JP2001043650A - Magnetic head slider - Google Patents
Magnetic head sliderInfo
- Publication number
- JP2001043650A JP2001043650A JP11213110A JP21311099A JP2001043650A JP 2001043650 A JP2001043650 A JP 2001043650A JP 11213110 A JP11213110 A JP 11213110A JP 21311099 A JP21311099 A JP 21311099A JP 2001043650 A JP2001043650 A JP 2001043650A
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic head
- outside air
- head slider
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、磁気記録再生装置
に装備される磁気ヘッドに係り、特に磁気ヘッドスライ
ダーの記録媒体と対向する面に設ける積層膜の構造を工
夫して更なる薄膜化によりスペーシングを減らして磁気
ヘッドの高感度化を図る技術に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head provided in a magnetic recording / reproducing apparatus, and more particularly, to a thinner film by devising a structure of a laminated film provided on a surface of a magnetic head slider facing a recording medium. The present invention relates to a technique for increasing the sensitivity of a magnetic head by reducing spacing.
【０００２】[0002]
【従来の技術】ハードディスク装置に用いられる磁気ヘ
ッドでは磁気記録特性の向上のために、磁気ヘッドスラ
イダーと記録媒体との浮上距離の低減が求められてい
る。このため、記録媒体の表面形状の制御のみならず磁
気ヘッドスライダーの空気潤滑面の形状の工夫による低
浮上化、空気潤滑面上にＤＬＣ（Ｄｉａｍｏｎｄ−Ｌｉ
ｋｅ−Ｃａｒｂｏｎ）等の薄膜を形成して摺動時の摩擦
力の低減を図っている。2. Description of the Related Art In a magnetic head used in a hard disk drive, it is required to reduce a flying distance between a magnetic head slider and a recording medium in order to improve magnetic recording characteristics. Therefore, not only the surface shape of the recording medium is controlled but also the flying height is reduced by devising the shape of the air lubrication surface of the magnetic head slider, and the DLC (Diamond-Li
A thin film such as ke-Carbon is formed to reduce the frictional force during sliding.
【０００３】一方、薄膜で形成された記録素子と再生素
子を構成する材料は、外気中の水分や化学物質により腐
食され易い材料が一部使用されている。このため記録媒
体との摩擦低減のみならず腐食をも防止する積層膜が要
求されている。[0003] On the other hand, as a material constituting a recording element and a reproducing element formed of a thin film, a material which is easily corroded by moisture or a chemical substance in the outside air is partially used. For this reason, there is a demand for a laminated film that not only reduces the friction with the recording medium but also prevents corrosion.
【０００４】以上の課題に対して従来の技術では、記録
再生素子を含む空気潤滑面全面に５〜１０ｎｍの厚みで
緻密なＤＬＣ薄膜を被覆し、摺動時の摩擦係数の低減と
外気からの水分や化学物質の進入を防いで記録再生素子
の腐食を防いでいる。In order to solve the above-mentioned problems, in the prior art, a dense DLC thin film having a thickness of 5 to 10 nm is coated on the entire surface of the air lubrication surface including the recording / reproducing element to reduce the friction coefficient at the time of sliding and to reduce the outside air. This prevents corrosion of the read / write element by preventing the entry of moisture and chemical substances.
【０００５】しかしながらＤＬＣ薄膜は一般的に大きな
内部圧縮応力を有しているため、ＤＬＣ薄膜のみを空気
潤滑面に製膜しても空気潤滑面から剥離する。ＤＬＣ膜
の剥離を防ぐため、ＡＴＣ（Ａｌ2Ｏ3−ＴｉＣ）等の材
料で構成された空気潤滑面とＤＬＣ薄膜の密着性を高め
るために珪素等を含んだ厚み１〜３ｎｍほどの薄膜を配
している。However, since the DLC thin film generally has a large internal compressive stress, even if only the DLC thin film is formed on the air-lubricated surface, it is separated from the air-lubricated surface. In order to prevent peeling of the DLC film, a thin film containing silicon or the like having a thickness of about 1 to 3 nm containing silicon or the like is used to enhance the adhesion between the air lubricating surface made of a material such as ATC (Al 2 O 3 —TiC) and the DLC thin film. I have arranged.
【０００６】すなわち空気潤滑面上の薄膜は二層の積層
構造になっており、珪素等含んだ薄膜は空気潤滑面とＤ
ＬＣ薄膜の密着力強化の役割を担い、ＤＬＣ薄膜は記録
再生素子の腐食防止機能と記録媒体との摺動時における
摩擦係数低減の機能を担っている。That is, the thin film on the air-lubricated surface has a two-layer laminated structure, and the thin film containing silicon or the like is
The DLC thin film has a function of preventing corrosion of the recording / reproducing element and a function of reducing the coefficient of friction when sliding with the recording medium.
