JP2001223252A - Suctionless hand of robot - Google Patents

Suctionless hand of robot

Info

Publication number
JP2001223252A
JP2001223252A JP2000029284A JP2000029284A JP2001223252A JP 2001223252 A JP2001223252 A JP 2001223252A JP 2000029284 A JP2000029284 A JP 2000029284A JP 2000029284 A JP2000029284 A JP 2000029284A JP 2001223252 A JP2001223252 A JP 2001223252A
Authority
JP
Japan
Prior art keywords
substrate
hand
slip
holding
robot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000029284A
Other languages
Japanese (ja)
Inventor
Kazuo Kimata
一夫 木全
Yasuhiro Inukai
泰弘 犬飼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASSIST JAPAN KK
Original Assignee
ASSIST JAPAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASSIST JAPAN KK filed Critical ASSIST JAPAN KK
Priority to JP2000029284A priority Critical patent/JP2001223252A/en
Publication of JP2001223252A publication Critical patent/JP2001223252A/en
Pending legal-status Critical Current

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  • Manipulator (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a suctionless hand which can hold a substrate without sucking. SOLUTION: A nonslip sheet 10 provided with a nonslip part 10a on its upper part is attached to the substrate holding part 3 of a hand 1. The nonslip part 10a is provided with an uneven surface, which holds a substrate W with a large frictional resistance. In the case the substrate W having a warpage is held, one end of the nonslip part 10a is brought into contact with the lower surface of the substrate, so that a fraction angle is formed on the nonslip part 10a. As a result, the friction resistance is made large, resulting in preventing the displacement of the substrate and holding it stably.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、ガラス基板やウ
ェハ等の基板を保持して搬送するロボットのハンドにお
いて、基板を吸着することなく保持できるロボットの吸
着レスハンドに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a robot hand for holding and transporting a substrate such as a glass substrate or a wafer, and more particularly to a suction-less hand for a robot capable of holding a substrate without suction.

【0002】[0002]

【従来の技術】ロボットのハンドは、カセット内に収納
されているガラス基板やウェハ等の基板、又は処理ステ
ージに載置されている基板を保持して搬送するために、
ロボットのアームに連結されて駆動されている。ハンド
は、一般に、ロボットのアームに枢着される元部と基板
を保持する基板保持部とを有して形成されている。従来
から採用されている主なるハンド20は、図7に示すよ
うに、基板保持部22に空気用パイプ24に接続された
複数の吸着パット23を設けて基板Wを吸着するように
構成されたり、別のハンド25は、図8に示すように、
基板保持部27に凹部28を形成して凹部28内に基板
Wを落し込み、基板端を保持できるように構成されてい
た。
2. Description of the Related Art A robot hand holds and transports a substrate such as a glass substrate or a wafer stored in a cassette or a substrate placed on a processing stage.
It is connected to and driven by a robot arm. The hand is generally formed to have a base unit pivotally attached to an arm of a robot and a substrate holding unit for holding a substrate. As shown in FIG. 7, a main hand 20 conventionally used is configured to provide a plurality of suction pads 23 connected to an air pipe 24 in a substrate holding unit 22 to suction a substrate W. , Another hand 25, as shown in FIG.
The concave portion 28 is formed in the substrate holding portion 27, the substrate W is dropped into the concave portion 28, and the edge of the substrate can be held.

【0003】[0003]

【発明が解決しようとする課題】しかし、基板は各種の
加工工程で処理されて搬送されるので、各加工工程によ
っては、例えば、成膜処理加工された基板は、熱の影響
で基板自体が撓みを有したままで搬送されることがあ
る。また、特に大型化されたガラス基板では、重量によ
り自然に下方に撓んでいる。従って、上記のような撓み
のある基板を搬送する場合、ガラス基板やウェハ等の基
板を吸着するように構成された従来のハンド20では、
基板Wの吸着面は、ハンド20の基板保持部22に形成
された吸着パット23に必ずしも全面的に接していると
は限らない。このような場合、空気漏れが生じて基板W
を保持しにくく、搬送途中に基板Wがずれたりまたは落
下してしまうおそれがあった。
However, since the substrate is processed and transported in various processing steps, depending on each processing step, for example, a substrate that has been subjected to a film forming process may be affected by heat. In some cases, the sheet may be conveyed while being bent. Further, especially in a large-sized glass substrate, the glass substrate naturally bends downward due to its weight. Therefore, in the case of transporting a substrate having the above-described bending, the conventional hand 20 configured to adsorb a substrate such as a glass substrate or a wafer,
The suction surface of the substrate W does not always completely contact the suction pad 23 formed on the substrate holding portion 22 of the hand 20. In such a case, air leakage occurs and the substrate W
Is difficult to hold, and the substrate W may shift or drop during the transfer.

