JP2000164502A - Rotation processor - Google Patents
Rotation processorInfo
- Publication number
- JP2000164502A JP2000164502A JP33937198A JP33937198A JP2000164502A JP 2000164502 A JP2000164502 A JP 2000164502A JP 33937198 A JP33937198 A JP 33937198A JP 33937198 A JP33937198 A JP 33937198A JP 2000164502 A JP2000164502 A JP 2000164502A
- Authority
- JP
- Japan
- Prior art keywords
- cup
- exhaust
- port
- substrate
- case
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Drying Of Solid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は半導体ウェーハやガ
ラス基板等の基板の表面に形成された被膜に対して現像
を施したり、基板表面に洗浄液を供給して洗浄等を行う
回転処理装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary processing apparatus for developing a coating film formed on the surface of a substrate such as a semiconductor wafer or a glass substrate, or for supplying a cleaning liquid to the surface of the substrate for cleaning.
【０００２】[0002]
【従来の技術】半導体ウェーハやガラス基板等の基板を
回転せしめるとともに、基板の表面に現像液等の液体を
供給して所定の処理を行う装置として、特開平８−３２
１４６０号公報に開示される装置が知られている。2. Description of the Related Art An apparatus for rotating a substrate such as a semiconductor wafer or a glass substrate and supplying a liquid such as a developing solution to the surface of the substrate to perform a predetermined process is disclosed in JP-A-8-32.
An apparatus disclosed in 1460 is known.
【０００３】この装置は、リング状をなすカップ内に基
板を保持して回転せしめるチャックを配置するととも
に、カップ外側に平面視で四角形をなすケース（外カッ
プ）を配置し、このケース底面とカップ底面との間を迂
回通路とし、この迂回通路を介して清浄な空気を基板の
下面側に供給し、供給した清浄な空気を基板下面に沿っ
て径方向外側に導くようにしている。In this apparatus, a chuck for holding and rotating a substrate is disposed in a ring-shaped cup, and a case (outer cup) having a quadrangular shape in a plan view is disposed outside the cup. A detour path is provided between the substrate and the bottom surface, and clean air is supplied to the lower surface side of the substrate via the detour path, and the supplied clean air is directed radially outward along the lower surface of the substrate.
【０００４】また、上記装置にあっては、排液ダクトと
排気ダクトを別々に設け、排液ダクトはリング状をなす
カップの外周部からケース底面を貫通して下方に垂下
し、排気ダクトは前記排液ダクトよりも径方向内側部に
おいてケース底面を貫通して下方に垂下している。In the above apparatus, a drain duct and an exhaust duct are separately provided. The drain duct penetrates from the outer peripheral portion of the ring-shaped cup through the bottom of the case, and hangs downward. At the inner side in the radial direction than the drainage duct, it penetrates the case bottom surface and hangs downward.
【０００５】[0005]
【発明が解決しようとする課題】上述した従来の回転処
理装置にあっては、基板を収納するリング状カップ自体
に排液或いは排気ダクトが開口しているため、乱流が生
じやすい。また、従来の回転処理装置にあっては、排液
或いは排気ダクトが開口している箇所が特に排液や排気
が集中する箇所ではないので、排液或いは排気の効率が
よくない。更に、従来の回転処理装置にあっては、ケー
スの四隅には空間が形成されるが、この空間は単に通気
路として作用するだけであり、スペースの有効利用が図
られていない。しかも、近年の基板の大型化に伴う回転
処理装置の大型化により、処理中に破損した基板を回収
するためにカップを外し、それをまた元に戻すためには
多大な労力と時間を要する。In the above-mentioned conventional rotary processing apparatus, since the drainage or exhaust duct is opened in the ring-shaped cup itself for accommodating the substrate, turbulence is likely to occur. Further, in the conventional rotary processing apparatus, the location where the drainage or exhaust duct is opened is not a location where the drainage or exhaust is concentrated, so that the efficiency of drainage or exhaustion is not good. Further, in the conventional rotation processing apparatus, spaces are formed at the four corners of the case, but these spaces merely act as ventilation paths, and no effective use of the spaces is attempted. In addition, due to the recent increase in the size of the rotary processing apparatus accompanying the increase in the size of the substrate, a great deal of labor and time are required to remove the cup for recovering the substrate damaged during the processing, and to restore it again.