【０００７】[0007]
【発明の解決しようとする課題】コンピューター等の記
憶装置として用いられるハードディスク装置の記録密度
は、磁気抵抗効果型再生素子（ＭＲ，ＧＭＲ素子）が実
用化され、急激に向上した。高密度記録に伴う磁気媒体
上の磁気信号の微弱化に対応するため、再生素子自体の
高感度化のみならず、媒体から僅かに漏れる磁界を効率
良く拾うために、記録媒体の磁性層表面から磁気ヘッド
スライダーが備えている記録再生素子のギャップ部分ま
での距離（以下、磁気的浮上量と言う）を出来うる限り
小さくする必要がある。The recording density of a hard disk device used as a storage device of a computer or the like has been drastically improved since magnetoresistive effect reproducing elements (MR, GMR elements) have been put to practical use. In order to cope with the weakening of the magnetic signal on the magnetic medium accompanying high-density recording, not only to increase the sensitivity of the read element itself, but also to pick up the magnetic field that leaks slightly from the medium, It is necessary to make the distance to the gap portion of the recording / reproducing element provided in the magnetic head slider (hereinafter, referred to as magnetic flying height) as small as possible.
【０００８】しかしながら、磁気ヘッドスライダー及び
記録媒体の対向面側には各々の信頼性を上げる目的で保
護膜が形成されている。磁気ヘッドスライダーには前述
した二層構造の積層膜が付けられている。この記録媒体
側の表面と磁気ヘッドスライダー側の表面の距離を一般
的には磁気ヘッドスライダーの浮上量（以下、物理的浮
上量と言う）と呼ぶ。However, a protective film is formed on the facing surface side of the magnetic head slider and the recording medium for the purpose of improving the reliability of each. The magnetic head slider is provided with the above-described laminated film having a two-layer structure. The distance between the surface on the recording medium side and the surface on the magnetic head slider side is generally called the flying height of the magnetic head slider (hereinafter referred to as the physical flying height).
【０００９】記録密度を上げるために、物理的浮上量が
０．０５μｍよりも小さくなっている現状においては、
単純に物理的浮上量を減らすことは、記録再生時に記録
媒体と磁気ヘッドスライダーの衝突等により、データー
エラー等が発生し易くなり信頼性の面から限界に近くな
っている。物理的浮上量を下げずに磁気的浮上量を下げ
るには、磁気媒体の保護膜の厚みを薄くする、もしくは
磁気ヘッドスライダーの空気潤滑面上の積層膜の厚みを
薄くして磁気的浮上量と物理的浮上量を近づける必要が
ある。In order to increase the recording density, in the present situation where the physical flying height is smaller than 0.05 μm,
Simply reducing the physical flying height is likely to cause a data error or the like due to a collision between a recording medium and a magnetic head slider during recording and reproduction, and is near the limit in terms of reliability. To lower the magnetic levitation without lowering the physical levitation, reduce the thickness of the protective film on the magnetic medium, or reduce the thickness of the laminated film on the air lubrication surface of the magnetic head slider to reduce the magnetic levitation. It is necessary to make the physical flying height close to that.
【００１０】磁気ヘッド側からの試みとしては、磁気ヘ
ッドスライダーの空気潤滑面上の二層構造の積層膜の各
々の膜厚を薄くする、もしくはＤＬＣ薄膜のみの単層に
する検討がされている。As an attempt from the magnetic head side, studies have been made to reduce the thickness of each of the two-layered laminated films on the air-lubricated surface of the magnetic head slider or to use only a single DLC thin film. .
【００１１】しかしながら単純に二層構造の積層膜の各
々の膜厚を薄くするだけでは積層膜が記録再生素子の腐
蝕を防止するほど緻密な膜にならず、また同様にＤＬＣ
膜と空気潤滑面の間に配置した珪素等含む薄膜が薄すぎ
て緻密な膜にならずに密着強度が落ちる問題が出てき
た。However, simply reducing the thickness of each of the two-layered laminated films does not make the laminated films dense enough to prevent corrosion of the recording / reproducing element.
A thin film containing silicon or the like disposed between the film and the air lubricating surface is too thin, resulting in a problem that the film does not become a dense film and the adhesion strength is reduced.
【００１２】一方、空気潤滑面上にＤＬＣ薄膜だけの単
層膜を形成する試みについては、ＤＬＣ薄膜の大きな内
部圧縮応力のため空気潤滑面との密着強度が得られず、
剥離してしまう問題が解決できず採用は難しい。On the other hand, in an attempt to form a single-layer film composed of only the DLC thin film on the air-lubricated surface, the adhesion strength with the air-lubricated surface cannot be obtained due to the large internal compressive stress of the DLC thin film.
The problem of peeling cannot be solved and it is difficult to adopt.
【００１３】本発明は前述の問題点を解決すべく、空気
潤滑面上のＤＬＣ薄膜を含む二層構造の積層膜を工夫し
て物理的浮上量を下げずに磁気的浮上量を下げることを
可能とし、かつ薄膜素子の耐腐食性、摺動時の記録媒体
との低摩擦特性維持が出来ることを目的とする。In order to solve the above-mentioned problems, the present invention devises a two-layer laminated film including a DLC thin film on an air lubricating surface to reduce the magnetic levitation without lowering the physical levitation. It is an object of the present invention to make it possible to maintain the corrosion resistance of a thin film element and to maintain low friction characteristics with a recording medium during sliding.
【００１４】[0014]
【課題を解決するための手段】上記目的を達成するため
本発明は、記録素子と再生素子を備えた磁気ヘッドスラ
イダーにおいて、前記磁気ヘッドスライダーの空気潤滑
面は、主に第４族元素を含む一層もしくは二層以上で構
成される外気遮断膜で被覆し、前記外気遮断膜全面に
は、連続膜に成る前に製膜操作を止めることにより形成
した多数の島状ＤＬＣ薄膜が分散して覆っていることを
特徴とする磁気ヘッドスライダーである。According to the present invention, there is provided a magnetic head slider having a recording element and a reproducing element, wherein an air lubricating surface of the magnetic head slider mainly contains a Group 4 element. A single layer or two or more layers are covered with an outside air blocking film, and a large number of island-shaped DLC thin films formed by stopping the film forming operation before forming a continuous film are dispersedly covered over the outside air blocking film. A magnetic head slider.