【0004】また、ハンド25の基板保持部27に凹部
28を形成して基板Wを落し込むように形成したハンド
25では、撓みのある基板Wは、基板端で保持されず
に、基板端より内部で支持されるため、基板Wを傷つけ
やすかった。
Further, in the hand 25 in which the concave portion 28 is formed in the substrate holding portion 27 of the hand 25 so that the substrate W is dropped, the bent substrate W is not held at the substrate end, but is held at the substrate end. Because it was supported inside, the substrate W was easily damaged.

【0005】この発明は、上述の課題を解決するもので
あり、基板が反って撓んでいても基板を傷つけることな
く確実に保持して搬送できるロボットの吸着レスハンド
を提供することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problem, and an object of the present invention is to provide a suctionless hand of a robot capable of securely holding and transporting a substrate without damaging the substrate even if the substrate is warped and bent. .

【0006】[0006]

【課題を解決するための手段】この発明にかかわるロボ
ットの吸着レスハンドでは、上記の課題を解決するため
に、以下のように構成するものである。すなわち、基板
を保持するハンド上に、基板保持部材が配設され、前記
基板保持部材に、滑り止め部が形成されていることを特
徴とするものである。
SUMMARY OF THE INVENTION A suctionless hand of a robot according to the present invention has the following configuration to solve the above-mentioned problems. That is, a substrate holding member is provided on a hand for holding a substrate, and the substrate holding member is formed with a non-slip portion.

【0007】また、前記滑り止め部が、凹凸状に形成さ
れていることが望ましい。
Further, it is desirable that the anti-slip portion is formed in an uneven shape.

【0008】さらに、前記基板保持部材が、前記ハンド
に着脱可能に配設されていればなおよい。
Furthermore, it is more preferable that the substrate holding member is detachably provided on the hand.

【0009】[0009]

【発明の効果】本発明によれば、ロボットの吸着レスハ
ンドは、上述のように、ハンド上に滑り止め部を有する
基板保持部材を設けて基板を保持するように構成してい
る。そのため、熱の影響や大型のガラス基板のように撓
みのある基板を、撓んだ状態のまま基板の位置ずれを起
こすことなく安定して保持することが可能となる。しか
も、ハンドの内部に空気通路を形成することがないた
め、ハンド自体を薄形状に形成することができる。
According to the present invention, the suctionless hand of the robot is configured to hold a substrate by providing a substrate holding member having a non-slip portion on the hand as described above. Therefore, it is possible to stably hold a flexible substrate such as a large glass substrate due to the influence of heat without causing a displacement of the substrate in a bent state. In addition, since no air passage is formed inside the hand, the hand itself can be formed in a thin shape.

【0010】また、滑り止め部の上面を凹凸状に形成す
れば、基板の保持面に対して接触面積を小さくできるの
で、摩擦抵抗を大きくして基板のずれを防止し、安定し
た基板の保持を行なうことができる。
If the upper surface of the non-slip portion is formed in an uneven shape, the contact area with respect to the holding surface of the substrate can be reduced, so that the frictional resistance can be increased to prevent the substrate from shifting and to stably hold the substrate. Can be performed.

【0011】さらに、基板保持部材をハンドに着脱可能
に装着して、ハンドに基板保持部材の取付位置を適宜変
更できるようにすれば、基板を保持する幅の位置を調整
することができる。
Further, if the substrate holding member is detachably mounted on the hand so that the mounting position of the substrate holding member on the hand can be appropriately changed, the position of the width for holding the substrate can be adjusted.