【０００６】[0006]
【課題を解決するための手段】上記課題を解決すべく本
発明に係る回転処理装置は、カップ内に基板を保持して
回転せしめるチャックを配置するとともに、カップ外側
にカップ内と連通しその１辺の長さがカップ外径に略等
しい矩形状ケースを設け、この矩形状ケースの四隅のう
ちの少なくとも一隅の底部に排気兼排液口を設けた。こ
のような構成とすることで、カップ内で乱流が生じにく
くなり、且つ排気兼排液の効率が高まる。SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, a rotation processing apparatus according to the present invention includes a chuck for holding and rotating a substrate in a cup, and communicating with the inside of the cup outside the cup. A rectangular case having a side length substantially equal to the cup outer diameter was provided, and an exhaust / drain port was provided at the bottom of at least one of the four corners of the rectangular case. With such a configuration, turbulence is less likely to occur in the cup, and the efficiency of exhaust and drainage is increased.
【０００７】前記排気兼排液口には異物回収部材を着脱
自在に設けることが好ましい。このような構成とするこ
とで、回転処理中に基板が破損した場合でも、破片の回
収を容易に行うことができる。It is preferable that a foreign substance collecting member is detachably provided at the exhaust / drain port. With such a configuration, even if the substrate is damaged during the rotation process, the fragments can be easily collected.
【０００８】また、前記排気兼排液口の上部には、カッ
プ内からの気体及び液体を前記排気兼排液口に誘導する
整流板を設けることが好ましい。このような構成とする
ことで、効率よく、排液及び排気を排気兼排液口に誘導
することができる。Preferably, a rectifying plate is provided above the exhaust / drain port to guide gas and liquid from inside the cup to the exhaust / drain port. With such a configuration, the drainage and the exhaust can be efficiently guided to the exhaust / drainage port.
【０００９】更に、前記排気兼排液口の上面にメンテナ
ンス口を形成することが好ましい。このような構成とす
ることで、前記異物回収部材の装着及び取り外し等を簡
単に行うことができる。Further, it is preferable to form a maintenance port on the upper surface of the exhaust / drain port. With such a configuration, the attachment and detachment of the foreign matter collecting member can be easily performed.
【００１０】[0010]
【発明の実施の形態】以下に本発明の実施の形態を添付
図面に基づいて説明する。ここで、図１は本発明に係る
回転処理装置の全体側面図、図２は同現像装置の平面
図、図３は同現像装置のＡ−Ａ拡大縦断面図、図４は図
３の要部拡大図である。Embodiments of the present invention will be described below with reference to the accompanying drawings. Here, FIG. 1 is an overall side view of the rotary processing apparatus according to the present invention, FIG. 2 is a plan view of the developing apparatus, FIG. 3 is an enlarged vertical sectional view of the developing apparatus taken along line AA, and FIG. It is a part enlarged view.
【００１１】図１に示すように、本発明に係る回転処理
装置１はダクトＤ及びフィルタＦからなる清浄空気の吹
き出し部の下方に配置され、また床Ｇはすのこ状になっ
ており、そのまま清浄空気が下方に抜ける構造になって
おり、微細な塵が現像処理中に表面に付着しにくい雰囲
気になっている。As shown in FIG. 1, a rotary processing apparatus 1 according to the present invention is disposed below a clean air blowing portion comprising a duct D and a filter F, and a floor G is shaped like a saw-tooth. The structure allows air to escape downward, creating an atmosphere in which fine dust hardly adheres to the surface during development processing.
