 DESCRIPTION OF SYMBOLS 1 Light source 2 Collimator part 3 1/4 wavelength plate 4 1/2 wavelength plate 5 Liquid crystal mask part 6 Lens 7 Pinhole 8 X-Z stage 9 Control part (PC) 10 Modeling object
【手続補正書】[Procedure amendment]
【提出日】平成１２年８月１日（２０００．８．１）[Submission Date] August 1, 2000 (2008.1)
【手続補正１】[Procedure amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】請求項４[Correction target item name] Claim 4
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【手続補正２】[Procedure amendment 2]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】０００１[Correction target item name] 0001
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【０００１】[0001]
【発明の属する技術分野】本発明は、光造形装置及び光
造形方法に係り、特に、可視光光源及び液晶パネルを用
いて、造形対象物（例えば、樹脂）の３次元形状を非積
層・一体で光造形する光造形装置及び光造形方法に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical shaping apparatus and an optical shaping method, and more particularly, to a method of non-stacking and integrating a three-dimensional shape of an object (for example, resin) using a visible light source and a liquid crystal panel. The present invention relates to a stereolithography apparatus and a stereolithography method for stereolithography with the use of a stereolithography.
【手続補正３】[Procedure amendment 3]
【補正対象書類名】図面[Document name to be amended] Drawing
【補正対象項目名】図１[Correction target item name] Fig. 1
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【図１】 FIG.
───────────────────────────────────────────────────── フロントページの続き Ｆターム(参考） 2H088 EA39 HA15 HA18 HA21 HA24 HA29 2H097 AA16 BB01 CA07 EA01 FA02 LA15 4F213 AA36 AA42E AA43E AH12 AP06 AR07 WA25 WA40 WB01 WL14 WL35 WL44 WL64 WL79 WL83 WL93 WL95 WW34 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H088 EA39 HA15 HA18 HA21 HA24 HA29 2H097 AA16 BB01 CA07 EA01 FA02 LA15 4F213 AA36 AA42E AA43E AH12 AP06 AR07 WA25 WA40 WB01 WL14 WL35 WL44 WL64 WL79 WL83 WL93 WL95 WW34
Claims (7)
する光源と、 ２次元情報及び階調情報により透過光又は反射光が制御
される液晶マスク部と、 液晶マスク部に、2次元情報及び階調情報を与え、造形
対象物の３次元形状を設定する制御部と、を備え、 前記光源からの可視光が、前記制御部により制御された
前記液晶マスク部を透過又は反射し、造形対象物に照射
されることにより、３次元形状を形成するようにした光
造形装置。1. A light source for outputting visible light for forming an object to be formed, a liquid crystal mask portion in which transmitted light or reflected light is controlled by two-dimensional information and gradation information, and a two-dimensional liquid crystal mask portion. A control unit that gives information and gradation information, and sets a three-dimensional shape of the object to be formed, wherein visible light from the light source is transmitted or reflected by the liquid crystal mask unit controlled by the control unit, An optical shaping device configured to form a three-dimensional shape by irradiating a shaping target.
メータと、 円偏光の光を直線偏光に変換する１／４波長板と、 直線偏光に変換した光の偏光方向を変える１／２波長板
とをさらに備え、前記液晶マスク部に入射される光を調
整するようにした請求項１に記載の光造形装置。2. A collimator for expanding a beam diameter of light from the light source, a quarter-wave plate for converting circularly-polarized light to linearly-polarized light, and a half-wavelength for changing the polarization direction of the light converted to linearly-polarized light. The stereolithography apparatus according to claim 1, further comprising a plate, and adjusting light incident on the liquid crystal mask unit.
ついて、０次光以外の回折光をカットする空間周波数フ
ィルターをさらに備えた請求項１又は２に記載の光造形
装置。3. The optical shaping apparatus according to claim 1, further comprising a spatial frequency filter that cuts off diffracted light other than zero-order light with respect to light transmitted or reflected by the liquid crystal mask portion.
特徴とする請求項１乃至３のいずれかに記載の光造形装
置。4. The optical molding apparatus according to claim 1, wherein the object to be molded is a photocurable resin.