【0012】[0012]

【発明の実施の形態】以下、この発明の一実施の形態を
図面に基づいて説明する。以下に説明するロボットの吸
着レスハンド(以下、ハンド1という)は、ガラス基板
を保持して搬送するのに好適なハンドであり、図1に示
すように、図示しないロボットのアームに枢着される元
部2と元部2から二分岐されて先端に向かって延設され
基板Wの下面を保持する基板保持部3とを有している。
二分岐された各基板保持部3の先端部と中央部には、基
板Wずれ防止用の滑り止め部10aを上部に有する基板
保持部材(以下滑り止めシート10という)が各2か所
づつ幅方向に並設するように装着されている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings. A suctionless hand (hereinafter referred to as a hand 1) of a robot described below is a hand suitable for holding and transporting a glass substrate, and is pivotally attached to a robot arm (not shown) as shown in FIG. And a substrate holding portion 3 that is bifurcated from the base portion 2 and extends toward the front end to hold the lower surface of the substrate W.
A substrate holding member (hereinafter referred to as a non-slip sheet 10) having a non-slip portion 10a for preventing the substrate W from slipping is provided at each of two ends of the bifurcated substrate holding portion 3 at the front end portion and the central portion thereof. It is mounted so as to be juxtaposed in the direction.

【0013】滑り止めシート10は、熱安定性がよい弾
性部材、例えば、シリコーンゴム等を有して形成され、
基板Wを傷つけることなく基板Wに対して摩擦力を有し
ている。この滑り止めシート10は、円板状に形成さ
れ、図2(a)に示すように、基板保持部3の上面に形
成された凹部31に接着して取り付けられるか、また
は、図2(b)に示すように、凹部31にねじ止めで取
りつけられ、その上面はハンド1の基板保持部3の上面
より上方に突出している。
The anti-slip sheet 10 is formed of an elastic member having good thermal stability, for example, silicone rubber or the like.
It has a frictional force on the substrate W without damaging the substrate W. This non-slip sheet 10 is formed in a disk shape and is attached by bonding to a concave portion 31 formed on the upper surface of the substrate holding portion 3 as shown in FIG. As shown in ()), it is attached to the recess 31 by screwing, and its upper surface protrudes above the upper surface of the substrate holding portion 3 of the hand 1.

【0014】図2(a)のように、基板保持部3の凹部
31に接着して取り付ける場合には、滑り止めシート1
0は滑り止め部10aを含んで弾性部材で一体的に形成
されている。
As shown in FIG. 2A, in the case where the anti-slip sheet 1 is attached to the concave portion 31 of the substrate holding portion 3 by adhesion.
Numeral 0 is integrally formed of an elastic member including the non-slip portion 10a.

【0015】図2(b)のように、ねじ止めで取りつけ
る場合、滑り止めシート10は、上部に弾性部材で配置
された滑り止め部10aと下部に配置する金属製の取付
部10bを接着することによって形成され、基板保持部
3の下面から挿入するねじが取付部10bに螺着できる
ように形成されている。そのため、このねじ止めの滑り
止めシート10は、取り外しが可能であり、基板Wが大
型の場合には、例えば、並設された2か所のうち、それ
ぞれ内側に配置された滑り止めシート10を外して外側
に配置された滑り止めシート10だけを取り付けておけ
ば、基板Wの撓みに合わせて広幅の状態で保持すること
ができる。
As shown in FIG. 2 (b), when mounting with a screw, the non-slip sheet 10 is bonded to a non-slip portion 10a which is disposed on the upper portion by an elastic member and a metal mounting portion 10b which is disposed on the lower portion. This is formed so that a screw inserted from the lower surface of the substrate holding section 3 can be screwed to the mounting section 10b. For this reason, the screw-fastened non-slip sheet 10 can be removed, and in the case where the substrate W is large, for example, the two non-slip anti-slip sheets 10 are arranged inside each other. If only the non-slip sheet 10 disposed outside is attached and removed, it can be held in a wide state in accordance with the bending of the substrate W.