【００１２】回転処理装置１は、平面視で矩形状をなす
ケース２内にリング状カップ３を配置している。このカ
ップ３は側壁４と底部５から構成され、側壁４は上方に
向かって徐々にその径が小さくなり、上端開口には整流
筒６が設けられている。この整流筒６はシリンダユニッ
ト７にて昇降可能とされ、回転処理装置１内に基板Ｗを
投入する際には下降して基板Ｗの搬入の邪魔にならない
ようにし、現像処理中は上昇し、カップ３内に乱流が生
じにくくしている。The rotation processing apparatus 1 has a ring-shaped cup 3 disposed in a case 2 having a rectangular shape in plan view. The cup 3 is composed of a side wall 4 and a bottom 5, and the diameter of the side wall 4 gradually decreases upward, and a rectifying cylinder 6 is provided at the upper end opening. The rectifying cylinder 6 can be moved up and down by the cylinder unit 7, so that the rectifying cylinder 6 is lowered when the substrate W is loaded into the rotation processing apparatus 1 so as not to obstruct the transfer of the substrate W, and is raised during the development processing. Turbulence is hardly generated in the cup 3.
【００１３】一方、前記カップ３の底部５の中央部には
開口８が形成され、開口８にはスピンナー軸９が挿通
し、このスピンナー軸９はベース１０に取り付けたモー
タ１１にて回転せしめられるとともにシリンダユニット
１２の作動で昇降動可能とされ、更にスピンナー軸９の
上端には基板Ｗを吸着保持するチャック１３が取り付け
られている。On the other hand, an opening 8 is formed in the center of the bottom 5 of the cup 3, and a spinner shaft 9 is inserted through the opening 8, and the spinner shaft 9 is rotated by a motor 11 mounted on a base 10. At the same time, the chuck unit 13 can be moved up and down by the operation of the cylinder unit 12, and a chuck 13 for sucking and holding the substrate W is attached to the upper end of the spinner shaft 9.
【００１４】また、前記底部５は２枚の上板１４と下板
１５にて構成され、これら上板１４及び下板１５は中央
の開口８から径方向外側に向かって下方に傾斜し、上板
１４の表面にはフッ素樹脂コーティングを施し、表面に
落下した現像液がスムーズに流れるようにし、また下板
１５には複数個のドレン排出口１６を、上板１４と下板
１５が下方に傾斜し合流するところに複数の排液の排出
口２６を設け、上板１４と下板１５との間のトラップ空
間に積極的に現像液や洗浄液を取り込み、これら液体が
回転軸受けの部分に廻り込まないようにしている。The bottom portion 5 is composed of two upper plates 14 and a lower plate 15. The upper plate 14 and the lower plate 15 are inclined downward from the central opening 8 toward the outside in the radial direction. The surface of the plate 14 is coated with a fluororesin so that the developer that has fallen on the surface flows smoothly. The lower plate 15 has a plurality of drain outlets 16, and the upper plate 14 and the lower plate 15 are directed downward. A plurality of drain outlets 26 are provided at the inclined and joined places, and the developer and the cleaning liquid are positively taken into the trap space between the upper plate 14 and the lower plate 15, and these liquids are circulated to the rotary bearing portion. I do not get stuck.
【００１５】また、前記上板１４及び下板１５は支持片
１７を介して前記ベース１０に取り付けられ、この支持
片１７の上端部には小寸法の基板Ｗに現像処理を施す際
に使用する整流リング１８を位置調整可能に取り付け、
一方、前記カップ３の側壁４内側に支持片１９を介して
大寸法の基板Ｗに現像処理を施す際に使用する整流リン
グ２０を位置調整可能に取り付けている。尚、大寸法の
基板Ｗに現像処理を施す際には、整流リング１８は取り
外しておく。The upper plate 14 and the lower plate 15 are attached to the base 10 via a support piece 17, and the upper end of the support piece 17 is used when developing a small-sized substrate W. Attach the rectifying ring 18 so that the position can be adjusted,
On the other hand, a rectifying ring 20 used for performing development processing on a large-sized substrate W is mounted on the inside of the side wall 4 of the cup 3 via a support piece 19 so as to be position-adjustable. Note that the rectifying ring 18 is removed when developing the large-sized substrate W.
