JP2001000986A - Ozone injection system - Google Patents
Ozone injection systemInfo
- Publication number
- JP2001000986A JP2001000986A JP11177769A JP17776999A JP2001000986A JP 2001000986 A JP2001000986 A JP 2001000986A JP 11177769 A JP11177769 A JP 11177769A JP 17776999 A JP17776999 A JP 17776999A JP 2001000986 A JP2001000986 A JP 2001000986A
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- ozone
- gas
- material gas
- waste liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、界面活性剤や有機
溶媒を含む放射性廃液の処理装置に係り、特に有機成分
を分解する酸化剤としてオゾンを用いるオゾン注入シス
テムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for treating radioactive waste liquid containing a surfactant and an organic solvent, and more particularly to an ozone injection system using ozone as an oxidizing agent for decomposing organic components.
【０００２】[0002]
【従来の技術】原子力発電所において、作業着等の洗濯
廃液、および手洗い廃液等の、界面活性剤を含む放射性
廃液が発生する。この廃液は、含有する界面活性剤等の
有機物の除去処理または酸化分解処理を行い、および放
射性クラッド等を除去した後、施設外に排出される。2. Description of the Related Art In a nuclear power plant, radioactive waste liquid containing a surfactant, such as washing waste liquid for work clothes and hand washing waste liquid, is generated. This waste liquid is discharged outside the facility after removing or oxidatively decomposing organic substances such as surfactants contained therein and removing radioactive cladding and the like.
【０００３】有機物の除去処理または酸化分解処理方法
としては、特願平８−１６５６０１号に開示されるよう
に、粉末活性炭による有機物の吸着後にろ過処理を行う
方法がある。As a method of removing or oxidatively decomposing an organic substance, there is a method of performing a filtration treatment after adsorbing the organic substance by activated carbon powder as disclosed in Japanese Patent Application No. 8-165601.
【０００４】また特願平１０−１７０６９５号に開示さ
れるように、オゾンガスを廃液に曝気し、オゾンを廃液
中に溶解した後に、紫外線を照射して有機物を分解する
方法がある。[0004] As disclosed in Japanese Patent Application No. 10-170695, there is a method in which ozone gas is aerated to a waste liquid to dissolve ozone in the waste liquid and then irradiated with ultraviolet rays to decompose organic substances.
【０００５】また廃液に過酸化水素を添加して加温条件
でオゾンガスを廃液に曝気し、有機物を分解する方法が
ある。There is also a method in which hydrogen peroxide is added to the waste liquid, and ozone gas is aerated to the waste liquid under a heating condition to decompose organic substances.
【０００６】[0006]
【発明が解決しようとする課題】前記の第一の公知例で
は、使用済み活性炭が二次廃棄物となり、この活性炭の
処理設備が必要であった。また、第二、第三の公知例で
は二次廃棄物の発生はないが、オゾンの廃液への溶解率
を高めるためには、酸素富化空気や純酸素を原料ガスと
する無声放電により、高濃度のオゾンを製造する必要が
ある。したがって、原料ガスのためのランニングコスト
が高くなる課題があった。In the above-mentioned first known example, the used activated carbon becomes secondary waste, and a treatment facility for the activated carbon is required. In the second and third known examples, no secondary waste is generated, but in order to increase the dissolution rate of ozone in the waste liquid, a silent discharge using oxygen-enriched air or pure oxygen as a source gas is performed. There is a need to produce high concentrations of ozone. Therefore, there is a problem that the running cost for the source gas is increased.
【０００７】本発明の目的は、廃液にオゾンを注入する
処理システムにおいて、原料ガスの消費を減らし、廃液
処理のランニングコストを低減することにある。An object of the present invention is to reduce the consumption of raw material gas and reduce the running cost of waste liquid treatment in a treatment system for injecting ozone into waste liquid.
【０００８】[0008]
【課題を解決するための手段】上記の目的を達成する第
１発明の特徴は、有機物を含む放射性廃液に、酸素ガ
ス、あるいは酸素富化空気を原料ガスとしてその無声放
電により発生するオゾンを曝気し、廃液中にオゾンを溶
解する処理方法において、曝気後の気体を循環し前期原
料ガスに混合することにある。A first feature of the present invention to achieve the above object is that a radioactive waste liquid containing organic substances is aerated with ozone generated by silent discharge of oxygen gas or oxygen-enriched air as a raw material gas. In the treatment method for dissolving ozone in waste liquid, the gas after aeration is circulated and mixed with the raw material gas.