【００１５】外気遮断膜の膜厚は１．０ｎｍ以上、かつ
２．０ｎｍ以下、前記島状ＤＬＣ薄膜の膜厚は０．５ｎ
ｍ以上、かつ２．０ｎｍ以下であることを特徴とする磁
気ヘッドスライダーである。The thickness of the outside air blocking film is 1.0 nm or more and 2.0 nm or less, and the thickness of the island-shaped DLC thin film is 0.5 n
m and 2.0 nm or less.
【００１６】外気遮断膜は、第４族元素として珪素が含
まれていることを特徴とする磁気ヘッドスライダーであ
る。The outside air blocking film is a magnetic head slider characterized by containing silicon as a Group 4 element.
【００１７】島状ＤＬＣ薄膜が前記外気遮断膜を覆って
いる面積の割合が４０％以上、かつ１００％未満の範囲
であることを特徴とする磁気ヘッドスライダーである。The magnetic head slider is characterized in that the area of the island-shaped DLC thin film covering the outside air-blocking film is in the range of 40% or more and less than 100%.
【００１８】以下、本願第一の発明について図１及び図
２を用いて説明する。図１は本発明の磁気ヘッドスライ
ダー外観図、そして図２は図１上に記した磁気ヘッドス
ライダー上のａ−ａ’のラインを切断線としたときに現
れる記録再生素子近傍の断面の模式形状である。Hereinafter, the first invention of the present application will be described with reference to FIGS. FIG. 1 is an external view of a magnetic head slider of the present invention, and FIG. 2 is a schematic cross-sectional shape near a recording / reproducing element which appears when the line aa ′ on the magnetic head slider shown in FIG. It is.
【００１９】ＭＲ素子やＧＭＲ素子のように薄膜で形成
された再生素子８と、記録素子７で構成される記録再生
素子１を備えた、磁気ヘッドスライダー２の空気潤滑面
３上に島状ＤＬＣ薄膜４と第４族元素を含むピンホール
等の欠陥の無い緻密な外気遮断膜５で構成されている。An island-shaped DLC is provided on an air lubricating surface 3 of a magnetic head slider 2 having a reproducing element 8 formed of a thin film such as an MR element or a GMR element and a recording / reproducing element 1 composed of a recording element 7. It is composed of a thin film 4 and a dense outside air blocking film 5 having no defects such as pinholes containing a Group 4 element.
【００２０】前記外気遮断膜５として使用する膜は主に
スパッタリングにより製膜するが、均一で欠陥の無い膜
を形成するためには少なくとも１．０ｎｍの膜厚が必要
である。また、外気遮断膜５を必要以上に厚くすると積
層膜１０全体の厚みが大きくなり磁気的浮上量が大きく
なるので外気遮断膜５の膜厚が２．０ｎｍを越えないよ
うにする。外気遮断膜５を二層以上で構成する場合は、
各層の合計膜厚が２．０ｎｍを越えないようにする。こ
こで、積層膜１０の厚みとは、外気遮断膜５の膜厚とＤ
ＬＣ薄膜４の膜厚の和を指している。ただし、ＤＬＣ薄
膜の膜厚は後述するが、均一な連続膜でない島状である
ので最も厚みの厚い箇所を膜厚と定義する。The film used as the outside air blocking film 5 is mainly formed by sputtering, but a film thickness of at least 1.0 nm is required to form a uniform and defect-free film. Further, if the outside air blocking film 5 is made thicker than necessary, the thickness of the entire laminated film 10 becomes large and the magnetic levitation amount becomes large. Therefore, the thickness of the outside air blocking film 5 should not exceed 2.0 nm. When the outside air blocking film 5 is composed of two or more layers,
The total thickness of each layer should not exceed 2.0 nm. Here, the thickness of the laminated film 10 is defined as the thickness of the outside air blocking film 5 and D
It indicates the sum of the thicknesses of the LC thin films 4. However, although the thickness of the DLC thin film will be described later, the thickest portion is defined as the film thickness because the DLC thin film has an island shape which is not a uniform continuous film.
【００２１】外気遮断膜５の成分としてＤＬＣ薄膜の主
成分である炭素と同族の元素（珪素、ゲルマニウム等の
第４族元素）が含まれているため、島状ＤＬＣ薄膜４と
外気遮断膜５はなじみが良く互いの密着力が大きくな
り、ＤＬＣ薄膜の剥離を防止する効果がある。外気遮断
膜５を二層以上で構成した場合は、各層に成分の異なっ
た膜を採用することもできる。Since an element (group 4 element such as silicon and germanium) which is the same as carbon which is a main component of the DLC thin film is contained as a component of the outside air blocking film 5, the island-shaped DLC thin film 4 and the outside air blocking film 5 It has a good fit and a large adhesion force, and has an effect of preventing peeling of the DLC thin film. When the outside air blocking film 5 is composed of two or more layers, films having different components can be adopted for each layer.