【００１６】一方、ケース２内とリング状カップ３内と
は開口２１を介して連通しており、特にケース２の四隅
部のうちの少なくとも一隅部の底面には、排気兼排液口
２２が形成され、この排気兼排液口２２内の少なくとも
１箇所には金網などから構成される異物回収部材２３
が、着脱可能に設けられている。On the other hand, the inside of the case 2 and the inside of the ring-shaped cup 3 communicate with each other via an opening 21. In particular, an exhaust / drainage port 22 is provided on the bottom surface of at least one of the four corners of the case 2. A foreign matter collecting member 23 made of a wire mesh or the like is formed at
Are detachably provided.
【００１７】また、ケース２の排気兼排液口２２の上部
にはリング状カップ３内からの気体及び液体を排気兼排
液口２２に誘導する整流板２４が配置され、更に、ケー
ス２の排気兼排液口２２の上面にはメンテナンス口２５
が形成されている。ここで、排気兼排液口２２はケース
２の四隅部のうちの少なくとも一隅部としたが、四隅部
の対角部の２箇所または四隅の４箇所に設けると排気、
排液のバランスがよい。A rectifying plate 24 for guiding gas and liquid from inside the ring-shaped cup 3 to the exhaust / drain port 22 is disposed above the exhaust / drain port 22 of the case 2. A maintenance port 25 is provided on the upper surface of the exhaust / drain port 22.
Are formed. Here, the exhaust / drainage port 22 is at least one corner of the four corners of the case 2.
Good drainage balance.
【００１８】以上において、露光処理が終了した基板Ｗ
に現像処理を施す場合を例にとって説明すると、シリン
ダユニット１２の作動でスピンナー軸９とともにチャッ
ク１３を上昇せしめ、また同時にシリンダユニット７の
作動で整流筒６を下降せしめた状態で、基板Ｗを側方か
ら搬送してきてチャック１３上に載置する。In the above, the substrate W after the exposure processing has been completed.
When the cylinder unit 12 is operated to raise the chuck 13 together with the spinner shaft 9 and at the same time the cylinder unit 7 is operated to lower the rectifying cylinder 6, the substrate W And is placed on the chuck 13.
【００１９】この後、シリンダユニット１２を逆方向に
作動させて、更に図示しないノズルから基板Ｗ表面に現
像液を供給し液盛りする。そして、回転処理直前にシリ
ンダユニット７を逆方向に作動させて整流筒６を上昇せ
しめる。現像液の供給ノズルとしては、例えば、スリッ
トノズルが好ましい。Thereafter, the cylinder unit 12 is operated in the reverse direction, and a developing solution is further supplied to the surface of the substrate W from a nozzle (not shown) to be stored therein. Then, immediately before the rotation processing, the cylinder unit 7 is operated in the reverse direction to raise the flow straightening cylinder 6. As the supply nozzle for the developer, for example, a slit nozzle is preferable.
【００２０】上記のように基板Ｗ表面に現像液を液盛り
して所定時間経過したならば、モータ１１を駆動して基
板Ｗを回転せしめ、基板Ｗ上に盛られた現像液を除去す
る。このときの回転速度は５〜２００rpmとする。ま
た、回転時間は０．１〜１０秒とする。When a predetermined time has elapsed after the developing solution has been applied to the surface of the substrate W as described above, the motor 11 is driven to rotate the substrate W to remove the developing solution applied on the substrate W. The rotation speed at this time is 5 to 200 rpm. The rotation time is set to 0.1 to 10 seconds.