【０００９】通常、酸素ガス、あるいは酸素富化空気を
原料ガスとしてその無声放電によりオゾンを製造する場
合、生成するオゾンガス中のオゾン濃度は最大でも２０
体積パーセント程度であり、残りは酸素ガスあるいは酸
素富化空気である。オゾンの大部分は廃液中の有機物や
水との反応により酸素に形態を変える。したがって、廃
液への曝気後の気体中の酸素濃度は原料ガスに匹敵する
程度に高く、原料ガスとして再利用可能である。そこ
で、曝気後の気体の一部を循環し原料ガスに混合供給す
ることで、混合割合に応じた原料ガス消費の削減が図れ
る。Usually, when producing ozone by silent discharge of oxygen gas or oxygen-enriched air as a raw material gas, the ozone concentration in the generated ozone gas is at most 20.
About volume percent, the balance being oxygen gas or oxygen-enriched air. Most of the ozone changes its form into oxygen by reaction with organic matter and water in the waste liquid. Therefore, the oxygen concentration in the gas after aeration of the waste liquid is as high as that of the source gas, and the gas can be reused as the source gas. Therefore, by circulating a part of the gas after aeration and mixing and supplying it to the source gas, it is possible to reduce the consumption of the source gas according to the mixing ratio.
【００１０】上記目的を達成する第２発明の特徴は、有
機物を含む放射性廃液に、酸素ガス、あるいは酸素富化
空気を原料ガスとしてその無声放電により発生するオゾ
ンを曝気し、廃液中にオゾンを溶解する処理方法におい
て、曝気後の気体を原料ガスとしてその無声放電により
発生するオゾンを廃液に曝気することにある。A feature of the second invention that achieves the above object is that a radioactive waste liquid containing an organic substance is aerated with ozone generated by silent discharge using oxygen gas or oxygen-enriched air as a raw material gas, and ozone is contained in the waste liquid. In the dissolving treatment method, the gas after aeration is used as a raw material gas, and the ozone generated by the silent discharge is aerated to the waste liquid.
【００１１】本発明の作用は第１発明と同じであるが、
原料ガスと循環気体の混合という操作を簡便化するとと
もに、バックアップ系としてのオゾン注入システムを構
成するのに適している。The operation of the present invention is the same as that of the first invention,
This is suitable for simplifying the operation of mixing the raw material gas and the circulating gas and configuring an ozone injection system as a backup system.
【００１２】[0012]
【発明の実施の形態】本発明の一実施例を図１を用いて
説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described with reference to FIG.
【００１３】原料ガスは酸素ボンベ１からオゾン発生器
２へ供給される。オゾン発生器では原料ガスの無声放電
により、酸素の一部がオゾンに変化する。生成したオゾ
ンガスは、散気管４を介して曝気槽３に供給された廃液
に注入される。図１の実施例では曝気後の気体の吸引、
および混合はイジェクタ７を用いている。原料ガスの流
速に応じて循環ライン５に負圧が発生し、曝気後の気体
の一部がイジェクタに導かれ、原料ガスと混合される。
原料ガスと循環気体の混合比はダンパ６で調整する。余
剰気体はベント配管８から排気される。A raw material gas is supplied from an oxygen cylinder 1 to an ozone generator 2. In the ozone generator, part of oxygen is changed to ozone by silent discharge of the raw material gas. The generated ozone gas is injected into the waste liquid supplied to the aeration tank 3 through the diffuser 4. In the embodiment of FIG. 1, suction of gas after aeration,
For mixing, an ejector 7 is used. A negative pressure is generated in the circulation line 5 according to the flow rate of the raw material gas, and a part of the gas after aeration is guided to the ejector and mixed with the raw material gas.
The mixing ratio between the source gas and the circulating gas is adjusted by the damper 6. Excess gas is exhausted from the vent pipe 8.