【００２２】前記ＤＬＣ薄膜４の構造は前記外気遮断膜
５とは異なり、連続膜構造に成る前に製膜操作を止める
ことにより形成した多数の微細な島状である。この島状
のＤＬＣ薄膜が分散して前記外気遮断膜５を被覆してい
る。具体的にはプラズマＣＶＤでＤＬＣ薄膜を製膜する
際に従来よりも製膜速度を下げるか、製膜時間を短くす
ることにより、ＤＬＣ薄膜が充分成長して連続膜になる
前に製膜を止め、不連続膜（島状構造膜）として実質的
に膜厚を小さくする。The structure of the DLC thin film 4 is different from that of the outside air blocking film 5 and is a large number of fine islands formed by stopping the film forming operation before forming a continuous film structure. The island-shaped DLC thin film is dispersed and covers the outside air blocking film 5. Specifically, when a DLC thin film is formed by plasma CVD, a lower film forming speed than before or a shorter film forming time allows the DLC thin film to be formed before the DLC thin film grows sufficiently to become a continuous film. The thickness is substantially reduced as a discontinuous film (island structure film).
【００２３】第４族元素を含む外気遮断膜５に記録再生
素子１の腐食防止機能を持たせ、島状ＤＬＣ薄膜４には
低摩擦係数等の摺動特性向上のみの機能だけを持たせる
ことにより、実質的な積層膜の膜厚を小さくすることが
出来る。The outside air blocking film 5 containing a Group 4 element has a function of preventing corrosion of the recording / reproducing element 1, and the island-like DLC thin film 4 has only a function of improving only sliding characteristics such as a low friction coefficient. Thereby, the substantial thickness of the laminated film can be reduced.
【００２４】即ち、本願第一の発明は、記録再生素子１
を備えた磁気ヘッドスライダー２において、前記磁気ヘ
ッドスライダーの空気潤滑面３は、主に第４族元素を含
む緻密な外気遮断膜５で被覆され、前記外気遮断膜５の
全面には、連続膜に成る前に製膜操作を止めることによ
り形成した多数の微細な島状ＤＬＣ薄膜が分散して覆っ
ている磁気ヘッドスライダーである。That is, the first invention of the present application is a recording / reproducing element 1
The air lubrication surface 3 of the magnetic head slider is mainly covered with a dense outside air blocking film 5 containing a Group 4 element, and a continuous film is formed on the entire surface of the outside air blocking film 5. This is a magnetic head slider in which a large number of fine island-like DLC thin films formed by stopping a film forming operation before forming a film are dispersedly covered.
【００２５】本願第二の発明は、第一の発明の磁気ヘッ
ドスライダーにおいて、前記外気遮断膜５の厚みは１．
０ｎｍ以上、かつ２．０ｎｍ以下、島状ＤＬＣ薄膜の膜
厚は０．５ｎｍ以上、かつ２．０ｎｍ以下であることを
特徴とする磁気ヘッドスライダーである。The second invention of the present application is the magnetic head slider according to the first invention, wherein the thickness of the outside air blocking film 5 is 1.
A magnetic head slider characterized in that the thickness of the island-shaped DLC thin film is not less than 0 nm and not more than 2.0 nm and not more than 2.0 nm.
【００２６】本願第三の発明について同じく第１図と第
２図を用いて説明する。第一の発明の磁気ヘッドスライ
ダーと同様に、ＭＲ素子やＧＭＲ素子のように薄膜で形
成された再生素子８と、記録素子７で構成される記録再
生素子１を備えた、磁気ヘッドスライダー２の空気潤滑
面３上に、第４族元素を含むピンホール等の欠陥の無い
緻密な外気遮断膜５と、島状ＤＬＣ薄膜４とで構成され
ている。前記外気遮断膜５の材質としては、アモルファ
ス珪素膜又は、二酸化珪素膜、窒化珪素等の珪素の酸化
物、炭化物、窒化物などが使用できる。The third invention of the present application will be described with reference to FIGS. 1 and 2. Similarly to the magnetic head slider of the first invention, the magnetic head slider 2 includes a reproducing element 8 formed of a thin film such as an MR element or a GMR element and a recording / reproducing element 1 including a recording element 7. On the air-lubricated surface 3, a dense outside-air blocking film 5 having no defect such as a pinhole containing a Group 4 element and an island-like DLC thin film 4 are formed. As a material of the outside air blocking film 5, an amorphous silicon film, a silicon dioxide film, a silicon oxide such as silicon nitride, a carbide, a nitride, or the like can be used.
【００２７】特に珪素による外気遮断膜５は単一元素に
より構成するので化合物薄膜よりもより薄い状態でも欠
陥の無い膜が形成出来る上、微細な島状ＤＬＣ薄膜で覆
われなかった部分のアモルファス珪素膜表面は、自然酸
化されて耐環境性の良い二酸化珪素に変化するため、外
気遮断膜として優れている。外気遮断膜５に含まれる第
４族元素として珪素が含まれていることを特徴としてい
る。In particular, since the outside air blocking film 5 made of silicon is composed of a single element, a film having no defect can be formed even in a state thinner than a compound thin film, and amorphous silicon in a portion not covered with a fine island-like DLC thin film can be formed. Since the film surface is naturally oxidized and changes to silicon dioxide having good environmental resistance, it is excellent as an outside air blocking film. It is characterized in that silicon is contained as a Group 4 element contained in the outside air blocking film 5.