【００２１】この回転速度は、現像液を乾燥させる際の
回転速度に比べて極めて低速であり、このように低速で
回転せしめることで、基板Ｗから遠心力により除去され
る現像液の速度を遅くし、基板Ｗから飛散する現像液の
うちの多くの割合の現像液がカップ底部５を構成する上
板１４上に落下し、上板１４の傾斜に沿って径方向外側
に向かって流れ、排液の排出口２６を介して図示しない
現像液回収ポケット内に流れ込み、ポンプの駆動でタン
クに回収され、再利用に供される。This rotation speed is extremely low as compared with the rotation speed at the time of drying the developing solution. By rotating at such a low speed, the speed of the developing solution removed from the substrate W by centrifugal force is reduced. Then, a large proportion of the developer scattered from the substrate W falls on the upper plate 14 constituting the cup bottom 5, flows radially outward along the inclination of the upper plate 14, and is discharged. The liquid flows into a developer collection pocket (not shown) via the liquid discharge port 26, is collected in a tank by driving a pump, and is reused.
【００２２】回収されなかった現像液及び排液は整流板
２４に導かれて排気兼排液口２２から外部に排出され
る。また、万一、基板Ｗが破損した場合には、小さな破
片が異物回収部材２３内に回収されるので、基板Ｗの回
転を停止した後、メンテナンス口２５から手を差し込ん
で異物回収部材２３を取り外し、異物回収部材２３内に
入った破片を取り除き、再び異物回収部材２３を排気兼
排液口２２にセットし、次の処理に備える。尚、異物回
収部材２３の形状は自由であるので、その断面形状が直
方形でも正方形でも逆台形でもいずれでもよい。The unrecovered developer and drainage are guided to the current plate 24 and discharged to the outside through the exhaust / drainage port 22. If the substrate W is damaged, small debris is collected in the foreign matter collecting member 23. Therefore, after the rotation of the substrate W is stopped, a hand is inserted through the maintenance port 25 to remove the foreign matter collecting member 23. The foreign matter collecting member 23 is removed, and the debris that has entered the foreign matter collecting member 23 is removed. The foreign matter collecting member 23 is set in the exhaust / drain port 22 again to prepare for the next process. Since the shape of the foreign matter collecting member 23 is free, the cross-sectional shape may be any of a rectangular shape, a square shape, and an inverted trapezoidal shape.
【００２３】[0023]
【発明の効果】以上に説明したように本発明に係る回転
処理装置によれば、カップ内に基板を保持して回転せし
めるチャックを配置するとともに、カップ外側にカップ
内と連通しその１辺の長さがカップ外径に略等しい矩形
状ケースを設け、この矩形状ケースの四隅の少なくとも
１隅の底部に排気兼排液口を設けたので、カップ内で乱
流が生じにくく、且つ排気兼排液の効率を高めることが
できる。As described above, according to the rotation processing apparatus according to the present invention, the chuck for holding and rotating the substrate is disposed inside the cup, and the inside of the cup communicates with the inside of the cup outside of the cup. Since a rectangular case having a length substantially equal to the outer diameter of the cup is provided, and an exhaust / drain port is provided at the bottom of at least one of the four corners of the rectangular case, turbulent flow hardly occurs in the cup, The efficiency of drainage can be increased.
【００２４】特に、排気兼排液口に異物回収部材を着脱
自在に設ければ、回転処理中に基板が破損した場合で
も、破片の回収を容易に行うことができ、また、排気兼
排液口に、カップ内からの気体及び液体を前記排気兼排
液口に誘導する整流板を設ければ、排液及び排気を効率
よく排気兼排液口に誘導することができ、更に、排気兼
排液口上方の矩形状ケース上面にメンテナンス口を形成
すれば、異物回収部材の装着及び取り外し等を簡単に行
うことができる。In particular, if a foreign substance collecting member is detachably provided at the exhaust / drain port, even if the substrate is damaged during the rotation process, the debris can be easily collected, and the exhaust / drain liquid can be easily collected. If a rectifying plate for guiding gas and liquid from the inside of the cup to the exhaust / drain port is provided in the mouth, the drain / exhaust can be efficiently guided to the exhaust / drain port. If the maintenance port is formed on the upper surface of the rectangular case above the drain port, the attachment and removal of the foreign matter collecting member can be easily performed.