【0016】滑り止めシート10の滑り止め部10aに
は、上面に凹凸部が形成され、接触する基板Wとの摩擦
抵抗を大きくするように形成されている。凹凸部の形状
は、例えば、図3(a)のように小円柱突起11を多数
配列させてもよく、また、図3(b)のように縦、横い
ずれか一方の方向に溝12を形成するようにしてもよ
く、さらに図3(c)のように、縦方向と横方向にそれ
ぞれ小溝13、13を形成して碁盤状にしてもよい。も
ちろん平面状でも構わない。
The anti-slip portion 10a of the anti-slip sheet 10 is formed with an uneven portion on the upper surface so as to increase the frictional resistance with the substrate W with which the anti-slip portion 10a comes into contact. For example, as shown in FIG. 3A, a large number of small columnar projections 11 may be arranged in the shape of the uneven portion, and the grooves 12 may be arranged in one of the vertical and horizontal directions as shown in FIG. Alternatively, as shown in FIG. 3C, small grooves 13 may be formed in the vertical and horizontal directions, respectively, to form a grid. Of course, it may be flat.

【0017】また、滑り止めシート10の滑り止め部1
0aの断面形状は、図4(a)に示すように、角山14
形状でもよく、図4(b)のように、先細り山15形状
でもよい。
The anti-slip portion 1 of the anti-slip sheet 10
As shown in FIG.
4 (b), and may be a tapered mountain 15 shape.

【0018】基板Wが、ウェハや小型のガラス基板であ
れば、基板W自体の撓みは少なく、その下面はほぼ平面
状であるため、上記の滑り止めシート10は、滑り止め
部10の上面全体で基板Wを保持することができる。
When the substrate W is a wafer or a small glass substrate, the substrate W itself is less bent and its lower surface is substantially flat. Can hold the substrate W.

【0019】一方、基板Wが大型のガラス基板や、熱の
影響により反りのある基板であれば、図5に示すよう
に、基板Wが撓みにより傾斜面を有するため、滑り止め
シート10は、滑り止め部10aの一端で保持すること
になる。この状態では、滑り止め部10aは、基板Wに
対して接触する面が小さく摩擦角を有することになるの
で、摩擦抵抗を大きくし基板Wのずれ防止をさらに向上
させる。しかも、滑り止め部10aが弾性体で形成して
いるために、基板Wとの接触面積が小さくても基板Wを
傷つけることはない。
On the other hand, if the substrate W is a large glass substrate or a substrate warped by the influence of heat, as shown in FIG. 5, since the substrate W has an inclined surface due to bending, the non-slip sheet 10 It will be held at one end of the non-slip portion 10a. In this state, the non-slip portion 10a has a small frictional angle on the surface contacting the substrate W, so that the frictional resistance is increased and the prevention of the displacement of the substrate W is further improved. Moreover, since the non-slip portion 10a is formed of an elastic body, the substrate W is not damaged even if the contact area with the substrate W is small.

【0020】ハンド1の基板保持部3に、上記のような
滑り止めシート10を設けることによって、基板Wの保
持する位置の幅を調整することが可能である。特に、撓
みのある基板Wをそのままの状態(平面状に修正せず)
で搬送したいという要望がある場合、滑り止めシート1
0の滑り止め部10bは、基板Wを接触面積を小さくし
て保持するために、基板Wを吸着して保持する方法に比
べて、保持する幅を広くしても安定した状態で保持でき
る。そのために、例えば、ハンド1の基板保持部3を元
部2に対して幅方向に移動可能に構成してもよく、ま
た、前述のように幅方向に複数の滑り止めシート10を
並設させておけば、いずれかの滑り止めシート10を選
択して保持するようにすることもできる。さらに、ハン
ド1の基板保持部3に幅方向に長穴を形成して、滑り止
めシート10を幅方向に移動調整可能に取り付けること
も可能である。
The width of the position where the substrate W is held can be adjusted by providing the anti-slip sheet 10 on the substrate holding section 3 of the hand 1 as described above. In particular, a state in which the bent substrate W is left as it is (not corrected to a planar shape)
Non-slip sheet 1
In order to hold the substrate W with a small contact area, the non-slip portion 10b can hold the substrate W in a stable state even when the holding width is widened, as compared with a method of holding the substrate W by suction. For this purpose, for example, the substrate holding unit 3 of the hand 1 may be configured to be movable in the width direction with respect to the base unit 2, and a plurality of anti-slip sheets 10 are arranged in the width direction as described above. If so, any one of the non-slip sheets 10 can be selected and held. Furthermore, it is also possible to form an elongated hole in the width direction in the substrate holding part 3 of the hand 1 and attach the anti-slip sheet 10 so as to be movable and adjustable in the width direction.

