JP2000306877A5 - - Google Patents
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- Publication number
- JP2000306877A5 JP2000306877A5 JP1999117690A JP11769099A JP2000306877A5 JP 2000306877 A5 JP2000306877 A5 JP 2000306877A5 JP 1999117690 A JP1999117690 A JP 1999117690A JP 11769099 A JP11769099 A JP 11769099A JP 2000306877 A5 JP2000306877 A5 JP 2000306877A5
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- manufacturing
- semiconductor device
- pins
- rotating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 claims description 20
- 239000004065 semiconductor Substances 0.000 claims description 20
- 239000007789 gas Substances 0.000 claims 6
- 238000004140 cleaning Methods 0.000 claims 5
- 229910001873 dinitrogen Inorganic materials 0.000 claims 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 4
- 239000000126 substance Substances 0.000 claims 4
- 238000000034 method Methods 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 1
- 238000005498 polishing Methods 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11769099A JP2000306877A (ja) | 1999-04-26 | 1999-04-26 | 半導体製造装置および半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11769099A JP2000306877A (ja) | 1999-04-26 | 1999-04-26 | 半導体製造装置および半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000306877A JP2000306877A (ja) | 2000-11-02 |
JP2000306877A5 true JP2000306877A5 (de) | 2004-11-04 |
Family
ID=14717895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11769099A Pending JP2000306877A (ja) | 1999-04-26 | 1999-04-26 | 半導体製造装置および半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000306877A (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW490756B (en) | 1999-08-31 | 2002-06-11 | Hitachi Ltd | Method for mass production of semiconductor integrated circuit device and manufacturing method of electronic components |
JP7390142B2 (ja) * | 2019-09-20 | 2023-12-01 | 株式会社Screenホールディングス | 基板処理装置および基板搬送方法 |
CN112735989B (zh) * | 2020-12-31 | 2022-12-20 | 至微半导体(上海)有限公司 | 一种适用于供酸***的高洁净湿法设备 |
CN112735985B (zh) * | 2020-12-31 | 2022-12-20 | 至微半导体(上海)有限公司 | 一种单片式湿法清洗设备 |
CN112786493B (zh) * | 2020-12-31 | 2022-12-20 | 至微半导体(上海)有限公司 | 一种有效防止晶圆交叉污染的气流控制模组 |
-
1999
- 1999-04-26 JP JP11769099A patent/JP2000306877A/ja active Pending
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