【００２８】即ち第三の発明は外気遮断膜５に、第４族
元素として珪素が含まれていることを特徴とする発明一
と二の磁気ヘッドスライダーである。That is, the third invention is the magnetic head slider according to the first and second inventions, wherein the outside air blocking film 5 contains silicon as a Group 4 element.
【００２９】本願第四の発明は、第一から三の発明の磁
気ヘッドスライダーにおいて、外気遮断膜５の４０％以
上の面積を島状ＤＬＣ薄膜が分散して覆っていれば、Ｃ
ＳＳ特性の悪化が見られない。前記外気遮断膜の４０％
以上、かつ１００％未満の範囲で覆っていることを特徴
とする発明第一から第三の磁気ヘッドスライダーであ
る。According to the fourth invention of the present application, in the magnetic head slider of the first to third inventions, if the island-like DLC thin film is dispersedly covering an area of 40% or more of the outside air blocking film 5, C
No deterioration in SS characteristics is observed. 40% of the outside air blocking film
The magnetic head sliders according to the first to third aspects of the present invention, wherein the magnetic head slider covers the magnetic head in a range of less than 100%.
【００３０】[0030]
【発明の実施の形態】本発明の実施の形態について説明
する。図１は本発明の一実施例を示す磁気ヘッドスライ
ダーの外観図である。磁気ヘッドスライダー２の空気潤
滑面３上にピンホール等の欠陥の無い連続したアモルフ
ァス珪素膜で形成された外気遮断膜５があり、その上に
微細な島状ＤＬＣ薄膜４が分散して形成されており、外
気遮断膜５と島状ＤＬＣ薄膜で積層膜１０を構成してい
る。Embodiments of the present invention will be described. FIG. 1 is an external view of a magnetic head slider showing one embodiment of the present invention. On the air lubrication surface 3 of the magnetic head slider 2, there is an outside air blocking film 5 formed of a continuous amorphous silicon film having no defects such as pinholes, on which fine island-like DLC thin films 4 are dispersedly formed. The laminated film 10 is composed of the outside air blocking film 5 and the island-like DLC thin film.
【００３１】本発明では外気遮断機能を持たせるアモル
ファス珪素膜を、スパッターを用い製膜し、島状ＤＬＣ
薄膜はＥＣＲプラズマＣＶＤを用いて製膜を行った。In the present invention, an amorphous silicon film having an outside air blocking function is formed by sputtering to form an island-like DLC.
The thin film was formed using ECR plasma CVD.
【００３２】外気遮断膜５と島状ＤＬＣ薄膜４からなる
積層膜１０の形成に使用した装置には、ロードロック方
式を採用した。外気遮断膜５を製膜するスパッター室
と、島状ＤＬＣ薄膜４を製膜するプラズマＣＶＤ室がロ
ードロック室を介して分離されている。スパッター室と
プラズマＣＶＤ室は、ロードロック室を介して試料の移
動を行うことが出来る。このため積層膜を形成する場
合、一層目の外気遮断膜５の製膜終了後、真空を破らず
に二層目の島状ＤＬＣ薄膜４を形成出来るため、アモル
ファス珪素で構成される一層目の外気遮断膜５と二層目
の島状ＤＬＣ薄膜４の界面に珪素酸化物等が生じない。The apparatus used for forming the laminated film 10 composed of the outside air blocking film 5 and the island-like DLC thin film 4 employs a load lock method. A sputter chamber for forming the outside air blocking film 5 and a plasma CVD chamber for forming the island-shaped DLC thin film 4 are separated via a load lock chamber. The sample can be moved between the sputter chamber and the plasma CVD chamber via the load lock chamber. For this reason, in the case of forming a laminated film, the second-layer island-shaped DLC thin film 4 can be formed without breaking the vacuum after the formation of the first outside air-blocking film 5, so that the first layer made of amorphous silicon is formed. No silicon oxide or the like is generated at the interface between the outside air blocking film 5 and the second-layer island-like DLC thin film 4.
【００３３】スパッター室内に移送した試料は表面の有
機物等の除去等のために、アルゴンガス流量３０ｓｃｃ
ｍ、圧力１．５Ｐａ、ＲＦ電力１５０Ｗの条件にてイオ
ンミリングを行った。この後、同室でアルゴンガス流量
３０ｓｃｃｍ、圧力０．６６Ｐａ、ＲＦ電力２００Ｗ、
製膜時間４０秒で膜厚２．０ｎｍのアモルファス珪素膜
の製膜を行った。ロードロック室を介して試料をプラズ
マＣＶＤ室に移送し、ＥＣＲプラズマＣＶＤにて、原料
ガスであるメタン流量３０ｓｃｃｍ、圧力０．６６Ｐ
ａ、マイクロ波電力２００Ｗ、ＲＦ電力１００Ｗの条件
で膜厚１．５ｎｍのＤＬＣ薄膜を形成した。２．０ｎｍ
厚の外気遮断膜５と１．５ｎｍ厚の島状ＤＬＣ薄膜４で
構成された３．５ｎｍ厚の積層膜１０を形成した。The sample transferred into the sputter chamber was subjected to an argon gas flow of 30 scc to remove organic substances on the surface.