【0021】上記のように構成されたハンド1は、図6
に示すように、図示しないロボットにより作動させ、ハ
ンド1をカセット5内に挿入する。この際、ハンド1は
ロボットの作動により、ハンド1の基板保持部3が基板
Wの下方に位置するように上下方向に位置調整される。
基板Wの大きさによって、二分岐された基板保持部3に
配置されるそれぞれの滑り止めシート10、10間は、
適宜な寸法の幅になるように、幅方向に位置調整されて
いる。
The hand 1 configured as described above is similar to the hand 1 shown in FIG.
As shown in (2), the hand 1 is inserted into the cassette 5 by being operated by a robot (not shown). At this time, the position of the hand 1 is adjusted vertically by the operation of the robot such that the substrate holding unit 3 of the hand 1 is positioned below the substrate W.
Depending on the size of the substrate W, each of the non-slip sheets 10 and 10 arranged on the bifurcated substrate holding unit 3 has
The position is adjusted in the width direction so that the width has an appropriate dimension.

【0022】ハンド1が、基板Wの下方で基板Wを保持
する位置に達すると、ハンド1は図示しないロボットの
作用で微速で上昇する。ハンド1の上昇によって、滑り
止めシート10の滑り止め部10aが基板Wの下面に接
触し基板Wを持ち上げる。この際、基板Wが撓みのない
状態でハンド1に保持される場合には、滑り止めシート
10は滑り止め部10aの上面全体で基板Wを保持し、
基板Wが撓みを有していれば、滑り止め部10aは摩擦
角を有して基板Wを保持することになる。
When the hand 1 reaches a position below the substrate W to hold the substrate W, the hand 1 moves up at a very low speed by the action of a robot (not shown). As the hand 1 rises, the non-slip portion 10a of the non-slip sheet 10 contacts the lower surface of the substrate W and lifts the substrate W. At this time, when the substrate W is held by the hand 1 without bending, the non-slip sheet 10 holds the substrate W on the entire upper surface of the non-slip portion 10a,
If the substrate W has a bend, the non-slip portion 10a will hold the substrate W with a friction angle.

【0023】基板Wは重量があるため、摩擦角を有して
保持する滑り止めシート10の摩擦抵抗をさらに大きく
して、基板Wの安定した保持を行なう。
Since the substrate W is heavy, the friction resistance of the non-slip sheet 10 held with a friction angle is further increased to stably hold the substrate W.

【0024】上記のように、ハンド1の保持部に滑り止
めシート10を設けて基板Wを保持するようにすれば、
熱の影響や大型のガラス基板Wのように撓みのある基板
Wを、撓んだ状態のまま安定して保持することが可能と
なる。しかも、ハンド1の内部に空気通路を形成するこ
とがないため、ハンド1自体を薄形状に形成することが
できる。
As described above, if the non-slip sheet 10 is provided on the holding portion of the hand 1 to hold the substrate W,
It is possible to stably hold a substrate W that is bent, such as the influence of heat or a large glass substrate W, in a bent state. Moreover, since no air passage is formed inside the hand 1, the hand 1 itself can be formed in a thin shape.

【0025】また、滑り止め部10aの上面を凹凸状に
形成すれば、基板Wの保持面に対して接触面積を小さく
できるので、摩擦抵抗を大きくして基板Wのずれを防止
し、安定した基板Wの保持を行なうことができる。
Further, if the upper surface of the anti-slip portion 10a is formed in an uneven shape, the contact area with respect to the holding surface of the substrate W can be reduced. The substrate W can be held.

【0026】さらに、滑り止めシート10を着脱可能に
装着して、ハンドに基板保持部材の取付位置を適宜変更
できるようにすれば、基板Wを保持する幅の位置を調整
することができる。
Further, if the non-slip sheet 10 is removably mounted so that the mounting position of the substrate holding member on the hand can be changed as appropriate, the position of the width for holding the substrate W can be adjusted.

【0027】なお、滑り止めシート10は、その形状や
取付位置は、上記に限るものではない。例えば、外径を
角状に形成してもよく、また上面を基板Wの撓み状態に
合わせて傾斜面にしてもよい。いずれも基板Wを傷つけ
ない材質であればよい。
The shape and the mounting position of the non-slip sheet 10 are not limited to those described above. For example, the outer diameter may be formed in a square shape, and the upper surface may be formed as an inclined surface in accordance with the bent state of the substrate W. Any material may be used as long as it does not damage the substrate W.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一形態のハンドを示す平面図FIG. 1 is a plan view illustrating a hand of one embodiment of the present invention.