する第１の偏光子と、 前記液晶パネルからの光の強度を調整する第２の偏光子
を備えた請求項１乃至４のいずれかに記載の光造形装
置。5. The liquid crystal mask section, comprising: a liquid crystal panel to which an information signal from the control section is input; a first polarizer for cutting a non-linearly polarized component of light incident on the liquid crystal panel; The stereolithography apparatus according to claim 1, further comprising a second polarizer that adjusts the intensity of light from the panel.
を与え、造形対象物の３次元造形形状を設定し、 光源からの可視光を、所定のビーム径で且つ一様又は略
一様な強度分布をもつ光に調整し、 調整された光を、液晶マスク部に透過させて又は液晶マ
スク部で反射させて、造形対象物に照射することによ
り、３次元形状を形成するようにした光造形方法。6. A two-dimensional information and a gradation information are given to a liquid crystal mask part, a three-dimensional printing shape of a printing object is set, and a visible light from a light source is irradiated with a predetermined beam diameter and a uniform or substantially one beam. By adjusting the light to have a similar intensity distribution, and passing the adjusted light through or reflected by the liquid crystal mask, and irradiating the object to be formed, a three-dimensional shape is formed. Stereolithography method.
らに空間周波数フィルターを通過させて、造形対象物に
照射するようにした請求項６に記載の光造形方法。7. The optical shaping method according to claim 6, wherein the light transmitted or reflected by the liquid crystal mask portion is further passed through a spatial frequency filter to irradiate an object to be formed.
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|---|---|---|---|
| JP2000065006A JP3784232B2 (en) | 2000-03-09 | 2000-03-09 | Stereolithography apparatus and stereolithography method |
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| US8119449B2 (en) | 2006-03-14 | 2012-02-21 | Panasonic Corporation | Method of manufacturing an electronic part mounting structure |
| JP2007298990A (en) * | 2006-04-28 | 2007-11-15 | Envisiontec Gmbh | Device and method for producing three-dimensional object by means of mask exposure |
| US8815143B2 (en) | 2006-04-28 | 2014-08-26 | Envisiontec Gmbh | Method for producing a three-dimensional object by means of mask exposure |
| JP2008064903A (en) * | 2006-09-06 | 2008-03-21 | National Institute Of Advanced Industrial & Technology | Device for producing three-dimensional structure, device for producing sensor, and method for producing three-dimensional structure |
| KR100921939B1 (en) * | 2007-11-01 | 2009-10-15 | 한국산업기술대학교산학협력단 | Stereolithography Device Using Laser Pick-UP Unit and Method for Forming Structure Using the Device |
| EP2335848A1 (en) * | 2009-12-04 | 2011-06-22 | SLM Solutions GmbH | Optical irradiation unit for an assembly for producing workpieces by means of irradiating powder layers with laser radiation |
| WO2011066989A1 (en) * | 2009-12-04 | 2011-06-09 | Slm Solutions Gmbh | Optical irradiation unit for a plant for producing workpieces by irradiation of powder layers with laser radiation |
| US9221100B2 (en) | 2009-12-04 | 2015-12-29 | Slm Solutions Gmbh | Optical irradiation unit for a plant for producing workpieces by irradiation of powder layers with laser radiation |
| WO2015081756A1 (en) * | 2013-12-03 | 2015-06-11 | 上海普利生机电科技有限公司 | Photo-curing 3d printing device and imaging system thereof |
| US10416541B2 (en) * | 2013-12-03 | 2019-09-17 | Prismlab China Ltd. | Photo-curing 3D printing device and imaging system thereof |
| JP2016173558A (en) * | 2015-01-12 | 2016-09-29 | 國立台湾科技大学 | Method of stereolithography fabrication and method for photo-curing photosensitive resin |
| WO2017130290A1 (en) * | 2016-01-26 | 2017-08-03 | 株式会社オルタステクノロジー | Head-up display apparatus |
| CN106363908A (en) * | 2016-09-05 | 2017-02-01 | 深圳市鹏安视科技有限公司 | Optical imaging system of photocuring 3D printer |
| CN106363908B (en) * | 2016-09-05 | 2019-05-03 | 深圳市鹏安视科技有限公司 | A kind of optical imaging system of photocuring 3D printer |
| CN111070687A (en) * | 2019-12-31 | 2020-04-28 | 上海天马微电子有限公司 | 3D printing device |
| CN117331285A (en) * | 2023-09-28 | 2024-01-02 | 暨南大学 | Method for producing patterns with any line width and any space by discrete digital mask photoetching |
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