【００１４】本実施例において、廃液へのオゾン注入量
を一定として、原料ガスと循環気体の混合比が１：１に
なるように運転した場合、原料ガスを１／２節約でき
る。循環ライン５には、除湿剤や活性炭のフィルターを
入れて、循環気体中の湿分や不純物を除去することが好
ましい。原料ガスとしては、酸素の高圧ガスの他、液体
酸素気化器から発生する酸素ガス、圧力スイング吸着装
置からの酸素富化空気等も使用可能である。In this embodiment, when the mixing ratio of the source gas and the circulating gas is set to 1: 1 while the amount of ozone injected into the waste liquid is kept constant, the source gas can be reduced by half. It is preferable to put a filter of a dehumidifier or activated carbon in the circulation line 5 to remove moisture and impurities in the circulation gas. As the raw material gas, in addition to the high-pressure gas of oxygen, oxygen gas generated from a liquid oxygen vaporizer, oxygen-enriched air from a pressure swing adsorption device, and the like can be used.
【００１５】本発明の第二の実施例を図２を用いて説明
する。A second embodiment of the present invention will be described with reference to FIG.
【００１６】原料ガスは酸素ボンベ１からオゾン発生器
２へ供給される。オゾン発生器では原料ガスの無声放電
により、酸素の一部がオゾンに変化する。生成したオゾ
ンガスは、散気管４を介して曝気槽３に供給された廃液
に注入される。曝気後の気体は吸気ブロア９を介して別
のオゾン発生器１０へ供給され、その無声放電により、
気体中の酸素の一部がオゾンに変化する。生成したオゾ
ンガスは、別の散気管１１を介して曝気槽３に供給され
た廃液に注入される。余剰ガスはベント１２から排気さ
れる。A raw material gas is supplied from an oxygen cylinder 1 to an ozone generator 2. In the ozone generator, part of oxygen is changed to ozone by silent discharge of the raw material gas. The generated ozone gas is injected into the waste liquid supplied to the aeration tank 3 through the diffuser 4. The gas after the aeration is supplied to another ozone generator 10 through the intake blower 9 and the silent discharge thereof causes
Some of the oxygen in the gas changes to ozone. The generated ozone gas is injected into the waste liquid supplied to the aeration tank 3 via another air diffuser 11. Excess gas is exhausted from the vent 12.
【００１７】本実施例において、原料ガスの流量と当量
吸気、再オゾン注入すれば、廃液へのオゾン曝気量が２
倍となり、廃液処理時間が短縮できる。結果として、原
料ガスの節約ができる。In the present embodiment, if the flow rate of the raw material gas is equivalent to the flow rate of the source gas and the re-ozone is injected, the ozone aeration amount to the waste liquid becomes 2
And the waste liquid treatment time can be reduced. As a result, source gas can be saved.
【００１８】[0018]
【発明の効果】本発明によれば、オゾンガスを用いた廃
液の処理システムにおいて、オゾンガスを製造する原料
ガスを節約でき、運転コストを低減することができる。According to the present invention, in a waste liquid treatment system using ozone gas, the source gas for producing ozone gas can be saved, and the operating cost can be reduced.
【図１】本発明の一実施例であるオゾン注入システムの
フロー図である。FIG. 1 is a flowchart of an ozone injection system according to an embodiment of the present invention.
【図２】本発明の一実施例であるオゾン注入システムの
フロー図である。FIG. 2 is a flowchart of an ozone injection system according to an embodiment of the present invention.
１…酸素ボンベ、２，１０…オゾン発生器、３…曝気
槽、４，１１…散気管、５…循環ライン、６…ダンパ、
７…イジェクター、８，１２…ベント、１０…吸気ブロ
ア。DESCRIPTION OF SYMBOLS 1 ... Oxygen cylinder, 2, 10 ... Ozone generator, 3 ... Aeration tank, 4, 11 ... Aeration tube, 5 ... Circulation line, 6 ... Damper,
7: ejector, 8, 12: vent, 10: intake blower.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 松本 隆行 茨城県日立市大みか町七丁目２番１号 株 式会社日立製作所電力・電機開発本部内 Ｆターム(参考） 4D050 AA13 AB02 AB07 BB02 BD02 BD03 BD04 BD06 BD08 4G035 AA01 AE13 4G042 AA07 CA01 CB12 CE04 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Takayuki Matsumoto 7-2-1, Omika-cho, Hitachi City, Ibaraki Prefecture F-term in the Electric Power & Electronics Development Division, Hitachi, Ltd. 4D050 AA13 AB02 AB07 BB02 BD02 BD03 BD04 BD06 BD08 4G035 AA01 AE13 4G042 AA07 CA01 CB12 CE04
Claims (2)
あるいは酸素富化空気を原料ガスとしてその無声放電に
より発生するオゾンを曝気し、廃液中にオゾンを溶解す
る処理方法において、曝気後の気体を循環し前期原料ガ
スに混合することを特徴とするオゾン注入システム。An oxygen gas, a radioactive waste liquid containing organic matter,
Alternatively, in a processing method in which ozone generated by silent discharge of oxygen-enriched air as a raw material gas is used to dissolve ozone in a waste liquid, the gas after the aeration is circulated and mixed with the raw material gas. Injection system.