The ion milling was performed under the conditions of m, pressure 1.5 Pa, and RF power 150 W. Thereafter, in the same chamber, an argon gas flow rate of 30 sccm, a pressure of 0.66 Pa, an RF power of 200 W,
An amorphous silicon film having a thickness of 2.0 nm was formed with a film formation time of 40 seconds. The sample was transferred to a plasma CVD chamber via a load lock chamber, and a methane flow rate of 30 sccm as a raw material gas and a pressure of 0.66 P were measured by ECR plasma CVD.
a, a 1.5-nm-thick DLC thin film was formed under the conditions of microwave power of 200 W and RF power of 100 W. 2.0nm
A 3.5 nm-thick laminated film 10 composed of a thick outside air blocking film 5 and a 1.5 nm-thick island-like DLC thin film 4 was formed.
【００３４】上記の条件で形成した積層膜１０を、原子
間力顕微鏡にて表面形状を観察することによりＤＬＣ薄
膜が連続膜でなく、島状構造を呈する不連続膜であるこ
とが確認された。また同時に外気遮断膜５の全面積に対
して、島状ＤＬＣ薄膜の総面積が８５％であることも確
認した。By observing the surface shape of the laminated film 10 formed under the above conditions with an atomic force microscope, it was confirmed that the DLC thin film was not a continuous film but a discontinuous film exhibiting an island structure. . At the same time, it was confirmed that the total area of the island-shaped DLC thin film was 85% of the total area of the outside air-blocking film 5.
【００３５】外気遮断膜５および島状ＤＬＣ薄膜４の各
々の効果を確認するため、外気遮断膜５を０．５〜３．
０ｎｍの範囲で製膜し、島状ＤＬＣ薄膜４を１．５ｎｍ
製膜した試料を用い、環境試験を行った。また、外気遮
断膜５を２．０ｎｍ製膜したのち、島状ＤＬＣ薄膜４を
０．４〜１．５ｎｍの範囲で製膜し、ＣＳＳ試験を行っ
た。In order to confirm the effect of each of the outside air blocking film 5 and the island-shaped DLC thin film 4, the outside air blocking film 5 is set to 0.5 to 3.
The island-shaped DLC thin film 4 was formed to a thickness of 1.5 nm.
An environmental test was performed using the formed sample. Further, after the outside air blocking film 5 was formed in a thickness of 2.0 nm, the island-like DLC thin film 4 was formed in a range of 0.4 to 1.5 nm, and a CSS test was performed.
【００３６】外気遮断膜５を、０．５〜３．０ｎｍの範
囲で約０．３ｎｍ間隔で８試料製膜した。島状ＤＬＣ薄
膜は１．５ｎｍの膜厚とした。環境試験はＰＣＴ（Ｐｒ
ｅｓｓｕｒｅ Ｃｏｏｋｅｒ Ｔｅｓｔ）を行い記録再
生素子１に腐蝕が発生したものを不良とした。ＰＣＴの
条件は圧力容器に１０８〜１０９（Ω−ｃｍ）の電気抵
抗を持つイオン交換水と、試料を入れ１２１℃に１００
時間保持した。１２１℃の温度下では、湿度１００％、
２気圧の条件となる。表１に外気遮断膜５の膜厚とＰＣ
Ｔ結果を示す。Eight samples of the outside air blocking film 5 were formed at intervals of about 0.3 nm in the range of 0.5 to 3.0 nm. The island-like DLC thin film had a thickness of 1.5 nm. The environmental test is PCT (Pr
Essure Cooker Test) was performed to determine that the recording / reproducing element 1 was corroded. The conditions of PCT are as follows. Ion-exchanged water having an electric resistance of 10 8 to 10 9 (Ω-cm) and a sample are put in a pressure vessel and put at 121 ° C. for 100 ° C.
Hold for hours. At a temperature of 121 ° C, the humidity is 100%,
The condition is 2 atm. Table 1 shows the thickness of the outside air blocking film 5 and the PC.
The T results are shown.
【００３７】[0037]
【表１】 [Table 1]
【００３８】表１に示す結果から判るように、外気遮断
膜５の膜厚が１．０ｎｍ未満の場合記録再生素子１に腐
蝕が発生していることから、外気遮断膜５の厚みは１．
０ｎｍ以上必要であることが判る。１．０ｎｍ以上で厚
い分には外気遮断効果は増加するため問題は無いが、前
述した物理的浮上量の低下に繋がるため好ましいもので
はないため、２．０ｎｍ以下に抑えることが良い。As can be seen from the results shown in Table 1, when the thickness of the outside air blocking film 5 is less than 1.0 nm, the recording / reproducing element 1 is corroded.
It turns out that 0 nm or more is required. When the thickness is 1.0 nm or more, there is no problem because the outside air blocking effect increases when the thickness is 1.0 nm or more, but it is not preferable because it leads to the decrease in the physical flying height described above.