【図2】滑り止めシートの各装着状態を示す一部断面図FIG. 2 is a partial cross-sectional view showing each mounting state of a non-slip sheet.

【図3】滑り止めシートの各凹凸形状をを示す平面図FIG. 3 is a plan view showing each uneven shape of the anti-slip sheet.

【図4】滑り止めシートの各凹凸形状を示す一部断面図FIG. 4 is a partial cross-sectional view showing each uneven shape of the anti-slip sheet.

【図5】撓みのある基板を滑り止めシートで保持する状
態を示す説明図
FIG. 5 is an explanatory view showing a state in which a flexible substrate is held by a non-slip sheet.

【図6】カセット内に収納されている基板を保持する状
態を示す正面断面図
FIG. 6 is a front sectional view showing a state of holding a substrate housed in a cassette;

【図7】従来の吸着タイプのハンドを示す一部断面図FIG. 7 is a partial sectional view showing a conventional suction type hand.

【図8】従来の落し込みタイプのハンドを示す一部断面
FIG. 8 is a partial cross-sectional view showing a conventional drop type hand.

【符号の説明】[Explanation of symbols]

1…ハンド 2…元部 3…基板保持部 5…カセット 10…滑り止めシート 10a…滑り止め部 11…小円柱突起部 12、13…溝 W…基板 DESCRIPTION OF SYMBOLS 1 ... Hand 2 ... Base part 3 ... Substrate holding part 5 ... Cassette 10 ... Non-slip sheet 10a ... Non-slip part 11 ... Small cylindrical protrusion part 12, 13 ... Groove W ... Substrate

フロントページの続き Fターム(参考) 3C007 DS01 ES02 EV05 EV10 EV16 NS09 NS11 NS17 3F061 AA01 BA02 BE05 BE16 BE26 DB00 DB04 DB06 5F031 CA02 CA05 GA05 GA08 PA13 PA18 Continued on front page F term (reference) 3C007 DS01 ES02 EV05 EV10 EV16 NS09 NS11 NS17 3F061 AA01 BA02 BE05 BE16 BE26 DB00 DB04 DB06 5F031 CA02 CA05 GA05 GA08 PA13 PA18

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 基板を保持するハンド上に、基板保持部
材が配設され、前記基板保持部材に、基板ずれ防止用の
滑り止め部が形成されていることを特徴とするロボット
の吸着レスハンド。
1. A suctionless hand for a robot, wherein a substrate holding member is provided on a hand for holding a substrate, and a slip preventing portion for preventing substrate displacement is formed on the substrate holding member. .
【請求項2】 前記滑り止め部が、凹凸状に形成されて
いることを特徴とする請求項1記載のロボットの吸着レ
スハンド。
2. The suctionless hand of a robot according to claim 1, wherein the non-slip portion is formed in an uneven shape.
【請求項3】 前記基板保持部材が、前記ハンドに着脱
可能に配設されていることを特徴とする請求項1記載の
ロボットの吸着レスハンド。
3. The suctionless hand of a robot according to claim 1, wherein the substrate holding member is detachably provided on the hand.
JP2000029284A 2000-02-07 2000-02-07 Suctionless hand of robot Pending JP2001223252A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000029284A JP2001223252A (en) 2000-02-07 2000-02-07 Suctionless hand of robot

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000029284A JP2001223252A (en) 2000-02-07 2000-02-07 Suctionless hand of robot

Publications (1)

Publication Number Publication Date
JP2001223252A true JP2001223252A (en) 2001-08-17

Family

ID=18554568

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000029284A Pending JP2001223252A (en) 2000-02-07 2000-02-07 Suctionless hand of robot

Country Status (1)

Country Link
JP (1) JP2001223252A (en)

Cited By (17)