あるいは酸素富化空気を原料ガスとしてその無声放電に
より発生するオゾンを曝気し、廃液中にオゾンを溶解す
る処理方法において、曝気後の気体を原料ガスとしてそ
の無声放電により発生するオゾンを廃液に曝気すること
を特徴とするオゾン注入システム。2. A radioactive waste liquid containing an organic substance, wherein oxygen gas,
Alternatively, in a treatment method in which ozone generated by silent discharge of oxygen-enriched air as a source gas is dissolved and ozone is dissolved in waste liquid, ozone generated by the silent discharge is aerated to waste liquid using the gas after aeration as a source gas. Ozone injection system characterized by performing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11177769A JP2001000986A (en) | 1999-06-24 | 1999-06-24 | Ozone injection system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11177769A JP2001000986A (en) | 1999-06-24 | 1999-06-24 | Ozone injection system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001000986A true JP2001000986A (en) | 2001-01-09 |
Family
ID=16036813
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11177769A Pending JP2001000986A (en) | 1999-06-24 | 1999-06-24 | Ozone injection system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001000986A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005296909A (en) * | 2004-03-16 | 2005-10-27 | Toshiba Corp | Water treating system |
| JP2010223739A (en) * | 2009-03-23 | 2010-10-07 | Toshiba Corp | Execution method and system related to treatment of waste liquid containing rust inhibitor |
| JP2012185013A (en) * | 2011-03-04 | 2012-09-27 | Hitachi-Ge Nuclear Energy Ltd | Processing method of radioactive waste liquid and processing apparatus therefor |
| JP2016525939A (en) * | 2013-06-07 | 2016-09-01 | エルブイディ アクイジション エルエルシー | Apparatus and method for sanitizing surfaces and treating water using ozone |
| JP6486569B1 (en) * | 2018-03-22 | 2019-03-20 | 三菱電機株式会社 | Water treatment apparatus and water treatment method |
| JP2020000969A (en) * | 2018-06-26 | 2020-01-09 | 荏原工業洗浄株式会社 | Method and device of treating aqueous ink effluent |
-
1999
- 1999-06-24 JP JP11177769A patent/JP2001000986A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005296909A (en) * | 2004-03-16 | 2005-10-27 | Toshiba Corp | Water treating system |
| JP2010223739A (en) * | 2009-03-23 | 2010-10-07 | Toshiba Corp | Execution method and system related to treatment of waste liquid containing rust inhibitor |
| JP2012185013A (en) * | 2011-03-04 | 2012-09-27 | Hitachi-Ge Nuclear Energy Ltd | Processing method of radioactive waste liquid and processing apparatus therefor |
| JP2016525939A (en) * | 2013-06-07 | 2016-09-01 | エルブイディ アクイジション エルエルシー | Apparatus and method for sanitizing surfaces and treating water using ozone |
| US9969632B2 (en) | 2013-06-07 | 2018-05-15 | Lvd Acquisition, Llc | Device and method for sanitizing surfaces and treating water using ozone |
| JP6486569B1 (en) * | 2018-03-22 | 2019-03-20 | 三菱電機株式会社 | Water treatment apparatus and water treatment method |
| WO2019180864A1 (en) * | 2018-03-22 | 2019-09-26 | 三菱電機株式会社 | Water treatment device and water treatment method |
| CN111886205A (en) * | 2018-03-22 | 2020-11-03 | 三菱电机株式会社 | Water treatment device and water treatment method |
| US11358884B2 (en) | 2018-03-22 | 2022-06-14 | Mitsubishi Electric Corporation | Water treatment apparatus and water treatment method |
| JP2020000969A (en) * | 2018-06-26 | 2020-01-09 | 荏原工業洗浄株式会社 | Method and device of treating aqueous ink effluent |
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