【図１】本発明に係る回転処理装置の全体側面図FIG. 1 is an overall side view of a rotation processing apparatus according to the present invention.
【図２】同現像装置の平面図FIG. 2 is a plan view of the developing device.
【図３】同現像装置のＡーＡ拡大縦断面図FIG. 3 is an enlarged vertical sectional view of the developing device taken along line AA.
【図４】図３の要部拡大図FIG. 4 is an enlarged view of a main part of FIG. 3;
１…回転処理装置、２…矩形状ケース、３…リング状カ
ップ、４…カップの側壁、５…カップの底部、６…整流
筒、７，１２…シリンダユニット、８…開口、９…スピ
ンナー軸、１０…ベース、１１…モータ、１３…チャッ
ク、１４…上板、１５…下板、１６…ドレン排出口、１
７…支持片、１８，２０…整流リング、２１…開口、２
２…排気兼排液口、２３…異物回収部材、２４…整流
板、２５…メンテナンス口、２６…排液の排出口。DESCRIPTION OF SYMBOLS 1 ... Rotating apparatus, 2 ... Rectangular case, 3 ... Ring-shaped cup, 4 ... Cup side wall, 5 ... Cup bottom, 6 ... Rectifying cylinder, 7, 12 ... Cylinder unit, 8 ... Opening, 9 ... Spinner shaft Reference numeral 10: base, 11: motor, 13: chuck, 14: upper plate, 15: lower plate, 16: drain outlet, 1
7 ... support piece, 18, 20 ... rectifying ring, 21 ... opening, 2
2. Exhaust / drain port, 23: Foreign matter collecting member, 24: Rectifier plate, 25: Maintenance port, 26: Drain outlet.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 福島 偉仁 神奈川県川崎市中原区中丸子150番地 東 京応化工業株式会社内 (72)発明者 高瀬 真治 神奈川県川崎市中原区中丸子150番地 東 京応化工業株式会社内 Ｆターム(参考） 2H096 AA00 AA24 AA25 AA27 GA29 GA32 GA33 3B201 AA03 AB24 AB47 BB21 BB92 CB01 CC13 CD11 CD22 3L113 AA03 AB08 AC45 AC46 AC54 AC55 AC57 AC63 AC64 AC72 AC73 AC76 AC78 AC79 AC83 BA34 CA15 DA01 DA07 DA15 DA22 5F046 LA06 LA07 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Weijin Fukushima 150 Nakamaruko, Nakahara-ku, Kawasaki City, Kanagawa Prefecture Inside Tokyo Ohka Kogyo Co., Ltd. (72) Inventor Shinji Takase 150 Nakamaruko, Nakahara-ku, Kawasaki City, Kanagawa Prefecture Tokyo Ohka F-term in Industrial Co., Ltd. LA06 LA07
Claims (4)
チャックを配置するとともに、カップ外側にカップ内と
連通しその１辺の長さがカップ外径に略等しい矩形状ケ
ースを設け、この矩形状ケースの四隅のうちの少なくと
も一隅の底部に排気兼排液口を設けたことを特徴とする
回転処理装置。A chuck for holding and rotating a substrate in a cup is provided, and a rectangular case communicating with the inside of the cup and having a side length substantially equal to the outside diameter of the cup is provided outside the cup. A rotary processing apparatus, wherein an exhaust / drain port is provided at the bottom of at least one of the four corners of the shape case.
て、前記排気兼排液口には異物回収部材を着脱自在に設
けたことを特徴とする回転処理装置。2. The rotary processing apparatus according to claim 1, wherein a foreign matter collecting member is detachably provided at the exhaust / drain port.