【００３９】次に、島状ＤＬＣ薄膜４効果を確認するた
め、外気遮断膜５を２．０ｎｍ製膜したのち、島状ＤＬ
Ｃ薄膜４を０．４〜１．５ｎｍの範囲で約０．３ｎｍ間
隔で４試料製膜し、ＣＳＳ試験を行った。ＣＳＳ試験は
１０万回まで行い、磁気ヘッドスライダーの空気潤滑面
および磁気媒体表面の傷付き状態と、磁気ヘッドスライ
ダーの記録再生特性再現率で評価した。記録再生特性の
再現率Ｒは、ＣＳＳ試験用磁気媒体とは別個に準備した
磁気媒体を用い、ＣＳＳ試験する前に記録再生した出力
電圧Ｖ０とＣＳＳ試験後に記録再生した出力電圧Ｖ１と
の比率で、Ｒ＝Ｖ１／Ｖ０＊１００（％）で求めた。表
２に島状ＤＬＣ薄膜の膜厚と島状ＤＬＣ薄膜の外気遮断
膜の被覆率、ＣＳＳ試験の傷発生状況、記録再生特性の
再現率Ｒを示す。比較のために５ｎｍの厚みで連続した
ＤＬＣ薄膜を付加した磁気ヘッドスライダーも同時に試
験した。Next, in order to confirm the effect of the island-shaped DLC thin film 4, the outside air blocking film 5 is formed to a thickness of 2.0 nm, and then the island-shaped DL
Four samples of the C thin film 4 were formed at intervals of about 0.3 nm in a range of 0.4 to 1.5 nm, and a CSS test was performed. The CSS test was performed up to 100,000 times, and the evaluation was made based on the scratched state of the air lubrication surface of the magnetic head slider and the surface of the magnetic medium, and the read / write characteristic reproducibility of the magnetic head slider. The reproducibility R of the recording / reproducing characteristics is a ratio of an output voltage V0 recorded / reproduced before the CSS test and an output voltage V1 recorded / reproduced after the CSS test using a magnetic medium prepared separately from the CSS test magnetic medium. , R = V1 / V0 * 100 (%). Table 2 shows the thickness of the island-like DLC thin film, the coverage of the island-like DLC thin film with the outside air blocking film, the occurrence of scratches in the CSS test, and the reproducibility R of the recording / reproducing characteristics. For comparison, a magnetic head slider to which a continuous DLC thin film having a thickness of 5 nm was added was also tested.
【００４０】[0040]
【表２】 [Table 2]
【００４１】表２に示す結果から判るように、島状ＤＬ
Ｃ薄膜４の膜厚が０．５ｎｍ以下、外気遮断膜５の全面
積に対する被覆率が４０％以下では、１０万回のＣＳＳ
回数に達する前に磁気ヘッドスライダーおよび磁気媒体
に肉眼で確認できるような傷が入った。記録再生特性の
劣化も大きく再現率Ｒも３０％以下と、記録再生素子１
も損傷を受けていることが確認された。島状ＤＬＣ薄膜
の膜厚が０．５ｎｍ以上あれば、１０万回のＣＳＳ試験
後も磁気ヘッドスライダーおよび磁気媒体に付く傷は、
５ｎｍの膜厚で付けた連続したＤＬＣ薄膜と同レベルで
あった。また、記録再生特性再現率Ｒも９８〜１０２
（％）と測定誤差範囲と考えられるレベルである。これ
らのことから、島状ＤＬＣ薄膜の膜厚が０．５ｎｍ以上
あれば、連続したＤＬＣ薄膜と同等の摺動特性を確保出
来ることが判る。As can be seen from the results shown in Table 2, the island-shaped DL
If the thickness of the C thin film 4 is 0.5 nm or less and the coverage of the entire area of the outside air blocking film 5 is 40% or less, 100,000 times of CSS
Before reaching the number of times, the magnetic head slider and the magnetic medium were visually scratched. The recording / reproducing characteristics of the recording / reproducing element 1 are greatly deteriorated, and the recall rate R is 30% or less.
It was also confirmed that it was damaged. If the thickness of the island-shaped DLC thin film is 0.5 nm or more, the scratches on the magnetic head slider and the magnetic medium even after 100,000 times of the CSS test,
It was at the same level as a continuous DLC thin film having a thickness of 5 nm. Further, the recording / reproducing characteristic reproducibility R is also 98 to 102.
(%) And a level considered to be a measurement error range. From these facts, it can be seen that if the thickness of the island-shaped DLC thin film is 0.5 nm or more, the same sliding characteristics as a continuous DLC thin film can be secured.
【００４２】外気遮断膜５の膜厚は１．０ｎｍ以上、島
状ＤＬＣ薄膜４の膜厚は０．５ｎｍ以上あれば、記録再
生素子１の外気からの遮断効果および摺動特性が得られ
ることが判る。膜厚の上限は物理的および磁気的浮上量
から決まることであるが、記録密度を上げる点から２ｎ
ｍとした。以上のことから、外気遮断膜５の膜厚は１．
０ｎｍ以上、かつ２．０ｎｍ以下とし、島状ＤＬＣ薄膜
４の膜厚を０．５ｎｍ以上、かつ２．０ｎｍ以下とし、
外気遮断膜５の全面積に対する島状ＤＬＣ薄膜４の被覆
率が４０％以上、かつ１００％未満に規定した。If the thickness of the outside air blocking film 5 is 1.0 nm or more and the thickness of the island-like DLC thin film 4 is 0.5 nm or more, the recording / reproducing element 1 can have the effect of blocking the outside air from outside and the sliding characteristics. I understand. The upper limit of the film thickness is determined by the physical and magnetic flying height, but 2n from the viewpoint of increasing the recording density.
m. From the above, the film thickness of the outside air blocking film 5 is 1.
0 nm or more and 2.0 nm or less, the thickness of the island-shaped DLC thin film 4 is 0.5 nm or more and 2.0 nm or less,
The coverage of the island-shaped DLC thin film 4 with respect to the entire area of the outside air-blocking film 5 was specified to be 40% or more and less than 100%.