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Publication number Priority date Publication date Assignee Title
JP2003168717A (en) * 2001-12-03 2003-06-13 Yaskawa Electric Corp Wafer transport fork
JP2006261377A (en) * 2005-03-17 2006-09-28 Ulvac Japan Ltd Substrate conveyance robot and substrate conveyance system provided with same
JP2006294786A (en) * 2005-04-08 2006-10-26 Ulvac Japan Ltd Substrate conveying system
JP2008105170A (en) * 2006-09-26 2008-05-08 Denso Corp Workpiece gripping tool
JP2008252012A (en) * 2007-03-30 2008-10-16 Applied Materials Inc Wafer transferring blade
JP2010192642A (en) * 2009-02-18 2010-09-02 Toppan Printing Co Ltd Robot hand for glass substrate conveyance
KR101028917B1 (en) 2003-12-27 2011-04-12 엘지디스플레이 주식회사 Robot hand
JP2011086806A (en) * 2009-10-16 2011-04-28 Gold Kogyo Kk Precise substrate housing container
KR101208644B1 (en) 2009-07-03 2012-12-06 도쿄엘렉트론가부시키가이샤 Position deviation preventing device, substrate holding member including the same, substrate transfer apparatus and substrate transfer method
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KR101334595B1 (en) * 2012-02-21 2013-11-29 (주)나린테크 Pad for transfer robot and transfer robot having the same
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US9698035B2 (en) 2013-12-23 2017-07-04 Lam Research Corporation Microstructures for improved wafer handling
US9776333B2 (en) 2015-11-24 2017-10-03 Hirata Corporation Hand member and hand
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Publication number Priority date Publication date Assignee Title
JP2003168717A (en) * 2001-12-03 2003-06-13 Yaskawa Electric Corp Wafer transport fork
KR101028917B1 (en) 2003-12-27 2011-04-12 엘지디스플레이 주식회사 Robot hand
JP4570037B2 (en) * 2005-03-17 2010-10-27 株式会社アルバック Substrate transfer system
JP2006261377A (en) * 2005-03-17 2006-09-28 Ulvac Japan Ltd Substrate conveyance robot and substrate conveyance system provided with same
JP2006294786A (en) * 2005-04-08 2006-10-26 Ulvac Japan Ltd Substrate conveying system
JP4680657B2 (en) * 2005-04-08 2011-05-11 株式会社アルバック Substrate transfer system
JP2008105170A (en) * 2006-09-26 2008-05-08 Denso Corp Workpiece gripping tool
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EP1975997A3 (en) * 2007-03-30 2009-10-07 Applied Materials, Inc. Wafer transfer blade
JP2008252012A (en) * 2007-03-30 2008-10-16 Applied Materials Inc Wafer transferring blade
KR100989752B1 (en) * 2007-03-30 2010-10-26 어플라이드 머티어리얼스, 인코포레이티드 Wafer transfer blade
JP2010192642A (en) * 2009-02-18 2010-09-02 Toppan Printing Co Ltd Robot hand for glass substrate conveyance
KR101208644B1 (en) 2009-07-03 2012-12-06 도쿄엘렉트론가부시키가이샤 Position deviation preventing device, substrate holding member including the same, substrate transfer apparatus and substrate transfer method
JP2011086806A (en) * 2009-10-16 2011-04-28 Gold Kogyo Kk Precise substrate housing container
KR101251024B1 (en) 2011-03-02 2013-04-05 (주)에스에스이엔지 Adhesive pad and robot for moving the substrate having the same
KR101334595B1 (en) * 2012-02-21 2013-11-29 (주)나린테크 Pad for transfer robot and transfer robot having the same
CN103943545A (en) * 2013-01-21 2014-07-23 北京北方微电子基地设备工艺研究中心有限责任公司 Manipulator and semiconductor device
WO2014110944A1 (en) * 2013-01-21 2014-07-24 北京北方微电子基地设备工艺研究中心有限责任公司 Manipulator and semiconductor device
US9698035B2 (en) 2013-12-23 2017-07-04 Lam Research Corporation Microstructures for improved wafer handling
KR101678375B1 (en) * 2015-10-01 2016-11-23 주식회사 선익시스템 Substrate Transfer Device and Substrate Aligning Apparatus Having the Same
US9776333B2 (en) 2015-11-24 2017-10-03 Hirata Corporation Hand member and hand
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KR20210026763A (en) * 2019-09-02 2021-03-10 에스케이실트론 주식회사 Paddle device and Polishing device
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