て、前記排気兼排液口の上部には、カップ内からの気体
及び液体を前記排気兼排液口に誘導する整流板を設けた
ことを特徴とする回転処理装置。3. The rotary processing apparatus according to claim 1, wherein a rectifying plate is provided above the exhaust / drain port to guide gas and liquid from inside the cup to the exhaust / drain port. A rotation processing device.
て、前記排気兼排液口の上方のケース上面にはメンテナ
ンス口が形成されていることを特徴とする回転処理装
置。4. The rotary processing apparatus according to claim 1, wherein a maintenance port is formed on an upper surface of the case above the exhaust / drain port.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33937198A JP3559987B2 (en) | 1998-11-30 | 1998-11-30 | Rotary processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33937198A JP3559987B2 (en) | 1998-11-30 | 1998-11-30 | Rotary processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000164502A true JP2000164502A (en) | 2000-06-16 |
| JP3559987B2 JP3559987B2 (en) | 2004-09-02 |
Family
ID=18326837
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33937198A Expired - Fee Related JP3559987B2 (en) | 1998-11-30 | 1998-11-30 | Rotary processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3559987B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002261073A (en) * | 2000-12-27 | 2002-09-13 | Shibaura Mechatronics Corp | Spin processor |
| KR101919987B1 (en) * | 2017-03-03 | 2018-11-19 | 김동명 | multistage dryer |
| CN114264136A (en) * | 2022-03-01 | 2022-04-01 | 潍坊润谱化学有限公司 | Quick drying equipment after granulation and cooling of flame-retardant master batches |
-
1998
- 1998-11-30 JP JP33937198A patent/JP3559987B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002261073A (en) * | 2000-12-27 | 2002-09-13 | Shibaura Mechatronics Corp | Spin processor |
| KR101919987B1 (en) * | 2017-03-03 | 2018-11-19 | 김동명 | multistage dryer |
| CN114264136A (en) * | 2022-03-01 | 2022-04-01 | 潍坊润谱化学有限公司 | Quick drying equipment after granulation and cooling of flame-retardant master batches |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3559987B2 (en) | 2004-09-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5829156A (en) | Spin dryer apparatus | |
| JP6863691B2 (en) | Board processing equipment | |
| JP2011238967A (en) | Liquid processing apparatus | |
| JPH081064A (en) | Rotary treating device | |
| JP2007287999A (en) | Liquid processing device | |
| JP2007044686A (en) | Spin processor of substrate | |
| JPH07106233A (en) | Rotary type substrate treater | |
| JP3396377B2 (en) | Substrate processing equipment | |
| JP3945569B2 (en) | Development device | |
| JP6027465B2 (en) | Substrate processing apparatus and substrate processing method | |
| JP2000164502A (en) | Rotation processor | |
| JP4804407B2 (en) | Liquid processing equipment | |
| JP4567178B2 (en) | Spin processing equipment | |
| JP4759183B2 (en) | Spin processing device | |
| JP3948963B2 (en) | Spin processing equipment | |
| JP2002329705A (en) | Spin treatment unit | |
| JP3712099B2 (en) | Rotation processing device | |
| JP4369022B2 (en) | Spin processing equipment | |
| JPH11305450A (en) | Developing device and developing method | |
| JP4358410B2 (en) | Spin processing equipment | |
| JP2948043B2 (en) | Rotary substrate processing equipment | |
| JP4447673B2 (en) | Spin processing equipment | |
| JP6799409B2 (en) | Board processing equipment | |
| JP2533461Y2 (en) | Substrate rotary developing equipment | |
| JP4410331B2 (en) | Spin processing equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20040511 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20040513 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100604 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110604 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120604 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120604 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130604 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140604 Year of fee payment: 10 |
|
| LAPS | Cancellation because of no payment of annual fees |