【００４３】[0043]
【発明の効果】以上詳細に説明したように本発明は、第
４族元素を含む緻密で連続した状態の外気遮断膜と、製
膜過程にて連続状態の膜構造に至る前に製膜を中断し
て、不連続状の島状構造膜にしたＤＬＣ薄膜からなる、
積層膜とすることにより、記録再生素子に対する腐食防
止能力、記録媒体に対する低摩擦係数性能を落とすこと
なくＤＬＣ薄膜の実質的な膜厚を減少させて磁気的浮上
量を小さく出来るため、磁気ヘッドの感度を高める事が
できる。As described in detail above, the present invention provides a dense and continuous outside air blocking film containing a Group 4 element and a film formation process before a continuous film structure is formed in the film formation process. Consisting of a DLC film interrupted into a discontinuous island structure film,
By using a laminated film, the DLC thin film can be reduced in substantial film thickness without decreasing the corrosion prevention ability for the recording / reproducing element and the low friction coefficient performance for the recording medium, thereby reducing the magnetic flying height. Sensitivity can be increased.
【図１】本発明の磁気ヘッドスライダーの外観図FIG. 1 is an external view of a magnetic head slider of the present invention.
【図２】本発明の記録再生素子近辺の断面図FIG. 2 is a cross-sectional view near the recording / reproducing element of the present invention.
１ 記録再生素子、２ 磁気ヘッドスライダー、３ 空
気潤滑面、４ 島状ＤＬＣ薄膜、５ 外気遮断膜、７
記録素子、８ 再生素子、１０ 積層膜DESCRIPTION OF SYMBOLS 1 Recording / reproducing element, 2 magnetic head slider, 3 air lubrication surface, 4 island DLC thin film, 5 outside air blocking film, 7
Recording element, 8 reproducing element, 10 laminated film
Claims (4)
スライダーにおいて、前記磁気ヘッドスライダーの空気
潤滑面は、主に第４族元素を含む一層もしくは二層以上
で構成される外気遮断膜で被覆し、前記外気遮断膜全面
には、連続膜に成る前に製膜操作を止めることにより形
成した多数の島状ＤＬＣ薄膜が分散して覆っていること
を特徴とする磁気ヘッドスライダー。1. A magnetic head slider having a recording element and a reproducing element, wherein an air lubrication surface of the magnetic head slider is covered with an outside air blocking film mainly composed of one or more layers containing a Group 4 element. A magnetic head slider, wherein a large number of island-shaped DLC thin films formed by stopping a film forming operation before forming a continuous film are dispersedly covered on the entire surface of the outside air blocking film.
上、かつ２．０ｎｍ以下、前記島状ＤＬＣ薄膜の膜厚は
０．５ｎｍ以上、かつ２．０ｎｍ以下であることを特徴
とする請求項１に記載の磁気ヘッドスライダー。2. The thickness of the outside air blocking film is 1.0 nm or more and 2.0 nm or less, and the thickness of the island-shaped DLC thin film is 0.5 nm or more and 2.0 nm or less. The magnetic head slider according to claim 1.
素が含まれていることを特徴とする請求項１又は２に記
載の磁気ヘッドスライダー。3. The magnetic head slider according to claim 1, wherein the outside air blocking film contains silicon as a Group 4 element.
覆っている面積の割合が４０％以上、かつ１００％未満
の範囲であることを特徴とする請求項１から３に記載の
磁気ヘッドスライダー。4. The magnetic head according to claim 1, wherein a ratio of an area where the island-shaped DLC thin film covers the outside air blocking film is in a range of 40% or more and less than 100%. slider.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21311099A JP3704000B2 (en) | 1999-07-28 | 1999-07-28 | Magnetic head slider |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21311099A JP3704000B2 (en) | 1999-07-28 | 1999-07-28 | Magnetic head slider |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001043650A true JP2001043650A (en) | 2001-02-16 |
| JP3704000B2 JP3704000B2 (en) | 2005-10-05 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21311099A Expired - Fee Related JP3704000B2 (en) | 1999-07-28 | 1999-07-28 | Magnetic head slider |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3704000B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004335093A (en) * | 2003-05-08 | 2004-11-25 | Sae Magnetics (Hk) Ltd | Magnetic head, magnetic disk system, and method for manufacturing magnetic head |
| US7746600B2 (en) | 2003-04-08 | 2010-06-29 | Seagate Technology Llc | Encapsulant for a disc drive component |
-
1999
- 1999-07-28 JP JP21311099A patent/JP3704000B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7746600B2 (en) | 2003-04-08 | 2010-06-29 | Seagate Technology Llc | Encapsulant for a disc drive component |
| US7855858B2 (en) | 2003-04-08 | 2010-12-21 | Seagate Technology Llc | Microactuator with self-assembled monolayer encapsulant |
| JP2004335093A (en) * | 2003-05-08 | 2004-11-25 | Sae Magnetics (Hk) Ltd | Magnetic head, magnetic disk system, and method for manufacturing magnetic head |
| US7327535B2 (en) * | 2003-05-08 | 2008-02-05 | Sae Magnetics (H.K.) Ltd. | Hybrid coating for magnetic heads |
| JP4499473B2 (en) * | 2003-05-08 | 2010-07-07 | 新科實業有限公司 | Magnetic head and magnetic disk system |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3704000B2 (en) | 2005-10-05 |
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